CN102222704A - 一种晶体硅太阳能电池三层减反射膜及其制备方法 - Google Patents
一种晶体硅太阳能电池三层减反射膜及其制备方法 Download PDFInfo
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- CN102222704A CN102222704A CN2011101739430A CN201110173943A CN102222704A CN 102222704 A CN102222704 A CN 102222704A CN 2011101739430 A CN2011101739430 A CN 2011101739430A CN 201110173943 A CN201110173943 A CN 201110173943A CN 102222704 A CN102222704 A CN 102222704A
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- titanium dioxide
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- 229910021419 crystalline silicon Inorganic materials 0.000 title claims abstract description 22
- 238000002360 preparation method Methods 0.000 title claims description 18
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical group O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 162
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical group O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims abstract description 160
- 239000000377 silicon dioxide Substances 0.000 claims abstract description 81
- 239000004408 titanium dioxide Substances 0.000 claims abstract description 66
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 46
- 238000000034 method Methods 0.000 claims abstract description 41
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims abstract description 33
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 33
- 239000010703 silicon Substances 0.000 claims abstract description 33
- 230000003647 oxidation Effects 0.000 claims abstract description 8
- 238000007254 oxidation reaction Methods 0.000 claims abstract description 8
- 239000012528 membrane Substances 0.000 claims description 42
- 239000002245 particle Substances 0.000 claims description 42
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 28
- 239000002105 nanoparticle Substances 0.000 claims description 28
- 239000002002 slurry Substances 0.000 claims description 28
- 239000006117 anti-reflective coating Substances 0.000 claims description 25
- 239000013078 crystal Substances 0.000 claims description 25
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 21
- 238000003756 stirring Methods 0.000 claims description 21
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 14
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 14
- 230000032683 aging Effects 0.000 claims description 14
- YHWCPXVTRSHPNY-UHFFFAOYSA-N butan-1-olate;titanium(4+) Chemical compound [Ti+4].CCCC[O-].CCCC[O-].CCCC[O-].CCCC[O-] YHWCPXVTRSHPNY-UHFFFAOYSA-N 0.000 claims description 14
- 210000004027 cell Anatomy 0.000 claims description 14
- 238000004140 cleaning Methods 0.000 claims description 14
- 239000006255 coating slurry Substances 0.000 claims description 14
- 239000012153 distilled water Substances 0.000 claims description 14
- 238000007639 printing Methods 0.000 claims description 14
- 238000007650 screen-printing Methods 0.000 claims description 14
- 238000005245 sintering Methods 0.000 claims description 14
- 238000001132 ultrasonic dispersion Methods 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 14
- 238000005253 cladding Methods 0.000 claims description 9
- 238000009792 diffusion process Methods 0.000 claims description 9
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 238000005530 etching Methods 0.000 claims description 7
- 239000011521 glass Substances 0.000 claims description 7
