CN105629674A - Vector arc stage switching method and device for double dual-layer water cooling-based dynamic magnetic steel type magnetic levitation workpiece stages - Google Patents

Abstract

The moving magnetic steel maglev double workpiece stage vector arc transfer method and device based on double-layer water cooling belong to the semiconductor manufacturing equipment technology. The device includes a support frame, a balance mass, a magnetic levitation workpiece table, a workpiece table measuring device, and a workpiece table driving device. , the two workpiece tables work between the measurement position and the exposure position, the position of the workpiece table is measured by a flat grating, and the passive compensation structure composed of a flat leaf spring and an electromagnetic damper is used to compensate the movement of the balance mass. The workpiece table adopts a The double-layer water-cooled structure is driven by a moving magnetic steel type magnetic levitation planar motor. During the exchange process of the double workpiece table, the planar motor is used to drive the two workpiece tables to realize the rapid exchange of single-beat arcs; , Long trajectory, many start-stop links, long stabilization time and other problems, reduce the number of steps to change the stage, shorten the time for changing the stage, and improve the productivity of the lithography machine.

Description

Method and device for moving magnetic steel maglev double workpiece table vector arc table changing based on double-layer water cooling

technical field

The invention belongs to the technical field of semiconductor manufacturing equipment, and mainly relates to a method and device based on a double-layer water-cooled moving magnet steel maglev double workpiece table vector arc return conversion table.

Background technique

Lithography machine is one of the important ultra-precision equipment in the manufacture of very large scale integrated circuits. As the key subsystem of the lithography machine, the workpiece table largely determines the resolution, overlay accuracy and productivity of the lithography machine.

Productivity is one of the main goals of lithography machine development. Under the condition of satisfying the resolution and overlay accuracy, improving the operating efficiency of the workpiece table and thus improving the productivity of the lithography machine is the development direction of the workpiece table technology. The most direct way to improve the operating efficiency of the workpiece table is to increase the motion acceleration and speed of the workpiece table, but in order to ensure the original accuracy, the speed and acceleration cannot be increased without limit. The initial workpiece table only had one silicon wafer carrier, and the lithography machine could only process one silicon wafer at a time. All processes were processed serially, and the production efficiency was low. For this reason, someone has proposed a double worktable technology, which is also the mainstream technical means to improve the production efficiency of lithography machines. The double worktable technology has two work stations for exposure and pretreatment and two workbenches on the workbench. The exposure and measurement adjustment can be processed in parallel, which greatly shortens the time and improves the production efficiency. The current representative product is the lithography machine based on the Twinscan technology, that is, the double-workpiece technology of ASML company in the Netherlands.

Improving the operating efficiency of the double workpiece table is one of the development goals of the current lithography machine workpiece table technology. The double workpiece table technology involves the problem of switching the workpiece table between two stations, and the efficiency of table switching directly affects the operating efficiency of the workpiece table of the lithography machine, that is, the productivity of the lithography machine. How to reduce the interference of channel switching to other systems while shortening the channel switching time as much as possible has always been the focus of research. In the traditional double-table switching process, the workpiece table is linearly driven in the exposure and pretreatment processes. In the dual-stage patents US2001/0004105A1 and W098/40791, each workpiece table has two interchangeable and coordinated units to achieve double-stage The exchange of the workpiece table improves the productivity without increasing the movement speed of the workpiece table. However, due to the coupling connection between the workpiece table and the guide rail, the workpiece table and the drive unit will be separated temporarily during the table change process, which will affect the workpiece table. The positioning accuracy has a great influence. At the same time, the motion unit and guide rail are longer, and the motion mass is larger, which has adverse effects on the improvement of motion speed and acceleration. Chinese patent CN101609265 proposes a planar motor-driven multiple exchange system for wafer stages. The stator of the planar motor is arranged on the top of the base stage, and the mover is arranged at the bottom of the wafer stage. Compared with the linear motor drive, there is no separation between the workpiece stage and the drive unit. Separation; Chinese patent CN101694560 proposes a dual-table exchange system driven by an air-supported permanent magnet planar motor. The workpiece table is driven by a planar motor and supported by air flotation, which avoids the separation of the drive unit and the workpiece table during the aforementioned table-changing process The problem is that the running resistance of the workpiece table is reduced, the driving current of the planar motor is reduced, and the problem of heat dissipation is reduced.

