CN108802883A - A kind of technology of preparing of low reflection cutoff filter - Google Patents
A kind of technology of preparing of low reflection cutoff filter Download PDFInfo
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- CN108802883A CN108802883A CN201810573943.1A CN201810573943A CN108802883A CN 108802883 A CN108802883 A CN 108802883A CN 201810573943 A CN201810573943 A CN 201810573943A CN 108802883 A CN108802883 A CN 108802883A
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- Prior art keywords
- cutoff filter
- preparing
- technology
- index material
- film
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- 238000005516 engineering process Methods 0.000 title claims abstract description 22
- 239000000463 material Substances 0.000 claims abstract description 47
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 claims abstract description 20
- 229910001635 magnesium fluoride Inorganic materials 0.000 claims abstract description 20
- 238000007747 plating Methods 0.000 claims abstract description 18
- 238000002360 preparation method Methods 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 238000005566 electron beam evaporation Methods 0.000 claims abstract description 8
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 5
- 239000011777 magnesium Substances 0.000 claims abstract description 5
- 238000012545 processing Methods 0.000 claims abstract description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 8
- 239000005321 cobalt glass Substances 0.000 claims description 4
- 239000000377 silicon dioxide Substances 0.000 claims description 4
- 239000011521 glass Substances 0.000 claims description 3
- 238000000465 moulding Methods 0.000 claims description 3
- AZCUJQOIQYJWQJ-UHFFFAOYSA-N oxygen(2-) titanium(4+) trihydrate Chemical compound [O-2].[O-2].[Ti+4].O.O.O AZCUJQOIQYJWQJ-UHFFFAOYSA-N 0.000 claims description 2
- 238000002310 reflectometry Methods 0.000 abstract description 13
- 238000000576 coating method Methods 0.000 abstract description 2
- 230000000694 effects Effects 0.000 abstract description 2
- 239000012528 membrane Substances 0.000 abstract description 2
- 238000005457 optimization Methods 0.000 abstract 1
- 230000003287 optical effect Effects 0.000 description 10
- 238000001914 filtration Methods 0.000 description 4
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000007795 chemical reaction product Substances 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000006854 communication Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000000047 product Substances 0.000 description 1
- 238000000985 reflectance spectrum Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/208—Filters for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B11/00—Filters or other obturators specially adapted for photographic purposes
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Optics & Photonics (AREA)
- Optical Filters (AREA)
Abstract
Disclosed by the invention to belong to low reflection cutoff filter technical field, specially a kind of technology of preparing of low reflection cutoff filter, the specific preparation process of the technology of preparing of the low reflection cutoff filter is as follows：S1：Substrate surface plates magnesium fluoride film：Magnesium fluoride film is plated by way of electron beam evaporation plating in substrate surface, the base material after plated film, which is stood magnesium film to be fluorinated, to be molded；S2：High low-index material alternate plating：High-index material and low-index material are successively plated by way of electron beam evaporation plating on the base material after plating magnesium fluoride film in step sl；S3：Lens surface processing：The eyeglass that plated film rear surface smoothness is inadequate in step S2 is polished, this programme adjusts the coating process of cutoff filter, and optimization membrane system proportioning reaches while reducing the reflectivity under the conditions of 0 ° and 30 °, and preparation method is simple, and it is preferable to prepare product effect.
Description
Technical field
The present invention relates to low reflection cutoff filter technical field, specially a kind of low reflection cutoff filter
Technology of preparing.
Background technology
The reflectivity of visible light wave range is weigh mobile phone camera module group cutoff filter optical quality one
Important indicator, at present in industry cutoff filter visible light wave range maximum reflectivity generally in Rmax≤0.8%
(0 °) and Tmax≤1.0% (30 °).
With higher and higher in the requirement of mobile phone camera pixel at present, infrared section of one of the most key optical component
Only the reflectivity of optical filter cannot meet the needs of high-end product, for this purpose, we have proposed a kind of low reflection infrared cutoff
The technology of preparing of optical filter.
