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WO2024247739A1 - Semiconductor device - Google Patents

Semiconductor device Download PDF

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Publication number
WO2024247739A1
WO2024247739A1 PCT/JP2024/018095 JP2024018095W WO2024247739A1 WO 2024247739 A1 WO2024247739 A1 WO 2024247739A1 JP 2024018095 W JP2024018095 W JP 2024018095W WO 2024247739 A1 WO2024247739 A1 WO 2024247739A1
Authority
WO
WIPO (PCT)
Prior art keywords
metal plate
resin member
terminal
semiconductor chip
control circuit
Prior art date
Application number
PCT/JP2024/018095
Other languages
French (fr)
Japanese (ja)
Inventor
洋 江草
Original Assignee
住友電気工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 住友電気工業株式会社 filed Critical 住友電気工業株式会社
Publication of WO2024247739A1 publication Critical patent/WO2024247739A1/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/12Mountings, e.g. non-detachable insulating substrates
    • H01L23/13Mountings, e.g. non-detachable insulating substrates characterised by the shape
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/48Arrangements for conducting electric current to or from the solid state body in operation, e.g. leads, terminal arrangements ; Selection of materials therefor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of semiconductor or other solid state devices
    • H01L25/18Assemblies consisting of a plurality of semiconductor or other solid state devices the devices being of the types provided for in two or more different main groups of the same subclass of H10B, H10D, H10F, H10H, H10K or H10N

