WO2015008744A1 - ポリアミドイミド樹脂、硬化性樹脂組成物及びその硬化物 - Google Patents
ポリアミドイミド樹脂、硬化性樹脂組成物及びその硬化物 Download PDFInfo
- Publication number
- WO2015008744A1 WO2015008744A1 PCT/JP2014/068774 JP2014068774W WO2015008744A1 WO 2015008744 A1 WO2015008744 A1 WO 2015008744A1 JP 2014068774 W JP2014068774 W JP 2014068774W WO 2015008744 A1 WO2015008744 A1 WO 2015008744A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- alcohol
- polyamideimide resin
- acid anhydride
- resin
- curable resin
- Prior art date
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- 229920005989 resin Polymers 0.000 title claims abstract description 175
- 239000011347 resin Substances 0.000 title claims abstract description 175
- 239000004962 Polyamide-imide Substances 0.000 title claims abstract description 110
- 229920002312 polyamide-imide Polymers 0.000 title claims abstract description 110
- 239000011342 resin composition Substances 0.000 title claims abstract description 74
- -1 alcohol compound Chemical class 0.000 claims abstract description 73
- 239000012948 isocyanate Substances 0.000 claims abstract description 32
- 239000005056 polyisocyanate Substances 0.000 claims abstract description 32
- 229920001228 polyisocyanate Polymers 0.000 claims abstract description 32
- 125000001931 aliphatic group Chemical group 0.000 claims abstract description 30
- 150000002513 isocyanates Chemical class 0.000 claims abstract description 27
- 238000006243 chemical reaction Methods 0.000 claims description 49
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 claims description 41
- 238000010521 absorption reaction Methods 0.000 claims description 34
- 239000002253 acid Substances 0.000 claims description 22
- 125000004018 acid anhydride group Chemical group 0.000 claims description 22
- 239000000203 mixture Substances 0.000 claims description 19
- 150000001875 compounds Chemical class 0.000 claims description 17
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 claims description 15
- 238000005259 measurement Methods 0.000 claims description 15
- 239000003085 diluting agent Substances 0.000 claims description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 10
- 229910052757 nitrogen Inorganic materials 0.000 claims description 10
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- 125000003700 epoxy group Chemical group 0.000 claims description 9
- NIMLQBUJDJZYEJ-UHFFFAOYSA-N isophorone diisocyanate Chemical compound CC1(C)CC(N=C=O)CC(C)(CN=C=O)C1 NIMLQBUJDJZYEJ-UHFFFAOYSA-N 0.000 claims description 9
- 239000004593 Epoxy Substances 0.000 claims description 8
- 150000008065 acid anhydrides Chemical class 0.000 claims description 7
- FWHUTKPMCKSUCV-UHFFFAOYSA-N 1,3-dioxo-3a,4,5,6,7,7a-hexahydro-2-benzofuran-5-carboxylic acid Chemical group C1C(C(=O)O)CCC2C(=O)OC(=O)C12 FWHUTKPMCKSUCV-UHFFFAOYSA-N 0.000 claims description 6
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 6
- 239000002798 polar solvent Substances 0.000 claims description 5
- 125000004434 sulfur atom Chemical group 0.000 claims description 5
- 125000004433 nitrogen atom Chemical group N* 0.000 claims description 3
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- 238000000862 absorption spectrum Methods 0.000 claims 1
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- 238000000576 coating method Methods 0.000 abstract description 26
- 239000011248 coating agent Substances 0.000 abstract description 24
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- 150000008064 anhydrides Chemical class 0.000 abstract description 4
- 238000001723 curing Methods 0.000 description 41
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- 239000003822 epoxy resin Substances 0.000 description 24
- 229920000647 polyepoxide Polymers 0.000 description 24
- 235000019441 ethanol Nutrition 0.000 description 23
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- 238000000034 method Methods 0.000 description 23
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- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 17
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- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 14
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- 238000002329 infrared spectrum Methods 0.000 description 13
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- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 9
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 9
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- 239000012463 white pigment Substances 0.000 description 9
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 8
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 8
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- 230000000704 physical effect Effects 0.000 description 8
- 230000015572 biosynthetic process Effects 0.000 description 7
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 7
- 125000004432 carbon atom Chemical group C* 0.000 description 7
- 238000000354 decomposition reaction Methods 0.000 description 7
- 125000005462 imide group Chemical group 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 7
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 7
- 150000003839 salts Chemical class 0.000 description 7
- 229910000679 solder Inorganic materials 0.000 description 7
- 238000003786 synthesis reaction Methods 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 6
- 229920000877 Melamine resin Polymers 0.000 description 6
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
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- 230000000694 effects Effects 0.000 description 6
- 239000004744 fabric Substances 0.000 description 6
- 239000000945 filler Substances 0.000 description 6
- VTHJTEIRLNZDEV-UHFFFAOYSA-L magnesium dihydroxide Chemical compound [OH-].[OH-].[Mg+2] VTHJTEIRLNZDEV-UHFFFAOYSA-L 0.000 description 6
- 239000000347 magnesium hydroxide Substances 0.000 description 6
- 229910001862 magnesium hydroxide Inorganic materials 0.000 description 6
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 6
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- 239000005011 phenolic resin Substances 0.000 description 6
- 239000000843 powder Substances 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 5
- FPZWZCWUIYYYBU-UHFFFAOYSA-N 2-(2-ethoxyethoxy)ethyl acetate Chemical compound CCOCCOCCOC(C)=O FPZWZCWUIYYYBU-UHFFFAOYSA-N 0.000 description 5
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 5
- WNROFYMDJYEPJX-UHFFFAOYSA-K aluminium hydroxide Chemical compound [OH-].[OH-].[OH-].[Al+3] WNROFYMDJYEPJX-UHFFFAOYSA-K 0.000 description 5
- 125000003118 aryl group Chemical group 0.000 description 5
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- MNUSMUGFHGAOIW-UHFFFAOYSA-N cyclohexane-1,1,2-tricarboxylic acid Chemical compound OC(=O)C1CCCCC1(C(O)=O)C(O)=O MNUSMUGFHGAOIW-UHFFFAOYSA-N 0.000 description 4
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- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
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- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 1
- 239000011976 maleic acid Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 150000007974 melamines Chemical class 0.000 description 1
- YSRVJVDFHZYRPA-UHFFFAOYSA-N melem Chemical compound NC1=NC(N23)=NC(N)=NC2=NC(N)=NC3=N1 YSRVJVDFHZYRPA-UHFFFAOYSA-N 0.000 description 1
- 150000002734 metacrylic acid derivatives Chemical class 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910000476 molybdenum oxide Inorganic materials 0.000 description 1
- 235000019837 monoammonium phosphate Nutrition 0.000 description 1
- 239000006012 monoammonium phosphate Substances 0.000 description 1
- YKYONYBAUNKHLG-UHFFFAOYSA-N n-Propyl acetate Natural products CCCOC(C)=O YKYONYBAUNKHLG-UHFFFAOYSA-N 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- WRYWBRATLBWSSG-UHFFFAOYSA-N naphthalene-1,2,4-tricarboxylic acid Chemical compound C1=CC=CC2=C(C(O)=O)C(C(=O)O)=CC(C(O)=O)=C21 WRYWBRATLBWSSG-UHFFFAOYSA-N 0.000 description 1
- 125000001624 naphthyl group Chemical group 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910000480 nickel oxide Inorganic materials 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 239000011255 nonaqueous electrolyte Substances 0.000 description 1
- SNQQPOLDUKLAAF-UHFFFAOYSA-N nonylphenol Chemical compound CCCCCCCCCC1=CC=CC=C1O SNQQPOLDUKLAAF-UHFFFAOYSA-N 0.000 description 1
- 239000003921 oil Substances 0.000 description 1
- 235000019198 oils Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical group 0.000 description 1
- 125000001477 organic nitrogen group Chemical group 0.000 description 1
- MPQXHAGKBWFSNV-UHFFFAOYSA-N oxidophosphanium Chemical class [PH3]=O MPQXHAGKBWFSNV-UHFFFAOYSA-N 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- PQQKPALAQIIWST-UHFFFAOYSA-N oxomolybdenum Chemical compound [Mo]=O PQQKPALAQIIWST-UHFFFAOYSA-N 0.000 description 1
- GNRSAWUEBMWBQH-UHFFFAOYSA-N oxonickel Chemical compound [Ni]=O GNRSAWUEBMWBQH-UHFFFAOYSA-N 0.000 description 1
- 238000002161 passivation Methods 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 125000001484 phenothiazinyl group Chemical class C1(=CC=CC=2SC3=CC=CC=C3NC12)* 0.000 description 1
- 150000003003 phosphines Chemical class 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical class O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 description 1
- 150000004850 phospholanes Chemical class 0.000 description 1
- 150000003009 phosphonic acids Chemical class 0.000 description 1
- 150000003018 phosphorus compounds Chemical class 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- FSDNTQSJGHSJBG-UHFFFAOYSA-N piperidine-4-carbonitrile Chemical compound N#CC1CCNCC1 FSDNTQSJGHSJBG-UHFFFAOYSA-N 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 229920001515 polyalkylene glycol Polymers 0.000 description 1
- 229920006393 polyether sulfone Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 239000001205 polyphosphate Substances 0.000 description 1
- 235000011176 polyphosphates Nutrition 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920005650 polypropylene glycol diacrylate Polymers 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 229940090181 propyl acetate Drugs 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 238000001953 recrystallisation Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 239000012783 reinforcing fiber Substances 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 238000007790 scraping Methods 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000003566 sealing material Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 150000004760 silicates Chemical class 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 229910021647 smectite Inorganic materials 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 229960004025 sodium salicylate Drugs 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052714 tellurium Inorganic materials 0.000 description 1
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 1
- 150000003512 tertiary amines Chemical class 0.000 description 1
- 238000012719 thermal polymerization Methods 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 239000013008 thixotropic agent Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- 229940098465 tincture Drugs 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- FOZHTJJTSSSURD-UHFFFAOYSA-J titanium(4+);dicarbonate Chemical compound [Ti+4].[O-]C([O-])=O.[O-]C([O-])=O FOZHTJJTSSSURD-UHFFFAOYSA-J 0.000 description 1
- DVKJHBMWWAPEIU-UHFFFAOYSA-N toluene 2,4-diisocyanate Chemical class CC1=CC=C(N=C=O)C=C1N=C=O DVKJHBMWWAPEIU-UHFFFAOYSA-N 0.000 description 1
- YFNKIDBQEZZDLK-UHFFFAOYSA-N triglyme Chemical compound COCCOCCOCCOC YFNKIDBQEZZDLK-UHFFFAOYSA-N 0.000 description 1
- BIKXLKXABVUSMH-UHFFFAOYSA-N trizinc;diborate Chemical compound [Zn+2].[Zn+2].[Zn+2].[O-]B([O-])[O-].[O-]B([O-])[O-] BIKXLKXABVUSMH-UHFFFAOYSA-N 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- NQPDZGIKBAWPEJ-UHFFFAOYSA-N valeric acid Chemical compound CCCCC(O)=O NQPDZGIKBAWPEJ-UHFFFAOYSA-N 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
- 150000007964 xanthones Chemical class 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 150000003739 xylenols Chemical class 0.000 description 1
- 239000010457 zeolite Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 239000011667 zinc carbonate Substances 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 235000004416 zinc carbonate Nutrition 0.000 description 1
- BNEMLSQAJOPTGK-UHFFFAOYSA-N zinc;dioxido(oxo)tin Chemical compound [Zn+2].[O-][Sn]([O-])=O BNEMLSQAJOPTGK-UHFFFAOYSA-N 0.000 description 1
- PZRXQXJGIQEYOG-UHFFFAOYSA-N zinc;oxido(oxo)borane Chemical compound [Zn+2].[O-]B=O.[O-]B=O PZRXQXJGIQEYOG-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/14—Polyamide-imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G73/00—Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
- C08G73/06—Polycondensates having nitrogen-containing heterocyclic rings in the main chain of the macromolecule
- C08G73/10—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
- C08G73/1003—Preparatory processes
- C08G73/1035—Preparatory processes from tetracarboxylic acids or derivatives and diisocyanates
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L63/00—Compositions of epoxy resins; Compositions of derivatives of epoxy resins
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L79/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
- C08L79/04—Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
- C08L79/08—Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
Definitions
- the present invention relates to a polyamideimide resin, a curable resin composition containing the polyamideimide resin, and a cured product thereof.
