CN101770923B - Method for loading plasma enhanced chemical vapor deposition equipment and glass panel - Google Patents
Method for loading plasma enhanced chemical vapor deposition equipment and glass panel Download PDFInfo
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Abstract
本发明公开了一种等离子体增强化学气相沉积设备与玻璃板装载方法,改进设备中槽条和托板轮的尺寸,使槽条内壁与极板间距大于玻璃板厚度,使托板轮的轨道宽度大于玻璃板厚度;另外在两端的U形铝槽外侧固接有夹紧机构支撑板,夹紧机构支撑板固定有夹紧机构支架,两端对应的所述夹紧机构支架之间连接有夹紧机构;装载时先将下卡条紧贴极板下部两侧装入,然后将玻璃板与上卡条同时装入极板两侧,待玻璃板装载完毕后,将所有上卡条和下卡条取出,最后将各夹紧机构按照先下部后上部的顺序转动90°,使玻璃板紧靠在极板两侧完成装载。本发明能够最大限度的减少玻璃板与极板间的摩擦,保证镀膜质量,从而降低废品率,提高经济效益。
The invention discloses a plasma-enhanced chemical vapor deposition equipment and a glass plate loading method. The dimensions of the groove bar and the supporting wheel in the equipment are improved, so that the distance between the inner wall of the groove bar and the pole plate is greater than the thickness of the glass plate, and the track of the supporting plate wheel The width is greater than the thickness of the glass plate; in addition, a clamping mechanism support plate is fixedly connected to the outside of the U-shaped aluminum groove at both ends, the clamping mechanism support plate is fixed with a clamping mechanism bracket, and the clamping mechanism bracket corresponding to the two ends is connected with a Clamping mechanism: when loading, first put the lower clamping strips close to both sides of the lower part of the polar plate, then put the glass plate and the upper clamping strips into both sides of the polar plate at the same time, after the glass plate is loaded, put all the upper clamping strips and Take out the lower clamping strip, and finally rotate each clamping mechanism 90° in the order of the lower part first and then the upper part, so that the glass plate is close to the two sides of the polar plate to complete the loading. The invention can reduce the friction between the glass plate and the polar plate to the greatest extent, ensure the coating film quality, thereby reducing the reject rate and improving economic benefits.
Description
技术领域technical field
本发明涉及太阳能电池生产技术,具体的说,是涉及等离子体增强化学气相沉积设备,即平板PEVCD设备,以及相应的玻璃板装载方法。The present invention relates to solar cell production technology, in particular, relates to plasma enhanced chemical vapor deposition equipment, that is, flat panel PEVCD equipment, and a corresponding glass plate loading method.
背景技术Background technique
随着人类生产力和生活水平的不断提高,人们对石油、煤炭等传统能源的需求日益加剧。目前使用最为普遍的石化能源,不仅数量有限、面临枯竭,而且对环境造成的危害也越来越突出。随着资源枯竭、环境污染以及生态破坏等问题日趋严重,近年来世界各国竞相实施可持续发展的能源政策,希望用之不竭、洁净环保的可再生能源能够改变人类的能源结构。其中太阳能以来源丰富、无污染、廉价和自由采取这些独有的优势成为人类对可再生能源进行利用的共识。With the continuous improvement of human productivity and living standards, people's demand for traditional energy such as oil and coal is increasing day by day. Currently the most widely used petrochemical energy is not only limited in quantity and facing depletion, but also more and more harmful to the environment. With the increasingly serious problems of resource depletion, environmental pollution and ecological damage, countries around the world have been competing to implement sustainable energy policies in recent years, hoping that inexhaustible, clean and environmentally friendly renewable energy can change the energy structure of mankind. Among them, solar energy has become the consensus of human beings to use renewable energy with its unique advantages of abundant sources, no pollution, low cost and free use.
