CN105487727A - Capacitive touch panel and manufacturing method thereof - Google Patents
Capacitive touch panel and manufacturing method thereof Download PDFInfo
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- CN105487727A CN105487727A CN201410474266.XA CN201410474266A CN105487727A CN 105487727 A CN105487727 A CN 105487727A CN 201410474266 A CN201410474266 A CN 201410474266A CN 105487727 A CN105487727 A CN 105487727A
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Abstract
The invention relates to a capacitive touch panel and a manufacturing method thereof. The capacitive touch panel comprises a substrate and a silver nanowire electrode layer. The silver nanowire electrode layer is arranged on one surface of the substrate and comprises a first electrode series arrayed along the first direction, first conducting wires, and a second electrode series arrayed along the second direction. The first electrode series comprises multiple first silver nanowire conducting units. The second electrode series comprises multiple second silver nanowire conducting units. Perforations communicating through upper and lower surfaces, are arranged in the region for second silver nanowire conducting units. The first silver nanowire conducting units are connected with the first conducting wires. The second silver nanowire conducting units are conducted with bridging wires via conduction material in the perforations. The bridging wires are arranged on one side, different from the silver nanowire electrode layer, on the substrate. The capacitive touch panel is advantaged by being low in resistance and easy in process.
Description
[technical field]
The present invention relates to touch-control field, particularly relate to a kind of capacitance type touch-control panel and manufacture method thereof.
[background technology]
Contact panel technology has become the input equipment of the easiest current man-machine communication.In view of touch-screen have easy, reaction velocity fast, save space, be easy to many advantages such as interchange, touch panel technologies is more and more wide in the range of application of China, it is not only widely used in the electronic installation carried with, as smart mobile phone, panel computer or notebook computer, also be widely used in ad information device simultaneously, Industry Control, military commanding, electronic game, multimedia teaching, real estate presell, and the inquiry unit of public information, as the service inquiry etc. of the departments such as telecommunication bureau, the tax bureau, bank, electric power.
Existing the most frequently used contact panel is capacitance type touch-control panel, and capacitance type touch-control panel technology utilizes the induction of the electric current of human body to carry out work, and it has easy and simple to handle, supports the plurality of advantages such as multi-point touch.Along with the development of infotech, the requirement of people to contact panel is more and more higher, it is mainly reflected in two broad aspect, the precision of first contact panel, two is the thickness of contact panel, highly sensitive lightening contact panel is the consistent pursuit of industry, especially lightening, and it has become a large attraction of to vie each other between contact panel manufacturer in recent years and comparing with.
Usually, mostly adopt tin indium oxide (ITO) as conductive electrode material at existing contact panel, because phosphide element is a kind of rare earth element, smaller in the memory space of the Nature, its price comparison is expensive, tin indium oxide improves the manufacturing cost of contact panel to a great extent as the conductive material of contact panel, in addition, the resistance of ITO is higher, it has had influence on touch sensitivity to a certain extent, if reduce sheet resistance, then need electrode layer thickening, this not only can improve preparation cost further, also can reduce the penetrability of electrode layer, simultaneously, the development trend increasing thickness and existing lightening electronic equipment is disagreed.Again, what the making of ITO electrode layer adopted is gold-tinted technique, and gold-tinted manufacturing process is complicated, and equipment cost is high, therefore it inhibits the development of contact panel industry to a certain extent.
In sum, touch panel industry be made to develop more fast, so, we need to find really in a hurry, and that a kind of new scheme can solve existing for ITO is expensive, the shortcomings such as resistance is high, complex process, damage-retardation poor performance.
[summary of the invention]
For overcoming prior art Problems existing, the invention provides a kind of low resistance, the simple capacitance type touch-control panel of technique and manufacture method thereof.
The scheme of technical solution problem of the present invention is to provide a kind of capacitance type touch-control panel, comprise a substrate and a nano-silver thread electrode layer, nano-silver thread electrode layer is arranged on substrate one on the surface, described nano-silver thread electrode layer comprises the first electrode array, the first wire-connecting and second electrode array along second direction arrangement of arranging along first direction, first electrode array comprises multiple first nano-silver thread conductive unit, and the second electrode array comprises multiple second nano-silver thread conductive unit; Substrate is provided with the perforation of through upper and lower surface in corresponding second nano-silver thread conductive unit region; First nano-silver thread conductive unit is connected by the first wire-connecting, and the second nano-silver thread conductive unit is conducted by the conductive material in perforation and bridging line, and described bridging line is arranged at the one side that substrate differs from nano-silver thread electrode layer.
Preferably, described nano-silver thread electrode layer comprises matrix and is distributed in many nano-silver threads in described matrix, described many nano-silver threads overlap formation conductive network mutually, the thickness of described first nano-silver thread conductive unit and the second nano-silver thread conductive unit is 10nm-5 μm, sheet resistance is for being less than 100ohm/sq, the line length of the every bar nano-silver thread in described many nano-silver threads is between 20-50 μm, and wire diameter is less than 500nm, and length breadth ratio is greater than 400.
Preferably, comprise a perforation in the graphics field of each second nano-silver thread conductive unit, the perforation in the second adjacent nano-silver thread conductive electrode unit is connected by bridging line.
Preferably, a bridging line connects all second nano-silver thread conductive units on the second electrode array by perforation conducting.
Preferably, the bridging line of two parallel side-by-side connects all second nano-silver thread conductive units on the second electrode array by perforation conducting.
Preferably, the length of bridging line is greater than the distance between the second electrode array head and the tail two the second nano-silver thread conductive units.
Preferably, comprise the first cabling and the second cabling further, described first cabling is connected with the one or both ends of described first electrode array, and described second cabling is connected with the one or both ends of described second electrode array.
