CN106533438A - Terahertz frequency synthesizer realized by adopting CMOS process - Google Patents
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Abstract
一种采用CMOS工艺实现的太赫兹频率合成器,包括有依次串联连接的:产生太赫兹LO信号的压控振荡器,用于进行分频的第一级注入锁定分频器和第二级注入锁定分频器,以及用于对达到设定的频率进行锁定的锁相环,所述锁相环的反馈输出端连接所述压控振荡器的反馈输入端。本发明的一种采用CMOS工艺实现的太赫兹频率合成器,采用标准的CMOS工艺实现,有集成度高、成本低、易于大规模生产等优点。同时还克服了CMOS工艺截止频率附近工作性能差的限制,实现了太赫兹频率合成器的设计。
A terahertz frequency synthesizer realized by CMOS technology, including: a voltage-controlled oscillator for generating a terahertz LO signal, a first-stage injection-locked frequency divider for frequency division, and a second-stage injection A locked frequency divider, and a phase-locked loop for locking the set frequency, the feedback output of the phase-locked loop is connected to the feedback input of the voltage-controlled oscillator. A terahertz frequency synthesizer implemented by a CMOS process of the present invention is implemented by a standard CMOS process, and has the advantages of high integration, low cost, and easy mass production. At the same time, it also overcomes the limitation of poor working performance near the cutoff frequency of CMOS technology, and realizes the design of a terahertz frequency synthesizer.
Description
技术领域technical field
本发明涉及一种太赫兹频率合成器。特别是涉及一种采用CMOS工艺实现的太赫兹频率合成器.The invention relates to a terahertz frequency synthesizer. In particular, it relates to a terahertz frequency synthesizer realized by CMOS technology.
背景技术Background technique
近年来,高速无线通信系统正不断朝着更高频率、带宽、更高集成度以及更低成本等方向发展。太赫兹频段(300GHz-3THz)介于微波和红外线之间,是电磁波谱中唯一没有获得较全面研究并很好加以利用的最后一个波谱区间,在通信频带日益紧缺的今天,对太赫兹波通信技术的研究具有重要意义。太赫兹波通信技术广泛应用于生活的各个方面,由于其自身所具有的独特性质以及在光谱中的位置使太赫兹波在通信、电子对抗、雷达、电磁武器、天文学、医学成像、无损检测、环境监测及安全检查等领域存在着广泛的应用前景。In recent years, high-speed wireless communication systems are constantly developing towards higher frequency, bandwidth, higher integration and lower cost. The terahertz frequency band (300GHz-3THz) is between microwaves and infrared rays. It is the only last spectrum interval in the electromagnetic spectrum that has not been fully studied and well utilized. Today, when communication frequency bands are increasingly scarce, the use of terahertz wave communication Technical research is of great significance. Terahertz wave communication technology is widely used in all aspects of life. Due to its unique properties and position in the spectrum, terahertz waves are widely used in communications, electronic countermeasures, radar, electromagnetic weapons, astronomy, medical imaging, non-destructive testing, There are broad application prospects in the fields of environmental monitoring and safety inspection.
