CN103515184A - Inductively coupled plasma device, spectroscopic analyzer, and mass spectrometer - Google Patents
Inductively coupled plasma device, spectroscopic analyzer, and mass spectrometer Download PDFInfo
- Publication number
- CN103515184A CN103515184A CN201310261620.6A CN201310261620A CN103515184A CN 103515184 A CN103515184 A CN 103515184A CN 201310261620 A CN201310261620 A CN 201310261620A CN 103515184 A CN103515184 A CN 103515184A
- Authority
- CN
- China
- Prior art keywords
- gas
- plasma
- inductively coupled
- correcting
- cover
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009616 inductively coupled plasma Methods 0.000 title claims abstract description 57
- 239000007789 gas Substances 0.000 claims description 177
- 230000008676 import Effects 0.000 claims description 16
- 239000012159 carrier gas Substances 0.000 claims description 12
- 230000006698 induction Effects 0.000 claims description 11
- 238000004458 analytical method Methods 0.000 claims description 10
- 230000007423 decrease Effects 0.000 claims description 9
- 238000005375 photometry Methods 0.000 claims description 7
- 230000015572 biosynthetic process Effects 0.000 claims description 4
- 238000004611 spectroscopical analysis Methods 0.000 claims description 4
- 230000001915 proofreading effect Effects 0.000 claims description 3
- 230000003247 decreasing effect Effects 0.000 claims 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 20
- 229910052786 argon Inorganic materials 0.000 description 10
- 238000010586 diagram Methods 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000004020 luminiscence type Methods 0.000 description 4
- 230000000803 paradoxical effect Effects 0.000 description 4
- 230000035945 sensitivity Effects 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 206010018612 Gonorrhoea Diseases 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000001307 helium Substances 0.000 description 2
- 229910052734 helium Inorganic materials 0.000 description 2
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 2
- 230000001535 kindling effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 238000000889 atomisation Methods 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- 238000001095 inductively coupled plasma mass spectrometry Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- -1 polytetrafluoroethylene Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/71—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited
- G01N21/73—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light thermally excited using plasma burners or torches
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/02—Details
- H01J49/06—Electron- or ion-optical arrangements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J49/00—Particle spectrometers or separator tubes
- H01J49/26—Mass spectrometers or separator tubes
Landscapes
- Analytical Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Biochemistry (AREA)
- Plasma & Fusion (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating, Analyzing Materials By Fluorescence Or Luminescence (AREA)
- Other Investigation Or Analysis Of Materials By Electrical Means (AREA)
- Electron Tubes For Measurement (AREA)
Abstract
Provided are an inductively coupled plasma device, a spectroscopic analyzer, and a mass spectrometer. The inductively coupled plasma device greatly reduces the consumption of plasma gas. As a solution, the inductively coupled plasma device comprises: a cylindrical cover which is separated from the plasma torch and has a height enough to surround the front end part for generating the plasma flame, and the cover is arranged on the plasma torch in an embedded manner; and a correction gas introduction mechanism that introduces a correction gas for correcting a flow path of the plasma gas into a gap portion formed between an inner surface of the cap and an outer surface of an outer tube of the plasma torch.
Description
Technical field
The present invention relates generally to inductively coupled plasma (following, the to be called ICP) device using as driving source or ion source, especially relates to the ICP device of the use amount that significantly reduces plasma gas.
Background technology
ICP device is used as the driving source of emission spectrographic analysis or take the ion source of the quality analysis apparatus that the ion that produces is object in plasma.In the past, this ICP device had the plasma torch consisting of quartz glass or the ceramic multiple tubular construction of manufacturing.
Fig. 7 shows ICP emission spectrographic analysis (ICP-OES) device, shows an example of the purposes of existing ICP device.Plasma torch 32 is concentric triple tube structures, by central sample ingress pipe 321(, sample is imported in plasma together with carrier gas), the assist gas pipe 322(that has in the periphery of this sample ingress pipe rises plasma by assist gas tube end) and form at the plasma gas pipe 323 that the periphery of this assist gas pipe has.In addition the region being surrounded by plasma gas pipe 323 on sample ingress pipe 321 top, is the part that is known as the plasma chamber that generates plasma.In addition, at induction coil 312 and plasma, with existence between flue 323, cover 30.The electric discharge of this cover 30 for preventing from occurring between induction coil 312 and plasma gas.Therefore, cover is present in induction coil 312 conventionally around the region of plasma torch.