The above-mentioned patent adopts a straight-line table-changing scheme when changing tables, and the back-turning table-changing scheme has unique advantages over the straight-line table-changing scheme, so a double-workpiece table technology using a back-turning table appears. Chinese patent CN101071275 adopts the method of rotating the whole abutment to realize the transposition of the double workpiece table, which simplifies the system structure, and at the same time, the movement of the two workpiece tables has no overlapping area, avoiding the potential safety hazard of collision. However, there are problems such as large moment of inertia, difficulty in precise positioning of high-power rotary motors, and high heat generation that cause system temperature rise by rotating the entire base to achieve workpiece table transposition. At the same time, the radius of rotation is large, which significantly increases the main structure of the lithography machine. Chinese patent CN102495528 adopts a rotary transfer table in the center of the abutment to complete the exchange of double workpiece tables. The table change is divided into three beats, which improves the efficiency of the table change. However, the structure of the rotary transfer table is complicated and the rotary positioning accuracy is low.

In order to prevent the drift of the balance mass, US7034920B2 proposes to use a contact linear push rod or an eccentric wheel as an active compensation mechanism. The principle is simple and can effectively restrain the drift of the balance mass, but cannot restrain the Rz rotation. Chinese patent ZL200710041226 proposes a dual-motor crank-rocker mechanism, which has compliance in the X and Y directions and good stiffness in the Z-axis. For the active motion compensation mechanism, its advantage is that it can perform accurate position compensation on the balance mass, but the control is complex, the system has poor robustness, low reliability, high cost, short maintenance cycle, and short service life.

Contents of the invention

Aiming at the deficiencies of the above-mentioned prior art, the present invention proposes a method and device based on a double-layer water-cooled moving magnet steel maglev double workpiece table vector arc return transfer table, so as to achieve single-beat rapid arc exchange of the workpiece table, The purpose of reducing the stage change link, shortening the stage change time, effectively improving the productivity of the lithography machine, and effectively reducing the temperature of the workpiece stage.

The purpose of the present invention is achieved like this:

A method for moving magnetic steel magnetic levitation double workpiece stage vector arc transfer method based on double-layer water cooling, the method includes the following steps: in the initial working state, the first workpiece stage at the measurement position is in a pre-aligned state, and the second workpiece stage at the exposure position In the exposure state; in the first step, after the pre-alignment of the first workpiece table at the measurement position is completed, it is driven by the moving magnet to move to the predetermined position A of the measurement position for changing the table, charging and waiting, and the second workpiece table at the exposure position is exposed by the moving magnet The steel drive moves to the preset position C of the exposure position; in the second step, the first workpiece table and the second workpiece table move counterclockwise along the circular arc track through the vector control of the plane motor. During the movement, the phases of the two workpiece tables are different. Change occurs, and the moving position is measured by the plane grating. When the first workpiece table is driven by the moving magnetic steel to move to the predetermined position C of the exposure position, and the second workpiece table is driven by the moving magnetic steel to move to the predetermined position D of the measurement position, the changeover ends , the first worktable performs silicon wafer lithography exposure at the exposure position, and the second worktable performs silicon wafer loading and silicon wafer pre-alignment operations at the measurement position; the third step, after the pre-alignment of the second worktable at the measurement position Driven by the moving magnetic steel to move to the predetermined position A' of the measuring position and change the stage, charge and wait, after the exposure of the first workpiece table at the exposure position, it is driven by the moving magnetic steel to move to the predetermined position C of the exposure position; the fourth step, the second workpiece table The first workpiece table moves clockwise along the circular arc track through the vector control of the plane motor. When the second workpiece table is driven by the moving magnetic steel to move to the predetermined exposure position C, the first workpiece table is driven by the moving magnetic steel to move to the predetermined measurement position. At position D, the stage change is over, the second workpiece stage at the exposure position enters the exposure state, and the first workpiece stage at the measurement position performs loading and unloading and pre-alignment operations. At this time, the system returns to the initial working state and completes two stage change operations. A working cycle is completed by wireless communication in the process of measurement, exposure and channel change.

