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ATA104198A - Transparenter leitfähiger film und masse für seine herstellung - Google Patents

Transparenter leitfähiger film und masse für seine herstellung

Info

Publication number
ATA104198A
ATA104198A AT0104198A AT104198A ATA104198A AT A104198 A ATA104198 A AT A104198A AT 0104198 A AT0104198 A AT 0104198A AT 104198 A AT104198 A AT 104198A AT A104198 A ATA104198 A AT A104198A
Authority
AT
Austria
Prior art keywords
dimensions
production
conductive film
transparent conductive
transparent
Prior art date
Application number
AT0104198A
Other languages
English (en)
Other versions
AT407204B (de
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP24141197A external-priority patent/JP3266066B2/ja
Priority claimed from JP24141097A external-priority patent/JP3266065B2/ja
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of ATA104198A publication Critical patent/ATA104198A/de
Application granted granted Critical
Publication of AT407204B publication Critical patent/AT407204B/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/61—Additives non-macromolecular inorganic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D1/00—Processes for applying liquids or other fluent materials
    • B05D1/02—Processes for applying liquids or other fluent materials performed by spraying
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
    • B05D5/12—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain a coating with specific electrical properties
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/02—Elements
    • C08K3/08—Metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/05—Alcohols; Metal alcoholates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/04—Oxygen-containing compounds
    • C08K5/06—Ethers; Acetals; Ketals; Ortho-esters
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/541—Silicon-containing compounds containing oxygen
    • C08K5/5415—Silicon-containing compounds containing oxygen containing at least one Si—O bond
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/24—Electrically-conducting paints
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/63—Additives non-macromolecular organic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]
    • Y10T428/2991—Coated
    • Y10T428/2993—Silicic or refractory material containing [e.g., tungsten oxide, glass, cement, etc.]
    • Y10T428/2995—Silane, siloxane or silicone coating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Wood Science & Technology (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Shielding Devices Or Components To Electric Or Magnetic Fields (AREA)
AT0104198A 1997-09-05 1998-06-17 Transparenter leitfähiger film und masse für seine herstellung AT407204B (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP24141197A JP3266066B2 (ja) 1997-09-05 1997-09-05 保存安定性に優れた金属微粒子含有導電膜形成用組成物
JP24141097A JP3266065B2 (ja) 1997-09-05 1997-09-05 金属微粒子からなる透明導電膜とその形成用組成物

Publications (2)

Publication Number Publication Date
ATA104198A true ATA104198A (de) 2000-05-15
AT407204B AT407204B (de) 2001-01-25

Family

ID=26535243

Family Applications (1)

Application Number Title Priority Date Filing Date
AT0104198A AT407204B (de) 1997-09-05 1998-06-17 Transparenter leitfähiger film und masse für seine herstellung

Country Status (6)

Country Link
US (2) US6086790A (de)
KR (1) KR100544252B1 (de)
CN (3) CN1279548C (de)
AT (1) AT407204B (de)
MY (1) MY124440A (de)
TW (1) TW505685B (de)

