CN109136884A - The automatic transmission control unit of plate type PECVD apparatus support plate, PECVD device and method - Google Patents
The automatic transmission control unit of plate type PECVD apparatus support plate, PECVD device and method Download PDFInfo
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- CN109136884A CN109136884A CN201810811357.6A CN201810811357A CN109136884A CN 109136884 A CN109136884 A CN 109136884A CN 201810811357 A CN201810811357 A CN 201810811357A CN 109136884 A CN109136884 A CN 109136884A
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- 230000005540 biological transmission Effects 0.000 title claims abstract description 52
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- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 title claims abstract description 32
- 238000001514 detection method Methods 0.000 claims abstract description 49
- 230000008569 process Effects 0.000 claims abstract description 25
- 238000001816 cooling Methods 0.000 claims abstract description 22
- 238000011897 real-time detection Methods 0.000 claims description 6
- 238000005303 weighing Methods 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 abstract description 10
- 230000001939 inductive effect Effects 0.000 description 9
- 229910020776 SixNy Inorganic materials 0.000 description 4
- 230000009471 action Effects 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 229910052593 corundum Inorganic materials 0.000 description 4
- 229910001845 yogo sapphire Inorganic materials 0.000 description 4
- 101001073212 Arabidopsis thaliana Peroxidase 33 Proteins 0.000 description 3
- 101001123325 Homo sapiens Peroxisome proliferator-activated receptor gamma coactivator 1-beta Proteins 0.000 description 3
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- 238000011161 development Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 238000013082 photovoltaic technology Methods 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 238000001505 atmospheric-pressure chemical vapour deposition Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 229910021419 crystalline silicon Inorganic materials 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 239000002360 explosive Substances 0.000 description 1
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- 238000007747 plating Methods 0.000 description 1
- 230000000750 progressive effect Effects 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4581—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber characterised by material of construction or surface finish of the means for supporting the substrate
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
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Abstract
本发明公开了一种平板式PECVD设备载板自动传输控制装置，包括载板位置检测组件，安装于各腔室内，用于检测载板的位置；以及控制单元，与载板位置检测组件相连，用于根据载板的位置信号控制载板在各腔室内的运行速度。本发明还公开了一种PECVD设备，包括控制装置、依次对接的上料台、第一上料腔、第一预热腔、第一工艺腔、第一冷却腔、第二上料腔、第二预热腔、第二工艺腔、第二冷却腔、下料腔和下料台；各腔室均对应有驱动电机，控制单元与各驱动电机相连。本发明还公开了一种控制方法，包括步骤：S01、通过载板位置检测组件检测载板的位置；S02、根据载板的位置控制载板在各腔室内的运行速度。本发明的控制装置、设备及方法均具有生产效率高等优点。
The invention discloses an automatic transmission control device for a carrier board of a flat-type PECVD equipment, comprising a carrier board position detection component installed in each chamber for detecting the position of the carrier board; and a control unit connected with the carrier board position detection component, It is used to control the running speed of the carrier board in each chamber according to the position signal of the carrier board. The invention also discloses a PECVD equipment, comprising a control device, a feeding table connected in sequence, a first feeding cavity, a first preheating cavity, a first process cavity, a first cooling cavity, a second feeding cavity, a first feeding cavity, and a second feeding cavity. Two preheating chambers, a second process chamber, a second cooling chamber, a feeding chamber and a feeding table; each chamber is provided with a corresponding driving motor, and the control unit is connected with each driving motor. The invention also discloses a control method, comprising the steps of: S01, detecting the position of the carrier board through a carrier board position detection component; S02, controlling the running speed of the carrier board in each chamber according to the position of the carrier board. The control device, equipment and method of the present invention all have the advantages of high production efficiency.
Description
Technical field
The invention mainly relates to photovoltaic technology field, refers in particular to a kind of plate type PECVD apparatus support plate and transmit control dress automatically
It sets, plate type PECVD apparatus and control method.