A double-layer water-cooled moving magnetic steel maglev double workpiece platform vector arc platform changer, the device includes a support frame, a balance mass, a first workpiece platform, a second workpiece platform, and a wireless charging transmitter. The mass block is located above the support frame, the macro-moving planar motor stator is installed on the plane on the balance mass block, the first workpiece platform and the second workpiece platform are arranged above the macro-moving planar motor stator, and the first workpiece platform and the second workpiece The table runs between the measurement position and the exposure position, and the measurement position plane grating and the exposure position plane grating are respectively installed on the upper plane of the first work table and the second work table; The motion compensation mechanism is connected with the balance mass. The planar leaf spring consists of 1 pair of X-direction leaf springs, 1 pair of Y-direction leaf springs, 1 Z-direction leaf spring and 1 Rz flexible hinge. The electromagnetic damper consists of The upper back plate of the damper, the upper Y-direction permanent magnet array and the X-direction permanent magnet array, the copper plate, the lower Y-direction permanent magnet array and the X-direction permanent magnet array, and the lower back plate of the damper are assembled. The lower back plate of the damper is fixed, the upper Y and X permanent magnet arrays are installed between the upper back plate of the damper and the copper plate, and the lower Y and X permanent magnet arrays are installed between the copper plate and the lower back plate of the damper. And a strong magnetic field is formed between the air gaps, the copper plate (23) is fixed on the support frame, the upper back plate of the damper is fixed with the balance mass block, relative to the upper and lower back plate copper plates can generate X, Y translation and Rz rotation The first workbench and the second workbench are six-degree-of-freedom maglev micro-motion stages, and the six-degree-of-freedom maglev micro-motion stages are composed of Chuck, suction cups, anti-collision frames, macro-motion planar motor movers, grating reading heads, leveling Composed of focusing sensor, wireless charging receiver, wireless communication transceiver, micro-movement planar motor mover and gravity compensator mover are integrated together, the suction cup is installed on the Chuck, and four gratings are installed on the four corners of the Chuck The reading head and the leveling and focusing sensor, the anti-collision frame is installed around the Chuck, and the macro-motion planar motor mover is installed under the anti-collision frame. The motor stator is composed of an upper water-cooling pipeline, a coil array and a lower water-cooling pipeline, wherein the coil array is arranged in a herringbone shape.

The present invention has the following innovations and outstanding advantages:

1) Propose the arc vector channel changing method, and design the arc vector channel changing device. The vector table change strategy is used to optimize the existing multi-beat linear table change of the double workpiece table into a single-beat fast table change, with fewer starts and stops and fewer stable links; at the same time, the arc trajectory planning is used to shorten the table change path, and the rotary impact is small , The stabilization time is short, and the real-time measurement system monitors the exchange process to ensure the macro/micro positioning accuracy during the channel change process, directly traceable to the laser wavelength, and finally realizes the high efficiency and high precision of the channel change. This is one of the innovation points and outstanding advantages of the present invention;

2) A large-stroke magnetic drive method for a double-layer water-cooled structure moving magnet steel maglev planar motor was proposed, and a double-layer water-cooled structure moving magnet steel maglev planar motor device was designed. The device adopts a double-layer water-cooling layout, which effectively reduces the temperature, makes the temperature distribution uniform, and has small thermal deformation. At the same time, it adopts moving magnetic steel drive, wireless communication data transmission, no cable binding, simple structure, and high positioning accuracy. This is the invention. The second point of innovation and outstanding advantages;

3) A work table exchange method without cable interference of wireless power supply and wireless communication is proposed, and a double work table device for wireless power supply and wireless communication is designed. Based on the maglev magnetic drive, the device adopts wireless power supply and wireless signal transmission methods to realize the wireless transmission and control of the power supply and communication signals of the two micro-tables, making the overall structure compact, and more importantly, eliminating the need for cables and signal lines The impact of cable disturbance on the positioning accuracy of the double worktable realizes wireless power supply, wireless communication data transmission and no cable constraints. This is the innovation point and the third of outstanding advantages of the present invention;

4) Propose a passive compensation method and an impulse balance method, and design a passive compensation and balance mass mechanism based on an electromagnetic damper and a planar leaf spring. This mechanism can realize the X-direction, Y-direction, Z-direction and Rz motion compensation of the balance mass. Compared with the active compensation structure, it reduces the complexity of the mechanism and reduces the difficulty of control and implementation. This is the innovation and highlight of the present invention. The fourth advantage.

Description of drawings

Fig. 1 is a schematic diagram of a single-beat optimized planning arc fast channel change process.

Fig. 2 is a schematic diagram of the overall structure of the moving magnet steel maglev double workpiece table vector arc table changing device based on double-layer water cooling.