On the other hand, ICP device is used expensive argon and helium as plasma gas conventionally.In the past, in order stably to obtain plasma flame, the consumption of plasma gas needs 15～20 liters of left and right per minute.Therefore study a large amount of consumption key factor, plasma gas that increase to suppress to become the operating cost of ICP device.
For example, following technology has been proposed: in plasma torch, the jet pipe region of plasma gas is diminished, make the outside partition of plasma gas pipe than carrier gas, with gas pipe range, form the shielding part with air, in addition, outside at the plasma gas pipe of this triple tube makes the cylindrical shell that refrigerating gas is used surround concentric shape, refrigerating gas is flowed into rotation mode, thereby both made plasma gas cylindrical shell carry out cooling and can not melt, and having made again plasma flame form to such an extent that compared with length, improve sensitivity (patent documentation 1).In addition,, at the ICP device for quality analysis, by forming described shielding part, the region that makes the jet pipe of plasma gas diminishes and does not reduce the flow of plasma gas, suppresses thus the consumption of plasma gas.In this case, by making the jet pipe width forming between plasma gas pipe in concentric triple tube and assist gas pipe reduce by half to make flow to become only about half of amount (non-patent literature 1).
Prior art document
Patent documentation
Patent documentation 1: TOHKEMY 2003-194723 communique (Fig. 8)
Non-patent literature
Non-patent literature 1: analytical chemistry vol.52, No.8, pp.559-568,, Japanese analytical chemistry meeting in 2003
Summary of the invention
But, first, in the situation that lengthening plasma and there is shield effectiveness with flue, avoiding air to be rolled into plasma flame, in the time of cannot carrying out photometry when being attached to the inner surface relative with plasma flame due to precipitate or when producing while breaking by the part of flue at this plasma due to hot impact, need to change each plasma torch, not only produce loaded down with trivial details operation, also produce uneconomic problem that the costliness due to plasma torch causes.
The second, in order addressing the above problem, to adopt and to there is the length of the degree of surrounding plasma flame and with respect to the plasma torch cover of cylinder type independently, also can be created in the new problem that paradoxical discharge occurs while lighting plasma.
In order to solve above-mentioned the first and second problems simultaneously, ICP device of the present invention is characterised in that to have: the sample introduction part that imports sample; Plasma torch, the concentric triple tube structure that its outer tube of using for the inner tube used by carrier gas, intervalve that assist gas is used and plasma gas forms, at one end portion has the gas introduction part of the gas introduction part of inner tube, the gas introduction part of intervalve and outer tube, and the other end is open state; The cover of drum, it is separated with plasma torch, has enough encirclements to the height of the leading section of the plasma flame generating, and is configured on described plasma torch to embedding outside this cover; Induction coil, it,, to surround near the mode of plasma flame plasma formation zone that form, the openend of plasma torch, is configured on cover to outer embedding; Gas control part, it controls carrier gas, assist gas and plasma gas; And correcting gas introducing mechanism, it will import to the clearance portion forming between the inner surface covering and the outer surface of outer tube for proofreading and correct the correcting gas of the stream of plasma gas.
In addition, in ICP device of the present invention, described correcting gas introducing mechanism has the capillary of ejection correcting gas, and this ejection side end capillaceous is configured to the clearance portion towards the fixation side end of cover.Or described correcting gas introducing mechanism has the stream that correcting gas is used, this stream along the clearance portion of the gas introduction part side of plasma torch part or all and configure, and be open state along part or all of the part of this clearance portion.
In addition, in ICP device of the present invention, described capillary or described stream make to import correcting gas Yi Ce end and are connected with the gas flow path of the branch midway of the gas flow path that is connected to outer tube from gas control part, make the increase and decrease of correcting gas and plasma gas increase in linkage/subtract.
In addition, cover is characterised in that and has one or more groove for photometry or hole.
In addition, ICP device of the present invention is for spectroscopy apparatus or mass spectrography device.
According to the present invention, use independent shielding part (cover) eliminate in luminescence of plasma device, air is rolled into the situation of plasma flame, and, by adopting the independently aligning gear of plasma gas, can improve the kindling of plasma, and can in the situation that not damaging sensitivity and precision, make the consumption of plasma gas reduce by half.Therefore, can provide the luminescence of plasma device with high economy.
Accompanying drawing explanation
Fig. 1 is the whole skeleton diagram of the ICP device of the 1st embodiment of the present invention.
