CN105487347A - Spring-damping-based dynamic-magnetic-steel magnetic levitation dual-stage vector arc switching method and device - Google Patents
Spring-damping-based dynamic-magnetic-steel magnetic levitation dual-stage vector arc switching method and device Download PDFInfo
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Abstract
基于弹簧阻尼的动磁钢磁浮双工件台矢量圆弧换台方法及装置属于半导体制造装备技术,该装置包括支撑框架、平衡质量块、磁浮工件台、工件台测量装置、工件台驱动装置,两个工件台工作于测量位和曝光位之间,采用平面光栅对工件台位置进行测量,采用四组平面片簧组成的被动补偿结构对平衡质量块进行运动补偿,工件台采用动磁钢式磁悬浮平面电机驱动,双工件台交换过程中,采用平面电机驱动两个工件台实现单节拍弧线快速换台;本发明解决了现有换台方案节拍多、轨迹长、起停环节多、稳定时间长等问题,减少换台环节,缩短了换台时间,提高了光刻机的产率。
The moving magnet steel magnetic levitation double workpiece table vector arc transfer method and device based on spring damping belong to the semiconductor manufacturing equipment technology. The two workpiece tables work between the measurement position and the exposure position. The position of the workpiece table is measured by a flat grating, and the passive compensation structure composed of four sets of flat leaf springs is used to compensate the movement of the balance mass. The workpiece table adopts a moving magnet steel type. Driven by a magnetic levitation planar motor, in the process of exchanging double workpiece tables, a planar motor is used to drive two workpiece tables to realize a single-beat arc rapid exchange; Long stabilization time and other problems, reduce the link of changing the stage, shorten the time of changing the stage, and improve the productivity of the lithography machine.
Description
技术领域technical field
本发明属于半导体制造装备技术领域,主要涉及基于弹簧阻尼的动磁钢磁浮双工件台矢量圆弧回转换台方法及装置。The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a method and a device for a moving magnet steel maglev double workpiece table vector arc return conversion table based on spring damping.
背景技术Background technique
光刻机是极大规模集成电路制造中重要的超精密装备之一。作为光刻机关键子系统的工件台在很大程度上决定了光刻机的分辨率、套刻精度和产率。Lithography machine is one of the important ultra-precision equipment in the manufacture of very large scale integrated circuits. As the key subsystem of the lithography machine, the workpiece table largely determines the resolution, overlay accuracy and productivity of the lithography machine.
产率是光刻机发展的主要追求目标之一。在满足分辨率和套刻精度的条件下,提高工件台运行效率进而提高提高光刻机产率是工件台技术的发展方向。提高工件台运行效率最直接的方式就是提高工件台的运动加速度和速度,但是为保证原有精度,速度和加速度不能无限制提高。最初的工件台只有一个硅片承载装置,光刻机一次只能处理一个硅片,全部工序串行处理,生产效率低。为此有人提出了双工件台技术,这也是目前提高光刻机生产效率的主流技术手段。双工件台技术在工件台上设有曝光、预处理两个工位和两个工件台,曝光和测量调整可并行处理,大大缩短了时间,提高了生产效率。目前的代表产品为荷兰ASML公司基于Twinscan技术即双工件台技术的光刻机。Productivity is one of the main goals of lithography machine development. Under the condition of satisfying the resolution and overlay accuracy, improving the operating efficiency of the workpiece table and thus improving the productivity of the lithography machine is the development direction of the workpiece table technology. The most direct way to improve the operating efficiency of the workpiece table is to increase the motion acceleration and speed of the workpiece table, but in order to ensure the original accuracy, the speed and acceleration cannot be increased without limit. The initial workpiece table only had one silicon wafer carrier, and the lithography machine could only process one silicon wafer at a time. All processes were processed serially, and the production efficiency was low. For this reason, someone has proposed a double worktable technology, which is also the mainstream technical means to improve the production efficiency of lithography machines. The double worktable technology has two work stations for exposure and pretreatment and two workbenches on the workbench. The exposure and measurement adjustment can be processed in parallel, which greatly shortens the time and improves the production efficiency. The current representative product is the lithography machine based on the Twinscan technology, that is, the double-workpiece technology of ASML company in the Netherlands.