近年来,随着特征尺寸的不断减小,深亚微米CMOS工艺及其MOSFET的特征频率已经达到200GHz以上,使得利用CMOS工艺实现GHz频段的高频模拟电路成为可能。在硅CMOS、BiCMOS、双极工艺、GaAs MESFET、异质结双极晶体管(HBT)、GeSi器件等众多工艺中,虽然硅CMOS的高频性能和噪声性能不是最好,但由于它的工艺最为成熟、成本最低、功耗最小、应用也最为广泛,因此CMOS射频集成电路是近年来发展的趋势。随着射频识别技术的发展,世界各国的研究人员在CMOS射频集成电路的设计和制作方面进行了大量研究,使CMOS射频集成电路的性能不断提高。随着硅基工艺的进步,硅基工艺已能支持实现太赫兹通信集成电路,但高达几百GHz的工作频段使太赫兹通信集成电路的实现面临一系列挑战。In recent years, with the continuous reduction of feature size, the characteristic frequency of deep submicron CMOS technology and its MOSFET has reached more than 200 GHz, making it possible to use CMOS technology to realize high-frequency analog circuits in the GHz band. Among many processes such as silicon CMOS, BiCMOS, bipolar process, GaAs MESFET, heterojunction bipolar transistor (HBT), GeSi device, etc., although the high frequency performance and noise performance of silicon CMOS are not the best, because its process is the most Mature, the lowest cost, the smallest power consumption, and the most widely used, so CMOS radio frequency integrated circuits are the development trend in recent years. With the development of radio frequency identification technology, researchers from all over the world have done a lot of research on the design and production of CMOS radio frequency integrated circuits, which has continuously improved the performance of CMOS radio frequency integrated circuits. With the advancement of silicon-based technology, silicon-based technology can support the realization of terahertz communication integrated circuits, but the working frequency band up to hundreds of GHz makes the realization of terahertz communication integrated circuits face a series of challenges.
传统的数字CMOS工艺技术之所以没有在超高频电路(频率超过100GHz)应用方面被充分考虑,是因为CMOS振荡器电路受到器件的截止频率(fT)和最大振荡频率(fmax)的限制。然而,工艺技术的发展使得器件尺寸不断缩小,器件的工作频率不断增加,使在CMOS工艺下能够使得场效应晶体管截止频率接近甚至达到太赫兹的频率范围,使得采用CMOS工艺实现在太赫兹波频段下工作的电路成为可能。The reason why traditional digital CMOS process technology has not been fully considered in the application of ultra-high frequency circuits (frequency exceeding 100GHz) is that the CMOS oscillator circuit is limited by the cut-off frequency (f T ) and maximum oscillation frequency (f max ) of the device . However, with the development of process technology, the size of the device is continuously reduced, and the operating frequency of the device is continuously increased, so that the cut-off frequency of the field effect transistor can be close to or even reach the frequency range of terahertz under the CMOS process, so that the CMOS process can be used to realize the frequency range of the terahertz wave. It is possible to work under the circuit.
采用CMOS工艺实现的太赫兹波电路已有研究,但是因为CMOS工艺器件。The terahertz wave circuit realized by CMOS process has been studied, but because of the CMOS process device.
发明内容Contents of the invention
本发明所要解决的技术问题是,提供一种集成度高、成本低、易于大规模生产的采用CMOS工艺实现的太赫兹频率合成器The technical problem to be solved by the present invention is to provide a terahertz frequency synthesizer realized by CMOS technology with high integration, low cost and easy mass production
本发明所采用的技术方案是:一种采用CMOS工艺实现的太赫兹频率合成器,包括有依次串联连接的:产生太赫兹LO信号的压控振荡器,用于进行分频的第一级注入锁定分频器和第二级注入锁定分频器,以及用于对达到设定的频率进行锁定的锁相环,所述锁相环的反馈输出端连接所述压控振荡器的反馈输入端。The technical solution adopted in the present invention is: a terahertz frequency synthesizer realized by CMOS technology, including a voltage-controlled oscillator that generates a terahertz LO signal connected in series, and a first-stage injection for frequency division A locked frequency divider and a second-stage injection locked frequency divider, and a phase locked loop for locking the set frequency, the feedback output of the phase locked loop is connected to the feedback input of the voltage controlled oscillator .
