CN107817654B - Vacuum surface plasma photoetching device - Google Patents

Abstract

The invention discloses a vacuum surface plasma lithography device, comprising three systems consisting of a vacuum generating unit, a vacuum chamber and a vacuum manipulator. The vacuum chamber is a photolithography area, and a vacuum cylinder limits the Z-direction displacement of a mask frame; The vacuum tank on the film table is adsorbed by negative pressure to improve the bonding degree between the substrate and the reticle; the alignment optical path cooperates with the reticle and the film support table to complete the alignment of the substrate; and then the mark is imaged on the high-definition CCD image detector through the objective lens. The fiber probe detects the three-point gap value between the reticle and the substrate, and feeds back the signal; the three-point piezoelectric linear motor is equipped with a grating ruler closed-loop to realize the leveling loop; the three-point micro linear motor moves up and down for the substrate pick and place; the rotating copper The material of the table is brass, and the elastic deformation is rotated at a small angle to complete the automatic recovery. Three-point free ball support to prevent deformation of the copper table. The device can greatly reduce lithography pattern defects caused by the existence of particles and air in the environment, and improve lithography resolution and exposure repeatability.

Description

Vacuum surface plasma photoetching device

Technical Field

The invention relates to the technical field of surface plasma photoetching equipment, in particular to a vacuum surface plasma photoetching device.

Background

The resolution of the traditional optical lithography technology can only reach lambda/2 due to the limit of diffraction. The imaging method is characterized in that evanescent wave components carrying object sub-wavelength information are exponentially attenuated along with propagation distance and cannot be propagated to a far field to participate in imaging. In recent years, the emergence of SP optics has brought a new opportunity for optical lithography that breaks through the diffraction limit. By utilizing the short wavelength characteristic of SP and the enhancement characteristic of evanescent wave, the photoetching result exceeding the diffraction limit can be realized. And develops into a nano-pattern processing means with high resolution and low cost. However, the existing surface plasma lithography apparatus has shortcomings in resolution, pattern quality, repeatability, and the like due to the limitations of the scattering loss of the super-diffraction material and the attenuation problem of the sub-wavelength structure information in the lithography medium.

Disclosure of Invention

In order to reduce the defects of photoetching patterns caused by the existence of particles and air in the environment and improve photoetching resolution and exposure repeatability, the invention aims to provide a vacuum surface plasma photoetching device, which exposes a part of the whole vacuum environment and completes leveling and alignment by utilizing a vacuum piezoelectric ceramic motor and the rotation of a copper table.

In order to achieve the purpose, the invention adopts the following technical scheme:

