JP6129611B2 - Manufacturing method of touch panel - Google Patents

Description

  The present invention relates to a method for manufacturing a touch panel.

  In recent years, touch panels have become widespread as input devices for various electronic devices (Patent Documents 1 and 2). Various types of position detection methods such as a resistive film method have been put into practical use as touch panels, and recently, capacitive touch panels capable of multi-touch (multi-point simultaneous input) have attracted attention.

FIG. 5 is a diagram illustrating an example of a conventional touch panel 40 using a projected capacitive method, which is a kind of capacitive method. 5A, 5B, and 5C are plan views of the sensor electrode 42, and FIG. 5D is a cross-sectional view.
In the case of the conventional touch panel 40 shown in the figure, sensor electrodes 42 are formed on both surfaces of one surface 41p of one transparent substrate 41 and the other surface 41q opposite to the one surface 41p. A plurality of X-direction sensor electrodes 42x for position detection extending in the X-axis direction are formed on one surface 41p that is the upper side in the drawing, and the other surface 41q extends in the Y-axis direction orthogonal to the X-axis direction. A plurality of Y-direction sensor electrodes 42y for position detection are formed.

Various electrode patterns of the X-direction sensor electrode 42x and the Y-direction sensor electrode 42y are known in the projection capacitive method, but here, a lattice pattern will be described as a typical pattern.
As shown in the plan view of FIG. 5 (b), the X-direction sensor electrode 42x has a plurality of X-direction sensor electrode elements 42xE that are arranged apart from each other in the X-axis direction and are electrically connected at the corners thereof. It has a pattern shape. In the example shown in the figure, the shape of the X-direction sensor electrode element 42xE is a square shape in the main part except the peripheral part, and both ends in the X-axis direction are triangles cut in half in the X-axis direction. It has a shape.
Similarly to the X-direction sensor electrode 42x, the Y-direction sensor electrode 42y includes a plurality of Y-direction sensor electrode elements 42yE that are arranged apart from each other in the Y-axis direction, as shown in the plan view of FIG. It has a pattern shape that is electrically connected at the corners. The shape of the main part and both ends of the Y-direction sensor electrode element 42yE is the same as that of the X-direction sensor electrode 42x.

  When the X direction sensor electrode 42x and the Y direction sensor electrode 42y are insulated from each other by the transparent base material 41 and formed separately on both surfaces of the transparent base material 41, as shown in the plan view of FIG. The X direction sensor electrode element 42xE and the Y direction sensor electrode element 42yE are stacked so as not to overlap each other in the Z-axis direction, that is, the thickness direction.

JP 2008-97283 A JP 2009-259063 A

However, as shown in the plan view of FIG. 6A, when the positional relationship between the X-direction sensor electrode element 42xE and the Y-direction sensor electrode element 42yE in the XY plane direction is shifted, the sensor electrode 42 becomes a transparent electrode. However, it may be visually recognized as shading unevenness.
In the plan view of FIG. 5A, the X-direction sensor electrode 42x and the Y-direction sensor electrode 42y are shown with different hatching so that they can be easily distinguished from each other. (Indium tin oxide) and the same material. For this reason, in FIG. 6A illustrating the uneven density, the X direction sensor electrode 42x and the Y direction sensor electrode 42y are drawn using the same hatching. Therefore, as a comparison, a diagram corresponding to FIG. 5A drawn as a state in which unevenness in density is not generated is drawn using the same hatching on the X direction sensor electrode 42x and the Y direction sensor electrode 42y. The appearance of the case is shown in the plan view of FIG.

  The unevenness in density is formed by first forming the sensor electrode 42 on one of the one surface 41p and the other surface 41q by a photolithography method or a printing method, and then forming the remaining sensor electrode 42 on the remaining surface. This occurs when the alignment accuracy of the sensor electrode 42 to be formed next is poor with respect to the sensor electrode 42 formed first. The alignment accuracy deteriorates due to differences in environmental conditions such as air temperature and humidity, and processing conditions during patterning of the sensor electrode 42 on one surface 41p and patterning of the sensor electrode 42 on the other surface 41q. This is because the dimensional change and patterning angle of the sensor electrode 42 deviate from the original design. Hereinafter, the alignment accuracy is also referred to as “registration accuracy” in accordance with printing industry terms.