所述的压控振荡器包括有第一MOS管、第二MOS管、第一电阻以及第二电阻,其中,所述第一MOS管的栅极依次通过第三电感和第四电感连接第二MOS管的栅极,所述第一MOS管的栅极还通过第三电容与源极一起分别连接可变电容的一端及第五电感的一端,所述第一MOS管的漏极通过第一电感连接供电电源,以及通过第一电容至输出端正极连接第一级注入锁定分频器的输入端,所述第二MOS管的栅极还通过第四电容与源极一起分别连接可变电容的另一端及第六电感的一端,所述第二MOS管的漏极通过第二电感连接供电电源,以及通过第二电容至输出端负极连接第一级注入锁定分频器的输入端,所述第三电感和第四电感相连接端依次通过第一电阻和偏置电压接地,所述第五电感的另一端和第六电感的另一端连接第二电阻和第五电容的一端,所述第二电阻和第五电容的另一端接地。The voltage-controlled oscillator includes a first MOS transistor, a second MOS transistor, a first resistor, and a second resistor, wherein the gate of the first MOS transistor is connected to the second MOS transistor through a third inductance and a fourth inductance in sequence. The gate of the MOS transistor, the gate of the first MOS transistor is also connected to one end of the variable capacitor and one end of the fifth inductor through the third capacitor and the source, and the drain of the first MOS transistor is connected to the first end of the MOS transistor through the first The inductance is connected to the power supply, and the positive pole of the output terminal is connected to the input terminal of the first-stage injection-locked frequency divider through the first capacitor, and the gate of the second MOS transistor is also connected to the variable capacitor through the fourth capacitor and the source. The other end of the second MOS transistor and one end of the sixth inductance, the drain of the second MOS transistor is connected to the power supply through the second inductance, and the negative electrode of the output end is connected to the input end of the first-stage injection-locked frequency divider through the second capacitor, so The connection ends of the third inductance and the fourth inductance are grounded sequentially through the first resistor and the bias voltage, the other end of the fifth inductance and the other end of the sixth inductance are connected to one end of the second resistor and the fifth capacitor, the The other ends of the second resistor and the fifth capacitor are grounded.
所述的第一级注入锁定分频器包括有第三MOS管、第四MOS管、第五MOS管、第六MOS管、第七MOS管和第八MOS管,其中,第三MOS管的栅极连接外部供电电源,第三MOS管的源极和漏极分别连接第九电感上的a抽头和c抽头,所述第四MOS管的栅极连接第九电感中部的b抽头,以及构成输入端(Prot1)连接所述的压控振荡器的输出端,第四MOS管的源极分别连接第九电感的一端、第五MOS管的栅极、第七MOS管的漏极,以及第八MOS管的栅极,第四MOS管的漏极分别连接第九电感的另一端、第六MOS管的栅极、第八MOS管的漏极,以及第七MOS管的栅极,第七MOS管和第八MOS管的源极通过第一电流源接地,所述第五MOS管和第六MOS管的源极通过第二电流源接地,第五MOS管的漏极通过第七电感连接供电电源,以及构成输出端连接第二级注入锁定分频器的输入端,所述第六MOS管的漏极通过第八电感连接供电电源。The first-stage injection-locked frequency divider includes a third MOS transistor, a fourth MOS transistor, a fifth MOS transistor, a sixth MOS transistor, a seventh MOS transistor and an eighth MOS transistor, wherein the third MOS transistor The gate is connected to an external power supply, the source and drain of the third MOS transistor are respectively connected to tap a and tap c on the ninth inductance, the gate of the fourth MOS transistor is connected to tap b in the middle of the ninth inductance, and constitute The input terminal (Prot1) is connected to the output terminal of the voltage-controlled oscillator, and the source of the fourth MOS transistor is respectively connected to one end of the ninth inductor, the grid of the fifth MOS transistor, the drain of the seventh MOS transistor, and the drain of the fourth MOS transistor. The gates of the eight MOS transistors and the drain of the fourth MOS transistor are respectively connected to the other end of the ninth inductor, the gate of the sixth MOS transistor, the drain of the eighth MOS transistor, and the gate of the seventh MOS transistor. The sources of the MOS transistor and the eighth MOS transistor are grounded through the first current source, the sources of the fifth MOS transistor and the sixth MOS transistor are grounded through the second current source, and the drains of the fifth MOS transistor are connected through the seventh inductance A power supply, and an output end connected to the input end of the second-stage injection-locked frequency divider, the drain of the sixth MOS transistor is connected to the power supply through the eighth inductor.
