WO2023113779A1 - High purity polysiloxane macromers and method for making the same - Google Patents
High purity polysiloxane macromers and method for making the same Download PDFInfo
- Publication number
- WO2023113779A1 WO2023113779A1 PCT/US2021/063438 US2021063438W WO2023113779A1 WO 2023113779 A1 WO2023113779 A1 WO 2023113779A1 US 2021063438 W US2021063438 W US 2021063438W WO 2023113779 A1 WO2023113779 A1 WO 2023113779A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- acryloxyalkyldimethylchlorosilane
- less
- macromer
- purity
- copolymer
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims abstract description 55
- -1 polysiloxane Polymers 0.000 title claims description 45
- 229920001296 polysiloxane Polymers 0.000 title claims description 22
- 239000012535 impurity Substances 0.000 claims abstract description 16
- 150000001875 compounds Chemical class 0.000 claims abstract description 13
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims abstract description 12
- 230000002194 synthesizing effect Effects 0.000 claims abstract description 9
- 125000003545 alkoxy group Chemical group 0.000 claims abstract description 6
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims abstract description 4
- 239000006227 byproduct Substances 0.000 claims description 36
- 229920001577 copolymer Polymers 0.000 claims description 26
- 239000000047 product Substances 0.000 claims description 24
- OKQXCDUCLYWRHA-UHFFFAOYSA-N 3-[chloro(dimethyl)silyl]propyl 2-methylprop-2-enoate Chemical group CC(=C)C(=O)OCCC[Si](C)(C)Cl OKQXCDUCLYWRHA-UHFFFAOYSA-N 0.000 claims description 14
- 238000012653 anionic ring-opening polymerization Methods 0.000 claims description 13
- PQKMPPXIVXUHHY-UHFFFAOYSA-N 3-[chloro(dimethyl)silyl]propyl 2-methylpropanoate Chemical compound CC(C)C(=O)OCCC[Si](C)(C)Cl PQKMPPXIVXUHHY-UHFFFAOYSA-N 0.000 claims description 12
- QABCGOSYZHCPGN-UHFFFAOYSA-N chloro(dimethyl)silicon Chemical compound C[Si](C)Cl QABCGOSYZHCPGN-UHFFFAOYSA-N 0.000 claims description 9
- 239000003153 chemical reaction reagent Substances 0.000 claims description 8
- WCEQVCWCZPWAJN-UHFFFAOYSA-N [chloro(dimethyl)silyl]methyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC[Si](C)(C)Cl WCEQVCWCZPWAJN-UHFFFAOYSA-N 0.000 claims description 7
- 229920000435 poly(dimethylsiloxane) Polymers 0.000 claims description 7
- 239000004205 dimethyl polysiloxane Substances 0.000 claims description 6
- CERQOIWHTDAKMF-UHFFFAOYSA-M methacrylate group Chemical group C(C(=C)C)(=O)[O-] CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 claims description 6
- 238000006467 substitution reaction Methods 0.000 claims description 6
- NCNZEUPRAWNELZ-UHFFFAOYSA-N 11-[chloro(dimethyl)silyl]undecyl 2-methylprop-2-enoate Chemical compound C(C(=C)C)(=O)OCCCCCCCCCCC[Si](C)(C)Cl NCNZEUPRAWNELZ-UHFFFAOYSA-N 0.000 claims description 5
- CSBJCQMIXISILC-UHFFFAOYSA-N 3-[chloro(dimethyl)silyl]propyl prop-2-enoate Chemical compound C[Si](C)(Cl)CCCOC(=O)C=C CSBJCQMIXISILC-UHFFFAOYSA-N 0.000 claims description 5
- QXKMQBOTKLTKOE-UHFFFAOYSA-N 3-[dichloro(methyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC[Si](C)(Cl)Cl QXKMQBOTKLTKOE-UHFFFAOYSA-N 0.000 claims description 5
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 5
- WETWJCDKMRHUPV-UHFFFAOYSA-N acetyl chloride Chemical compound CC(Cl)=O WETWJCDKMRHUPV-UHFFFAOYSA-N 0.000 claims description 5
- 239000012346 acetyl chloride Substances 0.000 claims description 5
- HTDJPCNNEPUOOQ-UHFFFAOYSA-N hexamethylcyclotrisiloxane Chemical compound C[Si]1(C)O[Si](C)(C)O[Si](C)(C)O1 HTDJPCNNEPUOOQ-UHFFFAOYSA-N 0.000 claims description 5
- 238000006555 catalytic reaction Methods 0.000 claims description 3
- AVDUEHWPPXIAEB-UHFFFAOYSA-N chloro-ethyl-dimethylsilane Chemical compound CC[Si](C)(C)Cl AVDUEHWPPXIAEB-UHFFFAOYSA-N 0.000 claims description 3
- 239000011968 lewis acid catalyst Substances 0.000 claims description 3
- 239000007858 starting material Substances 0.000 claims description 3
- 238000012546 transfer Methods 0.000 claims description 3
- 238000006243 chemical reaction Methods 0.000 description 20
- 230000015572 biosynthetic process Effects 0.000 description 13
