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WO2025028355A1 - Highly refractive radical-polymerizable composition including sulfide compound - Google Patents

Highly refractive radical-polymerizable composition including sulfide compound Download PDF

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Publication number
WO2025028355A1
WO2025028355A1 PCT/JP2024/026404 JP2024026404W WO2025028355A1 WO 2025028355 A1 WO2025028355 A1 WO 2025028355A1 JP 2024026404 W JP2024026404 W JP 2024026404W WO 2025028355 A1 WO2025028355 A1 WO 2025028355A1
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polymerizable composition
refractive index
meth
group
bis
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PCT/JP2024/026404
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French (fr)
Japanese (ja)
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丹下一騎
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エア・ウォーター・パフォーマンスケミカル株式会社
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/64Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and sulfur atoms, not being part of thio groups, bound to the same carbon skeleton
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D263/00Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings
    • C07D263/52Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings condensed with carbocyclic rings or ring systems
    • C07D263/54Benzoxazoles; Hydrogenated benzoxazoles
    • C07D263/58Benzoxazoles; Hydrogenated benzoxazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D277/00Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/60Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings condensed with carbocyclic rings or ring systems
    • C07D277/62Benzothiazoles
    • C07D277/68Benzothiazoles with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached in position 2
    • C07D277/70Sulfur atoms
    • C07D277/74Sulfur atoms substituted by carbon atoms
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F220/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
    • C08F220/02Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
    • C08F220/10Esters
    • C08F220/38Esters containing sulfur
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F228/00Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur
    • C08F228/02Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a bond to sulfur or by a heterocyclic ring containing sulfur by a bond to sulfur
    • C08F228/04Thioethers