- the present invention is a field that requires transparency in addition to heat resistance, for example, a field for optical materials, a solder resist material for printed wiring boards, a protective material and insulation for household appliances such as refrigerators and rice cookers.
- liquid crystal displays and liquid crystal display elements organic and inorganic electroluminescence displays, organic and inorganic electroluminescence elements, LED displays, light emitting diodes, electronic paper, solar cells, TSVs, protective materials used for optical fibers and optical waveguides, insulating materials, Polyamideimide resin that can be suitably used in fields such as adhesives, reflective materials, and display device fields such as liquid crystal alignment films and protective films for color filters, and curable resin compositions containing the polyamideimide resin and It relates to the cured product.
- Polyamideimide resin is excellent in heat resistance and mechanical properties, and has been used in various fields mainly in the electrical and electronic industries.
- general-purpose solvents such as EDGA (diethylene glycol monoethyl ether acetate) have been used to reduce the burden on the environment.
- EDGA diethylene glycol monoethyl ether acetate
- the polyamide-imide resin is expected to be used in fields where transparency of cured products such as the above-mentioned liquid crystal display and LED display is required in view of heat resistance and mechanical properties. In these fields, for example, light transmittance from the visible to the ultraviolet region (around 300 nm) is required.
- a polyamideimide resin that is soluble in a general-purpose solvent for example, a polyamideimide resin obtained by reacting an isocyanurate type polyisocyanate (a1) of an isocyanate having an aliphatic structure with trimellitic anhydride is disclosed (for example, (See Patent Document 1).
- the cured product obtained by using the polyamideimide resin disclosed in Patent Document 1 has insufficient transparency. For example, in the measurement of light transmittance, light transmission particularly in the ultraviolet region (around 300 nm). Sex was not enough.
- a polyamide-imide resin obtained by reacting an isocyanurate type polyisocyanate (a1) synthesized from an isocyanate having an aliphatic structure with a tricarboxylic acid anhydride (a2) having an aliphatic structure is soluble in general-purpose solvents. It is known that a cured product (cured coating film) having excellent transparency can be provided by blending with a curable resin and further curing while maintaining the above (see Patent Document 2). However, the curable resin composition obtained by blending the polyamide-imide resin with a curable resin or a reaction diluent tends to have insufficient storage stability and pot life and insufficient handleability. .
- JP 2001-316469 A WO2010 / 107045 pamphlet
- an object of the present invention is to contain a polyamideimide resin soluble in a general-purpose solvent, and even when blended with a curable resin, the storage stability and pot life are long, and further, a cured product having excellent transparency (cured) It is in providing the curable resin composition which can manufacture a coating film, and its hardened
- the present inventors have determined that the terminal group of the polyamide-imide resin obtained by reacting the isocyanurate type polyisocyanate (a1) synthesized from the isocyanate having the aliphatic structure with the tricarboxylic acid anhydride (a2).
- the acid anhydride group By modifying the acid anhydride group with an alcohol compound, it is soluble in a general-purpose solvent and has a long storage stability and pot life even when blended with a curable resin, and further, the resin composition is cured.
- the cured product obtained in this way was found to be excellent in heat resistance and transparency, and the present invention was completed.
- the present invention provides an alcohol compound after reacting an isocyanurate type polyisocyanate (a1) synthesized from an isocyanate having an aliphatic structure with a tricarboxylic acid anhydride (a2) to produce a polyamideimide resin (a).
- the present invention relates to an alcohol-modified polyamideimide resin obtained by reacting (b).
- the present invention also relates to a curable resin composition containing the alcohol-modified polyamideimide resin (A) and the curable resin (B).
- this invention relates to the hardened
- a cured product (cured coating film) containing a polyamideimide resin soluble in a general-purpose solvent and having a long storage stability and usable time even when blended with a curable resin, and having excellent transparency.
- a curable resin composition that can be produced and a cured product thereof can be provided.
- the alcohol-modified polyamideimide resin (A2) of the present invention is prepared by reacting an isocyanurate type polyisocyanate (a1) synthesized from an isocyanate having an aliphatic structure with a tricarboxylic acid anhydride (a2). Is obtained by reacting the alcohol compound (b).
- Examples of the isocyanurate type polyisocyanate (a1) synthesized from an isocyanate having an aliphatic structure include an isocyanurate type polyisocyanate synthesized from an isocyanate having a linear aliphatic structure and an isocyanate having a cyclic aliphatic structure. Examples include synthesized isocyanurate type polyisocyanates.
- Examples of the isocyanurate type polyisocyanate synthesized from an isocyanate having a linear aliphatic structure include HDI3N (isocyanurate type triisocyanate synthesized from hexamethylene diisocyanate (including polymers such as pentamers)), HTMDI3N, and the like. (Isocyanurate-type triisocyanate synthesized from trimethylhexamethylene diisocyanate (including polymers such as pentamers)) and the like. These may be used in combination or alone.
- Examples of the isocyanurate type polyisocyanate synthesized from an isocyanate having a cycloaliphatic structure include IPDI3N (isocyanurate type triisocyanate synthesized from isophorone diisocyanate (including polymers such as pentamers)), HTDI3N ( Isocyanurate type triisocyanate (including polymer such as pentamer) synthesized from hydrogenated tolylene diisocyanate, HXDI3N (Isocyanurate type triisocyanate synthesized from hydrogenated xylene diisocyanate (polymer such as pentamer) ), NBDI3N (isocyanurate-type triisocyanate synthesized from norbornane diisocyanate (including polymers such as pentamers)), HMDI3N (isocyanur synthesized from hydrogenated diphenylmethane diisocyanate) Chromatography (including 5-mers, etc. of the polymer)
- the isocyanurate type polyisocyanate (a1) synthesized from an isocyanate having an aliphatic structure used in the present invention has a cycloaliphatic structure because a cured coating film having a particularly high Tg and excellent thermal properties can be obtained.
- Isocyanurate type polyisocyanate synthesized from isocyanate is preferable, and isocyanurate type triisocyanate synthesized from isophorone diisocyanate is particularly preferable.
- the isocyanurate type triisocyanate synthesized from isophorone diisocyanate may contain a polymer such as a pentamer.
- the isocyanurate type polyisocyanate synthesized from an isocyanate having a cyclic aliphatic structure in the isocyanurate type polyisocyanate (a1) synthesized from an isocyanate having an aliphatic structure is based on the mass of the compound (a1). 50 to 80% by mass is preferable because a cured coating film having high Tg and excellent thermal properties can be obtained, more preferably 80 to 100% by mass, and most preferably 100% by mass.
- an adduct obtained by urethanization reaction of the above isocyanate compound and various polyols can be used as long as the solvent solubility of the polyamideimide resin of the present invention is not impaired.
- the polyamideimide resin (A1) containing a carboxy group used in the present invention is a polyamic having a problem in stability or the like by directly forming an imide bond from the above-mentioned isocyanate compound (a1) and tricarboxylic acid anhydride (a2).
- a polyamide-imide resin having good reproducibility, good solubility and excellent transparency can be synthesized without going through an acid intermediate.
- the transparency of the polyamideimide resin obtained by using tricarboxylic acid anhydride (a2) as a raw material for polyamideimide is improved.
- tricarboxylic acid anhydrides include tricarboxylic acid anhydrides having an aromatic structure in the molecule and tricarboxylic acids having an aliphatic structure in the molecule.
- a tricarboxylic acid having an aliphatic structure in the molecule is preferable because the storage stability of the curable resin composition is excellent, the pot life is long, and the thermal decomposition temperature of the cured product tends to be excellent.
- Examples of the tricarboxylic acid anhydride having an aromatic structure in the molecule include trimellitic anhydride and naphthalene-1,2,4-tricarboxylic acid anhydride.
- Examples of the tricarboxylic acid anhydride having an aliphatic structure include a tricarboxylic acid anhydride having a linear aliphatic structure and a tricarboxylic acid anhydride having a cyclic aliphatic structure.
- Examples of the tricarboxylic acid anhydride having a linear aliphatic structure include propane tricarboxylic acid anhydride.
- Examples of the tricarboxylic acid anhydride having a cycloaliphatic structure include cyclohexanetricarboxylic acid anhydride, methylcyclohexanetricarboxylic acid anhydride, cyclohexentricarboxylic acid anhydride, methylcyclohexentricarboxylic acid anhydride, and the like.
- a tricarboxylic acid anhydride having a cyclic aliphatic structure is preferable because a cured coating film having high Tg and excellent thermal properties can be obtained in addition to transparency.
- the isocyanurate type polyisocyanate compound (a1) is an isocyanurate type polyisocyanate synthesized from an isocyanate having a cyclic aliphatic structure
- the tricarboxylic acid anhydride (a2) is a tricarboxylic acid having a cyclic aliphatic structure. More preferably, it is an acid anhydride.
- tricarboxylic acid anhydride having a cycloaliphatic structure examples include cyclohexane tricarboxylic acid anhydride. One or more of these can be used. In some cases, bifunctional dicarboxylic acid compounds such as adipic acid, sebacic acid, phthalic acid, fumaric acid, maleic acid and acid anhydrides thereof may be used in combination.
- cyclohexanetricarboxylic acid anhydride examples include cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydride, cyclohexane-1,3,5-tricarboxylic acid-3,5-anhydride, cyclohexane-1 2,3-tricarboxylic acid-2,3-anhydride and the like.
- cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydride is obtained because it becomes a polyamideimide resin having excellent solvent solubility in addition to transparency, and a cured coating film having high Tg and excellent thermal properties can be obtained. Is preferred.
- cyclohexanetricarboxylic acid anhydride is represented by the structure of the following general formula (1), and cyclohexane-1,2,3-tricarboxylic acid, cyclohexane-1,3,4, which is used as a production raw material.
- impurities such as tricarboxylic acid do not impair the curing of the present invention, for example, 10 mass% or less, preferably 5 mass% or less, they may be mixed.
- the carboxylic acid component of the tricarboxylic acid anhydride (a2) reacts with the isocyanate component in the polyisocyanate (a1), an imide and an amide are formed, and the resin of the present invention becomes an amide-imide resin. Further, when the polyisocyanate (a1) and the tricarboxylic acid anhydride (a2) are reacted, the tricarboxylic acid anhydride (a2) and the polyisocyanate (a) in such a ratio that the carboxylic acid component of the tricarboxylic acid anhydride (a2) remains. When reacted with a1), the resulting polyamideimide resin has a carboxy group.