- 238000006459 hydrosilylation reaction Methods 0.000 description 13
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 12
- 239000011541 reaction mixture Substances 0.000 description 12
- 238000003786 synthesis reaction Methods 0.000 description 12
- 238000002290 gas chromatography-mass spectrometry Methods 0.000 description 9
- 238000006116 polymerization reaction Methods 0.000 description 9
- WJFKNYWRSNBZNX-UHFFFAOYSA-N 10H-phenothiazine Chemical compound C1=CC=C2NC3=CC=CC=C3SC2=C1 WJFKNYWRSNBZNX-UHFFFAOYSA-N 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 8
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 8
- 229950000688 phenothiazine Drugs 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 230000002829 reductive effect Effects 0.000 description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 6
- 238000001514 detection method Methods 0.000 description 6
- 235000013870 dimethyl polysiloxane Nutrition 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 239000000523 sample Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 239000000203 mixture Substances 0.000 description 5
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical class CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 5
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 4
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 4
- 239000003054 catalyst Substances 0.000 description 4
- 239000000460 chlorine Substances 0.000 description 4
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 4
- 238000004821 distillation Methods 0.000 description 4
- 238000001165 gas chromatography-thermal conductivity detection Methods 0.000 description 4
- 230000003287 optical effect Effects 0.000 description 4
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- FYSNRJHAOHDILO-UHFFFAOYSA-N thionyl chloride Chemical compound ClS(Cl)=O FYSNRJHAOHDILO-UHFFFAOYSA-N 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- JSOZORWBKQSQCJ-UHFFFAOYSA-N 3-[ethoxy(dimethyl)silyl]propyl 2-methylprop-2-enoate Chemical compound CCO[Si](C)(C)CCCOC(=O)C(C)=C JSOZORWBKQSQCJ-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- 239000005046 Chlorosilane Substances 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- KOPOQZFJUQMUML-UHFFFAOYSA-N chlorosilane Chemical compound Cl[SiH3] KOPOQZFJUQMUML-UHFFFAOYSA-N 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 239000012467 final product Substances 0.000 description 3
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 3
- FBCQUCJYYPMKRO-UHFFFAOYSA-N prop-2-enyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC=C FBCQUCJYYPMKRO-UHFFFAOYSA-N 0.000 description 3
- IIFBEYQLKOBDQH-UHFFFAOYSA-N 3-chloropropyl-ethoxy-dimethylsilane Chemical group CCO[Si](C)(C)CCCCl IIFBEYQLKOBDQH-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 2
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 2
- 239000002841 Lewis acid Substances 0.000 description 2
- MZRVEZGGRBJDDB-UHFFFAOYSA-N N-Butyllithium Chemical compound [Li]CCCC MZRVEZGGRBJDDB-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 125000000746 allylic group Chemical group 0.000 description 2
- KCXMKQUNVWSEMD-UHFFFAOYSA-N benzyl chloride Chemical compound ClCC1=CC=CC=C1 KCXMKQUNVWSEMD-UHFFFAOYSA-N 0.000 description 2
- 229940073608 benzyl chloride Drugs 0.000 description 2
- 150000001805 chlorine compounds Chemical class 0.000 description 2
- IGMQAYXTTRYCPZ-UHFFFAOYSA-N chloromethyl-ethoxy-dimethylsilane Chemical compound CCO[Si](C)(C)CCl IGMQAYXTTRYCPZ-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 238000001704 evaporation Methods 0.000 description 2
- 230000008020 evaporation Effects 0.000 description 2
- 239000000706 filtrate Substances 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 150000004820 halides Chemical class 0.000 description 2
- 125000001188 haloalkyl group Chemical group 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000007062 hydrolysis Effects 0.000 description 2
- 238000006460 hydrolysis reaction Methods 0.000 description 2
- 238000011065 in-situ storage Methods 0.000 description 2
- 239000003112 inhibitor Substances 0.000 description 2
- 150000007517 lewis acids Chemical class 0.000 description 2
