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WO2015160058A1 - Réacteur à plasma permettant de traiter un gaz d'échappement produit à partir d'une installation de traitement - Google Patents

Réacteur à plasma permettant de traiter un gaz d'échappement produit à partir d'une installation de traitement Download PDF

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Publication number
WO2015160058A1
WO2015160058A1 PCT/KR2014/010121 KR2014010121W WO2015160058A1 WO 2015160058 A1 WO2015160058 A1 WO 2015160058A1 KR 2014010121 W KR2014010121 W KR 2014010121W WO 2015160058 A1 WO2015160058 A1 WO 2015160058A1
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WO
WIPO (PCT)
Prior art keywords
conduit
electrode portion
plasma reactor
thickness
electrode
Prior art date
Application number
PCT/KR2014/010121
Other languages
English (en)
Korean (ko)
Inventor
고경오
강경두
노명근
Original Assignee
주식회사 클린팩터스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from KR1020140045421A external-priority patent/KR101563193B1/ko
Priority claimed from KR1020140070600A external-priority patent/KR101567562B1/ko
Application filed by 주식회사 클린팩터스 filed Critical 주식회사 클린팩터스
Priority to CN201480077933.9A priority Critical patent/CN106165062A/zh
Publication of WO2015160058A1 publication Critical patent/WO2015160058A1/fr

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    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/2406—Generating plasma using dielectric barrier discharges, i.e. with a dielectric interposed between the electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H2245/00—Applications of plasma devices
    • H05H2245/10—Treatment of gases
    • H05H2245/17—Exhaust gases

Definitions

  • the present invention relates to an exhaust gas treatment plasma reactor generated in a process facility, and more particularly, has a structure capable of decomposing the exhaust gas discharged from the process chamber and preventing damage to the conduit caused by plasma discharge.
  • the present invention relates to an exhaust gas treating plasma reactor generated in a process facility capable of cooling.
  • processes such as functional thin film formation and dry etching are applied.
  • Such a process is generally performed in a vacuum chamber, and various kinds of metal and nonmetallic precursors are used as process gases for forming a functional thin film, and various kinds of etching gases are also used for dry etching.
  • each component consisting of a process chamber, a vacuum pump, a scrubber, or the like is connected to each other through an exhaust line.
  • the gas discharged from the process chamber is different depending on the process, but may include a gas molecule or an unreacted precursor (precursor), a solid seed crystal of the aerosol state, and the inert gas as a carrier gas It may further include.
  • These exhaust gases are introduced into the vacuum pump along the exhaust line. Since the compression of the exhaust gases occurs at a high temperature of 100 or more inside the vacuum pump, phase shifts of the exhaust gases easily occur, and solid by-products are easily formed inside the vacuum pump. It accumulates and accumulates and corrodes by-products of corrosive gas including F, Cl, and the like, causing the vacuum pump to fail.
  • Korean Patent No. 1065013 discloses a plasma reactor technology that decomposes exhaust gas by applying an AC driving voltage to cause a discharge to a conduit barrier.
  • the conduit of the plasma reactor is damaged by the fine particles of the plasma discharge generated by the plasma discharge or the plasma discharge inside the plasma reactor has a problem that the life of the plasma reactor is shortened.
  • the charged particles generated by the plasma discharge hits the inner circumferential surface of the conduit by the electric field (ion shock), which causes the conduit to be damaged.
  • the damage to the conduit proceeds faster in the region where the plasma discharge is concentrated, this causes the burden on the user because the conduit must be frequently replaced in the plasma reactor, or when the conduit cannot be replaced, the plasma reactor must be replaced as a whole. There is also.
  • the present invention has a structure that can decompose the exhaust gas discharged from the process chamber, to prevent damage to the conduit due to the plasma discharge, to provide an exhaust gas treatment plasma reactor generated in the process equipment that can be cooled when overheated. The purpose.
  • the present invention provides a plasma reactor disposed between a process chamber and a vacuum pump to decompose an exhaust gas discharged from a process chamber, comprising: a conduit in which the exhaust gas flows and formed of a dielectric; A first electrode part disposed on the conduit and shielding the inner space of the conduit; And a second electrode portion spaced apart from the first electrode portion, the second electrode portion decomposing the exhaust gas by causing plasma discharge with the first electrode portion, to prevent damage to the conduit caused by the plasma discharge.
  • the thickness of the conduit provides a plasma reactor in which the thickness of the portion where the plasma discharge is concentrated is thicker than the thickness of the peripheral portion.
  • the plasma reactor according to the present invention has the following effects.
  • the thickness of the conduit is made thicker from the set reference toward the area where the plasma discharge is concentrated, thereby preventing the conduit from being damaged by the fine particles of the exhaust gas decomposed by the plasma discharge and the plasma discharge, thereby preventing the plasma discharge. It is possible to prevent the charged particles generated by the ion impact on the conduit by the electric field to damage the conduit to improve the life of the plasma reactor.
