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WO2020141806A3 - 플라즈마 발생 장치 및 그 동작 방법 - Google Patents

플라즈마 발생 장치 및 그 동작 방법 Download PDF

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Publication number
WO2020141806A3
WO2020141806A3 PCT/KR2019/018549 KR2019018549W WO2020141806A3 WO 2020141806 A3 WO2020141806 A3 WO 2020141806A3 KR 2019018549 W KR2019018549 W KR 2019018549W WO 2020141806 A3 WO2020141806 A3 WO 2020141806A3
Authority
WO
WIPO (PCT)
Prior art keywords
induction coil
coil module
discharge induction
generating apparatus
plasma generating
Prior art date
Application number
PCT/KR2019/018549
Other languages
English (en)
French (fr)
Other versions
WO2020141806A2 (ko
Inventor
엄세훈
이윤성
손영훈
박세홍
Original Assignee
인투코어테크놀로지 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020180173639A external-priority patent/KR102142867B1/ko
Priority claimed from KR1020190172614A external-priority patent/KR102257146B1/ko
Application filed by 인투코어테크놀로지 주식회사 filed Critical 인투코어테크놀로지 주식회사
Priority to US16/973,994 priority Critical patent/US11532455B2/en
Publication of WO2020141806A2 publication Critical patent/WO2020141806A2/ko
Publication of WO2020141806A3 publication Critical patent/WO2020141806A3/ko
Priority to US18/055,640 priority patent/US11791133B2/en
Priority to US18/465,849 priority patent/US12159766B2/en
Priority to US18/924,866 priority patent/US20250046571A1/en

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/321Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211Antennas, e.g. particular shapes of coils
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32009Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082Radio frequency generated discharge
    • H01J37/32174Circuits specially adapted for controlling the RF discharge
    • H01J37/32183Matching circuits
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32Processing objects by plasma generation
    • H01J2237/327Arrangements for generating the plasma
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/32431Constructional details of the reactor
    • H01J37/32798Further details of plasma apparatus not provided for in groups H01J37/3244 - H01J37/32788; special provisions for cleaning or maintenance of the apparatus
    • H01J37/32816Pressure
    • H01J37/32825Working under atmospheric pressure or higher

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)

Abstract

본 발명의 일 실시예에 따른 플라즈마 발생 장치는 유전체 방전 튜브에 배치된 한 쌍의 전극, 초기 방전 유도 코일 모듈, 및 메인 방전 유도 코일 모듈을 포함한다. 초기 방전 유도 코일 모듈 및 메인 방전 유도 코일 모듈은 RF 전원에 연결되고, 상기 RF 전원은 서로 다른 공진 주파수의 RF 전력을 초기 방전 유도 코일 모듈 및 메인 방전 유도 코일 모듈에 각각 제공한다.
PCT/KR2019/018549 2018-12-31 2019-12-27 플라즈마 발생 장치 및 그 동작 방법 WO2020141806A2 (ko)

Priority Applications (4)

Application Number Priority Date Filing Date Title
US16/973,994 US11532455B2 (en) 2018-12-31 2019-12-27 Plasma generating apparatus and method for operating same
US18/055,640 US11791133B2 (en) 2018-12-31 2022-11-15 Plasma generating apparatus and method for operating same
US18/465,849 US12159766B2 (en) 2018-12-31 2023-09-12 Plasma generating apparatus and method for operating same
US18/924,866 US20250046571A1 (en) 2018-12-31 2024-10-23 Plasma generating apparatus and method for operating same

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
KR1020180173639A KR102142867B1 (ko) 2018-12-31 2018-12-31 대기압 플라즈마 발생 장치
KR10-2018-0173639 2018-12-31
KR10-2019-0172614 2019-12-23
KR1020190172614A KR102257146B1 (ko) 2019-12-23 2019-12-23 플라즈마 발생 장치 및 그 동작 방법

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US202016973994A Continuation 2018-12-31 2020-12-10

Publications (2)

Publication Number Publication Date
WO2020141806A2 WO2020141806A2 (ko) 2020-07-09
WO2020141806A3 true WO2020141806A3 (ko) 2020-12-17

Family

ID=71407050

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/KR2019/018549 WO2020141806A2 (ko) 2018-12-31 2019-12-27 플라즈마 발생 장치 및 그 동작 방법

Country Status (2)

Country Link
US (4) US11532455B2 (ko)
WO (1) WO2020141806A2 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10896806B2 (en) * 2016-11-03 2021-01-19 En2Core Technology, Inc. Inductive coil structure and inductively coupled plasma generation system
WO2020141806A2 (ko) 2018-12-31 2020-07-09 인투코어테크놀로지 주식회사 플라즈마 발생 장치 및 그 동작 방법
KR20220168428A (ko) * 2021-06-16 2022-12-23 (주)펨토사이언스 유도 결합형 플라즈마 생성 장치
WO2023081110A1 (en) * 2021-11-03 2023-05-11 Lam Research Corporation Method and apparatus for automated regulation of a frequency-modulated multilevel outphasing power amplifier
WO2023244714A1 (en) * 2022-06-17 2023-12-21 Standard Biotools Canada Inc. Rf coil resonator systems and methods
WO2025014713A1 (en) * 2023-07-12 2025-01-16 Lam Research Corporation A systems and methods for providing closed-loop voltage control of a nano pulse generator