Background technique
Photovoltaic industry experienced the quick explosive growth of more than ten years, and the technological accumulation of early period is substantially depleted,
Entire industry entry market adjustment and industrial transformation update phase.With the continuous quickening of China's process of industrialization, to the energy
Demand can be more more and more urgent.And in the emerging energies system such as wind energy, tide energy, underground heat, nuclear energy, photo-thermal, photovoltaic, photovoltaic hair
Electricity is the most popular field of current world research.With being constantly progressive for photovoltaic technology, photovoltaic energy will necessarily become conventional energy
The important component in source.
Passivating structure (PERC) battery is most preferably carried on the back with conventional crystalline silicon battery compatibility at present, volume production efficiency has reached
21.15%.The difference of PERC battery and conventional batteries is one layer of Al2O3 passivating film of increase among overleaf Al-BSF and silicon wafer,
For reducing the surface recombination of photo-generated carrier, to improve the short circuit current of photovoltaic cell, and then transfer efficiency is improved.It is passing through
The research for spending 2012 to 2015 and market application, the methods of ALD, APCVD due to can not industrialization production require gradually move back
Pilot study is being done by scale market out, Jin Shuojia scientific research institution.PECVD method is high with its production capacity at present, film forming is uniform, certainly
Dynamicization degree is high, the advantages such as at low cost are mainstream development directions in industry, is accordingly used in the flat of PERC battery plated film
PECVD device is the technological equipment that photovoltaic industry is badly in need of industrialization.
Conventional production lines are higher to the qualification dependence of operator since the degree of automation is low, and flat-plate type PECVD is set
Standby development, can not only reduce cost of labor can also be greatly improved production efficiency, but during carrier plate transmission, existing card frame,
Hit frame phenomenon be also presently, there are a comparison distinct issues, how to improve the safety of equipment capacity and transmission is one
A worth probing direction.
Summary of the invention
The technical problem to be solved in the present invention is that, for technical problem of the existing technology, the present invention provides one
Kind of structure is simple, the automatic transmission control unit of plate type PECVD apparatus support plate and plate of high degree of automation, high production efficiency
Formula PECVD device, and a kind of control method for operating brief introduction, high production efficiency is accordingly provided.
In order to solve the above technical problems, technical solution proposed by the present invention are as follows:
A kind of automatic transmission control unit of plate type PECVD apparatus support plate, including
Support plate position detection component, is installed in each chamber of plate type PECVD apparatus, the position for real-time detection support plate；
And
Control unit is connected with the support plate position detection component, for controlling support plate in each chamber according to the position signal of support plate
The indoor speed of service.
As a further improvement of the above technical scheme:
The support plate position detection component includes multiple position detection parts, is installed in each chamber.
Position detection part there are two being respectively mounted in each chamber, is installed on the rear and front end of chamber.
The invention also discloses a kind of plate type PECVD apparatus, including feeding platform, the first feeding chamber, successively docked
One preheating cavity, the first process cavity, the first cooling chamber, the second feeding chamber, the second preheating cavity, the second process cavity, the second cooling chamber, under
Expect chamber and blanking bench；Each chamber is corresponding with driving motor；It further include control device as described above, wherein control unit and each
Driving motor is connected, by control driving motor to realize the transmission speed for adjusting each chamber.
The invention also discloses a kind of based on the automatic transmission control unit of plate type PECVD apparatus support plate as described above
Control method, comprising the following steps:
S01, pass through the position of support plate position detection component real-time detection support plate；
S02, control unit control support plate in the indoor speed of service of each chamber according to the position signal of support plate.
As a further improvement of the above technical scheme:
Position detection part there are two being respectively mounted in each chamber, is installed on the rear and front end of chamber；When the position detection part of rear end is examined
When measuring support plate, stops the transmission of a upper chamber or/and close a upper chamber and work as gate and valve between front chamber；When the position of front end
When setting detection piece and detecting support plate, control is when front chamber gradually slows down until stopping transporting.
When position detection part when front end detects support plate, control is when front chamber gradually slows down until stopping transport；Stopping
After only transporting, when next chamber and after pressure balance between front chamber, next chamber is opened and when the gate valve between front chamber
Door, and the transmission of front chamber and next chamber is worked as in starting simultaneously.
In step S02, control unit controls each indoor driving motor of chamber according to the position signal of support plate to realize control
Make the speed of service of each chamber.
