Thereby first purpose of the present invention just provides a kind of method that adopts the low energy ion beam pair cell to modify to reach the improvement species;
Another object of the present invention just provides a kind of device of realizing that the low energy ion beam pair cell is modified.
Adopt ion implantation mutagenesis crops breeding technique, for promoting the farm crop improvement to play vital role.
The principle of ion implantation mutagenesis crops breeding is: arrive in the organism skim ion implantation, mix by energy exchange and the slowing down ionic that injects ion and biomolecules, cause transgenation and reorganization in this skim, thereby reach the purpose of improvement species.
Because the ionic range is controlled, thereby be partial, and be dual: be i.e. energy exchange and quality deposition at the mutagenesis of regional area to the damage of seed.Therefore, under the high situation of species surviving rate, can obtain high mutation rate and wide mutation spectrum
According to Food and Argriculture OrganizationFAO's statistics, gamma-ray and mutagenesis is under medial lethal dose, and average mutation rate is 1%, favourable mutation rate 3/10000ths; And ion implantation mutagenesis is under the situation of surviving rate 90%, average mutation rate 8.4%, favourable mutation rate 1%.This shows the efficiency ratio gamma-rays of ion implantation mutation breeding high tens times even hundreds of times.The more important thing is the spatial resolution of height is arranged on incident direction, differentiate if focusing of ion beam below the micron bundle, just can be realized three-dimensional space because ionic fluid and organism interact.People can utilize this technology to carry out the gene locus operation, thereby solve the directional problems of selection by mutation.
The present invention utilizes low energy ion beam ise cell walls, makes it to form on cell walls micropore, and ion acts on the cytolemma by micropore, forms the passage that biomacromolecule (as the foreign gene molecule) enters cell.
The present invention is by low energy ion and cell surface momentum exchange principle, adapts to various animal and plant cell mutations, removes the cell modification technique of wall.
Method of the present invention is under aseptic condition, with animal and plant cells with 0.5 the degree/minute speed make it to be pre-chilled to the 4-6 degree, by sterilisable chamber, put into the microenvironment target chamber, the vacuum tightness of target chamber is 2 * 10
-4~2 * 10
-6Torr.
The present invention also needs to select different ions according to different purposes:
When making cell mutation, inject N
+, energy is 30-50KeV, dosage is 1 * 10
15~1 * 10
16Between;
When making the cell walls etching, select Ar
+, energy is 10~20KeV, dosage is 1 * 10
14~1 * 10
15Between.
When two cells lean on very closely, use Ar
+Ionic fluid comes inswept, carries out cytogamy; After wall is by ion beam etching, carries out foreign gene and import.
According to thermodynamic principles, the equilibrium moisture that vapour-liquid is practised physiognomy is relevant with vapour pressure.When air pressure descended, the phase surface temperature can descend thereupon.Suppose that a cell is that a radius is the little water droplet of r, is exposed to 10 when its moment
-2During the following vacuum of torr, cell surface one deck will freeze rapidly, and forming thickness is the nilas of dr.As time goes on, nilas extends inward.The existence of nilas prevents the evaporation of internal moisture, and has enough intensity to bear negative pressure, makes the unlikely destruction of cell.Be placed on the interior overlong time of vacuum chamber but work as cell, the nilas of cell surface layer will break because of bearing the negative pressure that does not live in the vacuum chamber.For this reason, the present invention has designed the device of cell modification technique with low energy ion beam.
Apparatus of the present invention comprise:
An ion source,
A main vacuum chamber, this vacuum chamber is furnished with the vacuum unit, leaves a passage, and the ionic fluid that can allow ion source draw passes through, and is injected on the animal and plant cells that is placed on the specimen holder.
A little vacuum chamber, also claim the microenvironment target chamber, this target chamber is to link to each other with big vacuum chamber by segregaion valve, is useful on the specimen holder of placing animal and plant cell species in the target chamber, target chamber is joined a forepump, also has an air-flow treatment facilities and the gas source interface that the high efficiency filter material is housed.
During work, at first big vacuum chamber is evacuated to 2 * 10
-6, the ion source debugging is normal, under sterile environment, pending animal and plant cells is placed on the specimen holder of little vacuum target chamber, the forepump that little vacuum chamber is linked to each other is opened again, vacuumizes 1 minute, makes the vacuum tightness of little vacuum chamber reach 10
-2About torr, open segregaion valve, the true chamber degree in the little vacuum chamber reaches 2 * 10 rapidly
-6Torr, simultaneously, ion source discharge is drawn, and energetic ion is injected on the specimen holder, promptly the animal and plant cell is carried out etching, punching, stoning, and foreign gene shifts cytogamy etc.
The characteristics of apparatus of the present invention are, a little vacuum chamber is arranged, and the volume ratio of big or small vacuum chamber are 1000: 2, and the vacuum tightness of little vacuum chamber only need be extracted into 10 in advance
-1~10
-2Torr is opened valve, and little vacuum chamber just can vacuum tightness reach 10 in the extremely short time
-8About, like this, be placed on the cell on the specimen holder, only need in little vacuum chamber, to place in 10 minutes, just can finish ion implantation, thereby protected processed cell.
Test shows: to the cotton pollen parent cell, placed 4 hours at little vacuum chamber, surviving rate is 20.1%, and places 25 minutes, and surviving rate is 96.0%, and this is equivalent in 20 minutes the survival rate (94.7%) under 40 ℃ of atmospheric condition.
Apparatus of the present invention make (in 10 minutes) in the ion etching process get rid of the influence of vacuum pair cell surviving rate.
The effect of apparatus of the present invention is good.
1. animal and plant cells 10 minutes residence times in target chamber, bear 5 * 10
16After individual ion/square centimeter etching, survival rate can reach 30-70% to various unicellular organisms.
2.GUS CAT and PBI
222Reporter gene changes the paddy rice intact cell over to and mature embryo obtains high level expression through ion-beam mediated, and obtains a large amount of transfer-gen plants.
3. cotton pollen cell and saccharomycetic ionic fluid cytogamy.
4. the stoning of onion culturing cell.
5. the plasmid that has marker gene 2.7Kb imports intestinal bacteria, plasmid in the ion implantation body, mutation rate 30%.