CN105152549A - Coated glass and preparation method thereof - Google Patents

Abstract

The invention discloses coated glass and a preparation method thereof, the coated glass comprises a glass substrate and a film layer formed on the glass substrate, and the film layer comprises the following components in sequence from the glass substrate to the outside: the infrared reflection coating comprises a first composite dielectric layer, a first infrared reflection layer, a first barrier layer, a second composite dielectric layer, a second infrared reflection layer, a second barrier layer, a third composite dielectric layer, a third infrared reflection layer, a third barrier layer and a fourth composite dielectric layer, wherein the first barrier layer, the second barrier layer and the third barrier layer are prepared by sputtering a metal oxide ceramic target by a direct-current power supply, and the metal oxide ceramic target is selected from AZO and TiO_xOr NiCrO_xAnd is a rotating target. The invention avoids the problem of the change of the absorption characteristic of the barrier layer before and after toughening, and adopts a direct current power supply to sputter the rotating target, thereby avoiding the problems of arc striking or slag falling of the ceramic target. Therefore, the coated glass has high visible light transmittance and good color stability before and after tempering.

Description

A kind of coated glass and preparation method thereof

technical field

The invention relates to the technical field of coated glass, in particular to a thermally stable coated glass using a novel barrier technology and a preparation method thereof.

Background technique

Silver-based low-emissivity (Low-E) coated glass is made by depositing multi-layer metal films and dielectric films on the surface of float glass. By properly selecting materials and optimizing the film structure, good optical performance can be obtained , Coating products with electrical and thermal properties. Low-E coated glass has become one of the most widely used materials in building energy-saving products because of its excellent far-infrared reflection characteristics. The triple-silver low-emissivity coated glass is the Low-E product with the highest technical content in this field at present, and its film system includes more than a dozen film layers such as dielectric layer, barrier layer and metal layer.

However, the existing triple-silver low-emissivity coated glass has a low transmittance, and the products before and after tempering cannot be used together. This is because the existing Low-E film systems mostly use metal materials as barrier layers, such as NiCr, Ti and Cr, etc., to protect the silver layer from the subsequent sputtering process and prevent it from being damaged during the tempering process. However, the metal film absorbs light, so it is difficult to improve the transmittance of triple silver Low-E coated glass. In addition, during the tempering process, the metal material acts as a sacrificial layer, absorbs oxygen, and turns part or all of it into a metal oxide. After tempering, the transmittance of Low-E products increases significantly, and the color changes greatly. Therefore, the coating film obtained before and after tempering Glass products cannot be mixed.

The utility model patent with the authorized announcement number CN202448400U introduces the use of a composite barrier layer structure - a metal barrier layer/AZO barrier layer, to improve the visible light transmittance of low-emissivity coated glass with a toughened dual-functional layer structure, and to reduce the color after tempering Variety. Although a certain effect has been achieved, the two barrier layers mean that the production line needs to be equipped with an additional sputtering chamber, which increases the capital investment of equipment. In addition, the CN202448400U patent adopts intermediate frequency power supply and rotating cathode sputtering to deposit AZO. There is a problem in this production method: after the AZO target is installed and used for a period of time, the surface of the AZO target is prone to nodules and discharges, and even slag will appear, which seriously affects the target. The use power and life of the material sometimes force the production line to return air in advance to clean up the residue and reduce the production efficiency.

Contents of the invention

The invention provides a heat-stabilized coated glass with novel barrier technology and a preparation method thereof.

According to the first aspect of the present invention, the present invention provides a kind of coated glass, this coated glass comprises glass substrate and the film layer that is formed on this glass substrate, and this film layer outwardly from above-mentioned glass substrate is: first composite dielectric layer , the first infrared reflective layer, the first barrier layer, the second composite dielectric layer, the second infrared reflective layer, the second barrier layer, the third composite dielectric layer, the third infrared reflective layer, the third barrier layer and the fourth composite dielectric layer, wherein the first barrier layer, the second barrier layer and the third barrier layer are prepared by sputtering a metal oxide ceramic target with a DC power supply, and the metal oxide ceramic target is selected from AZO, TiO _x or NiCrO _x , and for the rotating target.

As a preferred solution of the present invention, the thicknesses of the first barrier layer, the second barrier layer and the third barrier layer are each 0.5-5 nm.

As a preferred solution of the present invention, the above-mentioned first infrared reflective layer, second infrared reflective layer and third infrared reflective layer are silver or silver alloy.

