CN102490408A - Temperable three-silver low radiation coated glass and production technology thereof - Google Patents
Temperable three-silver low radiation coated glass and production technology thereof Download PDFInfo
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- CN102490408A CN102490408A CN2011103816681A CN201110381668A CN102490408A CN 102490408 A CN102490408 A CN 102490408A CN 2011103816681 A CN2011103816681 A CN 2011103816681A CN 201110381668 A CN201110381668 A CN 201110381668A CN 102490408 A CN102490408 A CN 102490408A
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- 239000011521 glass Substances 0.000 title claims abstract description 86
- 229910052709 silver Inorganic materials 0.000 title claims abstract description 56
- 239000004332 silver Substances 0.000 title claims abstract description 56
- 230000005855 radiation Effects 0.000 title claims abstract description 35
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 238000005516 engineering process Methods 0.000 title claims abstract description 10
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims abstract description 30
- 239000000758 substrate Substances 0.000 claims abstract description 15
- 239000010410 layer Substances 0.000 claims description 164
- 239000011241 protective layer Substances 0.000 claims description 49
- 238000004544 sputter deposition Methods 0.000 claims description 30
- 238000005496 tempering Methods 0.000 claims description 25
- 239000000463 material Substances 0.000 claims description 18
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 16
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 11
- 229910052710 silicon Inorganic materials 0.000 claims description 11
- 239000010703 silicon Substances 0.000 claims description 11
- 238000006243 chemical reaction Methods 0.000 claims description 9
- 230000009977 dual effect Effects 0.000 claims description 9
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 8
- 229910020286 SiOxNy Inorganic materials 0.000 claims description 6
- 239000012300 argon atmosphere Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- PWKWDCOTNGQLID-UHFFFAOYSA-N [N].[Ar] Chemical compound [N].[Ar] PWKWDCOTNGQLID-UHFFFAOYSA-N 0.000 claims description 5
- VVTSZOCINPYFDP-UHFFFAOYSA-N [O].[Ar] Chemical compound [O].[Ar] VVTSZOCINPYFDP-UHFFFAOYSA-N 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 150000001875 compounds Chemical class 0.000 claims description 5
- 238000005755 formation reaction Methods 0.000 claims description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 4
- 229910001120 nichrome Inorganic materials 0.000 claims description 4
- 239000012299 nitrogen atmosphere Substances 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
- 239000011701 zinc Substances 0.000 claims description 4
- GWVKDXOHXJEUCP-UHFFFAOYSA-N [N].[O].[Ar] Chemical compound [N].[O].[Ar] GWVKDXOHXJEUCP-UHFFFAOYSA-N 0.000 claims description 3
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 2
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 229910052681 coesite Inorganic materials 0.000 claims description 2
- 229910052906 cristobalite Inorganic materials 0.000 claims description 2
- 238000001035 drying Methods 0.000 claims description 2
- 229910044991 metal oxide Inorganic materials 0.000 claims description 2
- 150000004706 metal oxides Chemical class 0.000 claims description 2
- 229910052759 nickel Inorganic materials 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 150000004767 nitrides Chemical class 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 229910052682 stishovite Inorganic materials 0.000 claims description 2
- 230000007704 transition Effects 0.000 claims description 2
- 229910052905 tridymite Inorganic materials 0.000 claims description 2
- 229910052726 zirconium Inorganic materials 0.000 claims description 2
- 238000012545 processing Methods 0.000 abstract description 8
- 230000003287 optical effect Effects 0.000 abstract description 5
- 239000011248 coating agent Substances 0.000 abstract description 3
- 238000000576 coating method Methods 0.000 abstract description 3
- 238000009413 insulation Methods 0.000 abstract description 3
- 230000003647 oxidation Effects 0.000 description 15
- 238000007254 oxidation reaction Methods 0.000 description 15
- 229910018487 Ni—Cr Inorganic materials 0.000 description 14
- 238000004062 sedimentation Methods 0.000 description 11
- 229910004286 SiNxOy Inorganic materials 0.000 description 10
- 238000002310 reflectometry Methods 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 239000000047 product Substances 0.000 description 7
- 239000012298 atmosphere Substances 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical group N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 239000005344 low-emissivity glass Substances 0.000 description 3
- KYKLWYKWCAYAJY-UHFFFAOYSA-N oxotin;zinc Chemical group [Zn].[Sn]=O KYKLWYKWCAYAJY-UHFFFAOYSA-N 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000011787 zinc oxide Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 241000227425 Pieris rapae crucivora Species 0.000 description 2
- 229910000611 Zinc aluminium Inorganic materials 0.000 description 2
- HXFVOUUOTHJFPX-UHFFFAOYSA-N alumane;zinc Chemical compound [AlH3].[Zn] HXFVOUUOTHJFPX-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 238000013003 hot bending Methods 0.000 description 2