a vacuum surface plasma photoetching device comprises a vibration isolator, a marble optical platform, a vacuum cylinder, a CF150 vacuum flange, a CF150 inner welding flange, a vacuum cylinder fixing block, a steel ball joint, a universal groove, a vacuum linear electric cylinder, a clamping device, a CF50 vacuum flange, a vacuum cavity, a lifting lug, a linear motor adapter, a vacuum tubular linear servo motor, an alignment light path mounting plate, a vacuum cavity reinforcing rib, a CF150 vacuum observation window, quartz, a vacuum linear guide rail, a triangular prism clamp, a triangular prism, a vacuum micro linear motor, a vacuum LED light source, an optical lens cavity, a micro linear motor, an objective lens, an optical fiber probe, a CCD lens, a non-drive guide shaft, a mask frame, a V-shaped notch, a bearing platform, a tension spring fixing seat, a substrate air pipe passage, Teflon, a mask clamp, a mask plate, a wire passing cylinder, a micro piezoelectric linear motor, The piezoelectric motor mounting seat, the miniature linear guide rail, the piezoelectric linear motor, the hinge, the rectangular blind plate, the steel ball, the rotary copper platform, the three-point supporting plate, the adapter plate and the X-Y motion platform, the vibration isolator is arranged on the bottom surface, the marble optical platform is arranged on the vibration isolator, the whole equipment can be isolated from the outside as much as possible under the action of the vibration isolator, the vacuum cavity is arranged on the marble optical platform through foot supports welded at the bottom, a CF150 vacuum flange, a CF inner welding flange and a CF50 vacuum flange are arranged on the outer side wall of the vacuum cavity, signal communication between a vacuum part and the outside can be realized through flange connection, observation of a vacuum environment is facilitated through arranging an observation window, the top of the vacuum cavity is provided with a CF150 vacuum observation window which is worn by quartz glass, and the light source of the equipment can effectively realize light source exposure through the observation window, the four lifting lugs at the top of the vacuum cavity can facilitate the transportation of equipment, meanwhile, the upper top surface of the vacuum cavity is in flange connection, the lifting lugs can facilitate the debugging and fault maintenance of the device, and the clamp is arranged behind the vacuum cavity and is matched with a hinge for use, so that the opening and closing of a cavity door of the vacuum cavity are realized; the vacuum cylinders are arranged on the inner side wall of the vacuum cavity and are connected with each other through vacuum cylinder fixing blocks, the three cylinders are distributed below the mask frame during working, the mask frame is tightly pressed upwards through the head ball heads, and the mask frame is locked to move in the Z direction; the vacuum linear electric cylinder is installed on a beam of a vacuum cavity through screw connection, the mask frame is stably installed on the other side of the vacuum cavity through a matched non-driving guide shaft, the distance displacement of the mask frame which is larger than 1000mm is achieved, vacuum parts taking are convenient, a pair of vacuum linear guide rails are installed on the vacuum beam, an alignment light path installing plate is supported, a stator of a vacuum tubular linear servo motor is installed on the inner wall of the vacuum cavity through switching of a linear motor, a rotor is connected to the alignment light path installing plate through an installing clamping piece, the whole alignment light path can be driven to be adjusted in the Y direction of an alignment objective lens through front and back movement of the rotor, a triangular prism is installed in a triangular prism clamp to be aligned and then bonded, the visual field of the objective lens can be imaged into a CCD lens, and then fed back to a visual port, the vacuum miniature linear, The objective lens integrally generates X, Z-direction movement to realize adjustable alignment design, an optical fiber probe is installed on an impinging light path installation plate through a miniature direct current motor, the vertical displacement of an optical fiber is realized through Z-direction displacement of a motor, three-point distance measurement on a wafer bearing table can be realized, a three-point grating ruler resets to 0 point after data feedback, a piezoelectric linear motor rises to jack up the whole wafer bearing table, a tension spring and a tension spring fixing seat integrally move in the Z direction, the step number is completed through a displacement signal obtained by the three-point piezoelectric linear motor, the three-point grating ruler completes closing control in cooperation with the motor to realize leveling of the wafer bearing table, a mask plate is installed on a mask frame through a mask clamp, the mask plate is jacked up by using screws in the XY direction, and is fixed on the mask clamp by adopting vacuum; the rotary copper platform is connected with the three-point supporting plate through a central flange and is connected with the three-point supporting position, the three-point supporting is completed by adopting a steel ball, the X-Y motion platform and the whole wafer bearing platform can be connected by the adapter plate, after exposure is completed, the rectangular blind plate is opened, the vacuum three-axis mechanical arm extends into the center of the wafer bearing platform, the substrate is jacked up by matching with Z-direction motion of the miniature piezoelectric linear motor, the vacuum three-axis mechanical arm completes taking of the substrate, and the substrate is placed in the wafer loading box capable of realizing Z-direction motion by returning of the mechanical arm.

The three-point vacuum cavity is used for fixing the Z-direction displacement of the mask frame in the vacuum cavity, the vacuum cylinder is in contact with the mask frame in an outward ball head mode, the vacuum cavity is prevented from radially deflecting, and meanwhile the three-point ball heads of the cylinder can be guaranteed to be located on the same plane.

The alignment light path mounting plate is mounted on the vacuum cavity through a vacuum linear guide rail, and can work with the LED light path in a clearance mode through moving back and forth to achieve leveling and exposure.

The vacuum tubular linear servo motor is used for driving the whole alignment light path to reciprocate, is small in size and is suitable for a vacuum environment.