- TWXDDNPPQUTEOV-FVGYRXGTSA-N methamphetamine hydrochloride Chemical compound Cl.CN[C@@H](C)CC1=CC=CC=C1 TWXDDNPPQUTEOV-FVGYRXGTSA-N 0.000 description 2
- 239000012044 organic layer Substances 0.000 description 2
- 238000005191 phase separation Methods 0.000 description 2
- UHZYTMXLRWXGPK-UHFFFAOYSA-N phosphorus pentachloride Chemical compound ClP(Cl)(Cl)(Cl)Cl UHZYTMXLRWXGPK-UHFFFAOYSA-N 0.000 description 2
- XHXFXVLFKHQFAL-UHFFFAOYSA-N phosphoryl trichloride Chemical compound ClP(Cl)(Cl)=O XHXFXVLFKHQFAL-UHFFFAOYSA-N 0.000 description 2
- 229910000027 potassium carbonate Inorganic materials 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000010189 synthetic method Methods 0.000 description 2
- FAQYAMRNWDIXMY-UHFFFAOYSA-N trichloroborane Chemical compound ClB(Cl)Cl FAQYAMRNWDIXMY-UHFFFAOYSA-N 0.000 description 2
- XPUBCCUJVHXZCV-UHFFFAOYSA-N (3,5-ditert-butyl-4-hydroxyphenyl)methyl-dimethylazanium;chloride Chemical compound Cl.CN(C)CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 XPUBCCUJVHXZCV-UHFFFAOYSA-N 0.000 description 1
- BHKAWXZKFKVZLK-UHFFFAOYSA-N 2,3-ditert-butyl-6-methylphenol Chemical compound CC1=CC=C(C(C)(C)C)C(C(C)(C)C)=C1O BHKAWXZKFKVZLK-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- NGNBDVOYPDDBFK-UHFFFAOYSA-N 2-[2,4-di(pentan-2-yl)phenoxy]acetyl chloride Chemical compound CCCC(C)C1=CC=C(OCC(Cl)=O)C(C(C)CCC)=C1 NGNBDVOYPDDBFK-UHFFFAOYSA-N 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- 229910021592 Copper(II) chloride Inorganic materials 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- 206010015946 Eye irritation Diseases 0.000 description 1
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 1
- 229910021627 Tin(IV) chloride Inorganic materials 0.000 description 1
- AAGGQHFQJFTHCM-UHFFFAOYSA-N [chloro(dimethyl)silyl] 2-methylprop-2-enoate Chemical group CC(=C)C(=O)O[Si](C)(C)Cl AAGGQHFQJFTHCM-UHFFFAOYSA-N 0.000 description 1
- VSCWAEJMTAWNJL-UHFFFAOYSA-K aluminium trichloride Chemical compound Cl[Al](Cl)Cl VSCWAEJMTAWNJL-UHFFFAOYSA-K 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- VQPFDLRNOCQMSN-UHFFFAOYSA-N bromosilane Chemical class Br[SiH3] VQPFDLRNOCQMSN-UHFFFAOYSA-N 0.000 description 1
- 239000001569 carbon dioxide Substances 0.000 description 1
- 229910002092 carbon dioxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000004587 chromatography analysis Methods 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000000356 contaminant Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- KTQYJQFGNYHXMB-UHFFFAOYSA-N dichloro(methyl)silicon Chemical compound C[Si](Cl)Cl KTQYJQFGNYHXMB-UHFFFAOYSA-N 0.000 description 1
- MROCJMGDEKINLD-UHFFFAOYSA-N dichlorosilane Chemical compound Cl[SiH2]Cl MROCJMGDEKINLD-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 231100000013 eye irritation Toxicity 0.000 description 1
- 238000005984 hydrogenation reaction Methods 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000010348 incorporation Methods 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 229910052741 iridium Inorganic materials 0.000 description 1
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 1
- 238000006317 isomerization reaction Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- ZHVVREFXHSWVQF-UHFFFAOYSA-N lithium dimethyl(oxido)silane Chemical compound [Li+].C[SiH](C)[O-] ZHVVREFXHSWVQF-UHFFFAOYSA-N 0.000 description 1
- KBJKWYZQIJZAOZ-UHFFFAOYSA-N lithium;oxidosilane Chemical compound [Li+].[SiH3][O-] KBJKWYZQIJZAOZ-UHFFFAOYSA-N 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000005055 methyl trichlorosilane Substances 0.000 description 1
- 239000005048 methyldichlorosilane Substances 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- SYSQUGFVNFXIIT-UHFFFAOYSA-N n-[4-(1,3-benzoxazol-2-yl)phenyl]-4-nitrobenzenesulfonamide Chemical class C1=CC([N+](=O)[O-])=CC=C1S(=O)(=O)NC1=CC=C(C=2OC3=CC=CC=C3N=2)C=C1 SYSQUGFVNFXIIT-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000037361 pathway Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BDAWXSQJJCIFIK-UHFFFAOYSA-N potassium methoxide Chemical compound [K+].[O-]C BDAWXSQJJCIFIK-UHFFFAOYSA-N 0.000 description 1