提高双工件台的运行效率是目前光刻机工件台技术的发展目标之一。双工件台技术的牵扯到工件台在两个工位之间切换的问题,换台效率直接影响到光刻机工件台的运行效率即光刻机的产率。如何在尽可能缩短换台时间的条件下减小换台对其他系统的干扰一直是研究的重点。在传统双台切换过程中,工件台在曝光和预处理工序中一样为直线驱动,双台专利US2001/0004105A1和W098/40791中,每个工件台有两个可交换配合的单元来实现双台的交换,在不提高工件台运动速度的前提下提高了产率,但由于工件台与导轨之间采用耦合连接方式,在换台过程中工件台与驱动单元会出现短暂的分离,对工件台的定位精度产生较大影响。同时运动单元和导轨较长,运动质量较大,对于运动速度和加速度的提高都产生不利影响。中国专利CN101609265提出了一种平面电机驱动的硅片台多台交换系统,平面电机定子设置在基台顶部,动子设置在硅片台底部,相对于直线电机驱动不存在工件台和驱动单元的分离;中国专利CN101694560中提出了一种采用气浮支撑永磁平面电机驱动的双台交换系统,工件台采用平面电机驱动并通过气浮支撑,避免了前述换台过程中驱动单元与工件台分离问题,减小了工件台运行阻力,减小了平面电机驱动电流,减小了散热问题。Improving the operating efficiency of the double workpiece table is one of the development goals of the current lithography machine workpiece table technology. The double workpiece table technology involves the problem of switching the workpiece table between two stations, and the efficiency of table switching directly affects the operating efficiency of the workpiece table of the lithography machine, that is, the productivity of the lithography machine. How to reduce the interference of channel switching to other systems while shortening the channel switching time as much as possible has always been the focus of research. In the traditional double-table switching process, the workpiece table is linearly driven in the exposure and pretreatment processes. In the dual-stage patents US2001/0004105A1 and W098/40791, each workpiece table has two interchangeable and coordinated units to achieve double-stage The exchange of the workpiece table improves the productivity without increasing the movement speed of the workpiece table. However, due to the coupling connection between the workpiece table and the guide rail, the workpiece table and the drive unit will be separated temporarily during the table change process, which will affect the workpiece table. The positioning accuracy has a great influence. At the same time, the motion unit and guide rail are longer, and the motion mass is larger, which has adverse effects on the improvement of motion speed and acceleration. Chinese patent CN101609265 proposes a planar motor-driven multiple exchange system for wafer stages. The stator of the planar motor is arranged on the top of the base stage, and the mover is arranged at the bottom of the wafer stage. Compared with the linear motor drive, there is no separation between the workpiece stage and the drive unit. Separation; Chinese patent CN101694560 proposes a dual-table exchange system driven by an air-supported permanent magnet planar motor. The workpiece table is driven by a planar motor and supported by air flotation, which avoids the separation of the drive unit and the workpiece table during the aforementioned table-changing process The problem is that the running resistance of the workpiece table is reduced, the driving current of the planar motor is reduced, and the problem of heat dissipation is reduced.
上述专利换台时采用直线换台方案,回转换台方案较直线换台方案有独特优势,因此出现了采用回转换台的双工件台技术。中国专利CN101071275采用回转整个基台的方式实现双工件台的换位,简化了系统结构,同时两个工件台运动无重叠区域,避免了碰撞安全隐患。但是通过回转整个基台实现工件台换位存在转动惯量大,大功率回转电机精密定位困难和发热量大引起系统温升等问题,同时回转半径大,使光刻机主机结构显著增大。中国专利CN102495528在基台中心采用一种回转转接台完成双工件台换台,换台分为三个节拍,提高了换台效率,但回转换台机构结构复杂,回转定位精度较低。The above-mentioned patent adopts a straight-line table-changing scheme when changing tables, and the back-turning table-changing scheme has unique advantages over the straight-line table-changing scheme, so a double-workpiece table technology using a back-turning table appears. Chinese patent CN101071275 adopts the method of rotating the whole abutment to realize the transposition of the double workpiece table, which simplifies the system structure, and at the same time, the movement of the two workpiece tables has no overlapping area, avoiding the potential safety hazard of collision. However, there are problems such as large moment of inertia, difficulty in precise positioning of high-power rotary motors, and high heat generation that cause system temperature rise by rotating the entire base to achieve workpiece table transposition. At the same time, the radius of rotation is large, which significantly increases the main structure of the lithography machine. Chinese patent CN102495528 adopts a rotary transfer table in the center of the abutment to complete the exchange of double workpiece tables. The table change is divided into three beats, which improves the efficiency of the table change. However, the structure of the rotary transfer table is complicated and the rotary positioning accuracy is low.