  That is, the subject of this invention is providing the manufacturing method of the touch panel which can improve the registration precision of the sensor electrodes of both surfaces of a transparent base material, and can suppress the uneven density of a sensor electrode resulting from a registration precision defect.

Therefore, in the present invention, a touch panel manufacturing method having the following configuration is adopted.
A sensor electrode for position detection formed on both surfaces of the transparent substrate and the one surface of the transparent substrate, and the other surface opposite to the one surface of the transparent substrate. A method of manufacturing a touch panel having
(A) On both surfaces of the transparent base material, it is opaque to visible light and exposure light, and is patterned in a subsequent process, so that a metal layer that becomes a conductive mesh layer is made of copper, gold, platinum, tin, aluminum Nickel or an alloy thereof is used as a metal foil, a metal vapor deposition film, a metal plating layer or a combination thereof, and the thickness of each metal layer on both surfaces of the transparent substrate is 0.5 μm to 20 μm. Preparing a base material with a metal layer to be formed into a base material preparation step,
(B) a resist layer forming step of forming a photosensitive resist layer on the metal layer on both surfaces of the process substrate;
(C) a double-sided simultaneous exposure step of simultaneously exposing the photosensitive resist layers on both sides in a predetermined pattern different from each other on the both sides;
(D) a development step of developing the photosensitive resist layer on both sides to form a resist pattern layer on both sides;
(E) The conductive mesh in which the metal layer on both sides is etched with the resist pattern layers on both sides to ensure transparency, and the conductive mesh made of a metal layer with an opaque layer is a mesh. Etching process for forming sensor electrodes formed by layers on both sides of the transparent substrate ,
The manufacturing method of a touch panel including each process of this order.

  ADVANTAGE OF THE INVENTION According to this invention, the manufacturing method of the touch panel which can improve the registration precision of the sensor electrodes of both surfaces of a transparent base material, and can suppress the uneven density of a sensor electrode resulting from a registration precision defect can be provided.

Sectional drawing explaining the manufacturing method of the touchscreen by this invention in the one Embodiment. The top view (a) explaining an example of the touch panel by the manufacturing method of this invention, the partial enlarged plan view (b) of the electroconductive mesh layer, the top views (c) and (d) of a sensor electrode, and sectional drawing (e) . The top views (a) and (b) which show the pattern shape of the sensor electrode of each of the two directions which comprise the touch panel of FIG. The top view (a) explaining another example (a sensor electrode is an orthogonal stripe pattern) by the manufacturing method of this invention, and the elements on larger scale (b) which show the overlapping condition of a conductive mesh layer. The top view (a) which shows an example of the conventional touch panel, the top views (b) and (c) of the sensor electrode, and sectional drawing (d). The top view (a) explaining the shading nonuniformity by the sensor electrode which may arise with the conventional touch panel, and the top view (b) explaining the state which the shading nonuniformity has not generate | occur | produced.

    Hereinafter, embodiments of the present invention will be described with reference to the drawings. Note that the drawings are conceptual diagrams, and the scale relations, aspect ratios, and the like of components may be exaggerated as appropriate for convenience of explanation.

<< A >> Touch Panel Manufacturing Method:
First, each process which the manufacturing method of the touchscreen by this invention contains is demonstrated in order with reference to the process drawing in one Embodiment shown in FIG.

<< Process substrate preparation process (a) >>
As shown in FIG. 1A, the process substrate preparation process (a) is a process group with a metal layer in which a metal layer 2A opaque to visible light and exposure light is formed on both surfaces of the transparent substrate 1. This is a step of preparing the material 6.

