CN105196162B - conveying device - Google Patents
conveying device Download PDFInfo
- Publication number
- CN105196162B CN105196162B CN201510297363.0A CN201510297363A CN105196162B CN 105196162 B CN105196162 B CN 105196162B CN 201510297363 A CN201510297363 A CN 201510297363A CN 105196162 B CN105196162 B CN 105196162B
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- CN
- China
- Prior art keywords
- chip
- chuck table
- holding unit
- workpiece
- unit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/34—Accessories
- B24B37/345—Feeding, loading or unloading work specially adapted to lapping
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/27—Work carriers
- B24B37/30—Work carriers for single side lapping of plane surfaces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Jigs For Machine Tools (AREA)
- Grinding Of Cylindrical And Plane Surfaces (AREA)
Abstract
The present invention provides a kind of carrying device, which includes holding unit, keeps machined object;Mobile unit moves holding unit between temporary placement table and chuck table and moves in vertical direction;And support portion, holding unit is supported from the ends sag of mobile unit.Holding unit includes: discoid support member, is fixed on support portion;And cyclic annular pressing pad, it is disposed in the periphery lower surface of discoid support member, cyclic annular pressing pad includes press section, is formed as cyclic annular by elastomeric element, presses the outer region of machined object;And the dip portion of cone cell, be formed as cyclic annular by elastomeric element, be disposed in the circumferential lateral surface of press section, extend downward from press section, with downward and towards radial outside extension and thickness it is thinning.
Description
Technical field
The present invention relates to carrying device, the plate machined object with warpage is transported to chucking work by the carrying device
Platform, and the machined object attracting holding can be made in chuck table.
Background technique
In the manufacturing process of semiconductor devices or optical device, the shape on the front of semiconductor wafer or optical device wafer
At the segmentation preset lines of a plurality of clathrate for being known as spacing track, it is formed on each region divided by segmentation preset lines and partly leads
Body device, optical device.
Be ground the back side of these chips and after thickness as defined in being thinned to, along segmentation preset lines using cutting apparatus or
Person's laser processing device etc. is split, to produce semiconductor devices, optical device one by one.
When implementing grinding to the plates machined object such as semiconductor wafer or optical device wafer, grinding attachment is utilized
Chuck table slides grinding tool while abutting with the back side of chip via the face side of protection band attracting holding chip
It is dynamic, grinding and feeding is carried out thereby executing grinding to Grinding wheel.
Also, when implementing Tool in Cutting processing to plate machined object, rotate cutter tool along circuit orbit
Meanwhile processing feeding is carried out to the chuck table that remain plate machined object with defined processing feed speed, thus lead to
Cutter tool is crossed to carry out rotary cutting to the surface for the plate machined object being maintained on chuck table and make its planarization.
But plate machined object has warpage sometimes, for example, sometimes in WL-CSP (Wafer Level-Chip Size
Package: wafer scale sized package) chip etc. is laminated in the chip of unlike material has biggish warpage.Also, major diameter
Chip sometimes also have biggish warpage.
When chip significantly warpage, create the problem that since the retaining surface of chuck table is flat, it can not benefit
With chuck table attracting holding chip.In the case where the outer region warpage upwards of chip, the outer region of chip is floating
It rises, negative pressure leakage occurs and leads to not keep chip using chuck table.In Japanese Unexamined Patent Publication 2005-109057 bulletin and
Disclosing in Japanese Unexamined Patent Publication 2006-019566 bulletin being capable of removing using the chip of this warpage of chuck table attracting holding
Send device.
The absorption hand for the carrying device recorded in bulletin disclosed above includes absorption layer, only adsorbs the central portion of chip
Point;Plate covers the top of chip;Or pin, it is corresponding with the outer region of chip.
In these absorption hands, the chip for being transported to chuck table is pressed into the guarantor of chuck table using plate or pin
Face is held, to correct the warpage of chip, wafer suction is made to be held in chuck table.
Existing patent document
Patent document
Patent document 1: Japanese Unexamined Patent Publication 2005-109057 bulletin
Patent document 2: Japanese Unexamined Patent Publication 2006-019566 bulletin
Summary of the invention
However, script carrying device is not used to for chip to be pressed into the device of chuck table, it is larger in order to obtain
Pressing force and the motor for being used to that carrying device to be made to move up and down must be changed to powerful device.
