CN102796993A - CVD (Chemical Vapor Deposition) equipment and control method thereof - Google Patents
CVD (Chemical Vapor Deposition) equipment and control method thereof Download PDFInfo
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- CN102796993A CN102796993A CN2011101413188A CN201110141318A CN102796993A CN 102796993 A CN102796993 A CN 102796993A CN 2011101413188 A CN2011101413188 A CN 2011101413188A CN 201110141318 A CN201110141318 A CN 201110141318A CN 102796993 A CN102796993 A CN 102796993A
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Abstract
The invention provides CVD (Chemical Vapor Deposition) equipment comprising a cavity, an electrode plate, a plurality of horizontally arranged driving wheels, a carrier plate, first lifting mechanisms and a controller, wherein the cavity is used for forming a chamber; the electrode plate is arranged on the top of the chamber; the driving wheels are arranged in the chamber; the carrier plate is arranged on the driving wheels; the first lifting mechanisms are respectively located at two ends of the electrode plate and used for supporting the electrode plate and controlling the electrode plate to vertically move; and the controller is connected with the driving wheels and the first lifting mechanisms and used for controlling the rotation of the driving wheels and the lifting of the first lifting mechanism so as to move the electrode plate and the carrier plate in or out of the chamber. The invention also provides a control method. The CVD equipment provided by the embodiment of the invention has the advantages of high electrode plate replacement speed and low energy consumption. The control method of the CVD equipment has the advantages of simplicity in control and high control precision.
Description
Technical field
The present invention relates to microelectronics technology, the control method of particularly a kind of CVD equipment and this CVD equipment.
Background technology
Plasma enhanced chemical vapor deposition (PECVD) equipment mainly is divided into two kinds of direct method and indirect methods according to the difference of thin film-forming method, and these two kinds of equipment all are to bear wafer through support plate.The support plate ground connection of direct method, top electrode connects intermediate frequency or radio frequency, between top electrode and support plate, forms plasma body.The support plate of indirect method is earth-free, only plays transmitting effect, and battery lead plate connects high frequency or microwave, and ion is combined into antireflective film and is deposited on the wafer surface by diffusion in discharge space.
Mostly indirect method is down plated film mode, and wafer is placed on chamber roof during plated film, plasma source below, film forming face down, but because indirect method can only realize surface passivation, so limited the lifting of short-circuit current.And the direct method film forming is fine and close, can realize film forming body passivation, therefore can promote short-circuit current.As shown in Figure 1, be plated film PECVD device 100 on traditional flat direct method.Generally be in vacuum state in the chamber 111; Process gas gets into chamber 111 through air inlet port 120; Radio-frequency power supply 170 provides energy through battery lead plate 130 in chamber 111, support plate 140 direct ground connection produce rf electric field between battery lead plate 130 and support plate 140; Process gas is excited into plasma body, thereby the wafer that is positioned on the support plate 140 is carried out plated film.But because film formation surface is up, the particle that therefore in technological process, produces, or the particle that long-play rear electrode plate 130 peels off may drop on the film formation surface, and then influence the outward appearance and the quality of wafer.
Therefore, when battery lead plate 130 surfaces formed particle, the battery lead plate 130 that need clean or more renew was to improve the yield of wafer.Yet, because the battery lead plate 130 of plated film PECVD device 100 causes changing loaded down with trivial details and loses time for being fixed on chamber 111 upper surfaces on traditional flat direct method.And in the replacing process, well heater 160 need stop heating, cooling, and after the battery lead plate 130 replacing completion, well heater 160 needs be heated to support plate 140 again the temperature of the required plated film of wafer, causes energy consumption to improve, and battery lead plate 130 maintenance times are long.
Summary of the invention
The object of the invention is intended to solve at least one of above-mentioned technological deficiency.
For this reason, the objective of the invention is to propose a kind of CVD equipment, this CVD equipment can be changed battery lead plate fast, and then improves the working efficiency of CVD equipment.And need not stop heating in the replacing process, reach the requirement that cuts down the consumption of energy.