- This carboxy group reacts with a polymerizable group such as an epoxy group of an epoxy resin contained in the curable resin composition of the present invention described later to form a crosslinked structure of the cured product. Since the reaction rate is fast imidization, even in the reaction of tricarboxylic acid and triisocyanate, tricarboxylic acid selectively forms an imide at the acid anhydride.
- the isocyanurate type polyisocyanate (a1) synthesized from the isocyanate having an aliphatic structure is reacted with the tricarboxylic acid anhydride (a2) to obtain the polyamideimide resin (A1) used in the present invention
- a nitrogen atom is used.
- reacting in a polar solvent which does not contain any sulfur atom In the presence of a polar solvent containing nitrogen or sulfur atoms, environmental problems are likely to occur, and in the reaction of isocyanurate type polyisocyanate (a1) with tricarboxylic acid anhydride (a2), molecular growth occurs. Is likely to be disturbed. When such a molecule is cut, the physical properties of the composition are likely to deteriorate, and film defects such as “repellency” tend to occur.
- the polar solvent containing neither a nitrogen atom nor a sulfur atom is more preferably an aprotic solvent.
- a cresol solvent is a phenolic solvent having protons, but is somewhat unfavorable in terms of the environment, and easily reacts with an isocyanate compound to hinder molecular growth.
- the cresol solvent easily reacts with an isocyanate group to easily become a blocking agent. Therefore, it is difficult to obtain good physical properties by reacting with other curing components (for example, epoxy resin) during curing.
- other curing components for example, epoxy resin
- alcohol solvents are not preferred because they react with isocyanates or acid anhydrides.
- Examples of the aprotic solvent include ether solvents having no hydroxyl groups, ester solvents having no hydroxyl groups, and ketone solvents having no hydroxyl groups.
- Examples of ester solvents that do not have a hydroxyl group include ethyl acetate, propyl acetate, and butyl acetate.
- Examples of the ketone solvent having no hydroxyl group include acetone, methyl ethyl ketone, methyl isobutyl ketone, and cyclohexanone. Of these, an ether solvent having no hydroxyl group is particularly preferred.
- the ether solvent having no hydroxyl group has weak polarity and is excellent in the reaction of the isocyanate having the aliphatic structure described above with the isocyanurate type polyisocyanate (a1) and the tricarboxylic acid anhydride (a2).
- ether solvents known and commonly used solvents can be used.
- ethylene glycol dialkyl ethers such as ethylene glycol dimethyl ether, ethylene glycol diethyl ether, ethylene glycol dibutyl ether; diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol dibutyl ether , Polyethylene glycol dialkyl ethers such as triethylene glycol dimethyl ether, triethylene glycol diethyl ether and triethylene glycol dibutyl ether; ethylene glycol monomers such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate and ethylene glycol monobutyl ether acetate Alkyl ether acetates; polyethylene glycol monoalkyl ether acetates such as diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, triethylene glycol monomethyl ether acetate, triethylene glycol monoeth
- Isocyanurate type polyisocyanate (a1) synthesized from isocyanate having aliphatic structure and tricarboxylic acid anhydride (a2) are isocyanates of isocyanurate type polyisocyanate (a1) synthesized from isocyanate having aliphatic structure.
- the ratio of the number of moles of group (N) to the total number of moles of carboxy group (M1) and acid anhydride group (M2) of tricarboxylic anhydride (a2) [(M1) + (M2 )) / (N)] is reacted in a range of 1.1 to 3 because the polarity in the reaction system becomes high and the reaction proceeds to lubrication, the isocyanate group does not remain, and the resulting polyamideimide resin It is preferable for reasons such as good stability, little residual amount of tricarboxylic acid anhydride (a2), and difficulty in separation such as recrystallization. Among these, 1.2 to 2 is more preferable.
- the acid anhydride group refers to a —CO—O—CO— group obtained by intramolecular dehydration condensation of two molecules of carboxylic acid.
- the imidization reaction is performed in a solvent or in the absence of a solvent by mixing one or more isocyanate compounds (a1) and one or more tricarboxylic acid anhydrides (a2) and raising the temperature while stirring.
- the reaction temperature is preferably in the range of 50 ° C. to 250 ° C., particularly preferably in the range of 70 ° C. to 180 ° C. By setting such a reaction temperature, the reaction rate is increased, and the side reaction and decomposition are less likely to occur. While the reaction is accompanied by decarboxylation, the hydroxyl-free and isocyanate groups form imide groups.
- the progress of the reaction can be followed by an analytical means such as an infrared vector, acid value, or isocyanate group quantification.
- the infrared spectrum, 2270 cm -1 which is the characteristic absorption of an isocyanate group was reduced as the reaction further acid anhydride group is reduced with a characteristic absorption at 1860 cm -1 and 850 cm -1.
- the absorption of imide groups increases at 1780 cm ⁇ 1 and 1720 cm ⁇ 1 .
- the reaction may be terminated by lowering the temperature while confirming the target acid value, viscosity, molecular weight and the like. However, it is more preferable to continue the reaction until the isocyanate group disappears from the standpoint of stability over time.
- a catalyst, an antioxidant, a surfactant, other solvents, and the like may be added as long as the physical properties of the synthesized resin are not impaired.
- Examples of the polyamideimide resin (A1) used in the present invention include imide resins represented by the following (formula 2).
- N is a repeating unit of 0-30.
- Rb is, for example, a structural unit represented by the following structural formula (Formula 3) or (Formula 4).
- R 2 is, for example, an aromatic or aliphatic tricarboxylic acid residue that may have a substituent having 6 to 20 carbon atoms.
- Rc is represented by the following structural formula (formula 5), for example. A structural unit.
- Rd is, for example, a trivalent organic group represented by the following (formula 6):
- Ra represents, for example, a residue of a divalent aliphatic diisocyanate.
- the alcohol-modified polyamideimide resin (A2) of the present invention is obtained by producing the polyamideimide resin (A1) by the above method and subsequently reacting with the alcohol compound (a3).
- the reaction between the polyamideimide resin (A1) and the alcohol compound (a3) is not particularly limited as long as the effects of the present invention are not impaired.
- the reaction can be performed by the following esterification reaction.
- the polyamideimide resin (A1) used as a raw material the one produced by the above method can be used.
- the side reaction of urethanization can be suppressed during the reaction with the alcohol compound (a3), the isocyanate group is completely It is preferable to use those that have disappeared.
- the disappearance of the isocyanate group can be confirmed by the disappearance of 2270 cm ⁇ 1, which is the characteristic absorption of the isocyanate group in the infrared spectrum, for example.
- the reaction between the polyamideimide resin (A1) and the alcohol compound (a3) is carried out by the number of moles of acid anhydride groups (M3) in the polyamideimide resin (A1) and the number of moles of hydroxyl groups (L) of the alcohol compound (a3).
- M3 acid anhydride groups
- L hydroxyl groups
- the number of moles of acid anhydride groups (M3) in the polyamideimide resin (A1) is determined by the following method because the tricarboxylic acid anhydride (a2) is consumed by the reaction with the polyisocyanate (a1). Can be obtained.
- the polyamideimide resin (A1) is diluted with a solvent or the like, and the acid value (a) is determined by titration with an aqueous KOH solution.
- the polyamide-imide resin (A1) is diluted with a solvent or the like, an excess amount of n-butanol is reacted with the acid anhydride group, and then the acid value (b) is obtained by titration with an aqueous KOH solution.
- Examples of the alcohol compound (a3) include methyl alcohol, ethyl alcohol, n-propyl alcohol, isopropyl alcohol, n-butyl alcohol, isobutyl alcohol, t-butyl alcohol, ethylene glycol, propylene glycol, trimethylolpropane and benzyl alcohol.
- Alcohol having 10 or less carbon atoms 2-methoxyethyl alcohol, 2-ethoxyethyl alcohol, 1-methoxy-2-propyl alcohol, 1-ethoxy-2-propyl alcohol, 3-methoxy-1-butyl alcohol, 2-iso Alcohols having 10 or less carbon atoms including an ether bond such as propoxyethyl alcohol; Alcohols having 10 or less carbon atoms such as 3-hydroxy-2-butanone; methyl hydroxyisobutyrate, etc. Carbon atoms containing ester groups, such as 10 ppm alcohol are exemplified. In the present invention, it is preferable to use a monohydric alcohol having 10 or less carbon atoms from the physical properties of the resulting thermosetting resin. Furthermore, monohydric alcohols having 5 or less carbon atoms are preferred.
- the dehydration esterification reaction is preferably carried out by mixing the polyamideimide resin (A1) and one or more alcohol compounds (a3) in a solvent or without a solvent and raising the temperature while stirring.
- the reaction temperature is preferably in the range of 50 ° C. to 150 ° C., particularly preferably in the range of 70 ° C. to 130 ° C. By setting such a reaction temperature, the reaction rate is increased, and the side reaction and decomposition are less likely to occur.
- the reaction forms an ester bond with a dehydration reaction.
- the progress of the reaction can be traced by an analytical means such as an infrared vector, acid value, or ester bond quantification.
- the infrared spectrum, 1860 cm -1 and 850 cm -1 which is the characteristic absorption of an acid anhydride group decreases with the reaction.
- the reaction may be terminated by lowering the temperature while confirming the target acid value, viscosity, molecular weight and the like. However, it is more preferable to continue the reaction until the acid anhydride group disappears from the viewpoint of stability over time.
- the same solvent as that used in the imidation reaction can be used as the solvent used in the dehydration esterification reaction.
- a catalyst, an antioxidant, a surfactant, other solvents, and the like may be added as long as the physical properties of the synthesized resin are not impaired.
- the acid value of the alcohol-modified polyamideimide resin (A2) of the present invention is preferably 70 to 210 KOHmg / g, and particularly preferably 90 to 190 KOHmg / g. When it is 70 to 210 KOHmg / g, it exhibits excellent performance as a cured material.
- the alcohol-modified polyamideimide resin (A2) of the present invention is preferably a polyamideimide resin that dissolves in a polar solvent that does not contain any of the nitrogen and sulfur atoms. Examples of such polyamideimide resins include branched polyamideimide resins having a branched structure and an acid value of the resin of 60 KOHmg / g or more.
- the number average molecular weight of the alcohol-modified polyamideimide resin (A2) of the present invention is preferably from 1,000 to 20,000, preferably from 2,000 to 20,000 in view of good solubility in a solvent and a cured product having excellent mechanical strength. 8000 is more preferable.
- the molecular weight can be measured by gel permeation chromatography (GPC) or quantitative analysis of the terminal functional group amount.
- the number average molecular weight was determined using GPC under the following conditions.
- Measuring device Tosoh Corporation HLC-8120GPC, UV8020
- Measurement conditions Column temperature 40 ° C Solvent THF Flux 1.0ml / min Standard: Calibration curve prepared with polystyrene standard sample Sample: 0.1% by mass THF solution in terms of resin solids filtered through microfilter (injection amount: 200 ⁇ l)
- Examples of the alcohol-modified polyamideimide resin (A2) used in the present invention include imide resins represented by the following (formula 7).
- Ra represents, for example, a residue of a divalent aliphatic diisocyanate.