Preferably, described first electrode array and/or the second electrode array comprise at least two sub-electrode strings arranged in parallel respectively, at least two strip electrode arrays of this first nano-silver thread electrode array are electrically connected in same one end, and at least two strip electrode arrays of this second nano-silver thread electrode array are electrically connected in same one end.
Preferably, nano-silver thread electrode layer both sides more arrange adhesion promoting layer, levelling blanket, one or more layers among optical match layer, two or three layers among adhesion promoting layer, levelling blanket, optical match layer homonymy or the heteropleural that can be arranged on nano-silver thread electrode layer, optical match layer, between adhesion promoting layer and levelling blanket three, position is interchangeable.
The another technical scheme that the present invention solves the problems of the technologies described above is to provide a kind of manufacture method of capacitance type touch-control panel, comprises the following steps:
S11 a: substrate is provided;
S12: form electrode pattern at upper surface of base plate impression;
S13: carry out perforation processing procedure to substrate, forms perforation;
S14: the pattern forming bridging line at substrate back impression; And
S15: filled conductive material in perforation.
Preferably, in step S13 and step S14, first impression carries out substrate punching after forming electrode pattern, and the pattern of now electrode pattern and bridging line is formed simultaneously.
Preferably, in step s 12, electrode pattern utilizes roller mode of printing to impress.
Preferably, in step s 12, the material of electrode pattern is the radio frequency slurries such as nano-silver thread, conductive silver paste, copper slurry, conducting metal slurry or conductive carbon paste.
Preferably, in step s 13, processing procedure of boring a hole utilizes radium-shine perforation, mould perforation or bore mode to carry out.
The technical scheme again that the present invention solves the problems of the technologies described above is to provide a kind of manufacture method of capacitance type touch-control panel, comprises the following steps:
S21 a: substrate is provided;
S22: carry out perforation processing procedure to substrate, forms perforation;
S23: form electrode pattern at upper surface of base plate impression; And
S24: form bridging line pattern and filled conductive material in perforation simultaneously at base lower surface impression.
Preferably, in step S23 and S24, while upper surface of base plate impression forms electrode pattern, form bridging line pattern at base lower surface impression and complete the filling of conductive material in perforation simultaneously.
Preferably, in step s 24 which, first after base lower surface impression forms bridging line pattern, then in perforation filled conductive material.
Preferably, in step S22, perforation processing procedure utilizes radium-shine perforation, mould perforation or bore mode to carry out.
Preferably, in step S23, electrode pattern utilizes roller mode of printing to impress.
Preferably, in step S23, the material of electrode pattern is the radio frequency slurries such as nano-silver thread, conductive silver paste, copper slurry, conducting metal slurry or conductive carbon paste.
Compared with prior art, the nano-silver thread electrode layer of capacitance type touch-control panel of the present invention is made after mainly have employed nano-silver thread patterning, it is low that nano-silver thread has price as touch control electrode conductive material, resistance is low, frivolous, the advantages such as flexibility is good, the more important thing is, capacitance type touch-control panel of the present invention is by being arranged at base lower surface by bridging line, by the mode of back side bridge joint, the making of bridging line is made to become simple, only need print one deck nano-silver thread layer at the substrate back punch position of correspondence, while simplifying technique, compare and above the first wire-connecting, to form bridging line need to lay insulation course on wire-connecting, the present invention adopts back side bridge joint, therefore without the need to laying insulation course, meet the development trend that contact panel is lightening.Bridging line is formed at substrate back, form pattern more for convenience, the specification pattern of bridging line can realize variation, and make the patterning of bridging line formed with the formation of electrode pattern by together with processing procedure complete and achieve possibility, in volume to volume processing procedure, roller impression in top forms electrode pattern, and roller impression in below forms bridging line pattern, achieve the simplification of technique, save cost of manufacture.
In addition, bridging line is arranged at the lower surface of substrate, and bridging line can not be subject to curved surface tension force, thus makes bridging line stable connection, not easily breaks, can improving product yield greatly.
[accompanying drawing explanation]
Fig. 1 is the cross section structure schematic diagram that nano-silver thread electrode layer is distributed on substrate.
Fig. 2 is the planar structure schematic diagram that nano-silver thread electrode layer is distributed on substrate.
Fig. 3 is first embodiment of the invention capacitance type touch-control panel perspective view.
Fig. 4 is the nano-silver thread electrode layer planar structure schematic diagram of first embodiment of the invention capacitance type touch-control panel.
Fig. 5 is the cross section structure schematic diagram of first embodiment of the invention capacitance type touch-control panel along Y-direction.
Fig. 6 is the bridging line schematic diagram of first embodiment of the invention capacitance type touch-control panel.
Fig. 7 is the cabling schematic diagram of first embodiment of the invention capacitance type touch-control panel.
Fig. 8 is the bridging line schematic diagram of second embodiment of the invention capacitance type touch-control panel.
Fig. 9 is the planar structure schematic diagram of third embodiment of the invention capacitance type touch-control panel.
Figure 10 is the first manufacture method process flow diagram of fourth embodiment of the invention capacitance type touch-control panel.
Figure 11 is the schematic flow sheet of the first manufacture method of fourth embodiment of the invention capacitance type touch-control panel.
Figure 12 is the second manufacture method process flow diagram of fifth embodiment of the invention capacitance type touch-control panel.
Figure 13 is the schematic flow sheet of the first manufacture method of fifth embodiment of the invention capacitance type touch-control panel.
Figure 14 is the third manufacture method process flow diagram of sixth embodiment of the invention capacitance type touch-control panel.
Figure 15 is the schematic flow sheet of the third manufacture method of sixth embodiment of the invention capacitance type touch-control panel.
Figure 16 is the 4th kind of manufacture method process flow diagram of seventh embodiment of the invention capacitance type touch-control panel.