- LLLCSBYSPJHDJX-UHFFFAOYSA-M potassium;2-methylprop-2-enoate Chemical group [K+].CC(=C)C([O-])=O LLLCSBYSPJHDJX-UHFFFAOYSA-M 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004886 process control Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 1
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000007151 ring opening polymerisation reaction Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- IBWGNZVCJVLSHB-UHFFFAOYSA-M tetrabutylphosphanium;chloride Chemical compound [Cl-].CCCC[P+](CCCC)(CCCC)CCCC IBWGNZVCJVLSHB-UHFFFAOYSA-M 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 description 1
- 125000000725 trifluoropropyl group Chemical group [H]C([H])(*)C([H])([H])C(F)(F)F 0.000 description 1
- 238000004260 weight control Methods 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/12—Organo silicon halides
- C07F7/121—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20
- C07F7/123—Preparation or treatment not provided for in C07F7/14, C07F7/16 or C07F7/20 by reactions involving the formation of Si-halogen linkages
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
- C07F7/1804—Compounds having Si-O-C linkages
- C07F7/1872—Preparation; Treatments not provided for in C07F7/20
- C07F7/1892—Preparation; Treatments not provided for in C07F7/20 by reactions not provided for in C07F7/1876 - C07F7/1888
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/06—Preparatory processes
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/04—Polysiloxanes
- C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
Definitions
- isomeric impurities lead to non-homogeneity in copolymer structures and inert impurities may lead to extractable species which may affect biocompatibility or result in domain separation that affects the optical properties of copolymers.
- Polysiloxane macromers are formed by living anionic ring-opening polymerization (AROP). This chemistry is described by Goff et al. (see “Applications of Hybrid Polymers Generated from Living Anionic Ring Opening Polymerization,” Molecules, 26, 2755 (2021)). The conditions for avoiding redistribution reactions during the polymerization that forms the siloxane-containing macromer are critical for achieving purity, but most of these variables are now understood. The most significant limit to achieving high- purity is the “end-capper” or “termination” reagent employed in the AROP reaction: 3- (methacryloxy)propyldimethylchlorosilane, having formula (4).
- This end-capper material is conventionally produced by the hydrosilylation of allyl methacrylate.
- the earliest discrete synthesis for the product was reported by Cameron (Polymer, 26, 437 (1985)) in 50% yield with final purity unspecified.
- Cameron Polymer, 26, 437 (1985)
- a major byproduct is the P-isomer, l-methyl-2-methacryloxy ethyldimethylchlorosilane, (formula (5)).
- the genesis of these impurities is the selectivity of the hydrosilylation catalyst which, although favoring the anti-Markovnikov addition product, also allows the formation of the normal Markovnikov product, allows minor dehydrogenative coupling reactions, and catalyzes hydrogenation of the double bond of the acrylate.
- the hydrosilylation is preferred, but not limited to the allylic group, and, to a lesser degree, also occurs with the unsaturation of the acrylate.
- there is allylic unsaturation in the product formed by hydrosilylation of the acrylate double bond under normal polymerization conditions it is essentially unreactive with the consequence that macromers derived from this byproduct are also extractable.
- allyl functional macromers do not readily undergo photoinitiated polymerization.
- JP 2003-096086 of Nishiwaki describes the use of an iridium catalyst, which also resulted in a purity of 98.8%.
- isobutyroxypropyldimethylchlorosilane also known as a-methylpropionyloxypropyldimethylchlorosilane
- all of the earlier literature reports of high purities are likely overstated, at least because at the time of these references, analytical limitations typically lacked the sensitivity to determine hydrogenated and isomeric byproducts and failure to meet performance criteria appeared inexplicable.