The three-point 120-degree distribution leveling wafer bearing table is adopted, the piezoelectric linear motor is used for jacking the wafer bearing table, the minimum stepping amount is less than or equal to 1nm, the top of the wafer bearing table is connected by a steel ball, and the wafer bearing table is closed-loop controlled by beryllium bronze and a grating ruler.

The three-point miniature piezoelectric linear motor is used for lifting and lowering the substrate, and the three-point miniature piezoelectric linear motor is matched with the three-axis mechanical arm to stretch into the rectangular opening at the position of the rectangular blind plate to finish the taking and placing of the substrate.

The long-stroke vacuum linear electric cylinder is used, the total length of the long-stroke vacuum linear electric cylinder is 1400mm, the stroke is 1000mm, the bearing capacity is 100kg, the long-stroke vacuum linear electric cylinder is suitable for a vacuum environment, the use method needs to ensure that the integral moving speed cannot be too high, a single vacuum stepping motor and a vacuum reducer are assembled to finish the movement of the mask frame, the other side of the long-stroke vacuum linear electric cylinder adopts a non-driving guide shaft to realize bilateral bearing, and the phenomenon that the stepping motor loses steps, steps are crossed and the like.

The content of the objective lens is subjected to feedback monitoring by adopting two CCD lenses with 400 ten thousand high-definition pixels, and the CCD lenses can be normally used in a vacuum environment.

The X-Y displacement of the mask is fixed on the mask clamp by screws, the mask protrudes out of the mask clamp by 0.5-1 mm to ensure the mask to be attached to a substrate, the mask clamp is mounted on the mask frame in a screw mode, a gap is reserved around the mask to attach Teflon, and abrasion and mechanical vibration of the mask clamp are reduced.

The three-point tension spring resets the wafer bearing platform after the piezoelectric linear motor contracts, so that the problem that the piezoelectric linear motor has no tensile force is solved;

a vacuum X-Y motion platform is adopted and is built by three single-shaft motion platforms, the single motion platform bears 100kG, a grating ruler is configured for the walking precision, and the walking precision of the wafer bearing platform is improved;

the rotary copper platform of the sheet bearing platform is made of a whole block of brass, is designed in a three-layer isolation mode, is coupled by a copper sheet structure, supports the center by three free balls, is connected with a flange, and is driven by a piezoelectric motor to rotate around the axis to drive the sheet bearing platform to generate displacement.

Compared with the prior art, the invention has the advantages that:

(1) the invention adopts the piezoelectric motor with high precision and realizes the small-angle rotation self-recovery design by matching with the high rigidity characteristic of the optional copper platform.

(2) The invention adopts the miniature piezoelectric linear motor to move the top substrate in the Z direction, and completes vacuum pickup by matching with a mechanical arm and a gate valve, thereby realizing vacuum pickup while ensuring the vacuum degree.

(3) The invention adopts an optical fiber distance measurement feedback signal and is matched with a grating ruler of a piezoelectric linear motor device to realize a leveling closed loop.

Drawings

FIG. 1 is a schematic view of a partial structure of a vacuum chamber according to the present invention.

FIG. 2 is a schematic diagram of a partial structure of the vacuum chamber according to the present invention.

FIG. 3 is a schematic view of a rotary copper stage.

In fig. 1: 1-a vibration isolator; 2-a marble optical bench; 3-a vacuum cylinder; 9-vacuum linear electric cylinder; 12-vacuum chamber; 15-vacuum tubular linear servo motor; 31-mask holder; 33-a wafer stage; 41-a miniature linear motor; 44-piezoelectric linear motors; 48-rotating the copper table; 54-aligning the optical path; 55-a light source; a 51-x-y motion stage; 52-vacuum pump cavity interface; 53-universal ball; 56-free ball head support; 57-vacuum three-axis robotic arm; 58-piezoelectric motor.

