CN103013345A - Oily diamond grinding liquid and preparation method thereof - Google Patents
Oily diamond grinding liquid and preparation method thereof Download PDFInfo
- Publication number
- CN103013345A CN103013345A CN2012105607971A CN201210560797A CN103013345A CN 103013345 A CN103013345 A CN 103013345A CN 2012105607971 A CN2012105607971 A CN 2012105607971A CN 201210560797 A CN201210560797 A CN 201210560797A CN 103013345 A CN103013345 A CN 103013345A
- Authority
- CN
- China
- Prior art keywords
- oil
- acid
- sodium
- surfactant
- diamond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
Abstract
本发明公开了属于表面超精研磨技术领域的一种油性金刚石研磨液及其制备方法,本研磨液含有以下组分:金刚石微粉、表面活性剂、分散剂、pH值调节剂、润湿剂和油,各组分的重量配比(wt.)为:金刚石微粉:0.001%-10%;表面活性剂:0.001%-20%;分散剂:0-20%;pH值调节剂:0-10%;润湿剂:0-10%;其余为油。主要应用于碳化硅晶片、LED蓝宝石衬底片、陶瓷、光纤、模具及半导体化合物晶片等表面的研磨抛光。使用本发明提供的研磨液可大大的提高抛光效率,分散性能好,可以长期保持均匀稳定状态,用其抛光后产品光洁度高,抛光效果好并且不含对人体有害成分,易于清洗,有利于环保。The invention discloses an oil-based diamond grinding liquid and a preparation method thereof, which belong to the technical field of surface superfine grinding. The grinding liquid contains the following components: diamond micropowder, surfactant, dispersant, pH regulator, wetting agent and Oil, the weight ratio (wt.) of each component is: diamond powder: 0.001%-10%; surfactant: 0.001%-20%; dispersant: 0-20%; pH regulator: 0-10 %; wetting agent: 0-10%; the rest is oil. It is mainly used in the grinding and polishing of silicon carbide wafers, LED sapphire substrates, ceramics, optical fibers, molds and semiconductor compound wafers. Using the abrasive liquid provided by the invention can greatly improve the polishing efficiency, has good dispersion performance, and can maintain a uniform and stable state for a long time. After polishing, the product has a high finish, good polishing effect and does not contain harmful ingredients to the human body. It is easy to clean and is conducive to environmental protection. .
Description
技术领域 technical field
本发明涉及一种用于研磨、抛光加工用的抛光液,特别是一种油性金刚石研磨液及其制备方法,属于超精表面研磨抛光技术领域。The invention relates to a polishing liquid used for grinding and polishing, in particular to an oily diamond grinding liquid and a preparation method thereof, belonging to the technical field of ultra-fine surface grinding and polishing.
背景技术 Background technique
金刚石微粉是一种具有高硬度及良好机械物理性能的超细磨料,其外形为球形或椭球形,用于研磨抛光不会划伤被研磨体,因此目前已广泛应用于不同的加工抛光领域,特别是超精密表面抛光加工领域。金刚石微粉是硬质合金、陶瓷、宝石、光学玻璃、人工晶体、集成电路等坚硬物质的一种理想抛光材料,可以制成膏剂、气雾剂、膜状、油性或水性液体的抛光制品,金刚石膏剂、气雾剂由于易结巴沉淀、难分散且浪费较大等缺点,限制了其应用范围。油性研磨液与水性研磨液相比,油性研磨液润滑性能好,磨削速度快,速率稳定并具有降温冷却作用,而水性研磨液在研磨过程中容易导致工件出现大划痕,悬浮稳定性较差,因此,油性研磨液的应用相对广泛,但是传统的油性研磨液易沉淀、抛光效率低、具有腐蚀性而且不易清洗、不符合环保的要求等缺点。目前的研究主要是针对水性金刚石研磨液的,而对油性金刚石研磨液的研究还鲜见报道。Diamond micropowder is an ultra-fine abrasive with high hardness and good mechanical and physical properties. Its shape is spherical or ellipsoidal. It is used for grinding and polishing without scratching the object to be ground. Therefore, it has been widely used in different processing and polishing fields. Especially in the field of ultra-precision surface polishing. Diamond powder is an ideal polishing material for hard alloys, ceramics, gemstones, optical glass, artificial crystals, integrated circuits, etc. It can be made into ointment, aerosol, film, oily or water-based liquid polishing products, diamond Ointments and aerosols have limited their application scope due to their disadvantages such as easy stagnation and precipitation, difficulty in dispersing and large waste. Compared with water-based grinding fluid, oil-based grinding fluid has good lubricating performance, fast grinding speed, stable speed and cooling effect, while water-based grinding fluid is easy to cause large scratches on the workpiece during the grinding process, and the suspension stability is relatively low. Poor, therefore, the application of oil-based abrasives is relatively wide, but the traditional oil-based abrasives are prone to precipitation, low polishing efficiency, corrosive and difficult to clean, and do not meet the requirements of environmental protection. The current research is mainly aimed at water-based diamond grinding fluid, but the research on oil-based diamond grinding fluid is rarely reported.
发明内容 Contents of the invention
本发明的目的是为了克服已有技术的不足之处,提出了一种油性金刚石研磨液及其制备方法。本发明提供的油性金刚石研磨液应用于超精表面的研磨抛光,可大大的提高抛光效率,分散性能好,能长期存放不发生沉降,用其抛光后产品光洁度高,抛光效果好并且不含对人体有害成分,不腐蚀设备,易于清洗,有利于环保。The objective of the invention is to propose a kind of oily diamond grinding liquid and preparation method thereof in order to overcome the weak point of prior art. The oily diamond abrasive liquid provided by the invention is applied to the grinding and polishing of ultra-fine surfaces, which can greatly improve the polishing efficiency, has good dispersion performance, and can be stored for a long time without sedimentation. Harmful ingredients to the human body, no corrosion to equipment, easy to clean, and conducive to environmental protection.
为了实现上述目标,本发明利用了表面活性剂对颗粒进行改性,使金刚石颗粒在油中能保持良好的分散状态,具有很好的稳定性又不易划伤抛光样品。加上与一些添加剂的协同增效作用,提高了油性金刚石研磨液的抛光速率并得到良好的抛光效果。In order to achieve the above goals, the present invention utilizes a surfactant to modify the particles, so that the diamond particles can maintain a good dispersion state in the oil, have good stability and are not easy to scratch the polished sample. Together with the synergistic effect of some additives, the polishing rate of the oily diamond grinding fluid is improved and a good polishing effect is obtained.