As a preferred version of the present invention, the above-mentioned first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are silver alloys, the main component of the above-mentioned silver alloys is silver, and includes gold, titanium, palladium, copper and niobium at least one element, wherein the content of at least one element among the above-mentioned gold, titanium, palladium, copper and niobium accounts for 0.3-10 at.% of the total amount of the silver alloy.

As a preferred solution of the present invention, the thicknesses of the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are each 5-15 nm.

As a preferred solution of the present invention, the above-mentioned first composite dielectric layer, second composite dielectric layer, third composite dielectric layer and fourth composite dielectric layer are made of Si ₃ N ₄ , SnO ₂ , Zn ₂ SnO ₄ , Nb ₂ O ₅ and Two or more combined film layers in ZnAlO _x .

As a preferred solution of the present invention, the thicknesses of the first composite dielectric layer, the second composite dielectric layer, the third composite dielectric layer and the fourth composite dielectric layer are each 10-85 nm in thickness.

As a preferred solution of the present invention, the above-mentioned coated glass further includes a protective layer outside the fourth composite dielectric layer, the protective layer is at least one of TiO ₂ , Si ₃ N ₄ , SiN _x O _y or ZrO ₂ , with a thickness of 5-5. 30nm.

According to a second aspect of the present invention, the present invention provides a method for preparing the coated glass of the first aspect, the method comprising: forming film layers in the following order outward from the glass substrate on a glass substrate by sputtering: A composite medium layer, a first infrared reflective layer, a first barrier layer, a second composite medium layer, a second infrared reflective layer, a second barrier layer, a third composite medium layer, a third infrared reflective layer, a third barrier layer and The fourth composite dielectric layer, the above method uses a direct current power source to sputter a metal oxide ceramic target to prepare the above first barrier layer, second barrier layer and third barrier layer, and the above metal oxide ceramic target is selected from AZO, TiO _x or NiCrO _x , and is a rotating target.

As a preferred solution of the present invention, if AZO is selected as the target material of the barrier layer, pure argon is used as the sputtering gas, and no reaction gas is added; if _TiOx or _{NiCrOx is} selected as the target material of the barrier layer, argon gas is used Mixed gas with oxygen is used as the sputtering gas, wherein the volume content of oxygen is less than or equal to 10%, preferably less than or equal to 7%.

As a preferred solution of the present invention, the thicknesses of the first barrier layer, the second barrier layer and the third barrier layer are each 0.5-5 nm.

As a preferred solution of the present invention, the above method adopts a DC power supply and a planar cathode to form the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer by sputtering deposition in an argon atmosphere.

As a preferred solution of the present invention, the thicknesses of the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are each 5-15 nm.

As a preferred solution of the present invention, the above-mentioned first infrared reflective layer, second infrared reflective layer and third infrared reflective layer are silver or silver alloy.

As a preferred version of the present invention, the above-mentioned first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are silver alloys, the main component of the above-mentioned silver alloys is silver, and includes gold, titanium, palladium, copper and niobium at least one element, wherein the content of at least one element among the above-mentioned gold, titanium, palladium, copper and niobium accounts for 0.3-10 at.% of the total amount of the silver alloy.

As a preferred solution of the present invention, the above method adopts intermediate frequency AC voltage and double rotating cathodes to form the first composite dielectric layer, the second composite dielectric layer, the third composite dielectric layer and the fourth composite dielectric layer by sputtering deposition under argon nitrogen or argon oxygen mixed atmosphere. Composite medium layer.

As a preferred solution of the present invention, the thicknesses of the first composite dielectric layer, the second composite dielectric layer, the third composite dielectric layer and the fourth composite dielectric layer are each 10-85 nm in thickness.

As a preferred solution of the present invention, the above-mentioned first composite dielectric layer, second composite dielectric layer, third composite dielectric layer and fourth composite dielectric layer are made of Si ₃ N ₄ , SnO ₂ , Zn ₂ SnO ₄ , Nb ₂ O ₅ and Two or more combined film layers in ZnAlO _x .

As a preferred solution of the present invention, the above method further includes forming a protective layer by sputtering outside the fourth composite dielectric layer, the protective layer is at least one of TiO ₂ , Si ₃ N ₄ , SiN _x O _y or ZrO ₂ , The thickness is 5-30nm.