Fig. 2 is the skeleton diagram of critical piece of the ICP device of the 1st embodiment of the present invention.
Fig. 3 is the whole skeleton diagram of the ICP device of the 2nd embodiment of the present invention.
Fig. 4 (a) is the skeleton diagram of critical piece of the ICP device of the 2nd embodiment of the present invention.
Fig. 4 (b) is the skeleton diagram of the correcting gas introducing mechanism observed from the b direction of Fig. 4 (a).
Fig. 4 (c) is the B-B ' cutaway view of Fig. 4 (a).
Fig. 5 (a) is the skeleton diagram of the cover of ICP device of the present invention.
Fig. 5 (b) is another skeleton diagram of the cover of ICP device of the present invention.
Fig. 6 (a) is the figure that the example of gas path of the present invention is shown.
Fig. 6 (b) is the figure that another gas path of the present invention is shown.
Fig. 7 is the whole skeleton diagram that uses the ICP light splitting light-emitting device of existing ICP device.
Label declaration
10A, 10B, 30 covers;
11,31 plasma generating units;
12,32 plasma torchs;
13,33 sample introduction parts;
14 plasma torch support components;
15A, 15B correcting gas introduction part
Embodiment
Below, with reference to accompanying drawing, luminescence of plasma device of the present invention is described.
Fig. 1 and Fig. 3 are the whole skeleton diagrams of the ICP device of the 1st embodiment of the present invention.
The ICP device of present embodiment consists of plasma generating unit 11, sample introduction part 13, plasma torch 12, cover 10A, plasma torch support component 14 and correcting gas introduction part 15A substantially, and take JISK0116(emission spectrographic analysis general rule) the ICP device of regulation is for basic.
In addition, be configured in to the outer embedding of cover 10A the outside that plasma is used flue 122.Object is to prevent following situation: when when sample is lighted plasma with flue 121 tops, because being involved in that air from outside causes the unstable of plasma flame and because of the luminous decline that causes measuring sensitivity from air.For this reason, cover 10A can be used quartz glass tube cylindraceous, and is configured to respect to plasma and is formed with predetermined gap d with flue 123.
Plasma torch support component 14 consists of basal part 141 and fixed part 142.Fixed part 142 makes plasma torch discharge/fix in mode separated or that part connects with basal part 141.
Correcting gas introduction part 15A is set up in order to produce along the ejection air-flow of the direction ejection identical with the flow direction of plasma gas P, to prevent that especially flow hour at plasma gas P becomes delay reason, the gap d of plasma gas between cover 10A and the open end of plasma gas pipe 123 of the paradoxical discharge while lighting plasma.Thus, can light plasma based on plasma gas P in a small amount.
(embodiment 1)
Below, the ICP device of Fig. 1 is elaborated.
This plasma torch 12 to be fixedly basal part 141 by plasma torch support component 14 and handling carry out with the fixing clamping of tool 142.In this case, fixedly tool 142 can be pressed to be fixed along the basad portion 14 of toroidal in the outside of plasma torch 12, also any one in its left and right can be made as to hinge shape and open and close in the one-sided mode of opening.And then plasma gas P is imported into plasma and plays formation spiral flow with Bing Cong its underpart, inner side of flue 123, flows out from open end.
In addition, plasma gas P reduces flow in order to suppress to consume, and thus, from the spouting velocity of open end ejection, also declines.Therefore,, for the end, gap corresponding to outlet of the path of the plasma gas P with forming, also can adjust to reduce its width between plasma is with the inner surface of flue 123 and the outer surface of assist gas pipe 122.Thus, even in the situation that suppressed the flow of plasma gas, also can adjust, flow velocity not declined, thereby can stably obtain the plasma flame of predetermined altitude.In addition, in the present embodiment, plasma gas P adopts argon gas.
Next, the cover using in ICP device of the present invention is described.This cover 10A is the outer quartz glass cylindraceous (internal diameter 21mm, wall thickness 1.3mm) on plasma torch 12 that is embedded in.Thereby, gap d by and the size of plasma torch 12 between relation determine, be about 0.5mm.