本发明提供的油性金刚石研磨液,其特征在于,该研磨液由金刚石微粉、表面活性剂、分散剂、pH值调节剂、润湿剂和油组成,各成分的重量百分含量(wt.%)为:The oily diamond grinding liquid provided by the present invention is characterized in that the grinding liquid is composed of diamond micropowder, surfactant, dispersant, pH regulator, wetting agent and oil, and the weight percentage of each component (wt.% )for:
金刚石微粉:0.001%-10%;Diamond powder: 0.001%-10%;
表面活性剂:0.001%-20%;Surfactant: 0.001%-20%;
分散剂:0%-20%;Dispersant: 0%-20%;
pH值调节剂:0%-10%;pH regulator: 0%-10%;
润湿剂:0%-10%;Wetting agent: 0%-10%;
其余为油;The rest is oil;
其中,所述的表面活性剂为非离子表面活性剂、阴离子表面活性剂或阳离子表面活性剂中的一种或几种,所述的非离子表面活性剂为蓖麻油聚氧乙烯醚(优选EL-n,n=10-90及HEL-20、HEL-40、HEL-60)、月桂酸聚氧乙烯酯、油酸聚氧乙烯酯、硬脂酸聚氧乙烯酯、脂肪胺聚氧乙烯醚、嵌段聚氧乙烯-聚氧丙烯醚、脂肪醇聚氧乙烯醚、烷基醇酰胺聚氧乙烷醚、烷基糖苷、椰子油脂肪酸单乙醇酰胺、椰子油脂肪酸二乙醇酰胺、乙二醇单硬脂酸酯、聚乙二醇双硬脂酸酯、甘油单硬脂酸酯、聚甘油单硬脂酸酯、蔗糖脂肪酸酯、失水山梨醇脂肪酸酯、聚氧乙烯失水山梨醇脂肪酸酯中的一种或几种;所述的阴离子表面活性剂为C12-16烷基苯磺酸钠、烷基萘磺酸盐、C12-16烷基磺酸钠、α-烯烃磺酸钠、木质素磺酸盐、石油磺酸盐、C12- 16烷基硫酸盐、蓖麻油酸丁酯硫酸钠、脂肪醇聚氧乙烯醚硫酸盐、月桂酰氨乙基硫酸钠、油酰氨基酸钠、N-酰基氨基酸盐、脂肪醇聚氧乙烯醚羧酸盐中的一种或几种;所述的阳离子表面活性剂为咪唑啉、十二烷基三甲基氯化铵、十二烷基三甲基溴化铵、四甲基溴化铵、十二烷基三甲基硫酸铵中的一种或几种。表面活性剂的重量百分含量优选0.01-10%,更优选0.1-7%。Wherein, the surfactant is one or more of nonionic surfactants, anionic surfactants or cationic surfactants, and the nonionic surfactants are castor oil polyoxyethylene ethers (preferably EL -n, n=10-90 and HEL-20, HEL-40, HEL-60), polyoxyethylene laurate, polyoxyethylene oleate, polyoxyethylene stearate, fatty amine polyoxyethylene ether , block polyoxyethylene-polyoxypropylene ether, fatty alcohol polyoxyethylene ether, alkyl alcohol amide polyoxyethylene ether, alkyl glycoside, coconut oil fatty acid monoethanolamide, coconut oil fatty acid diethanolamide, ethylene glycol Monostearate, polyethylene glycol distearate, glycerol monostearate, polyglycerol monostearate, sucrose fatty acid ester, sorbitan fatty acid ester, polyoxyethylene sorbitan One or more of alcohol fatty acid esters; the anionic surfactant is C12-16 sodium alkylbenzene sulfonate, alkyl naphthalene sulfonate, C12-16 sodium alkyl sulfonate, α-olefin sulfonate Sodium sulfonate, lignosulfonate, petroleum sulfonate, C12-16 alkyl sulfate, sodium butyl ricinoleate sulfate, fatty alcohol polyoxyethylene ether sulfate, sodium lauramide ethyl sulfate, oleoyl amino acid One or more of sodium, N-acyl amino acid salt, fatty alcohol polyoxyethylene ether carboxylate; the cationic surfactant is imidazoline, dodecyltrimethylammonium chloride, dodecane One or more of trimethylammonium bromide, tetramethylammonium bromide, and dodecyltrimethylammonium sulfate. The weight percentage of surfactant is preferably 0.01-10%, more preferably 0.1-7%.
所述的分散剂为聚乙二醇、乙二醇、聚丙二醇、己基癸醇、六偏磷酸钠、三聚磷酸钠、焦磷酸钠、聚丙烯酸钠、聚丙烯酸、阿拉伯树胶粉、羟丙基纤维素、羟丙基甲基纤维素、羟乙基纤维素、羧甲基纤维素、羟基丙基甲基纤维素、甲基纤维素、N-甲基吡咯烷酮、聚乙烯吡咯烷酮、泡花碱、硅烷偶联剂中的一种或几种。分散剂的重量百分含量优选0.01-10%,更优选0.01-1%。The dispersant is polyethylene glycol, ethylene glycol, polypropylene glycol, hexyldecanol, sodium hexametaphosphate, sodium tripolyphosphate, sodium pyrophosphate, sodium polyacrylate, polyacrylic acid, gum arabic powder, hydroxypropyl Hydroxyl cellulose, hydroxypropyl methyl cellulose, hydroxyethyl cellulose, carboxymethyl cellulose, hydroxypropyl methyl cellulose, methyl cellulose, N-methylpyrrolidone, polyvinylpyrrolidone, natron , One or more of the silane coupling agents. The weight percentage of the dispersant is preferably 0.01-10%, more preferably 0.01-1%.
所述的金刚石微粉是金刚石单晶体或多晶体,金刚石晶体粒径为1-9微米。金刚石微粉的重量百分含量优选0.01-5%,更优选0.05-2%。The diamond micropowder is diamond single crystal or polycrystal, and the diamond crystal grain size is 1-9 microns. The weight percentage of diamond micropowder is preferably 0.01-5%, more preferably 0.05-2%.
研磨液中还可以包括pH值调节剂,所述的pH值调节剂为氢氧化钾、氢氧化钠、氨水、乙醇胺、三乙醇胺、十八胺、异丙醇胺、盐酸、硫酸、硝酸、硼酸、醋酸、硬脂酸、苯甲酸、苯甲酸钠、油酸、油酸钠、水杨酸、月桂酸、丙烯酸、酒石酸、没食子酸中的一种或几种,研磨液的pH值调节范围为3-11。Can also include pH regulator in the grinding liquid, described pH regulator is potassium hydroxide, sodium hydroxide, ammoniacal liquor, ethanolamine, triethanolamine, octadecylamine, isopropanolamine, hydrochloric acid, sulfuric acid, nitric acid, boric acid , acetic acid, stearic acid, benzoic acid, sodium benzoate, oleic acid, sodium oleate, salicylic acid, lauric acid, acrylic acid, tartaric acid, gallic acid or one or more of them, and the pH value adjustment range of the grinding liquid is 3 -11.
研磨液中还可以包括润湿剂,所述的润湿剂为甘油、乙酸乙酯、1,2-丙二醇、1,3-丙二醇、丙三醇、1,3-丁二醇、1,4-丁二醇、月桂醇、三乙醇胺、椰油酰胺丙基甜菜碱中的一种或几种。润湿剂的重量百分含量优选0.01-6%,更优选0.5-2%。Can also comprise wetting agent in the polishing liquid, described wetting agent is glycerin, ethyl acetate, 1,2-propanediol, 1,3-propanediol, glycerol, 1,3-butanediol, 1,4 - One or more of butylene glycol, lauryl alcohol, triethanolamine, and cocamidopropyl betaine. The weight percentage of the wetting agent is preferably 0.01-6%, more preferably 0.5-2%.
