CN102559354A - Water-based glass grinding fluid - Google Patents
Water-based glass grinding fluid Download PDFInfo
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- CN102559354A CN102559354A CN2010106199646A CN201010619964A CN102559354A CN 102559354 A CN102559354 A CN 102559354A CN 2010106199646 A CN2010106199646 A CN 2010106199646A CN 201010619964 A CN201010619964 A CN 201010619964A CN 102559354 A CN102559354 A CN 102559354A
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Abstract
The invention discloses a water-based glass grinding fluid which comprises a brominated alkyl quaternary ammonium salt surfactant, organic alcohol, a corrosion inhibitor and water. The water-based glass grinding fluid has excellent properties of cooling, lubricating, washing, corrosion preventing and the like, and has a better chemical dressing function on a diamond grinding tool; and according to the water-based glass grinding fluid, the grinding precision can be remarkably improved, the service life of the grinding tool is prolonged, and the greasy blockage of the grinding tool is effectively prevented. The water-based glass grinding fluid has good glass grinding efficiency, excellent chemical stability and low cost, has no harm to the health, does not pollute the environment, is convenient for use, and can be widely applied to the grinding and cleaning processes of various kinds of glass.
Description
Technical field
The present invention relates to a kind of grinding fluid in the glass grinding technology, relate to a kind of water base glass grinding liquid particularly.
Background technology
In common glass grinding technology, often adopt diamond super hard abrasive, diamond lap pad or diamond lap dish to carry out quick grinding, precise finiss and the operation such as precise polished of glass.Diamond is the process that diamond abrasive tool cuts at glass surface to the grinding process of glass.Can produce a large amount of glass powders and heat during glass grinding; Continue to carry out and guarantee grinding accuracy for what guarantee the glass grinding process; Must use suitable grinding fluid to remove the glass powder that produces in the glass grinding process; And the heat that produces in the absorption grinding process, glass and diamond abrasive tool are cooled off.In order to improve the smooth finish of glass surface after the grinding, the frictional force the when grinding fluid of being selected for use must effectively reduce glass grinding between diamond abrasive tool and glass, thereby require grinding fluid to have certain lubricity.
In glass grinding technology, use by formulated oiliness or emulsifying property grinding fluids such as MO, yellow soda ash, Sodium Nitrites for a long time always.Along with the development of glass grinding technology, that improves grinding accuracy and grinding tool work-ing life requires increasingly highly, and oiliness or emulsifying property grinding fluid can not satisfy processing requirement.Secondly, oiliness or emulsifying property grinding fluid rot easily, and corrode equipment for grinding easily; The nitrite that contains is harmful, and easy polluted water; Oleaginousness is high, is unfavorable for environment protection.The water base glass grinding liquid of some synthetic has appearred in recent years; Formulated by multiple water-soluble additive; Have stable performance, life cycle length and low cost and other advantages; But the grinding efficiency when most water base glass grinding liquid can not obviously improve glass grinding, perhaps oilness and/or non-corrosibility are not enough.
Water base glass grinding liquid mainly is made up of tensio-active agent, lubricant and water etc., adds additives such as antiseptic-germicide, inhibiter, acid-base modifier and organic solvent sometimes.
Tensio-active agent such as polyoxyethylene glycol, Soxylat A 25-7 and polyacrylate etc.; Can reduce the surface tension of water base glass grinding liquid; Improve the wetting ability of water base glass grinding liquid, help improving the cleansing power of water base glass grinding liquid glass powder to glass surface; Reduction diamond abrasive tool that simultaneously can be to a certain extent and the frictional force between glass.Some special tensio-active agent shows the chemical dressing effect good to the Buddha's warrior attendant stone mill.
The effect of lubricant is on the surface that is adsorbed on diamond abrasive tool and glass, is forming lubricant film between diamond abrasive tool and glass and between diamond abrasive tool and the abrasive dust, reduces these frictional force at the interface, makes glass surface smooth finish improve.Lubricant commonly used generally is the long-chain organic cpds that has hydroxyl, carboxyl and amide group, like high fatty alcohol, higher fatty acid, SEPIGEL 305 etc.
Heat that produces in the grinding process and glass chip are taken away in the effect that water in the water base glass grinding liquid mainly plays cooling and cleans.
Proposed among the JP2001303027 to be used for the abrading glass base material by containing silicon grain, containing the fluorochemicals of hydroxyl and the water base glass grinding liquid that water is formed.