Figure 17 is the schematic flow sheet of the 4th kind of manufacture method of seventh embodiment of the invention capacitance type touch-control panel.
Figure 18 is eighth embodiment of the invention capacitive touch control panel structure schematic diagram.
Figure 19 is the structural representation of ninth embodiment of the invention capacitance type touch-control panel.
Figure 20 is the structural representation of tenth embodiment of the invention capacitance type touch-control panel.
Figure 21 is the structural representation of eleventh embodiment of the invention capacitance type touch-control panel.
[embodiment]
In order to make object of the present invention, technical scheme and advantage are clearly understood, below in conjunction with accompanying drawing and embodiment, are further elaborated to the present invention.Should be appreciated that specific embodiment described herein only in order to explain the present invention, be not intended to limit the present invention.
Silver is when nanoscale, and nano-silver thread has good transmittance and splendid electric conductivity, can be good at the conductive electrode applying to contact panel.
Refer to Fig. 1 and Fig. 2, it is the schematic diagram that nano-silver thread electrode layer 1005 is distributed on substrate 1003, the many nano-silver threads 1001 that nano-silver thread electrode layer 1005 comprises matrix 1007 and is embedded in matrix 1007, nano-silver thread 1001 mutually overlap joint forms conductive network.The line length of nano-silver thread 1001 is 10 μm-300 μm, be preferably 20 μm-100 μm, its length optimum is 20 μm-50 μm, wire diameter is less than 500nm, or is less than 200nm, 100nm, preferably be less than 50nm, and its length breadth ratio ratio of wire diameter (line length with) is greater than 10, is preferably greater than 50, more preferably greater than 100.Substrate 1003 is generally transparent insulation material.
Nano-silver thread 1001 scatters or embeds in matrix 1007, forms conductive network, and rely on matrix 1007 to form nano-silver thread electrode layer 1005, matrix 1007 can protect nano-silver thread 1001 not to be subject to the impact of the external environments such as burn into wearing and tearing.
Matrix 1007 refers to that nano-silver thread solution is being arranged on substrate 1003 through methods such as coatings, after heating, drying makes volatile material volatilize, stays the non-nano silver line material on substrate 1003.Nano-silver thread solution refers to, nano-silver thread 1001 is dispersed in the aaerosol solution formed in specific solvent, and this solvent can be water, aqueous solution, solion, saline solns, supercritical fluid, oil or its potpourri etc.Also can other adjuvant be contained, as spreading agent, surfactant, crosslinking chemical, stabilizing agent, wetting agent or thickening agent, but not as limit in this solvent.
The thickness of nano-silver thread electrode layer 1005 is about 10nm-5 μm, and be preferably 20nm-1 μm, more excellent is 10nm-200nm, and sheet resistance is less than 100ohm/sq.In certain embodiments, the refractive index of nano-silver thread electrode layer 1005 is 1.3-2.5, and more excellent is 1.35-1.8.
Refer to Fig. 3, first embodiment of the invention capacitance type touch-control panel 10 comprises substrate 11 and a nano-silver thread electrode layer 13, and nano-silver thread electrode layer 13 is formed at substrate 11 1 on the surface, and namely substrate 11 is the adhesion layer of nano-silver thread electrode layer 13.Nano-silver thread electrode layer 13 comprises in a first direction multiple first electrode arrays 131 that (hereinafter referred to as X-direction) array is arranged, multiple second electrode arrays 133 of (hereinafter referred to as Y-direction) array setting in a second direction, multiple first electrode arrays 131 constitute the touch control electrode in both direction respectively with multiple second electrode array 133.
Refer to Fig. 4, first electrode array 131 and the second electrode array 133 are that nano-silver thread 1001 patterning is formed, first electrode array 131 comprises multiple first nano-silver thread conductive unit 1311, it is rhombus, realize series connection by many first wire-connectings 1315 between first nano-silver thread conductive unit 1311, between the first adjacent between two electrode array 131, comprise multiple first vacancy section 1313.Correspondingly, the second electrode array 133 comprises multiple second nano-silver thread conductive unit 1331, and is also rhombus, independent toward each other between the second nano-silver thread conductive unit 1331.Look over from the front of capacitance type touch-control panel 10, the first nano-silver thread conductive unit 1311 on first electrode array 131 and the second nano-silver thread conductive unit 1331 zero lap region on the second electrode array 133, that is, second nano-silver thread conductive unit 1331 is arranged in the first vacancy section 1313, best, the first nano-silver thread conductive unit 1311 on first electrode array 131 and pattern complementary between the second nano-silver thread conductive unit 1331 on the second electrode array 133, the material making light pass nano-silver thread electrode layer 13 like this maintains unanimously as far as possible, optical effect is best, overcome the light brought because of material refractive index difference uneven, appear the shortcomings such as electrode pattern in one's mind.
Please continue to refer to Fig. 5, Fig. 6, due to independent toward each other between the second nano-silver thread conductive unit 1331, realization is not had to electrically conduct, for making it to electrically conduct, need to adopt " bridging structure ", substrate 11 upper surface is placed with multiple first electrode array 131 and multiple second electrode array 133, first nano-silver thread conductive unit 1311 of the first electrode array 131 is in series by the first wire-connecting 1315, second nano-silver thread conductive unit 1331 of the second electrode array 133 is separate, be provided with its upper and lower two surperficial perforation 111 through on the substrate 11, this perforation 111 is corresponding with the second nano-silver thread conductive unit 1331, in the present embodiment, the corresponding perforation 111 of each second nano-silver thread conductive unit 1331, this perforation 111 may correspond to the arbitrary place being arranged at the second nano-silver thread conductive unit 1331 pattern, conductive material is perfused with in it.Being provided with bridging line 18 below substrate 11, the perforation 111 that bridging line 18 bridge joint two is adjacent, for connecting adjacent two the second nano-silver thread conductive units 1331 of conducting, finally making the second electrode array 133 realize conducting.
