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CN102758179A - 铝合金防腐处理方法及其铝合金制品 - Google Patents

铝合金防腐处理方法及其铝合金制品 Download PDF

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CN102758179A
CN102758179A CN2011101081322A CN201110108132A CN102758179A CN 102758179 A CN102758179 A CN 102758179A CN 2011101081322 A CN2011101081322 A CN 2011101081322A CN 201110108132 A CN201110108132 A CN 201110108132A CN 102758179 A CN102758179 A CN 102758179A
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alloy
matrix aluminum
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张新倍
陈文荣
蒋焕梧
陈正士
马楠
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Hongfujin Precision Industry Shenzhen Co Ltd
Hon Hai Precision Industry Co Ltd
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Priority to TW100115412A priority patent/TW201243090A/zh
Priority to US13/176,354 priority patent/US20120276349A1/en
Publication of CN102758179A publication Critical patent/CN102758179A/zh
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Abstract

本发明一种铝合金防腐处理方法，包括如下步骤：提供铝合金基体；采用真空镀膜的方式，于该铝合金基体上形成防护层；于该防护层上依次形成颜色层及绝缘层，所述防护层为CrON层、AlON层及TiON层中的任意一种。本发明还提供了经上述方法制得的铝合金制品。该铝合金制品具有良好的耐腐蚀性。

