CN101838830B - Electrolyte of electroplating palladium-nickel alloy - Google Patents
Electrolyte of electroplating palladium-nickel alloy Download PDFInfo
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Abstract
Description
技术领域 technical field
本发明涉及一种电解液,尤其是涉及一种电镀钯镍合金的电解液。The invention relates to an electrolytic solution, in particular to an electrolytic solution for electroplating a palladium-nickel alloy.
背景技术 Background technique
金具有优良的耐蚀性、导电性及延展性,在电子工业中被广泛应用为电接触器和连接器的涂饰金属。金价格昂贵,寻求金镀层的替代品、节约成本已引起人们的广泛关注。钯的许多性质都与金类似,如耐蚀性、延展性等,且钯的价格较便宜,密度较低,应用成本远远低于金。钯合金镀层不仅可以使成本进一步降低,还可以显著降低纯钯镀层的吸氢现象,改善钯镀层的延展性、耐磨性、接触电阻和光亮度等。因此,钯及其合金被认为是最有可能取代或节约金的金属或合金。Gold has excellent corrosion resistance, electrical conductivity and ductility, and is widely used as a finishing metal for electrical contacts and connectors in the electronics industry. The price of gold is expensive, and the search for substitutes for gold plating to save costs has aroused widespread concern. Many properties of palladium are similar to gold, such as corrosion resistance, ductility, etc., and palladium is cheaper, has a lower density, and its application cost is much lower than that of gold. The palladium alloy coating can not only further reduce the cost, but also significantly reduce the hydrogen absorption phenomenon of the pure palladium coating, and improve the ductility, wear resistance, contact resistance and brightness of the palladium coating. Therefore, palladium and its alloys are considered to be the most likely metals or alloys to replace or save gold.
此外,钯及其合金还可作为高档装饰品的底层、阻挡层、电接触镀层、接插镀层,广泛应用于装饰性行业、电子工业、微机电加工等行业。In addition, palladium and its alloys can also be used as the bottom layer, barrier layer, electrical contact coating, and socket coating of high-end decorations, and are widely used in decorative industries, electronics industries, micro-electromechanical processing and other industries.
钯和镍同属一族,性质接近。钯镍合金的热力学稳定性较好。因为镍的价格便宜,耐蚀性较好,接触电阻较低,所以钯镍合金是目前最普遍应用的一种钯合金。Palladium and nickel belong to the same family and have similar properties. The thermodynamic stability of palladium-nickel alloy is good. Because nickel is cheap, has good corrosion resistance and low contact resistance, palladium-nickel alloy is currently the most commonly used palladium alloy.
目前,国内关于电镀钯镍合金的研究极少。国外研究的重点是,通过络合剂和添加剂的选择,以达到高速电镀和无氨电镀的目的。对既能电镀高镍含量,又能根据要求,电镀不同镍含量钯镍合金的工艺技术的研究未见报道;对高镍含量及不同镍含量钯镍合金镀层光亮度、致密性及孔隙率起决定作用的添加剂研究也未见报道。At present, there are very few domestic studies on electroplating palladium-nickel alloys. The focus of foreign research is to achieve the purpose of high-speed electroplating and ammonia-free electroplating through the selection of complexing agents and additives. There is no report on the process technology of electroplating high nickel content and electroplating palladium-nickel alloys with different nickel contents according to requirements; There is no report on the additives that determine the effect.
钯镍合金中,镍含量对镀层的性质影响较大,不同镍含量的钯镍合金镀层具有不同的硬度、不同的热力学稳定性,当然也有不同的应用。目前,镍质量含量为20%左右的钯镍合金镀层已被广泛应用,但高镍质量含量的钯镍合金未见工业应用。In the palladium-nickel alloy, the nickel content has a great influence on the properties of the coating. The palladium-nickel alloy coating with different nickel content has different hardness and different thermodynamic stability, and of course it also has different applications. At present, the palladium-nickel alloy coating with a nickel mass content of about 20% has been widely used, but the palladium-nickel alloy with a high nickel mass content has no industrial application.
对于同一种镀液,在一定的电流密度范围内,电镀得到的钯镍合金镀层,镍的质量含量要基本不变。美国专利US.4849303指出,镀液中加入少量的碘离子后,在不同电流密度下,得到的钯镍合金镀层中镍质量变化不超过3%。For the same plating solution, within a certain range of current density, the mass content of nickel in the palladium-nickel alloy coating obtained by electroplating should basically remain unchanged. US Patent No. 4,849,303 pointed out that after adding a small amount of iodide ions to the plating solution, the mass change of nickel in the palladium-nickel alloy coating obtained under different current densities does not exceed 3%.