等离子体增强化学气相沉积设备,即平板PECVD(Plasma Enhanced Chmical Vapor Deposition)设备是太阳能电池生产中最关键的设备之一。等离子体增强化学气相沉积(PEVCD)技术是利用低温等离子体作能量源,样品置于低气压下辉光放电的极板上,利用辉光放电(或另加发热体)使样品升温到预定的温度,然后通入适量的反应气体,气体经一系列化学反应和等离子体反应,在样品表面形成固态薄膜。Plasma-enhanced chemical vapor deposition equipment, that is, flat-panel PECVD (Plasma Enhanced Chmical Vapor Deposition) equipment is one of the most critical equipment in solar cell production. Plasma Enhanced Chemical Vapor Deposition (PEVCD) technology uses low-temperature plasma as an energy source. The sample is placed on a plate of glow discharge under low pressure, and the temperature of the sample is raised to a predetermined temperature by glow discharge (or an additional heating element). temperature, and then an appropriate amount of reaction gas is introduced, and the gas undergoes a series of chemical reactions and plasma reactions to form a solid film on the surface of the sample.
如图1和图2所示,目前平板PECVD设备主要由底部的U形铝槽、支架桥,两侧的舢板,顶部的顶罩和装条顶板围成,支架桥上插装若干极板,装条顶板设置槽条,槽条用于对极板顶端定位,极板下部两侧还对称设置托板轮。其中槽条和托板轮的尺寸恰好使得带镀膜玻璃板装入后紧贴极板两侧。在生产中,由于待镀膜玻璃板插入和取出时均是紧贴着极板进行,玻璃板和极板会因发生摩擦而相互划伤,从而影响镀膜的质量,因此太阳能电池极板生产过程中废品率高,导致经济效益较差。As shown in Figure 1 and Figure 2, the current flat-panel PECVD equipment is mainly composed of a U-shaped aluminum tank at the bottom, a support bridge, sampans on both sides, a top cover and a strip roof, and several pole plates are inserted on the support bridge. The strip-loading top plate is provided with grooved bars, and the grooved bars are used for positioning the top of the pole plate, and supporting plate wheels are symmetrically arranged on both sides of the bottom of the pole plate. Wherein the size of the groove bar and the supporting plate wheel is just to make the coated glass plate close to both sides of the pole plate after being loaded. In production, since the glass plate to be coated is inserted and taken out close to the pole plate, the glass plate and the pole plate will scratch each other due to friction, which will affect the quality of the coating. Therefore, during the production process of the solar cell plate The high scrap rate leads to poor economic benefits.
发明内容Contents of the invention
本发明要解决的技术问题是提供一种改进结构的等离子体增强化学气相沉积设备,使其最大限度的减少玻璃板与极板间的摩擦,保证镀膜质量,从而降低废品率,提高经济效益。The technical problem to be solved by the present invention is to provide a plasma-enhanced chemical vapor deposition equipment with an improved structure, which can minimize the friction between the glass plate and the pole plate, ensure the quality of the coating film, thereby reducing the scrap rate and improving economic benefits.
本发明要解决的另一个技术问题是提供一种改进的等离子体增强化学气相沉积设备玻璃板装载方法,其专门适用于本发明的设备。Another technical problem to be solved by the present invention is to provide an improved glass plate loading method for plasma-enhanced chemical vapor deposition equipment, which is specially suitable for the equipment of the present invention.
为了解决上述技术问题,本发明通过以下的技术方案予以实现:In order to solve the above technical problems, the present invention is achieved through the following technical solutions:
一种等离子体增强化学气相沉积设备,包括平设于底部的U形铝槽,所述U形铝槽两端通过脚座支架固定有舢板,所述舢板之间固接插装有极板的支架桥,所述极板顶端通过设置在装条顶板上的槽条限位,所述装条顶板两侧与所述舢板顶端固接,所述极板下部两侧对称设置托板轮,所述槽条内壁与所述极板的间距大于玻璃板的厚度,所述托板轮的轨道宽度大于玻璃板的厚度;A plasma-enhanced chemical vapor deposition equipment, comprising a U-shaped aluminum trough laid flat on the bottom, two ends of the U-shaped aluminum trough are fixed with sampans through foot brackets, and poles are fixedly inserted between the sampans. The support bridge of the pole plate, the top of the pole plate is limited by the groove bar arranged on the top plate of the strip, the two sides of the top plate of the strip are fixedly connected with the top of the sampan, and the two sides of the lower part of the pole plate are symmetrically provided with supporting plates wheel, the distance between the inner wall of the groove bar and the pole plate is greater than the thickness of the glass plate, and the track width of the supporting plate wheel is greater than the thickness of the glass plate;