Definitions

  • Patent Document 1 Patent Document 2, Patent Document 3
  • the semiconductor device includes a first metal plate having electrical conductivity, a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate, and a control circuit metal plate that is disposed at a position different from the first metal plate in the thickness direction of the semiconductor chip, has electrical conductivity, and constitutes a control circuit for controlling the semiconductor device.
  • the control circuit includes at least one of a gate circuit, an auxiliary source circuit, a temperature characteristic detection circuit, and an electrical characteristic detection circuit.
  • FIG. 1 is a schematic perspective view of a semiconductor device according to a first embodiment.
  • FIG. 2 is a schematic plan view of the semiconductor device shown in FIG.
  • FIG. 3 is a schematic bottom view of the semiconductor device shown in FIG.
  • FIG. 4 is a schematic front view of the semiconductor device shown in FIG.
  • FIG. 5 is a schematic rear view of the semiconductor device shown in FIG.
  • FIG. 6 is a schematic left side view of the semiconductor device shown in FIG.
  • FIG. 7 is a schematic right side view of the semiconductor device shown in FIG.
  • FIG. 8 is a schematic perspective view showing a state in which a first resin member, which will be described later, has been removed from the semiconductor device shown in FIG.
  • FIG. 9 is a schematic plan view of the semiconductor device shown in FIG. FIG.
  • FIG. 10 is a schematic cross-sectional view taken along the line XX in FIG.
  • FIG. 11 is a schematic plan view showing a DBC substrate on which eight semiconductor chips, which will be described later, are mounted.
  • FIG. 12 is a schematic cross-sectional view of the DBC substrate shown in FIG. 11 taken along the line indicated by XII-XII in FIG.
  • FIG. 13 is a schematic perspective view showing an enlarged area where the insert metal is placed.
  • FIG. 14 is a schematic plan view showing an enlarged view of a part of a semiconductor device in which a solder resist is provided on a control circuit metal plate.
  • FIG. 15 is a schematic perspective view showing a state in which the first resin member has been removed in the semiconductor device according to the second embodiment of the present disclosure.
  • FIG. 16 is a schematic plan view of the semiconductor device shown in FIG.
  • FIG. 17 is a schematic bottom view of the semiconductor device shown in FIG. 18 is a schematic bottom view showing an enlarged portion of the inside of the semiconductor device shown in FIG.
  • FIG. 19 is a schematic perspective view showing a semiconductor device according to the third embodiment of the present disclosure.
  • one of the objectives is to provide a semiconductor device that can ensure stable operation while being compact.
  • a semiconductor device includes a first metal plate having electrical conductivity, a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate, and a control circuit metal plate disposed at a position different from the first metal plate in a thickness direction of the semiconductor chip, having electrical conductivity, and constituting a control circuit for controlling the semiconductor device.
  • the control circuit includes at least one of a gate circuit, an auxiliary source circuit, a temperature characteristic detection circuit, and an electrical characteristic detection circuit.
  • the control circuit formed by the control circuit metal plate includes at least one of the gate circuit, the auxiliary source circuit, the temperature characteristic detection circuit, and the electrical characteristic detection circuit, so that the semiconductor device can be controlled more precisely.
  • the control circuit metal plate constituting the control circuit including at least one of the gate circuit, the auxiliary source circuit, the temperature characteristic detection circuit, and the electrical characteristic detection circuit is disposed at a position different from the first metal plate on which the semiconductor chip is mounted in the thickness direction of the semiconductor chip. In this way, the first metal plate can be greatly expanded while suppressing the increase in the overall size of the semiconductor device in the direction perpendicular to the thickness direction of the first metal plate.
  • the control circuit metal plate regardless of the size of the control circuit metal plate, the area of the first metal plate that contributes to improving the heat dissipation of the semiconductor chip can be increased. Furthermore, since the control circuit metal plate is disposed at a position different from the semiconductor chip that becomes hot, thermal interference from the semiconductor chip can also be prevented. Therefore, stable operation can be ensured while achieving compactness of the semiconductor device.
  • the control circuit metal plate does not necessarily have to adopt the configuration of a substrate including an insulating layer, so there is no restriction on the heat resistance of the insulating layer when an insulating layer is included during the manufacture of the semiconductor device, etc. Furthermore, if the insulating layer can be omitted, costs can be reduced. Furthermore, omitting the insulating layer relaxes the dimensional restrictions in the thickness direction of the control circuit metal plate, and the thickness of the control circuit metal plate can be increased to reduce parasitic resistance and parasitic inductance, ensuring more stable operation. Furthermore, if the insulating layer can be omitted, the control circuit metal plate can be metallically bonded to other metal components, improving productivity.
  • control circuit metal plate may include an area that overlaps with the first metal plate when viewed in the thickness direction of the semiconductor chip. This allows the first metal plate to be made larger while effectively utilizing the area in the thickness direction of the semiconductor chip where the control circuit metal plate is located. This allows for more reliable compactness while improving heat dissipation.
  • a first resin member that seals the semiconductor chip may be further provided.
  • the control circuit metal plate may include a first terminal having a portion exposed from the first resin member, and a first frame having a portion covered by the first resin member.
  • the first terminal and the first frame may be integrally configured. In this manner, the first terminal can be arranged at the same time by holding the first frame, which is included in the control circuit metal plate and integrally configured with the first terminal, with the second resin member described below, improving assembly during manufacturing.
  • integral means that the first terminal and the first frame are manufactured from a single member, rather than being manufactured by combining multiple members by bonding, connecting with screws, or the like.
  • a first resin member that seals the semiconductor chip may be further provided.
  • the control circuit metal plate may include a first terminal having a portion exposed from the first resin member, and a first frame having a portion covered by the first resin member.
  • the first terminal and the first frame may be configured as separate bodies.
  • the first terminal may be held by the second resin member. In this way, by metal-joining the first frame, it is possible to fix the first frame and simultaneously establish an electrical connection.
  • “separate bodies” is a concept that is opposed to the above-mentioned "integral body," and the first terminal and the first frame are not manufactured from a single member, but are manufactured by combining multiple members by bonding, connecting with screws, etc.
  • a first resin member that seals the semiconductor chip and a second resin member that is provided separately from the first resin member may be further provided.
  • the control circuit metal plate may be disposed on the second resin member. In this way, the control circuit metal plate can be positioned by the second resin member and fixed. Therefore, a manufacturing jig is not required, and productivity can be improved.
  • the second resin member functions as a base. Therefore, ultrasonic vibrations are applied efficiently, and stable bonding can be ensured.
  • the second resin member is an insulator, it can be disposed in a state where insulation from the first metal plate is ensured, and stable operation can be ensured.
  • the semiconductor device may further include a first resin member that seals the semiconductor chip, and a second resin member that is provided separately from the first resin member.
  • the control circuit metal plate may include a first terminal having a protruding portion protruding from the second resin member and a holding portion held by the second resin member, and a first frame having a portion covered by the first resin member.
  • the holding portion may include a terminal exposed portion exposed from the second resin member.
  • the first frame may be joined to the first terminal in a region where the terminal exposed portion is located when viewed in the thickness direction of the semiconductor chip.
  • the metals of the first terminal and the first frame overlap each other in the terminal exposed portion, making it possible to perform metal joining such as fusion joining by laser welding or liquid phase joining by solder or brazing material, and to achieve electrical connection at the same time as fixing. This allows the joining time to be shortened, thereby improving productivity.
  • the semiconductor device may further include a first resin member that seals the semiconductor chip, a second resin member that is provided separately from the first resin member, and an insert metal that is held by the second resin member and joined to the control circuit metal plate.
  • the insert metal may include a first exposed portion exposed from the second resin member.
  • the insert metal may be joined to the control circuit metal plate in a region where the first exposed portion is located when viewed in the thickness direction of the semiconductor chip. In this way, the metals of the insert metal and the control circuit metal plate overlap each other in the first exposed portion, making it possible to perform metal joining such as fusion joining by laser welding or liquid phase joining by solder or brazing material, and to fix the second resin member and the control circuit metal plate.
  • the control circuit metal plate and the first metal plate can be connected via the insert metal, and the heat conduction between the control circuit metal plate and the first metal plate can be improved. Therefore, if a thermistor is attached to the temperature characteristic detection circuit, the temperature of the semiconductor chip and the water-cooling temperature of the semiconductor device can be monitored with higher accuracy.
  • the semiconductor device may further include a first resin member that seals the semiconductor chip, a second resin member that is provided separately from the first resin member, and an insert metal that is held by the second resin member and joined to the first metal plate and the control circuit metal plate.
  • the insert metal may include a second exposed portion that is exposed from the second resin member.
  • the insert metal may be joined to the first metal plate in a region where the second exposed portion is located when viewed in the thickness direction of the semiconductor chip. In this way, the metals of the insert metal and the first metal plate overlap each other in the second exposed portion, making it possible to perform metal joining such as fusion joining by laser welding or liquid phase joining by solder or brazing material, and to fix the second resin member and the first metal plate. Therefore, the joining time can be shortened, and productivity can be improved.
  • temperature monitoring by a thermistor can be performed with high accuracy as described above.
  • a solder resist may be provided on a portion of the control circuit metal plate. In this way, when joining electronic components to the control circuit metal plate, the solder resist can prevent the flow of joining material when joining the electronic components, thereby ensuring reliable positioning and electrical connection of the electronic components.
  • the semiconductor device may further include electronic components electrically connected to the control circuit metal plate.
  • electronic components such as suppressing ringing and oscillation when the transistor operates, and monitoring the temperature of the transistor chip, the temperature of the diode chip when the semiconductor chip is used as a diode chip, and the water-cooling temperature of the semiconductor device.
  • a control circuit metal plate with electronic components already incorporated is prepared, a circuit including electronic components can be manufactured simply by arranging the control circuit metal plate, thereby improving productivity.
  • the semiconductor device may further include a first resin member that seals the semiconductor chip, and a second resin member that is provided separately from the first resin member.
  • the second resin member may be provided with an engagement portion that engages with the control circuit metal plate. In this way, the control circuit metal plate can be positioned relative to the second resin member using the engagement portion. Therefore, a jig used to position the control circuit metal plate is not required, and productivity can be improved.
  • the first metal plate may be a lead frame or an electrode on a substrate having an insulating layer on the surface opposite to the surface on which the semiconductor chip is arranged in the thickness direction of the semiconductor chip. If the first metal plate is a lead frame, there is no need to provide an insulating layer, so the number of parts can be reduced, and the configuration can be simplified. In addition, by making the first metal plate an electrode on the substrate, the above configuration can be achieved using, for example, a DBC (Direct Bonded Copper) substrate, which can improve production efficiency and reduce costs.
  • DBC Direct Bonded Copper
  • the semiconductor device may further include a first resin member that seals the semiconductor chip, and a second resin member that is provided separately from the first resin member.
  • the first metal plate may be a lead frame.
  • the first metal plate may include a connection portion that extends in the thickness direction of the semiconductor chip.
  • the first metal plate may be joined to the control circuit metal plate at the connection portion. In this way, the connection portion provided on the first metal plate, which is the lead frame, can be used to join to the control circuit metal plate. This can further reduce the number of parts and improve productivity.
  • the semiconductor device may further include a first resin member that seals the semiconductor chip, a second resin member provided separately from the first resin member, and an insulating layer that is arranged on the surface of the first metal plate opposite the surface on which the semiconductor chip is arranged in the thickness direction of the semiconductor chip.
  • the control circuit metal plate may be arranged on the second resin member.
  • the second resin member may be arranged on the first metal plate or on the insulating layer.
  • the melting point of the second resin member may be higher than the melting point of the first resin member. In this way, it is possible to reduce the risk of the second resin member melting when the molten first resin member is poured in and molded after the second resin member is arranged. Therefore, stable production can be performed.
  • the semiconductor device may further include an insulating layer disposed on the surface of the first metal plate opposite to the surface on which the semiconductor chip is disposed in the thickness direction of the semiconductor chip with respect to the first metal plate, and a second metal plate disposed on the opposite side of the insulating layer to the first metal plate in the thickness direction of the semiconductor chip.
  • the second metal plate may have a slit formed at a distance from the outer edge of the second metal plate. In this way, when the second metal plate and the heat sink are joined, the distance from one end to the other end can be shortened because the second metal plate is divided by the slit. In this way, the stress applied to the end due to the difference in linear expansion coefficient during temperature change can be reduced.
  • the joining material that joins the second metal plate and the heat sink is placed inside the end face of the slit.
  • the slit is formed at a distance from the outer edge of the second metal plate, the outer periphery of the second metal plate is pressed by the mold during resin molding, and the risk of resin entering the slit can be reduced. Therefore, stress at the joint can be more reliably relieved.
  • the first metal plate may be a lead frame.
  • a groove may be formed on the surface of the first metal plate opposite the surface on which the semiconductor chip is arranged, with a gap from the outer edge of the first metal plate. In this way, the distance from end to end can be shortened when joining the first metal plate to the heat sink. This can reduce the stress applied to the end caused by the difference in linear expansion coefficient during temperature changes. In this case, since the groove is formed with a gap from the outer edge of the first metal plate, the risk of resin entering the groove during resin molding can be reduced. Therefore, stress at the joint can be more reliably alleviated.
  • the semiconductor device may further include a first resin member that seals the semiconductor chip, a first terminal, and a second terminal different from the first terminal.
  • the first terminal and the second terminal may be any one of a P terminal, an N terminal, an O terminal, a gate terminal, an auxiliary source terminal, a temperature characteristic detection terminal, and an electrical characteristic detection terminal.
  • the first resin member may be formed with a rib disposed between the first terminal and the second terminal. At least one of the first terminal and the second terminal may be provided with a notch that receives the rib. In this way, the first terminal and the second terminal can be disposed close to each other while increasing the creepage distance between the first terminal and the second terminal.
  • the fillet at the base of the rib can be made large without increasing the distance between the first terminal and the second terminal, and the strength of the rib can be reinforced while suppressing an increase in parasitic inductance.
  • FIG. 1 is a schematic perspective view of the semiconductor device according to the first embodiment.
  • FIG. 2 is a schematic plan view of the semiconductor device shown in FIG. 1.
  • FIG. 3 is a schematic bottom view of the semiconductor device shown in FIG. 1.
  • FIG. 4 is a schematic front view of the semiconductor device shown in FIG. 1.
  • FIG. 4 is a view seen in the direction indicated by the arrow IV in FIG. 2.
  • FIG. 5 is a schematic rear view of the semiconductor device shown in FIG. 1.
  • FIG. 5 is a view seen in the direction indicated by the arrow V in FIG. 2.
  • FIG. 6 is a schematic left side view of the semiconductor device shown in FIG. 1.
  • FIG. 1 is a schematic perspective view of the semiconductor device according to the first embodiment.
  • FIG. 2 is a schematic plan view of the semiconductor device shown in FIG. 1.
  • FIG. 3 is a schematic bottom view of the semiconductor device shown in FIG. 1.
  • FIG. 4 is a schematic front view of the semiconductor device shown in FIG. 1.
  • FIG. 4 is
  • FIG. 6 is a view seen in the direction indicated by the arrow VI in FIG. 2.
  • FIG. 7 is a schematic right side view of the semiconductor device shown in FIG. 1.
  • FIG. 7 is a view seen in the direction indicated by the arrow VII in FIG. 2.
  • FIG. 8 is a schematic perspective view showing a state in which a first resin member described later is removed from the semiconductor device shown in FIG. 1.
  • FIG. 9 is a schematic plan view of the semiconductor device shown in FIG. 8.
  • FIG. 10 is a schematic cross-sectional view taken along the line indicated by X-X in FIG. 9.
  • Fig. 11 is a schematic plan view showing a DBC substrate on which eight semiconductor chips described later are mounted.
  • Fig. 11 is a schematic plan view showing a DBC substrate on which eight semiconductor chips described later are mounted.
  • the Z direction indicates the thickness direction of the semiconductor chips described later
  • the Y direction indicates the direction in which the first main terminals and the second main terminals described later are arranged
  • the X direction indicates the direction perpendicular to the Y direction.
  • the X direction, the Y direction, and the Z direction are perpendicular to each other.
  • the semiconductor device 10a in the first embodiment includes a first resin member 11a, a second resin member 12a, a DBC (Direct Bonded Copper) substrate 13a as a base substrate, a P terminal 14a as a first main terminal, an N terminal 14b as a second main terminal, an O terminal 14c as a third main terminal, a control circuit metal plate 15a and a control circuit metal plate 15b.
  • a DBC Direct Bonded Copper
  • the control circuit metal plate 15a includes a first gate terminal 21a, a first auxiliary source terminal 21b, and an electrical characteristic detection terminal 21d.
  • the control circuit metal plate 15b includes a second gate terminal 22a, a second auxiliary source terminal 22b, a first temperature characteristic detection terminal 21c, and a second temperature characteristic detection terminal 22c.
  • the P terminal 14a constitutes the positive terminal
  • the N terminal 14b constitutes the negative terminal
  • the O terminal 14c constitutes the AC terminal.
  • the semiconductor device 10a employs a so-called 2-in-1 configuration.
  • the semiconductor device 10a includes resistors 23a and 23b as electronic components electrically connected to the control circuit metal plate 15a.
  • the resistors 23a and 23b are attached to the first gate terminal 21a so as to connect the divided regions.
  • the semiconductor device 10a includes resistors 23c and 23d as electronic components electrically connected to the control circuit metal plate 15b, and a thermistor 24a.
  • the resistors 23c and 23d are attached to the second gate terminal 22a so as to connect the divided regions.
  • the thermistor 24a is attached to connect the first temperature characteristic detection terminal 21c and the second temperature characteristic detection terminal 22c in a region disposed inside the semiconductor device 10a.
  • Such resistors 23a, 23b, 23c, and 23d contribute to suppressing ringing and oscillation when a transistor operates when a semiconductor chip 51a or the like described later is used as a transistor chip.
  • the thermistor 24a is also effectively used to monitor the temperature of the transistor chip, the temperature of the diode chip when the semiconductor chip 51e described later is used as the diode chip, the water-cooling temperature of the semiconductor device 10a, etc.
  • the electrical characteristic detection terminal 21d is, for example, a DESAT terminal that detects overcurrent.
  • the electrical characteristic detection terminal 21d is electrically connected to the first region 41a of the first metal plate 31a described later via the insert metal 25a or the insert metal 25b described later.
  • the first resin member 11a seals the electronic components included in the semiconductor device 10a, including the semiconductor chip included in the semiconductor device 10a, which will be described later.
  • the first resin member 11a has a rectangular parallelepiped shape, except for the ribs, which will be described later.
  • the P terminal 14a, the N terminal 14b, the O terminal 14c, the first gate terminal 21a, the second gate terminal 22a, the first auxiliary source terminal 21b, the second auxiliary source terminal 22b, the first temperature characteristic detection terminal 21c, the second temperature characteristic detection terminal 22c, and the electrical characteristic detection terminal 21d are each configured so that a portion thereof is exposed from the side of the first resin member 11a.
  • the first resin member 11a functions as a molded resin that exposes a portion of the above-mentioned terminals and covers the entire device.
  • the material of the first resin member 11a is, for example, a thermosetting resin such as an epoxy resin.
  • the first resin member 11a has a rib 17a that protrudes outward. Fillets 18a and 18b are formed at the base of the rib 17a, making it thick.
  • the rib 17a is disposed between the P terminal 14a and the N terminal 14b.
  • the length of the rib 17a in the X direction is longer than the length of the P terminal 14a and the N terminal 14b exposed from the first resin member 11a in the X direction.
  • the first resin member 11a has four through holes 19a, 19b, 19c, and 19d that penetrate in the thickness direction.
  • the through holes 19a, 19b, 19c, and 19d are marks of pressure pins provided in the mold die when molding the first resin member 11a.
  • the second resin member 12a is provided separately from the first resin member 11a.
  • the second resin member 12a is a frame-shaped member and is arranged along the outer edge of the insulating layer 33a described later when viewed in the thickness direction.
  • the control circuit metal plate 15a and the control circuit metal plate 15b are arranged on the second resin member 12a.
  • the second resin member 12a is formed with an engagement portion 28a that engages with the control circuit metal plate 15a and an engagement portion 28b that engages with the control circuit metal plate 15b.
  • the second resin member 12a is also formed with engagement portions 29a, 29b, and 29c that engage with the above-mentioned terminals.
  • the engagement portions 28a, 28b, 29a, 29b, and 29c allow the control circuit metal plate 15a, the control circuit metal plate 15b, the P terminal 14a, the N terminal 14b, and the O terminal 14c to be positioned relative to the second resin member 12a.
  • the melting point of the second resin member 12a is higher than that of the first resin member 11a.
  • materials for the second resin member 12a include polyphenylene sulfide (PPS (Poly Phenylene Sulfide)) and polybutylene terephthalate (PBT (Poly Butylene Terephthalate)).
  • the second resin member 12a is manufactured by, for example, injection molding, cutting, or three-dimensional modeling.
  • the second resin member 12a is formed with a snap fitting portion 37a that snaps into the control circuit metal plate 15a and a snap fitting portion 37b that snaps into the control circuit metal plate 15b.
  • the second resin member 12a arranged along the outer edge is made of a resin material like the first resin member 11a, and can be chemically bonded.
  • the second resin member 12a has an anchor effect as a protruding portion, but the anchor effect may also be achieved as a concave shape.
  • the DBC substrate 13a includes a first metal plate 31a, a second metal plate 32a, and an insulating layer 33a. That is, the DBC substrate 13a is composed of the first metal plate 31a, the second metal plate 32a, and the insulating layer 33a.
  • the first metal plate 31a is disposed on one surface of the insulating layer 33a in the thickness direction
  • the second metal plate 32a is disposed on the other surface of the insulating layer 33a in the thickness direction. That is, the DBC substrate 13a is configured such that the insulating layer 33a is sandwiched between the first metal plate 31a and the second metal plate 32a disposed on both sides in the thickness direction.
  • the material of the insulating layer 33a for example, Al 2 O 3 (alumina), SiN (silicon nitride), or AlN (aluminum nitride) is selected.
  • the first metal plate 31a includes a first region 41a, a second region 42a, a third region 43a, a fourth region 44a, a fifth region 45a, a sixth region 46a, a seventh region 47a, an eighth region 48a, and a ninth region 49a (see FIG. 11 in particular). That is, the first metal plate 31a is divided into multiple regions, specifically, nine regions, on the insulating layer 33a.
  • the first region 41a, the second region 42a, and the third region 43a are the main circuit plates through which current flows during operation of the semiconductor device 10a.
  • the other regions are joined to the control circuit metal plate 15a and the control circuit metal plate 15b, and are used for fixing and thermally coupling to the second metal plate 32a.
  • the fourth region 44a, the fifth region 45a, the sixth region 46a, the seventh region 47a, the eighth region 48a and the ninth region 49a are used for the above-mentioned fixing, and the sixth region 46a and the seventh region 47a are also used for the above-mentioned thermal bonding.
  • the second metal plate 32a is not divided into multiple regions, but is formed as a single piece.
  • Two slits 34a and 34b are formed in the second metal plate 32a (see FIG. 3 in particular).
  • the slits 34a and 34b are formed as a pair extending in the X direction with a gap in the Y direction.
  • the slits 34a and 34b are each formed with a gap from the outer edge 35a of the second metal plate 32a.
  • the slits 34a and 34b are each provided to penetrate the second metal plate 32a in the thickness direction. In other words, in the regions where the slits 34a and 34b are located, the insulating layer 33a is exposed when viewed from the bottom side.
  • the P terminal 14a is formed by bending a strip-shaped metal plate.
  • the P terminal 14a has a portion covered by the first resin member 11a and a portion exposed from the first resin member 11a.
  • the P terminal 14a has a round hole 16a penetrating in the thickness direction in the portion exposed from the first resin member 11a.
  • the N terminal 14b and the O terminal 14c are also formed by bending a strip-shaped metal plate like the P terminal 14a, and have round holes 16b and 16c penetrating in the thickness direction in the portion exposed from the first resin member 11a.
  • the P terminal 14a is joined to the first region 41a of the first metal plate 31a inside the semiconductor device 10a.
  • the N terminal 14b is joined to the third region 43a of the first metal plate 31a inside the semiconductor device 10a.
  • the O terminal 14c is bonded to the second region 42a of the first metal plate 31a inside the semiconductor device 10a.
  • the P terminal 14a is electrically connected to the first region 41a of the first metal plate 31a
  • the N terminal 14b is electrically connected to the third region 43a of the first metal plate 31a
  • the O terminal 14c is electrically connected to the second region 42a of the first metal plate 31a.
  • the electrical bonding is performed using a bonding material such as solder or sintered material, a fusion bond such as laser welding or ultrasonic bonding, or a conductive material such as a wire.
  • the second resin member 12a is provided with engaging portions 29a and 29b that engage with the P terminal 14a, N terminal 14b, and O terminal 14c. Therefore, the P terminal 14a, N terminal 14b, and O terminal 14c can be positioned relative to the second resin member 12a using the engaging portions 29a and 29b. This eliminates the need for jigs to position the P terminal 14a, N terminal 14b, and O terminal 14c, improving productivity.
  • the engaging portion 29b is convex in shape and positions the P terminal 14a, N terminal 14b, and O terminal 14c by arranging them therebetween, but it may also be concave in shape and positions the P terminal 14a, N terminal 14b, and O terminal 14c therein.
  • the P terminal 14a, N terminal 14b, and O terminal 14c have a stepped shape in the portion exposed from the first resin member 11a, and are provided with a fastening surface with round holes 16a, 16b, and 16c, and a pressing surface at the base of the first resin member 11a.
  • the exposed portions of the P terminal 14a, N terminal 14b, and O terminal 14c are crushed by the upper and lower dies of the molding die, which may cause deformation.
  • By separating the pressing surface and the fastening surface it is possible to avoid changes in the shape of the fastening surface even if the pressing surface is crushed, and therefore it is possible to prevent poor fastening and increased contact resistance during fastening.
  • the P terminal 14a, N terminal 14b, and O terminal 14c are molded with the first resin member 11a, they are crushed by the mold die, and there is a possibility that they may be displaced and stress may be applied to the joints between the P terminal 14a, N terminal 14b, and O terminal 14c and the first metal plate 31a.
  • the P terminal 14a has a through hole, and by fitting with the engagement portion 29a provided on the second resin member 12a, a catch is created at this fitting portion, suppressing the application of stress to the joint.
  • the N terminal 14b is metal-joined by placing an insert mold (not shown) provided on the second resin member 12a on the bottom surface of the N terminal 14b, and a catch is created at this joint, suppressing the application of stress to the joint.
  • the O terminal 14c is fixed by molding the periphery from the second resin member 12a, and a catch is created at this fixing portion, suppressing the application of stress to the joint. This improves the reliability of the joints between the P terminal 14a, N terminal 14b, and O terminal 14c and the first metal plate 31a.
  • the P terminal 14a has a notch 36a formed therein to receive the fillet 18a.
  • the N terminal 14b has a notch 36b formed therein to receive the fillet 18b.
  • Control circuit metal plate 15a and control circuit metal plate 15b are each disposed at a different position in the thickness direction from first metal plate 31a. That is, control circuit metal plate 15a and control circuit metal plate 15b each overlap first metal plate 31a when viewed in the thickness direction.
  • the control circuit formed by control circuit metal plate 15a and control circuit metal plate 15b includes all of the gate circuit, auxiliary source circuit, temperature characteristic detection circuit, and electrical characteristic detection circuit.
  • the semiconductor device 10a of the first embodiment includes a semiconductor chip (first semiconductor chip) 51a, a semiconductor chip (second semiconductor chip) 51b, a semiconductor chip (third semiconductor chip) 51c, a semiconductor chip (fourth semiconductor chip) 51d, a semiconductor chip (fifth semiconductor chip) 51e, a semiconductor chip (sixth semiconductor chip) 51f, a semiconductor chip (seventh semiconductor chip) 51g, and a semiconductor chip (eighth semiconductor chip) 51h.
  • the semiconductor chip 51a, the semiconductor chip 51b, the semiconductor chip 51c, and the semiconductor chip 51d are each vertical transistor chips.
  • the semiconductor chip 51a, the semiconductor chip 51b, the semiconductor chip 51c, and the semiconductor chip 51d are each, for example, a metal-oxide-semiconductor field effect transistor (MOSFET).
  • MOSFET metal-oxide-semiconductor field effect transistor
  • Each of the semiconductor chips 51a, 51b, 51c, and 51d is a switching element.
  • the semiconductor chips 51a and 51b form an upper arm in the semiconductor device 10a, and the semiconductor chips 51c and 51d form a lower arm in the semiconductor device 10a.
  • Each of the semiconductor chips 51e, 51f, 51g, and 51h is a diode chip.
  • each of the semiconductor chips 51e, 51f, 51g, and 51h is a Schottky barrier diode (SBD (Schottky Barrier Diode)).
  • SBD Schottky barrier diode
  • FIG. 12 is a schematic cross-sectional view of the DBC substrate 13a shown in FIG. 11 taken along the line indicated by XII-XII in FIG. 12.
  • the drain electrode 52a of the semiconductor chip 51a is joined to the first metal plate 31a by the bonding material 38a.
  • the semiconductor chips 51b, 51c, and 51d are similarly joined to the first metal plate 31a.
  • the cathode electrode 52b of the semiconductor chip 51e is joined to the first metal plate 31a by the bonding material 38b.
  • the semiconductor chips 51f, 51g, and 51h are similarly joined to the first metal plate 31a.
  • the source electrode 53a of the semiconductor chip 51a, the anode electrode 54a of the semiconductor chip 51e, and the second region 42a of the first metal plate 31a are electrically connected by a wire 56a, which is a conductive member.
  • the source electrode 53b of the semiconductor chip 51b, the anode electrode 54b of the semiconductor chip 51f, and the second region 42a of the first metal plate 31a are electrically connected by a wire 56b.
  • the source electrode 53c of the semiconductor chip 51c, the anode electrode 54c of the semiconductor chip 51g, and the third region 43a of the first metal plate 31a are electrically connected by a wire 56c.
  • the source electrode 53d of the semiconductor chip 51d, the anode electrode 54d of the semiconductor chip 51h, and the second region 42a of the first metal plate 31a are electrically connected by a wire 56d.
  • the connection by wire is performed by wire bonding.
  • the gate electrode of the semiconductor chip 51a is electrically connected to the first gate terminal 21a by a wire 57a.
  • the gate electrode of the semiconductor chip 51b is electrically connected to the first gate terminal 21a by a wire 57b.
  • the gate electrode of the semiconductor chip 51c is electrically connected to the second gate terminal 22a by a wire 57c.
  • the gate electrode of the semiconductor chip 51d is electrically connected to the second gate terminal 22a by a wire 57d.
  • the source electrode 53a of the semiconductor chip 51a is electrically connected to the first auxiliary source terminal 21b by a wire 58a.
  • the source electrode 53b of the semiconductor chip 51b is electrically connected to the first auxiliary source terminal 21b by a wire 58b.
  • the source electrode 53c of the semiconductor chip 51c is electrically connected to the second auxiliary source terminal 22b by a wire 58c.
  • the source electrode 53d of the semiconductor chip 51d is electrically connected to the second auxiliary source terminal 22b by a wire 58d.
  • the first gate terminal 21a included in the control circuit metal plate 15a includes a first terminal 26a having a portion exposed from the first resin member 11a, and a first frame 27a having a portion covered by the first resin member 11a.
  • the first terminal 26a and the first frame 27a of the first gate terminal 21a are configured separately.
  • the second gate terminal 22a is configured integrally with the first terminal 26a and the first frame 27a.
  • the semiconductor device 10a includes insert metal 25a and insert metal 25b.
  • FIG. 13 is a schematic perspective view showing an enlarged view of the area in which the insert metal 25a and insert metal 25b are arranged. Referring also to FIG. 13, the insert metal 25a and insert metal 25b are held in the second resin member 12a. In this embodiment, the insert metal 25a and insert metal 25b are embedded inside by insert molding during molding of the second resin member 12a.
  • the insert metal 25a and insert metal 25b include a first exposed portion 61a and a second exposed portion 62a exposed from the second resin member 12a.
  • the first exposed portion 61a is a surface facing the first temperature characteristic detection terminal 21c and the second temperature characteristic detection terminal 22c, respectively.
  • the second exposed portion 62a is a surface facing the sixth region 46a and the seventh region 47a of the first metal plate 31a, respectively.
  • the insert metal 25a is joined to the first metal plate 31a and the control circuit metal plate 15b. Specifically, the insert metal 25a is joined to the second temperature characteristic detection terminal 22c of the control circuit metal plate 15b in the region where the first exposed portion 61a is located. In this case, the joining is performed by laser welding irradiated in the thickness direction.
  • the insert metal 25a is also joined to the sixth region 46a of the first metal plate 31a in the region where the second exposed portion 62a is located. In this case, the joining is also performed by laser welding irradiated in the thickness direction.
  • the semiconductor device 10a also includes insert metals that join the first gate terminal 21a and the first metal plate 31a, the first auxiliary source terminal 21b and the first metal plate 31a, the second gate terminal 22a and the first metal plate 31a, the second auxiliary source terminal 22b and the first metal plate 31a, and the electrical characteristic detection terminal 21d and the first metal plate 31a.
  • the first gate terminal 21a of the control circuit metal plate 15a includes a first terminal 26a and a first frame 27a (see FIG. 9 in particular).
  • the first terminal 26a has a protruding portion protruding from the second resin member 12a and a holding portion held by the second resin member 12a.
  • the holding portion includes a terminal exposed portion exposed from the second resin member 12a.
  • the first frame 27a is joined to the first terminal 26a in the region where the terminal exposed portion is located when viewed in the thickness direction.
  • a DBC substrate 13a is prepared by forming a circuit pattern such as the first region 41a described above on the first metal plate 31a and forming the slits 34a described above on the second metal plate 32a.
  • a second resin member 12a having the above shape with the first terminal 26a of the control circuit metal plate 15a, the insert metal 25a, etc. inserted therein is also prepared.
  • the O terminal 14c is also partially molded and attached to the second resin member 12a in advance.
  • the semiconductor chip 51a etc. are bonded onto the first metal plate 31a.
  • the second resin member 12a is attached onto the DBC substrate 13a with an adhesive or the like.
  • the P terminal 14a, the N terminal 14b, the control circuit metal plate 15a, and the control circuit metal plate 15b are placed on the second resin member 12a, and the P terminal 14a, the N terminal 14b, and the O terminal 14c are joined to the first metal plate 31a, and the control circuit metal plate 15a and the control circuit metal plate 15b are joined to the first terminal 26a and the insert metal 25a, etc., by laser welding.
  • Electronic components such as the resistor 23a are previously joined to the control circuit metal plate 15a and the control circuit metal plate 15b.
  • the semiconductor chip 51a, etc. are electrically connected by wire bonding.
  • the semiconductor chip 51a, etc. are sealed by transfer molding so as to be sealed in the first resin member 11a. In this manner, the semiconductor device 10a is manufactured.
  • the control circuit constituted by the control circuit metal plate 15a and the control circuit metal plate 15b includes a gate circuit, an auxiliary source circuit, a temperature characteristic detection circuit, and an electrical characteristic detection circuit, so that the semiconductor device 10a can be controlled more precisely.
  • the control circuit metal plate 15a and the control circuit metal plate 15b constituting the control circuit including the gate circuit, the auxiliary source circuit, the temperature characteristic detection circuit, and the electrical characteristic detection circuit are arranged at a different position in the thickness direction of the semiconductor chip 51a from the first metal plate 31a on which the semiconductor chip 51a is mounted.
  • the first metal plate 31a can be greatly expanded while suppressing the size of the overall shape of the semiconductor device 10a from increasing in the direction perpendicular to the thickness direction of the first metal plate 31a.
  • the area of the first metal plate 31a that contributes to improving the heat dissipation of the semiconductor chip 51a, etc. can be increased.
  • the control circuit metal plate 15a and the control circuit metal plate 15b are located in a different position from the semiconductor chip 51a etc., which becomes hot, it is possible to prevent thermal interference from the semiconductor chip 51a etc. Therefore, it is possible to ensure stable operation while making the semiconductor device 10a compact.
  • the control circuit metal plate 15a and the control circuit metal plate 15b when viewed in the thickness direction of the semiconductor chip 51a, etc., the control circuit metal plate 15a and the control circuit metal plate 15b include an area that overlaps with the first metal plate 31a. Therefore, the first metal plate 31a can be made larger while effectively utilizing the area in which the control circuit metal plate 15a and the control circuit metal plate 15b are located in the thickness direction of the semiconductor chip 51a. This makes it possible to improve heat dissipation while more reliably achieving compactness.
  • control circuit metal plate 15a and the control circuit metal plate 15b include a first terminal having a portion exposed from the first resin member 11a, and a first frame having a portion covered by the first resin member 11a.
  • the first terminal and the first frame are integrally configured. Therefore, if the first frame included in the control circuit metal plate 15a and the control circuit metal plate 15b and integrally configured with the first terminal is held by the second resin member 12a, the first terminal can be positioned at the same time, thereby improving the ease of assembly during manufacturing.
  • control circuit metal plate 15a and the control circuit metal plate 15b include a first terminal having a portion exposed from the first resin member 11a, and a first frame having a portion covered by the first resin member 11a.
  • the first terminal and the first frame are configured as separate bodies. Since the first terminal is held by the second resin member 12a, by metal-joining the first frame, it is possible to fix the first frame and simultaneously establish an electrical connection.
  • control circuit metal plate 15a and the control circuit metal plate 15b are disposed on the second resin member 12a. Therefore, the control circuit metal plate 15a and the control circuit metal plate 15b can be positioned by the second resin member 12a, and the control circuit metal plate 15a and the control circuit metal plate 15b can be fixed. This eliminates the need for manufacturing jigs, and improves productivity. Furthermore, when bonding wires to the control circuit metal plate 15a and the control circuit metal plate 15b by ultrasonic bonding, the second resin member 12a functions as a base. Therefore, ultrasonic vibrations are applied efficiently, and stable bonding can be ensured. Furthermore, since the second resin member 12a is an insulator, it can be disposed in a state where insulation from the first metal plate 31a is ensured, and stable operation can be ensured.
  • control circuit metal plate 15a and the control circuit metal plate 15b include a first terminal having a protruding portion protruding from the second resin member 12a and a holding portion held by the second resin member 12a, and a first frame covered by the first resin member 11a.
  • the holding portion includes a terminal exposed portion exposed from the second resin member 12a.
  • the first frame is joined to the first terminal in the region where the terminal exposed portion is located when viewed in the thickness direction of the semiconductor chip 51a, etc.
  • the metals of the first terminal and the first frame overlap at the terminal exposed portion, making it possible to perform metal joining such as fusion joining by laser welding or liquid phase joining by solder or brazing material, and to establish electrical connection at the same time as fixing. This allows the joining time to be shortened, improving productivity.
  • the semiconductor device 10a includes insert metals 25a and 25b that are held by the second resin member 12a and are joined to the first metal plate 31a and the control circuit metal plate 15a and control circuit metal plate 15b.
  • the insert metals 25a and 25b include a first exposed portion exposed from the second resin member 12a.
  • the insert metals 25a and 25b are joined to the control circuit metal plate 15a and control circuit metal plate 15b in the region where the first exposed portion is located when viewed in the thickness direction of the semiconductor chip 51a, etc.
  • This allows the joining time to be shortened and productivity to be improved.
  • the first temperature characteristic detection terminal 21c and the second temperature characteristic detection terminal 22c can connect the control circuit metal plate 15a, the control circuit metal plate 15b and the first metal plate 31a via the insert metal 25a, the insert metal 25b, and can improve the thermal conduction between the control circuit metal plate 15a, the control circuit metal plate 15b and the first metal plate 31a. Therefore, when the thermistor 24a is attached to the first temperature characteristic detection terminal 21c and the second temperature characteristic detection terminal 22c, the temperature of the semiconductor chip 51a as a transistor chip, the temperature of the semiconductor chip 51e as a diode chip, and the water-cooling temperature of the semiconductor device 10a can be monitored with higher accuracy.
  • the insert metal 25a and the insert metal 25b include a second exposed portion exposed from the second resin member 12a.
  • the insert metal 25a and the insert metal 25b are joined to the first metal plate 31a in the region where the second exposed portion is located when viewed in the thickness direction of the semiconductor chip 51a, etc.
  • the metals of the insert metal 25a and the insert metal 25b and the first metal plate 31a overlap each other in the second exposed portion, making it possible to perform metal joining such as fusion joining by laser welding or liquid phase joining by solder or brazing material, etc., and to fix the second resin member 12a and the first metal plate 31a. Therefore, the joining time can be shortened and productivity can be improved.
  • temperature monitoring by the thermistor 24a can be performed with high accuracy as described above.
  • the second resin member 12a is provided with engaging portions 28a and 28b that engage with the control circuit metal plate 15a and the control circuit metal plate 15b. Therefore, the control circuit metal plate 15a and the control circuit metal plate 15b can be positioned relative to the second resin member 12a using the engaging portions 28a and 28b. This eliminates the need for a jig to position the control circuit metal plate 15a and the control circuit metal plate 15b, improving productivity.
  • the engaging portions 28a and 28b are positioned by placing the control circuit metal plate 15a and the control circuit metal plate 15b between them as convex shapes, but they may also be positioned by placing the control circuit metal plate 15a and the control circuit metal plate 15b in a concave shape.
  • the melting point of the second resin member 12a is higher than that of the first resin member 11a. Therefore, when the molten first resin member 11a is poured in and molded after the second resin member 12a is placed, the risk of the second resin member 12a melting can be reduced. Therefore, stable production can be performed.
  • the second resin member 12a is a thermoplastic resin and the first resin member 11a is a thermosetting resin, but this is not limited to this, and both may be thermoplastic resins as long as there is a difference in melting point (as long as the melting point of the second resin member 12a is higher than that of the first resin member 11a).
  • a thermosetting resin is used for the second resin member 12a and once heated and cured, it will not melt when the thermosetting resin of the first resin member 11a is poured in, so both may be thermosetting resins.
  • the second metal plate 32a has slits 34a and slits 34b formed at intervals from the outer edge 35a of the second metal plate 32a. Therefore, when the second metal plate 32a and the heat sink are joined, the distance from one end to the other can be shortened because the second metal plate 32a is divided by the slits 34a and slits 34b. This reduces the stress on the end caused by the difference in linear expansion coefficient during temperature changes.
  • the joining material joining the second metal plate 32a and the heat sink is disposed inside the end faces of the slits 34a and slits 34b.
  • the slits 34a and slits 34b are formed at intervals from the outer edge 35a of the second metal plate 32a, so that the outer periphery of the second metal plate 32a is pressed by the mold during resin molding, reducing the risk of resin entering the slits 34a and slits 34b. Therefore, stress at the joint can be more reliably relieved.
  • the first resin member 11a is formed with a rib 17a disposed between the P terminal 14a and the N terminal 14b.
  • the P terminal 14a and the N terminal 14b are provided with a notch 36a and a notch 36b for receiving the rib 17a. Therefore, the P terminal 14a and the N terminal 14b can be disposed close to each other while increasing the creepage distance between them. This allows the semiconductor device 10a to be made compact while reducing inductance.
  • the fillets 18a and 18b can be made large without increasing the distance between the P terminal 14a and the N terminal 14b, and the strength of the rib 17a can be reinforced while suppressing an increase in parasitic inductance.
  • a solder resist may be provided on a portion of the control circuit metal plate.
  • FIG. 14 is a schematic plan view showing an enlarged view of a portion of a semiconductor device in which a solder resist is provided on the control circuit metal plate. Referring to FIG. 14, solder resist 39a and solder resist 39b are provided on a portion of control circuit metal plate 15b. Solder resist 39a is formed so as to be applied around the area where resistor 23c is attached. Solder resist 39b is formed so as to be applied around the area where thermistor 24a is attached.
  • solder resist 39a and solder resist 39b can prevent the outflow of the joining material when joining the electronic components, and can ensure reliable positioning and electrical connection of the electronic components.
  • FIG. 15 is a schematic perspective view showing a state in which the first resin member is removed in the semiconductor device in the second embodiment of the present disclosure.
  • FIG. 16 is a schematic plan view of the semiconductor device shown in FIG. 15.
  • FIG. 17 is a schematic bottom view of the semiconductor device shown in FIG.
  • the semiconductor device in the second embodiment basically has the same configuration as the first embodiment, and achieves the same effects.
  • the semiconductor device in the second embodiment differs from the first embodiment in that a lead frame is used instead of a DBC substrate, the shape of the second resin member is different, and the like.
  • the semiconductor device 10b of the second embodiment includes a first resin member (not shown), a second resin member 12b, a lead frame 13b as the first metal plate 31a, a control circuit metal plate 15a and a control circuit metal plate 15b. That is, in the second embodiment, the first metal plate 31b is composed of the lead frame 13b.
  • the semiconductor device 10b forms the P terminal 14a, the N terminal 14b, the O terminal 14c and the first metal plate 31b by bending a metal plate of a predetermined shape that constitutes the lead frame 13b.
  • the first metal plate 31b includes the first region 41b, the second region 42b, the third region 43b, the fourth region 44b, the fifth region 45b, the sixth region 46b, the seventh region 47b, the eighth region 48b and the ninth region 49b, similar to the first metal plate 31a of the first embodiment.
  • the first region 41b and the P terminal 14a are formed by bending a single metal plate
  • the second region 42b and the O terminal 14c are formed by bending a single metal plate
  • the third region 43b and the N terminal 14b are formed by bending a single metal plate.
  • the semiconductor chip 51a, the semiconductor chip 51b, the semiconductor chip 51e, and the semiconductor chip 51f as transistor chips are bonded and electrically connected on the first region 41b.
  • the semiconductor chip 51c, the semiconductor chip 51d, the semiconductor chip 51g, and the semiconductor chip 51h as diode chips are bonded and electrically connected on the second region 42b.
  • the electrical connections of the members by the wires 56a, 56b, 56c, 56d, 57a, 57b, 57c, 57d, 58a, 58b, 58c, and 58d are also the same as in the first embodiment.
  • the P terminal 14a, N terminal 14b, and O terminal 14c are formed integrally with the first metal plate 31b, but may be provided separately, as in the case of the semiconductor device 10a in embodiment 1.
  • the metal plate constituting the first region 41b and the P terminal 14a, the metal plate constituting the second region 42b and the O terminal 14c, the metal plate constituting the third region 43b and the N terminal 14b, the first gate terminal 21a and the first auxiliary source terminal 21b are attached to the second resin member 12b.
  • the second resin member 12b when the second resin member 12b is manufactured, it is manufactured so as to hold the metal plate constituting the first region 41b and the N terminal 14b, the metal plate constituting the second region 42b and the O terminal 14c, the metal plate constituting the third region 43b and the P terminal 14a, the first gate terminal 21a and the first auxiliary source terminal 21b.
  • the second resin member 12b is fixed by partially molding the lead frame 13b, such as by hoop molding.
  • the P terminal 14a, the N terminal 14b, and the O terminal 14c are fixed by molding the periphery by the second resin member 12b.
  • the second resin member 12b is fixed to the first metal plate 31b by partial molding, but may be provided as a separate member as in the case of the semiconductor device 10a in embodiment 1.
  • the first metal plate 31b has grooves 63b and 64b formed on the surface opposite to the surface on which the semiconductor chip 51a and the like are arranged.
  • the grooves 63b and 64b are formed as a pair extending in the X direction with a gap in the Y direction.
  • the grooves 63b and 64b are each formed with a gap from the outer edge 35b of the first metal plate 31b.
  • the grooves 63b and 64b are each provided to avoid the areas in which the semiconductor chips 51a, 51b, 51c, 51d, 51e, 51f, 51g, and 51h are arranged when viewed in the thickness direction.
  • the grooves 63b and 64b are each provided so as to recess the first metal plate 31b in the thickness direction.
  • the surface on which the semiconductor chips 51a and the like are arranged is raised.
  • the grooves 63b and 64b of the semiconductor device 10b have the same effect as the slits 34a and 34b of the semiconductor device 10a of embodiment 1.
  • FIG. 18 is a schematic bottom view showing an enlarged portion of the inside of the semiconductor device shown in FIG. 15.
  • the first metal plate 31b includes a connection portion 65b extending in the thickness direction (Z direction) of the semiconductor chip 51a, etc.
  • the first metal plate 31b is joined to the control circuit metal plate 15a at the connection portion 65b.
  • the connection portion 65b formed in continuity with the first region 41b of the first metal plate 31b is joined to the electrical characteristic detection terminal 21d of the control circuit metal plate 15a.
  • a connection portion (not shown) provided in another location on the first metal plate 31b is joined to the control circuit metal plate 15a.
  • the first metal plate 31b is the lead frame 13b, so there is no need to provide an insulating layer. This allows the number of parts to be reduced, and the configuration to be simplified.
  • the first metal plate 31b includes the above-mentioned connection portion 65b, and therefore can be joined to the control circuit metal plate 15a using the connection portion 65b provided on the first metal plate 31b, which is the lead frame 13b. This allows for a further reduction in the number of parts, thereby improving productivity.
  • the grooves 63b and 64b are formed, and the grooves 63b and 64b are divided when the first metal plate 31b and the heat sink are joined, so that the distance from one end to the other end can be shortened. This can reduce the stress on the end caused by the difference in linear expansion coefficient during temperature changes.
  • the joining material joining the lead frame 13b and the heat sink is placed inside the end faces of the grooves 63b and 64b.
  • the grooves 63b and 64b are formed with a gap between them and the outer edge 35b of the first metal plate 31b, so that the outer periphery of the lead frame 13b is pressed by the mold during resin molding, and the risk of resin entering the grooves 63b and 64b can be reduced. Therefore, stress at the joint can be more reliably relieved.
  • FIG. 19 is a schematic perspective view showing a semiconductor device in the third embodiment of the present disclosure.
  • the semiconductor device in the third embodiment basically has the same configuration as in the first embodiment, and achieves the same effects.
  • the semiconductor device in the third embodiment is different from the first embodiment in that a potting resin is used instead of the first resin member constituting the mold resin.
  • the semiconductor device 10c of the third embodiment includes a potting resin 11c, a second resin member 12c, a DBC substrate 13a, a P terminal 14a, an N terminal 14b, an O terminal 14c, a control circuit metal plate 15a, and a control circuit metal plate 15b.
  • the potting resin 11c is disposed inside the frame-shaped second resin member 12c and on the DBC substrate 13a, and seals the semiconductor chip 51a disposed on the DBC substrate 13a.
  • a rib 17a is formed on the second resin member 12c.
  • the material of the potting resin is, for example, a thermosetting resin such as silicone gel or epoxy resin.
  • the semiconductor device 10c configured in this way can ensure stable operation while being compact.
  • resistors and thermistors are provided as electronic components, but the present invention is not limited to this, and the electronic components may be configured to include capacitors, diodes, and coils.
  • the transistor chip is a MOSFET, but it may be an IGBT (Insulated Gate Bipolar Transistor).
  • the diode chip is an SBD, but it may be an FWD (Free Wheeling Diode). Note that the configuration may not include a diode chip.
  • the transistor chip and diode chip are bonded to the first metal plate with a bonding material (not shown).
  • the bonding material may be, for example, solder or a sintered material such as Ag (silver) or Cu (copper).
  • the conductive members electrically connected to the transistor chip and diode chip may be electrically connected using copper clips instead of wires.
  • (Appendix 1) An insulating layer; a first metal plate disposed on the insulating layer and having electrical conductivity; a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate; a first terminal electrically connected to the first metal plate; a second metal plate electrically connected to the semiconductor chip via a conductive member; a second terminal electrically connected to the second metal plate; a first resin member fixed to at least one of the insulating layer, the first metal plate, and the second metal plate; a second resin member that seals the semiconductor chip and is disposed so as to cover the first metal plate, wherein a melting point of the first resin member is higher than a melting point of the second resin member.
  • a semiconductor device comprising: A first metal plate having electrical conductivity; a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate; a control circuit metal plate that is disposed at a position different from the first metal plate in a thickness direction of the semiconductor chip, has electrical conductivity, and constitutes a control circuit that controls the semiconductor device; a first resin member that encapsulates the semiconductor chip; a first terminal electrically connected to the first metal plate; a second metal plate electrically connected to the semiconductor chip via a conductive member; and a second terminal electrically connected to the second metal plate, the control circuit includes a gate circuit, an auxiliary source circuit, a temperature characteristic detection circuit, and an electrical characteristic detection circuit; the control circuit metal plate is exposed from the first resin member and includes a gate terminal constituting a part of the gate circuit, an auxiliary source terminal constituting a part of the auxiliary source circuit, a temperature characteristic detection terminal constituting a part of the temperature characteristic detection circuit, and an electric characteristic detection terminal constituting a part of the
  • a semiconductor device comprising: A first metal plate having electrical conductivity; a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate; a control circuit metal plate that is disposed at a position different from the first metal plate in a thickness direction of the semiconductor chip, has electrical conductivity, and constitutes a control circuit that controls the semiconductor device; a first terminal electrically connected to the first metal plate; a second metal plate electrically connected to the semiconductor chip via a conductive member; a second terminal electrically connected to the second metal plate; a second resin member supporting the first terminal and the second terminal, the control circuit includes a gate circuit, an auxiliary source circuit, a temperature characteristic detection circuit, and an electrical characteristic detection circuit; the control circuit metal plate includes a gate terminal constituting a part of the gate circuit, an auxiliary source terminal constituting a part of the auxiliary source circuit, a temperature characteristic detection terminal constituting a part of the temperature characteristic detection circuit, and an electric characteristic detection terminal constituting a part of the electric characteristic detection circuit, each of the first metal plate having electrical conduct
  • 10a, 10b, 10c semiconductor device 11a first resin member, 11c potting resin member, 12a, 12b, 12c second resin member, 13a DBC substrate, 13b lead frame, 14a P terminal, 14b N terminal, 14c O terminal, 15a, 15b control circuit metal plate, 16a, 16b, 16c round hole, 17a rib, 18a, 18b fillet, 19a, 19b, 19c, 19d through hole, 21a first gate terminal, 21b first auxiliary source terminal, 21c first temperature characteristic detection terminal, 21d electrical characteristic detection terminal, 22a second gate terminal, 22b second auxiliary source terminal, 22c second temperature characteristic detection terminal, 23a, 23b, 23c, 23d resistor, 24a thermistor, 25a, 25b Insert metal, 26a: first terminal, 27a: first frame, 27b: exposed frame portion, 28a, 28b, 29a, 29b, 29c: engaging portion, 31a, 31b: first metal plate, 32a: second metal plate, 33a: insulating layer, 34a