Compared with the prior art, the advantages of the present invention are as follows:
The automatic transmission control unit of plate type PECVD apparatus support plate, control method and plate type PECVD apparatus of the invention,
By precisely being detected to the position of support plate in real time, to be carried out by control unit to the indoor transmission speed of each chamber real-time
Adjustment greatly improves production efficiency to realize the precise delivery to support plate and control.
Detailed description of the invention
Fig. 1 is the structural diagram of the present invention.
Figure label indicates: 1, the first feeding chamber；2, the first preheating cavity；3, the first process cavity；4, the first cooling chamber；5,
Two feeding chambers；6, the second preheating cavity；7, the second process cavity；8, the second cooling chamber；9, blanking chamber, 10, feeding platform, 11, blanking bench,
12, support plate.
Specific embodiment
Below in conjunction with Figure of description and specific embodiment, the invention will be further described.
As shown in Figure 1, the automatic transmission control unit of plate type PECVD apparatus support plate of the present embodiment, is applied particularly to put down
In board-like PECVD device, wherein plate type PECVD apparatus includes that the feeding platform 10 successively docked, the first feeding chamber 1, first are pre-
Hot chamber 2, the first process cavity 3, the first cooling chamber 4, the second feeding chamber 5, the second preheating cavity 6, the second process cavity 7, the second cooling chamber
8, blanking chamber 9 and blanking bench 11, the transmission between each chamber is to complete under vacuum conditions, is connected using gate valve or sealing ring
It connects, for completely cutting off air.Control device includes support plate position detection component, is installed in each chamber of plate type PECVD apparatus,
Position for real-time detection support plate；And control unit, it is connected with the support plate position detection component, for according to support plate
Position signal controls support plate in the indoor speed of service of each chamber.Plate type PECVD apparatus support plate of the invention transmits control automatically
Device, by precisely being detected to the position of support plate in real time, thus by control unit to the indoor transmission speed of each chamber into
Row adjustment in real time greatly improves production efficiency to realize the precise delivery to support plate and control.
In the present embodiment, support plate position detection component includes multiple position detection parts (such as position-detection sensor), distribution
In the rear and front end of each chamber, specifically, as shown in Figure 1, altogether including position-detection sensor det1.1 ~ det11.2, each
Chamber is divided into two.It is understood that be not defined herein to the quantity of position detection piece, in other embodiments,
The layout type of three, four or more can also be distributed using each chamber.
As shown in Figure 1, the present invention further correspondingly discloses a kind of plate type PECVD apparatus, specifically include successively dock it is upper
Expect platform 10, the first feeding chamber 1, the first preheating cavity 2, the first process cavity 3, the first cooling chamber 4, the second feeding chamber 5, the second preheating cavity
6, the second process cavity 7, the second cooling chamber 8, blanking chamber 9 and blanking bench 11, each chamber are corresponding with driving motor, and control unit is then
By controlling the revolving speed of driving motor to realize the transmission speed of each chamber.
The present invention further correspondingly discloses a kind of based on the automatic transmission control unit of plate type PECVD apparatus support plate as described above
Control method, comprising the following steps:
S01, pass through the position of support plate position detection component real-time detection support plate；
S02, control unit control support plate in the indoor speed of service of each chamber according to the position signal of support plate.
In the present embodiment, as described above, being respectively mounted in each chamber, there are two position detection parts, are installed on the front and back two of chamber
End；When position detection part when rear end detects support plate, stops the transmission of a upper chamber or/and close a upper chamber and work as ante-chamber
Gate and valve between room；When position detection part when front end detects support plate, control is when front chamber gradually slows down until stopping transport.
In the present embodiment, when the position detection part when front end detects support plate, control is when front chamber gradually slows down until stopping
Only transport；After stopping transport, when next chamber and after pressure balance between front chamber, opens next chamber and work as front chamber
Between gate and valve, and simultaneously starting work as front chamber and next chamber transmission.