- an acryloxyalkyldimethylchlorosilane having a purity of at least about 99% and containing less than about 0.1 wt. % hydrogenated byproducts and less than about 0.1 wt. % isomeric byproducts.
- a method of synthesizing a high purity acryloxyalkyldimethylchlorosilane comprising:
- a methacrylate-functional macromer or copolymer derived from an acryloxyalkyldimethylchlorosilane wherein the macromer or copolymer has a purity of at least about 99%.
- Embodiment 1 An acryloxyalkyldimethylchlorosilane having a purity of at least about 99% and containing less than about 0.1 wt. % hydrogenated byproducts and less than about 0.1 wt. % isomeric byproducts.
- Embodiment 2 The acryloxyalkyl dimethylchlorosilane according to embodiment 1, wherein the acryloxyalkyldimethylchlorosilane contains less than about 0.05 wt. % hydrogenated byproducts and less than about 0.05 wt. % isomeric byproducts.
- Embodiment 3 The acryloxyalkyldimethylchlorosilane according to embodiment 1 or 2, wherein the acryloxyalkyldimethylchlorosilane is a (meth)acryloxy alkyl dimethylchlorosilane.
- Embodiment 4 The acryloxyalkyldimethyl chlorosilane according to embodiment 3, wherein the acryloxyalkyldimethylchlorosilane contains less than about 0.05 wt. % isobutyroxypropyldimethylchlorosilane and less than about 0.05 wt. % l-methyl-2- methacryloxy ethyldimethylchlorosilane.
- Embodiment 5 The acryloxyalkyldimethyl chlorosilane according to any of the preceding embodiments, wherein the purity is greater than about 99.3%.
- Embodiment 6 The acryloxyalkyl dimethylchlorosilane according to any of the preceding embodiments, wherein the acryloxyalkyldimethylchlorosilane is 3- methacryloxypropyldimethylchlorosilane, methacryloxymethyldimethylchlorosilane, 3 - (acryloxy)propyldimethylchlorosilane, 11 -(methacryloxy )undecyldimethylchlorosilane, or 3- (methacryloxy)propylmethyl dichlorosilane.
- Embodiment 7 A method of synthesizing a high purity acryloxyalkyldimethylchlorosilane comprising:
- Embodiment 8 The method according to embodiment 7, wherein step (a) is a phase transfer catalyzed reaction.
- Embodiment 9 The method according to embodiment 7 or 8, wherein step (a) comprises (i) reacting a halide salt with methacrylic acid to form the acrylate salt; and (ii) reacting the acrylate salt with the haloalkyldimethylalkoxysilane.
- Embodiment 10 The method according to any of embodiments 7-9, wherein step (b) is an exchange or substitution reaction.
- Embodiment 11 The method according to any of embodiments 7-10, wherein step (b) comprises reacting the acryloxy-substituted alkyldimethylalkoxysilane with an acetyl chloride and a weak Lewis acid catalyst.
- Embodiment 12 The method according to any of embodiments 7-11, wherein the acryloxyalkyldimethylchlorosilane is a (meth)acryloxyalkyldimethylchlorosilane and the product of step (a) is a (meth)acryloxyalkyldimethylalkoxysilane.
- Embodiment 13 The method according to any of embodiments 7-12, wherein the acryloxyalkyldimethylchlorosilane is 3 -methyacryloxypropyl dimethylchlorosilane, methacryloxymethyldimethylchlorosilane, 3-(acryloxy)propyldimethylchlorosilane, 11- (methacryloxy)undecyldimethylchlorosilane, or 3- (methacryloxy)propylmethyl dichlorosilane.
- the acryloxyalkyldimethylchlorosilane is 3 -methyacryloxypropyl dimethylchlorosilane, methacryloxymethyldimethylchlorosilane, 3-(acryloxy)propyldimethylchlorosilane, 11- (methacryloxy)undecyldimethylchlorosilane, or 3- (methacryloxy)propylmethyl dichlorosilane.
- Embodiment 14 The method according to any of embodiments 7-13, wherein the acryloxyalkyldimethylchlorosilane has a purity of greater than about 99%.
- Embodiment 15 The method according to any of embodiments 7-14, wherein the acryloxyalkyldimethylchlorosilane has a purity of greater than about 99.3%.
- Embodiment 16 The method according to any of embodiments 7-15, wherein the acryloxyalkyldimethylchlorosilane contains less than about 0.1 wt. % hydrogenated byproducts and less than about 0.1 wt. % isomeric byproducts.