- 229910052757 nitrogen Inorganic materials 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- SOQBVABWOPYFQZ-UHFFFAOYSA-N oxygen(2-);titanium(4+) Chemical group [O-2].[O-2].[Ti+4] SOQBVABWOPYFQZ-UHFFFAOYSA-N 0.000 claims description 7
- 230000035484 reaction time Effects 0.000 claims description 7
- 229910052719 titanium Inorganic materials 0.000 claims description 7
- 239000010936 titanium Substances 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims 1
- 239000010408 film Substances 0.000 abstract description 69
- 239000010409 thin film Substances 0.000 abstract description 8
- 238000006243 chemical reaction Methods 0.000 abstract description 6
- 239000002131 composite material Substances 0.000 abstract 2
- 238000000576 coating method Methods 0.000 abstract 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 230000003667 anti-reflective effect Effects 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 2
- 230000003595 spectral effect Effects 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000623 plasma-assisted chemical vapour deposition Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
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Abstract
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CN201110173943.0A CN102222704B (zh) | 2011-06-27 | 2011-06-27 | 一种晶体硅太阳能电池三层减反射膜及其制备方法 |
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CN201110173943.0A CN102222704B (zh) | 2011-06-27 | 2011-06-27 | 一种晶体硅太阳能电池三层减反射膜及其制备方法 |
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CN102222704A true CN102222704A (zh) | 2011-10-19 |
CN102222704B CN102222704B (zh) | 2014-04-09 |
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Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102496634A (zh) * | 2011-12-27 | 2012-06-13 | 华东理工大学 | 一种晶硅太阳能电池三层减反射膜及其制备工艺 |
CN102916057A (zh) * | 2012-10-31 | 2013-02-06 | 湖南红太阳光电科技有限公司 | 一种晶硅太阳能电池梯度折射率减反膜及其制备方法 |
CN102931242A (zh) * | 2012-11-14 | 2013-02-13 | 东方电气集团(宜兴)迈吉太阳能科技有限公司 | 一种晶体硅太阳能电池多层二氧化硅减反射膜 |
CN103035752A (zh) * | 2013-01-25 | 2013-04-10 | 中国科学院苏州纳米技术与纳米仿生研究所 | 包含纳米结构抗反膜的晶体硅太阳能电池及其制备方法 |
CN103137714A (zh) * | 2011-12-01 | 2013-06-05 | 上海纳米技术及应用国家工程研究中心有限公司 | 一种太阳能电池三层复合钝化减反层及制备方法 |
CN104530998A (zh) * | 2014-12-23 | 2015-04-22 | 常熟高嘉能源科技有限公司 | 一种电池组件用高透光封装胶膜 |
CN104992986A (zh) * | 2015-06-09 | 2015-10-21 | 同济大学 | 一种基于溶胶-凝胶技术的多结太阳能电池的宽光谱减反射膜 |
CN105070769A (zh) * | 2015-08-06 | 2015-11-18 | 蚌埠玻璃工业设计研究院 | 一种具有仿生凸起结构SiO2减反射膜的制备方法 |
WO2017216592A2 (en) | 2016-06-15 | 2017-12-21 | Hungaro Lux Light Kft | Antireflection film and its use on a substrate |
CN113257931A (zh) * | 2021-05-12 | 2021-08-13 | 苏州大学 | 全角度陷光晶硅太阳能电池绒面的制备方法 |
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US20010031365A1 (en) * | 1999-05-20 | 2001-10-18 | Charles Anderson | Transparent substrate with an antireflection, low-emissivity or solar-protection coating |
CN101236261A (zh) * | 2007-02-01 | 2008-08-06 | 甘国工 | 有防雾涂层的显示器玻璃保护屏及使用该屏的液晶显示器 |
CN201203292Y (zh) * | 2008-04-15 | 2009-03-04 | 北京天瑞星真空技术开发有限公司 | 一种太阳能集热管外管的干涉减反射涂层 |
CN101431110A (zh) * | 2008-10-06 | 2009-05-13 | 上海电力学院 | 低折射率纳米材料减反射膜 |
CN101527326A (zh) * | 2009-03-02 | 2009-09-09 | 苏州阿特斯阳光电力科技有限公司 | 一种应用于冶金硅太阳电池的减反射膜及其制备方法 |
WO2009120983A2 (en) * | 2008-03-27 | 2009-10-01 | Rensselaer Polytechnic Institute | Ultra-low reflectance broadband omni-directional anti-reflection coating |