Below with reference to a specific embodiment, control method of the invention is described further:
The wherein corresponding motor M1 of feeding platform 10；First feeding chamber, 1 abbreviation feeding chamber 1#, corresponding motor are M2, and two sides are corresponding
There are gate and valve Gate 1 and Gate 2；First preheating cavity, 2 abbreviation preheating cavity 1#, corresponding motor are M3；First process cavity 3 is referred to as
Process cavity 1#, corresponding motor are M4；First cooling chamber, 4 abbreviation cooling chamber 1#, corresponding motor are M5 and M6；Second feeding chamber
5 abbreviation feeding chamber 2#, corresponding motor is M7, and two sides are corresponding with gate and valve Gate 3 and Gate 4；Second preheating cavity 6 referred to as preheats
Chamber 2#, corresponding motor are M8；Second process cavity, 7 abbreviation process cavity 2#, corresponding motor M9；Second cooling chamber, 8 abbreviation cooling chamber 2#,
Corresponding motor M10 and M11；Blanking chamber 9 corresponds to motor M12, and two sides are corresponding with gate and valve Gate 5 and Gate 6, and blanking bench 10 is right
Answer motor M13.
Equipment operates normally, and according to process requirements, feeding chamber 1# is in normal pressure at this time, and support plate 12 passes through artificial or passes through
Automation equipment is transmitted on feeding platform 10.When the position-detection sensor det1.1 on feeding platform 10 detects that support plate 12 passes through
Afterwards, it issues and inductive signal and feeds back, control unit issues transmission instruction to motor M1, and motor M1 is with the speed X that sets to support plate
12 carry out horizontal transport；When position-detection sensor det1.2 detects that support plate 12 passes through, transmission instruction is issued to motor M2,
Motor M2 is issued to gate valve 1# and is instructed with setting speed X unlatching, is driven by the cylinder gate and valve 1#(Gate 1) it opens, support plate
12 are transmitted to feeding chamber 1 through gate valve 1#；After position detecting switch det2.1 on feeding chamber 1 detects that support plate 12 passes through, issue
Inductive signal is simultaneously fed back, and control unit is issued to motor M1 transmits the instruction that stops operating, while issuing and instructing to gate valve 1#, by gas
Cylinder drives gate and valve to close；When the position detecting switch det2.2 on feeding chamber 1 detects that support plate 12 passes through, sent out to motor M2
Deceleration stop command is transmitted out, and support plate 12 stops slowly under the action of frictional force, avoids support plate 12 from crossing and crashes into gate valve 2#
On (Gate 2), feeding chamber 1 is vacuumized by vacuum system at the same time, is restored by normal pressure to low pressure.
After the pressure balance of feeding chamber 1# and the two sides preheating cavity 1#, control unit is issued to gate valve 2# and is instructed, by cylinder
Driving gate valve 2# is opened, while issuing transmission instruction to motor M2, M3, and motor M2, M3 drive support plate with setting speed X unlatching
12 onwards transmissions；After the position-detection sensor det3.1 on preheating cavity 1# detects that support plate 12 passes through, inductive signal is issued
And feed back, control unit issues transmission to motor M2 and stops operating instruction, while issuing instruction to gate valve 2#, is driven by the cylinder pair
Gate and valve is answered to close；When position detecting switch det3.2 on preheating cavity 1# detects that support plate 12 passes through, issues and pass to motor M4
Defeated instruction, motor M4 drive support plate 12 to continue onwards transmission to process cavity 1#, wherein due to technique with setting speed Y unlatching
It needs, Y setting value is less than X setting value；When position detecting switch det4.2 on process cavity 1# detects that support plate 12 passes through, to
Motor M5, M6 issue transmission instruction, and motor M5, M6 drive support plate 12 to continue onwards transmission to cooling chamber with setting speed X unlatching
1#；After position detecting switch det5.1 on cooling chamber 1# detects that support plate 12 passes through, issues inductive signal and feed back, control is single
Member issues to motor M4 and transmits the instruction that stops operating, when the position detecting switch det5.2 on cooling chamber 1# detects that support plate 12 passes through
It is out-of-date, transmission deceleration stop command is issued to motor M5, M6, support plate 12 stops slowly under the action of frictional force, avoids carrying
Plate 12, which is crossed, crashes into Gate 3 in gate valve 3#(Fig. 1) on.