两端的所述U形铝槽外侧固接有夹紧机构支撑板,所述夹紧机构支撑板固定有夹紧机构支架,两端对应的所述夹紧机构支架之间连接有夹紧机构;The outside of the U-shaped aluminum groove at both ends is fixedly connected with a clamping mechanism support plate, and the clamping mechanism support plate is fixed with a clamping mechanism bracket, and a clamping mechanism is connected between the corresponding clamping mechanism brackets at both ends;
所述夹紧机构支撑板为表面设置有螺栓孔的角钢;The supporting plate of the clamping mechanism is an angle steel with bolt holes on the surface;
所述夹紧机构支架为底部设置有安装座的立柱,所述立柱上部和下部各安装有一个支架配件,所述立柱与所述支架配件分别设置有半圆形凹槽,两个所述半圆形凹槽拼接为圆形通孔,所述圆形通孔的圆心在所述夹紧机构支架的竖直中心线上;The bracket of the clamping mechanism is a column with a mounting seat at the bottom, a bracket accessory is installed on the upper and lower parts of the column, the column and the bracket accessory are respectively provided with semicircular grooves, and the two semi-circular grooves are respectively installed. The circular groove is spliced into a circular through hole, and the center of the circular through hole is on the vertical centerline of the clamping mechanism bracket;
所述夹紧机构包括两端设置有转动钮的椭圆柱体,所述转动钮和椭圆柱体之间设置有穿装于所述夹紧机构支架的圆形通孔中的圆柱形轴颈。The clamping mechanism includes an elliptical cylinder with rotating knobs at both ends, and a cylindrical journal inserted in a circular through hole of the clamping mechanism bracket is arranged between the rotating knob and the elliptical cylinder.
所述槽条内壁与所述极板的间距比玻璃板厚度大1.5mm~2mm。The distance between the inner wall of the groove bar and the pole plate is 1.5 mm to 2 mm greater than the thickness of the glass plate.
所述托板轮的轨道宽度比玻璃板厚度大1.5mm~2mm。The track width of the supporting wheel is 1.5 mm to 2 mm larger than the thickness of the glass plate.
本发明提供的另一技术方案是一种应用上述等离子体增强化学气相沉积设备的玻璃板装载方法,该方法由以下步骤组成:Another technical solution provided by the present invention is a glass plate loading method using the above-mentioned plasma-enhanced chemical vapor deposition equipment, the method consists of the following steps:
a.在所述夹紧机构椭圆柱体的长轴竖直的状态下,先将每组下卡条紧贴所述极板下部两侧装入,然后将玻璃板与每组上卡条同时装入极板两侧,使上卡条位于所述玻璃板与所述极板的间隙中;a. In the state where the long axis of the elliptical cylinder of the clamping mechanism is vertical, first install each set of lower clamping strips close to the two sides of the lower part of the polar plate, and then put the glass plate and each set of upper clamping strips at the same time Install on both sides of the pole plate so that the upper clamping strip is located in the gap between the glass plate and the pole plate;
b.所有玻璃板装载完毕后,将所有上卡条和下卡条取出;b. After all the glass plates are loaded, take out all the upper and lower clips;
c.将各夹紧机构按照先下部后上部的顺序转动90°,即所述夹紧机构的椭圆柱体长轴转到水平方向,使玻璃板紧靠在极板两侧,即完成装载。c. Rotate each clamping mechanism by 90° in the order of the lower part and then the upper part, that is, the long axis of the elliptical cylinder of the clamping mechanism is turned to the horizontal direction, so that the glass plate is close to the two sides of the polar plate, and the loading is completed.
上述方法也可以由以下步骤组成:The above method may also consist of the following steps:
a.在所述夹紧机构椭圆柱体的长轴竖直的状态下,先将每组下卡条紧贴所述极板下部两侧装入,然后将玻璃板与每组上卡条同时装入极板两侧,使上卡条位于所述玻璃板与所述极板的间隙中;a. In the state where the long axis of the elliptical cylinder of the clamping mechanism is vertical, first install each set of lower clamping strips close to the two sides of the lower part of the polar plate, and then put the glass plate and each set of upper clamping strips at the same time Install on both sides of the pole plate so that the upper clamping strip is located in the gap between the glass plate and the pole plate;
b.每组玻璃板装载完毕后,将相应的上卡条和下卡条取出;b. After each group of glass plates is loaded, take out the corresponding upper and lower clips;
c.将装载完玻璃板旁边的夹紧机构按照先下部后上部的顺序转动90°,所述夹紧机构的椭圆柱体长轴转到水平方向,将玻璃板紧靠在极板两侧;c. Turn the clamping mechanism next to the loaded glass plate by 90° in the order of first the lower part and then the upper part, the long axis of the elliptical cylinder of the clamping mechanism is turned to the horizontal direction, and the glass plate is close to the two sides of the polar plate;
d.逐个重复步骤(b)和步骤(c),直至将所有的玻璃板夹紧,即完成装载。d. Repeat step (b) and step (c) one by one until all the glass plates are clamped, ie the loading is completed.