Another object of the present invention is to propose a kind of control method of above-mentioned CVD equipment, this method has controls advantage simple, precise control.
For achieving the above object, the CVD equipment that the embodiment of first aspect present invention proposes comprises: cavity, and said cavity forms chamber; Be arranged on the battery lead plate of said chamber roof; The a plurality of power wheels that are horizontal positioned, said a plurality of power wheels are arranged within the said chamber; Support plate, said support plate are placed on said a plurality of power wheel, and said power wheel rotates and moves horizontally to drive said support plate; First hoisting appliance, said first hoisting appliance lays respectively at the two ends of said battery lead plate, and said first hoisting appliance is used to support said battery lead plate, and controls said battery lead plate vertical shifting; And unit; Said unit links to each other with said first hoisting appliance with said power wheel; Said unit is used to control the rotation of said a plurality of power wheels and the up-down of said first hoisting appliance, so that said battery lead plate and said support plate are shifted out or move into said chamber.。
In the CVD of embodiment of the invention equipment, when battery lead plate took out in chamber, unit was at first controlled power wheel and is rotated; So that the support plate that will be placed on the power wheel shifts out chamber; Then unit is controlled first hoisting appliance and is descended, so that the battery lead plate that is supported on first hoisting appliance descends, and finally breaks away from the support of first hoisting appliance and places on the power wheel; At last, unit control power wheel rotates battery lead plate is shifted out chamber.When battery lead plate is put into chamber; Unit control power wheel rotates so that the battery lead plate that cleans or change places the predetermined position on the power wheel; Then unit is controlled first hoisting appliance and is risen, thereby and the battery lead plate that supports after cleaning or changing rise to the replacing that the reaction desired location is accomplished battery lead plate.The battery lead plate of the CVD equipment of the embodiment of the invention places on first hoisting appliance, need not be fixedly mounted on the top of chamber, therefore, in battery lead plate replacing process, has saved the installing/dismounting time of battery lead plate, and has changed simple and convenient.In addition, a plurality of power wheels of the CVD equipment through the embodiment of the invention will place the battery lead plate level on a plurality of power wheels to shift out chamber apace, thereby improve the working efficiency of this CVD equipment.
In addition, CVD equipment according to the present invention can also have following additional technical characterictic:
In one embodiment of the invention, said first hoisting appliance comprises: elevator; The connection mechanism that links to each other with said elevator; Abschirmblech, an end of said Abschirmblech links to each other with said connection mechanism, and the other end of said Abschirmblech is used to support said battery lead plate and shielded radio frequency.
In one embodiment of the invention, the width of said Abschirmblech is greater than the width of said support plate.
In one embodiment of the invention, be provided with opening among the said Abschirmblech, when said first hoisting appliance is controlled said battery lead plate and is risen to response location, said opening and said support plate relatively so that said support plate pass said opening and shift out said chamber.
In one embodiment of the invention, the area of said support plate is less than the area of said battery lead plate.
In one embodiment of the invention, said CVD equipment also comprises: well heater, said well heater is positioned under the said support plate.
In one embodiment of the invention, said CVD equipment also comprises: second hoisting appliance, and said second hoisting appliance is positioned under the said support plate, and said second hoisting appliance is used to support said support plate, and controls said support plate vertical shifting.
In one embodiment of the invention, said battery lead plate links to each other with power supply, and said support plate links to each other with ground.
The control method of the CVD equipment of the above-mentioned first aspect embodiment that the embodiment of second aspect present invention proposes may further comprise the steps: a plurality of rotor wheels of controlling said CVD equipment rotate so that said support plate is shifted out said chamber; Control said first hoisting appliance and descend, and make said battery lead plate break away from the support of said first hoisting appliance so that said battery lead plate contacts with said a plurality of rotor wheels; Controlling said a plurality of rotor wheel rotates so that said battery lead plate is shifted out said chamber; Battery lead plate after cleaning or changing is moved into said chamber; Control that said first hoisting appliance rises so that said first hoisting appliance supports said cleaning or change after battery lead plate, and the battery lead plate that will control after said cleaning or the replacing rises to response location; With said support plate is moved into said chamber.