  • the layers in direct contact with the plasma discharge may be formed by including a material resistant to corrosion, thereby preventing damage to the conduits and extending the life of the plasma reactor.
  • the refrigerant can be injected to cool the conduit to prevent damage to the conduit due to overheating. Therefore, it is possible to have an effect of extending the life of the plasma reactor including the conduit.
  • the insulating portion surrounding the first electrode portion is provided, it is possible to cool the conduit using the cooling water.
  • the insulating part can also protect the temperature sensor, thereby preventing malfunction or damage of the temperature sensor by the coolant.
  • various types of refrigerant can be used without limiting the refrigerant to gas.
  • FIG. 1 illustrates a connection relationship between a process chamber, a vacuum pump, a scrubber, and a plasma reactor.
  • FIG. 2 is a cross-sectional view showing a plasma reactor according to an embodiment of the present invention.
  • FIG 3 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • FIG. 4 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • FIG. 5 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • FIG. 6 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • FIG. 7 is a sectional view showing a plasma reactor according to another embodiment of the present invention.
  • FIG. 8 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • FIG. 9 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • FIG. 10 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • FIG. 11 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • FIG. 12 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • FIG. 13 is a block diagram illustrating a configuration of cooling means included in the plasma reactor according to FIGS. 7 to 12.
  • FIG. 14 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • 15 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • 16 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • 17 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • FIG. 18 is a cross-sectional view showing a plasma reactor according to another embodiment of the present invention.
  • 19 is a sectional view showing a plasma reactor according to another embodiment of the present invention.
  • the plasma reactor 100 is a by-product of the metal precursor, the non-metal precursor and the process gas, cleaning gas discharged from the process chamber 10 It is disposed between the process chamber 10 and the vacuum pump 30 to decompose the exhaust gas including the.
  • the plasma reactor 100 does not necessarily have to be disposed between the process chamber 10 and the vacuum pump 30.
  • the vacuum pump 30 and the scrubber 50 may be disposed.
  • a plurality of plasma reactors 100 may be installed to repeat the decomposition and purification of the exhaust gas several times.
  • the process chamber 10, the plasma reactor 100, the vacuum pump 30 and the scrubber 50 are connected to each other by an exhaust line.
  • the process chamber 10 is formed in a vacuum environment to perform processes such as ashing, deposition, etching, photography, cleaning, and nitriding. In this embodiment, a thin film formation or dry etching is performed in the process chamber 10 as an example.
  • an inner surface of the vacuum pump 30 or an inner surface of the scrubber 50 is formed. Accumulate and cause many problems.
  • the reactive gas causes the unreacted metallic precursor molecules or the unreacted nonmetallic precursor molecules to decompose, thereby forming metal oxides or nonmetal oxides of the microparticles without forming metallic byproducts or nonmetallic byproducts.
  • the plasma reactor 100 includes a conduit 110, a first electrode part 120, second electrode parts 130, and a housing 140.
  • the conduit 110 of the plasma reactor 100 is a flow path through which the exhaust gas flows.
  • the conduit 110 is formed in a cylindrical shape penetrating through the longitudinal direction.
  • the conduit 110 is formed of a dielectric including a high dielectric material such as alumina, zirconia (ZrO 2 ), yttria (Y 2 O 3 ), sapphire, quartz tube, glass tube, and the like.
  • the first electrode part 120 is extrapolated to the outer circumferential surface of the conduit 110 to surround the outer circumferential surface of the conduit 110, and is spaced apart from the second electrode part 130 so as to be spaced apart from the second electrode part. Plasma discharge is generated between them.
  • the first electrode portion 120 is formed in a tube shape so as to surround the outer circumferential surface of the conduit 110.
  • the first electrode part 120 functions as a driving electrode so that plasma discharge can occur between the second electrode parts 130. Therefore, an AC voltage is applied to the first electrode part 120.
  • the first electrode part 120 is formed to have a long length in the longitudinal direction of the conduit 110, but is not limited thereto. Between the conduit 110 and the first electrode portion 120 may be inserted into a buffer portion (not shown) of the tube structure, the buffer portion (not shown) is formed of a material or dielectric having electrical conductivity, The conduit 110 and the first electrode 120 has an elasticity to be in close contact.
  • the second electrode portions 130 are connected to one or both ends of the conduit 110 in communication with the conduit 110. Since the first electrode part 120 functions as a driving electrode to which an AC voltage is applied, the second electrode parts 130 are grounded to cause plasma discharge with the first electrode part 120. It functions as an electrode. Therefore, the second electrode parts 130 are formed of a metal body.
  • the cross section of the second electrode unit 130 is shown to be progressively smaller along the longitudinal direction.
  • the cross section of the second electrode unit 130 is not limited thereto, and the cross section of the second electrode unit 130 may be uniformly formed along the length direction. have.