<Process substrate 6 with metal layer>
The process substrate 6 with a metal layer is opaque to visible light and exposure light on both surfaces of the transparent substrate 1, that is, one surface 1p and the other surface 1q opposite to the one surface 1p. This is a base material used in the manufacturing process on which a simple metal layer 2A is formed.

[Transparent substrate 1]
The transparent substrate 1 is in the form of a sheet or plate, and is not particularly limited as long as it is a transparent and electrically insulating material. For example, a polyester resin such as polyethylene terephthalate or polyethylene terephthalate, or In addition, a resin material using polyether ether ketone, acrylic resin, cyclopolyolefin resin, polycarbonate resin, or a substrate using an inorganic material such as glass or quartz can be used.

In the present invention, the terms “sheet”, “film”, and “plate” are not distinguished from each other only based on the difference in designation.
In the present invention, the transparency of the transparent substrate 1 means that the transparent substrate 1 is transparent to the extent that the visibility of the display of the image display panel viewed through the touch panel is not impaired.
In addition, the transparency of the transparent substrate 1 is preferably colorless and transparent, but various properties required in individual touch panel applications, in particular, within a range that does not impede practicality on display visibility, It may be colored and transparent.

  The thickness of the transparent substrate 1 depends on the screen size in terms of mechanical strength, handleability, etc., but is usually 15 to 5000 μm, usually 25 to 100 μm in the case of a resin material, and usually in the case of an inorganic material. 500 to 3000 μm. This is because if it is less than this range, the mechanical strength and handleability may decrease, and if it exceeds this range, it may hinder thinning.

(Adhesive layer)
Although not shown, the transparent base material 1 is formed from the conductive mesh layer 4a made of a metal layer, and therefore the transparent base material 1 is used when the adhesiveness with the sensor electrode 2 is insufficient. As a constituent element, a known adhesive layer such as an adhesive layer, an anchor layer, or an adhesion reinforcing layer can be provided on the surface on which the sensor electrode 2 is formed. For example, as the adhesive layer, urethane resin, epoxy resin, or the like can be used.

  In the present embodiment, the transparent base material 1 has a biaxially stretched polyethylene terephthalate film as a base body, and has a structure in which a two-component curable urethane resin adhesive layer for bonding a metal layer is provided on both surfaces of the base body. ing.

In the present embodiment, because the metal foil is used for the metal layer constituting the conductive mesh layer 4a to be the sensor electrode 2, the adhesive layer used for bonding the metal foil to the transparent substrate 1 is the sensor electrode. 2 is provided on the entire surface of the transparent substrate 1 on which 2 is formed.
However, in the present invention, when an adhesive layer is provided between the metal layer constituting the conductive mesh layer 4a to be the sensor electrode 2 and the transparent base material 1, the adhesive layer is at least the metal layer and the transparent base material 1 What is necessary is just to be formed between.

[Metal layer 2A]
The metal layer 2A is a layer that finally becomes the conductive mesh layer 4a by being patterned in the subsequent steps.
The metal layer 2A is a layer using a metal as a conductive material, and as a result, is a layer that is opaque to visible light and exposure light. The exposure light is, of course, exposure light when exposing the photosensitive resist layer 5R.

  As the metal used for the metal layer 2A, a highly conductive metal (and also alloys thereof) such as copper, gold, silver, platinum, tin, aluminum, and nickel can be used. In particular, these highly conductive metals have an advantage that the surface resistivity of the surface on which the conductive mesh layer 4a is formed can be lowered as compared with a transparent metal oxide film such as an ITO thin film. The metal layer 2A may be a metal foil, a metal vapor deposition film by vapor deposition, sputtering, etc., a metal plating film by electrolytic plating, electroless plating, or a combination of these, such as a metal plating film laminated on the metal vapor deposition film. it can.