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Abstract

This semiconductor device comprises: a first metal plate that has electrical conductivity; a semiconductor chip that is disposed on the first metal plate and is electrically connected to the first metal plate; and a control circuit metal plate that is disposed at a position different from that of the first metal plate in the thickness direction of the semiconductor chip, has electrical conductivity, and constitutes a control circuit for controlling the semiconductor device. The control circuit includes at least one of a gate circuit, an auxiliary source circuit, a temperature characteristic detection circuit, and an electrical characteristic detection circuit.

Description

半導体装置Semiconductor Device

 本開示は、半導体装置に関するものである。本出願は、2023年5月29日出願の日本出願第2023-088226号に基づく優先権を主張し、前記日本出願に記載された全ての記載内容を援用するものである。 This disclosure relates to a semiconductor device. This application claims priority to Japanese Application No. 2023-088226, filed May 29, 2023, and incorporates all of the contents of said Japanese application by reference.

 制御回路基板を備える半導体装置に関する技術が開示されている(例えば、特許文献1、特許文献2および特許文献3参照)。 Technology relating to semiconductor devices equipped with control circuit boards has been disclosed (see, for example, Patent Document 1, Patent Document 2, and Patent Document 3).

特開2007-234753号公報JP 2007-234753 A 特開2014-194014号公報JP 2014-194014 A 特開2018-170362号公報JP 2018-170362 A

 本開示に従った半導体装置は、導電性を有する第1金属板と、第1金属板上に配置され、第1金属板と電気的に接続される半導体チップと、半導体チップの厚さ方向において第1金属板と異なる位置に配置され、導電性を有し、半導体装置を制御する制御回路を構成する制御回路金属板と、を備える。制御回路は、ゲート回路、補助ソース回路、温度特性検出回路および電気特性検出回路のうちの少なくともいずれか一つを含む。 The semiconductor device according to the present disclosure includes a first metal plate having electrical conductivity, a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate, and a control circuit metal plate that is disposed at a position different from the first metal plate in the thickness direction of the semiconductor chip, has electrical conductivity, and constitutes a control circuit for controlling the semiconductor device. The control circuit includes at least one of a gate circuit, an auxiliary source circuit, a temperature characteristic detection circuit, and an electrical characteristic detection circuit.

図1は、実施の形態1における半導体装置の概略斜視図である。FIG. 1 is a schematic perspective view of a semiconductor device according to a first embodiment. 図2は、図1に示す半導体装置の概略平面図である。FIG. 2 is a schematic plan view of the semiconductor device shown in FIG. 図3は、図1に示す半導体装置の概略底面図である。FIG. 3 is a schematic bottom view of the semiconductor device shown in FIG. 図4は、図1に示す半導体装置の概略正面図である。FIG. 4 is a schematic front view of the semiconductor device shown in FIG. 図5は、図1に示す半導体装置の概略背面図である。FIG. 5 is a schematic rear view of the semiconductor device shown in FIG. 図6は、図1に示す半導体装置の概略左側面図である。FIG. 6 is a schematic left side view of the semiconductor device shown in FIG. 図7は、図1に示す半導体装置の概略右側面図である。FIG. 7 is a schematic right side view of the semiconductor device shown in FIG. 図8は、図1に示す半導体装置において、後述する第1樹脂部材を取り除いた状態を示す概略斜視図である。FIG. 8 is a schematic perspective view showing a state in which a first resin member, which will be described later, has been removed from the semiconductor device shown in FIG. 図9は、図8に示す半導体装置の概略平面図である。FIG. 9 is a schematic plan view of the semiconductor device shown in FIG. 図10は、図9中のX-Xで示す線分で切断した場合の概略断面図である。FIG. 10 is a schematic cross-sectional view taken along the line XX in FIG. 図11は、後述の8つの半導体チップを搭載したDBC基板を示す概略平面図である。FIG. 11 is a schematic plan view showing a DBC substrate on which eight semiconductor chips, which will be described later, are mounted. 図12は、図11に示すDBC基板を図12中のXII-XIIで示す線分で切断した場合の概略断面図である。FIG. 12 is a schematic cross-sectional view of the DBC substrate shown in FIG. 11 taken along the line indicated by XII-XII in FIG. 図13は、インサート金属が配置される領域を拡大して示す概略斜視図である。FIG. 13 is a schematic perspective view showing an enlarged area where the insert metal is placed. 図14は、制御回路金属板にソルダ―レジストを設けた場合の半導体装置の一部を拡大して示す概略平面図である。FIG. 14 is a schematic plan view showing an enlarged view of a part of a semiconductor device in which a solder resist is provided on a control circuit metal plate. 図15は、本開示の実施の形態2における半導体装置において、第1樹脂部材を取り除いた状態を示す概略斜視図である。FIG. 15 is a schematic perspective view showing a state in which the first resin member has been removed in the semiconductor device according to the second embodiment of the present disclosure. 図16は、図15に示す半導体装置の概略平面図である。FIG. 16 is a schematic plan view of the semiconductor device shown in FIG. 図17は、図15に示す半導体装置の概略底面図である。FIG. 17 is a schematic bottom view of the semiconductor device shown in FIG. 図18は、図15に示す半導体装置の内部の一部を拡大して示す概略底面図である。18 is a schematic bottom view showing an enlarged portion of the inside of the semiconductor device shown in FIG. 図19は、本開示の実施の形態3における半導体装置を示す概略斜視図である。FIG. 19 is a schematic perspective view showing a semiconductor device according to the third embodiment of the present disclosure.

 [本開示が解決しようとする課題]
 昨今、半導体装置においては、そのサイズが小さくなるようコンパクト化を図りながら、安定した動作を確保することが求められる。
[Problem to be solved by this disclosure]
Recently, there is a demand for semiconductor devices to be compact so as to reduce their size while still ensuring stable operation.

 そこで、コンパクト化を図りながら、安定した動作を確保ことができる半導体装置を提供することを目的の1つとする。 Therefore, one of the objectives is to provide a semiconductor device that can ensure stable operation while being compact.

 [本開示の効果]
 このような半導体装置によると、コンパクト化を図りながら、安定した動作を確保することができる。
[Effects of the present disclosure]
According to such a semiconductor device, stable operation can be ensured while achieving compactness.

 [本開示の実施形態の説明]
 (1)本開示に係る半導体装置は、導電性を有する第1金属板と、第1金属板上に配置され、第1金属板と電気的に接続される半導体チップと、半導体チップの厚さ方向において第1金属板と異なる位置に配置され、導電性を有し、半導体装置を制御する制御回路を構成する制御回路金属板と、を備える。制御回路は、ゲート回路、補助ソース回路、温度特性検出回路および電気特性検出回路のうちの少なくともいずれか一つを含む。
[Description of the embodiments of the present disclosure]
(1) A semiconductor device according to the present disclosure includes a first metal plate having electrical conductivity, a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate, and a control circuit metal plate disposed at a position different from the first metal plate in a thickness direction of the semiconductor chip, having electrical conductivity, and constituting a control circuit for controlling the semiconductor device. The control circuit includes at least one of a gate circuit, an auxiliary source circuit, a temperature characteristic detection circuit, and an electrical characteristic detection circuit.

 本開示に係る半導体装置によると、制御回路金属板によって構成される制御回路は、ゲート回路、補助ソース回路、温度特性検出回路および電気特性検出回路のうちの少なくともいずれか一つを含むため、より厳密な半導体装置の制御が可能になる。ゲート回路、補助ソース回路、温度特性検出回路および電気特性検出回路のうちの少なくともいずれか一つを含む制御回路を構成する制御回路金属板は、半導体チップの厚さ方向において半導体チップを搭載する第1金属板と異なる位置に配置される。そうすると、第1金属板の厚さ方向に垂直な方向において半導体装置の全体形状のサイズが大きくなることを抑制しながら、第1金属板を大きく広げることができる。すなわち、制御回路金属板の大きさに関わらず、半導体チップの放熱性の向上に寄与する第1金属板の面積を大きくすることができる。さらに、高温になる半導体チップと異なる位置に制御回路金属板は配置されるため、半導体チップからの熱干渉も防ぐことができる。したがって、半導体装置のコンパクト化を図りながら、安定した動作を確保することができる。 In the semiconductor device according to the present disclosure, the control circuit formed by the control circuit metal plate includes at least one of the gate circuit, the auxiliary source circuit, the temperature characteristic detection circuit, and the electrical characteristic detection circuit, so that the semiconductor device can be controlled more precisely. The control circuit metal plate constituting the control circuit including at least one of the gate circuit, the auxiliary source circuit, the temperature characteristic detection circuit, and the electrical characteristic detection circuit is disposed at a position different from the first metal plate on which the semiconductor chip is mounted in the thickness direction of the semiconductor chip. In this way, the first metal plate can be greatly expanded while suppressing the increase in the overall size of the semiconductor device in the direction perpendicular to the thickness direction of the first metal plate. In other words, regardless of the size of the control circuit metal plate, the area of the first metal plate that contributes to improving the heat dissipation of the semiconductor chip can be increased. Furthermore, since the control circuit metal plate is disposed at a position different from the semiconductor chip that becomes hot, thermal interference from the semiconductor chip can also be prevented. Therefore, stable operation can be ensured while achieving compactness of the semiconductor device.

 この場合、制御回路金属板は、絶縁層を含む基板の構成を必ずしも採用しなくともよいため、半導体装置の製造時等において、絶縁層を有する場合の絶縁層の耐熱の制約を受けない。また、絶縁層を省略することができれば、コストダウンを図ることができる。さらに、絶縁層を省略すると制御回路金属板の厚さ方向の寸法の制約が緩和され、制御回路金属板の厚さを大きくして、寄生抵抗の低減や寄生インダクタンスの低減を図ることができ、より安定した動作を確保することができる。さらに、絶縁層を省略できれば、制御回路金属板は、他の金属部品と金属接合を取ることができ、生産性の向上を図ることができる。 In this case, the control circuit metal plate does not necessarily have to adopt the configuration of a substrate including an insulating layer, so there is no restriction on the heat resistance of the insulating layer when an insulating layer is included during the manufacture of the semiconductor device, etc. Furthermore, if the insulating layer can be omitted, costs can be reduced. Furthermore, omitting the insulating layer relaxes the dimensional restrictions in the thickness direction of the control circuit metal plate, and the thickness of the control circuit metal plate can be increased to reduce parasitic resistance and parasitic inductance, ensuring more stable operation. Furthermore, if the insulating layer can be omitted, the control circuit metal plate can be metallically bonded to other metal components, improving productivity.

 (2)上記(1)において、半導体チップの厚さ方向に見て、制御回路金属板は、第1金属板と重複する領域を含んでもよい。このようにすることにより、半導体チップの厚さ方向において、制御回路金属板が位置する領域を有効活用しながら、第1金属板を大きくすることができる。したがって、より確実にコンパクト化を図りながら、放熱性の向上を図ることができる。 (2) In (1) above, the control circuit metal plate may include an area that overlaps with the first metal plate when viewed in the thickness direction of the semiconductor chip. This allows the first metal plate to be made larger while effectively utilizing the area in the thickness direction of the semiconductor chip where the control circuit metal plate is located. This allows for more reliable compactness while improving heat dissipation.

 (3)上記(1)または(2)において、半導体チップを封止する第1樹脂部材をさらに備えてもよい。制御回路金属板は、第1樹脂部材から露出する部分を有する第1端子と、第1樹脂部材によって覆われる部分を有する第1フレームと、を含んでもよい。第1端子と第1フレームとは、一体で構成されていてもよい。このようにすることにより、制御回路金属板に含まれ、第1端子と一体で構成されている第1フレームを後述する第2樹脂部材により保持すれば第1端子も同時に配置できるため、製造時における組み立て性の向上を図ることができる。ここで、「一体」とは、第1端子と第1フレームとが、複数の部材を接着やねじによる連結等により組み合わせて製造されているものではなく、単一の部材で製造されているものをいう。 (3) In the above (1) or (2), a first resin member that seals the semiconductor chip may be further provided. The control circuit metal plate may include a first terminal having a portion exposed from the first resin member, and a first frame having a portion covered by the first resin member. The first terminal and the first frame may be integrally configured. In this manner, the first terminal can be arranged at the same time by holding the first frame, which is included in the control circuit metal plate and integrally configured with the first terminal, with the second resin member described below, improving assembly during manufacturing. Here, "integral" means that the first terminal and the first frame are manufactured from a single member, rather than being manufactured by combining multiple members by bonding, connecting with screws, or the like.

 (4)上記(1)または(2)において、半導体チップを封止する第1樹脂部材をさらに備えてもよい。制御回路金属板は、第1樹脂部材から露出する部分を有する第1端子と、第1樹脂部材によって覆われる部分を有する第1フレームと、を含んでもよい。第1端子と第1フレームとは、別体で構成されていてもよい。第1端子は、第2樹脂部材に保持されていてもよい。このようにすることにより、第1フレームを金属接合することで、第1フレームを固定すると同時に電気的接続を取ることができる。ここで、「別体」とは、上記「一体」とは相対する概念であり、第1端子と第1フレームとが単一の部材で製造されているものではなく、複数の部材を接着やねじによる連結等により組み合わせて製造されているものである。 (4) In the above (1) or (2), a first resin member that seals the semiconductor chip may be further provided. The control circuit metal plate may include a first terminal having a portion exposed from the first resin member, and a first frame having a portion covered by the first resin member. The first terminal and the first frame may be configured as separate bodies. The first terminal may be held by the second resin member. In this way, by metal-joining the first frame, it is possible to fix the first frame and simultaneously establish an electrical connection. Here, "separate bodies" is a concept that is opposed to the above-mentioned "integral body," and the first terminal and the first frame are not manufactured from a single member, but are manufactured by combining multiple members by bonding, connecting with screws, etc.

 (5)上記(1)から(4)のいずれかにおいて、半導体チップを封止する第1樹脂部材と、第1樹脂部材と別体で設けられる第2樹脂部材をさらに備えてもよい。制御回路金属板は、第2樹脂部材上に配置されていてもよい。このようにすることにより、第2樹脂部材により制御回路金属板の位置決めを行って、制御回路金属板を固定することができる。したがって、製造治具が不要になり生産性の向上を図ることができる。また、制御回路金属板にワイヤを超音波接合にて接合する際に、第2樹脂部材は土台として機能する。したがって、超音波振動が効率よく印加されるため、安定した接合を確保することができる。また、第2樹脂部材は絶縁物であるため、第1金属板とは確実に絶縁を確保した状態で配置することができるため、安定した動作を確保することができる。 (5) In any of (1) to (4) above, a first resin member that seals the semiconductor chip and a second resin member that is provided separately from the first resin member may be further provided. The control circuit metal plate may be disposed on the second resin member. In this way, the control circuit metal plate can be positioned by the second resin member and fixed. Therefore, a manufacturing jig is not required, and productivity can be improved. In addition, when bonding wires to the control circuit metal plate by ultrasonic bonding, the second resin member functions as a base. Therefore, ultrasonic vibrations are applied efficiently, and stable bonding can be ensured. In addition, since the second resin member is an insulator, it can be disposed in a state where insulation from the first metal plate is ensured, and stable operation can be ensured.

 (6)上記(1)から(5)のいずれかにおいて、半導体装置は、半導体チップを封止する第1樹脂部材と、第1樹脂部材と別体で設けられる第2樹脂部材と、をさらに備えてもよい。制御回路金属板は、第2樹脂部材から突出する突出部および第2樹脂部材によって保持される保持部を有する第1端子と、第1樹脂部材によって覆われる部分を有する第1フレームと、を含んでもよい。保持部は、第2樹脂部材から露出する端子露出部を含んでもよい。第1フレームは、半導体チップの厚さ方向に見て端子露出部が位置する領域において第1端子と接合されていてもよい。このようにすることにより、端子露出部において第1端子と第1フレームの金属同士が重なるため、レーザー溶接等の溶融接合や、はんだやロウ材等の液相接合等の金属接合が可能になり、固定と同時に電気的接続を取ることができる。そのため、接合時間を短縮することができ、生産性の向上を図ることができる。 (6) In any of (1) to (5) above, the semiconductor device may further include a first resin member that seals the semiconductor chip, and a second resin member that is provided separately from the first resin member. The control circuit metal plate may include a first terminal having a protruding portion protruding from the second resin member and a holding portion held by the second resin member, and a first frame having a portion covered by the first resin member. The holding portion may include a terminal exposed portion exposed from the second resin member. The first frame may be joined to the first terminal in a region where the terminal exposed portion is located when viewed in the thickness direction of the semiconductor chip. In this way, the metals of the first terminal and the first frame overlap each other in the terminal exposed portion, making it possible to perform metal joining such as fusion joining by laser welding or liquid phase joining by solder or brazing material, and to achieve electrical connection at the same time as fixing. This allows the joining time to be shortened, thereby improving productivity.

 (7)上記(1)から(6)のいずれかにおいて、半導体装置は、半導体チップを封止する第1樹脂部材と、第1樹脂部材と別体で設けられる第2樹脂部材と、第2樹脂部材に保持され、制御回路金属板と接合されるインサート金属と、をさらに備えてもよい。インサート金属は、第2樹脂部材から露出する第1露出部を含んでもよい。インサート金属は、半導体チップの厚さ方向に見て第1露出部が位置する領域において制御回路金属板と接合されてもよい。このようにすることにより、第1露出部においてインサート金属と制御回路金属板の金属同士が重なるため、レーザー溶接等の溶融接合や、はんだやロウ材等の液相接合等の金属接合が可能になり、第2樹脂部材と制御回路金属板を固定することができる。そのため、接合時間を短縮することができ、生産性の向上を図ることができる。また、温度特性検出回路において、インサート金属を介して制御回路金属板と第1金属板とを接続することができ、制御回路金属板および第1金属板間の熱伝導を良好にすることができる。したがって、温度特性検出回路にサーミスタを取り付けた場合、半導体チップの温度、半導体装置の水冷温度をより高精度に監視することができる。 (7) In any of the above (1) to (6), the semiconductor device may further include a first resin member that seals the semiconductor chip, a second resin member that is provided separately from the first resin member, and an insert metal that is held by the second resin member and joined to the control circuit metal plate. The insert metal may include a first exposed portion exposed from the second resin member. The insert metal may be joined to the control circuit metal plate in a region where the first exposed portion is located when viewed in the thickness direction of the semiconductor chip. In this way, the metals of the insert metal and the control circuit metal plate overlap each other in the first exposed portion, making it possible to perform metal joining such as fusion joining by laser welding or liquid phase joining by solder or brazing material, and to fix the second resin member and the control circuit metal plate. Therefore, it is possible to shorten the joining time and improve productivity. In addition, in the temperature characteristic detection circuit, the control circuit metal plate and the first metal plate can be connected via the insert metal, and the heat conduction between the control circuit metal plate and the first metal plate can be improved. Therefore, if a thermistor is attached to the temperature characteristic detection circuit, the temperature of the semiconductor chip and the water-cooling temperature of the semiconductor device can be monitored with higher accuracy.

