CN104112811A - LED (light emitting diode) packaging method - Google Patents
LED (light emitting diode) packaging method Download PDFInfo
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- CN104112811A CN104112811A CN201410361999.2A CN201410361999A CN104112811A CN 104112811 A CN104112811 A CN 104112811A CN 201410361999 A CN201410361999 A CN 201410361999A CN 104112811 A CN104112811 A CN 104112811A
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- 238000000034 method Methods 0.000 title claims abstract description 55
- 238000004806 packaging method and process Methods 0.000 title claims abstract description 28
- 239000002184 metal Substances 0.000 claims abstract description 217
- 229910052751 metal Inorganic materials 0.000 claims abstract description 217
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 34
- 238000009713 electroplating Methods 0.000 claims abstract description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 36
- 229920002120 photoresistant polymer Polymers 0.000 claims description 34
- 239000000853 adhesive Substances 0.000 claims description 18
- 230000001070 adhesive effect Effects 0.000 claims description 18
- 229910052737 gold Inorganic materials 0.000 claims description 18
- 239000010931 gold Substances 0.000 claims description 18
- 229910052759 nickel Inorganic materials 0.000 claims description 18
- 238000005538 encapsulation Methods 0.000 claims description 16
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 7
- 229910052802 copper Inorganic materials 0.000 claims description 7
- 239000010949 copper Substances 0.000 claims description 7
- WABPQHHGFIMREM-UHFFFAOYSA-N lead(0) Chemical compound [Pb] WABPQHHGFIMREM-UHFFFAOYSA-N 0.000 claims description 6
- 238000007747 plating Methods 0.000 claims description 6
- 239000000126 substance Substances 0.000 claims description 6
- 239000003292 glue Substances 0.000 claims description 3
- 239000000463 material Substances 0.000 claims description 3
- 238000005498 polishing Methods 0.000 claims description 3
- 238000005507 spraying Methods 0.000 claims description 2
- 239000008393 encapsulating agent Substances 0.000 claims 1
- 239000011347 resin Substances 0.000 abstract description 4
- 229920005989 resin Polymers 0.000 abstract description 4
- 230000007547 defect Effects 0.000 abstract description 2
- 238000000206 photolithography Methods 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 230000007797 corrosion Effects 0.000 abstract 1
- 238000005260 corrosion Methods 0.000 abstract 1
- 238000011161 development Methods 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 239000004020 conductor Substances 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 230000017525 heat dissipation Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000001039 wet etching Methods 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/80—Constructional details
- H10H20/85—Packages
- H10H20/857—Interconnections, e.g. lead-frames, bond wires or solder balls
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/85909—Post-treatment of the connector or wire bonding area
- H01L2224/8592—Applying permanent coating, e.g. protective coating
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10H—INORGANIC LIGHT-EMITTING SEMICONDUCTOR DEVICES HAVING POTENTIAL BARRIERS
- H10H20/00—Individual inorganic light-emitting semiconductor devices having potential barriers, e.g. light-emitting diodes [LED]
- H10H20/01—Manufacture or treatment
- H10H20/036—Manufacture or treatment of packages
- H10H20/0364—Manufacture or treatment of packages of interconnections
Landscapes
- Led Device Packages (AREA)
Abstract
本发明公开了一种LED的封装方法,属于半导体封装技术领域。本发明多次以铁箔(8)作为导电层进行高精度的电镀工艺,并结合光刻工艺实现再布线金属层和金属块,其次以包封树脂包封再布线金属层和金属块形成金属引线框本体(1),再在金属引线框本体(1)上正装固定LED芯片(2),然后完成整个封装结构。本发明采用高精度的电镀工艺实现金属引线框本体,克服了湿法腐蚀工艺存在的框架的翘曲缺陷,有效地解决了芯片贴装与打线工艺的协调问题,提高了产品的良率和一致性。
The invention discloses an LED packaging method, which belongs to the technical field of semiconductor packaging. In the present invention, the iron foil (8) is used as the conductive layer to carry out high-precision electroplating process many times, and combined with the photolithography process to realize the rewiring metal layer and metal block, and then encapsulating the rewiring metal layer and metal block with encapsulating resin to form a metal The lead frame body (1), and then the LED chip (2) is mounted and fixed on the metal lead frame body (1), and then the entire packaging structure is completed. The invention adopts a high-precision electroplating process to realize the metal lead frame body, overcomes the warping defect of the frame existing in the wet corrosion process, effectively solves the coordination problem of the chip mounting and wire bonding process, and improves the yield rate and consistency.