  • the second electrode unit 130 serves as an exhaust gas inlet 131 and the exhaust gas outlet 132 according to a position connected to the conduit 110.
  • the exhaust gas flows into the conduit 110 through the exhaust gas inlet 131, and the exhaust gas having a predetermined pressure is present in the conduit 110.
  • the first electrode 120 as a driving electrode
  • electrons start to move between the second electrode 130 as a ground electrode and plasma discharge is generated to decompose exhaust gas. do.
  • the housing 140 is provided to surround the conduit 110 to protect the outer circumferential surface of the conduit 110 and the first electrode 120 extrapolated to the outer circumferential surface of the conduit 110.
  • the housing 140 forms a space between the outer circumference of the conduit 110.
  • the conduit 110 has a problem that can be damaged by the plasma discharge occurring between the first electrode portion 120 and the second electrode portion 130. In particular, a lot of damage occurs in the portion corresponding to the region A where the plasma discharge is concentrated. Therefore, in the present invention, the thickness of the conduit 110 is formed so that the thickness of the region A where the plasma discharge is concentrated is thicker than the thickness of the peripheral portion. This is a structure to prevent the charged particles generated by the plasma discharge ion bombarded to the conduit 110 by the electric field to damage the conduit 110.
  • the region A where the plasma discharge is concentrated is between the first electrode 120 and the second electrode 130.
  • both end sides of the conduit 110 are yarns of the first electrode part 120 and the second electrode part 130, an area A in which plasma discharge is concentrated is obtained. This damage occurs.
  • the conduit 110 when the first electrode portion 120 is installed in the longitudinal center of the conduit 110, the conduit 110 is formed from the longitudinal center of the conduit 110.
  • the thickness is gradually thickened toward both ends of the conduit 110 along the longitudinal direction of ie, formed to have an increase rate of zero or more.
  • the thickness t1 corresponding to the longitudinal center of the conduit 110 is gradually thickened until the thickness t2 corresponding to both ends of the conduit 110 becomes.
  • the conduit 110 includes a first layer 111 having the same thickness in the longitudinal direction, and a second layer 112 having a thicker area A where the plasma discharge is concentrated than the peripheral portion. do.
  • the first layer 111 and the second layer 112 are manufactured separately so that the second layer 112 is interpolated in the first layer 111, and the first layer ( 111 and the second layer 112 are integrally formed.
  • the present invention is not limited thereto, and the second layer 112 is formed by lamination, spray spray coating, or dipping inside the first layer 111, and the first layer 111 and the second layer are formed. 112 may be integrally formed. As shown in FIG.
  • an electrically conductive material or dielectric sprayed onto the first layer 111 is finely stacked on the center portion of the first layer 111, and thus, a portion of the center portion of the first layer 111 is formed.
  • the thickness is formed thicker than the initial.
  • the present invention is not limited thereto, and the second layer 112 may be formed so that the thickness of the first layer 111 is not increased. In this case, the first layer 111 and the second layer 112 may be manufactured separately, and then the second layer 112 may be inserted into the first layer 111.
  • the conduit 110 is formed of a dielectric
  • the dielectric forming the second layer 112 includes a high dielectric material having a higher corrosion resistance than the dielectric forming the first layer 111.
  • the second layer may be formed by sintering alumina and yttria mixed powder as a material, or including yttria having excellent sputtering resistance in the alumina material. have.
  • silicon nitride (Si 3 N 4 ) Or yttrium (Y 2 O 3 ) may be used. This is because the second layer 112 is directly affected by the plasma discharge generated between the first electrode 120 and the second electrode 130. Therefore, in order to minimize etching to the plasma discharge, the second layer is formed to include a material having high corrosion resistance.
  • first layer 111 and the second layer 112 are manufactured separately, so that the first layer (1) may be integrally formed by interpolating the second layer 112 to the first layer 111.
  • 111 and the second layer 112 may be formed including an elastic material. If the first layer 111 and the second layer 112 are made of only a dielectric, problems may occur in that the fixing of the first layer 111 and the second layer 112 is difficult even if the second layer 112 is interpolated into the first layer 111. Accordingly, when the first layer 111 and the second layer 112 are manufactured by including a material having elasticity, the first layer 111 and the second layer 112 may each have elasticity.
  • the second layer 112 When the second layer 112 is interpolated into the first layer 111, the second layer 112 is fixed to the first layer 111. Accordingly, the first layer 111 and the second layer 112 may be integrally formed, and the second layer 112 may be prevented from being separated from or separated from the first layer 111.
  • the present invention is not limited thereto, and the first layer 111 and the second layer 112 are each formed only of a dielectric material, and when the second layer 112 is interpolated into the first layer 111, A buffer layer (not shown) may be further included between the first layer 111 and the second layer 112.