Through the control method of the embodiment of the invention, realized automatic integratedization of the battery lead plate replacing of CVD equipment, reduce manpower, and replacing is simple, replacing speed is fast.In addition, the control method of embodiment of the invention counter electrode plate is in real time changed control, need not change the required temperature of chamber internal reaction, thereby cut down the consumption of energy, and then improve the rate of utilization of embodiment of the invention CVD equipment.
Additional aspect of the present invention and advantage part in the following description provide, and part will become obviously from the following description, or recognize through practice of the present invention.
Description of drawings
The present invention above-mentioned and/or additional aspect and advantage from obviously with easily understanding becoming the description of embodiment, wherein below in conjunction with accompanying drawing:
Fig. 1 is the synoptic diagram of plated film CVD equipment on the traditional flat direct method;
Fig. 2 is the synoptic diagram of the CVD equipment of the embodiment of the invention; And
Fig. 3 is the schema of the control method of the embodiment of the invention.
Embodiment
Describe embodiments of the invention below in detail, the example of said embodiment is shown in the drawings, and wherein identical from start to finish or similar label is represented identical or similar elements or the element with identical or similar functions.Be exemplary through the embodiment that is described with reference to the drawings below, only be used to explain the present invention, and can not be interpreted as limitation of the present invention.
In description of the invention; It will be appreciated that; The orientation of indications such as term " " center ", " vertically ", " laterally ", " on ", D score, " preceding ", " back ", " left side ", " right side ", " vertically ", " level ", " top ", " end ", " interior ", " outward " or position relation are for based on orientation shown in the drawings or position relation; only be to describe with simplifying for the ease of describing the present invention; rather than the device or the element of indication or hint indication must have specific orientation, with specific azimuth configuration and operation, therefore can not be interpreted as limitation of the present invention.In addition, term " first ", " second " only are used to describe purpose, and can not be interpreted as indication or hint relative importance.
In description of the invention, need to prove that only if clear and definite regulation and qualification are arranged in addition, term " installation ", " linking to each other ", " connection " should be done broad understanding, for example, can be to be fixedly connected, also can be to removably connect, or connect integratedly; Can be mechanical connection, also can be to be electrically connected; Can be directly to link to each other, also can link to each other indirectly through intermediary, can be the connection of two element internals.For those of ordinary skill in the art, can understand above-mentioned term concrete implication in the present invention as the case may be.
Below in conjunction with accompanying drawing 2 the CVD equipment according to the embodiment of the invention is described at first.
As shown in Figure 2, be the synoptic diagram of the CVD equipment of the embodiment of the invention.The CVD equipment of the embodiment of the invention is used for wafer surface is carried out plasma enhanced chemical vapor deposition (PECVD).CVD equipment 200 according to the embodiment of the invention comprises cavity 210, process gas allocation component 220, battery lead plate 230, a plurality of power wheel 240, support plate 250, first hoisting appliance 260 and the unit.Therefore in other embodiments of the invention, battery lead plate 230 also can be a gas distribution plate, and CVD equipment can not comprise process gas allocation component 220 in other embodiments of the invention, and its function is integrated among the battery lead plate 230.To be that example is introduced with the CVD equipment with process gas allocation component 220 in following examples, other embodiment of the present invention and following examples be similar except that process gas allocation component 220, repeat no more at this.
Wherein, be formed with chamber 211 in the cavity 210.Process gas allocation component 220 and battery lead plate 230 are arranged on the top of chamber 211.Like Fig. 2, process gas allocation component 220 places on the battery lead plate 230, and when battery lead plate 230 placed response location A, CVD equipment 200 was in response behaviour.In example of the present invention, for example battery lead plate 230 can link to each other with power supply 231 to produce intermediate frequency or RFC, and support plate 250 links to each other with ground.At this moment, process gas is forming plasma body under the effect of intermediate frequency or RFC between battery lead plate 230 and support plate 250, and is diffused into the wafer surface that is carried on the support plate 250, to form deposit film in wafer surface.