As a preferred solution of the present invention, the above-mentioned protective layer is formed by sputtering deposition under a mixed atmosphere of argon-nitrogen or argon-oxygen by using intermediate frequency AC voltage and double rotating cathodes.

Each barrier layer of the coated glass of the present invention has only one layer respectively, and is prepared by sputtering a metal oxide ceramic target (rotary target) with a DC power supply, wherein the metal oxide ceramic target is selected from one of AZO, TiO _x or NiCrO _x kind. This new barrier technology avoids the problem of changing the absorption properties of the barrier layer before and after tempering, and helps to prepare low-emissivity coated glass with thermal stability. At the same time, this new barrier technology uses a DC power source to sputter the rotating target, avoiding problems such as arcing or slag falling on the ceramic target, and solving the process problems existing in the actual production of the AZO target. In addition, the metal oxide barrier layer prepared by this process has the dual characteristics of metal and dielectric, and the barrier layer itself has very low absorption of visible light, so it can be used as a protective layer of silver layer or silver alloy layer, and as a dielectric layer. Especially in the tempering process, the metal oxide barrier layer has a positive effect on the stability of the film structure and color. Since the metal oxide barrier layer does not undergo obvious optical property changes when heated, it can also act as a barrier to oxygen, which can effectively protect the silver layer from damage.

Therefore, the advantages of the coated glass of the present invention are: (1) the product has a high transmittance, and the visible light transmittance is ≥ 60%; (2) the product has good color stability before and after tempering; (3) the product has excellent moisture resistance.

Description of drawings

Fig. 1 is a schematic structural view of the coated glass of the present invention.

Detailed ways

The present invention will be further described in detail below through specific embodiments in conjunction with the accompanying drawings.

Please refer to Fig. 1, the coated glass of the present invention comprises a glass substrate and a film layer formed on the glass substrate. A barrier layer, a second composite dielectric layer, a second infrared reflective layer, a second barrier layer, a third composite dielectric layer, a third infrared reflective layer, a third barrier layer, a fourth composite dielectric layer, and an optional protective layer.

It should be noted that FIG. 1 is only a schematic structural view of the coated glass, in which each film layer is only schematic, and its actual thickness is not as shown in FIG. 1 .

The key of the present invention is that the first barrier layer, the second barrier layer and the third barrier layer are prepared by sputtering the metal oxide ceramic target with a DC power source, which is a technical means never used in the previous technology. The metal oxide ceramic target in the present invention is selected from AZO, TiO _x or NiCrO _x , and is a rotating target.

Wherein, AZO is aluminum-doped zinc oxide, and the composition of AZO adopted in one embodiment of the present invention is 98wt% ZnO:2wt%Al ₂ O ₃ ; _TiOx is the oxide of titanium, as the sputtering target material, it has sputtering The well-known characteristics in the field of sputtering targets are generally oxides in an incomplete oxidation state, where the value range of x can be in the range of 1.6≤x≤1.9; NiCrO _x is nickel chromium oxide, as a sputtering target, it has The well-known characteristics in the field of sputtering targets are generally oxides in an incomplete oxidation state, where the value of x can be in the range of 0.5≤x≤1.

In the specific manufacturing process of the coated glass of the present invention, if AZO is selected as the target material of the barrier layer, pure argon is used as the sputtering gas without adding reaction gas; if _TiOx or _{NiCrOx is} selected as the target material of the barrier layer , a mixed gas of argon and oxygen is used as the sputtering gas, wherein the volume content of oxygen is less than or equal to 10%, preferably less than or equal to 7%. Sputtering power can be 10-40kw.

The invention avoids the problem of changing the absorption characteristics of the barrier layer before and after tempering by adopting the novel barrier technology of direct current power source sputtering metal oxide ceramic target, and contributes to the preparation of thermally stable low-radiation coated glass. At the same time, this new barrier technology uses a DC power source to sputter the rotating target, avoiding problems such as arcing or slag falling on the ceramic target, and solving the process problems existing in the actual production of the AZO target. In addition, the metal oxide barrier layer prepared by this process has the dual characteristics of metal and dielectric, and the barrier layer itself has very low absorption of visible light, so it can be used as a protective layer of silver layer or silver alloy layer, and as a dielectric layer. Especially in the tempering process, the metal oxide barrier layer has a positive effect on the stability of the film structure and color. Since the metal oxide barrier layer does not undergo obvious optical property changes when heated, it can also act as a barrier to oxygen, which can effectively protect the silver layer from damage.