所述的第二级注入锁定分频器包括有第九MOS管、第十MOS管、第十一MOS管和变压器,其中,所述第十一MOS管的栅极构成输入端连接所述第一级注入锁定分频器的输出端,所述第十一MOS管的源极和漏极分别连接变压器初级线圈的两端,所述变压器次级线圈的一端构成输出端的正极或负极连接所述锁相环的输入端,该端还分别连接第九MOS管的漏极和第十MOS管的栅极,所述变压器次级线圈的另一端构成输出端的负极或正极连接所述锁相环的输入端,该端还分别连接第十MOS管的漏极和第九MOS管的栅极,所述第九MOS管和第十MOS管的源极接地。The second-stage injection-locked frequency divider includes a ninth MOS transistor, a tenth MOS transistor, an eleventh MOS transistor and a transformer, wherein the gate of the eleventh MOS transistor constitutes an input terminal connected to the first The output terminal of the first-stage injection-locked frequency divider, the source and drain of the eleventh MOS tube are respectively connected to the two ends of the primary coil of the transformer, and one end of the secondary coil of the transformer constitutes the positive pole or negative pole of the output terminal connected to the The input terminal of the phase-locked loop, which is also connected to the drain of the ninth MOS transistor and the gate of the tenth MOS transistor, the other end of the secondary coil of the transformer constitutes the negative pole of the output terminal or the positive pole is connected to the gate of the phase-locked loop The input terminal is connected to the drain of the tenth MOS transistor and the gate of the ninth MOS transistor respectively, and the sources of the ninth MOS transistor and the tenth MOS transistor are grounded.
本发明的一种采用CMOS工艺实现的太赫兹频率合成器,采用标准的CMOS工艺实现,有集成度高、成本低、易于大规模生产等优点。同时还克服了CMOS工艺截止频率附近工作性能差的限制,实现了太赫兹频率合成器的设计。本发明具有如下优点:A terahertz frequency synthesizer implemented by a CMOS process of the present invention is implemented by a standard CMOS process, and has the advantages of high integration, low cost, and easy mass production. At the same time, it also overcomes the limitation of poor working performance near the cutoff frequency of CMOS technology, and realizes the design of a terahertz frequency synthesizer. The present invention has the following advantages:
1.THz波的波长处于微波及红外光之间,它和物质的相互作用具有独特的物理机制,并呈现出很多新的特点。由于0.3THz-10THz频段的太赫兹波能够很强的穿透像塑料、纸、木料、人体、大气等一类物质,因此它可以广泛应用于安保扫描、射电天文、生物遥感、生产监控等领域,具体分类可以包括邮件扫描、纸类生产、塑料焊接检测、古画分析、人体透视、食品质量检测、皮肤癌分类等。1. The wavelength of THz wave is between microwave and infrared light. Its interaction with matter has a unique physical mechanism and presents many new features. Since the terahertz wave in the 0.3THz-10THz frequency band can strongly penetrate substances such as plastic, paper, wood, human body, atmosphere, etc., it can be widely used in security scanning, radio astronomy, biological remote sensing, production monitoring and other fields , the specific classification can include mail scanning, paper production, plastic welding inspection, ancient painting analysis, human body perspective, food quality inspection, skin cancer classification, etc.
2.该频率合成器能工作在太赫兹频率下,能够克服由于频率接近器件截止频率带来的频率限制,使得输出频率提高到器件实际工作频率之上。2. The frequency synthesizer can work at the terahertz frequency, and can overcome the frequency limitation caused by the frequency close to the cut-off frequency of the device, so that the output frequency can be increased above the actual operating frequency of the device.
3.该设计的功耗、尺寸相对于传统电路有明显改善。3. Compared with the traditional circuit, the power consumption and size of the design are significantly improved.