Definitions

  • the present invention relates to a highly refractive radically polymerizable composition containing a sulfide compound and a polymer thereof.
  • these film laminates each have a different refractive index for light, and the difference in refractive index can result in various characteristics or problems.
  • the difference in refractive index can result in various characteristics or problems.
  • a color filter if the pigment type is different, the pixels will have different refractive indices, which can cause problems such as increased light scattering at the interface with the overcoat layer and loss of transmitted light.
  • film laminates are generally bonded with an adhesive composition, but it is known that if a general acrylic adhesive is used to bond high refractive index materials, reflections will occur at the interface due to the difference in refractive index between the two. For this reason, there are known examples in which a refractive index adjuster is used to adjust the refractive index of the adhesive.
  • a compound having a triazine ring is added to an acrylic polymer to develop an adhesive with a high refractive index of 1.55 or more.
  • ITO Indium Tin Oxide
  • Patent Document 2 discloses a polymerizable composition that does not contain a (meth)acrylate compound having a triazine skeleton and a refractive index adjuster, and by using a (meth)acrylate compound having a fluorene skeleton as the refractive index adjuster, a cured product is obtained that has a refractive index at 589 nm of 1.557 or more and 1.571 or less.
  • a refractive index adjuster that can increase the refractive index of existing polymerizable compositions.
  • a method for increasing the refractive index of a polymerizable compound it is already widely known to introduce an aromatic ring into the molecular structure, or to introduce a halogen atom (excluding fluorine) or a sulfur atom.
  • a polymerizable compound having an aromatic ring in the molecular structure in addition to a benzene ring, those having a polycyclic aromatic ring such as biphenyl, naphthalene, fluorene, and anthracene are known.
  • a polymerizable compound having a single benzene ring in the molecular structure does not have a sufficient refractive index.
  • Patent Document 3 discloses a composition containing a (meth)acrylate having a fluorene skeleton as a curable composition that can obtain a cured product with a high refractive index and a low Abbe number.
  • 9,9-bis(4-(2-acryloyloxyethoxy)phenyl)fluorene has a refractive index nD of 1.608 and a viscosity at 25°C of 100,000 mPa ⁇ s or more.
  • Patent Document 4 discloses a polymerizable composition mainly composed of a thio(meth)acrylate monomer, and bis[(4-methacryloylthio)phenyl]sulfide and the like are disclosed.
  • Patent Document 6 discloses a compound containing a methylthiophenyl group as a new (meth)acrylic acid ester for dilution, which has low viscosity, high refractive index, and high heat resistance of its homopolymer.
  • Patent Document 7 discloses a polymerizable composition that uses a sulfide compound and a (meth)acrylate compound containing a sulfur compound as a liquid curable ink composition that can form a cured product with a high refractive index and is applicable to the inkjet method, and uses zirconium oxide nanocrystals as the metal compound nanocrystals.
  • Patent Document 8 discloses a (meth)acrylic acid ester having a condensed ring selected from the group consisting of a naphthalene ring, an anthracene ring, a benzothiazole ring, a benzoxazole ring, a benzimidazole ring, a fluorene ring, and a phenanthrene ring, as a polymerizable compound having a high refractive index, high solubility in a polymerizable compound having an aromatic ring, and high visible light transmittance of the cured product.
  • a condensed ring selected from the group consisting of a naphthalene ring, an anthracene ring, a benzothiazole ring, a benzoxazole ring, a benzimidazole ring, a fluorene ring, and a phenanthrene ring
  • Patent Document 9 discloses a (meth)acrylic acid ester having an aryl group or a heteroaryl group as a method for producing a high refractive index symmetrical (meth)acrylic acid ester, and a compound having a mercaptobenzothiazole group as the heteroaryl group.
  • Patent Document 10 discloses a (meth)acrylic acid ester compound having a benzothiazole ring as a sulfur atom-containing (meth)acrylic acid ester.
  • all of these acrylic esters having a high refractive index have the problem of high viscosity.
  • Patent Document 11 discloses a compound in which an aromatic ring or aromatic heterocycle is introduced into three of the four molecular chains of a quaternary carbon of a pentaerythritol skeleton, and a (meth)acrylic group is introduced into the remaining one.
  • Patent Document 12 discloses a high refractive index monomer that can be cured with ultraviolet light and is useful for manufacturing optical articles, particularly light control films, and among them, as a heterocyclic (meth)acrylate, a meth)acrylate having a benzothiazole group is disclosed.
  • the refractive index of 1,3-bis(2-mercaptobenzothiazoyl)propan-2-yl acrylate is 1.629 and the viscosity is 860 cP
  • the refractive index of 2-(4-chlorophenoxy)-1-[(phenylthio)methyl]ethyl acrylate is 1.5792 and the viscosity is 352 cP.
  • Patent Document 13 discloses a compound having a polymerizable functional group and a diaryl sulfide skeleton as a composition for nanoimprinting, and discloses vinyl groups, allyl groups, methacryloyl groups, and acryloyl groups as the polymerizable functional groups.
  • Patent Documents 14 to 16 disclose polymerizable compositions containing phenyl vinyl sulfide.
  • Patent Documents 17 and 18 describe the use of an organic peracid and/or an azo compound to radically polymerize a plastic lens material such as 2-vinylthiobenzothiazole and a radical polymerizable compound such as divinylbenzene under heating.
  • Patent Document 19 describes the use of an organic peracid and/or an azo compound to radically polymerize a polymerizable compound having an aromatic heterocycle, including 2-vinylthiobenzothiazole, under heating as an organic electroluminescence material. Both of these methods use a thermal radical polymerization initiator, and have different compositions from those of the present invention.
  • the object of the present invention is to provide a radical polymerizable composition that is used as a transparent resin raw material suitable for optical applications, and that not only has excellent curing properties, but also has a low viscosity and a high refractive index, and allows adjustment of the refractive index of the polymer obtained by curing.
  • a radically polymerizable composition containing a vinyl sulfide compound having a specific structure and an aryl sulfide compound having a specific structure as resin raw materials has a low viscosity and a very high refractive index, and can be easily polymerized under practical conditions to give a polymer with a high refractive index, leading to the completion of the present invention.
  • a first invention resides in a radically polymerizable composition
  • a radically polymerizable composition comprising (A) a vinyl sulfide compound having a heterocycle represented by general formula (1), (B) an aryl sulfide compound represented by general formula (5), and (C) a radical polymerization initiator, wherein the radically polymerizable composition has a refractive index (n D ) of 1.60 or more at 25° C.
  • A represents an oxygen atom or a sulfur atom
  • R 1 and R 2 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, or an arylthio group having 6 to 10 carbon atoms
  • R 1 and R 2 may bond to each other to form a saturated or unsaturated ring.
  • R3 represents a (meth)acrylic group or a vinyl group
  • n represents 0 or an integer of 1 to 5.
  • Multiple m's may be the same or different and represent 0 or an integer of 1 to 4
  • R4 represents an alkyl group having 1 to 3 carbon atoms and may be the same or different when there are multiple R4's
  • multiple A's may be the same or different and represent an oxygen atom or a sulfur atom.
  • the second invention is the radical polymerizable composition according to the first invention, characterized in that the content of (A) the vinyl sulfide compound having a heterocycle represented by general formula (1) is 40% by weight or more relative to 100% by weight of the total amount of the radical polymerizable composition.
  • the third invention is the radical polymerizable composition according to the first invention, characterized in that the viscosity of the radical polymerizable composition at 25°C is 30 mPa ⁇ s or less.
  • the fourth invention is the radical polymerizable composition according to the first invention, characterized in that the radical polymerization initiator (C) is a photoradical polymerization initiator.
  • the fifth invention is a polymerization method in which the radical polymerizable composition according to any one of the first to fourth inventions is irradiated with active energy rays.
  • the sixth invention is the polymerization method described in the fifth invention, characterized in that the irradiated active energy rays have a peak wavelength in the wavelength range of 350 nm to 420 nm.
  • a seventh invention relates to a polymer obtained by polymerizing the radically polymerizable composition according to any one of the first to fourth inventions, characterized in that the polymer has a refractive index ( nD ) of 1.60 or more at 25°C.
  • (meth)acrylate means acrylate or methacrylate
  • (meth)acryloyl means acryloyl or methacryloyl
  • (meth)acrylic means acrylic or methacrylic.
  • the refractive index in the present invention means the refractive index ( nD ) for the D line (589 nm) at 25°C unless otherwise specified.
  • the viscosity means a value measured at 25°C using an E-type viscometer unless otherwise specified.
  • the radically polymerizable composition of the present invention has a low viscosity and a high refractive index, and is easily polymerized under practical conditions. By polymerizing the radically polymerizable composition of the present invention, a polymer with an ultra-high refractive index can be obtained.
  • BMTPS 4'-bis(methacryloylthio)diphenyl sulfide
  • the vinyl sulfide compound having a heterocycle of the present invention is represented by general formula (1).
  • A represents an oxygen atom or a sulfur atom
  • R 1 and R 2 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, or an arylthio group having 6 to 10 carbon atoms
  • R 1 and R 2 may bond to each other to form a saturated or unsaturated ring.
  • the alkyl group having 1 to 6 carbon atoms represented by R 1 and R 2 may be a linear alkyl group or a branched alkyl group, and specific examples thereof include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a t-butyl group, an n-pentyl group, an isopentyl group, a 2-methylbutyl group, a neopentyl group, a 1-ethylpropyl group, an n-hexyl group, a 4-methylpentyl group, a 3-methylpentyl group, a 2-methylpentyl group, a 1-methylpentyl group, a 3,3-dimethylbutyl group, a 2,2-dimethylbutyl group, a 1,1-dimethylbutyl group,
  • Examples of aryl groups having 6 to 10 carbon atoms include phenyl, tolyl, and naphthyl groups, which may have a substituent.
  • Examples of alkoxy groups having 1 to 6 carbon atoms include linear, branched, or cyclic alkoxy groups, such as methoxy, ethoxy, propoxy, butoxy, pentoxy, hexyloxy, and cyclohexyloxy groups.
  • Examples of aryloxy groups having 6 to 10 carbon atoms include phenyloxy, tolyloxy, and naphthyloxy groups, which may have a substituent.
  • alkylthio groups having 1 to 6 carbon atoms include methylthio, ethylthio, n-propylthio, i-propylthio, n-butylthio, i-butylthio, n-amylthio, i-amylthio, n-hexylthio, and cyclohexylthio groups.
  • arylthio groups having 6 to 10 carbon atoms include phenylthio and naphthylthio groups.
  • the vinyl sulfide compound when A is an oxygen atom, the vinyl sulfide compound has a benzoxazole group, and when A is a sulfur atom, the vinyl sulfide compound has a benzothiazole group.
  • vinyl sulfide compounds having a benzoxazole group in which A in general formula (1) is an oxygen atom include 2-vinylthiobenzoxazole, 2-vinylthio-5-methylbenzoxazole, 2-vinylthio-6-methylbenzoxazole, 2-vinylthio-4-methylbenzoxazole, 2-vinylthio-5,6-dimethylbenzoxazole, 2-vinylthio-naphtho[2,1-d]benzoxazole, 2-vinylthio-naphtho[1,2-d]benzoxazole, 2-vinylthio-5-phenylbenzoxazole, 2-vinyl Examples include thio-5-tert-butylbenzoxazole, 2-vinylthio-4-methoxybenzoxazole, 2-vinylthio-5-methoxybenzoxazole, 2-vinylthio-6-methoxybenzoxazole, 2-vinylthio-6
  • vinyl sulfide compounds having a benzothiazole group in which A in general formula (1) is a sulfur atom include 2-vinylthiobenzothiazole, 2-vinylthio-5-methylbenzothiazole, 2-vinylthio-6-methylbenzothiazole, 2-vinylthio-4-methylbenzothiazole, 2-vinylthio-5,6-dimethylbenzothiazole, 2-vinylthio-naphtho[2,1-d]benzothiazole, 2-vinylthio-naphtho[1,2-d]benzothiazole, 2-vinylthio-5-phenylbenzothiazole, 2-vinyl Examples include 2-vinylthio-5-tert-butylbenzothiazole, 2-vinylthio-4-methoxybenzothiazole, 2-vinylthio-5-methoxybenzothiazole, 2-vinylthio-6-methoxybenzothiazole, 2-vinyl
  • 2-vinylthiobenzoxazole of the following structural formula (2) and 2-vinylthiobenzothiazole of the structural formula (3) are preferred in terms of ease of synthesis, refractive index, and viscosity.
  • compounds in which A in general formula (1) is an oxygen atom are preferred in terms of polymerization at low exposure doses and the resulting polymer has high transmittance and low yellowness, and 2-vinylthiobenzoxazole of structural formula (2) is particularly preferred in terms of ease of synthesis.
  • the compound of general formula (1) can be synthesized by a known method. For example, as shown in the following reaction formula 1, a 2-mercaptobenzoxazole compound or a 2-mercaptobenzothiazole compound is reacted with a dihalogenated ethane such as 1,2-dibromoethane in the presence of a base, and then the resulting mixture is dehydrohalogenated in the presence of a base, thereby synthesizing the compound of general formula (1).
  • a dihalogenated ethane such as 1,2-dibromoethane
  • A represents an oxygen atom or a sulfur atom
  • R1 and R2 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, or an arylthio group having 6 to 10 carbon atoms
  • R1 and R2 may be bonded to each other to form a saturated or unsaturated ring.
  • X represents a chlorine atom or a bromine atom, and the two Xs may be the same or different.
  • the reaction of the compound of general formula (4) with dihalogenated ethane causes a substitution reaction of the thiol group to produce a thioether compound, but almost simultaneously, the hydrogen halide is eliminated to produce a double bond, and the desired vinyl sulfide compound having a heterocycle of general formula (1) can be obtained without isolating the intermediate.
  • the vinyl sulfide having a heterocycle represented by general formula (1) synthesized by the above method is a compound with extremely low viscosity and high refractive index.
  • 2-vinylthiobenzoxazole which is a vinyl sulfide having a heterocycle of the present invention, is a liquid compound, has an extremely low viscosity of 4.2 mPa ⁇ s at 25°C, and exhibits a high refractive index of 1.62.
  • 2-vinylthiobenzothiazole is also a liquid compound, has an extremely low viscosity of 7.6 mPa ⁇ s at 25°C, and exhibits a very high refractive index of 1.68.
  • the vinyl sulfide having a heterocycle represented by the general formula (1) of the present invention can be polymerized and cured using a commercially available photoradical polymerization initiator, and is an extremely useful polymerizable compound that can be polymerized and cured not only with light sources such as high-pressure mercury lamps, but also with light sources with a single wavelength and weak irradiation energy such as ultraviolet LEDs and semiconductor lasers. It also has extremely high compatibility with other polymerizable compounds such as (meth)acrylic acid esters, and the radical polymerizable composition obtained by mixing it can also maintain a low viscosity, and the obtained polymerized and cured product exhibits a high refractive index.
  • a commercially available photoradical polymerization initiator is an extremely useful polymerizable compound that can be polymerized and cured not only with light sources such as high-pressure mercury lamps, but also with light sources with a single wavelength and weak irradiation energy such as ultraviolet LEDs and semiconductor lasers. It also has extremely high compatibil
  • 2-vinylthiobenzothiazole compounds are preferred.
  • 2-vinylthiobenzoxazole compounds are particularly preferred because they are polymerized with a low amount of exposure, and the polymerized product exhibits an ultra-high refractive index, high transmittance, and low YI (yellowing index).
  • R3 represents a (meth)acrylic group or a vinyl group
  • n represents 0 or an integer of 1 to 5.
  • Multiple m's may be the same or different and represent 0 or an integer of 1 to 4
  • R4 represents an alkyl group having 1 to 3 carbon atoms and may be the same or different when there are multiple R4's
  • multiple A's may be the same or different and represent an oxygen atom or a sulfur atom.
  • aryl sulfides represented by general formula (5) include 4,4'-bis(methacryloylthio)diphenyl sulfide, 4,4'-bis(acryloylthio)diphenyl sulfide, 4,4'-bis(methacryloyloxymethylthio)diphenyl sulfide, 4,4'-bis(acryloyloxymethylthio)diphenyl sulfide, 4,4'-bis(methacryloyloxyethylthio)diphenyl sulfide, 4,4'-bis(acryloyloxyethylthio)diphenyl sulfide, 4,4'-bis(methacryloyloxybutylthio)diphenyl sulfide, 4,4'-bis(acryloyloxybutylthio)diphenyl sulfide, and 4,4'-bis(vinylthio)diphenyl sulfide.
  • 4,4'-bis(methacryloylthio)diphenyl sulfide, 4,4'-bis(acryloyloxyethylthio)diphenyl sulfide, 4,4'-bis(vinylthio)diphenyl sulfide, 4,4'-bis(acryloyloxy)diphenyl sulfide, and 4,4'-bis(methacryloyloxy)diphenyl sulfide are preferred, and 4,4'-bis(methacryloylthio)diphenyl sulfide in which R3 is a methacryl group, n and m are 0, and A is a sulfur atom is particularly preferred.
  • the aryl sulfide compound represented by the general formula (5) is generally a viscous liquid or solid, depending on its structure, and is used in a solvent or mixed with a low-viscosity polymerizable compound for polymerization.
  • a low-viscosity polymerizable compound for polymerization for example, 4,4'-bis(methacryloylthio)diphenyl sulfide is available as a reagent, but is a white crystal with a melting point of 64°C.
  • 4,4'-bis(acryloyloxyethylthio)diphenyl sulfide has a relatively low viscosity, but Table 1-1 of JP 2011-170073 A describes that the viscosity of the composition at 23°C is 150 mPa ⁇ s.
  • aryl sulfide compounds themselves have a high refractive index, but many of them are solids or high-viscosity liquids, and when polymerizing them, it is undesirable to use a solvent due to issues such as outgassing. Also, when copolymerizing with a low-viscosity polymerizable compound, the low-viscosity polymerizable compound often has a low refractive index, making it difficult to obtain a copolymer with a high refractive index.
  • the vinyl sulfide compound having a heterocycle represented by the general formula (1) of the present invention is highly compatible with the aryl sulfide compound represented by the general formula (5), and not only has a high refractive index but also a very low viscosity, so that by adding it to the aryl sulfide compound, the viscosity of the copolymer composition can be rapidly reduced, and the refractive index of the copolymer becomes extremely high.
  • composition of the composition of the present invention by specifying the composition of the composition of the present invention, it is possible to obtain a radical polymerizable composition with a high refractive index and low viscosity, for example, a refractive index of 1.60 or more and a viscosity of the composition at 25°C of 20 mPa ⁇ s or less.
  • the addition ratio of the vinyl sulfide compound (A) represented by general formula (1) is preferably 1% by weight or more, more preferably 10% by weight or more, relative to 100% by weight of the total amount of the radical polymerizable composition, and particularly preferably 40% by weight or more in terms of the viscosity of the copolymer composition.
  • compositions having various refractive indices and viscosities can be prepared by adjusting the composition ratio of (A) the vinyl sulfide compound having a heterocycle represented by general formula (1) and (B) the aryl sulfide compound represented by general formula (5).
  • a preferred composition ratio is selected to obtain a desired refractive index and viscosity.
  • the aryl sulfide compound of the present invention can be synthesized from commercially available 4,4'-thiobisbenzenethiol or 4,4'-thiodiphenol by a known method.
  • Radically polymerizable compounds other than (A) and (B) can be used in the radically polymerizable composition of the present invention, as long as the effects of the present invention are not impaired.
  • examples of such compounds include vinyl ethers, vinyl sulfides other than those of general formula (1), (meth)acrylic acid, (meth)acrylonitrile, monofunctional (meth)acrylates, monofunctional (meth)acrylamides, polyfunctional (meth)acrylates, polyfunctional (meth)acrylamides, and oligomers thereof.
  • monofunctional (meth)acrylates and polyfunctional (meth)acrylates are preferred.
  • monofunctional (meth)acrylates that can be used include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, hydroxyethyl acrylate, tert-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isodecyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, isostearyl (meth)acrylate, tridecyl (meth)acrylate, methoxyethyl (meth)acrylate, ethoxyethyl (meth)acrylate, propoxyethyl (meth)acrylate, butoxyethyl (meth)
  • acrylates examples include ethyl (meth)acrylate, phenoxydiethylene glycol (meth)acrylate, phenoxytetraethylene glycol (meth)acrylate, phenoxyhexaethylene glycol (meth)acrylate, methoxydipropylene glycol (meth)acrylate, methoxytripropylene glycol (meth)acrylate, cyclohexyl (meth)acrylate, tert-butylcyclohexyl (meth)acrylate, benzyl (meth)acrylate, phenoxyethyl (meth)acrylate, dicyclopentanyl (meth)acrylate, dicyclopentenyl (meth)acrylate, bornyl (meth)acrylate, isobornyl (meth)acrylate, tetrahydrofurfuryl acrylate, 2-methyl-2-adamantyl (meth)acrylate, allyl (meth)acrylate, hydroxyethyl (meth)
  • polyfunctional (meth)acrylates include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, ditetraethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, polytetramethylene glycol di(meth)acrylate, 1,3-butanediol di(meth)acrylate, meth)acrylate, 1,4-butanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,7-heptanediol di(meth)acrylate, 1,8-octanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate,
  • examples of polyfunctional (meth)acrylates include, for example, trade names CN2203 and CN2270 manufactured by SARTOMER, and trade names M-6100 and M-8060 manufactured by Toa Gosei Co., Ltd.; examples of urethane acrylates include, for example, trade names UV-3200B, UV-3000B, UV-6640B, UV-3700B, UV-3310B, and UV-7000B manufactured by Nippon Synthetic Chemical Industry Co., Ltd.; trade names U-4HA and U-200PA manufactured by Shin-Nakamura Chemical Co., Ltd.; and trade names EBECRYL245, EBECRYL1259, and EBECRYL260 manufactured by Daicel-Cytec Co., Ltd.
  • Examples of the epoxy (meth)acrylate that can be used include ECRYL8210, EBECRYL284, EBECRYL8402, CN944, CN969, CN9002, and CN9029 manufactured by SARTOMER Co., Ltd., UN1255 and UN-5507 manufactured by Negami Chemical Industry Co., Ltd., and AH-600 and UA-306I manufactured by Kyoeisha Chemical Co., Ltd., and EBECRYL1259, EBECRYL605, and EBECRYL1606 manufactured by Daicel-Cytec Co., Ltd., and CN110, CN120, and CN153 manufactured by SARTOMER Co., Ltd.
  • urethane acrylate UV-6640B or U-200PA is more preferable.
  • These polyfunctional (meth)acrylates may be used alone or in combination of two or more.
  • a radical polymerization initiator is added to the radical polymerizable composition of the present invention.
  • the radical polymerization initiator is not particularly limited, but from the viewpoint of ease of production of the cured product, resolution, and pattern formability, polymerization curing by light irradiation is preferred, and in that sense, a photoradical polymerization initiator is preferred.
  • the photoradical polymerization initiator refers to a compound that generates radicals when irradiated with light, that is, a compound that absorbs light energy, decomposes and/or reacts, and generates radicals.
  • a compound that generates radicals by heat that is, a compound that absorbs heat energy, decomposes, and generates radical species, for example, a peroxide-based radical polymerization initiator or an azo-based radical polymerization initiator, is not included in the photoradical polymerization initiator of the present invention.
  • the photoradical polymerization initiator can be any commonly used one without any particular limitation, and for example, one or more photoradical polymerization initiators selected from the group consisting of alkylphenone-based photoradical polymerization initiators, benzophenone-based photoradical polymerization initiators, acylphosphine oxide-based photoradical polymerization initiators, oxime ester-based photoradical polymerization initiators, ⁇ -aminoacetophenone-based photoradical polymerization initiators, biimidazole-based photoradical polymerization initiators, triazine-based photoradical polymerization initiators, and thioxanthone-based photoradical polymerization initiators can be used.
  • one or more photoradical polymerization initiators selected from the group consisting of alkylphenone-based photoradical polymerization initiators, benzophenone-based photoradical polymerization initiators, acylphosphine oxide-based photoradical polymerization initiators, oxi
  • alkylphenone-based photoradical polymerization initiators examples include 2,2'-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxycyclohexylphenyl-ketone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1- ⁇ 4-[4-(2-hydroxy-2-methyl-propionyl)-benzyl]phenyl ⁇ -2-methyl-propan Examples include 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzylmethyl-2-(dimethylamino)-1-(4-morpholinophenyl)-1-butanone, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholinophenyl)-1-butanone, 2-(4-methylbenzyl)-2-(dimethyl
  • benzophenone-based photoradical polymerization initiators include benzophenone, p-methylbenzophenone, Michler's ketone, methylbenzophenone, 4,4'-dichlorobenzophenone, and 4,4'-bisdiethylaminobenzophenone.
  • acylphosphine oxide-based photoradical polymerization initiators examples include 2,4,6-trimethylbenzoyl-diphenylphosphine oxide (trade name “Omnirad TPO” manufactured by IGM Group B.V.) and bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (trade name "Omnirad 819" manufactured by IGM Group B.V.).
  • oxime ester photoradical polymerization initiators examples include 1,2-octanedione, 1-[4-(phenylthio)phenyl]-, 2-(o-benzoyloxime) (product name "IrgacureOXE01" manufactured by BASF, Irgacure is a registered trademark of BASF), ethanone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-, 1-(o-acetone), ethyl oxime) (trade name "Irgacure OXE02" manufactured by BASF), [8-[[(acetyloxy)imino][2-(2,2,3,3-tetrafluoropropoxy)phenyl]methyl]-11-(2-ethylhexyl)-11H-benzo[a]carbazol-5-yl]-,(2,4,6-trimethylphenyl) (trade name "Irgacure OXE
  • Examples of ⁇ -aminoacetophenone-based photoradical polymerization initiators include 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one (trade name "Omnirad 907" manufactured by IGM Group B.V.), 2-benzyl-2-(dimethylamino)-4'-morpholinobutyrophenone (trade name "Omnirad 369" manufactured by IGM Group B.V.), and 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholino-4-yl-phenyl)butan-1-one (trade name "Omnirad 379" manufactured by IGM Group B.V.).
  • biimidazole-based photoradical polymerization initiators include 2,4,5-triarylimidazole dimers such as 2-(o-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(o-chlorophenyl)-4,5-di(methoxyphenyl)imidazole dimer, 2-(o-fluorophenyl)-4,5-diphenylimidazole dimer, 2-(o-methoxyphenyl)-4,5-diphenylimidazole dimer, and 2-(p-methoxyphenyl)-4,5-diphenylimidazole dimer.
  • 2,4,5-triarylimidazole dimers such as 2-(o-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(o-chlorophenyl)-4,5-di(methoxyphenyl)imidazole dimer, 2-(o-fluorophenyl)-4,5-diphenylimid
  • triazine-based photoradical polymerization initiators examples include 2-(3,4-methylenedioxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, etc.
  • thioxanthone-based photoradical polymerization initiators examples include 2,4-diethylthioxanthone and 2-isopropylthioxanthone.
  • the alkylphenone-based photoradical polymerization initiator, benzophenone-based photoradical polymerization initiator, acylphosphine oxide-based photoradical polymerization initiator, oxime ester-based photoradical polymerization initiator, ⁇ -aminoacetophenone-based photoradical polymerization initiator, biimidazole-based photoradical polymerization initiator, triazine-based photoradical polymerization initiator, and thioxanthone-based photoradical polymerization initiator that can be used in the present invention can each be used alone, or multiple types can be used in combination depending on the application, etc.
  • photoradical polymerization initiators listed above biimidazole-based photoradical polymerization initiators, alkylphenone-based photoradical polymerization initiators, acylphosphine oxide-based photoradical polymerization initiators, and oxime-based photoradical polymerization initiators are preferred. In terms of activity, acylphosphine oxide-based photoradical polymerization initiators and oxime ester-based photoradical polymerization initiators are particularly preferred.
  • the amount of photoradical polymerization initiator added is preferably 0.1% by weight or more and 10% by weight or less relative to the radical polymerizable composition.
  • LED light sources have been used as light sources in photoradical polymerization, but due to problems such as high energy consumption, curing devices using LED light sources, which have low running costs and little impact on the natural environment, have come to be used.
  • these LED light sources emit light with long wavelengths such as 365 nm, 385 nm, 395 nm, and 405 nm, and unlike high pressure mercury lamps, they emit light of a single wavelength, so there is a problem that the irradiation energy is weak. With such LED lamps, it is often the case that conventional photoradical polymerization initiators cannot sufficiently cure.
  • a photoradical polymerization sensitizer In order to deal with such long wavelength, single light LED lamps, it is preferable to further add a photoradical polymerization sensitizer.
  • a photoradical polymerization sensitizer that absorbs long wavelength light, the radical generation reaction of the photoradical polymerization initiator can be promoted, and the reactivity of the radical polymerization can be improved.
  • any commonly used sensitizer that is active to light of the irradiation wavelength can be used without any particular restrictions.
  • thioxanthone-based sensitizers such as isopropylthioxanthone and diethylthioxanthone
  • benzophenone-based sensitizers such as 4,4'-bis(diethylamino)benzophenone
  • anthracene-based sensitizers such as 9,10-diethoxyanthracene, 9,10-dibutoxyanthracene, 9,10-bisheptanoyloxyanthracene, and 9,10-bisoctanoyloxyanthracene
  • coumarin-based sensitizers such as coumarin and ketocoumarin, acridine orange, camphorquinone, etc.
  • the amount of the photoradical polymerization sensitizer added is preferably 0.1% by weight or more and 10% by weight or less relative to the radical polymerizable composition.
  • the radically polymerizable composition of the present invention may contain a polymerization accelerator depending on the photoradical polymerization initiator used.
  • the polymerization accelerator include amine compounds such as ethyl p-dimethylaminobenzoate, 2-ethylhexyl p-dimethylaminobenzoate, methyl p-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, and butoxyethyl p-dimethylaminobenzoate.
  • the radical polymerizable composition of the present invention may also contain a polymerization inhibitor to enhance the stability of the composition.
  • polymerization inhibitors include at least one compound selected from the group consisting of hydroquinone, hydroquinone monomethyl ether, 1,4-benzoquinone, tert-butylhydroquinone, and 4-tert-butylpyrocatechol.
  • the radical polymerizable composition of the present invention may contain a surfactant, and the surfactant is preferably a nonionic surfactant.
  • the nonionic surfactant is, for example, a compound containing a fluorine group (e.g., a fluorinated alkyl group) or a silanol group, or a compound having a siloxane bond as the main skeleton. It is preferable to use one containing a fluorine-based surfactant or a silicone-based surfactant.
  • fluorine-based surfactants include, but are not limited to, Megafac F-171, F-173, F-444, F-470, F-471, F-475, F-482, F-477, F-554, F-556, and F-557 manufactured by DIC Corporation, and Novec FC4430 and FC4432 manufactured by Sumitomo 3M Limited.
  • Silicone-based surfactants include surfactants having siloxane bonds in the molecule.
  • surfactant examples include Toray Silicone DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA, and SH8400 (trade name: manufactured by Toray Dow Corning Co., Ltd.), KP321, KP322, KP323, KP324, KP326, KP340, and KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452, and TSF4460 (manufactured by Momentive Performance Materials Japan LLC).
  • silicone surfactant having a fluorine atom examples include a surfactant having a siloxane bond and a fluorocarbon chain in the molecule. Specific examples include Megafac (registered trademark) R08, BL20, F475, F477, and F443 (manufactured by DIC Corporation).
  • the radical polymerizable composition of the present invention may contain various resin additives such as pigments, dyes, diluents, organic or inorganic fillers, leveling agents, surfactants, dispersants, defoamers, thickeners, flame retardants, surface modifiers, penetration promoters, moisture absorbents, moisturizers, fixing agents, antifungal agents, preservatives, antioxidants, UV absorbers, chelating agents, pH adjusters, stabilizers, lubricants, and plasticizers, within the scope of the present invention.
  • resin additives such as pigments, dyes, diluents, organic or inorganic fillers, leveling agents, surfactants, dispersants, defoamers, thickeners, flame retardants, surface modifiers, penetration promoters, moisture absorbents, moisturizers, fixing agents, antifungal agents, preservatives, antioxidants, UV absorbers, chelating agents, pH adjusters, stabilizers, lubricants, and plasticizers, within the scope of
  • a cured product can be obtained by irradiating the radical polymerizable composition of the present invention with light and polymerizing it.
  • the radical polymerizable composition when the radical polymerizable composition is irradiated with light to polymerize and photocure it, the radical polymerizable composition can be molded into a film and photocure it, or it can be molded into a block and photocure it.
  • the liquid radical polymerizable composition is applied to a substrate such as a polyester film using a bar coater or the like so as to have a film thickness of 5 to 300 microns.
  • the composition can be applied to a thinner or thicker film thickness by spin coating or screen printing.
  • the vinyl sulfide compound having a heterocycle represented by the general formula (1) of the present invention and the copolymerizable composition thereof have a low viscosity, so that they may be used as ink for inkjet printing.
  • a cured product can be obtained by irradiating a coating film or droplets of the radically polymerizable composition thus prepared with energy rays (ultraviolet rays) having a wavelength range of 300 nm to 500 nm at an intensity of about 1 to 1000 mW/cm 2.
  • energy rays ultraviolet rays
  • Examples of light sources that can be used include high-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halide lamps, xenon lamps, gallium-doped lamps, black lights, 405 nm ultraviolet LEDs, 395 nm ultraviolet LEDs, 385 nm ultraviolet LEDs, 365 nm ultraviolet LEDs, semiconductor lasers, blue LEDs, white LEDs, D bulbs and V bulbs manufactured by Fusion, Inc.
  • a single wavelength including a long wavelength range of 365 nm to 405 nm, such as a 405 nm ultraviolet LED, a 395 nm ultraviolet LED, a 385 nm ultraviolet LED, a 375 nm ultraviolet LED, or a 365 nm ultraviolet LED, and ultraviolet LEDs or semiconductor lasers with central wavelengths of 365 nm, 375 nm, 385 nm, 395 nm, or 405 nm are particularly preferred as the irradiation source.
  • a single wavelength including a long wavelength range of 365 nm to 405 nm, such as a 405 nm ultraviolet LED, a 395 nm ultraviolet LED, a 385 nm ultraviolet LED, a 375 nm ultraviolet LED, or a 365 nm ultraviolet LED
  • ultraviolet LEDs or semiconductor lasers with central wavelengths of 365 nm, 375 nm, 385 nm, 395 nm, or 405 nm are particularly
  • Viscosity measurement of compounds The viscosity was measured using an E-type viscometer TVE35H. A cone rotor of 1°34' ⁇ R24 was used, and after adjusting the gap between the sample cup and the cone rotor, 1.1 mL of sample was injected into the center of the sample cup using a syringe. The sample cup was then set in the viscometer body, and the cone rotor was rotated at 25° C. and 20 rpm. The value at which the viscosity became constant was taken as the viscosity value.
  • the transmittance at 430 nm of the thin film obtained on the glass substrate was measured using a UV-VIS SPECTROPHOTOMETER (Shimazu Corporation, "UV-2600").
  • YI value was calculated using a UV-VIS SPECTROPHOTOMETER (Shimazu Corporation, "UV-2600”) and color measurement software.
  • tack free test As a method for determining whether the radical polymerizable composition of the present invention has been photocured, there is a tack-free test (finger touch test). That is, when the radical polymerizable composition is irradiated with light, it is cured and the tack (stickiness) of the surface disappears, so whether it has been cured or not is confirmed by whether the tack (stickiness) has disappeared after the light irradiation.
  • UV exposure machine Model name: MATSUO, UV-LED CURE M/C, JVC-200-SC-N-POWER
  • Example 1 Photoradical polymerization of 2-vinylthiobenzoxazole 1 To 100 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and dissolved by applying ultrasonic waves.
  • OmniradTPO OmniradTPO
  • Megafac F-477 Megafac is a registered trademark of DIC Corporation
  • This radical polymerizable composition was formed into a film of 10 ⁇ m on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 365 nm at an illuminance of 100 mW and an exposure amount of 30 J/cm 2.
  • a wavelength of 365 nm at an illuminance of 100 mW and an exposure amount of 30 J/cm 2.
  • Example 2 Photoradical polymerization of 2-vinylthiobenzoxazole 2 To 100 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and dissolved by applying ultrasonic waves.
  • OmniradTPO OmniradTPO
  • Megafac F-477 Megafac is a registered trademark of DIC Corporation
  • This radical polymerizable composition was formed into a film of 10 ⁇ m on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 365 nm at an illuminance of 100 mW and an exposure amount of 3 J/cm 2.
  • a wavelength of 365 nm at an illuminance of 100 mW and an exposure amount of 3 J/cm 2.
  • Example 3 Photoradical polymerization of 2-vinylthiobenzoxazole 3 To 100 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and dissolved by applying ultrasonic waves.
  • OmniradTPO OmniradTPO
  • Megafac F-477 Megafac is a registered trademark of DIC Corporation
  • This radical polymerizable composition was formed into a film of 10 ⁇ m on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 365 nm at an illuminance of 100 mW and an exposure amount of 0.3 J/cm 2.
  • a wavelength of 365 nm at an illuminance of 100 mW and an exposure amount of 0.3 J/cm 2.
  • Example 4 Photoradical polymerization of 2-vinylthiobenzoxazole 4 To 100 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and dissolved by applying ultrasonic waves.
  • OmniradTPO OmniradTPO
  • Megafac F-477 Megafac is a registered trademark of DIC Corporation
  • This radical polymerizable composition was formed into a film of 10 ⁇ m on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 405 nm at an illuminance of 100 mW and an exposure amount of 30 J/cm 2.
  • a wavelength of 405 nm at an illuminance of 100 mW and an exposure amount of 30 J/cm 2.
  • Example 5 Photoradical polymerization of 2-vinylthiobenzoxazole 5 To 100 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and dissolved by applying ultrasonic waves.
  • OmniradTPO OmniradTPO
  • Megafac F-477 Megafac is a registered trademark of DIC Corporation
  • This radical polymerizable composition was formed into a film of 10 ⁇ m on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 405 nm at an illuminance of 100 mW and an exposure amount of 3 J/cm 2.
  • a wavelength of 405 nm at an illuminance of 100 mW and an exposure amount of 3 J/cm 2.
  • Example 6 Photoradical polymerization of 2-vinylthiobenzoxazole 6 To 100 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and the mixture was dissolved by applying ultrasonic waves.
  • OmniradTPO OmniradTPO
  • Megafac F-477 Megafac is a registered trademark of DIC Corporation
  • This radical polymerizable composition was formed into a film of 10 ⁇ m on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 405 nm at an illuminance of 100 mW and an exposure amount of 0.3 J/cm 2.
  • a wavelength of 405 nm at an illuminance of 100 mW and an exposure amount of 0.3 J/cm 2.
  • the liquid refractive index before curing was 1.62
  • the refractive index (n D ) after curing was 1.68
  • the visible light transmittance was 95%
  • the YI value was 0.3.
  • Example 7 Photoradical polymerization synthesis of 2-vinylthiobenzothiazole To 100 parts of 2-vinylthiobenzothiazole obtained by the same method as in Example 2, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and dissolved by applying ultrasonic waves.
  • OmniradTPO OmniradTPO
  • Megafac F-477 Megafac is a registered trademark of DIC Corporation
  • This photoradical polymerizable composition was formed into a film of 10 ⁇ m on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 365 nm at an illuminance of 100 mW and an exposure amount of 30 J/cm 2.
  • irradiating light with a wavelength of 365 nm at an illuminance of 100 mW and an exposure amount of 30 J/cm 2.
  • the compounds of the present invention have an extremely low viscosity of 10 mPa ⁇ s or less at 25° C., can be easily polymerized even with light of a single long wavelength such as 365 nm or 405 nm, and have an ultrahigh refractive index (n D ) of 1.67 to 1.71.
  • a polymer obtained by curing 2-vinylthiobenzoxazole in which A in general formula (1) is an oxygen atom has a low yellowness with a YI value of 3.5 to 2.1, and in particular, products cured with low exposure or at a long wavelength of 405 nm tend to show a low YI value of 1.9 to 0.3.
  • Example 8 Photoradical copolymerization of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide 1 50 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1 and 50 parts of 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) were mixed, 3 parts of OmniradTPO and 1 part of Megafac F-477 were added, and the mixture was dissolved by applying ultrasonic waves.
  • BMTPS 4,4'-bis(methacryloylthio)diphenyl sulfide
  • 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) were easily mixed together to form a uniform liquid phase.
  • BMTPS 4,4'-bis(methacryloylthio)diphenyl sulfide
  • the liquid refractive index before curing was 1.64
  • the refractive index after curing (n D ) was 1.68
  • the visible light transmittance was 91%
  • the YI was 2.4.
  • the 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) used was manufactured by Tokyo Chemical Industry Co., Ltd. This reagent is a white solid, and was dissolved in ethyl benzoate at several concentrations to measure the viscosity at 25°C.
  • the refractive index (n D ) of BMTPS was calculated to be 1.645 by extrapolation.
  • Example 9 Photoradical copolymerization of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide 2
  • a composition was prepared in the same manner as in Example 7, except that 40 parts of 2-vinylthiobenzoxazole and 60 parts of 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) were used, and exposure was performed in the same manner to obtain a polymer.
  • BMTPS 4,4'-bis(methacryloylthio)diphenyl sulfide
  • Example 10 Photoradical copolymerization of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide 3
  • a composition was prepared and exposed in the same manner as in Example 7, except that 40 parts of 2-vinylthiobenzoxazole, 60 parts of 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS), and the wavelength of the irradiated light were 405 nm, to obtain a polymer.
  • BMTPS 4,4'-bis(methacryloylthio)diphenyl sulfide
  • Example 11 Photoradical copolymerization of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide 4
  • the curing was carried out in the same manner as in Example 8, except that the exposure dose was 0.3 J/ cm2 .
  • the tackiness of the surface was checked after exposure, there was no tackiness.
  • the liquid refractive index before curing was 1.64
  • the refractive index after curing ( nD ) was 1.69
  • the visible light transmittance was 96%
  • the YI was 0.5.
  • Example 12 Photoradical copolymerization of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide 5
  • the curing was carried out in the same manner as in Example 9, except that the exposure dose was 0.3 J/ cm2 .
  • the tackiness of the surface was checked after exposure, there was no tackiness.
  • the liquid refractive index before curing was 1.64
  • the refractive index after curing ( nD ) was 1.69
  • the visible light transmittance was 96%
  • the YI was 1.0.
  • the copolymer composition of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS), which is the compound of the present invention can be easily polymerized even with light of a single long wavelength such as 365 nm or 405 nm, and the refractive index (n D ) of the obtained polymer is an ultra-high refractive index of 1.67 to 1.69.
  • BMTPS 4,4'-bis(methacryloylthio)diphenyl sulfide
  • the polymer obtained by curing the copolymer composition has a low yellowness index with a YI value of 3.5 or less, and in particular, it is found that the product cured with a low exposure dose or at a long wavelength of 405 nm shows a low YI value of 1.0 or less.
  • Example 14 Preparation of photoradical copolymerization composition of 2-vinylthiobenzoxazole and aryl sulfide 2 50 parts of 2-vinylthiobenzoxazole obtained in the same manner as in Synthesis Example 2 and 50 parts of 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) were mixed and dissolved by applying ultrasonic waves. The dissolution rate of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) was extremely fast, and they were easily mixed together to form a uniform liquid phase. The refractive index (n D ) of the composition was 1.64 and the viscosity was 20.2 mPa ⁇ s. The results are shown in Table 3 and Figure 1.
  • Example 15 Preparation of photoradical copolymerization composition of 2-vinylthiobenzoxazole and aryl sulfide 3 40 parts of 2-vinylthiobenzoxazole obtained in the same manner as in Synthesis Example 2 and 60 parts of 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) were mixed and dissolved by applying ultrasonic waves. The dissolution rate of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) was extremely fast, and they were easily mixed together to form a uniform liquid phase. The refractive index (n D ) of the composition was 1.64 and the viscosity was 32.5 mPa ⁇ s. The results are shown in Table 3 and Figure 1.
  • the viscosity reducing effect of the amount of 2-vinylthiobenzoxazole, a compound of the present invention, added to a copolymer composition of 2-vinylthiobenzoxazole, a compound of the present invention, and 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) is large, and the viscosity of the copolymer composition can be greatly reduced by adding a small amount.
  • the compound represented by the general formula (1) of the present invention is a radically polymerizable compound used as a transparent resin raw material suitable for optical applications, and is a radically polymerizable compound that not only has excellent curability but also has low viscosity, and the polymer obtained by curing has excellent flexibility and a high refractive index.