- Rb represents, for example, the above structural formula (Formula 3) or (Formula 4).
- Rd is, for example, a trivalent organic group represented by the above (formula 6), and Rc ′ is, for example, a structure represented by the following structural formula (formula 8) Unit.
- R 2 is, for example, the same as described above.
- R 3 represents a residue obtained by removing a hydroxyl group from an alcohol compound.
- the curable resin composition of the present invention contains the alcohol-modified polyamideimide resin (A2) of the present invention, the curable resin (B) and / or the reactive diluent (C).
- the curable resin (B) examples include an epoxy compound (B1) having two or more epoxy groups in the molecule, a compound having two or more maleimide groups in the molecule, a benzoxazine resin, and a cyanate ester resin. Is mentioned.
- the component (B1) known and commonly used epoxy resins can be used, and two or more kinds may be mixed and used.
- Other examples include melamine resins, isocyanate compounds, silicates and alkoxysilane compounds, (meth) acrylic resins, etc., which are excellent in heat resistance, dimensional stability and mechanical properties (toughness, flexibility).
- An epoxy resin is preferable in that a cured product such as a cured coating film is obtained.
- cured material property mentioned above and below-mentioned described in this invention is the polyamideimide resin of this invention alone or the polyamideimide resin of this invention other than the hardened
- Examples of the epoxy resin (B1) include reaction of bisphenol A type epoxy resin, bisphenol S type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, cresol novolac type epoxy resin, dicyclopentadiene and various phenols. Epoxidized products of various dicyclopentadiene-modified phenolic resins, 2,2 ′, 6,6′-tetramethylbiphenol epoxidized product, 4,4′-methylenebis (2,6-dimethylphenol) epoxidized product, Epoxy derived from naphthalene skeleton, such as naphthol, binaphthol or novolak modification of naphthol or binaphthol, aromatic epoxy resin such as epoxy resin obtained by epoxidizing phenol resin of fluorene skeleton, etc. It is.
- aliphatic epoxy resins such as neopentyl glycol diglycidyl ether, 1,6-hexanediol diglycidyl ether, hydrogenated bisphenol A type epoxy resin, hydrogenated bisphenol F type epoxy resin, 3,4-epoxycyclohexylmethyl- 3,4-epoxycyclohexanecarboxylate, bis- (3,4-epoxybicyclohexyl) adipate, 1,2-epoxy-4- (2-oxiranyl) cyclohexane of 2,2-bis (hydroxymethyl) -1-butanol
- a cycloaliphatic epoxy resin such as an adduct, an epoxy resin containing a polyalkylene glycol chain in the main chain, such as polyethylene glycol diglycidyl ether, polypropylene glycol diglycidyl ether, and triglycidyl isocyanurate Heterocycle-containing epoxy resins can be used.
- an epoxy group-containing polymerization resin obtained by polymerizing an unsaturated group of an epoxy compound having a polymerizable unsaturated double bond such as a (meth) acryloyl group or a vinyl group, and other monomers having a polymerizable unsaturated bond Copolymers with can also be used.
- Examples of the compound having both (meth) acryloyl group and epoxy group include glycidyl (meth) acrylate, 2-hydroxyethyl (meth) acrylate glycidyl ether, hydroxypropyl (meth) acrylate glycidyl ether, 4-hydroxydibutyl (meth) acrylate glycidyl ether.
- 6-hydroxyhexyl (meth) acrylate glycidyl ether 5-hydroxy-3-methylpentyl (meth) acrylate glycidyl ether, (meth) acrylic acid-3,4-epoxycyclohexyl, lactone modified (meth) acrylic acid-3, 4-epoxycyclohexyl, vinylcyclohexene oxide and the like.
- the epoxy resin (B1) component having two or more epoxy groups in the molecule is particularly preferably a cycloaliphatic epoxy resin. If it is a cycloaliphatic epoxy resin, a cured coating film having a high Tg and excellent thermal properties can be obtained, and a cured product having a high light transmittance in the ultraviolet region (around 300 nm) can be obtained.
- cycloaliphatic epoxy resins hydrogenated bisphenol A type epoxy resin, 1,2-epoxy-4- (2-oxiranyl) cyclohexane adduct of 2,2-bis (hydroxymethyl) -1-butanol and the like are preferable. .
- Such cycloaliphatic epoxy resins can be obtained on the market, and examples thereof include Denacol EX-252 (manufactured by Nagase ChemteX Corporation), EHPE3150, EHPE3150CE (manufactured by Daicel Chemical Industries, Ltd.), and the like.
- the alcohol-modified polyamideimide resin (A2) and the epoxy resin (B1) having two or more epoxy groups in the molecule can be freely blended according to various desired physical properties, such as Tg.
- Tg desired physical properties
- the number of moles of carboxy groups (COOH) of the alcohol-modified polyamideimide resin (A2) and two or more epoxy groups in the molecule Alcohol-modified polyamideimide resin (A2) and epoxy resin (B1) having a ratio [(EPOXY) / n (COOH)] with the number of moles of epoxy groups n (EPOXY) of 0.3 to 4 Since blending with the epoxy resin (B1) makes it easy to obtain Tg as a property of the cured product, a cured product having excellent mechanical properties and the like is obtained, and the transparency of the cured product is further improved. Masui.
- the curable resin composition of the present invention may be mixed with an epoxy-carboxylic acid-based curing catalyst or the like.
- epoxy-carboxylic acid-based curing catalysts include primary to tertiary amines for promoting the reaction, quaternary ammonium salts, nitrogen compounds such as dicyandiamide and imidazole compounds, TPP (triphenylphosphine). ),
- TPP triphenylphosphine
- Known epoxy curing accelerators such as phosphine compounds such as alkyl-substituted trialkyl phonylphosphine and derivatives thereof, phosphophonium salts thereof, dialkylureas, carboxylic acids, phenols, or methylol group-containing compounds. Etc., and a small amount of these can be used in combination.
- maleimide compound (B2) examples include, for example, N-cyclohexylmaleimide, N-methylmaleimide, Nn-butylmaleimide, N-aliphatic maleimides such as N-hexylmaleimide and N-tert-butylmaleimide; N-aromatic maleimides such as N-phenylmaleimide, N- (P-methylphenyl) maleimide and N-benzylmaleimide; 4,4 ′ -Diphenylmethane bismaleimide, 4,4'-diphenylsulfone bismaleimide, m-phenylene bismaleimide, bis (3-methyl-4-maleimidophenyl) methane, bis (3-ethyl-4-maleimidophenyl) methane, bis (3 , 5-dimethyl-4-maleimidophenyl) methane, bis 3-eth
- bismaleimide is particularly preferable because the cured product has good heat resistance, and 4,4′-diphenylmethane bismaleimide, bis (3,5-dimethyl-4-maleimidophenyl) methane, bis (3 Preferred examples include -ethyl-5-methyl-4-maleimidophenyl) methane and bis (3,5-diethyl-4-maleimidophenyl) methane.
- a curing accelerator can be used as necessary.
- the curing accelerator that can be used here include amine compounds, phenol compounds, acid anhydrides, imidazoles, and organic metal salts.
- reactive diluent (C) used in the present invention known and commonly used photopolymerizable vinyl monomers can be used. Typical examples include dimethylaminoethyl acrylate, diethylaminoethyl acrylate, ethylene glycol diacrylate, Diethylene glycol diacrylate, triethylene glycol diacrylate, polyethylene glycol diacrylate, propylene glycol diacrylate, dipropylene glycol diacrylate, tripropylene glycol diacrylate, polypropylene glycol diacrylate, trimethylolpropane diacrylate, trimethylolpropane triacrylate, penta Erythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol Polyhexaacrylate, acryloylmorpholine, vinylpyrrolidone, styrene, tris (2-acryloyloxyethyl) isocyanurate, alkyl (meth)
- the alcohol-modified polyamide-imide resin (A2) and the reactive diluent (C) can be freely blended in accordance with various target physical properties, such as thermal properties such as Tg, mechanical properties, etc.
- the ratio [A2 / C] of the alcohol-modified polyamideimide resin (A2) to the photopolymerizable group of the reactive diluent (C) is 0.2 to Mixing the alcohol-modified polyamideimide resin (A2) and the reactive diluent (C) within a range of 5.0 makes it easy to obtain Tg as a property of the cured product, and a cured product having excellent mechanical properties and the like is obtained. Further, it is preferable because the transparency of the cured product is improved.
- a photopolymerization initiator (D) can be used.
- the photopolymerization initiator (D) is not particularly limited, and a known and commonly used polymerizable photoinitiator can be used. Typical examples include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether.
- Benzoin and benzoin alkyl ethers such as acetophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy-2-phenylacetophenone, acetophenones such as 1,1-dichloroacetophenone, 2-methylanthraquinone, 2 -Anthraquinones such as ethylanthraquinone, 2-tertiarybutylanthraquinone, 1-chloroanthraquinone, 2-aluminumanthraquinone, 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2-chloro Thioxanthones such as thioxanthone, 2,4-diisopropylthioxanthone, trimethylbenzoyl such as bis (2,6dimethoxybenzoyl) -2,4,4-trimethylpentylphosphine oxide, 2,4,6-tri
- the amount of the photopolymerization initiator (D) used is not particularly limited as long as it does not impair the effects of the present invention, but usually 0.1 to 30 masses per 100 mass parts of the alcohol-modified polyamideimide resin (A2). Part range, more preferably 0.5 to 10 parts by mass.
- Such photopolymerization initiators can also be used in combination with one or more known and commonly used photopolymerization accelerators.
- the curable resin composition of the present invention may further contain an organic solvent (E) as necessary.
- an organic solvent (E) the same organic solvent as that used to prepare the alcohol-modified polyamideimide resin (A2) can be used.
- additives such as a polymerization inhibitor, a thixotropic agent, an antifoaming agent, a leveling agent, and a coupling agent can also be used.
- Curing of the curable resin composition of the present invention is basically performed while appropriately selecting and adjusting the type and blending ratio of the alcohol-modified polyamideimide resin (A2), curable resin (B), other components, and curing conditions. be able to.
- active energy ray curing, curing by heat, and both are used in combination, that is, semi-curing by active energy ray curing, then curing by heat, semi-curing by curing by heat It is also possible to carry out active energy ray curing and both at the same time.
- ultraviolet rays and electron beams can be used.
- an ultrahigh pressure mercury lamp, a high pressure mercury lamp, a low pressure mercury lamp, a carbon arc, a black light lamp, a metal halide lamp, or the like can be used.
- As the ultraviolet wavelength a wavelength of 1900 to 3800 angstroms is mainly used.
- an apparatus having an irradiation source such as various electron beam accelerators can be used, and electrons having an energy of 100 to 1000 KeV are irradiated.
- the curing is carried out in the range of a curing temperature of 80 ° C. to 300 ° C., preferably in the range of 120 ° C. to 250 ° C. in the presence of a catalyst for starting thermal polymerization and additives.
- the material to be coated can be cured by heating after being painted or cast. Further, step curing at various temperatures may be performed. Alternatively, a sheet-like or film-like composition semi-cured at a temperature of about 50 ° C. to 170 ° C. may be stored and treated at the above-described curing temperature when necessary.
- the active energy ray and heat there is no limitation in using the active energy ray and heat in combination.
- additives such as other solvents, various leveling agents, antifoaming agents, antioxidants, anti-aging agents, ultraviolet absorbers, anti-settling agents, rheology control agents and the like are added to the curable resin composition of the present invention as necessary.