Families Citing this family (78)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW505685B (en) 1997-09-05 2002-10-11 Mitsubishi Materials Corp Transparent conductive film and composition for forming same
KR100297362B1 (ko) * 1998-08-05 2001-08-07 구자홍 플라즈마디스플레이패널의버스전극형성방법
MY125159A (en) * 1998-09-14 2006-07-31 Mitsubishi Materials Corp Fine metal particle-dispersion solution and conductive film using the same
US6440331B1 (en) * 1999-06-03 2002-08-27 Electrochemicals Inc. Aqueous carbon composition and method for coating a non conductive substrate
DE60023614T2 (de) * 1999-08-26 2006-07-27 Sumitomo Metal Mining Co. Ltd. Transparente, electrisch leitende Struktur und Verfahren zu ihrer Herstellung, Beschichtungs-Fluid dafür und Anzeigevorrichtung mit dieser Struktur
JP2002083518A (ja) * 1999-11-25 2002-03-22 Sumitomo Metal Mining Co Ltd 透明導電性基材とその製造方法並びにこの透明導電性基材が適用された表示装置、および透明導電層形成用塗液とその製造方法
JP3619118B2 (ja) * 2000-05-01 2005-02-09 キヤノン株式会社 露光用反射型マスクとその製造方法、並びに露光装置とデバイス製造方法
JP2002038053A (ja) * 2000-07-25 2002-02-06 Sumitomo Metal Mining Co Ltd 透明導電層形成用塗液
JP4043941B2 (ja) * 2000-08-11 2008-02-06 住友大阪セメント株式会社 透明導電膜および表示装置
JP5008216B2 (ja) * 2000-10-13 2012-08-22 株式会社アルバック インクジェット用インクの製法
TW522437B (en) * 2000-11-09 2003-03-01 Matsushita Electric Ind Co Ltd Method of treating surface of face panel used for image display device, and image display device comprising the treated face panel
US7471042B2 (en) * 2001-02-06 2008-12-30 Panasonic Corporation Plasma display panel with an improved electrode
JP4986198B2 (ja) * 2001-03-15 2012-07-25 日東電工株式会社 光学フィルム及び液晶表示装置
JP4183924B2 (ja) * 2001-03-30 2008-11-19 日揮触媒化成株式会社 金属微粒子および該微粒子の製造方法、該微粒子を含む透明導電性被膜形成用塗布液、透明導電性被膜付基材、表示装置
JPWO2003049123A1 (ja) * 2001-12-05 2005-04-21 旭硝子株式会社 導電膜、およびその製造方法、ならびにそれを備えた基材
KR100436710B1 (ko) * 2002-01-23 2004-06-22 삼성에스디아이 주식회사 투명도전막, 그 제조방법 및 이를 채용한 화상표시장치
US6748264B2 (en) 2002-02-04 2004-06-08 Fook Tin Technologies Limited Body fat analyzer with integral analog measurement electrodes
AU2003208610A1 (en) * 2002-02-25 2003-09-09 Fuji Photo Film Co., Ltd. Antiglare and antireflection film, polarizing plate and display device
KR100844004B1 (ko) * 2002-03-15 2008-07-04 엘지디스플레이 주식회사 유기전계발광 소자용 투명 도전막의 제조 방법
AT412681B (de) * 2002-04-22 2005-05-25 Hueck Folien Gmbh Substrate mit unsichtbaren elektrisch leitfähigen schichten
KR100484102B1 (ko) * 2002-05-16 2005-04-18 삼성에스디아이 주식회사 투명도전막 형성용 조성물, 이로부터 형성된 투명도전막및 상기 투명도전막을 채용한 화상표시장치
US7566360B2 (en) * 2002-06-13 2009-07-28 Cima Nanotech Israel Ltd. Nano-powder-based coating and ink compositions
US7736693B2 (en) * 2002-06-13 2010-06-15 Cima Nanotech Israel Ltd. Nano-powder-based coating and ink compositions