Also, in this antidote, there are the following problems: because of the generation when chip to be pressed on chuck table
Counter-force and cause the track for being equipped with carrying device or keep track frame be deformed.
In mass-production process, when being iteratively produced this deformation in a device, it is possible to failure can be generated, needed pair
Deformed part is reinforced.When replacing to cope with above such problems or when the component of bracing means, can generate into
This increase such problems.
The present invention is completed in view of such point, and its purpose is to provide a kind of carrying devices, in conveying perimeter region
Domain the plate machined object of warpage and makes its attracting holding when chuck table upwards, not bracing means motor or remove
In the case where sending mechanism, the chip of outer region warpage upwards can be corrected as flat state, and can be normally
Attracting holding is in chuck table.
According to the present invention, a kind of carrying device is provided, by machined object from the interim of the interim machined object for placing plate
Work platform for placing is transported to the chuck table with retaining surface, even if for the quilt of peripheral part nearby than center warpage upwards
Machining object also can carry out attracting holding using chuck table, and the carrying device is characterized in that, it is single to include holding
Member keeps machined object;Mobile unit makes the holding unit between the temporary placement table and the chuck table
It moves and also moves in vertical direction;And support portion, from the ends sag of the mobile unit and support the holding list
Member, the holding unit include: discoid support member, are fixed on the support portion;Rod unit, it is discoid that one end penetrates through this
The central part of support member and the end that can be movably inserted in the support portion;Absorption layer is fixed on the rod unit
The other end, and there is adsorption plane;Helical spring is mounted between the absorption layer and the discoid support member, to absorption layer
It exerts a force downwards;And cyclic annular pressing pad, it is disposed in the periphery lower surface of the discoid support member, the ring-type pressing pad
Press section is included, is formed as cyclic annular by elastomeric element, there is the outer diameter for being greater than machined object and be less than the interior of machined object
Diameter, and press the outer region of machined object;And the dip portion of cone cell, be formed as cyclic annular by elastomeric element, be disposed in this
The circumferential lateral surface of press section extends downward from the press section, with downward and towards radial outside extension and thick
Spend thinning, which can move between prominent position and reception position, and the prominent position is the adsorption plane than should be by
Splenium position outstanding downwards, the reception position are the adsorption planes unlike press section position outstanding downwards.
Invention effect
Carrying device according to the present invention, after conveying plate machined object is placed on the retaining surface of chuck table,
Further make holding unit decline and utilize pressing pad press section pressing machined object outer region when, dip portion with
The outer peripheral portion of the retaining surface of chuck table contacts and presses the press section of the outer region of machined object, dip portion, chuck
The retaining surface and machined object area defined of workbench, form closed area, are processed being attracted using chuck table
When object, closed area becomes negative pressure and is adjacent to the machined object of warpage and the retaining surface of chuck table, being capable of attracting holding
Machined object with warpage.
Detailed description of the invention
Fig. 1 is the perspective view with the grinding attachment of carrying device of the invention.
Fig. 2 is the perspective view shown the case where pasting protection band on the front of semiconductor wafer.
Fig. 3 is the sectional view of the state of the chip of chuck table attracting holding warpage to be utilized.
Fig. 4 is the sectional view (one) being illustrated to the effect of the carrying device of embodiment of the present invention.
Fig. 5 be the effect of carrying device is illustrated sectional view (secondly).
Fig. 6 be the effect of carrying device is illustrated sectional view (thirdly).
Label declaration
10: thick grinding unit;11: semiconductor wafer;30: fine ginding unit;48: turntable;50: chuck table;66: facing
When work platform for placing;70: carrying device;80: holding unit;82: column;84: arm;86: support portion;88: discoid support portion
Part;90: rod unit;92: absorption layer;96: cyclic annular pressing pad;98: press section;100: dip portion;102: closed area.
Specific embodiment
Hereinafter, referring to attached drawing, the embodiment of the present invention will be described in detail.Referring to Fig.1, Fig. 1 is shown with this hair
The stereoscopic figure of the grinding attachment 2 of the carrying device of bright embodiment.Label 4 is the pedestal of grinding attachment, after pedestal 4
Column 6a, 6b there are two being just vertically arranged.