- Agents known and conventional fillers such as barium sulfate, silicon oxide, talc, clay, calcium carbonate, silica, colloidal silica, glass, various metal powders, fibrous fillers such as glass fiber, carbon fiber, Kevlar fiber, etc.
- blend well-known and usual coloring pigments such as phthalocyanine blue, phthalocyanine green, a titanium oxide, carbon black, a silica, and other adhesive provision agents.
- blend polymers such as an acrylic resin, a cellulose resin, a polyvinyl resin, polyphenylene ether, and polyether sulfone, as needed.
- a non-halogen flame retardant containing substantially no halogen atom is blended so long as the effect of the present invention is not impaired so that the cured product exhibits flame retardancy. May be.
- the non-halogen flame retardants include phosphorus flame retardants, nitrogen flame retardants, silicone flame retardants, inorganic flame retardants, and organic metal salt flame retardants.
- the flame retardants may be used alone or in combination, and a plurality of flame retardants of the same system may be used, or different types of flame retardants may be used in combination.
- the phosphorus flame retardant either inorganic or organic can be used.
- the inorganic compounds include red phosphorus, monoammonium phosphate, diammonium phosphate, triammonium phosphate, ammonium phosphates such as ammonium polyphosphate, and inorganic nitrogen-containing phosphorus compounds such as phosphate amide.
- the red phosphorus is preferably subjected to a surface treatment for the purpose of preventing hydrolysis and the like.
- Examples of the surface treatment method include (i) magnesium hydroxide, aluminum hydroxide, zinc hydroxide, water A method of coating with an inorganic compound such as titanium oxide, bismuth oxide, bismuth hydroxide, bismuth nitrate or a mixture thereof; (ii) an inorganic compound such as magnesium hydroxide, aluminum hydroxide, zinc hydroxide, titanium hydroxide; and A method of coating with a mixture of a thermosetting resin such as a phenol resin, (iii) thermosetting of a phenol resin or the like on a coating of an inorganic compound such as magnesium hydroxide, aluminum hydroxide, zinc hydroxide, or titanium hydroxide
- a method of double coating with a resin may be used.
- general-purpose organic phosphorus compounds such as phosphate ester compounds, phosphonic acid compounds, phosphinic acid compounds, phosphine oxide compounds, phospholane compounds, organic nitrogen-containing phosphorus compounds,
- the blending amount thereof is appropriately selected depending on the type of the phosphorus-based flame retardant, the other components of the curable resin composition, and the desired degree of flame retardancy.
- the polyamide-imide resin (A2) In 100 parts by mass of curable resin composition containing all of curable resin (B) and / or reactive diluent (C), curing agent, non-halogen flame retardant, and other fillers and additives, red phosphorus Is preferably blended in the range of 0.1 to 2.0 parts by weight when used as a non-halogen flame retardant, and similarly in the range of 0.1 to 10.0 parts by weight when using an organophosphorus compound. It is preferable to mix in the range of 0.5 to 6.0 parts by mass.
- the phosphorous flame retardant when using the phosphorous flame retardant, may be used in combination with hydrotalcite, magnesium hydroxide, boric compound, zirconium oxide, black dye, calcium carbonate, zeolite, zinc molybdate, activated carbon, etc. Good.
- nitrogen-based flame retardant examples include triazine compounds, cyanuric acid compounds, isocyanuric acid compounds, and phenothiazines, and triazine compounds, cyanuric acid compounds, and isocyanuric acid compounds are preferable.
- triazine compound examples include melamine, acetoguanamine, benzoguanamine, melon, melam, succinoguanamine, ethylene dimelamine, melamine polyphosphate, triguanamine, and the like, for example, (i) guanylmelamine sulfate, melem sulfate, sulfate (Iii) co-condensates of phenols such as phenol, cresol, xylenol, butylphenol and nonylphenol with melamines such as melamine, benzoguanamine, acetoguanamine and formguanamine and formaldehyde, (iii) (Ii) a mixture of a co-condensate of (ii) and a phenolic resin such as a phenol formaldehyde condensate, (iv) those obtained by further modifying (ii) and (iii) with paulownia oil, isomerized linseed oil
- the cyanuric acid compound examples include cyanuric acid and cyanuric acid melamine.
- the amount of the nitrogen-based flame retardant is appropriately selected depending on the type of the nitrogen-based flame retardant, the other components of the curable resin composition, and the desired degree of flame retardant. 100 parts by mass of a curable resin composition containing all of (A2), curable resin (B) and / or reactive diluent (C), curing agent, non-halogen flame retardant, and other fillers and additives Among them, it is preferably blended in the range of 0.05 to 10 parts by mass, and particularly preferably in the range of 0.1 to 5 parts by mass. Moreover, when using the said nitrogen-type flame retardant, you may use together a metal hydroxide, a molybdenum compound, etc.
- the silicone flame retardant is not particularly limited as long as it is an organic compound containing a silicon atom, and examples thereof include silicone oil, silicone rubber, and silicone resin.
- the amount of the silicone flame retardant is appropriately selected depending on the type of the silicone flame retardant, the other components of the curable resin composition, and the desired degree of flame retardant.
- Examples of the inorganic flame retardant include metal hydroxide, metal oxide, metal carbonate compound, metal powder, boron compound, and low melting point glass.
- Specific examples of the metal hydroxide include aluminum hydroxide, magnesium hydroxide, dolomite, hydrotalcite, calcium hydroxide, barium hydroxide, zirconium hydroxide and the like.
- Specific examples of the metal oxide include, for example, zinc molybdate, molybdenum trioxide, zinc stannate, tin oxide, aluminum oxide, iron oxide, titanium oxide, manganese oxide, zirconium oxide, zinc oxide, molybdenum oxide, and cobalt oxide. Bismuth oxide, chromium oxide, nickel oxide, copper oxide, tungsten oxide and the like.
- the metal carbonate compound examples include zinc carbonate, magnesium carbonate, calcium carbonate, barium carbonate, basic magnesium carbonate, aluminum carbonate, iron carbonate, cobalt carbonate, and titanium carbonate.
- the metal powder examples include aluminum, iron, titanium, manganese, zinc, molybdenum, cobalt, bismuth, chromium, nickel, copper, tungsten, and tin.
- Specific examples of the boron compound include zinc borate, zinc metaborate, barium metaborate, boric acid, and borax.
- the low-melting-point glass include, for example, Shipley (Bokusui Brown), hydrated glass SiO 2 —MgO—H 2 O, PbO—B 2 O 3 system, ZnO—P 2 O 5 —MgO system, P 2 O 5 —B 2 O 3 —PbO—MgO system, P—Sn—O—F system, PbO—V 2 O 5 —TeO 2 system, Al 2 O 3 —H 2 O system, lead borosilicate system, etc.
- the glassy compound can be mentioned.
- the blending amount of the inorganic flame retardant is appropriately selected depending on the kind of the inorganic flame retardant, the other components of the curable resin composition, and the desired degree of flame retardancy.
- a curable resin composition containing all of (A2), curable resin (B) and / or reactive diluent (C), curing agent, non-halogen flame retardant, and other fillers and additives Among them, it is preferably blended in the range of 0.05 to 20 parts by mass, and particularly preferably in the range of 0.5 to 15 parts by mass.
- the organic metal salt flame retardant include ferrocene, acetylacetonate metal complex, organic metal carbonyl compound, organic cobalt salt compound, organic sulfonic acid metal salt, metal atom and aromatic compound or heterocyclic compound or an ionic bond or Examples thereof include a coordinated compound.
- the amount of the organic metal salt flame retardant is appropriately selected depending on the type of the organic metal salt flame retardant, the other components of the curable resin composition, and the desired degree of flame retardancy.
- the curable resin composition of the present invention provides a cured coating film that is soluble in a general-purpose solvent and is excellent in heat resistance and light transmittance. For this reason, in particular, in the field where the transparency of the cured product is required, for example, the field for optical materials, solder resist materials for printed wiring boards, protective materials and insulating materials for household appliances such as refrigerators and rice cookers, liquid crystal displays, Protective materials used for liquid crystal display elements, organic and inorganic electroluminescence displays, organic and inorganic electroluminescence elements, LED displays, light emitting diodes, electronic paper, solar cells, through silicon electrodes (Through Silicon Via: TSV), optical fibers, optical waveguides, etc. It can be suitably used in fields such as insulating materials, adhesives and reflective materials, and display device fields such as liquid crystal alignment films and color filter protective films.
- the field where the transparency of the cured product is not required, for example, various heat-resistant coating materials, heat-resistant adhesives; sealing materials for electric and electronic parts, insulating varnishes, laminates, insulating powder coatings, semiconductor passivation Electrical insulating materials such as films and gate insulating films; Conductive materials such as conductive films and conductive adhesives; Adhesives for structural materials such as laminates for printed wiring boards, prepregs and honeycomb panels; glass fibers and carbon fibers , Fiber reinforced plastics using various reinforcing fibers such as aramid fibers and prepregs thereof; patterning materials such as resist inks; gaskets for non-aqueous electrolyte secondary batteries such as lithium ion secondary batteries Can do.
- the curable resin composition of the present invention includes a white prepreg, a white laminate, and the white laminate because a cured coating film that is soluble in a general-purpose solvent and has excellent heat resistance and light transmittance is obtained. It can be suitably used for a chip LED. Details will be described below.
- the white prepreg of the present invention is characterized in that a mixture containing the curable resin composition of the present invention and a white pigment is impregnated or applied to a sheet-like glass fiber substrate and then dried. Specifically, the mixture containing the curable resin composition of the present invention and a white pigment is impregnated or applied to a sheet-like glass fiber base material, and then in a dryer in the range of 100 to 200 ° C. for 1 to 60 minutes. It is characterized by being semi-cured within the range.
- the white prepreg and the production method thereof will be specifically described below.
- the white pigment examples include zinc oxide, calcium carbonate, titanium dioxide, alumina, and synthetic smectite.
- the white pigment is not particularly limited as long as it is a white inorganic powder, but is not limited to visible light reflectance, whiteness, or electricity. It is most preferable to use titanium dioxide from the viewpoint of characteristics.
- the crystal structure of titanium dioxide includes anatase type and rutile type.
- the anatase type has good reflectance in the visible light short wavelength region
- the rutile type has excellent long-term durability and discoloration resistance. Either may be sufficient as a white pigment added to the curable resin composition of this invention, and it does not specifically limit. It is of course possible to use a mixture of both.
- the content of the white pigment contained in the mixture is preferably in the range of 10 to 75% by mass in the formulation. If it is 10% by mass or more, sufficient whiteness and reflectance can be obtained, and if it is 75% by mass or less, the impregnation property to the sheet-like glass fiber substrate is lowered or the adhesive strength to the metal foil is lowered. There will be no problems.
- the titanium dioxide When titanium dioxide is used as the white pigment, the titanium dioxide may be subjected to alumina or silica treatment as a surface treatment. Moreover, a silane coupling agent or titanate coupling agent treatment is also possible.
- the mixture impregnated into the sheet-like glass fiber base material may contain an inorganic filler such as silica, if necessary.
- the inorganic filler that can be contained include silica, aluminum hydroxide, magnesium hydroxide, E glass powder, magnesium oxide, potassium titanate, calcium silicate, clay, and talc. Two or more types may be used in combination.