US20100027123A1 (en) * | 2008-07-31 | 2010-02-04 | Keio University | Anti-reflection coating, optical member comprising it, and exchange lens unit and imaging device comprising such optical member |
US20100180941A1 (en) * | 2008-09-08 | 2010-07-22 | Electronics And Telecommunications Research Institute | Antireflection film of solar cell, solar cell, and method of manufacturing solar cell |
CN101969075A (zh) * | 2010-08-10 | 2011-02-09 | 苏州阿特斯阳光电力科技有限公司 | 一种晶体硅太阳能电池双层减反射膜及其制备方法 |
-
2011
- 2011-06-27 CN CN201110173943.0A patent/CN102222704B/zh not_active Expired - Fee Related
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
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US20010031365A1 (en) * | 1999-05-20 | 2001-10-18 | Charles Anderson | Transparent substrate with an antireflection, low-emissivity or solar-protection coating |
CN101236261A (zh) * | 2007-02-01 | 2008-08-06 | 甘国工 | 有防雾涂层的显示器玻璃保护屏及使用该屏的液晶显示器 |
WO2009120983A2 (en) * | 2008-03-27 | 2009-10-01 | Rensselaer Polytechnic Institute | Ultra-low reflectance broadband omni-directional anti-reflection coating |
CN201203292Y (zh) * | 2008-04-15 | 2009-03-04 | 北京天瑞星真空技术开发有限公司 | 一种太阳能集热管外管的干涉减反射涂层 |
US20100027123A1 (en) * | 2008-07-31 | 2010-02-04 | Keio University | Anti-reflection coating, optical member comprising it, and exchange lens unit and imaging device comprising such optical member |
US20100180941A1 (en) * | 2008-09-08 | 2010-07-22 | Electronics And Telecommunications Research Institute | Antireflection film of solar cell, solar cell, and method of manufacturing solar cell |
CN101431110A (zh) * | 2008-10-06 | 2009-05-13 | 上海电力学院 | 低折射率纳米材料减反射膜 |
CN101527326A (zh) * | 2009-03-02 | 2009-09-09 | 苏州阿特斯阳光电力科技有限公司 | 一种应用于冶金硅太阳电池的减反射膜及其制备方法 |
CN101969075A (zh) * | 2010-08-10 | 2011-02-09 | 苏州阿特斯阳光电力科技有限公司 | 一种晶体硅太阳能电池双层减反射膜及其制备方法 |
Cited By (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103137714A (zh) * | 2011-12-01 | 2013-06-05 | 上海纳米技术及应用国家工程研究中心有限公司 | 一种太阳能电池三层复合钝化减反层及制备方法 |
CN103137714B (zh) * | 2011-12-01 | 2016-09-21 | 上海纳米技术及应用国家工程研究中心有限公司 | 一种太阳能电池三层复合钝化减反层及制备方法 |
CN102496634A (zh) * | 2011-12-27 | 2012-06-13 | 华东理工大学 | 一种晶硅太阳能电池三层减反射膜及其制备工艺 |
CN102916057A (zh) * | 2012-10-31 | 2013-02-06 | 湖南红太阳光电科技有限公司 | 一种晶硅太阳能电池梯度折射率减反膜及其制备方法 |
CN102916057B (zh) * | 2012-10-31 | 2015-10-28 | 湖南红太阳光电科技有限公司 | 一种晶硅太阳能电池梯度折射率减反膜及其制备方法 |
CN102931242A (zh) * | 2012-11-14 | 2013-02-13 | 东方电气集团(宜兴)迈吉太阳能科技有限公司 | 一种晶体硅太阳能电池多层二氧化硅减反射膜 |
CN103035752B (zh) * | 2013-01-25 | 2016-09-07 | 中国科学院苏州纳米技术与纳米仿生研究所 | 包含纳米结构抗反膜的晶体硅太阳能电池及其制备方法 |
CN103035752A (zh) * | 2013-01-25 | 2013-04-10 | 中国科学院苏州纳米技术与纳米仿生研究所 | 包含纳米结构抗反膜的晶体硅太阳能电池及其制备方法 |
CN104530998A (zh) * | 2014-12-23 | 2015-04-22 | 常熟高嘉能源科技有限公司 | 一种电池组件用高透光封装胶膜 |
CN104992986B (zh) * | 2015-06-09 | 2017-06-13 | 同济大学 | 一种基于溶胶‑凝胶技术的多结太阳能电池的宽光谱减反射膜 |
CN104992986A (zh) * | 2015-06-09 | 2015-10-21 | 同济大学 | 一种基于溶胶-凝胶技术的多结太阳能电池的宽光谱减反射膜 |
CN105070769A (zh) * | 2015-08-06 | 2015-11-18 | 蚌埠玻璃工业设计研究院 | 一种具有仿生凸起结构SiO2减反射膜的制备方法 |
CN105070769B (zh) * | 2015-08-06 | 2016-11-16 | 蚌埠玻璃工业设计研究院 | 一种具有仿生凸起结构SiO2减反射膜的制备方法 |
WO2017216592A2 (en) | 2016-06-15 | 2017-12-21 | Hungaro Lux Light Kft | Antireflection film and its use on a substrate |
US11029514B2 (en) | 2016-06-15 | 2021-06-08 | Hungaro Lux Light Kft. | Antireflection film and its use on a substrate |
CN113257931A (zh) * | 2021-05-12 | 2021-08-13 | 苏州大学 | 全角度陷光晶硅太阳能电池绒面的制备方法 |
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