CN105629544A - Display base plate and manufacturing method of display base plate as well as display panel and display device - Google Patents
Display base plate and manufacturing method of display base plate as well as display panel and display device Download PDFInfo
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- CN105629544A CN105629544A CN201610023652.6A CN201610023652A CN105629544A CN 105629544 A CN105629544 A CN 105629544A CN 201610023652 A CN201610023652 A CN 201610023652A CN 105629544 A CN105629544 A CN 105629544A
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- base plate
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- pattern layer
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/133302—Rigid substrates, e.g. inorganic substrates
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- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Abstract
The invention provides a display base plate. The display base plate comprises a substrate base plate and a conductive pattern layer arranged on the substrate base plate, wherein the conductive pattern layer comprises a low-reflection pattern layer arranged on the substrate base plate, and a metal pattern layer formed on the low-reflection pattern layer; the low-reflection pattern layer is made of metal oxide; the metal oxide is obtained by oxidizing a metal material of the metal pattern layer. The invention further provides a display panel, a display device and a manufacturing method of the base plate. When external light penetrates through the transparent substrate base plate to be illuminated on the upper surface of the conductive pattern layer, one part of the light is absorbed by the low-reflection pattern layer; unabsorbed light also forms diffuse reflection to be diffused to different directions and mirror surface reflection is not formed, so that the influences on emergent light of the display device provided by the invention, caused by the reflection of the external environment light, can be reduced, and furthermore, the relatively good display effect is obtained.
Description
Technical field
The present invention relates to Display Technique field, in particular it relates to the manufacture method of a kind of display base plate, this substrate, include the display floater of described display base plate and include the display device of this display floater.
Background technology
The substrate of some display devices includes underlay substrate 100 and the conductive pattern layer 200 being set directly on this underlay substrate 100, and this conductive pattern layer 200 is made up of metal material, as shown in Figure 1.
In the application scenario that some are concrete, the metal level being arranged on underlay substrate is positioned at the outermost of display device, for instance, in touch control display apparatus, conductive pattern layer includes touch-control sensing electrode and touch-control drive electrode. As shown in fig. 1, when the touch control display apparatus including described substrate displays, the light traverse underlay substrate outgoing that display floater sends. But, the minute surface reflective phenomenon ratio that external ambient light (solid arrow in Fig. 1) is formed at the upper surface of described substrate is more serious, when external ambient light is stronger, even influence whether the emergent light (dotted arrow in Fig. 1) of display device, and then have influence on the normal display of display device.
Summary of the invention
It is an object of the invention to provide a kind of display base plate, this substrate will not affect the display effect of display device because metal level is reflective. The present invention also provides for the manufacture method of a kind of display device including described substrate and described substrate.
To achieve these goals, as one aspect of the present invention, a kind of display base plate is provided, described display base plate includes underlay substrate and the conductive pattern layer being arranged on described underlay substrate, wherein, described conductive pattern layer includes the low reflective graphics layer and the formation metal pattern layer on described low reflective graphics layer that are arranged on described underlay substrate, the material of described low reflective graphics layer includes metal-oxide, and described metal-oxide obtains by the metal material of described metal pattern layer carries out oxidation.
Preferably, the material of described metal pattern layer is any one in molybdenum, titanium, molybdenum alloy and titanium alloy or any a few person.
Preferably, the material of described low reflective graphics layer also includes the metallic particles that the material of described metal pattern layer is formed.
Preferably, the thickness of described low reflective graphics layer isExtremely
Preferably, described display base plate is array base palte or touch base plate.
As another aspect of the present invention, it is provided that a kind of display floater, described display floater includes display base plate, and wherein, shown substrate is above-mentioned display base plate provided by the present invention.
Preferably, described display base plate is array base palte, described display floater also includes box substrate, backlight and liquid crystal layer, described to box substrate between described backlight and described liquid crystal layer, described liquid crystal layer is arranged on described between box substrate and described array base palte.
