CN110057479A - Plating laminar double-layer sensitive film and preparation method for FP chamber fibre optic compression sensor - Google Patents
Plating laminar double-layer sensitive film and preparation method for FP chamber fibre optic compression sensor Download PDFInfo
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- 239000000835 fiber Substances 0.000 title claims abstract description 24
- 238000007747 plating Methods 0.000 title claims 13
- 230000006835 compression Effects 0.000 title claims 7
- 238000007906 compression Methods 0.000 title claims 7
- 238000002360 preparation method Methods 0.000 title abstract description 7
- 239000013307 optical fiber Substances 0.000 claims abstract description 41
- 229910052751 metal Inorganic materials 0.000 claims abstract description 30
- 239000002184 metal Substances 0.000 claims abstract description 30
- 239000011521 glass Substances 0.000 claims abstract description 26
- 229920002120 photoresistant polymer Polymers 0.000 claims description 40
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 16
- 235000013870 dimethyl polysiloxane Nutrition 0.000 claims description 16
- CXQXSVUQTKDNFP-UHFFFAOYSA-N octamethyltrisiloxane Chemical compound C[Si](C)(C)O[Si](C)(C)O[Si](C)(C)C CXQXSVUQTKDNFP-UHFFFAOYSA-N 0.000 claims description 16
- 238000004987 plasma desorption mass spectroscopy Methods 0.000 claims description 16
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 16
- 239000012528 membrane Substances 0.000 claims description 6
- 238000000034 method Methods 0.000 claims description 6
- 239000000758 substrate Substances 0.000 claims description 6
- 229910052709 silver Inorganic materials 0.000 claims description 5
- 239000004332 silver Substances 0.000 claims description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052737 gold Inorganic materials 0.000 claims description 4
- 239000010931 gold Substances 0.000 claims description 4
- 238000005566 electron beam evaporation Methods 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims description 2
- 210000001951 dura mater Anatomy 0.000 claims 7
- 229910017435 S2 In Inorganic materials 0.000 claims 1
- 230000003628 erosive effect Effects 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 238000004528 spin coating Methods 0.000 claims 1
- 238000002310 reflectometry Methods 0.000 abstract description 9
- 239000011248 coating agent Substances 0.000 abstract description 8
- 238000000576 coating method Methods 0.000 abstract description 8
- 239000010410 layer Substances 0.000 description 59
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 25
- 239000000377 silicon dioxide Substances 0.000 description 13
- 235000012239 silicon dioxide Nutrition 0.000 description 12
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 9
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
- 229910021389 graphene Inorganic materials 0.000 description 5
- 238000005516 engineering process Methods 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- 239000003292 glue Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000004038 photonic crystal Substances 0.000 description 2
- 230000004044 response Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 238000001228 spectrum Methods 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001727 in vivo Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 239000003129 oil well Substances 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229920006268 silicone film Polymers 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
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- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
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- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L1/00—Measuring force or stress, in general
- G01L1/24—Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet
- G01L1/242—Measuring force or stress, in general by measuring variations of optical properties of material when it is stressed, e.g. by photoelastic stress analysis using infrared, visible light, ultraviolet the material being an optical fibre
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- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L11/00—Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/00 or G01L9/00