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Abstract

[Problem] To provide a radical-polymerizable composition that is used as a transparent resin source material suited for optical applications, wherein the radical-polymerizable composition not only has superior curability, but also has a low viscosity and a high refractive index, and the refractive index of a polymer that is obtained by curing the same can be adjusted. [Solution] A radical-polymerizable composition including: (A) a vinyl sulfide compound that has a heterocycle and is represented by general formula (1); an aryl sulfide compound that is represented by general formula (5); and (C) a radical polymerization initiator, said radical-polymerizable composition being characterized in that the refractive index (nD) at 25°C is 1.60 or greater.

Description

スルフィド化合物を含有する高屈折ラジカル重合性組成物Highly refractive radically polymerizable composition containing a sulfide compound

本発明は、スルフィド化合物を含有する高屈折ラジカル重合性組成物及びその重合物に関する The present invention relates to a highly refractive radically polymerizable composition containing a sulfide compound and a polymer thereof.

近年、液晶や有機ELを用いたディスプレイが多く用いられているが、これらのディスプレイの表面は、何層もの光学フィルムの積層体で覆われており、光取り出しやタッチパネルなどの機能を付与している。また、その基板もガラス基板から樹脂を用いたフレキシブル基板へと移りつつあり、その封止においても、種々のフィルムの積層体が用いられている。これらのディスプレイにおいて、外部からの光の制御や内部から発せられた光の制御は、ディスプレイの品質という点で非常に重要となってくる。 In recent years, displays using liquid crystal or organic electroluminescence (EL) have come into widespread use, and the surfaces of these displays are covered with a laminate of multiple layers of optical films, providing functions such as light extraction and touch panel functionality. The substrates used are also shifting from glass substrates to flexible substrates using resin, and various film laminates are used for sealing. In these displays, controlling the light from the outside and the light emitted from the inside is extremely important in terms of display quality.

一方、これらのフィルムの積層体は、それぞれ光に対する異なる屈折率を有しており、その屈折率の違いにより、様々な特性が発現したり、逆に様々な問題が生じたりしている。例えば、カラーフィルタにおいては、顔料種が異なると画素の屈折率がそれぞれ異なってしまい、オーバーコート層との界面で光の散乱が大きくなってしまい透過光の損失が生じてしまうという問題が生じる。また、フィルムの積層体は一般に粘着組成物で接着されるが、高屈折率材料の接合に一般的なアクリル系粘着剤を用いると、両者の屈折率差に起因して界面で反射が生じることが知られている。そのため、粘着剤の屈折率を調節するための屈折率調整剤が用いられる例が知られている。例えば、特許文献1には、トリアジン環を有する化合物をアクリル系ポリマーに添加して、屈折率1.55以上という高屈折率の粘着剤を開発している。 On the other hand, these film laminates each have a different refractive index for light, and the difference in refractive index can result in various characteristics or problems. For example, in a color filter, if the pigment type is different, the pixels will have different refractive indices, which can cause problems such as increased light scattering at the interface with the overcoat layer and loss of transmitted light. In addition, film laminates are generally bonded with an adhesive composition, but it is known that if a general acrylic adhesive is used to bond high refractive index materials, reflections will occur at the interface due to the difference in refractive index between the two. For this reason, there are known examples in which a refractive index adjuster is used to adjust the refractive index of the adhesive. For example, in Patent Document 1, a compound having a triazine ring is added to an acrylic polymer to develop an adhesive with a high refractive index of 1.55 or more.

また、ガスバリアフィルムをディスプレイの表面保護として用いると、プラスチック基材、蒸着薄膜層、ガスバリア被覆層と界面が2箇所あるため、干渉光による色ムラが発生し、外観上問題となっている。一般に、二つのフィルムの積層状態において、その屈折率の差が大きい程フィルムの接触面での反射が大きくなり、そのことにより、光取り出し上の問題が生じると考えられる。よって、積層するフィルム間の屈折率差を少なくする方法が検討されている。例えば、タッチパネルなどでは、可視光を透過するITO(IndiumTinOxide)という金属酸化物でパターニングしたフィルムが使用されているが、このITOは無機物であるため有機物に比べて光の反射率が高く、ITO表面と基材フィルム(PET)の反射率が異なるためITOパターンが可視化されるという問題がある。このように、樹脂フィルムは一般に屈折率が低く、フィルムの屈折率を高めるような試みが検討されている。例えば、特許文献2では、トリアジン骨格を有する(メタ) アクリレート化合物と、屈折率調整剤とを含無重合性組成物が開示されており、屈折率調整剤として、フルオレン骨格を有する(メタ)アクリレート化合物を用いることにより、硬化後の硬化物の589nmにおける屈折率が1.557以上、1.571以下の硬化物を得ている。このように、既存の重合性組成物の屈折率を高くすることができるような屈折率調整剤が求められている。 In addition, when a gas barrier film is used to protect the surface of a display, there are two interfaces with the plastic substrate, the evaporated thin film layer, and the gas barrier coating layer, so color unevenness occurs due to interference light, which is a problem in appearance. In general, when two films are laminated, the greater the difference in refractive index, the greater the reflection at the contact surface of the films, which is thought to cause problems with light extraction. Therefore, methods to reduce the difference in refractive index between the laminated films are being considered. For example, in touch panels, etc., films patterned with a metal oxide called ITO (Indium Tin Oxide), which transmits visible light, are used, but since this ITO is an inorganic material, it has a higher light reflectance than organic materials, and there is a problem that the ITO pattern becomes visible because the reflectance of the ITO surface and the substrate film (PET) differs. In this way, resin films generally have a low refractive index, and attempts to increase the refractive index of the film are being considered. For example, Patent Document 2 discloses a polymerizable composition that does not contain a (meth)acrylate compound having a triazine skeleton and a refractive index adjuster, and by using a (meth)acrylate compound having a fluorene skeleton as the refractive index adjuster, a cured product is obtained that has a refractive index at 589 nm of 1.557 or more and 1.571 or less. As such, there is a demand for a refractive index adjuster that can increase the refractive index of existing polymerizable compositions.

一般に、フィルムの屈折率とその原料となる重合性組成物の屈折率には正の相関関係にあり、高屈折率の重合物を得るためにはその重合性組成物を構成する重合性化合物が高屈折率であることが必要である。よって、既存の重合性化合物と共重合可能な高屈折率の重合性化合物を添加することにより、屈折率を高く調製できると考えられる。 In general, there is a positive correlation between the refractive index of a film and the refractive index of the polymerizable composition that is its raw material, and in order to obtain a polymer with a high refractive index, the polymerizable compound that makes up the polymerizable composition must have a high refractive index. Therefore, it is thought that a high refractive index can be achieved by adding a polymerizable compound with a high refractive index that can be copolymerized with existing polymerizable compounds.

重合性化合物の屈折率を高くする方法としては、分子構造中に芳香環を導入したり、ハロゲン原子(フッ素を除く)や硫黄原子を導入したりすることが既に広く知られている。例えば、分子構造中に芳香環を有する重合性化合物としては、例えば、ベンゼン環のほか、ビフェニル、ナフタレン、フルオレン、アントラセンなどの多環芳香環を有するものが知られている。しかし、分子構造中に単一のベンゼン環を有する重合性化合物では屈折率が十分でない。また、分子構造中にビフェニル、ナフタレン、フルオレン、アントラセンなどの多環芳香環を有する重合性化合物は、高屈折率が期待されるものの、殆どの場合に高粘度液体または結晶固体になるため溶解性などのハンドリング性が低下する問題がある。例えば、特許文献3には、屈折率が高く、かつアッベ数が低い硬化物を得ることができる硬化性組成物として、フルオレン骨格を有する(メタ)アクリレートを含む組成物が開示されている。その中で、9,9-ビス(4-(2-アクリロイルオキシエトキシ)フェニル)フルオレンの屈折率がnD:1.608であって、25℃における粘度が100000mPa・s以上である。 As a method for increasing the refractive index of a polymerizable compound, it is already widely known to introduce an aromatic ring into the molecular structure, or to introduce a halogen atom (excluding fluorine) or a sulfur atom. For example, as a polymerizable compound having an aromatic ring in the molecular structure, in addition to a benzene ring, those having a polycyclic aromatic ring such as biphenyl, naphthalene, fluorene, and anthracene are known. However, a polymerizable compound having a single benzene ring in the molecular structure does not have a sufficient refractive index. In addition, although a polymerizable compound having a polycyclic aromatic ring such as biphenyl, naphthalene, fluorene, and anthracene in the molecular structure is expected to have a high refractive index, in most cases it becomes a high-viscosity liquid or crystalline solid, and there is a problem that handling properties such as solubility are reduced. For example, Patent Document 3 discloses a composition containing a (meth)acrylate having a fluorene skeleton as a curable composition that can obtain a cured product with a high refractive index and a low Abbe number. Among them, 9,9-bis(4-(2-acryloyloxyethoxy)phenyl)fluorene has a refractive index nD of 1.608 and a viscosity at 25°C of 100,000 mPa·s or more.

更にまた、高い固有屈折率を有する硫黄原子を有する単量体組成物も報告されている。例えば、特許文献4には、硫黄原子を介して芳香族環を導入することで高屈折率化を図っている。特許文献5では、チオ(メタ)アクリレート モノマーを主体とする重合性組成物が開示されており、ビス[(4-メタクリロイルチオ)フェニル] サルファイドなどが開示されている。また、特許文献6には、低粘度、高屈折率でその単独重合体の耐熱性が高い、希釈用の新規な(メタ)アクリル酸エステルとして、メチルチオフェニル基を有する化合物が開示されている。特許文献7では、高屈折率の硬化物を形成可能であって、インクジェット法を適用可能である液状の硬化性インク組成物として、スルフィド化合物と硫黄化合物を含有する(メタ)アクリレート化合物とを用い、金属化合物ナノ結晶として酸化ジルコニウムナノ結晶を用いた重合性組成物が開示されている。 Furthermore, monomer compositions containing sulfur atoms with high intrinsic refractive index have also been reported. For example, in Patent Document 4, an aromatic ring is introduced via a sulfur atom to increase the refractive index. Patent Document 5 discloses a polymerizable composition mainly composed of a thio(meth)acrylate monomer, and bis[(4-methacryloylthio)phenyl]sulfide and the like are disclosed. Patent Document 6 discloses a compound containing a methylthiophenyl group as a new (meth)acrylic acid ester for dilution, which has low viscosity, high refractive index, and high heat resistance of its homopolymer. Patent Document 7 discloses a polymerizable composition that uses a sulfide compound and a (meth)acrylate compound containing a sulfur compound as a liquid curable ink composition that can form a cured product with a high refractive index and is applicable to the inkjet method, and uses zirconium oxide nanocrystals as the metal compound nanocrystals.

さらに、特許文献8には、屈折率が高く、芳香環を有する重合性化合物への溶解性が高く、かつ硬化物の可視光透過率が高い重合性化合物として、縮合環が、ナフタレン環、アントラセン環、ベンゾチアゾール環、ベンゾオキサゾール環、ベンゾイミダゾール環、フルオレン環およびフェナントレン環からなる群から選ばれる環を持つ(メタ)アクリル酸エステルが開示されている。そして、特許文献9には、高屈折率対称型(メタ)アクリル酸エステルの製造方法として、アリール基またはヘテロアリール基を有する(メタ)アクリル酸エステルが開示されており、ヘテロアリール基としてメルカプトベンゾチアゾール基を持つ化合物が開示されている。同様に、特許文献10には、硫黄原子含有(メタ)アクリル酸エステルとして、ベンゾチアゾール環を有する(メタ)アクリル酸エステル化合物が開示されている。しかし、これらの高屈折率を有するアクリルエステルはいずれも粘度が高いという問題を有している。 Furthermore, Patent Document 8 discloses a (meth)acrylic acid ester having a condensed ring selected from the group consisting of a naphthalene ring, an anthracene ring, a benzothiazole ring, a benzoxazole ring, a benzimidazole ring, a fluorene ring, and a phenanthrene ring, as a polymerizable compound having a high refractive index, high solubility in a polymerizable compound having an aromatic ring, and high visible light transmittance of the cured product. Patent Document 9 discloses a (meth)acrylic acid ester having an aryl group or a heteroaryl group as a method for producing a high refractive index symmetrical (meth)acrylic acid ester, and a compound having a mercaptobenzothiazole group as the heteroaryl group. Similarly, Patent Document 10 discloses a (meth)acrylic acid ester compound having a benzothiazole ring as a sulfur atom-containing (meth)acrylic acid ester. However, all of these acrylic esters having a high refractive index have the problem of high viscosity.

また、特許文献11には、ペンタエリスリトール骨格の四級炭素の4つの分子鎖のうち3つの分子鎖に、芳香環または芳香族複素環が導入されており、残りの一つに(メタ)アクリル基を導入した化合物が開示されている。芳香族複素環としてベンゾオキサゾール環、チエノオキサゾール環、チアゾロオキサゾール環、オキサゾロオキサゾール環、オキサゾロイミダゾール環、オキサゾロピリジン環、オキサゾロピリダジン環、オキサゾロピリミジン環、オキサゾロピラジン環、ナフトオキサゾール環、キノリノオキサゾール環、ジオキサゾロピラジン環、フェノキサジン環、ベンゾチアゾール環、フロチアゾール環、チエノチアゾール環、チアゾロチアゾール環、チアゾロイミダゾール環、チエノチアジアゾール環、チアゾロチアジアゾール環、チアゾロピリジン環、チアゾロピリダジン環、チアゾロピリミジン環、チアゾロピラジン環、ナフトチアゾール環、キノリノチアゾール環、及びフェノチアジン環が開示されている。その中で、チアゾロチアジアゾール環が開示されている。 Furthermore, Patent Document 11 discloses a compound in which an aromatic ring or aromatic heterocycle is introduced into three of the four molecular chains of a quaternary carbon of a pentaerythritol skeleton, and a (meth)acrylic group is introduced into the remaining one. As the aromatic heterocycle, a benzoxazole ring, a thienoxazole ring, a thiazolooxazole ring, an oxazolooxazole ring, an oxazoloimidazole ring, an oxazolopyridine ring, an oxazolopyridazine ring, an oxazolopyrimidine ring, an oxazolopyrazine ring, a naphthoxazole ring, a quinolinoxazole ring, a dioxazolopyrazine ring, a phenoxazine ring, a benzothiazole ring, a furothiazole ring, a thienothiazole ring, a thiazolothiazole ring, a thiazoloimidazole ring, a thienothiadiazole ring, a thiazolothiadiazole ring, a thiazolopyridine ring, a thiazolopyridazine ring, a thiazolopyrimidine ring, a thiazolopyrazine ring, a naphthothiazole ring, a quinolinothiazole ring, and a phenothiazine ring are disclosed. Among them, a thiazolothiadiazole ring is disclosed.

しかし、これらの高屈折率の重合性化合物は、アクリル酸エステルの構造をとるものがほとんどである。アクリル酸エステルとすることにより、透明性が期待でき、高い重合性が期待できる。しかし、その反面、粘度が高くなってしまうという欠点がある。例えば、特許文献12には、光学物品、特に調光フィルムの製造に有用な紫外線で硬化可能な高屈折率モノマーが開示されており、その中で、複素環式(メタ)アクリレートとして、ベンゾチアゾール基を有するメタ)アクリレートなどが開示されている。アクリル酸1,3-ビス(2-メルカプトベンゾチアゾイル)プロパン-2-イルの屈折率が1.629であり、粘度が860cPであり、アクリル酸2-(4-クロロフェノキシ)-1-[(フェニルチオ)メチル]エチルの屈折率が1.5792であり、粘度が352cPであることが記載されている。 However, most of these high refractive index polymerizable compounds have an acrylic acid ester structure. By using acrylic acid ester, transparency and high polymerizability can be expected. However, on the other hand, there is a drawback in that the viscosity becomes high. For example, Patent Document 12 discloses a high refractive index monomer that can be cured with ultraviolet light and is useful for manufacturing optical articles, particularly light control films, and among them, as a heterocyclic (meth)acrylate, a meth)acrylate having a benzothiazole group is disclosed. It is described that the refractive index of 1,3-bis(2-mercaptobenzothiazoyl)propan-2-yl acrylate is 1.629 and the viscosity is 860 cP, and that the refractive index of 2-(4-chlorophenoxy)-1-[(phenylthio)methyl]ethyl acrylate is 1.5792 and the viscosity is 352 cP.

一方、近年、ディスプレイなどの光学用途でこれらの高屈折の重合性化合物を用いる場合、インクジェットなどの塗布型で用いることが有望視されており、これらの高屈折重合性化合物を含む重合性組成物もインクジェットインクとして、低粘度であることも重要な因子として求められている。例えば、インクジェットインクとしては、30mPa・s以下というような低粘度の重合性組成物が求められており、高屈折率であり、重合性が高く、かつ低粘度である重合性化合物が期待されている。 On the other hand, in recent years, when these high refractive index polymerizable compounds are used in optical applications such as displays, it is considered promising to use them in coating methods such as inkjet printing, and low viscosity is also required as an important factor for polymerizable compositions containing these high refractive index polymerizable compounds as inkjet inks. For example, low viscosity polymerizable compositions of 30 mPa·s or less are required as inkjet inks, and polymerizable compounds that have a high refractive index, high polymerizability, and low viscosity are expected.

また、ビニルスルフィド基を有する重合性化合物も知られている。特許文献13には、ナノインプリント用組成物として、重合性官能基とジアリールスルフィド骨格を有する化合物が開示されており、重合性官能基として、ビニル基、アリル基、メタクリロイル基、アクリロイル基が開示されている。特許文献14~16には、フェニルビニルスルフィドを含む重合性組成物が開示されている。 Polymerizable compounds having a vinyl sulfide group are also known. Patent Document 13 discloses a compound having a polymerizable functional group and a diaryl sulfide skeleton as a composition for nanoimprinting, and discloses vinyl groups, allyl groups, methacryloyl groups, and acryloyl groups as the polymerizable functional groups. Patent Documents 14 to 16 disclose polymerizable compositions containing phenyl vinyl sulfide.

特許文献17及び18には、プラスチックレンズ材料として2-ビニルチオベンゾチアゾール及びジビニルベンゼン等のラジカル重合性化合物とを有機過酸及び/又はアゾ化合物を用いて、加熱下にラジカル重合することが記載されている。また、特許文献19には、有機エレクトロルミネッセンス材料として2-ビニルチオベンゾチアゾールを含む芳香族ヘテロ環を有する重合性化合物を有機過酸及び/又はアゾ化合物を用いて、加熱下にラジカル重合することが記載されている。いずれも熱ラジカル重合開始剤を用いているもので、本発明とはその組成が異なる。 Patent Documents 17 and 18 describe the use of an organic peracid and/or an azo compound to radically polymerize a plastic lens material such as 2-vinylthiobenzothiazole and a radical polymerizable compound such as divinylbenzene under heating. Patent Document 19 describes the use of an organic peracid and/or an azo compound to radically polymerize a polymerizable compound having an aromatic heterocycle, including 2-vinylthiobenzothiazole, under heating as an organic electroluminescence material. Both of these methods use a thermal radical polymerization initiator, and have different compositions from those of the present invention.

特開2023-38116号公報JP 2023-38116 A 特開2012-72316号公報JP 2012-72316 A 特開2019-14767号公報JP 2019-14767 A 特開2020-37693号公報JP 2020-37693 A 特開平9-25321号公報Japanese Patent Application Publication No. 9-25321 特開2017-190326号公報JP 2017-190326 A 特開2021-31669号公報JP 2021-31669 A 特開2018-104696号公報JP 2018-104696 A 特開2012-82145号公報JP 2012-82145 A 特開2023-32499号公報JP 2023-32499 A 特開2017-14213号公報JP 2017-14213 A 特開2005-133071号公報JP 2005-133071 A 特開2022-170092号公報JP 2022-170092 A 特開2022-128911号公報JP 2022-128911 A 国際公開第2018/062196号パンフレットInternational Publication No. 2018/062196 特開2021-55051号公報JP 2021-55051 A 特開平2-265907号公報Japanese Patent Application Publication No. 2-265907 特開平4-225007号公報Japanese Patent Application Publication No. 4-225007 特開2000-87027号公報JP 2000-87027 A

光学用途に適している透明な樹脂原料として用いられるラジカル重合性組成物であって、硬化性に優れているばかりでなく、低粘度で高屈折率であり、硬化して得られる重合物の屈折率を調整できるラジカル重合性組成物を提供することにある。 The object of the present invention is to provide a radical polymerizable composition that is used as a transparent resin raw material suitable for optical applications, and that not only has excellent curing properties, but also has a low viscosity and a high refractive index, and allows adjustment of the refractive index of the polymer obtained by curing.