- 239000002346 layers by function Substances 0.000 description 2
- 238000004321 preservation Methods 0.000 description 2
- 239000005336 safety glass Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000000903 blocking effect Effects 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000011900 installation process Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- -1 nitride compound Chemical class 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 230000002194 synthesizing effect Effects 0.000 description 1
- GZCWPZJOEIAXRU-UHFFFAOYSA-N tin zinc Chemical compound [Zn].[Sn] GZCWPZJOEIAXRU-UHFFFAOYSA-N 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
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Abstract
The invention relates to temperable three-silver low radiation coated glass. The coated glass which comprises a glass body and a coating film is characterized in that: the glass body is a substrate; and the film structure of the coating film comprises, from inside to outside, a first dielectric combination layer, a first block protection layer, a first dielectric layer, a first silver layer, a second block protection layer, a first interval dielectric combination layer, a third block protection layer, a second dielectric layer, a second silver layer, a fourth block protection layer, a second interval dielectric combination layer, a fifth block protection layer, a third dielectric layer, a third silver layer, a sixth block protection layer and a second dielectric combination layer. The temperable three-silver low radiation coated glass disclosed in the invention adopts the unique film structure and a unique production technology, so a problem that middle and low radiation coated glass in the prior art cannot be well tempered is solved, and the coated glass which has the advantages of high visible light transmissivity, good photo-thermal ratio and optical stability, and good thermal insulation can satisfy various requirements of subsequent processing.
Description
Technical field
The present invention relates to a kind of automobile-used and for building coated glass, but specifically be a kind of tempering three-silver low radiation coated glass and production technology thereof.
Background technology
Low radiation coated glass (claiming LOW-E glass again) is that to plate the film that multiple layer metal or other compounds form at glass surface be product, and low radiation coated glass is a kind ofly can let outdoor solar energy, visible light transmissive as simple glass; Again can be as ir reflector; Especially the centering far infrared has very high reflectivity, and the coated glass of new generation that can object secondary radiation heat reflection be gone back is used to control light; Regulate, improve environment, help energy savings and heat.Three-silver low radiation glass is as the high-end product in the low radiation coated glass; By nearly three layers silver layer and multiple layer metal oxidation or nitride compound are formed; Have higher visible light transmissivity, very high infrared reflection rate, can obtain splendid heat insulation and preservation effect.But in traditional three-silver low radiation glass processing, can only adopt the first tempering processing mode of plated film again, cause traditional three-silver low radiation can not be generalized to vehicle glass, can not large tracts of land be generalized to the residential houses glass.Because the traditional processing mode can not realize the curved arc coating film on glass, and modern architecture and windshield extensively adopt curved tempering and hot bending glass, then traditional off-line low radiation coated glass can not bend follow-up hot-working processing such as tempering and hot bending.And conventional glass processing mode efficient is low, and the plated film charging ratio of safety glass has only about 75% usually, just can only bring into play 75% of plated film line production capacity; Safety glass needs artificial loading, unloading sheet, needs the enough operative employees of configuration, has increased the labor wage expenditure; The speed of artificial loading, unloading sheet has restricted the plated film walking speed again simultaneously, thereby causes plated film line operational efficiency lower, and various sticking patch quantity are many in the filming process; The sticking patch lamp that occurs in the sticking patch that occurs of plated film and hollow operation for example, transportation and installation process all will be included the production order once more in and arrange production; From cutting to plated film; The sticking patch cycle is long, and particularly plated film is many because of the plated film product category, needs usually to wait for the long period.The glass cost of transportation of conventional industries is also high; Because of must synthesizing double glazing, uses the off-line low radiation coated glass; The double glazing of 6mm low emissivity glass+12mm air layer+6mm low emissivity glass for example, its volume is the twice of monolithic glass, the transportation of double glazing has increased the transportation expenditure.For these reasons, but to develop a kind of novel tempering three-silver low radiation glass imperative.