US7601406B2 (en) * 2002-06-13 2009-10-13 Cima Nanotech Israel Ltd. Nano-powder-based coating and ink compositions
US6911385B1 (en) * 2002-08-22 2005-06-28 Kovio, Inc. Interface layer for the fabrication of electronic devices
US7078276B1 (en) 2003-01-08 2006-07-18 Kovio, Inc. Nanoparticles and method for making the same
US7085444B2 (en) * 2003-02-25 2006-08-01 Eastman Kodak Company Porous optical switch films
KR100668921B1 (ko) * 2003-03-25 2007-01-12 세키스이가세이힝코교가부시키가이샤 실리카 피복 중합체 입자, 이의 제조 방법 및 이의 용도
JP2005144858A (ja) * 2003-11-14 2005-06-09 Nitto Denko Corp 透明導電性フィルムの製造方法
US7794629B2 (en) * 2003-11-25 2010-09-14 Qinetiq Limited Composite materials
CN100336136C (zh) * 2003-12-12 2007-09-05 日本曹达株式会社 透明导电膜形成液和包含该形成液的透明导电膜附着基体的制造方法
CN100438119C (zh) * 2003-12-15 2008-11-26 乐金显示有限公司 双面板型有机电致发光器件及其制造方法
JP2006004907A (ja) * 2004-05-18 2006-01-05 Seiko Epson Corp エレクトロルミネッセンス装置及び電子機器
JP2006154829A (ja) * 2004-12-01 2006-06-15 Lg Electronics Inc プラズマディスプレイパネル
US20080176103A1 (en) * 2005-03-28 2008-07-24 Ngk Insulators, Ltd. Conductive Paste and Electronic Parts
KR101300442B1 (ko) * 2005-06-10 2013-08-27 시마 나노 테크 이스라엘 리미티드 강화 투명 전도성 코팅 및 이의 제조 방법
EP1922759B8 (de) * 2005-08-12 2012-09-05 Cambrios Technologies Corporation Transparente leiter auf nanodrahtbasis
JP2007066711A (ja) * 2005-08-31 2007-03-15 Tdk Corp 透明導電体及びこれを用いた透明導電フィルム
TWI312799B (en) 2005-12-30 2009-08-01 Ind Tech Res Inst Viscosity controllable highly conductive ink composition and method for fabricating a metal conductive pattern
KR100796157B1 (ko) * 2006-05-10 2008-01-21 스카이코팅 주식회사 대전방지용 조성물
JP4373996B2 (ja) * 2006-06-09 2009-11-25 三菱マテリアル電子化成株式会社 導電性防眩膜形成用組成物、導電性防眩膜及びディスプレイ
TWI399759B (zh) * 2006-06-30 2013-06-21 Mitsubishi Materials Corp 形成太陽電池之電極用組成物及該電極之形成方法以及使用依該形成方法所得電極之太陽電池
JP5309521B2 (ja) * 2006-10-11 2013-10-09 三菱マテリアル株式会社 電極形成用組成物及びその製造方法並びに該組成物を用いた電極の形成方法
US8018568B2 (en) 2006-10-12 2011-09-13 Cambrios Technologies Corporation Nanowire-based transparent conductors and applications thereof
CN102324462B (zh) * 2006-10-12 2015-07-01 凯博瑞奥斯技术公司 基于纳米线的透明导体及其应用
JP5169389B2 (ja) 2007-04-19 2013-03-27 三菱マテリアル株式会社 導電性反射膜の製造方法
SG156218A1 (de) 2007-04-20 2009-11-26
JP2009135044A (ja) * 2007-11-30 2009-06-18 Tdk Corp 透明導電材料及び透明導電体
EP2232571A2 (de) * 2007-12-20 2010-09-29 Cima Nano Tech Israel Ltd. Pv-element mit transparenter elektrode aus nanopartikeln
JP5058839B2 (ja) * 2008-02-01 2012-10-24 株式会社ノリタケカンパニーリミテド 転写用感光性導体ペーストおよび感光性転写シート
CN102017012B (zh) 2008-03-14 2014-08-20 Nano-C公司 用于透明导电用途的碳纳米管-透明导电无机纳米颗粒混杂薄膜
KR20110066431A (ko) * 2009-12-11 2011-06-17 제일모직주식회사 전극 형성용 조성물 및 이로부터 형성된 전극을 포함하는 플라즈마 디스플레이 패널
