CN108152358A - Plasma-mass spectrometry system and its method of work - Google Patents
Plasma-mass spectrometry system and its method of work Download PDFInfo
- Publication number
- CN108152358A CN108152358A CN201711490627.XA CN201711490627A CN108152358A CN 108152358 A CN108152358 A CN 108152358A CN 201711490627 A CN201711490627 A CN 201711490627A CN 108152358 A CN108152358 A CN 108152358A
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- valve
- ion
- plasma
- mass spectrometry
- sampling cone
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- 238000000918 plasma mass spectrometry Methods 0.000 title claims abstract description 25
- 238000000034 method Methods 0.000 title claims abstract description 12
- 238000005070 sampling Methods 0.000 claims abstract description 26
- 239000002245 particle Substances 0.000 claims abstract description 14
- 230000007935 neutral effect Effects 0.000 claims description 7
- 230000005684 electric field Effects 0.000 claims description 3
- 238000004949 mass spectrometry Methods 0.000 claims description 2
- 238000004458 analytical method Methods 0.000 abstract description 6
- 238000001514 detection method Methods 0.000 abstract 1
- 150000002500 ions Chemical class 0.000 description 33
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 238000001816 cooling Methods 0.000 description 4
- 239000000112 cooling gas Substances 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007717 exclusion Effects 0.000 description 1
- 230000004438 eyesight Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000002028 premature Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
- G01N27/622—Ion mobility spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N27/00—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means
- G01N27/62—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode
- G01N27/64—Investigating or analysing materials by the use of electric, electrochemical, or magnetic means by investigating the ionisation of gases, e.g. aerosols; by investigating electric discharges, e.g. emission of cathode using wave or particle radiation to ionise a gas, e.g. in an ionisation chamber
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/04—Arrangements for introducing or extracting samples to be analysed, e.g. vacuum locks; Arrangements for external adjustment of electron- or ion-optical components
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/10—Ion sources; Ion guns
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- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- Immunology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Physics & Mathematics (AREA)
- Pathology (AREA)
- Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
The present invention provides a kind of Plasma Mass Spectrometry analysis system and its method of work, the Plasma Mass Spectrometry analysis system includes mass spectrometer, vacuum unit；Quarter bend, the outlet of the quarter bend is straight up；Sampling cone, the sampling cone are arranged on the ion exit direction of the quarter bend；First valve, first valve are arranged on the ion exit direction, and the downstream in the sampling cone；Ion deflecting unit, the particle deflection unit are arranged on ion exit direction, and the downstream in the first valve, after the ion deflecting unit, ion deflecting angle α；Second valve, second valve are arranged on the ion direction after ion deflecting unit deflection.The present invention has many advantages, such as that accuracy of detection is high.
Description
Technical field
The present invention relates to mass spectral analyses, more particularly to plasma-mass spectrometry system and its method of work.
Background technology
When ICP-MS is analyzed, torch pipe is goed deep into plasma intercepting wherein all using horizontal positioned using sampling cone
Ion enter mass spectrograph carry out quality analysis.Because plasma power is very high, need using water cooling sampling cone and
The air cooling system plasma of big flow exhausting, sampling cone heat dissipation not only need the cooling gas (argon gas) of very big flow in this way
Torch pipe is protected, in order to avoid burning torch pipe, in addition the air cooling system of big flow inevitably blows plasma, causes
Sample intake passage inside plasma can be influenced to generate disturbance by wind, and analysis result is caused to generate unnecessary fluctuation.
In addition the interception cone being deep into plasma is also influenced by plasma high-temperature, with the change of heating time
Change, the collected number of ions of ICP-MS is caused to gradually change, reflect that in performance together be exactly that signal gradually deviates, stability is not
It is good.
Simultaneously as horizontal positioned torch pipe, by thermodynamic (al) normal effects, the upper space of torch pipe is that temperature is higher naturally,
Lower space temperature is relatively low, and plasma is unevenly distributed, Temperature Distribution is also uneven, is easy to cause torch pipe upper space and more holds
Easily burn.
Invention content
In order to solve the deficiency in above-mentioned prior art, the present invention provides it is a kind of exclusion neutral ion influence, from
Sub- efficiency of transmission is high, stabilization time is short, analytical precision is high, plasma-mass spectrometry system of good reliability.
A kind of plasma-mass spectrometry system, the plasma-mass spectrometry system include mass spectrometer, true
Dummy cell；Plasma-the mass spectrometry system further comprises：
Quarter bend, the outlet of the quarter bend is straight up；
Sampling cone, the sampling cone are arranged on the ion exit direction of the quarter bend；
First valve, first valve are arranged on the ion exit direction, and the downstream in the sampling cone；
Ion deflecting unit, the particle deflection unit are arranged on ion exit direction, and under the first valve
Trip, after the ion deflecting unit, ion deflecting angle α；
Second valve, second valve are arranged on the ion direction after ion deflecting unit deflection.