Summary of the invention
Technical purpose of the present invention is to overcome the problem that exists in the prior art; Low radiation coated glass to traditional improves; Solve that the traditional low emissivity glass silver thickness and the number of plies increase that the back visible light transmissive is lower, appearance color presents interference colour, color select limited, can't following process etc. problem, but provide a kind of visible light transmissivity high, have the tempering three-silver low radiation coated glass and a production technology thereof of good light ratio of specific heat and optical stability.
Technical scheme of the present invention is:
But a kind of tempering three-silver low radiation coated glass comprises glass body and plated film, it is characterized in that, is substrate with said glass substrate, and said plated film film layer structure from inside to outside is:
First dielectric combination layer, first block protective layer, first dielectric layer, first silver layer, second block protective layer, first be dielectric combination layer, the 3rd block protective layer, second dielectric layer, second silver layer, the 4th block protective layer, the second interval dielectric combination layer, the 5th block protective layer, the 3rd dielectric layer, the 3rd silver layer, the 6th block protective layer, second dielectric combination layer at interval.
Further technical scheme also comprises:
Said first dielectric combination layer, second dielectric combination layer are the silicon base compound material.
As preferably, said silicon base compound material is Si
3N
4, SiO
2Or SiOxNy.
Said first dielectric layer, second dielectric layer, the 3rd dielectric layer are the metallic zinc compound-material.
As preferably, said metallic zinc compound-material is a kind of among ZnO, the AZO.
Said first at interval dielectric combination layer, second at interval dielectric combination layer be SSTOx, CrNx, CdO, MnO
2, InSbO, TxO, SnO
2, ZnO, ZnSnOx, ZnSnPbOx, ZrO2, AZO, Si
3N
4, SiO2, SiOxNy, BiO
2, Al
2O
3, Nb
2O
5, Ta
2O
5, In
2O
3, MoO
3One or more formations in the material.
Said the first, second, third, fourth, the 5th, the 6th block protective layer is metal, metal oxide or metal nitride materials, as preferably, can select a kind of among Ti, NiCr, Ni, Cr, Nb, Zr, NiCrOx, NiCrNx, the CrNx for use.
But a kind of production technology of tempering three-silver low radiation coated glass adopts the vacuum magnetic-control sputtering plated film, it is characterized in that, may further comprise the steps:
Step 1, with behind the glass substrate cleaning-drying, place the vacuum sputtering district, be carried out at vacuum transition;
Step 2, be substrate with said glass substrate; Dielectric combination layer, the 5th block protective layer, the 3rd layer of dielectric layer, the 3rd silver layer, the 6th block protective layer, second dielectric make up layer formation product at interval to deposit first dielectric combination layer, first block protective layer, first dielectric layer, first silver layer, second block protective layer, second wall dielectric combination layer, the 3rd block protective layer, second dielectric layer, second silver layer, the 4th block protective layer, second successively.
Further, said first, second, third dielectric layer, first, second dielectric combination layer, first, second interval dielectric combination layer all adopt the mode of dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering in argon oxygen, argon nitrogen or argon oxygen nitrogen atmosphere, to deposit; Said first, second silver layer, first to the 6th block protective layer all adopt the mode of planar cathode, d.c. sputtering to be deposited in argon oxygen, argon nitrogen or the straight argon atmosphere and deposit.
But the beneficial effect of tempering three-silver low radiation coated glass provided by the present invention and production technology thereof is:
1, traditional with the low radiation coated glass of Ag as the infrared external reflection rete; The basic reason that can not carry out subsequent heat treatment is that the Ag layer is easy to be destroyed in heating process, as rete face resistance significantly raise, face vaporific, the rete face that comes off that is white in color is the retaining layer; The Ag layer is oxidized, and fuzzy vaporific, the full plate pin hole shape small particles of face sheet etc. are the ruined phenomenon of Ag layer, and sometimes even the mistake function that can remove infrared external reflection, therefore traditional three-silver low radiation coated glass can not carry out subsequent heat treatment.The present invention is not destroyed in heat treatment process with protection Ag layer through before and after silver layer, increasing block protective layer and increasing resistant to elevated temperatures dielectric layer at the glass bottom, satisfies the demand of strange land processing;
2, the present invention adopts the matting layer of metallic zinc oxide as the Ag layer, and the Ag layer is grown better, and film forming is more even, smooth, reduces the influence to membrane uniformity of Ag layer island structure, can protect the Ag layer better;
3, the high hardness material that employing of the present invention and glass material are close is as the dielectric layer combination layer; Not only can between glass substrate and function Ag layer, play good bonding effect; And can offset the internal stress of composite film, particularly scratch resistance, wear-resisting and anticorrosive aspect effect more obvious;
4, glass rete of the present invention rete crystallization once more in the tempering process makes that the light transmittance of rete is higher, radiance is lower;
But tempering three-silver low radiation coated glass of the present invention have very high visible light transmissivity, extremely low radiance, good photo-thermal than and optical stability, weatherability; Have splendid ultraviolet blocking effect, and can design multiple color, satisfy different clients' demand; Can extensively be generalized to vehicle glass and building glass market; And can obtain splendid heat insulation and preservation effect, and can realize strange land processing, satisfy the various requirement of following process.