The a pair of guide rails 8 vertically extended is fixed on column 6a.Thick grinding unit 10 is installed to be being capable of edge
This pair of guide rails 8 move in the up-down direction.The shell 20 of thick grinding unit 10 is installed in along a pair of guide rails 8 upper and lower
The movable drill base 12 moved on direction.
Thick grinding unit 10 includes: shell 20;Axis 22 can rotatably be stored within the casing 20;Servo motor is received
It receives within the casing 20, for rotating drive shaft 22;Wheel assembly device 24, is fixed on the tip of the axis;And Grinding wheel 26, tool
There are multiple grinding tools roughly ground and cut, the grinding tool is detachably fixed on wheel assembly device 24.
Thick grinding unit 10 has thick grinding unit feed mechanism 18, and the thick grinding unit feed mechanism 18 is roughly ground by making
The ball-screw 14 that unit 10 moves in the up-down direction along a pair of guide rails 8 is cut to constitute with pulse motor 16.When to pulse electricity
When machine 16 is driven, ball-screw 14 rotates and moves movable drill base 12 along the vertical direction.
The a pair of guide rails 28 vertically extended is also fixed on another column 6b.Fine ginding unit 30 is installed to be
It can be moved in the up-down direction along this pair of guide rails 28.
The shell 40 of fine ginding unit 30 is installed in the movable drill base moved in the up-down direction along a pair of guide rails 28
32.Fine ginding unit 30 includes: shell 40;Axis 42 can be rotatably accommodated in shell 40;Servo motor is accommodated in
In shell 40, for rotating drive shaft 42;Wheel assembly device 44, is fixed on the end of axis 42;And Grinding wheel 46, have
The grinding tool of fine ginding, the grinding tool are detachably fixed on wheel assembly device 44.
Fine ginding unit 30 has fine ginding unit feed mechanism 38, and the fine ginding unit feed mechanism 38 is refined by making
The ball-screw 34 that unit 30 moves in the up-down direction along a pair of guide rails 28 is cut to constitute with pulse motor 36.When to pulse electricity
When machine 36 is driven, ball-screw 34 rotates and moves fine ginding unit 30 along the vertical direction.
Grinding attachment 2 has turntable 48 in the front side of column 6a, 6b, and the turntable 48 matches the upper surface being set as with pedestal 4
In parallel.Turntable 48 is formed as bigger discoid of diameter, by rotary drive mechanism (not shown) to side shown in arrow 49
To rotation.
Configured with 3 chuck tables 50 for being along the circumferential direction separated by 120 °, the chucking work on turntable 48
Platform 50 can rotate in the horizontal plane.Chuck table 50, which has, is formed as discoid maintaining part by porous ceramic film material, leads to
Crossing makes vacuum sucking unit be acted and carry out attracting holding to the chip in the retaining surface for being positioned in maintaining part.
It is suitably rotated by turntable 48,3 chuck tables 50 being disposed on turntable 48 are successively moved to chip and remove
Enter to move out region A, corase grinding cuts machining area B, fine ginding machining area C and chip carrying-in/carrying-out region A.
Box mounting region 52 is equipped in the front part of pedestal 4, box mounting region 52 is by being fixed on pedestal 4
2 box microscope carriers 54,56 are constituted.Box 58 of the mounting for the chip before storing grinding, is uploaded in box microscope carrier 56 on box microscope carrier 54
Set the box 60 for storing chip after grinding.
As shown in Fig. 2, on the front of semiconductor wafer (hereinafter, sometimes referred to simply as chip) 11, multiple segmentation preset lines
(spacing track) 13 is formed as clathrate, and IC (integrated circuit), LSI are formed on each region divided by segmentation preset lines 13
Devices such as (large scale integrated circuits) 15.The orientation plane 17 for indicating the crystal orientation of chip 11 is formed on chip 11.
In order to which protection is formed in positive device 15 when being ground at the back side for implementing chip 11, glued on the front of chip 11
Front protecting band 19 is posted, chip 11 is accommodated in box 58 in the state of making to be pasted on positive protection band 19 downward.
It is formed with recess portion 62 on the part adjacent with box mounting region 52 of pedestal 4, is equipped with crystalline substance in the recess portion 62
Piece conveying machine people 64.It is adjacent to recess portion 62 and is equipped with temporary placement table 66, the temporary placement table 66 is interim
The chip taken out by wafer transfer robot 64 from box 58 is placed, is equipped with shooting unit in the top of temporary placement table 66
68, the shooting unit 68 shoots the chip 11 being positioned on temporary placement table 66.