 (8)上記(1)から(6)のいずれかにおいて、半導体装置は、半導体チップを封止する第1樹脂部材と、第1樹脂部材と別体で設けられる第2樹脂部材と、第2樹脂部材に保持され、第1金属板および制御回路金属板と接合されるインサート金属と、をさらに備えてもよい。インサート金属は、第2樹脂部材から露出する第2露出部を含んでもよい。インサート金属は、半導体チップの厚さ方向に見て第2露出部が位置する領域において第1金属板と接合されてもよい。このようにすることにより、第2露出部においてインサート金属と第1金属板の金属同士が重なるため、レーザー溶接等の溶融接合や、はんだやロウ材等の液相接合等の金属接合が可能になり、第2樹脂部材と第1金属板を固定することができる。そのため、接合時間を短縮することができ、生産性の向上を図ることができる。また、温度特性検出回路においては、前述と同様にサーミスタによる温度監視を高精度に行うことができる。 (8) In any of (1) to (6) above, the semiconductor device may further include a first resin member that seals the semiconductor chip, a second resin member that is provided separately from the first resin member, and an insert metal that is held by the second resin member and joined to the first metal plate and the control circuit metal plate. The insert metal may include a second exposed portion that is exposed from the second resin member. The insert metal may be joined to the first metal plate in a region where the second exposed portion is located when viewed in the thickness direction of the semiconductor chip. In this way, the metals of the insert metal and the first metal plate overlap each other in the second exposed portion, making it possible to perform metal joining such as fusion joining by laser welding or liquid phase joining by solder or brazing material, and to fix the second resin member and the first metal plate. Therefore, the joining time can be shortened, and productivity can be improved. In addition, in the temperature characteristic detection circuit, temperature monitoring by a thermistor can be performed with high accuracy as described above.

 (9)上記(1)から(8)のいずれかにおいて、制御回路金属板の一部上には、ソルダーレジストが設けられていてもよい。このようにすることにより、制御回路金属板に電子部品を接合する際に、ソルダ―レジストにより電子部品を接合する際の接合材の流出を防止することができ、電子部品の確実な位置決めおよび電気的な接続を確保することができる。 (9) In any of the above (1) to (8), a solder resist may be provided on a portion of the control circuit metal plate. In this way, when joining electronic components to the control circuit metal plate, the solder resist can prevent the flow of joining material when joining the electronic components, thereby ensuring reliable positioning and electrical connection of the electronic components.

 (10)上記(1)から(9)のいずれかにおいて、半導体装置は、制御回路金属板に電気的に接続される電子部品をさらに備えてもよい。このようにすることにより、半導体チップをトランジスタチップとして用いた場合に、トランジスタが動作した際におけるリンギングの抑制や発振の抑制、トランジスタチップの温度や半導体チップをダイオードチップとして用いた場合のダイオードチップの温度、半導体装置の水冷温度等を監視する等、電子部品による半導体装置の高精度な制御等を行うことができる。また、電子部品を事前に組み込んだ制御回路金属板を用意すれば、制御回路金属板を配置するだけで電子部品を含んだ回路を製造できるため、生産性の向上を図ることができる。 (10) In any of (1) to (9) above, the semiconductor device may further include electronic components electrically connected to the control circuit metal plate. In this way, when the semiconductor chip is used as a transistor chip, it is possible to perform highly accurate control of the semiconductor device using electronic components, such as suppressing ringing and oscillation when the transistor operates, and monitoring the temperature of the transistor chip, the temperature of the diode chip when the semiconductor chip is used as a diode chip, and the water-cooling temperature of the semiconductor device. In addition, if a control circuit metal plate with electronic components already incorporated is prepared, a circuit including electronic components can be manufactured simply by arranging the control circuit metal plate, thereby improving productivity.

 (11)上記(1)から(10)のいずれかにおいて、半導体装置は、半導体チップを封止する第1樹脂部材と、第1樹脂部材と別体で設けられる第2樹脂部材と、をさらに備えてもよい。第2樹脂部材には、制御回路金属板と係合する係合部が設けられていてもよい。このようにすることにより、第2樹脂部材に対して係合部を利用して制御回路金属板の位置決めを行うことができる。したがって、制御回路金属板の位置決めに利用する治具が不要となり、生産性の向上を図ることができる。 (11) In any of (1) to (10) above, the semiconductor device may further include a first resin member that seals the semiconductor chip, and a second resin member that is provided separately from the first resin member. The second resin member may be provided with an engagement portion that engages with the control circuit metal plate. In this way, the control circuit metal plate can be positioned relative to the second resin member using the engagement portion. Therefore, a jig used to position the control circuit metal plate is not required, and productivity can be improved.

 (12)上記(1)から(11)のいずれかにおいて、第1金属板は、リードフレームであるか、または半導体チップの厚さ方向において半導体チップが配置される面と反対側の面に絶縁層を有する基板上の電極であってもよい。第1金属板がリードフレームであれば、絶縁層を設ける必要はないため、部品点数の低減等を図ることができ、構成をシンプルにすることができる。また、第1金属板を上記基板上の電極とすることにより、例えば、DBC(Direct Bonded Copper)基板を用いて上記構成とすることができ、生産効率の向上やコストダウンを図ることができる。 (12) In any of (1) to (11) above, the first metal plate may be a lead frame or an electrode on a substrate having an insulating layer on the surface opposite to the surface on which the semiconductor chip is arranged in the thickness direction of the semiconductor chip. If the first metal plate is a lead frame, there is no need to provide an insulating layer, so the number of parts can be reduced, and the configuration can be simplified. In addition, by making the first metal plate an electrode on the substrate, the above configuration can be achieved using, for example, a DBC (Direct Bonded Copper) substrate, which can improve production efficiency and reduce costs.

 (13)上記(1)から(12)のいずれかにおいて、半導体装置は、半導体チップを封止する第1樹脂部材と、第1樹脂部材と別体で設けられる第2樹脂部材と、をさらに備えてもよい。第1金属板は、リードフレームであってもよい。第1金属板は、半導体チップの厚さ方向に延びる接続部を含んでもよい。第1金属板は、接続部において制御回路金属板と接合されてもよい。このようにすることにより、リードフレームである第1金属板に設けられた接続部を利用して、制御回路金属板と接合することができる。したがって、より部品点数の削減を図って、生産性の向上の図ることができる。 (13) In any of (1) to (12) above, the semiconductor device may further include a first resin member that seals the semiconductor chip, and a second resin member that is provided separately from the first resin member. The first metal plate may be a lead frame. The first metal plate may include a connection portion that extends in the thickness direction of the semiconductor chip. The first metal plate may be joined to the control circuit metal plate at the connection portion. In this way, the connection portion provided on the first metal plate, which is the lead frame, can be used to join to the control circuit metal plate. This can further reduce the number of parts and improve productivity.

 (14)上記(1)から(13)のいずれかにおいて、半導体装置は、半導体チップを封止する第1樹脂部材と、第1樹脂部材と別体で設けられる第2樹脂部材と、第1金属板に対して、半導体チップの厚さ方向において半導体チップが配置される面と反対側の面に配置される絶縁層と、をさらに備えてもよい。制御回路金属板は、第2樹脂部材上に配置されてもよい。第2樹脂部材は、第1金属板上または絶縁層上に配置されてもよい。第2樹脂部材の融点は、第1樹脂部材の融点よりも高くてもよい。このようにすることにより、第2樹脂部材を配置した後に溶融させた第1樹脂部材を流し込んで成型する際に、第2樹脂部材が溶融するおそれを低減することができる。したがって、安定して生産を行うことができる。 (14) In any of (1) to (13) above, the semiconductor device may further include a first resin member that seals the semiconductor chip, a second resin member provided separately from the first resin member, and an insulating layer that is arranged on the surface of the first metal plate opposite the surface on which the semiconductor chip is arranged in the thickness direction of the semiconductor chip. The control circuit metal plate may be arranged on the second resin member. The second resin member may be arranged on the first metal plate or on the insulating layer. The melting point of the second resin member may be higher than the melting point of the first resin member. In this way, it is possible to reduce the risk of the second resin member melting when the molten first resin member is poured in and molded after the second resin member is arranged. Therefore, stable production can be performed.

 (15)上記(1)から(14)のいずれかにおいて、半導体装置は、第1金属板に対して、半導体チップの厚さ方向において半導体チップが配置ある面と反対側の第1金属板の面に配置される絶縁層と、絶縁層に対して、半導体チップの厚さ方向において第1金属板と反対側に配置される第2金属板と、をさらに備えてもよい。第2金属板には、第2金属板の外縁と間隔をあけてスリットが形成されていてもよい。このようにすることにより、第2金属板とヒートシンクとを接合する際に、スリットで分割されているため、端部から端部に至る距離を短くすることができる。そうすると、温度変化時において線膨張係数の差に起因した端部に負荷されるストレスを軽減することができる。この場合、第2金属板とヒートシンクを接合する接合材は、スリットの端面より内側に配置される。また、スリットは第2金属板の外縁との間隔をあけて形成されているため、樹脂モールド時において第2金属板の外周が金型で押さえられ、スリット内に樹脂が入り込むおそれを低減することができる。したがって、より確実に接合部における応力の緩和を図ることができる。 (15) In any of (1) to (14) above, the semiconductor device may further include an insulating layer disposed on the surface of the first metal plate opposite to the surface on which the semiconductor chip is disposed in the thickness direction of the semiconductor chip with respect to the first metal plate, and a second metal plate disposed on the opposite side of the insulating layer to the first metal plate in the thickness direction of the semiconductor chip. The second metal plate may have a slit formed at a distance from the outer edge of the second metal plate. In this way, when the second metal plate and the heat sink are joined, the distance from one end to the other end can be shortened because the second metal plate is divided by the slit. In this way, the stress applied to the end due to the difference in linear expansion coefficient during temperature change can be reduced. In this case, the joining material that joins the second metal plate and the heat sink is placed inside the end face of the slit. In addition, since the slit is formed at a distance from the outer edge of the second metal plate, the outer periphery of the second metal plate is pressed by the mold during resin molding, and the risk of resin entering the slit can be reduced. Therefore, stress at the joint can be more reliably relieved.

 (16)上記(1)から(14)のいずれかにおいて、第1金属板は、リードフレームであってもよい。第1金属板の半導体チップが配置される面と反対側の面には、第1金属板の外縁と間隔をあけて凹溝が形成されてもよい。このようにすることにより、第1金属板とヒートシンクとを接合する際に、端部から端部に至る距離を短くすることができる。そうすると、温度変化時において線膨張係数の差に起因した端部に負荷されるストレスを軽減することができる。この場合、凹溝は第1金属板の外縁との間隔をあけて形成されているため、樹脂モールド時において、凹溝内に樹脂が入り込むおそれを低減することができる。したがって、より確実に接合部における応力の緩和を図ることができる。 (16) In any of (1) to (14) above, the first metal plate may be a lead frame. A groove may be formed on the surface of the first metal plate opposite the surface on which the semiconductor chip is arranged, with a gap from the outer edge of the first metal plate. In this way, the distance from end to end can be shortened when joining the first metal plate to the heat sink. This can reduce the stress applied to the end caused by the difference in linear expansion coefficient during temperature changes. In this case, since the groove is formed with a gap from the outer edge of the first metal plate, the risk of resin entering the groove during resin molding can be reduced. Therefore, stress at the joint can be more reliably alleviated.

 (17)上記(1)から(16)のいずれかにおいて、半導体装置は、半導体チップを封止する第1樹脂部材と、第1端子と、第1端子と異なる第2端子と、をさらに備えてもよい。第1端子および第2端子はそれぞれ、P端子、N端子、O端子、ゲート端子、補助ソース端子、温度特性検出端子および電気特性検出端子のうちのいずれか一つであってもよい。第1樹脂部材には、第1端子と第2端子との間に配置されるリブが形成されていてもよい。第1端子および第2端子のうちの少なくともいずれか一方には、リブを受け入れる切り欠きが設けられていてもよい。このようにすることにより、第1端子と第2端子間の沿面距離を長くしながら、第1端子と第2端子とを近接して配置することができる。そうすると、半導体装置のコンパクト化を図りながら、インダクタンスの低減を図ることができる。また、リブを受け入れる切り欠きが設けられているため、第1端子と第2端子の間の距離を広げることなくリブの根元のフィレットを大きく取ることができ、寄生インダクタンスの増加を抑えながらリブの強度も補強することができる。 (17) In any of the above (1) to (16), the semiconductor device may further include a first resin member that seals the semiconductor chip, a first terminal, and a second terminal different from the first terminal. The first terminal and the second terminal may be any one of a P terminal, an N terminal, an O terminal, a gate terminal, an auxiliary source terminal, a temperature characteristic detection terminal, and an electrical characteristic detection terminal. The first resin member may be formed with a rib disposed between the first terminal and the second terminal. At least one of the first terminal and the second terminal may be provided with a notch that receives the rib. In this way, the first terminal and the second terminal can be disposed close to each other while increasing the creepage distance between the first terminal and the second terminal. This makes it possible to reduce the inductance while making the semiconductor device more compact. In addition, since the notch that receives the rib is provided, the fillet at the base of the rib can be made large without increasing the distance between the first terminal and the second terminal, and the strength of the rib can be reinforced while suppressing an increase in parasitic inductance.

 [本開示の実施形態の詳細]
  次に、本開示の半導体装置の実施形態を、図面を参照しつつ説明する。以下の図面において同一または相当する部分には同一の参照符号を付しその説明は繰り返さない。
[Details of the embodiment of the present disclosure]
Next, an embodiment of a semiconductor device according to the present disclosure will be described with reference to the drawings. In the following drawings, the same or corresponding parts are designated by the same reference characters and their description will not be repeated.

 (実施の形態1)
 本開示の実施の形態1における半導体装置について説明する。図1は、実施の形態1における半導体装置の概略斜視図である。図2は、図1に示す半導体装置の概略平面図である。図3は、図1に示す半導体装置の概略底面図である。図4は、図1に示す半導体装置の概略正面図である。図4は、図2中の矢印IVで示す向きに見た図である。図5は、図1に示す半導体装置の概略背面図である。図5は、図2中の矢印Vで示す向きに見た図である。図6は、図1に示す半導体装置の概略左側面図である。図6は、図2中の矢印VIで示す向きに見た図である。図7は、図1に示す半導体装置の概略右側面図である。図7は、図2中の矢印VIIで示す向きに見た図である。図8は、図1に示す半導体装置において、後述する第1樹脂部材を取り除いた状態を示す概略斜視図である。図9は、図8に示す半導体装置の概略平面図である。図10は、図9中のX-Xで示す線分で切断した場合の概略断面図である。図11は、後述の8つの半導体チップを搭載したDBC基板を示す概略平面図である。なお、図1以下に示す図面において、Z方向は、後述する半導体チップの厚さ方向を示し、Y方向は、後述する第1主端子と第2主端子が並ぶ方向を示し、X方向は、Y方向に直交する方向を示す。X方向、Y方向およびZ方向は、それぞれ直交する。
(Embodiment 1)
A semiconductor device according to a first embodiment of the present disclosure will be described. FIG. 1 is a schematic perspective view of the semiconductor device according to the first embodiment. FIG. 2 is a schematic plan view of the semiconductor device shown in FIG. 1. FIG. 3 is a schematic bottom view of the semiconductor device shown in FIG. 1. FIG. 4 is a schematic front view of the semiconductor device shown in FIG. 1. FIG. 4 is a view seen in the direction indicated by the arrow IV in FIG. 2. FIG. 5 is a schematic rear view of the semiconductor device shown in FIG. 1. FIG. 5 is a view seen in the direction indicated by the arrow V in FIG. 2. FIG. 6 is a schematic left side view of the semiconductor device shown in FIG. 1. FIG. 6 is a view seen in the direction indicated by the arrow VI in FIG. 2. FIG. 7 is a schematic right side view of the semiconductor device shown in FIG. 1. FIG. 7 is a view seen in the direction indicated by the arrow VII in FIG. 2. FIG. 8 is a schematic perspective view showing a state in which a first resin member described later is removed from the semiconductor device shown in FIG. 1. FIG. 9 is a schematic plan view of the semiconductor device shown in FIG. 8. FIG. 10 is a schematic cross-sectional view taken along the line indicated by X-X in FIG. 9. Fig. 11 is a schematic plan view showing a DBC substrate on which eight semiconductor chips described later are mounted. In Fig. 1 and subsequent figures, the Z direction indicates the thickness direction of the semiconductor chips described later, the Y direction indicates the direction in which the first main terminals and the second main terminals described later are arranged, and the X direction indicates the direction perpendicular to the Y direction. The X direction, the Y direction, and the Z direction are perpendicular to each other.

 図1、図2、図3、図4、図5、図6、図7、図8、図9、図10および図11を参照して、実施の形態1における半導体装置10aは、第1樹脂部材11aと、第2樹脂部材12aと、ベース基板としてのDBC(Direct Bonded Copper)基板13aと、第1主端子としてのP端子14aと、第2主端子としてのN端子14bと、第3主端子としてのO端子14cと、制御回路金属板15aと、制御回路金属板15bと、を含む。 Referring to Figures 1, 2, 3, 4, 5, 6, 7, 8, 9, 10 and 11, the semiconductor device 10a in the first embodiment includes a first resin member 11a, a second resin member 12a, a DBC (Direct Bonded Copper) substrate 13a as a base substrate, a P terminal 14a as a first main terminal, an N terminal 14b as a second main terminal, an O terminal 14c as a third main terminal, a control circuit metal plate 15a and a control circuit metal plate 15b.

 制御回路金属板15aは、第1ゲート端子21aと、第1補助ソース端子21bと、電気特性検出端子21dと、を含む。制御回路金属板15bは、第2ゲート端子22aと、第2補助ソース端子22bと、第1温度特性検出端子21cと、第2温度特性検出端子22cと、を含む。本実施形態においては、P端子14aは、正極側端子を構成し、N端子14bは、負極側端子を構成し、O端子14cは、交流端子を構成する。半導体装置10aは、いわゆる2in1の構成を採用する。 The control circuit metal plate 15a includes a first gate terminal 21a, a first auxiliary source terminal 21b, and an electrical characteristic detection terminal 21d. The control circuit metal plate 15b includes a second gate terminal 22a, a second auxiliary source terminal 22b, a first temperature characteristic detection terminal 21c, and a second temperature characteristic detection terminal 22c. In this embodiment, the P terminal 14a constitutes the positive terminal, the N terminal 14b constitutes the negative terminal, and the O terminal 14c constitutes the AC terminal. The semiconductor device 10a employs a so-called 2-in-1 configuration.

 半導体装置10aは、制御回路金属板15aに電気的に接続される電子部品としての抵抗23a、抵抗23bと、を含む。抵抗23aおよび抵抗23bはそれぞれ、分割された領域を接続するように第1ゲート端子21aに取り付けられる。半導体装置10aは、制御回路金属板15bに電気的に接続される電子部品としての抵抗23c、抵抗23dと、サーミスタ24aと、を含む。抵抗23cおよび抵抗23dはそれぞれ、分割された領域を接続するように第2ゲート端子22aに取り付けられる。サーミスタ24aは、半導体装置10aの内部に配置される領域において、第1温度特性検出端子21cと第2温度特性検出端子22cとを接続するように取り付けられる。このような抵抗23a、抵抗23b、抵抗23cおよび抵抗23dは、後述する半導体チップ51a等をトランジスタチップとして用いた場合のトランジスタが動作した際におけるリンギングの抑制や発振の抑制に寄与している。また、サーミスタ24aについては、トランジスタチップの温度や後述する半導体チップ51e等をダイオードチップとして用いた場合のダイオードチップの温度、半導体装置10aの水冷温度等を監視する際に有効に利用される。電気特性検出端子21dは、例えば過電流検出を行うDESAT端子である。電気特性検出端子21dは、後述するインサート金属25aまたはインサート金属25bを介して、後述する第1金属板31aの第1領域41aと電気的に接続されている。 The semiconductor device 10a includes resistors 23a and 23b as electronic components electrically connected to the control circuit metal plate 15a. The resistors 23a and 23b are attached to the first gate terminal 21a so as to connect the divided regions. The semiconductor device 10a includes resistors 23c and 23d as electronic components electrically connected to the control circuit metal plate 15b, and a thermistor 24a. The resistors 23c and 23d are attached to the second gate terminal 22a so as to connect the divided regions. The thermistor 24a is attached to connect the first temperature characteristic detection terminal 21c and the second temperature characteristic detection terminal 22c in a region disposed inside the semiconductor device 10a. Such resistors 23a, 23b, 23c, and 23d contribute to suppressing ringing and oscillation when a transistor operates when a semiconductor chip 51a or the like described later is used as a transistor chip. The thermistor 24a is also effectively used to monitor the temperature of the transistor chip, the temperature of the diode chip when the semiconductor chip 51e described later is used as the diode chip, the water-cooling temperature of the semiconductor device 10a, etc. The electrical characteristic detection terminal 21d is, for example, a DESAT terminal that detects overcurrent. The electrical characteristic detection terminal 21d is electrically connected to the first region 41a of the first metal plate 31a described later via the insert metal 25a or the insert metal 25b described later.

 第1樹脂部材11aは、半導体装置10aに含まれる後述の半導体チップを含めた半導体装置10aに含まれる電子部品を封止する。第1樹脂部材11aは、後述するリブを除いて、直方体形状である。P端子14a、N端子14b、O端子14c、第1ゲート端子21a、第2ゲート端子22a、第1補助ソース端子21b、第2補助ソース端子22b、第1温度特性検出端子21c、第2温度特性検出端子22cおよび電気特性検出端子21dはそれぞれ、一部が第1樹脂部材11aの側面から露出するように構成される。第1樹脂部材11aは、上記した端子の一部を露出させ、全体を覆うモールド樹脂として機能する。第1樹脂部材11aの材質としては、例えばエポキシ樹脂等の熱硬化性樹脂が採用される。 The first resin member 11a seals the electronic components included in the semiconductor device 10a, including the semiconductor chip included in the semiconductor device 10a, which will be described later. The first resin member 11a has a rectangular parallelepiped shape, except for the ribs, which will be described later. The P terminal 14a, the N terminal 14b, the O terminal 14c, the first gate terminal 21a, the second gate terminal 22a, the first auxiliary source terminal 21b, the second auxiliary source terminal 22b, the first temperature characteristic detection terminal 21c, the second temperature characteristic detection terminal 22c, and the electrical characteristic detection terminal 21d are each configured so that a portion thereof is exposed from the side of the first resin member 11a. The first resin member 11a functions as a molded resin that exposes a portion of the above-mentioned terminals and covers the entire device. The material of the first resin member 11a is, for example, a thermosetting resin such as an epoxy resin.