  • a portion corresponding to the peripheral region of the region A where the plasma discharge is concentrated may be further formed by a predetermined thickness. Since the peripheral area of the region A where the plasma discharge is concentrated is not influenced by the plasma discharge at all, the peripheral region A may have a predetermined thickness even if it is not formed as thick as the thickness corresponding to the region A where the plasma discharge is concentrated. It may be formed to protect the first layer 111.
  • FIG. 3 shows a plasma reactor 100a in accordance with another embodiment of the present invention.
  • the plasma reactor 100a illustrated in FIG. 3 uses the same reference numerals for the same configuration as the plasma reactor 100 according to the above-described embodiment, and a detailed description thereof will be omitted. I will explain only.
  • the shape of the conduit 110 ⁇ is different.
  • the conduit 110 ′ is uniformly formed from the center in the longitudinal direction to the respective set positions toward both ends in the longitudinal direction of the conduit 110 ′, and then from the set position to the conduit 110.
  • Both ends of ⁇ ) are formed thick with uniform thickness. That is, the thickness is uniform by t1 ⁇ from the longitudinal center of the conduit 110 ⁇ to the position set toward both ends in the longitudinal direction of the conduit 110 ⁇ , and from the set position to the position of the conduit 110 ⁇ .
  • Both ends are uniformly formed to a thickness t2 ⁇ which is thicker than the thickness t1 ⁇ .
  • the thickness t1 ⁇ is formed to be 6 mm to 10 mm thick
  • the thickness t2 ⁇ is formed to be 1 mm to 2 mm thicker than the thickness t1 ⁇ .
  • the plasma reactor 100b shown in FIG. 4 is a modified form in the embodiment shown in FIG.
  • the thickness of the conduit 110 according to the present embodiment may be greater than that of the portion covering the first electrode portion 120 with the second layer 112 being thicker.
  • the thickness of the portion (b) adjacent to the electrode portion 130 is formed as thin as the thickness (t1 ⁇ ) from the center in the longitudinal direction of the conduit 110 to the set position.
  • the plasma discharge is concentrated in the portion A adjacent to the first electrode portion 120 and the second electrode portion 130, but relatively with the first electrode portion 120.
  • the concentration of plasma discharge becomes low between the second electrode portions 130. Therefore, the thickness of the conduit 110 corresponding to this portion (b) is formed as thin as the thickness (t1 ⁇ ) from the longitudinal center of the conduit 110 to the set position.
  • the second electrode part 130a is different from the embodiment described above with reference to FIGS. 2 to 4.
  • the second electrode portion 130a is formed in a tube shape similarly to the first electrode portion 120 and is extrapolated to the outer circumferential surface of the conduit 110a.
  • the second electrode 130a is spaced apart from each other by a predetermined interval with the first electrode 120. That is, the first electrode portion 120 and the second electrode portion 130a are spaced apart from each other by a predetermined distance with respect to the longitudinal center of the conduit 110a.
  • the first electrode part is a driving electrode to which an AC voltage is applied
  • the second electrode part is formed of a ground electrode to cause plasma discharge between the first electrode part and the first electrode part. It is not limited to this.
  • an AC voltage is applied to both of the first electrode part 120 and the second electrode part 130a, but to any one of the first electrode part 120 and the second electrode part 130a.
  • a relatively positive voltage is applied, and a relatively negative voltage is applied to the other to give a voltage difference between the two electrode portions to cause plasma discharge.
  • the conduit (110a) in the present embodiment is formed in a form that is gradually thinner toward both ends of the conduit (110a) relative to the center of the longitudinal direction of the conduit (110a).
  • the first electrode part 120 and the second electrode part 130a are spaced apart from each other with respect to the longitudinal direction of the conduit 110a, the first electrode part 120 and the second electrode. Between the portions 130a is an area A where plasma discharge is concentrated. Therefore, by forming the thickest position corresponding to the longitudinal center of the conduit 110a, damage of the conduit 110a can be minimized even when plasma discharge is concentrated.
  • the plasma reactor 100d shown in FIG. 6 is modified in the embodiment shown in FIG. 5.
  • the thickness of the longitudinal center of the conduit 110b in the conduit 110b is thicker than that of the conduit 110a shown in FIG. 5, but in this embodiment, the length of the conduit 110b is increased. It is formed with a thick thickness (t4 ⁇ ) from the reference center to a predetermined position toward both ends of the conduit (110b) from the reference, and is formed with a thin thickness (t3 ⁇ ) from the set position to both ends of the conduit (110b). .
  • FIG. 7 shows a plasma reactor 200 according to another embodiment of the present invention.
  • FIG. 7 further includes a temperature sensor 157 and cooling means in the plasma reactor 100 shown in FIG. 1.
  • the temperature sensor 157 is installed inside the housing 140.
  • the temperature sensor 157 detects the surface temperature of the conduit 110 or the housing 140 or the temperature of the separation space and transmits temperature information to the cooling means described later.