为了防止平衡质量块的漂移,美国专利US7034920B2采用直线推杆运动补偿机构和偏心转轮运动补偿机构,直线推杆运动补偿机构原理简单,控制直观,但不能抑制Rz转动,偏心转轮运动补偿机构采用4个旋转伺服电机通过偏心转轮控制平衡质量块在一个相对小的平面范围内运动,运动包含了X,Y和Rz向的自由度,但是这种结构要求4个电机运动解耦,对电机的一致性,以及电机的控制要求较高。而被动式补偿无需位置检测及主动控制,降低了成本,提高了可靠性,简化了结构。In order to prevent the drift of the balance mass, the US patent US7034920B2 uses a linear push rod motion compensation mechanism and an eccentric wheel motion compensation mechanism. The linear push rod motion compensation mechanism is simple in principle and intuitive to control, but it cannot inhibit Rz rotation. The eccentric wheel motion compensation mechanism Four rotating servo motors are used to control the movement of the balance mass in a relatively small plane range through the eccentric wheel. The movement includes degrees of freedom in the X, Y and Rz directions, but this structure requires the decoupling of the four motors. The consistency of the motor and the control requirements of the motor are relatively high. The passive compensation does not need position detection and active control, which reduces the cost, improves the reliability and simplifies the structure.
发明内容Contents of the invention
针对上述现有技术的不足,本发明提出了一种基于弹簧阻尼的动磁钢磁浮双工件台矢量圆弧回转换台方法及装置,达到实现工件台单节拍快速弧线换台、减少换台环节、缩短换台时间、有效提高了光刻机产率的目的。Aiming at the deficiencies of the above-mentioned prior art, the present invention proposes a method and device for moving magnetic steel magnetic levitation double workpiece table vector arc return conversion table based on spring damping, so as to achieve single-beat rapid arc change of workpiece table and reduce the number of changeover tables. The purpose of improving the production rate of the lithography machine is to reduce the stage link, shorten the time for changing the stage, and effectively improve the productivity of the lithography machine.
本发明的目的是这样实现的:The purpose of the present invention is achieved like this:
一种基于弹簧阻尼的动磁钢磁浮双工件台矢量圆弧换台方法,该方法包括以下步骤:初始工作状态,测量位第一工件台处于预对准状态,曝光位第二工件台处于曝光状态;第一步,测量位第一工件台预对准完毕后由动磁钢驱动运动到测量位换台预定位置A并充电和等待,曝光位第二工件台曝光完毕后由动磁钢驱动运动到曝光位预定位置C;第二步,第一工件台与第二工件台通过平面电机矢量控制沿圆弧轨迹逆时针运动,在运动过程中,两个工件台的相位不发生变化,运动位置由平面光栅进行测量,当第一工件台由动磁钢驱动运动到曝光位预定位置C、第二工件台由动磁钢驱动运动到测量位预定位置D时,换台结束,第一工件台在曝光位进行硅片光刻曝光,第二工件台在测量位进行硅片上片及硅片预对准操作;第三步,测量位第二工件台预对准完毕后由动磁钢驱动运动到测量位换台预定位置A'并充电和等待,曝光位第一工件台曝光完毕后由动磁钢驱动运动到曝光位预定位置C;第四步,第二工件台与第一工件台通过平面电机矢量控制沿圆弧轨迹顺时针运动,当第二工件台由动磁钢驱动运动到曝光位预定位置C、第一工件台由动磁钢驱动运动到测量位预定位置D时,换台结束,曝光位第二工件台进入曝光状态,测量位第一工件台进行上下片及预对准操作,此时系统回到初始工作状态,完成了包含两次换台操作的一个工作周期,在测量、曝光和换台过程中采用无线通讯方式完成。A method for moving magnetic steel magnetic levitation double worktables based on spring damping and vector circular arc transfer, the method includes the following steps: in the initial working state, the first worktable at the measurement position is in the pre-aligned state, and the second workbench at the exposure position is in the Exposure state: the first step, after the pre-alignment of the first workpiece table at the measurement position, it is driven by the moving magnetic steel to move to the predetermined position A of the measurement position for changing the table, charging and waiting. Drive and move to the predetermined position C of the exposure position; in the second step, the first workpiece table and the second workpiece table move counterclockwise along the circular arc track through the vector control of the plane motor. During the movement, the phase of the two workpiece tables does not change. The moving position is measured by the plane grating. When the first workpiece table is driven by the moving magnetic steel to move to the predetermined position C of the exposure position, and the second workpiece table is driven by the moving magnetic steel to move to the predetermined position D of the measurement position, the stage change is completed, and the first The workpiece stage performs silicon wafer lithography exposure at the exposure position, and the second workpiece stage performs silicon wafer loading and silicon wafer pre-alignment operations at the measurement position; the third step, after the pre-alignment of the second workpiece stage at the measurement position, the moving magnet The steel drive moves to the predetermined position A' of the measurement position and changes the stage and charges and waits. After the exposure of the first workpiece stage at the exposure position, the moving magnet steel drives and moves to the predetermined position C of the exposure position; the fourth step, the second workpiece stage and the first The workpiece table moves clockwise along the circular arc track through the vector control of the plane motor. When the second workpiece table is driven by the moving magnet to move to the predetermined position C of the exposure position, and the first workpiece table is driven by the moving magnet to move to the predetermined position D of the measurement position. , the stage change is over, the second workpiece stage at the exposure position enters the exposure state, and the first workpiece stage at the measurement position performs loading and unloading and pre-alignment operations. At this time, the system returns to the initial working state, and a job including two stage change operations is completed. The cycle is completed by wireless communication during the measurement, exposure and channel change process.
