Four Probe
Four Probe
Four Probe
AIM
APPARATUS
The experimental set up consists of probe arrangement, sample , oven 0-200C, constant
current generator , oven power supply and digital panel meter(measuring voltage and current).
Four probe apparatus is one of the standard and most widely used apparatus for the
measurement of resistivity of semiconductors.
This method is employed when the sample is in the form of a thin wafer, such as a thin semiconductor material deposited on a substrate.
The sample is millimeter in size and having a thickness w. It consists of four probe arranged linearly in a straight line at equal distance S
from each other. A constant current is passed through the two probes and the potential drop V across the middle two probes is measured. An
oven is provided with a heater to heat the sample so that behavior of the sample is studied with increase in temperature.
Fig:1 Fig:2
The figure shows the arrangements of four probes that measure voltage (V) and supply current (A) to the surface of the crystal.
THEORY
At a constant temperature, the resistance, R of a conductor is proportional to its length L and inversely proportional to its area of cross
section A.
(1)
(2)
The function, f(w/S) is a divisor for computing resistivity which depends on the value of w and S
We assume that the size of the metal tip is infinitesimal and sample thickness is greater than the distance between the probes,
(3)
Total electrical conductivity of a semiconductor is the sum of the conductivities of the valence band and conduction band carriers. Resistivity
is the reciprocal of conductivity and its temperature dependence is given by
(4)
Applications