US9534124B2 (en) * 2010-02-05 2017-01-03 Cam Holding Corporation Photosensitive ink compositions and transparent conductors and method of using the same
TWI401702B (zh) * 2010-02-10 2013-07-11 Cheng Uei Prec Ind Co Ltd 導電薄膜的製備方法
TW201231789A (en) * 2011-01-21 2012-08-01 E Ink Holdings Inc Smart window and smart window system using the same
CN102952423B (zh) * 2011-08-17 2017-05-10 长濑化成株式会社 有机导电膜
CN102585602A (zh) * 2012-02-13 2012-07-18 苏州晶讯科技股份有限公司 一种取代贵金属的印刷电路用催化油墨
WO2013148051A1 (en) * 2012-03-30 2013-10-03 Linda Zhong Electrode for energy storage devices and method for making same
EP2654086B1 (de) 2012-04-17 2018-10-03 Heraeus Precious Metals North America Conshohocken LLC Leitfähige dicke filmpaste für solarzellenkontakte
CN103377753B (zh) * 2012-04-17 2017-07-14 赫劳斯贵金属北美康舍霍肯有限责任公司 用于导电糊组合物的无机反应体系
US10424648B2 (en) * 2013-07-23 2019-09-24 Asahi Kasei Kabushiki Kaisha Copper and/or copper oxide dispersion, and electroconductive film formed using dispersion
DE102013111267B4 (de) * 2013-10-11 2019-10-24 Schott Ag Kochfeld mit einem transparenten elektrischen Leiter und Verfahren zur Herstellung
CN106170718A (zh) * 2014-04-14 2016-11-30 富士胶片株式会社 防反射膜及功能性玻璃
CN106463749B (zh) * 2014-07-30 2019-07-09 株式会社Lg化学 致密度改进的无机电解质膜制造方法、制造该膜的组合物及使用该组合物制造的膜
US20160060467A1 (en) * 2014-08-27 2016-03-03 Symbol Technologies, Inc. Formulation and method for fabricating a transparent force sensing layer
EP3188314B1 (de) * 2014-08-29 2021-07-07 Mitsui Mining & Smelting Co., Ltd. Leiterverbindungsstruktur, verfahren zur herstellung davon, leiterzusammensetzung und elektronisches komponentenmodul
CN104766675A (zh) * 2015-03-11 2015-07-08 中山大学 微波在制备透明导电薄膜中的应用
WO2018155048A1 (ja) * 2017-02-21 2018-08-30 セントラル硝子株式会社 着色被膜付板ガラスの製造方法
US20200368389A1 (en) * 2017-08-01 2020-11-26 Ishihara Sangyo Kaisha, Ltd. Three-dimensional structure, method for producing same, and coating device
CN109545440A (zh) * 2017-09-22 2019-03-29 南昌欧菲显示科技有限公司 透明导电性薄膜、触控屏及其制备方法
CN107992234A (zh) * 2017-12-29 2018-05-04 东莞北斗同创智能科技有限公司 一种智能穿戴触摸屏及其半透ito膜层制作方法
CN110149737B (zh) * 2018-02-12 2023-01-17 冯嘉俊 一种自修复的柔性发热元件及其制备方法
DE112019004970T5 (de) 2018-10-05 2021-06-24 Knowles Electronics, Llc Mikrofonvorrichtung mit Eindringschutz
WO2020072938A1 (en) 2018-10-05 2020-04-09 Knowles Electronics, Llc Methods of forming mems diaphragms including corrugations
US11508956B2 (en) 2020-09-08 2022-11-22 Licap Technologies, Inc. Dry electrode manufacture with lubricated active material mixture
KR102362584B1 (ko) * 2021-06-30 2022-02-15 한국건설기술연구원 밀드 카본을 사용한 emp 차폐용 무기계 도료 조성물 및 이를 이용한 구조물의 emp 차폐 방법
CN115584145A (zh) * 2022-11-02 2023-01-10 合肥昊泰新材料科技有限责任公司 一种低发射率彩色复合颜料的制备方法
CN116376038B (zh) * 2023-02-10 2024-09-24 成都理工大学 一种用于细胞成像和铜离子检测的纳米金属有机配合物制备方法