发明内容 Contents of the invention
本发明旨在提供一种能电镀出不同镍质量含量(10%~40%)的光亮、致密、无针孔的电镀钯镍合金的电解液。The invention aims to provide a bright, dense and pinhole-free electroplating palladium-nickel alloy electrolytic solution capable of electroplating different nickel mass contents (10%-40%).
本发明所述电镀钯镍合金的电解液包括主盐、络合剂、添加剂、导电盐和pH稳定剂;所述主盐包括钯盐和镍盐,以金属钯计算,钯盐的含量为1~10g/L,按摩尔比,钯盐∶镍盐为1∶(1~3);所述络合剂的浓度为0.2~1.0mol/L;所述添加剂的含量为0.01~1.0g/L;所述导电盐的含量为20~100g/L;所述pH稳定剂为20~50g/L硼酸或30~90g/L焦硼酸盐。The electrolytic solution of the electroplating palladium-nickel alloy of the present invention comprises main salt, complexing agent, additive, conductive salt and pH stabilizer; Said main salt comprises palladium salt and nickel salt, calculates with metal palladium, and the content of palladium salt is 1 ~10g/L, in molar ratio, palladium salt: nickel salt is 1: (1 ~ 3); the concentration of the complexing agent is 0.2 ~ 1.0mol/L; the content of the additive is 0.01 ~ 1.0g/L ; The content of the conductive salt is 20-100g/L; the pH stabilizer is 20-50g/L boric acid or 30-90g/L pyroborate.
所述钯盐可选自氯化钯、二氯二氨钯、二氯四氨钯、硫酸二氨钯、硫酸四氨钯、亚硝酸氨钯、硝酸氨钯、草酸二氨钯等中的至少一种。The palladium salt can be selected from palladium chloride, dichlorodiammine palladium, dichlorotetraammine palladium, diammonium palladium sulfate, tetraammine palladium sulfate, ammonium nitrite palladium, ammonium nitrate palladium, oxalate diammonia palladium, etc. A sort of.
所述镍盐可选自硫酸镍、氯化镍、氨基磺酸镍等中的至少一种。The nickel salt may be selected from at least one of nickel sulfate, nickel chloride, nickel sulfamate and the like.
所述络合剂可选自氨水、乙二胺、氨基乙酸、三乙醇胺、乙醇胺、二乙烯二胺、三乙烯四胺、柠檬酸及其盐、酒石酸及其盐等中的至少一种。The complexing agent can be selected from at least one of ammonia water, ethylenediamine, aminoacetic acid, triethanolamine, ethanolamine, diethylenediamine, triethylenetetramine, citric acid and its salts, tartaric acid and its salts, and the like.
所述添加剂可选自丙烯基硫脲、烟酸、菸酰胺、吡啶三磺酸、丙烯酰胺、糖精、苯亚磺酸钠、丙炔醇、丁炔二醇等中的至少一种。The additive may be selected from at least one of propenylthiourea, nicotinic acid, nicotinamide, pyridinetrisulfonic acid, acrylamide, saccharin, sodium benzenesulfinate, propynyl alcohol, butynediol, and the like.
所述导电盐可选自氯化铵、氯化钠、氯化钾、硫酸钠、硫酸铵、硝酸铵、硝酸钾等中的至少一种。The conductive salt may be selected from at least one of ammonium chloride, sodium chloride, potassium chloride, sodium sulfate, ammonium sulfate, ammonium nitrate, potassium nitrate and the like.
电镀的条件是:镀液pH值范围为6.5~10;电流密度为0.1~2.0A/dm2;镀液温度为20~50℃;电解时,中速搅拌;采用镀铂的钛网、石墨、不锈钢等为不溶性阳极,阴阳极面积比为1∶(1~3)。The conditions for electroplating are: the pH range of the plating solution is 6.5-10; the current density is 0.1-2.0A/dm 2 ; the temperature of the plating solution is 20-50°C; during electrolysis, stir at a medium speed; use platinum-plated titanium mesh, graphite , stainless steel, etc. are insoluble anodes, and the area ratio of cathode and anode is 1: (1~3).
镍质量含量最高可以达到40%。The nickel mass content can reach up to 40%.
