AT269222B - Verfahren zum Herstellen von Metallstrukturen auf Halbleiteroberflächen - Google Patents
Verfahren zum Herstellen von Metallstrukturen auf HalbleiteroberflächenInfo
- Publication number
- AT269222B AT269222B AT833867A AT833867A AT269222B AT 269222 B AT269222 B AT 269222B AT 833867 A AT833867 A AT 833867A AT 833867 A AT833867 A AT 833867A AT 269222 B AT269222 B AT 269222B
- Authority
- AT
- Austria
- Prior art keywords
- production
- metal structures
- semiconductor surfaces
- semiconductor
- structures
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/02—Local etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/04—Coating on selected surface areas, e.g. using masks
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S428/00—Stock material or miscellaneous articles
- Y10S428/922—Static electricity metal bleed-off metallic stock
- Y10S428/9335—Product by special process
- Y10S428/938—Vapor deposition or gas diffusion
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12528—Semiconductor component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/12—All metal or with adjacent metals
- Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
- Y10T428/12736—Al-base component
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electrodes Of Semiconductors (AREA)
- Weting (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE1564707A DE1564707C3 (de) | 1966-09-14 | 1966-09-14 | Verfahren zum Herstellen eines mit pn-Übergang versehenen Halbleiterbauelements |
DE1521509A DE1521509C3 (de) | 1966-09-14 | 1966-09-14 | Verfahren zum Herstellen von Metallstrukturen auf Halbleiteroberflächen |
Publications (1)
Publication Number | Publication Date |
---|---|
AT269222B true AT269222B (de) | 1969-03-10 |
Family
ID=25998601
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT833867A AT269222B (de) | 1966-09-14 | 1967-09-12 | Verfahren zum Herstellen von Metallstrukturen auf Halbleiteroberflächen |
Country Status (7)
Country | Link |
---|---|
US (1) | US3607479A (de) |
AT (1) | AT269222B (de) |
CH (1) | CH466667A (de) |
DE (2) | DE1564707C3 (de) |
GB (1) | GB1144993A (de) |
NL (1) | NL6710496A (de) |
SE (1) | SE334400B (de) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3900598A (en) * | 1972-03-13 | 1975-08-19 | Motorola Inc | Ohmic contacts and method of producing same |
JPS51142988A (en) * | 1975-06-04 | 1976-12-08 | Hitachi Ltd | Semiconductor devices |
-
1966
- 1966-09-14 DE DE1564707A patent/DE1564707C3/de not_active Expired
- 1966-09-14 DE DE1521509A patent/DE1521509C3/de not_active Expired
-
1967
- 1967-06-27 SE SE09344/67*A patent/SE334400B/xx unknown
- 1967-07-28 NL NL6710496A patent/NL6710496A/xx unknown
- 1967-09-11 US US666582A patent/US3607479A/en not_active Expired - Lifetime
- 1967-09-12 CH CH1273167A patent/CH466667A/de unknown
- 1967-09-12 AT AT833867A patent/AT269222B/de active
- 1967-09-13 GB GB41757/67A patent/GB1144993A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DE1564707A1 (de) | 1970-02-12 |
CH466667A (de) | 1968-12-15 |
DE1564707B2 (de) | 1977-10-06 |
DE1564707C3 (de) | 1978-06-01 |
DE1521509A1 (de) | 1969-09-18 |
DE1521509C3 (de) | 1978-05-03 |
DE1521509B2 (de) | 1977-09-08 |
SE334400B (de) | 1971-04-26 |
NL6710496A (de) | 1968-03-15 |
GB1144993A (en) | 1969-03-12 |
US3607479A (en) | 1971-09-21 |
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