Description
技术领域 technical field
本发明涉及一种LED的封装方法,属于半导体封装技术领域。 The invention relates to an LED packaging method, which belongs to the technical field of semiconductor packaging.
背景技术 Background technique
在节能环保的大背景下,我国LED产业发展迅速,LED产业发展前景备受看好,EMC(环氧包封料)封装是LED行业目前高端发展方向之一。由于EMC封装方法中,引线框是通过湿法腐蚀工艺形成,即所谓的半刻蚀工艺,该工艺形成的引线框的框架本身的翘曲较大,导致芯片贴装与打线工艺较难调整,良率损失大;同时,该工艺形成的引框架刻蚀精度低,产品的一致性不好。 Under the background of energy saving and environmental protection, my country's LED industry is developing rapidly, and the development prospects of the LED industry are very promising. EMC (epoxy encapsulation material) packaging is one of the current high-end development directions of the LED industry. In the EMC packaging method, the lead frame is formed by a wet etching process, that is, the so-called half-etching process. The warpage of the lead frame itself formed by this process is relatively large, which makes it difficult to adjust the chip mounting and wiring process. , the loss of yield is large; at the same time, the etching precision of the lead frame formed by this process is low, and the consistency of the product is not good.
发明内容 Contents of the invention
本发明的目的在于克服上述传统引线框封装LED的不足,提供一种提高产品的良率和一致性的LED封装方法。 The purpose of the present invention is to overcome the disadvantages of the traditional lead frame packaged LED and provide an LED package method that improves the yield and consistency of products.
本发明的目的是这样实现的: The purpose of the present invention is achieved like this :
本发明一种LED的封装方法,其工艺过程如下: A kind of packaging method of LED of the present invention, its technical process is as follows:
取一载板和铁箔,在载板上固定铁箔; Take a carrier board and iron foil, and fix the iron foil on the carrier board;
在铁箔上贴光刻膜Ⅰ,顺次通过设定图形、曝光、显影,形成光刻膜Ⅰ开口图形; Paste the photoresist film I on the iron foil, and form the opening pattern of the photoresist film I by setting the pattern, exposing and developing in sequence;
在光刻膜Ⅰ开口图形内电镀金属,形成再布线金属层,并在再布线金属层的表面化学镀镍/金,通过去胶工艺去除剩余的光刻膜; Electroplate metal in the opening pattern of the photoresist film I to form a rewiring metal layer, and electroless nickel/gold plating on the surface of the rewiring metal layer, and remove the remaining photoresist film through a deglue process;
在完成再布线金属层的铁箔上贴光刻膜Ⅱ,顺次通过设定图形、曝光、显影,形成光刻膜Ⅱ开口图形,露出再布线金属层; Paste the photoresist film II on the iron foil that has completed the rewiring metal layer, and sequentially set the pattern, expose, and develop to form the opening pattern of the photoresist film II to expose the rewiring metal layer;
在光刻膜Ⅱ开口图形内电镀形成金属块,通过去胶工艺去除剩余的光刻膜,再布线金属层与金属块一对一连接,分别形成金属组块Ⅰ、金属组块Ⅱ、金属组块Ⅲ; Metal block is formed by electroplating in the opening pattern of photoresist film II, and the remaining photoresist film is removed by deglue process, and then the wiring metal layer is connected to the metal block one-to-one to form metal block I, metal block II, and metal group respectively. Block III;