Compare with the existing cover 30 shown in Fig. 7, this cover 10A has following feature: the plasma torch that is independent of simple drum; And, be projected into the top that is provided with induction coil 112 region.Conventionally, the end of induction coil be configured to and align with the open end of the outer tube of flue as plasma, making induction coil act on plasma generating unit 11 region, therefore, the left and right of mm more than ten, the top of their end quilt cover surrounds.First, this besieged length is set as the stable scope that air can not be rolled into plasma flame, is 20mm left and right in the present embodiment.In addition,, as following, by being independent of plasma torch, having easily to load and unload and only change the effect of cover.
In addition, this cover 10A is fixed as follows: an end of capillary support component 151a that is arranged on the following correcting gas introducing mechanism 15A on basal part 14 top in formation, be provided with the extension forming along the circle in the outside of plasma torch, make the guide rail that covers on 10A and described extension chimeric.In this case, can on the fixing distolateral circumference of cover 10A, groove 101 be set, and coincide with the protuberance 154a arranging on capillary support component 151a.Thus, the circumferential position of locating cover 10A easily.
The main effect of this cover 10A is to prevent the following situation of generation when the flow of plasma gas P declines (for example, 10L per minute below): at the open end of plasma torch 12, because the decline of the ejection flow velocity of plasma gas P causes air to be rolled into around openings.Therefore, the corresponding region of height by cover 10A encirclement with plasma flame, thus, realizes mensuration more effective, can to reduce plasma gas P consumption, economic.In addition, as mentioned above, cover 10A and plasma torch 12 are separate, thereby can independently change respectively.Especially there is following effect: at the inner surface relative with plasma flame of cover, sometimes because precipitate causes gonorrhoea or because generation such as heat are broken, in these cases, only by changing cheaply, cover and just can tackle.
In addition, as mentioned above, induction coil 112 is configured in to outer embedding cover 10A with the open end aligned position of outer tube upper, thereby acts on plasma generating unit 11 region.
Next, correcting gas introducing mechanism 15A ICP device of the present invention being had describes.
Correcting gas C has following effect: when lighting plasma, a part that prevents plasma gas P is involved in and is trapped in the gap d between cover 10A and the open end of plasma torch 12, and the gas calibration of delay is returned to the original stream of plasma gas.Being trapped in while lighting plasma of this plasma gas can cause paradoxical discharge, becomes the obstacle that obtains stable plasma flame.In addition, this situation only cannot be eliminated by the flow adjustment of plasma gas P.Inventor, in order to obtain stable plasma flame in the structure having utilized cover 10A, has carried out Depth Study repeatedly, has adopted this correcting gas introducing mechanism 15A.Correcting gas C from stiff end () side towards the other end (on) side imports to the gap d forming between the inner surface of described cover 10A and the outer surface of plasma torch 12.
As shown in Figure 1 ，Gai mechanism by be fixed on basal part 14 top capillary support component 151a, for importing the capillary 152a of correcting gas C and pressing securing member 153a capillaceous, form.Fig. 2 illustrates the stereogram relevant to the configuration of covering 10A and correcting gas introducing mechanism 15A.The internal diameter capillaceous adopting is 0.75mm.In addition, capillary is fixed to: utilize the groove 101 arranging on the fixing distolateral circumference of described cover 101A, make front end capillaceous towards this groove 101.This direction so long as make correcting gas flow into the direction in gap d from groove 101, allows direction to have deviation to a certain degree owing to adjusting flow.In order to import efficiently correcting gas, preferably along the flow direction of plasma gas.In addition, in order to form spiral flow, can along gap d adjust capillary front end towards.In addition, capillary can adopt use softness easily, PTFE(polytetrafluoroethylene) etc.In Fig. 1, capillary configurations be in-plane with respect to basal part 14 with 45 degree towards top.
ICP device of the present invention gas used is the related carrier gas CA of plasma torch 12, assist gas A, plasma gas P and correcting gas C.These gases have been used argon gas.In addition, correcting gas C is as long as the gas of proofreading and correct at the open end of gap d is detained, and can follow the increase and decrease of plasma gas P and similarly increases and decreases.Therefore, as shown in Figure 6 (a), the lead-in path of gas adopts following structure: as in the past, by 1 gas control system, import carrier gas CA, assist gas A and plasma gas P, and, adopt the arm of plasma gas P to import correcting gas C.Thus, can make the increase and decrease interlock of correcting gas C and plasma gas P.In addition, the internal diameter that the flow of correcting gas C can be by arm or easy manually flowmeter etc. are adjusted in advance.
In addition, do not need to control individually the flow of correcting gas C, on device, do not need the attendant equipments such as control part or valve yet.Therefore, can be succinctly and efficient apparatus structure is provided at low cost.
