CN105180800B - The high optics sub-structure of auto-collimation grating interferometer - Google Patents
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Abstract
一种自准直光栅干涉仪的高光学细分结构,包括:标尺光栅、第一反射镜和第二反射镜;测量光束以近利特罗角首次入射到所述的标尺光栅,经标尺光栅衍射,衍射级次为‑1的衍射光在第一平面内,该‑1级次衍射光入射到所述的第一反射镜,经第一反射镜反射后依然在第一平面内,并再次以近利特罗角入射到标尺光栅上,如此使测量光束在标尺光栅和第一反射镜之间往返反射,最终垂直入射到第二反射镜后,测量光束沿原光路返回,整个结构形成自准直结构。本发明使光学细分倍数提高至N倍,采用近利特罗角入射,可使标尺光栅设计制作更为简便,增加测量光束经标尺光栅衍射的次数,即增加光栅干涉仪光学细分的倍数。
A highly optically subdivided structure of a self-collimating grating interferometer, comprising: a scale grating, a first reflector and a second reflector; the measurement beam is first incident on the scale grating at a near Littrow angle, and is diffracted by the scale grating , the diffracted light with a diffraction order of -1 is in the first plane, and the -1 order diffracted light is incident on the first reflector, and is still in the first plane after being reflected by the first reflector, and is again nearly The Littrow angle is incident on the scale grating, so that the measurement beam is reflected back and forth between the scale grating and the first reflector, and finally perpendicularly incident on the second reflector, the measurement beam returns along the original optical path, and the whole structure forms a self-collimation structure. The invention increases the optical subdivision multiple to N times, adopts near Littrow angle incident, can make the design and manufacture of the scale grating easier, increases the number of times the measurement beam is diffracted by the scale grating, that is, increases the multiple of the optical subdivision of the grating interferometer .
Description
技术领域technical field
本发明涉及一种光栅干涉仪,特别是一种自准直光栅干涉仪的高光学细分结构,该结构能大幅度提高光栅干涉仪的光学细分倍数。The invention relates to a grating interferometer, in particular to a high optical subdivision structure of the self-collimating grating interferometer, which can greatly increase the optical subdivision multiple of the grating interferometer.
背景技术Background technique
对微纳米精密位移测量的仪器目前主要包括两种:激光干涉仪和光栅干涉仪。激光干涉仪以波长为基准,能得到很高的分辨率,但由于波长容易受到环境、光源等因素的影响,其应用受到了限制。而光栅干涉仪刚好弥补了激光干涉仪的缺点,其以光栅周期作为基准,测量结果基本不受环境和波长的影响,已广泛应用于加工机床、机器人、生物医疗等领域。There are currently two main types of instruments for micro-nano precision displacement measurement: laser interferometer and grating interferometer. Laser interferometer is based on wavelength and can obtain high resolution, but its application is limited because the wavelength is easily affected by factors such as environment and light source. The grating interferometer just makes up for the shortcomings of the laser interferometer. It uses the grating period as the reference, and the measurement results are basically not affected by the environment and wavelength. It has been widely used in processing machine tools, robots, biomedical and other fields.
无论是激光干涉仪还是光栅干涉仪,其分辨率大小都取决于光学细分倍数和电子细分倍数。由于电子细分受限于光学细分信号,在电子细分相同的情况下,光学细分倍数越高,其测量分辨率越高。目前典型的光栅干涉仪系统,如海德汉公司的专利US5574558,日本佳能公司的专利US5038032,美国IBM公司的专利US5442172等,其光学细分倍数并不高,一般为2或4倍。所以提高光学细分倍数有着重要的意义。本发明在光栅效率足够高的情况下理论上能无限地提高光学细分倍数,解决了目前光栅干涉仪细分倍数低的问题。Whether it is a laser interferometer or a grating interferometer, its resolution depends on the optical subdivision multiple and the electronic subdivision multiple. Since the electronic subdivision is limited by the optical subdivision signal, in the case of the same electronic subdivision, the higher the optical subdivision multiple, the higher the measurement resolution. Currently typical grating interferometer systems, such as the patent US5574558 of Heidenhain, the patent US5038032 of Canon of Japan, the patent US5442172 of IBM, etc., the optical subdivision multiple is not high, generally 2 or 4 times. Therefore, it is of great significance to increase the optical subdivision multiple. The present invention can theoretically increase the optical subdivision factor infinitely under the condition that the grating efficiency is sufficiently high, and solves the problem of low subdivision factor of the current grating interferometer.