本発明者らが鋭意検討した結果、樹脂原料として特定の構造を有するビニルスルフィド化合物と特定の構造を有するアリールスルフィド化合物を含有するラジカル重合性組成物が、低粘度で且つその屈折率が非常に高く、実用的な条件で容易に重合し、高屈折率の重合物を得ることができることを見出し、本発明の完成に至った。 As a result of intensive research, the inventors discovered that a radically polymerizable composition containing a vinyl sulfide compound having a specific structure and an aryl sulfide compound having a specific structure as resin raw materials has a low viscosity and a very high refractive index, and can be easily polymerized under practical conditions to give a polymer with a high refractive index, leading to the completion of the present invention.

第一の発明は、(A)一般式(1)で表される複素環を有するビニルスルフィド化合物、(B)一般式(5)で表されるアリールスルフィド化合物、(C)ラジカル重合開始剤、を含有するラジカル重合性組成物であって、当該ラジカル重合性組成物の25℃における屈折率(n)が1.60以上であることを特徴とする、ラジカル重合性組成物に存する。 A first invention resides in a radically polymerizable composition comprising (A) a vinyl sulfide compound having a heterocycle represented by general formula (1), (B) an aryl sulfide compound represented by general formula (5), and (C) a radical polymerization initiator, wherein the radically polymerizable composition has a refractive index (n D ) of 1.60 or more at 25° C.

Figure JPOXMLDOC01-appb-C000003
 
Figure JPOXMLDOC01-appb-C000003
 

一般式(1)において、Aは酸素原子または硫黄原子を表し、R、Rは、それぞれ独立して、水素原子、炭素数1から6のアルキル基、炭素数6から10のアリール基、炭素数1から6のアルコキシ基、炭素数6から10のアリールオキシ基、炭素数1から6のアルキルチオ基、炭素数6から10のアリールチオ基を表し、RとRが互いに結合して飽和又は不飽和の環を形成してもよい。 In general formula (1), A represents an oxygen atom or a sulfur atom, R 1 and R 2 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, or an arylthio group having 6 to 10 carbon atoms, and R 1 and R 2 may bond to each other to form a saturated or unsaturated ring.

Figure JPOXMLDOC01-appb-C000004
 
Figure JPOXMLDOC01-appb-C000004
 

一般式(5)において、Rは、(メタ)アクリル基又はビニル基を表し、nは0又は1から5の整数を表す。複数あるmは同一であっても異なっていてもよく、0又は1から4の整数を表し、Rは、炭素数1から3のアルキル基を表し、複数ある場合は同一であっても異なっていてもよい。そして、複数あるAは、同一であっても異なっていてもよく、酸素原子又は硫黄原子を表わす。 In the general formula (5), R3 represents a (meth)acrylic group or a vinyl group, n represents 0 or an integer of 1 to 5. Multiple m's may be the same or different and represent 0 or an integer of 1 to 4, R4 represents an alkyl group having 1 to 3 carbon atoms and may be the same or different when there are multiple R4's, and multiple A's may be the same or different and represent an oxygen atom or a sulfur atom.

第二の発明は、第一の発明に記載のラジカル重合性組成物において、(A)一般式(1)で表される複素環を有するビニルスルフィド化合物の含有量がラジカル重合性組成物全量100重量%に対して40重量%以上であることを特徴とする、ラジカル重合性組成物に存する。 The second invention is the radical polymerizable composition according to the first invention, characterized in that the content of (A) the vinyl sulfide compound having a heterocycle represented by general formula (1) is 40% by weight or more relative to 100% by weight of the total amount of the radical polymerizable composition.

第三の発明は、ラジカル重合性組成物の25℃における粘度が30mPa・s以下であることを特徴とする、第一の発明に記載のラジカル重合性組成物に存する。 The third invention is the radical polymerizable composition according to the first invention, characterized in that the viscosity of the radical polymerizable composition at 25°C is 30 mPa·s or less.

第四の発明は、(C)ラジカル重合開始剤が光ラジカル重合開始剤であることを特徴とする、第一の発明に記載のラジカル重合性組成物に存する。 The fourth invention is the radical polymerizable composition according to the first invention, characterized in that the radical polymerization initiator (C) is a photoradical polymerization initiator.

第五の発明は、第一乃至第四の発明のいずれかひとつに記載のラジカル重合性組成物に活性エネルギー線を照射する重合方法に存する。 The fifth invention is a polymerization method in which the radical polymerizable composition according to any one of the first to fourth inventions is irradiated with active energy rays.

第六の発明は、照射する活性エネルギー線が350nmから420nmの波長範囲にピーク波長を有することを特徴とする、第五の発明に記載の重合方法に存する。 The sixth invention is the polymerization method described in the fifth invention, characterized in that the irradiated active energy rays have a peak wavelength in the wavelength range of 350 nm to 420 nm.

第七の発明は、第一乃至第四の発明のいずれかひとつに記載のラジカル重合性組成物を重合してなる重合物であって、該重合物の25℃における屈折率(n)が1.60以上であることを特徴とする、重合物に存する。 A seventh invention relates to a polymer obtained by polymerizing the radically polymerizable composition according to any one of the first to fourth inventions, characterized in that the polymer has a refractive index ( nD ) of 1.60 or more at 25°C.

本発明において、(メタ)アクリレートとは、アクリレート又はメタクリレートを表し、(メタ)アクリロイルとは、アクリロイル又はメタクリロイルを、(メタ)アクリルとは、アクリル又はメタクリルを表す。また、本発明における屈折率とは、特に断らない限り、25℃におけるD線(589nm)に対する屈折率(n)を意味する。さらにまた、本発明における粘度とは、特に断らない限り、E型粘度計を使用して25℃で測定した値を意味する。 In the present invention, (meth)acrylate means acrylate or methacrylate, (meth)acryloyl means acryloyl or methacryloyl, and (meth)acrylic means acrylic or methacrylic. In addition, the refractive index in the present invention means the refractive index ( nD ) for the D line (589 nm) at 25°C unless otherwise specified. Furthermore, in the present invention, the viscosity means a value measured at 25°C using an E-type viscometer unless otherwise specified.

本発明のラジカル重合性組成物は、低粘度で且つ高屈折率で、実用的な条件で容易に重合し、本発明のラジカル重合性組成物を重合することにより超高屈折率を有した重合物を得ることができる。 The radically polymerizable composition of the present invention has a low viscosity and a high refractive index, and is easily polymerized under practical conditions. By polymerizing the radically polymerizable composition of the present invention, a polymer with an ultra-high refractive index can be obtained.

本発明の目的、特徴及び利点は、以下の詳細な説明によって、より明白となる。 The objects, features and advantages of the present invention will become more apparent from the detailed description below.

2-ビニルチオベンゾオキサゾールと4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)の共重合組成物における2-ビニルチオベンゾオキサゾールの添加割合と組成物の屈折率、粘度の関係を示した図。平滑線はプロットされた各点を滑らかに結んだものである。A graph showing the relationship between the ratio of 2-vinylthiobenzoxazole added in a copolymer composition of 2-vinylthiobenzoxazole and 4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) and the refractive index and viscosity of the composition. The smooth line smoothly connects each of the plotted points.

以下、本発明について詳細に説明する。 The present invention is described in detail below.

((A)一般式(1)で表される複素環を有するビニルスルフィド化合物)
本発明の複素環を有するビニルスルフィド化合物は、一般式(1)で表される。
((A) Vinyl sulfide compound having a heterocycle represented by general formula (1))
The vinyl sulfide compound having a heterocycle of the present invention is represented by general formula (1).

Figure JPOXMLDOC01-appb-C000005
 
Figure JPOXMLDOC01-appb-C000005
 

一般式(1)において、Aは酸素原子または硫黄原子を表し、R、Rは、それぞれ独立して、水素原子、炭素数1から6のアルキル基、炭素数6から10のアリール基、炭素数1から6のアルコキシ基、炭素数6から10のアリールオキシ基、炭素数1から6のアルキルチオ基、炭素数6から10のアリールチオ基を表し、RとRが互いに結合して飽和又は不飽和の環を形成してもよい。 In general formula (1), A represents an oxygen atom or a sulfur atom, R 1 and R 2 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, or an arylthio group having 6 to 10 carbon atoms, and R 1 and R 2 may bond to each other to form a saturated or unsaturated ring.

一般式(1)において、R、Rで表される炭素数1から6のアルキル基としては、直鎖アルキル基でもよく分枝のアルキル基でもよい。具体的には、メチル基、エチル基、n-プロピル基、イソプロピル基、n-ブチル基、イソブチル基、sec-ブチル基、t-ブチル基、n-ペンチル基、イソペンチル基、2-メチルブチル基、ネオペンチル基、1-エチルプロピル基、n-ヘキシル基、4-メチルペンチル基、3-メチルペンチル基、2-メチルペンチル基、1-メチルペンチル基、3,3-ジメチルブチル基、2,2-ジメチルブチル基、1,1-ジメチルブチル基、又は1,2-ジメチルブチル基等が挙げられる。 In general formula (1), the alkyl group having 1 to 6 carbon atoms represented by R 1 and R 2 may be a linear alkyl group or a branched alkyl group, and specific examples thereof include a methyl group, an ethyl group, an n-propyl group, an isopropyl group, an n-butyl group, an isobutyl group, a sec-butyl group, a t-butyl group, an n-pentyl group, an isopentyl group, a 2-methylbutyl group, a neopentyl group, a 1-ethylpropyl group, an n-hexyl group, a 4-methylpentyl group, a 3-methylpentyl group, a 2-methylpentyl group, a 1-methylpentyl group, a 3,3-dimethylbutyl group, a 2,2-dimethylbutyl group, a 1,1-dimethylbutyl group, and a 1,2-dimethylbutyl group.

炭素数6から10のアリール基としては、アリール基としては、置換基を有しても良いフェニル基、トリル基、ナフチル基等が挙げられる。炭素数1から6のアルコキシ基としては、メトキシ基、エトキシ基、プロポキシ基、ブトキシ基、ペントキシ基、ヘキシルオキシ基、シクロヘキシルオキシ基等の直鎖状、分枝鎖状又は環状のアルコキシ基等を挙げることができる。炭素数6から10のアリールオキシ基としては、置換基を有しても良いフェニルオキシ基、トリルオキシ基、ナフチルオキシ基等が挙げられる。炭素数1から6のアルキルチオ基としては、メチルチオ基、エチルチオ基、n-プロピルチオ基、i-プロピルチオ基、n-ブチルチオ基、i-ブチルチオ基、n-アミルチオ基、i-アミルチオ基、n-ヘキシルチオ基、シクロヘキシルチオ基等を挙げることができ、炭素数6から10のアリールチオ基としては、フェニルチオ基、ナフチルチオ基等が挙げられる。 Examples of aryl groups having 6 to 10 carbon atoms include phenyl, tolyl, and naphthyl groups, which may have a substituent. Examples of alkoxy groups having 1 to 6 carbon atoms include linear, branched, or cyclic alkoxy groups, such as methoxy, ethoxy, propoxy, butoxy, pentoxy, hexyloxy, and cyclohexyloxy groups. Examples of aryloxy groups having 6 to 10 carbon atoms include phenyloxy, tolyloxy, and naphthyloxy groups, which may have a substituent. Examples of alkylthio groups having 1 to 6 carbon atoms include methylthio, ethylthio, n-propylthio, i-propylthio, n-butylthio, i-butylthio, n-amylthio, i-amylthio, n-hexylthio, and cyclohexylthio groups. Examples of arylthio groups having 6 to 10 carbon atoms include phenylthio and naphthylthio groups.

一般式(1)において、Aが酸素原子である場合はベンゾオキサゾール基を有するビニルスルフィド化合物となり、Aが硫黄原子である場合はベンゾチアゾール基を有するビニルスルフィド化合物となる。 In general formula (1), when A is an oxygen atom, the vinyl sulfide compound has a benzoxazole group, and when A is a sulfur atom, the vinyl sulfide compound has a benzothiazole group.

一般式(1)におけるAが酸素原子であるベンゾオキサゾール基を有するビニルスルフィド化合物の具体的な例としては、2-ビニルチオベンゾオキサゾール、2-ビニルチオ-5-メチルベンゾオキサゾール、2-ビニルチオ-6-メチルベンゾオキサゾール、2-ビニルチオ-4-メチルベンゾオキサゾール、2-ビニルチオ-5,6-ジメチルベンゾオキサゾール、2-ビニルチオ-ナフト[2,1-d]ベンゾオキサゾール、2-ビニルチオ-ナフト[1,2-d]ベンゾオキサゾール、2-ビニルチオ-5-フェニルベンゾオキサゾール、2-ビニルチオ-5-tert-ブチルベンゾオキサゾール、2-ビニルチオ-4-メトキシベンゾオキサゾール、2-ビニルチオ-5-メトキシベンゾオキサゾール、2-ビニルチオ-6-メトキシベンゾオキサゾール、2-ビニルチオ-6-エトキシベンゾオキサゾール、2-ビニルチオ-4-メチルチオベンゾオキサゾール、2-ビニルチオ-5-メチルチオベンゾオキサゾール、2-ビニルチオ-6-メチルチオベンゾオキサゾール、2-ビニルチオ-6-エチルチオベンゾオキサゾール、2-ビニルチオ-6-フェニルチオベンゾオキサゾールなどが挙げられる。 Specific examples of vinyl sulfide compounds having a benzoxazole group in which A in general formula (1) is an oxygen atom include 2-vinylthiobenzoxazole, 2-vinylthio-5-methylbenzoxazole, 2-vinylthio-6-methylbenzoxazole, 2-vinylthio-4-methylbenzoxazole, 2-vinylthio-5,6-dimethylbenzoxazole, 2-vinylthio-naphtho[2,1-d]benzoxazole, 2-vinylthio-naphtho[1,2-d]benzoxazole, 2-vinylthio-5-phenylbenzoxazole, 2-vinyl Examples include thio-5-tert-butylbenzoxazole, 2-vinylthio-4-methoxybenzoxazole, 2-vinylthio-5-methoxybenzoxazole, 2-vinylthio-6-methoxybenzoxazole, 2-vinylthio-6-ethoxybenzoxazole, 2-vinylthio-4-methylthiobenzoxazole, 2-vinylthio-5-methylthiobenzoxazole, 2-vinylthio-6-methylthiobenzoxazole, 2-vinylthio-6-ethylthiobenzoxazole, and 2-vinylthio-6-phenylthiobenzoxazole.

一般式(1)におけるAが硫黄原子であるベンゾチアゾール基を有するビニルスルフィド化合物の具体的な例としては、2-ビニルチオベンゾチアゾール、2-ビニルチオ-5-メチルベンゾチアゾール、2-ビニルチオ-6-メチルベンゾチアゾール、2-ビニルチオ-4-メチルベンゾチアゾール、2-ビニルチオ-5,6-ジメチルベンゾチアゾール、2-ビニルチオ-ナフト[2,1-d]ベンゾチアゾール、2-ビニルチオ-ナフト[1,2-d]ベンゾチアゾール、2-ビニルチオ-5-フェニルベンゾチアゾール、2-ビニルチオ-5-tert-ブチルベンゾチアゾール、2-ビニルチオ-4-メトキシベンゾチアゾール、2-ビニルチオ-5-メトキシベンゾチアゾール、2-ビニルチオ-6-メトキシベンゾチアゾール、2-ビニルチオ-6-エトキシベンゾチアゾール、2-ビニルチオ-4-メチルチオベンゾチアゾール、2-ビニルチオ-5-メチルチオベンゾチアゾール、2-ビニルチオ-6-メチルチオベンゾチアゾール、2-ビニルチオ-6-エチルチオベンゾチアゾール、2-ビニルチオ-6-フェニルチオベンゾチアゾールなどが挙げられる。 Specific examples of vinyl sulfide compounds having a benzothiazole group in which A in general formula (1) is a sulfur atom include 2-vinylthiobenzothiazole, 2-vinylthio-5-methylbenzothiazole, 2-vinylthio-6-methylbenzothiazole, 2-vinylthio-4-methylbenzothiazole, 2-vinylthio-5,6-dimethylbenzothiazole, 2-vinylthio-naphtho[2,1-d]benzothiazole, 2-vinylthio-naphtho[1,2-d]benzothiazole, 2-vinylthio-5-phenylbenzothiazole, 2-vinyl Examples include 2-vinylthio-5-tert-butylbenzothiazole, 2-vinylthio-4-methoxybenzothiazole, 2-vinylthio-5-methoxybenzothiazole, 2-vinylthio-6-methoxybenzothiazole, 2-vinylthio-6-ethoxybenzothiazole, 2-vinylthio-4-methylthiobenzothiazole, 2-vinylthio-5-methylthiobenzothiazole, 2-vinylthio-6-methylthiobenzothiazole, 2-vinylthio-6-ethylthiobenzothiazole, and 2-vinylthio-6-phenylthiobenzothiazole.

上記例示した化合物の中でも下記構造式(2)の2-ビニルチオベンゾオキサゾールと構造式(3)の2-ビニルチオベンゾチアゾールが、合成が容易で、屈折率、粘度という点で好ましい。また、低露光量で重合すること、そしてその重合物の透過度が高く、黄色度が低いという点で、一般式(1)におけるAが酸素原子である化合物が好ましく、合成の容易さから構造式(2)の2-ビニルチオベンゾオキサゾールが特に好ましい。 Among the compounds given above as examples, 2-vinylthiobenzoxazole of the following structural formula (2) and 2-vinylthiobenzothiazole of the structural formula (3) are preferred in terms of ease of synthesis, refractive index, and viscosity. In addition, compounds in which A in general formula (1) is an oxygen atom are preferred in terms of polymerization at low exposure doses and the resulting polymer has high transmittance and low yellowness, and 2-vinylthiobenzoxazole of structural formula (2) is particularly preferred in terms of ease of synthesis.

Figure JPOXMLDOC01-appb-C000006
 
Figure JPOXMLDOC01-appb-C000006
 

Figure JPOXMLDOC01-appb-C000007
 
Figure JPOXMLDOC01-appb-C000007
 

(合成方法)
一般式(1)の化合物は、公知の方法で合成できる。例えば、下記反応式1に示したように、2-メルカプトベンゾオキサゾール化合物、2-メルカプトベンゾチアゾール化合物と1,2-ジブロモエタン等のジハロゲン化エタンを塩基存在下に反応させ、そののちに塩基存在下に脱ハロゲン化水素することにより、一般式(1)の化合物を合成できる。
(Synthesis Method)
The compound of general formula (1) can be synthesized by a known method. For example, as shown in the following reaction formula 1, a 2-mercaptobenzoxazole compound or a 2-mercaptobenzothiazole compound is reacted with a dihalogenated ethane such as 1,2-dibromoethane in the presence of a base, and then the resulting mixture is dehydrohalogenated in the presence of a base, thereby synthesizing the compound of general formula (1).

Figure JPOXMLDOC01-appb-C000008
 
Figure JPOXMLDOC01-appb-C000008
 

反応式1において、Aは酸素原子または硫黄原子を表し、R、Rは、それぞれ独立して、水素原子、炭素数1から6のアルキル基、炭素数6から10のアリール基、炭素数1から6のアルコキシ基、炭素数6から10のアリールオキシ基、炭素数1から6のアルキルチオ基、炭素数6から10のアリールチオ基を表し、RとRが互いに結合して飽和又は不飽和の環を形成してもよい。また、Xは、塩素原子または臭素原子を表し、二つあるXは、同一であっても異なっていてもよい。 In reaction formula 1, A represents an oxygen atom or a sulfur atom, R1 and R2 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, or an arylthio group having 6 to 10 carbon atoms, and R1 and R2 may be bonded to each other to form a saturated or unsaturated ring. X represents a chlorine atom or a bromine atom, and the two Xs may be the same or different.

通常は、一般式(4)の化合物とジハロゲン化エタンの反応によってチオール基が置換反応を起こしチオエーテル化合物が生成されるが、その後ほぼ同時にハロゲン化水素が脱離し二重結合を生成し、中間体を単離することなく、目的とする一般式(1)の複素環を有するビニルスルフィド化合物を得ることができる。 Normally, the reaction of the compound of general formula (4) with dihalogenated ethane causes a substitution reaction of the thiol group to produce a thioether compound, but almost simultaneously, the hydrogen halide is eliminated to produce a double bond, and the desired vinyl sulfide compound having a heterocycle of general formula (1) can be obtained without isolating the intermediate.

上記方法により合成された一般式(1)で表される複素環を有するビニルスルフィドは、極めて低粘度で、かつ高屈折率の化合物である。例えば、本発明の複素環を有するビニルスルフィドである2-ビニルチオベンゾオキサゾールは、液状化合物であり、その25℃における粘度は4.2mPa・sと極めて低粘度であり、その屈折率は、1.62と高い屈折率を示す。また、2-ビニルチオベンゾチアゾールも液状化合物であり、その25℃における粘度は7.6mPa・sと極めて低粘度であり、その屈折率は、1.68と非常に高い屈折率を示す。 The vinyl sulfide having a heterocycle represented by general formula (1) synthesized by the above method is a compound with extremely low viscosity and high refractive index. For example, 2-vinylthiobenzoxazole, which is a vinyl sulfide having a heterocycle of the present invention, is a liquid compound, has an extremely low viscosity of 4.2 mPa·s at 25°C, and exhibits a high refractive index of 1.62. 2-vinylthiobenzothiazole is also a liquid compound, has an extremely low viscosity of 7.6 mPa·s at 25°C, and exhibits a very high refractive index of 1.68.