  • it is more efficient to sense the surface temperature of the conduit 110 than to detect the surface temperature of the housing 140.
  • the conduit 110 An example of sensing the surface temperature will be described.
  • the cooling means is provided in the conduit 110 to prevent the exhaust gas from being overheated by the heat generated as it is decomposed by the plasma discharge. This is because the conduit 110 directly receives heat generated when the exhaust gas is decomposed. Since the housing 140 transfers heat from the conduit 110, it may be difficult to accurately determine whether the conduit 110 is overheated. Therefore, the temperature sensor 157 is more efficient to install on the surface of the conduit 110 than the surface of the housing 140, and when overheating when sensing the temperature information of the surface temperature or the space of the housing 140 It is preferable to set the set temperature which is a reference for determining the lower than when detecting the surface temperature information of the conduit 110.
  • the cooling means serves to cool the conduit 110 by injecting a refrigerant when the surface temperature of the conduit 110 is higher than or equal to a predetermined temperature.
  • the cooling means includes a controller (not shown), a refrigerant injection valve 151, and a refrigerant recovery unit 153.
  • the controller determines whether the conduit 110 is overheated and cools the conduit 110 through a coolant, but is not limited thereto. An alarm may be generated or a lock may be stopped to stop the plasma discharge. You may.
  • the controller receives surface temperature information of the conduit 110 from the temperature sensor 157.
  • the temperature sensor 157 is installed on the outer circumferential surface of the conduit 110 to detect surface temperature information of the conduit 110, and the detected surface temperature information of the conduit 110 is detected by the controller ( (Not shown).
  • the controller (not shown) stores a preset temperature, and determines that the conduit 110 is overheated if the surface temperature of the conduit 110 transmitted from the temperature sensor 157 is higher than or equal to a preset temperature. .
  • the control unit stores a first set temperature and a second set temperature.
  • the first set temperature is a temperature that is a reference for determining overheating of the conduit 110 and is a maximum temperature for preventing breakage of the conduit 110.
  • the controller determines that the conduit 110 is overheated and cools when the surface temperature information of the conduit 110 is greater than or equal to the first set temperature.
  • the second set temperature is a temperature used as a reference for determining whether the conduit 110 is cooled.
  • the second set temperature may be the same temperature value as the first set temperature, or may be a temperature value lower than the first set temperature. If the second set temperature and the first set temperature is the same set value can have the effect of shortening the time to cool the conduit 110, if the second set temperature is lower than the first set temperature set value The time for which the cooling means is operated becomes long.
  • the control unit injects the refrigerant into the spaced space of the housing 140 through the refrigerant injection valve 151.
  • the refrigerant includes a refrigerant gas or cooling water.
  • the refrigerant injection valve 151 is connected to the storage container (not shown). The refrigerant is injected into the spaced space of the housing 140. Meanwhile, a coolant injection hole 133 is formed in the housing 140 so that the coolant injection valve 151 may be connected to each other. In general, the housing 140 and the refrigerant injection valve 151 are connected to each other through the refrigerant injection hole 133.
  • a coolant discharge hole 134 is further formed at a position facing the coolant injection hole 133 in the housing 140, and the coolant recovery unit 153 is connected to the coolant discharge hole 134. .
  • the refrigerant injected into the spaced space of the housing 140 through the coolant injection hole 133 cools the conduit 110 while flowing through the spaced space of the housing 140, and then the coolant discharge hole 134. It is discharged to the refrigerant recovery unit 153 through.
  • the coolant recovery unit 153 includes, for example, a tank 153a and a heat exchanger 153b.
  • the refrigerant discharged to the refrigerant recoverer 153 is stored in the tank 153a and cooled by the heat exchanger 153b.
  • the coolant recovery unit 153 includes the tank 153a and the heat exchanger 153b, but the present invention is not limited thereto.
  • the refrigerant is recovered and recycled, but the refrigerant may be discharged from the tank without being recycled. In this case, the refrigerant is used when air is used, and when the refrigerant is discharged, the refrigerant may be discharged to the outside by using a fan.
  • the plasma reactor 200 may be damaged by the high temperature heat generated while decomposing the exhaust gas because the plasma reactor 200 is operated continuously without stopping once operating.
  • the cooling means when the surface temperature of the conduit 110 reaches a predetermined temperature or more, refrigerant gas is injected to cool the conduit 110 that is overheated. The effect of preventing damage to the conduit 110 and extending its life can be obtained.
  • the refrigerant is the cooling water further includes the insulating portion 125. Since the first electrode part 120 serving as a driving electrode is extrapolated to the outer circumferential surface of the conduit 110, the coolant is contacted with the coolant when the coolant is injected into the separation space. The first electrode unit 120 may be damaged and a short problem may occur. That is, the insulating part 125 protects the first electrode part 120.