综上所述,本发明提出的功率放大器结构和实施方法具有良好的应用前景。In summary, the power amplifier structure and implementation method proposed by the present invention have good application prospects.
附图说明Description of drawings
图1是本发明一种采用CMOS工艺实现的太赫兹频率合成器的构成框图;Fig. 1 is a block diagram of the composition of a terahertz frequency synthesizer realized by CMOS technology in the present invention;
图2是本发明中压控振荡器的电路原理图;Fig. 2 is the circuit schematic diagram of voltage-controlled oscillator in the present invention;
图3是本发明中第一级注入锁定分频器的电路原理图;Fig. 3 is the circuit schematic diagram of the first-stage injection-locked frequency divider in the present invention;
图4是本发明中第二级注入锁定分频器的电路原理图。Fig. 4 is a schematic circuit diagram of the second-stage injection-locked frequency divider in the present invention.
具体实施方式detailed description
下面结合实施例和附图对本发明的一种采用CMOS工艺实现的太赫兹频率合成器做出详细说明。A terahertz frequency synthesizer implemented by a CMOS process of the present invention will be described in detail below with reference to the embodiments and the accompanying drawings.
本发明的一种采用CMOS工艺实现的太赫兹频率合成器,是由太赫兹压控振荡器和ILFDs以及分频器链组成。其中压控振荡器用于得到满足太赫兹频率的输出信号;随后的ILFDs(injection locking frequency dividers)和分频器链将信号调整至合适频率。其后端由锁相环进行单独的频率以及相位锁定。A terahertz frequency synthesizer implemented by a CMOS process of the present invention is composed of a terahertz voltage-controlled oscillator, ILFDs and a frequency divider chain. Among them, the voltage-controlled oscillator is used to obtain the output signal satisfying the terahertz frequency; the subsequent ILFDs (injection locking frequency dividers) and frequency divider chain adjust the signal to the appropriate frequency. Its rear end is locked independently by a phase-locked loop in frequency and phase.
由于CMOS工艺的截止频率和最大振荡频率的限制,决定了在接近或超过截止频率的频率下,有源器件性能极大地恶化或无法正常工作。而太赫兹频段仍然处于CMOS工艺的截止频率之上,因此CMOS工艺的集成电路中的有源器件不能直接应用于太赫兹频段。本发明采用基频信号经过功率分离,多路信号路径分别经过功率放大器,产生的功率放大后的信号经过无源器件倍频,倍频之后不再通过有源器件,将得到偶次谐波频率的信号直接进行功率合成与阻抗变换,从而避免了有源器件在过高工作频率下性能的恶化,最终得到太赫兹频段内的输出信号。Due to the limitation of the cut-off frequency and the maximum oscillation frequency of the CMOS process, it is determined that the performance of active devices is greatly deteriorated or cannot work normally at frequencies close to or exceeding the cut-off frequency. However, the terahertz frequency band is still above the cut-off frequency of the CMOS process, so active devices in integrated circuits of the CMOS process cannot be directly applied to the terahertz frequency band. In the present invention, the fundamental frequency signal is separated by power, and the multi-channel signal paths respectively pass through the power amplifier, and the generated power amplified signal is frequency-multiplied by passive devices, and no longer passes through active devices after frequency multiplication, and the even-order harmonic frequency will be obtained The signal is directly subjected to power combination and impedance transformation, thereby avoiding the deterioration of the performance of the active device at an excessively high operating frequency, and finally obtaining an output signal in the terahertz frequency band.