Figure 3 is a schematic diagram of the double-layer water-cooled structure of the stator of the macro-motion planar motor.

Fig. 4 is a schematic diagram of the assembly structure of the motion compensation mechanism and the balance mass.

Fig. 5 is a schematic diagram of the planar leaf spring structure.

Fig. 6 is a schematic diagram of the electromagnetic damping structure.

Fig. 7 is a schematic diagram of the magnetic steel arrangement of the electromagnetic damper.

Fig. 8 is a schematic structural diagram of a six-degree-of-freedom maglev micro-motion stage.

Fig. 9 is a schematic diagram of the integration mechanism of the micro-motion planar motor mover and the gravity compensator.

Fig. 10 is a schematic diagram of the arrangement of the magnetic rigid array of the macro-moving planar motor mover.

Fig. 11 is a schematic diagram of the arrangement of the stator coil array of the macro-motion planar motor.

Part number in the picture: 1-support frame; 2-balance mass system; 3-macro planar motor stator; 3a-upper water cooling pipe; 3b-macro planar motor coil array; 3c-lower water cooling pipe; 4a-first workpiece Table; 4b-second workpiece table; 5a-measurement plane grating; 5b-exposure plane grating; 11-measurement; 12-exposure; 13-parallel leaf spring; 14-electromagnetic damper; 21-upper damper Back plate; 22a-upper Y-direction permanent magnet array; 22b-upper X-direction permanent magnet array; 23-copper plate; 24a-lower Y-direction permanent magnet array; 24b-lower X-direction permanent magnet array; 25-damper lower back Plate; 26-X-direction leaf spring; 27-Y-direction leaf spring; 28-Z-direction leaf spring; 29-Rz flexible hinge; 401-Chuck; 402-suction cup; 404-anti-collision frame; 406- grating reading head; 407-leveling and focusing sensor; 408-micro-motion planar motor mover; 409-gravity compensator mover; 411-magnetic steel array; 412-coil array; 413-wireless charging receiver ; 414-wireless communication transceiver.

detailed description

Below in conjunction with accompanying drawing, embodiment of the present invention is described in further detail:

A method for moving magnetic steel magnetic levitation double workpiece stage vector arc transfer method based on double-layer water cooling, the method includes the following steps: in the initial working state, the first workpiece stage at the measurement position is in a pre-aligned state, and the second workpiece stage at the exposure position In the exposure state; in the first step, after the pre-alignment of the first workpiece table at the measurement position is completed, it is driven by the moving magnet to move to the predetermined position A of the measurement position for changing the table, charging and waiting, and the second workpiece table at the exposure position is exposed by the moving magnet The steel drive moves to the preset position C of the exposure position; in the second step, the first workpiece table and the second workpiece table move counterclockwise along the circular arc track through the vector control of the plane motor. During the movement, the phases of the two workpiece tables are different. Change occurs, and the moving position is measured by the plane grating. When the first workpiece table is driven by the moving magnetic steel to move to the predetermined position C of the exposure position, and the second workpiece table is driven by the moving magnetic steel to move to the predetermined position D of the measurement position, the changeover ends , the first worktable performs silicon wafer lithography exposure at the exposure position, and the second worktable performs silicon wafer loading and silicon wafer pre-alignment operations at the measurement position; the third step, after the pre-alignment of the second worktable at the measurement position Driven by the moving magnetic steel to move to the predetermined position A' of the measuring position and change the stage, charge and wait, after the exposure of the first workpiece table at the exposure position, it is driven by the moving magnetic steel to move to the predetermined position C of the exposure position; the fourth step, the second workpiece table The first workpiece table moves clockwise along the circular arc track through the vector control of the plane motor. When the second workpiece table is driven by the moving magnetic steel to move to the predetermined exposure position C, the first workpiece table is driven by the moving magnetic steel to move to the predetermined measurement position. At position D, the stage change is over, the second workpiece stage at the exposure position enters the exposure state, and the first workpiece stage at the measurement position performs loading and unloading and pre-alignment operations. At this time, the system returns to the initial working state and completes two stage change operations. A working cycle is completed by wireless communication in the process of measurement, exposure and channel change.