 第1樹脂部材11aには、外方側に突出するリブ17aが設けられている。リブ17aの根本には、フィレット18a、フィレット18bが形成されており、太く構成されている。リブ17aは、本実施形態においては、P端子14aとN端子14bとの間に配置される。リブ17aのX方向の長さは、第1樹脂部材11aから露出しているP端子14aおよびN端子14bのX方向の長さよりも長く構成されている。なお、第1樹脂部材11aには、厚さ方向に貫通する4つの貫通穴19a、貫通穴19b、貫通穴19c、貫通穴19dが形成されている。この貫通穴19a、貫通穴19b、貫通穴19c、貫通穴19dは、第1樹脂部材11aをモールドする際のモールド金型に設けられる押圧ピンの痕である。後述する第2金属板32aの表面を第1樹脂部材11aから露出させるため、封止する前の半導体装置10aをモールド金型の下金型に押し付ける必要がある。押圧ピンで第1金属板31a等の導電部を押し付けると、導電部が第1樹脂部材11aから露出してしまい、絶縁が困難になるおそれがある。そのため、押圧ピンは後述する第2樹脂部材12aを押し付けることで第1樹脂部材11aから露出する部分は絶縁物になるため、導電部を露出させないようにすることができる。貫通穴19a、貫通穴19b、貫通穴19c、貫通穴19dは、厚さ方向に見て後述する第2樹脂部材12aと重複した位置に配置されている。 The first resin member 11a has a rib 17a that protrudes outward. Fillets 18a and 18b are formed at the base of the rib 17a, making it thick. In this embodiment, the rib 17a is disposed between the P terminal 14a and the N terminal 14b. The length of the rib 17a in the X direction is longer than the length of the P terminal 14a and the N terminal 14b exposed from the first resin member 11a in the X direction. The first resin member 11a has four through holes 19a, 19b, 19c, and 19d that penetrate in the thickness direction. The through holes 19a, 19b, 19c, and 19d are marks of pressure pins provided in the mold die when molding the first resin member 11a. In order to expose the surface of the second metal plate 32a (described later) from the first resin member 11a, it is necessary to press the semiconductor device 10a before sealing against the lower die of the molding die. If the conductive parts of the first metal plate 31a, etc. are pressed with a pressing pin, the conductive parts may be exposed from the first resin member 11a, making insulation difficult. Therefore, by pressing the pressing pin against the second resin member 12a (described later), the parts exposed from the first resin member 11a become insulating material, so that the conductive parts are not exposed. Through holes 19a, 19b, 19c, and 19d are arranged at positions overlapping with the second resin member 12a (described later) when viewed in the thickness direction.

 第2樹脂部材12aは、第1樹脂部材11aと別体で設けられる。第2樹脂部材12aは、枠状の部材であって、厚さ方向に見て後述する絶縁層33aの外縁に沿って配置される。第2樹脂部材12a上には、制御回路金属板15aおよび制御回路金属板15bが配置される。第2樹脂部材12aには、制御回路金属板15aと係合する係合部28aおよび制御回路金属板15bと係合する係合部28bが形成されている。また、第2樹脂部材12aには、上記各端子と係合する係合部29a、係合部29bおよび係合部29cが形成されている。係合部28a、係合部28b、係合部29a、係合部29bおよび係合部29cにより、第2樹脂部材12aに対して、制御回路金属板15a、制御回路金属板15b、P端子14a、N端子14bおよびO端子14cの位置決めを行うことができる。 The second resin member 12a is provided separately from the first resin member 11a. The second resin member 12a is a frame-shaped member and is arranged along the outer edge of the insulating layer 33a described later when viewed in the thickness direction. The control circuit metal plate 15a and the control circuit metal plate 15b are arranged on the second resin member 12a. The second resin member 12a is formed with an engagement portion 28a that engages with the control circuit metal plate 15a and an engagement portion 28b that engages with the control circuit metal plate 15b. The second resin member 12a is also formed with engagement portions 29a, 29b, and 29c that engage with the above-mentioned terminals. The engagement portions 28a, 28b, 29a, 29b, and 29c allow the control circuit metal plate 15a, the control circuit metal plate 15b, the P terminal 14a, the N terminal 14b, and the O terminal 14c to be positioned relative to the second resin member 12a.

 上記した第2樹脂部材12aの融点は、第1樹脂部材11aの融点よりも高い。第2樹脂部材12aの材質としては、例えばポリフェニレンサルファイド(PPS(Poly Phenylene Sulfide))やポリブチレンテレフタレート(PBT(Poly Butylene Terephtalate))等が挙げられる。第2樹脂部材12aは、例えば射出成型や切削加工、三次元造形により製造される。なお、第2樹脂部材12aには、制御回路金属板15aとスナップ嵌合するスナップ嵌合部37aおよび制御回路金属板15bとスナップ嵌合するスナップ嵌合部37bが形成されている。外縁に沿って配置される第2樹脂部材12aは、第1樹脂部材11aと同様に樹脂材料のため、化学的結合を取ることができる。また、第2樹脂部材12aの表面上にシボ加工等の凹凸を設けることでアンカー効果による機械的結合を取ることができる。さらに、第2樹脂部材12aから外周に突き出た突出部を付加することによって、さらにアンカー効果による機械的結合を取ることができる。これにより、第1樹脂部材11aと第2樹脂部材12aの密着強度を高めることができるため、外縁を起点とする第1樹脂部材11aの剥離を抑えることができる。第2樹脂部材12aは、突出部としてアンカー効果を持たせたが、凹形状としてアンカー効果を持たせてもよい。 The melting point of the second resin member 12a is higher than that of the first resin member 11a. Examples of materials for the second resin member 12a include polyphenylene sulfide (PPS (Poly Phenylene Sulfide)) and polybutylene terephthalate (PBT (Poly Butylene Terephthalate)). The second resin member 12a is manufactured by, for example, injection molding, cutting, or three-dimensional modeling. The second resin member 12a is formed with a snap fitting portion 37a that snaps into the control circuit metal plate 15a and a snap fitting portion 37b that snaps into the control circuit metal plate 15b. The second resin member 12a arranged along the outer edge is made of a resin material like the first resin member 11a, and can be chemically bonded. Also, by providing unevenness, such as embossing, on the surface of the second resin member 12a, mechanical bonding can be achieved through the anchor effect. Furthermore, by adding a protruding portion that protrudes from the outer periphery of the second resin member 12a, mechanical bonding can be achieved further through the anchor effect. This increases the adhesive strength between the first resin member 11a and the second resin member 12a, thereby preventing the first resin member 11a from peeling off from the outer edge. The second resin member 12a has an anchor effect as a protruding portion, but the anchor effect may also be achieved as a concave shape.

 DBC基板13aは、第1金属板31aと、第2金属板32aと、絶縁層33aと、を含む。すなわち、DBC基板13aは、第1金属板31aと、第2金属板32aと、絶縁層33aとから構成されている。絶縁層33aの厚さ方向の一方の面上に第1金属板31aが配置され、絶縁層33aの厚さ方向の他方の面上に第2金属板32aが配置される。すなわち、DBC基板13aは、絶縁層33aを、厚さ方向の両側に配置される第1金属板31aおよび第2金属板32aで挟み込んだ構成である。絶縁層33aの材質としては、例えばAl(アルミナ)、SiN(シリコンナイトライド)、AlN(窒化アルミニウム)が選択される。 The DBC substrate 13a includes a first metal plate 31a, a second metal plate 32a, and an insulating layer 33a. That is, the DBC substrate 13a is composed of the first metal plate 31a, the second metal plate 32a, and the insulating layer 33a. The first metal plate 31a is disposed on one surface of the insulating layer 33a in the thickness direction, and the second metal plate 32a is disposed on the other surface of the insulating layer 33a in the thickness direction. That is, the DBC substrate 13a is configured such that the insulating layer 33a is sandwiched between the first metal plate 31a and the second metal plate 32a disposed on both sides in the thickness direction. As the material of the insulating layer 33a, for example, Al 2 O 3 (alumina), SiN (silicon nitride), or AlN (aluminum nitride) is selected.

 第1金属板31aは、第1領域41aと、第2領域42aと、第3領域43aと、第4領域44aと、第5領域45aと、第6領域46aと、第7領域47aと、第8領域48aと、第9領域49aと、を含む(特に図11参照)。すなわち、第1金属板31aは、絶縁層33a上において、複数、具体的には、9つの領域に分割されている。第1領域41a、第2領域42aおよび第3領域43aが、半導体装置10aの動作時において電流が流れるメインの回路板となる。他の領域は、制御回路金属板15aおよび制御回路金属板15bに接合され、固定および第2金属板32aまでの熱的な結合を取る際に利用される。すなわち、第4領域44a、第5領域45a、第6領域46a、第7領域47a、第8領域48aおよび第9領域49aは上記した固定に利用され、さらに第6領域46aおよび第7領域47aは上記熱的な結合にも利用される。 The first metal plate 31a includes a first region 41a, a second region 42a, a third region 43a, a fourth region 44a, a fifth region 45a, a sixth region 46a, a seventh region 47a, an eighth region 48a, and a ninth region 49a (see FIG. 11 in particular). That is, the first metal plate 31a is divided into multiple regions, specifically, nine regions, on the insulating layer 33a. The first region 41a, the second region 42a, and the third region 43a are the main circuit plates through which current flows during operation of the semiconductor device 10a. The other regions are joined to the control circuit metal plate 15a and the control circuit metal plate 15b, and are used for fixing and thermally coupling to the second metal plate 32a. That is, the fourth region 44a, the fifth region 45a, the sixth region 46a, the seventh region 47a, the eighth region 48a and the ninth region 49a are used for the above-mentioned fixing, and the sixth region 46a and the seventh region 47a are also used for the above-mentioned thermal bonding.

 第2金属板32aは、複数の領域に分割されておらず、一枚で構成されている。第2金属板32aには、2つのスリット34a、スリット34bが形成されている(特に図3参照)。スリット34a、スリット34bは、Y方向に間隔をあけてX方向に延びるように一対形成されている。スリット34a、スリット34bはそれぞれ、第2金属板32aの外縁35aと間隔をあけて形成されている。スリット34a、スリット34bはそれぞれ、第2金属板32aを厚さ方向に貫通するように設けられている。すなわち、スリット34a、スリット34bが位置する領域においては、底面側から見て絶縁層33aが露出している構成となる。 The second metal plate 32a is not divided into multiple regions, but is formed as a single piece. Two slits 34a and 34b are formed in the second metal plate 32a (see FIG. 3 in particular). The slits 34a and 34b are formed as a pair extending in the X direction with a gap in the Y direction. The slits 34a and 34b are each formed with a gap from the outer edge 35a of the second metal plate 32a. The slits 34a and 34b are each provided to penetrate the second metal plate 32a in the thickness direction. In other words, in the regions where the slits 34a and 34b are located, the insulating layer 33a is exposed when viewed from the bottom side.

 P端子14aは、帯状の金属板を折り曲げて形成されている。P端子14aは、第1樹脂部材11aによって覆われる部分と、第1樹脂部材11aから露出する部分とを有する。P端子14aには、第1樹脂部材11aから露出する部分において、厚さ方向に貫通する丸穴16aが設けられている。N端子14bおよびO端子14cもP端子14aと同様に、帯状の金属板を折り曲げて形成されており、第1樹脂部材11aから露出する部分において、厚さ方向に貫通する丸穴16b、丸穴16cがそれぞれ設けられている。P端子14aは、半導体装置10aの内部において、第1金属板31aの第1領域41aと接合されている。N端子14bは、半導体装置10aの内部において、第1金属板31aの第3領域43aと接合されている。O端子14cは、半導体装置10aの内部において、第1金属板31aの第2領域42aと接合されている。これにより、P端子14aは、第1金属板31aの第1領域41a、N端子14bは、第1金属板31aの第3領域43a、O端子14cは、第1金属板31aの第2領域42aにそれぞれ電気的に接続される。接合については、はんだや焼結材等の接合材、レーザー溶接や超音波接合等の溶融接合、ワイヤ等の導電部材により電気的に接合される。 The P terminal 14a is formed by bending a strip-shaped metal plate. The P terminal 14a has a portion covered by the first resin member 11a and a portion exposed from the first resin member 11a. The P terminal 14a has a round hole 16a penetrating in the thickness direction in the portion exposed from the first resin member 11a. The N terminal 14b and the O terminal 14c are also formed by bending a strip-shaped metal plate like the P terminal 14a, and have round holes 16b and 16c penetrating in the thickness direction in the portion exposed from the first resin member 11a. The P terminal 14a is joined to the first region 41a of the first metal plate 31a inside the semiconductor device 10a. The N terminal 14b is joined to the third region 43a of the first metal plate 31a inside the semiconductor device 10a. The O terminal 14c is bonded to the second region 42a of the first metal plate 31a inside the semiconductor device 10a. As a result, the P terminal 14a is electrically connected to the first region 41a of the first metal plate 31a, the N terminal 14b is electrically connected to the third region 43a of the first metal plate 31a, and the O terminal 14c is electrically connected to the second region 42a of the first metal plate 31a. The electrical bonding is performed using a bonding material such as solder or sintered material, a fusion bond such as laser welding or ultrasonic bonding, or a conductive material such as a wire.

 本実施形態においては、第2樹脂部材12aには、P端子14a、N端子14b、O端子14cと係合する係合部29a、係合部29bが設けられている。よって、第2樹脂部材12aに対して係合部29a、係合部29bを利用してP端子14a、N端子14b、O端子14cの位置決めを行うことができる。したがって、P端子14a、N端子14b、O端子14cの位置決めに利用する治具が不要となり、生産性の向上を図ることができる。係合部29bは、凸形状としてP端子14a、N端子14b、O端子14cを間に配置することで位置決めを行っているが、凹形状としてその中にP端子14a、N端子14b、O端子14cを配置して位置決めを行ってもよい。 In this embodiment, the second resin member 12a is provided with engaging portions 29a and 29b that engage with the P terminal 14a, N terminal 14b, and O terminal 14c. Therefore, the P terminal 14a, N terminal 14b, and O terminal 14c can be positioned relative to the second resin member 12a using the engaging portions 29a and 29b. This eliminates the need for jigs to position the P terminal 14a, N terminal 14b, and O terminal 14c, improving productivity. The engaging portion 29b is convex in shape and positions the P terminal 14a, N terminal 14b, and O terminal 14c by arranging them therebetween, but it may also be concave in shape and positions the P terminal 14a, N terminal 14b, and O terminal 14c therein.

 P端子14a、N端子14b、O端子14cには、第1樹脂部材11aから露出する部分において段曲げした形状になっており、丸穴16a、丸穴16b、丸穴16cのある締結面と、第1樹脂部材11aの根元にある押圧面が設けられている。第1樹脂部材11aをモールドする際、モールド金型の上金型と下金型でP端子14a、N端子14b、O端子14cの露出部は押しつぶされるため、変形する可能性がある。押圧面と締結面を分けることで、押圧面が押しつぶされても締結面は形状変更を回避することができるため、締結時の締結不良や接触抵抗増加を防ぐことができる。 The P terminal 14a, N terminal 14b, and O terminal 14c have a stepped shape in the portion exposed from the first resin member 11a, and are provided with a fastening surface with round holes 16a, 16b, and 16c, and a pressing surface at the base of the first resin member 11a. When molding the first resin member 11a, the exposed portions of the P terminal 14a, N terminal 14b, and O terminal 14c are crushed by the upper and lower dies of the molding die, which may cause deformation. By separating the pressing surface and the fastening surface, it is possible to avoid changes in the shape of the fastening surface even if the pressing surface is crushed, and therefore it is possible to prevent poor fastening and increased contact resistance during fastening.

 P端子14a、N端子14b、O端子14cは、第1樹脂部材11aでモールドする際にモールド金型で押しつぶされるため、変位してP端子14a、N端子14b、O端子14cと第1金属板31aの接合部に応力が加わる可能性がある。P端子14aは貫通穴があり、第2樹脂部材12aに設けられた係合部29aと嵌合させることで、この嵌合部で引っ掛かりを作り、接合部に応力が加わるのを抑制している。N端子14bは、第2樹脂部材12aに設けられたインサート金型(図示せず)をN端子14bの底面に配置することで金属接合を行い、この接合部で引っ掛かりを作り、接合部に応力が加わるのを抑制している。O端子14cは、第2樹脂部材12aより周囲をモールドされて固定されており、この固定部で引っ掛かりを作り、接合部に応力が加わるのを抑制している。これにより、P端子14a、N端子14b、O端子14cと第1金属板31aの接合部の信頼性を高めることができる。 When the P terminal 14a, N terminal 14b, and O terminal 14c are molded with the first resin member 11a, they are crushed by the mold die, and there is a possibility that they may be displaced and stress may be applied to the joints between the P terminal 14a, N terminal 14b, and O terminal 14c and the first metal plate 31a. The P terminal 14a has a through hole, and by fitting with the engagement portion 29a provided on the second resin member 12a, a catch is created at this fitting portion, suppressing the application of stress to the joint. The N terminal 14b is metal-joined by placing an insert mold (not shown) provided on the second resin member 12a on the bottom surface of the N terminal 14b, and a catch is created at this joint, suppressing the application of stress to the joint. The O terminal 14c is fixed by molding the periphery from the second resin member 12a, and a catch is created at this fixing portion, suppressing the application of stress to the joint. This improves the reliability of the joints between the P terminal 14a, N terminal 14b, and O terminal 14c and the first metal plate 31a.

 P端子14aには、フィレット18aを受け入れる切り欠き36aが形成されている。N端子14bには、フィレット18bを受け入れる切り欠き36bが形成されている。この切り欠き36a、切り欠き36bにより、P端子14aとN端子14bの間の距離を広げることなくフィレット18a、フィレット18bを大きく取ることができるため、寄生インダクタンスの増加を抑えながらリブ17aの強度も補強することができる。 The P terminal 14a has a notch 36a formed therein to receive the fillet 18a. The N terminal 14b has a notch 36b formed therein to receive the fillet 18b. These notches 36a and 36b allow the fillets 18a and 18b to be made larger without increasing the distance between the P terminal 14a and the N terminal 14b, so the strength of the rib 17a can be reinforced while suppressing an increase in parasitic inductance.

 制御回路金属板15aおよび制御回路金属板15bはそれぞれ、厚さ方向において第1金属板31aと異なる位置に配置される。すなわち、制御回路金属板15aおよび制御回路金属板15bはそれぞれ、厚さ方向に見て第1金属板31aと重なっている。本実施形態においては、制御回路金属板15a、制御回路金属板15bによって構成される制御回路は、ゲート回路、補助ソース回路、温度特性検出回路および電気特性検出回路の全てを含む。 Control circuit metal plate 15a and control circuit metal plate 15b are each disposed at a different position in the thickness direction from first metal plate 31a. That is, control circuit metal plate 15a and control circuit metal plate 15b each overlap first metal plate 31a when viewed in the thickness direction. In this embodiment, the control circuit formed by control circuit metal plate 15a and control circuit metal plate 15b includes all of the gate circuit, auxiliary source circuit, temperature characteristic detection circuit, and electrical characteristic detection circuit.

 実施の形態1の半導体装置10aは、半導体チップ(第1半導体チップ)51aと、半導体チップ(第2半導体チップ)51bと、半導体チップ(第3半導体チップ)51cと、半導体チップ(第4半導体チップ)51dと、半導体チップ(第5半導体チップ)51eと、半導体チップ(第6半導体チップ)51fと、半導体チップ(第7半導体チップ)51gと、半導体チップ(第8半導体チップ)51hと、を含む。半導体チップ51a、半導体チップ51b、半導体チップ51cおよび半導体チップ51dはそれぞれ、縦型のトランジスタチップである。本実施形態においては、半導体チップ51a、半導体チップ51b、半導体チップ51cおよび半導体チップ51dはそれぞれ、例えば金属-酸化物-半導体電界効果型トランジスタ(MOSFET(Metal-Oxide-Semiconductor Field Effect Transistor))である。半導体チップ51a、半導体チップ51b、半導体チップ51cおよび半導体チップ51dはそれぞれ、スイッチング素子である。半導体チップ51aおよび半導体チップ51bは、半導体装置10aにおいて上アームを構成し、半導体チップ51cおよび半導体チップ51dは、半導体装置10aにおいて下アームを構成する。半導体チップ51e、半導体チップ51f、半導体チップ51gおよび半導体チップ51hはそれぞれ、ダイオードチップである。本実施形態においては、半導体チップ51e、半導体チップ51f、半導体チップ51gおよび半導体チップ51hはそれぞれ、ショットキーバリアダイオード(SBD(Schottky Barrier Diode))である。 The semiconductor device 10a of the first embodiment includes a semiconductor chip (first semiconductor chip) 51a, a semiconductor chip (second semiconductor chip) 51b, a semiconductor chip (third semiconductor chip) 51c, a semiconductor chip (fourth semiconductor chip) 51d, a semiconductor chip (fifth semiconductor chip) 51e, a semiconductor chip (sixth semiconductor chip) 51f, a semiconductor chip (seventh semiconductor chip) 51g, and a semiconductor chip (eighth semiconductor chip) 51h. The semiconductor chip 51a, the semiconductor chip 51b, the semiconductor chip 51c, and the semiconductor chip 51d are each vertical transistor chips. In this embodiment, the semiconductor chip 51a, the semiconductor chip 51b, the semiconductor chip 51c, and the semiconductor chip 51d are each, for example, a metal-oxide-semiconductor field effect transistor (MOSFET). Each of the semiconductor chips 51a, 51b, 51c, and 51d is a switching element. The semiconductor chips 51a and 51b form an upper arm in the semiconductor device 10a, and the semiconductor chips 51c and 51d form a lower arm in the semiconductor device 10a. Each of the semiconductor chips 51e, 51f, 51g, and 51h is a diode chip. In this embodiment, each of the semiconductor chips 51e, 51f, 51g, and 51h is a Schottky barrier diode (SBD (Schottky Barrier Diode)).

 図12は、図11に示すDBC基板13aを図12中のXII-XIIで示す線分で切断した場合の概略断面図である。図12を併せて参照して、半導体チップ51aのドレイン電極52aは、接合材38aにより第1金属板31aに接合される。半導体チップ51b、半導体チップ51cおよび半導体チップ51dについても同様に第1金属板31aに接合される。半導体チップ51eのカソード電極52bは、接合材38bにより第1金属板31aに接合される。半導体チップ51f、半導体チップ51gおよび半導体チップ51hについても同様に第1金属板31aに接合される。 FIG. 12 is a schematic cross-sectional view of the DBC substrate 13a shown in FIG. 11 taken along the line indicated by XII-XII in FIG. 12. Referring also to FIG. 12, the drain electrode 52a of the semiconductor chip 51a is joined to the first metal plate 31a by the bonding material 38a. The semiconductor chips 51b, 51c, and 51d are similarly joined to the first metal plate 31a. The cathode electrode 52b of the semiconductor chip 51e is joined to the first metal plate 31a by the bonding material 38b. The semiconductor chips 51f, 51g, and 51h are similarly joined to the first metal plate 31a.

 半導体チップ51aのソース電極53aと、半導体チップ51eのアノード電極54aと、第1金属板31aの第2領域42aとは、導電部材であるワイヤ56aにより電気的に接続される。同様に、半導体チップ51bのソース電極53bと、半導体チップ51fのアノード電極54bと、第1金属板31aの第2領域42aとは、ワイヤ56bにより電気的に接続される。半導体チップ51cのソース電極53cと、半導体チップ51gのアノード電極54cと、第1金属板31aの第3領域43aとは、ワイヤ56cにより電気的に接続される。同様に、半導体チップ51dのソース電極53dと、半導体チップ51hのアノード電極54dと、第1金属板31aの第2領域42aとは、ワイヤ56dにより電気的に接続される。ワイヤによる接続については、ワイヤボンディングにより実施される。 The source electrode 53a of the semiconductor chip 51a, the anode electrode 54a of the semiconductor chip 51e, and the second region 42a of the first metal plate 31a are electrically connected by a wire 56a, which is a conductive member. Similarly, the source electrode 53b of the semiconductor chip 51b, the anode electrode 54b of the semiconductor chip 51f, and the second region 42a of the first metal plate 31a are electrically connected by a wire 56b. The source electrode 53c of the semiconductor chip 51c, the anode electrode 54c of the semiconductor chip 51g, and the third region 43a of the first metal plate 31a are electrically connected by a wire 56c. Similarly, the source electrode 53d of the semiconductor chip 51d, the anode electrode 54d of the semiconductor chip 51h, and the second region 42a of the first metal plate 31a are electrically connected by a wire 56d. The connection by wire is performed by wire bonding.

 半導体チップ51aのゲート電極は、第1ゲート端子21aとワイヤ57aにより電気的に接続される。半導体チップ51bのゲート電極は、第1ゲート端子21aとワイヤ57bにより電気的に接続される。半導体チップ51cのゲート電極は、第2ゲート端子22aとワイヤ57cにより電気的に接続される。半導体チップ51dのゲート電極は、第2ゲート端子22aとワイヤ57dにより電気的に接続される。半導体チップ51aのソース電極53aは、第1補助ソース端子21bとワイヤ58aにより電気的に接続される。半導体チップ51bのソース電極53bは、第1補助ソース端子21bとワイヤ58bにより電気的に接続される。半導体チップ51cのソース電極53cは、第2補助ソース端子22bとワイヤ58cにより電気的に接続される。半導体チップ51dのソース電極53dは、第2補助ソース端子22bとワイヤ58dにより電気的に接続される。 The gate electrode of the semiconductor chip 51a is electrically connected to the first gate terminal 21a by a wire 57a. The gate electrode of the semiconductor chip 51b is electrically connected to the first gate terminal 21a by a wire 57b. The gate electrode of the semiconductor chip 51c is electrically connected to the second gate terminal 22a by a wire 57c. The gate electrode of the semiconductor chip 51d is electrically connected to the second gate terminal 22a by a wire 57d. The source electrode 53a of the semiconductor chip 51a is electrically connected to the first auxiliary source terminal 21b by a wire 58a. The source electrode 53b of the semiconductor chip 51b is electrically connected to the first auxiliary source terminal 21b by a wire 58b. The source electrode 53c of the semiconductor chip 51c is electrically connected to the second auxiliary source terminal 22b by a wire 58c. The source electrode 53d of the semiconductor chip 51d is electrically connected to the second auxiliary source terminal 22b by a wire 58d.