如图1所示,本发明的一种采用CMOS工艺实现的太赫兹频率合成器,包括有依次串联连接的:产生太赫兹LO信号的压控振荡器1,用于进行分频的第一级注入锁定分频器2和第二级注入锁定分频器3,以及用于对达到设定的频率进行锁定的锁相环4,所述锁相环4的反馈输出端连接所述压控振荡器1的反馈输入端。As shown in Fig. 1, a kind of terahertz frequency synthesizer realized by CMOS technology of the present invention includes: a voltage-controlled oscillator 1 generating a terahertz LO signal connected in series, and a first stage for frequency division An injection-locked frequency divider 2 and a second-stage injection-locked frequency divider 3, and a phase-locked loop 4 for locking to a set frequency, the feedback output of the phase-locked loop 4 is connected to the voltage-controlled oscillation Feedback input of device 1.
首先由压控振荡器产生太赫兹LO信号,振荡器输出的可调频率范围为118.6GHz~121GHz。随后信号进入第一级注入锁定分频器和第二级注入锁定分频器以及分频器链进行分频,最后进入锁相环对达到所希望的频率进行锁定。本发明最终实现频率为21GHz,在1MHz处的相位噪声为-74dBc/Hz,直流功耗为174mW。First, a terahertz LO signal is generated by a voltage-controlled oscillator, and the adjustable frequency range of the oscillator output is 118.6GHz to 121GHz. Then the signal enters the first-stage injection-locked frequency divider, the second-stage injection-locked frequency divider and the frequency divider chain for frequency division, and finally enters the phase-locked loop to lock to the desired frequency. The present invention finally achieves a frequency of 21GHz, a phase noise of -74dBc/Hz at 1MHz, and a DC power consumption of 174mW.
如图2所示,所述的压控振荡器1包括有第一MOS管M1、第二MOS管M2、第一电阻R1以及第二电阻R2,其中,所述第一MOS管M1的栅极依次通过第三电感L3和第四电感L4连接第二MOS管M2的栅极,所述第一MOS管M1的栅极还通过第三电容C3与源极一起分别连接可变电容C6的一端及第五电感L5的一端,所述第一MOS管M1的漏极通过第一电感L1连接供电电源VDD,以及通过第一电容C1至输出端正极Prot1连接第一级注入锁定分频器2的输入端,所述第二MOS管M2的栅极还通过第四电容C4与源极一起分别连接可变电容C6的另一端及第六电感L6的一端,所述第二MOS管M2的漏极通过第二电感L2连接供电电源VDD,以及通过第二电容C2至输出端负极Prot1连接第一级注入锁定分频器2的输入端,所述第三电感L3和第四电感L4相连接端依次通过第一电阻R1和偏置电压V1接地,所述第五电感L5的另一端和第六电感L6的另一端连接第二电阻R2和第五电容C5的一端,所述第二电阻R2和第五电容C5的另一端接地。As shown in FIG. 2, the voltage-controlled oscillator 1 includes a first MOS transistor M1, a second MOS transistor M2, a first resistor R1, and a second resistor R2, wherein the gate of the first MOS transistor M1 The gate of the second MOS transistor M2 is connected sequentially through the third inductance L3 and the fourth inductance L4, and the gate of the first MOS transistor M1 is also connected to one end and the source of the variable capacitor C6 through the third capacitor C3 and the source, respectively. One end of the fifth inductor L5, the drain of the first MOS transistor M1 is connected to the power supply VDD through the first inductor L1, and the input of the first-stage injection-locked frequency divider 2 is connected to the positive electrode Prot1 of the output terminal through the first capacitor C1 terminal, the gate of the second MOS transistor M2 is also connected to the other end of the variable capacitor C6 and one end of the sixth inductor L6 through the fourth capacitor C4 and the source, and the drain of the second MOS transistor M2 is connected through The second inductor L2 is connected to the power supply VDD, and is connected to the input terminal of the first-stage injection-locked frequency divider 2 through the second capacitor C2 to the negative electrode Prot1 of the output terminal, and the connection terminals of the third inductor L3 and the fourth inductor L4 are sequentially passed through The first resistor R1 and the bias voltage V1 are grounded, the other end of the fifth inductance L5 and the other end of the sixth inductance L6 are connected to the second resistor R2 and one end of the fifth capacitor C5, the second resistor R2 and the fifth capacitor C5 The other end of the capacitor C5 is grounded.