In fig. 2: 1-a vibration isolator; 2-a marble optical bench; 3-a vacuum cylinder; 4-CF150 vacuum flange; 5-CF150 inner welding flange; 6-vacuum cylinder fixing block; 7-steel ball joint; 8-universal slot; 9-vacuum linear electric cylinder; 10-a gripper; 11-CF50 vacuum flange; 12-vacuum chamber; 13-lifting lugs; 14-switching of a linear motor; 15-vacuum tubular linear servo motor; 16-aligning the light path mounting plate; 17-vacuum cavity reinforcing ribs; 18-CF150 vacuum viewing window; 19-quartz 20-vacuum linear guide; 21-a triangular prism clamp; 22-triangular prism; 23-vacuum micro linear motor; 24-vacuum LED light source; 25-an optic cavity; 26-a miniature direct current motor; 27-an objective lens; 28-a fiber optic probe; 29-CCD lens; 30-no drive guide shaft; 31-mask holder; a 32-V notch; 33-a wafer stage; 34-an extension spring; 35-extension spring fixing seat; 36-substrate gas line path; 37-teflon; 38-mask holder; 39-mask plate; 40-a wire passing cylinder; 41-a miniature linear motor; 42-piezoelectric motor mount; 43-a miniature linear guide; 44-piezoelectric linear motors; 45-hinge; 46-rectangular blind plate; 47-steel ball; 48-rotating the copper table; 49-three point support plate; 50-a copper table; a 51-X-Y motion stage.

In fig. 3: 48-rotating the copper table; 59-piezoelectric motor mounting plate; 60-a piezoelectric motor; 61-a mounting plate; 62-a flange; 63-steel ball limit ring; 64-a sealing flange; 65-supporting the steel ball.

Detailed Description

The invention is further illustrated by the following examples in conjunction with the accompanying drawings. The scope of the invention is not limited to the following examples, but is intended to include the full scope of the claims.