In addition, as shown in Figure 6 (b), also can utilize other system to control correcting gas C.In this case, not having described before effect, still, is significant utilizing expensive argon cheap gas in addition as correcting gas C this respect.For example, can utilize air pump to send into air.
In addition, though not shown, can import chamber gas path, and this gas to chamber path is for when lighting plasma, utilizes beyond above-mentioned gas path the gas of use for the time being to carry out the gas of exchange system inside.
In the ICP device of the gas path of employing Fig. 6 (a) involved in the present invention, allow induction coil 112 produce high-frequency energy under the condition of frequency 27.12MHz, power output 1.2kW, make argon gas ahead start to light plasma time condition current downflow tens of second after, utilize igniter to form kindling material, then import carrier gas CA, confirm that plasma becomes round, then wait for the plasma stability several seconds, the plasma gas flow while being switched to common running.In this case, the argon flow amount when starting to light plasma, with respect to the setting of plasma gas P 20L per minute, as the correcting gas C of its arm because capillary 152a becomes below 0.3L per minute.Plasma gas P while conventionally turning round in addition, and the flow of correcting gas C are respectively 8L per minute and below 0.1L.Consequently, can form on sample ingress pipe 121 top the plasma of photometry height mm more than ten, thus stable plasma flame always in obtaining starting between test period when lighting.Plasma gas flow now under these conditions, is compared with the 15～20L per minute of plasma gas flow as in existing ICP device, can be in the situation that keep sensitivity more than equal extent roughly to reduce by half.Therefore, determine and there is high economy.
(embodiment 2)
Next, the correcting gas introducing mechanism 15B different from embodiment 1 described.In addition, because the part except correcting gas introducing mechanism is common with embodiment 1, thereby symbol is identical.
Fig. 3 illustrates: as ICP device of the present invention, the stiff end of the cover 10B of channel member 151b (under) side has the jet pipe 152b of the correcting gas C arranging along the circumference of gap d, substitutes the capillary of the correcting gas introducing mechanism 15A of the embodiment 1 that imports correcting gas C.Fig. 4 (a) illustrates the path of jet pipe 152b by stereogram.Fig. 4 (b) illustrate from the b direction of Fig. 4 (a) (directly over) gas path while observing.Fig. 4 (c) is illustrated in the gap d that forms and the position relationship of jet pipe 152b between the outer peripheral face of plasma gas pipe 123 of B-B ' section of Fig. 4 (a) and the inner peripheral surface of cover 10B.Herein, the half cycle place in the circumference of cover 10B arranges jet pipe, but also can be in all-round setting, or also can along its circle spacing a plurality of holes are set.In addition, about gas flow path, can make through hole at basal part 14, as long as can form jet pipe 152b, also can transform capillary and use.In addition, in order easily cover 10B to be positioned, also can be with embodiment 1 in the same manner at the fixing distolateral groove 101 that arranges that covers 10B.
By this structure, can make the gas of the open end of plasma torch 12 can not be detained and obtain the result identical with embodiment 1, show identical effect.
ICP device of the present invention can be used in ICP emission spectrographic analysis (ICP-OES) device or ICP quality analysis apparatus (ICP-MS).In addition, also can be used in the device that utilizes luminescence of plasma in addition.
In addition,, when the transverse direction from plasma carries out photometry, in cover 10A and 10B, can near photometric measurer, there is at least one party in groove 102-L and 102-R.Thus, even if in the situation that the inner surface generation gonorrhoea of cover also can not hinder photometry.Should can be also hole for the groove of photometry, so long as can prevent the scope of the impact of air plasma flame, its shape can be arbitrarily.
In addition, plasma gas is not limited to argon, also can utilize nitrogen, helium etc.
In addition, ICP device of the present invention can provide by cover of the present invention and the correcting gas introducing mechanism as its critical piece by assembling on existing ICP device.This makes to discard existing device just can enjoy effect of the present invention, thereby has economy at the party's mask.
As mentioned above, side effect when ICP device of the present invention utilizes the long cover of cylinder tubulose to eliminate the consumption that reduces plasma gas (because air is involved in the unstable of plasma flame that plasma causes), and, also eliminated the side effect (paradoxical discharge while lighting plasma because of plasma torch with the part stagnation of covering the plasma gas causing is caused) while using this cover, the consumption of the plasma gas in the time of consequently, can significantly reducing long time running.