Label 70 is the carrying device of embodiment of the present invention comprising can move up and down and can borrow by cylinder etc.
Help the column 82 of the rotations such as motor, the upper end for being installed on column 82 arm 84, be fixed on arm 84 end support portion 86 with
And the holding unit 80 supported by support portion 86.
Carrying device 70 keeps the chip 11 being temporarily placed on temporary placement table 66 using the absorption of holding unit 80,
Chip 11 is transported to the chuck table 50 for being positioned at chip carrying-in/carrying-out region A.Carrying device 70 is also from being positioned at chip
Absorption keeps the chip of grinding completion and is transported to rotation cleaning unit 72 on the chuck table 50 of carrying-in/carrying-out region A.
The carrying device 70 of embodiment of the present invention is with the structure especially suitable for following situation: by the crystalline substance with warpage
Piece 11 is transported to from temporary placement table 66 to be positioned at the chuck table 50 of chip carrying-in/carrying-out region A and carries out attraction guarantor
It holds.
The problem of when referring to Fig. 3 to chip 11 using chuck table 50 to keep warpage, is illustrated.Chuck work
Make platform 50 with multiple attraction slots 74 in its retaining surface 50a upper opening, each attraction slot 74 is via attraction access 76,78 and does not scheme
The attraction source connection shown.
When the chip 11 for connecting the attraction access 76 of chuck table 50 with attraction source and wanting attracting holding that there is warpage
When, the partial compromise that negative pressure is not adjacent to the retaining surface 50a of chuck table 50 from chip 11 can not utilize chuck table
50 attracting holding chips 11.
When pressing chip 11 using press unit and keep it flat relative to the retaining surface 50a of chuck table 50, by
It will not be leaked from the retaining surface 50a of chuck table 50 in negative pressure, therefore 50 attracting holding chip of chuck table can be utilized
11。
Hereinafter, being described in detail referring to carrying device 70 of the fig. 4 to fig. 6 to embodiment of the present invention.As described above,
Carrying device 70 includes: the column 82 installed in a manner of it can move up and down and rotate relative to pedestal 4;It is installed on column 82
Upper end arm 84;The support portion 86 sagging from the terminal part of arm 84;And the holding unit 80 of the support by support portion 86.
As shown in (A) of Fig. 4, holding unit 80 has the discoid support member 88 for the end for being fixed on support portion 86.
One end of rod unit 90 penetrates through the central part of discoid support member 88 and can movably be inserted in the end of support portion 86,
Absorption layer 92 with adsorption plane 92a is installed on the other end of rod unit 90.In absorption layer 92 and discoid support member
The helical spring 94 to exert a force downwards to absorption layer 92 is installed between 86.
Cyclic annular pressing pad 96 is installed in the lower surface of the outer peripheral portion of discoid support member 88.Cyclic annular pressing pad 96 by
The dip portion 100 of press section 98 and cone cell is constituted, and the press section 98 is formed as cyclic annular by elastomeric elements such as rubber, is had and is greater than
The outer diameter of chip 11 and the internal diameter for being less than chip 11, the dip portion 100 utilize the rubber etc. of the material more soft than press section 98
Elastomeric element is formed as cyclic annular, is disposed in the circumferential lateral surface of press section 98, extends downward from press section 98, the dip portion
100 with downward and towards radial outside extension and thickness it is thinning.
Absorption layer 92 can move between prominent position and reception position, and the prominent position is absorption layer 92 by spiral
Spring 94 exert a force and make the position outstanding downwards than press section 98 adsorption plane 92a, the reception position be adsorption plane 92a not
Than position shown in press section 98 downwards (B) outstanding such as Fig. 6.
Hereinafter, being illustrated to the effect of carrying device 70.As shown in (A) of Fig. 4, rotate carrying device 70 arm 84 and
Holding unit 80 is positioned on the chip 11 of temporary placement table 66.
Then, as shown in (B) of Fig. 4, to the mobile holding unit 80 in lower section shown in arrow Z1, absorption layer 92 is pressed into
The central part of chip 11.Since the central part warpage in chip 11 is smaller, temporary placement table 66 is being relieved
Absorption after, can using absorption layer 92 absorption keep chip 11.