In one embodiment of the present invention, the thicknesses of the first barrier layer, the second barrier layer and the third barrier layer are respectively controlled at 0.5-5 nm, which can ensure high visible light transmittance of the product, and the barrier effect is intact.

In one embodiment of the present invention, the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are silver or silver alloy. Preferably, the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are silver alloys, the main component of which is silver and includes at least one element of gold, titanium, palladium, copper and niobium , wherein the content of at least one element among the above-mentioned gold, titanium, palladium, copper and niobium accounts for 0.3-10 at.% of the total amount of the silver alloy, wherein at.% means atomic percentage. Compared with the pure silver layer, the silver alloy layer can significantly improve the moisture resistance and water vapor resistance of the silver-based low-emissivity coated glass, prolong the oxidation resistance time of the coated glass, and significantly reduce the silver-based low-emissivity coated glass due to the film layer. White point defects caused by migration and agglomeration of silver atoms.

In one embodiment of the present invention, the thicknesses of the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are respectively 5-15 nm. In a specific manufacturing process, the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer can be formed by sputtering deposition under an argon atmosphere by using a DC power supply and a planar cathode. The power of vacuum magnetron sputtering equipment can be 3-15kw.

In one embodiment of the present invention, the first composite dielectric layer, the second composite dielectric layer, the third composite dielectric layer and the fourth composite dielectric layer are Si ₃ N ₄ , SnO ₂ , Zn ₂ SnO ₄ , Nb ₂ O ₅ and In _ZnAlOx , more than two combined film layers, wherein _ZnAlOx refers to aluminum-doped zinc oxide (Aldoped-ZnO), in one embodiment, ZnAlOx _is specifically ZnO doped with 2wt% Al ₂ O ₃ , namely 2 wt% aluminum doped zinc oxide (2 wt% Aldoped-ZnO). In a preferred embodiment, at least one layer of 2wt% Aldoped-ZnO is included in the first composite dielectric layer, the second composite dielectric layer and the third composite dielectric layer, and this layer is in contact with the Ag film and is located under the silver film, It is beneficial to the preferred orientation growth of the subsequent silver film, reduces the surface resistance of the silver film, and then reduces the emissivity of the entire silver-based low-emissivity film.

In one embodiment of the present invention, the thicknesses of the first composite dielectric layer, the second composite dielectric layer, the third composite dielectric layer and the fourth composite dielectric layer are each 10-85 nm. Such a composite dielectric layer can effectively block Na ions diffused from the glass substrate during tempering or heat bending. In the specific manufacturing process, the first composite dielectric layer, the second composite dielectric layer, the third composite dielectric layer and the fourth composite dielectric can be formed by sputtering deposition under an argon-nitrogen or argon-oxygen mixed atmosphere by using intermediate frequency AC voltage and double rotating cathodes layer. The power of the vacuum magnetron sputtering equipment can be 10-60kw, and the frequency of the intermediate frequency power supply can be 40kHz.

_In one embodiment _of the present invention, the coated glass further includes a protective layer outside the _fourth composite _dielectric layer, and the protective _{layer is} at least One, the thickness is 5-30nm. This protective layer enhances the scratch resistance and abrasion resistance of the silver-based low-E coated glass. In a specific manufacturing process, the above-mentioned protective layer can be formed by sputtering deposition under a mixed atmosphere of argon nitrogen or argon oxygen by using intermediate frequency AC voltage and double rotating cathodes. The power of the vacuum magnetron sputtering equipment can be 15-50kw, and the frequency of the intermediate frequency power supply can be 40kHz.

The preparation process of the present invention and the performance advantages of the prepared coated glass will be described in detail below through specific examples.

Example 1

The layer structure of this embodiment is Si ₃ N ₄ /Zn ₂ SnO ₄ /ZnAlO _x /Ag alloy/TiO _x /Zn ₂ SnO ₄ /ZnAlO _x /Ag alloy/TiO _x / Zn ₂ SnO ₄ /ZnAlO _x /Ag alloy/TiO _x /Zn ₂ SnO ₄ /Si ₃ N ₄ .

The processing technology and parameters of the above-mentioned film layer are described as follows:

The background vacuum of all chambers is less than 5×10 ^-5 mbar, and the gas pressure during sputtering is about 10 ^-3 mbar.