Described conductive material can be nano-silver thread conductive material, conductive silver paste, copper slurry or the radio frequency slurry such as other conducting metals slurry or conductive carbon paste.First electrode array 131 and the second electrode array 133 by together with processing procedure patterning formed.
The shape of described perforation 111 can be circular, square, rhombus, triangle, polygon, or irregular figure, and its width is 5 μm-60 μm, is preferably 10 μm-40 μm.
In the present embodiment, article one, bridging line 18 connects all second nano-silver thread conductive units 1331 on the second electrode array 133 by perforation 111 conducting, the length of described bridging line 18 is more than or equal to the distance between the second electrode array 133 head and the tail two the second nano-silver thread conductive units 1331, width is greater than the width of perforation 111, bridging line 18 covers perforation 111 completely to ensure the complete conducting between the second nano-silver thread conductive unit 1331, and the material of bridging line 18 adopts nano-silver thread.
Please continue to refer to Fig. 7, capacitance type touch-control panel 10 of the present invention also comprises the cabling (non-label) being communicated with touch control electrode and external flexible circuits plate (being called for short FPC), cabling comprises many first cablings 171 and many second cablings 173, each first electrode array 131 is connected to FPC by two the first cablings 171, each second electrode array 133 is connected to FPC by two the second cablings 173, like this, first electrode array 131 and the second electrode array 133 form bilateral cabling by many first cablings 171 and the second cabling 173, it strengthens signal transmission, attenuated signal is decayed, even if on same first electrode array 131 or the second electrode array 133 wherein first cabling 171 or wherein second cabling 173 there is broken string phenomenon, capacitance type touch-control panel 10 still can keep normal work.This first cabling 171 and the second cabling 173 material are nano-silver thread 1001, its can together with nano-silver thread electrode layer 13 technique together patterning formed, also can adopt conventional I TO touch-screen technique, by twice processing procedure respectively patterning formed.
The present embodiment also comprises following distortion:
Cabling is except adopting nano-silver thread 1001 and being formed, in further embodiments, cabling can also be formed after other transparent or opaque patterns of conductive materials, and described transparent conductive material is as ITO, IZO (ZnO:In), AZO (ZnO:Al), GZO (ZnO:Ga), IGZO (In:Ga:Zn), NANO CRYSTAL COPPER WIRE, Graphene, polyaniline, PEDOT.PSS, electrically conducting transparent macromolecular material, carbon nano-tube, Graphene etc.; Described opaque conductive material is as conducting metal Al, Ag, Au, Cu etc., or conducting metal stepped construction MoAlMo, MoNb etc.
First nano-silver thread conductive unit 1311 and the second nano-silver thread conductive unit 1331 can be rectangles, and it can also be triangle, hexagon, polygon, circle, other arbitrary shapes such as waveform or irregular figure.
Compared with prior art, the nano-silver thread electrode layer 13 of the present embodiment capacitance type touch-control panel 10 is made after mainly have employed nano-silver thread patterning, it is low that nano-silver thread has price as touch control electrode conductive material, resistance is low, frivolous, the advantages such as flexibility is good, the more important thing is, the present embodiment capacitance type touch-control panel 10 is by being arranged at substrate 11 lower surface by bridging line 18, by the mode of back side bridge joint, the making of bridging line 18 is made to become simple, one deck nano-silver thread layer is printed in 111 positions of only need boring a hole at substrate 11 back side of correspondence, while simplifying technique, compare and above the first wire-connecting 1315, form bridging line 18 need to lay insulation course on wire-connecting, the present embodiment adopts back side bridge joint, therefore without the need to laying insulation course, meet the development trend that contact panel is lightening.Bridging line 18 is formed on substrate 11 back side, and form pattern more for convenience, the specification pattern of therefore bridging line 18 can realize variation, and patterning forming process is simple.
In addition, bridging line 18 is arranged at the lower surface of substrate 11, and bridging line can not be subject to curved surface tension force, thus makes bridging line 18 stable connection, not easily breaks, can improving product yield greatly.
Refer to Fig. 8, the structure of second embodiment of the invention capacitance type touch-control panel 20 is substantially identical with the first embodiment, the one side of substrate 21 forms multiple first electrode array 231 and multiple second electrode array 233, be connected by the first wire-connecting 2315 between first nano-silver thread conductive unit 2311 of the first electrode array 231, second nano-silver thread conductive unit 2331 of the second electrode array 233 is by forming bridging line 28 conducting at substrate 21 another side, difference is only: connected by two bridging lines 28 arranged in parallel between all second nano-silver thread conductive units 2331 on the second electrode array 233, realize electrically conducting of the second electrode array 233, article two, all perforation 211 of all second nano-silver thread conductive unit 2331 correspondences connect by bridging line 28, its length is greater than the distance of the second electrode array 233 head and the tail two the second nano-silver thread conductive units 2331, width is slightly wider than perforation 211 width.It can also be three or many.
By being provided with many bridging lines 28, it can realize low line resistance, and makes bridge joint more stable, greatly improve touch-control sensitivity, even and if wherein a bridging line 28 rupture, other bridging lines 28 still normally work, reduce product waste paper rate, improving product yield greatly.