Therefore, compared with the past, the ICP device that economy is very superior can be provided.
In addition, embodiments of the present invention are not limited to above-mentioned record content, within not departing from the scope of purport of the present invention, can increase and decrease, improve and change.
Claims (12)
1. an inductively coupled plasma device, is characterized in that, this inductively coupled plasma device has:
Import the sample introduction part of sample,
Plasma torch, the concentric triple tube structure that its outer tube of using for the inner tube used by carrier gas, intervalve that assist gas is used and plasma gas forms, at one end portion has the gas introduction part of the gas introduction part of described inner tube, described intervalve and the gas introduction part of described outer tube, and the other end is open state;
The cover of drum, it is separated with described plasma torch, has enough encirclements to the height of the leading section of the plasma flame generating, and is configured on described plasma torch to embedding outside this cover;
Induction coil, it,, to surround near the mode of described plasma flame plasma formation zone that form, the openend of described plasma torch, is configured in to outer embedding on described cover;
Gas control part, it controls described carrier gas, described assist gas and described plasma gas; And
Correcting gas introducing mechanism, it will import to the clearance portion forming between the inner surface of described cover and the outer surface of described outer tube for proofreading and correct the correcting gas of the stream of described plasma gas.
2. inductively coupled plasma device according to claim 1, wherein,
The described part covering on the circumference that is supported on the open end on basal part, has the groove of the inside and outside that is communicated with its cylinder, and wherein, described basal part supports fixing described cover,
A part on the line that described basal part joins in the cylinder end of the fixation side with described cover has protuberance that can be identical with described groove, benchmark when this protuberance becomes configuration.
3. inductively coupled plasma device according to claim 1, wherein,
Described correcting gas introducing mechanism has the capillary of the described correcting gas of ejection,
This ejection side end capillaceous is configured to the described clearance portion towards the fixation side end of described cover.
4. inductively coupled plasma device according to claim 3, wherein,
Described ejection side end capillaceous from the end sides of the fixation side of described cover towards described groove.
5. inductively coupled plasma device according to claim 1, wherein,
Described correcting gas introducing mechanism has the stream that described correcting gas is used,
This stream along the described clearance portion of the gas introduction part side of described plasma torch part or all and configure, and be open state along part or all of the part of this clearance portion.
6. inductively coupled plasma device according to claim 3, wherein,
Described capillary makes to import the Yi Ce end of described correcting gas and is connected with the gas flow path of the branch midway of the gas flow path that is connected to described outer tube from described gas control part, and the increase and decrease of described correcting gas and described plasma gas is increased and decreased in linkage.
7. inductively coupled plasma device according to claim 5, wherein,
Described stream makes to import the Yi Ce end of described correcting gas and is connected with the gas flow path of the branch midway of the gas flow path that is connected to described outer tube from described gas control part, and the increase and decrease of described correcting gas and described plasma gas is increased and decreased in linkage.
8. inductively coupled plasma device according to claim 3, wherein,
Described capillary has the gas control part different from described plasma gas, and described correcting gas and described plasma gas are different gas.
9. inductively coupled plasma device according to claim 5, wherein,
Described stream has the gas control part different from described plasma gas, and described correcting gas and described plasma gas are different gas.
10. inductively coupled plasma device according to claim 1, wherein,
Near described covering on the Yi Ce end contrary with the fixation side that is fixed to described basal part or its, has one or more groove for photometry or hole.
11. 1 kinds of spectroscopy apparatus, wherein,
This spectroscopy apparatus has inductively coupled plasma device claimed in claim 1.