Preferably, described display base plate is touch base plate, and described display floater also includes display screen, and described touch base plate is arranged on the exiting surface of described display screen, and described metal pattern layer is towards described display screen, and described low reflective graphics layer is towards described underlay substrate.
Still another aspect as the present invention, it is provided that a kind of display device, described display device includes display base plate, and wherein, described display base plate is above-mentioned display base plate provided by the present invention.
Still another aspect as the present invention, it is provided that a kind of manufacture method manufacturing above-mentioned display base plate provided by the present invention, wherein, described manufacture method includes:
Underlay substrate is provided;
Sputtering forms low reflection layer, and sputtering target material is metal, and process gas includes oxygen;
Stop passing into oxygen, continue sputtering and form metal level;
Low reflection layer and metal level to forming as one are patterned, to obtain described conductive pattern layer.
Preferably, being formed in the step of low reflection layer in sputtering, process gas also includes the noble gas not reacted with sputtering target material.
Preferably, described noble gas is argon.
Preferably, the material of described target is any one in molybdenum, titanium, molybdenum alloy and titanium alloy or any a few person, and in the step forming low reflection layer, the flow velocity of argon is 500sccm to 700sccm, and the flow velocity of oxygen is 600sccm to 800sccm.
Preferably, the thickness of described low reflection layer existsExtremelyBetween.
In technical scheme provided herein, what directly contact with underlay substrate is low reflective graphics layer, owing to low reflective graphics layer includes the oxide of making the material of metal pattern layer, therefore, the surface of low reflective graphics layer is also rough, and be formed with the defect in some such as spaces etc, thus the upper surface in conductive pattern layer becomes relative coarseness. When extraneous light is radiated on the upper surface of conductive pattern layer through underlay substrate, a part of light is absorbed by low reflective graphics layer, do not have absorbed light can form diffuse-reflectance, scattering is to different directions, direct reflection will not be formed, such that it is able to reduce because of the reflection of external ambient light the emergent light using display device provided by the present invention, it is thus achieved that display effect preferably.
Accompanying drawing explanation
Accompanying drawing is used to provide a further understanding of the present invention, and constitutes the part of description, is used for explaining the present invention, but is not intended that limitation of the present invention together with detailed description below. In the accompanying drawings:
Fig. 1 is the schematic diagram of existing substrate;
Fig. 2 is the schematic diagram of substrate provided by the present invention;
Fig. 3 is a kind of embodiment of display device provided by the present invention;
Fig. 4 is the another embodiment of display device provided by the present invention;
Fig. 5 is the flow chart of manufacture method provided by the present invention.
Description of reference numerals
100: underlay substrate 200: conductive pattern layer
210: low reflective graphics layer 220: metal pattern layer
300: to box substrate 400: backlight
500: liquid crystal layer 600: display screen
Detailed description of the invention
Below in conjunction with accompanying drawing, the specific embodiment of the present invention is described in detail. It should be appreciated that detailed description of the invention described herein is merely to illustrate and explains the present invention, it is not limited to the present invention.
In the present invention, the noun of locality " on ", D score typically refer in Fig. 2 " on ", D score direction.
As one aspect of the present invention, a kind of display base plate is provided, as shown in Figure 2, described display base plate includes underlay substrate 100 and the conductive pattern layer 200 being arranged on this underlay substrate 100, wherein, conductive pattern layer 200 includes the low reflective graphics layer 210 and the formation metal pattern layer 220 on this low reflective graphics layer 210 that are arranged on underlay substrate 100, the material of low reflective graphics layer 210 includes metal-oxide, and this metal-oxide is by the metal material of metal pattern layer 220 carries out oxidation acquisition. Such as, when the material of metal pattern layer 220 is Mo, the material of low reflective graphics layer 210 then can include the oxide of Mo, and when the material of metal pattern layer 220 is Cu, the material of low reflective graphics layer 210 then can include the oxide of Cu.
In the present invention, owing to described display base plate is in display floater, therefore, underlay substrate 100 can be made of clear material, to be formed as the exiting surface of display floater. In addition, extraneous environment light is also the direct irradiation surface at underlay substrate 100.
