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CN107699928A - The preparation method of black rhenium coating - Google Patents

The preparation method of black rhenium coating Download PDF

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CN107699928A
CN107699928A CN201611090758.4A CN201611090758A CN107699928A CN 107699928 A CN107699928 A CN 107699928A CN 201611090758 A CN201611090758 A CN 201611090758A CN 107699928 A CN107699928 A CN 107699928A
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molten salt
electroplating
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cathode
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CN107699928B (en
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朱利安
叶益聪
白书欣
张虹
白宏德
王江帆
黄永乐
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National University of Defense Technology
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/66Electroplating: Baths therefor from melts
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/004Sealing devices
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/003Electroplating using gases, e.g. pressure influence

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  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

本发明公开了一种黑铼涂层的制备方法,包括以下步骤:S1、熔盐氯化:在惰性气体保护下,将CsCl加热至熔融状态后,加入K2ReCl6,得到含K2ReCl6的熔盐,向含K2ReCl6的熔盐中通入氯气进行氯化处理,冷却后得到氯化后的熔盐;S2、电镀:在惰性气体保护下加热步骤S1所得氯化后的熔盐至熔融状态,将镀件基体浸入熔融状态的氯化后的熔盐中,以熔融状态的氯化后的熔盐为镀液,以镀件基体为阴极,以惰性电极为阳极,通电后进行电镀,在镀件基体上得到黑铼涂层。本发明的制备方法成本低、沉积速度快,制得的黑铼涂层均匀性好。

The invention discloses a method for preparing a black rhenium coating, which comprises the following steps: S1, molten salt chlorination: under the protection of an inert gas, after heating CsCl to a molten state, adding K 2 ReCl 6 to obtain K 2 ReCl 6 molten salt, feed chlorine gas into the molten salt containing K 2 ReCl 6 for chlorination, and obtain the chlorinated molten salt after cooling; S2, electroplating: heating step S1 obtained chlorinated When the molten salt is in a molten state, immerse the substrate of the plated piece in the chlorinated molten salt in the molten state, use the chlorinated molten salt in the molten state as the plating solution, use the substrate of the plated piece as the cathode, and use the inert electrode as the anode, and energize After electroplating, a black rhenium coating is obtained on the substrate of the plated piece. The preparation method of the invention has low cost and fast deposition speed, and the prepared black rhenium coating has good uniformity.

Description

黑铼涂层的制备方法Preparation method of black rhenium coating

技术领域technical field

本发明属于熔盐电化学和表面涂层技术领域,涉及一种黑铼涂层的制备方法,具体涉及一种高发射率黑色铼涂层的熔盐电镀制备方法。The invention belongs to the technical field of molten salt electrochemistry and surface coating, and relates to a method for preparing a black rhenium coating, in particular to a method for preparing a high emissivity black rhenium coating by molten salt electroplating.

背景技术Background technique

铼(Rhenium)是一种稀有难熔金属,具有高熔点(3180℃)、高模量、优异的高温力学性能和耐热冲击性能,这些性质使得铼特别适合于在超高温和强热震工作环境中使用。此外,金属铼还具有非常好的耐磨损和抗腐蚀性能,铼抗磨损的能力仅次于金属锇(Os),对于除氧气之外的大部分燃气都能够保持比较好的化学惰性。目前铼主要用于高温结构和能量体系(比如空间导弹推进系统)、超高温发射极、耐磨损冲刷涂层和火箭、卫星用发动机燃烧室等高温领域。相对于传统的具有银白色金属光泽的铼,微观上呈平行尖状凸起、具有强织构取向、宏观上表面呈黑色的铼具有更高的表面发射率,可以提高材料向外界辐射转移能量的速率,在超高温服役环境中显示出更好的性能。在辐射冷却的火箭发动机中,黑铼可用于发动机的外壁材料降低发动机的温度,从而提高发动机的性能和工作寿命。另外,黑铼也是太阳能热推进系统中进行热交换的关键材料。Rhenium (Rhenium) is a rare refractory metal with high melting point (3180°C), high modulus, excellent high-temperature mechanical properties and thermal shock resistance, these properties make rhenium especially suitable for working at ultra-high temperature and strong thermal shock environment. In addition, metal rhenium also has very good wear resistance and corrosion resistance. The wear resistance of rhenium is second only to metal osmium (Os), and it can maintain relatively good chemical inertness to most gases except oxygen. At present, rhenium is mainly used in high-temperature fields such as high-temperature structures and energy systems (such as space missile propulsion systems), ultra-high-temperature emitters, wear-resistant erosion coatings, rockets, and satellite engine combustion chambers. Compared with the traditional rhenium with silver-white metallic luster, rhenium with parallel pointed protrusions on the microscopic scale, strong texture orientation, and black upper surface on the macroscopic scale has a higher surface emissivity, which can improve the radiation transfer energy of the material to the outside world. The rate shows better performance in the ultra-high temperature service environment. In radiation-cooled rocket engines, black rhenium can be used as the outer wall material of the engine to reduce the temperature of the engine, thereby improving the performance and working life of the engine. In addition, black rhenium is also a key material for heat exchange in solar thermal propulsion systems.