本发明的有益效果是:The beneficial effects of the present invention are:
通过对等离子体增强化学气相沉积设备,尤其是设备中的用于玻璃板装载的相关机构的改进,可以将玻璃板的装载过程由原有的一次紧贴极板送入分解为两步完成:第一步先使玻璃板沿着宽松的槽条和托板轮轨道送入,第二步再用夹紧机构将玻璃板压紧。这样可以最大限度地减少待镀膜玻璃板与极板的摩擦,解决在太阳能电池板生产过程中的由于擦伤而造成废品率高的问题,从而降低废品率,提高经济效益,并且结构简单,操作方便。Through the improvement of the plasma-enhanced chemical vapor deposition equipment, especially the relevant mechanism for glass plate loading in the equipment, the loading process of the glass plate can be decomposed into two steps from the original one-time close-to-the-plate feeding: In the first step, the glass plate is fed along the loose groove and the pallet wheel track, and in the second step, the glass plate is pressed tightly by the clamping mechanism. In this way, the friction between the glass plate to be coated and the pole plate can be reduced to the greatest extent, and the problem of high scrap rate caused by scratches in the production process of solar panels can be solved, thereby reducing the scrap rate and improving economic benefits, and the structure is simple and easy to operate. convenient.
附图说明Description of drawings
图1是现有技术中的等离子体增强化学气相沉积设备的结构示意图;Fig. 1 is the structural representation of the plasma-enhanced chemical vapor deposition equipment in the prior art;
图1-1是图1的主视图;Figure 1-1 is the front view of Figure 1;
图2是本发明的等离子体增强化学气相沉积设备的结构示意图;Fig. 2 is the structural representation of plasma-enhanced chemical vapor deposition equipment of the present invention;
图2-1是图2的主视图;Figure 2-1 is the front view of Figure 2;
图2-2是图2的后视图;Figure 2-2 is a rear view of Figure 2;
图2-3是图2的右视图;Fig. 2-3 is the right view of Fig. 2;
图3-1是长槽条的主视图;Figure 3-1 is the front view of the long groove;
图3-2是长槽条的左视图;Figure 3-2 is the left view of the long groove bar;
图3-3是长槽条的俯视图;Figure 3-3 is a top view of the long groove bar;
图4-1是短槽条的主视图;Figure 4-1 is the front view of the short groove;
图4-2是短槽条的左视图;Figure 4-2 is the left view of the short groove;
图4-3是短槽条的俯视图;Figure 4-3 is a top view of the short groove;
图5-1是托板轮的主视图;Figure 5-1 is the front view of the pallet wheel;
图5-2是托板轮的左视图;Figure 5-2 is a left view of the pallet wheel;
图6-1是前夹紧机构支撑板的主视图;Figure 6-1 is a front view of the support plate of the front clamping mechanism;
图6-2是前夹紧机构支撑板的左视图;Figure 6-2 is a left view of the front clamping mechanism support plate;
图6-3是前夹紧机构支撑板的俯视图;Figure 6-3 is a top view of the support plate of the front clamping mechanism;
图7-1是后夹紧机构支撑板的主视图;Figure 7-1 is a front view of the support plate of the rear clamping mechanism;
图7-2是后夹紧机构支撑板的左视图;Figure 7-2 is a left view of the support plate of the rear clamping mechanism;
图7-3是后夹紧机构支撑板的俯视图;Figure 7-3 is a top view of the support plate of the rear clamping mechanism;
图8是夹紧机构支架的结构示意图;Fig. 8 is a schematic structural view of the clamping mechanism bracket;
图8-1是图8中立柱的主视图;Fig. 8-1 is the front view of the column in Fig. 8;
图8-2是图8中立柱的左视图;Fig. 8-2 is the left side view of column in Fig. 8;
图8-3是图8中立柱的俯视图;Figure 8-3 is a top view of the column in Figure 8;
图8-4是图8中支架配件的主视图;Figure 8-4 is a front view of the bracket fitting in Figure 8;
图8-5是图8中支架配件的侧视图;Figure 8-5 is a side view of the bracket fitting in Figure 8;
图8-6是图8中支架配件的俯视图;Figure 8-6 is a top view of the bracket fitting in Figure 8;
图9是夹紧机构的结构示意图;Fig. 9 is a schematic structural view of the clamping mechanism;
图9-1是图9是俯视图;Figure 9-1 is a top view of Figure 9;
图9-2是图9是左视图;Figure 9-2 is a left view of Figure 9;
图9-3是图9是主视图;Figure 9-3 is a front view of Figure 9;
图10-1是玻璃板装入但未夹紧时的局部视图;Figure 10-1 is a partial view of the glass plate when it is loaded but not clamped;
图10-2是玻璃板装入且夹紧时的局部视图。Figure 10-2 is a partial view of the glass plate when loaded and clamped.