所述的油为白油、石脑油、矿物油、合成油、基础油、菜籽油、蓖麻油、橄榄油、液体石蜡中的一种或几种。The oil is one or more of white oil, naphtha, mineral oil, synthetic oil, base oil, rapeseed oil, castor oil, olive oil, and liquid paraffin.
本发明提出的一种油性金刚石研磨液,其组分及配比为:A kind of oily diamond abrasive liquid that the present invention proposes, its component and proportioning are:
本发明提供一种上述的油性金刚石研磨液的制备方法,具体步骤为:The present invention provides a kind of preparation method of above-mentioned oily diamond grinding liquid, concrete steps are:
1)将润湿剂、表面活性剂和油按比例混合,充分搅拌5-30分钟。1) Mix the wetting agent, surfactant and oil in proportion and stir thoroughly for 5-30 minutes.
2)将金刚石微粉与上述油性液体混合,充分搅拌并超声5-30分钟。2) Mix the diamond micropowder with the above oily liquid, stir well and ultrasonic for 5-30 minutes.
3)在上述油性液体中加入分散剂,充分搅拌并超声分散5-30分钟。3) Add dispersant to the above oily liquid, stir thoroughly and ultrasonically disperse for 5-30 minutes.
4)在上述分散好的油性液体中加入pH值调节剂,充分搅拌,调节pH值为3-11,即制备成油性研磨液。4) Add a pH adjuster to the dispersed oily liquid, stir well, and adjust the pH to 3-11 to prepare an oily grinding liquid.
本发明与现有技术相比有如下优点:Compared with the prior art, the present invention has the following advantages:
1)本发明的金刚石研磨液能实现机械作用与化学作用很好的匹配性,使抛光效率高,抛光质量好。本发明的金刚石研磨液可应用于LED蓝宝石衬底片及碳化硅晶片的减薄研磨,也可以用于精密陶瓷、精度模具、光纤及半导体化合物晶片等表面的研磨抛光。1) The diamond abrasive liquid of the present invention can achieve good matching between mechanical action and chemical action, so that the polishing efficiency is high and the polishing quality is good. The diamond grinding liquid of the present invention can be applied to thinning and grinding of LED sapphire substrates and silicon carbide wafers, and can also be used for grinding and polishing surfaces of precision ceramics, precision molds, optical fibers and semiconductor compound wafers.
2)本发明的金刚石研磨液分散性能好,能长期存放保持均匀稳定状态不发生沉降。2) The diamond abrasive liquid of the present invention has good dispersibility, and can be stored for a long time to maintain a uniform and stable state without sedimentation.
3)用其抛光后产品光洁度高,抛光效果好,本发明的金刚石研磨液不含对人体有害成分,易于清洗,有利于环保。3) After polishing, the product has high finish and good polishing effect. The diamond grinding liquid of the present invention does not contain harmful components to the human body, is easy to clean, and is beneficial to environmental protection.
具体实施方式Detailed ways
下面通过实施例对本发明作进一步的阐述,当然无论如何不应解释为限制本发明的范围。The present invention will be further described below by way of examples, which certainly should not be construed as limiting the scope of the present invention in any case.
(实施例)(Example)
以具体实施例1为例:Take specific embodiment 1 as an example:
实施例1:(配制1000克的油性金刚石研磨液)Embodiment 1: (preparation of 1000 grams of oily diamond grinding fluid)
本实施例中研磨液各组分及其重量百分比如下:Each component of grinding liquid and its weight percent are as follows in the present embodiment:
3微米金刚石多晶微粉0.1%3 micron diamond polycrystalline powder 0.1%
表面活性剂月桂酸聚氧乙烯酯1%Surfactant polyoxyethylene laurate 1%
表面活性剂α-烯烃磺酸钠1%Surfactant Sodium α-Olefin Sulfonate 1%
其余为3#工业级白油,产地:茂名石化。The rest is 3# industrial grade white oil, origin: Maoming Petrochemical.
取10克表面活性剂月桂酸聚氧乙烯酯和10克表面活性剂α-烯烃磺酸钠加入979克的白油中,充分搅拌5分钟。Get 10 grams of surfactant polyoxyethylene laurate and 10 grams of surfactant sodium α-olefin sulfonate and add them to 979 grams of white oil, and stir thoroughly for 5 minutes.
取1克粒度为3微米的多晶金刚石微粉与上述油性液体混合,搅拌并超声15分钟,充分润湿金刚石微粉表面,即制备成油性研磨液。Take 1 gram of polycrystalline diamond powder with a particle size of 3 microns and mix it with the above-mentioned oily liquid, stir and sonicate for 15 minutes, fully wet the surface of the diamond powder, and prepare an oily grinding liquid.
实施例2-6的油性金刚石研磨液的制备方法,具体步骤为:The preparation method of the oily diamond grinding liquid of embodiment 2-6, concrete steps are:
1)将润湿剂、表面活性剂和油按比例混合,充分搅拌5分钟;1) Mix the wetting agent, surfactant and oil in proportion and stir thoroughly for 5 minutes;
2)将金刚石微粉与上述油性液体混合,充分搅拌并超声15分钟;2) Mix the diamond micropowder with the above oily liquid, stir thoroughly and ultrasonically for 15 minutes;
3)在上述油性液体中加入分散剂,充分搅拌并超声分散15分钟;3) Add dispersant to the above oily liquid, stir thoroughly and ultrasonically disperse for 15 minutes;
4)在上述分散好的油性液体中加入pH值调节剂,充分搅拌,调节pH值为3-11,即制备成油性研磨液。4) Add a pH adjuster to the dispersed oily liquid, stir well, and adjust the pH to 3-11 to prepare an oily grinding liquid.
抛光工艺:所用抛光机为单面抛光机,使用抛光盘为铜盘,压力为5kgf,转速为80rpm/min,抛光时间为10min,抛光液流量为2ml/min。Polishing process: The polishing machine used is a single-sided polishing machine, the polishing disc is a copper disc, the pressure is 5kgf, the rotation speed is 80rpm/min, the polishing time is 10min, and the flow rate of the polishing solution is 2ml/min.
抛光速率:抛光去除速率通过抛光前后LED衬底片厚度的变化计算得到,采用五点法测量取平均值,测试LED衬底片抛光前后厚度的变化可用千分尺测得,抛光速率为抛光去除厚度变化与抛光时间的比值。Polishing rate: The polishing removal rate is calculated by the change of the thickness of the LED substrate before and after polishing. The average value is measured by the five-point method. The thickness change of the test LED substrate before and after polishing can be measured with a micrometer. ratio of time.
在上述抛光工艺条件下,使用该研磨液加工2寸的LED衬底片,抛光前表面粗糙度值(Ra)是27.546nm,抛光后表面粗糙度值(Ra)达到4.642nm,抛光速率达到1.25微米/分钟。Under the above polishing process conditions, use this abrasive to process a 2-inch LED substrate, the surface roughness (Ra) before polishing is 27.546nm, the surface roughness (Ra) after polishing reaches 4.642nm, and the polishing rate reaches 1.25 microns /minute.
以上所述仅是本发明的其中一种实施方式,应当指出的是对于本技术领域的一般技术人员来说,在不脱离本发明技术原理的前提下,还可以做出相应的调整和改进,这些调整和改进也应视为本发明的保护范围。The above is only one of the embodiments of the present invention. It should be pointed out that those skilled in the art can make corresponding adjustments and improvements without departing from the technical principle of the present invention. These adjustments and improvements should also be regarded as the protection scope of the present invention.