由于铼具有较高的熔点和电子发射性能,也被广泛应用于制作加热元件、电器插头、热电偶、特殊金属丝以及电子管中的元件,其中最突出的应用即制造热电子发电机中的超高温发射极。材料的电子发射性能与其微观结构紧密相关,而表面呈平行尖状生长的黑铼则具有更佳的电子发射性能。Because rhenium has a high melting point and electron emission performance, it is also widely used in the production of heating elements, electrical plugs, thermocouples, special metal wires and components in electron tubes. High temperature emitter. The electron emission performance of the material is closely related to its microstructure, and the black rhenium whose surface grows in parallel pointed shape has better electron emission performance.

国内外对于黑色铼涂层的研究报道很少,目前成功制备且得到应用的只有美国Ultramet公司采用CVD方法制备的黑铼涂层。但是传统的CVD技术沉积速度较慢,成本较高,且在制备形状复杂的构件时难以保证构件各个位置涂层厚度的均匀性。There are very few research reports on black rhenium coating at home and abroad. At present, only the black rhenium coating prepared by Ultramet company of the United States by CVD method has been successfully prepared and applied. However, the traditional CVD technology has a slow deposition rate and high cost, and it is difficult to ensure the uniformity of the coating thickness at each position of the component when preparing components with complex shapes.

因此,提供一种成本低、沉积速率快且均匀性好的黑铼涂层制备方法是本领域技术人员极为关注的技术问题。Therefore, providing a method for preparing a black rhenium coating with low cost, fast deposition rate and good uniformity is a technical problem that is of great concern to those skilled in the art.

发明内容Contents of the invention

本发明要解决的技术问题是克服现有技术的不足,提供一种成本低、沉积速度快、均匀性好的黑铼涂层的制备方法。The technical problem to be solved by the present invention is to overcome the deficiencies of the prior art and provide a method for preparing a black rhenium coating with low cost, fast deposition speed and good uniformity.

为解决上述技术问题,本发明采用以下技术方案:In order to solve the problems of the technologies described above, the present invention adopts the following technical solutions:

一种黑铼涂层的制备方法,包括以下步骤:A preparation method for black rhenium coating, comprising the following steps:

S1、熔盐氯化:在惰性气体保护下,将CsCl加热至熔融状态后,加入K2ReCl6,得到含K2ReCl6的熔盐,向含K2ReCl6的熔盐中通入氯气进行氯化处理,冷却后得到氯化后的熔盐;S1. Molten salt chlorination: under the protection of an inert gas, heat CsCl to a molten state, then add K 2 ReCl 6 to obtain a molten salt containing K 2 ReCl 6 , and introduce chlorine gas into the molten salt containing K 2 ReCl 6 Chlorination treatment is carried out to obtain chlorinated molten salt after cooling;

S2、电镀:在惰性气体保护下加热步骤S1所得氯化后的熔盐至熔融状态,将镀件基体浸入熔融状态的氯化后的熔盐中,以熔融状态的氯化后的熔盐为镀液,以镀件基体为阴极,以惰性电极为阳极,通电后进行电镀,在镀件基体上得到黑铼涂层。S2, electroplating: under the protection of an inert gas, heat the chlorinated molten salt obtained in step S1 to a molten state, immerse the plated piece substrate in the molten chlorinated molten salt, and use the molten chlorinated molten salt as In the plating solution, the substrate of the plated part is used as the cathode, and the inert electrode is used as the anode. Electroplating is carried out after electrification, and a black rhenium coating is obtained on the substrate of the plated part.

上述的黑铼涂层的制备方法,优选的,所述步骤S1中,所述加热温度为700℃~750℃,所述含K2ReCl6的熔盐中铼离子的浓度为1wt.%~7wt.%,所述氯化处理的时间为30min~60min。In the method for preparing the above-mentioned black rhenium coating, preferably, in the step S1, the heating temperature is 700°C-750°C, and the concentration of rhenium ions in the molten salt containing K 2 ReCl 6 is 1 wt.%- 7wt.%, the time of the chlorination treatment is 30min~60min.

上述的黑铼涂层的制备方法,优选的,所述步骤S2中,所述电镀的温度为700℃~850℃,阴极电流密度为50mA/cm2~100mA/cm2In the method for preparing the above-mentioned black rhenium coating, preferably, in the step S2, the electroplating temperature is 700°C-850°C, and the cathode current density is 50mA/cm 2 -100mA/cm 2 .

上述的黑铼涂层的制备方法,优选的,所述步骤S2中,所述惰性电极为与镀件基体相匹配的象形阳极,电镀过程中阴极保持旋转。In the method for preparing the above-mentioned black rhenium coating, preferably, in the step S2, the inert electrode is a pictograph anode matching the substrate of the plating piece, and the cathode keeps rotating during the electroplating process.

上述的黑铼涂层的制备方法,优选的,所述镀件基体包括铼、钨、铱或石墨。In the preparation method of the above-mentioned black rhenium coating, preferably, the substrate of the plated part includes rhenium, tungsten, iridium or graphite.

上述的黑铼涂层的制备方法,优选的,所述步骤S2中,通电之前,将镀件基体浸入熔融状态的氯化后的熔盐中保温5min~15min,再进行电镀。In the method for preparing the above-mentioned black rhenium coating, preferably, in the step S2, before energizing, the substrate of the plated piece is immersed in molten chlorinated molten salt for 5 minutes to 15 minutes and then electroplated.