对形成金属组块Ⅰ、金属组块Ⅱ、金属组块Ⅲ的铁箔上方进行包封,形成包封层; Encapsulating the top of the iron foil forming the metal block I, the metal block II, and the metal block III to form an encapsulation layer;
采用研磨、抛光的工艺减薄铁箔上方的包封层,露出金属组块Ⅰ、金属组块Ⅱ、金属组块Ⅲ的一端面,且在金属组块Ⅰ、金属组块Ⅱ、金属组块Ⅲ的该端面化学镀镍/金层; The encapsulation layer on the top of the iron foil is thinned by grinding and polishing, exposing one end surface of metal block I, metal block II, and metal block III, and the metal block I, metal block II, and metal block Electroless nickel/gold plating on the end face of Ⅲ;
将上述完成封装的结构上下翻转180°,取下载板,并腐蚀掉铁箔,露出金属组块Ⅰ、金属组块Ⅱ、金属组块Ⅲ的另一端面,在金属组块Ⅰ、金属组块Ⅱ、金属组块Ⅲ的该端面化学镀镍/金层; Flip the above-mentioned packaged structure up and down 180°, take out the download board, and corrode the iron foil to expose the other end faces of metal block I, metal block II, and metal block III. Ⅱ. Electroless nickel/gold plating layer on the end face of metal block Ⅲ;
在完成镍/金层的金属组块Ⅲ的表面点上粘合剂Ⅰ,并将LED芯片的背面通过粘合剂Ⅰ贴装至金属组块Ⅲ的区域内; Put adhesive I on the surface of metal block III with nickel/gold layer, and attach the back of the LED chip to the area of metal block III through adhesive I;
打线,将LED芯片的电极通过引线分别与金属组块Ⅰ、金属组块Ⅱ的再布线金属层连接; Wire bonding, connect the electrodes of the LED chip to the rewiring metal layers of the metal block I and the metal block II through the lead wires;
点封装物,所述封装物包裹LED芯片及其引线; A dot package, which wraps the LED chip and its leads;
将上述完成封装的LED封装结构切割成单颗封装体。 The above packaged LED package structure is cut into individual packages.
本发明所述金属组块Ⅲ的再布线金属层的边界不小于LED芯片的边界。 The boundary of the rewiring metal layer of the metal block III in the present invention is not smaller than the boundary of the LED chip.
本发明所述光刻膜Ⅰ开口图形的开口尺寸不小于对应的光刻膜Ⅱ开口图形的开口尺寸。 The opening size of the opening pattern of the photoresist film I described in the present invention is not smaller than the opening size of the corresponding opening pattern of the photoresist film II.
本发明所述金属组块Ⅰ、金属组块Ⅱ、金属组块Ⅲ均呈T字型。 The metal block I, the metal block II and the metal block III in the present invention are all T-shaped.
本发明所述金属组块Ⅰ、金属组块Ⅱ、金属组块Ⅲ的高度相等。 The heights of metal block I, metal block II and metal block III in the present invention are equal.
本发明所述金属块的高度为100微米~200微米。 The metal block of the present invention has a height of 100 microns to 200 microns.
本发明所述金属块的材质为金属铜。 The material of the metal block in the present invention is metal copper.
本发明所述再布线金属层的材质为金属铜。 The redistribution metal layer of the present invention is made of metal copper.
本发明在打线之后还包括步骤:在引线与金属组块Ⅰ、金属组块Ⅱ的连接处点上粘合剂Ⅱ。 The present invention further includes a step after wiring: spotting adhesive II on the joints of the leads and the metal block I and the metal block II.
本发明在点封装物之前还包括工艺步骤:在LED芯片的发光面喷涂荧光物质。 The present invention also includes a process step before the dot encapsulation: spraying fluorescent substances on the light-emitting surface of the LED chip.