Sputtering of the first, second, third, and fourth composite dielectric layers: Sputtering deposition under a mixed atmosphere (argon nitrogen or argon oxygen) using medium frequency AC voltage and double rotating cathodes, vacuum magnetron sputtering equipment power 10-60kw, medium frequency The mains frequency is 40kHz. Among them, to prepare the Si ₃ N ₄ film layer, an intermediate frequency power source is used to sputter a double rotating cathode SiAl target (Si:Al=90:10), and the volume ratio of argon to nitrogen is kept at 1.2:1; to prepare the Zn ₂ SnO ₄ film layer, a mixed Gas reactive sputtering ZnSn target (Zn:Sn=50:50), the volume ratio of argon to oxygen is kept at 1:1.2; ZnAlO _x film layer is prepared, and ZnAl target is sputtered by AC cathode reactive sputtering (Zn:Al=98:2) , the volume ratio of argon to oxygen is kept at 1.3:1.

Sputtering of the first, second and third infrared reflective layers: DC power supply and planar cathode are used for sputtering deposition in a pure argon atmosphere, and the power of the vacuum magnetron sputtering equipment is 3-15kw. A silver alloy is used, the main component of which is silver and includes 0.3 at.% gold.

Sputtering of the first, second and third barrier layers: prepared by sputtering metal oxide ceramic targets (rotary targets) with a DC power supply, the metal oxide ceramic targets are TiO _x (1.6≤x≤1.9), and the sputtering power is 10-40kw . The sputtering gas is a mixed gas of argon and oxygen, the amount of oxygen is low, and the volume ratio of argon to oxygen is kept at 15:1.

Table 1 shows the film layer structure of this embodiment and its material and thickness.

Film layer structure and film thickness of table 1 embodiment 1

Table 2 shows the color parameter values of this embodiment before and after tempering, that is, the characterization of optical properties.

The optical property of table 2 embodiment 1

Note: Tvis represents the visible light transmittance; a*(T), b*(T) represent the a* and b* values in the transmitted color respectively; Rg represents the reflectance of the glass surface, a*(Rg), b*(Rg ) respectively represent the a* and b* values in the reflection color of the glass surface; △Eab represents the color difference before and after tempering, and the formula is:

From the results in Table 2 above, it can be seen that the coated glass of Example 1 has a relatively high visible light transmittance, Tvis=64% (before steel), and has good color stability before and after tempering, ΔEab<1.5.

Example 2

The film layer structure of this example is Si ₃ N ₄ /Zn ₂ SnO ₄ /ZnAlO _x /Ag alloy/AZO/Zn ₂ SnO ₄ /ZnAlO _x /Ag alloy/AZO/Zn ₂ SnO from the glass (6mm) to the outside ₄ /ZnAlO _x /Ag alloy/AZO/Zn ₂ SnO ₄ /Si ₃ N ₄ .

The processing technology and parameters of the above-mentioned film layer are described as follows:

The background vacuum of all chambers is less than 5×10 ^-5 mbar, and the gas pressure during sputtering is about 10 ^-3 mbar.

Sputtering of the first, second, third, and fourth composite dielectric layers: using medium-frequency AC voltage plus double rotating cathodes in a mixed atmosphere (argon nitrogen or argon oxygen) for reactive sputtering deposition, the power of the vacuum magnetron sputtering equipment is 10-60kw, The intermediate frequency power supply frequency is 40kHz. Among them, to prepare the Si ₃ N ₄ film layer, an intermediate frequency power source is used to sputter a double rotating cathode SiAl target (Si:Al=90:10), and the volume ratio of argon to nitrogen is kept at 1.2:1; to prepare the Zn ₂ SnO ₄ film layer, a mixed Gas reactive sputtering ZnSn (Zn:Sn=50:50), the volume ratio of argon and oxygen is kept at 1:1.2; ZnAlO _x film layer is prepared, and the ZnAl target is sputtered by AC cathode reactive sputtering (Zn:Al=98:2), Its argon-oxygen volume ratio is maintained at 1.3:1.

Sputtering of the first, second and third infrared reflective layers: DC power supply and planar cathode are used for sputtering deposition in a pure argon atmosphere, and the power of the vacuum magnetron sputtering equipment is 3-15kw. A silver alloy is used, the main component of which is silver and includes 5 at. % of titanium, palladium and copper.