It is mobile to the direction arrow Y1 as shown in (A) of Fig. 5 in the state of keeping chip 11 using the absorption of absorption layer 92
Holding unit 80, that is, cursor 84 and the chip 11 for being held in absorption layer 92 is transported to and is positioned at chip carrying-in/carrying-out region A
Chuck table 50 on.Then, as shown in (B) of Fig. 5, to the mobile holding unit 80 in lower section shown in arrow Z1 by chip
11 are positioned on chuck table 50.
When further moving holding unit 80 downwards, as shown in (A) of Fig. 6, while helical spring 94 shortens,
The upper end of rod unit 90 enters in support portion 86.At the same time, due to the press section 98 of cyclic annular pressing pad 96 and chip 11
Peripheral part abuts, and cyclic annular dip portion 100 is abutted with the peripheral part of the retaining surface 50a of chuck table 50, therefore, cyclic annular sagging
Closed area 102 is formd between portion 100, press section 98, chip 11 and the retaining surface 50a of chuck table 50.
When in this state, by chuck table 50 connect with attraction source and as shown by arrow A to attracting access 76 to carry out
When attraction, suction function makes to become negative pressure (negative pressure) in closed area 102 in attraction slot 74.Therefore,
When pressing holding unit 80 along the direction arrow Z1, as shown in (B) of Fig. 6, due to also can be sharp with not too much big pressing force
It is flat for pressing the peripheral part of chip 11 with press section 98 and correcting chip 11, even therefore the chip 11 with warpage
Also attracting holding can be carried out using chuck table 50.
When increase arm 84, due to the retaining surface of chip 11 and chuck table 50
50a is adjacent to, therefore is able to maintain that the state using 50 attracting holding chip 11 of chuck table.
After in this way using 50 attracting holding of chuck table chip 11, turntable 48 is made to rotate 120 ° and determine chip 11
Machining area B is cut positioned at corase grinding, is cut using the corase grinding that thick grinding unit 10 implements chip 11.After implementing corase grinding and cutting, it will turn
Disk 48 further rotates 120 ° and chip 11 is positioned at fine ginding machining area C, implements chip 11 using fine ginding unit 30
Fine ginding.
After implementing fine ginding, turntable 48 is further rotated 120 ° and the chuck table 50 of chip 11 will be remain
It is positioned at chip carrying-in/carrying-out region A.Then, it rotates the arm 84 of carrying device 70 and holding unit 80 is located in chip 11
On, then decline holding unit 80, contacts the adsorption plane 92a of absorption layer 92 with chip 11.
After the attracting holding for releasing chuck table 50, chip 11 is adsorbed using absorption layer 92, rotation carrying device 70
Arm 84 and chip 11 after grinding is transported to rotation cleaning unit 72, chip 11 is rotated using rotation cleaning unit 72
Cleaning and rotary drying.
In the above-described embodiment, the example that carrying device 70 is applied to the chip 11 with warpage is said
It is bright, but the chip 11 of warpage can certainly not transported.In addition, and be not only the conveying of chip, also can be same
Carrying device of the invention is applied to the conveying of other plate machined objects such as WL-CSP chip by ground.
In the above description, the example that carrying device 70 of the invention is applied to grinding attachment is illustrated,
But the invention is not restricted to this, can also be equally applicable to the chucking work with the plates machined object such as attracting holding chip
The processing unit (plant)s such as cutting apparatus, grinding device, Tool in Cutting device, the laser processing device of platform.