上述的黑铼涂层的制备方法,优选的,所述步骤S2之前还包括将镀件基体进行镀前处理,所述镀前处理包括打磨、脱脂、酸洗、水洗、有机溶剂洗和烘干处理中的一种或多种;所述步骤S2之后,还包括:取出阴极,在氩气保护下随炉冷却,再进行水洗和烘干。The preparation method of the above-mentioned black rhenium coating, preferably, before the step S2, also includes pre-plating the substrate, and the pre-plating treatment includes grinding, degreasing, pickling, water washing, organic solvent washing and drying One or more of the processes; after the step S2, it also includes: taking out the cathode, cooling with the furnace under the protection of argon, and then washing and drying with water.

上述的黑铼涂层的制备方法,优选的,所述步骤S1之前,还包括:将CsCl进行烘干处理,以除去结晶水。The method for preparing the above-mentioned black rhenium coating preferably, before the step S1, further includes: drying the CsCl to remove the water of crystallization.

所述步骤S1中,所述熔盐氯化的过程在熔盐氯化装置中进行,所述熔盐氯化装置包括石英桶、石英杯、两根进气管和一根出气管;所述石英杯设于石英桶内,石英桶14的顶部设有用于密封的橡胶塞,进气管和出气管均贯穿所述橡胶塞。In the step S1, the molten salt chlorination process is carried out in a molten salt chlorination device, the molten salt chlorination device includes a quartz barrel, a quartz cup, two inlet pipes and an outlet pipe; the quartz The cup is arranged in the quartz barrel, and the top of the quartz barrel 14 is provided with a rubber stopper for sealing, and the air inlet pipe and the air outlet pipe all pass through the rubber stopper.

所述步骤中,所述电镀的过程在电镀装置中进行,所述电镀装置包括手套箱、不锈钢筒、电镀槽和井式电阻炉,所述手套箱设于所述不锈钢筒上并与不锈钢筒密封连接,所述不锈钢筒设于所述井式电阻炉内,所述电镀槽设于所述不锈钢筒内,所述不锈钢筒的开口端设有一盖板,所述盖板上插设有阳极杆、阴极杆、进气管和热电偶,所述阳极杆的一端与电镀槽中的惰性阳极相连,所述阳极杆的另一端通过导线与手套箱上的正接线柱相连,所述阴极杆的一端通过一石墨连接杆与一阴极相连,所述阴极杆的另一端通过导线与手套箱上的负接线柱相连,所述阴极杆可沿竖直方向运动,所述不锈钢筒侧面还插设有一出气管。In the step, the electroplating process is carried out in an electroplating device, the electroplating device includes a glove box, a stainless steel cylinder, an electroplating tank and a well-type resistance furnace, and the glove box is arranged on the stainless steel cylinder and connected with the stainless steel cylinder Sealed connection, the stainless steel tube is set in the well-type resistance furnace, the electroplating tank is set in the stainless steel tube, the open end of the stainless steel tube is provided with a cover plate, and the anode is inserted on the cover plate Rod, cathode rod, air intake pipe and thermocouple, one end of the anode rod is connected with the inert anode in the electroplating tank, the other end of the anode rod is connected with the positive terminal on the glove box through a wire, the cathode rod One end is connected to a cathode through a graphite connecting rod, the other end of the cathode rod is connected to the negative terminal on the glove box through a wire, the cathode rod can move in the vertical direction, and a Exit pipe.

本发明中,电镀时间根据所需涂层厚度进行选择。In the present invention, the electroplating time is selected according to the desired coating thickness.

与现有技术相比,本发明的优点在于:Compared with the prior art, the present invention has the advantages of:

1、本发明的黑铼涂层的制备方法,采用经氯化处理的含K2ReCl6的熔盐作为电镀液,其中,K2ReCl6作为铼元素的来源直接加入氯化物熔盐中,操作方便,且铼离子的浓度便于控制。K2ReCl6直接加入CsCl熔融盐中会发生一定量的歧化反应,即K2ReCl6→Re+ReCl5↑,而通入氯气对含K2ReCl6的CsCl熔融盐进行氯化处理能很好地解决上述问题,具体作用如下:第一、在氯气气氛下K2ReCl6可以更为稳定的溶解;第二、可以将歧化反应生成的铼单质重新氯化进入熔盐当中;第三、氯化处理可以更加有效的去处熔盐中残余的水汽和杂质。实验证明经过氯化处理后的熔盐宏观上更加干净均匀。采用氯化物体系熔盐作为电解质,原料成本低廉。视铼离子消耗情况对主盐K2ReCl6进行补充可以重复利用电解液,相比CVD工艺铼的转化利用率大大提高,成本降低。1. The preparation method of the black rhenium coating of the present invention adopts chlorinated molten salt containing K 2 ReCl 6 as an electroplating solution, wherein K 2 ReCl 6 is directly added in the chloride molten salt as a source of rhenium element, The operation is convenient, and the concentration of rhenium ions is easy to control. When K 2 ReCl 6 is directly added to CsCl molten salt, a certain amount of disproportionation reaction will occur, that is, K 2 ReCl 6 →Re+ReCl 5 ↑, and the chlorination of CsCl molten salt containing K 2 ReCl 6 can be very To solve the above problems well, the specific functions are as follows: first, K 2 ReCl 6 can be dissolved more stably in a chlorine atmosphere; second, the rhenium element generated by the disproportionation reaction can be re-chlorinated into the molten salt; third, Chlorination treatment can more effectively remove residual water vapor and impurities in molten salt. Experiments have proved that the molten salt after chlorination is macroscopically cleaner and more uniform. The molten salt of the chloride system is used as the electrolyte, and the raw material cost is low. Depending on the consumption of rhenium ions, supplementing the main salt K 2 ReCl 6 can reuse the electrolyte. Compared with the CVD process, the conversion utilization rate of rhenium is greatly improved, and the cost is reduced.