A double-layer water-cooled moving magnetic steel maglev double-workpiece table vector arc table changer, the device includes a support frame 1, a balance mass 2, a first worktable 4a, a second worktable 4b, and a wireless charging transmitter 30, the balance mass 2 is located above the support frame 1, the macro-motion planar motor stator 3 is installed on the plane of the balance mass 2, and the first work table 4a and the second work table 4b are arranged on the macro-motion planar motor stator 3 Above, the first workpiece table 4a and the second workpiece table 4b run between the measurement position 11 and the exposure position 12, and the measurement position plane grating 5a and The exposure position plane grating 5b; the support frame 1 is connected with the balance weight 2 through a motion compensation mechanism composed of a plane leaf spring 13 and an electromagnetic damper 14 in parallel, and the plane leaf spring 13 is composed of a pair of X-direction leaf springs 26, 1 Composed of a Y-direction leaf spring 27, a Z-direction leaf spring 28 and a Rz flexible hinge 29, the electromagnetic damper 14 consists of an upper back plate 21 of the damper, an upper Y-direction permanent magnet array 22a and an X-direction permanent magnet array 22b, red copper plate 23, the lower Y-direction permanent magnet array 24a and X-direction permanent magnet array 24b, and the damper lower backplane 25 are assembled, the damper upper backplane 21 and the damper lower backplane 25 are fixed, wherein the upper Y, The X-direction permanent magnet arrays 22a, 22b are installed between the upper back plate 21 of the damper and the copper plate 23, the lower Y, X-direction permanent magnet arrays 24a, 24b are installed between the copper plate 23 and the lower back plate 25 of the damper, and A strong magnetic field is formed between the air gaps. The copper plate 23 is fixed on the support frame 1. The upper back plate 21 of the damper is fixed to the balance mass block 2. Compared with the upper and lower back plates 21 and 25, the copper plate 23 can generate X, Y direction flat and Rz rotation; the first workpiece table 4a and the second workpiece table 4b are six-degree-of-freedom maglev micro-motion tables, and the six-degree-of-freedom maglev micro-motion tables are driven by Chuck401, suction cup 402, anti-collision frame 404, and macro-motion plane motor. sub 405, grating reading head 406, leveling and focusing sensor 407, wireless charging receiver 413, wireless communication transceiver 414, micro-motion planar motor mover 408 and gravity compensator mover 409 are integrated together to form, the suction cup 402 is installed on Chuck401. Four grating reading heads 406 and leveling and focusing sensors 407 are installed on the four corners of Chuck401. Anti-collision frames 404 are installed around Chuck401. The macro-motion planar motor mover 405 is installed on the anti-collision frames Below 404, the mover 405 of the macro-moving planar motor is composed of a staggered arrangement of magnetic steel arrays 411, and the stator 3 of the macro-moving planar motor is composed of an upper water-cooling pipe 3a, a coil array 412 and a lower water-cooling pipe 3c, in which the coil array 412 is arranged in a herringbone shape .

The working process of the present invention is as follows:

After the pre-alignment of the measurement position 11, the first workpiece table 4a is driven by the plane motor to move to the stage change position A, and waits for the second workpiece table 4b to complete the exposure at the exposure position 12. After the second workpiece table 4b completes the exposure, it is driven by the plane motor Drive and move to the stage change position B, and then the first workpiece table 4a and the second workpiece table 4b move counterclockwise along the circular arc track through the plane motor vector control to complete the stage change operation; after the stage change is completed, the first workpiece table 4a moves to the exposure position 12 moves to perform exposure at exposure position 12, and the second workpiece table 4b moves to measurement position 11 to perform loading and pre-alignment operations at measurement position 11; the second work table 4b that has completed pre-alignment of the silicon wafer first moves to the measurement position Change the stage position A', wait for the first workpiece stage 4a to complete the exposure and then move to the stage change position B', then, the second workpiece stage 4b and the first workpiece stage 4a move clockwise along the circular arc track through the vector control of the plane motor, and complete The second stage change; after the stage change is completed, the first workpiece stage 4a moves to the measurement position 11, and the second workpiece stage 4b moves to the exposure position 12, thus completing a complete working cycle.