发明内容Contents of the invention
本发明的目的在于解决目前光栅干涉仪光学细分倍数低的问题,提出一种用于自准直光栅干涉仪的高光学细分结构,该结构能使测量光束多次被光栅标尺衍射,从而大幅度提高光栅干涉仪系统的光学细分倍数。The purpose of the present invention is to solve the problem of low optical subdivision multiples of the current grating interferometer, and propose a high optical subdivision structure for the self-collimation grating interferometer, which can make the measuring beam diffracted by the grating scale many times, thereby Greatly increase the optical subdivision multiple of the grating interferometer system.
本发明的原理如下:Principle of the present invention is as follows:
光栅干涉仪的原理是利用光栅多普勒频移计算光栅标尺的位移,所述的光栅多普勒频移或者通过测量光束和参考光束干涉形成条纹移动的数目获得,或者通过两束测量光束干涉形成条纹移动的数目获得。所述的测量光束为经过光栅标尺衍射的光束,所述的参考光束为不经光栅标尺衍射的光束。The principle of the grating interferometer is to use the grating Doppler frequency shift to calculate the displacement of the grating scale. The grating Doppler frequency shift is either obtained by the number of fringe movements formed by the interference of the measuring beam and the reference beam, or by the interference of two measuring beams. The number of fringe moves is obtained. The measuring beam is a beam diffracted by the grating scale, and the reference beam is a beam not diffracted by the grating scale.
本发明的自准直光栅干涉仪的高光学细分结构使光栅干涉仪的测量光束以近利特罗角入射光栅标尺,利特罗角可通过下式得到,The high optical subdivision structure of the self-collimating grating interferometer of the present invention makes the measurement beam of the grating interferometer incident on the grating scale at a near Littrow angle, and the Littrow angle can be obtained by the following formula,
式中λ为测量光束的波长,d为光栅周期。Where λ is the wavelength of the measuring beam, and d is the grating period.
本发明的技术解决方案如下:Technical solution of the present invention is as follows:
一种自准直光栅干涉仪的高光学细分结构,特点在于其构成包括:标尺光栅、第一反射镜和第二反射镜;A high optical subdivision structure of a self-collimating grating interferometer is characterized in that its composition includes: a scale grating, a first reflector and a second reflector;
设第一平面为测量光束与标尺光栅栅线所形成的平面,第二平面为标尺光栅法线与标尺光栅栅线所形成的平面,所述的第一平面和所述的第二平面的夹角为利特罗角,第三平面为标尺光栅法线与光栅矢量形成的平面;Let the first plane be the plane formed by the measuring light beam and the scale grating lines, the second plane be the plane formed by the scale grating normal and the scale grating lines, the first plane and the second plane between The angle is the Littrow angle, and the third plane is the plane formed by the scale grating normal and the grating vector;
所述的第一反射镜的反射面垂直于所述的第一平面,所述的第二反射镜的反射面垂直于经标尺光栅第N次衍射的衍射光方向,其中2N为测量光束被标尺光栅衍射的总衍射次数;The reflective surface of the first reflector is perpendicular to the first plane, and the reflective surface of the second reflector is perpendicular to the direction of the diffracted light diffracted by the scale grating for the Nth time, where 2N is the measuring beam being measured by the scale The total number of diffractions for grating diffraction;
所述的测量光束以近利特罗角首次入射到所述的标尺光栅,经标尺光栅衍射,衍射级次为-1的衍射光在第一平面内,该-1级次衍射光入射到所述的第一反射镜,经第一反射镜反射后依然在第一平面内,并再次以近利特罗角入射到标尺光栅上,如此使测量光束在标尺光栅和第一反射镜之间往返反射,最终垂直入射到第二反射镜后,测量光束沿原光路返回,整个结构形成自准直结构。The measuring beam is first incident on the scale grating at a near Littrow angle, and is diffracted by the scale grating. The diffracted light with a diffraction order of -1 is in the first plane, and the -1 order diffracted light is incident on the The first reflector is still in the first plane after being reflected by the first reflector, and is incident on the scale grating at a near Littrow angle again, so that the measuring beam is reflected back and forth between the scale grating and the first reflector, After finally being perpendicularly incident on the second reflector, the measuring beam returns along the original optical path, and the whole structure forms a self-collimating structure.