また、本発明の一般式(1)で表される複素環を有するビニルスルフィドは、市販の光ラジカル重合開始剤を用いて重合硬化させることが可能であり、高圧水銀ランプのような光源だけでなく、紫外線LED、半導体レーザというような単一波長で照射エネルギーが弱い光源でも重合硬化する、極めて有用な重合性化合物であり、(メタ)アクリル酸エステルなどの他の重合性化合物との相溶性も極めて高く、混合することにより得られるラジカル重合性組成物もまた、粘度が低く保つことができ、得られる重合硬化物は、高屈折率を示す。高屈折率という点においては、2-ビニルチオベンゾチアゾール化合物が好ましい。また、2-ビニルチオベンゾオキサゾール化合物は低露光量で重合し、その重合物は、超高屈折率を示すとともに、高透過率で低YI(黄変度)であることから特に好ましい。 In addition, the vinyl sulfide having a heterocycle represented by the general formula (1) of the present invention can be polymerized and cured using a commercially available photoradical polymerization initiator, and is an extremely useful polymerizable compound that can be polymerized and cured not only with light sources such as high-pressure mercury lamps, but also with light sources with a single wavelength and weak irradiation energy such as ultraviolet LEDs and semiconductor lasers. It also has extremely high compatibility with other polymerizable compounds such as (meth)acrylic acid esters, and the radical polymerizable composition obtained by mixing it can also maintain a low viscosity, and the obtained polymerized and cured product exhibits a high refractive index. In terms of a high refractive index, 2-vinylthiobenzothiazole compounds are preferred. In addition, 2-vinylthiobenzoxazole compounds are particularly preferred because they are polymerized with a low amount of exposure, and the polymerized product exhibits an ultra-high refractive index, high transmittance, and low YI (yellowing index).

((B) 一般式(5)で表されるアリールスルフィド化合物) 
本発明のアリールスルフィド化合物は、一般式(5)で表される。
((B) Aryl sulfide compound represented by general formula (5))
The aryl sulfide compound of the present invention is represented by the general formula (5).

Figure JPOXMLDOC01-appb-C000009
 
Figure JPOXMLDOC01-appb-C000009
 

一般式(5)において、Rは、(メタ)アクリル基又はビニル基を表し、nは0又は1から5の整数を表す。複数あるmは同一であっても異なっていてもよく、0又は1から4の整数を表し、Rは、炭素数1から3のアルキル基を表し、複数ある場合は同一であっても異なっていてもよい。そして、複数あるAは、同一であっても異なっていてもよく、酸素原子又は硫黄原子を表わす。 In the general formula (5), R3 represents a (meth)acrylic group or a vinyl group, n represents 0 or an integer of 1 to 5. Multiple m's may be the same or different and represent 0 or an integer of 1 to 4, R4 represents an alkyl group having 1 to 3 carbon atoms and may be the same or different when there are multiple R4's, and multiple A's may be the same or different and represent an oxygen atom or a sulfur atom.

一般式(5)で表されるアリールスルフィドの具体例としては、4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド、4,4’-ビス(アクリロイルチオ)ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシメチルチオ)ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシメチルチオ)ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシエチルチオ)ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシエチルチオ)ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシブチルチオ)ジフェニルスルフィド、4,4′-ビス(アクリロイルオキシブチルチオ)ジフェニルスルフィド、4,4’-ビス(ビニルチオ)ジフェニルスルフィド、4,4’-ビス(アリルチオ)ジフェニルスルフィド、4,4’-ビス(メタクリロイルチオ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルチオ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシメチルチオ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシメチルチオ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシエチルチオ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシエチルチオ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシブチルチオ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシブチルチオ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(ビニルチオ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(アリルチオ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(メタクリロイルチオ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルチオ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4′-ビス(メタクリロイルオキシメチルチオ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシメチルチオ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシエチルチオ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシエチルチオ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシブチルチオ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシブチルチオ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(ビニルチオ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(アリルチオ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド等があげられる。 Specific examples of aryl sulfides represented by general formula (5) include 4,4'-bis(methacryloylthio)diphenyl sulfide, 4,4'-bis(acryloylthio)diphenyl sulfide, 4,4'-bis(methacryloyloxymethylthio)diphenyl sulfide, 4,4'-bis(acryloyloxymethylthio)diphenyl sulfide, 4,4'-bis(methacryloyloxyethylthio)diphenyl sulfide, 4,4'-bis(acryloyloxyethylthio)diphenyl sulfide, 4,4'-bis(methacryloyloxybutylthio)diphenyl sulfide, 4,4'-bis(acryloyloxybutylthio)diphenyl sulfide, and 4,4'-bis(vinylthio)diphenyl sulfide. , 4,4'-bis(allylthio)diphenyl sulfide, 4,4'-bis(methacryloylthio)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(acryloylthio)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(methacryloyloxymethylthio)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(acryloyloxymethylthio)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(methacryloyloxyethylthio)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(acryloyloxyethylthio)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(methacryloyloxybutylthio)-3,3' -dimethyl-diphenyl sulfide, 4,4'-bis(acryloyloxybutylthio)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(vinylthio)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(allylthio)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(methacryloylthio)-3,3',5,5'-tetramethyl-diphenyl sulfide, 4,4'-bis(acryloylthio)-3,3',5,5'-tetramethyl-diphenyl sulfide, 4,4'-bis(methacryloyloxymethylthio)-3,3',5,5'-tetramethyl-diphenyl sulfide, 4,4'-bis(methacryloyloxymethylthio)-3,3',5,5'-tetramethyl-diphenyl sulfide, 4,4'-bis(acryloyloxymethylthio)-3,3',5,5'-tetramethyl-diphenyl sulfide Examples include methyl diphenyl sulfide, 4,4'-bis (methacryloyloxyethylthio)-3,3',5,5'-tetramethyl diphenyl sulfide, 4,4'-bis (acryloyloxyethylthio)-3,3',5,5'-tetramethyl diphenyl sulfide, 4,4'-bis (methacryloyloxybutylthio)-3,3',5,5'-tetramethyl diphenyl sulfide, 4,4'-bis (acryloyloxybutylthio)-3,3',5,5'-tetramethyl diphenyl sulfide, 4,4'-bis (vinylthio)-3,3',5,5'-tetramethyl diphenyl sulfide, and 4,4'-bis (allylthio)-3,3',5,5'-tetramethyl diphenyl sulfide.

また、4,4’-ビス(メタクリロイルオキシ)ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシ)ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシメトキシ)ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシメトキシ)ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシエトキシ)ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシエトキシ)ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシブトキシ)ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシブトキシ)ジフェニルスルフィド、4,4’-ビス(ビニルオキシ)ジフェニルスルフィド、4,4’-ビス(アリルオキシ)ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシメトキシ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシメトキシ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシエトキシ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシエトキシ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシブトキシ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシブトキシ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(ビニルオキシ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(アリルオキシ)-3,3’-ジメチル-ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシメトキシ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシメトキシ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4′-ビス(メタクリロイルオキシエトキシ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシエトキシ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4′-ビス(メタクリロイルオキシブトキシ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシブトキシ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4’-ビス(ビニルオキシ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド、4,4′-ビス(アリルオキシ)-3,3’,5,5’-テトラメチル-ジフェニルスルフィド等があげられる。 In addition, 4,4'-bis(methacryloyloxy)diphenyl sulfide, 4,4'-bis(acryloyloxy)diphenyl sulfide, 4,4'-bis(methacryloyloxymethoxy)diphenyl sulfide, 4,4'-bis(acryloyloxymethoxy)diphenyl sulfide, 4,4'-bis(methacryloyloxyethoxy)diphenyl sulfide, 4,4'-bis(acryloyloxyethoxy)diphenyl sulfide, 4,4'-bis(methacryloyloxybutoxy)diphenyl sulfide, 4,4'-bis(acryloyloxybutoxy)diphenyl sulfide, 4,4'-bis(vinyloxy)diphenyl sulfide, 4,4'-bis(allyloxy)diphenyl sulfide 4,4'-bis(methacryloyloxy)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(acryloyloxy)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(methacryloyloxymethoxy)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(acryloyloxymethoxy)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(methacryloyloxyethoxy)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(acryloyloxyethoxy)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(methacryloyloxybutoxy)-3,3'-dimethyl-diphenyl sulfide 4,4'-bis(acryloyloxybutoxy)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(vinyloxy)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(allyloxy)-3,3'-dimethyl-diphenyl sulfide, 4,4'-bis(methacryloyloxy)-3,3',5,5'-tetramethyl-diphenyl sulfide, 4,4'-bis(acryloyloxy)-3,3',5,5'-tetramethyl-diphenyl sulfide, 4,4'-bis(methacryloyloxymethoxy)-3,3',5,5'-tetramethyl-diphenyl sulfide, 4,4'-bis(acryloyloxymethoxy)-3,3',5,5'-tetramethyl-diphenyl sulfide phenyl sulfide, 4,4'-bis(methacryloyloxyethoxy)-3,3',5,5'-tetramethyl-diphenyl sulfide, 4,4'-bis(acryloyloxyethoxy)-3,3',5,5'-tetramethyl-diphenyl sulfide, 4,4'-bis(methacryloyloxybutoxy)-3,3',5,5'-tetramethyl-diphenyl sulfide, 4,4'-bis(acryloyloxybutoxy)-3,3',5,5'-tetramethyl-diphenyl sulfide, 4,4'-bis(vinyloxy)-3,3',5,5'-tetramethyl-diphenyl sulfide, 4,4'-bis(allyloxy)-3,3',5,5'-tetramethyl-diphenyl sulfide, etc.

中でも4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド、4,4’-ビス(アクリロイルオキシエチルチオ)ジフェニルスルフィド、4,4’-ビス(ビニルチオ)ジフェニルスルフィド、4,4′-ビス(アクリロイルオキシ)ジフェニルスルフィド、4,4’-ビス(メタクリロイルオキシ)ジフェニルスルフィドが好ましく、特に、Rがメタクリル基であり、n、mは0であり、Aが硫黄原子である、4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィドが好ましい。 Among these, 4,4'-bis(methacryloylthio)diphenyl sulfide, 4,4'-bis(acryloyloxyethylthio)diphenyl sulfide, 4,4'-bis(vinylthio)diphenyl sulfide, 4,4'-bis(acryloyloxy)diphenyl sulfide, and 4,4'-bis(methacryloyloxy)diphenyl sulfide are preferred, and 4,4'-bis(methacryloylthio)diphenyl sulfide in which R3 is a methacryl group, n and m are 0, and A is a sulfur atom is particularly preferred.

一般式(5)で表されるアリールスルフィド化合物は、その構造にもよるが、一般的には、粘稠な液体か固体である場合が多く、重合するために、溶媒を用いるか低粘度の重合性化合物と混合して用いられる。例えば、4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィドは、試薬として入手可能であるが、白色結晶であり、融点は64℃である。また、4,4’-ビス(アクリロイルオキシエチルチオ)ジフェニルスルフィドは、比較的低粘度であるが、特開2011‐170073号公報の表1-1に、組成物の粘度であるが23℃の粘度が150mPa・sであることが記載されている。 The aryl sulfide compound represented by the general formula (5) is generally a viscous liquid or solid, depending on its structure, and is used in a solvent or mixed with a low-viscosity polymerizable compound for polymerization. For example, 4,4'-bis(methacryloylthio)diphenyl sulfide is available as a reagent, but is a white crystal with a melting point of 64°C. In addition, 4,4'-bis(acryloyloxyethylthio)diphenyl sulfide has a relatively low viscosity, but Table 1-1 of JP 2011-170073 A describes that the viscosity of the composition at 23°C is 150 mPa·s.

上記のように、アリールスルフィド化合物そのものは高屈折率を有するが、固体であるか高粘度の液体が多く、重合させる場合、アウトガスの問題等で溶媒を用いたくなく、また低粘度の重合性化合物と共重合させる場合は、低粘度の重合性化合物が低屈折率の場合が多く、共重合物として高屈折率の重合物を得ることが難しかった。 As mentioned above, aryl sulfide compounds themselves have a high refractive index, but many of them are solids or high-viscosity liquids, and when polymerizing them, it is undesirable to use a solvent due to issues such as outgassing. Also, when copolymerizing with a low-viscosity polymerizable compound, the low-viscosity polymerizable compound often has a low refractive index, making it difficult to obtain a copolymer with a high refractive index.

本発明の一般式(1)で表される複素環を有するビニルスルフィド化合物は、一般式(5)で表されるアリールスルフィド化合物との相溶性が高く、高屈折率であるだけでなく、非常に低粘度であるので、アリールスルフィド化合物に添加することにより、急激にその共重合組成物の粘度を低下でき、その共重合物の屈折率は極めて高いものとなる。図1からもわかるように、本発明の組成物において、その組成を規定することにより、例えば、屈折率1.60以上で、組成物の25℃の粘度が20mPa・s以下というよな、高屈折率低粘度のラジカル重合性組成物を得ることができる。 The vinyl sulfide compound having a heterocycle represented by the general formula (1) of the present invention is highly compatible with the aryl sulfide compound represented by the general formula (5), and not only has a high refractive index but also a very low viscosity, so that by adding it to the aryl sulfide compound, the viscosity of the copolymer composition can be rapidly reduced, and the refractive index of the copolymer becomes extremely high. As can be seen from Figure 1, by specifying the composition of the composition of the present invention, it is possible to obtain a radical polymerizable composition with a high refractive index and low viscosity, for example, a refractive index of 1.60 or more and a viscosity of the composition at 25°C of 20 mPa·s or less.

本発明のラジカル重合性組成物において、(A)一般式(1)で表されるビニルスルフィド化合物の添加割合は、ラジカル重合性組成物全量100重量%に対して、1重量%以上であることが好ましく、10重量%以上であることがさらに好ましく、共重合組成物の粘度という点では40重量%以上であることが特に好ましい。 In the radical polymerizable composition of the present invention, the addition ratio of the vinyl sulfide compound (A) represented by general formula (1) is preferably 1% by weight or more, more preferably 10% by weight or more, relative to 100% by weight of the total amount of the radical polymerizable composition, and particularly preferably 40% by weight or more in terms of the viscosity of the copolymer composition.

本発明のラジカル重合性組成物において、(A)一般式(1)で表される複素環を有するビニルスルフィド化合物と(B)一般式(5)で表されるアリールスルフィド化合物の組成比により、種々の屈折率や粘度を有する組成物を調製できる。所望の屈折率や粘度を得るために、好ましい組成比が選ばれる。例えば、(A)一般式(1)で表される複素環を有するビニルスルフィド化合物として2-ビニルチオベンゾオキサゾールを用い、(B)一般式(5)で表されるアリールスルフィド化合物として4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィドを用いた例で、25℃における粘度が30mPa・s以下の共重合性組成物を調製するには、図1より、2-ビニルチオベンゾオキサゾールの添加量を42重量%以上とすることにより、達成できることがわかる。この時の組成物の25℃における屈折率(n)は、1.65程度ある。 In the radical polymerizable composition of the present invention, compositions having various refractive indices and viscosities can be prepared by adjusting the composition ratio of (A) the vinyl sulfide compound having a heterocycle represented by general formula (1) and (B) the aryl sulfide compound represented by general formula (5). A preferred composition ratio is selected to obtain a desired refractive index and viscosity. For example, in an example in which 2-vinylthiobenzoxazole is used as the vinyl sulfide compound having a heterocycle represented by general formula (1) (A) and 4,4'-bis(methacryloylthio)diphenyl sulfide is used as the aryl sulfide compound represented by general formula (B) (B), it can be seen from FIG. 1 that a copolymerizable composition having a viscosity of 30 mPa·s or less at 25°C can be prepared by setting the amount of 2-vinylthiobenzoxazole to 42% by weight or more. The refractive index (n D ) of the composition at 25°C at this time is about 1.65.

本発明のアリールスルフィド化合物は、市販の4,4’-チオビスベンゼンチオール又は4,4’-チオジフェノールより、公知の方法で、合成することができる。 The aryl sulfide compound of the present invention can be synthesized from commercially available 4,4'-thiobisbenzenethiol or 4,4'-thiodiphenol by a known method.

本発明のラジカル重合性組成物には、本発明の効果を損なわない範囲で、(A)、(B)以外のラジカル重合性化合物を用いることができる。例えば、ビニルエーテル、一般式(1)以外のビニルスルフィド、(メタ)アクリル酸、(メタ)アクリロニトリル、単官能(メタ)アクリレート、単官能(メタ)アクリルアミド、多官能(メタ)アクリレート及び多官能(メタ)アクリルアミド等又はこれらのオリゴマーが挙げられる。 Radically polymerizable compounds other than (A) and (B) can be used in the radically polymerizable composition of the present invention, as long as the effects of the present invention are not impaired. Examples of such compounds include vinyl ethers, vinyl sulfides other than those of general formula (1), (meth)acrylic acid, (meth)acrylonitrile, monofunctional (meth)acrylates, monofunctional (meth)acrylamides, polyfunctional (meth)acrylates, polyfunctional (meth)acrylamides, and oligomers thereof.

中でも、単官能(メタ)アクリレート、多官能(メタ)アクリレートが好ましい。用いることができる単官能(メタ)アクリレートとしては、例えば、メチル(メタ)アクリレート、エチル(メタ)アクリレート、プロピル(メタ)アクリレート、イソプロピル(メタ)アクリレート、n-ブチル(メタ)アクリレート、イソブチル(メタ)アクリレート、ヒドロキシエチルアクリレート、tert-ブチル(メタ)アクリレート、2-エチルヘキシル(メタ)アクリレート、イソデシル(メタ)アクリレート、ラウリル(メタ)アクリレート、ステアリル(メタ)アクリレート、イソステアリル(メタ)アクリレート、トリデシル(メタ)アクリレート、メトキシエチル(メタ)アクリレート、エトキシエチル(メタ)アクリレート、プロポキシエチル(メタ)アクリレート、ブトキシエチル(メタ)アクリレート、メトキシジエチレングリコール(メタ)アクリレート、メトキシトリエチレングリコール(メタ)アクリレート、メトキシテトラエチレングリコール(メタ)アクリレート、2-(2-エトキシエトキシ)エチルアクリレート、フェノキシエチル(メタ)アクリレート、フェノキシジエチレングリコール(メタ)アクリレート、フェノキシテトラエチレングリコール(メタ)アクリレート、フェノキシヘキサエチレングリコール(メタ)アクリレート、メトキシジプロピレングリコール(メタ)アクリレート、メトキシトリプロピレングリコール(メタ)アクリレート、シクロヘキシル(メタ)アクリレート、tert-ブチルシクロヘキシル(メタ)アクリレート、ベンジル(メタ)アクリレート、フェノキシエチル(メタ)アクリレート、ジシクロペンタニル(メタ)アクリレート、ジシクロペンテニル(メタ)アクリレート、ボルニル(メタ)アクリレート、イソボルニ(メタ)アクリレート、テトラヒドロフルフリルアクリレート、2-メチル-2-アダマンチル(メタ)アクリレート、アリル(メタ)アクリレート、ヒドロキシエチル(メタ)アクリレート、ヒドロキシプロピル(メタ)アクリレート、ヒドロキシブチル(メタ)アクリレート、ヒドロキシヘキシル(メタ)アクリレート等が挙げられる。 Of these, monofunctional (meth)acrylates and polyfunctional (meth)acrylates are preferred. Examples of monofunctional (meth)acrylates that can be used include methyl (meth)acrylate, ethyl (meth)acrylate, propyl (meth)acrylate, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, hydroxyethyl acrylate, tert-butyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, isodecyl (meth)acrylate, lauryl (meth)acrylate, stearyl (meth)acrylate, isostearyl (meth)acrylate, tridecyl (meth)acrylate, methoxyethyl (meth)acrylate, ethoxyethyl (meth)acrylate, propoxyethyl (meth)acrylate, butoxyethyl (meth)acrylate, methoxydiethylene glycol (meth)acrylate, methoxytriethylene glycol (meth)acrylate, methoxytetraethylene glycol (meth)acrylate, 2-(2-ethoxyethoxy)ethyl acrylate, phenoxyethyl (meth)acrylate, methyl acrylate, ethyl ... Examples of the acrylates include ethyl (meth)acrylate, phenoxydiethylene glycol (meth)acrylate, phenoxytetraethylene glycol (meth)acrylate, phenoxyhexaethylene glycol (meth)acrylate, methoxydipropylene glycol (meth)acrylate, methoxytripropylene glycol (meth)acrylate, cyclohexyl (meth)acrylate, tert-butylcyclohexyl (meth)acrylate, benzyl (meth)acrylate, phenoxyethyl (meth)acrylate, dicyclopentanyl (meth)acrylate, dicyclopentenyl (meth)acrylate, bornyl (meth)acrylate, isobornyl (meth)acrylate, tetrahydrofurfuryl acrylate, 2-methyl-2-adamantyl (meth)acrylate, allyl (meth)acrylate, hydroxyethyl (meth)acrylate, hydroxypropyl (meth)acrylate, hydroxybutyl (meth)acrylate, and hydroxyhexyl (meth)acrylate.