一种基于弹簧阻尼的动磁钢磁浮双工件台矢量圆弧换台装置,该装置包括支撑框架、平衡质量块、第一工件台、第二工件台、无线充电发射器,所述平衡质量块位于支撑框架上方,宏动平面电机定子安装在平衡质量块上的平面上,第一工件台和第二工件台配置在宏动平面电机定子上方,所述第一工件台和第二工件台运行于测量位和曝光位之间,在第一工件台和第二工件台上平面上分别安装测量位平面光栅和曝光位平面光栅;支撑框架通过四个平面片簧组成的运动补偿机构与平衡质量块相连接,所述平面片簧由1对X向片簧、1对Y向片簧、1个Z向片簧和1个Rz柔性铰链组成,平面片簧固定在支撑框架上,平面片簧上表面与平衡质量块连接;第一工件台和第二工件台为六自由度磁浮微动台,所述六自由度磁浮微动台由Chuck、吸盘、微动电机、防撞框、宏动平面电机动子、平面光栅读数头、调平调焦传感器、无线充电接收器、无线通讯收发器组成,所述微动电机由微动平面电机动子与重力补偿器动子集成在一起构成,所述吸盘安装在Chuck上,Chuck四个角上安装有四个平面光栅读数头和四个调平调焦传感器,Chuck固定在微动电机上,在微动电机四周安装有防撞框,所述宏动平面电机动子安装在防撞框下方,宏动平面电机动子由磁钢阵列交错排布构成,宏动平面电机定子由线圈阵列成人字形排布构成。A moving magnet steel maglev double workpiece platform vector arc platform changing device based on spring damping, the device includes a support frame, a balance mass, a first workpiece platform, a second workpiece platform, and a wireless charging transmitter. The balance mass The block is located above the support frame, the stator of the macro-moving planar motor is installed on the plane on the balance mass block, the first workpiece table and the second workpiece table are arranged above the stator of the macro-moving planar motor, and the first workpiece table and the second workpiece table It runs between the measurement position and the exposure position, and the measurement position plane grating and the exposure position plane grating are respectively installed on the upper plane of the first work table and the second work table; the support frame is balanced by a motion compensation mechanism composed of four plane leaf springs. The mass blocks are connected, and the planar leaf spring is composed of 1 pair of X-direction leaf springs, 1 pair of Y-direction leaf springs, 1 Z-direction leaf spring and 1 Rz flexible hinge. The planar leaf springs are fixed on the support frame, and the planar leaf springs The sprung surface is connected with the balance mass block; the first workpiece table and the second workpiece table are six-degree-of-freedom maglev micro-motion tables, and the six-degree-of-freedom magnetic-flotation micro-motion tables are composed of Chuck, suction cups, micro-motion motors, anti-collision frames, macro The mover of the moving planar motor, the reading head of the planar grating, the leveling and focusing sensor, the wireless charging receiver, and the wireless communication transceiver are composed of the mover of the micro-moving planar motor and the mover of the gravity compensator. , the suction cup is installed on the Chuck, four planar grating reading heads and four leveling and focusing sensors are installed on the four corners of the Chuck, the Chuck is fixed on the micro-motor, and an anti-collision frame is installed around the micro-motor, The mover of the macro planar motor is installed under the anti-collision frame, the mover of the macro planar motor is composed of a magnetic steel array arranged in a staggered manner, and the stator of the macro planar motor is composed of a coil array arranged in a herringbone shape.
