CN101960610B - 铜铟镓硫硒薄膜太阳电池光吸收层的制备方法 - Google Patents
铜铟镓硫硒薄膜太阳电池光吸收层的制备方法 Download PDFInfo
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- CN101960610B CN101960610B CN2008801240397A CN200880124039A CN101960610B CN 101960610 B CN101960610 B CN 101960610B CN 2008801240397 A CN2008801240397 A CN 2008801240397A CN 200880124039 A CN200880124039 A CN 200880124039A CN 101960610 B CN101960610 B CN 101960610B
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/12—Active materials
- H10F77/126—Active materials comprising only Group I-III-VI chalcopyrite materials, e.g. CuInSe2, CuGaSe2 or CuInGaSe2 [CIGS]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02518—Deposited layers
- H01L21/02521—Materials
- H01L21/02568—Chalcogenide semiconducting materials not being oxides, e.g. ternary compounds
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
- H01L21/02612—Formation types
- H01L21/02617—Deposition types
- H01L21/02623—Liquid deposition
- H01L21/02628—Liquid deposition using solutions
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
- H10F71/127—The active layers comprising only Group III-V materials, e.g. GaAs or InP
- H10F71/1272—The active layers comprising only Group III-V materials, e.g. GaAs or InP comprising at least three elements, e.g. GaAlAs or InGaAsP
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/541—CuInSe2 material PV cells
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/544—Solar cells from Group III-V materials
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- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Photovoltaic Devices (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
Abstract
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Claims (14)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN2008801240397A CN101960610B (zh) | 2007-12-29 | 2008-12-29 | 铜铟镓硫硒薄膜太阳电池光吸收层的制备方法 |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN200710173785.2 | 2007-12-29 | ||
CNA2007101737852A CN101471394A (zh) | 2007-12-29 | 2007-12-29 | 铜铟镓硫硒薄膜太阳电池光吸收层的制备方法 |
PCT/CN2008/073805 WO2009089754A1 (en) | 2007-12-29 | 2008-12-29 | Preparation method of light absorption layer of copper-indium-gallium-sulfur-selenium film solar cell |
CN2008801240397A CN101960610B (zh) | 2007-12-29 | 2008-12-29 | 铜铟镓硫硒薄膜太阳电池光吸收层的制备方法 |
Publications (2)
Publication Number | Publication Date |
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CN101960610A CN101960610A (zh) | 2011-01-26 |
CN101960610B true CN101960610B (zh) | 2012-04-11 |
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Family Applications (2)
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CNA2007101737852A Pending CN101471394A (zh) | 2007-12-29 | 2007-12-29 | 铜铟镓硫硒薄膜太阳电池光吸收层的制备方法 |
CN2008801240397A Active CN101960610B (zh) | 2007-12-29 | 2008-12-29 | 铜铟镓硫硒薄膜太阳电池光吸收层的制备方法 |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
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CNA2007101737852A Pending CN101471394A (zh) | 2007-12-29 | 2007-12-29 | 铜铟镓硫硒薄膜太阳电池光吸收层的制备方法 |
Country Status (8)
Country | Link |
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US (1) | US9735297B2 (zh) |
EP (1) | EP2234168A4 (zh) |
JP (1) | JP5646342B2 (zh) |
KR (1) | KR101633388B1 (zh) |
CN (2) | CN101471394A (zh) |
BR (1) | BRPI0821501B8 (zh) |
RU (1) | RU2446510C1 (zh) |
WO (1) | WO2009089754A1 (zh) |
Cited By (3)
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TWI495740B (zh) * | 2012-12-14 | 2015-08-11 | Nat Inst Chung Shan Science & Technology | 軟性太陽能電池光吸收層之真空製程設備及其製造方法 |
TWI594952B (zh) * | 2013-06-03 | 2017-08-11 | 東京應化工業股份有限公司 | 錯合物及其溶液之製造方法、太陽電池用光吸收層之製造方法及太陽電池之製造方法 |
TWI619614B (zh) * | 2017-05-04 | 2018-04-01 | 施權峰 | 太陽能吸收層及其製作方法 |
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CN101471394A (zh) | 2007-12-29 | 2009-07-01 | 中国科学院上海硅酸盐研究所 | 铜铟镓硫硒薄膜太阳电池光吸收层的制备方法 |
JP5511320B2 (ja) * | 2008-11-11 | 2014-06-04 | 京セラ株式会社 | 薄膜太陽電池の製法 |
CN101700873B (zh) * | 2009-11-20 | 2013-03-27 | 上海交通大学 | 铜锌锡硒纳米粒子的制备方法 |
JP5464984B2 (ja) * | 2009-11-26 | 2014-04-09 | 京セラ株式会社 | 半導体層の製造方法および光電変換装置の製造方法 |
US20120280362A1 (en) * | 2009-12-18 | 2012-11-08 | The Regents Of The University Of California | Simple route for alkali metal incorporation in solution-processed crystalline semiconductors |
CN102130202A (zh) * | 2010-01-14 | 2011-07-20 | 正峰新能源股份有限公司 | 非真空形成铜铟镓硫硒吸收层及硫化镉缓冲层的方法及系统 |
CN102652367B (zh) * | 2010-01-29 | 2015-01-28 | 京瓷株式会社 | 半导体层的制造方法,光电转换装置的制造方法及半导体层形成用溶液 |
CN101818375A (zh) * | 2010-02-11 | 2010-09-01 | 昆山正富机械工业有限公司 | 以非真空工艺制作铜铟镓硒(硫)光吸收层的方法 |
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CN101820030A (zh) * | 2010-02-11 | 2010-09-01 | 昆山正富机械工业有限公司 | 非真空制作铜铟镓硒和/或硫光吸收层的方法 |
US8501524B2 (en) * | 2010-02-26 | 2013-08-06 | Electronics And Telecommunications Research Institute | Method of manufacturing thin-film light-absorbing layer, and method of manufacturing thin-film solar cell using the same |
CN101771106B (zh) * | 2010-03-05 | 2011-10-05 | 中国科学院上海硅酸盐研究所 | 铜锌镉锡硫硒薄膜太阳电池光吸收层的制备方法 |
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EP2234168A1 (en) | 2010-09-29 |
BRPI0821501B1 (pt) | 2019-02-12 |
RU2010131761A (ru) | 2012-02-10 |
CN101960610A (zh) | 2011-01-26 |
RU2446510C1 (ru) | 2012-03-27 |
WO2009089754A1 (en) | 2009-07-23 |
BRPI0821501B8 (pt) | 2022-08-23 |
JP2011508439A (ja) | 2011-03-10 |
US9735297B2 (en) | 2017-08-15 |
US20110008927A1 (en) | 2011-01-13 |
JP5646342B2 (ja) | 2014-12-24 |
CN101471394A (zh) | 2009-07-01 |
BRPI0821501A2 (pt) | 2015-06-16 |
KR101633388B1 (ko) | 2016-06-24 |
EP2234168A4 (en) | 2015-04-29 |
KR20100099753A (ko) | 2010-09-13 |
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