  The thickness of the metal layer 2A is 0.5 μm to 20 μm, usually 1 to 5 μm, in terms of conductivity and transparency when it becomes the conductive mesh layer 4a. When the thickness is less than the above range, the conductivity as a conductor is lowered, and it becomes difficult to balance the transparency and the conductivity. When the thickness exceeds the above range, the conductivity as a conductor is improved, but the aspect ratio of the thickness to the line width is increased, and it is difficult to stably form a thin line.

  In the present embodiment, a copper foil is used for the metal layer 2A. The copper foil may be an electrolytic copper foil or a vapor-deposited copper foil formed by vapor deposition or sputtering. The thickness of the copper foil can be, for example, 10 μm, and the thickness of the ultrathin copper foil can be 1 μm.

<< Resist layer forming step (b) >>
In the resist layer forming step (b), as shown in FIG. 1B, a photosensitive resist layer 5R is formed on the metal layers 2A on both surfaces of the process substrate 6 with a metal layer.
As the photosensitive resist for forming the photosensitive resist layer 5R, known ones such as rubber-based and cinnamic acid ester-based materials can be used. For example, the photosensitive resist may be a dry film or a liquid material. In the process diagram shown in FIG. 1, the photosensitive resist is depicted as a negative type in which an exposed portion remains after development in FIG. 1D of the development process (d) described later, but is not exposed after development. A positive type in which a portion remains may be used.

<< Double-sided simultaneous exposure process (c) >>
The double-sided simultaneous exposure step (c) is a step of simultaneously exposing the photosensitive resist layers 5R formed on both sides with predetermined patterns different from each other as shown in FIG. 1 (c). In the exposure, exposure light is normally exposed through the mask opening through the mask M.
The exposure light is not particularly limited as long as the photosensitive resist is exposed to light. Usually, ultraviolet rays are used, but other than these, electron beams, visible rays, X-rays, and the like may be used.
Even if the two layers are simultaneously exposed in different predetermined patterns, the metal layer 2A is opaque to the exposure light, so that the photosensitive resist layer 5R on the other surface 1q is exposed by the exposure light from one surface 1p. There is no end to it.

  The predetermined pattern is a pattern corresponding to each electrode pattern of the X direction sensor electrode 2x and the Y direction sensor electrode 2y to be formed on both surfaces. In the present embodiment, as the predetermined pattern, a pattern that is compatible with the projection capacitive method is exposed.

  The resist pattern layer 5 can be formed with an exposure method and a double-sided simultaneous exposure method that exposes both sides at the same time. It becomes.

<< Development step (d) >>
In the developing step (d), as shown in FIG. 1D, the photosensitive resist layer 5R on both sides is developed to form the resist pattern layer 5 on both sides. Development can be performed with a known developer, such as an alkaline solution, depending on the material of the resist pattern layer 5.

<< Etching process (e) >>
In the etching step (e), as shown in FIG. 1E, the exposed portions of the resist pattern layer 5 of the metal layer 2A on both sides are etched by the resist pattern layer 5 on both sides to form the sensor electrodes 2 on both sides. It is a process. Etching can be performed with a known etching solution depending on the materials of the metal layer 2A and the resist pattern layer 5, such as dilute sulfuric acid, acidic aqueous solution such as ferric chloride aqueous solution, alkaline aqueous solution such as caustic soda aqueous solution.
The sensor electrode 2 is formed as a transparent conductive layer 4 for ensuring transparency by a conductive mesh layer 4a in which a conductor made of a metal layer 2A having an opaque layer is formed in a mesh shape.

<< Resist removal process (f) >>
The resist removal step (f) is a step of removing the resist pattern layer 5 used as an etching resist in the etching step (e) as shown in FIG.
In this embodiment, this resist removal step (e) is performed. By the resist removing step (e), the resist pattern layer 5 covering the surface of the sensor electrode 2 can be removed to expose the surface of the sensor electrode 2.

  In the present invention, the resist removal step (f) may be omitted. This is because the present step of exposing the sensor electrode 2 can be omitted if there is a means for electrically connecting the sensor electrode 2 to another circuit.