图中:顶罩——1 装条顶板——2 长槽条——3In the figure: Top cover——1 Top plate with strips——2 Long groove——3
极板——4 托板轮——5 支架桥——6Pole plate——4 Pallet wheel——5 Support bridge——6
第一U形铝槽——7 第二U形铝槽——8 第三U形铝槽——9The first U-shaped aluminum slot——7 The second U-shaped aluminum slot——8 The third U-shaped aluminum slot——9
脚座支架——10 舢板——11 前夹紧机构支撑板——12Foot bracket——10 Sampan——11 Front clamping mechanism support plate——12
夹紧机构支架——13 安装座——131 支架配件——132Clamping mechanism bracket——13 Mounting seat——131 Bracket accessories——132
圆形通孔——133 立柱——134 半圆形凹槽——135Circular through hole——133 Column——134 Semicircular groove——135
夹紧机构——14 转动钮——141 椭圆柱体——142Clamping mechanism——14 Turn knob——141 Ellipse cylinder——142
圆柱形轴颈——143 后夹紧机构支撑板——15 上卡条——16Cylindrical journal——143 Rear clamping mechanism support plate——15 Upper clip——16
玻璃板——17 下卡条——18Glass plate——17 Lower clip——18
具体实施方式Detailed ways
下面结合附图和实施例对本发明作进一步的详细描述:Below in conjunction with accompanying drawing and embodiment the present invention will be described in further detail:
本发明提供了一种对等离子体增强化学气相沉积设备,即平板PECVD设备改进的技术方案。图1是现有技术中平板PECVD设备主体部分的结构示意图,包括平设于设备底部前端的第一U形铝槽7、中间的第二U形铝槽8以及后端的第三U形铝槽9,上述三条U形铝槽两端分别通过一条与它们垂直的脚座支架10连接,并通过脚座支架10固定连接两侧舢板11。所述舢板11的顶端通过螺钉连接有装条顶板2,所述装条顶板2上面设置有顶罩1。The invention provides a technical scheme for improving plasma-enhanced chemical vapor deposition equipment, that is, flat-panel PECVD equipment. Figure 1 is a schematic structural view of the main body of a flat-panel PECVD equipment in the prior art, including a first
结合图1-1所示,两块所述舢板11之间设置有六个支架桥6,每个所述支架桥6的两端分别通过螺钉与左右舢板11固定连接。所述支架桥6上设置有若干插接槽,每个插接槽插装有极板4。其中阳极板和阴极板间隔安装,一般阳极板下端通过阳极板座安装。As shown in FIG. 1-1 , six
所述装条顶板2下表面在于所述极板4相对应的位置,安装有若干列槽条3,每一列槽条3包括一个设置于中间的短槽条和四个分设在两边的长槽条。所述槽条3用于对所述极板4的顶端限位,从而与所述支架条6上下配合将极板4直立固定,并保证它们的垂直度。所述长槽条3的结构见图3-1至图3-3,所述短槽条3的结构见图4-1至图4-3,特别是通过图3-2和图4-2可见,所述槽条3的中间设置有一个最深的凹面,用于将极板4插入其中限位。The lower surface of the strip-loading
所述极板4下部在支架桥6的上方位置安装有托板轮5,所述托板轮5在极板4两侧对称设置为一组。单个所述托板轮5的结构可见图5-1和图5-2,托板轮5内侧低陷形成用于带镀膜玻璃板17插入的轨道。The lower part of the
现有技术中槽条3和托板轮5的尺寸恰好使得带镀膜玻璃板17装入后紧贴于所述极板4的两侧。也就是说,槽条3内壁与极板4的间距仅略大于玻璃板17的厚度,即图3-2中槽条3开口宽度L1基本等于极板4的厚度的与两块玻璃板17的厚度之和;而所述托板轮5的轨道宽度仅略大于玻璃板17的厚度,即图4-1中托板轮5的L2尺寸长度基本等于玻璃板17的厚度。因此生产中,待镀膜玻璃板17插入和取出时均是紧贴着极板4进行,玻璃板17和极板4会因发生摩擦而相互划伤,从而影响镀膜的质量。In the prior art, the dimensions of the