Claims (2)

1. the floating double-workpiece-table vector circular arc channel switching method of the dynamic magnet steel magnetic based on Double water-cooled, it is characterised in that the method comprises the following steps: original operating state, measures position the first work stage and is in prealignment state, and exposure position second workpiece platform is in exposure status, the first step, by dynamic magnet steel actuation movement to measuring position zapping precalculated position A and charging and wait after the first work stage prealignment of measurement position, exposes after position second workpiece platform exposes by dynamic magnet steel actuation movement to exposure zapping precalculated position, position C, second step, first work stage and second workpiece platform by planar motor vector controlled along arc track counterclockwise movement, in motor process, the phase place of two work stage does not change, movement position is measured by plane grating, when the first work stage is by moving magnet steel actuation movement to exposure precalculated position, position C, second workpiece platform by moving magnet steel actuation movement to when measuring precalculated position, position D, zapping terminates, first work stage carries out silicon chip photolithographic exposure in exposure position, and second workpiece platform carries out silicon chip upper slice and wafer pre-alignment operation in measurement position, 3rd step, by dynamic magnet steel actuation movement to measuring position zapping precalculated position A' and charging and wait after the second workpiece platform prealignment of measurement position, exposes after position the first work stage exposes by dynamic magnet steel actuation movement to exposure precalculated position, position C, 4th step, second workpiece platform and the first work stage by planar motor vector controlled along arc track clockwise movement, when second workpiece platform is by moving magnet steel actuation movement to exposing precalculated position, position C, first work stage is by moving magnet steel actuation movement to when measuring precalculated position, position D, zapping terminates, exposure position second workpiece platform enters exposure status, measure position the first work stage and carry out fluctuating plate and prealignment operation, now system returns to original operating state, complete the working cycle comprising twice zapping operation, measuring, exposure and zapping process adopt wireless communication mode complete.

2. the floating double-workpiece-table vector circular arc programme changer of the dynamic magnet steel magnetic based on Double water-cooled, it is characterized in that this device includes supporting framework (1), balance mass block (2), first work stage (4a), second workpiece platform (4b), wireless charging emitter (30), described balance mass block (2) is positioned at support framework (1) top, grand dynamic planar motor stator (3) is arranged in the plane on balance mass block (2), first work stage (4a) and second workpiece platform (4b) are arranged in grand dynamic planar motor stator (3) top, described first work stage (4a) and second workpiece platform (4b) run between measurement position (11) and exposure position (12), the upper plane of first work stage (4a) and second workpiece platform (4b) is respectively mounted measurement bit plane grating (5a) and exposure bit plane grating (5b), support framework (1) to be connected with balance mass block (2) by the motion compensation mechanism that is made up of parallel with electromagnetic damper (14) plane leaf spring (13), described plane leaf spring (13) by 1 couple of X to leaf spring (26), 1 pair of Y-direction leaf spring (27), 1 Z-direction leaf spring (28) and 1 Rz flexible hinge (29) composition, described electromagnetic damper (14) is by backboard on antivibrator (21), top Y-direction permanent magnet array (22a) and X are to permanent magnet array (22b), copper plate (23), bottom Y-direction permanent magnet array (24a) and X are to permanent magnet array (24b), under antivibrator, backboard (25) is assembled, and on antivibrator, backboard (21) is fixed with backboard (25) under antivibrator, its middle and upper part Y, X is to permanent magnet array (22a, 22b) it is installed on antivibrator between backboard (21) and copper plate (23), bottom Y, X is to permanent magnet array (24a, 24b) being installed under copper plate (23) and antivibrator between backboard (25), and constitute high-intensity magnetic field between air gap, copper plate (23) is fixed in support framework (1), and on antivibrator, backboard (21) is fixed with balance mass block (2), relative to upper, lower backboard (21, 25) copper plate (23) can produce X, Y-direction translation and Rz rotate, first work stage (4a) and second workpiece platform (4b) are six-freedom-degree magnetic suspension jiggle station, described six-freedom-degree magnetic suspension jiggle station is by Chuck(401), sucker (402), crashproof frame (404), grand dynamic planar motor rotor (405), grating reading head (406), leveling and focusing sensor (407), wireless charging receptor (413), wireless communication transceiver (414) forms, fine motion planar motor rotor (408) and gravity compensator mover (409) integrate composition, described sucker (402) is arranged on Chuck(401) on, Chuck(401) four angles are provided with four grating reading heads (406) and leveling and focusing sensor (407), Chuck(401) surrounding is provided with crashproof frame (404), described grand dynamic planar motor rotor (405) is arranged on crashproof frame (404) lower section, grand dynamic planar motor rotor (405) is constituted by magnetic steel array (411) is staggered, grand dynamic planar motor stator (3) is by top water cooled pipeline (3a), coil array (412) and bottom water cooled pipeline (3c) are constituted, wherein coil array (412) becomes herringbone arrangement.