<< Effects of this manufacturing method >>
By using the manufacturing method including the steps as described above, it is possible to increase the registration accuracy between the electrode patterns on both surfaces of the transparent substrate 1 at the time of exposure (less misalignment with the design). The effect of dimensional expansion / contraction of the transparent base material 1 due to heat, stress, moisture absorption / release, etc. applied in the process is equally applied to both the front and back surfaces. The effect of suppressing the occurrence of uneven density in the sensor electrode due to inaccuracy is obtained.

<< B >> Touch panel obtained by the production method of the present invention:
Here, the touch panel obtained by the manufacturing method of the present invention will be described.
Since the transparent base material 1 and the metal layer 2A have already been described in the process base material preparation step (a), the sensor electrode 2 and other elements will be described here.

  The touch panel 10 illustrated in FIG. 2 is an example of a projected capacitive method that is a kind of a capacitive method. 2A, 2B, 2C, and 2D are plan views, and FIG. 2E is a cross-sectional view. 2A is a plan view of the touch panel 10, and FIG. 2E is a cross-sectional view of the touch panel 10. FIG. 2B is a partially enlarged plan view of the conductive mesh layer 4 a constituting the sensor electrode 2 of the touch panel 10. FIGS. 2C and 2D are plan views showing electrode patterns of the sensor electrode 2 of the touch panel 10.

  A touch panel 10 illustrated in FIG. 2 includes a transparent base material 1, and an X-direction sensor electrode 2 x and a Y-direction sensor electrode 2 y for position detection formed on the surface of the transparent base material 1. The sensor electrode 2 is formed as a transparent conductive layer 4 for ensuring transparency by a conductive mesh layer 4a in which a conductor made of a metal layer having an opaque layer is formed in a mesh shape.

  As shown in the cross-sectional view of FIG. 2 (e), the touch panel 10 here has a plurality of surfaces extending in the X-axis direction on the surface of the one surface 1 p that is the upper side of the transparent substrate 1. A plurality of position detection Ys extending in the Y-axis direction orthogonal to the X-axis direction are provided on the surface of the other surface 1q opposite to the one surface 1p. It has direction sensor electrode 2y.

  3 shows that the sensor electrode 2 shown in FIG. 2 is formed on the X-direction sensor electrode 2x formed on one surface 1p of the transparent substrate 1 and the other surface 1q of the transparent substrate 1. It is the top view which showed separately the Y direction sensor electrode 2y made. 3A shows only the X direction sensor electrode 2x (Y direction sensor electrode 2y is not shown), and the plan view of FIG. 3B shows only the Y direction sensor electrode 2y (X direction sensor electrode). 2x is not shown).

  Hereinafter, each component will be described in detail.

<< Sensor electrode 2 >>
The sensor electrode 2 is a position detection electrode. The sensor electrode 2 is formed of the transparent conductive layer 4 so as not to hinder the visual recognition of the display on the image display panel.

The partial enlarged plan view of FIG. 2B shows an example of a mesh pattern of the conductive mesh layer 4 a formed as the transparent conductive layer 4.
In the conductive mesh layer 4a, even if the position detection area of the sensor electrode 2 is large, for example, as in a 40V type monitor display, the surface resistivity can be easily maintained lower than that of a transparent metal oxide film such as ITO. can get.

<Electrode pattern of sensor electrode 2>
In the present embodiment, the electrode pattern of the sensor electrode 2 is a pattern that can be applied to the projected capacitive method.
The sensor electrode 2 required for the projected capacitive touch panel 10 includes a plurality of first sensor electrodes 2 having a first direction as an extending direction, and is insulated from the first sensor electrodes 2. A plurality of second sensor electrodes 2 having a direction intersecting the first direction as a second direction. Usually, the intersection between the first direction and the second direction is orthogonal.

  In the touch panel 10 described here, the first direction is the X-axis direction, the first sensor electrode 2 corresponds to the X-direction sensor electrode 2x, the second direction is the Y-axis direction, and the second sensor electrode 2 Is an example corresponding to the Y-direction sensor electrode 2y.

