WO2010096988A1 - 一种制备负载型钯或钯合金膜的方法 - Google Patents
一种制备负载型钯或钯合金膜的方法 Download PDFInfo
- Publication number
- WO2010096988A1 WO2010096988A1 PCT/CN2009/075184 CN2009075184W WO2010096988A1 WO 2010096988 A1 WO2010096988 A1 WO 2010096988A1 CN 2009075184 W CN2009075184 W CN 2009075184W WO 2010096988 A1 WO2010096988 A1 WO 2010096988A1
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- WIPO (PCT)
- Prior art keywords
- palladium
- porous ceramic
- pencil
- porous
- electroless plating
- Prior art date
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- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 title claims abstract description 135
- 229910052763 palladium Inorganic materials 0.000 title claims abstract description 67
- 229910001252 Pd alloy Inorganic materials 0.000 title claims abstract description 17
- 239000012528 membrane Substances 0.000 title abstract description 24
- 238000004519 manufacturing process Methods 0.000 title abstract 2
- 239000000919 ceramic Substances 0.000 claims abstract description 55
- 238000000034 method Methods 0.000 claims abstract description 42
- 238000007772 electroless plating Methods 0.000 claims abstract description 26
- 239000000758 substrate Substances 0.000 claims description 26
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 21
- 229910002804 graphite Inorganic materials 0.000 claims description 21
- 239000010439 graphite Substances 0.000 claims description 21
- 229910052751 metal Inorganic materials 0.000 claims description 13
- 239000002184 metal Substances 0.000 claims description 13
- 238000007747 plating Methods 0.000 claims description 12
- 239000011148 porous material Substances 0.000 claims description 12
- OAKJQQAXSVQMHS-UHFFFAOYSA-N hydrazine group Chemical group NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 10
- 230000007547 defect Effects 0.000 claims description 8
- 239000000203 mixture Substances 0.000 claims description 8
- 238000001354 calcination Methods 0.000 claims description 7
- 239000003638 chemical reducing agent Substances 0.000 claims description 7
- 101150003085 Pdcl gene Proteins 0.000 claims description 6
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 5
- 238000000151 deposition Methods 0.000 claims description 5
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 3
- 150000002739 metals Chemical class 0.000 claims description 3
- SWELZOZIOHGSPA-UHFFFAOYSA-N palladium silver Chemical group [Pd].[Ag] SWELZOZIOHGSPA-UHFFFAOYSA-N 0.000 claims description 2
- 229910000881 Cu alloy Inorganic materials 0.000 claims 1
- 238000005275 alloying Methods 0.000 claims 1
- 229910052739 hydrogen Inorganic materials 0.000 abstract description 13
- 239000001257 hydrogen Substances 0.000 abstract description 13
- 238000012986 modification Methods 0.000 abstract description 11
- 230000004048 modification Effects 0.000 abstract description 11
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 abstract description 9
- 230000035699 permeability Effects 0.000 abstract description 6
- 230000008569 process Effects 0.000 abstract description 4
- 230000003746 surface roughness Effects 0.000 abstract description 2
- 206010061619 Deformity Diseases 0.000 abstract 1
- 238000000576 coating method Methods 0.000 description 9
- 238000002360 preparation method Methods 0.000 description 9
- 239000010410 layer Substances 0.000 description 8
- 238000001994 activation Methods 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 7
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 6
- 239000004927 clay Substances 0.000 description 6
- 239000002131 composite material Substances 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- 238000000926 separation method Methods 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 5
- 230000004913 activation Effects 0.000 description 5
- 239000000084 colloidal system Substances 0.000 description 5
- 238000003980 solgel method Methods 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 239000000956 alloy Substances 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 150000002431 hydrogen Chemical class 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 238000009713 electroplating Methods 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 239000011159 matrix material Substances 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 238000012876 topography Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 230000004584 weight gain Effects 0.000 description 3
- 235000019786 weight gain Nutrition 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical group O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 239000003054 catalyst Substances 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000002386 leaching Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000002715 modification method Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000010970 precious metal Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000008399 tap water Substances 0.000 description 2
- 235000020679 tap water Nutrition 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 229910002668 Pd-Cu Inorganic materials 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002378 acidificating effect Effects 0.000 description 1
- 229910000323 aluminium silicate Inorganic materials 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000012700 ceramic precursor Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012065 filter cake Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000008098 formaldehyde solution Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 239000005373 porous glass Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001235 sensitizing effect Effects 0.000 description 1