本发明具有以下创新点和突出优点:The present invention has the following innovations and outstanding advantages:
1)提出的圆弧矢量换台方案可有效缩短换台时间,提高了换台效率。采用矢量换台策略将双工件台现有的多节拍直线换台优化为单节拍快速换台,起停次数少、稳定环节少;同时采用弧线轨迹规划缩短了换台路径,回转冲击小、稳定时间短,这是本发明的创新点和突出优点之一;1) The proposed arc vector channel change scheme can effectively shorten the channel change time and improve the channel change efficiency. The vector table change strategy is used to optimize the existing multi-beat linear table change of the double workpiece table into a single-beat fast table change, with fewer starts and stops and fewer stable links; at the same time, the arc trajectory planning is used to shorten the table change path, and the rotary impact is small , The stable time is short, which is one of the innovative points and outstanding advantages of the present invention;
2)提出的动磁钢磁浮平面电机,采用复合电流驱动实现高功效矢量控制,具有运动范围大、推力密度大、动态特性好、绕组利用率高、温度分布均匀、热变形小等特点,同时采用动磁钢驱动、无线通信数据传输,无线缆束缚,结构简单,定位精度高,这是本发明的创新点和突出优点之二;2) The proposed moving magnet steel maglev planar motor adopts compound current drive to realize high-efficiency vector control. It has the characteristics of large motion range, high thrust density, good dynamic characteristics, high winding utilization, uniform temperature distribution, and small thermal deformation. Using moving magnetic steel drive, wireless communication data transmission, no cable binding, simple structure, high positioning accuracy, this is the second innovation point and outstanding advantage of the present invention;
3)提出的基于平面片簧的被动补偿机构,可以实现平衡质量块X向、Y向、Z向、Rz运动补偿,相对于主动补偿结构,降低了机构的复杂程度,减小了控制和实施难度,这是本发明的创新点和突出优点之三;3) The proposed passive compensation mechanism based on planar leaf springs can realize the compensation of the X-direction, Y-direction, Z-direction, and Rz motion of the balance mass. Compared with the active compensation structure, the complexity of the mechanism is reduced, and the control and implementation Difficulty, this is the innovation point of the present invention and the third of outstanding advantages;
4)提出了无线通电和无线通信的无线缆干扰的工件台交换方法,并设计了无线通电和无线通信的双工件台装置。该装置在磁浮磁驱的基础上,采用无线通电和无线信号传输方式,实现两个微动台电源和通讯信号的无线传输和控制,使得整体结构紧凑,更重要的是消除了电缆和信号线缆扰动对双工件台定位精度的影响,实现了无线供电、无线通信数据的传输和无线缆束缚。这是本发明的创新点和突出优点之四。4) A work table exchange method without cable interference for wireless power supply and wireless communication is proposed, and a double work table device for wireless power supply and wireless communication is designed. Based on the maglev magnetic drive, the device adopts wireless power supply and wireless signal transmission methods to realize the wireless transmission and control of the power supply and communication signals of the two micro-tables, making the overall structure compact, and more importantly, eliminating the need for cables and signal lines The impact of cable disturbance on the positioning accuracy of the double worktable realizes wireless power supply, wireless communication data transmission and no cable constraints. This is innovation point and outstanding advantage four of the present invention.
附图说明Description of drawings
图1是单节拍优化规划弧线快速换台流程示意图。Fig. 1 is a schematic diagram of a single-beat optimized planning arc fast channel change process.
图2是基于弹簧阻尼的动磁钢磁浮双工件台矢量圆弧换台装置总体结构示意图。Fig. 2 is a schematic diagram of the overall structure of the moving magnet steel maglev double workpiece table vector arc table changing device based on spring damping.
图3是双工件台系统的剖视图。Fig. 3 is a cross-sectional view of the dual stage system.
图4是运动补偿机构与平衡质量块装配结构示意图。Fig. 4 is a schematic diagram of the assembly structure of the motion compensation mechanism and the balance mass.
图5是平面片簧结构示意图。Fig. 5 is a schematic diagram of the planar leaf spring structure.
图6是六自由度磁浮微动台结构示意图。Fig. 6 is a schematic structural diagram of a six-degree-of-freedom maglev micro-motion stage.
图7是微动平面电机动子与重力补偿器集成机构示意图。Fig. 7 is a schematic diagram of the integration mechanism of the micro-motion planar motor mover and the gravity compensator.