Sputtering of the first, second and third barrier layers: prepared by sputtering a metal oxide ceramic target (rotary target) with a DC power supply. The metal oxide ceramic target is selected from AZO (98wt% ZnO: 2wt% Al ₂ O ₃ ), 10-40kw. The sputtering gas was pure argon.

Table 3 shows the film layer structure of this embodiment and its material and thickness.

Film layer structure and film thickness of table 3 embodiment 2

Table 4 shows the color parameter values of this embodiment before and after tempering, that is, the characterization of optical properties.

The optical performance of table 4 embodiment 2

From the results in Table 4 above, it can be seen that the visible light transmittance of the coated glass in Example 2 reaches 70.6% (before steel), ΔEab<1.5 before and after tempering, and the color stability of the product is good.

Example 3

The film layer structure of this embodiment is Si ₃ N ₄ /Zn ₂ SnO ₄ /ZnAlO _x /Ag alloy/NiCrO _x /Zn ₂ SnO ₄ /ZnAlO _x /Ag alloy/NiCrO _x /Zn from the glass (6mm) to the outside ₂ SnO ₄ /ZnAlO _x /Ag alloy/NiCrO _x /Zn ₂ SnO ₄ /Si ₃ N ₄ .

The processing technology and parameters of the above-mentioned film layer are described as follows:

The background vacuum of all chambers is less than 5×10 ^-5 mbar, and the gas pressure during sputtering is about 10 ^-3 mbar.

Sputtering of the first, second, third, and fourth composite dielectric layers: Sputtering deposition under a mixed atmosphere (argon nitrogen or argon oxygen) using medium frequency AC voltage and double rotating cathodes, vacuum magnetron sputtering equipment power 10-60kw, medium frequency The mains frequency is 40kHz. Among them, to prepare the Si ₃ N ₄ film layer, an intermediate frequency power source is used to sputter a double rotating cathode SiAl target (Si:Al=90:10), and the volume ratio of argon to nitrogen is kept at 1.2:1; to prepare the Zn ₂ SnO ₄ film layer, a mixed Gas reactive sputtering ZnSn target (Zn:Sn=50:50), the volume ratio of argon to oxygen is kept at 1:1.2; ZnAlO _x film layer is prepared, and ZnAl target is sputtered by AC cathode reactive sputtering (Zn:Al=98:2) , the volume ratio of argon to oxygen is kept at 1.3:1.

Sputtering of the first, second and third infrared reflective layers: DC power supply and planar cathode are used for sputtering deposition in a pure argon atmosphere, and the power of the vacuum magnetron sputtering equipment is 3-15kw. A silver alloy is used, the main component of which is silver and includes 10 at.% of titanium, palladium, copper and niobium.

Sputtering of the first, second, and third barrier layers: It is prepared by sputtering metal oxide ceramic targets (rotary targets) with a DC power supply. The metal oxide ceramic targets are NiCrO _x (0.5≤x≤1), and the sputtering power is 10-40kw . The sputtering gas is a mixed gas of argon and oxygen, the amount of oxygen is low, and the volume ratio of argon to oxygen is kept at 100:9.

Table 5 shows the film layer structure of this embodiment and its material and thickness.

Film layer structure and film thickness of table 5 embodiment 3

Table 6 shows the color parameter values of this embodiment before and after tempering, that is, the characterization of optical properties.

The optical performance of table 6 embodiment 3

From the results in Table 6 above, it can be seen that the visible light transmittance of the coated glass in Example 3 reaches 67% (before steel), ΔEab<1.5 before and after tempering, and the color stability of the product is good.

The above content is a further detailed description of the present invention in conjunction with specific embodiments, and it cannot be assumed that the specific implementation of the present invention is limited to these descriptions. Those of ordinary skill in the technical field to which the present invention belongs can also make some simple deduction or replacement without departing from the concept of the present invention.

Claims (10)