- G01L11/02—Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/00 or G01L9/00 by optical means
- G01L11/025—Measuring steady or quasi-steady pressure of a fluid or a fluent solid material by means not provided for in group G01L7/00 or G01L9/00 by optical means using a pressure-sensitive optical fibre
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- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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Abstract
本发明涉及一种用于FP腔光纤压力传感器的镀层式双层敏感膜及制备方法,属于压力传感器技术领域。本发明的FP腔光纤压力传感器包括毛细玻璃管、单模光纤和敏感膜,单模光纤从毛细玻璃管的一环形端面插入,另一个环形端面与将其覆盖的镀层式双层敏感膜固连,单模光纤和镀层式双层敏感膜之间形成一空气腔作为FP腔体;镀层式双层敏感膜包括软膜和镀在软膜外表面的金属硬膜,金属硬膜与单模光纤的纤芯横截面相对设置,金属硬膜的直径与单模光纤纤芯横截面的直径相等,软膜直径与毛细玻璃管环形端面的外径相等。本发明将弹性模量较大且反射率大的金属硬膜镀在弹性模量小的软膜外表面,形成一外镀双层结构敏感膜,同时具有很好的形变能力和反射率。
The invention relates to a coating type double-layer sensitive film for an FP cavity optical fiber pressure sensor and a preparation method, and belongs to the technical field of pressure sensors. The FP cavity optical fiber pressure sensor of the present invention includes a capillary glass tube, a single-mode optical fiber and a sensitive film. The single-mode optical fiber is inserted from one annular end face of the capillary glass tube, and the other annular end face is fixedly connected with the coating-type double-layer sensitive film covering it. , an air cavity is formed between the single-mode fiber and the coated double-layer sensitive film as the FP cavity; the coated double-layer sensitive film includes a soft film and a metal hard film coated on the outer surface of the soft film, and the metal hard film and the single-mode fiber The cross-sections of the cores are arranged opposite, the diameter of the metal hard film is equal to the diameter of the cross-section of the single-mode fiber core, and the diameter of the soft film is equal to the outer diameter of the annular end face of the capillary glass tube. In the invention, the metal hard film with large elastic modulus and high reflectivity is coated on the outer surface of the soft film with small elastic modulus to form an externally plated double-layer structure sensitive film, which has good deformability and reflectivity at the same time.
Description
技术领域technical field
本发明涉及压力传感器技术领域,尤其涉及一种用于FP腔光纤压力传感器的镀层式双层敏感膜及制备方法。The invention relates to the technical field of pressure sensors, in particular to a coating type double-layer sensitive film for an FP cavity optical fiber pressure sensor and a preparation method thereof.
背景技术Background technique
光纤传感器可用于压力、应变、位移、温度、湿度、电流、磁场等众多物理量的测量,基于FP腔的光纤压力传感器具有高可靠性、高灵敏度、耐恶劣环境、抗电磁干扰等特点,在航空航天、桥梁建筑、高温油井、声口内探测和生物医疗等领域得到了广泛应用。非本征膜片式FP光纤压力传感器相较于传统FP光纤压力传感器具有更高的灵敏度、更强的抗干扰能力,在构件健康监测、医学超声波检测、生物体内探测等需要高精度测量的方面具有极大的应用潜力。Optical fiber sensors can be used for the measurement of many physical quantities such as pressure, strain, displacement, temperature, humidity, current, magnetic field, etc. The optical fiber pressure sensor based on FP cavity has the characteristics of high reliability, high sensitivity, resistance to harsh environments, and anti-electromagnetic interference. It has been widely used in aerospace, bridge construction, high temperature oil wells, acoustic detection and biomedical fields. Compared with the traditional FP fiber optic pressure sensor, the extrinsic diaphragm FP fiber optic pressure sensor has higher sensitivity and stronger anti-interference ability, and requires high-precision measurement in the aspects of component health monitoring, medical ultrasonic testing, and in vivo detection. Has great application potential.
非本征膜片式FP光纤传感器大多是由切割得到的光纤端面和敏感膜片构成FP腔的两个反射镜,薄膜在外力作用下发生振动,从而导致FP腔的干涉情况发生变化,通过检测干涉变化可以得到外界压力的变化。因此,敏感膜片的设计和加工对传感器的整体性能指标有重要影响。Most of the extrinsic diaphragm FP fiber sensors are two mirrors of the FP cavity composed of the cut fiber end face and the sensitive diaphragm. The film vibrates under the action of external force, which causes the interference of the FP cavity to change. Interference changes can obtain changes in external pressure. Therefore, the design and processing of the sensitive diaphragm have an important impact on the overall performance of the sensor.