Refer to Fig. 9, the structure of third embodiment of the invention capacitance type touch-control panel 30 is substantially identical with the first embodiment, substrate 31 is arranged nano-silver thread electrode layer 33, this nano-silver thread electrode layer 33 comprises multiple the first electrode array 331 in X direction and multiple the second electrode array 333 along Y-direction, spaced set between first electrode array 331 and the second electrode array 333, difference is: the first electrode array 331 comprises two the first sub-electrode strings 3312 be parallel to each other, article two, be arranged in parallel between the first sub-electrode string 3312 and form electricity connection end at two the first sub-electrode strings 3312 with one end, second electrode array 333 is similar with it, but the nano-silver thread conductive unit 3331 of the second sub-electrode string 3332 is conducted each other by the bridging line 38 below substrate 31, realize being electrically connected, the kind of bridging line 38 can be selected from any one or its combination in above-mentioned bridging line.Thus, even if electrode array wherein there is the situation of rupture of line in a strip electrode array time, do not affect the normal work of capacitance type touch-control panel 30 yet.
Refer to Figure 10 and Figure 11, fourth embodiment of the invention provides a kind of production method of above-mentioned capacitance type touch-control panel, for the first embodiment capacitance type touch-control panel 10, specifically comprises the following steps:
S11 a: substrate 11 is provided;
S12: surface imprint forms electrode pattern on the substrate 11;
S13: carry out perforation processing procedure to base 11, forms perforation 111;
S14: the pattern forming bridging line 18 at substrate 11 back side impression; And
S15: filled conductive material in perforation 111.
In step s 11, substrate can be glass, tempered glass, sapphire glass or flexible transparent substrate are as PEEK (polyetheretherketone), PI (polyimide), PET (polyethylene terephthalate), PC (polycarbonate), PES (any one or its both material such as compound arbitrarily of polyethylene glycol succinate, PMMA (polymethylmethacrylate).The water droplet angle of described substrate 11 is less than 30 °, is preferably less than 10 °.
In step s 12, adopt volume to volume (rolltoroll) processing procedure, the cylinder be now positioned at above substrate 11 is electrode roller 121, it is printed with the pattern matched with electrode pattern, when electrode roller 121 rolls across a circle, namely completes a substrate 11 top electrode graphic-print, the simultaneously filling of nano-silver thread in finishing patterns, roller below substrate 11, for supporting roller 122, plays supporting function, realize volume to volume together with electrode roller 121.In step s 12, the material of electrode pattern is except being except nano-silver thread, and common conductive silver paste, copper slurry or the radio frequency slurry such as other conducting metals slurry or conductive carbon paste are all the equivalent equivalent material that can select.
In step s 13, the spacing of the second nano-silver thread conductive unit 1331 of the second electrode array 133 that the position of perforation processing procedure middle punch 111 and the spacing reference of perforation 111 will be shaping is arranged.
Perforation processing procedure adopts radium-shine perforation, and radium-shine rifle 124 is suspended from above substrate 11, launches laser penetration substrate 11, forms perforation 111.Perforation processing procedure also can use the perforation means such as common mould perforation or boring.
In step S14, imprinting process and S12 similar, in volume to volume processing procedure, now be positioned at above substrate 11 be support roller 122, roller below substrate 11 is bridging line roller 123, it is printed with the pattern of required bridging line 18, bridging line roller 123 rolls across a circle, completes the imprint patterns of the bridging line 18 of one piece of substrate 11 and the filling of nano-silver thread in finishing patterns at the same time.
In step S15, the conductive material in perforation 111 can be nano-silver thread, conductive silver paste, copper slurry or the radio frequency slurry such as other conducting metals slurry or conductive carbon paste, preferably adopts nano-silver thread.
In volume to volume processing procedure, now be positioned at above substrate 11 for support roller 122, below is for filling roller 125, both have coordinated the filling to conductive material in perforation 111, similar with S13, S14, when filling roller 125 rolls across a circle, the filling of conductive material in the perforation 111 namely completing a substrate 11.
Refer to Figure 12 and Figure 13, be the second manufacture method of fifth embodiment of the invention capacitance type touch-control panel, for the first embodiment capacitance type touch-control panel 10, specifically comprise the following steps:
S21 a: substrate 11 is provided;
S22: surface imprint forms electrode pattern and forms bridging line 18 pattern at lower surface impression simultaneously on the substrate 11;
S23: carry out perforation processing procedure to base 11, forms perforation 111; And
S24: filled conductive material in perforation 111.
The method and the difference of method described in the 4th embodiment be in step s 12 by the pattern of electrode pattern and bridging line 18 by together with volume to volume processing procedure namely complete, it is now electrode roller 121 above substrate 11, it is bridging line roller 123 below substrate 11, two rollers roll across the impression that namely a circle completes electrode pattern on one piece of substrate 11 and bridging line 18 pattern, and in electrode pattern and bridging line 18 pattern, fill nano-silver thread while impression.Step S23 perforation processing procedure utilizes radium-shine perforation, mould perforation or bore mode to carry out.
Refer to Figure 14 and Figure 15, be the third manufacture method of sixth embodiment of the invention capacitance type touch-control panel, for the first embodiment capacitance type touch-control panel 10, specifically comprise the following steps:
S31 a: substrate 11 is provided;
S32: carry out perforation processing procedure to substrate 11, forms perforation 111;
S33: surface imprint forms electrode pattern on the substrate 11; And
S34: form bridging line 18 pattern and filled conductive material in perforation 111 simultaneously at substrate 11 lower surface impression.
Described in the method and the 4th embodiment, the difference of method is: advanced eleven punch 11 processing procedure, carry out the impression of electrode pattern again, then together with the impression of bridging line 18 pattern being merged into the filling of conductive material in processing procedure, impression and the 8th embodiment of electrode pattern are similar, completed together with the support roller 122 of below by the electrode roller 121 above substrate 11, in step S34, surface is for supporting roller 122, below is bridging line roller 123, while both have cooperated the impression of bridging line 18 pattern, bridging line roller 123 also has the function of filling roller, complete the task of filled conductive material in perforation 111.Step S32 perforation processing procedure utilizes radium-shine perforation, mould perforation or bore mode to carry out.Step S34 can also first after substrate 11 lower surface impression forms bridging line 18 pattern, then in perforation 111 filled conductive material.