- the blending amount is not particularly limited, but is preferably 50% by mass or less with respect to the mixture. If it is 50 mass% or less, there is almost no possibility that the impregnation property to a sheet-like glass fiber base material will fall or the adhesive strength with metal foil will generate
- Fluorescent agent can be blended in the mixture impregnated into the sheet-like glass fiber substrate, if necessary, in addition to the white pigment and the inorganic filler.
- the fluorescent agent is a compound that has the property of absorbing light energy such as light, radiation, and ultraviolet light and emitting it by changing to light of other wavelengths.
- diaminostilbene derivatives, anthracene, sodium salicylate , Diaminostilbene disulfonic acid derivatives, imidazole derivatives, coumarin derivatives, pyrazoline derivatives, decalylamine derivatives, and the like are examples of organic substances.
- the fluorescent agent preferably has a radiation wavelength in the visible light short wavelength region (380 to 470 nm) in which the reflectance is remarkably lowered.
- the fluorescent agent is generally called a fluorescent whitening agent.
- Diaminostilbene disulfonic acid derivatives, imidazole derivatives, coumarin derivatives, pyrazoline derivatives and the like are suitable.
- the addition amount is not limited, but in the case of a pyrazoline derivative, the effect is exhibited from the addition of about 0.1% by mass with respect to the mixture, and the effect is increased as the addition amount is increased. Further, it is desirable that the optical brightener to be added is soluble in a solvent.
- the sheet-like glass fiber substrate used for the white prepreg of the present invention may be either a glass cloth or a nonwoven fabric, and a glass cloth and a nonwoven fabric may be used in combination.
- a plain weave structure is basically used, but a woven structure such as Nanako weave, satin weave or twill weave may be used, and is not particularly limited.
- a woven structure such as Nanako weave, satin weave or twill weave may be used, and is not particularly limited.
- the thickness of the glass cloth is not particularly limited, but is preferably in the range of 0.02 to 0.3 mm because it is easy to handle.
- the sheet-like glass fiber base material may be subjected to a surface treatment with a silane coupling agent or the like. Furthermore, the sheet-like glass fiber base material itself may be colored white.
- a solvent such as methyl ethyl ketone is added to the mixture described above to prepare a resin varnish, impregnated into a sheet-like glass fiber substrate made of glass cloth or the like, and dried to produce a white prepreg.
- the method for impregnating and drying the resin varnish on the sheet glass fiber substrate is not particularly limited. For example, after impregnating the resin varnish by immersing the sheet glass fiber substrate in the resin varnish, 100 ° C. to A method of removing the solvent and semi-curing the curable resin by heating at a temperature of about 200 ° C. for 1 to 60 minutes can be employed.
- the impregnation amount of the curable resin composition of the white prepreg produced by impregnating and drying the sheet-like glass fiber substrate is not particularly limited, but is preferably in the range of 30 to 60% by mass.
- drying conditions for the prepreg for example, it is preferable to previously measure the gel time of the resin varnish with a gel time tester (manufactured by Yasuda Seiki Seisakusho).
- the gel time measurement conditions the gel time at 160 ° C. (curing time: the time required for the rotor torque to reach about 3.3 kg ⁇ cm) is measured by the above-mentioned apparatus, and the gel time of the varnish resin is 5 minutes or more.
- the range of ⁇ 15 minutes is preferable, and the gel time is more preferably 5 minutes to less than 10 minutes. If the gel time of the resin varnish is short, the semi-cured state cannot be maintained, and it becomes difficult to produce a uniform prepreg. Further, when the half-curing cannot be maintained and the curing is reached, it becomes difficult to bond with a metal foil described later. Therefore, it is preferable to semi-cure under conditions suitable for the process by varnish gel time measurement.
- a combination of the obtained white prepreg and copper foil or aluminum foil is heated and pressed to produce a white laminate.
- the number of white prepregs to be overlaid is not particularly limited, but as a single-layer substrate, one or two to ten white prepregs are stacked. In general, the foils are laminated.
- the multilayer substrate is manufactured by laminating a plurality of the single-layer substrates, but there is no particular limitation on the number of the stacked substrates.
- the metal foil copper foil, aluminum foil or the like is used as the metal foil. Further, the thickness of the metal foil is generally 1 ⁇ m to 105 ⁇ m, and particularly preferably in the range of 1.5 ⁇ m to 35 ⁇ m.
- the white laminates and metal foil-clad white laminates obtained in this way have high reflectivity in the visible light region, remarkably little discoloration due to heating and ultraviolet rays, and high heat resistance and excellent thickness accuracy. It becomes the white laminated board for wiring boards, and a metal foil clad white laminated board.
- the lamination molding conditions for the metal foil-clad laminate the usual method for laminates for printed wiring boards can be applied. For example, a multistage press, a multistage vacuum press, a continuous molding, an autoclave molding machine, etc.
- a temperature 100- A range of 300 ° C.
- pressure 2 to 100 kgf / cm 2
- heating time range of 0.1 to 5 hours is general, but in terms of uniform insulation layer thickness, removal of bubbles, etc., lamination molding is It is preferable to carry out under a vacuum of 70 mmHg or less.
- a conductive pattern is formed on the obtained white laminate by an additive method to obtain a printed wiring board.
- a circuit pattern is printed on the metal foil of the obtained metal foil-clad white laminate and etched to obtain a printed wiring board.
- solder is applied on the printed wiring board, and the chip LED is placed on the printed wiring board, and then the chip LED is melted by passing it through reflow or the like. Is fixed to the printed circuit board.
- chip LEDs By integrating chip LEDs with high density, it can be used as a surface light source, and such a surface light source is suitably used for a backlight for a liquid crystal display that is particularly required to be thin.
- it is applied to induction display illumination lamps, evacuation exit illumination lamps, advertisement lights, etc. as surface emitting illumination devices.
- the thickness accuracy of the chip LED mounting substrate is extremely important when the elements mounted on the substrate are sealed by transfer molding.
- transfer molding refers to a method of press-fitting a resin into a clamped mold.
- the thickness of the substrate used for the chip LED is generally 0.06 mm to 1.0 mm.
- the required accuracy of the substrate thickness in such transfer molding is, for example, a tolerance of ⁇ 0.05 mm or less (range is 0.1 mm), preferably a tolerance of ⁇ 0.03 mm or less for a substrate having a thickness of 1.0 mm. (The range is 0.06 mm). Therefore, if there is a substrate with high thickness accuracy, the defect rate can be greatly reduced in the manufacturing process of the chip LED, which is extremely significant in the industry.
- the curable resin composition of the present invention is used as a patterning material
- the curable resin composition of the present invention is applied onto a substrate, the solvent is dried, and then energy is passed through a mask having a pattern.
- a pattern can be formed by irradiating a line and developing with an alkaline aqueous solution or a solvent. Furthermore, a stronger pattern can be formed by heat treatment at 80 ° C. or higher. Details will be described below.
- a photosensitive film comprising a support and a photosensitive resin composition layer made of the curable resin composition of the present invention formed on the support is produced.
- the photosensitive resin composition layer is formed by dissolving the curable resin composition of the present invention in a solvent or mixed solvent to obtain a solution having a solid content of about 30 to 70% by mass, and then applying the solution onto a support. It is preferable to do.
- the thickness of the photosensitive resin composition layer varies depending on the use, but it is preferably 10 to 100 ⁇ m, more preferably 20 to 60 ⁇ m, after drying after removing the solvent by heating and / or hot air blowing. . If the thickness is less than 10 ⁇ m, there is a tendency that it is difficult to apply industrially, and if it exceeds 100 ⁇ m, the above-described effects produced by the present invention tend to be reduced, and in particular, physical properties and resolution tend to be reduced.
- the support provided in the photosensitive film examples include polyesters such as polyethylene terephthalate, polymer films having heat resistance and solvent resistance such as polypropylene and polyethylene.
- the thickness of the support is preferably 5 to 100 ⁇ m, and more preferably 10 to 30 ⁇ m. If the thickness is less than 5 ⁇ m, the support tends to be broken when the support is peeled off before development, and if it exceeds 100 ⁇ m, the resolution and flexibility tend to decrease.
- the photosensitive film consisting of two layers of the support and the photosensitive resin composition layer as described above or the photosensitive film consisting of three layers of the support, the photosensitive resin composition layer, and the protective film, for example, is stored as it is. Alternatively, the protective film may be interposed and wound around the core in a roll shape and stored.
- the method for forming a resist pattern using the photosensitive resin composition or photosensitive film of the present invention is, first, by a known screen printing, a step of applying by a roll coater, or by laminating, etc. by removing the protective film, respectively.
- the resist is stacked on the substrate.
- a removal step of removing the support film from the photosensitive film described above is performed, or actinic rays are passed through the mask pattern without removing the support film to a predetermined portion of the photosensitive resin composition layer. Irradiation is performed to perform an exposure process for photocuring the photosensitive resin composition layer of the irradiated portion.
- the photosensitive resin composition layer other than the irradiated part is removed by the next development step after removing the support film.
- substrate which forms a resist points out a printed wiring board, a board
- a known light source such as a carbon arc lamp, a mercury vapor arc lamp, an ultra-high pressure mercury lamp, a high-pressure mercury lamp, or a xenon lamp is used.
- a known light source such as a carbon arc lamp, a mercury vapor arc lamp, an ultra-high pressure mercury lamp, a high-pressure mercury lamp, or a xenon lamp is used.
- what emits visible light effectively such as a photographic flood light bulb and a solar lamp, is also used.
- direct drawing direct laser exposure may be used.
- An excellent pattern can be formed by using a photopolymerization initiator (D) corresponding to each laser light source and exposure method.
- an alkaline developer such as a dilute solution of sodium carbonate (1 to 5% by mass aqueous solution) at 20 to 50 ° C. is used as the developer, and known spraying, rocking immersion, brushing, scraping, etc. Develop by the method of.
- the irradiation amount can be adjusted as necessary.
- irradiation can be performed at an irradiation amount of about 0.2 to 10 J / cm 2 .
- the resist pattern is heated, it is preferably performed in the range of about 100 to 170 ° C. for about 15 to 90 minutes.
- ultraviolet irradiation and heating can be performed at the same time, and after either one is performed, the other can be performed. When ultraviolet irradiation and heating are performed simultaneously, it is more preferable to heat to 60 to 150 ° C. from the viewpoint of effectively imparting solder heat resistance, chemical resistance and the like.
- This photosensitive resin composition layer also serves as a protective film for wiring after soldering to the substrate, and has excellent crack resistance, HAST resistance, and gold plating properties, so for printed wiring boards and semiconductor package substrates It is useful as a solder resist for flexible wiring boards.
- the substrate provided with the resist pattern in this manner is then mounted with a semiconductor element or the like (for example, wire bonding, solder connection), and then mounted on an electronic device such as a personal computer.
- a semiconductor element or the like for example, wire bonding, solder connection
- Synthesis example 1 [Preparation of polyamideimide resin (A1-1)]
- PGMAc propylene glycol monomethyl ether acetate
- NCO% 17.2
- 499.1 g (2.52 mol) of cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydride were added, and the temperature was raised to 140 ° C. The reaction proceeded with foaming. The reaction was carried out at this temperature for 8 hours.