Description of drawings
Fig. 1 is the structural representation of product of the present invention;
Fig. 2 is the schematic flow sheet of technology of the present invention.
The specific embodiment
In order to illustrate technical scheme of the present invention and technical purpose, the present invention is done further introduction below in conjunction with the accompanying drawing and the specific embodiment.
As shown in the figure, but the structure of tempering three-silver low radiation coated glass of the present invention is:
Glass substrate/first dielectric combination layer/first block protective layer/first dielectric layer/first silver layer/second block protective layer/first be dielectric combination layer/the 3rd block protective layer/second dielectric layer, second silver layer/the 4th block protective layer/second interval dielectric combination layer/the 5th block protective layer/the 3rd dielectric layer/the 3rd silver layer/the 6th block protective layer/second dielectric combination layer at interval.
The thickness of said first, second dielectric combination layer is 10-80nm;
The thickness of said first, second interval dielectric combination layer is: 10-200nm;
The thickness of said the first, second, third, fourth, the 5th, the 6th block protective layer is: 0.3-5nm;
Said first, second, third dielectric layer thickness is: 5-10nm;
The thickness of said first, second, third silver layer is: 5-40nm.
Embodiment 1:
Present embodiment film material structure is: glass substrate/SiNxOy/NiCrOx/AZO/Ag/NiCrOx/ZnSnOx/NiCrOx/AZO/Ag/NiCrOx/ ZnSnOx/NiCrOx/AZO/Ag/NiCrOx layer/Si
3N
4
First dielectric combination layer is silicon oxynitride (SiNxOy), and thicknesses of layers is: 46nm;
First block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
First dielectric layer is AZO, and thicknesses of layers is: 6nm;
The first silver layer thicknesses of layers is: 13.9nm;
Second block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The first interval dielectric combination layer is zinc-tin oxide (ZnSnOx), and thicknesses of layers is: 69.7nm;
The 3rd block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
Second dielectric layer is AZO, and thicknesses of layers is: 6nm;
The second silver layer thicknesses of layers is: 15.0nm;
The 4th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The second interval dielectric combination layer is zinc-tin oxide (ZnSnOx), and thicknesses of layers is: 58.6nm;
The 5th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The 3rd dielectric layer is AZO, and thicknesses of layers is: 6nm;
The 3rd silver layer thicknesses of layers is: 9.4nm;
The 6th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
Second dielectric combination layer is silicon nitride (Si
3N
4) thicknesses of layers is respectively: 32.2nm;
Silicon nitride (Si in the said structure
3N
4) layer use sial (92: 8) target, adopting dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon nitrogen atmosphere, power is 20-80kw, supply frequency is 20-40kHz;
Silicon oxynitride (SiOxNy) layer uses sial (92: 8) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon nitrogen oxygen atmosphere, and power is 20-80kw, and supply frequency is 20-40kHz;
The AZO layer uses ceramic zinc-aluminium target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon oxygen atmosphere, and power is 5-15kw, and supply frequency is 20-40kHz;
Zinc-tin oxide (ZnSnOx) layer uses Zinc-tin alloy (50: 50) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, oxygen atmosphere, and power is 10-70kw, and supply frequency is 20-40kHz;
Oxidation nickel chromium triangle (NiCrOx) layer uses the nichrome target, adopts planar cathode, magnetically controlled DC sputtering mode sputtering sedimentation in the straight argon atmosphere, and power is 2-10kw;
Functional layer Ag layer uses silver-colored target, adopts planar cathode, magnetically controlled DC sputtering mode sputtering sedimentation in the straight argon atmosphere, and power is 2-10kw;
As shown in Figure 2, rete plated film successively carries out on-line measurement to product parameters, product inspection then, packaging product afterwards after accomplishing.