  多官能(メタ)アクリレートとしては、例えば、エチレングリコールジ(メタ)アクリレート、ジエチレングリコールジ(メタ)アクリレート、プロピレングリコールジ(メタ)アクリレート、トリプロピレングリコールジ(メタ)アクリレート、ジテトラエチレングリコールジ(メタ)アクリレート、ポリエチレングリコールジ(メタ)アクリレート、ポリプロピレングリコールジ(メタ)アクリレート、ポリテトラメチレングリコールジ(メタ)アクリレート、1,3-ブタンジオールジ(メタ)アクリレート、1,4-ブタンジオールジ(メタ)アクリレート、ネオペンチルグリコールジ(メタ)アクリレート、1,6-ヘキサンジオールジ(メタ)アクリレート、1,7-ヘプタンジオールジ(メタ)アクリレート、1,8-オクタンジオールジ(メタ)アクリレート、1,9-ノナンジオールジ(メタ)アクリレート、ヒドロキシピバリン酸ネオペンチルグリコールジ(メタ)アクリレート、ジシクロペンタニルジ(メタ)アクリレート、カプロラクトン変性ジシクロペンテニルジ(メタ)アクリレート、エチレンオキシド変性リン酸ジ(メタ)アクリレート、ペンタエリスリトールテトラ(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレート、ジペンタエリスルトールヘキサ(メタ)アクリレート、ジペンタエリスリトールペンタ(メタ)アクリレート、ジペンタエリスリトールテトラ(メタ)アクリレート、トリメチロールエタントリ(メタ)アクリレート、トリメチロールプパントリ(メタ)アクリレート、トリシクロデカンジメタノールジ(メタ)アクリレート、エチレンオキサイド変性ビスフェノールAジ(メタ)アクリレート、プロピレンオキサイド変性ビスフェノールAジ(メタ)アクリレート、シクロヘキサンジメタノールジ(メタ)アクリレート、アクリレートエステル(ジオキサングリコールジアクリレート)、アルコキシ化ヘキサンジオールジ(メタ)アクリレート、アルコキシ化シクロヘキサンジメタノールジ(メタ)アクリレート、エポキシ(メタ)アクリレート、ウレタン(メタ)アクリレート等のモノマーとオリゴマーが挙げられる。また、市販品で入手容易の観点から、多官能(メタ)アクリレートとしては、例えばSARTOMER社製、商品名CN2203、CN2270、東亜合成社製、商品名M-6100、M-8060、ウレタンアクリレートとしては、例えば日本合成化学社製、商品名UV-3200B、UV-3000B、UV-6640B、UV-3700B、UV-3310B、UV-7000Bや新中村化学工業社製、商品名U-4HA、U-200PA、ダイセル・サイテック社製、商品名EBECRYL245、EBECRYL1259、EBECRYL8210、EBECRYL284、EBECRYL8402、SARTOMER社製、商品名CN944、CN969、CN9002、CN9029、根上工業社製、商品名UN1255、UN-5507、共栄社化学社製、商品名AH-600、UA-306I等を用いることができ、エポキシ(メタ)アクリレートとしては、ダイセル・サイテック社製、商品名EBECRYL1259、EBECRYL605、EBECRYL1606やSARTOMER社製、商品名CN110、CN120、CN153等を使用できる。さらに、樹脂組成物の粘度や取扱いの容易さ等の観点から、ウレタンアクリレートUV-6640BまたはU-200PAがより好ましい。これらの多官能(メタ)アクリレートは1種を単独で用いてもよいし、2種以上を組み合わせて用いてもよい。 Examples of polyfunctional (meth)acrylates include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, ditetraethylene glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, polypropylene glycol di(meth)acrylate, polytetramethylene glycol di(meth)acrylate, 1,3-butanediol di(meth)acrylate, meth)acrylate, 1,4-butanediol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, 1,7-heptanediol di(meth)acrylate, 1,8-octanediol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, hydroxypivalic acid neopentyl glycol di(meth)acrylate, dicyclopentanyl di(meth)acrylate, caprolactone-modified dicyclopentenyl di(meth)acrylate Examples of monomers and oligomers include bisphenol A di(meth)acrylate, ethylene oxide modified phosphate di(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol tri(meth)acrylate, dipentaerythritol hexa(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol tetra(meth)acrylate, trimethylolethane tri(meth)acrylate, trimethylolpropane tri(meth)acrylate, tricyclodecane dimethanol di(meth)acrylate, ethylene oxide modified bisphenol A di(meth)acrylate, propylene oxide modified bisphenol A di(meth)acrylate, cyclohexane dimethanol di(meth)acrylate, acrylate ester (dioxane glycol diacrylate), alkoxylated hexanediol di(meth)acrylate, alkoxylated cyclohexane dimethanol di(meth)acrylate, epoxy (meth)acrylate, and urethane (meth)acrylate. From the viewpoint of commercial availability, examples of polyfunctional (meth)acrylates include, for example, trade names CN2203 and CN2270 manufactured by SARTOMER, and trade names M-6100 and M-8060 manufactured by Toa Gosei Co., Ltd.; examples of urethane acrylates include, for example, trade names UV-3200B, UV-3000B, UV-6640B, UV-3700B, UV-3310B, and UV-7000B manufactured by Nippon Synthetic Chemical Industry Co., Ltd.; trade names U-4HA and U-200PA manufactured by Shin-Nakamura Chemical Co., Ltd.; and trade names EBECRYL245, EBECRYL1259, and EBECRYL260 manufactured by Daicel-Cytec Co., Ltd. Examples of the epoxy (meth)acrylate that can be used include ECRYL8210, EBECRYL284, EBECRYL8402, CN944, CN969, CN9002, and CN9029 manufactured by SARTOMER Co., Ltd., UN1255 and UN-5507 manufactured by Negami Chemical Industry Co., Ltd., and AH-600 and UA-306I manufactured by Kyoeisha Chemical Co., Ltd., and EBECRYL1259, EBECRYL605, and EBECRYL1606 manufactured by Daicel-Cytec Co., Ltd., and CN110, CN120, and CN153 manufactured by SARTOMER Co., Ltd. Furthermore, from the viewpoint of the viscosity of the resin composition, ease of handling, and the like, urethane acrylate UV-6640B or U-200PA is more preferable. These polyfunctional (meth)acrylates may be used alone or in combination of two or more.

((C)ラジカル重合開始剤)
本発明のラジカル重合性組成物には、ラジカル重合開始剤が添加される。ラジカル重合開始剤としては、特に限定されないが、硬化物の製造しやすさや解像性、パターン形成性の観点からは、光照射による重合硬化が好ましく、その意味で光ラジカル重合開始剤が好ましい。光ラジカル重合開始剤とは、光照射を受けてラジカルを発生する化合物、すなわち、光エネルギーを吸収し、分解および/または反応し、ラジカルを発生させるものを指し、熱によってラジカルを発生する化合物、すなわち、熱エネルギーを吸収し、分解してラジカル種を発生する化合物である、例えば、過酸化物系ラジカル重合開始剤、またはアゾ系ラジカル重合開始剤は、本発明の光ラジカル重合開始剤には含まれない。光ラジカル重合開始剤としては、一般に使用されるものであれば、特に制限なく使用可能であり、例えば、アルキルフェノン系光ラジカル重合開始剤、ベンゾフェノン系光ラジカル重合開始剤、アシルホスフィンオキサイド系光ラジカル重合開始剤、オキシムエステル系光ラジカル重合開始剤、α-アミノアセトフェノン系光ラジカル重合開始剤、ビイミダゾール系光ラジカル重合開始剤、トリアジン系光ラジカル重合開始剤及びチオキサントン系光ラジカル重合開始剤からなる群より選択されるいずれか一つ以上の光ラジカル重合開始剤を用いることができる。
((C) Radical Polymerization Initiator)
A radical polymerization initiator is added to the radical polymerizable composition of the present invention. The radical polymerization initiator is not particularly limited, but from the viewpoint of ease of production of the cured product, resolution, and pattern formability, polymerization curing by light irradiation is preferred, and in that sense, a photoradical polymerization initiator is preferred. The photoradical polymerization initiator refers to a compound that generates radicals when irradiated with light, that is, a compound that absorbs light energy, decomposes and/or reacts, and generates radicals. A compound that generates radicals by heat, that is, a compound that absorbs heat energy, decomposes, and generates radical species, for example, a peroxide-based radical polymerization initiator or an azo-based radical polymerization initiator, is not included in the photoradical polymerization initiator of the present invention. The photoradical polymerization initiator can be any commonly used one without any particular limitation, and for example, one or more photoradical polymerization initiators selected from the group consisting of alkylphenone-based photoradical polymerization initiators, benzophenone-based photoradical polymerization initiators, acylphosphine oxide-based photoradical polymerization initiators, oxime ester-based photoradical polymerization initiators, α-aminoacetophenone-based photoradical polymerization initiators, biimidazole-based photoradical polymerization initiators, triazine-based photoradical polymerization initiators, and thioxanthone-based photoradical polymerization initiators can be used.

アルキルフェノン系光ラジカル重合開始剤としては、例えば、2,2’-ジメトキシ-1,2-ジフェニルエタン-1-オン、1-ヒドロキシシクロヘキシルフェニル-ケトン、2-ヒドロキシ-2-メチル-1-フェニル-プロパン-1-オン、1-[4-(2-ヒドロキシエトキシ)-フェニル]-2-ヒドロキシ-2-メチル-1-プロパン-1-オン、2-ヒロドキシ-1-{4-[4-(2-ヒドロキシ-2-メチル-プロピオニル)-ベンジル]フェニル}-2-メチル-プロパン-1-オン、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン、2-ベンジルメチル-2-(ジメチルアミノ)-1-(4-モルホリノフェニル)-1-ブタノン、2-(ジメチルアミノ)-2-[(4-メチルフェニル)メチル]-1-(4-モルホリノフェニル)-1-ブタノン、2-(4-メチルベンジル)-2-(ジメチルアミノ)-1-(4-モルホリノフェニル)-1-ブタノン、N,N-ジメチルアミノアセトフェノンなどが挙げられる。 Examples of alkylphenone-based photoradical polymerization initiators include 2,2'-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxycyclohexylphenyl-ketone, 2-hydroxy-2-methyl-1-phenyl-propan-1-one, 1-[4-(2-hydroxyethoxy)-phenyl]-2-hydroxy-2-methyl-1-propan-1-one, 2-hydroxy-1-{4-[4-(2-hydroxy-2-methyl-propionyl)-benzyl]phenyl}-2-methyl-propan Examples include 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one, 2-benzylmethyl-2-(dimethylamino)-1-(4-morpholinophenyl)-1-butanone, 2-(dimethylamino)-2-[(4-methylphenyl)methyl]-1-(4-morpholinophenyl)-1-butanone, 2-(4-methylbenzyl)-2-(dimethylamino)-1-(4-morpholinophenyl)-1-butanone, and N,N-dimethylaminoacetophenone.

ベンゾフェノン系光ラジカル重合開始剤としては、例えば、ベンゾフェノン、p-メチルベンゾフェノン、ミヒラーズケトン、メチルベンゾフェノン、4,4’-ジクロロベンゾフェノン、4,4’-ビスジエチルアミノベンゾフェノン等が挙げられる。 Examples of benzophenone-based photoradical polymerization initiators include benzophenone, p-methylbenzophenone, Michler's ketone, methylbenzophenone, 4,4'-dichlorobenzophenone, and 4,4'-bisdiethylaminobenzophenone.

アシルホスフィンオキサイド系光ラジカル重合開始剤としては、例えば、2,4,6-トリメチルベンゾイル-ジフェニルホスフィンオキサイド(商品名「OmniradTPO」IGMGroupB.V.社製)、ビス(2,4,6-トリメチルベンゾイル)フェニルホスフィンオキサイド(商品名「Omnirad819」IGMGroupB.V.社製)等が挙げられる。 Examples of acylphosphine oxide-based photoradical polymerization initiators include 2,4,6-trimethylbenzoyl-diphenylphosphine oxide (trade name "Omnirad TPO" manufactured by IGM Group B.V.) and bis(2,4,6-trimethylbenzoyl)phenylphosphine oxide (trade name "Omnirad 819" manufactured by IGM Group B.V.).

オキシムエステル系光ラジカル重合開始剤としては、例えば、1,2-オクタンジオン、1-[4-(フェニルチオ)フェニル]-、2-(о-ベンゾイルオキシム)(商品名「IrgacureOXE01」BASF社製、IrgacureはBASF社の登録商標)、エタノン、1-[9-エチル-6-(2-メチルベンゾイル)-9H-カルバゾール-3-イル]-、1-(о-アセチルオキシム)(商品名「IrgacureOXE02」BASF社製)、[8-[[(アセチルオキシ)イミノ][2-(2,2,3,3-テトラフルオロプロポキシ)フェニル]メチル]-11-(2-エチルヘキシル)-11H-ベンゾ[a]カルバゾール-5-イル]-,(2,4,6-トリメチルフェニル)(商品名「IrgacureOXE03」BASF社製)等が挙げられる。 Examples of oxime ester photoradical polymerization initiators include 1,2-octanedione, 1-[4-(phenylthio)phenyl]-, 2-(o-benzoyloxime) (product name "IrgacureOXE01" manufactured by BASF, Irgacure is a registered trademark of BASF), ethanone, 1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-, 1-(o-acetone), ethyl oxime) (trade name "Irgacure OXE02" manufactured by BASF), [8-[[(acetyloxy)imino][2-(2,2,3,3-tetrafluoropropoxy)phenyl]methyl]-11-(2-ethylhexyl)-11H-benzo[a]carbazol-5-yl]-,(2,4,6-trimethylphenyl) (trade name "Irgacure OXE03" manufactured by BASF), etc.

α-アミノアセトフェノン系光ラジカル重合開始剤としては、例えば、2-メチル-1-[4-(メチルチオ)フェニル]-2-モルホリノプロパン-1-オン(商品名「Omnirad907」IGMGroupB.V.社製)、2-ベンジル-2-(ジメチルアミノ)-4’-モルフォリノブチロフェノン(商品名「Omnirad369」IGMGroupB.V.社製)、2-ジメチルアミノ-2-(4-メチルベンジル)-1-(4-モルフォリノ-4-イル-フェニル)ブタンー1-オン(商品名「Omnirad379」IGMGroupB.V.社製)等が挙げられる。 Examples of α-aminoacetophenone-based photoradical polymerization initiators include 2-methyl-1-[4-(methylthio)phenyl]-2-morpholinopropan-1-one (trade name "Omnirad 907" manufactured by IGM Group B.V.), 2-benzyl-2-(dimethylamino)-4'-morpholinobutyrophenone (trade name "Omnirad 369" manufactured by IGM Group B.V.), and 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholino-4-yl-phenyl)butan-1-one (trade name "Omnirad 379" manufactured by IGM Group B.V.).

ビイミダゾール系光ラジカル重合開始剤としては、例えば、2-(o-クロロフェニル)-4,5-ジフェニルイミダゾール二量体、2-(o-クロロフェニル)-4,5-ジ(メトキシフェニル)イミダゾール二量体、2-(o-フルオロフェニル)-4,5-ジフェニルイミダゾール二量体、2-(o-メトキシフェニル)-4,5-ジフェニルイミダゾール二量体、2-(p-メトキシフェニル)-4,5-ジフェニルイミダゾール二量体等の2,4,5-トリアリールイミダゾール二量体等が挙げられる。 Examples of biimidazole-based photoradical polymerization initiators include 2,4,5-triarylimidazole dimers such as 2-(o-chlorophenyl)-4,5-diphenylimidazole dimer, 2-(o-chlorophenyl)-4,5-di(methoxyphenyl)imidazole dimer, 2-(o-fluorophenyl)-4,5-diphenylimidazole dimer, 2-(o-methoxyphenyl)-4,5-diphenylimidazole dimer, and 2-(p-methoxyphenyl)-4,5-diphenylimidazole dimer.

トリアジン系光ラジカル重合開始剤としては、例えば、2-(3,4-メチレンジオキシフェニル)-4,6-ビス(トリクロロメチル)-1,3,5-トリアジン、2-(4-メトキシフェニル)-4,6-ビス(トリクロロメチル)-1,3,5-トリアジン等が挙げられる。 Examples of triazine-based photoradical polymerization initiators include 2-(3,4-methylenedioxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, etc.

チオキサントン系光ラジカル重合開始剤としては、例えば、2,4-ジエチルチオキサントン、2-イソプロピルチオキサントン等が挙げられる。 Examples of thioxanthone-based photoradical polymerization initiators include 2,4-diethylthioxanthone and 2-isopropylthioxanthone.

本発明で用いることができる、アルキルフェノン系光ラジカル重合開始剤、ベンゾフェノン系光ラジカル重合開始剤、アシルホスフィンオキサイド系光ラジカル重合開始剤、オキシムエステル系光ラジカル重合開始剤、α-アミノアセトフェノン系光ラジカル重合開始剤、ビイミダゾール系光ラジカル重合開始剤、トリアジン系光ラジカル重合開始剤、チオキサントン系光ラジカル重合開始剤はそれぞれ単独で用いることもできるが、用途等に合わせて、複数種類を合わせて用いることもできる。 The alkylphenone-based photoradical polymerization initiator, benzophenone-based photoradical polymerization initiator, acylphosphine oxide-based photoradical polymerization initiator, oxime ester-based photoradical polymerization initiator, α-aminoacetophenone-based photoradical polymerization initiator, biimidazole-based photoradical polymerization initiator, triazine-based photoradical polymerization initiator, and thioxanthone-based photoradical polymerization initiator that can be used in the present invention can each be used alone, or multiple types can be used in combination depending on the application, etc.

上記挙げた光ラジカル重合開始剤の中でも、ビイミダゾール系光ラジカル重合開始剤、アルキルフェノン系光ラジカル重合開始剤、アシルホスフィンオキサイド系光ラジカル重合開始剤およびオキシム系光ラジカル重合開始剤が好ましい。活性という点で、アシルホスフィンオキサイド系光ラジカル重合開始剤、オキシムエステル系光ラジカル重合開始剤が特に好ましい。 Among the photoradical polymerization initiators listed above, biimidazole-based photoradical polymerization initiators, alkylphenone-based photoradical polymerization initiators, acylphosphine oxide-based photoradical polymerization initiators, and oxime-based photoradical polymerization initiators are preferred. In terms of activity, acylphosphine oxide-based photoradical polymerization initiators and oxime ester-based photoradical polymerization initiators are particularly preferred.

光ラジカル重合開始剤の添加量は、ラジカル重合性組成物に対して、0.1重量%以上、10重量%以下であることが好ましい。 The amount of photoradical polymerization initiator added is preferably 0.1% by weight or more and 10% by weight or less relative to the radical polymerizable composition.

(光ラジカル重合増感剤)
光ラジカル重合における光源として、従来、高圧水銀ランプが用いられていたがその消費エネルギーが大きい等の問題から、ランニングコストが安く、自然環境への影響を小さいLED光源を用いた硬化装置が用いられるようになってきている。しかし、このLED光源は、その中心波長が、365nm 、385nm、395nm、405nmというような長波長の光を発するものが用いられ、そして、高圧水銀ランプとは異なり、単一波長の光を発するため照射エネルギーが弱いという問題がある。そのようなLEDランプでは、従来の光ラジカル重合開始剤では、十分に硬化できないことが多く発生している。そのような長波長、単一光のLEDランプに対応するため、光ラジカル重合増感剤をさらに添加することが好ましい。長波長の光を吸収する光ラジカル重合増感剤を添加することにより、光ラジカル重合開始剤のラジカル生成反応を促進させて、ラジカル重合の反応性を向上させることができる。
(Photoradical polymerization sensitizer)
Conventionally, high pressure mercury lamps have been used as light sources in photoradical polymerization, but due to problems such as high energy consumption, curing devices using LED light sources, which have low running costs and little impact on the natural environment, have come to be used. However, these LED light sources emit light with long wavelengths such as 365 nm, 385 nm, 395 nm, and 405 nm, and unlike high pressure mercury lamps, they emit light of a single wavelength, so there is a problem that the irradiation energy is weak. With such LED lamps, it is often the case that conventional photoradical polymerization initiators cannot sufficiently cure. In order to deal with such long wavelength, single light LED lamps, it is preferable to further add a photoradical polymerization sensitizer. By adding a photoradical polymerization sensitizer that absorbs long wavelength light, the radical generation reaction of the photoradical polymerization initiator can be promoted, and the reactivity of the radical polymerization can be improved.

  光ラジカル重合増感剤としては、照射波長の光に活性で一般に使用されるものであれば、特に制限なく使用可能であり、例えば、イソプロピルチ オキサントン、ジエチルチオキサントン等のチオキサントン系増感剤、4,4’-ビス(ジエチルアミノ)ベンゾフェノン等のベンゾフェノン系増感剤、9,10-ジエトキシアントラセン、9,10-ジブトキシアントラセン、9,10-ビスヘプタノイルオキシアントラセンおよび9,10-ビスオクタノイルオキシアントラセン等のアントラセン系増感剤、クマリン、ケトクマリン等のクマリン系増感剤、アクリジンオレンジ、カンファーキノンなどを用いることができる。 As the photoradical polymerization sensitizer, any commonly used sensitizer that is active to light of the irradiation wavelength can be used without any particular restrictions. For example, thioxanthone-based sensitizers such as isopropylthioxanthone and diethylthioxanthone, benzophenone-based sensitizers such as 4,4'-bis(diethylamino)benzophenone, anthracene-based sensitizers such as 9,10-diethoxyanthracene, 9,10-dibutoxyanthracene, 9,10-bisheptanoyloxyanthracene, and 9,10-bisoctanoyloxyanthracene, coumarin-based sensitizers such as coumarin and ketocoumarin, acridine orange, camphorquinone, etc. can be used.

  光ラジカル重合増感剤の添加量は、ラジカル重合性組成物に対して、0.1重量%以上、10重量%以下であることが好ましい。 The amount of the photoradical polymerization sensitizer added is preferably 0.1% by weight or more and 10% by weight or less relative to the radical polymerizable composition.

  本発明のラジカル重合性組成物には、用いる光ラジカル重合開始剤により、重合促進剤を含有してもよい。重合促進剤としては、例えば、p-ジメチルアミノ安息香酸エチル、p-ジメチルアミノ安息香酸-2-エチルヘキシル、p-ジメチルアミノ安息香酸メチル、安息香酸-2-ジメチルアミノエチル、p-ジメチルアミノ安息香酸ブトキシエチルといったアミン化合物があげられる。 The radically polymerizable composition of the present invention may contain a polymerization accelerator depending on the photoradical polymerization initiator used. Examples of the polymerization accelerator include amine compounds such as ethyl p-dimethylaminobenzoate, 2-ethylhexyl p-dimethylaminobenzoate, methyl p-dimethylaminobenzoate, 2-dimethylaminoethyl benzoate, and butoxyethyl p-dimethylaminobenzoate.

 また、 本発明のラジカル重合性組成物には、組成物の安定性を高めるために重合禁止剤を含有してもよい。重合禁止剤の例としては、ヒドロキノン、ハイドロキノンモノメチルエーテル、1,4-ベンゾキノン、tert-ブチルヒドロキノン、及び4-tert-ブチルピロカテコール等からなる群から選択される少なくとも一種の化合物が挙げられる。 The radical polymerizable composition of the present invention may also contain a polymerization inhibitor to enhance the stability of the composition. Examples of polymerization inhibitors include at least one compound selected from the group consisting of hydroquinone, hydroquinone monomethyl ether, 1,4-benzoquinone, tert-butylhydroquinone, and 4-tert-butylpyrocatechol.