- Synthesis example 2 [Preparation of polyamideimide resin (A1-2)]
- EDGA diethylene glycol monoethyl ether acetate
- 2070 g (2.83 mol) and 1386 g (7 mol) of cyclohexane-1,3,4-tricarboxylic acid-3,4-anhydride was added and the temperature was raised to 140 ° C. The reaction proceeded with foaming. The reaction was carried out at this temperature for 8 hours.
- Synthesis example 3 [Preparation of alcohol-modified polyamideimide resin (A2-3)] Synthesis example except that 153.7 g (1.3 mol) of butyl cellosolve was added to the polyamideimide resin solution (A1-1) instead of 96.3 g (1.3 mol) of n-butanol and reacted at 120 ° C. for 2 hours. In the same manner as in Example 1, an alcohol-modified polyamideimide resin (A2-3) was obtained. As a result of measuring the characteristic absorption in the infrared spectrum, the absorption at 1860 cm ⁇ 1 which is the characteristic absorption of the acid anhydride group completely disappeared. The acid value in terms of solid content was 145 KOH mg / g, and the molecular weight was number average molecular weight 4900 in terms of polystyrene. Moreover, the density
- PGMAc propylene glycol monomethyl ether acetate
- Trimellitic anhydride 791 g (4.12 mol) was added, and the temperature was raised to 140 °
- Footnote EHPE3150 in Table 1 Cycloaliphatic epoxy resin manufactured by Daicel Chemical Industries, Ltd. (1,2-epoxy-4- (2-oxiranyl) cyclohexane of 2,2-bis (hydroxymethyl) -1-butanol Adduct). Epoxy equivalent is 177. The resin content is 100% by mass.
- Epicron N-680 Cresol novolac type epoxy resin manufactured by DIC Corporation. The epoxy equivalent is 211. The resin content is 100% by mass.
- Denacol EX-252 Cyclic aliphatic epoxy resin (hydrogenated bisphenol A type epoxy resin) manufactured by Nagase ChemteX Corporation. Epoxy equivalent is 212. The resin content is 100% by mass.
- Measuring instrument METTLER TGA / DSC1 (manufactured by METTLER TOLEDO) Measurement temperature: 25 ° C-600 ° C Temperature increase rate: 10 ° C / min Measurement atmosphere: nitrogen Sample pan: SII aluminum The results obtained are shown in Table 2 as “decomposition temperature (° C.) of laminate”.
- the curable resin composition of Example 1 using an alcohol-modified polyamideimide resin synthesized using a tricarboxylic acid anhydride having an aliphatic structure as a raw material was obtained in the same manner except that no alcohol modification was performed. As compared with the curable resin composition of Example 1, it was revealed that the gel time at 160 ° C. was long and the storage stability was improved. In addition, the curable resin compositions of Examples 2 and 3 using an alcohol-modified polyamideimide resin synthesized using a tricarboxylic acid anhydride having an aliphatic structure also have a long gel time at 160 ° C. and excellent storage stability. It became clear.
- the curable resin composition of Example 4 using an alcohol-modified polyamideimide resin synthesized using a tricarboxylic acid anhydride having an aromatic structure as a raw material was also obtained in the same manner except that no alcohol modification was performed.
- the gel time at 160 ° C. was long and the storage stability was improved.
- the films prepared using the curable resin compositions of Examples 1 to 4 all have a Tg of 200 ° C. or higher, and have sufficient heat resistance to cope with the recent increase in heat resistance of electronic materials. Had.
- the laminates produced using the curable resin compositions of Examples 1 to 4 all have a high heat-resistant decomposition temperature, suppress decomposition of alcohol-modified sites and elimination of alcohol, and It had sufficient thermal decomposition resistance for application to the material field.
- the thing of Example 4 has no problem in practical use, since the solvent is sufficiently dried, there are irregularities that appear to be caused by the side of the solvent or insufficient melting of the resin in a part of the laminated board. Partly confirmed. Further, in Comparative Example 2, the solvent was sufficiently dried, and not only irregularities that were thought to be caused by the side of the solvent or insufficient melting of the resin were confirmed in a part of the laminated board, but also the laminated board was peeled off. , Can not withstand practical use.
- the curable resin compositions of Examples 1 to 4 and the cured products thereof were able to maintain the heat resistance (high Tg) and transparency of the cured products, and the storage stability of the curable resin compositions. It was excellent and the pot life was long, and this tendency was particularly excellent in Examples 1 to 3 using an alcohol-modified polyamideimide resin synthesized using a tricarboxylic acid anhydride having an aliphatic structure.
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Abstract
Description
(1)ポリアミドイミド樹脂(A1)を、溶剤等で希釈し、KOH水溶液の滴定により酸価(a)を求める。
(2)ポリアミドイミド樹脂(A1)を溶剤等で希釈し、酸無水物基に過剰量のn-ブタノールを反応させた後、KOH水溶液の滴定により酸価(b)を求める。なお、(2)において、酸無水物基とn-ブタノールの反応は、117℃にて行うものとする。酸無水物の消失は赤外スペクトルにて、酸無水物基の特性吸収である1860cm-1が完全に消滅したことで確認する。
(3)上記酸価(a)と酸価(b)の差より、本発明のポリアミドイミド樹脂(A1)中の酸無水物基の濃度を算出し、モル数(M3)に換算する。
また、本発明のアルコール変性ポリアミドイミド樹脂(A2)は、前記した窒素原子及び硫黄原子のいずれも含まない極性溶剤に溶解するポリアミドイミド樹脂が好ましい。このようなポリアミドイミド樹脂の例示としては、分岐型構造を有し、樹脂の酸価が60KOHmg/g以上である分岐型ポリアミドイミド樹脂が挙げられる。
測定装置:東ソー株式会社製 HLC-8120GPC、UV8020
カラム :東ソー株式会社製 TFKguardcolumnhxl-L、TFKgel(G1000HXL、G2000HXL、G3000HXL、G4000HXL)
検出器 :RI(示差屈折計)及びUV(254nm)
測定条件:カラム温度 40℃
溶媒 THF
流束 1.0ml/min
標準 :ポリスチレン標準試料にて検量線作成
試料 :樹脂固形分換算で0.1質量%のTHF溶液をマイクロフィルターでろ過したもの(注入量:200μl)
もちろん、活性エネルギー線と熱とを併用して硬化させることについてもその使用にあたっては、何ら限定がない。
本発明の白色プリプレグは、本発明の硬化性樹脂組成物と白色顔料を含む混合物を、シート状ガラス繊維基材に含浸または塗布させた後、乾燥させてなることを特徴とする。具体的には、本発明の硬化性樹脂組成物と白色顔料を含む混合物を、シート状ガラス繊維基材に含浸または塗布させた後、100~200℃の範囲の乾燥機中で1~60分間の範囲にて半硬化させることを特徴とする。以下に白色プリプレグ、その製造方法を具体的に説明する。
〔ポリアミドイミド樹脂(A1-1)の調製〕
撹拌装置、温度計、コンデンサーを付けたフラスコにPGMAc(プロピレングリコールモノメチルエーテルアセテート)1086g、IPDI3N(イソホロンジイソシアネートから合成されたイソシアヌレート型トリイソシアネート:NCO%=17.2)587.3g(0.80mol)及びシクロヘキサン-1,3,4-トリカルボン酸-3,4-無水物499.1g(2.52mol)を加え、140℃まで昇温した。反応は、発泡とともに進行した。この温度で8時間反応させた。系内は淡黄色の液体となり、赤外スペクトルにて特性吸収を測定した結果、イソシアネート基の特性吸収である2270cm-1が完全に消滅し、1780cm-1、1720cm-1にイミド基の吸収が確認された。酸価は、固形分換算で212KOHmg/gで、分子量はポリスチレン換算で数平均分子量4700であった。酸無水物基の濃度は、固形分換算で1.14mmol/gであった。また、樹脂分の濃度は47.4質量%であった。この樹脂の溶液をポリアミドイミド樹脂(A1-1)の溶液と略記する。