Various electrode patterns of the X-direction sensor electrode 2x and the Y-direction sensor electrode 2y are known in the projection capacitive method, but here, a typical pattern is a lattice pattern. .
As shown in the plan view of FIG. 2 (c), the X-direction sensor electrode 2x has a plurality of X-direction sensor electrode elements 2xE arranged at a distance from each other in the X-axis direction. The pattern shape is electrically connected at 2 × C. In the example shown in the figure, the shape of the X direction sensor electrode element 2xE is a square shape in the main part except the peripheral part, and both ends in the X axis direction are cut in half in the X axis direction. It has a shape.
Similarly to the X-direction sensor electrode 2x, the Y-direction sensor electrode 2y includes a plurality of Y-direction sensor electrode elements 2yE that are arranged apart from each other in the Y-axis direction, as shown in the plan view of FIG. The corner portion has a pattern shape in which Y-direction electrode element connection portions (not shown) are electrically connected. The shape of the main part and both ends of the Y-direction sensor electrode element 2yE is the same as that of the X-direction sensor electrode 2x.

  When the X direction sensor electrode 2x and the Y direction sensor electrode 2y are separately formed on both surfaces of the transparent substrate 1, as shown in the plan view of FIG. 2A, the X direction sensor electrode elements 2xE and Y The direction sensor electrode element 2yE is formed so as not to overlap each other in the Z-axis direction, that is, the thickness direction.

<Transparent conductive layer 4>
The sensor electrode 2 composed of the X-direction sensor electrode 2x and the Y-direction sensor electrode 2y is a conductor made of a metal layer 2A that is opaque to visible light and exposure light as a transparent conductive layer 4 for ensuring transparency. Is formed by the conductive mesh layer 4a formed in a mesh shape.

  “Transparency” in the translucent conductive layer 4 means that the display of the image display panel can be viewed to the extent that the visibility of the display of the image display panel viewed through the touch panel is not impaired. In the present invention, the transparent conductive layer 4 is an opening that appears to be transparent as a whole when the conductive layer formed by the opaque metal layer 2A is formed in a mesh shape. A conductive mesh layer 4a having a portion 4aO is used.

[Conductive mesh layer 4a]
The pattern shape of the mesh pattern of the conductive mesh layer 4a is not particularly limited. The mesh pattern in FIG. 2B is a square lattice pattern. In addition to such a square lattice, the mesh pattern may be a regular pattern having a periodicity such as a triangular lattice, a rectangular lattice, a pentagonal lattice, a hexagonal lattice, or an irregular pattern including random-shaped openings 4aO. In the case of a square lattice mesh pattern shown in FIG. 2B, the shape of the opening 4aO is a square. The openings 4aO are triangular in a triangular lattice, pentagonal in a pentagonal lattice, and hexagonal in a hexagonal lattice.
The mesh pattern of the conductive mesh layer 4a includes a pattern in which conductors are formed in parallel line groups or stripes, and there are no openings 4aO surrounded by the conductors.
The conductive mesh layer 4a ensures transparency by a conductor non-forming portion such as the opening 4aO of the mesh pattern.

  The line of the conductive mesh layer 4a may have a shape including only a curve, or a shape including a straight line and a curve, in addition to the shape including only a straight line as illustrated in FIG.

  The line width of the conductive mesh layer 4a is appropriately set in the position detection region of the sensor electrode 2 depending on the invisibility according to the viewing distance and the required surface resistivity. For example, the line width may be 50 μm or less, preferably 30 μm or less, more preferably 15 μm or less, and even more preferably 10 μm or less. The lower limit is, for example, 1 μm or more, preferably 3 μm or more in order to ensure the conductivity required for the sensor electrode 2 and avoid disconnection.