更に、本発明のラジカル重合性組成物には、界面活性剤を含むことができ、界面活性剤としては非イオン性界面活性剤が好ましい。 非イオン性界面活性剤を含むことにより、ラジカル重合組成物を基材上に塗布して樹脂膜を得る際の塗布性が良好となり、均一な厚みの塗布膜を得ることができる。非イオン性界面活性剤は、たとえばフッ素基(たとえば、フッ素化アルキル基)もしくはシラノール基を含む化合物、またはシロキサン結合を主骨格とする化合物である。フッ素系界面活性剤またはシリコーン系界面活性剤を含むものを用いることが好ましい。フッ素系界面活性剤としては例えば、DIC(株)製のメガファックF-171、F-173、F-444、F-470、F-471、F-475、F-482、F-477、F-554、F-556、およびF-557、住友スリーエム(株)製のノベックFC4430、及びFC4432等が挙げられるが、これらに限定されない。シリコーン系界面活性剤としては、分子内にシロキサン結合を有する界面活性剤等が挙げられる。具体的には、トーレシリコーンDC3PA、同SH7PA、同DC11PA、同SH21PA、同SH28PA、同SH29PA、同SH30PA、同SH8400(商品名:東レ・ダウコーニング(株)製)、KP321、KP322、KP323、KP324、KP326、KP340、KP341(信越化学工業(株)製)、TSF400、TSF401、TSF410、TSF4300、TSF4440、TSF4445、TSF4446、TSF4452及びTSF4460(モメンティブ・パフォーマンス・マテリアルズ・ジャパン合同会社製)等が挙げられる。フッ素原子を有するシリコーン系界面活性剤としては、分子内にシロキサン結合及びフルオロカーボン鎖を有する界面活性剤等が挙げられる。具体的には、メガファック(登録商標)R08、同BL20、同F475、同F477及び同F443(DIC(株)製)等が挙げられる。 Furthermore, the radical polymerizable composition of the present invention may contain a surfactant, and the surfactant is preferably a nonionic surfactant.  By containing a nonionic surfactant, the coating properties when the radical polymerizable composition is applied to a substrate to obtain a resin film are improved, and a coating film of uniform thickness can be obtained. The nonionic surfactant is, for example, a compound containing a fluorine group (e.g., a fluorinated alkyl group) or a silanol group, or a compound having a siloxane bond as the main skeleton. It is preferable to use one containing a fluorine-based surfactant or a silicone-based surfactant. Examples of fluorine-based surfactants include, but are not limited to, Megafac F-171, F-173, F-444, F-470, F-471, F-475, F-482, F-477, F-554, F-556, and F-557 manufactured by DIC Corporation, and Novec FC4430 and FC4432 manufactured by Sumitomo 3M Limited. Silicone-based surfactants include surfactants having siloxane bonds in the molecule. Specific examples of the surfactant include Toray Silicone DC3PA, SH7PA, DC11PA, SH21PA, SH28PA, SH29PA, SH30PA, and SH8400 (trade name: manufactured by Toray Dow Corning Co., Ltd.), KP321, KP322, KP323, KP324, KP326, KP340, and KP341 (manufactured by Shin-Etsu Chemical Co., Ltd.), TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF4446, TSF4452, and TSF4460 (manufactured by Momentive Performance Materials Japan LLC). Examples of the silicone surfactant having a fluorine atom include a surfactant having a siloxane bond and a fluorocarbon chain in the molecule. Specific examples include Megafac (registered trademark) R08, BL20, F475, F477, and F443 (manufactured by DIC Corporation).

なお、本発明のラジカル重合性組成物は、本発明の効果を損なわない範囲において、上記以外に、顔料、染料、希釈剤、有機又は無機の充填剤、レベリング剤、界面活性剤、分散剤、消泡剤、増粘剤、難燃剤、表面改質剤、浸透促進剤、吸湿剤、保湿剤、定着剤、防黴剤、防腐剤、酸化防止剤、紫外線吸収剤、キレート剤、pH調整剤、安定剤、滑剤、可塑剤等の各種樹脂添加剤を配合してもよい。 In addition to the above, the radical polymerizable composition of the present invention may contain various resin additives such as pigments, dyes, diluents, organic or inorganic fillers, leveling agents, surfactants, dispersants, defoamers, thickeners, flame retardants, surface modifiers, penetration promoters, moisture absorbents, moisturizers, fixing agents, antifungal agents, preservatives, antioxidants, UV absorbers, chelating agents, pH adjusters, stabilizers, lubricants, and plasticizers, within the scope of the present invention.

(重合方法)
本発明のラジカル重合性組成物に光を照射したりして重合することにより、硬化物を得ることができる。例えば、ラジカル重合性組成物に光を照射し重合させ光硬化させる場合、当該ラジカル重合性組成物をフィルム状に成形して光硬化させることもできるし、塊状に成形して光硬化させることもできる。フィルム状に成形して光硬化させる場合は、液状の当該ラジカル重合性組成物を例えばポリエステルフィルムなどの基材にバーコーターなどを用いて膜厚5~300ミクロンになるように塗布する。一方、スピンコーティング法やスクリーン印刷法により、さらに薄い膜厚あるいは厚い膜厚にして塗布することもできる。本発明の一般式(1)で表される複素環を有するビニルスルフィド化合物及びその共重合性組成物は低粘度であるので、インクとしてインクジェット印刷に供してもよい。
(Polymerization method)
A cured product can be obtained by irradiating the radical polymerizable composition of the present invention with light and polymerizing it. For example, when the radical polymerizable composition is irradiated with light to polymerize and photocure it, the radical polymerizable composition can be molded into a film and photocure it, or it can be molded into a block and photocure it. When the composition is molded into a film and photocure it, the liquid radical polymerizable composition is applied to a substrate such as a polyester film using a bar coater or the like so as to have a film thickness of 5 to 300 microns. On the other hand, the composition can be applied to a thinner or thicker film thickness by spin coating or screen printing. The vinyl sulfide compound having a heterocycle represented by the general formula (1) of the present invention and the copolymerizable composition thereof have a low viscosity, so that they may be used as ink for inkjet printing.

このようにして調製したラジカル重合性組成物からなる塗膜又は液滴に、300nmから500nmの波長範囲を含むエネルギー線(紫外線)を1~1000mW/cm程度の強さで光照射することにより、硬化物を得ることができる。用いる光源としては、高圧水銀ランプ、超高圧水銀ランプ、メタルハライドランプ、キセノンランプ、ガリウムドープドランプ、ブラックライト、405nm紫外線LED、395nm紫外線LED、385nm紫外線LED、365nm紫外線LED、半導体レーザ、青色LED、白色LED、フュージョン社製のDバルブ、Vバルブ等が挙げられる。特に、405nm紫外線LED、395nm紫外線LED、385nm紫外線LED、375nm紫外線LED、365nm紫外線LEDのような波長が365nm~405nmというような長波長域の波長範囲を含む単一波長の光でも硬化することが特徴であり、中心波長が365nm、375nm、385nm、395nm、405nmの紫外LED又は半導体レーザが照射源として特に好ましい。 A cured product can be obtained by irradiating a coating film or droplets of the radically polymerizable composition thus prepared with energy rays (ultraviolet rays) having a wavelength range of 300 nm to 500 nm at an intensity of about 1 to 1000 mW/cm 2. Examples of light sources that can be used include high-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halide lamps, xenon lamps, gallium-doped lamps, black lights, 405 nm ultraviolet LEDs, 395 nm ultraviolet LEDs, 385 nm ultraviolet LEDs, 365 nm ultraviolet LEDs, semiconductor lasers, blue LEDs, white LEDs, D bulbs and V bulbs manufactured by Fusion, Inc. In particular, it is characterized by being cured even with light of a single wavelength including a long wavelength range of 365 nm to 405 nm, such as a 405 nm ultraviolet LED, a 395 nm ultraviolet LED, a 385 nm ultraviolet LED, a 375 nm ultraviolet LED, or a 365 nm ultraviolet LED, and ultraviolet LEDs or semiconductor lasers with central wavelengths of 365 nm, 375 nm, 385 nm, 395 nm, or 405 nm are particularly preferred as the irradiation source.

以下、実施例により本発明の具体的態様をさらに説明するが、本発明はその要旨を超えない限り、これらの実施例によって限定されるものではない。すなわち、以下の実施例は、網羅的であったり、記載した形態そのままに本発明を制限したりすることを意図したものではない。よって、本発明は、その趣旨を超えない限り、以下の記載例に限定されるものではない。また、特記しない限り、すべての部および百分率は重量基準である。 The following examples further illustrate specific aspects of the present invention, but the present invention is not limited to these examples as long as the gist of the invention is not exceeded. In other words, the following examples are not intended to be exhaustive or to limit the present invention to the exact form described. Therefore, the present invention is not limited to the following examples as long as the gist of the invention is not exceeded. Furthermore, all parts and percentages are by weight unless otherwise specified.

(化合物の同定)
得られた化合物の同定は、以下の機器を用いて測定した。
(1)H-NMR分析:核磁気共鳴装置(NMR)、日本電子社製、型式:JNM  ECS  400型  FT  NMR  Spectorometer)
(2)Massスペクトル:島津製作所社製、質量分析計、型式GCMS-QP2000等を用いて測定した。
(Identification of Compounds)
The identity of the obtained compound was determined using the following instruments.
(1) 1H -NMR analysis: Nuclear magnetic resonance apparatus (NMR), manufactured by JEOL Ltd., model: JNM ECS 400 type FT NMR Spectrometer)
(2) Mass spectrum: Measurement was performed using a mass spectrometer, model GCMS-QP2000, manufactured by Shimadzu Corporation.

(化合物の物性測定)
得られた化合物の物性測定
(1)粘度:E型粘度計(東気産業、TVE-35H)
(2)屈折率:屈折率計(測定条件:25℃、n
 ・液体の場合(1.50≦n≦1.70)
  機種名:ERMA社、ER-7MW-H
 ・液体/フィルム/薄膜の場合(1.30≦n≦1.70)
  機種名:アントンパール・ジャパン社、AbbematMw
・薄膜の場合(n>1.70)
  機種名:アタゴ社、DR-M4
(3)透過率:SHIMADZU, UV-2600 
(Measurement of physical properties of compounds)
Measurement of physical properties of the obtained compound (1) Viscosity: E-type viscometer (Toki Sangyo, TVE-35H)
(2) Refractive index: Refractometer (measurement conditions: 25° C., n D )
In the case of liquid (1.50≦n D ≦1.70)
Model name: ERMA, ER-7MW-H
For liquids/films/thin films (1.30≦n D ≦1.70)
Model name: Anton Paar Japan, AbbematMw
For thin films (n D >1.70)
Model name: Atago, DR-M4
(3) Transmittance: SHIMADZU, UV-2600

(化合物の粘度測定)
E型粘度計TVE35Hを用いて粘度を測定した。コーンローターは、1°34‘×R24を用い、サンプルカップとコーンローター間のギャップ調整をした後、サンプルカップ中央に1.1mLのサンプルをシリンジを用いて注入した。その後粘度計本体にサンプルカップをセットし、25℃、20rpmの条件でコーンローターを回転させた。その際、粘度が一定となった時の値を粘度値とした。
(Viscosity measurement of compounds)
The viscosity was measured using an E-type viscometer TVE35H. A cone rotor of 1°34'×R24 was used, and after adjusting the gap between the sample cup and the cone rotor, 1.1 mL of sample was injected into the center of the sample cup using a syringe. The sample cup was then set in the viscometer body, and the cone rotor was rotated at 25° C. and 20 rpm. The value at which the viscosity became constant was taken as the viscosity value.

(屈折率測定方法)
  液体(1.50≦n≦1.70)の場合、ERMA社製屈折率計ER-7MW-Hを用いて、25℃の条件で測定した。
液体/フィルム/薄膜(1.30≦n≦1.70)の場合、アントンパール・ジャパン社、AbbematMwを用いて、25℃の条件で測定した。
薄膜(n>1.70)の場合、アタゴ社、DR-M4を用いて25℃の条件で測定した。
(Refractive index measurement method)
In the case of a liquid (1.50≦n D ≦1.70), the measurement was performed at 25° C. using a refractometer ER-7MW-H manufactured by ERMA.
In the case of a liquid/film/thin film (1.30≦n D ≦1.70), the measurement was performed at 25° C. using AbbematMw manufactured by Anton Paar Japan.
In the case of a thin film (n D >1.70), the measurement was performed at 25° C. using Atago's DR-M4.

(透過率の測定方法)
ガラス基板上に得た薄膜の430nmにおける透過率を、UV-VIS SPECTROPHOTOMETER(SHIMAZU社製「UV-2600」)を用いて測定した。
(Method of measuring transmittance)
The transmittance at 430 nm of the thin film obtained on the glass substrate was measured using a UV-VIS SPECTROPHOTOMETER (Shimazu Corporation, "UV-2600").

(YI値の測定方法)
透過率と同じく、UV-VIS SPECTROPHOTOMETER(SHIMAZU社製「UV-2600」)を用いて、カラー測定ソフトを使用してYI値を算出した。
(Method of measuring YI value)
As with the transmittance, the YI value was calculated using a UV-VIS SPECTROPHOTOMETER (Shimazu Corporation, "UV-2600") and color measurement software.

(タック・フリー・テスト)
本発明のラジカル重合性組成物が光硬化したかどうかを判定する方法としては、タック・フリー・テスト(指触テスト)がある。すなわち、ラジカル重合性組成物に光を照射すると、硬化して表面のタック(べたつき)がなくなるため、光の照射後に、タック(べたつき)がなくなっているかどうかで硬化したかどうかを確認した。
(tack free test)
As a method for determining whether the radical polymerizable composition of the present invention has been photocured, there is a tack-free test (finger touch test). That is, when the radical polymerizable composition is irradiated with light, it is cured and the tack (stickiness) of the surface disappears, so whether it has been cured or not is confirmed by whether the tack (stickiness) has disappeared after the light irradiation.

(UV露光機)
機種名:MATSUO, UV-LED CURE M/C,JVC-200-SC-N-POWER
(UV exposure machine)
Model name: MATSUO, UV-LED CURE M/C, JVC-200-SC-N-POWER

[合成実施例1]
三つ口フラスコに2-メルカプトベンゾオキサゾール(50.00g、0.331mol)と1,2-ジブロモエタン(124.25g、0.661mol)、4-メチルテトラヒドロピラン(500g)を入れ、室温で攪拌混合した後、70℃まで昇温した。その後、DBU(ジアザビシクロウンデセン、100.69g、0.661mol)を滴下し、滴下終了してから3時間攪拌した。その後、反応液を常温まで冷やした後、析出した塩と副生物を減圧濾過で除去し、有機層を純水で洗浄し、無水硫酸マグネシウムで脱水・濾過した後、エバポレーターで溶媒を留去した。その後、減圧蒸留を実施し、目的物である2-ビニルチオベンゾオキサゾールを無色透明液体、収量17.1g、収率29%で得た。n=1.62、粘度(25℃):約4.2mPa・s。屈折率、粘度については表3に記載。
[Synthesis Example 1]
2-mercaptobenzoxazole (50.00 g, 0.331 mol), 1,2-dibromoethane (124.25 g, 0.661 mol), and 4-methyltetrahydropyran (500 g) were placed in a three-necked flask, stirred and mixed at room temperature, and then heated to 70°C. Then, DBU (diazabicycloundecene, 100.69 g, 0.661 mol) was added dropwise, and the mixture was stirred for 3 hours after the addition was completed. Then, the reaction solution was cooled to room temperature, and the precipitated salt and by-products were removed by vacuum filtration, the organic layer was washed with pure water, dehydrated and filtered with anhydrous magnesium sulfate, and the solvent was distilled off with an evaporator. Then, vacuum distillation was performed to obtain the target product, 2-vinylthiobenzoxazole, as a colorless transparent liquid, with a yield of 17.1 g and a yield of 29%. n D = 1.62, viscosity (25°C): about 4.2 mPa·s. The refractive index and viscosity are shown in Table 3.

[合成実施例2]
三つ口フラスコに2-メルカプトベンゾチアゾール(37.29g、0.223mol)と1,2-ジブロモエタン(83.77g、0.446mol)、4-メチルテトラヒドロピラン(186.4g)を入れ、室温で攪拌混合した後、70℃まで昇温した。その後、DBU(ジアザビシクロウンデセン、67.89g、0.446mol)を滴下し、滴下終了してから3時間攪拌した。その後、反応液を常温まで冷やした後、析出した塩と副生物を減圧濾過で除去し、有機層を純水で洗浄し、無水硫酸マグネシウムで脱水・濾過した後、エバポレーターで溶媒を留去した。その後、減圧蒸留を実施し、目的物である2-ビニルチオベンゾチアゾールを淡黄色透明液体、収量9.1g、収率24%で得た。n=1.69、粘度(25℃):約7.6mPa・s。屈折率、粘度については表3に記載。
[Synthesis Example 2]
2-mercaptobenzothiazole (37.29 g, 0.223 mol), 1,2-dibromoethane (83.77 g, 0.446 mol), and 4-methyltetrahydropyran (186.4 g) were placed in a three-necked flask, stirred and mixed at room temperature, and then heated to 70°C. Then, DBU (diazabicycloundecene, 67.89 g, 0.446 mol) was added dropwise, and the mixture was stirred for 3 hours after the dropwise addition was completed. Then, the reaction solution was cooled to room temperature, and the precipitated salt and by-products were removed by vacuum filtration, the organic layer was washed with pure water, dehydrated and filtered with anhydrous magnesium sulfate, and the solvent was distilled off with an evaporator. Then, vacuum distillation was performed to obtain the target product, 2-vinylthiobenzothiazole, as a pale yellow transparent liquid, with a yield of 9.1 g and a yield of 24%. n D = 1.69, viscosity (25°C): about 7.6 mPa·s. The refractive index and viscosity are shown in Table 3.

[実施例1]2-ビニルチオベンゾオキサゾールの光ラジカル重合1
合成実施例1と同様の方法で得た2-ビニルチオベンゾオキサゾール100部に対し、光ラジカル重合開始剤としてOmniradTPOを3部、フッ素系界面活性剤メガファックF-477(メガファックはDIC株式会社の登録商標)を1部添加し、超音波をかけて溶解させた。このラジカル重合性組成物をガラス基板上にバーコーターで10μmになるように製膜し、露光機内を窒素で置換後に波長365nmの光を照度100mWで露光量30J/cm照射して硬化させた。露光後に表面のタックを確認したところ、タックはなかった。硬化前の液屈折率は1.62であり、硬化後の屈折率(n)は1.67で、可視光透過率は92%、YI値は3.1であった。結果を表1と2に示す。
[Example 1] Photoradical polymerization of 2-vinylthiobenzoxazole 1
To 100 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and dissolved by applying ultrasonic waves. This radical polymerizable composition was formed into a film of 10 μm on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 365 nm at an illuminance of 100 mW and an exposure amount of 30 J/cm 2. When the tack of the surface was confirmed after exposure, there was no tack. The liquid refractive index before curing was 1.62, the refractive index after curing (n D ) was 1.67, the visible light transmittance was 92%, and the YI value was 3.1. The results are shown in Tables 1 and 2.

[実施例2]2-ビニルチオベンゾオキサゾールの光ラジカル重合2
合成実施例1と同様の方法で得た2-ビニルチオベンゾオキサゾール100部に対し、光ラジカル重合開始剤としてOmniradTPOを3部、フッ素系界面活性剤メガファックF-477(メガファックはDIC株式会社の登録商標)を1部添加し、超音波をかけて溶解させた。このラジカル重合性組成物をガラス基板上にバーコーターで10μmになるように製膜し、露光機内を窒素で置換後に波長365nmの光を照度100mWで露光量3J/cm照射して硬化させた。露光後に表面のタックを確認したところ、タックはなかった。硬化前の液屈折率は1.62であり、硬化後の屈折率(n)は1.67で、可視光透過率は92%、YI値は3.5であった。結果を表1に示す。
[Example 2] Photoradical polymerization of 2-vinylthiobenzoxazole 2
To 100 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and dissolved by applying ultrasonic waves. This radical polymerizable composition was formed into a film of 10 μm on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 365 nm at an illuminance of 100 mW and an exposure amount of 3 J/cm 2. When the tack of the surface was confirmed after exposure, there was no tack. The liquid refractive index before curing was 1.62, the refractive index after curing (n D ) was 1.67, the visible light transmittance was 92%, and the YI value was 3.5. The results are shown in Table 1.

[実施例3]2-ビニルチオベンゾオキサゾールの光ラジカル重合3
合成実施例1と同様の方法で得た2-ビニルチオベンゾオキサゾール100部に対し、光ラジカル重合開始剤としてOmniradTPOを3部、フッ素系界面活性剤メガファックF-477(メガファックはDIC株式会社の登録商標)を1部添加し、超音波をかけて溶解させた。このラジカル重合性組成物をガラス基板上にバーコーターで10μmになるように製膜し、露光機内を窒素で置換後に波長365nmの光を照度100mWで露光量0.3J/cm照射して硬化させた。露光後に表面のタックを確認したところ、タックはなかった。硬化前の液屈折率は1.62であり、硬化後の屈折率(n)は1.69で、可視光透過率は94%、YI値は2.1であった。結果を表1に示す。
[Example 3] Photoradical polymerization of 2-vinylthiobenzoxazole 3
To 100 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and dissolved by applying ultrasonic waves. This radical polymerizable composition was formed into a film of 10 μm on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 365 nm at an illuminance of 100 mW and an exposure amount of 0.3 J/cm 2. When the tack of the surface was confirmed after exposure, there was no tack. The liquid refractive index before curing was 1.62, the refractive index (n D ) after curing was 1.69, the visible light transmittance was 94%, and the YI value was 2.1. The results are shown in Table 1.

[実施例4]2-ビニルチオベンゾオキサゾールの光ラジカル重合4
合成実施例1と同様の方法で得た2-ビニルチオベンゾオキサゾール100部に対し、光ラジカル重合開始剤としてOmniradTPOを3部、フッ素系界面活性剤メガファックF-477(メガファックはDIC株式会社の登録商標)を1部添加し、超音波をかけて溶解させた。このラジカル重合性組成物をガラス基板上にバーコーターで10μmになるように製膜し、露光機内を窒素で置換後に波長405nmの光を照度100mWで露光量30J/cm照射して硬化させた。露光後に表面のタックを確認したところ、タックはなかった。硬化前の液屈折率は1.62であり、硬化後の屈折率(n)は1.67で、可視光透過率は94%、YI値は1.9であった。結果を表1に示す。
[Example 4] Photoradical polymerization of 2-vinylthiobenzoxazole 4
To 100 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and dissolved by applying ultrasonic waves. This radical polymerizable composition was formed into a film of 10 μm on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 405 nm at an illuminance of 100 mW and an exposure amount of 30 J/cm 2. When the tack of the surface was confirmed after exposure, there was no tack. The liquid refractive index before curing was 1.62, the refractive index after curing (n D ) was 1.67, the visible light transmittance was 94%, and the YI value was 1.9. The results are shown in Table 1.