Claims (1)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2014124362A JP6335672B2 (en) | 2014-06-17 | 2014-06-17 | Transport device |
JP2014-124362 | 2014-06-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
CN105196162A CN105196162A (en) | 2015-12-30 |
CN105196162B true CN105196162B (en) | 2019-03-08 |
Family
ID=54944289
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201510297363.0A Active CN105196162B (en) | 2014-06-17 | 2015-06-03 | conveying device |
Country Status (4)
Country | Link |
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JP (1) | JP6335672B2 (en) |
KR (1) | KR102214368B1 (en) |
CN (1) | CN105196162B (en) |
TW (1) | TWI649157B (en) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6761271B2 (en) * | 2016-04-05 | 2020-09-23 | キヤノン株式会社 | Processing equipment and manufacturing method of articles |
JP6685857B2 (en) * | 2016-07-04 | 2020-04-22 | 株式会社ディスコ | Processing equipment |
JP6696851B2 (en) * | 2016-07-13 | 2020-05-20 | 株式会社ディスコ | Chuck table mechanism |
KR20180045666A (en) * | 2016-10-26 | 2018-05-04 | 삼성전자주식회사 | Apparatus for producting substrate |
JP6855217B2 (en) * | 2016-11-04 | 2021-04-07 | 株式会社東京精密 | Wafer transfer holding device |
JP6866115B2 (en) * | 2016-11-04 | 2021-04-28 | 株式会社東京精密 | Wafer transfer holding device |
CN108615697B (en) * | 2016-12-09 | 2020-11-03 | 矽电半导体设备(深圳)股份有限公司 | Automatic chip loading and unloading device |
JP2018126830A (en) * | 2017-02-09 | 2018-08-16 | 株式会社ディスコ | Processing system |
JP7166065B2 (en) * | 2018-03-02 | 2022-11-07 | 株式会社東京精密 | Wafer carrier and holder |
JP7108467B2 (en) * | 2018-03-30 | 2022-07-28 | 株式会社岡本工作機械製作所 | Substrate suction device |
TWI647782B (en) * | 2018-05-16 | 2019-01-11 | 力成科技股份有限公司 | Vacuum positioning device for fan-out wafer- panel level packaging |
JP2020009827A (en) * | 2018-07-04 | 2020-01-16 | 株式会社ディスコ | Inspection method of device chip |
JP7216613B2 (en) * | 2019-05-16 | 2023-02-01 | 株式会社ディスコ | processing equipment |
JP7256685B2 (en) * | 2019-05-16 | 2023-04-12 | 株式会社ディスコ | Grinding equipment |
JP7396815B2 (en) * | 2019-06-12 | 2023-12-12 | 株式会社ディスコ | robot hand |
CN111584416A (en) * | 2020-04-30 | 2020-08-25 | 南通通富微电子有限公司 | Wafer handling device and wafer thinning equipment |
US11533577B2 (en) | 2021-05-20 | 2022-12-20 | Apple Inc. | Method and system for detecting sound event liveness using a microphone array |
WO2025013636A1 (en) * | 2023-07-10 | 2025-01-16 | 東京エレクトロン株式会社 | Substrate processing device and chuck operation method |
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CN102456600A (en) * | 2010-10-18 | 2012-05-16 | 株式会社迪思科 | Wafer conveying mechanism |
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US7726715B2 (en) * | 2003-01-29 | 2010-06-01 | Mitsuboshi Diamond Industrial Co., Ltd. | Vacuum suction head |
JP2005109057A (en) | 2003-09-30 | 2005-04-21 | Okamoto Machine Tool Works Ltd | Substrate carrying instrument |
JP2006019566A (en) | 2004-07-02 | 2006-01-19 | Toshiba Corp | Semiconductor substrate adsorption hand and its operation method |
JP5180557B2 (en) * | 2007-10-31 | 2013-04-10 | 株式会社ディスコ | Processing equipment |
JP2010153419A (en) * | 2008-12-24 | 2010-07-08 | Ushio Inc | Workpiece stage and exposure apparatus using the workpiece stage |
JP5368200B2 (en) * | 2009-07-15 | 2013-12-18 | 株式会社ディスコ | Processing equipment |
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2014
- 2014-06-17 JP JP2014124362A patent/JP6335672B2/en active Active
-
2015
- 2015-05-05 TW TW104114257A patent/TWI649157B/en active
- 2015-06-03 CN CN201510297363.0A patent/CN105196162B/en active Active
- 2015-06-16 KR KR1020150085133A patent/KR102214368B1/en active Active
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CN102117758A (en) * | 2009-11-27 | 2011-07-06 | 株式会社迪思科 | Transfer mechanism |
CN102456600A (en) * | 2010-10-18 | 2012-05-16 | 株式会社迪思科 | Wafer conveying mechanism |
Also Published As
Publication number | Publication date |
---|---|
KR102214368B1 (en) | 2021-02-08 |
JP6335672B2 (en) | 2018-05-30 |
JP2016004909A (en) | 2016-01-12 |
CN105196162A (en) | 2015-12-30 |
TW201603947A (en) | 2016-02-01 |
KR20150144713A (en) | 2015-12-28 |
TWI649157B (en) | 2019-02-01 |
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