本发明采用光刻工艺结合电镀工艺实现金属引线框本体的再布线金属层和金属块,提升了金属引线框的加工精度。 The invention adopts a photolithography process combined with an electroplating process to realize the rewiring metal layer and the metal block of the metal lead frame body, thereby improving the processing accuracy of the metal lead frame.
本发明的有益效果是: The beneficial effects of the present invention are:
本发明的金属引线框通过高精度的电镀工艺实现,克服了湿法腐蚀工艺存在的框架的翘曲缺陷,有效地解决了芯片贴装与打线工艺的协调问题,提高了产品的良率和一致性。 The metal lead frame of the present invention is realized by a high-precision electroplating process, which overcomes the warping defect of the frame existing in the wet etching process, effectively solves the problem of coordination between chip mounting and wire bonding processes, and improves the yield rate and consistency.
附图说明 Description of drawings
图1为本发明一种LED的封装方法的流程示意图; Fig. 1 is the schematic flow sheet of a kind of packaging method of LED of the present invention;
图2为本发明一种LED的封装方法的封装结构的实施例的剖面示意图; 2 is a schematic cross-sectional view of an embodiment of a packaging structure of a LED packaging method according to the present invention;
图3为图2的各部件位置关系的俯视示意图; Fig. 3 is a schematic top view of the positional relationship of the components in Fig. 2;
图4至图17为图2实施例的封装方法的流程示意图; 4 to 17 are schematic flow charts of the packaging method in the embodiment of FIG. 2;
其中,金属引线框本体1 where the metal lead frame body 1
包封层10 encapsulation layer 10
再布线金属层111、112、113 Redistribution metal layers 111, 112, 113
金属块121、122、123 Metal blocks 121, 122, 123
金属组块Ⅰ11 Metal Block Ⅰ11
金属组块Ⅱ12 Metal Block II 12
金属组块Ⅲ13 Metal block III13
镍/金层151、152 Nickel/gold layers 151, 152
切割道16 cutting lane 16
LED芯片2 LED chip 2
电极21、22 Electrodes 21, 22
粘合剂Ⅰ31 Adhesive Ⅰ 31
粘合剂Ⅱ32 Adhesive II 32
荧光物质4 Fluorescent substance 4
引线51、52 Leads 51, 52
封装物6 Package 6
载板7 Carrier 7
铁箔8 Iron foil 8
光刻膜Ⅰ91 Photoresist film Ⅰ 91
光刻膜Ⅰ开口图形911 Photoresist film I opening pattern 911
光刻膜Ⅱ92 Photoresist film Ⅱ 92
光刻膜Ⅱ开口图形921。 Opening pattern 921 of the photoresist film II.
具体实施方式 Detailed ways
现在将在下文中参照附图更加充分地描述本发明,在附图中示出了本发明的示例性实施例,从而本公开将本发明的范围充分地传达给本领域的技术人员。然而,本发明可以以许多不同的形式实现,并且不应被解释为限制于这里阐述的实施例。 The present invention will now be described more fully hereinafter with reference to the accompanying drawings, in which exemplary embodiments of the invention are shown so that this disclosure will fully convey the scope of the invention to those skilled in the art. However, this invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.
参见图1,本发明一种LED的封装方法的工艺过程如下: Referring to Fig. 1, the technological process of a kind of packaging method of LED of the present invention is as follows:
S101:在载板上固定铁箔; S101: fixing the iron foil on the carrier plate;
S102:在铁箔上形成再布线金属层; S102: forming a rewiring metal layer on the iron foil;
S103:在再布线金属层上形成金属块; S103: forming a metal block on the redistribution metal layer;
S104:包封再布线金属层和金属块,形成金属引线框本体; S104: encapsulating and rewiring the metal layer and the metal block to form a metal lead frame body;
S105:除去载板和铁箔; S105: removing the carrier plate and the iron foil;
S106:将LED芯片固定于金属引线框本体的表面; S106: fixing the LED chip on the surface of the metal lead frame body;
S107:打线; S107: wire bonding;
S108:点封装物,封闭LED芯片; S108: dot encapsulation, enclosing the LED chip;
S109:切割成单颗封装体。 S109: cutting into individual packages.