Use glass (behind the tempering) optical property that above-mentioned technological parameter makes (glass is 6mm common white glass) as follows:
A, glass visible light transmissivity T=62.6%;
Visible light glass reflectivity=10.2%;
Visible light glass chromaticity coordinates a* value=-1.8;
Visible light glass chromaticity coordinates b* value=-5.0;
Visible light face reflectivity=6.5%;
Visible light face chromaticity coordinates a*=-2.2;
Visible light face chromaticity coordinates b*=-3.6;
Glass radiance E=0.014.
B, use the present invention to process the double glazing of 6mm+12A+6mm (rete outdoor inner face) structure, following according to the data of ISO10292 standard test:
Visible light transmissivity T=57.8%;
Visible light glass reflectivity (out)=12.4%;
Visible light glass reflectivity (in)=8.6%;
Solar energy transmitance T=17%;
Solar reflectance (out)=53%;
G-value＝0.24；
Shading coefficient SC=0.275;
U value=1.51W/m2K;
Photo-thermal compares LSG=2.40.
Embodiment 2:
Present embodiment film material structure is: glass substrate/SiNxOy/NiCrOx/AZO/Ag/NiCrOx/SiNxOy/NiCrOx/AZO/Ag/NiCrOx/ SiNxOy/NiCrOx/AZO/Ag/NiCrOx/SiNxOy/Si
3N
4Said combination layer can be the individual layer stack combinations that is made up of separately multiple material.
Wherein, first dielectric combination layer is silicon oxynitride (SiNxOy), and the rete degree is: 48.0nm;
First block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
First dielectric layer is AZO, and thicknesses of layers is: 8nm;
The first silver layer thicknesses of layers is: 13.5nm;
Second block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The first interval dielectric combination layer is silicon oxynitride (SiNxOy), and thicknesses of layers is: 68.2nm;
The 3rd block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
Second dielectric layer is AZO, and thicknesses of layers is: 8nm;
The second silver layer thicknesses of layers is: 15.2nm;
The 4th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The second interval dielectric combination layer is silicon oxynitride (SiNxOy), and thicknesses of layers is: 58.8nm;
The 5th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
The 3rd dielectric layer is AZO, and thicknesses of layers is: 8nm;
The 3rd silver layer thicknesses of layers is: 9.8nm;
The 6th block protective layer is oxidation nickel chromium triangle (NiCrOx), and thicknesses of layers is: 0.3nm;
Second dielectric combination layer is silicon oxynitride (SiNxOy) and silicon nitride (Si
3N
4) two-layer rete formation, thicknesses of layers is respectively: 16.6nm, 18.2nm.
Silicon nitride (Si in the said structure
3N
4) layer use sial (92: 8) target, adopting dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, nitrogen atmosphere, power is 20-80kw, supply frequency is 20-40kHz;
Silicon oxynitride (SiOxNy) layer uses sial (92: 8) target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, nitrogen, oxygen atmosphere, and power is 20-80kw, and supply frequency is 20-40kHz;
The AZO layer uses ceramic zinc-aluminium target, adopts dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering mode sputtering sedimentation in argon, oxygen atmosphere, and power is 5-15kw, and supply frequency is 20-40kHz;
Oxidation nickel chromium triangle (NiCrOx) layer uses the nichrome target, adopts planar cathode, magnetically controlled DC sputtering mode sputtering sedimentation in the straight argon atmosphere, and power is 2-10kw;
Functional layer Ag layer adopts planar cathode, magnetically controlled DC sputtering mode sputtering sedimentation in the straight argon atmosphere for using silver-colored target, and power is 2-10kw;
Use glass (behind the tempering) optical property that above-mentioned technological parameter makes (glass is 6mm common white glass) as follows:
A, glass visible light transmissivity T=56.4%;
Visible light glass reflectivity=11.4%;
Visible light glass chromaticity coordinates a* value=-2.8;
Visible light glass chromaticity coordinates b* value=-7.0;
Visible light face reflectivity=7.8%;
Visible light face chromaticity coordinates a*=1.2;
Visible light face chromaticity coordinates b*=-3.3;
Glass radiance E=0.015.