所述的近利特罗角是指处在第一平面内的测量光束偏离第三平面一个角度。The near Littrow angle means that the measurement beam in the first plane deviates from the third plane by an angle.
进一步,本发明还包括:第三反射镜和第四反射镜;Further, the present invention also includes: a third reflecting mirror and a fourth reflecting mirror;
所述的第三反射镜与所述的第一反射镜以所述的标尺光栅相垂直的平面为轴镜像对称,所述的第四反射镜与所述的第二反射镜以所述的标尺光栅相垂直的平面为轴镜像对称;The third reflector and the first reflector are mirror-symmetrical with respect to the plane perpendicular to the scale grating, and the fourth reflector and the second reflector are symmetrical with respect to the scale The plane perpendicular to the grating is axisymmetric;
两束测量光束以所述的标尺光栅相垂直的平面为轴镜像对称、且分别以近利特罗角首次入射到所述的标尺光栅,经标尺光栅衍射,衍射级次为-1的衍射光在第一平面内,该-1级次衍射光分别入射到所述的第一反射镜和第三反射镜,经第一反射镜、第三反射镜反射后依然在第一平面内,并再次以近利特罗角入射到标尺光栅上,如此使测量光束在标尺光栅和第一反射镜、标尺光栅和第三反射镜之间往返反射,最终垂直分别入射到第二反射镜和第四反射镜后,测量光束分别沿原光路返回,整个结构形成自准直结构。The two measuring beams are mirror-symmetrical with respect to the plane perpendicular to the scale grating, and respectively incident on the scale grating for the first time at a near Littrow angle, and are diffracted by the scale grating, and the diffracted light with a diffraction order of -1 is In the first plane, the -1-order diffracted light is respectively incident on the first reflector and the third reflector, and is still in the first plane after being reflected by the first reflector and the third reflector, and is again nearly The Littrow angle is incident on the scale grating, so that the measurement beam is reflected back and forth between the scale grating and the first reflector, the scale grating and the third reflector, and finally perpendicularly incident on the second reflector and the fourth reflector respectively , the measuring beam returns along the original optical path respectively, and the whole structure forms a self-collimating structure.
特别地,本发明适用于干涉条纹为两束测量光形成的自准直光栅干涉仪,只要增加第三反射镜和第四反射镜即可,第三反射镜和第四反射镜放置的情况与第一反射镜和第二反射镜放置的情况完全相同。第一测量光束在标尺光栅和第一反射镜之间往返反射并最终垂直入射到第二反射镜沿原光路返回,第二测量光束则是在标尺光栅和第三反射镜之间来回反射并最终垂直入射到第四反射镜上沿原光路返回。In particular, the present invention is applicable to the self-collimating grating interferometer whose interference fringes are formed by two beams of measuring light, as long as the third reflector and the fourth reflector are added, the placement of the third reflector and the fourth reflector is the same as The placement of the first and second mirrors is exactly the same. The first measurement beam is reflected back and forth between the scale grating and the first reflector, and finally enters the second reflector perpendicularly and returns along the original optical path; the second measurement beam is reflected back and forth between the scale grating and the third reflector and finally It is perpendicularly incident on the fourth reflector and returns along the original optical path.
特别地,每次近利特罗角入射时测量光束偏离第三平面的小角度可以相等亦可以不相等。In particular, the small angles by which the measurement beam deviates from the third plane at each incidence near the Littrow angle may or may not be equal.
特别地,本发明采用的是以近利特罗角入射,也可以采用近多次布拉格角入射。m次布拉格角为,In particular, the present invention adopts near-Littrow angle incidence, and may also adopt near-multiple Bragg angle incidence. The m-th Bragg angle is,
式中m为衍射级次。where m is the diffraction order.