When the conductive mesh layer 4a has the opening 4aO in which the conductor non-forming portion is surrounded by the conductor as shown in FIG. 2B, the size of the opening 4aO is, for example, 50 to 2000 μm. The size and line width of the opening 4aO and the volume resistivity and thickness of the conductive mesh layer 4a itself affect the surface resistivity. These are determined according to the surface resistivity required for the sensor electrode 2.
Here, the size of the opening 4aO is defined as the longest diagonal length when the opening 4aO has a polygonal shape.

When the mesh pattern is a regular pattern, moire may occur due to interference between the periodicity of the opening 4aO or the conductor non-forming portion and the periodicity of the pixel arrangement of the image display panel. When moire occurs, a so-called bias angle is set by tilting the arrangement direction of the openings 4aO of the mesh pattern of the conductive mesh layer 4a or the conductor non-formation portion with respect to the arrangement direction of the pixel arrangement of the image display panel. Also good. The mesh pattern of the conductive mesh layer 4a shown in FIG. 2B is an example in which a bias angle of 45 degrees is set. The bias angle is set within a range exceeding 0 degree and less than 90 degrees. By setting the bias angle, moire can be made inconspicuous.

  As an irregular mesh pattern, JP2012-178556A (electromagnetic wave shielding material, laminated body and image display device), JP2013-5013A (transparent antenna, and the like) which are patents published by the present applicant. In addition, a mesh pattern that can be defined using a Voronoi diagram, which is disclosed in Japanese Patent Application Laid-Open No. 2003-260260, etc., can also be employed. This mesh pattern can reduce the periodicity very effectively, and as a result, the occurrence of moire can be reduced extremely effectively without setting the bias angle.

<< Variation of this manufacturing method >>
The manufacturing method of the touch panel by this invention can take other forms other than the above-mentioned form. Some of these will be described below.

<Other processes>
In addition to the steps described above, the method for manufacturing a touch panel according to the present invention includes a step of forming a take-out circuit 3 (see reference numeral 3 in FIG. 2A), a step of forming a protective layer, a step of attaching a flexible printed board, and a touch panel drive A known process such as a circuit attaching process may be included.
As these steps and materials used therefor, known methods and materials can be employed.

  For example, for the extraction circuit 3, the materials and formation methods described for the sensor electrode 2 can be employed. At this time, the extraction circuit 3 may be formed of the same material as the sensor electrode 2 at the same time. By simultaneously forming the extraction circuit 3 with the same material as the sensor electrode 2, it is possible to form the extraction circuit 3 without increasing the number of steps. The extraction circuit 3 can include wiring, electrodes, connection terminals, and the like.

  The protective layer can be formed, for example, by attaching a protective film to a portion where the sensor electrode 2 or the like does not require electrical contact with other components, thereby improving reliability. be able to.

<Electrode member for touch panel>
The touch panel 10 manufactured by the manufacturing method of the present invention may include all components for operating as a touch panel including a touch panel drive circuit and the like, but at a minimum, only the transparent substrate 1 and the sensor electrode 2 are included. It may be composed of The touch panel 10 manufactured by the manufacturing method of the present invention includes a transparent substrate 1 and the sensor electrode 2 alone, or a transparent substrate 1, the sensor electrode 2, and a take-out circuit 3. It can also be referred to as “electrode member for touch panel”.

<Electrode pattern of sensor electrode 2>
As for the electrode pattern of the sensor electrode 2, FIGS. 2 and 3 are patterns that can be applied to the projected capacitive method.
However, the electrode pattern of the sensor electrode 2 in which the manufacturing method of the present invention is effective may be in accordance with the position detection method, and various known patterns can be employed.
In the present invention, the position detection method of the sensor electrode 2 may be any method other than the projected capacitance method as long as the sensor electrode 2 is formed on both surfaces of the transparent substrate 1. -