- 239000010944 silver (metal) Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000012795 verification Methods 0.000 description 1
Classifications
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/45—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements
- C04B41/50—Coating or impregnating, e.g. injection in masonry, partial coating of green or fired ceramics, organic coating compositions for adhering together two concrete elements with inorganic materials
- C04B41/51—Metallising, e.g. infiltration of sintered ceramic preforms with molten metal
- C04B41/5122—Pd or Pt
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/22—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion
- B01D53/228—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by diffusion characterised by specific membranes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D67/00—Processes specially adapted for manufacturing semi-permeable membranes for separation processes or apparatus
- B01D67/0039—Inorganic membrane manufacture
- B01D67/0069—Inorganic membrane manufacture by deposition from the liquid phase, e.g. electrochemical deposition
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D69/00—Semi-permeable membranes for separation processes or apparatus characterised by their form, structure or properties; Manufacturing processes specially adapted therefor
- B01D69/10—Supported membranes; Membrane supports
- B01D69/105—Support pretreatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D71/00—Semi-permeable membranes for separation processes or apparatus characterised by the material; Manufacturing processes specially adapted therefor
- B01D71/02—Inorganic material
- B01D71/022—Metals
- B01D71/0223—Group 8, 9 or 10 metals
- B01D71/02231—Palladium
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/009—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone characterised by the material treated
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
- C04B41/80—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone of only ceramics
- C04B41/81—Coating or impregnation
- C04B41/85—Coating or impregnation with inorganic materials
- C04B41/88—Metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1635—Composition of the substrate
- C23C18/1644—Composition of the substrate porous substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1646—Characteristics of the product obtained
- C23C18/165—Multilayered product
- C23C18/1651—Two or more layers only obtained by electroless plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/1601—Process or apparatus
- C23C18/1633—Process of electroless plating
- C23C18/1689—After-treatment
- C23C18/1692—Heat-treatment
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/18—Pretreatment of the material to be coated
- C23C18/1851—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material
- C23C18/1872—Pretreatment of the material to be coated of surfaces of non-metallic or semiconducting in organic material by chemical pretreatment
- C23C18/1886—Multistep pretreatment
- C23C18/1889—Multistep pretreatment with use of metal first
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/38—Coating with copper
- C23C18/40—Coating with copper using reducing agents
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/42—Coating with noble metals
- C23C18/44—Coating with noble metals using reducing agents
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2256/00—Main component in the product gas stream after treatment
- B01D2256/16—Hydrogen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2257/00—Components to be removed
- B01D2257/10—Single element gases other than halogens
- B01D2257/108—Hydrogen
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2325/00—Details relating to properties of membranes
- B01D2325/04—Characteristic thickness
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2111/00—Mortars, concrete or artificial stone or mixtures to prepare them, characterised by specific function, property or use
- C04B2111/00474—Uses not provided for elsewhere in C04B2111/00
- C04B2111/00793—Uses not provided for elsewhere in C04B2111/00 as filters or diaphragms
- C04B2111/00801—Membranes; Diaphragms
Definitions
- the present invention relates to a surface modification of a porous ceramic substrate and its application to the preparation of a supported hydrogen permeable palladium or palladium alloy film. Background technique
- the metal palladium film (including the palladium alloy film) has excellent hydrogen permeability and selectivity, and any gas other than hydrogen cannot pass through the palladium film, and it has been used as a hydrogen separator and a purifier.
- the palladium membrane also has good high temperature stability and has broad application prospects in the field of hydrogen separation.
- the palladium or palladium alloy layer is supported on the porous base material to form a supported palladium film, which is also called a composite palladium film, which can greatly reduce the film thickness, which not only saves the precious metal palladium but also increases the hydrogen permeability, because the hydrogen permeability of the palladium film It is inversely proportional to its thickness.
- the matrix material of the palladium membrane is mainly porous ceramics and porous metals, but the former is mainly due to its excellent stability and wide market sources.