In technical scheme provided herein, what directly contact with underlay substrate 100 is low reflective graphics layer 210, owing to low reflective graphics layer 210 includes metal-oxide, therefore, the surface of low reflective graphics layer 210 is also rough, such as have the existence of the shapes such as some spaces, so that the surface towards external environment condition of conductive pattern layer 200 (that is, the upper surface in Fig. 2) becomes relative coarseness. When extraneous light is radiated on the upper surface of conductive pattern layer 200 through underlay substrate 100, a part of light is absorbed by low reflective graphics layer 210, absorbed light is not had to form diffuse-reflectance, scattering is to different directions, direct reflection will not be formed, because of the reflection of external ambient light, the emergent light using display device provided by the present invention is caused bad impact such that it is able to reduce, to obtain good display effect.
In the present invention, the concrete structure of described display base plate is not had special restriction, for instance, described substrate can be array base palte, it is also possible to be touch base plate. Hereinafter both of these case will be carried out detailed explanation, first do not repeat here.
In the present invention, the concrete material of metal pattern layer 220 is not done special restriction, for instance, the material of metal pattern layer 220 is can any one or any a few person in molybdenum, titanium, molybdenum alloy and titanium alloy. It is to say, the material of metal pattern layer 220 can be metal molybdenum, it is also possible to be Titanium, it is also possible to be molybdenum alloy or titanium alloy, it is also possible to be the mixture of any several persons in above-mentioned material. Correspondingly, the material of low reflective graphics layer 210 can include any one in the oxide of molybdenum, titanyl compound, the oxide of titanium alloy and the oxide of molybdenum alloy or the mixture of any a few person.
Electric conductivity in order to ensure conductive pattern layer 200, it is preferable that the material of low reflective graphics layer 210 also includes the metallic particles that the material of metal pattern layer 220 is formed. In other words, the mixture that material is metal oxide particle and metallic particles of low reflective graphics layer 210. Owing to the density of metal-oxide Yu metallic particles there are differences, therefore, between metal-oxide and metallic particles, there is the defects such as gap, such that it is able to improve the roughness on low reflective graphics layer 210 surface. Be blended in the metallic particles in metal-oxide can so that low reflective graphics layer 210 has certain electric conductivity, such that it is able to improve the electric conductivity of whole conductive pattern layer 200.
So that conductive pattern layer has light absorption, diffuse-reflectance and electric conductivity concurrently, it is preferable that the thickness of low reflective graphics layer 210 can beExtremely
When described substrate is array base palte, the conductive pattern layer 200 being formed directly on described underlay substrate can include grid line, public electrode wire etc. When described substrate is touch base plate, the conductive pattern layer 200 being formed directly on described underlay substrate can include touch-control drive electrode and touch-control sensing electrode.
As another aspect of the present invention, it is provided that a kind of display floater, described display floater includes display base plate, and wherein, described display base plate is above-mentioned display base plate provided by the present invention.
Owing to described display base plate is arranged on the light emission side of display floater, and the surface that conductive pattern layer 200 and underlay substrate 100 fit is low reflective graphics layer 210, the surface of this low reflective graphics layer 210 is comparatively coarse, therefore, the part being radiated at external environmental light thereon can be absorbed by the surface of low reflective graphics layer 210, a part of diffuse-reflectance, and then the external ambient light impact on the display of display device can be reduced, and obtain good display effect.
Shown in Fig. 3 be described display base plate is the embodiment of array base palte, as shown in Figure 3, described display device also includes box substrate 300, backlight 400 and liquid crystal layer 500, to box substrate 300 between backlight 400 and liquid crystal layer 500, liquid crystal layer 500 is arranged between box substrate 300 and the described display base plate being formed as array base palte. In embodiment shown in figure 3, the size being sized larger than backlight of array base palte, is arranged on array base palte the part that the edge of box substrate is protruded, therefore by the circuit board for transmitting signal, in the embodiment shown in Fig. 3, it is possible to obtain the display device that frame is narrower.