1. a kind of coated glass, it is characterized in that, described coated glass comprises glass substrate and the film layer that is formed on described glass substrate, and described film layer outwards from described glass substrate successively is: the first composite medium layer, The first infrared reflection layer, the first blocking layer, the second composite dielectric layer, the second infrared reflection layer, the second blocking layer, the third composite dielectric layer, the third infrared reflection layer, the third blocking layer and the fourth composite dielectric layer , wherein the first barrier layer, the second barrier layer and the third barrier layer are prepared by sputtering a metal oxide ceramic target with a DC power supply, and the metal oxide ceramic target is selected from AZO, TiO _x or NiCrO _x , and is a rotating target. 2 . The coated glass according to claim 1 , wherein the thicknesses of the first barrier layer, the second barrier layer and the third barrier layer are each 0.5-5 nm. 3. The coated glass according to claim 1, wherein the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are silver or silver alloy; Preferably, the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are silver alloys, and the main component of the silver alloy is silver, and includes at least one of gold, titanium, palladium, copper and niobium. An element, wherein the content of at least one element among gold, titanium, palladium, copper and niobium accounts for 0.3-10 at.% of the total amount of the silver alloy; Preferably, the thicknesses of the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are respectively 5-15 nm. 4. The coated glass according to claim 1, characterized in that, the first composite dielectric layer, the second composite dielectric layer, the third composite dielectric layer and the fourth composite dielectric layer are Si ₃ N ₄ , SnO ₂ , Combination of two or more layers of Zn ₂ SnO ₄ , Nb ₂ O ₅ and ZnAlO _x ; Preferably, the thicknesses of the first composite dielectric layer, the second composite dielectric layer, the third composite dielectric layer and the fourth composite dielectric layer are each 10-85 nm. 5. The coated glass according to claim 1, characterized in that, the coated glass also includes a protective layer outside the fourth composite dielectric layer, and the protective layer is TiO ₂ , Si ₃ N ₄ , SiN _x O _y or At least one of ZrO ₂ with a thickness of 5~30nm. 6. A method for preparing the coated glass according to any one of claims 1-5, characterized in that, the method comprises: forming on the glass substrate outwards from the glass substrate in the following order by sputtering Film layer: the first composite dielectric layer, the first infrared reflective layer, the first barrier layer, the second composite dielectric layer, the second infrared reflective layer, the second barrier layer, the third composite dielectric layer, the third infrared reflective layer, the Three barrier layers and a fourth composite dielectric layer, the method uses a DC power source to sputter a metal oxide ceramic target to prepare the first barrier layer, the second barrier layer and the third barrier layer, and the metal oxide ceramic target is selected from AZO, TiO _x or NiCrO _x , and it is a rotating target. 7. The method according to claim 6, characterized in that, if AZO is selected as the target material of the barrier layer, pure argon is used as the sputtering gas, and no reaction gas is added; if _TiOx or _{NiCrOx is} selected as the barrier layer For the target material, a mixed gas of argon and oxygen is used as the sputtering gas, wherein the volume content of oxygen is less than or equal to 10%, preferably less than or equal to 7%; Preferably, the thicknesses of the first barrier layer, the second barrier layer and the third barrier layer are each 0.5-5 nm. 8. The method according to claim 6, wherein the method adopts a DC power supply and a planar cathode to form the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer by sputtering deposition under an argon atmosphere ; Preferably, the thicknesses of the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are each 5-15 nm; Preferably, the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are silver or silver alloy; Preferably, the first infrared reflective layer, the second infrared reflective layer and the third infrared reflective layer are silver alloys, and the main component of the silver alloy is silver, and includes at least one of gold, titanium, palladium, copper and niobium. An element, wherein the content of at least one element among gold, titanium, palladium, copper and niobium accounts for 0.3-10 at.% of the total amount of the silver alloy. 9. The method according to claim 6, characterized in that, the method adopts medium-frequency AC voltage and double rotating cathodes to form the first composite dielectric layer and the second composite dielectric layer by sputtering deposition under argon-nitrogen or argon-oxygen mixed atmosphere , the third composite dielectric layer and the fourth composite dielectric layer; Preferably, the thicknesses of the first composite dielectric layer, the second composite dielectric layer, the third composite dielectric layer and the fourth composite dielectric layer are each 10-85 nm; Preferably, the first composite dielectric layer, the second composite dielectric layer, the third composite dielectric layer and the fourth composite dielectric layer are made of Si ₃ N ₄ , SnO ₂ , Zn ₂ SnO ₄ , Nb ₂ O ₅ and ZnAlO _x Combination of two or more film layers. 10. The method according to claim 6, further comprising forming a protective layer outside the fourth composite dielectric layer by sputtering, the protective layer being TiO ₂ , Si ₃ N ₄ , SiN At least one of _x O _y or ZrO ₂ with a thickness of 5-30nm; Preferably, the method adopts medium-frequency AC voltage and double rotating cathodes to form the protective layer by sputtering deposition under a mixed atmosphere of argon nitrogen or argon oxygen.