与现有技术相比,本发明的技术效果:Compared with prior art, technical effect of the present invention:
本发明使测量光束以近利特罗角入射到标尺光栅上,通过反射镜使得测量光束被标尺光栅多次衍射,从而达到高光学细分的效果。由光栅多普勒频移效应可知,入射光束在标尺光栅上经过N次-1级次衍射,则对测量光束产生N倍多普勒频移,可使光学细分倍数提高至N倍。特别地,本发明采用近利特罗角入射,可使标尺光栅设计制作更为简便,因为光栅在利特罗角入射时容易获得高衍射效率,意味着可以增加测量光束经标尺光栅衍射的次数,即增加光栅干涉仪光学细分的倍数。特别地,本发明仅采用两个反射镜设计高光学细分结构,结构简单,经济实惠。The invention makes the measurement light beam incident on the scale grating at a near Littrow angle, and the measurement light beam is diffracted by the scale grating for multiple times through the reflection mirror, so as to achieve the effect of high optical subdivision. According to the grating Doppler frequency shift effect, it can be seen that the incident beam undergoes N times-1 order diffraction on the scale grating, which will generate N times Doppler frequency shift to the measuring beam, which can increase the optical subdivision multiple to N times. In particular, the present invention adopts near Littrow angle incidence, which can make the design and manufacture of the scale grating easier, because the grating is easy to obtain high diffraction efficiency when the Littrow angle is incident, which means that the number of diffractions of the measuring beam through the scale grating can be increased , that is, to increase the multiple of the optical subdivision of the grating interferometer. In particular, the present invention adopts only two mirrors to design a high optical subdivision structure, which is simple in structure and economical.
附图说明Description of drawings
图1是自准直光栅干涉仪的高光学细分部件示意图Figure 1 is a schematic diagram of the high optical subdivision components of the self-collimating grating interferometer
图2是另一种自准直光栅干涉仪的高光学细分部件示意图Figure 2 is a schematic diagram of high optical subdivision components of another self-collimating grating interferometer
图3是应用自准直光栅干涉仪的高光学细分部件实施例1的示意图Fig. 3 is the schematic diagram of embodiment 1 of high optical subdivision components using self-collimating grating interferometer
图4为应用自准直光栅干涉仪的高光学细分部件实施例2的示意图Fig. 4 is the schematic diagram of embodiment 2 of high optical subdivision components using self-collimating grating interferometer
图5为应用自准直光栅干涉仪的高光学细分部件实施例3的示意图Fig. 5 is the schematic diagram of embodiment 3 of high optical subdivision components using self-collimating grating interferometer
具体实施方式detailed description
本发明自准直光栅干涉仪的高光学细分结构可用于所有的自准直光栅干涉仪的结构中,激光光源可以采用单频激光光源,也可以采用双频激光光源,干涉信号可以是两束测量光形成的,也可以是测量光束和参考光束干涉形成的。下面结合实施例和附图对本发明作进一步说明,但不应以此限制本发明的保护范围。The high optical subdivision structure of the self-collimating grating interferometer of the present invention can be used in the structure of all self-collimating grating interferometers, and the laser light source can adopt a single-frequency laser light source or a dual-frequency laser light source, and the interference signal can be two The measurement beam can also be formed by the interference of the measurement beam and the reference beam. The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.
一种自准直光栅干涉仪的高光学细分结构30如图1所示,主要用于测量光束和参考光束形成干涉条纹的光栅干涉仪中。该结构包括:光栅标尺1,第一反射镜2,第二反射镜3。测量光束的入射光束41首次入射到所述的标尺光栅1后,经标尺光栅1衍射,衍射光经第一反射镜2反射后依然在第一平面内,再次以近利特罗角入射到标尺光栅1上,如此使测量光束在标尺光栅1和第一反射镜2之间往返反射,最终垂直入射到第二反射镜3,测量光束将沿原光路返回形成出射光束42,光束42与光束41共线,但传播方向相反。整个结构形成自准直结构。特别地,每次近利特罗角入射时测量光束偏离第三平面的小角度可以相等亦可以不相等。测量光束的出射光束42经后续光栅干涉的结构后和参考光束汇合在一起形成干涉条纹,通过干涉条纹可以计算多普勒频移,从而得到光栅的位移。此结构的特点在于,只有一束测量光束,这能充分减轻光栅设计制作的负担,只需要优化一个偏振方向的光束的衍射光高衍射效率即可。A highly optically subdivided structure 30 of a self-collimating grating interferometer is shown in FIG. 1 , which is mainly used in a grating interferometer in which measuring beams and reference beams form interference fringes. The structure includes: a grating scale 1 , a first reflector 2 and a second reflector 3 . After the incident light beam 41 of the measuring beam is incident on the scale grating 1 for the first time, it is diffracted by the scale grating 1, and the diffracted light is still in the first plane after being reflected by the first reflector 2, and is incident on the scale grating again at a near Littrow angle 1, so that the measuring beam is reflected back and forth between the scale grating 1 and the first reflector 2, and finally is perpendicularly incident on the second reflector 3, and the measuring beam will return along the original optical path to form an outgoing beam 42. The beam 42 and the beam 41 share the same line, but in the opposite direction. The whole structure forms a self-collimating structure. In particular, the small angles by which the measurement beam deviates from the third plane at each incidence near the Littrow angle may or may not be equal. The outgoing beam 42 of the measurement beam passes through the subsequent grating interference structure and merges with the reference beam to form interference fringes. The Doppler frequency shift can be calculated through the interference fringes, thereby obtaining the displacement of the grating. The characteristic of this structure is that there is only one measurement beam, which can fully reduce the burden of grating design and manufacture, and only need to optimize the diffraction efficiency of the beam in one polarization direction to achieve high diffraction efficiency.