下表为各实施例中油性金刚石研磨液的组分和含量以及由其进行抛光后的LED衬底片表面粗糙度、去除速率。The following table shows the components and contents of the oily diamond grinding liquid in each embodiment, as well as the surface roughness and removal rate of the LED substrate after being polished by it.
Claims (9)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210560797.1A CN103013345B (en) | 2012-12-21 | 2012-12-21 | Oily diamond grinding liquid and preparation method thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201210560797.1A CN103013345B (en) | 2012-12-21 | 2012-12-21 | Oily diamond grinding liquid and preparation method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
CN103013345A true CN103013345A (en) | 2013-04-03 |
CN103013345B CN103013345B (en) | 2015-02-18 |
Family
ID=47962474
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
CN201210560797.1A Expired - Fee Related CN103013345B (en) | 2012-12-21 | 2012-12-21 | Oily diamond grinding liquid and preparation method thereof |
Country Status (1)
Country | Link |
---|---|
CN (1) | CN103013345B (en) |
Cited By (70)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103254799A (en) * | 2013-05-29 | 2013-08-21 | 陈玉祥 | Hydrophilic diamond-suspended grinding and polishing solution and preparation method thereof |
CN103275620A (en) * | 2013-06-19 | 2013-09-04 | 北京工业大学 | Special magnesium aluminum alloy polishing liquid and preparation method thereof |
CN103525314A (en) * | 2013-10-30 | 2014-01-22 | 湖北三翔超硬材料有限公司 | High-efficiency diamond lubricating cooling polishing solution and preparation method and application thereof |
CN103627328A (en) * | 2013-11-27 | 2014-03-12 | 常熟市劲力工具有限公司 | Oily diamond grinding fluid |
CN103624635A (en) * | 2013-11-27 | 2014-03-12 | 常熟市劲力工具有限公司 | Cutter surface processing technology |
CN103643394A (en) * | 2013-11-30 | 2014-03-19 | 江苏金泰针织有限责任公司 | Preparation method of knitted collar and sleeve materials |
CN103710112A (en) * | 2013-12-26 | 2014-04-09 | 常熟市美尔特金属制品有限公司 | Special antirust oil for iron powder stamping parts |
CN103773553A (en) * | 2013-11-29 | 2014-05-07 | 福建六九环保科技有限公司 | Nano-diamond lubricant additive as well as formula, production process and application thereof |
CN103897606A (en) * | 2013-11-11 | 2014-07-02 | 东南大学 | High-purity nano-diamond polishing solution and preparation method thereof |
CN104130713A (en) * | 2014-07-01 | 2014-11-05 | 安徽宏发节能设备有限公司 | Mixed metal polishing fluid added with multiple abrasives and preparation method thereof |
CN104190313A (en) * | 2014-06-06 | 2014-12-10 | 济南裕兴化工有限责任公司 | A cost-reducing wetting dispersant used for titanium dioxide |
CN104213133A (en) * | 2014-09-20 | 2014-12-17 | 常熟市天河机械设备制造有限公司 | Metal cleaner |
CN104213408A (en) * | 2014-09-18 | 2014-12-17 | 常熟市洁韵巾被有限公司 | Production method of hand towels |
CN104213410A (en) * | 2014-09-18 | 2014-12-17 | 常熟市洁韵巾被有限公司 | Production method of bath towels |
CN104497886A (en) * | 2014-12-11 | 2015-04-08 | 北京工业大学 | Special polishing liquid for diamond compact and preparation method of special polishing liquid |
CN104531066A (en) * | 2014-12-17 | 2015-04-22 | 郑州磨料磨具磨削研究所有限公司 | Oil-water-soluble diamond grinding paste and preparation method thereof |
CN104726029A (en) * | 2015-03-13 | 2015-06-24 | 天津诚信盈达科技发展有限公司 | Polishing solution and preparation method thereof |
CN104974714A (en) * | 2014-04-03 | 2015-10-14 | 昭和电工株式会社 | Polishing composition and method for polishing substrate using the same |
CN105038607A (en) * | 2015-06-16 | 2015-11-11 | 东莞市中微纳米科技有限公司 | Effective sapphire fine grinding method and fine grinding solution |
CN105349046A (en) * | 2015-11-04 | 2016-02-24 | 郑州磨料磨具磨削研究所有限公司 | Oil-in-water emulsified diamond grinding solution and preparation method thereof |
CN105350000A (en) * | 2015-12-02 | 2016-02-24 | 苏州捷德瑞精密机械有限公司 | Environment-friendly type aluminum alloy material polishing solution and preparation method thereof |
CN105419647A (en) * | 2015-12-29 | 2016-03-23 | 常熟市金蝙蝠工艺家具有限公司 | Redwood furniture maintaining and nursing liquid |
CN105440953A (en) * | 2015-11-04 | 2016-03-30 | 郑州磨料磨具磨削研究所有限公司 | Aqueous diamond grinding fluid with continuously suspending abrasives and preparation method thereof |
CN105462503A (en) * | 2015-12-02 | 2016-04-06 | 苏州捷德瑞精密机械有限公司 | Nano stainless-steel precise mechanical polishing solution and preparation method thereof |
CN105525283A (en) * | 2015-12-25 | 2016-04-27 | 常熟市诺信达机械设备有限公司 | Belt conveyor |
CN105647475A (en) * | 2015-12-31 | 2016-06-08 | 河南省联合磨料磨具有限公司 | Water-soluble and oil-soluble diamond grinding liquid and preparation method thereof |
CN105647394A (en) * | 2016-02-24 | 2016-06-08 | 湖南皓志科技股份有限公司 | Water-based diamond polishing solution and preparation method thereof |
CN105733446A (en) * | 2016-04-07 | 2016-07-06 | 天津大学 | Oil-based silicon carbide precision grinding and polishing liquid |
CN105733311A (en) * | 2016-04-07 | 2016-07-06 | 天津大学 | Preparing method for surface modified silicon carbide based on oil-based grinding and polishing agent |
CN105950115A (en) * | 2016-05-13 | 2016-09-21 | 盐城工学院 | Environment-friendly abrasive paste suitable for gallium oxide substrate and preparation method of environment-friendly abrasive paste |
CN105970229A (en) * | 2016-06-29 | 2016-09-28 | 巢湖鹏远金属焊管有限公司 | Rust spot polishing paste used for processing of steel pipe |
CN106085248A (en) * | 2016-06-13 | 2016-11-09 | 句容市江电电器机械有限公司 | A kind of transformer shell external surface polishing agent and preparation method thereof |
CN106318219A (en) * | 2015-06-29 | 2017-01-11 | 蓝思科技股份有限公司 | Diamond grinding fluid dedicated for sapphire polishing and preparation method thereof |
CN106701019A (en) * | 2016-12-29 | 2017-05-24 | 东莞市淦宏信息科技有限公司 | Improved ceramic plate grinding fluid |
CN107603492A (en) * | 2017-10-20 | 2018-01-19 | 山东重山光电材料股份有限公司 | A kind of environment-friendly type diamond grinding fluid and its preparation technology |
CN107663422A (en) * | 2016-07-29 | 2018-02-06 | 蓝思科技股份有限公司 | A kind of ceramic polished lapping liquid |