A plurality of power wheels 240 are horizontal positioned and are arranged within the chamber 211.Support plate 250 is placed on a plurality of power wheels 240, and power wheel 240 rotates to drive support plate 250 and moves horizontally.First hoisting appliance 260 lays respectively at the two ends (right ends among Fig. 2) of battery lead plate 230, and first hoisting appliance 260 is used for support electrode plate 230, and control electrode plate 230 vertical shifting.
On substrate during deposit film; First hoisting appliance, 260 support electrode plates 230 to response location A; When needs clean or change battery lead plate 230, earlier support plate 250 is shifted out cavity 210, again first hoisting appliance 260 is vertically dropped to B place, position; As shown in Figure 2, battery lead plate 230 will drop on a plurality of power wheels 240 and break away from the support of first hoisting appliance 260.Then battery lead plate 230 is along with thereby the rotation level of a plurality of power wheels 240 shifts out chamber 211.
In conjunction with Fig. 2, in an example of the present invention, for example first hoisting appliance 260 can be made up of elevator 261, connection mechanism 262 and Abschirmblech 263.Wherein, connection mechanism 262 links to each other with elevator 261.One end of Abschirmblech 263 links to each other with connection mechanism 262, and the other end of Abschirmblech 263 is used for the radio frequency of support electrode plate 230 and guarded electrode plate 230.Position A during Abschirmblech 263 support electrode plate 230 to normal process makes battery lead plate 230 need not be fixedly mounted on the top of chamber 211, has saved the installing/dismounting time of battery lead plate 230.Can drop to fast on a plurality of power wheels 240 through elevator 261 control electrode plates 230, and along with chamber 211 is shifted out in the rotation of a plurality of power wheels 240.Thereby not only pass through the quick travel of elevator 261 Rapid Realization battery lead plates 230 between response location A and position B, and realize that through a plurality of power wheels 240 B shifts out chamber 211 or moves into chamber 211 fast battery lead plates 230 fast from the position.
Another of Abschirmblech 263 act as the radio frequency that guarded electrode plate 230 sends, and plasma body is enclosed in the airtight relatively uniform space, with raising plasma body utilization ratio, thus the one-tenth film uniformity of raising wafer.Preferably, for example Abschirmblech 263 is processed by stupalith.High temperature resistant, insulating characteristic that pottery has, the shielded radio frequency effect is obvious.Certainly, embodiments of the invention are not limited to this, and for example Abschirmblech 263 can also be processed by tetrafluoro, glass and mica material.In addition, the width of Abschirmblech 263 should so that Abschirmblech 263 can surround whole support plate 250, make plasma body more even on the support plate surface greater than the width of support plate 250.In another embodiment of the present invention, for example the area of support plate 250 should make battery lead plate 230 after lowering, can contact and break away from the support of first hoisting appliance 260 with power wheel 240 less than the area of battery lead plate 230.All there is plasma body the neighboring area that guarantees the surface of support plate 250, thereby guarantees to place the wafer film forming on the support plate 250 more even, and film-formation result is better.
The unit of the CVD equipment 200 of the embodiment of the invention links to each other with first hoisting appliance 260 with power wheel 240; Unit is used to control the rotation of a plurality of power wheels 240 and the up-down of first hoisting appliance 260, so that battery lead plate 230 and support plate 250 are shifted out or move into chamber 211.Particularly, for example when cleaning or change battery lead plate 230, control power wheel 240 rotates support plate 250 is shifted out chamber 211.Then; Unit controls that first hoisting appliance 260 descends so that battery lead plate 230 and a plurality of power wheels 240 contact and break away from the support of first hoisting appliance 260; Unit is then controlled a plurality of power wheels 240 and is rotated so that battery lead plate 230 is shifted out chamber 211, and the battery lead plate shift-in chamber 211 that rotate after will cleaning or change of control power wheel 240.