Invention content
The purpose of the present invention is to provide a kind of technologies of preparing of low reflection cutoff filter, to solve above-mentioned background
Itd is proposed in technology with higher and higher in the requirement of mobile phone camera pixel at present, one of the most key optical component it is red
The reflectivity of outer edge filter cannot meet the problem of the needs of high-end product.
To achieve the above object, the present invention provides the following technical solutions：A kind of preparation of low reflection cutoff filter
The specific preparation process of technology, the technology of preparing of the low reflection cutoff filter is as follows：
S1：Substrate surface plates magnesium fluoride film：Magnesium fluoride film is plated by way of electron beam evaporation plating in substrate surface, it will
Base material after plated film stands magnesium film molding to be fluorinated；
S2：High low-index material alternate plating：High-index material and low-index material are successively passed through into electron beam
The mode of vapor deposition is plated on the base material after plating magnesium fluoride film in step sl；
S3：Lens surface processing：Polish the eyeglass that plated film rear surface smoothness is inadequate in step S2.
Preferably, the base material in the step S1 is white glass or smalt.
Preferably, the thickness of the magnesium fluoride film in the step S1 is 20-80nm.
Preferably, plated film in the state of vacuum of the plated film in the step S2.
Preferably, silica and five oxygen is respectively adopted in the high-index material in the step S2 and low-index material
Change Tritanium/Trititanium.
Preferably, the thickness of high-index material and the thickness of low-index material are respectively 20- in the step S2
200nm、80-250nm。
Compared with prior art, the beneficial effects of the invention are as follows：This programme adjusts the coating process of cutoff filter,
Optimize membrane system proportioning, reach while reducing the reflectivity under the conditions of 0 ° and 30 °, preparation method is simple, and it is preferable to prepare product effect.
Description of the drawings
Fig. 1 is preparation technology flow chart of the present invention；
Fig. 2 is the experimental data figure of the embodiment of the present invention.
Specific implementation mode
Following will be combined with the drawings in the embodiments of the present invention, and technical solution in the embodiment of the present invention carries out clear, complete
Site preparation describes, it is clear that described embodiments are only a part of the embodiments of the present invention, instead of all the embodiments.It is based on
Embodiment in the present invention, it is obtained by those of ordinary skill in the art without making creative efforts every other
Embodiment shall fall within the protection scope of the present invention.
Referring to Fig. 1, the present invention provides a kind of technical solution：A kind of technology of preparing of low reflection cutoff filter,
The specific preparation process of the technology of preparing of the low reflection cutoff filter is as follows：
S1：Substrate surface plates magnesium fluoride film：Magnesium fluoride film is plated by way of electron beam evaporation plating in substrate surface, it will
Base material after plated film stands magnesium film molding to be fluorinated；
S2：High low-index material alternate plating：High-index material and low-index material are successively passed through into electron beam
The mode of vapor deposition is plated on the base material after plating magnesium fluoride film in step sl；
S3：Lens surface processing：Polish the eyeglass that plated film rear surface smoothness is inadequate in step S2.
Wherein, the base material in the step S1 is white glass or smalt, the magnesium fluoride film in the step S1
Thickness is 20-80nm, plated film in the state of vacuum of the plated film in the step S2, the high-index material in the step S2
It is respectively adopted silica and titanium pentoxide with low-index material, the thickness of high-index material and low in the step S2
The thickness of refraction materials is respectively 20-200nm, 80-250nm.
Embodiment
The specific preparation process of the technology of preparing of the low reflection cutoff filter is as follows：
S1：Substrate surface plates magnesium fluoride film：Magnesium fluoride is plated by way of electron beam evaporation plating in smalt substrate surface
The thickness of film, magnesium fluoride film is 50nm ± 5nm, and the base material after plated film, which is stood magnesium film to be fluorinated, to be molded；
S2：High low-index material alternate plating：High-index material silica and low-index material five are aoxidized
Successively alternately the base after magnesium fluoride film is plated in plating to Tritanium/Trititanium in step sl in the state of vacuum by way of electron beam evaporation plating
On material, the mode of alternate plating achievees the purpose that the selectivity of ultraviolet-near infrared band is penetrated and reflected, high-index material
The thickness of thickness and low-index material is respectively 110nm ± 5nm, 160nm ± 5nm, and high-index material is in magnesium fluoride film
High-index material film is formed, low-index material is thin in the surface of high-index material film formation low-index material
Film, light continuous phase in different film layer communication processes are reinforced and are offset, and ensure transmitance and reflectivity；
S3：Lens surface processing：Polish the eyeglass that plated film rear surface smoothness is inadequate in step S2.