基于不同材料制成不同结构的敏感膜的FP腔光纤传感器已经被多次报导:例如,(1)Dai等人使用单层石墨烯薄膜作为敏感膜,结合套着毛细管的单模光纤构成FP腔,进而制成FP腔光纤传感器;其中使用单层石墨烯薄膜制成的敏感膜弹性模量低,但是折射率低、成本较高且容易损坏。(2)Majun等人使用多层石墨烯作为敏感膜,用多层石墨烯制成的敏感膜在0.2-22Khz间有高响应,同时随着石墨烯厚度增大,敏感膜的折射率提高但是其弹性模量增大。(3)使用光子晶体反射镜作为敏感膜,在10-50Khz间有高响应,光子晶体反射镜制成的敏感膜具有高反射率和高弹性模量的特点。FP cavity optical fiber sensors based on sensitive membranes made of different materials have been reported many times: for example, (1) Dai et al. used a single-layer graphene film as a sensitive membrane, combined with a single-mode optical fiber sheathed with a capillary tube to form an FP cavity , and then make an FP cavity optical fiber sensor; wherein the sensitive film made of single-layer graphene film has low elastic modulus, but has low refractive index, high cost and easy damage. (2) Majun et al. used multi-layer graphene as the sensitive film. The sensitive film made of multi-layer graphene has a high response between 0.2 and 22Khz. At the same time, as the thickness of graphene increases, the refractive index of the sensitive film increases, but Its elastic modulus increases. (3) The photonic crystal mirror is used as the sensitive film, which has a high response between 10-50Khz. The sensitive film made of the photonic crystal mirror has the characteristics of high reflectivity and high elastic modulus.
现有的敏感膜只具有高反射率或低弹性模量中的单一特点,不能满足实际FP腔光纤压力传感器的使用要求。The existing sensitive films only have a single feature of high reflectivity or low elastic modulus, which cannot meet the requirements of practical FP cavity optical fiber pressure sensors.
发明内容SUMMARY OF THE INVENTION
有鉴于此,本发明提供了一种用于FP腔光纤压力传感器的镀层式双层敏感膜及制备方法,敏感膜为在弹性模量小的软膜外表面上镀上一层高反射率的金属硬膜,同时具有弹性模小和高反射率的特点。In view of this, the present invention provides a coating type double-layer sensitive film for an FP cavity optical fiber pressure sensor and a preparation method. The metal hard film has the characteristics of small elastic mode and high reflectivity at the same time.
本发明提供了一种用于FP腔光纤压力传感器的镀层式双层敏感膜,该FP腔光纤压力传感器由毛细玻璃管、单模光纤和敏感膜组成,其中单模光纤从毛细玻璃管的一环形端面插入,毛细玻璃管的另一个环形端面与将其覆盖的镀层式双层敏感膜固连,单模光纤和镀层式双层敏感膜之间形成一空气腔作为FP腔体,毛细玻璃管环形端面的内径和单模光纤的直径相等;单模光纤的横截面中心和敏感膜的中心均在毛细玻璃管的轴线上,单模光纤的纤芯横截面和敏感膜作为FP腔体的两个腔镜,与毛细玻璃管的轴向成90°,形成FP腔干涉结构。The invention provides a coating type double-layer sensitive film for an FP cavity optical fiber pressure sensor. The FP cavity optical fiber pressure sensor is composed of a capillary glass tube, a single-mode optical fiber and a sensitive film, wherein the single-mode optical fiber is formed from a capillary glass tube. The annular end face is inserted, the other annular end face of the capillary glass tube is fixed with the coated double-layer sensitive film covering it, and an air cavity is formed between the single-mode optical fiber and the coated double-layer sensitive film as the FP cavity, and the capillary glass tube The inner diameter of the annular end face is equal to the diameter of the single-mode fiber; the center of the cross-section of the single-mode fiber and the center of the sensitive film are both on the axis of the capillary glass tube, and the cross-section of the core of the single-mode fiber and the sensitive film serve as two parts of the FP cavity. A cavity mirror, which is 90° to the axial direction of the capillary glass tube, forms an FP cavity interference structure.