続いて、得られたポリアミドイミド樹脂(A1-1)の溶液にn-ブタノール96.3g(1.3mol)を加え、120℃にて2時間反応させた。赤外スペクトルにて特性吸収を測定した結果、酸無水物基の特性吸収である1860cm-1の質量吸収が完全に消失した。酸価は、固形分換算で、148KOHmg/gで、分子量はポリスチレン換算で数平均分子量4800であった。また、樹脂分の濃度は49.2質量%であった。この樹脂の溶液をアルコール変性ポリアミドイミド樹脂(A2-1)と略記する。
〔ポリアミドイミド樹脂(A1-2)の調製〕
撹拌装置、温度計、コンデンサーを付けたフラスコにEDGA(ジエチレングリコールモノエチルエーテルアセテート)4628g、IPDI3N(イソホロンジイソシアネートから合成されたイソシアヌレート型トリイソシアネート:NCO%=17.2)2070g(2.83mol)及びシクロヘキサン-1,3,4-トリカルボン酸-3,4-無水物1386g(7mol)を加え、140℃まで昇温した。反応は、発泡とともに進行した。この温度で8時間反応させた。系内は淡黄色の液体となり、赤外スペクトルにて特性吸収を測定した結果、イソシアネート基の特性吸収である2270cm-1が完全に消滅し、1780cm-1、1720cm-1にイミド基の吸収が確認された。酸価は、固形分換算で140KOHmg/gで、分子量はポリスチレン換算で数平均分子量5800であった。酸無水物基の濃度は、固形分換算で0.75mmol/gであった。また、樹脂分の濃度は40質量%であった。この樹脂の溶液をポリアミドイミド樹脂(A1-2)の溶液と略記する。
続いて、得られたポリアミドイミド樹脂(A1-2)の溶液に2-エチルヘキサノール326g(2.5mol)を加え、120℃にて2時間反応させた。赤外スペクトルにて特性吸収を測定した結果、酸無水物基の特性吸収である1860cm-1の吸収が完全に消失した。酸価は、固形分換算で、98KOHmg/gで、分子量はポリスチレン換算で数平均分子量6000であった。また、樹脂分の濃度は40.9質量%であった。この樹脂の溶液をアルコール変性ポリアミドイミド樹脂(A2-2)と略記する。
〔アルコール変性ポリアミドイミド樹脂(A2-3)の調製〕
n-ブタノール96.3g(1.3mol)の替りにブチルセロソルブ153.7g(1.3mol)をポリアミドイミド樹脂溶液(A1-1)に加え、120℃にて2時間反応させたこと以外は合成例1と同様にして、アルコール変性ポリアミドイミド樹脂(A2-3)を得た。赤外スペクトルにて特性吸収を測定した結果、酸無水物基の特性吸収である1860cm-1の吸収が完全に消失した。酸価は、固形分換算で、145KOHmg/gで、分子量はポリスチレン換算で数平均分子量4900であった。また、樹脂分の濃度は50.2質量%であった。
〔ポリアミドイミド樹脂(A1-4)の調製〕
撹拌装置、温度計、コンデンサーを付けたフラスコにPGMAc(プロピレングリコールモノメチルエーテルアセテート)1569g、IPDI3N(イソホロンジイソシアネートから合成されたイソシアヌレート型トリイソシアネート:NCO%=17.2)959g(1.31mol)及び無水トリメリット酸791g(4.12mol)を加え、140℃まで昇温した。反応は、発泡とともに進行した。この温度で8時間反応させた。系内は淡黄色の液体となり、赤外スペクトルにて特性吸収を測定した結果、イソシアネート基の特性吸収である2270cm-1が完全に消滅し、1780cm-1、1720cm-1にイミド基の吸収が確認された。酸価は、固形分換算で185KOHmg/gで、分子量はポリスチレン換算で数平均分子量5700であった。酸無水物基の濃度は、固形分換算で0.57mmol/gであった。また、樹脂分の濃度は50.2重量%であった。この樹脂の溶液をポリアミドイミド樹脂(A1-4)の溶液と略記する。
続いて、得られたイミド樹脂(A1-4)の溶液にn-ブタノール79.9g(1.08mol)を加え、120℃にて5時間反応させた。赤外スペクトルにて特性吸収を測定した結果、酸無水物基の特性吸収である1860cm-1の吸収が完全に消失した。酸価は、固形分換算で、153KOHmg/gで、分子量はポリスチレン換算で数平均分子量5800であった。また、樹脂分の濃度は51.1質量%であった。この樹脂の溶液をアルコール変性ポリアミドイミド樹脂(A2-4)と略記する。
撹拌装置、温度計、コンデンサーを付けたフラスコにPGMAc(プロピレングリコールモノメチルエーテルアセテート)1086g、IPDI3N(イソホロンジイソシアネートから合成されたイソシアヌレート型トリイソシアネート:NCO%=17.2)587.3g(0.80mol)及びシクロヘキサン-1,3,4-トリカルボン酸-3,4-無水物499.1g(2.52mol)を加え、140℃まで昇温した。反応は、発泡とともに進行した。この温度で8時間反応させた。系内は淡黄色の液体となり、赤外スペクトルにて特性吸収を測定した結果、イソシアネート基の特性吸収である2270cm-1が完全に消滅し、1780cm-1、1720cm-1にイミド基の吸収が確認された。酸価は、固形分換算で212KOHmg/gで、分子量はポリスチレン換算で数平均分子量4700であった。酸無水物基の濃度は、固形分換算で1.14mmol/gであった。また、樹脂分の濃度は47.4質量%であった。この樹脂の溶液を比較用ポリアミドイミド樹脂(a1)の溶液と略記する。
撹拌装置、温度計、コンデンサーを付けたフラスコにPGMAc(プロピレングリコールモノメチルエーテルアセテート)1569g、IPDI3N(イソホロンジイソシアネートから合成されたイソシアヌレート型トリイソシアネート:NCO%=17.2)959g(1.31mol)及び無水トリメリット酸791g(4.12mol)を加え、140℃まで昇温した。反応は、発泡とともに進行した。この温度で8時間反応させた。系内は淡黄色の液体となり、赤外スペクトルにて特性吸収を測定した結果、イソシアネート基の特性吸収である2270cm-1が完全に消滅し、1780cm-1、1720cm-1にイミド基の吸収が確認された。酸価は、固形分換算で185KOHmg/gで、分子量はポリスチレン換算で数平均分子量5700であった。酸無水物基の濃度は、固形分換算で0.57mmol/gであった。また、樹脂分の濃度は50.2質量%であった。この樹脂の溶液を比較用ポリアミドイミド樹脂(a2)の溶液と略記する。
上記で得られたアルコール変性ポリアミドイミド樹脂(A2-1)、同(A2-2)、同(A2-3)、同(A2-4)、比較用ポリアミドイミド樹脂(a1)、同(a2)を用いて、表1に記載した配合条件で、硬化性樹脂組成物1~6を製造した。
EHPE3150:ダイセル化学工業株式会社製の環式脂肪族系エポキシ樹脂(2,2-ビス(ヒドロキシメチル)-1-ブタノールの1,2-エポキシ-4-(2-オキシラニル)シクロヘキサン付加物)。エポキシ当量は177。樹脂分の濃度は100質量%。
エピクロンN-680:DIC株式会社製のクレゾールノボラック型エポキシ樹脂。エポキシ当量は211。樹脂分の濃度は100質量%。
デナコールEX-252:ナガセケムテックス株式会社製の環式脂肪族系エポキシ樹脂(水添ビスフェノールA型エポキシ樹脂)。エポキシ当量は212。樹脂分の濃度は100質量%。
160℃に加熱したホットプレート上で加熱し、当該硬化性樹脂組成物1~6の糸引きがなくなるまでの時間をそれぞれ測定した。得られた結果を表2に「160℃ゲルタイム」として示した。
・測定用試験片の作成
前記硬化性樹脂組成物1~6を硬化後の膜厚が25~35ミクロンになるように、ブリキ基板上に塗装を行った。次いでこの塗装板を50℃の乾燥機で30分乾燥した後、100℃で30分乾燥させ、最後に170℃で1時間硬化させ硬化塗膜を作成した。室温まで冷却した後、硬化塗膜を所定の大きさに切り出し、基板から単離して測定用試料とした。
動的粘弾性を測定し、得られたスペクトルのTanδの最大の温度をTGとした。尚、 動的粘弾性は、以下の条件で測定した。
測定機器:レオバイブロンRSA-II(レオメトッリク社製)
治具:引っ張り
チャック間:20mm
測定温度:25℃~400℃
測定周波数:1HZ
昇温速度:3℃/min
得られた結果を表2に「フィルムのTg(℃)」として示した。
最終的に各熱硬化性樹脂組成物1~6の不揮発分(N.V.)が58質量%となるように、さらにメチルエチルケトンを配合して調整した。
次いで、下記の如き条件で硬化させて積層板を試作し、下記の方法で評価した。
・積層板作製条件
基材:日東紡績株式会社製 ガラスクロス「#2116」(210×280mm)
プライ数:6 プリプレグ化条件:160℃
硬化条件:200℃、40kg/cm2で1.5時間、成型後板厚:0.8mm
・積層板の分解温度の測定方法
熱質量測定装置を用いて測定した、昇温前の質量に対して5質量%減少する温度を熱分解温度(℃)とした。
測定機器:METTLER TGA/DSC1(メトラー・トレド株式会社製)
測定温度:25℃~600℃
昇温速度:10℃/min
測定雰囲気:窒素
サンプルパン:SIIアルミ
得られた結果を表2に「積層板の分解温度(℃)」として示した。
・測定用試験片の作成
硬化性樹脂組成物1~6を硬化後の膜厚が25~35ミクロンになるように、ブリキ基板上に塗装を行った。次いでこの塗装板を50℃の乾燥機で30分乾燥した後、100℃で30分乾燥させ、最後に170℃で1時間硬化させ硬化塗膜を作成した。室温まで冷却した後、硬化塗膜を所定の大きさに切り出し、基板から単離して測定用試料とした。
以下の条件で光線透過率を測定した。測定値は光線透過率(%)である。
測定機器:分光光度計 U-2800(日立ハイテクノロジーズ株式会社製)
測定波長範囲:250nm~800nm
得られた結果を表3に示した。
一方、芳香族構造を有するトリカルボン酸無水物を原料として合成されたアルコール変性ポリアミドイミド樹脂を用いた実施例4の硬化性樹脂組成物も、アルコール変性を行わなかったこと以外は同様にして得られた比較例2の硬化性樹脂組成物と対比して、160℃でのゲルタイムが長く、貯蔵安定性が向上したことが明らかとなった。
Claims (13)
- 脂肪族構造を有するイソシアネートから合成されたイソシアヌレート型ポリイソシアネート(a1)とトリカルボン酸無水物(a2)とを反応させてポリアミドイミド樹脂(A1)を生成した後、アルコール化合物(a3)を反応させて得られるアルコール変性ポリアミドイミド樹脂。
- 脂肪族構造を有するイソシアネートから合成されたイソシアヌレート型ポリイソシアネート(a1)とトリカルボン酸無水物(a2)とを反応させ、赤外吸収スペクトル測定においてイソシアネート基の特性吸収である2270cm-1が消滅したポリアミドイミド樹脂(A1)に対して、アルコール化合物(a3)を反応させて得られたものである、請求項1記載のアルコール変性ポリアミドイミド樹脂。
- 前記脂肪族構造を有するイソシアネートから合成されたイソシアヌレート型ポリイソシアネート(a1)のイソシアネート基のモル数(N)と、トリカルボン酸無水物(a2)のカルボキシ基のモル数(M1)及び酸無水物基モル数(M2)の合計のモル数との比〔(M1)+(M2))/(N)〕が1.1~3である請求項1または2記載のアルコール変性ポリアミドイミド樹脂。
- 前記ポリアミドイミド樹脂(A1)とアルコール化合物(a3)との反応は、該ポリアミドイミド樹脂(A1)中の酸無水物基モル数(M3)と、アルコール化合物(a3)の水酸基のモル数(L)との比、M3/L=1~5の範囲である請求項1~3の何れか一項記載のアルコール変性ポリアミドイミド樹脂。
- 前記トリカルボン酸無水物(a2)が脂肪族構造を有するトリカルボン酸無水物である請求項1~4の何れか一項に記載のアルコール変性ポリアミドイミド樹脂。
- イソシアヌレート型ポリイソシアネート化合物(a1)が環式脂肪族構造を有するイソシアネートから合成されたイソシアヌレート型ポリイソシアネートであり、脂肪族構造を有するトリカルボン酸無水物(a2)が環式脂肪族構造を有するトリカルボン酸無水物である請求項1~5の何れか一項に記載のアルコール変性ポリアミドイミド樹脂。
- 前記環式脂肪族構造を有するイソシアヌレート型ポリイソシアネート化合物がイソホロンジイソシアネートから合成されたイソシアヌレート型トリイソシアネート(5量体等の重合体を含む)であり、環式脂肪族構造を有するトリカルボン酸無水物がシクロヘキサン-1,3,4-トリカルボン酸-3,4-無水物である請求項6記載のアルコール変性ポリアミドイミド樹脂。
- 酸価が70~210KOHmg/gである請求項1~7の何れか一項に記載のアルコール変性ポリアミドイミド樹脂。
- 窒素原子及び硫黄原子のいずれも含まない極性溶剤に溶解する請求項1~8の何れか1項に記載のアルコール変性ポリアミドイミド樹脂。
- 請求項1~9のいずれか1項記載のアルコール変性ポリアミドイミド樹脂(A2)と、硬化性樹脂(B)及び/又は反応性希釈剤(C)とを含有することを特徴とする硬化性樹脂組成物。
- さらに、光重合開始剤(D)を含有する請求項10項記載の硬化性樹脂組成物。
- 硬化性樹脂(B)が、分子中に2個以上のエポキシ基を有するエポキシ化合物(B1)である請求項10または11記載の硬化性樹脂組成物。
- 請求項10~12の何れか一項記載の硬化性樹脂組成物を硬化させてなることを特徴とする硬化物。
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Also Published As
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EP3023449B1 (en) | 2021-07-14 |
CN105408394B (zh) | 2017-09-22 |
CN105408394A (zh) | 2016-03-16 |
KR102051442B1 (ko) | 2019-12-03 |
EP3023449A4 (en) | 2017-03-22 |
JPWO2015008744A1 (ja) | 2017-03-02 |
US10202493B2 (en) | 2019-02-12 |
US20160152773A1 (en) | 2016-06-02 |
KR20160034252A (ko) | 2016-03-29 |
EP3023449A1 (en) | 2016-05-25 |
JP5839149B2 (ja) | 2016-01-06 |
TW201510081A (zh) | 2015-03-16 |
TWI621663B (zh) | 2018-04-21 |
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