图2和图2-1至图2-3所示是改进后本发明的对等离子体增强化学气相沉积设备,主要从以下两大方面对设备进行改进。Figure 2 and Figure 2-1 to Figure 2-3 show the improved plasma-enhanced chemical vapor deposition equipment of the present invention, which mainly improves the equipment from the following two aspects.
一方面,对所述槽条3和所述托板轮5的尺寸进行调整,使槽条3内壁与极板4的间距大于玻璃板17的厚度,使托板轮5的轨道宽度大于玻璃板17的厚度。一般来说,可以将槽条3的开口宽度L1增加3mm~4mm;将托板轮5的L2尺寸增加1.5mm~2mm。这样就可以使玻璃板17在装入和取出时不再紧贴极板4。On the one hand, the size of the
另一方面,如图2-3所示,在所述第一U形铝槽7和所述第三U形铝槽9的外侧分别固接前夹紧机构支撑板12和后夹紧机构支撑板15。图6-1至图6-3示出了所述前夹紧机构支撑板12的结构,由角钢制成,其两翼板表面设置有若干螺纹孔,一个翼板紧贴第一U形铝槽7并与其固定;则另一个翼板面呈水平状态,可以用于安装夹紧机构支架13。同理,图7-1至图7-3示出了所述后夹紧机构支撑板15的结构。On the other hand, as shown in Figures 2-3, the front clamping
图8是组合之后的所述安装夹紧机构支架13,它包括底部设置有安装座131的立柱134,所述立柱134上部和下部各安装有一个支架配件132。如图8-1至图8-6所示,所述立柱134与所述支架配件132分别设置有半圆形凹槽135,两个所述半圆形凹槽135正好拼接为圆形通孔133,所述圆形通孔133的圆心在所述夹紧机构支架13的竖直中心线上。如图2-2,所述安装夹紧机构支架13在每两块相邻极板4间均有布置,为易于读图只画出一件,其余用中心线代替。FIG. 8 shows the assembly
两端对应的所述夹紧机构支架13之间连接有夹紧机构14。如图9和图9-1至图9-3所示,所述夹紧机构14包括两端设置有转动钮141的椭圆柱体142,所述转动钮141和椭圆柱体142之间设置有圆柱形轴颈143,所述圆柱形轴颈143用于穿装于所述夹紧机构支架13的圆形通孔133中。A
如图10-1和图10-2所示,通过从外侧对转动钮141的作用力,可以将夹紧机构14中段的椭圆柱体142转动。如图10-1,当所述椭圆柱体142的椭圆截面长轴位于竖直状态时,可以将玻璃板17沿着较为宽松的轨道送入或者取出;当所述椭圆柱体142的椭圆截面长轴位于水平状态时,可以实现对玻璃板17夹紧的功能。As shown in FIG. 10-1 and FIG. 10-2 , the
在进行玻璃板17的装载时,还需要用到上卡条16和下卡条18这两种辅助部件。本发明的等离子体增强化学气相沉积设备玻璃装载方法由以下步骤组成:When carrying out the loading of
a.在所述夹紧机构14椭圆柱体142的长轴竖直的状态下,先将每组下卡条18紧贴所述极板4下部两侧装入,然后将玻璃板17与每组上卡条16同时装入极板4两侧,使上卡条16位于所述槽条3内壁与所述极板4的间隙中;a. In the state where the major axis of the
b.所有玻璃板17装载完毕后,将所有上卡条16和下卡条18取出;b. After all the
c.将各夹紧机构14按照先下部后上部的顺序转动90°,即所述夹紧机构14的椭圆柱体142长轴转到水平方向,使玻璃板17紧靠在极板4两侧,即完成装载。c. Rotate each
上述玻璃装载方法还可以按照以下步骤循序进行:The above-mentioned glass loading method can also be carried out sequentially according to the following steps:
a.在所述夹紧机构14椭圆柱体142的长轴竖直的状态下,先将每组下卡条18紧贴所述极板4下部两侧装入,然后将玻璃板17与每组上卡条16同时装入极板4两侧,使上卡条16位于所述槽条3内壁与所述极板4的间隙中;a. In the state where the major axis of the
b.每组玻璃板17装载完毕后,将相应的上卡条16和下卡条18取出;b. After each group of
c.将装载完玻璃板17旁边的夹紧机构14按照先下部后上部的顺序转动90°,所述夹紧机构14的椭圆柱体142长轴转到水平方向,将玻璃板17紧靠在极板4两侧;c. Turn the
d.逐个重复步骤(b)和步骤(c),直至将所有的玻璃板17夹紧,即完成装载。d. Step (b) and step (c) are repeated one by one until all the