2、本发明的黑铼涂层的制备方法,采用熔盐电镀制备铼涂层,速度快,平均沉积速度可达50~80μm/h,镀层厚度易于控制。在阴极旋转和采用象形阳极的情况下构件各个部位铼涂层厚度均匀性好。电流效率接近100%,金属镀层致密光滑,与基体结合良好。黑铼涂层室温表面发射率大于0.7,远高于采用其他方法制备的铼。2. The preparation method of the black rhenium coating of the present invention adopts molten salt electroplating to prepare the rhenium coating, the speed is fast, the average deposition rate can reach 50-80 μm/h, and the coating thickness is easy to control. When the cathode is rotated and the pictorial anode is used, the thickness uniformity of the rhenium coating at each part of the component is good. The current efficiency is close to 100%, the metal coating is dense and smooth, and it is well combined with the substrate. The surface emissivity of the black rhenium coating at room temperature is greater than 0.7, which is much higher than that of rhenium prepared by other methods.

3、本发明的黑铼涂层的制备方法,采用手套箱和熔盐电镀装置密封连接的方式,镀件基体的浸镀和提拉操作均在手套箱内完成,可以实现严格气氛保护条件下的熔盐电镀。3. The preparation method of the black rhenium coating of the present invention adopts the method of sealing connection between the glove box and the molten salt electroplating device, and the immersion plating and pulling operations of the plated part substrate are all completed in the glove box, which can realize the process under strict atmosphere protection conditions. molten salt plating.

附图说明Description of drawings

图1为本发明的黑铼涂层的制备方法的工艺流程图。Fig. 1 is the process flow chart of the preparation method of the black rhenium coating of the present invention.

图2 为本发明实施例中采用的熔盐氯化装置示意图。Fig. 2 is a schematic diagram of the molten salt chlorination device used in the embodiment of the present invention.

图3为本发明实施例中采用的电镀装置示意图。Fig. 3 is a schematic diagram of the electroplating device used in the embodiment of the present invention.

图4为本发明实施例1在750℃条件下制得的黑铼涂层的宏观照片。Fig. 4 is a macroscopic photo of the black rhenium coating prepared at 750°C in Example 1 of the present invention.

图5为本发明实施例1在750℃条件下制得的黑铼涂层的表面微观形貌图。Fig. 5 is a surface microscopic view of the black rhenium coating prepared at 750°C in Example 1 of the present invention.

图6为本发明实施例1在750℃条件下制得的黑铼涂层的断口微观形貌图。Fig. 6 is a fracture microscopic view of the black rhenium coating prepared at 750°C in Example 1 of the present invention.

图7为本发明实施例2在850℃条件下制得的黑铼涂层的表面微观形貌图。Fig. 7 is a surface microscopic view of the black rhenium coating prepared at 850°C in Example 2 of the present invention.

图8为本发明实施例2在850℃条件下制得的黑铼涂层的断口微观形貌图。Fig. 8 is a fracture microscopic view of the black rhenium coating prepared at 850°C in Example 2 of the present invention.

图9为不同方法制备的铼室温发射率比较图。Fig. 9 is a comparison chart of room temperature emissivity of rhenium prepared by different methods.

图例说明:illustration:

1、手套箱;2、不锈钢筒;3、电镀槽;4、井式电阻炉;5、阴极;6、阳极杆;7、石墨连接杆;8、热电偶;9、阴极杆;10、盖板;11、进气管;12、正接线柱;13、负接线柱;14、石英桶;15、石英杯;16、橡胶塞;17、出气管。1. Glove box; 2. Stainless steel cylinder; 3. Electroplating tank; 4. Well-type resistance furnace; 5. Cathode; 6. Anode rod; 7. Graphite connecting rod; 8. Thermocouple; 9. Cathode rod; 10. Cover Plate; 11, intake pipe; 12, positive terminal; 13, negative terminal; 14, quartz barrel; 15, quartz cup; 16, rubber plug; 17, outlet pipe.

具体实施方式detailed description

以下结合说明书附图和具体优选的实施例对本发明作进一步描述,但并不因此而限制本发明的保护范围。The present invention will be further described below in conjunction with the accompanying drawings and specific preferred embodiments, but the protection scope of the present invention is not limited thereby.

实施例1:Example 1:

一种黑铼涂层的制备方法,工艺流程如图1所示,包括以下步骤:A kind of preparation method of black rhenium coating, technological process as shown in Figure 1, comprises the following steps:

(1)熔盐氯化:(1) Molten salt chlorination:

在配制熔盐的过程中采用了如图2所示的熔盐氯化装置,该熔盐氯化装置包括石英桶14、石英杯15、两根进气管和一根出气管;石英杯15设于石英桶14内,石英桶14的顶部设有用于密封的橡胶塞16,进气管和出气管均贯穿橡胶塞16,其中一根进气管用于通入氯气,另一根进气管用于通入氩气。当石英杯15内装有熔盐时,通氯气的进气管插入熔盐中。Adopted molten salt chlorination device as shown in Figure 2 in the process of preparing molten salt, this molten salt chlorination device comprises quartz barrel 14, quartz cup 15, two air inlet pipes and an outlet pipe; Quartz cup 15 is designed In the quartz barrel 14, the top of the quartz barrel 14 is provided with a rubber plug 16 for sealing, and the air inlet pipe and the air outlet pipe all run through the rubber plug 16, wherein one air inlet pipe is used to feed chlorine gas, and the other air inlet pipe is used to pass through the rubber plug 16. into argon. When molten salt was housed in the quartz cup 15, the inlet pipe of logical chlorine was inserted in the molten salt.