- Embodiment 17 The method according to any of embodiments 7-16 wherein the acryloxyalkyldimethylchlorosilane contains less than about 0.05 wt. % hydrogenated byproducts and less than about 0.05% isomeric byproducts.
- Embodiment 18 The method according to any of embodiments 7-17, wherein the acryloxyalkyldimethylchlorosilane is a (meth)acryloxyalkyldimethylchlorosilane and contains less than about 0.05 wt. % isobutyroxypropyldimethylchlorosilane and less than about 0.05 wt. % l-methyl-2-methacryloxy ethyldimethylchlorosilane.
- Embodiment 19 A method for synthesizing a high purity (meth)acryloxyalkyldimethyl functional polysiloxane macromer comprising performing living anionic ring-opening polymerization using hexamethylcyclotrisiloxane as a starting material and the acryloxyalkyldimethylchlorosilane according to any of embodiments 1-6 as a termination reagent.
- Embodiment 20 The method according to embodiment 19, wherein the polysiloxane is a monomethacryloxypropyl terminated polydimethylsiloxane.
- Embodiment 21 The method according to embodiment 19 or 20, wherein the polysiloxane is substantially free of non-polymeric polysiloxanes.
- Embodiment 22 The method according to any of embodiments 19-21, wherein the polysiloxane contains less than about 0.1 wt. % impurities containing hydrogenated derivatives or isomers of the (meth)acryloxyalkyl functionality.
- Embodiment 23 A methacrylate-functional macromer or copolymer derived from an acryloxyalkyldimethylchlorosilane, wherein the macromer or copolymer has a purity of at least about 99%.
- Embodiment 24 The macromer or copolymer according to embodiment 23, wherein the macromer or copolymer contains less than about 0.1 wt. % hydrogenated derivatives of the methacrylate functionality.
- Embodiment 25 The macromer or copolymer according to embodiment 23 or 24, wherein the macromer or copolymer contains less than about 0.05 wt. % hydrogenated derivatives of the methacrylate functionality.
- Embodiment 26 The macromer or copolymer according to any of embodiments 23-25, having a molecular weight of less than about 5,000 Daltons.
- Embodiment 27 The methacrylate-functional macromer or copolymer derived from an acryloxyalkyl dimethylchlorosilane according to any of embodiments 23-26, wherein the macromer or copolymer has a purity of at least about 99.3%.
- the disclosure relates to a method for synthesizing high purity acryloxyalkyldimethylchlorosilanes, which are suitable end-cappers for living AROP. These high purity compounds are substantially free of isomers and hydrogenated byproducts and allow for the preparation of high purity acryloxyalkyl terminated poly(siloxanes) which are substantially free of non-polymerizable poly siloxanes.
- the method of this disclosure avoids hydrosilylation of an acrylate, and instead utilizes substitution reactions in which there is no chemical mechanism for isomerization or reduction.
- the endcapper produced by the method is 3-methacryloxypropyldimethylchlorosilane (formula (4)) with a purity of about 99% or greater and contains no detectable hydrogenated analog (isobutyroxypropyldimethylchlorosilane, having formula (6)) or the 0-isomer (l-methyl-2- methacryloxyethyldimethylchlorosilane, having formula (5)).
- This high purity compound may be used as an end-capper or terminator for the production of monomethacryloxypropyl terminated poly dimethylsiloxanes.
- high purity compounds suitable as endcappers or termination reagents for the living AROP synthesis of macromers which may be synthesized by the method described herein include (methacryloxymethyl)dimethylchlorosilane and 3-(acryloxymethyl)dimethylchlorosilane, which have not heretofore been synthesized.
- the compounds described herein are substantially free of isomeric and hydrogenated byproducts/reductive analogs.
- the negative effects of impure end-capping compounds are most significant when the macromers are of relatively low molecular weight, in particular less than about 5,000 Daltons.
- the non-reactive macromers formed from reductive analogs can be solubilized in a final polymer in which the macromer forms a pendant group in a copolymer.
- copolymers derived from low molecular weight macromers With copolymers derived from low molecular weight macromers, a loss of optical transmission caused by phase separation of the reductive analog may occur.
- the materials and methods described herein solve the problem of defects in optics which are associated with low molecular weight macromers incorporated as comonomers in polymers utilized in the formation of contact lenses.
- the term “high purity” may be understood to mean a purity greater than about 99%, more preferably greater than about 99.2 %, even more preferably greater than about 99.3%.