Propose the water base glass grinding liquid formed by abrasive mixt, amino acid, at least a aminated compounds that is selected from trimeric cyanamide, hydrazine or its salt, quadrol and the thanomin of oxidation-containing cerium among JP10183104 and the JP3856513, be used for the abrading glass base material.
Proposed by colloidal silica among the US2008006057, contained the water base glass grinding liquid that sulfonic group compound, pH regulator agent and water are formed, be used for abrading glass base material and alumina silicate glass etc.
Water base glass grinding liquid among the JP2001303027 contains silicon grain, and chemicalstability is relatively poor; Be used for the abrading glass base material, but its grinding speed to glass baseplate is lower.
Water base glass grinding liquid among JP10183104 and the JP3856513 is used for the abrading glass base material.Its glass grinding rapid speed, the smooth finish of glass surface is better after the grinding, but its chemicalstability is relatively poor, and insalubrity, be unfavorable for environment protection.
Water base glass grinding liquid among the US2008006057 contains colloidal silica particle, and chemicalstability is relatively poor; Be used for abrading glass hard disk and alumina silicate glass etc., but its grinding speed to glass baseplate is lower.
Summary of the invention
The objective of the invention is in order to overcome the existing glass grinding fluid not enough to the grinding efficiency of glass; Can't improve the work-ing life of grinding accuracy and grinding tool; Perhaps can't satisfy the quick grinding and the technological operation requirement such as precise polished of glass simultaneously, provide a kind of and have excellent chemicalstability, have good glass grinding efficient, can obviously improve the work-ing life of grinding accuracy and grinding tool and can satisfy the quick grinding, precise finiss of glass simultaneously and the water base glass grinding liquid that technological operation such as precise polished requires.
The invention discloses a kind of water base glass grinding liquid.This water base glass grinding liquid comprises the bromination quaternary ammonium alkyl salt surfactant of (a) 0.1~20wt%, (b) organic alcohol of 0.1~30wt%, (c) inhibiter of 0.01~20wt%, (d) water of 30~99.5wt%; Do not comprise abrasive grains.This water base glass grinding liquid has performances such as excellent cooling, lubricated, washing, protection against corrosion; Diamond abrasive tool there is good chemical dressing effect; Can obviously improve the work-ing life of grinding accuracy and grinding tool, and prevent that effectively grinding tool from " greasy plug " phenomenon taking place; Have good glass grinding efficient, excellent chemicalstability is harmless to the health, free from environmental pollution, and cost is low, and is easy to use, can be widely used in the ground finish and the cleaning of various glass.
Among the present invention; Described bromination quaternary ammonium alkyl salt surfactant has good chemical dressing effect to diamond abrasive tool; Can obviously improve the work-ing life of grinding accuracy and grinding tool, prevent that effectively grinding tool from " greasy plug " phenomenon taking place, and the grinding efficiency when obviously improving glass grinding.Described bromination quaternary ammonium alkyl salt surfactant has excellent antibacterial ability, can prevent to produce bacterium in the water base glass grinding liquid, improves the storage and the work-ing life of water base glass grinding liquid; Need not to add in addition other antiseptic-germicide.Described bromination quaternary ammonium alkyl salt surfactant is preferable is selected from 4 bromide, phenyl trimethylammonium bromide, benzyltrimethylammonium bromide, Trimethyllaurylammonium bromide, dodecyl dimethyl benzyl ammonium bromide, TTAB, tetradecyl dimethyl benzyl ammonium, cetyl trimethylammonium bromide, octadecyl trimethylammonium bromide, didodecyldimethylammbromide bromide, trioctylphosphine methyl brometo de amonio, rosinyl TTAB, hexadecyl glucosides Trimethyllaurylammonium bromide, two octyl glucosides two (Trimethyllaurylammonium bromide), two dodecyl glucosides three (cetyl trimethylammonium bromide), 3; 3 '-hexanedioyl oxygen base-2; 2 '-in dihydroxyl-dipropyl-two (the dodecyl dimethyl brometo de amonios), myristamide dodecyl dimethyl brometo de amonio, T 46155 dodecyl dimethyl brometo de amonio (number-average molecular weight is 5000), T 46155 hexadecyldimethyl benzyl ammonium brometo de amonio (number-average molecular weight is 10000), two (2-11 (17) alkyl-1-methane amide ethyl imidazol(e) quinoline) hexanediamine trimethylammonium bromide and two (2-undecyl imidazole quinoline) tetramethylenediamine trimethylammonium bromide one or more, better be selected from benzyltrimethylammonium bromide, Trimethyllaurylammonium bromide, dodecyl dimethyl benzyl ammonium bromide, TTAB, tetradecyl dimethyl benzyl ammonium, cetyl trimethylammonium bromide, didodecyldimethylammbromide bromide, myristamide dodecyl dimethyl brometo de amonio, T 46155 dodecyl dimethyl brometo de amonio (number-average molecular weight is 5000) and two (2-undecyl imidazole quinoline) tetramethylenediamine trimethylammonium bromide one or more.That its content is preferable is 0.1~20wt%, and that better is 0.5~10wt%.
