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BE814657A - Dispositif de retenue d'extremites de barreau lors d'une fusion par zones sans creuset - Google Patents

Dispositif de retenue d'extremites de barreau lors d'une fusion par zones sans creuset

Info

Publication number
BE814657A
BE814657A BE144013A BE144013A BE814657A BE 814657 A BE814657 A BE 814657A BE 144013 A BE144013 A BE 144013A BE 144013 A BE144013 A BE 144013A BE 814657 A BE814657 A BE 814657A
Authority
BE
Belgium
Prior art keywords
merger
crucible
zones
device during
retaining device
Prior art date
Application number
BE144013A
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE814657A publication Critical patent/BE814657A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
    • C30B13/28—Controlling or regulating
    • C30B13/285—Crystal holders, e.g. chucks
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10S117/911—Seed or rod holders
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S269/00—Work holders
    • Y10S269/903—Work holder for electrical circuit assemblages or wiring systems
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T279/00—Chucks or sockets
    • Y10T279/17—Socket type
    • Y10T279/17761—Side detent
    • Y10T279/17821—Set screw

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
  • Silicon Compounds (AREA)
BE144013A 1973-05-07 1974-05-07 Dispositif de retenue d'extremites de barreau lors d'une fusion par zones sans creuset BE814657A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2322969A DE2322969C3 (de) 1973-05-07 1973-05-07 Vorrichtung zum Haltern der Stabenden beim tiegelfreien Zonenschmelzen

Publications (1)

Publication Number Publication Date
BE814657A true BE814657A (fr) 1974-09-02

Family

ID=5880196

Family Applications (1)

Application Number Title Priority Date Filing Date
BE144013A BE814657A (fr) 1973-05-07 1974-05-07 Dispositif de retenue d'extremites de barreau lors d'une fusion par zones sans creuset

Country Status (6)

Country Link
US (1) US3901499A (fr)
JP (1) JPS5443476B2 (fr)
BE (1) BE814657A (fr)
DE (1) DE2322969C3 (fr)
DK (1) DK135409C (fr)
IT (1) IT1010390B (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2529366A1 (de) * 1975-07-01 1977-01-20 Wacker Chemitronic Vorrichtung zum stuetzen eines kristallinen stabes
JPS5344351A (en) * 1976-10-06 1978-04-21 Shizuoka Seiki Co Ltd Grain dryer
US4257841A (en) * 1978-01-06 1981-03-24 Monsanto Company Stabilizing and supporting apparatus for float zone refined semiconductor crystal rod
US4448432A (en) * 1981-06-19 1984-05-15 French Errol J Sabre saw chuck
JP2617258B2 (ja) * 1991-11-28 1997-06-04 信越半導体株式会社 シリコン多結晶棒自重締付保持具
US6123864A (en) 1993-06-02 2000-09-26 Applied Materials, Inc. Etch chamber
US5843623A (en) * 1996-09-10 1998-12-01 International Business Machines Corporation Low profile substrate ground probe
US6044573A (en) * 1998-03-25 2000-04-04 Cockrill; Huston G. Measuring device
US8840723B2 (en) * 2009-03-10 2014-09-23 Mitsubishi Materials Corporation Manufacturing apparatus of polycrystalline silicon
DE102014213628B3 (de) * 2014-07-14 2015-10-22 Wacker Chemie Ag Halterung für Impflingskristalle und Siliciumstäbe sowie Verfahren zur Herstellung eines einkristallinen Siliciumstabes

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2999776A (en) * 1955-01-13 1961-09-12 Siemens Ag Method of producing differentiated doping zones in semiconductor crystals
BE581195A (fr) * 1958-07-30
NL112832C (fr) * 1959-05-08
DE1114171B (de) * 1959-12-31 1961-09-28 Siemens Ag Halterung fuer stabfoermiges Halbleitermaterial in Vorrichtungen zum tiegelfreien Zonenschmelzen

Also Published As

Publication number Publication date
DK135409C (da) 1977-10-10
DK135409B (da) 1977-04-25
DE2322969A1 (de) 1974-11-28
DE2322969C3 (de) 1980-10-16
IT1010390B (it) 1977-01-10
JPS5015705A (fr) 1975-02-19
DE2322969B2 (de) 1980-02-28
US3901499A (en) 1975-08-26
JPS5443476B2 (fr) 1979-12-20

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