- the term “substantially free” may be understood to mean that the impurity is not detectable by GC and GC-MS, which typically have detection limits of less than about 0.05 wt. %. Accordingly, the method provides for the synthesis of acryloxyalkyldimethylchlorosilanes having high purity and also no detectible isomeric or hydrogenated byproducts, that is, less than about 0.1 wt. % or less than about 0.05 wt. % isomeric or hydrogenated byproducts. Other impurities which may be present will have little impact on AROP or in the performance of the resulting macromers.
- the method for synthesizing the high purity acryloxyalkyldimethylchlorosilanes involves (a) forming an acryloxy-substituted alkyldimethylalkoxysilane, preferably by a phase transfer catalyzed reaction between an acrylate salt and a (haloalkyl)dimethylalkoxysilane, and then (b) displacing the alkoxy group with a halide, preferably in an exchange or substitution reaction.
- a preferred acrylate salt is potassium methacrylate, which may be generated in-situ from the reaction of potassium carbonate and methacrylic acid, for example.
- a preferred (haloalkyl)dimethylalkoxysilane is 3-chloropropyldimethylethoxysilane.
- an acrylic acid may be reacted with a haloalkylsilane in the presence of a base acceptor.
- this chemistry cannot directly produce the preferred methacryloxypropyldimethylchlorosilane because the acrylate salt also reacts with the chlorine bound to silicon.
- the high purity end-capper is a (meth)acryloxypropyldimethylchlorosilane and the intermediate is a (meth)acryloxypropyldimethylethoxysilane.
- an ethoxy group on silicon may be exchanged with chlorine by reaction with thionyl chloride, phosphoryl trichloride, phosphorous pentachloride, benzyl chloride, boron trichloride, tin tetrachloride, methyltrichlorosilane, or an acid chloride, among others.
- thionyl chloride and phosphorus pentachloride may additionally cleave acrylate esters, forming acid chlorides, and all act as initiators for polymerization (see T. Sengupta et al, Journal of the Indian Chemical Society, 53:7, 726-7 (1976)).
- Benzyl chloride and acid chlorides are less effective in exchange or substitution reactions unless catalyzed by the presence of a strong Lewis acid type catalyst such as aluminum trichloride or boron trichloride.
- strong Lewis acids have the potential to catalyze reactions involving the acrylate functionality.
- a presently preferred reaction couple for the exchange reaction is acetyl chloride and a weak Lewis acid catalyst, preferably ferric chloride, which does not cleave the acrylate ester or induce polymerization.
- a weak Lewis acid catalyst preferably ferric chloride
- the synthetic method described above is generally applicable for producing analogs and homologs of 3 -methacryloxypropyldimethylchlorosilanes in purities greater than about 99%, more preferably greater than about 99.2 %, even more preferably greater than about 99.3%, without detectable isomers or hydrogenated byproduct contamination, and which are suitable for use in the synthesis of high purity acrylate functional macromers.
- aspects of the disclosure also relate to methods for producing high purity (meth)acryloxyalkylmethylsiloxane macromers and copolymers derived from the high purity (meth)acryloxyalkylmethyldichlorosilanes described above.
- Asymmetric macromers are typically prepared by initiating polymerization with a lithium dimethylsilanolate formed by the reaction of an alkyl lithium reagent with a strained cyclic siloxane, most commonly hexamethylcyclotrisiloxane.
- the lithium silanolate can be isolated or formed in situ.
- a strained cyclic with a promoter typically an aprotic polar material such as dimethylformamide or tetrahydrofuran
- a chlorosilane such as the most commonly used 3 -(methacryloxy)propyldimethyl chlorosilane
- These macromers and copolymers have a purity of greater than about 99%, more preferably greater than about 99.2 %, even more preferably greater than about 99.3%, contain less than about 0.1 wt. % hydrogenated impurities and less than about 0.1 wt. % isomeric impurities, and have a molecular weight less than about 5,000 Daltons, more preferably less than about 1,000 Daltons.
- Further aspects of the disclosure relate to methods for producing high purity (meth)acrylate functional macromers derived from the high purity end-cappers, including meth(acryloxy)methyl terminated macromers which have not been previously prepared. Specifically, these macromers may be produced using AROP procedures which are well known in the art and employing the high purity end-cappers described herein.
- a method for synthesizing a high purity (meth)acryloxyalkyl dimethyl functional asymmetric polysiloxane macromer comprises performing living anionic ring-opening polymerization using hexamethylcyclotrisiloxane as a starting material and the acryloxyalkyldimethylchlorosilane as previously described as an end-capper.