In embodiment shown in figure 3, to box substrate 300 can be provided with color rete.
In the embodiment shown in Fig. 4, described display base plate is touch base plate, and described display device also includes display screen 600, and described touch base plate is arranged on the exiting surface of display screen 600, and metal pattern layer 220 is towards display screen 600, low reflective graphics layer 210 is towards underlay substrate 100. In embodiment shown in the diagram, conductive pattern layer 200 can include touch-control drive electrode and touch-control sensing electrode.
As one aspect of the present invention, it is provided that a kind of display device, described display device includes display base plate, and wherein, described display floater is above-mentioned display base plate provided by the present invention.
In invention, described display device can be the electronic equipments such as mobile phone, panel computer, navigator.
As one aspect of the present invention, it is provided that the manufacture method of display base plate of the present invention, wherein, as described in Figure 5, described manufacture method includes:
Underlay substrate is provided;
Sputtering forms low reflection layer, and sputtering target material is metal, and process gas includes oxygen;
Stop passing into oxygen, continue sputtering and form metal level;
Low reflection layer and metal level to forming as one are patterned, to obtain conductive pattern layer.
It is easily understood that low reflection layer is formed as the low reflective graphics layer of described substrate after graphical, metal level is formed as the metal pattern layer of described substrate after graphical.
In method provided by the present invention, the low reflection layer including metal-oxide can be obtained by controlling the break-make of oxygen, and, in method provided by the present invention, same step patterning processes can obtain the conductive pattern layer 200 including low reflective graphics layer 210 and metal pattern layer 220, therefore, manufacture method provided by the present invention is utilized to manufacture described substrate process simple.
In the present invention, the step performing described low reflection layer to forming as one and metal level is patterned do not had special restriction, it is possible to use dry carving technology can also utilize the wet-etching technique low reflection layer to forming as one and metal level to be patterned. Such as, in the present invention it is possible to utilize the wet-etching technique low reflection layer to forming as one and metal level to be patterned. Specifically, the step low reflection layer formed as one and metal level being patterned includes:
Apply a layer photoetching glue-line on the metal layer;
Utilize mask plate that photoresist layer is exposed;
Subsequently the photoresist layer after exposure is developed;
Utilize etching liquid that described metal level and described low reflection layer are performed etching, to obtain described conductive pattern layer.
Preferably, being formed in the step of low reflection layer in sputtering, process gas also includes the noble gas not reacted with sputtering target material.
In sputtering technology, noble gas is ionized, and bombards target under the influence of a magnetic field, so that metallic comes off from target.
Owing to process gas includes oxygen, oxygen reacts with metallic, forms metal-oxide on described underlay substrate.
In the present invention, described noble gas is preferably argon. Because ar atmo molecular weight is relatively big, described target can be caused bigger bombardment power by the argon plasma that argon ionization is formed, thus being conducive to the carrying out of sputtering.
Preferably, it is possible to the THICKNESS CONTROL of low reflection layer is existedExtremelyBetween.
As mentioned above it is possible, the material of metal pattern layer can be molybdenum, therefore, in the step forming low reflection layer, the flow velocity of argon is 500sccm to 700sccm, and the flow velocity of oxygen is 600sccm to 800sccm. Two kinds of process gas are controlled at above-mentioned flow velocity, it is possible to the film forming speed of low reflection layer is controlledLeft and right, with this speed film forming, it is thus achieved that the oxide of molybdenum and the granule of metal molybdenum mix so that described low reflection layer had both had good electric conductivity, will not form again smooth surface.
The material of described target can also be titanium. In this embodiment, in the step forming low reflection layer, the flow velocity of argon is 500sccm to 700sccm, and the flow velocity of oxygen is 600sccm to 800sccm. In this embodiment, it is possible to obtain composition is the low reflection layer of Titanium granule and the mixture of titanyl compound.
Or, the material of described target can be molybdenum alloy or titanium alloy. Similarly, in both embodiments, in the step forming low reflection layer, the flow velocity of argon is 500sccm to 700sccm, and the flow velocity of oxygen is 600sccm to 800sccm.