CN107699140A (en) * | 2017-11-06 | 2018-02-16 | 北京国瑞升科技股份有限公司 | A kind of oiliness lapping liquid and preparation method thereof |
CN107880784A (en) * | 2017-12-04 | 2018-04-06 | 苏州市宽道模具机械有限公司 | A kind of high-performance polishing fluid and preparation method thereof |
CN108068003A (en) * | 2017-12-29 | 2018-05-25 | 上海驰声新材料有限公司 | The method and apparatus that a kind of non-crystaline amorphous metal glue-feeder quickly grinds removal |
CN108300413A (en) * | 2018-02-05 | 2018-07-20 | 合肥欧仕嘉机电设备有限公司 | A kind of mechanical equipment grinding agent and preparation method thereof |
CN108505047A (en) * | 2018-05-29 | 2018-09-07 | 苏州德莱美润滑油有限公司 | A kind of brightening solution for stainless steel and preparation method thereof |
CN108587479A (en) * | 2018-07-04 | 2018-09-28 | 江西汇诺科技有限公司 | A kind of novel sapphire polishing liquid |
CN108929655A (en) * | 2017-05-27 | 2018-12-04 | 东莞华晶粉末冶金有限公司 | Diamond paste and preparation method thereof |
CN109536042A (en) * | 2018-12-28 | 2019-03-29 | 河南联合精密材料股份有限公司 | A kind of oiliness polishing fluid and the preparation method and application thereof |
CN109848834A (en) * | 2018-12-06 | 2019-06-07 | 太原理工大学 | A kind of combined type processing method improving titanium alloy surface quality |
CN109971422A (en) * | 2019-03-31 | 2019-07-05 | 河南飞孟金刚石工业有限公司 | A kind of aerospace composite polycrystal-diamond lapping liquid |
CN111363520A (en) * | 2020-04-17 | 2020-07-03 | 深圳市朗纳研磨材料有限公司 | Grinding fluid and preparation method thereof |
CN111922333A (en) * | 2020-07-26 | 2020-11-13 | 自贡硬质合金有限责任公司 | Hard alloy mixture dispersing agent |
CN111995983A (en) * | 2020-09-02 | 2020-11-27 | 中科孚迪科技发展有限公司 | Preparation method of grinding fluid for processing semiconductor wafer |
CN112029416A (en) * | 2020-09-02 | 2020-12-04 | 中科孚迪科技发展有限公司 | Grinding fluid for processing semiconductor wafer |
CN112029417A (en) * | 2020-09-30 | 2020-12-04 | 常州时创新材料有限公司 | Polishing composition for silicon carbide CMP and preparation method thereof |
CN112063220A (en) * | 2020-09-04 | 2020-12-11 | 江苏镇钛化工有限公司 | Titanium dioxide efficient dispersant and preparation method thereof |
CN112481010A (en) * | 2020-11-26 | 2021-03-12 | 南京工业大学 | Viscosity-series water-glycol flame-retardant hydraulic fluid and preparation method thereof |
CN112480825A (en) * | 2020-12-10 | 2021-03-12 | 河南联合精密材料股份有限公司 | Diamond polishing solution for rough polishing of silicon carbide wafer and preparation method thereof |
CN112646550A (en) * | 2020-12-23 | 2021-04-13 | 江苏奥首材料科技有限公司 | Diamond grinding fluid for wafer substrate slice |
CN113563843A (en) * | 2021-08-02 | 2021-10-29 | 浙江奥首材料科技有限公司 | Cerium dioxide/nano-diamond composite abrasive with core-shell structure, preparation method thereof and polishing solution for ultra-precise polishing of sapphire |
CN113881346A (en) * | 2020-07-02 | 2022-01-04 | 苏州诺天美新材料技术有限公司 | A kind of diamond grinding fluid and preparation process thereof |
CN114106705A (en) * | 2021-12-20 | 2022-03-01 | 安美科技股份有限公司 | Micro powder suspension polishing oil and preparation method thereof |
CN114574107A (en) * | 2022-03-18 | 2022-06-03 | 北京通美晶体技术股份有限公司 | Cleaning agent for grinding and polishing solution and preparation method thereof |
CN115044299A (en) * | 2022-07-04 | 2022-09-13 | 浙江奥首材料科技有限公司 | Water-soluble high-specific-gravity large-size abrasive suspension auxiliary agent, preparation method and application thereof, and grinding fluid containing water-soluble high-specific-gravity large-size abrasive suspension auxiliary agent |
CN115305013A (en) * | 2022-09-21 | 2022-11-08 | 歌尔光学科技有限公司 | Diamond polishing solution and preparation method thereof |
CN115477925A (en) * | 2022-09-23 | 2022-12-16 | 珠海市创智成功科技有限公司 | Chemical grinding liquid formula applied to wafer back thinning |
CN115521714A (en) * | 2022-10-24 | 2022-12-27 | 浙江奥首材料科技有限公司 | Oily diamond polishing solution, preparation method and application thereof |
CN115595584A (en) * | 2021-07-07 | 2023-01-13 | 浙江伟星实业发展股份有限公司(Cn) | Bright water for zipper polishing, metal natural-color bright zipper and preparation method thereof |
CN116606630A (en) * | 2023-05-23 | 2023-08-18 | 大连奥首科技有限公司 | A kind of abrasive liquid, preparation method and application |
CN116640518A (en) * | 2023-05-23 | 2023-08-25 | 浙江陶特容器科技股份有限公司 | Fluid grinding agent and application thereof |
CN116970342A (en) * | 2023-08-01 | 2023-10-31 | 南京金瑞立丰硬质材料科技有限公司 | Polycrystalline diamond polishing agent for silicon carbide processing and preparation method thereof |
CN118165651A (en) * | 2024-03-12 | 2024-06-11 | 河南路纳尔新材料有限公司 | Corrosion-resistant diamond grinding fluid and preparation method thereof |
CN119346098A (en) * | 2024-12-26 | 2025-01-24 | 淄博加华新材料有限公司 | Preparation method of modified cerium-zirconium solid solution |
CN119361725A (en) * | 2024-12-25 | 2025-01-24 | 浙江大学温州研究院 | Metal particle loaded self-supporting electrode material and preparation method and application thereof |
Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1304968A (en) * | 2000-12-01 | 2001-07-25 | 清华大学 | Nm-class polishing liquid and its preparing process |
JP2002146345A (en) * | 2000-11-07 | 2002-05-22 | Trusco Nakayama Corp | Oily diamond paste abrasive composition and its aerosol abrasive product |
CN1560161A (en) * | 2004-03-01 | 2005-01-05 | 长沙矿冶研究院 | Water-based nano diamond polishing solution and preparation method thereof |
JP2005186246A (en) * | 2003-12-26 | 2005-07-14 | Tokyo Magnetic Printing Co Ltd | Polishing method for composite material and lapping oil composite used for finish polishing |
CN101033374A (en) * | 2007-04-13 | 2007-09-12 | 中国地质大学(武汉) | High-purity nano diamond polishing liquid and preparing method thereof |
CN101050339A (en) * | 2007-05-17 | 2007-10-10 | 中国地质大学(武汉) | Diamond polishing paste in high purity, and preparation method |
US20080139089A1 (en) * | 2006-12-01 | 2008-06-12 | Nihon Micro Coating Co., Ltd. | Method of polishing hard crystal substrate and polishing oil slurry therefor |