称取CsCl,并置于200℃烘箱中烘干处理24h去除结晶水。将烘干后的CsCl放入如图2所示的熔盐氯化装置的石英杯3中,先用氩气清洗装置三次,然后在氩气保护性气氛下加热至750℃充分熔化,得到CsCl熔盐。搅拌CsCl熔盐并向CsCl熔盐中加入K2ReCl6,使含K2ReCl6的熔盐中铼离子浓度为5wt.%,向含K2ReCl6的熔盐中通入氯气氯化处理30分钟,最后在氩气保护条件下冷却,得到氯化后的熔盐。Weigh the CsCl, and dry it in an oven at 200°C for 24 hours to remove the water of crystallization. Put the dried CsCl into the quartz cup 3 of the molten salt chlorination device shown in Figure 2, first use argon to clean the device three times, and then heat it to 750°C under an argon protective atmosphere to fully melt to obtain CsCl molten salt. Stir the CsCl molten salt and add K 2 ReCl 6 to the CsCl molten salt, so that the rhenium ion concentration in the molten salt containing K 2 ReCl 6 is 5wt.%, pass chlorine gas into the molten salt containing K 2 ReCl 6 for chlorination 30 minutes, and finally cooled under the protection of argon to obtain the chlorinated molten salt.

本实施例中,只需给出铼离子的浓度即可,CsCl和K2ReCl6的量可根据最终产品所需尺寸不同而不同。In this embodiment, only the concentration of rhenium ions is given, and the amounts of CsCl and K 2 ReCl 6 may vary according to the required size of the final product.

(2)镀件前处理:镀件采用石墨,电镀前用2000号砂纸磨平,丙酮超声清洗15分钟,以去除表面残留的石墨粉,然后在120℃烘箱中充分干燥,得到石墨镀件基体。(2) Pre-treatment of plated parts: the plated parts are made of graphite, smoothed with No. 2000 sandpaper before electroplating, and ultrasonically cleaned with acetone for 15 minutes to remove the residual graphite powder on the surface, and then fully dried in an oven at 120 ° C to obtain the substrate of graphite plated parts .

(3)电镀:(3) Electroplating:

在电镀过程中采用了如图3所示的电镀装置,该电镀装置包括手套箱1、不锈钢筒2、电镀槽3和井式电阻炉4,手套箱1设于不锈钢筒2上并与不锈钢筒2密封连接,不锈钢筒2设于井式电阻炉4的炉膛内,电镀槽3设于不锈钢筒2内的底端。电镀槽3具体为石墨坩埚,石墨坩埚也为惰性阳极,且设计成与镀件基体相匹配的象形阳极。不锈钢筒2的开口端设有一盖板10,盖板10上插设有阳极杆6、阴极杆9、进气管11和热电偶8。阳极杆6的一端与电镀槽3(也即石墨阳极)相连,阳极杆6的另一端通过导线与手套箱1上的正接线柱12相连,正接线柱12与电源正极相连。阴极杆9的一端通过石墨连接杆7与阴极5(即镀件基体)相连,以防止阴极杆9与阴极5直接相连会在熔盐中被腐蚀,阴极杆9的另一端通过导线与手套管1上的负接线柱13相连,负接线柱13与电源正极相连。阴极杆9可沿竖直方向运动,可方便从手套箱内对镀件基体进行浸镀和提拉操作,由于手套箱1与不锈钢筒2密封连接,镀件基体的浸镀和提拉操作均在手套箱内完成,可以实现严格气氛保护条件下的熔盐电镀。本实施例采用的导线优选外加石英管保护的铁铬铝丝。盖板10上插设的热电偶8用于测量和控制电镀槽3内熔盐的温度。盖板10上插设的进气管11用于通氩气。不锈钢筒2的侧面还设有一出气管17,出气管17可用于放出尾气。Adopted the electroplating device shown in Figure 3 in the electroplating process, this electroplating device comprises glove box 1, stainless steel tube 2, electroplating tank 3 and well type resistance furnace 4, and glove box 1 is located on stainless steel tube 2 and is connected with stainless steel tube 2 are sealed and connected, the stainless steel tube 2 is set in the hearth of the well-type resistance furnace 4, and the electroplating tank 3 is set at the bottom of the stainless steel tube 2. The electroplating tank 3 is specifically a graphite crucible, and the graphite crucible is also an inert anode, and is designed to be a pictorial anode matching the substrate of the plating piece. The open end of the stainless steel cylinder 2 is provided with a cover plate 10 on which an anode rod 6 , a cathode rod 9 , an air inlet pipe 11 and a thermocouple 8 are inserted. One end of the anode rod 6 is connected to the electroplating tank 3 (that is, the graphite anode), and the other end of the anode rod 6 is connected to the positive terminal 12 on the glove box 1 through a wire, and the positive terminal 12 is connected to the positive pole of the power supply. One end of the cathode rod 9 is connected to the cathode 5 (that is, the substrate of the plated part) through the graphite connecting rod 7 to prevent the cathode rod 9 from being directly connected to the cathode 5 and will be corroded in the molten salt. The other end of the cathode rod 9 is connected to the glove tube through the wire 1 is connected to the negative terminal 13, and the negative terminal 13 is connected to the positive pole of the power supply. The cathode rod 9 can move in the vertical direction, which can facilitate the dipping and pulling operations on the substrate of the plated part from the glove box. Since the glove box 1 is sealed and connected with the stainless steel cylinder 2, the dipping and pulling operations of the substrate of the plated part can be performed smoothly. Finished in the glove box, molten salt electroplating under strict atmosphere protection conditions can be realized. The wires used in this embodiment are preferably iron-chromium-aluminum wires protected by quartz tubes. The thermocouple 8 inserted on the cover plate 10 is used to measure and control the temperature of the molten salt in the electroplating tank 3 . The air inlet pipe 11 inserted on the cover plate 10 is used for passing argon gas. The side of the stainless steel cylinder 2 is also provided with an air outlet pipe 17, and the air outlet pipe 17 can be used for releasing exhaust gas.