Description

铝合金防腐处理方法及其铝合金制品
技术领域
本发明涉及一种铝合金防腐处理方法及其铝合金制品。
背景技术
铝合金具有质量轻、散热性能好等诸多优点，在通讯、电子、交通运输、建筑以及航空航天等领域的应用非常广泛。在空气中铝合金表面会形成氧化铝的保护膜（厚度约10nm），在一般的大气环境下，铝合金表面的这层氧化铝膜能够有效地保护铝合金基体。但在含有电解质的湿气中，例如海洋表面大气环境，铝合金表面会出现点蚀，严重破坏产品外观，同时导致产品使用寿命缩短。为了提高铝合金产品的耐腐蚀性能（或耐盐雾性能），通常要对铝合金基体进行表面处理，如阳极氧化、烤漆等，但这些工艺都存在较大的环境污染。
真空镀膜技术（PVD）是一种较环保的镀膜技术。PVD膜层具有高硬度、高耐磨性、良好的化学稳定性等优点，因此在表面防护或装饰处理领域的应用越来越广。而对于铝合金来说，其标准电极电位与许多PVD功能性膜层（如装饰性的颜色层等）的差异较大，极易造成电偶腐蚀，使整个铝合金产品失效。
据悉，目前有通过设置一绝缘层于铝合金基体与功能性膜层之间来防止铝合金基体的电偶腐蚀及失效，但收效甚微。这是由于PVD膜层本身不可避免的会存在缺陷，如针孔、裂纹等，这些缺陷将成为电解质溶液的通道，使铝合金基体和表面的功能性膜层相连形成微电池。此时，功能性膜层成为微电池的阴极，而铝合金基体表面的微小孔洞接触点成为阳极，由于阴极的面积远远大于阳极的面积，即阴阳极的面积比趋于无限大，致使腐蚀电流极大而急剧加速了腐蚀。这种腐蚀失效严重限制了铝合金基体于PVD镀膜技术的应用。
发明内容
鉴于此，有必要提供一种可克服上述缺陷的铝合金防腐处理方法。
另外，还有必要提供一种经由上述防腐处理方法所制得的铝合金制品。
一种铝合金防腐处理方法，包括如下步骤：
提供铝合金基体；
采用真空镀膜的方式，于该铝合金基体上形成防护层，所述防护层为CrON层、AlON层及TiON层中的任意一种；
于该防护层上依次形成颜色层及绝缘层。
一种铝合金制品，包括铝合金基体、依次形成于该铝合金基体上的防护层、颜色层及绝缘层，所述防护层为CrON层、AlON层及TiON层中的任意一种。
相较于现有技术，所述的铝合金防腐处理方法通过对铝合金基体表面的PVD膜系进行结构调整，将装饰性的颜色层与绝缘层的位置互换，将绝缘层设置为外表层，这样一来，绝缘层阻挡了大部分的电解质溶液，而仅少部分的电解质溶液到达颜色层表面，使颜色层的阴极面积大大降低，腐蚀电流也随之大大降低，从而极大地降低了电偶腐蚀发生的速率，提高了铝合金制品的耐腐蚀性能。进一步地，所述防护层还可阻挡电解质溶液，使到达铝合金基体的电解质溶液的浓度进一步降低，腐蚀电流也进一步降低，进一步提高了铝合金制品的耐腐蚀性能。
附图说明
图1是本发明一较佳实施方式的铝合金制品的剖视示意图；
图2是本发明一较佳实施例真空镀膜机的示意图。
主要元件符号说明
铝合金制品 10
铝合金基体 11
防护层 13
颜色层 15
绝缘层 17
真空镀膜机 20
镀膜室 21
第一靶材 23
第二靶材 24
第三靶材 25
轨迹 26
真空泵 30
如下具体实施方式将结合上述附图进一步说明本发明。
具体实施方式
请结合参阅图1与图2，本发明一较佳实施方式的铝合金防腐处理方法包括如下步骤：
提供铝合金基体11，该铝合金基体11可以通过冲压成型得到。
对该铝合金基体11进行清洁前处理。该清洁前处理包括：采用去离子水和无水乙醇依次对所述铝合金基体11的表面进行擦拭，然后将该铝合金基体11置于丙酮中进行超声波清洗，以去除表面的油污。清洗后将该铝合金基体11干燥备用。
对经所述清洁前处理的铝合金基体11的表面进行氩气等离子体清洗，以进一步去除铝合金基体11表面的油污，以及改善铝合金基体11表面与后续镀层的结合力。
请再次参阅图2，提供一真空镀膜机20，该真空镀膜机20包括一镀膜室21及连接于镀膜室21的一真空泵30，真空泵30用以对镀膜室21抽真空。该镀膜室21内设有转架(未图示)、相对设置的二第一靶材23、相对设置的二第二靶材24及相对设置的二第三靶材25。转架带动铝合金基体11沿圆形的轨迹26公转，且铝合金基体11在沿轨迹26公转时亦自转。其中，所述第一靶材23为铬靶、铝靶及钛靶中的任意一种；所述第二靶材24为铬靶；所述第三靶材25为硅靶或铝靶。
该等离子体清洗的具体操作及工艺参数可为：将铝合金基体11固定于真空镀膜机20的镀膜室21中的转架上，将该镀膜室21抽真空至8.0×10-3Pa左右，然后向镀膜室21内通入流量约为500sccm(标准状态毫升/分钟)的氩气(纯度为99.999%)，并施加-500~-800V的偏压于铝合金基体11，对铝合金基体11表面进行氩气等离子体清洗，清洗时间为5~10min。
采用磁控溅射法在经氩气等离子体清洗后的铝合金基体11上溅镀一防护层13。形成防护层13的具体操作方法及工艺参数为：设置第一靶材23的功率为5~15kW；以氮气及氧气为反应气体，氮气的流量为30~60sccm，氧气的流量为40~80sccm，以氩气为工作气体，氩气流量为100~200sccm；溅镀时对铝合金基体11施加-100~-300V的偏压，并加热所述镀膜室21至温度为100~250℃，镀膜时间可为30~120min。所述防护层13为CrON层、AlON层及TiON层中的任意一种，其厚度为100~600nm。溅射完成该防护层13后，关闭所述第一靶材23的电源。
由于所述防护层13在其形成过程中可形成Cr-O与Cr-N的两相化合物、Al-O与Al-N的两相化合物或Ti-O与Ti-N的两相化合物，上述两相化合物的形成可相互抑制各相晶粒的生长，从而可降低各相晶粒的尺寸，使得所述防护层13的致密性增强。
于所述防护层13上溅射一颜色层15。形成颜色层15的具体操作方法及工艺参数为：开启第二靶材24，设置其功率为5~10kw；以氮气为反应气体，氮气流量为10~120sccm，以氩气为工作气体，氩气流量为100~200sccm；溅镀时对铝合金基体11施加-100~-300V的偏压，并加热所述镀膜室21至温度为50~150℃，镀膜时间可为10~30min。该颜色层15为铬-氮（Cr-N）层，其厚度为200~400nm。溅射完成该颜色层15后，关闭所述第二靶材24的电源。
于所述颜色层15上溅射一绝缘层17，制得铝合金制品10。形成绝缘层17的具体操作方法及工艺参数为：开启第三靶材25，该第三靶材25的功率设置为5~15kW；以氧气为反应气体，氧气的流量为100~200sccm，以氩气为工作气体，氩气流量为100~150ccm；溅镀时对铝合金基体11施加-100~-300V的偏压，并加热所述镀膜室21至温度为150~250℃，镀膜时间可为60~120min。所述绝缘层17为透明的SiO2层或Al2O3层，其厚度为200~400nm。溅射完成该绝缘层17后，关闭所述第三靶材25的电源。
关闭负偏压、第三靶材25的电源，停止通入氩气及氧气，待所述绝缘层17冷却后，向镀膜内通入空气，打开镀膜室门，取出所述铝合金制品10。
可以理解的，所述颜色层15还可以为TiNO层、TiCN层、TiN层、CrNO层、CrCN层或其他任意具装饰色彩的膜层。该颜色层15也可被其他的功能性膜层所替代。
可以理解的，所述防护层13及所述绝缘层17还可通过电弧离子镀膜法、蒸发镀膜法等其他真空镀膜法形成。
可以理解的，所述绝缘层17还可以为聚四氟乙烯层、绝缘漆层、绝缘油墨层或其他任意的绝缘层。所述聚四氟乙烯层可通过化学气相沉积或喷涂等方法形成，所述绝缘漆层、绝缘油墨层可通过喷涂或印刷等方式形成。
可以理解的，所述绝缘层17可制作为透明状或半透明状，以满足产品的外观需求。
本发明一较佳实施方式的经由上述防腐处理方法所制得的铝合金制品10包括铝合金基体11、依次形成于该铝合金基体11上的防护层13、颜色层15及绝缘层17。
该铝合金制品10可以为3C电子产品的铝合金制品，也可为通讯、电子、交通运输、建筑以及航空航天等领域的任意铝合金零部件或装饰件。
相较于现有技术，所述的铝合金防腐处理方法通过对铝合金基体11表面的PVD膜系进行结构调整，将装饰性的颜色层15与绝缘层17的位置互换，将绝缘层17设置为外表层，这样一来，绝缘层17阻挡了大部分的电解质溶液，而仅少部分的电解质溶液到达颜色层15表面，使颜色层15的阴极面积大大降低，腐蚀电流也随之大大降低，从而极大地降低了发生腐蚀的速率，提高了铝合金制品10的耐腐蚀性能。同时，由于绝缘层17为透明层，其不会影响到颜色层15对铝合金制品10的装饰性功能。
进一步地，所述的铝合金防腐处理方法在形成颜色层15之前于铝合金基体11表面设置防护层13，由于该防护层13具有良好的致密性，其可阻挡电解质溶液，使到达铝合金基体11的电解质溶液的浓度进一步降低，腐蚀电流也随之进一步降低，进一步提高了铝合金制品10的耐腐蚀性能。
为了证明所述铝合金制品10良好的耐腐蚀性能，对该铝合金制品10进行了35℃中性盐雾（NaCl浓度为5%）测试。结果表明，该铝合金制品10的耐盐雾性能超过96小时。测试至96小时后观察到形成于铝合金基体11表面的颜色层15及绝缘层17均外观完好。可见，所述铝合金制品10具有良好的耐腐蚀性。