实施例,参见图2和图3 Examples, see Figures 2 and 3
一种LED的封装结构,其包括金属引线框本体1和LED芯片2,LED芯片2正装设置于金属引线框本体1之上。金属引线框本体1由金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13和包封金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13的包封层10构成。金属组块Ⅲ13位于金属引线框本体1的中央,所占区域最大,金属组块Ⅰ11设置于金属组块Ⅲ13的左侧,金属组块Ⅱ12设置于金属组块Ⅲ13的右侧,金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13三者的高度相等。 An LED packaging structure, which includes a metal lead frame body 1 and an LED chip 2 , the LED chip 2 is mounted on the metal lead frame body 1 . The metal lead frame body 1 is composed of a metal block I11, a metal block II12, a metal block III13 and an encapsulation layer 10 encapsulating the metal block I11, the metal block II12, and the metal block III13. The metal block III13 is located in the center of the metal lead frame body 1 and occupies the largest area. The metal block I11 is set on the left side of the metal block III13, the metal block II12 is set on the right side of the metal block III13, and the metal block I11 , metal block II12, and metal block III13 are equal in height.
金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13的上部分分别为再布线金属层111、112、113,其下部分分别为金属块121、122、123,且金属再布线层111与金属块121、金属再布线层112与金属块122、金属再布线层113与金属块123分别上下固定连接。再布线金属层111、112、113的边界分别不小于对应金属块121、122、123的边界。金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13的材质通常为金属铜,在其上端面设置镍/金层151、在其下端面设置镍/金层152,以防止金属铜表面氧化,同时也可满足焊接可靠性的要求。 The upper parts of metal block I11, metal block II12, and metal block III13 are rewiring metal layers 111, 112, 113 respectively, and the lower parts are metal blocks 121, 122, 123 respectively, and the metal rewiring layer 111 and the metal The block 121 , the metal redistribution layer 112 and the metal block 122 , the metal redistribution layer 113 and the metal block 123 are fixedly connected up and down respectively. The borders of the redistribution metal layers 111 , 112 , 113 are not smaller than the borders of the corresponding metal blocks 121 , 122 , 123 . Metal block I11, metal block II12, and metal block III13 are usually made of metal copper, with a nickel/gold layer 151 set on the upper end surface and a nickel/gold layer 152 set on the lower end surface to prevent oxidation of the metal copper surface. At the same time, it can also meet the requirements of welding reliability.
包封层10由一种有很好的电绝缘性的包封树脂形成,其连接并紧固金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13;同时包封层10内一般还含有氧化硅、氧化铝等填充料,以提高包封树脂的弹性模量和导热系数、降低热膨胀系数,从而提升封装方法的导热性能和可靠性。 The encapsulation layer 10 is formed of an encapsulation resin with good electrical insulation, which connects and fastens the metal block I11, the metal block II12, and the metal block III13; at the same time, the encapsulation layer 10 generally contains oxide Silicon, alumina and other fillers are used to increase the elastic modulus and thermal conductivity of the encapsulation resin and reduce the thermal expansion coefficient, thereby improving the thermal conductivity and reliability of the packaging method.
金属组块Ⅲ13上设置粘合剂Ⅰ31,LED芯片2通过粘合剂Ⅰ31与金属组块Ⅲ13固连,金属组块Ⅲ13的再布线金属层113的边界不小于LED芯片2的边界,以实现快速散热。粘合剂Ⅰ31一般为导热胶或导热膜,以银粉为主要导热材质居多,其延展面积以略大于LED芯片2的底部面积为佳。 Adhesive I31 is set on the metal block III13, and the LED chip 2 is fixedly connected to the metal block III13 through the adhesive I31. Heat dissipation. Adhesive I 31 is generally thermally conductive glue or thermally conductive film, mostly silver powder as the main thermally conductive material, and its extension area is preferably slightly larger than the bottom area of the LED chip 2 .