Refer to Figure 16 and Figure 17, be the 4th kind of manufacture method of seventh embodiment of the invention capacitance type touch-control panel, for the first embodiment capacitance type touch-control panel 10, specifically comprise the following steps:
S41 a: substrate 11 is provided;
S42: carry out perforation processing procedure to base 11, forms perforation 111; And
S43: surface imprint formation electrode pattern forms bridging line 18 pattern at lower surface impression simultaneously and completes the filling of conductive material in perforation 111 at the same time on the substrate 11.
The method simplifies further on the basis of method described in the 6th embodiment, S33 and S34 is merged and is completed by a step, make the final impression realizing being completed by one processing procedure electrode pattern, the filling of conductive material in the impression of bridging line 18 pattern and perforation 111, bridging line roller 121 now below substrate 11 is the same with the bridging line roller of the tenth embodiment, be responsible for impression form bridging line 18 pattern and in bridging line 18 pattern, fill nano-silver thread and the task of filled conductive material in perforation 111 simultaneously, with above substrate 11 electrode roller 121 form together with realize volume to volume.Step S43 can also first after substrate 11 lower surface impression forms bridging line 18 pattern, then in perforation 111 filled conductive material.
Refer to Figure 18, in eighth embodiment of the invention capacitance type touch-control panel 91 and embodiment one to embodiment three, the difference of any embodiment is only: the present embodiment arranges an adhesion promoting layer 912 between substrate 911 and nano-silver thread electrode layer 913, therefore capacitance type touch-control panel 91 comprises a substrate 911 from top to bottom, one adhesion promoting layer 912, nano-silver thread electrode layer 913.One deck adhesion promoting layer 912 is applied between substrate 911 and nano-silver thread electrode layer 913, the coated area of adhesion promoting layer 912 is 100% of nano-silver thread electrode layer 913 surface area, or 80%-90%, minimumly be not less than 50%, nano-silver thread electrode layer 913 surface area that is shaped with nano-silver thread 1001 of coated area is for benchmark herein, namely when nano-silver thread electrode layer 913 be greater than, be less than or equal to substrate 911 surface area time, coated area is 100% of nano-silver thread electrode layer 913 surface area, or 80%-90%, be minimumly not less than 50%.
The expansion coefficient of described adhesion promoting layer 912 is less than the expansion coefficient of substrate 911, and the configuration of adhesion promoting layer 912 can reduce the degree that flexible base plate 911 produces warpage in film forming manufacturing process, greatly improves the yield of product.
The material of described adhesion promoting layer 912 can be selected from high molecular polymer, insulating material, resin, transparent optical cement, oxide, class photoresistances etc., include but not limited to: material or their combination in any such as polyacetylene, polyaniline, polyarylene, polythiophene, Graphene.
Refer to Figure 19, ninth embodiment of the invention contact panel 92 is only with the difference of any embodiment in embodiment one to embodiment three: the present embodiment arranges a levelling blanket 924 on nano-silver thread electrode layer 923 surface, therefore, capacitance type touch-control panel 92 comprises a substrate 921 from top to bottom, one nano-silver thread electrode layer 923, levelling blanket 924.
Levelling blanket 924 is coated in above nano-silver thread electrode layer 923, and after rolling technology process, the overlap joint area between nano-silver thread 1001 can be made to increase thus improve contact rate and the conductance of nano-silver thread 1001, thus reaching good flatness.Described levelling blanket 924 is positioned at above nano-silver thread electrode layer 923, or preferably, nano-silver thread electrode layer 923 is partially submerged in levelling blanket 924 in a thickness direction.
The material of described levelling blanket 924 can be selected from high molecular polymer, insulating material, resin, transparent optical cement, oxide, class photoresistance etc., include but not limited to: polyacetylene, polyaniline, polyarylene, polythiophene, Graphene gather 3,4-ethylidene dioxy fen (PEDOT), etc. material or their combination in any.
Refer to Figure 20, tenth embodiment of the invention contact panel 93 is only with the difference of any embodiment in embodiment one to embodiment three: the present embodiment arranges an optical match layer 936 at nano-silver thread electrode layer 933 lower surface, therefore capacitance type touch-control panel 93 comprises a substrate 931 from top to bottom, one nano-silver thread electrode layer 933, optical match layer 936.In other embodiments, optical match layer 936 also can be arranged on the upper surface of nano-silver thread electrode layer 933 or be arranged on upper surface and the lower surface of nano-silver thread electrode layer 933 simultaneously
There is certain haze issues in nano-silver thread, in order to the display effect making whole contact panel reach best, this variant embodiment arranges optical match layer 936 at nano-silver thread electrode layer 933 lower surface of contact panel, this optical match layer 936 is the blooming of one deck low-refraction, it can reduce the reflection of nano-silver thread 1001, described low-refraction is that refractive index is less than 1.6, preferably 1.1 ~ 1.6.Optical match layer 936 can be organism or inorganics, or organic and inorganic mixed coating.Such as Si oxide, chloro-fluoride, magnesium fluoride, silicon dioxide, preferred refractive index is 1.1,1.25,1.32,1.38,1.46,1.50,1.52.The optical film thickness of optical match layer 936 is 1/4 wavelength odd-multiple.After increasing by an optical match layer 936 in the present embodiment, the mist degree of nano-silver thread electrode layer 933 can be reduced to about 5%, is preferably less than 3%, 2%, 1.5%.