  • the insulating part 125 is formed of a non-conductor or a dielectric, and is formed in a tube shape so as to be extrapolated and installed on an outer circumferential surface of the conduit 110. In addition, the insulation part 125 also surrounds the temperature sensor 157 to protect the first electrode part 120 and the temperature sensor 157 from the cooling water.
  • the plasma reactor 200a illustrated in FIG. 8 is an embodiment in which the temperature sensor 157 and the cooling means are further included as described above in the plasma reactor 100a illustrated in FIG. 3.
  • the plasma reactor 200b illustrated in FIG. 9 is an embodiment in which the temperature sensor 157 and the cooling means are further included as described above in the plasma reactor 100b illustrated in FIG. 4.
  • the plasma reactor 300 illustrated in FIG. 10 is an embodiment in which the temperature sensor 157 and the cooling means are further included in the plasma reactor 100c illustrated in FIG. 5. In the plasma reactor 300a of FIG. 11, the temperature sensor 157 and the cooling means are further included in the plasma reactor 100d of FIG. 6.
  • the conduit 210 of the plasma reactor 200 is a flow path through which the exhaust gas flows, and the inside of the conduit 210 is formed in a cylindrical shape penetrating along the length direction.
  • the conduit 210 is formed of a high dielectric material such as alumina, zirconia (ZrO 2 ), yttria (Y 2 O 3 ), sapphire, quartz tube, glass tube, and the like.
  • ZrO 2 zirconia
  • Y 2 O 3 yttria
  • sapphire quartz tube, glass tube, and the like.
  • the first electrode portion 220 is extrapolated to surround the outer circumferential surface of the conduit 210 and is spaced apart from the second electrode portions 230 to be described later, so that the first electrode portion 220 is separated from the second electrode portions 230. Plasma discharge occurs in between.
  • the first electrode 220 is formed in a tube shape so as to surround the outer circumferential surface of the conduit 210. Since the first electrode part 220 functions as a driving electrode, an AC voltage is applied. Referring to FIG. 12, the first electrode part 220 is formed to have a long length in the longitudinal direction of the conduit 210, but is not limited thereto.
  • the first electrode unit 220 may be provided in a plurality of forms so that voltage is applied at different periods.
  • the buffer part is formed of a material having electrical conductivity, and has elasticity such that the conduit 210 and the first electrode part 220 can be in close contact with each other.
  • the second electrode portions 230 are connected to one or both ends of the conduit 210 in communication with the conduit 210.
  • the second electrode parts 230 function as a ground electrode that causes plasma discharge with the first electrode part 220. Therefore, the second electrode portions 230 are formed of a metal body.
  • the exhaust gas discharged from the process chamber 10 flows through the second electrode portion 230 of any one of the second electrode portions 230 and flows through the conduit 210, and then the other. Is discharged through the second electrode portion 230. Accordingly, as shown in FIG. 12, an exhaust gas inlet 201 is formed in one of the second electrode parts 230, and the other second electrode part ( An exhaust gas outlet 203 is formed at 230.
  • the cross section of the second electrode portion 230 is formed to gradually become smaller along the longitudinal direction, but the present invention is not limited thereto and the cross section of the second electrode portion 230 may be uniformly formed along the length direction.
  • the exhaust gas is introduced through the exhaust gas inlet 201 and flows into the conduit 210, and the exhaust gas of a predetermined pressure is present in the conduit 210.
  • an AC voltage is applied to the first electrode portion 220 which is a driving electrode
  • movement of electrons is started between the second electrode portions 230 which are ground electrodes, and plasma discharge is performed to decompose exhaust gas. Is generated.
  • the housing 240 surrounds the conduit 210 to protect the outer circumferential surface of the conduit 210 and the first electrode portion 220 formed on the outer circumferential surface of the conduit 210.
  • the housing 240 forms a space between the outer circumferential surface of the conduit 210.
  • the housing is generally made of metal.
  • the temperature sensor 250 is installed inside the housing 240. More specifically, attached to the outer circumferential surface of the conduit 210, or attached to the inner circumferential surface of the housing 240, the surface temperature of the conduit 210, the surface temperature of the housing 240 or the conduit 210 And sense a temperature of the space between the housing 240. As described above, the temperature sensor 250 detects the surface temperature of the conduit 210 or the housing 240 and the temperature of the separation space to transmit temperature information to the cooling means 260 which will be described later. In order to use the plasma reactor 400 more safely, it is preferable to sense the surface temperature of the conduit 210 rather than the surface temperature of the housing 240. In this embodiment, the surface of the conduit 210 is sensed. The sensing of temperature will be described as an example.