As shown in figure 1, the vacuum surface plasma photoetching device comprises a vibration isolator 1, a marble optical platform 2, a vacuum cylinder 3, a CF150 vacuum flange 4, a CF150 inner welding flange 5, a vacuum cylinder fixing block 6, a steel ball joint 7, a universal groove 8, a vacuum linear electric cylinder 9, a clamper 10, a CF50 vacuum flange 11, a vacuum cavity 12, a lifting lug 13, a linear motor adapter 14, a vacuum tubular linear servo motor 15, an alignment light path mounting plate 16, a vacuum cavity reinforcing rib 17, a CF150 vacuum observation window 18, quartz 19, a vacuum linear guide rail 20, a triangular prism clamp 21, a triangular prism 22, a vacuum miniature linear motor 23, a vacuum LED light source 24, an optical mirror cavity 25, a miniature direct current motor 26, an objective lens 27, an optical fiber probe 28, a CCD lens 29, a non-driving guide shaft 30, a mask frame 31, a V-shaped groove 32, a bearing platform 33, a tension spring 34, a tension spring fixing seat 35, The device comprises a substrate air pipe passage 36, Teflon 37, a mask clamp 38, a mask plate 39, a wire passing cylinder 40, a micro linear motor 41, a piezoelectric motor mounting seat 42, a micro linear guide rail 43, a piezoelectric linear motor 44, a hinge 45, a rectangular blind plate 46, a steel ball 47, a rotary copper table 48, a three-point supporting plate 49, an adapter plate 50, an X-Y motion table 51, an electrical element and vacuum unit, a rectangular door valve and a three-axis vacuum mechanical arm, a main board circuit and a control module. The vibration isolator 1 is placed on the bottom surface, the marble optical platform 2 is placed on the vibration isolator 1, the whole equipment can be isolated from the outside as much as possible under the action of the vibration isolator 1, the vacuum cavity 12 is placed on the marble optical platform 2 through feet welded at the bottom, a CF150 vacuum flange 4 and a CF inner welding flange 5CF50 vacuum flange 11 are installed on the outer side wall of the vacuum cavity 12, signal communication between vacuum parts and the outside can be realized through flange connection, observation of a vacuum environment can be facilitated through arranging an observation window, quartz 19 glass is worn on a CF150 vacuum observation window 18 arranged at the top of the vacuum cavity 12, the light source of the equipment can effectively realize the light source exposure effect through the observation window, four lifting lugs 13 at the top of the vacuum cavity 12 can facilitate the transportation of the equipment, meanwhile, the upper top surface of the vacuum cavity 12 is in flange connection, and the arrangement of the lifting lugs 13 can also facilitate the debugging and fault maintenance of the device, the clamp 10 is installed at the back of the vacuum chamber 12 and is used with the hinge 45 to realize the opening and closing of the chamber door of the vacuum chamber 12. The vacuum cylinder 3 is installed on the inner side wall of the vacuum cavity 12, the vacuum cylinder fixing block 6 is used for completing switching, the three cylinders are distributed below the mask frame 31 during working, the mask frame 31 is tightly jacked upwards through the head ball head, and the mask frame is locked to move in the Z direction. The vacuum linear electric cylinder 9 is installed on a beam of the vacuum cavity 12 through screw connection, the mask frame 31 is stably installed on the other side of the vacuum cavity by using a matched non-driven guide shaft 30, the distance displacement of the mask frame 31 which is larger than 1000mm is realized, the vacuum piece taking is convenient, a pair of vacuum linear guide rails 20 are installed on the vacuum beam, an alignment light path installing plate 16 is lifted up, a stator of a vacuum tubular linear servo motor 15 is installed on the inner wall of the vacuum cavity 12 through a linear motor switching 14, a rotor is connected on the alignment light path installing plate 16 through an installing clamping piece, the whole alignment light path can be driven to move forwards and backwards through the front and back movement of the rotor to realize the Y-direction adjustment of an alignment objective lens 27, a triangular prism 22 is installed in a triangular prism clamp 21 to be aligned and then bonded, the visual field of the objective lens can be imaged into a CCD lens, The micro linear motor 26 of the optical lens cavity 25 and the objective lens 27 integrally generate X, Z-direction movement to realize adjustable alignment design, the optical fiber probe 28 is arranged on the clash light path mounting plate 16 through the micro direct current motor 26, the vertical displacement of the optical fiber is realized through the Z-direction walking of the motor, three-point distance measurement on the wafer bearing table 33 can be realized, the three-point grating ruler is reset to 0 position after data feedback, the piezoelectric linear motor 44 rises to push up the whole wafer bearing table 33, the extension spring 34 and the extension spring fixing seat 35 move in the Z direction integrally, the walking signals obtained by the three-point piezoelectric linear motor 44 are used for completing the step number, the three-point grating ruler is matched with the motor to complete closing control, the leveling of the wafer bearing table is realized, the mask plate 39 is installed on the mask frame 31 through the mask clamp 38, the mask plate 39 is pushed by screws in the XY direction, and is fixed on the mask clamp 38 in the Z direction by vacuum suction. The rotary copper platform 48 is connected with a three-point supporting plate 49 through a central flange connection and a three-point supporting position, the three-point supporting is completed by adopting a steel ball 47, and the X-Y moving platform 51 can be connected with the whole wafer bearing platform part through an adapter plate 50. After exposure is completed, the rectangular blind plate 46 is opened, the vacuum three-axis mechanical arm 57 extends into the center of the wafer bearing table 33 and is matched with the miniature piezoelectric linear motor 41 to move in the Z direction to jack up the substrate, the vacuum three-axis mechanical arm 57 completes taking of the substrate, and the mechanical arm returns to place the substrate in a wafer loading box capable of realizing Z-direction movement.

The vacuum machine set is matched with a vacuum gauge and a butterfly valve to ensure the vacuum degree in the vacuum cavity 12, the alignment light path 54 is controlled by a vacuum tubular linear servo motor 15 to move to the middle of a wafer bearing table 33, meanwhile, a mask frame 31 is moved to the middle of the wafer bearing table 33 through a vacuum linear electric cylinder 9, a fiber probe 28 arranged on the alignment light path 54 is used for detecting feedback data of a mask, a signal is sent to a three-point vacuum linear motor 44, the walking steps are respectively counted by a three-point grating ruler, and the leveling and alignment of the mask 39 are completed by closed-loop control. The part of the alignment light path 54 moves to avoid the illumination system, the vacuum cylinder 3 is jacked to fix the mask plate 39, the piezoelectric linear motor moves in a closed loop for the same distance, the universal beryllium bronze ball head is contacted with the bearing table 33 at the upper part to move upwards to attach the substrate to the mask plate 39, and the illumination system acts to complete exposure. After exposure is finished, the substrate is jacked up by the miniature linear motor 41, the rectangular gate valve is opened, the vacuum mechanical arm extends in to finish the operation of taking and placing the part, the mask frame 31 is moved to the other end of the equipment by the vacuum linear electric cylinder 9, and the mask plate 39 is taken and replaced by the openable vacuum gate to finish an exposure process.