12. 1 kinds of quality analysis apparatus, wherein,
This quality analysis apparatus has inductively coupled plasma device claimed in claim 1.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2012-144604 | 2012-06-27 | ||
| JP2012144604A JP5965743B2 (en) | 2012-06-27 | 2012-06-27 | ICP device, spectroscopic analyzer, and mass spectrometer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN103515184A true CN103515184A (en) | 2014-01-15 |
| CN103515184B CN103515184B (en) | 2017-06-16 |
Family
ID=49897722
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201310261620.6A Active CN103515184B (en) | 2012-06-27 | 2013-06-27 | Inductively coupled plasma device, spectroscopic analyzer, and mass spectrometer |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5965743B2 (en) |
| KR (1) | KR101948943B1 (en) |
| CN (1) | CN103515184B (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107464735A (en) * | 2017-06-28 | 2017-12-12 | 中国地质科学院水文地质环境地质研究所 | A kind of new chlorine bromine isotope mass spectrometer and its analysis method |
| CN108181374A (en) * | 2018-02-08 | 2018-06-19 | 聚光科技(杭州)股份有限公司 | The method of work of plasma-mass spectrometry system |
| CN108732234A (en) * | 2017-04-24 | 2018-11-02 | 上海新昇半导体科技有限公司 | Plasma producing apparatus |
| CN109314025A (en) * | 2017-04-06 | 2019-02-05 | 株式会社爱发科 | Ion source and ion implantation apparatus |
| CN110519904A (en) * | 2019-08-16 | 2019-11-29 | 中国地质大学（武汉） | A kind of ICP plasma source formation device and method based on collection chinaware |
| CN110603441A (en) * | 2017-05-12 | 2019-12-20 | 胜高股份有限公司 | Atomizing chamber, sample atomizing and introducing device, analyzer, and method for analyzing components in sample |
| CN110677972A (en) * | 2019-10-17 | 2020-01-10 | 中国人民解放军国防科技大学 | Plasma generator for SiC optical mirror processing and application method thereof |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4760253A (en) * | 1986-01-31 | 1988-07-26 | Vg Instruments Group Limited | Mass spectrometer |
| US4926021A (en) * | 1988-09-09 | 1990-05-15 | Amax Inc. | Reactive gas sample introduction system for an inductively coupled plasma mass spectrometer |
| JPH05135896A (en) * | 1991-11-11 | 1993-06-01 | Sansha Electric Mfg Co Ltd | Induction plasma torch |
| US5642190A (en) * | 1995-09-01 | 1997-06-24 | Thermo Jarrell Ash Corp. | Dual-axis plasma imaging system for use in spectroscopic analysis |
| JPH11111491A (en) * | 1997-10-01 | 1999-04-23 | Yokogawa Analytical Systems Inc | Plasma generator |
| CN1235274A (en) * | 1997-12-29 | 1999-11-17 | 液体空气乔治洛德方法利用和研究有限公司 | Plasma torch with adjustable injector and gas analyser using such torch |
| JP2003194723A (en) * | 2001-12-27 | 2003-07-09 | Rikogaku Shinkokai | Plasma torch |
| JP2004327243A (en) * | 2003-04-24 | 2004-11-18 | Tdk Corp | Inductively coupled plasma mass spectrometer and mass spectrometry method |
| JP2010197080A (en) * | 2009-02-23 | 2010-09-09 | Sii Nanotechnology Inc | Induction coupling plasma analyzer |
| WO2011140168A1 (en) * | 2010-05-05 | 2011-11-10 | Perkinelmer Health Sciences, Inc. | Inductive devices and low flow plasmas using them |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS584062U (en) * | 1981-06-30 | 1983-01-11 | 日本ジヤ−レル・アツシユ株式会社 | High frequency induction plasma torch tube |
| JP2010197207A (en) * | 2009-02-25 | 2010-09-09 | Shimadzu Corp | Emission spectral analysis method and emission spectrophotometer |
-
2012
- 2012-06-27 JP JP2012144604A patent/JP5965743B2/en active Active
-
2013
- 2013-06-21 KR KR1020130071401A patent/KR101948943B1/en active IP Right Grant
- 2013-06-27 CN CN201310261620.6A patent/CN103515184B/en active Active
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4760253A (en) * | 1986-01-31 | 1988-07-26 | Vg Instruments Group Limited | Mass spectrometer |
| US4926021A (en) * | 1988-09-09 | 1990-05-15 | Amax Inc. | Reactive gas sample introduction system for an inductively coupled plasma mass spectrometer |
| JPH05135896A (en) * | 1991-11-11 | 1993-06-01 | Sansha Electric Mfg Co Ltd | Induction plasma torch |
| US5642190A (en) * | 1995-09-01 | 1997-06-24 | Thermo Jarrell Ash Corp. | Dual-axis plasma imaging system for use in spectroscopic analysis |