JP2009263534A (en) * | 2008-04-25 | 2009-11-12 | Yushiro Chem Ind Co Ltd | Abrasive grain dispersion medium, slurry composition, method of polishing of brittle material, and preparation method of sapphire substrate |
-
2012
- 2012-12-21 CN CN201210560797.1A patent/CN103013345B/en not_active Expired - Fee Related
Patent Citations (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2002146345A (en) * | 2000-11-07 | 2002-05-22 | Trusco Nakayama Corp | Oily diamond paste abrasive composition and its aerosol abrasive product |
CN1304968A (en) * | 2000-12-01 | 2001-07-25 | 清华大学 | Nm-class polishing liquid and its preparing process |
JP2005186246A (en) * | 2003-12-26 | 2005-07-14 | Tokyo Magnetic Printing Co Ltd | Polishing method for composite material and lapping oil composite used for finish polishing |
CN1560161A (en) * | 2004-03-01 | 2005-01-05 | 长沙矿冶研究院 | Water-based nano diamond polishing solution and preparation method thereof |
US20080139089A1 (en) * | 2006-12-01 | 2008-06-12 | Nihon Micro Coating Co., Ltd. | Method of polishing hard crystal substrate and polishing oil slurry therefor |
CN101033374A (en) * | 2007-04-13 | 2007-09-12 | 中国地质大学(武汉) | High-purity nano diamond polishing liquid and preparing method thereof |
CN101050339A (en) * | 2007-05-17 | 2007-10-10 | 中国地质大学(武汉) | Diamond polishing paste in high purity, and preparation method |
JP2009263534A (en) * | 2008-04-25 | 2009-11-12 | Yushiro Chem Ind Co Ltd | Abrasive grain dispersion medium, slurry composition, method of polishing of brittle material, and preparation method of sapphire substrate |
Non-Patent Citations (4)
Title |
---|
张书达等: "金刚石微粉和抛光液的制造工艺检测技术及应用(下)", 《超硬材料工程》, vol. 24, no. 2, 15 April 2012 (2012-04-15), pages 22 - 26 * |
李凤兰等: "硬表面用抛光剂", 《天津化工》, no. 03, 30 September 1998 (1998-09-30) * |
许向阳等: "表面活性剂组合使用对纳米金刚石在水介质中分散行为的影响", 《矿冶工程》, vol. 23, no. 3, 30 June 2003 (2003-06-30), pages 60 - 64 * |
靳洪允等: "纳米金刚石抛光液制备及应用", 《金刚石与磨料磨具工程》, no. 03, 15 June 2007 (2007-06-15) * |
Cited By (91)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103254799A (en) * | 2013-05-29 | 2013-08-21 | 陈玉祥 | Hydrophilic diamond-suspended grinding and polishing solution and preparation method thereof |
CN103275620A (en) * | 2013-06-19 | 2013-09-04 | 北京工业大学 | Special magnesium aluminum alloy polishing liquid and preparation method thereof |
CN103275620B (en) * | 2013-06-19 | 2014-10-22 | 北京工业大学 | Special magnesium aluminum alloy polishing liquid and preparation method thereof |
CN103525314A (en) * | 2013-10-30 | 2014-01-22 | 湖北三翔超硬材料有限公司 | High-efficiency diamond lubricating cooling polishing solution and preparation method and application thereof |
CN103525314B (en) * | 2013-10-30 | 2014-12-10 | 湖北三翔超硬材料有限公司 | High-efficiency diamond lubricating cooling polishing solution and preparation method and application thereof |
CN103897606A (en) * | 2013-11-11 | 2014-07-02 | 东南大学 | High-purity nano-diamond polishing solution and preparation method thereof |
CN103627328A (en) * | 2013-11-27 | 2014-03-12 | 常熟市劲力工具有限公司 | Oily diamond grinding fluid |
CN103624635A (en) * | 2013-11-27 | 2014-03-12 | 常熟市劲力工具有限公司 | Cutter surface processing technology |
CN103773553A (en) * | 2013-11-29 | 2014-05-07 | 福建六九环保科技有限公司 | Nano-diamond lubricant additive as well as formula, production process and application thereof |
CN103643394A (en) * | 2013-11-30 | 2014-03-19 | 江苏金泰针织有限责任公司 | Preparation method of knitted collar and sleeve materials |
CN103710112A (en) * | 2013-12-26 | 2014-04-09 | 常熟市美尔特金属制品有限公司 | Special antirust oil for iron powder stamping parts |
CN104974714B (en) * | 2014-04-03 | 2019-03-08 | 昭和电工株式会社 | The grinding method of abrasive composition and the substrate using the abrasive composition |
CN104974714A (en) * | 2014-04-03 | 2015-10-14 | 昭和电工株式会社 | Polishing composition and method for polishing substrate using the same |
CN104190313A (en) * | 2014-06-06 | 2014-12-10 | 济南裕兴化工有限责任公司 | A cost-reducing wetting dispersant used for titanium dioxide |
CN104190313B (en) * | 2014-06-06 | 2015-10-21 | 济南裕兴化工有限责任公司 | A kind of titanium dioxide wetting dispersing agent |
CN104130713B (en) * | 2014-07-01 | 2015-10-28 | 安徽宏发节能设备有限公司 | A kind of hybrid metal polishing fluid adding multiple grinding and preparation method thereof |
CN104130713A (en) * | 2014-07-01 | 2014-11-05 | 安徽宏发节能设备有限公司 | Mixed metal polishing fluid added with multiple abrasives and preparation method thereof |
CN104213408A (en) * | 2014-09-18 | 2014-12-17 | 常熟市洁韵巾被有限公司 | Production method of hand towels |
CN104213410A (en) * | 2014-09-18 | 2014-12-17 | 常熟市洁韵巾被有限公司 | Production method of bath towels |
CN104213133A (en) * | 2014-09-20 | 2014-12-17 | 常熟市天河机械设备制造有限公司 | Metal cleaner |
CN104497886A (en) * | 2014-12-11 | 2015-04-08 | 北京工业大学 | Special polishing liquid for diamond compact and preparation method of special polishing liquid |
CN104531066A (en) * | 2014-12-17 | 2015-04-22 | 郑州磨料磨具磨削研究所有限公司 | Oil-water-soluble diamond grinding paste and preparation method thereof |
CN104726029A (en) * | 2015-03-13 | 2015-06-24 | 天津诚信盈达科技发展有限公司 | Polishing solution and preparation method thereof |
CN105038607A (en) * | 2015-06-16 | 2015-11-11 | 东莞市中微纳米科技有限公司 | Effective sapphire fine grinding method and fine grinding solution |
CN106318219A (en) * | 2015-06-29 | 2017-01-11 | 蓝思科技股份有限公司 | Diamond grinding fluid dedicated for sapphire polishing and preparation method thereof |
CN106318219B (en) * | 2015-06-29 | 2018-07-13 | 蓝思科技股份有限公司 | Special diamond grinding liquid of a kind of sapphire polishing and preparation method thereof |
CN105349046A (en) * | 2015-11-04 | 2016-02-24 | 郑州磨料磨具磨削研究所有限公司 | Oil-in-water emulsified diamond grinding solution and preparation method thereof |
CN105440953A (en) * | 2015-11-04 | 2016-03-30 | 郑州磨料磨具磨削研究所有限公司 | Aqueous diamond grinding fluid with continuously suspending abrasives and preparation method thereof |
CN105462503A (en) * | 2015-12-02 | 2016-04-06 | 苏州捷德瑞精密机械有限公司 | Nano stainless-steel precise mechanical polishing solution and preparation method thereof |