将步骤(1)得到的氯化后的熔盐放入如图3所示的电镀装置的石墨坩埚中并装配好电极,抽真空并用氩气清洗装置三次,在流动的氩气气氛中将熔盐加热到750℃,待氯化后的熔盐熔化后,将步骤(2)得到的石墨镀件基体(即阴极5)插入熔盐中,保温10分钟后,开始电镀,电镀温度为750℃,阴极电流密度为50mA/cm2,电镀槽3(惰性阳极)内通入Ar保护,电镀时间为1小时,在镀件基体上形成黑铼涂层。Put the chlorinated molten salt obtained in step (1) into the graphite crucible of the electroplating device shown in Figure 3 and assemble the electrodes, vacuumize the device and clean the device three times with argon gas, and melt Heat the salt to 750°C, and after the chlorinated molten salt melts, insert the graphite plated substrate (cathode 5) obtained in step (2) into the molten salt, keep it warm for 10 minutes, and then start electroplating, the electroplating temperature is 750°C , the cathode current density is 50mA/cm 2 , the electroplating tank 3 (inert anode) is protected by Ar, the electroplating time is 1 hour, and a black rhenium coating is formed on the substrate of the plated piece.

其中,本实施例的石墨镀件基体为圆柱体,石墨坩埚内壁的轮廓设计成与石墨镀件基体的外轮廓一致,以形成简单象形阳极。Wherein, the base of the graphite-coated part in this embodiment is a cylinder, and the contour of the inner wall of the graphite crucible is designed to be consistent with the outer contour of the base of the graphite-coated part, so as to form a simple pictorial anode.

(4)镀件清洗:取出阴极镀件,并在Ar气保护下冷却至室温,将样品用水超声清洗去除表面残留熔盐,烘干后,得到镀覆有黑铼涂层的镀件。(4) Cleaning of plated parts: Take out the cathode plated parts and cool them down to room temperature under the protection of Ar gas, ultrasonically clean the samples with water to remove residual molten salt on the surface, and dry them to obtain the plated parts coated with black rhenium coating.

图4为本实施例制备的黑铼涂层的宏观照片,涂层表面光滑,呈黑色。图5和图6分别为本实施例制备的黑铼涂层表面和断口微观形貌图,经检测,涂层表面为粒径小于5μm的尖顶状晶粒密排而成,晶粒呈不规则多边形状,涂层厚度约为40μm。按照国家标准GB 5210-85《涂层附着力的测定法 拉开法》对所得的黑铼涂层进行拉开试验,测得的平均拉伸强度为10.2MPa,断开位置为涂层与基体结合处。黑铼涂层室温表面发射率为0.73。Fig. 4 is the macrophotograph of the black rhenium coating prepared in this embodiment, the coating surface is smooth and black. Fig. 5 and Fig. 6 are respectively the microscopic appearance diagrams of the surface and fracture of the black rhenium coating prepared in this example. After testing, the surface of the coating is densely packed with apex-shaped grains with a particle size of less than 5 μm, and the grains are irregular. Polygonal shape, the coating thickness is about 40μm. According to the national standard GB 5210-85 "Determination of Coating Adhesion Pulling Method", the obtained black rhenium coating was pulled apart. The measured average tensile strength was 10.2MPa, and the breaking position was between the coating and the substrate. Meeting point. The surface emissivity of the black rhenium coating at room temperature is 0.73.

实施例2:Example 2:

一种黑铼涂层的制备方法,与实施例1的步骤基本相同,区别仅在于:步骤(3)的电镀温度为850℃。A method for preparing a black rhenium coating, the steps of which are basically the same as in Example 1, the only difference being that the electroplating temperature in step (3) is 850°C.