本发明中的镀层式双层敏感膜包括软膜和镀在软膜外表面的金属硬膜,两者形成倒T形结构,金属硬膜与单模光纤的纤芯横截面相对设置,金属硬膜的直径与单模光纤纤芯横截面的直径相等,软膜的直径与毛细玻璃管环形端面的外径相等。The coating type double-layer sensitive film in the present invention includes a soft film and a metal hard film coated on the outer surface of the soft film, the two form an inverted T-shaped structure, the metal hard film is arranged opposite to the cross section of the core of the single-mode optical fiber, and the metal hard film is arranged opposite to the core cross-section of the single-mode optical fiber. The diameter of the membrane is equal to the diameter of the cross section of the single-mode optical fiber core, and the diameter of the soft membrane is equal to the outer diameter of the annular end face of the capillary glass tube.
进一步的,所述软膜为表面平整光洁的橡胶模或硅胶膜,软膜优选由PDMS制成。Further, the soft film is a rubber mold or a silicone film with a smooth and clean surface, and the soft film is preferably made of PDMS.
进一步的,金属硬膜由金或银制成。Further, the metal hard coat is made of gold or silver.
进一步的,所述软膜的厚度为0.5-10μm,金属硬膜的厚度为10-1000nm。Further, the thickness of the soft film is 0.5-10 μm, and the thickness of the metal hard film is 10-1000 nm.
本发明还提供了一种上述镀层式双层敏感膜的制备方法,包括以下步骤:The present invention also provides a preparation method of the above-mentioned coating type double-layer sensitive film, comprising the following steps:
S1、在基底上淀积一层氧化层作为牺牲层,在氧化层上旋涂一层光刻胶,高能辐射透过一掩膜板上特定图形对光刻胶曝光,用显影液去除曝光后性质发生改变的光刻胶,得到与掩膜版对应的图形形状的空槽,然后剩下的光刻胶作为掩膜,使用ICP对整个表面进行刻蚀,在氧化层上得到对应图形的标记,便于后续套刻步骤的定位;S1. An oxide layer is deposited on the substrate as a sacrificial layer, a layer of photoresist is spin-coated on the oxide layer, high-energy radiation is exposed to the photoresist through a specific pattern on a mask, and the exposed photoresist is removed with a developing solution. The photoresist whose properties have changed, obtains an empty groove in the shape of the pattern corresponding to the mask, and then the remaining photoresist is used as a mask, and ICP is used to etch the entire surface, and the corresponding pattern marks are obtained on the oxide layer. , which is convenient for the positioning of subsequent engraving steps;
S2、再次涂上光刻胶,利用另一个与步骤S1中掩膜版相同位置开设有相同标记图形的掩膜版进行定位,步骤S2中掩膜版还开设有圆形图案;经过与步骤1相同的曝光、溶解步骤,在光刻胶中形成一圆柱体空槽,将软膜溶液填充在圆柱体空槽中,制得软膜;S2. Coat the photoresist again, and use another mask with the same marking pattern at the same position as the mask in step S1 for positioning. In step S2, the mask is also provided with a circular pattern; In the steps of exposing and dissolving, a cylindrical hollow groove is formed in the photoresist, and the soft film solution is filled in the cylindrical hollow groove to obtain a soft film;
S3、再次在软膜上涂上光刻胶,利用另一个与步骤S1中掩膜版相同位置开设有相同标记图形的掩膜版进行定位,步骤S3中掩膜版还开设有圆形图案,其圆心与步骤S2中掩膜版开设的圆形图案的圆心重合;经过与步骤1相同的曝光、溶解步骤,在光刻胶中形成一圆柱体空槽,通过电子束蒸发技术在软膜的外表面镀上一层金属硬膜;S3. Coat the photoresist on the soft film again, and use another mask with the same marking pattern at the same position as the mask in step S1 for positioning. In step S3, the mask is also provided with a circular pattern, the center of which is Coinciding with the center of the circular pattern opened by the mask in step S2; through the same exposure and dissolving steps as in step 1, a cylindrical hollow groove is formed in the photoresist, and the outer surface of the soft film is formed by electron beam evaporation technology. Coated with a layer of metal hard film;
S4、去除光刻胶和基底,制得镀层式双层敏感膜。S4, removing the photoresist and the substrate to obtain a plated double-layer sensitive film.
进一步的,在步骤S2中,所述软膜由PDMS制成,软膜的厚度为0.5-10μm,表面平整光洁。Further, in step S2, the soft film is made of PDMS, the thickness of the soft film is 0.5-10 μm, and the surface is smooth and clean.