According to above-mentioned plasma-mass spectrometry system, it is preferable that first valve and/or the second valve use
Slide-valve.
According to above-mentioned plasma-mass spectrometry system, optionally, what the sampling cone included setting gradually first takes
Sample is bored and the second sampling cone.
According to above-mentioned plasma-mass spectrometry system, it is preferable that angle
According to above-mentioned plasma-mass spectrometry system, it is preferable that the ion deflecting unit uses deflecting electric field.
The present invention also aims to provide the method for work according to above-mentioned plasma-mass spectrometry system, the hair
Improving eyesight is achieved by the following technical programs：
According to the method for work of above-mentioned plasma-mass spectrometry system, the method for work is：
(A1) after the optically focused lights plasma and is moved to setting position, first valve is opened；
Ion and neutral particle are emitted from the quarter bend and move straight up, sequentially pass through the sampling cone and the first valve
Enter the particle deflection unit behind the door, ion deflects in the ion deflecting unit, and the neutral particle is according to original
The direction of motion continues up；
(A2) after ion interface vacuum reaches setting, then second valve is opened；
Ion after deflection passes through second valve, into downstream；
(A3) quarter bend is closed, and first valve and the second valve are closed.
Compared with prior art, the device have the advantages that being：
1. compared to traditional off-axis deflection, 90 degree can completely eliminate central particles interference, and ion transmits off axis
More efficient, ion transmission efficiency can be greatly improved in the suitable ion-optic system of space layout of turning at 90 degree；
2. plasma design meets the characteristics of hot gas automatic uplink, heat automatic plasma body upper space, for
Torch pipe is integrally uniform, and the concentration of temperature will not be locally caused in torch pipe, leads to torch pipe premature breakdown, improves service life；
3. the temperature in vertical plasma torch pipe will be lower, more saved for cooling gas consumption；Conventional
The consumption of cooling gas can be reduced to 10L/min hereinafter, reducing by 1/3rd argon gas consumption；
4. the heat of vertical torch pipe is directly taken away by the water cooling interface of top, equipment heat source is more concentrated, and being conducive to concentration will
Heat is drained, and will not cause to generate Wen Sheng inside complete machine；
5. the plasma placed vertically integrally excites more symmetrically, plasma is more stablized relative to laterally disposed,
Be conducive to improve Instrumental Analysis precision；
It 6. two-stage valve such as slide-valve designs, can preferably ensure the vacuum of ion-optic system, safeguard and adjusting
System vacuum can not be influenced when ion-optical interface, reduces vacuum settling time, lowering apparatus stabilization time.
Description of the drawings
With reference to attached drawing, the disclosure will be easier to understand.Skilled addressee readily understands that be：This
A little attached drawings are used only for the technical solution illustrated the present invention, and are not intended to and protection scope of the present invention is construed as limiting.
In figure：
Fig. 1 is the structure diagram of plasma-mass spectrometry system according to embodiments of the present invention.
Specific embodiment
Fig. 1 and following description describe the present invention optional embodiment with instruct those skilled in the art how to implement and
Reproduce the present invention.In order to instruct technical solution of the present invention, simplified or some conventional aspects be omitted.Those skilled in the art should
The understanding is originated from the modification of these embodiments or replacement will within the scope of the invention.Under those skilled in the art should understand that
Stating feature can combine to form multiple modifications of the invention in various ways.The invention is not limited in following optional as a result,
Embodiment, and be only limited by the claims and their equivalents.
Embodiment：
Fig. 1 schematically illustrates the structure diagram of plasma-mass spectrometry system of the embodiment of the present invention, such as Fig. 1
Shown, the plasma-mass spectrometry system includes：
Mass spectrometer, vacuum unit；These are all the state of the art, and concrete structure and working method are herein not
It repeats again；
Quarter bend, the outlet of the quarter bend is straight up；
Sampling cone, the sampling cone are arranged on the ion exit direction of the quarter bend；The sampling cone includes setting successively
The first sampling cone and the second sampling cone put；
First valve, such as slide-valve, first valve are arranged on the ion exit direction, and in the sampling
The downstream of cone；
Ion deflecting unit, such as ion deflecting electric field, the particle deflection unit is arranged on ion exit direction, and is located
In the downstream of the first valve, after the ion deflecting unit, ion deflecting angle α, such as angle
Second valve, such as slide-valve, second valve are arranged on the ion after ion deflecting unit deflection
On direction.
According to the method for work of above-mentioned plasma-mass spectrometry system, the method for work is：
(A1) after the optically focused lights plasma and is moved to setting position, first valve is opened；
Ion and neutral particle are emitted from the quarter bend and move straight up, sequentially pass through the sampling cone and the first valve
Enter the particle deflection unit behind the door, ion deflects in the ion deflecting unit, and the neutral particle is according to original
The direction of motion continues up；
(A2) after ion interface vacuum reaches setting, then second valve is opened；
Ion after deflection passes through second valve, into downstream；
(A3) quarter bend is closed, and first valve and the second valve are closed.