Among the present invention, the frictional force when described organic alcohol can obviously reduce glass grinding between diamond abrasive tool and glass is improved the smooth finish of glass surface after the grinding; Diamond abrasive tool there is good chemical dressing effect, the grinding efficiency when improving glass grinding.Described organic alcohol is preferable is selected from terepthaloyl moietie, Diethylene Glycol, triethylene glycol, glycol ether, three diglycol ethylenes, six diglycol ethylenes, Tri Ethyleneglycol, Ucar 35, dipropylene glycol, DPG, three contract in dipropylene glycol, glycol monomethyl phenyl ether, Ucar 35 list phenyl ether, USP Kosher, propanetriol-diglycidyl-ether, T 46155 USP Kosher ether (number-average molecular weight is 10000), polyoxypropylene USP Kosher ether (number-average molecular weight is 5000), mono laurate glycerine ester, Stearinsaeure glycerine ester and the single oleic acid glycerine ester one or more of dipropylene glycol, six that contract, better three diglycol ethylenes, six diglycol ethylenes, DPG, three contract in dipropylene glycol, USP Kosher, propanetriol-diglycidyl-ether, T 46155 USP Kosher ether (number-average molecular weight is 10000) and the polyoxypropylene USP Kosher ether (number-average molecular weight is 5000) one or more of dipropylene glycol, six that contract that are selected from.That its content is preferable is 0.1~30wt%, and that better is 0.5~20wt%.
Among the present invention, described inhibiter can effectively suppress corrosion or the damage of glass grinding liquid to equipment for grinding.Described inhibiter is preferable is selected from boric acid, borate, boric acid ester, Hydrocerol A, Citrate trianion, citrate, azole, phosphonic acid based and the polyacrylic inhibiter one or more; Better boric acid, phenylo boric acid, 2-carboxyl phenylo boric acid, 2-methylol phenylo boric acid, tetramethyl-ammonium borate, tetraethyl-ammonium borate, boric acid Monoethanolamine MEA BASF salt, triethanolamine borate salt, boric acid glycol ether amine salt, boric acid Monoethanolamine MEA BASF ester, triethanolamine borate ester, boric acid diglycolamine ester, boric acid Yi Bingchunan ester, boric acid Mono Methyl Ethanol Amine ester, boric acid methyldiethanolamine ester, duplex pyrocatechol boric acid ester, Hydrocerol A, 2-Hydroxycitric acid, Hydrocerol A bay alcohol ester, Hydrocerol A Monoethanolamine MEA BASF ester, Hydrocerol A triethanolamine ester, Hydrocerol A diglycolamine ester, Hydrocerol A tetramethyl-ammonium, Hydrocerol A tetraethyl ammonium, Hydrocerol A Monoethanolamine MEA BASF salt, Hydrocerol A triethanolamine salt, Hydrocerol A glycol ether amine salt, benzotriazole, methyl benzotriazazole, benzotriazole diethanolamine salt, 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, the 3-amino-1 of being selected from; 2; 4-triazole, 4-amino-1; 2; 4-triazole, 3-amino-5-sulfydryl-1; 2; 4-triazole, 5-amino-tetrazole, 1-hydroxy ethylene-1; 1-di 2 ethylhexyl phosphonic acid, ATMP, 2-phosphonic acids butane-1; 2, one or more in the ROHM Monoethanolamine MEA BASF salt (number-average molecular weight is 40000) of polymethyl acrylic acid of 4-tricarboxylic acid, ethylenediamine tetramethylene phosphonic acid, T 46155 modification (number-average molecular weight is 10000) and T 46155 modification.That the content of described inhibiter is preferable is 0.01~20wt%, and that better is 0.1~10wt%.