The wafer bearing platform part feeds back signals through the optical fiber probe, the three-point piezoelectric linear motor moves upwards, the walking information is fed back by the three-point grating ruler, the numerical values of the three-point grating ruler are the same or fluctuate within an allowable range, namely the wafer bearing platform part is still in a leveling state, the three-point linear guide rail can package the piezoelectric linear motor and is free from radial force, the beryllium bronze universal ball head is pressed at the upper part of the wafer bearing platform part, and the beryllium bronze universal ball head is kept

The wafer bearing platform has no deflection. Rotation of the wafer bearing table: the central flange of the copper platform is fixed, three stainless steel balls freely limit the Z-direction displacement of the copper platform, the piezoelectric motor is adopted to push the inner copper platform to be selectively installed, the whole copper platform is guided to rotate by a size less than or equal to 5 degrees by taking the center as an axis, and the calculated deformation is less than the allowable deformation.

The vacuum surface plasma photoetching device is realized by the following steps:

firstly, the vibration isolator 1 and a marble 2 optical platform level and isolate vibration to the whole vacuum cavity 12, a vacuum machine group supplies air to the vacuum cavity 12, a vacuum gauge and a butterfly valve are utilized to realize stable control to the vacuum degree of the vacuum cavity 12, a vacuum linear electric cylinder 9 moves to move, the center of a mask plate 39 is moved to the center of a CF150 vacuum observation window 18 above the vacuum cavity 12 to coincide, the vacuum cylinder 3 acts to fix the mask plate 39 in the z direction, an X-Y motion table 51 drives the whole wafer bearing table part to move to be aligned with the center of a wafer bearing table 33, a vacuum tubular linear servo motor 15 is controlled to drive an alignment light path 54 part, a CCD lens 29 is matched with an objective lens 27 to image to complete the alignment process, the distance between the three-point optical fiber probe 28 and a substrate is monitored, a piezoelectric linear motor 44 is controlled to move upwards after data feedback analysis, a ball head contacts the wafer bearing table 33, the leveling closed-loop control of the piezoelectric linear motor 44 is realized, and after the substrate is contacted with the mask plate 39, the butterfly valve is controlled to open the suction pipe of the substrate, so that the vacuum groove of the substrate bearing table 33 is under negative pressure, and the adhesion force of the substrate mask plate 39 is enhanced. After exposure is finished, the piezoelectric linear motor 44 is reset, the miniature linear motor 41 jacks up the substrate, the rectangular gate valve is opened, the vacuum mechanical arm extends in, the substrate which is jacked up by the three points is taken out, and then a new substrate is put in the same way to finish one-time exposure.

The invention has not been described in detail and is within the skill of the art.

Claims (9)