- electroless plating is recognized as the best method. Before electroless plating, it is generally necessary to deposit a layer of metal particles on the surface of the substrate as a catalyst [Huang Yan, Li Xue, Fan Yiqun, Xu Nanping. Research progress of hydrogen palladium composite membrane: principle, preparation and characterization. Progress in chemistry,
- the purpose of surface modification of porous ceramics is to produce a surface layer with no defects, uniformity and low roughness.
- the coating method is most commonly used.
- the coating materials are A1 2 0 3 , Zr0 2 , Si0 2 , MgO, Ti0 2 . Etc., the implementation of the coating is mainly a sol-gel method. Specifically, the ceramic precursor is made into a sol and coated on the surface of the substrate, dried to form a gel, and finally subjected to high temperature treatment to decompose the gel into a porous ceramic thin layer [XL Zhang, GX Xiong, WS Yang, A modified electroless Plating technique for thin dense palladium composite membranes with Enhanced stability, J. Membr.
- the object of the present invention is to develop a method for preparing a supported palladium or palladium alloy film by using a graphite pencil to modify a porous ceramic surface, in order to prepare a porous substrate for a supported palladium film (including a palladium alloy film), and to use a graphite pencil in the present invention.
- Modifying the porous ceramic surface is a simple and effective porous ceramic surface modification technology to replace the more sol-gel method.
- a specific technical solution of the present invention is: A method for preparing a supported palladium or palladium alloy film, the specific steps of which are as follows:
- the surface of the porous ceramic is coated to reduce the roughness of the porous ceramic surface and fill the surface defects of the porous ceramic; or the graphite pencil core is directly coated on the surface of the porous ceramic, and then the porous ceramic is The substrate is calcined; the modified porous ceramic substrate is obtained;
- the modified porous ceramic substrate is activated, and a palladium or palladium alloy film is prepared by electroless plating.
- the graphite pencil refill is an excellent finishing material.
- the refill material of a regular pencil consists of graphite and clay.
- Clay is a natural aluminosilicate with fine particle size and good dispersibility. Clay has good plasticity like graphite. The greater the amount of clay incorporated in the pencil lead, the harder the refill. People use "H” to indicate the hardness of the pencil, and "B" to indicate the softness of the pencil.
- the pencil refill is a mixture of graphite and clay.
- the chemical properties of the pencil are extremely stable, which neither hinders the preparation of the palladium membrane nor fully satisfies the working conditions of the palladium membrane.
- the main use of palladium membranes is for hydrogen separation, and its working temperature The degree generally does not exceed 500 ° C.
- pure graphite can be used to form a modified layer on the surface of the porous ceramic, the effect of the clay is very important. In addition to increasing the hardness, it also contributes to the gas permeability of the modified layer.
- the porous ceramic may be calcined after the modification is completed, or the core may be calcined in advance; the calcination temperature is 300 to 800 ° C, and the calcination time is 0.5 to 10 h.
- An important property of graphite is electrical conductivity, so graphite modification can change the surface of the porous ceramic from insulation to electrical conduction.
- the surface of the substrate In order to initiate electroless plating uniformly and rapidly on the surface of the substrate, the surface of the substrate must be catalytically active. Generally, any electrically conductive substance can catalyze electroless plating, and graphite is one of them, which has also been obtained in our experiments. Verification. However, the graphite surface has a slower initiation rate for electroless plating and more film defects, which is caused by the low catalytic activity of graphite. Therefore, this patent still proposes to activate the graphite modified layer.
- the most used substrate activation is a metal palladium catalyst, that is, a layer of nano-scale metal palladium particles is deposited on the surface of the substrate before electroless plating.
- a metal palladium catalyst that is, a layer of nano-scale metal palladium particles is deposited on the surface of the substrate before electroless plating.
- There are many methods for depositing palladium particles the most common of which is palladium leaching, and there are many kinds of palladium leaching methods, the most common of which is the colloidal palladium method, such as the SnCl 2 /PdCl 2 method.
- the research group also invented a Pd(OH) ⁇ S method; for example, Huang Yan, Fan Jingjing, Shu Shili, Hu Xiaojuan.
- the preparation method of the palladium alloy film is generally to first palladium electrolessly and then deposit other metals by electroless plating, electroplating or other methods, and finally form an alloy by heat treatment.