Among the present invention, described water is preferable is selected from tap water (through filtering), deionized water, zero(ppm) water and the ultrapure water one or more.That the content of described water is preferable is 30~99.5wt%, and that better is 50~99wt%.
Water base glass grinding liquid among the present invention does not contain abrasive grains.
Among the present invention, described water base glass grinding liquid can also further comprise one or more in polar organic solvent, organic amine, inorganic salt, antiseptic-germicide and other tensio-active agent.What the content of described polar organic solvent was preferable is≤10wt% to comprise 0wt%; What the content of described organic amine was preferable is≤10wt% to comprise 0wt%; What the content of described inorganic salt was preferable is≤10wt% to comprise 0wt%; What the content of described skimmer was preferable is≤10wt%, but does not comprise 0wt%; What the content of described other tensio-active agent was preferable is≤10wt%, comprises 0wt%, and that better is 0.05~5.0wt%.
Among the present invention, described polar organic solvent can improve the wetting ability of water base glass grinding liquid to glass surface and glass chip, and improves the cleansing power of water base glass grinding liquid to glass chip.Described polar organic solvent is preferable is selected from sulfoxide, sulfone, imidazolidone and the alkylene glycol monoalkyl ether one or more; Better DMSO 99.8MIN., diethyl sulfoxide, the first and second basic sulfoxides, methyl sulfone, ethyl sulfone, tetramethylene sulfone, the 2-imidazolidone, 1 of being selected from; 3-dimethyl--2-imidazolidone, 1, one or more in 3-diethylammonium-2-imidazolidone, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol monobutyl ether, dipropylene glycol monomethyl ether, dipropylene glycol list ether and the dipropylene glycol monobutyl ether.
Among the present invention, described organic amine can improve the infiltration and the wetting ability of water base glass grinding liquid, thereby improves the cleansing power of water base glass grinding liquid to glass chip; And it has good chemical dressing effect, the grinding efficiency in the time of can improving glass grinding to diamond abrasive tool.Described organic amine is preferable is selected from AEEA, hexanediamine, cyclohexanediamine, Monoethanolamine MEA BASF, trolamine, diglycolamine, Yi Bingchunan, Mono Methyl Ethanol Amine, methyldiethanolamine, dimethylethanolamine, piperazine and N, one or more in the N-diethylammonium piperazine.
Among the present invention, described inorganic salt have good chemical dressing effect, the grinding efficiency in the time of can improving glass grinding to diamond abrasive tool; Some inorganic salt shows good corrosion-resisting function to equipment for grinding simultaneously.Described inorganic salt are preferable is selected from sodium-chlor, Repone K, SODIUMNITRATE, saltpetre, Sodium Bromide, Potassium Bromide, brometo de amonio, potassium bromate, yellow soda ash, sodium hydrogencarbonate, salt of wormwood, saleratus, Sodium orthomolybdate, Potassium orthomolybdate, sodium wolframate and the potassium wolframate one or more.
Among the present invention; Described skimmer is preferable is selected from modification Soxylat A 25-7, modification polyethenoxy ether and the modified polyorganosiloxane one or more, one or more in the better ZGK 5 (number-average molecular weight is 8000) that is selected from T 46155 USP Kosher ether (number-average molecular weight is 10000), polyoxypropylene USP Kosher ether (number-average molecular weight is 5000), polyoxyethylene polyoxypropylene tetramethylolmethane ether (number-average molecular weight is 20000), T 46155 modification, the dimethione (number-average molecular weight is 10000) of T 46155 modification.
Among the present invention, described other tensio-active agent can improve the infiltration and the wetting ability of water base glass grinding liquid, improves the cleansing power of water base glass grinding liquid to glass chip; Frictional force in the time of can reducing glass grinding between diamond abrasive tool and glass is improved the smooth finish of glass surface after the grinding.Described other tensio-active agent is preferable is selected from polyoxyethylene glycol, Vinylpyrrolidone polymer and the Soxylat A 25-7 one or more, better polyoxyethylene glycol and/or the Soxylat A 25-7 of being selected from.What the number-average molecular weight of described tensio-active agent was preferable is 500~100000, and better is 1000~50000.
Agents useful for same of the present invention and raw material are all commercially available to be got.
Water base glass grinding liquid of the present invention can be made by the simple mixing of top said component.