  • the cooling means 260 is provided in the conduit 210 to prevent the exhaust gas from being overheated by the heat generated by the decomposition of the plasma discharge. This is because the conduit 210 receives heat directly generated when the exhaust gas is decomposed. Since the housing 240 transfers heat from the conduit 210, it may be difficult to accurately determine whether the conduit 210 is overheated. Therefore, it is more efficient to install the temperature sensor 250 on the surface of the conduit 210 than on the surface of the housing 240, and when the temperature information of the surface temperature of the housing 240 or the space information of the space is sensed is overheated. It is preferable to set the set temperature which is a reference for determining the lower than when detecting the surface temperature information of the conduit 210.
  • the cooling means 260 serves to cool the conduit 210 by injecting a refrigerant when the surface temperature of the conduit 210 is equal to or higher than a set temperature.
  • the cooling means 260 includes a control unit 261, a refrigerant injection valve 263, and a refrigerant recovery unit 264.
  • the control unit 261 determines whether the conduit 210 is overheated and cools the conduit 110 through a coolant.
  • the control unit 261 is not limited thereto and may lock an alarm or stop the plasma discharge. It may be.
  • the controller 261 receives surface temperature information of the conduit 210 from the temperature sensor 250.
  • the temperature sensor 250 is installed on the outer circumferential surface of the conduit 210 to detect the surface temperature information of the conduit 210, and the detected surface temperature information of the conduit 210 to the control unit ( 261).
  • the controller 261 stores a preset temperature, and determines that the conduit 210 is overheated when the surface temperature of the conduit 210 transmitted from the temperature sensor 250 is equal to or greater than a preset temperature.
  • the controller 261 stores a first set temperature and a second set temperature.
  • the first set temperature is a reference temperature for determining overheating of the conduit 210 and is a maximum temperature for preventing breakage of the conduit 210.
  • the controller 261 determines that the conduit 210 is overheated and cools when the surface temperature information of the conduit 210 is greater than or equal to the first set temperature.
  • the second set temperature is a temperature used as a reference for determining whether the conduit 210 has cooled down.
  • the second set temperature may be the same temperature value as the first set temperature, or may be a temperature value lower than the first set temperature. If the second set temperature and the first set temperature is the same set value may have the effect of shortening the time to cool the conduit 210, if the second set temperature is lower than the first set temperature set value The time for which the cooling means 260 is operated becomes long.
  • the controller 261 injects the refrigerant into the spaced space of the housing 240 through the refrigerant injection valve 263.
  • the refrigerant includes a refrigerant gas or cooling water.
  • the storage container (not shown) in which the refrigerant is stored is connected to the refrigerant injection valve 263, and when the control unit 261 determines that the conduit 210 is overheated, the refrigerant injection valve 263 is used.
  • the refrigerant is injected into the spaced space of the housing 240.
  • the housing 240 has a refrigerant injection hole 241 is formed so that the refrigerant injection valve 263 is connected in communication. In general, the housing 240 and the refrigerant injection valve 263 are connected to each other through the refrigerant injection hole 241.
  • a coolant discharge hole 245 is further formed in the housing 240 at a position opposite to the coolant injection hole 241, and the coolant recovery unit 264 is connected to the coolant discharge hole 245. .
  • the refrigerant injected into the spaced space of the housing 240 through the coolant injection hole 241 cools the conduit 210 while flowing through the spaced space of the housing 240, and then the coolant discharge hole 245. Through the refrigerant recovery 264 is discharged through.
  • the coolant recovery unit 264 includes, for example, a tank 264a and a heat exchanger 264b.
  • the refrigerant discharged to the refrigerant recoverer 264 is stored in the tank 264a and cooled by the heat exchanger 264b.
  • the coolant recovery unit 264 includes the tank 264a and the heat exchanger 264b, but the present invention is not limited thereto.
  • the refrigerant is recovered and recycled, but the refrigerant may be discharged from the tank without being recycled. In this case, the refrigerant is used when air is used, and when the refrigerant is discharged, the refrigerant may be discharged to the outside by using a fan.
  • the plasma reactor 400 may be damaged by high temperature heat generated while decomposing the exhaust gas because the plasma reactor 400 operates continuously without stopping once operating.
  • the cooling means 260 is provided as in an embodiment of the present invention, when the surface temperature of the conduit 210 reaches a predetermined temperature or more, refrigerant gas is injected to cool the conduit 210 that is overheated. Therefore, it is possible to obtain an effect of preventing damage to the conduit 210 and extending its life.
  • the coolant further includes the insulating part 225. Since the first electrode part 220 serving as a driving electrode is extrapolated to the outer circumferential surface of the conduit 210, the coolant is contacted with the coolant when the coolant is injected into the separation space. The first electrode unit 220 may be damaged and a short problem may occur. That is, the insulating part 225 protects the first electrode part 220.
  • the insulating part 225 is formed of a non-conductor or a dielectric, and is formed in a tube shape so as to be extrapolated and installed on the outer circumferential surface of the conduit 210. In addition, the insulating part 225 also surrounds the temperature sensor 250 to protect the first electrode part 220 and the temperature sensor 250 from the cooling water.