电极21通过引线51与金属组块Ⅰ11的再布线金属层111实现电气连通,电极22通过引线52与金属组块Ⅱ12的再布线金属层112实现电气连通。因此以选择再布线金属层的边界大于金属块的边界为佳,呈T字型,以分别固定金属引线51、引线52,在SMT(表面贴装)工艺过程和使用过程中可以避免引线51、引线52被拉出,以提升产品结构的力学可靠性。金属组块Ⅰ11、金属组块Ⅱ12的上方也可点上粘合剂Ⅱ32,以增加引线51与金属组块Ⅰ11的再布线金属层111、引线52与金属组块Ⅱ12的再布线金属层112的连接强度。粘合剂Ⅱ32一般为导热胶或导热膜,以银粉为主要导热材质居多。 The electrode 21 is electrically connected to the redistribution metal layer 111 of the metal block I11 through the lead 51 , and the electrode 22 is electrically connected to the redistribution metal layer 112 of the metal block II12 through the lead 52 . Therefore, it is better to select the boundary of the re-wiring metal layer to be larger than the boundary of the metal block, which is T-shaped to fix the metal leads 51 and 52 respectively, so that the leads 51 and 52 can be avoided during the SMT (surface mount) process and use. The lead wire 52 is pulled out to improve the mechanical reliability of the product structure. Adhesive II 32 can also be dotted on the top of metal block I11 and metal block II12 to increase the distance between lead wire 51 and the redistribution metal layer 111 of metal block I11, lead wire 52 and the redistribution metal layer 112 of metal block II12. connection strength. Adhesive II 32 is generally thermally conductive adhesive or thermally conductive film, and mostly silver powder is used as the main thermally conductive material.
金属引线框本体1的上表面设置硅胶、光学树脂等材质的封装物6,封装物6将LED芯片2和引线51、52封闭于其内,以保护LED芯片2和引线51、52,封装物6的外表面呈凸面。 The upper surface of the metal lead frame body 1 is provided with a package 6 made of silica gel, optical resin, etc., and the package 6 seals the LED chip 2 and the leads 51, 52 in it to protect the LED chip 2 and the leads 51, 52. The outer surface of 6 is convex.
为了获得白光,需要选择发蓝色光的芯片,并在LED芯片2的发光面涂覆黄色荧光粉的荧光物质4,通过蓝光激发黄色荧光物质获得白光,形成白光LED的封装结构。 In order to obtain white light, it is necessary to select a chip that emits blue light, and to coat the light-emitting surface of the LED chip 2 with a fluorescent substance 4 of yellow phosphor powder, and to excite the yellow fluorescent substance with blue light to obtain white light, forming a white LED packaging structure.
上述实施例的LED的封装方法的工艺过程如下: The technological process of the LED packaging method of the above-mentioned embodiment is as follows:
如图4所示,取一平整的载板7和铁箔8,在载板7上固定铁箔8,铁箔8比载板7稍微小些。 As shown in FIG. 4 , take a flat carrier 7 and iron foil 8 , fix the iron foil 8 on the carrier 7 , and the iron foil 8 is slightly smaller than the carrier 7 .
如图5和图6所示,在铁箔8上贴可光刻的光刻膜Ⅰ91,顺次通过设定图形、曝光、显影等工艺,形成光刻膜Ⅰ开口图形911。 As shown in Fig. 5 and Fig. 6, a photoresist film I 91 that can be photoresisted is pasted on the iron foil 8, and the opening pattern 911 of the photoresist film I is formed through successive processes such as pattern setting, exposure, and development.