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3775176A (en) * 1971-02-23 1973-11-27 Amicon Corp Method of forming an electroplatable microporous film with exposed metal particles within the pores
US4387115A (en) * 1980-08-08 1983-06-07 Mitsui Toatsu Chemicals, Inc. Composition for conductive cured product
US4430382A (en) * 1980-12-15 1984-02-07 Joseph Savit Conductive coating
US4622073A (en) * 1983-12-06 1986-11-11 Toyo Aluminium Kabushiki Kaisha Metal powder pigment
WO1986002881A1 (en) * 1984-11-09 1986-05-22 Konishiroku Photo Industry Co., Ltd. Conductive laminate
US4950423A (en) * 1986-01-22 1990-08-21 The B. F. Goodrich Company Coating of EMI shielding and method therefor
US4826631A (en) * 1986-01-22 1989-05-02 The B. F. Goodrich Company Coating for EMI shielding and method for making
NL8802387A (nl) * 1988-09-29 1990-04-17 Philips Nv Werkwijze voor het aanbrengen van een thermisch zwarte laag op een verhittingslichaam voor een indirect verhitte kathode.
JP2778092B2 (ja) * 1989-03-28 1998-07-23 日本エクスラン工業株式会社 ゾル・ゲル成膜用液及び成膜方法
WO1992009665A1 (en) * 1990-11-21 1992-06-11 Catalysts & Chemicals Industries Co., Ltd. Coating solution for forming transparent electrically conductive film, method of preparation thereof, electrically conductive substrate, method of preparation thereof, and display device having transparent electrically conductive substrate
JPH05337351A (ja) * 1991-05-14 1993-12-21 Hitachi Ltd 液中微粒子分散法
JPH05107403A (ja) 1991-10-16 1993-04-30 Asahi Glass Co Ltd 導電性高屈折率膜及び帯電防止低反射膜及びこれらの製造方法
JP3002327B2 (ja) 1992-04-10 2000-01-24 住友大阪セメント株式会社 導電性・高屈折率膜形成用塗料及び導電性・高屈折率膜付き透明材料積層体
JPH0612920A (ja) 1992-06-24 1994-01-21 Asahi Glass Co Ltd 透明導電膜、低反射帯電防止膜、及びこれらの製造方法
JPH0612290A (ja) * 1992-06-29 1994-01-21 Fujitsu Ltd 制御データ監視方式
JP2767729B2 (ja) * 1992-06-30 1998-06-18 アルプス電気株式会社 合金粉末、該合金粉末を用いた分散型導電体および合金粉末の製造方法
JP2892250B2 (ja) 1993-06-04 1999-05-17 住友大阪セメント株式会社 帯電防止・高屈折率膜形成用塗料、及び帯電防止・反射防止膜付き透明積層体並びに表示装置
US5455117A (en) * 1992-10-27 1995-10-03 Kansai Paint Co., Ltd. Electromagnetic wave reflection-preventing material and electromagnetic wave reflection-preventing method
JP2575273B2 (ja) * 1993-02-09 1997-01-22 住友金属鉱山株式会社 電界シールド用透明導電膜
US5504133A (en) 1993-10-05 1996-04-02 Mitsubishi Materials Corporation Composition for forming conductive films
US5632833A (en) * 1993-10-29 1997-05-27 Nec Corporation Method of manufacturing laminated ceramic capacitor
JP3478589B2 (ja) * 1994-03-30 2003-12-15 住友大阪セメント株式会社 導電性・高屈折率膜形成用塗料、およびそれから得られる導電性・反射防止膜付き透明積層体
JP3262704B2 (ja) * 1995-04-24 2002-03-04 シャープ株式会社 非水系二次電池用炭素電極、その製造方法及びそれを用いた非水系二次電池
US5882722A (en) * 1995-07-12 1999-03-16 Partnerships Limited, Inc. Electrical conductors formed from mixtures of metal powders and metallo-organic decompositions compounds
JPH0953030A (ja) * 1995-08-11 1997-02-25 Sumitomo Osaka Cement Co Ltd 透明導電塗料及び透明導電膜
JP3473272B2 (ja) * 1996-06-10 2003-12-02 旭硝子株式会社 導電膜形成用塗布液および導電膜
KR19990036350A (ko) * 1996-06-11 1999-05-25 다테모토쇼이치 투명 도전막, 저 반사 투명 도전막 및 표시장치
JP3378441B2 (ja) * 1996-07-24 2003-02-17 株式会社東芝 陰極線管およびその製造方法
JPH10110123A (ja) * 1996-10-08 1998-04-28 Sumitomo Osaka Cement Co Ltd 透明導電膜形成用塗料およびその製造方法、透明導電低反射性膜およびその製造方法、ならびに透明導電低反射性膜付き表示装置
JPH10204336A (ja) 1997-01-23 1998-08-04 Sumitomo Osaka Cement Co Ltd 透明導電膜形成用塗料、低反射透明導電膜および表示装置
TW505685B (en) 1997-09-05 2002-10-11 Mitsubishi Materials Corp Transparent conductive film and composition for forming same
KR100322063B1 (ko) * 1999-01-13 2002-03-12 김순택 도전막 형성용 조성물, 그 제조방법 및 그를 이용하여 제조된 도전막을 구비한 음극선관

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US6808654B2 (en) 2004-10-26
CN1540678A (zh) 2004-10-27
US6086790A (en) 2000-07-11
CN1222483C (zh) 2005-10-12
AT407204B (de) 2001-01-25
CN1287391C (zh) 2006-11-29
KR100544252B1 (ko) 2006-03-23
CN1279548C (zh) 2006-10-11
US20020063242A1 (en) 2002-05-30
TW505685B (en) 2002-10-11
MY124440A (en) 2006-06-30
CN1540677A (zh) 2004-10-27
KR19990029225A (ko) 1999-04-26

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