B, use the present invention to process the double glazing of 6mm+12A+6mm (rete outdoor inner face) structure, following according to the data of ISO10292 standard test:
Visible light transmissivity T=52.1%;
Visible light glass reflectivity (out)=13.4%;
Visible light glass reflectivity (in)=9.6%;
Solar energy transmitance T=14%;
Solar reflectance (out)=55%;
G-value＝0.22；
Shading coefficient SC=0.25;
U value=1.51W/m2K;
Photo-thermal compares LSG=2.37.
Below disclose the present invention with preferred embodiment, so it is not in order to restriction the present invention, and all employings are equal to replacement or the technical scheme that obtained of equivalent transformation mode, all drop within protection scope of the present invention.
Claims (10)
1. but a tempering three-silver low radiation coated glass comprises glass body and plated film, it is characterized in that, is substrate with said glass substrate, and said plated film film layer structure from inside to outside is:
First dielectric combination layer, first block protective layer, first dielectric layer, first silver layer, second block protective layer, first be dielectric combination layer, the 3rd block protective layer, second dielectric layer, second silver layer, the 4th block protective layer, the second interval dielectric combination layer, the 5th block protective layer, the 3rd dielectric layer, the 3rd silver layer, the 6th block protective layer, second dielectric combination layer at interval.
2. but a kind of tempering three-silver low radiation coated glass according to claim 1 is characterized in that, said first dielectric combination layer, second dielectric combination layer are the silicon base compound material.
3. but a kind of tempering three-silver low radiation coated glass according to claim 2, it is characterized in that: said silicon base compound material is Si
3N
4, SiO
2Or SiOxNy.
4. but a kind of tempering three-silver low radiation coated glass according to claim 1 is characterized in that said first dielectric layer, second dielectric layer, the 3rd dielectric layer are the metallic zinc compound-material.
5. but a kind of tempering three-silver low radiation coated glass according to claim 4 is characterized in that,
Said metallic zinc compound-material is a kind of among ZnO, the AZO.
6. but a kind of tempering three-silver low radiation coated glass according to claim 1 is characterized in that, said first at interval dielectric combination layer, second at interval dielectric combination layer be SSTOx, CrNx, CdO, MnO
2, InSbO, TxO, SnO
2, ZnO, ZnSnOx, ZnSnPbOx, ZrO2, AZO, Si
3N
4, SiO2, SiOxNy, BiO
2, Al
2O
3, Nb
2O
5, Ta
2O
5, In
2O
3, MoO
3One or more formations in the material.
7. but a kind of tempering three-silver low radiation coated glass according to claim 1 is characterized in that said the first, second, third, fourth, the 5th, the 6th block protective layer is metal, metal oxide or metal nitride materials.
8. but a kind of tempering three-silver low radiation coated glass according to claim 7 is characterized in that,
The material of said the first, second, third, fourth, the 5th, the 6th block protective layer is a kind of among Ti, NiCr, Ni, Cr, Nb, Zr, NiCrOx, NiCrNx, the CrNx.
9. but the production technology of a tempering three-silver low radiation coated glass adopts the vacuum magnetic-control sputtering plated film, it is characterized in that, may further comprise the steps:
Step 1, with behind the glass substrate cleaning-drying, place the vacuum sputtering district, be carried out at vacuum transition;
Step 2, be substrate with said glass substrate; Dielectric combination layer, the 5th block protective layer, the 3rd layer of dielectric layer, the 3rd silver layer, the 6th block protective layer, second dielectric make up layer formation product at interval to deposit first dielectric combination layer, first block protective layer, first dielectric layer, first silver layer, second block protective layer, second wall dielectric combination layer, the 3rd block protective layer, second dielectric layer, second silver layer, the 4th block protective layer, second successively.
10. but the manufacturing approach of a kind of tempering three-silver low radiation coated glass according to claim 9 is characterized in that:
Said first, second, third dielectric layer, first, second dielectric combination layer, first, second interval dielectric combination layer all adopt the mode of dual rotary negative electrode, intermediate frequency reaction magnetocontrol sputtering in argon oxygen, argon nitrogen or argon oxygen nitrogen atmosphere, to deposit; Said first, second silver layer, first to the 6th block protective layer all adopt the mode of planar cathode, d.c. sputtering to be deposited in argon oxygen, argon nitrogen or the straight argon atmosphere and deposit.
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