图7和图8分别为本实施例制备的黑铼涂层表面和断口微观形貌图,由图可知,涂层表面光滑,呈灰黑色。涂层晶粒尺寸较实施例1大,表面为粒径小于10μm的尖顶塔状晶粒密排而成,涂层厚度约为40μm。按照国家标准GB 5210-85《涂层附着力的测定法 拉开法》进行拉开试验,测得的平均拉伸强度为12.2MPa,断开位置为涂层与基体结合处。铼涂层室温表面发射率为0.7。Fig. 7 and Fig. 8 are respectively the microscopic appearance diagrams of the surface and fracture of the black rhenium coating prepared in this embodiment. It can be seen from the figure that the coating surface is smooth and gray-black. The grain size of the coating is larger than that of Example 1, and the surface is densely packed with pointed and tower-shaped grains with a grain size less than 10 μm, and the coating thickness is about 40 μm. According to the national standard GB 5210-85 "Determination of Coating Adhesion-Pull-Off Method", the pull-off test is carried out. The average tensile strength measured is 12.2MPa, and the break-off position is the joint between the coating and the substrate. The surface emissivity of rhenium coating at room temperature is 0.7.

对比例:Comparative example:

对采用本发明的熔盐电镀法(ED法)、常规粉末冶金法(PM法)和常规化学气相沉积法(CVD法)制备出的铼在室温条件下的表面发射率进行比较,如图9所示,可以看出采用本发明的熔盐电镀法制备的黑铼(ED铼)表面发射率明显高于PM铼和CVD铼。The surface emissivity of rhenium prepared by the molten salt electroplating method (ED method) of the present invention, conventional powder metallurgy method (PM method) and conventional chemical vapor deposition method (CVD method) at room temperature is compared, as shown in Figure 9 As shown, it can be seen that the surface emissivity of black rhenium (ED rhenium) prepared by the molten salt electroplating method of the present invention is significantly higher than that of PM rhenium and CVD rhenium.

以上所述,仅是本发明的较佳实施例而已,并非对本发明作任何形式上的限制。虽然本发明已以较佳实施例揭示如上,然而并非用以限定本发明。任何熟悉本领域的技术人员,在不脱离本发明的精神实质和技术方案的情况下,都可利用上述揭示的方法和技术内容对本发明技术方案做出许多可能的变动和修饰,或修改为等同变化的等效实施例。因此,凡是未脱离本发明技术方案的内容,依据本发明的技术实质对以上实施例所做的任何简单修改、等同替换、等效变化及修饰,均仍属于本发明技术方案保护的范围内。The above descriptions are only preferred embodiments of the present invention, and do not limit the present invention in any form. Although the present invention has been disclosed above with preferred embodiments, it is not intended to limit the present invention. Any person familiar with the art, without departing from the spirit and technical solutions of the present invention, can use the methods and technical content disclosed above to make many possible changes and modifications to the technical solutions of the present invention, or modify them to be equivalent Variations of equivalent embodiments. Therefore, any simple modifications, equivalent replacements, equivalent changes and modifications made to the above embodiments according to the technical essence of the present invention, which do not deviate from the technical solutions of the present invention, still fall within the protection scope of the technical solutions of the present invention.

Claims (10)