上述两种方法的区别主要在于,一种是在取出每组上卡条16和下卡条18之后再旋转夹紧机构14;另一种是全部取出上卡条16和下卡条18之后,再统一转动夹紧机构14。The difference between the above two methods mainly lies in that one is to rotate the
其中,特别注意旋转所述夹紧机构14必须要按照先下部后上部的顺序转动,这样可以保证玻璃板17安全的靠在极板4上。如果先转动上部的夹紧机构14再转动下部的夹紧机构14,则在转动下部的夹紧机构14时,已经靠在极板4上的玻璃板17上端必然需要向上挪动一小段距离才能达到整个玻璃板17贴合的效果。这样,玻璃板17上部会划伤极板4,因此,夹紧机构14先下部后上部的转动顺序可以防止此问题的出现。Wherein, special attention should be paid to rotating the
尽管上面结合附图对本发明的优选实施例进行了描述,但是本发明并不局限于上述的具体实施方式,上述的具体实施方式仅仅是示意性的,并不是限制性的,本领域的普通技术人员在本发明的启示下,在不脱离本发明宗旨和权利要求所保护的范围情况下,还可以作出很多形式的具体变换,这些均属于本发明的保护范围之内。Although the preferred embodiments of the present invention have been described above in conjunction with the accompanying drawings, the present invention is not limited to the above-mentioned specific embodiments. The above-mentioned specific embodiments are only illustrative and not restrictive. Those of ordinary skill in the art Under the enlightenment of the present invention, without departing from the purpose of the present invention and the scope of protection of the claims, personnel can also make specific changes in many forms, and these all belong to the protection scope of the present invention.
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US4873942A (en) * | 1988-06-08 | 1989-10-17 | The Stackpole Corporation | Plasma enhanced chemical vapor deposition wafer holding fixture |
CN101245449A (en) * | 2007-02-14 | 2008-08-20 | 北京行者多媒体科技有限公司 | Plasma box for mass production of thin film |
CN101265574A (en) * | 2008-03-14 | 2008-09-17 | 福建钧石能源有限公司 | Thin film deposition apparatus and thin film deposition method |
CN201587981U (en) * | 2010-01-19 | 2010-09-22 | 天津大学 | Plasma Enhanced Chemical Vapor Deposition Equipment |
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US4873942A (en) * | 1988-06-08 | 1989-10-17 | The Stackpole Corporation | Plasma enhanced chemical vapor deposition wafer holding fixture |
CN101245449A (en) * | 2007-02-14 | 2008-08-20 | 北京行者多媒体科技有限公司 | Plasma box for mass production of thin film |
CN101265574A (en) * | 2008-03-14 | 2008-09-17 | 福建钧石能源有限公司 | Thin film deposition apparatus and thin film deposition method |
CN201587981U (en) * | 2010-01-19 | 2010-09-22 | 天津大学 | Plasma Enhanced Chemical Vapor Deposition Equipment |
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