进一步的,在步骤S3中,所述金属硬膜由金或银制成,金属硬膜的厚度为10-1000nm。Further, in step S3, the metal hard film is made of gold or silver, and the thickness of the metal hard film is 10-1000 nm.
与现有技术相比,本发明的技术方案具有的有益效果如下:本发明的镀层式双层敏感膜将弹性模量较大且反射率高的金属硬膜镀在弹性模量小的软膜外表面,构成双层复合薄膜,将该薄膜作为光纤FP腔体的一个腔镜,在受压时,形变主要发生在外侧的软膜层上,处于光纤模场直径范围内的金属硬膜层形变量小,反射率高,将有效增加光束在腔内的往返次数,提高FP腔体的Q值和反射光谱锐度,从而提高传感器的灵敏度。Compared with the prior art, the technical solution of the present invention has the following beneficial effects: the coated double-layer sensitive film of the present invention coats a metal hard film with a large elastic modulus and a high reflectivity on a soft film with a small elastic modulus The outer surface forms a double-layer composite film, which is used as a cavity mirror of the fiber FP cavity. When under pressure, the deformation mainly occurs on the outer soft film layer, and the metal hard film layer within the diameter of the fiber mode field. The deformation is small and the reflectivity is high, which will effectively increase the number of round trips of the beam in the cavity, improve the Q value of the FP cavity and the sharpness of the reflection spectrum, thereby improving the sensitivity of the sensor.
附图说明Description of drawings
附图仅用于示出具体实施例的目的,而并不认为是对本发明的限制,在整个附图中,相同的参考符号表示相同的部件。The drawings are for the purpose of illustrating specific embodiments only and are not to be considered limiting of the invention, and like reference numerals refer to like parts throughout the drawings.
图1为本发明实施例中基于镀层式双层敏感膜的FP腔光纤压力传感器的立体剖面示意简图;1 is a schematic three-dimensional cross-sectional schematic diagram of an FP cavity optical fiber pressure sensor based on a coated double-layer sensitive film in an embodiment of the present invention;
图2为图1中镀层式双层敏感膜的结构示意图;Fig. 2 is the structural representation of the coating type double-layer sensitive film in Fig. 1;
图3(a)-图3(k)为本发明实施例中制备镀层式双层敏感膜的制作流程示意图。3( a )- FIG. 3( k ) are schematic diagrams of a manufacturing process for preparing a plated double-layer sensitive film in an embodiment of the present invention.
附图标记:Reference number:
1-毛细玻璃管;2-单模光纤;3-敏感膜;31-软膜;32-金属硬膜;4-空气腔;5-硅底;6-二氧化硅层;7-光刻胶。1-capillary glass tube; 2-single-mode fiber; 3-sensitive film; 31-soft film; 32-metal hard film; 4-air cavity; 5-silicon bottom; 6-silicon dioxide layer; 7-photoresist .
具体实施方式Detailed ways
为使本发明的目的、技术方案和优点更加清楚,下面将结合附图对本发明实施方式作进一步地描述。In order to make the objectives, technical solutions and advantages of the present invention clearer, the embodiments of the present invention will be further described below with reference to the accompanying drawings.
本发明提供了一种用于FP腔光纤压力传感器的镀层式双层敏感膜,需要说明的是该FP腔光纤压力传感器由毛细玻璃管1、单模光纤2和敏感膜3组成,其中单模光纤2从毛细玻璃管1的一环形端面插入,毛细玻璃管1的另一个环形端面与将其覆盖的镀层式双层敏感膜3固连,单模光纤2和镀层式双层敏感膜3之间形成一空气腔4作为FP腔体,毛细玻璃管1环形端面的内径和单模光纤2的直径相等;单模光纤2的横截面中心和敏感膜3的中心均在毛细玻璃管1的轴线上,单模光纤2的纤芯横截面和敏感膜3作为FP腔体的两个腔镜,与毛细玻璃管1的轴向成90°,形成FP腔干涉结构。The present invention provides a coated double-layer sensitive film for an FP cavity optical fiber pressure sensor. It should be noted that the FP cavity optical fiber pressure sensor is composed of a capillary glass tube 1, a single-mode optical fiber 2 and a sensitive film 3, wherein the single-mode optical fiber pressure sensor is composed of a capillary glass tube 1, a single-mode optical fiber 2 and a sensitive film 3. The optical fiber 2 is inserted from an annular end face of the capillary glass tube 1, and the other annular end face of the capillary glass tube 1 is fixedly connected with the coated double-layer sensitive film 3 covering it. An air cavity 4 is formed between them as the FP cavity. The inner diameter of the annular end face of the capillary glass tube 1 is equal to the diameter of the single-mode optical fiber 2; Above, the core cross-section of the single-mode fiber 2 and the sensitive film 3 are used as the two cavity mirrors of the FP cavity, which are 90° to the axial direction of the capillary glass tube 1, forming the FP cavity interference structure.