图8是宏动平面电机动子磁刚阵列排布示意图。Fig. 8 is a schematic diagram of the arrangement of the magneto-rigid array of the macro-moving planar motor.
图9是宏动平面电机定子线圈阵列排布示意图。Fig. 9 is a schematic diagram of the arrangement of the stator coil array of the macro-motion planar motor.
图中件号:1-支撑框架;2-平衡质量系统;3-宏动平面电机定子;4a-第一工件台;4b-第二工件台;5a-测量位平面光栅;5b-曝光位平面光栅;11-测量位;12-曝光位;13-平行片簧;26-X向片簧;27-Y向片簧;28-Z向片簧;29-Rz柔性铰链;401-Chuck;402-吸盘;403-微动电机;404-防撞框;405-宏动平面电机动子;406-平面光栅读数头;407-调平调焦传感器;408-微动平面电机动子;409-重力补偿器动子;411-磁钢阵列;412-线圈阵列;413-无线充电接收器;414-无线通讯收发器。Part number in the picture: 1-supporting frame; 2-balance mass system; 3-macro planar motor stator; 4a-first workpiece table; 4b-second workpiece table; 5a-measuring plane grating; 5b-exposure plane Grating; 11-measurement position; 12-exposure position; 13-parallel leaf spring; 26-X direction leaf spring; 27-Y direction leaf spring; 28-Z direction leaf spring; 29-Rz flexible hinge; 401-Chuck; 402 -suction cup; 403-micro motor; 404-anti-collision frame; 405-macro planar motor mover; 406-planar grating reading head; 407-leveling and focusing sensor; 408-micro planar motor mover; 409- Gravity compensator mover; 411-magnetic steel array; 412-coil array; 413-wireless charging receiver; 414-wireless communication transceiver.
具体实施方式detailed description
下面结合附图对本发明实施方案作进一步详细说明:Below in conjunction with accompanying drawing, embodiment of the present invention is described in further detail:
一种基于弹簧阻尼的动磁钢磁浮双工件台矢量圆弧换台方法,该方法包括以下步骤:初始工作状态,测量位第一工件台处于预对准状态,曝光位第二工件台处于曝光状态;第一步,测量位第一工件台预对准完毕后由动磁钢驱动运动到测量位换台预定位置A并充电和等待,曝光位第二工件台曝光完毕后由动磁钢驱动运动到曝光位预定位置C;第二步,第一工件台与第二工件台通过平面电机矢量控制沿圆弧轨迹逆时针运动,在运动过程中,两个工件台的相位不发生变化,运动位置由平面光栅进行测量,当第一工件台由动磁钢驱动运动到曝光位预定位置C、第二工件台由动磁钢驱动运动到测量位预定位置D时,换台结束,第一工件台在曝光位进行硅片光刻曝光,第二工件台在测量位进行硅片上片及硅片预对准操作;第三步,测量位第二工件台预对准完毕后由动磁钢驱动运动到测量位换台预定位置A'并充电和等待,曝光位第一工件台曝光完毕后由动磁钢驱动运动到曝光位预定位置C;第四步,第二工件台与第一工件台通过平面电机矢量控制沿圆弧轨迹顺时针运动,当第二工件台由动磁钢驱动运动到曝光位预定位置C、第一工件台由动磁钢驱动运动到测量位预定位置D时,换台结束,曝光位第二工件台进入曝光状态,测量位第一工件台进行上下片及预对准操作,此时系统回到初始工作状态,完成了包含两次换台操作的一个工作周期,在测量、曝光和换台过程中采用无线通讯方式完成。A method for moving magnetic steel magnetic levitation double worktables based on spring damping and vector circular arc transfer, the method includes the following steps: in the initial working state, the first worktable at the measurement position is in the pre-aligned state, and the second workbench at the exposure position is in the Exposure state: the first step, after the pre-alignment of the first workpiece table at the measurement position, it is driven by the moving magnetic steel to move to the predetermined position A of the measurement position for changing the table, charging and waiting. Drive and move to the predetermined position C of the exposure position; in the second step, the first workpiece table and the second workpiece table move counterclockwise along the circular arc track through the vector control of the plane motor. During the movement, the phase of the two workpiece tables does not change. The moving position is measured by the plane grating. When the first workpiece table is driven by the moving magnetic steel to move to the predetermined position C of the exposure position, and the second workpiece table is driven by the moving magnetic steel to move to the predetermined position D of the measurement position, the stage change is completed, and the first The workpiece stage performs silicon wafer lithography exposure at the exposure position, and the second workpiece stage performs silicon wafer loading and silicon wafer pre-alignment operations at the measurement position; the third step, after the pre-alignment of the second workpiece stage at the measurement position, the moving magnet The steel drive moves to the predetermined position A' of the measurement position and changes the stage and charges and waits. After the exposure of the first workpiece stage at the exposure position, the moving magnet steel drives and moves to the predetermined position C of the exposure position; the fourth step, the second workpiece stage and the first The workpiece table moves clockwise along the circular arc track through the vector control of the plane motor. When the second workpiece table is driven by the moving magnet to move to the predetermined position C of the exposure position, and the first workpiece table is driven by the moving magnet to move to the predetermined position D of the measurement position. , the stage change is over, the second workpiece stage at the exposure position enters the exposure state, and the first workpiece stage at the measurement position performs loading and unloading and pre-alignment operations. At this time, the system returns to the initial working state, and a job including two stage change operations is completed. The cycle is completed by wireless communication during the measurement, exposure and channel change process.