如图7所示,以铁箔8作为导电层,在光刻膜Ⅰ开口图形911内电镀铜,形成再布线金属层111、112、113,再布线金属层113位于再布线金属层111、112之间;在再布线金属层111、112、113的表面化学镀镍/金,再布线金属层113的边界不小于LED芯片2的边界;通过去胶工艺去除剩余的光刻膜。 As shown in FIG. 7, iron foil 8 is used as the conductive layer, and copper is electroplated in the opening pattern 911 of the photoresist film I to form rewiring metal layers 111, 112, 113. The rewiring metal layer 113 is located on the rewiring metal layers 111, 112. between them; electroless nickel/gold plating on the surface of the rewiring metal layers 111, 112, 113, the boundary of the rewiring metal layer 113 is not smaller than the boundary of the LED chip 2; the remaining photoresist film is removed by deglue process.
如图8和图9所示,在完成再布线金属层111、112、113的铁箔8上贴可光刻的光刻膜Ⅱ92,顺次通过设定图形、曝光、显影,形成光刻膜Ⅱ开口图形921,露出表面完成化学镀镍/金的部分再布线金属层111、112、113;光刻膜Ⅰ开口图形911的开口尺寸不小于对应的光刻膜Ⅱ开口图形921的开口尺寸。 As shown in Figure 8 and Figure 9, a photoresist film II 92 that can be photoresisted is pasted on the iron foil 8 that has completed the rewiring metal layers 111, 112, 113, and the photoresist film is formed by setting the pattern, exposing, and developing in sequence The II opening pattern 921 exposes part of the rewiring metal layers 111, 112, 113 that have been electroless nickel/gold plated on the surface; the opening size of the photoresist film I opening pattern 911 is not smaller than the opening size of the corresponding photoresist film II opening pattern 921.
如图10所示,再次以铁箔8作为导电层,在光刻膜Ⅱ开口图形921内电镀形成金属块121、122、123,金属块121、122、123的高度为100微米~200微米。通过去胶工艺去除剩余的光刻膜,再布线金属层111、112、113与金属块121、122、123一对一连接,分别形成金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13,通常金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13均呈T字型,有效地固定了金属引线,在SMT(表面贴装)工艺过程和使用过程中,金属引线不会被拉出 ,提升了产品结构的力学可靠性。 As shown in FIG. 10 , metal blocks 121 , 122 , 123 are formed by electroplating in the opening pattern 921 of the photoresist film II with the iron foil 8 as the conductive layer again. The remaining photoresist film is removed through the glue removal process, and then the wiring metal layers 111, 112, 113 are connected one-to-one with the metal blocks 121, 122, 123 to form metal block I11, metal block II12, and metal block III13 respectively. Usually metal block Ⅰ11, metal block Ⅱ12, and metal block Ⅲ13 are all T-shaped, which effectively fixes the metal leads. During the SMT (surface mount) process and use, the metal leads will not be pulled out. The mechanical reliability of the product structure is improved.
如图11所示,对形成金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13的整个铁箔8进行包封,形成包封层10。 As shown in FIG. 11 , the entire iron foil 8 forming the metal block I11 , the metal block II12 , and the metal block III13 is encapsulated to form an encapsulation layer 10 .
如图12所示,采用研磨、抛光的工艺减薄铁箔8上方的包封层10,露出金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13的一端面,且在金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13的该端面化学镀形成镍/金,形成镍/金层151。 As shown in Figure 12, the encapsulation layer 10 on the top of the iron foil 8 is thinned by grinding and polishing, exposing one end surface of the metal block I11, the metal block II12, and the metal block III13, and on the metal block I11, The end faces of the metal block II12 and the metal block III13 are electroless plated to form nickel/gold, forming a nickel/gold layer 151 .
如图13所示,将上述完成的封装结构上下翻转180°,取下载板7,并腐蚀掉铁箔8,露出金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13的另一端面,在金属组块Ⅰ11、金属组块Ⅱ12、金属组块Ⅲ13的另一端面化学镀镍/金,形成镍/金层152。 As shown in Figure 13, turn the completed packaging structure up and down 180°, take out the lower plate 7, and corrode the iron foil 8, exposing the other end surfaces of the metal block I11, metal block II12, and metal block III13. The other end surfaces of the metal block I11 , the metal block II12 , and the metal block III13 are electrolessly plated with nickel/gold to form a nickel/gold layer 152 .