Visible light wave range ranging from 430-720nm, the optical filter prepared by above preparation process within this range into
The result data of row light reflectivity experiment is as shown in Figure 2：
Such as visible light wave range be 410nm when：The angle of light and optical filtering is 0 °, reflectivity 0.40；Light and filter
The angle of light microscopic is 30 °, reflectivity 0.16.
Such as example visible light wave range be 581nm when：The angle of light and optical filtering is 0 °, reflectivity 0.25；Light
Angle with optical filtering is 30 °, reflectivity 0.45.
Such as visible light wave range be 716nm when：The angle of light and optical filtering is 0 °, reflectivity 0.36；Light and filter
The angle of light microscopic is 30 °, reflectivity 0.42.
It can be derived that by the broken line diagram data in Fig. 2,0 ° of reflectance spectrum can be controlled in Rmax≤0.4%, and 30 ° anti-
Penetrating spectrum can control in Rmax≤0.5%.
It although an embodiment of the present invention has been shown and described, for the ordinary skill in the art, can be with
Understanding without departing from the principles and spirit of the present invention can carry out these embodiments a variety of variations, modification, replace
And modification, the scope of the present invention is defined by the appended.
Claims (6)
1. a kind of technology of preparing of low reflection cutoff filter, it is characterised in that：The low reflection cutoff filter
The specific preparation process of technology of preparing is as follows：
S1：Substrate surface plates magnesium fluoride film：Magnesium fluoride film is plated by way of electron beam evaporation plating in substrate surface, by plated film
Base material afterwards stands magnesium film molding to be fluorinated；
S2：High low-index material alternate plating：High-index material and low-index material are successively passed through into electron beam evaporation plating
Mode plate in step sl plate magnesium fluoride film after base material on；
S3：Lens surface processing：Polish the eyeglass that plated film rear surface smoothness is inadequate in step S2.
2. a kind of technology of preparing of low reflection cutoff filter according to claim 1, it is characterised in that：The step
Base material in rapid S1 is white glass or smalt.
3. a kind of technology of preparing of low reflection cutoff filter according to claim 1, it is characterised in that：The step
The thickness of magnesium fluoride film in rapid S1 is 20-80nm.
4. a kind of technology of preparing of low reflection cutoff filter according to claim 1, it is characterised in that：The step
Suddenly plated film in the state of vacuum of the plated film in S2.
5. a kind of technology of preparing of low reflection cutoff filter according to claim 1, it is characterised in that：The step
Silica and titanium pentoxide is respectively adopted in high-index material and low-index material in rapid S2.