一种基于弹簧阻尼的动磁钢磁浮双工件台矢量圆弧换台装置,该装置包括支撑框架1、平衡质量块2、第一工件台4a、第二工件台4b、无线充电发射器30,所述平衡质量块2位于支撑框架1上方,宏动平面电机定子3安装在平衡质量块2上的平面上,第一工件台4a和第二工件台4b配置在宏动平面电机定子3上方,所述第一工件台4a和第二工件台4b运行于测量位11和曝光位12之间,在第一工件台4a和第二工件台4b上平面上分别安装测量位平面光栅5a和曝光位平面光栅5b;支撑框架1通过四个平面片簧13组成的运动补偿机构与平衡质量块2相连接,所述平面片簧13由1对X向片簧26、1对Y向片簧27、1个Z向片簧28和1个Rz柔性铰链29组成,平面片簧13固定在支撑框架1上,平面片簧13上表面与平衡质量块2连接;第一工件台4a和第二工件台4b为六自由度磁浮微动台,所述六自由度磁浮微动台由Chuck401、吸盘402、微动电机403、防撞框404、宏动平面电机动子405、平面光栅读数头406、调平调焦传感器407、无线充电接收器413、无线通讯收发器414组成,所述微动电机403由微动平面电机动子408与重力补偿器动子409集成在一起构成,所述吸盘402安装在Chuck401上,Chuck401四个角上安装有四个平面光栅读数头406和四个调平调焦传感器407,Chuck401固定在微动电机403上,在微动电机403四周安装有防撞框404,所述宏动平面电机动子405安装在防撞框404下方,宏动平面电机动子405由磁钢阵列411交错排布构成,宏动平面电机定子3由线圈阵列412成人字形排布构成。A moving magnet steel magnetic levitation double workpiece table vector circular arc table changing device based on spring damping, the device includes a support frame 1, a balance mass 2, a first workpiece table 4a, a second workpiece table 4b, and a wireless charging transmitter 30 , the balance mass 2 is located above the support frame 1, the macro-motion planar motor stator 3 is installed on the plane on the balance mass 2, and the first work table 4a and the second work table 4b are arranged above the macro-motion planar motor stator 3 , the first workpiece table 4a and the second workpiece table 4b run between the measurement position 11 and the exposure position 12, and the measurement position plane grating 5a and the exposure plane grating 5a are respectively installed on the first workpiece table 4a and the second workpiece table 4b. The bit plane grating 5b; the support frame 1 is connected with the balance mass 2 through a motion compensation mechanism composed of four planar leaf springs 13, and the planar leaf spring 13 consists of a pair of X-direction leaf springs 26 and a pair of Y-direction leaf springs 27 , 1 Z-direction leaf spring 28 and 1 Rz flexible hinge 29, the planar leaf spring 13 is fixed on the support frame 1, and the upper surface of the planar leaf spring 13 is connected with the balance mass 2; the first workpiece table 4a and the second workpiece Table 4b is a six-degree-of-freedom maglev micro-motion stage, which consists of Chuck401, suction cup 402, micro-motion motor 403, anti-collision frame 404, macro-motion planar motor mover 405, planar grating reading head 406, It consists of a leveling and focusing sensor 407, a wireless charging receiver 413, and a wireless communication transceiver 414. The micro-motor 403 is composed of a micro-motion planar motor mover 408 and a gravity compensator mover 409. The suction cup 402 Installed on Chuck401, four planar grating reading heads 406 and four leveling and focusing sensors 407 are installed on the four corners of Chuck401, Chuck401 is fixed on the micro motor 403, and anti-collision frames 404 are installed around the micro motor 403 , the macro-moving planar motor mover 405 is installed under the anti-collision frame 404, the macro-moving planar motor mover 405 is composed of a magnetic steel array 411 arranged in a staggered manner, and the macro-moving planar motor stator 3 is composed of a coil array 412 arranged in a herringbone shape .