另一种自准直光栅干涉仪的高光学细分结构30如图2所示,主要用于两束测量光形成干涉条纹的光栅干涉仪中。该结构包括:光栅标尺1,第一反射镜2,第二反射镜3,第三反射镜4,第四反射镜5。第一测量光束的入射光束41首次入射到所述的标尺光栅1后,经标尺光栅1衍射,衍射光经第一反射镜2反射后,再次以近利特罗角入射到标尺光栅1上,如此使测量光束在标尺光栅1和第一反射镜2之间往返反射,最终垂直入射到第二反射镜3,第一测量光束将沿原光路返回形成第一测量光束的出射光束42,第一测量光束的出射光束42与第一测量光束的入射光束41共线,但传播方向相反。第二测量光束的入射光束43首次入射到所述的标尺光栅1后,经标尺光栅1衍射,衍射光经第三反射镜4反射后,再次以近利特罗角入射到标尺光栅1上,如此使测量光束在标尺光栅1和第三反射镜4之间往返反射,最终垂直入射到第四反射镜5,第二测量光束将沿原光路返回形成第二测量光束的出射光束44,第二测量光束的出射光束44与第二测量光束的入射光束43共线,但传播方向相反。整个结构形成自准直结构。特别地,每次近利特罗角入射时测量光束偏离第三平面的小角度可以相等亦可以不相等。第一测量光束的出射光束42和第二测量光束的出射光束44经光栅干涉仪的后续结构后汇合在一起形成干涉条纹,通过干涉条纹可以计算多普勒频移,从而得到光栅的位移。此结构的特点在于,能充分利用两束测量光经标尺光栅衍射后多普勒频移的方向相反,使得光学细分倍数增加了一倍。Another highly optically subdivided structure 30 of a self-collimating grating interferometer is shown in FIG. 2 , which is mainly used in a grating interferometer in which two beams of measuring light form interference fringes. The structure includes: a grating scale 1 , a first reflector 2 , a second reflector 3 , a third reflector 4 and a fourth reflector 5 . After the incident light beam 41 of the first measurement beam is incident on the scale grating 1 for the first time, it is diffracted by the scale grating 1, and after being reflected by the first reflector 2, the diffracted light is incident on the scale grating 1 again at a near Littrow angle, so The measurement beam is reflected back and forth between the scale grating 1 and the first reflector 2, and is finally perpendicularly incident on the second reflector 3. The first measurement beam will return along the original optical path to form the outgoing beam 42 of the first measurement beam. The first measurement The outgoing beam 42 of the beam is collinear with the incoming beam 41 of the first measurement beam, but in the opposite direction of propagation. After the incident light beam 43 of the second measurement beam is incident on the scale grating 1 for the first time, it is diffracted by the scale grating 1, and after the diffracted light is reflected by the third reflector 4, it is incident on the scale grating 1 again at a near Littrow angle, so The measurement beam is reflected back and forth between the scale grating 1 and the third reflector 4, and is finally vertically incident on the fourth reflector 5. The second measurement beam will return along the original optical path to form the outgoing beam 44 of the second measurement beam. The second measurement The outgoing beam 44 of the beam is collinear with the incoming beam 43 of the second measurement beam, but in the opposite direction of propagation. The whole structure forms a self-collimating structure. In particular, the small angles by which the measurement beam deviates from the third plane at each incidence near the Littrow angle may or may not be equal. The outgoing beam 42 of the first measuring beam and the outgoing beam 44 of the second measuring beam are combined to form interference fringes after passing through the subsequent structure of the grating interferometer, and the Doppler frequency shift can be calculated through the interference fringes, thereby obtaining the displacement of the grating. The feature of this structure is that it can make full use of the opposite direction of Doppler frequency shift after the two beams of measuring light are diffracted by the scale grating, so that the optical subdivision factor is doubled.