For reducing mist degree further, described substrate 931 can be replaced 1/4 wavelength retarder plate, when light is by producing reflection during quarter-wave retardation plate, because optical path difference postpones, incident light and reflected light are offset, thus can reduce reflected light, reduce the mist degree of nano-silver thread in nano-silver thread electrode layer 933.In addition, by arranging quarter-wave retardation plate above nano-silver thread electrode layer 933, simultaneously the line polarisation of LCD or OLED can be changed into rotatory polarization, thus under polarized sunglasses, watch the phenomenon that Touch Screen there will not be delustring.
Above-mentioned levelling blanket 924, adhesion promoting layer 912, optical match layer 936 can optional one be added in contact panel, also can optional two add or all add.
Refer to Figure 21; eleventh embodiment of the invention contact panel 94 is only with the difference of any embodiment in embodiment one to embodiment three: this contact panel comprises a cover plate 945; nano-silver thread electrode layer 943 and a substrate 941; this nano-silver thread electrode layer 943 is formed at substrate 941 upper surface; substrate 941 is fitted tightly by laminating layer 949 with the one side of cover plate 945; the another side of this cover plate 945; namely the laying face differing from nano-silver thread electrode layer 943 can be touch operation surface, and this cover plate 945 can play the effect of protection nano-silver thread electrode layer 943 simultaneously.Cover plate 945 is connected with substrate 941 by laminating layer 949.In Figure 21, nano-silver thread electrode layer 943 is arranged between substrate 941 and laminating layer 949.In other embodiments, nano-silver thread electrode layer 943 also can be arranged on the side that substrate 941 deviates from laminating layer 949, and namely from view, nano-silver thread electrode layer 943 is positioned at the lower surface of described substrate 941.In addition, the inventive point of other embodiments is all applicable to the present embodiment.
The foregoing is only preferred embodiment of the present invention, not in order to limit the present invention, all any amendments done within principle of the present invention, equivalent replacement and improvement etc. all should comprise within protection scope of the present invention.
Claims (20)
1. a capacitance type touch-control panel, comprise a substrate and a nano-silver thread electrode layer, nano-silver thread electrode layer is arranged on substrate one on the surface, it is characterized in that: described nano-silver thread electrode layer comprises the first electrode array, the first wire-connecting and second electrode array along second direction arrangement of arranging along first direction, first electrode array comprises multiple first nano-silver thread conductive unit, and the second electrode array comprises multiple second nano-silver thread conductive unit;
Substrate is provided with the perforation of through upper and lower surface in corresponding second nano-silver thread conductive unit region;
First nano-silver thread conductive unit is connected by the first wire-connecting, and the second nano-silver thread conductive unit is conducted by the conductive material in perforation and bridging line, and described bridging line is arranged at the one side that substrate differs from nano-silver thread electrode layer.
2. capacitance type touch-control panel as claimed in claim 1, it is characterized in that: described nano-silver thread electrode layer comprises matrix and is distributed in many nano-silver threads in described matrix, described many nano-silver threads overlap formation conductive network mutually, the thickness of described first nano-silver thread conductive unit and the second nano-silver thread conductive unit is 10nm-5 μm, sheet resistance is for being less than 100ohm/sq, the line length of the every bar nano-silver thread in described many nano-silver threads is between 20-50 μm, wire diameter is less than 500nm, and length breadth ratio is greater than 400.
3. capacitance type touch-control panel as claimed in claim 1, it is characterized in that: comprise a perforation in the graphics field of each second nano-silver thread conductive unit, the perforation in the second adjacent nano-silver thread conductive electrode unit is connected by bridging line.
4. the capacitance type touch-control panel as described in any one of claim 3, is characterized in that: a bridging line connects all second nano-silver thread conductive units on the second electrode array by perforation conducting.
5. the capacitance type touch-control panel as described in any one of claim 3, is characterized in that: the bridging line of two parallel side-by-side connects all second nano-silver thread conductive units on the second electrode array by perforation conducting.
6. the capacitance type touch-control panel as described in any one of claim 4 or 5, is characterized in that: the length of bridging line is greater than the distance between the second electrode array head and the tail two the second nano-silver thread conductive units.
7. capacitance type touch-control panel as claimed in claim 1, it is characterized in that: comprise the first cabling and the second cabling further, described first cabling is connected with the one or both ends of described first electrode array, and described second cabling is connected with the one or both ends of described second electrode array.
8. capacitance type touch-control panel as claimed in claim 1, it is characterized in that: described first electrode array and/or the second electrode array comprise at least two sub-electrode strings arranged in parallel respectively, at least two strip electrode arrays of this first nano-silver thread electrode array are electrically connected in same one end, and at least two strip electrode arrays of this second nano-silver thread electrode array are electrically connected in same one end.
9. capacitance type touch-control panel as claimed in claim 1, it is characterized in that: nano-silver thread electrode layer both sides more arrange adhesion promoting layer, levelling blanket, one or more layers among optical match layer, two or three layers among adhesion promoting layer, levelling blanket, optical match layer homonymy or the heteropleural that can be arranged on nano-silver thread electrode layer, optical match layer, between adhesion promoting layer and levelling blanket three, position is interchangeable.
10. a manufacture method for capacitance type touch-control panel, is characterized in that, comprises the following steps:
S11 a: substrate is provided;
S12: form electrode pattern at upper surface of base plate impression;
S13: carry out perforation processing procedure to substrate, forms perforation;
S14: the pattern forming bridging line at substrate back impression; And
S15: filled conductive material in perforation.
The manufacture method of 11. capacitance type touch-control panels as claimed in claim 10, is characterized in that: in step S14 and step S13, first impression carries out substrate punching after forming electrode pattern, and the pattern of now electrode pattern and bridging line is formed simultaneously.
The manufacture method of 12. capacitance type touch-control panels as claimed in claim 10, is characterized in that: in step s 12, electrode pattern utilizes roller mode of printing to impress.