- the polysiloxane is a monomethacryloxypropyl terminated polydimethylsiloxane.
- the resulting polysiloxane is substantially free of non-polymeric polysiloxanes and contains less than about 0.1 wt. % impurities (or less than about 0.05 wt.
- symmetric polysiloxane macromers may be derived from 3-(methacryloxypropyl)methyldichlorosilane.
- Phenothiazine (5 wt %) was added to the reaction mixture and purified using a wiped film evaporator to afford a clear colorless liquid (1100 g, 50 %).
- FTIR (cm' 1 ): 2958.43, 2925.56, 2892.7, 1716.86, 1638.17, 1452.32, 1407.43, 1319.71, 1295.06, 1254.91, 1157.04, 1064.03, 1011.38, 938.82, 846.93;
- GC-TCD purity - 88.85%, P-isomer - 2.01%, isobutyroxypropyldi
- a 2L 4-neck flask was equipped with a mechanical stirrer, heating mantle, addition funnel, pot thermal probe, fritted glass dispersion tube and Dean-Stark trap with water-cooled condenser.
- Di-t-butylhydroxytoluene (BHT) (4.19g, 3.50 wt%) and toluene (960 g) were charged to the reactor. Stirring was initiated and potassium carbonate (109.1 g, 7.67 mol) was added. The slurry was heated to 80°C with an Cb/Ar sparge and then methacrylic acid (119.9 g, 1.40 mol) was added dropwise at 100°C over 2 hours.
- the product was then purified by wiped film evaporation at 0.6-0.7 mmHg vacuum, with a 64-5°C jacket temperature and a cold finger temperature of 30°C with a product residue split of 4: 1 to afford the final product, 3- methacryloxypropyldimethylethoxysilane, as a clear colorless liquid (202.6 g, 66.2 %).
- a IL 4-neck reactor was equipped with a magnetic stirrer, pot thermal probe, cooling bath, addition funnel, packed column, and distillation head with N2.
- Ferric chloride, anhydrous, (1.40 g, 0.01 mol) and acetyl chloride (123.6 g, 1.58 mol) were charged to the reactor.
- 3 -Methacryloxypropyldimethylethoxy silane as prepared in Example 2 inhibited with 1 wt % BHT (345.5 g, 1.50 mol) and phenothiazine (1.50 g, 0.01 mol) were added dropwise to the reaction mixture at a rate to maintain the reaction temperature at 20 to 25°C.
- a 22 L 4-neck flask was equipped with a mechanical stirrer, heating mantle, addition funnel, pot thermal probe, fritted glass dispersion tube and distillation head mounted on a 500 cm packed column.
- the flask was charged with 3000 ml of cyclohexane and 3718 g of a solution of 32% potassium methoxide in methanol. Stirring and a below liquid surface air sparge were initiated.
- Methacrylic acid 1439 ml, inhibited with BHT was added through an addition funnel, maintaining the temperature below 60°C. After addition was completed, the pH was >9. The flask was then heated to remove methanol.
- the polymer was terminated with 3 -methacryloxypropyldimethylchlorosilane (prepared in Example 3) to obtain monobutyl-, monomethacryloxypropyl-terminated polydimethylsiloxane.
- the solution was then stirred overnight and washed with 178 g deionized water.
- the aqueous and organic layers were separated, and the organic layer was dried with sodium sulfate, filtered, and stripped under vacuum at 95°C with a dry air sparge.
- 3-Methacyloxpropyldimethylchlorosilane was synthesized as described in Example 1 of U.S. Patent No. 5,493,039 of Okawa using the same conditions and scale, except that the water content of the allyl methacrylate was 37 ppm and not 171 ppm. Analysis of the product revealed the presence of isobutyroxypropyldimethylchlorosilane (0.59 %) and the 0-isomer (1.47%). The purpose of this comparative example was to demonstrate that, although not reported by Okawa, the reduction product was in fact generated during this hydrosilylation method. The level of isobutyroxymethyldimethylchlorosilane was below the level of detection by GC and GC-MS using a capillary column, i.e., less than 0.05%
- the 3-methacryloxypropyldimethylchlorosilane prepared by the method according to the present disclosure not only has dramatically higher purity than the analogous material prepared by traditional hydrosilylation, but also has no detectable 0-isomer or hydrogenated byproduct. Further, the percentage excess required when using this compound as an end-capper for AROP is reduced by half.
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