本发明实施例中的敏感膜3为镀层式双层敏感膜,包括软膜31和镀在软模31外表面的金属硬膜32,金属硬膜32与单模光纤2的纤芯横截面相对设置,金属硬膜32的直径与单模光纤2纤芯横截面的直径相等,软膜31的直径与毛细玻璃管1环形端面的外径相等。The sensitive film 3 in the embodiment of the present invention is a plated double-layer sensitive film, including a soft film 31 and a metal hard film 32 plated on the outer surface of the soft mode 31, and the metal hard film 32 is opposite to the cross section of the core of the single-mode optical fiber 2 The diameter of the metal hard film 32 is equal to the diameter of the cross section of the core of the single-mode optical fiber 2 , and the diameter of the soft film 31 is equal to the outer diameter of the annular end face of the capillary glass tube 1 .
如图2所示,在一具体实施例中,所述镀层式双层敏感膜3中的软膜31由PDMS制成,金属硬膜32由银制成,PDMS软膜31表面平整光洁;最终制成的镀层式双层敏感膜3中软膜31的厚度为2.5μm,银金属硬膜32的厚度为400nm;PDMS软膜31直径与毛细玻璃管1环形端面的内径相等,为250μm;银金属硬膜32的直径与单模光纤2纤芯横截面的直径相等,为10μm。As shown in FIG. 2 , in a specific embodiment, the soft film 31 in the plated double-layer sensitive film 3 is made of PDMS, the metal hard film 32 is made of silver, and the surface of the PDMS soft film 31 is smooth and smooth; finally The thickness of the soft film 31 in the prepared plated double-layer sensitive film 3 is 2.5 μm, and the thickness of the silver metal hard film 32 is 400 nm; the diameter of the PDMS soft film 31 is equal to the inner diameter of the annular end face of the capillary glass tube 1, which is 250 μm; the silver metal The diameter of the hard coat 32 is equal to the diameter of the cross-section of the core of the single-mode optical fiber 2, and is 10 μm.
如图3(a)-图3(k)所示,本发明实施例中镀层式双层敏感膜的制备方法如下:As shown in Fig. 3(a)-Fig. 3(k), the preparation method of the coating type double-layer sensitive film in the embodiment of the present invention is as follows:
(1)在硅底5上镀上一层1-3um厚的二氧化硅层6作为牺牲层,再在二氧化硅层6上旋涂一薄层光刻胶,将一掩膜版覆盖在薄层光刻胶上,掩膜版的边缘开设有三角形的标记图形;使用紫外光透过掩膜版上的三角形标记图形对光刻胶进行曝光,利用显影液融去曝光后性质发生改变的光刻胶;移去掩膜版,利用ICP技术直接对装置表面进行刻蚀,然后去除薄层光刻胶,在二氧化硅层6上得到三角形标记(图中未显示),便于后续工艺步骤的定位、套刻,如图3(a)所示。(1) A layer of silicon dioxide layer 6 with a thickness of 1-3um is plated on the silicon substrate 5 as a sacrificial layer, and then a thin layer of photoresist is spin-coated on the silicon dioxide layer 6, and a mask is covered on the On the thin-layer photoresist, the edge of the mask is provided with a triangular mark pattern; use ultraviolet light to pass through the triangular mark pattern on the mask to expose the photoresist, and use the developer to melt away the changed properties after exposure. Photoresist; remove the mask, use ICP technology to directly etch the surface of the device, then remove the thin layer of photoresist, and obtain a triangular mark (not shown in the figure) on the silicon dioxide layer 6, which is convenient for subsequent process steps The positioning and engraving are shown in Figure 3(a).