[実施例5]2-ビニルチオベンゾオキサゾールの光ラジカル重合5
合成実施例1と同様の方法で得た2-ビニルチオベンゾオキサゾール100部に対し、光ラジカル重合開始剤としてOmniradTPOを3部、フッ素系界面活性剤メガファックF-477(メガファックはDIC株式会社の登録商標)を1部添加し、超音波をかけて溶解させた。このラジカル重合性組成物をガラス基板上にバーコーターで10μmになるように製膜し、露光機内を窒素で置換後に波長405nmの光を照度100mWで露光量3J/cm照射して硬化させた。露光後に表面のタックを確認したところ、タックはなかった。硬化前の液屈折率は1.62であり、硬化後の屈折率(n)は1.67で、可視光透過率は95%、YI値は1.8であった。結果を表1に示す。
[Example 5] Photoradical polymerization of 2-vinylthiobenzoxazole 5
To 100 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and dissolved by applying ultrasonic waves. This radical polymerizable composition was formed into a film of 10 μm on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 405 nm at an illuminance of 100 mW and an exposure amount of 3 J/cm 2. When the tack of the surface was confirmed after exposure, there was no tack. The liquid refractive index before curing was 1.62, the refractive index (n D ) after curing was 1.67, the visible light transmittance was 95%, and the YI value was 1.8. The results are shown in Table 1.

[実施例6]2-ビニルチオベンゾオキサゾールの光ラジカル重合6
合成実施例1と同様の方法で得た2-ビニルチオベンゾオキサゾール100部に対し、光ラジカル重合開始剤としてOmniradTPOを3部、フッ素系界面活性剤メガファックF-477(メガファックはDIC株式会社の登録商標)を1部添加し、超音波をかけて溶解させた。このラジカル重合性組成物をガラス基板上にバーコーターで10μmになるように製膜し、露光機内を窒素で置換後に波長405nmの光を照度100mWで露光量0.3J/cm照射して硬化させた。露光後に表面のタックを確認したところ、タックはなかった。硬化前の液屈折率は1.62であり、硬化後の屈折率(n)は1.68で、可視光透過率は95%、YI値は0.3であった。結果を表1に示す。
[Example 6] Photoradical polymerization of 2-vinylthiobenzoxazole 6
To 100 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and the mixture was dissolved by applying ultrasonic waves. This radical polymerizable composition was formed into a film of 10 μm on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 405 nm at an illuminance of 100 mW and an exposure amount of 0.3 J/cm 2. When the tack of the surface was confirmed after exposure, there was no tack. The liquid refractive index before curing was 1.62, the refractive index (n D ) after curing was 1.68, the visible light transmittance was 95%, and the YI value was 0.3. The results are shown in Table 1.

[実施例7]2-ビニルチオベンゾチアゾールの光ラジカル重合
合成実施例2と同様の方法で得た2-ビニルチオベンゾチアゾール100部に対し、光ラジカル重合開始剤としてOmniradTPOを3部、フッ素系界面活性剤メガファックF-477(メガファックはDIC株式会社の登録商標)を1部添加し、超音波をかけて溶解させた。この光ラジカル重合性組成物をガラス基板上にバーコーターで10μmになるように製膜し、露光機内を窒素で置換後に波長365nmの光を照度100mWで露光量30J/cm照射して硬化させた。露光後に表面のタックを確認したところ、タックはなかった。硬化前の液屈折率は1.68であり、硬化後の屈折率(n)は1.71で、可視光透過率は70%、YI値は15.5であった。結果を表1に示す。
[Example 7] Photoradical polymerization synthesis of 2-vinylthiobenzothiazole To 100 parts of 2-vinylthiobenzothiazole obtained by the same method as in Example 2, 3 parts of OmniradTPO as a photoradical polymerization initiator and 1 part of fluorosurfactant Megafac F-477 (Megafac is a registered trademark of DIC Corporation) were added, and dissolved by applying ultrasonic waves. This photoradical polymerizable composition was formed into a film of 10 μm on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 365 nm at an illuminance of 100 mW and an exposure amount of 30 J/cm 2. When the tack of the surface was confirmed after exposure, there was no tack. The liquid refractive index before curing was 1.68, the refractive index (n D ) after curing was 1.71, the visible light transmittance was 70%, and the YI value was 15.5. The results are shown in Table 1.

Figure JPOXMLDOC01-appb-T000010
 
Figure JPOXMLDOC01-appb-T000010
 

合成実施例1、2及び実施例1から7及び表1より明らかなように、本発明の化合物である2-ビニルチオベンゾオキサゾール及び2-ビニルチオベンゾチアゾールが、25℃の粘度が10mPa・s以下と極めて低粘度であり、365nm、405nmというような長波長の単一波長の光でも容易に重合可能なこと、そして得られた重合物の屈折率(n)が1.67~1.71と超高屈折率であることがわかる。そして、一般式(1)におけるAが酸素原子である2-ビニルチオベンゾオキサゾールを硬化させた重合物では、YI値が3.5~2.1と黄色度が低く、特に、低露光量や405nmという長波長での硬化物においては1.9~0.3と低YI値を示す傾向にあることがわかる。 As is clear from Synthesis Examples 1 and 2 and Examples 1 to 7 and Table 1, the compounds of the present invention, 2-vinylthiobenzoxazole and 2-vinylthiobenzothiazole, have an extremely low viscosity of 10 mPa·s or less at 25° C., can be easily polymerized even with light of a single long wavelength such as 365 nm or 405 nm, and have an ultrahigh refractive index (n D ) of 1.67 to 1.71. Furthermore, it can be seen that a polymer obtained by curing 2-vinylthiobenzoxazole in which A in general formula (1) is an oxygen atom has a low yellowness with a YI value of 3.5 to 2.1, and in particular, products cured with low exposure or at a long wavelength of 405 nm tend to show a low YI value of 1.9 to 0.3.

[実施例8]2-ビニルチオベンゾオキサゾールと4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィドとの光ラジカル共重合1
合成実施例1と同様の方法で得た2-ビニルチオベンゾオキサゾール50部と,4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)を50部を混合し、OmniradTPOを3部、メガファックF-477を1部添加し、超音波をかけて溶解させた。2-ビニルチオベンゾオキサゾールと4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)は簡単にまじりあい均一な液相となった。その後、調製したラジカル重合性組成物をガラス基板上にバーコーターで10μmになるように製膜し、露光機内を窒素で置換後に波長365nmの光を30J/cm照射して硬化させた。露光後に表面のタックを確認したところ、タックはなかった。硬化前の液屈折率は1.64であり、硬化後の屈折率(n)は1.68で、可視光透過率は91%、YIは2.4であった。なお、4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)は、東京化成工業株式会社製を使用した。該試薬は、白色固体で、安息香酸エチルに何点かの濃度で溶解して、25℃における粘度を測定し、補外処理することにより、BMTPSの屈折率(n)を計算したところ、1.645であった。
[Example 8] Photoradical copolymerization of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide 1
50 parts of 2-vinylthiobenzoxazole obtained by the same method as in Synthesis Example 1 and 50 parts of 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) were mixed, 3 parts of OmniradTPO and 1 part of Megafac F-477 were added, and the mixture was dissolved by applying ultrasonic waves. 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) were easily mixed together to form a uniform liquid phase. Thereafter, the prepared radical polymerizable composition was formed into a film of 10 μm on a glass substrate using a bar coater, and after replacing the inside of the exposure machine with nitrogen, it was cured by irradiating light with a wavelength of 365 nm at 30 J/cm 2. When the tack of the surface was confirmed after exposure, there was no tack. The liquid refractive index before curing was 1.64, the refractive index after curing (n D ) was 1.68, the visible light transmittance was 91%, and the YI was 2.4. The 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) used was manufactured by Tokyo Chemical Industry Co., Ltd. This reagent is a white solid, and was dissolved in ethyl benzoate at several concentrations to measure the viscosity at 25°C. The refractive index (n D ) of BMTPS was calculated to be 1.645 by extrapolation.

[実施例9]2-ビニルチオベンゾオキサゾールと4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィドとの光ラジカル共重合2
2-ビニルチオベンゾオキサゾールを40部と、4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)を60部とした以外は、実施例7と同様に組成物を調整し、同様に露光し、重合物を得た。露光後に表面のタックを確認したところ、タックはなかった。硬化前の液屈折率は1.64であり、硬化後の屈折率(n)は1.69で、可視光透過率は90%、YIは3.4であった。
[Example 9] Photoradical copolymerization of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide 2
A composition was prepared in the same manner as in Example 7, except that 40 parts of 2-vinylthiobenzoxazole and 60 parts of 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) were used, and exposure was performed in the same manner to obtain a polymer. When the tackiness of the surface was checked after exposure, there was no tackiness. The liquid refractive index before curing was 1.64, and the refractive index (n D ) after curing was 1.69, the visible light transmittance was 90%, and the YI was 3.4.

[実施例10]2-ビニルチオベンゾオキサゾールと4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィドとの光ラジカル共重合3
2-ビニルチオベンゾオキサゾールを40部と、4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)を60部とし、照射した光の波長を405nmとした以外は、実施例7と同様に組成物を調整し、同様に露光し、重合物を得た。露光後に表面のタックを確認したところ、タックはなかった。硬化前の液屈折率は1.64であり、硬化後の屈折率(n)は1.69で、可視光透過率は93%、YIは1.6であった。
[Example 10] Photoradical copolymerization of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide 3
A composition was prepared and exposed in the same manner as in Example 7, except that 40 parts of 2-vinylthiobenzoxazole, 60 parts of 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS), and the wavelength of the irradiated light were 405 nm, to obtain a polymer. When the tackiness of the surface was checked after exposure, no tackiness was found. The liquid refractive index before curing was 1.64, and the refractive index (n D ) after curing was 1.69, the visible light transmittance was 93%, and the YI was 1.6.

[実施例11]2-ビニルチオベンゾオキサゾールと4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィドとの光ラジカル共重合4
露光量を0.3J/cmにした以外は実施例8と同様にして硬化させた。露光後に表面のタックを確認したところ、タックはなかった。硬化前の液屈折率は1.64であり、硬化後の屈折率(n)は1.69で、可視光透過率は96%、YIは0.5であった。
[Example 11] Photoradical copolymerization of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide 4
The curing was carried out in the same manner as in Example 8, except that the exposure dose was 0.3 J/ cm2 . When the tackiness of the surface was checked after exposure, there was no tackiness. The liquid refractive index before curing was 1.64, the refractive index after curing ( nD ) was 1.69, the visible light transmittance was 96%, and the YI was 0.5.

[実施例12]2-ビニルチオベンゾオキサゾールと4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィドとの光ラジカル共重合5
露光量を0.3J/cmにした以外は実施例9と同様にして硬化させた。露光後に表面のタックを確認したところ、タックはなかった。硬化前の液屈折率は1.64であり、硬化後の屈折率(n)は1.69で、可視光透過率は96%、YIは1.0であった。
[Example 12] Photoradical copolymerization of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide 5
The curing was carried out in the same manner as in Example 9, except that the exposure dose was 0.3 J/ cm2 . When the tackiness of the surface was checked after exposure, there was no tackiness. The liquid refractive index before curing was 1.64, the refractive index after curing ( nD ) was 1.69, the visible light transmittance was 96%, and the YI was 1.0.

Figure JPOXMLDOC01-appb-T000011
 
Figure JPOXMLDOC01-appb-T000011
 

実施例8から12と表2より明らかなように、本発明の化合物である2-ビニルチオベンゾオキサゾールと4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)の共重合組成物は、365nm、405nmというような長波長の単一波長の光でも容易に重合可能なこと、そして得られた重合物の屈折率(n)が1.67~1.69と超高屈折率であることがわかる。また、該共重合組成物を硬化させた重合物では、YI値が3.5以下と黄色度が低く、特に、低露光量や405nmという長波長での硬化物においては1.0以下と低YI値を示すことがわかる。 As is clear from Examples 8 to 12 and Table 2, the copolymer composition of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS), which is the compound of the present invention, can be easily polymerized even with light of a single long wavelength such as 365 nm or 405 nm, and the refractive index (n D ) of the obtained polymer is an ultra-high refractive index of 1.67 to 1.69. In addition, the polymer obtained by curing the copolymer composition has a low yellowness index with a YI value of 3.5 or less, and in particular, it is found that the product cured with a low exposure dose or at a long wavelength of 405 nm shows a low YI value of 1.0 or less.

[実施例13]2-ビニルチオベンゾオキサゾールとアリールスルフィドとの光ラジカル共重合組成物の調製1
合成実施例2と同様の方法で得た2-ビニルチオベンゾオキサゾール90部と4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)を10部を混合し、超音波をかけて溶解させた。2-ビニルチオベンゾオキサゾールと4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)の溶解速度は極めて速く、簡単にまじりあい均一な液相となった。その組成物の屈折率(n)は1.63で粘度は5.4mPa・sであった。結果を表3と図1に記載。
[Example 13] Preparation of photoradical copolymerization composition of 2-vinylthiobenzoxazole and aryl sulfide 1
90 parts of 2-vinylthiobenzoxazole obtained in the same manner as in Synthesis Example 2 and 10 parts of 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) were mixed and dissolved by applying ultrasonic waves. The dissolution rate of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) was extremely fast, and they were easily mixed together to form a uniform liquid phase. The refractive index (n D ) of the composition was 1.63 and the viscosity was 5.4 mPa·s. The results are shown in Table 3 and Figure 1.

[実施例14]2-ビニルチオベンゾオキサゾールとアリールスルフィドとの光ラジカル共重合組成物の調製2
合成実施例2と同様の方法で得た2-ビニルチオベンゾオキサゾール50部と4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)を50部を混合し、超音波をかけて溶解させた。2-ビニルチオベンゾオキサゾールと4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)の溶解速度は極めて速く、簡単にまじりあい均一な液相となった。その組成物の屈折率(n)は1.64で粘度は20.2mPa・sであった。結果を表3と図1に記載。
[Example 14] Preparation of photoradical copolymerization composition of 2-vinylthiobenzoxazole and aryl sulfide 2
50 parts of 2-vinylthiobenzoxazole obtained in the same manner as in Synthesis Example 2 and 50 parts of 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) were mixed and dissolved by applying ultrasonic waves. The dissolution rate of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) was extremely fast, and they were easily mixed together to form a uniform liquid phase. The refractive index (n D ) of the composition was 1.64 and the viscosity was 20.2 mPa·s. The results are shown in Table 3 and Figure 1.

[実施例15]2-ビニルチオベンゾオキサゾールとアリールスルフィドとの光ラジカル共重合組成物の調製3
合成実施例2と同様の方法で得た2-ビニルチオベンゾオキサゾール40部と4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)を60部を混合し、超音波をかけて溶解させた。2-ビニルチオベンゾオキサゾールと4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)の溶解速度は極めて速く、簡単にまじりあい均一な液相となった。その組成物の屈折率(n)は1.64で粘度は32.5mPa・sであった。結果を表3と図1に記載。
[Example 15] Preparation of photoradical copolymerization composition of 2-vinylthiobenzoxazole and aryl sulfide 3
40 parts of 2-vinylthiobenzoxazole obtained in the same manner as in Synthesis Example 2 and 60 parts of 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) were mixed and dissolved by applying ultrasonic waves. The dissolution rate of 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) was extremely fast, and they were easily mixed together to form a uniform liquid phase. The refractive index (n D ) of the composition was 1.64 and the viscosity was 32.5 mPa·s. The results are shown in Table 3 and Figure 1.

Figure JPOXMLDOC01-appb-T000012
 
Figure JPOXMLDOC01-appb-T000012
 

表3と合成実施例1と実施例13~15より明らかなように、本発明の化合物である2-ビニルチオベンゾオキサゾールは、アリールスルフィドである4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)と容易に溶解混合し、共重合組成物を形成する。そして、図1から明らかなように、組成物の屈折率nは組成比と屈折率との間には加成性が成立し、その組成物の屈折率を調整可能であることがわかる。また、粘度の調整においては、本発明の化合物である2-ビニルチオベンゾオキサゾールと4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)の共重合組成物において本発明の化合物である2-ビニルチオベンゾオキサゾールの添加量における粘度低減効果は大きく、少量の添加で共重合組成物の粘度を大きく低減できる。例えば、2-ビニルチオベンゾオキサゾールと4,4’-ビス(メタクリロイルチオ)ジフェニルスルフィド(BMTPS)を用いた例で、25℃における粘度が20mPa・s以下の共重合性組成物を調製するには、図1より、2-ビニルチオベンゾオキサゾールの添加量を50重量%以上とすることにより、達成できることがわかる。 As is clear from Table 3, Synthesis Example 1, and Examples 13 to 15, 2-vinylthiobenzoxazole, a compound of the present invention, is easily dissolved and mixed with 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS), an aryl sulfide, to form a copolymer composition. As is clear from FIG. 1, the refractive index nD of the composition has an additivity between the composition ratio and the refractive index, and it is understood that the refractive index of the composition can be adjusted. In addition, in terms of viscosity adjustment, the viscosity reducing effect of the amount of 2-vinylthiobenzoxazole, a compound of the present invention, added to a copolymer composition of 2-vinylthiobenzoxazole, a compound of the present invention, and 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS) is large, and the viscosity of the copolymer composition can be greatly reduced by adding a small amount. For example, in the case of using 2-vinylthiobenzoxazole and 4,4'-bis(methacryloylthio)diphenyl sulfide (BMTPS), in order to prepare a copolymerizable composition having a viscosity of 20 mPa·s or less at 25°C, it is understood from FIG. 1 that this can be achieved by setting the amount of 2-vinylthiobenzoxazole to 50% by weight or more.

本発明の一般式(1)で示される化合物は、光学用途に適している透明な樹脂原料として用いられるラジカル重合性化合物であって、硬化性に優れているばかりでなく、低粘度であり、硬化して得られる重合物が柔軟性に優れ、高屈折率であるラジカル重合性化合物である。
 
 

 
The compound represented by the general formula (1) of the present invention is a radically polymerizable compound used as a transparent resin raw material suitable for optical applications, and is a radically polymerizable compound that not only has excellent curability but also has low viscosity, and the polymer obtained by curing has excellent flexibility and a high refractive index.



Claims (7)

(A)一般式(1)で表される複素環を有するビニルスルフィド化合物、
(B)一般式(5)で表されるアリールスルフィド化合物、
(C)ラジカル重合開始剤、
を含有するラジカル重合性組成物であって、
当該ラジカル重合性組成物の25℃における屈折率(n)が1.60以上であることを特徴とする、ラジカル重合性組成物。
Figure JPOXMLDOC01-appb-C000001
 
(一般式(1)において、Aは酸素原子または硫黄原子を表し、R、Rは、それぞれ独立して、水素原子、炭素数1から6のアルキル基、炭素数6から10のアリール基、炭素数1から6のアルコキシ基、炭素数6から10のアリールオキシ基、炭素数1から6のアルキルチオ基、炭素数6から10のアリールチオ基を表し、RとRが互いに結合して飽和又は不飽和の環を形成してもよい。)
Figure JPOXMLDOC01-appb-C000002
 
(一般式(5)において、Rは、(メタ)アクリル基又はビニル基を表し、nは0又は1から5の整数を表す。複数あるmは同一であっても異なっていてもよく、0又は1から4の整数を表し、Rは、炭素数1から3のアルキル基を表し、複数ある場合は同一であっても異なっていてもよい。そして、複数あるAは、同一であっても異なっていてもよく、酸素原子又は硫黄原子を表わす。)
(A) a vinyl sulfide compound having a heterocycle represented by general formula (1),
(B) an aryl sulfide compound represented by general formula (5),
(C) a radical polymerization initiator,
A radically polymerizable composition comprising:
The radical polymerizable composition is characterized in that the refractive index (n D ) of the radical polymerizable composition at 25° C. is 1.60 or more.
Figure JPOXMLDOC01-appb-C000001

(In general formula (1), A represents an oxygen atom or a sulfur atom, R 1 and R 2 each independently represent a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, an aryloxy group having 6 to 10 carbon atoms, an alkylthio group having 1 to 6 carbon atoms, or an arylthio group having 6 to 10 carbon atoms, and R 1 and R 2 may be bonded to each other to form a saturated or unsaturated ring.)
Figure JPOXMLDOC01-appb-C000002

(In the general formula (5), R3 represents a (meth)acrylic group or a vinyl group, n represents 0 or an integer of 1 to 5, m, which may be the same or different, represents 0 or an integer of 1 to 4, R4 represents an alkyl group having 1 to 3 carbon atoms, which may be the same or different when there are multiple R4s, and A, which may be the same or different, represents an oxygen atom or a sulfur atom.)
請求項1に記載のラジカル重合性組成物において、(A)一般式(1)で表される複素環を有するビニルスルフィド化合物の含有量がラジカル重合性組成物全量100重量%に対して40重量%以上であることを特徴とする、ラジカル重合性組成物 The radical polymerizable composition according to claim 1, characterized in that the content of (A) the vinyl sulfide compound having a heterocycle represented by general formula (1) is 40% by weight or more relative to 100% by weight of the total amount of the radical polymerizable composition. ラジカル重合性組成物の25℃における粘度が30mPa・s以下であることを特徴とする、請求項1に記載のラジカル重合性組成物。 The radical polymerizable composition according to claim 1, characterized in that the viscosity of the radical polymerizable composition at 25°C is 30 mPa·s or less. (C)ラジカル重合開始剤が光ラジカル重合開始剤であることを特徴とする、請求項1に記載のラジカル重合性組成物。 The radical polymerizable composition according to claim 1, characterized in that the radical polymerization initiator (C) is a photoradical polymerization initiator. 請求項1乃至4のいずれか一項に記載のラジカル重合性組成物に活性エネルギー線を照射する重合方法。 A polymerization method comprising irradiating the radically polymerizable composition according to any one of claims 1 to 4 with active energy rays. 照射する活性エネルギー線が350nmから420nmの波長範囲にピーク波長を有することを特徴とする、請求項5に記載の重合方法。 The polymerization method according to claim 5, characterized in that the active energy rays irradiated have a peak wavelength in the wavelength range of 350 nm to 420 nm. 請求項1乃至4のいずれか一項に記載のラジカル重合性組成物を重合してなる重合物であって、該重合物の25℃における屈折率(n)が1.60以上であることを特徴とする、重合物。
 

 
A polymer obtained by polymerizing the radically polymerizable composition according to claim 1 , wherein the polymer has a refractive index (n D ) at 25° C. of 1.60 or more.


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