直流偏置主要由第一MOS管M1、第二MOS管M2、第一电阻R1、第二电阻R2和偏置电压V1以及电阻R2确定,第一电阻R1的值应该尽可能的小,一方面可以减小电压波动,另一方面这个电阻可以看做是与电感串联的电阻,较大的阻值会恶化电感的Q值,影响电路的相位噪声性能,第二电阻R2的作用相当于一个电流源,它一方面要建立起直流偏置,同时要保证其引入的噪声不能过大,因此第二电阻R2阻值的选取也需要根据性能要求进行折衷。经过设计仿真第一电阻R1和第二电阻R2应分别为20Ω和52Ω。与传统的设计相比,这种方法能在预定的基本频率上获得更宽的调谐范围,并能减少品质因子Q的恶化。The DC bias is mainly determined by the first MOS transistor M1, the second MOS transistor M2, the first resistor R1, the second resistor R2, the bias voltage V1 and the resistor R2, the value of the first resistor R1 should be as small as possible, on the one hand It can reduce voltage fluctuations. On the other hand, this resistor can be regarded as a resistor connected in series with the inductor. A larger resistance value will deteriorate the Q value of the inductor and affect the phase noise performance of the circuit. The role of the second resistor R2 is equivalent to a current Source, on the one hand, it needs to establish a DC bias, and at the same time, it must ensure that the noise introduced by it cannot be too large, so the selection of the resistance value of the second resistor R2 also needs to be compromised according to the performance requirements. After design simulation, the first resistor R1 and the second resistor R2 should be 20Ω and 52Ω respectively. Compared with the traditional design, this method can obtain a wider tuning range at the predetermined fundamental frequency and can reduce the deterioration of the quality factor Q.
前一部分的压控振荡器可能产生直流电压失配,因此需要加入第一级注入锁定分频器2和第二级注入锁定分频器3解决这一问题。The voltage-controlled oscillator in the previous part may produce DC voltage mismatch, so it is necessary to add the first-stage injection-locked frequency divider 2 and the second-stage injection-locked frequency divider 3 to solve this problem.
如图3所示,所述的第一级注入锁定分频器2包括有第三MOS管M3、第四MOS管M4、第五MOS管M5、第六MOS管M6、第七MOS管M7和第八MOS管M8,其中,第三MOS管M3的栅极连接外部供电电源Vsw2,第三MOS管M3的源极和漏极分别连接第九电感L9上的a抽头和c抽头,所述第四MOS管M4的栅极连接第九电感L9中部的b抽头,以及构成输入端Prot1连接所述的压控振荡器1的输出端,第四MOS管M4的源极分别连接第九电感L9的一端、第五MOS管M5的栅极、第七MOS管M7的漏极,以及第八MOS管M8的栅极,第四MOS管M4的漏极分别连接第九电感L9的另一端、第六MOS管M6的栅极、第八MOS管M8的漏极,以及第七MOS管M7的栅极,第七MOS管M7和第八MOS管M8的源极通过第一电流源I1接地,所述第五MOS管M5和第六MOS管M6的源极通过第二电流源I2接地,第五MOS管M5的漏极通过第七电感L7连接供电电源VDD,以及构成输出端Prot2连接第二级注入锁定分频器3的输入端,所述第六MOS管M6的漏极通过第八电感L8连接供电电源VDD。As shown in FIG. 3, the first-stage injection-locked frequency divider 2 includes a third MOS transistor M3, a fourth MOS transistor M4, a fifth MOS transistor M5, a sixth MOS transistor M6, a seventh MOS transistor M7 and The eighth MOS transistor M8, wherein the gate of the third MOS transistor M3 is connected to the external power supply Vsw2, and the source and drain of the third MOS transistor M3 are respectively connected to the a tap and the c tap on the ninth inductor L9. The gates of the four MOS transistors M4 are connected to the tap b in the middle of the ninth inductor L9, and the input end Prot1 is connected to the output end of the voltage-controlled oscillator 1, and the sources of the fourth MOS transistor M4 are respectively connected to the ninth inductor L9. One end, the gate of the fifth MOS transistor M5, the drain of the seventh MOS transistor M7, and the gate of the eighth MOS transistor M8, and the drain of the fourth MOS transistor M4 are respectively connected to the other end of the ninth inductor L9, the sixth The gate of the MOS transistor M6, the drain of the eighth MOS transistor M8, and the gate of the seventh MOS transistor M7, the sources of the seventh MOS transistor M7 and the eighth MOS transistor M8 are grounded through the first current source I1, the The sources of the fifth MOS transistor M5 and the sixth MOS transistor M6 are grounded through the second current source I2, the drain of the fifth MOS transistor M5 is connected to the power supply VDD through the seventh inductance L7, and the output terminal Prot2 is connected to the second injection stage. The input terminal of the frequency divider 3 is locked, and the drain of the sixth MOS transistor M6 is connected to the power supply VDD through the eighth inductor L8.