The method of use of water base glass grinding liquid of the present invention can be with reference to following steps: glass grinding amount size is as required confirmed water base glass grinding liquid stoste is diluted with water to certain proportion (1%~50%); With the diluent of water base glass grinding liquid with the flow velocity stream of 100~300ml/min on the diamond lap pad or diamond lap dish of rotation, through apply suitable pressure at glass surface glass is carried out grinding.
Positive progressive effect of the present invention is:
1. water base glass grinding liquid of the present invention has performances such as excellent cooling, lubricated, washing, protection against corrosion.
2. the bromination quaternary ammonium alkyl salt surfactant that contains in the water base glass grinding liquid of the present invention has good chemical dressing effect to diamond abrasive tool; The work-ing life of grinding efficiency, grinding accuracy and grinding tool in the time of can obviously improving glass grinding, and prevent that effectively grinding tool from " greasy plug " phenomenon taking place.
3. the bromination quaternary ammonium alkyl salt surfactant that contains in the water base glass grinding liquid of the present invention has excellent antibacterial ability, can prevent to produce bacterium in the water base glass grinding liquid, improves the storage and the work-ing life of water base glass grinding liquid; Need not to add in addition other antiseptic-germicide.
4. the frictional force when the organic alcohol that contains in the water base glass grinding liquid of the present invention can obviously reduce glass grinding between diamond abrasive tool and glass is improved the smooth finish of glass surface after the grinding; Diamond abrasive tool there is good chemical dressing effect, the grinding efficiency when improving glass grinding.
5. the inhibiter that contains in the water base glass grinding liquid of the present invention can effectively suppress corrosion or the damage of glass grinding liquid to equipment for grinding.
6. do not contain abrasive grains in the water base glass grinding liquid of the present invention, have excellent chemicalstability.
7. the organic amine that can contain in the water base glass grinding liquid of the present invention can improve the infiltration and the wetting ability of water base glass grinding liquid, thereby improves the cleansing power of water base glass grinding liquid to glass chip.
8. water base glass grinding liquid of the present invention is harmless to the health, free from environmental pollution.
9. water base glass grinding liquid cost of the present invention is low and easy to use, can on-the-spot prepare, and also can process earlier and use after liquid concentrator is diluted with water to 1%~50% diluent then.
10. water base glass grinding liquid of the present invention has the technological operation window of broad, can under different grinding pressure, use, and can satisfy quick grinding, precise finiss and the technological operation requirement such as precise polished of glass simultaneously.
Embodiment
Further specify beneficial effect of the present invention through the preferred effect embodiment of the present invention below, but therefore do not limit the present invention among the described scope of embodiments.Among the following embodiment, per-cent is mass percent.
Effect embodiment contrasts water base glass grinding liquid 1 '~3 ' and water base glass grinding liquid 1~10 of the present invention
Table 1 has provided the prescription of water base glass grinding liquid 1 '~3 ' of contrast and cleansing composition 1~10 of the present invention, presses listed component and content thereof in the table 1, simply mixes, and promptly makes each water base glass grinding liquid.
The component and the content of water base glass grinding liquid 1 '~3 ' of table 1 contrast and water base glass grinding liquid 1~10 of the present invention
Among the present invention; Utilize the method for water base glass grinding liquid grinding glasswork following: the water diluting soln of the water base glass grinding liquid 1 '~3 ' of the contrast in the table 1 and the water diluting soln of water base glass grinding liquid 1~10 of the present invention to be used for the grinding simple glass, to test surface smoothness situation after its grinding speed and the grinding.Testing method and condition: at first with 3M
TMTrizact 661XA (the diamond particle diameter is 9 μ m) diamond lap pad (diameter is 180mm) is fixed on the rotatable grinding flat plate; Then 4 * 4cm simple glass is fixed on movably on the disk; Disk is placed upside down in glass is clipped between disk and the diamond lap pad; The flow velocity of controlling the water diluting soln of water base glass grinding liquid is 200ml/min, and adjusting is 1~7psi through the pressure that disk is added in glass surface, and the rotating speed of adjusting diamond lap pad is 30~70rpm; Simple glass was ground 1~5 minute; Through the water washing after drying, the variation in thickness of utilizing thickness tester to measure simple glass grinding front and back calculates the grinding speed of glass then, and with the surface smoothness after the microscopic examination glass grinding.The result is as shown in table 2.