CN105350000A (en) * | 2015-12-02 | 2016-02-24 | 苏州捷德瑞精密机械有限公司 | Environment-friendly type aluminum alloy material polishing solution and preparation method thereof |
CN105525283A (en) * | 2015-12-25 | 2016-04-27 | 常熟市诺信达机械设备有限公司 | Belt conveyor |
CN105419647A (en) * | 2015-12-29 | 2016-03-23 | 常熟市金蝙蝠工艺家具有限公司 | Redwood furniture maintaining and nursing liquid |
CN105647475A (en) * | 2015-12-31 | 2016-06-08 | 河南省联合磨料磨具有限公司 | Water-soluble and oil-soluble diamond grinding liquid and preparation method thereof |
CN105647475B (en) * | 2015-12-31 | 2017-12-01 | 河南联合精密材料股份有限公司 | Oily two molten diamond grinding fluids of a kind of water and preparation method thereof |
CN105647394A (en) * | 2016-02-24 | 2016-06-08 | 湖南皓志科技股份有限公司 | Water-based diamond polishing solution and preparation method thereof |
CN105733446A (en) * | 2016-04-07 | 2016-07-06 | 天津大学 | Oil-based silicon carbide precision grinding and polishing liquid |
CN105733311A (en) * | 2016-04-07 | 2016-07-06 | 天津大学 | Preparing method for surface modified silicon carbide based on oil-based grinding and polishing agent |
CN105733311B (en) * | 2016-04-07 | 2017-10-17 | 天津大学 | A kind of preparation method of the surface modified carbon SiClx based on oil base grinding and polishing liquid |
CN105950115A (en) * | 2016-05-13 | 2016-09-21 | 盐城工学院 | Environment-friendly abrasive paste suitable for gallium oxide substrate and preparation method of environment-friendly abrasive paste |
CN106085248A (en) * | 2016-06-13 | 2016-11-09 | 句容市江电电器机械有限公司 | A kind of transformer shell external surface polishing agent and preparation method thereof |
CN105970229A (en) * | 2016-06-29 | 2016-09-28 | 巢湖鹏远金属焊管有限公司 | Rust spot polishing paste used for processing of steel pipe |
CN107663422A (en) * | 2016-07-29 | 2018-02-06 | 蓝思科技股份有限公司 | A kind of ceramic polished lapping liquid |
CN107663422B (en) * | 2016-07-29 | 2020-08-11 | 蓝思科技股份有限公司 | Ceramic polishing grinding fluid |
CN106701019A (en) * | 2016-12-29 | 2017-05-24 | 东莞市淦宏信息科技有限公司 | Improved ceramic plate grinding fluid |
CN108929655A (en) * | 2017-05-27 | 2018-12-04 | 东莞华晶粉末冶金有限公司 | Diamond paste and preparation method thereof |
CN107603492A (en) * | 2017-10-20 | 2018-01-19 | 山东重山光电材料股份有限公司 | A kind of environment-friendly type diamond grinding fluid and its preparation technology |
CN107699140A (en) * | 2017-11-06 | 2018-02-16 | 北京国瑞升科技股份有限公司 | A kind of oiliness lapping liquid and preparation method thereof |
CN107699140B (en) * | 2017-11-06 | 2020-04-10 | 北京国瑞升科技股份有限公司 | Oily grinding fluid and preparation method thereof |
CN107880784A (en) * | 2017-12-04 | 2018-04-06 | 苏州市宽道模具机械有限公司 | A kind of high-performance polishing fluid and preparation method thereof |
CN108068003A (en) * | 2017-12-29 | 2018-05-25 | 上海驰声新材料有限公司 | The method and apparatus that a kind of non-crystaline amorphous metal glue-feeder quickly grinds removal |
CN108300413A (en) * | 2018-02-05 | 2018-07-20 | 合肥欧仕嘉机电设备有限公司 | A kind of mechanical equipment grinding agent and preparation method thereof |
CN108505047A (en) * | 2018-05-29 | 2018-09-07 | 苏州德莱美润滑油有限公司 | A kind of brightening solution for stainless steel and preparation method thereof |
CN108587479A (en) * | 2018-07-04 | 2018-09-28 | 江西汇诺科技有限公司 | A kind of novel sapphire polishing liquid |
CN108587479B (en) * | 2018-07-04 | 2021-01-15 | 江西汇诺科技有限公司 | Sapphire polishing solution |
CN109848834A (en) * | 2018-12-06 | 2019-06-07 | 太原理工大学 | A kind of combined type processing method improving titanium alloy surface quality |
CN109536042A (en) * | 2018-12-28 | 2019-03-29 | 河南联合精密材料股份有限公司 | A kind of oiliness polishing fluid and the preparation method and application thereof |
CN109536042B (en) * | 2018-12-28 | 2021-06-25 | 河南联合精密材料股份有限公司 | Oily polishing solution and preparation method and application thereof |
CN109971422A (en) * | 2019-03-31 | 2019-07-05 | 河南飞孟金刚石工业有限公司 | A kind of aerospace composite polycrystal-diamond lapping liquid |
CN111363520A (en) * | 2020-04-17 | 2020-07-03 | 深圳市朗纳研磨材料有限公司 | Grinding fluid and preparation method thereof |
CN113881346A (en) * | 2020-07-02 | 2022-01-04 | 苏州诺天美新材料技术有限公司 | A kind of diamond grinding fluid and preparation process thereof |
CN111922333A (en) * | 2020-07-26 | 2020-11-13 | 自贡硬质合金有限责任公司 | Hard alloy mixture dispersing agent |
CN112029416A (en) * | 2020-09-02 | 2020-12-04 | 中科孚迪科技发展有限公司 | Grinding fluid for processing semiconductor wafer |
CN112029416B (en) * | 2020-09-02 | 2022-06-03 | 中科孚迪科技发展有限公司 | Grinding fluid for processing semiconductor wafer |
CN111995983A (en) * | 2020-09-02 | 2020-11-27 | 中科孚迪科技发展有限公司 | Preparation method of grinding fluid for processing semiconductor wafer |
CN112063220A (en) * | 2020-09-04 | 2020-12-11 | 江苏镇钛化工有限公司 | Titanium dioxide efficient dispersant and preparation method thereof |
CN112029417A (en) * | 2020-09-30 | 2020-12-04 | 常州时创新材料有限公司 | Polishing composition for silicon carbide CMP and preparation method thereof |
CN112481010A (en) * | 2020-11-26 | 2021-03-12 | 南京工业大学 | Viscosity-series water-glycol flame-retardant hydraulic fluid and preparation method thereof |
CN112481010B (en) * | 2020-11-26 | 2022-11-11 | 南京工业大学 | Viscosity-series water-glycol flame-retardant hydraulic fluid and preparation method thereof |
CN112480825A (en) * | 2020-12-10 | 2021-03-12 | 河南联合精密材料股份有限公司 | Diamond polishing solution for rough polishing of silicon carbide wafer and preparation method thereof |
CN112646550A (en) * | 2020-12-23 | 2021-04-13 | 江苏奥首材料科技有限公司 | Diamond grinding fluid for wafer substrate slice |
CN115595584A (en) * | 2021-07-07 | 2023-01-13 | 浙江伟星实业发展股份有限公司(Cn) | Bright water for zipper polishing, metal natural-color bright zipper and preparation method thereof |
CN113563843A (en) * | 2021-08-02 | 2021-10-29 | 浙江奥首材料科技有限公司 | Cerium dioxide/nano-diamond composite abrasive with core-shell structure, preparation method thereof and polishing solution for ultra-precise polishing of sapphire |