图3为应用自准直光栅干涉仪的高光学细分部件实例1的原理示意图,光源为双频激光光源,干涉信号为测量光束和参考光束形成的。双频激光器51发出正交双频线偏振光,经非偏振分束器52平分成两束光,一束通过与正交双频线偏振光45度放置的第一检偏器59后形成干涉信号,并由第一光电探测器61接收,作为双频外差干涉术的参考信号;另一束通过偏振分束器52分成透射P光和反射S光,P光作为测量光束,S光作为参考光束,测量光束通过第五反射镜56入射到如图1所示的自准直光栅干涉仪的高光学细分结构30,测量光束的入射光束41经高光学细分结构后变为测量光束的出射光束42。参考光束经垂直入射到第六反射镜57原路返回,并与经自准直光栅干涉仪的高光学细分结构出射的依次经过第五反射镜56、偏振分光棱镜53的光束42共同入射到非偏振分光镜52,测量光束和参考光束经非偏振分光镜52反射部分的光经45度放置的第二检偏器58后形成干涉信号,并由第二光电探测器60接收,作为双频外差干涉术的测量信号;上述参考信号和测量信号经由数据采集和处理及控制单元62处理即可获得标尺衍射光栅的横向位移量。Fig. 3 is a schematic diagram of the principle of the example 1 of the highly subdivided component using the self-collimating grating interferometer. The light source is a dual-frequency laser light source, and the interference signal is formed by the measurement beam and the reference beam. The dual-frequency laser 51 emits orthogonal dual-frequency linearly polarized light, which is split into two beams by the non-polarizing beam splitter 52, and one beam passes through the first analyzer 59 placed at 45 degrees to the orthogonal dual-frequency linearly polarized light to form interference The signal is received by the first photodetector 61 as a reference signal for dual-frequency heterodyne interferometry; the other beam is divided into transmitted P light and reflected S light by a polarizing beam splitter 52, P light is used as a measuring beam, and S light is used as The reference beam and the measuring beam are incident on the high optical subdivision structure 30 of the self-collimating grating interferometer shown in FIG. The outgoing beam 42. The reference beam is vertically incident on the sixth reflector 57 and returns on the original path, and is jointly incident with the beam 42 that passes through the fifth reflector 56 and the polarizing beam splitter prism 53 through the high optical subdivision structure of the self-collimating grating interferometer. Non-polarizing beam splitter 52, the light reflected by the non-polarizing beam splitter 52 of the measuring beam and the reference beam forms an interference signal after passing through the second analyzer 58 placed at 45 degrees, and is received by the second photodetector 60 as a dual-frequency The measurement signal of heterodyne interferometry; the above-mentioned reference signal and measurement signal can be processed by the data acquisition and processing and control unit 62 to obtain the lateral displacement of the scale diffraction grating.
图4为应用自准直光栅干涉仪的高光学细分部件实例2的原理示意图,光源为双频激光光源,干涉信号为两束测量光形成的。双频激光器51发出正交双频线偏振光,经非偏振分束器52平分成两束光,一束通过与正交双频线偏振光45度放置的第一检偏器59后形成干涉信号,并由第一光电探测器61接收,作为双频外差干涉术的参考信号;另一束通过偏振分束器53分成透射P光和反射S光,分别由第一四分之一波片54和第二四分之一波片55变换为圆偏振光,再通过第五反射镜56和第六反射镜57入射到如图2所示的自准直光栅干涉仪的高光学细分结构30,第一测量光束的入射光束41和第二测量光束的入射光束43经高光学细分结构后变为第一测量光束的出射光束42和第二测量光束的出射光束44,两出射光束再次经过第一反射镜56和第二反射镜57,第一四分之一波片54和第二四分之一波片55变换为与原偏振态正交的线偏振光,经过偏振分光棱镜53共同入射到45度放置的第二检偏器58后形成干涉信号,并由第二光电探测器60接收,作为双频外差干涉术的测量信号;上述参考信号和测量信号经由数据采集和处理及控制单元62处理即可获得标尺衍射光栅的横向位移量。Figure 4 is a schematic diagram of the principle of the example 2 of the high optical subdivision component using the self-collimating grating interferometer. The light source is a dual-frequency laser light source, and the interference signal is formed by two beams of measurement light. The dual-frequency laser 51 emits orthogonal dual-frequency linearly polarized light, which is split into two beams by the non-polarizing beam splitter 52, and one beam passes through the first analyzer 59 placed at 45 degrees to the orthogonal dual-frequency linearly polarized light to form interference signal, and is received by the first photodetector 61 as the reference signal of dual-frequency heterodyne interferometry; the other beam is divided into the transmitted P light and the reflected S light by the polarizing beam splitter 