At this point, whether control unit detection gate valve 3# pressure at both sides balances, if when balance, control unit is issued to gate valve 3#
Instruction is driven by the cylinder corresponding gate and valve 3, while issuing transmission instruction, the speed X of motor M6, M7 to set to motor M6, M7
Horizontal transport is carried out to support plate 12, support plate 12 is transmitted to feeding chamber 2# through gate valve 3#；When position-detection sensor det6.1 is detected
After being passed through to support plate 12, issuing inductive signal and feed back, control unit is issued to motor M6 transmits the instruction that stops operating, while to
The gate valve 3# issues instruction, is driven by the cylinder gate and valve closing；When the position detecting switch det6.2 on feeding chamber 2 is detected
When support plate 12 passes through, transmission deceleration stop command is issued to motor M7, support plate 12 stops slowly under the action of frictional force, keeps away
Exempt from support plate 12 and crash into Gate 4 in gate valve 4#(Fig. 1 excessively) on.
Whether control unit detection gate valve 4# pressure at both sides balances, if when balance, control unit is issued to gate valve 4# and is instructed,
It being driven by the cylinder corresponding gate and valve to open, while issuing transmission instruction to motor M7, M8, motor M7, M8 are opened with setting speed X,
Drive 12 onwards transmission of support plate；After the position-detection sensor det7.1 on preheating cavity 2# detects that support plate 12 passes through, issue
Inductive signal is simultaneously fed back, and control unit is issued to motor M7 transmits the instruction that stops operating, while issuing and instructing to the gate valve 4#,
Corresponding gate and valve is driven by the cylinder to close；When position detecting switch det7.2 on preheating cavity 2# detects that support plate 12 passes through, to
Motor M9 sending transmission instruction, motor M9 are opened with setting speed Y2, drive support plate 12 continuation onwards transmission to process cavity 2#,
In, due to the needs of technique, Y2 setting value is less than X setting value, and the setting of Y1 and Y2 refer to not necessarily identical；On process cavity 2#
When position detecting switch det8.2 detects that support plate 12 passes through, to motor M10, M11 issue transmission instruction, motor M10, M11 with
Setting speed X is opened, and support plate 12 is driven to continue onwards transmission to cooling chamber 2#；Position detecting switch det9.1 on cooling chamber 2#
After detecting that support plate 12 passes through, issuing inductive signal and feed back, control unit issues to motor M9 and transmits the instruction that stops operating, when
When position detecting switch det9.2 on cooling chamber 2# detects that support plate 12 passes through, transmission deceleration is issued to motor M10, M11 and is stopped
It only instructs, support plate 12 stops slowly under the action of frictional force, and support plate 12 is avoided to cross the Gate crashed into gate valve 5#(Fig. 1
5) on.
At this point, whether control unit detection gate valve 5# pressure at both sides balances, if when balance, control unit is issued to gate valve #5
Instruction, is driven by the cylinder corresponding gate and valve and opens, while issuing transmission instruction to motor M11, M12, and motor M11, M12 are to set
Speed X carries out horizontal transport to support plate 12, and support plate 12 is transmitted to blanking chamber 9 through gate valve 5#；As position-detection sensor det10.1
After detecting that support plate 12 passes through, issuing inductive signal and feed back, control unit issues to motor M11 and transmits the instruction that stops operating,
It issues and instructs to gate valve 5# simultaneously, be driven by the cylinder corresponding gate and valve and close；Position detecting switch on blanking chamber 9
When det10.2 detects that support plate 12 passes through, transmission deceleration stop command, effect of the support plate 12 in frictional force are issued to motor M12
Under stop slowly, avoid support plate 12 from crossing and crash into the Gate 6 in gate valve 6#(Fig. 1) on.
Whether control unit detection gate valve 6# pressure at both sides balances, after the inflation of blanking chamber 9 is restored to normal pressure by low pressure, control
Unit is issued to gate valve 6# and is instructed, and is driven by the cylinder corresponding gate and valve 6# and is opened, while issuing transmission instruction to motor M12, M13,
Motor M12, M13 drive 12 onwards transmission of support plate with setting speed X unlatching；Position-detection sensor on blanking bench 11
It after det11.1 detects that support plate 12 passes through, issues inductive signal and feeds back, control unit issues transmission to motor M12 and stops turning
Dynamic instruction, while issuing and instructing to gate valve 6#, it is driven by the cylinder corresponding gate and valve and closes；When the position detection on blanking bench 11 is opened
When pass det11.2 detects that support plate 12 passes through, transmission deceleration stop command, work of the support plate 12 in frictional force are issued to motor M13
It stops slowly under, completes one-time process process.