As shown in above, it is preferable that the thickness of described low reflection layer isExtremely
It is understood that the principle that is intended to be merely illustrative of the present of embodiment of above and the illustrative embodiments that adopts, but the invention is not limited in this. For those skilled in the art, without departing from the spirit and substance in the present invention, it is possible to make various modification and improvement, these modification and improvement are also considered as protection scope of the present invention.
Claims (14)
1. a display base plate, described display base plate includes underlay substrate and the conductive pattern layer being arranged on described underlay substrate, it is characterized in that, described conductive pattern layer includes the low reflective graphics layer and the formation metal pattern layer on described low reflective graphics layer that are arranged on described underlay substrate, the material of described low reflective graphics layer includes metal-oxide, and described metal-oxide obtains by the metal material of described metal pattern layer carries out oxidation.
2. display base plate according to claim 1, it is characterised in that the material of described metal pattern layer is any one in molybdenum, titanium, molybdenum alloy and titanium alloy or any a few person.
3. display base plate according to claim 1, it is characterised in that the material of described low reflective graphics layer also includes the metallic particles that the material of described metal pattern layer is formed.
4. display base plate as claimed in any of claims 1 to 3, it is characterised in that the thickness of described low reflective graphics layer isExtremely
5. display base plate as claimed in any of claims 1 to 3, it is characterised in that described display base plate is array base palte or touch base plate.
6. a display floater, described display floater includes display base plate, it is characterised in that shown substrate is the display base plate in claim 1 to 5 described in any one.
7. display floater according to claim 6, it is characterized in that, described display base plate is array base palte, described display floater also includes box substrate, backlight and liquid crystal layer, described to box substrate between described backlight and described liquid crystal layer, described liquid crystal layer is arranged on described between box substrate and described array base palte.
8. display floater according to claim 6, it is characterized in that, described display base plate is touch base plate, described display floater also includes display screen, described touch base plate is arranged on the exiting surface of described display screen, and described metal pattern layer is towards described display screen, described low reflective graphics layer is towards described underlay substrate.
9. a display device, described display device includes display base plate, it is characterised in that described display base plate is the display base plate in claim 1 to 5 described in any one.
10. the manufacture method of the display base plate manufactured as described in any one in claim 1 to 5, it is characterised in that described manufacture method includes:
Underlay substrate is provided;
Sputtering forms low reflection layer, and sputtering target material is metal, and process gas includes oxygen;
Stop passing into oxygen, continue sputtering and form metal level;
Low reflection layer and metal level to forming as one are patterned, to obtain described conductive pattern layer.
11. manufacture method according to claim 10, it is characterised in that being formed in the step of low reflection layer in sputtering, process gas also includes the noble gas not reacted with sputtering target material.
12. manufacture method according to claim 11, it is characterised in that described noble gas is argon.
13. manufacture method according to claim 12, it is characterized in that, the material of described target is any one in molybdenum, titanium, molybdenum alloy and titanium alloy or any a few person, in the step forming low reflection layer, the flow velocity of argon is 500sccm to 700sccm, and the flow velocity of oxygen is 600sccm to 800sccm.
14. the manufacture method according to any one in claim 10 to 13, it is characterised in that the thickness of described low reflection layer existsExtremelyBetween.
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| CN201610023652.6A CN105629544B (en) | 2016-01-14 | 2016-01-14 | Display base plate and its manufacturing method, display panel and display device |
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| CN201610023652.6A CN105629544B (en) | 2016-01-14 | 2016-01-14 | Display base plate and its manufacturing method, display panel and display device |
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| CN105629544B CN105629544B (en) | 2019-11-01 |
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| CN108565246A (en) * | 2018-01-03 | 2018-09-21 | 京东方科技集团股份有限公司 | Thin film transistor base plate and preparation method thereof, dot structure, display device |
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| Publication number | Publication date |
|---|---|
| CN105629544B (en) | 2019-11-01 |
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