1. A vacuum surface plasma lithography apparatus, characterized by: the device comprises a vibration isolator (1), a marble optical platform (2), a vacuum cylinder (3), a CF150 vacuum flange (4), a CF150 inner welding flange (5), a vacuum cylinder fixing block (6), a vacuum linear electric cylinder (9), a clamping device (10), a CF50 vacuum flange (11), a vacuum cavity (12), a lifting lug (13), a linear motor adapter (14), a vacuum tubular linear servo motor (15), an alignment light path mounting plate (16), a CF150 vacuum observation window (18), quartz glass (19), a vacuum linear guide rail (20), a triangular prism clamp (21), a triangular prism (22), a first vacuum micro linear motor (23), a vacuum LED light source (24), an optical lens cavity (25), a second micro linear motor (26), an objective lens (27), an optical fiber probe (28), a CCD lens (29), a non-driving guide shaft (30), a mask frame (31), The device comprises a bearing platform (33), an extension spring (34), an extension spring fixing seat (35), a mask clamp (38), a mask plate (39), a miniature piezoelectric linear motor (41), a piezoelectric linear motor (44), a hinge (45), a rectangular blind plate (46), a steel ball (47), a rotary copper platform (48), a three-point supporting plate (49), an adapter plate (50) and an X-Y motion platform (51), wherein the vibration isolator (1) is placed on the ground, a marble optical platform (2) is placed on the vibration isolator (1), the whole device can be isolated from the outside as much as possible under the action of the vibration isolator (1), a vacuum cavity (12) is placed on the marble optical platform (2) through foot supports welded at the bottom, a CF150 vacuum flange (4), a CF150 inner welding flange (5) and a CF50 vacuum flange (11) are installed on the outer side wall of the vacuum cavity (12) and connected through flanges, the vacuum device can realize signal communication between a vacuum part and the outside, and can also be provided with an observation window to facilitate observation of a vacuum environment, the top of the vacuum cavity (12) is provided with a CF150 vacuum observation window (18) for wearing quartz glass (19), a light source of the device can effectively realize light source exposure through the observation window, four lifting lugs (13) at the top of the vacuum cavity (12) can facilitate transportation of the device, meanwhile, the upper top surface of the vacuum cavity (12) is in flange connection, the lifting lugs (13) are arranged to facilitate debugging and fault maintenance of the device, a clamp (10) is arranged at the back of the vacuum cavity (12) and is matched with a hinge (45) for use, and opening and closing of a cavity door of the vacuum cavity (12) are realized; the vacuum cylinders (3) are arranged on the inner side wall of the vacuum cavity (12), the switching is completed through the vacuum cylinder fixing blocks (6), the three cylinders are distributed below the mask frame (31) during working, the mask frame (31) is tightly jacked upwards through the head ball heads, and the mask frame is locked to move in the Z direction; the vacuum linear electric cylinder (9) is connected and installed on a vacuum beam of a vacuum cavity (12) through a screw, the other side uses a matched non-driving guide shaft (30) to stably install a mask frame (31), the distance displacement of the mask frame (31) which is larger than 1000mm is realized, the vacuum pickup is convenient, a pair of vacuum linear guide rails (20) is installed on the vacuum beam to support an alignment light path installation plate (16), a stator of a vacuum tubular linear servo motor (15) is installed on the inner wall of the vacuum cavity (12) through a linear motor switching device (14), a rotor is connected on the alignment light path installation plate (16) through an installation clamping device, the front and back movement of the whole alignment light path can be driven to realize the Y-direction adjustment of an objective lens (27), a triangular prism (22) is installed in a triangular prism clamp (21) to be bonded after alignment, and the view of the objective lens can be imaged in a CCD lens (, thereby feeding back to a visible port, the first vacuum micro linear motor (23) can drive the vacuum LED light source (24), the optical lens cavity (25), the second micro linear motor (26) and the objective lens (27) to integrally generate X, Z-direction motion, the adjustable alignment design is realized, the optical fiber probe (28) is arranged on the alignment light path mounting plate (16) through the second micro linear motor (26), the vertical displacement of the optical fiber probe is realized through the Z-direction displacement of the second micro linear motor (26), the three-point distance measurement of the bearing platform (33) can be realized, the three-point grating ruler resets to 0 point after data feedback, the piezoelectric linear motor (44) rises to jack up the whole bearing platform (33), the extension spring (34) and the extension spring fixing seat (35) integrally move in the Z direction, the number of steps is completed through displacement signals obtained by the piezoelectric linear motor (44), the three-point grating ruler is matched with the piezoelectric linear motor (44) to complete the closing control, leveling a wafer bearing table is realized, a mask plate (39) is installed on a mask frame (31) through a mask clamp (38), the mask plate (39) is ejected by screws in the XY direction, and is fixed on the mask clamp (38) in the Z direction by adopting vacuum suction; the rotary copper platform (48) is connected with a three-point supporting plate (49) through a central flange at a three-point supporting position, the three-point supporting is completed by adopting a steel ball (47), an X-Y moving platform (51) can be connected with the whole wafer bearing platform part by an adapter plate (50), after exposure is completed, a rectangular blind plate (46) is opened, a vacuum three-axis mechanical arm (57) extends into the center of the wafer bearing platform (33), the substrate is jacked up by matching with Z-direction movement of a miniature piezoelectric linear motor (41), the vacuum three-axis mechanical arm (57) completes taking of the substrate, and the substrate is placed in a wafer loading box capable of realizing Z-direction movement by returning the mechanical arm.