本发明所述电解液,钯盐主要以氯化钯、二氯二氨钯、二氯四氨钯、硫酸二氨钯、硫酸四氨钯、亚硝酸氨钯、硝酸氨钯或草酸二氨钯等形式引入,镍盐主要以硫酸镍、氯化镍或氨基磺酸镍等形式引入。镀层中钯与镍含量的比例随着镀液中钯盐与镍盐的比例增加而增加,但当镀层中镍质量含量超过40%后,镍质量含量基本不再随镀液中镍盐含量的进一步提高而变化。钯盐的含量(以金属钯计)为1~10g/L。镀液中钯含量越高,镀速越快,但钯损失也越大;镀液中钯含量太低,则要经常补加钯,维护费用增加。镍盐按钯盐与镍盐摩尔比1∶(1~3)加入。The electrolytic solution of the present invention, the palladium salt is mainly composed of palladium chloride, palladium dichloride, tetraammine palladium dichloride, palladium diamine sulfate, palladium tetraammine sulfate, palladium ammonium nitrite, palladium ammonium nitrate or palladium diammine oxalate The nickel salt is mainly introduced in the form of nickel sulfate, nickel chloride or nickel sulfamate. The ratio of palladium to nickel content in the plating layer increases with the increase of the ratio of palladium salt to nickel salt in the plating solution, but when the nickel mass content in the plating layer exceeds 40%, the nickel mass content basically no longer increases with the nickel salt content in the plating solution. change with further improvement. The content of the palladium salt (calculated as metal palladium) is 1-10 g/L. The higher the palladium content in the plating solution, the faster the plating speed, but the greater the palladium loss; if the palladium content in the plating solution is too low, palladium must be added frequently, and the maintenance cost will increase. The nickel salt is added according to the molar ratio of palladium salt to nickel salt 1: (1-3).
本发明所述电解液,络合剂主要是氨水、乙二胺、氨基乙酸、三乙醇胺、乙醇胺、二乙烯二胺、三乙烯四胺,柠檬酸及其盐,酒石酸及其盐中的一种或几种。浓度为0.2~1.0mol/L。在含有这些络合剂的电解液中,可得到光亮的钯镍合金镀层。在使用氨水作为络合剂时,应注意适当降低镀液的温度和pH值以阻碍氨水的挥发。The electrolytic solution of the present invention, the complexing agent is mainly one of ammonia, ethylenediamine, aminoacetic acid, triethanolamine, ethanolamine, diethylenediamine, triethylenetetramine, citric acid and its salt, tartaric acid and its salt or several. The concentration is 0.2~1.0mol/L. In the electrolyte containing these complexing agents, a bright palladium-nickel alloy coating can be obtained. When using ammonia water as a complexing agent, attention should be paid to properly reducing the temperature and pH value of the plating solution to hinder the volatilization of ammonia water.
本发明所述电解液,添加剂主要是丙烯基硫脲、烟酸、菸酰胺、吡啶三磺酸、丙烯酰胺、糖精、苯亚磺酸钠、十二烷基磺酸钠、丙炔醇或丁炔二醇中的一种或几种,含量为0.01~1.0g/L。十二烷基磺酸钠既起表面活性剂的作用,又起光亮剂的作用,丙烯基硫脲、丙烯酰胺、糖精、菸酰胺、丙炔醇、丁炔二醇、苯亚磺酸钠等是光亮剂。当电流密度高时,还需加少量的烟酸、吡啶三磺酸或菸酰胺。添加剂配合使用,才可以得到光亮、致密、无针孔的钯镍合金镀层。The electrolyte of the present invention, the additive is mainly propenylthiourea, nicotinic acid, nicotinamide, pyridine trisulfonic acid, acrylamide, saccharin, sodium benzenesulfinate, sodium dodecylsulfonate, propynyl alcohol or butane One or more of acetylenic diols, the content is 0.01-1.0g/L. Sodium dodecylsulfonate not only acts as a surfactant but also as a brightener, allylthiourea, acrylamide, saccharin, nicotinamide, propynyl alcohol, butynediol, sodium benzenesulfinate, etc. It's a brightener. When the current density is high, it is necessary to add a small amount of nicotinic acid, pyridine trisulfonic acid or nicotinamide. Only when additives are used together can a bright, dense, pinhole-free palladium-nickel alloy coating be obtained.
本发明所述电解液,导电盐为氯化铵、氯化钠、氯化钾、硫酸钠、硫酸铵、硝酸铵或硝酸钾中的一种或几种。含量为20~100g/L。The electrolytic solution of the present invention, the conductive salt is one or more of ammonium chloride, sodium chloride, potassium chloride, sodium sulfate, ammonium sulfate, ammonium nitrate or potassium nitrate. The content is 20-100g/L.