第一级注入锁定分频器2接收前面的压控振荡器给出的输出,其中谐振电感L9将频率的误差控制在1GHz以内,由于分频器的工作频率较低(94GHz),因此谐振电感L9的电感值应控制在120pH,品质因子Q也需要控制在可接受的范围。The first-stage injection-locked frequency divider 2 receives the output given by the previous voltage-controlled oscillator, in which the resonant inductor L9 controls the frequency error within 1GHz. Since the operating frequency of the frequency divider is low (94GHz), the resonant inductor The inductance value of L9 should be controlled at 120pH, and the quality factor Q also needs to be controlled within an acceptable range.
如图4所示,所述的第二级注入锁定分频器3包括有第九MOS管M9、第十MOS管M10、第十一MOS管M11和变压器T,其中,所述第十一MOS管M11的栅极构成输入端Prot2连接所述第一级注入锁定分频器2的输出端,所述第十一MOS管M11的源极和漏极分别连接变压器T初级线圈的两端,所述变压器T次级线圈的一端构成输出端Prot3的正极或负极连接所述锁相环4的输入端,该端还分别连接第九MOS管M9的漏极和第十MOS管M10的栅极,所述变压器T次级线圈的另一端构成输出端Prot3的负极或正极连接所述锁相环4的输入端,该端还分别连接第十MOS管M10的漏极和第九MOS管M9的栅极,所述第九MOS管M9和第十MOS管M10的源极接地。As shown in FIG. 4, the second-stage injection-locked frequency divider 3 includes a ninth MOS transistor M9, a tenth MOS transistor M10, an eleventh MOS transistor M11 and a transformer T, wherein the eleventh MOS The gate of the tube M11 forms an input terminal Prot2 connected to the output terminal of the first-stage injection-locked frequency divider 2, and the source and drain of the eleventh MOS tube M11 are respectively connected to both ends of the primary coil of the transformer T, so One end of the secondary coil of the transformer T constitutes the positive or negative pole of the output terminal Prot3 connected to the input terminal of the phase-locked loop 4, and this terminal is also connected to the drain of the ninth MOS transistor M9 and the grid of the tenth MOS transistor M10, The other end of the secondary coil of the transformer T constitutes the output terminal Prot3. The negative pole or the positive pole is connected to the input terminal of the phase-locked loop 4, and this terminal is also connected to the drain of the tenth MOS transistor M10 and the gate of the ninth MOS transistor M9 respectively. The source electrodes of the ninth MOS transistor M9 and the tenth MOS transistor M10 are grounded.
第二级注入锁定分频器3用于将第一级注入锁定分频器2输出的太赫兹信号进行1/12分频。The second-stage injection-locked frequency divider 3 is used to divide the terahertz signal output by the first-stage injection-locked frequency divider 2 by 1/12.
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