  • the second electrode portion 230a is not connected to the conduit 210 and is extrapolated to surround the outer circumferential surface on the conduit 210 similarly to the first electrode portion 220. It may be. In this case, the second electrode portion 230a is also formed in a tube shape. When the second electrode 230a is installed on the conduit 210, the second electrode 230a is spaced apart from the first electrode 220. A relative positive voltage is applied to one of the first electrode part 220 and the second electrode part 230a, and a relative negative voltage is applied to the other.
  • the plasma reactor 400a is disposed at both ends of the conduit 210 in the process chamber 10 or the vacuum pump.
  • a flange (not shown) in which an exhaust gas inlet 201 or an exhaust gas outlet 202 is formed may be coupled to be coupled to an exhaust line connecting the 30.
  • the plasma reactor 400b according to another embodiment of the present invention.
  • the plasma reactor 400b according to another embodiment of the present invention includes a coil part 230 ′ spirally wrapping the outer circumferential surface of the conduit 210.
  • RF plasma discharge may be generated in the coil unit 230 ′ to decompose the exhaust gas flowing into the conduit 210.
  • the plasma reactor 400c has the same configuration as that of the plasma reactor 400 illustrated in FIGS. 12 to 14.
  • the temperature sensor is not included.
  • the refrigerant is frequently injected through the cooling means 260 to provide the conduit ( 210 to prevent overheating. Therefore, in the present embodiment, it is not necessary to determine whether overheating of the surface temperature of the conduit 210, the surface temperature of the housing 240, or the temperature of the separation space, so that the control unit may be omitted from the cooling means 260. It's okay.
  • Injecting the coolant through the cooling means 260 may be performed manually by an operator, and although not shown in the drawing, the cooling means 260 moves to the spaced space at a predetermined time with a timer (not shown). It may be controlled to inject the refrigerant.
  • the plasma reactor 400d illustrated in FIG. 18 is an embodiment in which the temperature sensor is omitted in the configuration of the plasma reactor 400a illustrated in FIG. 15, and the plasma reactor 400e illustrated in FIG. 19 is illustrated in FIG. 16.
  • the temperature sensor is omitted in the configuration of the plasma reactor 400b, similar to the plasma reactor 400c of FIG. 17, the surface temperature of the conduit 210, the surface temperature of the housing 240, or the separation space are shown. Irrespective of whether the temperature of the sensing means to prevent overheating of the conduit 210 from time to time through the cooling means 260.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)

Abstract

La présente invention se rapporte à un réacteur à plasma permettant de traiter un gaz d'échappement produit à partir d'une installation de traitement et, de façon plus précise, à un réacteur à plasma agencé entre une chambre de traitement et une pompe à vide de sorte à dissoudre le gaz d'échappement évacué de la chambre de traitement, ledit réacteur comprenant : un tube composé d'un diélectrique à travers lequel s'écoule le gaz d'échappement ; une première partie d'électrode qui est installée sur le tube et est protégée de l'espace interne du tube ; et une seconde partie d'électrode qui est agencée à distance de la première partie d'électrode, pour dissoudre le gaz d'échappement en provoquant une décharge électrique de plasma, l'épaisseur du tube étant formée de telle sorte qu'une zone où la décharge de plasma est concentrée, soit plus épaisse que l'épaisseur des zones environnantes de sorte à empêcher des dégâts au tube en raison de la décharge électrique de plasma.
PCT/KR2014/010121 2014-04-16 2014-10-27 Réacteur à plasma permettant de traiter un gaz d'échappement produit à partir d'une installation de traitement WO2015160058A1 (fr)

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CN201480077933.9A CN106165062A (zh) 2014-04-16 2014-10-27 处理制程设备发生的废气的等离子体反应器

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KR1020140045421A KR101563193B1 (ko) 2014-04-16 2014-04-16 공정설비에서 발생되는 배기가스 처리 플라즈마 반응기
KR10-2014-0045421 2014-04-16
KR10-2014-0070600 2014-06-11
KR1020140070600A KR101567562B1 (ko) 2014-06-11 2014-06-11 공정설비에서 발생되는 배기가스 처리 플라즈마 반응기

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TWI679376B (zh) * 2017-02-14 2019-12-11 鼎堅綠能科技股份有限公司 熱回收裝置及電漿火炬熱回收設備
KR101959165B1 (ko) * 2018-04-27 2019-03-15 (주)엔노피아 플라즈마 폐가스 처리 장치 및 그를 포함하는 폐가스 처리 시스템
SG11202103964PA (en) * 2018-10-29 2021-05-28 Eq Global Inc Plasma reactor including plural electrode assemblies or into which gas is injected
JP7494059B2 (ja) 2020-08-27 2024-06-03 キオクシア株式会社 排気配管装置

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