Claims (6)
1. a kind of plasma-mass spectrometry system, the plasma-mass spectrometry system includes mass spectrometer；It is special
Sign is：Plasma-the mass spectrometry system further comprises：
Quarter bend, the outlet of the quarter bend is straight up；
Sampling cone, the sampling cone are arranged on the ion exit direction of the quarter bend；
First valve, first valve are arranged on the ion exit direction, and the downstream in the sampling cone；
Ion deflecting unit, the particle deflection unit are arranged on ion exit direction, and the downstream in the first valve, warp
After crossing the ion deflecting unit, ion deflecting angle α；
Second valve, second valve are arranged on the ion direction after ion deflecting unit deflection.
2. plasma-mass spectrometry system according to claim 1, it is characterised in that：First valve and/or
Two valves use slide-valve.
3. plasma-mass spectrometry system according to claim 1, it is characterised in that：The sampling cone is included successively
The first sampling cone and the second sampling cone of setting.
4. plasma-mass spectrometry system according to claim 1, it is characterised in that：Angle
5. plasma-mass spectrometry system according to claim 1, it is characterised in that：The ion deflecting unit is adopted
Use deflecting electric field.
6. according to the method for work of any plasma-mass spectrometry systems of claim 1-5, the method for work
For：
(A1) after the optically focused lights plasma and is moved to setting position, first valve is opened；
Ion and neutral particle are emitted from the quarter bend and move straight up, after sequentially passing through the sampling cone and the first valve
Into the particle deflection unit, ion deflects in the ion deflecting unit, and the neutral particle is moved according to original
Direction continues up；
(A2) after ion interface vacuum reaches setting, then second valve is opened；
Ion after deflection passes through second valve, into downstream；
(A3) quarter bend is closed, and first valve and the second valve are closed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711490627.XA CN108152358B (en) | 2017-12-30 | 2017-12-30 | Plasma-mass spectrometry system and working method thereof |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201711490627.XA CN108152358B (en) | 2017-12-30 | 2017-12-30 | Plasma-mass spectrometry system and working method thereof |
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| Publication Number | Publication Date |
|---|---|
| CN108152358A true CN108152358A (en) | 2018-06-12 |
| CN108152358B CN108152358B (en) | 2024-02-02 |
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|---|---|---|---|
| CN201711490627.XA Active CN108152358B (en) | 2017-12-30 | 2017-12-30 | Plasma-mass spectrometry system and working method thereof |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112241132A (en) * | 2020-09-20 | 2021-01-19 | 杭州谱育科技发展有限公司 | Control device and method for scanning speed of quadrupole mass spectrometer |
| CN112750677A (en) * | 2020-12-31 | 2021-05-04 | 杭州谱育科技发展有限公司 | Inductively coupled plasma mass spectrometer with particle elimination function |
| CN112750678A (en) * | 2020-12-31 | 2021-05-04 | 杭州谱育科技发展有限公司 | Inductive coupling plasma mass spectrometer based on torch tube verticality and working method thereof |
| CN112863997A (en) * | 2020-12-31 | 2021-05-28 | 杭州谱育科技发展有限公司 | ICP-MS with particle elimination function |
| CN113488371A (en) * | 2020-12-31 | 2021-10-08 | 杭州谱育科技发展有限公司 | Ion interface device and plasma-mass spectrometry system |
| WO2022104448A1 (en) * | 2020-11-18 | 2022-05-27 | Kimia Analytics Inc. | Air-cooled interface for inductively coupled plasma mass spectrometer (icp-ms) |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN112241132A (en) * | 2020-09-20 | 2021-01-19 | 杭州谱育科技发展有限公司 | Control device and method for scanning speed of quadrupole mass spectrometer |
| WO2022104448A1 (en) * | 2020-11-18 | 2022-05-27 | Kimia Analytics Inc. | Air-cooled interface for inductively coupled plasma mass spectrometer (icp-ms) |
| CN112750677A (en) * | 2020-12-31 | 2021-05-04 | 杭州谱育科技发展有限公司 | Inductively coupled plasma mass spectrometer with particle elimination function |
| CN112750678A (en) * | 2020-12-31 | 2021-05-04 | 杭州谱育科技发展有限公司 | Inductive coupling plasma mass spectrometer based on torch tube verticality and working method thereof |
| CN112863997A (en) * | 2020-12-31 | 2021-05-28 | 杭州谱育科技发展有限公司 | ICP-MS with particle elimination function |
| CN113488371A (en) * | 2020-12-31 | 2021-10-08 | 杭州谱育科技发展有限公司 | Ion interface device and plasma-mass spectrometry system |
| CN112863997B (en) * | 2020-12-31 | 2024-06-11 | 杭州谱育科技发展有限公司 | ICP-MS with particle elimination function |
| CN112750678B (en) * | 2020-12-31 | 2025-03-21 | 杭州谱育科技发展有限公司 | Inductively coupled plasma mass spectrometer based on vertical torch and working method thereof |
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