 制御回路金属板15aに含まれる第1ゲート端子21aは、第1樹脂部材11aから露出する部分を有する第1端子26aと、第1樹脂部材11aによって覆われる部分を有する第1フレーム27aと、を含む。本実施形態においては、第1ゲート端子21aについては、第1端子26aと第1フレーム27aとが別体で構成されている。第1補助ソース端子21bについても同様である。第2ゲート端子22aについては、第1端子26aと第1フレーム27aとが一体で構成されている。第2補助ソース端子22b、第1温度特性検出端子21c、第2温度特性検出端子22cおよび電気特性検出端子21dについても同様である。 The first gate terminal 21a included in the control circuit metal plate 15a includes a first terminal 26a having a portion exposed from the first resin member 11a, and a first frame 27a having a portion covered by the first resin member 11a. In this embodiment, the first terminal 26a and the first frame 27a of the first gate terminal 21a are configured separately. The same applies to the first auxiliary source terminal 21b. The second gate terminal 22a is configured integrally with the first terminal 26a and the first frame 27a. The same applies to the second auxiliary source terminal 22b, the first temperature characteristic detection terminal 21c, the second temperature characteristic detection terminal 22c, and the electrical characteristic detection terminal 21d.

 半導体装置10aは、インサート金属25a、インサート金属25bを含む。図13は、インサート金属25a、インサート金属25bが配置される領域を拡大して示す概略斜視図である。図13を併せて参照して、インサート金属25a、インサート金属25bは、第2樹脂部材12aに保持される。本実施形態においては、インサート金属25a、インサート金属25bは、第2樹脂部材12aの成形時においてインサート成形されて内部に埋め込まれる。インサート金属25a、インサート金属25bは、第2樹脂部材12aから露出する第1露出部61aおよび第2露出部62aを含む。第1露出部61aは、第1温度特性検出端子21c、第2温度特性検出端子22cにそれぞれ対向する面である。第2露出部62aは、第1金属板31aの第6領域46a、第7領域47aにそれぞれ対向する面である。インサート金属25aは、第1金属板31aおよび制御回路金属板15bと接合される。具体的には、インサート金属25aは、第1露出部61aが位置する領域において制御回路金属板15bの第2温度特性検出端子22cと接合される。この場合、厚さ方向に照射されるレーザー溶接により接合される。また、インサート金属25aは、第2露出部62aが位置する領域において第1金属板31aの第6領域46aと接合される。この場合も、厚さ方向に照射されるレーザー溶接により接合される。このように、インサート金属25aを介して、第2温度特性検出端子22cと第1金属板31aとが金属部材で接続されることとなる。インサート金属25bについても同様に、第1温度特性検出端子21cと第1金属板31aが金属部材で接合される。半導体装置10aは、図13にて拡大した領域以外にも、第1ゲート端子21aと第1金属板31a、第1補助ソース端子21bと第1金属板31a、第2ゲート端子22aと第1金属板31a、第2補助ソース端子22bと第1金属板31a、電気特性検出端子21dと第1金属板31aを接合するインサート金属を含んでいる。 The semiconductor device 10a includes insert metal 25a and insert metal 25b. FIG. 13 is a schematic perspective view showing an enlarged view of the area in which the insert metal 25a and insert metal 25b are arranged. Referring also to FIG. 13, the insert metal 25a and insert metal 25b are held in the second resin member 12a. In this embodiment, the insert metal 25a and insert metal 25b are embedded inside by insert molding during molding of the second resin member 12a. The insert metal 25a and insert metal 25b include a first exposed portion 61a and a second exposed portion 62a exposed from the second resin member 12a. The first exposed portion 61a is a surface facing the first temperature characteristic detection terminal 21c and the second temperature characteristic detection terminal 22c, respectively. The second exposed portion 62a is a surface facing the sixth region 46a and the seventh region 47a of the first metal plate 31a, respectively. The insert metal 25a is joined to the first metal plate 31a and the control circuit metal plate 15b. Specifically, the insert metal 25a is joined to the second temperature characteristic detection terminal 22c of the control circuit metal plate 15b in the region where the first exposed portion 61a is located. In this case, the joining is performed by laser welding irradiated in the thickness direction. The insert metal 25a is also joined to the sixth region 46a of the first metal plate 31a in the region where the second exposed portion 62a is located. In this case, the joining is also performed by laser welding irradiated in the thickness direction. In this way, the second temperature characteristic detection terminal 22c and the first metal plate 31a are connected by a metal member via the insert metal 25a. Similarly, the first temperature characteristic detection terminal 21c and the first metal plate 31a are joined by a metal member for the insert metal 25b. In addition to the area enlarged in FIG. 13, the semiconductor device 10a also includes insert metals that join the first gate terminal 21a and the first metal plate 31a, the first auxiliary source terminal 21b and the first metal plate 31a, the second gate terminal 22a and the first metal plate 31a, the second auxiliary source terminal 22b and the first metal plate 31a, and the electrical characteristic detection terminal 21d and the first metal plate 31a.

 また、半導体装置10aにおいて、制御回路金属板15aの第1ゲート端子21aは、第1端子26aと、第1フレーム27aと、を含む(特に図9参照)。第1端子26aは、第2樹脂部材12aから突出する突出部および第2樹脂部材12aによって保持される保持部を有する。保持部は、第2樹脂部材12aから露出する端子露出部を含む。第1フレーム27aは、厚さ方向に見て端子露出部が位置する領域において第1端子26aと接合される。 In the semiconductor device 10a, the first gate terminal 21a of the control circuit metal plate 15a includes a first terminal 26a and a first frame 27a (see FIG. 9 in particular). The first terminal 26a has a protruding portion protruding from the second resin member 12a and a holding portion held by the second resin member 12a. The holding portion includes a terminal exposed portion exposed from the second resin member 12a. The first frame 27a is joined to the first terminal 26a in the region where the terminal exposed portion is located when viewed in the thickness direction.

 次に、上記構成の半導体装置10aの製造工程について、簡単に説明する。まず、第1金属板31aに上記した第1領域41a等の回路パターンを形成し、第2金属板32aに上記したスリット34a等を形成したDBC基板13aを準備する。また、制御回路金属板15aの第1端子26a、インサート金属25a等をインサートした上記した形状の第2樹脂部材12aも準備する。ここで、O端子14cも予め第2樹脂部材12aに一部をモールドされて取り付けられている。そして、第1金属板31a上に半導体チップ51a等を接合する。その後、DBC基板13a上に第2樹脂部材12aを接着剤等により取り付ける。その後、P端子14a、N端子14b、制御回路金属板15aおよび制御回路金属板15bを第2樹脂部材12aに配置し、P端子14a、N端子14bおよびO端子14cは第1金属板31a、制御回路金属板15aおよび制御回路金属板15bは第1端子26aおよびインサート金属25a等とレーザー溶接で接合する。抵抗23a等の電子部品は、予め制御回路金属板15aおよび制御回路金属板15bに接合されている。その後、ワイヤボンディングにより半導体チップ51a等の電気的な接続を行う。その後、第1樹脂部材11aにて半導体チップ51a等を封止するようにトランスファーモールドにより封止する。このようにして、半導体装置10aを製造する。 Next, the manufacturing process of the semiconductor device 10a having the above configuration will be briefly described. First, a DBC substrate 13a is prepared by forming a circuit pattern such as the first region 41a described above on the first metal plate 31a and forming the slits 34a described above on the second metal plate 32a. A second resin member 12a having the above shape with the first terminal 26a of the control circuit metal plate 15a, the insert metal 25a, etc. inserted therein is also prepared. Here, the O terminal 14c is also partially molded and attached to the second resin member 12a in advance. Then, the semiconductor chip 51a etc. are bonded onto the first metal plate 31a. After that, the second resin member 12a is attached onto the DBC substrate 13a with an adhesive or the like. Then, the P terminal 14a, the N terminal 14b, the control circuit metal plate 15a, and the control circuit metal plate 15b are placed on the second resin member 12a, and the P terminal 14a, the N terminal 14b, and the O terminal 14c are joined to the first metal plate 31a, and the control circuit metal plate 15a and the control circuit metal plate 15b are joined to the first terminal 26a and the insert metal 25a, etc., by laser welding. Electronic components such as the resistor 23a are previously joined to the control circuit metal plate 15a and the control circuit metal plate 15b. Then, the semiconductor chip 51a, etc. are electrically connected by wire bonding. Then, the semiconductor chip 51a, etc. are sealed by transfer molding so as to be sealed in the first resin member 11a. In this manner, the semiconductor device 10a is manufactured.

 本開示の半導体装置10aによると、制御回路金属板15a、制御回路金属板15bによって構成される制御回路は、ゲート回路、補助ソース回路、温度特性検出回路および電気特性検出回路を含むため、より厳密な半導体装置10aの制御が可能になる。ゲート回路、補助ソース回路、温度特性検出回路および電気特性検出回路を含む制御回路を構成する制御回路金属板15a、制御回路金属板15bは、半導体チップ51aの厚さ方向において半導体チップ51aを搭載する第1金属板31aと異なる位置に配置される。よって、第1金属板31aの厚さ方向に垂直な方向において半導体装置10aの全体形状のサイズが大きくなることを抑制しながら、第1金属板31aを大きく広げることができる。すなわち、制御回路金属板15a、制御回路金属板15bの大きさに関わらず、半導体チップ51a等の放熱性の向上に寄与する第1金属板31aの面積を大きくすることができる。さらに、高温になる半導体チップ51a等と異なる位置に制御回路金属板15a、制御回路金属板15bは配置されるため、半導体チップ51a等からの熱干渉も防ぐことができる。したがって、半導体装置10aのコンパクト化を図りながら、安定した動作を確保することができる。 According to the semiconductor device 10a of the present disclosure, the control circuit constituted by the control circuit metal plate 15a and the control circuit metal plate 15b includes a gate circuit, an auxiliary source circuit, a temperature characteristic detection circuit, and an electrical characteristic detection circuit, so that the semiconductor device 10a can be controlled more precisely. The control circuit metal plate 15a and the control circuit metal plate 15b constituting the control circuit including the gate circuit, the auxiliary source circuit, the temperature characteristic detection circuit, and the electrical characteristic detection circuit are arranged at a different position in the thickness direction of the semiconductor chip 51a from the first metal plate 31a on which the semiconductor chip 51a is mounted. Therefore, the first metal plate 31a can be greatly expanded while suppressing the size of the overall shape of the semiconductor device 10a from increasing in the direction perpendicular to the thickness direction of the first metal plate 31a. In other words, regardless of the size of the control circuit metal plate 15a and the control circuit metal plate 15b, the area of the first metal plate 31a that contributes to improving the heat dissipation of the semiconductor chip 51a, etc. can be increased. Furthermore, because the control circuit metal plate 15a and the control circuit metal plate 15b are located in a different position from the semiconductor chip 51a etc., which becomes hot, it is possible to prevent thermal interference from the semiconductor chip 51a etc. Therefore, it is possible to ensure stable operation while making the semiconductor device 10a compact.

 本実施形態においては、半導体チップ51a等の厚さ方向に見て、制御回路金属板15a、制御回路金属板15bは、第1金属板31aと重複する領域を含む。よって、半導体チップ51aの厚さ方向において、制御回路金属板15a、制御回路金属板15bが位置する領域を有効活用しながら、第1金属板31aを大きくすることができる。したがって、より確実にコンパクト化を図りながら、放熱性の向上を図ることができる。 In this embodiment, when viewed in the thickness direction of the semiconductor chip 51a, etc., the control circuit metal plate 15a and the control circuit metal plate 15b include an area that overlaps with the first metal plate 31a. Therefore, the first metal plate 31a can be made larger while effectively utilizing the area in which the control circuit metal plate 15a and the control circuit metal plate 15b are located in the thickness direction of the semiconductor chip 51a. This makes it possible to improve heat dissipation while more reliably achieving compactness.

 本実施形態においては、制御回路金属板15a、制御回路金属板15bは、第1樹脂部材11aから露出する部分を有する第1端子と、第1樹脂部材11aによって覆われる部分を有する第1フレームと、を含む。第1端子と第1フレームとは、一体で構成されている。よって、制御回路金属板15a、制御回路金属板15bに含まれ、第1端子と一体で構成されている第1フレームを第2樹脂部材12aにより保持すれば第1端子も同時に配置できるため、製造時における組み立て性の向上を図ることができる。 In this embodiment, the control circuit metal plate 15a and the control circuit metal plate 15b include a first terminal having a portion exposed from the first resin member 11a, and a first frame having a portion covered by the first resin member 11a. The first terminal and the first frame are integrally configured. Therefore, if the first frame included in the control circuit metal plate 15a and the control circuit metal plate 15b and integrally configured with the first terminal is held by the second resin member 12a, the first terminal can be positioned at the same time, thereby improving the ease of assembly during manufacturing.

 本実施形態においては、制御回路金属板15a、制御回路金属板15bは、第1樹脂部材11aから露出する部分を有する第1端子と、第1樹脂部材11aによって覆われる部分を有する第1フレームと、を含む。第1端子と第1フレームとは、別体で構成されている。第1端子は、第2樹脂部材12aに保持されているため、第1フレームを金属接合することで、第1フレームを固定すると同時に電気的接続を取ることができる。 In this embodiment, the control circuit metal plate 15a and the control circuit metal plate 15b include a first terminal having a portion exposed from the first resin member 11a, and a first frame having a portion covered by the first resin member 11a. The first terminal and the first frame are configured as separate bodies. Since the first terminal is held by the second resin member 12a, by metal-joining the first frame, it is possible to fix the first frame and simultaneously establish an electrical connection.

 本実施形態においては、制御回路金属板15a、制御回路金属板15bは、第2樹脂部材12a上に配置されている。よって、第2樹脂部材12aにより制御回路金属板15a、制御回路金属板15bの位置決めを行って、制御回路金属板15a、制御回路金属板15bを固定することができる。したがって、製造治具が不要になり生産性の向上を図ることができる。また、制御回路金属板に15a、制御回路金属板15bにワイヤを超音波接合にて接合する際に、第2樹脂部材12aは土台として機能する。したがって、超音波振動が効率よく印加されるため、安定した接合を確保することができる。また、第2樹脂部材12aは絶縁物であるため、第1金属板31aとは確実に絶縁を確保した状態で配置することができるため、安定した動作を確保することができる。 In this embodiment, the control circuit metal plate 15a and the control circuit metal plate 15b are disposed on the second resin member 12a. Therefore, the control circuit metal plate 15a and the control circuit metal plate 15b can be positioned by the second resin member 12a, and the control circuit metal plate 15a and the control circuit metal plate 15b can be fixed. This eliminates the need for manufacturing jigs, and improves productivity. Furthermore, when bonding wires to the control circuit metal plate 15a and the control circuit metal plate 15b by ultrasonic bonding, the second resin member 12a functions as a base. Therefore, ultrasonic vibrations are applied efficiently, and stable bonding can be ensured. Furthermore, since the second resin member 12a is an insulator, it can be disposed in a state where insulation from the first metal plate 31a is ensured, and stable operation can be ensured.

 本実施形態においては、制御回路金属板15a、制御回路金属板15bは、第2樹脂部材12aから突出する突出部および第2樹脂部材12aによって保持される保持部を有する第1端子と、第1樹脂部材11aで覆われる第1フレームと、を含む。保持部は、第2樹脂部材12aから露出する端子露出部を含む。第1フレームは、半導体チップ51a等の厚さ方向に見て端子露出部が位置する領域において第1端子と接合されている。これにより、端子露出部において第1端子と第1フレームの金属同士が重なるため、レーザー溶接等の溶融接合や、はんだやロウ材等の液相接合等の金属接合が可能になり、固定と同時に電気的接続を取ることができる。そのため、接合時間を短縮することができ生産性の向上を図ることができる。 In this embodiment, the control circuit metal plate 15a and the control circuit metal plate 15b include a first terminal having a protruding portion protruding from the second resin member 12a and a holding portion held by the second resin member 12a, and a first frame covered by the first resin member 11a. The holding portion includes a terminal exposed portion exposed from the second resin member 12a. The first frame is joined to the first terminal in the region where the terminal exposed portion is located when viewed in the thickness direction of the semiconductor chip 51a, etc. As a result, the metals of the first terminal and the first frame overlap at the terminal exposed portion, making it possible to perform metal joining such as fusion joining by laser welding or liquid phase joining by solder or brazing material, and to establish electrical connection at the same time as fixing. This allows the joining time to be shortened, improving productivity.

 本実施形態においては、半導体装置10aは、第2樹脂部材12aに保持され、第1金属板31aおよび制御回路金属板15a、制御回路金属板15bと接合されるインサート金属25a、25bを備える。インサート金属25a、インサート金属25bは、第2樹脂部材12aから露出する第1露出部を含む。インサート金属25a、インサート金属25bは、半導体チップ51a等の厚さ方向に見て第1露出部が位置する領域において制御回路金属板15a、制御回路金属板15bと接合されている。これにより、第1露出部においてインサート金属25a、インサート金属25bと制御回路金属板15a、制御回路金属板15bの金属同士が重なるため、レーザー溶接等の溶融接合や、はんだやロウ材等の液相接合等の金属接合が可能になり、第2樹脂部材12aと制御回路金属板15a、制御回路金属板15bを固定することができる。そのため、接合時間を短縮することができ生産性の向上を図ることができる。また、第1温度特性検出端子21cと、第2温度特性検出端子22cにおいて、インサート金属25a、インサート金属25bを介して制御回路金属板15a、制御回路金属板15bと第1金属板31aとを接続することができ、制御回路金属板15a、制御回路金属板15bおよび第1金属板31a間の熱伝導を良好にすることができる。したがって、第1温度特性検出端子21cと、第2温度特性検出端子22cにサーミスタ24aを取り付けた場合、トランジスタチップとしての半導体チップ51a等の温度やダイオードチップとしての半導体チップ51e等の温度、半導体装置10aの水冷温度をより高精度に監視することができる。 In this embodiment, the semiconductor device 10a includes insert metals 25a and 25b that are held by the second resin member 12a and are joined to the first metal plate 31a and the control circuit metal plate 15a and control circuit metal plate 15b. The insert metals 25a and 25b include a first exposed portion exposed from the second resin member 12a. The insert metals 25a and 25b are joined to the control circuit metal plate 15a and control circuit metal plate 15b in the region where the first exposed portion is located when viewed in the thickness direction of the semiconductor chip 51a, etc. As a result, the metals of the insert metals 25a and 25b and the control circuit metal plate 15a and control circuit metal plate 15b overlap each other in the first exposed portion, making it possible to perform metal joining such as fusion joining by laser welding or liquid phase joining by solder or brazing material, and to fix the second resin member 12a to the control circuit metal plate 15a and control circuit metal plate 15b. This allows the joining time to be shortened and productivity to be improved. In addition, the first temperature characteristic detection terminal 21c and the second temperature characteristic detection terminal 22c can connect the control circuit metal plate 15a, the control circuit metal plate 15b and the first metal plate 31a via the insert metal 25a, the insert metal 25b, and can improve the thermal conduction between the control circuit metal plate 15a, the control circuit metal plate 15b and the first metal plate 31a. Therefore, when the thermistor 24a is attached to the first temperature characteristic detection terminal 21c and the second temperature characteristic detection terminal 22c, the temperature of the semiconductor chip 51a as a transistor chip, the temperature of the semiconductor chip 51e as a diode chip, and the water-cooling temperature of the semiconductor device 10a can be monitored with higher accuracy.

 本実施形態においては、インサート金属25a、インサート金属25bは、第2樹脂部材12aから露出する第2露出部を含む。インサート金属25a、インサート金属25bは、半導体チップ51a等の厚さ方向に見て第2露出部が位置する領域において第1金属板31aと接合されている。これにより、第2露出部においてインサート金属25a、インサート金属25bと第1金属板31aの金属同士が重なるため、レーザー溶接等の溶融接合や、はんだやロウ材等の液相接合等の金属接合が可能になり、第2樹脂部材12aと第1金属板31aを固定することができる。そのため、接合時間を短縮することができ生産性の向上を図ることができる。また、第1温度特性検出端子21cと、第2温度特性検出端子22cにおいては、前述と同様にサーミスタ24aによる温度監視を高精度に行うことができる。 In this embodiment, the insert metal 25a and the insert metal 25b include a second exposed portion exposed from the second resin member 12a. The insert metal 25a and the insert metal 25b are joined to the first metal plate 31a in the region where the second exposed portion is located when viewed in the thickness direction of the semiconductor chip 51a, etc. As a result, the metals of the insert metal 25a and the insert metal 25b and the first metal plate 31a overlap each other in the second exposed portion, making it possible to perform metal joining such as fusion joining by laser welding or liquid phase joining by solder or brazing material, etc., and to fix the second resin member 12a and the first metal plate 31a. Therefore, the joining time can be shortened and productivity can be improved. In addition, in the first temperature characteristic detection terminal 21c and the second temperature characteristic detection terminal 22c, temperature monitoring by the thermistor 24a can be performed with high accuracy as described above.

 本実施形態においては、第2樹脂部材12aには、制御回路金属板15a、制御回路金属板15bと係合する係合部28a、係合部28bが設けられている。よって、第2樹脂部材12aに対して係合部28a、係合部28bを利用して制御回路金属板15a、制御回路金属板15bの位置決めを行うことができる。したがって、制御回路金属板15a、制御回路金属板15bの位置決めに利用する治具が不要となり、生産性の向上を図ることができる。係合部28a、係合部28bは、凸形状として制御回路金属板15a、制御回路金属板15bを間に配置することで位置決めを行っているが、凹形状としてその中に制御回路金属板15a、制御回路金属板15bを配置して位置決めを行ってもよい。 In this embodiment, the second resin member 12a is provided with engaging portions 28a and 28b that engage with the control circuit metal plate 15a and the control circuit metal plate 15b. Therefore, the control circuit metal plate 15a and the control circuit metal plate 15b can be positioned relative to the second resin member 12a using the engaging portions 28a and 28b. This eliminates the need for a jig to position the control circuit metal plate 15a and the control circuit metal plate 15b, improving productivity. The engaging portions 28a and 28b are positioned by placing the control circuit metal plate 15a and the control circuit metal plate 15b between them as convex shapes, but they may also be positioned by placing the control circuit metal plate 15a and the control circuit metal plate 15b in a concave shape.

 本実施形態においては、第2樹脂部材12aの融点は、第1樹脂部材11aの融点よりも高い。よって、第2樹脂部材12aを配置した後に溶融させた第1樹脂部材11aを流し込んで成型する際に、第2樹脂部材12aが溶融するおそれを低減することができる。したがって、安定して生産を行うことができる。また、本実施形態において、第2樹脂部材12aは、熱可塑性樹脂であり、第1樹脂部材11aは、熱硬化性樹脂であることとしたが、これに限らず、融点に差があれば(第2樹脂部材12aの融点が第1樹脂部材11aの融点よりも高ければ)ともに熱可塑性樹脂であってもよい。また、第2樹脂部材12aに熱硬化性樹脂を使用し、一度加熱硬化させれば、第1樹脂部材11aの熱硬化性樹脂を流し込む際に溶融することはないため、ともに熱硬化性樹脂であってもよい。 In this embodiment, the melting point of the second resin member 12a is higher than that of the first resin member 11a. Therefore, when the molten first resin member 11a is poured in and molded after the second resin member 12a is placed, the risk of the second resin member 12a melting can be reduced. Therefore, stable production can be performed. In this embodiment, the second resin member 12a is a thermoplastic resin and the first resin member 11a is a thermosetting resin, but this is not limited to this, and both may be thermoplastic resins as long as there is a difference in melting point (as long as the melting point of the second resin member 12a is higher than that of the first resin member 11a). In addition, if a thermosetting resin is used for the second resin member 12a and once heated and cured, it will not melt when the thermosetting resin of the first resin member 11a is poured in, so both may be thermosetting resins.