本发明所述电解液,pH稳定剂为20~50g/L硼酸或30~90g/L焦硼酸盐。在此pH范围内,电解液性质稳定,得到的镀层性能优越。镀液pH值偏低时,镀层呈白灰色;镀液pH值偏高时,镀层中镍含量会降低。In the electrolytic solution of the present invention, the pH stabilizer is 20-50 g/L boric acid or 30-90 g/L pyroborate. Within this pH range, the properties of the electrolyte are stable, and the resulting coating has superior performance. When the pH value of the plating solution is low, the coating is white-gray; when the pH value of the plating solution is high, the nickel content in the coating will decrease.
本发明的电镀条件,电解液呈弱碱性,优选的pH值范围为6.5~10。In the electroplating condition of the present invention, the electrolytic solution is weakly alkaline, and the preferred pH range is 6.5-10.
本发明的电镀条件,电镀是在0.1~2.0A/dm2的电流密度下进行的。当电流密度过大时,镀层镍含量会降低。这是因为,随着电流密度的提高,钯沉积速度的增加要大于镍沉积速度增加。但对同一种镀液,电流密度在0.1~2.0A/dm2范围内,得到的钯镍合金镀层的镍质量含量变化不超过4%。当电流密度过小时,电沉积效率降低,成本增加。In the electroplating conditions of the present invention, the electroplating is carried out at a current density of 0.1 to 2.0 A/dm 2 . When the current density is too high, the nickel content of the coating will decrease. This is because, with the increase of current density, the increase of palladium deposition rate is greater than that of nickel deposition rate. However, for the same plating solution, if the current density is in the range of 0.1-2.0A/ dm2 , the nickel mass content of the obtained palladium-nickel alloy coating will not change more than 4%. When the current density is too small, the electrodeposition efficiency decreases and the cost increases.
本发明的电镀条件,温度为20~50℃。当温度过高时,镀层表面发雾。当温度过低时,镀层中镍质量含量会降低。The electroplating condition of the present invention is that the temperature is 20-50°C. When the temperature is too high, the surface of the coating will be fogged. When the temperature is too low, the nickel mass content in the coating will decrease.
通过调节镀液组成及电镀条件,可以获得不同镍含量的钯镍合金镀层,镍质量含量最高可以达到40%。配合使用添加剂,可以得到不同镍含量、光亮、致密、无针孔的钯镍合金镀层。By adjusting the composition of the plating solution and the electroplating conditions, palladium-nickel alloy coatings with different nickel contents can be obtained, and the highest nickel mass content can reach 40%. With the use of additives, palladium-nickel alloy coatings with different nickel contents, bright, dense, and pinhole-free can be obtained.
具体实施方式 Detailed ways
以下给出所述电镀钯镍合金的电解液的配制方法(以配制1升为例):Provide below the preparation method of the electrolytic solution of described electroplating palladium-nickel alloy (taking preparation 1 liter as example):
1.将主盐钯盐加入含有100mL去离子水的容器中,加热,滴加氨水,搅拌,溶解,得溶液A;1. Add the main salt palladium salt into a container containing 100mL of deionized water, heat, add ammonia water dropwise, stir, and dissolve to obtain solution A;
2.将主盐镍盐加入含有100mL去离子水的容器中,加热,搅拌,溶解,得溶液B;2. Add the main salt nickel salt into a container containing 100mL deionized water, heat, stir, and dissolve to obtain solution B;
3.将络合剂、导电盐和pH稳定剂加入含有400mL去离子水的容器中,加热,搅拌,溶解,得溶液C;3. Add complexing agent, conductive salt and pH stabilizer into a container containing 400mL of deionized water, heat, stir, and dissolve to obtain solution C;
4.将溶液A和溶液B加入溶液C中,搅拌均匀,得溶液D;4. Add solution A and solution B into solution C, stir evenly to obtain solution D;
5.将添加剂加入含有100mL去离子水的容器中,加热,搅拌,溶解后,加入溶液D中,得溶液E;5. Add the additive into a container containing 100mL deionized water, heat, stir, and dissolve, then add it to solution D to obtain solution E;
6.用碱液如氨水、氢氧化钠或氢氧化钾溶液,加入溶液E中,使其pH值范围为6.5~10。补加去离子水,使溶液的总体积为1000mL。6. Add lye such as ammonia water, sodium hydroxide or potassium hydroxide solution into solution E to make the pH range between 6.5 and 10. Additional deionized water was added to bring the total volume of the solution to 1000 mL.