The water diluting soln of the water base glass grinding liquid 1 '~3 ' of table 2 contrast and the water diluting soln of water base glass grinding liquid of the present invention are to the grinding speed of glass and the glass surface smooth finish after the grinding
Can find out from table 2; Compare with the water diluting soln of water base glass grinding liquid 1 '~3 '; The water diluting soln of water base glass grinding liquid of the present invention shows higher glass grinding speed and good glass surface smooth finish; The technological operation window of broad can use under different grinding pressure, can satisfy quick grinding, precise finiss and the technological operation requirement such as precise polished of glass simultaneously.
Claims (15)
1. a water base glass grinding liquid comprises: bromination quaternary ammonium alkyl salt surfactant, organic alcohol, inhibiter and water.
2. water base according to claim 1 glass grinding liquid; It is characterized in that; The content of said bromination quaternary ammonium alkyl salt surfactant is 0.1~20wt%; The content of said organic alcohol is 0.1~30wt%, and the content of said inhibiter is 0.01~20wt%, and the content of said water is 30~99.5wt%.
3. like the said water base glass grinding liquid of claim 2; It is characterized in that the content of said bromination quaternary ammonium alkyl salt surfactant is 0.5~10wt%, the content of said organic alcohol is 0.5~20wt%; The content of said inhibiter is 0.1~10wt%, and the content of said water is 50~99wt%.
4. like each said water base glass grinding liquid of claim 1~3; It is characterized in that; Described bromination quaternary ammonium alkyl salt surfactant is selected from 4 bromide, phenyl trimethylammonium bromide, benzyltrimethylammonium bromide, Trimethyllaurylammonium bromide, dodecyl dimethyl benzyl ammonium bromide, TTAB, tetradecyl dimethyl benzyl ammonium, cetyl trimethylammonium bromide, octadecyl trimethylammonium bromide, didodecyldimethylammbromide bromide, trioctylphosphine methyl brometo de amonio, rosinyl TTAB, hexadecyl glucosides Trimethyllaurylammonium bromide, two octyl glucosides two (Trimethyllaurylammonium bromide), two dodecyl glucosides three (cetyl trimethylammonium bromide), 3; 3 '-hexanedioyl oxygen base-2,2 '-dihydroxyl-dipropyl-two (dodecyl dimethyl brometo de amonios), myristamide dodecyl dimethyl brometo de amonio, number-average molecular weight are that 5000 T 46155 dodecyl dimethyl brometo de amonio, number-average molecular weight are one or more in 10000 T 46155 hexadecyldimethyl benzyl ammonium brometo de amonio, two (2-11 (17) alkyl-1-methane amide ethyl imidazol(e) quinoline) hexanediamine trimethylammonium bromide and two (2-undecyl imidazole quinoline) the tetramethylenediamine trimethylammonium bromide.
5. like the said water base glass grinding liquid of claim 4; It is characterized in that it is in 5000 T 46155 dodecyl dimethyl brometo de amonio and two (2-undecyl imidazole quinoline) the tetramethylenediamine trimethylammonium bromide one or more that described bromination quaternary ammonium alkyl salt surfactant is selected from benzyltrimethylammonium bromide, Trimethyllaurylammonium bromide, dodecyl dimethyl benzyl ammonium bromide, TTAB, tetradecyl dimethyl benzyl ammonium, cetyl trimethylammonium bromide, didodecyldimethylammbromide bromide, myristamide dodecyl dimethyl brometo de amonio, number-average molecular weight.
6. like each said water base glass grinding liquid of claim 1~3; It is characterized in that it is that 10000 T 46155 USP Kosher ether, number-average molecular weight are one or more in 5000 polyoxypropylene USP Kosher ether, mono laurate glycerine ester, Stearinsaeure glycerine ester and the single oleic acid glycerine ester that described organic alcohol is selected from terepthaloyl moietie, Diethylene Glycol, triethylene glycol, glycol ether, three diglycol ethylenes, six diglycol ethylenes, Tri Ethyleneglycol, Ucar 35, dipropylene glycol, DPG, three the contract dipropylene glycol, glycol monomethyl phenyl ether, Ucar 35 list phenyl ether, USP Kosher, propanetriol-diglycidyl-ether, number-average molecular weight of dipropylene glycol, six that contract.
7. like the said water base glass grinding liquid of claim 6; It is characterized in that it is that 10000 T 46155 USP Kosher ether, number-average molecular weight are one or more in 5000 the polyoxypropylene USP Kosher ether that described organic alcohol is selected from three diglycol ethylenes, six diglycol ethylenes, DPG, three the contract dipropylene glycol, USP Kosher, propanetriol-diglycidyl-ether, number-average molecular weight of dipropylene glycol, six that contract.