 本実施形態において、第2金属板32aには、第2金属板32aの外縁35aと間隔をあけてスリット34a、スリット34bが形成されている。よって、第2金属板32aとヒートシンクとを接合する際に、スリット34a、スリット34bで分割されているため、端部から端部に至る距離を短くすることができる。そうすると、温度変化時において線膨張係数の差に起因した端部に負荷されるストレスを軽減することができる。この場合、第2金属板32aとヒートシンクを接合する接合材はスリット34a、スリット34bの端面よりも内側に配置される。また、スリット34a、スリット34bは第2金属板32aの外縁35aとの間隔をあけて形成されているため、樹脂モールド時において第2金属板32aの外周が金型で押さえられ、スリット34a、スリット34b内に樹脂が入り込むおそれを低減することができる。したがって、より確実に接合部における応力の緩和を図ることができる。 In this embodiment, the second metal plate 32a has slits 34a and slits 34b formed at intervals from the outer edge 35a of the second metal plate 32a. Therefore, when the second metal plate 32a and the heat sink are joined, the distance from one end to the other can be shortened because the second metal plate 32a is divided by the slits 34a and slits 34b. This reduces the stress on the end caused by the difference in linear expansion coefficient during temperature changes. In this case, the joining material joining the second metal plate 32a and the heat sink is disposed inside the end faces of the slits 34a and slits 34b. In addition, the slits 34a and slits 34b are formed at intervals from the outer edge 35a of the second metal plate 32a, so that the outer periphery of the second metal plate 32a is pressed by the mold during resin molding, reducing the risk of resin entering the slits 34a and slits 34b. Therefore, stress at the joint can be more reliably relieved.

 本実施形態において、第1樹脂部材11aには、P端子14aとN端子14bとの間に配置されるリブ17aが形成されている。P端子14aおよびN端子14bには、リブ17aを受け入れる切り欠き36a、切り欠き36bが設けられている。よって、P端子14aとN端子14b間の沿面距離を長くしながら、P端子14aとN端子14bとを近接して配置することができる。そうすると、半導体装置10aのコンパクト化を図りながら、インダクタンスの低減を図ることができる。また、リブ17aを受け入れる切り欠き36a、切り欠き36bが設けられているため、P端子14aとN端子14bの間の距離を広げることなくフィレット18aおよびフィレット18bを大きく取ることができ、寄生インダクタンスの増加を抑えながらリブ17aの強度も補強することができる。 In this embodiment, the first resin member 11a is formed with a rib 17a disposed between the P terminal 14a and the N terminal 14b. The P terminal 14a and the N terminal 14b are provided with a notch 36a and a notch 36b for receiving the rib 17a. Therefore, the P terminal 14a and the N terminal 14b can be disposed close to each other while increasing the creepage distance between them. This allows the semiconductor device 10a to be made compact while reducing inductance. In addition, because the notch 36a and the notch 36b for receiving the rib 17a are provided, the fillets 18a and 18b can be made large without increasing the distance between the P terminal 14a and the N terminal 14b, and the strength of the rib 17a can be reinforced while suppressing an increase in parasitic inductance.

 (変形例) なお、上記の実施の形態において、制御回路金属板の一部上には、ソルダーレジストが設けられていてもよい。図14は、制御回路金属板にソルダ―レジストを設けた場合の半導体装置の一部を拡大して示す概略平面図である。図14を参照して、制御回路金属板15bの一部上には、ソルダ―レジスト39a、ソルダ―レジスト39bが設けられている。ソルダ―レジスト39aは、抵抗23cが取り付けられる領域の周囲に塗布するように形成されている。ソルダ―レジスト39bは、サーミスタ24aが取り付けられる領域の周囲に塗布するように形成されている。このようにすることにより、制御回路金属板15bに抵抗23cやサーミスタ24aのような電子部品を接合する際に、ソルダ―レジスト39a、ソルダ―レジスト39bにより電子部品を接合する際の接合材の流出を防止することができ、電子部品の確実な位置決めおよび電気的な接続を確保することができる。 (Modification) In the above embodiment, a solder resist may be provided on a portion of the control circuit metal plate. FIG. 14 is a schematic plan view showing an enlarged view of a portion of a semiconductor device in which a solder resist is provided on the control circuit metal plate. Referring to FIG. 14, solder resist 39a and solder resist 39b are provided on a portion of control circuit metal plate 15b. Solder resist 39a is formed so as to be applied around the area where resistor 23c is attached. Solder resist 39b is formed so as to be applied around the area where thermistor 24a is attached. In this way, when electronic components such as resistor 23c and thermistor 24a are joined to control circuit metal plate 15b, solder resist 39a and solder resist 39b can prevent the outflow of the joining material when joining the electronic components, and can ensure reliable positioning and electrical connection of the electronic components.

 (実施の形態2)
 他の実施の形態である実施の形態2について説明する。図15は、本開示の実施の形態2における半導体装置において、第1樹脂部材を取り除いた状態を示す概略斜視図である。図16は、図15に示す半導体装置の概略平面図である。図17は、図15に示す半導体装置の概略底面図である。実施の形態2における半導体装置は、基本的には実施の形態1の場合と同様の構成を有し、同様の効果を奏する。しかし、実施の形態2の半導体装置は、DBC基板の代わりにリードフレームを用いている点、第2樹脂部材の形状が異なる点等において実施の形態1の場合とは異なっている。
(Embodiment 2)
A second embodiment, which is another embodiment, will be described. FIG. 15 is a schematic perspective view showing a state in which the first resin member is removed in the semiconductor device in the second embodiment of the present disclosure. FIG. 16 is a schematic plan view of the semiconductor device shown in FIG. 15. FIG. 17 is a schematic bottom view of the semiconductor device shown in FIG. The semiconductor device in the second embodiment basically has the same configuration as the first embodiment, and achieves the same effects. However, the semiconductor device in the second embodiment differs from the first embodiment in that a lead frame is used instead of a DBC substrate, the shape of the second resin member is different, and the like.

 図15、図16および図17を参照して、実施の形態2の半導体装置10bは、図示しない第1樹脂部材と、第2樹脂部材12bと、第1金属板31aとしてのリードフレーム13bと、制御回路金属板15aと、制御回路金属板15bと、を含む。すなわち、実施の形態2において、第1金属板31bは、リードフレーム13bから構成されている。半導体装置10bは、リードフレーム13bを構成する所定の形状の金属板を折り曲げることにより、P端子14a、N端子14b、O端子14cおよび第1金属板31bを形成している。第1金属板31bは、実施の形態1の第1金属板31aと同様に、第1領域41b、第2領域42b、第3領域43b、第4領域44b、第5領域45b、第6領域46b、第7領域47b、第8領域48bおよび第9領域49bを含む。第1領域41bとP端子14aとが一枚の金属板を折り曲げて形成され、第2領域42bとO端子14cとが一枚の金属板を折り曲げて形成され、第3領域43bとN端子14bとが一枚の金属板を折り曲げて形成される。第1領域41b上にトランジスタチップとしての半導体チップ51a、半導体チップ51b、ダイオードチップとしての半導体チップ51e、半導体チップ51fが接合され、電気的に接続される。第2領域42b上にトランジスタチップとしての半導体チップ51c、半導体チップ51d、ダイオードチップとしての半導体チップ51g、半導体チップ51hが接合され、電気的に接続される。ワイヤ56a、ワイヤ56b、ワイヤ56c、ワイヤ56d、ワイヤ57a、ワイヤ57b、ワイヤ57c、ワイヤ57d、ワイヤ58a、ワイヤ58b、ワイヤ58cおよびワイヤ58dによる各部材の電気的な接続についても、実施の形態1の場合と同様である。P端子14a、N端子14b、O端子14cは、第1金属板31bと一体となり形成されているが、実施の形態1における半導体装置10aの場合と同様に、別体として設けられていてもよい。 15, 16 and 17, the semiconductor device 10b of the second embodiment includes a first resin member (not shown), a second resin member 12b, a lead frame 13b as the first metal plate 31a, a control circuit metal plate 15a and a control circuit metal plate 15b. That is, in the second embodiment, the first metal plate 31b is composed of the lead frame 13b. The semiconductor device 10b forms the P terminal 14a, the N terminal 14b, the O terminal 14c and the first metal plate 31b by bending a metal plate of a predetermined shape that constitutes the lead frame 13b. The first metal plate 31b includes the first region 41b, the second region 42b, the third region 43b, the fourth region 44b, the fifth region 45b, the sixth region 46b, the seventh region 47b, the eighth region 48b and the ninth region 49b, similar to the first metal plate 31a of the first embodiment. The first region 41b and the P terminal 14a are formed by bending a single metal plate, the second region 42b and the O terminal 14c are formed by bending a single metal plate, and the third region 43b and the N terminal 14b are formed by bending a single metal plate. The semiconductor chip 51a, the semiconductor chip 51b, the semiconductor chip 51e, and the semiconductor chip 51f as transistor chips are bonded and electrically connected on the first region 41b. The semiconductor chip 51c, the semiconductor chip 51d, the semiconductor chip 51g, and the semiconductor chip 51h as diode chips are bonded and electrically connected on the second region 42b. The electrical connections of the members by the wires 56a, 56b, 56c, 56d, 57a, 57b, 57c, 57d, 58a, 58b, 58c, and 58d are also the same as in the first embodiment. The P terminal 14a, N terminal 14b, and O terminal 14c are formed integrally with the first metal plate 31b, but may be provided separately, as in the case of the semiconductor device 10a in embodiment 1.

 リードフレーム13bにおいて、第1領域41bおよびP端子14aを構成する金属板、第2領域42bおよびO端子14cを構成する金属板、第3領域43bおよびN端子14bを構成する金属板、第1ゲート端子21aおよび第1補助ソース端子21bについては、第2樹脂部材12bに取り付けられている。本実施形態においては、第2樹脂部材12bを製造する際に、第1領域41bおよびN端子14bを構成する金属板、第2領域42bおよびO端子14cを構成する金属板、第3領域43bおよびP端子14aを構成する金属板、第1ゲート端子21aおよび第1補助ソース端子21bを保持するように製造される。すなわち、第2樹脂部材12bは、フープ成形等、リードフレーム13bを部分成形することで固定されている。P端子14a、N端子14b、O端子14cは、第2樹脂部材12bより周囲をモールドされて固定されている。第2樹脂部材12bは、第1金属板31bと部分成形を行うことで一体となり固定されているが、実施の形態1における半導体装置10aの場合と同様に別体として設けられていてもよい。 In the lead frame 13b, the metal plate constituting the first region 41b and the P terminal 14a, the metal plate constituting the second region 42b and the O terminal 14c, the metal plate constituting the third region 43b and the N terminal 14b, the first gate terminal 21a and the first auxiliary source terminal 21b are attached to the second resin member 12b. In this embodiment, when the second resin member 12b is manufactured, it is manufactured so as to hold the metal plate constituting the first region 41b and the N terminal 14b, the metal plate constituting the second region 42b and the O terminal 14c, the metal plate constituting the third region 43b and the P terminal 14a, the first gate terminal 21a and the first auxiliary source terminal 21b. That is, the second resin member 12b is fixed by partially molding the lead frame 13b, such as by hoop molding. The P terminal 14a, the N terminal 14b, and the O terminal 14c are fixed by molding the periphery by the second resin member 12b. The second resin member 12b is fixed to the first metal plate 31b by partial molding, but may be provided as a separate member as in the case of the semiconductor device 10a in embodiment 1.

 第1金属板31bの半導体チップ51a等が配置される面と反対側の面には、凹溝63b、凹溝64bが形成されている。凹溝63b、凹溝64bは、Y方向に間隔をあけてX方向に延びるように一対形成されている。凹溝63b、凹溝64bはそれぞれ、第1金属板31bの外縁35bと間隔をあけて形成されている。凹溝63b、凹溝64bはそれぞれ、厚さ方向に見て半導体チップ51a、半導体チップ51b、半導体チップ51c、半導体チップ51d、半導体チップ51e、半導体チップ51f、半導体チップ51gおよび半導体チップ51hが配置される領域を避けて設けられている。凹溝63b、凹溝64bはそれぞれ、第1金属板31bを厚さ方向に凹ませるようにして設けられている。すなわち、凹溝63b、凹溝64bが位置する領域においては、半導体チップ51a等が配置される面は、盛り上がっている。半導体装置10bの凹溝63b、凹溝64bは、実施の形態1の半導体装置10aにおけるスリット34a、スリット34bと同じ効果を有することになる。 The first metal plate 31b has grooves 63b and 64b formed on the surface opposite to the surface on which the semiconductor chip 51a and the like are arranged. The grooves 63b and 64b are formed as a pair extending in the X direction with a gap in the Y direction. The grooves 63b and 64b are each formed with a gap from the outer edge 35b of the first metal plate 31b. The grooves 63b and 64b are each provided to avoid the areas in which the semiconductor chips 51a, 51b, 51c, 51d, 51e, 51f, 51g, and 51h are arranged when viewed in the thickness direction. The grooves 63b and 64b are each provided so as to recess the first metal plate 31b in the thickness direction. That is, in the areas where the grooves 63b and 64b are located, the surface on which the semiconductor chips 51a and the like are arranged is raised. The grooves 63b and 64b of the semiconductor device 10b have the same effect as the slits 34a and 34b of the semiconductor device 10a of embodiment 1.

 図18は、図15に示す半導体装置の内部の一部を拡大して示す概略底面図である。図18を併せて参照して、第1金属板31bは、半導体チップ51a等の厚さ方向(Z方向)に延びる接続部65bを含む。第1金属板31bは、接続部65bにおいて制御回路金属板15aと接合される。具体的には、第1金属板31bの第1領域41bに連なって形成される接続部65bは、制御回路金属板15aの電気特性検出端子21dと接合される。なお、第1金属板31bの他の箇所に設けられた不図示の接続部と、制御回路金属板15aとが接合される。 FIG. 18 is a schematic bottom view showing an enlarged portion of the inside of the semiconductor device shown in FIG. 15. Referring also to FIG. 18, the first metal plate 31b includes a connection portion 65b extending in the thickness direction (Z direction) of the semiconductor chip 51a, etc. The first metal plate 31b is joined to the control circuit metal plate 15a at the connection portion 65b. Specifically, the connection portion 65b formed in continuity with the first region 41b of the first metal plate 31b is joined to the electrical characteristic detection terminal 21d of the control circuit metal plate 15a. Note that a connection portion (not shown) provided in another location on the first metal plate 31b is joined to the control circuit metal plate 15a.

 実施の形態2の半導体装置10bによると、第1金属板31bがリードフレーム13bであるため、絶縁層を設ける必要はない。したがって、部品点数の低減等を図ることができ、構成をシンプルにすることができる。 In the semiconductor device 10b of the second embodiment, the first metal plate 31b is the lead frame 13b, so there is no need to provide an insulating layer. This allows the number of parts to be reduced, and the configuration to be simplified.

 本実施形態においては、第1金属板31bは、上記接続部65bを含むため、リードフレーム13bである第1金属板31bに設けられた接続部65bを利用して、制御回路金属板15aと接合することができる。したがって、より部品点数の削減を図って、生産性の向上の図ることができる。 In this embodiment, the first metal plate 31b includes the above-mentioned connection portion 65b, and therefore can be joined to the control circuit metal plate 15a using the connection portion 65b provided on the first metal plate 31b, which is the lead frame 13b. This allows for a further reduction in the number of parts, thereby improving productivity.

 本実施形態においては、上記凹溝63b、凹溝64bが形成されており、第1金属板31bとヒートシンクとを接合する際に凹溝63b、凹溝64bで分割されているため、端部から端部に至る距離を短くすることができる。そうすると、温度変化時において線膨張係数の差に起因した端部に負荷されるストレスを軽減することができる。この場合、リードフレーム13bとひーとシンクを接合する接合材は、凹溝63b、凹溝64bの端面よりも内側に配置される。また、凹溝63b、64bは第1金属板31bの外縁35bとの間隔をあけて形成されているため、樹脂モールド時においてリードフレーム13bの外周が金型で押さえられ、凹溝63b、凹溝64b内に樹脂が入り込むおそれを低減することができる。したがって、より確実に接合部における応力の緩和を図ることができる。 In this embodiment, the grooves 63b and 64b are formed, and the grooves 63b and 64b are divided when the first metal plate 31b and the heat sink are joined, so that the distance from one end to the other end can be shortened. This can reduce the stress on the end caused by the difference in linear expansion coefficient during temperature changes. In this case, the joining material joining the lead frame 13b and the heat sink is placed inside the end faces of the grooves 63b and 64b. In addition, the grooves 63b and 64b are formed with a gap between them and the outer edge 35b of the first metal plate 31b, so that the outer periphery of the lead frame 13b is pressed by the mold during resin molding, and the risk of resin entering the grooves 63b and 64b can be reduced. Therefore, stress at the joint can be more reliably relieved.

 (実施の形態3)
 他の実施の形態である実施の形態3について説明する。図19は、本開示の実施の形態3における半導体装置を示す概略斜視図である。実施の形態3における半導体装置は、基本的には実施の形態1の場合と同様の構成を有し、同様の効果を奏する。しかし、実施の形態3の半導体装置は、モールド樹脂を構成する第1樹脂部材の代わりにポッティング樹脂を用いている点等において実施の形態1の場合とは異なっている。
(Embodiment 3)
Another embodiment, the third embodiment, will now be described. Fig. 19 is a schematic perspective view showing a semiconductor device in the third embodiment of the present disclosure. The semiconductor device in the third embodiment basically has the same configuration as in the first embodiment, and achieves the same effects. However, the semiconductor device in the third embodiment is different from the first embodiment in that a potting resin is used instead of the first resin member constituting the mold resin.

 図19を参照して、実施の形態3の半導体装置10cは、ポッティング樹脂11cと、第2樹脂部材12cと、DBC基板13aと、P端子14aと、N端子14bと、O端子14cと、制御回路金属板15aと、制御回路金属板15bと、を含む。ポッティング樹脂11cは、枠状の第2樹脂部材12cの内側であってDBC基板13a上に配置され、DBC基板13a上に配置される半導体チップ51aを封止する。本実施形態においては、第2樹脂部材12cに、リブ17aが形成される。ポッティング樹脂の材質は、例えばシリコーンゲル、エポキシ樹脂等の熱硬化性樹脂である。 Referring to FIG. 19, the semiconductor device 10c of the third embodiment includes a potting resin 11c, a second resin member 12c, a DBC substrate 13a, a P terminal 14a, an N terminal 14b, an O terminal 14c, a control circuit metal plate 15a, and a control circuit metal plate 15b. The potting resin 11c is disposed inside the frame-shaped second resin member 12c and on the DBC substrate 13a, and seals the semiconductor chip 51a disposed on the DBC substrate 13a. In this embodiment, a rib 17a is formed on the second resin member 12c. The material of the potting resin is, for example, a thermosetting resin such as silicone gel or epoxy resin.

 このような構成の半導体装置10cによっても、コンパクト化を図りながら、安定した動作を確保することができる。 The semiconductor device 10c configured in this way can ensure stable operation while being compact.

 (他の実施の形態)
 なお、上記の実施の形態においては、電子部品として抵抗およびサーミスタを備えることとしたが、これに限らず、電子部品としてコンデンサやダイオード、コイルを備える構成としてもよい。
Other Embodiments
In the above embodiment, resistors and thermistors are provided as electronic components, but the present invention is not limited to this, and the electronic components may be configured to include capacitors, diodes, and coils.

 上記の実施の形態において、トランジスタチップは、MOSFETとしたが、IGBT(Insulated Gate Bipolar Transistor)であってもよい。ダイオードチップは、SBDとしたが、FWD(Free Wheeling Diode)であってもよい。なお、ダイオードチップを備えない構成にしてもよい。 In the above embodiment, the transistor chip is a MOSFET, but it may be an IGBT (Insulated Gate Bipolar Transistor). The diode chip is an SBD, but it may be an FWD (Free Wheeling Diode). Note that the configuration may not include a diode chip.

 トランジスタチップ、ダイオードチップは接合材(図示しない)で第1金属板に接合されている。接合材の材質としては、例えばはんだ、Ag(銀)またはCu(銅)等の焼結材である。 The transistor chip and diode chip are bonded to the first metal plate with a bonding material (not shown). The bonding material may be, for example, solder or a sintered material such as Ag (silver) or Cu (copper).

 トランジスタチップ、ダイオードチップと電気的に接続する導電部材は、ワイヤの代わりに銅クリップを用いて電気的に接続するようにしてもよい。 The conductive members electrically connected to the transistor chip and diode chip may be electrically connected using copper clips instead of wires.

 今回開示された実施の形態はすべての点で例示であって、どのような面からも制限的なものではないと理解されるべきである。本発明の範囲は上記した説明ではなく、請求の範囲によって規定され、請求の範囲と均等の意味および範囲内でのすべての変更が含まれることが意図される。 It should be understood that the embodiments disclosed herein are illustrative in all respects and are not restrictive in any respect. The scope of the present invention is defined by the claims, not the above description, and is intended to include all modifications within the meaning and scope of the claims.

 (本開示の好ましい態様)
 以下、本開示の好ましい態様を付記する。
(Preferred Aspects of the Disclosure)
Preferred aspects of the present disclosure are described below.

 (付記1)
 絶縁層と、
 前記絶縁層上に配置され、導電性を有する第1金属板と、
 前記第1金属板上に配置され、前記第1金属板と電気的に接続される半導体チップと、 前記第1金属板と電気的に接続される第1端子と、
 前記半導体チップと導電部材を介して電気的に接続される第2金属板と、
 前記第2金属板と電気的に接続される第2端子と、
 前記絶縁層、前記第1金属板および前記第2金属板のうちの少なくともいずれか一つに固定される第1樹脂部材と、
 前記半導体チップを封止し、前記第1金属板を覆うように配置される第2樹脂部材と、を備え、 前記第1樹脂部材の融点は、前記第2樹脂部材の融点よりも高い、半導体装置。
(Appendix 1)
An insulating layer;
a first metal plate disposed on the insulating layer and having electrical conductivity;
a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate; a first terminal electrically connected to the first metal plate;
a second metal plate electrically connected to the semiconductor chip via a conductive member;
a second terminal electrically connected to the second metal plate;
a first resin member fixed to at least one of the insulating layer, the first metal plate, and the second metal plate;
a second resin member that seals the semiconductor chip and is disposed so as to cover the first metal plate, wherein a melting point of the first resin member is higher than a melting point of the second resin member.

 (付記2)
 導電性を有する第1金属板と、
 前記第1金属板上に配置され、前記第1金属板と電気的に接続される半導体チップと、
 前記第1金属板と電気的に接続される第1端子と、
 前記半導体チップと導電部材を介して電気的に接続される第2金属板と、
 前記第2金属板と電気的に接続される第2端子と、
 前記第1金属板および前記第2金属板のうちの少なくともいずれか一つに固定される第1樹脂部材と、
 前記半導体チップを封止し、前記第1金属板を覆うように配置される第2樹脂部材と、を備え、
 前記第1金属板の前記半導体チップが配置あれる面の反対の面の少なくとも一部は、前記第2樹脂部材から露出しており、
 前記第1樹脂部材の融点は、前記第2樹脂部材の融点よりも高い、半導体装置。
(Appendix 2)
A first metal plate having electrical conductivity;
a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate;
a first terminal electrically connected to the first metal plate;
a second metal plate electrically connected to the semiconductor chip via a conductive member;
a second terminal electrically connected to the second metal plate;
a first resin member fixed to at least one of the first metal plate and the second metal plate;
a second resin member that seals the semiconductor chip and is arranged to cover the first metal plate,
At least a part of a surface of the first metal plate opposite to a surface on which the semiconductor chip is disposed is exposed from the second resin member,
The semiconductor device, wherein the melting point of the first resin member is higher than the melting point of the second resin member.

 (付記3)
 絶縁層と、
 前記絶縁層上に配置され、導電性を有する第1金属板と、
 前記絶縁層の前記第1金属板と反対側の面に配置される第2金属板と、
 前記第1金属板上に配置され、前記第1金属板と電気的に接続される半導体チップと、
 前記第1金属板を覆うように配置され、前記半導体チップを封止する第2樹脂部材と、を備え、
 前記第2金属板の表面の少なくとも一部は、前記第2樹脂部材から露出しており、
 前記第2金属板には、前記第2金属板の外縁と間隔をあけてスリットが形成されている、半導体装置。
(Appendix 3)
An insulating layer;
a first metal plate disposed on the insulating layer and having electrical conductivity;
a second metal plate disposed on a surface of the insulating layer opposite to the first metal plate;
a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate;
a second resin member disposed to cover the first metal plate and encapsulating the semiconductor chip;
At least a portion of a surface of the second metal plate is exposed from the second resin member,
A semiconductor device, wherein the second metal plate has a slit formed therein at a distance from an outer edge of the second metal plate.