实施例1Example 1
1)镀液组成及电镀条件如下1) The composition of the plating solution and the electroplating conditions are as follows
二氯二氨钯(以钯计) 2g/LDichlorodiammine palladium (calculated as palladium) 2g/L
六水硫酸镍 25g/LNickel sulfate hexahydrate 25g/L
氯化铵 30~50g/LAmmonium chloride 30~50g/L
硼酸 40~50g/LBoric acid 40~50g/L
氨水 30~60ml/LAmmonia water 30~60ml/L
十二烷基磺酸钠 0.1~0.5g/LSodium dodecyl sulfonate 0.1~0.5g/L
丙炔醇 0.05~0.4g/LPropylene Glycol 0.05~0.4g/L
糖精 0.1~0.5g/LSaccharin 0.1~0.5g/L
pH(用氨水调) 6.5~8pH (adjusted with ammonia water) 6.5~8
电流密度 0.5~1A/dm2 Current density 0.5~1A/ dm2
温度 45℃Temperature 45℃
阳极 镀铂钛网Anode Platinized Titanium Mesh
阴极与阳极的面积比 1∶2The area ratio of cathode to anode is 1:2
电镀过程中中速搅拌。Stir at medium speed during plating.
2)镀层测试结果:参见表1,接触电阻评定标准:SJ2431-84,一般金镀层接触电阻小于0.6mΩ。2) Coating test results: see Table 1, contact resistance evaluation standard: SJ2431-84, the general gold coating contact resistance is less than 0.6mΩ.
表1Table 1
实施例2Example 2
1)镀液组成及电镀条件如下1) The composition of the plating solution and the electroplating conditions are as follows
硫酸四氨钯(以钯计) 6g/LTetraammine palladium sulfate (calculated as palladium) 6g/L
六水氯化镍 25g/LNickel chloride hexahydrate 25g/L
氯化钠 30~50g/LSodium chloride 30~50g/L
十水焦硼酸钠 50~80g/LSodium pyroborate decahydrate 50~80g/L
乙二胺 10~30g/LEthylenediamine 10~30g/L
十二烷基磺酸钠 0.1~0.5g/LSodium dodecyl sulfonate 0.1~0.5g/L
烟酸 0.05~0.4g/LNiacin 0.05~0.4g/L
苯亚磺酸钠 0.05~0.5g/LSodium benzenesulfinate 0.05~0.5g/L
pH(用氨水调) 6.5~7.5pH (adjusted with ammonia water) 6.5~7.5
电流密度 1~1.5A/dm2 Current density 1~1.5A/ dm2
温度 50℃Temperature 50℃
阳极 石墨Anode Graphite
阴极与阳极的面积比 1∶2The area ratio of cathode to anode is 1:2
电镀过程中中速搅拌。Stir at medium speed during plating.
2)镀层测试结果:参见表2。2) Coating test results: see Table 2.
表2Table 2
实施例3Example 3
1)镀液组成及电镀条件如下1) The composition of the plating solution and the electroplating conditions are as follows
亚硝酸氨钯(以钯计) 8g/LAmmonium palladium nitrite (as palladium) 8g/L
氨基磺酸镍 40g/LNickel sulfamate 40g/L
硫酸铵 30~60g/LAmmonium sulfate 30~60g/L
硼酸 30~40g/LBoric acid 30~40g/L
氨基乙酸 15~30g/LGlycine 15~30g/L
丙烯酰胺 0.2~0.5g/LAcrylamide 0.2~0.5g/L
菸酰胺 0.05~0.4g/LNiacinamide 0.05~0.4g/L
十二烷基磺酸钠 0.05~0.5g/LSodium dodecyl sulfonate 0.05~0.5g/L
pH(用氨水调) 7~9pH (adjusted with ammonia water) 7~9
电流密度 1~1.5A/dm2 Current density 1~1.5A/ dm2
温度 30℃Temperature 30℃
阳极 不锈钢Anode Stainless Steel
阴极与阳极的面积比 1∶3The area ratio of cathode to anode is 1:3
电镀过程中中速搅拌。Stir at medium speed during plating.
2)镀层测试结果:参见表3。2) Coating test results: see Table 3.