In the present embodiment, the transmission method between each chamber is integrated into can both realize that support plate variable speed transmitted control automatically together
System, while between chamber plating single layer Al2O3, single layer SixNy, Al2O3+ can also be realized according to process requirements, flexible combination
The thin-film techniques such as SixNy, Al2O3+SixNy+SixNy.
In the present embodiment, position-detection sensor be can be set in the two sides up and down of each chamber or the left and right sides, and each
Centre distance between the position-detection sensor of chamber two sides distribution is always greater than the length of support plate, is convenient for speed control.
In addition, the switch direction of gate and valve towards process cavity side, to form pressure difference when cavity being enable to vacuumize, helps to seal.
Although the present invention has been disclosed as a preferred embodiment, however, it is not intended to limit the invention.It is any to be familiar with ability
The technical staff in domain, without deviating from the scope of the technical scheme of the present invention, all using the technology contents pair of the disclosure above
Technical solution of the present invention makes many possible changes and modifications or equivalent example modified to equivalent change.Therefore, all
Without departing from the content of technical solution of the present invention, according to the present invention technical spirit any simple modification made to the above embodiment,
Equivalent variations and modification, all shall fall within the protection scope of the technical scheme of the invention.
Claims (8)
1. a kind of automatic transmission control unit of plate type PECVD apparatus support plate, which is characterized in that including
Support plate position detection component, is installed in each chamber of plate type PECVD apparatus, the position for real-time detection support plate；
And
Control unit is connected with the support plate position detection component, for controlling support plate in each chamber according to the position signal of support plate
The indoor speed of service.
2. the automatic transmission control unit of plate type PECVD apparatus support plate according to claim 1, which is characterized in that described
Support plate position detection component includes multiple position detection parts, is installed in each chamber.
3. the automatic transmission control unit of plate type PECVD apparatus support plate according to claim 2, which is characterized in that each chamber
Interior is respectively mounted there are two position detection part, is installed on the rear and front end of chamber.
4. a kind of plate type PECVD apparatus, including the feeding platform, the first feeding chamber, the first preheating cavity, the first technique successively docked
Chamber, the first cooling chamber, the second feeding chamber, the second preheating cavity, the second process cavity, the second cooling chamber, blanking chamber and blanking bench；Each chamber
Room is corresponding with driving motor；It is characterized in that, further include the control device as described in any one of claims 1 to 3,
Middle control unit is connected with each driving motor, by control driving motor to realize the transmission speed for adjusting each chamber.
5. a kind of based on the automatic transmission control unit of plate type PECVD apparatus support plate described in any one of claims 1 to 3
Control method, which comprises the following steps:
S01, pass through the position of support plate position detection component real-time detection support plate；
S02, control unit control support plate in the indoor speed of service of each chamber according to the position signal of support plate.
6. control method according to claim 5, which is characterized in that it is respectively mounted in each chamber there are two position detection part,
It is installed on the rear and front end of chamber；When position detection part when rear end detects support plate, stop transmission or/and the pass of a upper chamber
Close a chamber and when gate and valve between front chamber；When position detection part when front end detects support plate, control when front chamber by
Decrescence speed is until stop transport.
7. control method according to claim 6, which is characterized in that when the position detection part when front end detects support plate,
Control is when front chamber gradually slows down until stopping transport；After stopping transport, pressure is flat when next chamber and between the front chamber
After weighing apparatus, opens next chamber and the transmission of front chamber and next chamber is worked as in starting when the gate and valve between front chamber, and simultaneously.
8. the control method according to any one of claim 5 to 7, which is characterized in that in step S02, control is single
Member controls the indoor driving motor of each chamber according to the position signal of support plate to realize the speed of service for controlling each chamber.
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| CN201810811357.6A CN109136884A (en) | 2018-07-23 | 2018-07-23 | The automatic transmission control unit of plate type PECVD apparatus support plate, PECVD device and method |
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