For example, the sensor electrodes 2 formed on both surfaces of the transparent substrate 1 may be a pattern having portions that overlap each other in the thickness direction.
The plan view of FIG. 4 is an example of such a configuration. The pattern of the sensor electrode 2 included in the touch panel 10 in the figure is also a pattern that can correspond to the projection capacitive method, and includes a plurality of X-direction sensor electrodes 2x and a plurality of Y-direction sensor electrodes 2y. An X-direction sensor electrode 2x is formed on one surface 1p of the transparent substrate 1, and a Y-direction sensor electrode 2y is formed on the other surface 1q. The conductive mesh layer 4a constituting the X direction sensor electrode 2x and the Y direction sensor electrode 2y is a square lattice pattern as illustrated in the partial enlarged plan view of FIG. 4B, but the X direction sensor electrode 2x and the Y direction The mesh pattern of the sensor electrode 2y has a relationship in which the lattice pitch is shifted by half. In this case, if the relative positions of the X-direction sensor electrode 2x and the Y-direction sensor electrode 2y deviate from this state by half the lattice pitch, the mesh patterns overlap each other. For this reason, if the overlapping state of the mesh patterns is deviated, the apparent transmittance may change depending on the degree of overlapping, resulting in shading unevenness.

<< C >> Use:
The use of the touch panel 10 obtained by the manufacturing method of the present invention is not particularly limited. For example, it may be used on an image display panel or a display surface such as a black and white or color printed matter represented by a halftone dot or a photograph formed on photographic paper.
An image display device configured by applying the touch panel 10 obtained by the manufacturing method of the present invention to an image display panel includes, for example, a portable information terminal such as a tablet computer, various telephones such as a smartphone, a television receiver, a personal computer, Equipped with position input means such as electronic book terminal, monitor display, digital camera, digital photo frame, measuring instrument, medical equipment, game machine, office equipment, cash dispenser, electronic blackboard, vending machine, etc. An image display device.

DESCRIPTION OF SYMBOLS 1 Transparent base material 1p One side 1q The other side 2 Sensor electrode 2A Metal layer 2x X direction sensor electrode 2xC X direction electrode element connection part 2xE X direction sensor electrode element 2y Y direction sensor electrode 2yE Y direction sensor electrode element 3 Extraction circuit DESCRIPTION OF SYMBOLS 4 Transparent conductive layer 4a Conductive mesh layer 4aO Opening 5 Resist pattern layer 5R Photosensitive resist layer 6 Process base material with a metal layer 10 Touch panel 40 Conventional touch panel 41 Transparent base material 41p One side 41q The other side 42 Sensor electrode 42x X direction sensor electrode 42xE X direction sensor electrode element 42y Y direction sensor electrode 42yE Y direction sensor electrode element M Mask

Claims (1)

A sensor electrode for position detection formed on both surfaces of the transparent substrate and the one surface of the transparent substrate, and the other surface opposite to the one surface of the transparent substrate. A method of manufacturing a touch panel having
(A) A metal layer that is opaque to visible light and exposure light on both surfaces of the transparent base material and becomes a conductive mesh layer by patterning in the following steps is made of copper, gold, platinum, tin, aluminum, Nickel or an alloy thereof is used as a metal foil, a metal vapor-deposited film, a metal plating layer, or a combination thereof, and the thickness of each metal layer on both surfaces of the transparent substrate is 0.5 μm to 20 μm. Preparing a process substrate with the metal layer to be formed, preparing a process substrate,
(B) a resist layer forming step of forming a photosensitive resist layer on the metal layer on both surfaces of the process substrate;
(C) a double-sided simultaneous exposure step of simultaneously exposing the photosensitive resist layers on both sides in a predetermined pattern different from each other on the both sides;
(D) a development step of developing the photosensitive resist layer on both sides to form a resist pattern layer on both sides;
(E) The conductive mesh in which the metal layer on both sides is etched with the resist pattern layers on both sides to ensure transparency, and the conductive mesh made of a metal layer with an opaque layer is a mesh. Etching process for forming sensor electrodes formed by layers on both sides of the transparent substrate ,
The manufacturing method of a touch panel including each process of this order.

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