6. a kind of technology of preparing of low reflection cutoff filter according to claim 1, it is characterised in that：The step
The thickness of high-index material and the thickness of low-index material are respectively 20-200nm, 80-250nm in rapid S2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810573943.1A CN108802883A (en) | 2018-06-06 | 2018-06-06 | A kind of technology of preparing of low reflection cutoff filter |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201810573943.1A CN108802883A (en) | 2018-06-06 | 2018-06-06 | A kind of technology of preparing of low reflection cutoff filter |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN108802883A true CN108802883A (en) | 2018-11-13 |
Family
ID=64087340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201810573943.1A Pending CN108802883A (en) | 2018-06-06 | 2018-06-06 | A kind of technology of preparing of low reflection cutoff filter |
Country Status (1)
| Country | Link |
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| CN (1) | CN108802883A (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108761613A (en) * | 2018-08-01 | 2018-11-06 | 湖北五方光电股份有限公司 | A kind of low infrared transmittivity cutoff filter and preparation method thereof |
| CN112198581A (en) * | 2020-10-20 | 2021-01-08 | 重庆盛泰光电有限公司 | Ultralow-reflection infrared filter and manufacturing process thereof |
| CN112649912A (en) * | 2020-12-23 | 2021-04-13 | 金湖万迪光电科技有限公司 | Preparation process of blue glass infrared cut-off filter |
| CN113307506A (en) * | 2021-06-22 | 2021-08-27 | 江苏星浪光学仪器有限公司 | Novel optical filter manufacturing process for coating spin coating liquid on substrate |
| CN113589617A (en) * | 2021-06-30 | 2021-11-02 | 上海摩勤智能技术有限公司 | Filter glass cover plate and camera unit comprising same |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006117979A1 (en) * | 2005-04-12 | 2006-11-09 | Tokai Kogaku Co., Ltd. | Infrared blocking filter |
| CN201576107U (en) * | 2010-01-28 | 2010-09-08 | 青岛豪雅光电子有限公司 | Optical filter |
| CN105403942A (en) * | 2015-12-02 | 2016-03-16 | 利达光电股份有限公司 | Blue-glass infrared cutoff filter and film plating method thereof |
| CN106707376A (en) * | 2016-12-22 | 2017-05-24 | 湖北东田光电材料科技有限公司 | Optical lens film-coated film layer structure and film coating method of optical lens film-coated film layer structure |
| CN206523651U (en) * | 2017-01-11 | 2017-09-26 | 湖北五方光电科技有限公司 | A kind of low reflection smalt optical filter |
| CN206523652U (en) * | 2017-01-11 | 2017-09-26 | 湖北五方光电科技有限公司 | A kind of high-strength abrasion-proof smalt optical filter |
-
2018
- 2018-06-06 CN CN201810573943.1A patent/CN108802883A/en active Pending
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2006117979A1 (en) * | 2005-04-12 | 2006-11-09 | Tokai Kogaku Co., Ltd. | Infrared blocking filter |
| CN201576107U (en) * | 2010-01-28 | 2010-09-08 | 青岛豪雅光电子有限公司 | Optical filter |
| CN105403942A (en) * | 2015-12-02 | 2016-03-16 | 利达光电股份有限公司 | Blue-glass infrared cutoff filter and film plating method thereof |
| CN106707376A (en) * | 2016-12-22 | 2017-05-24 | 湖北东田光电材料科技有限公司 | Optical lens film-coated film layer structure and film coating method of optical lens film-coated film layer structure |
| CN206523651U (en) * | 2017-01-11 | 2017-09-26 | 湖北五方光电科技有限公司 | A kind of low reflection smalt optical filter |
| CN206523652U (en) * | 2017-01-11 | 2017-09-26 | 湖北五方光电科技有限公司 | A kind of high-strength abrasion-proof smalt optical filter |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108761613A (en) * | 2018-08-01 | 2018-11-06 | 湖北五方光电股份有限公司 | A kind of low infrared transmittivity cutoff filter and preparation method thereof |
| CN112198581A (en) * | 2020-10-20 | 2021-01-08 | 重庆盛泰光电有限公司 | Ultralow-reflection infrared filter and manufacturing process thereof |
| CN112649912A (en) * | 2020-12-23 | 2021-04-13 | 金湖万迪光电科技有限公司 | Preparation process of blue glass infrared cut-off filter |
| CN113307506A (en) * | 2021-06-22 | 2021-08-27 | 江苏星浪光学仪器有限公司 | Novel optical filter manufacturing process for coating spin coating liquid on substrate |
| CN113589617A (en) * | 2021-06-30 | 2021-11-02 | 上海摩勤智能技术有限公司 | Filter glass cover plate and camera unit comprising same |
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| PB01 | Publication | ||
| PB01 | Publication | ||
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| SE01 | Entry into force of request for substantive examination | ||
| RJ01 | Rejection of invention patent application after publication |
Application publication date: 20181113 |
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| RJ01 | Rejection of invention patent application after publication |