The manufacture method of 13. capacitance type touch-control panels as claimed in claim 10, is characterized in that: in step s 12, and the material of electrode pattern is the radio frequency slurries such as nano-silver thread, conductive silver paste, copper slurry, conducting metal slurry or conductive carbon paste.
The manufacture method of 14. capacitance type touch-control panels as claimed in claim 10, is characterized in that: in step s 13, and perforation processing procedure utilizes radium-shine perforation, mould perforation or bore mode to carry out.
The manufacture method of 15. 1 kinds of capacitance type touch-control panels, is characterized in that, comprises the following steps:
S21 a: substrate is provided;
S22: carry out perforation processing procedure to substrate, forms perforation;
S23: form electrode pattern at upper surface of base plate impression; And
S24: form bridging line pattern and filled conductive material in perforation simultaneously at base lower surface impression.
The manufacture method of 16. capacitance type touch-control panels as claimed in claim 15, it is characterized in that: in step S23 and S24, while upper surface of base plate impression forms electrode pattern, form bridging line pattern at base lower surface impression and complete the filling of conductive material in perforation simultaneously.
The manufacture method of 17. capacitance type touch-control panels as claimed in claim 15, is characterized in that: in step s 24 which, first after base lower surface impression forms bridging line pattern, then in perforation filled conductive material.
The manufacture method of 18. capacitance type touch-control panels as claimed in claim 15, is characterized in that: in step S22, and perforation processing procedure utilizes radium-shine perforation, mould perforation or bore mode to carry out.
The manufacture method of 19. capacitance type touch-control panels as claimed in claim 15, is characterized in that: in step S23, electrode pattern utilizes roller mode of printing to impress.
The manufacture method of 20. capacitance type touch-control panels as claimed in claim 15, is characterized in that: in step S23, and the material of electrode pattern is the radio frequency slurries such as nano-silver thread, conductive silver paste, copper slurry, conducting metal slurry or conductive carbon paste.
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108538450A (en) * | 2018-06-30 | 2018-09-14 | 云谷（固安）科技有限公司 | Conductive film structure and preparation method thereof, touch panel and display screen |
| CN108920035A (en) * | 2018-06-30 | 2018-11-30 | 云谷（固安）科技有限公司 | Touch panel and preparation method thereof |
| CN112416156A (en) * | 2019-08-23 | 2021-02-26 | 陕西坤同半导体科技有限公司 | Touch display panel and preparation method |
Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012073992A (en) * | 2010-09-29 | 2012-04-12 | Samsung Mobile Display Co Ltd | Touch screen panel and manufacturing method therefor |
| US20130155011A1 (en) * | 2011-12-16 | 2013-06-20 | Lg Innotek Co., Ltd. | Electrode pattern of touch panel and forming method for the same |
| CN103246401A (en) * | 2013-03-21 | 2013-08-14 | 友达光电股份有限公司 | Sensing element structure of touch panel and manufacturing method thereof |
| CN103294308A (en) * | 2013-05-09 | 2013-09-11 | 晟光科技股份有限公司 | Improved GF (glass-film)-structured touch screen and connection method for FPC (flexible printed circuit) thereof |
| CN103389819A (en) * | 2012-05-11 | 2013-11-13 | 群康科技(深圳)有限公司 | Touch panel and display applying same |
| US20130341398A1 (en) * | 2012-06-21 | 2013-12-26 | Authentec, Inc. | Finger sensing device including finger sensing integrated circuit die within a recess in a mounting substrate and related methods |
| CN203720807U (en) * | 2013-11-22 | 2014-07-16 | 胜华科技股份有限公司 | Touch control panel |
| CN204155256U (en) * | 2014-09-17 | 2015-02-11 | 宸鸿科技(厦门)有限公司 | A kind of capacitance type touch-control panel |
-
2014
- 2014-09-17 CN CN201410474266.XA patent/CN105487727A/en active Pending
Patent Citations (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2012073992A (en) * | 2010-09-29 | 2012-04-12 | Samsung Mobile Display Co Ltd | Touch screen panel and manufacturing method therefor |
| US20130155011A1 (en) * | 2011-12-16 | 2013-06-20 | Lg Innotek Co., Ltd. | Electrode pattern of touch panel and forming method for the same |
| CN103389819A (en) * | 2012-05-11 | 2013-11-13 | 群康科技(深圳)有限公司 | Touch panel and display applying same |
| US20130341398A1 (en) * | 2012-06-21 | 2013-12-26 | Authentec, Inc. | Finger sensing device including finger sensing integrated circuit die within a recess in a mounting substrate and related methods |
| CN103246401A (en) * | 2013-03-21 | 2013-08-14 | 友达光电股份有限公司 | Sensing element structure of touch panel and manufacturing method thereof |
| CN103294308A (en) * | 2013-05-09 | 2013-09-11 | 晟光科技股份有限公司 | Improved GF (glass-film)-structured touch screen and connection method for FPC (flexible printed circuit) thereof |
| CN203720807U (en) * | 2013-11-22 | 2014-07-16 | 胜华科技股份有限公司 | Touch control panel |
| CN204155256U (en) * | 2014-09-17 | 2015-02-11 | 宸鸿科技(厦门)有限公司 | A kind of capacitance type touch-control panel |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN108538450A (en) * | 2018-06-30 | 2018-09-14 | 云谷（固安）科技有限公司 | Conductive film structure and preparation method thereof, touch panel and display screen |
| CN108920035A (en) * | 2018-06-30 | 2018-11-30 | 云谷（固安）科技有限公司 | Touch panel and preparation method thereof |
| CN108538450B (en) * | 2018-06-30 | 2020-07-07 | 广州国显科技有限公司 | Conducting film structure, manufacturing method thereof, touch panel and display screen |
| CN112416156A (en) * | 2019-08-23 | 2021-02-26 | 陕西坤同半导体科技有限公司 | Touch display panel and preparation method |
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