| JPH11111491A (en) * | 1997-10-01 | 1999-04-23 | Yokogawa Analytical Systems Inc | Plasma generator |
| CN1235274A (en) * | 1997-12-29 | 1999-11-17 | 液体空气乔治洛德方法利用和研究有限公司 | Plasma torch with adjustable injector and gas analyser using such torch |
| JP2003194723A (en) * | 2001-12-27 | 2003-07-09 | Rikogaku Shinkokai | Plasma torch |
| JP2004327243A (en) * | 2003-04-24 | 2004-11-18 | Tdk Corp | Inductively coupled plasma mass spectrometer and mass spectrometry method |
| JP2010197080A (en) * | 2009-02-23 | 2010-09-09 | Sii Nanotechnology Inc | Induction coupling plasma analyzer |
| WO2011140168A1 (en) * | 2010-05-05 | 2011-11-10 | Perkinelmer Health Sciences, Inc. | Inductive devices and low flow plasmas using them |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109314025A (en) * | 2017-04-06 | 2019-02-05 | 株式会社爱发科 | Ion source and ion implantation apparatus |
| CN109314025B (en) * | 2017-04-06 | 2020-05-15 | 株式会社爱发科 | Ion source and ion implantation apparatus |
| CN108732234A (en) * | 2017-04-24 | 2018-11-02 | 上海新昇半导体科技有限公司 | Plasma producing apparatus |
| CN110603441A (en) * | 2017-05-12 | 2019-12-20 | 胜高股份有限公司 | Atomizing chamber, sample atomizing and introducing device, analyzer, and method for analyzing components in sample |
| CN110603441B (en) * | 2017-05-12 | 2022-06-03 | 胜高股份有限公司 | Atomizing chamber, sample atomizing and introducing device, analysis device and method for analyzing components in sample |
| US11648574B2 (en) | 2017-05-12 | 2023-05-16 | Sumco Corporation | Spray chamber, sample atomization and introduction device, analysis device, and method of analyzing component in sample |
| CN107464735A (en) * | 2017-06-28 | 2017-12-12 | 中国地质科学院水文地质环境地质研究所 | A kind of new chlorine bromine isotope mass spectrometer and its analysis method |
| CN108181374A (en) * | 2018-02-08 | 2018-06-19 | 聚光科技(杭州)股份有限公司 | The method of work of plasma-mass spectrometry system |
| CN110519904A (en) * | 2019-08-16 | 2019-11-29 | 中国地质大学（武汉） | A kind of ICP plasma source formation device and method based on collection chinaware |
| CN110677972A (en) * | 2019-10-17 | 2020-01-10 | 中国人民解放军国防科技大学 | Plasma generator for SiC optical mirror processing and application method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2014009961A (en) | 2014-01-20 |
| KR20140001125A (en) | 2014-01-06 |
| KR101948943B1 (en) | 2019-02-15 |
| JP5965743B2 (en) | 2016-08-10 |
| CN103515184B (en) | 2017-06-16 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN103515184A (en) | Inductively coupled plasma device, spectroscopic analyzer, and mass spectrometer | |
| CN101198846B (en) | Atomization device | |
| CN103185693B (en) | Gas analyzing apparatus | |
| US9649716B2 (en) | Inductive devices and low flow plasmas using them | |
| JP4303582B2 (en) | UV irradiation equipment | |
| US9704699B2 (en) | Hybrid ion source and mass spectrometric device | |
| US20150262808A1 (en) | Light Source Driven by Laser | |
| KR102112363B1 (en) | Atomizing furnace | |
| CN102291921A (en) | Boost devices and methods of using them | |
| CN102759401A (en) | Lamp module with a deuterium lamp | |
| JP2014009961A5 (en) | ||
| KR20120111108A (en) | Gas injection apparatus, atomic layer deposition apparatus and the method of atomic layer deposition using the same | |
| CN104423097A (en) | Polarized light illumination device | |
| CN103687266B (en) | Electromagnetic waveguide and plasma source | |
| RU2657999C1 (en) | Electronic cigarette | |
| CA1116247A (en) | Plasma jet device and method of operating same | |
| JP2010197080A (en) | Induction coupling plasma analyzer | |
| CN202159044U (en) | Combined system of gas chromatography and atomic emission spectrum detector | |
| US6835929B2 (en) | Coaxial atmospheric pressure photoionization source for mass spectrometers | |
| US20040256550A1 (en) | Coaxial atmospheric pressure photoionization source for mass spectrometers | |
| JP7294620B2 (en) | interface unit | |
| JP6094253B2 (en) | Light source unit and irradiation device | |
| JP4333542B2 (en) | ICP emission analyzer | |
| CN106524162A (en) | Flame cutting torch | |
| JP6524866B2 (en) | Irradiator |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| GR01 | Patent grant |