(2)在二氧化硅层6的三角形标记以外区域,使用匀胶机在二氧化硅层6上旋涂一层2.5μm厚的光刻胶7,如图3(b)所示。(2) In the area other than the triangular mark of the silicon dioxide layer 6, spin-coat a layer of photoresist 7 with a thickness of 2.5 μm on the silicon dioxide layer 6 by using a glue spinner, as shown in FIG. 3( b ).
(3)将另一掩膜版覆盖在光刻胶7上,步骤(3)中掩膜版与步骤(1)中掩膜版的相同位置开设有三角形的标记图形,步骤(3)中掩膜版的三角形的标记图形与二氧化硅层6的三角形标记对齐。(3) covering another mask on the photoresist 7, in step (3), the mask is provided with a triangular mark pattern at the same position as the mask in step (1), and in step (3) The triangular mark pattern of the stencil is aligned with the triangular mark of the silicon dioxide layer 6 .
步骤(3)中掩膜版上还开设有直径为250μm的圆孔,使用紫外光透过掩膜版上的圆孔对光刻胶7进行曝光,利用显影液融去中间曝光部分的光刻胶7,在光刻胶7中得到直径250μm圆柱体槽,如图3(c)所示。In step (3), a circular hole with a diameter of 250 μm is also opened on the mask plate, and the photoresist 7 is exposed by ultraviolet light through the circular hole on the mask plate, and the photolithography of the middle exposure part is melted by the developing solution. 7, and a cylindrical groove with a diameter of 250 μm is obtained in the photoresist 7, as shown in FIG. 3(c).
(4)将配置好的PDMS溶液在真空烘箱干燥以去除气泡,再使用匀胶机旋涂在二氧化硅层6和光刻胶7上,使PDMS溶液填充满步骤(3)中的直径250μm圆柱体槽,如图3(d)所示。(4) The prepared PDMS solution was dried in a vacuum oven to remove air bubbles, and then spin-coated on the silicon dioxide layer 6 and the photoresist 7 using a glue spinner to fill the PDMS solution with the diameter of 250 μm in step (3). Cylinder slot, as shown in Fig. 3(d).
(5)用平整光滑的橡胶刀片横向刮过PDMS衬底表面,直至刀片和光刻胶7的顶端表面相接触,将多余的PDMS溶液去除,仅保留光刻胶中直径250μm圆柱体槽中的PDMS溶液,然后加热处理,制得PDMS软膜31,如图3(e)所示。(5) Scrape across the surface of the PDMS substrate with a flat and smooth rubber blade until the blade and the top surface of the photoresist 7 are in contact, remove the excess PDMS solution, and only keep the 250 μm diameter cylindrical groove in the photoresist. The PDMS solution is then heated to prepare the PDMS soft film 31, as shown in Figure 3(e).
(6)加热完成后,在二氧化硅层6上有一层薄薄的固体,使用ICP技术将其刻蚀,如图3(f)所示。(6) After the heating is completed, there is a thin layer of solid on the silicon dioxide layer 6, which is etched by ICP technology, as shown in FIG. 3(f).
(7)在步骤(6)的二氧化硅层6和PDMS软膜31上再次使用匀胶机旋涂一层光刻胶7,如图3(g)所示。(7) A layer of photoresist 7 is spin-coated on the silicon dioxide layer 6 and the PDMS soft film 31 in step (6) again using a glue spinner, as shown in FIG. 3(g).