CN113563843B (en) * | 2021-08-02 | 2022-04-08 | 浙江奥首材料科技有限公司 | Cerium dioxide/nano-diamond composite abrasive with core-shell structure, preparation method thereof and polishing solution for ultra-precise polishing of sapphire |
CN114106705A (en) * | 2021-12-20 | 2022-03-01 | 安美科技股份有限公司 | Micro powder suspension polishing oil and preparation method thereof |
CN114574107A (en) * | 2022-03-18 | 2022-06-03 | 北京通美晶体技术股份有限公司 | Cleaning agent for grinding and polishing solution and preparation method thereof |
CN115044299A (en) * | 2022-07-04 | 2022-09-13 | 浙江奥首材料科技有限公司 | Water-soluble high-specific-gravity large-size abrasive suspension auxiliary agent, preparation method and application thereof, and grinding fluid containing water-soluble high-specific-gravity large-size abrasive suspension auxiliary agent |
CN115044299B (en) * | 2022-07-04 | 2023-11-17 | 浙江奥首材料科技有限公司 | Water-soluble high-specific-gravity large-size abrasive suspension auxiliary agent, preparation method and application thereof, and grinding fluid containing water-soluble high-specific-gravity large-size abrasive suspension auxiliary agent |
CN115305013A (en) * | 2022-09-21 | 2022-11-08 | 歌尔光学科技有限公司 | Diamond polishing solution and preparation method thereof |
CN115305013B (en) * | 2022-09-21 | 2023-11-21 | 歌尔光学科技有限公司 | Diamond polishing solution and preparation method thereof |
CN115477925A (en) * | 2022-09-23 | 2022-12-16 | 珠海市创智成功科技有限公司 | Chemical grinding liquid formula applied to wafer back thinning |
CN115521714A (en) * | 2022-10-24 | 2022-12-27 | 浙江奥首材料科技有限公司 | Oily diamond polishing solution, preparation method and application thereof |
CN115521714B (en) * | 2022-10-24 | 2023-10-24 | 浙江奥首材料科技有限公司 | Oily diamond polishing solution, and preparation method and application thereof |
CN116606630B (en) * | 2023-05-23 | 2024-01-09 | 大连奥首科技有限公司 | Grinding fluid, preparation method and application |
CN116606630A (en) * | 2023-05-23 | 2023-08-18 | 大连奥首科技有限公司 | A kind of abrasive liquid, preparation method and application |
CN116640518A (en) * | 2023-05-23 | 2023-08-25 | 浙江陶特容器科技股份有限公司 | Fluid grinding agent and application thereof |
CN116970342A (en) * | 2023-08-01 | 2023-10-31 | 南京金瑞立丰硬质材料科技有限公司 | Polycrystalline diamond polishing agent for silicon carbide processing and preparation method thereof |
CN116970342B (en) * | 2023-08-01 | 2024-02-02 | 南京金瑞立丰硬质材料科技有限公司 | Polycrystalline diamond polishing agent for silicon carbide processing and preparation method thereof |
CN118165651A (en) * | 2024-03-12 | 2024-06-11 | 河南路纳尔新材料有限公司 | Corrosion-resistant diamond grinding fluid and preparation method thereof |
CN118165651B (en) * | 2024-03-12 | 2024-09-24 | 河南路纳尔新材料有限公司 | Corrosion-resistant diamond grinding fluid and preparation method thereof |
CN119361725A (en) * | 2024-12-25 | 2025-01-24 | 浙江大学温州研究院 | Metal particle loaded self-supporting electrode material and preparation method and application thereof |
CN119346098A (en) * | 2024-12-26 | 2025-01-24 | 淄博加华新材料有限公司 | Preparation method of modified cerium-zirconium solid solution |
Also Published As
Publication number | Publication date |
---|---|
CN103013345B (en) | 2015-02-18 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN103013345B (en) | Oily diamond grinding liquid and preparation method thereof | |
CN108239484B (en) | Alumina polishing solution for sapphire polishing and preparation method thereof | |
CN102311718B (en) | Aqueous grinding fluid for ultra-precision grinding of hard brittle material and use method thereof | |
CN107699140B (en) | Oily grinding fluid and preparation method thereof | |
CN108587474A (en) | Alumina micro powder polishing solution and preparation method thereof | |
WO2019119816A1 (en) | Cmp polishing solution, preparation method therefor and application thereof | |
CN102311717B (en) | High-hardness micron grinding fluid and preparation method thereof | |
CN108219678B (en) | Diamond grinding fluid and preparation method thereof | |
CN102190962A (en) | Polishing composition and polishing method using the same | |
KR102350734B1 (en) | Chemical mechanical polishing composition for polishing a sapphire surface and methods of using same | |
CN105086837B (en) | A kind of sapphire Liquid diamond | |
CN102021070B (en) | Water-soluble monocrystalline silicon wafer or polycrystalline silicon wafer cutting fluid | |
CN101186804A (en) | Water diamond lapping liquid and its preparation method and use | |
CN105505316B (en) | Grinding aid for rough grinding of sapphire, grinding liquid and their preparation method | |
JPWO2009151120A1 (en) | Aluminum oxide particles and polishing composition containing the same | |
CN105273638B (en) | Anti- cleavage suspension lapping liquid of gallium oxide wafer and preparation method thereof | |
CN102516873A (en) | Silicon wafer polishing composition and preparation method thereof | |
CN105647394A (en) | Water-based diamond polishing solution and preparation method thereof | |
CN104559798A (en) | Alumina-based chemical mechanical polishing slurry | |
CN101016439A (en) | Chemical mechanical polishing pulp for sapphire substrate underlay | |
CN113683962B (en) | Preparation method of silicon dioxide grinding and polishing agent | |
CN111548737A (en) | Diamond grinding fluid and preparation method thereof | |
CN105038607A (en) | Effective sapphire fine grinding method and fine grinding solution | |
CN107189693A (en) | A kind of A is to sapphire chemically mechanical polishing polishing fluid and preparation method thereof | |
CN105505231A (en) | A kind of high-efficiency boron carbide grinding fluid and preparation method thereof |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
C06 | Publication | ||
PB01 | Publication | ||
C10 | Entry into substantive examination | ||
SE01 | Entry into force of request for substantive examination | ||
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CF01 | Termination of patent right due to non-payment of annual fee | ||
CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20150218 Termination date: 20161221 |