如图14所示,在完成化学镀镍/金的金属组块Ⅲ13的表面点上粘合剂Ⅰ31,粘合剂Ⅰ31的边界一般不小于LED芯片2的边界,并将LED芯片2的背面通过粘合剂Ⅰ31贴装至金属组块Ⅲ13的区域内;打线,将LED芯片2的电极21通过引线51与金属组块Ⅰ11的再布线金属层111连通、电极22通过引线52与金属组块Ⅱ12的再布线金属层112连接。 As shown in Figure 14, adhesive I31 is placed on the surface of the electroless nickel/gold plated metal block III13, the boundary of adhesive I31 is generally not smaller than the boundary of LED chip 2, and the back of LED chip 2 is passed through Adhesive I31 is attached to the area of metal block III13; wire bonding, the electrode 21 of the LED chip 2 is connected to the redistribution metal layer 111 of the metal block I11 through the lead wire 51, and the electrode 22 is connected to the metal block through the lead wire 52 The redistribution metal layer 112 of II12 is connected.
如图15所示,在金属组块Ⅰ11、金属组块Ⅱ12的上方,引线51、52与金属组块Ⅰ11、金属组块Ⅱ12的连接处也可点上粘合剂Ⅱ32,以增加引线51与金属组块Ⅰ11的再布线金属层111、引线52与金属组块Ⅱ12的再布线金属层112的连接强度。 As shown in Figure 15, on the top of the metal block I11 and the metal block II12, the joints of the lead wires 51, 52 and the metal block I11 and the metal block II12 can also be dotted with adhesive II32 to increase the connection between the lead wires 51 and the metal block II12. The connection strength between the redistribution metal layer 111 of the metal block I11 , the leads 52 and the redistribution metal layer 112 of the metal block II12 .
如图16所示,在LED芯片2的发光面喷涂荧光物质4,点封装物6包裹LED芯片2和引线51、引线52。封装物6的外形通常形成具有聚光或散光效应的结构,如半球状、凸透镜状等,以适应各种场合需要。 As shown in FIG. 16 , the fluorescent substance 4 is sprayed on the light-emitting surface of the LED chip 2 , and the LED chip 2 and the lead wires 51 and 52 are wrapped by the dot package 6 . The outer shape of the package 6 usually forms a structure with a light-condensing or light-scattering effect, such as a hemispherical shape, a convex lens shape, etc., to meet the needs of various occasions.
如图17所示,将上述完成封装的LED封装结构沿切割道16切割成单颗封装体。 As shown in FIG. 17 , the above packaged LED package structure is cut along the cutting line 16 into individual packages.
本发明一种LED的封装方法不限于上述优选实施例,如LED芯片2的个数可以不止一个,可根据产品设计需要增加个数,所有芯片均设置在金属组块Ⅲ13的上方,通过金属组块Ⅲ13直接散热,散热通道短,热阻小、性能稳定。 An LED packaging method of the present invention is not limited to the above-mentioned preferred embodiment. For example, the number of LED chips 2 can be more than one, and the number can be increased according to product design needs. All chips are arranged above the metal block III13. Block III13 dissipates heat directly, with short heat dissipation channels, small thermal resistance and stable performance.
任何本领域技术人员在不脱离本发明的精神和范围内,依据本发明的技术实质对以上实施例所作的任何修改、等同变化及修饰,均落入本发明权利要求所界定的保护范围内。 Any modifications, equivalent changes and modifications made to the above embodiments according to the technical essence of the present invention by any person skilled in the art without departing from the spirit and scope of the present invention all fall within the scope of protection defined by the claims of the present invention.
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