(8)将另一掩膜版覆盖在光刻胶7上,步骤(8)中掩膜版与步骤(1)中掩膜版的相同位置开设有三角形的标记图形,步骤(8)中掩膜版的三角形的标记图形与二氧化硅层6的三角形标记对齐,步骤(8)中掩膜版上还开有直径为10μm的圆孔,步骤(8)中圆孔与步骤(3)中圆孔的圆心重合。(8) covering another mask on the photoresist 7, in step (8), the mask is provided with a triangular mark pattern at the same position as the mask in step (1), and in step (8) The triangular mark pattern of the stencil is aligned with the triangular mark of the silicon dioxide layer 6. In step (8), a circular hole with a diameter of 10 μm is also opened on the reticle, and the circular hole in step (8) is the same as that in step (3). The centers of the circular holes coincide.
使用紫外光透过掩膜版上的圆孔对光刻胶7进行曝光,利用显影液融去中间曝光部分的光刻胶7,在光刻胶7中得到直径10μm的圆柱体槽,如图3(h)所示。Use ultraviolet light to expose the photoresist 7 through the circular hole on the mask, and use the developer to melt the photoresist 7 in the middle exposed part, and obtain a cylindrical groove with a diameter of 10 μm in the photoresist 7, as shown in the figure 3(h).
(9)利用电子束蒸发技术,在直径10μm圆柱体槽内、PDMS软膜31上和直径10μm圆柱体槽外、光刻胶7上镀一层银金属,银金属层作为金属硬膜32,厚度为400nm,如图3(i)所示。(9) Using electron beam evaporation technology, a layer of silver metal is plated on the photoresist 7 in the cylindrical groove with a diameter of 10 μm, on the PDMS soft film 31 and outside the cylindrical groove with a diameter of 10 μm, and the silver metal layer is used as the metal hard film 32, The thickness is 400 nm, as shown in Fig. 3(i).
(10)然后将整个装置倒置浸泡在丙酮溶液中,去除多余的光刻胶7以及光刻胶7上的银金属层,在二氧化硅层6上剩下PDMS软膜31和镀在其上的银金属层7,如图3(j)所示。(10) Then the whole device was immersed in acetone solution upside down, the excess photoresist 7 and the silver metal layer on the photoresist 7 were removed, and the PDMS soft film 31 was left on the silicon dioxide layer 6 and plated on it. The silver metal layer 7 is shown in Figure 3(j).
(11)使用氢氟酸溶解二氧化硅层6,制得镀层式双层敏感膜,如图3(k)所示。(11) Using hydrofluoric acid to dissolve the silicon dioxide layer 6 to prepare a plated double-layer sensitive film, as shown in FIG. 3(k).
综上所述,本发明提供了一种用于FP腔光纤压力传感器的镀层式双层敏感膜及制备方法,镀层式双层敏感膜将弹性模量较大且反射率高的金属硬膜镀在弹性模量小的软膜外表面,构成双层复合薄膜,将该薄膜作为光纤FP腔体的一个腔镜,在受压时,形变主要发生在外侧的软膜层上,处于光纤模场直径范围内的金属硬膜层形变量小,反射率高,将有效增加光束在腔内的往返次数,提高FP腔体的Q值和反射光谱锐度,从而提高传感器的灵敏度。In summary, the present invention provides a coated double-layer sensitive film for an FP cavity optical fiber pressure sensor and a preparation method. The coated double-layer sensitive film coats a metal hard film with a large elastic modulus and a high reflectivity. On the outer surface of the soft film with small elastic modulus, a double-layer composite film is formed, and the film is used as a cavity mirror of the optical fiber FP cavity. When under pressure, the deformation mainly occurs on the outer soft film layer, which is in the fiber mode field The metal hard coating layer within the diameter range has small deformation and high reflectivity, which will effectively increase the number of round trips of the beam in the cavity, improve the Q value of the FP cavity and the sharpness of the reflection spectrum, thereby improving the sensitivity of the sensor.
在不冲突的情况下,本文中上述实施例及实施例中的特征可以相互结合。The above-described embodiments and features of the embodiments herein may be combined with each other without conflict.
以上所述仅为本发明的较佳实施例,并不用以限制本发明,凡在本发明的精神和原则之内,所作的任何修改、等同替换、改进等,均应包含在本发明的保护范围之内。The above are only preferred embodiments of the present invention and are not intended to limit the present invention. Any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present invention shall be included in the protection of the present invention. within the range.
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