2. The vacuum surface plasma lithography apparatus according to claim 1, wherein: three vacuum cylinders (3) are used in the vacuum cavity (12) to complete Z-direction displacement fixing of the mask frame (31), the vacuum cylinders (3) are in contact with the mask frame (31) in an outward ball head mode, radial deflection of the vacuum cavity (12) is prevented, and meanwhile the three ball heads of the cylinders can be guaranteed to be located on the same plane.

3. The vacuum surface plasma lithography apparatus according to claim 1 or 2, wherein: the alignment light path mounting plate (16) is mounted on the vacuum cavity (12) through a vacuum linear guide rail (20), and can work with the LED light path in a clearance manner through moving back and forth to realize leveling and exposure.

4. The vacuum surface plasma lithography apparatus according to claim 1, wherein: the vacuum tubular linear servo motor (15) is used for driving the alignment light path (54) to integrally reciprocate, and the vacuum tubular linear servo motor (15) is small in size and suitable for a vacuum environment.

5. The vacuum surface plasma lithography apparatus according to claim 1, wherein: three micro piezoelectric linear motors (41) are used for completing the lifting and the lowering of the substrate, and a three-axis mechanical arm is matched to stretch into the rectangular opening at the position of a rectangular blind plate (46) to complete the taking and placing of the substrate.

6. The vacuum surface plasma lithography apparatus according to claim 1, wherein: the long-stroke vacuum linear electric cylinder (9) is 1400mm in total length, 1000mm in stroke, 100kg in bearing capacity and suitable for vacuum environment, the use method has the advantages that the whole moving speed cannot be too high, the mask frame (31) is moved by adopting the assembly of a single vacuum stepping motor and a vacuum reducer, the two-side bearing is realized by adopting the non-driving guide shaft (30) on the other side, and the mask frame (31) is prevented from being blocked due to the phenomena of step loss and step crossing of the stepping motor.

7. The vacuum surface plasma lithography apparatus according to claim 1, wherein: two CCD lenses (29) with 400 ten thousand high-definition pixels are adopted, the content of the objective lens (27) is subjected to feedback monitoring, and the CCD lenses (29) can be normally used in a vacuum environment.

8. The vacuum surface plasma lithography apparatus according to claim 1, wherein: the X-Y displacement of the mask plate is fixed on the mask clamp by adopting screws, the mask plate (39) protrudes out of the mask clamp (38) by 0.5-1 mm in size, the mask clamp is attached to a substrate, the mask clamp (38) is mounted on the mask frame (31) in a screw mode, a gap is reserved around the mask clamp to attach the Teflon (37), and abrasion and mechanical vibration of the mask clamp (38) are reduced.

9. The vacuum surface plasma lithography apparatus according to claim 1, wherein: the three-point extension spring resets the wafer bearing platform after the piezoelectric linear motor (44) contracts, so that the problem that the piezoelectric linear motor (44) has no extension force is solved;

a vacuum X-Y motion platform (51) is adopted and is built by three single-shaft motion platforms, the single motion platform bears 100kG, a grating ruler is configured for the walking precision, and the walking precision of a wafer bearing platform (33) is improved;

the bearing piece platform and the rotary copper platform (48) are all made of a whole block of brass material, the three-layer isolation type design is adopted, the copper sheet type structure coupling is adopted, the three-point free ball supporting center is connected with a flange, the piezoelectric motor (60) of the rotary copper platform drives the rotary copper platform (48) to rotate around the axis, the bearing piece platform (33) is driven to generate displacement, and the copper sheet type structure coupling can reach the using condition through finite element analysis.

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