8. like each said water base glass grinding liquid of claim 1~3; It is characterized in that described inhibiter is selected from one or more in boric acid, borate, boric acid ester, Hydrocerol A, Citrate trianion, citrate, azole, phosphonic acid based and the polyacrylic inhibiter.
9. like the said water base glass grinding liquid of claim 8; It is characterized in that; Described inhibiter is selected from boric acid, phenylo boric acid, 2-carboxyl phenylo boric acid, 2-methylol phenylo boric acid, tetramethyl-ammonium borate, tetraethyl-ammonium borate, boric acid Monoethanolamine MEA BASF salt, triethanolamine borate salt, boric acid glycol ether amine salt, boric acid Monoethanolamine MEA BASF ester, triethanolamine borate ester, boric acid diglycolamine ester, boric acid Yi Bingchunan ester, boric acid Mono Methyl Ethanol Amine ester, boric acid methyldiethanolamine ester, duplex pyrocatechol boric acid ester, Hydrocerol A, 2-Hydroxycitric acid, Hydrocerol A bay alcohol ester, Hydrocerol A Monoethanolamine MEA BASF ester, Hydrocerol A triethanolamine ester, Hydrocerol A diglycolamine ester, Hydrocerol A tetramethyl-ammonium, Hydrocerol A tetraethyl ammonium, Hydrocerol A Monoethanolamine MEA BASF salt, Hydrocerol A triethanolamine salt, Hydrocerol A glycol ether amine salt, benzotriazole, methyl benzotriazazole, benzotriazole diethanolamine salt, 2-mercaptobenzimidazole, 2-mercaptobenzothiazole, 2-mercaptobenzoxazole, 3-amino-1; 2; 4-triazole, 4-amino-1; 2; 4-triazole, 3-amino-5-sulfydryl-1; 2; 4-triazole, 5-amino-tetrazole, 1-hydroxy ethylene-1; 1-di 2 ethylhexyl phosphonic acid, ATMP, 2-phosphonic acids butane-1,2,4-tricarboxylic acid, ethylenediamine tetramethylene phosphonic acid, number-average molecular weight are that polymethyl acrylic acid and the number-average molecular weight of 10000 T 46155 modification is one or more in the ROHM Monoethanolamine MEA BASF salt of 40000 T 46155 modification.
10. like each said water base glass grinding liquid of claim 1~3, it is characterized in that said water base glass grinding liquid does not contain abrasive grains.
11., it is characterized in that described water base glass grinding liquid further comprises one or more in polar organic solvent, organic amine, inorganic salt, skimmer and other tensio-active agent like each said water base glass grinding liquid of claim 1~3.
12., it is characterized in that the content of described polar organic solvent is≤10wt%, comprises 0wt% like the said water base glass grinding liquid of claim 11; The content of described organic amine is≤10wt%, comprises 0wt%; The content of described inorganic salt is≤10wt%, but does not comprise 0wt%; The content of described skimmer is≤10wt%, but does not comprise 0wt%; The content of described other tensio-active agent is≤10wt%, comprises 0wt%.
13., it is characterized in that described polar organic solvent is selected from one or more in sulfoxide, sulfone, imidazolidone and the alkylene glycol monoalkyl ether like the said water base glass grinding liquid of claim 11; Described organic amine is selected from AEEA, hexanediamine, cyclohexanediamine, Monoethanolamine MEA BASF, trolamine, diglycolamine, Yi Bingchunan, Mono Methyl Ethanol Amine, methyldiethanolamine, dimethylethanolamine, piperazine and N, one or more in the N-diethylammonium piperazine; Described inorganic salt are selected from one or more in sodium-chlor, Repone K, SODIUMNITRATE, saltpetre, Sodium Bromide, Potassium Bromide, brometo de amonio, potassium bromate, yellow soda ash, sodium hydrogencarbonate, salt of wormwood, saleratus, Sodium orthomolybdate, Potassium orthomolybdate, sodium wolframate and the potassium wolframate; Described skimmer is selected from one or more in modification Soxylat A 25-7, modification polyethenoxy ether and the modified polyorganosiloxane; Described other tensio-active agent is selected from one or more in polyoxyethylene glycol, Vinylpyrrolidone polymer and the Soxylat A 25-7.