53, respectively by the first quarter wave Plate 54 and the second quarter-wave plate 55 are converted into circularly polarized light, and then enter the high optical subdivision of the self-collimating grating interferometer as shown in Figure 2 through the fifth reflector 56 and the sixth reflector 57 Structure 30, the incident beam 41 of the first measuring beam and the incident beam 43 of the second measuring beam become the outgoing beam 42 of the first measuring beam and the outgoing beam 44 of the second measuring beam after highly optically subdivided structures, the two outgoing beams After passing through the first reflector 56 and the second reflector 57 again, the first quarter-wave plate 54 and the second quarter-wave plate 55 are converted into linearly polarized light orthogonal to the original polarization state, and pass through the polarization beam splitter prism 53 are jointly incident to the second analyzer 58 placed at 45 degrees to form an interference signal, and are received by the second photodetector 60 as the measurement signal of dual-frequency heterodyne interferometry; the above-mentioned reference signal and measurement signal are collected and The processing and control unit 62 processes to obtain the lateral displacement of the scale diffraction grating.
图5为应用自准直光栅干涉仪的高光学细分部件实例3的原理示意图,光源为单频激光光源,干涉信号为两束测量光形成的。单频激光器71发出线偏振光,经偏振分束器53分成P光和S光,分别由第一四分之一波片54和第二四分之一波片55变换为圆偏振光,再通过第五反射镜56和第六反射镜57入射到图2所示的自准直光栅干涉仪的高光学细分结构30,第一测量光束的入射光束41和第二测量光束的入射光束43经高光学细分结构后变为第一测量光束的出射光束42和第二测量光束的出射光束44,两出射光束再次经过第五反射镜56和第六反射镜57,第一四分之一波片54和第二四分之一波片55变换为与原偏振态正交的线偏振光,经过偏振分光棱镜53,共同进入虚线框内的由四分之一波片72、非偏振分束器73、第一偏振分束器75、第二偏振分束器74(45度旋转放置)及第一探测器76、第二探测器78、第三探测器77、第四探测器79组成的偏振相移干涉光电探测单元,形成四路相移90°的探测信号。进而由数据采集和处理及控制单元80处理即可获得标尺光栅的横向位移。Fig. 5 is a schematic diagram of the principle of the example 3 of the high optical subdivision component using the self-collimating grating interferometer. The light source is a single-frequency laser light source, and the interference signal is formed by two beams of measuring light. The single-frequency laser 71 emits linearly polarized light, which is divided into P light and S light by the polarization beam splitter 53, and is transformed into circularly polarized light by the first quarter-wave plate 54 and the second quarter-wave plate 55 respectively, and then The incident beam 41 of the first measuring beam and the incident beam 43 of the second measuring beam are incident to the high optical subdivision structure 30 of the self-collimating grating interferometer shown in FIG. 2 through the fifth reflector 56 and the sixth reflector 57 After the high optical subdivision structure, it becomes the outgoing beam 42 of the first measuring beam and the outgoing beam 44 of the second measuring beam. The two outgoing beams pass through the fifth reflector 56 and the sixth reflector 57 again, and the first quarter The wave plate 54 and the second quarter wave plate 55 are converted into linearly polarized light orthogonal to the original polarization state, and pass through the polarization beam splitter prism 53, and enter the dotted line frame jointly by the quarter wave plate 72, the non-polarization splitter A beam splitter 73, a first polarizing beam splitter 75, a second polarizing beam splitter 74 (placed at a 45-degree rotation), a first detector 76, a second detector 78, a third detector 77, and a fourth detector 79 The polarized phase-shifting interference photoelectric detection unit forms four detection signals with a phase shift of 90°. Furthermore, the lateral displacement of the scale grating can be obtained by processing the data acquisition and processing and control unit 80 .
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