Claims (11)

1.一种铝合金制品，包括铝合金基体及形成于该铝合金基体上的颜色层，其特征在于：所述铝合金制品还包括形成于铝合金基体与颜色层之间的防护层及形成于颜色层上的绝缘层，所述防护层为CrON层、AlON层及TiON层中的任意一种。
2.如权利要求1所述的铝合金制品，其特征在于：所述绝缘层为氧化铝层或氧化硅层。
3.如权利要求2所述的铝合金制品，其特征在于：所述绝缘层的厚度为200~400nm。
4.如权利要求1所述的铝合金制品，其特征在于：所述绝缘层为聚四氟乙烯层、绝缘漆层或绝缘油墨层。
5.如权利要求3或4所述的铝合金制品，其特征在于：所述绝缘层为透明层。
6.如权利要求1所述的铝合金制品，其特征在于：所述防护层的厚度为100~600nm。
7.一种铝合金防腐处理方法，包括如下步骤：
提供铝合金基体；
采用真空镀膜的方式，于该铝合金基体上形成防护层，所述防护层为CrON层、AlON层及TiON层中的任意一种；
于该防护层上依次形成颜色层及绝缘层。
8.如权利要求7所述的铝合金防腐处理方法，其特征在于：形成所述绝缘层的步骤为：选择Si及Al中的任一种为靶材，设置其功率为5~15kW；以氧气为反应气体，氧气的流量为50~150sccm，以氩气为工作气体，氩气流量为100~200sccm，施加于铝合金基体的偏压为-100~-300V，镀膜温度为150~250℃，镀膜时间为60~120min。
9.如权利要求8所述的铝合金防腐处理方法，其特征在于：所述绝缘层为氧化铝层或氧化硅层，其厚度为200~400nm。
10.如权利要求7所述的铝合金防腐处理方法，其特征在于：所述绝缘层为聚四氟乙烯层、绝缘漆层或绝缘油墨层。
11.如权利要求7所述的铝合金防腐处理方法，其特征在于：形成所述防护层的步骤以如下方式进行：选择Cr、Al及Ti中的任一种为靶材，设置其功率为5~15kW；以氮气及氧气为反应气体，氮气的流量为30~60sccm，氧气的流量为40~80sccm，以氩气为工作气体，氩气流量为100~200sccm；施加于铝合金基体的偏压为-100~-300V，镀膜温度为100~250℃，镀膜时间为30~120min。
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