本发明工作流程如下:The working process of the present invention is as follows:
第一工件台4a在测量位11预对准完毕后由平面电机动驱动运动到换台位置A,等待第二工件台4b在曝光位12完成曝光,第二工件台4b完成曝光后由平面电机驱动运动到换台位置B,然后第一工件台4a与第二工件台4b通过平面电机矢量控制沿圆弧轨迹逆时针运动完成换台操作;换台完成后,第一工件台4a向曝光位12运动在曝光位12进行曝光,第二工件台4b向测量位11运动在测量位11进行上片和预对准操作;率先完成硅片预对准完毕的第二工件台4b运动到测量位换台位置A',等待第一工件台4a完成曝光后运动到换台位置B',然后,第二工件台4b与第一工件台4a通过平面电机矢量控制沿圆弧轨迹顺时针运动,完成第二次换台;换台完成后,第一工件台4a向测量位11运动,第二工件台4b向曝光位12运动,这样完成了一次完整的工作周期。After the pre-alignment of the measurement position 11, the first workpiece table 4a is driven by the plane motor to move to the stage change position A, and waits for the second workpiece table 4b to complete the exposure at the exposure position 12. After the second workpiece table 4b completes the exposure, it is driven by the plane motor Drive and move to the stage change position B, and then the first workpiece table 4a and the second workpiece table 4b move counterclockwise along the circular arc track through the plane motor vector control to complete the stage change operation; after the stage change is completed, the first workpiece table 4a moves to the exposure position 12 moves to perform exposure at exposure position 12, and the second workpiece table 4b moves to measurement position 11 to perform loading and pre-alignment operations at measurement position 11; the second work table 4b that has completed pre-alignment of the silicon wafer first moves to the measurement position Change the stage position A', wait for the first workpiece stage 4a to complete the exposure and then move to the stage change position B', then, the second workpiece stage 4b and the first workpiece stage 4a move clockwise along the circular arc track through the vector control of the plane motor, and complete The second stage change; after the stage change is completed, the first workpiece stage 4a moves to the measurement position 11, and the second workpiece stage 4b moves to the exposure position 12, thus completing a complete working cycle.
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Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1479174A (en) * | 2002-06-07 | 2004-03-03 | Asml | Photoetching device and method for manufacturing device |
CN101609265A (en) * | 2009-07-21 | 2009-12-23 | 清华大学 | Multiple switching system of silicon wafer stage using magnetic levitation planar motor |
CN101610054A (en) * | 2009-07-21 | 2009-12-23 | 清华大学 | Planar Motor Using 3D Permanent Magnet Array |
CN103034073A (en) * | 2012-12-26 | 2013-04-10 | 清华大学 | Double silicon wafer platform exchange system provided with immersion-liquid recovery devices and laser interferometers |
CN103531502A (en) * | 2012-07-03 | 2014-01-22 | 上海微电子装备有限公司 | Workpiece bench apparatus |
-
2016
- 2016-01-14 CN CN201610023031.8A patent/CN105487347A/en active Pending
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1479174A (en) * | 2002-06-07 | 2004-03-03 | Asml | Photoetching device and method for manufacturing device |
CN101609265A (en) * | 2009-07-21 | 2009-12-23 | 清华大学 | Multiple switching system of silicon wafer stage using magnetic levitation planar motor |
CN101610054A (en) * | 2009-07-21 | 2009-12-23 | 清华大学 | Planar Motor Using 3D Permanent Magnet Array |
CN103531502A (en) * | 2012-07-03 | 2014-01-22 | 上海微电子装备有限公司 | Workpiece bench apparatus |
CN103034073A (en) * | 2012-12-26 | 2013-04-10 | 清华大学 | Double silicon wafer platform exchange system provided with immersion-liquid recovery devices and laser interferometers |
Non-Patent Citations (2)
Title |
---|
张磊: "动磁钢式磁悬浮平面电机的设计与建模研究", 《中国优秀硕士学位论文全文数据库 工程科技II辑》 * |
武志鹏等: "双工件台光刻机换台过程的轨迹规划及控制", 《哈尔滨工业大学学报》 * |
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