- the most commonly used palladium alloy film is a palladium silver or palladium copper film, and the deposition method of silver and copper is also mainly electroless plating.
- the composition of the copper plating solution is CuS0 4 .5H 2 0 5-15 g / L, NaOH 5-20 g / L, KNaC 4 H 4 0 6 .4H 2 0 40-50 g / L, the reducing agent is HCHO;
- the composition of the silver plating solution is AgN0 3 2-10 g/L, Na 2 EDTA 30-50 g/L concentrated ammonia water 300 ⁇ 600 ml/L, and the reducing agent is hydrazine.
- the technical idea proposed by the invention is not limited to the preparation of metal palladium membranes, but also can be used for the preparation of other metal films or alloy films, such as Ag, Pt, Cu, Ni films, Pd-Ag, Pd-Cu alloy films, etc. .
- the substrate modification method of the present invention is applicable not only to porous ceramics but also to porous stainless steel, porous glass, porous nickel, porous plastic, porous stainless steel-ceramic composite film, and the like.
- the coating method according to the present invention is not limited to the electroless plating method, but is also applicable to an electroplating method, a chemical vapor deposition method, or the like.
- This patent provides a simpler and easier surface modification method, especially for ordinary porous ceramic substrates with larger pore diameters. Especially effective. It is an environmentally friendly process that completely eliminates the three wastes in the sol-gel process and greatly reduces the cost.
- the prepared palladium film has good uniformity, brightness and adhesion.
- FIG. 1 Appearance of a porous ceramic substrate, wherein (A) an unmodified porous ceramic substrate, (B) a modified porous ceramic substrate, and (C) a supported palladium film prepared in Example 1.
- the A1 2 0 3 porous ceramic tube used is shown in Figure 1 (A).
- the surface SEM morphology is shown in Figure 2.
- the inner diameter is 8 mm, the outer diameter is 12 mm, and the length is 85 mm.
- the average pore diameter and the maximum pore diameter measured by the bubble method were 3 ⁇ and 9 ⁇ , respectively.
- the modified porous ceramic is rinsed with water, then washed with a hot commercial detergent solution, and rinsed with tap water and distilled water.
- the substrate was activated by SnCl 2 /PdCl 2 method, wherein the sensitizing solution contained SnCl 2 5 g/L, concentrated hydrochloric acid 1 ml/L, and the activation solution contained PdCl 2 0.2 g/L, concentrated hydrochloric acid 1 ml/ L. Sensitization-activation treatment 4 times.
- Electroless plating to prepare a palladium film The composition of the bath is: PdCl 2 5 g / L, concentrated ammonia 250 ml / L, Na 2 EDTA 70 g / L.
- the reducing agent was a 0.2 mol/L N 2 H 4 solution. After the coating is completed, it is first rinsed with tap water, then repeatedly rinsed with distilled water, finally immersed in absolute ethanol for 0.5 h, and dried at 120 °C overnight.
- the palladium film thickness is about 5.0 ⁇ according to the weight gain method.
- the obtained palladium film is as shown in Fig. 1 (C), the surface is uniform, bright, and airtight, and its microscopic SEM morphology is shown in Fig. 4.
- the palladium film was found at 400 ° using a ⁇ 2 / ⁇ 2 single gas test.
- the hydrogen permeation permeability at a pressure of 1 bar is 22.5 m 3 /m 2 h, and the H 2 /N 2 selectivity is greater than 200.
- the palladium film prepared by the graphite modification under the same conditions has a H 2 /N 2 selectivity of less than 5.
- porous ceramic has an average pore diameter of 1 ⁇ .
- the porous ceramic surface was repeatedly painted with a commercially available ordinary 2H pencil to form a graphite coating having a pencil lead applied amount of 10 g/m 2 , and then the porous ceramic was baked at 500 ° C for 5 hours.
- Example 1 The same steps (1), (2), (3), (4), and (5) as in Example 1, except that the ceramic substrate was selected to have an average pore diameter of 0.5 m.
- the prepared palladium membrane thickness was 4.5 ⁇ , and the nitrogen leakage amount was 1 ml/min at room temperature 1 bar.
- the steps (1), (2), (3), (4), and (5) of the first embodiment were carried out to have a palladium film thickness of 2.2 ⁇ m.