 (付記4)
 導電性を有する第1金属板と、
 前記第1金属板上に配置され、前記第1金属板と電気的に接続される半導体チップと、
 前記第1金属板を覆うように配置され、前記半導体チップを封止する第2樹脂部材と、を備え、
 前記第1金属板の前記半導体チップが配置される面と反対側の面の少なくとも一部は、前記第2樹脂部材から露出しており、 前記第1金属板の前記半導体チップが配置される面と反対側の面には、前記第1金属板の外縁と間隔をあけて凹溝が形成されている、半導体装置。
(Appendix 4)
A first metal plate having electrical conductivity;
a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate;
a second resin member disposed to cover the first metal plate and encapsulating the semiconductor chip;
A semiconductor device, wherein at least a portion of a surface of the first metal plate opposite to the surface on which the semiconductor chip is placed is exposed from the second resin member, and a groove is formed on the surface of the first metal plate opposite to the surface on which the semiconductor chip is placed, with a gap between the outer edge of the first metal plate.

 (付記5)
 半導体装置であって、
 導電性を有する第1金属板と、
 前記第1金属板上に配置され、前記第1金属板と電気的に接続される半導体チップと、
 前記半導体チップの厚さ方向において前記第1金属板と異なる位置に配置され、導電性を有し、前記半導体装置を制御する制御回路を構成する制御回路金属板と、
 前記半導体チップを封止する第1樹脂部材と、
 前記第1金属板と電気的に接続される第1端子と、
 前記半導体チップと導電部材を介して電気的に接続される第2金属板と 前記第2金属板と電気的に接続される第2端子と、を備え、
 前記制御回路は、ゲート回路、補助ソース回路、温度特性検出回路および電気特性検出回路を含み、
 前記制御回路金属板は、前記第1樹脂部材からそれぞれ露出し、前記ゲート回路の一部を構成するゲート端子、前記補助ソース回路の一部を構成する補助ソース端子、前記温度特性検出回路の一部を構成する温度特性検出端子および前記電気特性検出回路の一部を構成する電気特性検出端子を含み、
 前記第1端子および前記第2端子はそれぞれ、P端子、N端子およびO端子のうちのいずれか一つであり、
 前記第1樹脂部材には、前記第1端子、前記第2端子、前記ゲート端子、前記補助ソース端子、前記温度特性検出端子および前記電気特性検出端子の隣り合ういずれか2つの間に配置されるリブが形成されており、 前記リブが間に配置される前記第1端子、前記第2端子、前記ゲート端子、前記補助ソース端子、前記温度特性検出端子および前記電気特性検出端子の2つのうちの少なくともいずれか一方には、前記リブを受け入れる切り欠きが設けられている、半導体装置。
(Appendix 5)
A semiconductor device comprising:
A first metal plate having electrical conductivity;
a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate;
a control circuit metal plate that is disposed at a position different from the first metal plate in a thickness direction of the semiconductor chip, has electrical conductivity, and constitutes a control circuit that controls the semiconductor device;
a first resin member that encapsulates the semiconductor chip;
a first terminal electrically connected to the first metal plate;
a second metal plate electrically connected to the semiconductor chip via a conductive member; and a second terminal electrically connected to the second metal plate,
the control circuit includes a gate circuit, an auxiliary source circuit, a temperature characteristic detection circuit, and an electrical characteristic detection circuit;
the control circuit metal plate is exposed from the first resin member and includes a gate terminal constituting a part of the gate circuit, an auxiliary source terminal constituting a part of the auxiliary source circuit, a temperature characteristic detection terminal constituting a part of the temperature characteristic detection circuit, and an electric characteristic detection terminal constituting a part of the electric characteristic detection circuit,
each of the first terminal and the second terminal is one of a P terminal, an N terminal, and an O terminal;
a semiconductor device, wherein the first resin member is formed with a rib that is arranged between any two adjacent terminals of the first terminal, the second terminal, the gate terminal, the auxiliary source terminal, the temperature characteristic detection terminal, and the electrical characteristic detection terminal, and at least one of the first terminal, the second terminal, the gate terminal, the auxiliary source terminal, the temperature characteristic detection terminal, and the electrical characteristic detection terminal that are arranged between the rib is provided with a notch that receives the rib.

 (付記6)
 半導体装置であって、
 導電性を有する第1金属板と、
 前記第1金属板上に配置され、前記第1金属板と電気的に接続される半導体チップと、
 前記半導体チップの厚さ方向において前記第1金属板と異なる位置に配置され、導電性を有し、前記半導体装置を制御する制御回路を構成する制御回路金属板と、
 前記第1金属板と電気的に接続される第1端子と、
 前記半導体チップと導電部材を介して電気的に接続される第2金属板と、
 前記第2金属板と電気的に接続される第2端子と、
 前記第1端子および前記第2端子を支持する第2樹脂部材と、を備え、
 前記制御回路は、ゲート回路、補助ソース回路、温度特性検出回路および電気特性検出回路を含み、
 前記制御回路金属板は、前記ゲート回路の一部を構成するゲート端子、前記補助ソース回路の一部を構成する補助ソース端子、前記温度特性検出回路の一部を構成する温度特性検出端子および前記電気特性検出回路の一部を構成する電気特性検出端子を含み、
 前記第1端子および前記第2端子はそれぞれ、P端子、N端子およびO端子のうちのいずれか一つであり、
 前記第2樹脂部材には、前記第1端子、前記第2端子、前記ゲート端子、前記補助ソース端子、前記温度特性検出端子および前記電気特性検出端子の隣り合ういずれか2つの間に配置されるリブが形成されており、
 前記リブが間に配置される前記第1端子、前記第2端子、前記ゲート端子、前記補助ソース端子、前記温度特性検出端子および前記電気特性検出端子の2つのうちの少なくともいずれか一方には、前記リブを受け入れる切り欠きが設けられている、半導体装置。
(Appendix 6)
A semiconductor device comprising:
A first metal plate having electrical conductivity;
a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate;
a control circuit metal plate that is disposed at a position different from the first metal plate in a thickness direction of the semiconductor chip, has electrical conductivity, and constitutes a control circuit that controls the semiconductor device;
a first terminal electrically connected to the first metal plate;
a second metal plate electrically connected to the semiconductor chip via a conductive member;
a second terminal electrically connected to the second metal plate;
a second resin member supporting the first terminal and the second terminal,
the control circuit includes a gate circuit, an auxiliary source circuit, a temperature characteristic detection circuit, and an electrical characteristic detection circuit;
the control circuit metal plate includes a gate terminal constituting a part of the gate circuit, an auxiliary source terminal constituting a part of the auxiliary source circuit, a temperature characteristic detection terminal constituting a part of the temperature characteristic detection circuit, and an electric characteristic detection terminal constituting a part of the electric characteristic detection circuit,
each of the first terminal and the second terminal is one of a P terminal, an N terminal, and an O terminal;
a rib is formed in the second resin member and is disposed between any two adjacent ones of the first terminal, the second terminal, the gate terminal, the auxiliary source terminal, the temperature characteristic detection terminal, and the electrical characteristic detection terminal;
A semiconductor device, wherein at least one of the first terminal, the second terminal, the gate terminal, the auxiliary source terminal, the temperature characteristic detection terminal, and the electrical characteristic detection terminal between which the rib is arranged has a notch that receives the rib.

10a,10b,10c 半導体装置、11a 第1樹脂部材、11c ポッティング樹脂部材、12a,12b,12c 第2樹脂部材、13a DBC基板、13b リードフレーム、14a P端子、14b N端子、14c O端子、15a,15b 制御回路金属板、16a,16b,16c 丸穴、17a リブ、18a,18b フィレット、19a,19b,19c,19d 貫通穴、21a 第1ゲート端子、21b 第1補助ソース端子、21c 第1温度特性検出端子、21d 電気特性検出端子、22a 第2ゲート端子、22b 第2補助ソース端子、22c 第2温度特性検出端子、23a,23b,23c,23d 抵抗、24a サーミスタ、25a,25b インサート金属、26a 第1端子、27a 第1フレーム、27b フレーム露出部、28a,28b,29a,29b,29c 係合部、31a,31b 第1金属板、32a 第2金属板、33a 絶縁層、34a,34b スリット、35a,35b 外縁、36a,36b 切り欠き、37a,37b スナップ嵌合部、38a,38b 接合材、39a,39b ソルダ―レジスト、41a,41b 第1領域、42a,42b 第2領域、43a,43b 第3領域、44a,44b 第4領域、45a,45b 第5領域、46a,46b 第6領域、47a,47b 第7領域、48a,48b 第8領域、49a,49b 第9領域、51a,51b,51c,51d,51e,51f,51g,51h 半導体チップ、52a ドレイン電極、52b カソード電極、53a,53b,53c,53d ソース電極、54a,54b,54c,54d アノード電極、56a,56b,56c,56d,57a,57b,57c,57d,58a,58b,58c,58d ワイヤ、61a 第1露出部、62a 第2露出部、63b,64b 凹溝、65b 接続部。
 
10a, 10b, 10c semiconductor device, 11a first resin member, 11c potting resin member, 12a, 12b, 12c second resin member, 13a DBC substrate, 13b lead frame, 14a P terminal, 14b N terminal, 14c O terminal, 15a, 15b control circuit metal plate, 16a, 16b, 16c round hole, 17a rib, 18a, 18b fillet, 19a, 19b, 19c, 19d through hole, 21a first gate terminal, 21b first auxiliary source terminal, 21c first temperature characteristic detection terminal, 21d electrical characteristic detection terminal, 22a second gate terminal, 22b second auxiliary source terminal, 22c second temperature characteristic detection terminal, 23a, 23b, 23c, 23d resistor, 24a thermistor, 25a, 25b Insert metal, 26a: first terminal, 27a: first frame, 27b: exposed frame portion, 28a, 28b, 29a, 29b, 29c: engaging portion, 31a, 31b: first metal plate, 32a: second metal plate, 33a: insulating layer, 34a, 34b: slit, 35a, 35b: outer edge, 36a, 36b: notch, 37a, 37b: snap fitting portion, 38a, 38b: bonding material, 39a, 39b: solder resist, 41a, 41b: first region, 42a, 42b: second region, 43a, 43b: third region, 44a, 44b: fourth region, 45a, 45b: fifth region, 46a, 46b: sixth region, 47a, 47b: seventh region, 48a, 48b: eighth region, 49a, 49b 9th region, 51a, 51b, 51c, 51d, 51e, 51f, 51g, 51h semiconductor chip, 52a drain electrode, 52b cathode electrode, 53a, 53b, 53c, 53d source electrodes, 54a, 54b, 54c, 54d anode electrodes, 56a, 56b, 56c, 56d, 57a, 57b, 57c, 57d, 58a, 58b, 58c, 58d wires, 61a first exposed portion, 62a second exposed portion, 63b, 64b grooves, 65b connection portion.

Claims (17)

 半導体装置であって、
 導電性を有する第1金属板と、
 前記第1金属板上に配置され、前記第1金属板と電気的に接続される半導体チップと、
 前記半導体チップの厚さ方向において前記第1金属板と異なる位置に配置され、導電性を有し、前記半導体装置を制御する制御回路を構成する制御回路金属板と、を備え、
 前記制御回路は、ゲート回路、補助ソース回路、温度特性検出回路および電気特性検出回路のうちの少なくともいずれか一つを含む、半導体装置。
A semiconductor device comprising:
A first metal plate having electrical conductivity;
a semiconductor chip disposed on the first metal plate and electrically connected to the first metal plate;
a control circuit metal plate that is disposed at a position different from the first metal plate in a thickness direction of the semiconductor chip, has electrical conductivity, and constitutes a control circuit that controls the semiconductor device;
The control circuit includes at least one of a gate circuit, an auxiliary source circuit, a temperature characteristic detection circuit, and an electrical characteristic detection circuit.
 前記半導体チップの厚さ方向に見て、前記制御回路金属板は、前記第1金属板と重複する領域を含む、請求項1に記載の半導体装置。 The semiconductor device according to claim 1, wherein the control circuit metal plate includes an area that overlaps with the first metal plate when viewed in the thickness direction of the semiconductor chip.  前記半導体チップを封止する第1樹脂部材をさらに備え、
 前記制御回路金属板は、
 前記第1樹脂部材から露出する部分を有する第1端子と、
 前記第1樹脂部材によって覆われる部分を有する第1フレームと、を含み、
 前記第1端子と前記第1フレームとは、一体で構成されている、請求項1または請求項2に記載の半導体装置。
A first resin member that seals the semiconductor chip is further provided.
The control circuit metal plate is
a first terminal having a portion exposed from the first resin member;
a first frame having a portion covered by the first resin member;
3. The semiconductor device according to claim 1, wherein the first terminal and the first frame are integrally formed.
 前記半導体チップを封止する第1樹脂部材をさらに備え、
 前記制御回路金属板は、
 前記第1樹脂部材から露出する部分を有する第1端子と、
 前記第1樹脂部材によって覆われる部分を有する第1フレームと、を含み、
 前記第1端子と前記第1フレームとは、別体で構成されており、
 前記第1端子は、前記第1樹脂部材に保持される、請求項1または請求項2に記載の半導体装置。
A first resin member that seals the semiconductor chip is further provided.
The control circuit metal plate is
a first terminal having a portion exposed from the first resin member;
a first frame having a portion covered by the first resin member;
The first terminal and the first frame are configured separately,
The semiconductor device according to claim 1 , wherein the first terminal is held by the first resin member.
 前記半導体チップを封止する第1樹脂部材と、
 前記第1樹脂部材と別体で設けられる第2樹脂部材をさらに備え、
 前記制御回路金属板は、前記第2樹脂部材上に配置されている、請求項1から請求項4のいずれか1項に記載の半導体装置。
a first resin member that encapsulates the semiconductor chip;
A second resin member provided separately from the first resin member,
The semiconductor device according to claim 1 , wherein the control circuit metal plate is disposed on the second resin member.
 前記半導体チップを封止する第1樹脂部材と、
 前記第1樹脂部材と別体で設けられる第2樹脂部材と、をさらに備え、
 前記制御回路金属板は、
 前記第2樹脂部材から突出する突出部および前記第2樹脂部材によって保持される保持部を有する第1端子と、
 前記第1樹脂部材によって覆われる部分を有する第1フレームと、を含み、
 前記保持部は、前記第2樹脂部材から露出する端子露出部を含み、
 前記第1フレームは、前記半導体チップの厚さ方向に見て前記端子露出部が位置する領域において前記第1端子と接合される、請求項1から請求項5のいずれか1項に記載の半導体装置。
a first resin member that encapsulates the semiconductor chip;
A second resin member provided separately from the first resin member,
The control circuit metal plate is
a first terminal having a protruding portion protruding from the second resin member and a retaining portion retained by the second resin member;
a first frame having a portion covered by the first resin member;
the holding portion includes a terminal exposed portion exposed from the second resin member,
The semiconductor device according to claim 1 , wherein the first frame is joined to the first terminal in a region where the terminal exposed portion is located when viewed in a thickness direction of the semiconductor chip.
 前記半導体チップを封止する第1樹脂部材と、
 前記第1樹脂部材と別体で設けられる第2樹脂部材と、
 前記第2樹脂部材に保持され、前記制御回路金属板と接合されるインサート金属と、をさらに備え、
 前記インサート金属は、前記第2樹脂部材から露出する第1露出部を含み、
 前記インサート金属は、前記半導体チップの厚さ方向に見て前記第1露出部が位置する領域において前記制御回路金属板と接合される、請求項1から請求項6のいずれか1項に記載の半導体装置。
a first resin member that encapsulates the semiconductor chip;
a second resin member provided separately from the first resin member;
An insert metal that is held by the second resin member and joined to the control circuit metal plate,
the insert metal includes a first exposed portion exposed from the second resin member,
The semiconductor device according to claim 1 , wherein the insert metal is joined to the control circuit metal plate in a region where the first exposed portion is located when viewed in a thickness direction of the semiconductor chip.
 前記半導体チップを封止する第1樹脂部材と、
 前記第1樹脂部材と別体で設けられる第2樹脂部材と、
 前記第2樹脂部材に保持され、前記第1金属板と接合されるインサート金属と、をさらに備え、
 前記インサート金属は、前記第2樹脂部材から露出する第2露出部を含み、
 前記インサート金属は、前記半導体チップの厚さ方向に見て前記第2露出部が位置する領域において前記第1金属板と接合される、請求項1から請求項6のいずれか1項に記載の半導体装置。
a first resin member that encapsulates the semiconductor chip;
a second resin member provided separately from the first resin member;
An insert metal that is held by the second resin member and joined to the first metal plate,
the insert metal includes a second exposed portion exposed from the second resin member,
The semiconductor device according to claim 1 , wherein the insert metal is joined to the first metal plate in a region where the second exposed portion is located when viewed in a thickness direction of the semiconductor chip.
 前記制御回路金属板の一部上には、ソルダーレジストが設けられている、請求項1から請求項8のいずれか1項に記載の半導体装置。 The semiconductor device according to any one of claims 1 to 8, wherein a solder resist is provided on a portion of the control circuit metal plate.  前記制御回路金属板に電気的に接続される電子部品をさらに備える、請求項1から請求項9のいずれか1項に記載の半導体装置。 The semiconductor device according to any one of claims 1 to 9, further comprising an electronic component electrically connected to the control circuit metal plate.  前記半導体チップを封止する第1樹脂部材と、
 前記第1樹脂部材と別体で設けられる第2樹脂部材と、をさらに備え、
 前記第2樹脂部材には、前記制御回路金属板と係合する係合部が設けられている、請求項1から請求項10のいずれか1項に記載の半導体装置。
a first resin member that encapsulates the semiconductor chip;
A second resin member provided separately from the first resin member,
The semiconductor device according to claim 1 , wherein the second resin member is provided with an engagement portion that engages with the control circuit metal plate.
 前記第1金属板は、リードフレームであるか、または前記半導体チップの厚さ方向において前記半導体チップが配置される面と反対側の面に絶縁層を有する基板上の電極である、請求項1から請求項11のいずれか1項に記載の半導体装置。 The semiconductor device according to any one of claims 1 to 11, wherein the first metal plate is a lead frame or an electrode on a substrate having an insulating layer on a surface opposite to a surface on which the semiconductor chip is disposed in the thickness direction of the semiconductor chip.  前記半導体チップを封止する第1樹脂部材と、
 前記第1樹脂部材と別体で設けられる第2樹脂部材と、をさらに備え、
 前記第1金属板は、リードフレームであり、
 前記第1金属板は、前記半導体チップの厚さ方向に延びる接続部を含み、
 前記第1金属板は、前記接続部において前記制御回路金属板と接合される、請求項1から請求項12のいずれか1項に記載の半導体装置。
a first resin member that encapsulates the semiconductor chip;
A second resin member provided separately from the first resin member,
the first metal plate is a lead frame,
the first metal plate includes a connection portion extending in a thickness direction of the semiconductor chip,
The semiconductor device according to claim 1 , wherein the first metal plate is joined to the control circuit metal plate at the connection portion.
 前記半導体チップを封止する第1樹脂部材と、
 前記第1樹脂部材と別体で設けられる第2樹脂部材と、
 前記第1金属板に対して、前記半導体チップの厚さ方向において前記半導体チップが配置される面と反対側の面に配置される絶縁層と、をさらに備え、
 前記制御回路金属板は、前記第2樹脂部材上に配置されており、
 前記第2樹脂部材は、前記第1金属板上または前記絶縁層上に配置されており、
 前記第2樹脂部材の融点は、前記第1樹脂部材の融点よりも高い、請求項1から請求項13のいずれか1項に記載の半導体装置。
a first resin member that encapsulates the semiconductor chip;
a second resin member provided separately from the first resin member;
an insulating layer disposed on a surface of the first metal plate opposite to a surface on which the semiconductor chip is disposed in a thickness direction of the semiconductor chip;
the control circuit metal plate is disposed on the second resin member,
the second resin member is disposed on the first metal plate or on the insulating layer,
The semiconductor device according to claim 1 , wherein the second resin member has a melting point higher than a melting point of the first resin member.
 前記第1金属板に対して、前記半導体チップの厚さ方向において前記半導体チップが配置ある面と反対側の前記第1金属板の面に配置される絶縁層と、
 前記絶縁層に対して、前記半導体チップの厚さ方向において前記第1金属板と反対側に配置される第2金属板と、をさらに備え、
 前記第2金属板には、前記第2金属板の外縁と間隔をあけてスリットが形成されている、請求項1から請求項14のいずれか1項に記載の半導体装置。
an insulating layer disposed on a surface of the first metal plate opposite to a surface on which the semiconductor chip is disposed in a thickness direction of the first metal plate;
a second metal plate disposed on the insulating layer on the opposite side to the first metal plate in a thickness direction of the semiconductor chip,
The semiconductor device according to claim 1 , wherein the second metal plate has a slit formed therein and spaced apart from an outer edge of the second metal plate.
 前記第1金属板は、リードフレームであり、
 前記第1金属板の前記半導体チップが配置される面と反対側の面には、前記第1金属板の外縁と間隔をあけて凹溝が形成されている、請求項1から請求項14のいずれか1項に記載の半導体装置。
the first metal plate is a lead frame,
15. The semiconductor device according to claim 1, wherein a groove is formed on a surface of the first metal plate opposite to a surface on which the semiconductor chip is arranged, the groove being spaced apart from an outer edge of the first metal plate.
 前記半導体チップを封止する第1樹脂部材と、
 第1端子と、
 前記第1端子と異なる第2端子と、をさらに備え、
 前記第1端子および前記第2端子はそれぞれ、P端子、N端子、O端子、ゲート端子、補助ソース端子、温度特性検出端子および電気特性検出端子のうちのいずれか一つであり、
 前記第1樹脂部材には、前記第1端子と前記第2端子との間に配置されるリブが形成されており、
 前記第1端子および前記第2端子のうちの少なくともいずれか一方には、前記リブを受け入れる切り欠きが設けられている、請求項1から請求項16のいずれか1項に記載の半導体装置。
a first resin member that encapsulates the semiconductor chip;
A first terminal;
a second terminal different from the first terminal;
the first terminal and the second terminal are each one of a P terminal, an N terminal, an O terminal, a gate terminal, an auxiliary source terminal, a temperature characteristic detection terminal, and an electrical characteristic detection terminal;
the first resin member has a rib disposed between the first terminal and the second terminal;
The semiconductor device according to claim 1 , wherein at least one of the first terminal and the second terminal is provided with a notch for receiving the rib.
PCT/JP2024/018095 2023-05-29 2024-05-16 Semiconductor device WO2024247739A1 (en)

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Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003100983A (en) * 2001-09-21 2003-04-04 Kyocera Corp Ceramic circuit board
JP2005150209A (en) * 2003-11-12 2005-06-09 Denso Corp Electronic device and its manufacturing method
JP2007173405A (en) * 2005-12-20 2007-07-05 Showa Denko Kk Semiconductor module
WO2009150875A1 (en) * 2008-06-12 2009-12-17 株式会社安川電機 Power module and control method therefore
WO2011155165A1 (en) * 2010-06-11 2011-12-15 パナソニック株式会社 Resin-sealed semiconductor device and method for manufacturing same
WO2016125673A1 (en) * 2015-02-02 2016-08-11 株式会社村田製作所 Semiconductor module and power control unit
JP2018190875A (en) * 2017-05-10 2018-11-29 ローム株式会社 Semiconductor device
JP2021027263A (en) * 2019-08-08 2021-02-22 株式会社三社電機製作所 Semiconductor module
JP2022067375A (en) * 2020-10-20 2022-05-06 三菱電機株式会社 Power semiconductor devices, their manufacturing methods, and power conversion devices

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003100983A (en) * 2001-09-21 2003-04-04 Kyocera Corp Ceramic circuit board
JP2005150209A (en) * 2003-11-12 2005-06-09 Denso Corp Electronic device and its manufacturing method
JP2007173405A (en) * 2005-12-20 2007-07-05 Showa Denko Kk Semiconductor module
WO2009150875A1 (en) * 2008-06-12 2009-12-17 株式会社安川電機 Power module and control method therefore
WO2011155165A1 (en) * 2010-06-11 2011-12-15 パナソニック株式会社 Resin-sealed semiconductor device and method for manufacturing same
WO2016125673A1 (en) * 2015-02-02 2016-08-11 株式会社村田製作所 Semiconductor module and power control unit
JP2018190875A (en) * 2017-05-10 2018-11-29 ローム株式会社 Semiconductor device
JP2021027263A (en) * 2019-08-08 2021-02-22 株式会社三社電機製作所 Semiconductor module
JP2022067375A (en) * 2020-10-20 2022-05-06 三菱電機株式会社 Power semiconductor devices, their manufacturing methods, and power conversion devices

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