14., it is characterized in that the number-average molecular weight of described tensio-active agent is 500~100000 like the said water base glass grinding liquid of claim 11.
15., it is characterized in that the number-average molecular weight of described tensio-active agent is 1000~50000 like the said water base glass grinding liquid of claim 14.
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CN102977987A (en) * | 2012-12-04 | 2013-03-20 | 天津大学 | Special grinding fluid for ductile regime lapping of optical glass and preparation method of special grinding fluid |
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CN103275803A (en) * | 2013-06-09 | 2013-09-04 | 河南师范大学 | Glass grinding fluid and preparation method thereof |
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CN106350192A (en) * | 2016-08-31 | 2017-01-25 | 湖南金化科技集团有限公司 | Extreme pressure resistant water-based cutting fluid |
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Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11181468A (en) * | 1997-12-18 | 1999-07-06 | Neos Co Ltd | Water soluble processing oil agent |
CN101633831A (en) * | 2009-08-26 | 2010-01-27 | 广州机械科学研究院 | Optical product grinding fluid and preparation method and application thereof |
CN101665664A (en) * | 2008-09-05 | 2010-03-10 | 安集微电子(上海)有限公司 | Quaternary ammonium salt cationic surfactant and application of chemical mechanical polishing solution |
CN102102008A (en) * | 2009-12-18 | 2011-06-22 | 安集微电子(上海)有限公司 | Water-based glass grinding fluid and using method thereof |
-
2010
- 2010-12-30 CN CN2010106199646A patent/CN102559354A/en active Pending
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH11181468A (en) * | 1997-12-18 | 1999-07-06 | Neos Co Ltd | Water soluble processing oil agent |
CN101665664A (en) * | 2008-09-05 | 2010-03-10 | 安集微电子(上海)有限公司 | Quaternary ammonium salt cationic surfactant and application of chemical mechanical polishing solution |
CN101633831A (en) * | 2009-08-26 | 2010-01-27 | 广州机械科学研究院 | Optical product grinding fluid and preparation method and application thereof |
CN102102008A (en) * | 2009-12-18 | 2011-06-22 | 安集微电子(上海)有限公司 | Water-based glass grinding fluid and using method thereof |
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CN104450132A (en) * | 2014-10-31 | 2015-03-25 | 江南大学 | Special line-cutting fluid for diamond and preparation method of line-cutting fluid |
CN105542928A (en) * | 2015-12-18 | 2016-05-04 | 常熟市劲力工具有限公司 | Grinding fluid for double-angle milling cutter |
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CN106350192A (en) * | 2016-08-31 | 2017-01-25 | 湖南金化科技集团有限公司 | Extreme pressure resistant water-based cutting fluid |
CN106675749A (en) * | 2016-11-02 | 2017-05-17 | 清华大学天津高端装备研究院 | Fully-synthetic water-based glass grinding fluid and preparation method thereof |
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CN107057802A (en) * | 2017-04-28 | 2017-08-18 | 泰伦特生物工程股份有限公司 | A kind of glass grinding fluid containing bola type surfactants and preparation method and application method |
CN107057802B (en) * | 2017-04-28 | 2020-12-25 | 泰伦特生物工程股份有限公司 | Glass grinding fluid containing bola type surfactant, preparation method and use method |
CN107841371A (en) * | 2017-11-07 | 2018-03-27 | 北京工业大学 | A kind of preparation method of fully synthetic crystal cutting fluid |
CN108098460A (en) * | 2017-12-14 | 2018-06-01 | 湖南大学 | A kind of chemical modification liquid and the fine grinding processing method of chemical machinery |
CN108675654A (en) * | 2018-04-20 | 2018-10-19 | 吴礼高 | A kind of restorative procedure of the anti-roll bending of freezing-microtome glass |
CN110724068A (en) * | 2018-07-16 | 2020-01-24 | 中国石油化工股份有限公司 | Process for producing high-purity acrylonitrile |
CN112662460A (en) * | 2020-12-29 | 2021-04-16 | 江苏奥首材料科技有限公司 | Wafer cutting fluid containing natural plant extracts |
CN114317075A (en) * | 2021-12-03 | 2022-04-12 | 广东红日星实业有限公司 | Cutting fluid and preparation method and application thereof |
CN114317075B (en) * | 2021-12-03 | 2023-04-11 | 广东红日星实业有限公司 | Cutting fluid and preparation method and application thereof |
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