In one embodiment of the invention; For example among Abschirmblech 263, can be provided with opening; When first hoisting appliance, 260 control electrode plates 230 rise to response location; The opening of Abschirmblech 263 is relative with support plate 250 just, and the opening of Abschirmblech 263 should be greater than the vertical section of support plate 250, so that power wheel 240 rotates and make support plate 250 can waltz through the opening of Abschirmblech 263 and shift out chamber 211.Likewise, also can support plate 250 be moved among the chamber 211 through this opening.
In conjunction with Fig. 2, in example of the present invention, for example CVD equipment 200 also comprises well heater 270, and well heater 270 is positioned under the support plate 250.270 pairs of support plate heating of well heater react temperature required so that support plate 250 reaches fast; The CVD equipment 200 of the embodiment of the invention is when changing battery lead plate 230; First hoisting appliance, 260 VTOLs controlled by unit and a plurality of power wheel 240 rotates to realize changing the robotization of battery lead plate 230, and the replacing process does not need manpower, therefore; Well heater need not stop heating, cooling.Reduce the energy consumption of well heater 270, saved the time of cooling, reheat, improved the utilization ratio of CVD equipment 200.And in an embodiment of the present invention, because when changing battery lead plate 230, support plate 250 has been moved out of chamber 211, the particle of therefore having avoided the battery lead plate plated film to produce is fallen on the wafer, therefore can further improve the yield of wafer.
In addition, alternatively, in one embodiment of the invention, CVD equipment 200 can comprise that also second hoisting appliance, 280, the second hoisting appliances 280 are positioned under the support plate 250, and second hoisting appliance 280 is used for supports loadboard 250, and control support plate 250 vertical shifting.Distance when second hoisting appliance 280 can be controlled reaction between battery lead plate 230 and the support plate 250 is fit to distance between the two, thereby improves the quality of forming film of wafer.
Below in conjunction with the control method of accompanying drawing 3 descriptions according to the embodiment of the invention.
As shown in Figure 3, for the schema of the control method of the embodiment of the invention, in conjunction with Fig. 2.Control method according to the embodiment of the invention may further comprise the steps:
Step S301, a plurality of rotor wheels 240 of control CVD equipment 200 rotate so that support plate 250 is shifted out chamber 211.
Step S302 controls first hoisting appliance 260 and descends so that battery lead plate 230 contacts with a plurality of rotor wheels 240, and makes battery lead plate 230 break away from the support of first hoisting appliance 260.
Step S303 controls a plurality of rotor wheels 240 and rotates so that battery lead plate 230 is shifted out chamber 211.
Step S304 moves into chamber 211 with the battery lead plate 230 after cleaning or changing.
Step S305 controls that first hoisting appliance 260 rises so that first hoisting appliance 260 supports the battery lead plate 230 after cleaning or changing, and the battery lead plate 230 of control after cleaning or changing rises to response location.
Step S306 moves into chamber 211 with support plate 250.
According to the control method of the embodiment of the invention, realize automatic integratedization of the battery lead plate replacing of CVD equipment, reduce manpower, and replacing is simple, replacing speed is fast.In addition, the control method of embodiment of the invention counter electrode plate is in real time changed control, need not change the required temperature of chamber internal reaction, thereby cut down the consumption of energy, and then improve the rate of utilization of the CVD equipment of the embodiment of the invention.
In the description of this specification sheets, the description of reference term " embodiment ", " some embodiment ", " example ", " concrete example " or " some examples " etc. means the concrete characteristic, structure, material or the characteristics that combine this embodiment or example to describe and is contained at least one embodiment of the present invention or the example.In this manual, the schematic statement to above-mentioned term not necessarily refers to identical embodiment or example.And concrete characteristic, structure, material or the characteristics of description can combine with suitable manner in any one or more embodiment or example.
Although illustrated and described embodiments of the invention; For those of ordinary skill in the art; Be appreciated that under the situation that does not break away from principle of the present invention and spirit and can carry out multiple variation, modification, replacement and modification that scope of the present invention is accompanying claims and be equal to and limit to these embodiment.