1.一种黑铼涂层的制备方法,包括以下步骤:1. a preparation method of black rhenium coating, comprising the following steps: S1、熔盐氯化:在惰性气体保护下,将CsCl加热至熔融状态后,加入K2ReCl6,得到含K2ReCl6的熔盐,向含K2ReCl6的熔盐中通入氯气进行氯化处理,冷却后得到氯化后的熔盐;S1. Molten salt chlorination: under the protection of an inert gas, heat CsCl to a molten state, then add K 2 ReCl 6 to obtain a molten salt containing K 2 ReCl 6 , and introduce chlorine gas into the molten salt containing K 2 ReCl 6 Chlorination treatment is carried out to obtain chlorinated molten salt after cooling; S2、电镀:在惰性气体保护下加热步骤S1所得氯化后的熔盐至熔融状态,将镀件基体浸入熔融状态的氯化后的熔盐中,以熔融状态的氯化后的熔盐为镀液,以镀件基体为阴极,以惰性电极为阳极,通电后进行电镀,在镀件基体上得到黑铼涂层。S2, electroplating: under the protection of an inert gas, heat the chlorinated molten salt obtained in step S1 to a molten state, immerse the plated piece substrate in the molten chlorinated molten salt, and use the molten chlorinated molten salt as In the plating solution, the substrate of the plated part is used as the cathode, and the inert electrode is used as the anode. Electroplating is carried out after electrification, and a black rhenium coating is obtained on the substrate of the plated part. 2.根据权利要求1所述的黑铼涂层的制备方法,其特征在于,所述步骤S1中,所述加热温度为700℃~750℃,所述含K2ReCl6的熔盐中铼离子的浓度为1wt.%~7wt.%,所述氯化处理的时间为30min~60min。2. The preparation method of black rhenium coating according to claim 1, characterized in that, in the step S1, the heating temperature is 700°C to 750°C, and the rhenium in the molten salt containing K 2 ReCl 6 The ion concentration is 1wt.%-7wt.%, and the chlorination treatment time is 30min-60min. 3.根据权利要求1所述的黑铼涂层的制备方法,其特征在于,所述步骤S2中,所述电镀的温度为700℃~850℃,阴极电流密度为50mA/cm2~100mA/cm23. The preparation method of black rhenium coating according to claim 1, characterized in that, in the step S2, the temperature of the electroplating is 700°C-850°C, and the cathode current density is 50mA/cm 2 -100mA/ cm 2 . 4.根据权利要求1所述的黑铼涂层的制备方法,其特征在于,所述步骤S2中,所述惰性电极为与镀件基体相匹配的象形阳极,电镀过程中阴极保持旋转。4. The preparation method of the black rhenium coating according to claim 1, characterized in that, in the step S2, the inert electrode is a pictographic anode matched with the plating substrate, and the cathode keeps rotating during the electroplating process. 5.根据权利要求1~4中任一项所述的黑铼涂层的制备方法,其特征在于,所述镀件基体包括铼、钨、铱或石墨。5. The preparation method of the black rhenium coating according to any one of claims 1 to 4, characterized in that, the substrate of the plated part comprises rhenium, tungsten, iridium or graphite. 6.根据权利要求1~4中任一项所述的黑铼涂层的制备方法,其特征在于,所述步骤S2中,通电之前,将镀件基体浸入熔融状态的氯化后的熔盐中保温5min~15min,再进行电镀。6. according to the preparation method of the black rhenium coating described in any one in claim 1~4, it is characterized in that, in described step S2, before energizing, the chlorinated molten salt after immersing the plated piece substrate in molten state Keep warm for 5 minutes to 15 minutes in the middle, and then carry out electroplating. 7.根据权利要求1~4中任一项所述的黑铼涂层的制备方法,其特征在于,所述步骤S2之前还包括将镀件基体进行镀前处理,所述镀前处理包括打磨、脱脂、酸洗、水洗、有机溶剂洗和烘干处理中的一种或多种;所述步骤S2之后,还包括:取出阴极,在氩气保护下随炉冷却,再进行水洗和烘干。7. The preparation method of the black rhenium coating according to any one of claims 1 to 4, characterized in that, before the step S2, it also includes carrying out pre-plating treatment on the substrate of the plated piece, and the pre-plating treatment includes grinding , degreasing, pickling, water washing, organic solvent washing and drying treatment; after the step S2, it also includes: taking out the cathode, cooling with the furnace under the protection of argon, and then washing and drying . 8.根据权利要求1~4中任一项所述的黑铼涂层的制备方法,其特征在于,所述步骤S1之前,还包括:将CsCl进行烘干处理,以除去结晶水。8 . The method for preparing the black rhenium coating according to any one of claims 1 to 4 , characterized in that, before the step S1 , further comprising: drying CsCl to remove crystal water. 9.根据权利要求1~4中任一项所述的黑铼涂层的制备方法,其特征在于,所述步骤S1中,所述熔盐氯化的过程在熔盐氯化装置中进行,所述熔盐氯化装置包括石英桶(14)、石英杯(15)、两根进气管和一根出气管;所述石英杯(15)设于石英桶(14)内,石英桶(14)的顶部设有用于密封的橡胶塞(16),进气管和出气管均贯穿所述橡胶塞(16)。9. according to the preparation method of the black rhenium coating described in any one in claim 1~4, it is characterized in that, in described step S1, the process of described molten salt chlorination is carried out in molten salt chlorination device, The molten salt chlorination device comprises a quartz barrel (14), a quartz cup (15), two inlet pipes and an outlet pipe; the quartz cup (15) is arranged in the quartz barrel (14), and the quartz barrel (14 ) is provided with a rubber plug (16) for sealing, and both the air inlet pipe and the air outlet pipe run through the rubber plug (16). 10.根据权利要求1~4中任一项所述的黑铼涂层的制备方法,其特征在于,所述步骤S2中,所述电镀的过程在电镀装置中进行,所述电镀装置包括手套箱(1)、不锈钢筒(2)、电镀槽(3)和井式电阻炉(4),所述手套箱(1)设于所述不锈钢筒(2)上并与不锈钢筒(2)密封连接,所述不锈钢筒(2)设于所述井式电阻炉(4)内,所述电镀槽(3)设于所述不锈钢筒(2)内,所述不锈钢筒(2)的开口端设有一盖板(10),所述盖板(10)上插设有阳极杆(6)、阴极杆(9)、进气管(11)和热电偶(8),所述阳极杆(6)的一端与电镀槽(3)中的惰性阳极相连,所述阳极杆(6)的另一端通过导线与手套箱(1)上的正接线柱相连,所述阴极杆(9)的一端通过一石墨连接杆(7)与一阴极(5)相连,所述阴极杆(9)的另一端通过导线与手套箱(1)上的负接线柱相连,所述阴极杆(9)可沿竖直方向运动,所述不锈钢筒(2)侧面还插设有一出气管(17)。10. The preparation method of the black rhenium coating according to any one of claims 1 to 4, characterized in that, in the step S2, the electroplating process is carried out in an electroplating device, and the electroplating device includes gloves Box (1), stainless steel tube (2), electroplating tank (3) and well type resistance furnace (4), the glove box (1) is set on the stainless steel tube (2) and sealed with the stainless steel tube (2) connection, the stainless steel tube (2) is set in the well-type resistance furnace (4), the electroplating tank (3) is set in the stainless steel tube (2), and the open end of the stainless steel tube (2) A cover plate (10) is provided, and an anode rod (6), a cathode rod (9), an air inlet pipe (11) and a thermocouple (8) are inserted on the cover plate (10), and the anode rod (6) One end of the anode rod (6) is connected to the inert anode in the electroplating tank (3), the other end of the anode rod (6) is connected to the positive terminal on the glove box (1) through a wire, and one end of the cathode rod (9) is connected through a The graphite connecting rod (7) is connected to a cathode (5), and the other end of the cathode rod (9) is connected to the negative terminal on the glove box (1) through a wire, and the cathode rod (9) can be vertically Direction movement, the stainless steel cylinder (2) is also inserted with an outlet pipe (17) on the side.
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