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050047293A (ko) * 2003-11-17 2005-05-20 삼성전자주식회사 헬리컬 자기-공진 코일을 이용한 이온화 물리적 기상 증착장치
KR101657303B1 (ko) * 2015-05-22 2016-09-13 인투코어테크놀로지 주식회사 플라즈마 장치
KR20180001804A (ko) * 2016-06-28 2018-01-05 (주) 엔피홀딩스 플라즈마 발생기
KR101826883B1 (ko) * 2016-11-03 2018-02-08 인투코어테크놀로지 주식회사 유도 코일 구조체 및 유도 결합 플라즈마 발생 장치
KR20180116225A (ko) * 2016-01-22 2018-10-24 에스피피 테크놀로지스 컴퍼니 리미티드 플라즈마 제어 장치

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4587462A (en) * 1984-08-10 1986-05-06 Gte Laboratories Incorporated Fluorescent light source with parallel DC discharges
US4810935A (en) * 1985-05-03 1989-03-07 The Australian National University Method and apparatus for producing large volume magnetoplasmas
TW249313B (ko) * 1993-03-06 1995-06-11 Tokyo Electron Co
JP3033012B2 (ja) 1995-06-28 2000-04-17 近畿コカ・コーラボトリング株式会社 濃縮飲料遮断・自己洗浄型ポストミックス飲料抽出ディスペンサー
US6264812B1 (en) * 1995-11-15 2001-07-24 Applied Materials, Inc. Method and apparatus for generating a plasma
GB2344930B (en) * 1998-12-17 2003-10-01 Trikon Holdings Ltd Inductive coil assembly
JP3385528B2 (ja) * 1999-07-06 2003-03-10 日本電気株式会社 ドライエッチング装置とドライエッチング方法
US6507155B1 (en) * 2000-04-06 2003-01-14 Applied Materials Inc. Inductively coupled plasma source with controllable power deposition
US7090705B2 (en) 2002-10-16 2006-08-15 Sharp Kabushiki Kaisha Electronic device, production method thereof, and plasma process apparatus
JP2005005204A (ja) * 2003-06-13 2005-01-06 Harison Toshiba Lighting Corp 放電灯点灯装置
US20080156264A1 (en) * 2006-12-27 2008-07-03 Novellus Systems, Inc. Plasma Generator Apparatus
WO2010082561A1 (ja) * 2009-01-13 2010-07-22 リバーベル株式会社 プラズマ生成装置及び方法
JP5723130B2 (ja) * 2010-09-28 2015-05-27 東京エレクトロン株式会社 プラズマ処理装置
JP5800547B2 (ja) * 2011-03-29 2015-10-28 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
JP2013182966A (ja) * 2012-03-01 2013-09-12 Hitachi High-Technologies Corp プラズマ処理装置及びプラズマ処理方法
CN104169717B (zh) * 2012-03-15 2016-04-27 株式会社岛津制作所 放电电离电流检测器及其时效处理方法
KR20140089458A (ko) * 2013-01-04 2014-07-15 피에스케이 주식회사 플라즈마 챔버 및 기판 처리 장치
ITPD20130310A1 (it) * 2013-11-14 2015-05-15 Nadir S R L Metodo per la generazione di un getto o jet di plasma atmosferico e dispositivo minitorcia al plasma atmosferico
WO2015145663A1 (ja) * 2014-03-27 2015-10-01 株式会社日立国際電気 半導体装置の製造方法および基板処理装置
JP6582391B2 (ja) * 2014-11-05 2019-10-02 東京エレクトロン株式会社 プラズマ処理装置
KR102280380B1 (ko) 2015-09-03 2021-07-22 인투코어테크놀로지 주식회사 유도 결합 플라즈마 장치
JP6745134B2 (ja) * 2016-05-12 2020-08-26 東京エレクトロン株式会社 プラズマ処理装置
WO2017201198A1 (en) 2016-05-18 2017-11-23 Illumina, Inc. Self assembled patterning using patterned hydrophobic surfaces
US10541114B2 (en) 2016-11-03 2020-01-21 En2Core Technology, Inc. Inductive coil structure and inductively coupled plasma generation system
US20180358206A1 (en) * 2017-06-09 2018-12-13 Mattson Technology, Inc. Plasma Processing Apparatus
JP2021509525A (ja) * 2017-12-27 2021-03-25 マトソン テクノロジー インコーポレイテッドMattson Technology, Inc. プラズマ処理装置および方法
KR102363121B1 (ko) * 2018-06-11 2022-02-15 매슨 테크놀로지 인크 워크피스의 처리를 위한 수소 반응성 종의 생성
WO2020141806A2 (ko) 2018-12-31 2020-07-09 인투코어테크놀로지 주식회사 플라즈마 발생 장치 및 그 동작 방법

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20050047293A (ko) * 2003-11-17 2005-05-20 삼성전자주식회사 헬리컬 자기-공진 코일을 이용한 이온화 물리적 기상 증착장치
KR101657303B1 (ko) * 2015-05-22 2016-09-13 인투코어테크놀로지 주식회사 플라즈마 장치
KR20180116225A (ko) * 2016-01-22 2018-10-24 에스피피 테크놀로지스 컴퍼니 리미티드 플라즈마 제어 장치
KR20180001804A (ko) * 2016-06-28 2018-01-05 (주) 엔피홀딩스 플라즈마 발생기
KR101826883B1 (ko) * 2016-11-03 2018-02-08 인투코어테크놀로지 주식회사 유도 코일 구조체 및 유도 결합 플라즈마 발생 장치

Also Published As

Publication number Publication date
US20250046571A1 (en) 2025-02-06
US20210319979A1 (en) 2021-10-14
US11791133B2 (en) 2023-10-17
US11532455B2 (en) 2022-12-20
US20230083958A1 (en) 2023-03-16
US12159766B2 (en) 2024-12-03
WO2020141806A2 (ko) 2020-07-09
US20240006150A1 (en) 2024-01-04

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