Claims (9)
1. a CVD equipment is characterized in that, comprising:
Cavity, said cavity forms chamber;
Be arranged on the battery lead plate of said chamber roof;
The a plurality of power wheels that are horizontal positioned, said a plurality of power wheels are arranged within the said chamber;
Support plate, said support plate are placed on said a plurality of power wheel, and said power wheel rotates and moves horizontally to drive said support plate;
First hoisting appliance, said first hoisting appliance lays respectively at the two ends of said battery lead plate, said first hoisting appliance is used to support said battery lead plate, and through go up and down to change between said battery lead plate and said support plate vertical range and
Unit; Said unit links to each other with said first hoisting appliance with said a plurality of power wheels; Said unit is used to control the rotation of said a plurality of power wheels and the up-down of said first hoisting appliance, so that said battery lead plate and said support plate are shifted out or move into said chamber.
2. CVD equipment as claimed in claim 1 is characterized in that, said first hoisting appliance comprises:
Elevator;
The connection mechanism that links to each other with said elevator;
Abschirmblech, an end of said Abschirmblech links to each other with said connection mechanism, and the other end of said Abschirmblech is used to support said battery lead plate and shielded radio frequency.
3. CVD equipment as claimed in claim 2 is characterized in that the width of said Abschirmblech is greater than the width of said support plate.
4. CVD equipment as claimed in claim 3; It is characterized in that; Be provided with opening among the said Abschirmblech, when said first hoisting appliance is controlled said battery lead plate and is risen to response location, said opening and said support plate relatively so that said support plate pass said opening and shift out said chamber.
5. CVD equipment as claimed in claim 3 is characterized in that the area of said support plate is less than the area of said battery lead plate.
6. CVD equipment as claimed in claim 1 is characterized in that, also comprises:
Well heater, said well heater is positioned under the said support plate.
7. CVD equipment as claimed in claim 1 is characterized in that, also comprises:
Second hoisting appliance, said second hoisting appliance is positioned under the said support plate, and said second hoisting appliance is used to support said support plate, and controls said support plate vertical shifting.
8. CVD equipment as claimed in claim 1 is characterized in that said battery lead plate links to each other with power supply, and said support plate links to each other with ground.
9. the control method like each described CVD equipment of claim 1-8 is characterized in that, may further comprise the steps:
A plurality of rotor wheels of controlling said CVD equipment rotate so that said support plate is shifted out said chamber;
Control said first hoisting appliance and descend, and make said battery lead plate break away from the support of said first hoisting appliance so that said battery lead plate contacts with said a plurality of rotor wheels;
Controlling said a plurality of rotor wheel rotates so that said battery lead plate is shifted out said chamber;
Battery lead plate after cleaning or changing is moved into said chamber;
Control that said first hoisting appliance rises so that said first hoisting appliance supports said cleaning or change after battery lead plate, and the battery lead plate that will control after said cleaning or the replacing rises to response location; With
Said support plate is moved into said chamber.
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| CN201110141318.8A CN102796993B (en) | 2011-05-27 | 2011-05-27 | CVD (Chemical Vapor Deposition) equipment and control method thereof |
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| CN201110141318.8A CN102796993B (en) | 2011-05-27 | 2011-05-27 | CVD (Chemical Vapor Deposition) equipment and control method thereof |
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| CN103866282A (en) * | 2012-12-14 | 2014-06-18 | 北京北方微电子基地设备工艺研究中心有限责任公司 | PECVD apparatus |
| CN109136884A (en) * | 2018-07-23 | 2019-01-04 | 中国电子科技集团公司第四十八研究所 | The automatic transmission control unit of plate type PECVD apparatus support plate, PECVD device and method |
| CN109402599A (en) * | 2017-08-17 | 2019-03-01 | 中国科学院苏州纳米技术与纳米仿生研究所 | A kind of plasma device and its application |
| CN115190918A (en) * | 2020-02-14 | 2022-10-14 | 爱思强有限公司 | CVD reactor and method for processing a process chamber cover |
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| CN115190918A (en) * | 2020-02-14 | 2022-10-14 | 爱思强有限公司 | CVD reactor and method for processing a process chamber cover |
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