表3table 3
实施例4Example 4
1)镀液组成及电镀条件如下1) The composition of the plating solution and the electroplating conditions are as follows
草酸二氨钯(以钯计) 10g/LDiammonium palladium oxalate (calculated as palladium) 10g/L
六水硫酸镍 45g/LNickel sulfate hexahydrate 45g/L
氯化钾 30~50g/LPotassium chloride 30~50g/L
十水焦硼酸钠 40~80g/LSodium pyroborate decahydrate 40~80g/L
柠檬酸钾 40~60g/LPotassium citrate 40~60g/L
丁炔二醇 0.1~0.5g/LButynediol 0.1~0.5g/L
吡啶三磺酸 0.05~0.2g/LPyridine trisulfonic acid 0.05~0.2g/L
十二烷基磺酸钠 0.05~0.5g/LSodium dodecyl sulfonate 0.05~0.5g/L
pH(用氨水调) 6.5~8pH (adjusted with ammonia water) 6.5~8
电流密度 1~2A/dm2 Current density 1~2A/ dm2
温度 40℃Temperature 40℃
阳极 不锈钢Anode Stainless Steel
阴极与阳极的面积比 1∶2The area ratio of cathode to anode is 1:2
电镀过程中中速搅拌。Stir at medium speed during plating.
2)镀层测试结果:参见表4。2) Coating test results: see Table 4.
表4Table 4
在本发明中,随着镀层中镍质量含量的增加,镀层的硬度显著增加,耐磨性也显著提高,从而可大大提高其作为电接触镀层的使用寿命。高镍质量含量钯镍合金镀层仍具有较低的接触电阻、合格的可焊性,镀层光亮、致密、无针孔,完全达到在电子工业上应用的要求。In the present invention, as the mass content of nickel in the coating increases, the hardness and wear resistance of the coating increase significantly, thereby greatly improving its service life as an electrical contact coating. The palladium-nickel alloy coating with high nickel mass content still has low contact resistance and qualified solderability. The coating is bright, dense, and pinhole-free, which fully meets the requirements for application in the electronics industry.
在本发明中,同一镀液在电流密度为0.1~2.0A/dm2范围内得到的镀层,镍质量含量变化不超过4%。In the present invention, the change of the mass content of nickel is not more than 4% for the coating obtained by the same plating solution in the range of current density of 0.1-2.0A/ dm2 .
本发明通过调节镀液中钯盐和镍盐的比例及适当的工艺条件,得到的钯镍合金镀层中镍的质量含量可以根据需要在10%~40%之间变化,最高可达到40%。而且,得到的不同镍质量含量的钯镍合金镀层均具有较低的接触电阻、合格的可焊性、较好的耐磨性。In the invention, by adjusting the ratio of palladium salt and nickel salt in the plating solution and appropriate process conditions, the mass content of nickel in the obtained palladium-nickel alloy coating can be changed between 10% and 40% according to requirements, and the highest can reach 40%. Moreover, the obtained palladium-nickel alloy coatings with different nickel mass contents all have lower contact resistance, qualified weldability and better wear resistance.
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Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1430683A (en) * | 2000-04-06 | 2003-07-16 | 法国梅塔勒科技公司 | Electrolytic solution for electrochemical deposit of palladium or its alloys |
CN101240428A (en) * | 2007-11-23 | 2008-08-13 | 北京工业大学 | Preparation method of Pd-Ni double metal modified titanium catalytic electrode |
CN101348928A (en) * | 2007-07-20 | 2009-01-21 | 罗门哈斯电子材料有限公司 | High Speed Process for Plating Palladium and Palladium Alloys |
-
2010
- 2010-05-07 CN CN2010101680004A patent/CN101838830B/en not_active Expired - Fee Related
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1430683A (en) * | 2000-04-06 | 2003-07-16 | 法国梅塔勒科技公司 | Electrolytic solution for electrochemical deposit of palladium or its alloys |
CN101348928A (en) * | 2007-07-20 | 2009-01-21 | 罗门哈斯电子材料有限公司 | High Speed Process for Plating Palladium and Palladium Alloys |
CN101240428A (en) * | 2007-11-23 | 2008-08-13 | 北京工业大学 | Preparation method of Pd-Ni double metal modified titanium catalytic electrode |
Non-Patent Citations (2)
Title |
---|
李斌.电镀钯镍合金研究进展.《材料保护》.2002,第35卷第256-258页. * |
苑娟等.低速电沉积钯镍合金工艺的研究.《电镀与环保》.2004,第24卷(第6期),第14-17页. * |
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