- the composition of the plating solution was: CuS0 4 .5H 2 0 10 g/L, NaOH 10 g/L, KNaC 4 H 4 0 6 4H 2 045 g/L, and a reducing agent of 0.2 mol/L formaldehyde solution.
- the thickness of the copper plating measured by the weight gain method is 2.0 ⁇ .
- the palladium film thickness was 3.0 ⁇ .
- the composition of the plating solution was: 5 g/L of AgN0 3 , 35 g/L of Na 2 EDTA, and 500 ml/L of concentrated ammonia.
- the reducing agent was a 0.2 mol/L hydrazine solution.
- the cleaning method is the same as the step (5) of the first embodiment.
- the thickness of the silver plating measured by the weight gain method was 3.5 ⁇ .
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Description
说明书
一种制备负载型钯或钯合金膜的方法
技术领域
本发明涉及多孔陶瓷基体的一种表面修饰法,并将其应用于负载型透氢钯或钯合金膜 的制备。 背景技术
金属钯膜 (包括钯合金膜)具有优异的的透氢性和选择性, 除氢气外, 其它任何气体都 不能透过钯膜, 它已被用作氢气分离器和纯化器。钯膜还有着良好的高温稳定性, 在氢分 离领域有着广阔的应用前景。将钯或钯合金层负载于多孔基体材料可形成负载型钯膜,又 叫复合钯膜, 这样可以大大降低膜厚度, 不仅节约了贵金属钯而且提高了透氢率, 因为钯 膜的透氢率与其厚度成反比。钯膜的基体材料主要是多孔陶瓷和多孔金属,但以前者为主, 这要归功于其优异的稳定性和广泛的市场来源。负载型钯膜的制备方法很多,但化学镀法 被公认为最好的方法, 化学镀之前, 一般需要在基体表面沉积一层金属微粒作为催化剂 [黄彦, 李雪, 范益群, 徐南平. 透氢钯复合膜的研究进展: 原理、 制备及表征. 化学进展,
2006, 18(2-3): 230; 俞健, 胡小娟, 黄彦. 多孔不锈钢表面的陶瓷修饰及所负载的透氢钯 膜. 化学进展. 2008, 20(7-8): 1208·]。
钯膜应用过程中面临的一个瓶颈问题是成本,除贵金属钯本身的成本之外,多孔陶瓷 基体的成本也很高。市面上多孔陶瓷的种类繁多, 主要用途是固液分离。多孔陶瓷表面的 孔径和粗糙度对钯膜的制备和性能有巨大的影响: 表面越光滑、孔径越小, 则越有利于制 备出无缺陷的钯膜, 而且能把膜厚控制在一个较低的水平。但是, 这样的多孔陶瓷往往价 格昂贵, 以这样的基体来开发钯膜则失去使用价值。选用孔径大、表面较粗糙的普通多孔 陶瓷则需要对其进行表面修饰。 另一方面, 多孔陶瓷基体上往往有一些缺陷(如裂纹、 孔 洞等), 这些缺陷在固液分离时由于滤饼的形成可能不会造成太大的问题, 但用于气体分 离则不同。 多孔基体的表面缺陷最终引起钯膜的缺陷, 导致氢气的分离选择性下降。
多孔陶瓷表面修饰的目的是使表面产生一层无缺陷、均匀、粗糙度低的表面层, 其中 涂层法最为常用, 涂层材料为 A1203、 Zr02、 Si02、 MgO、 Ti02等, 涂层的实施主要是溶 胶一凝胶法。具体做法是将陶瓷前驱体制成溶胶并涂覆于基体表面,干燥后使其形成凝胶, 最后进行高温处理使凝胶分解为多孔陶瓷薄层 [X.L. Zhang, G.X. Xiong, W.S. Yang, A modified electroless plating technique for thin dense palladium composite membranes with
enhanced stability, J. Membr. Sci., 314 (2008) 226] [ H.B. Zhao, K. Pflanz, J.H. Gu, Preparation of palladium composite membranes by modified electroless plating procedure, J. Membr. Sci., 142 (1998) 147] 溶胶一凝胶工艺条件极其复杂、 成本较高, 容易出现裂纹、 脱落, 而且 孔径较大的多孔陶瓷通过这种方法很难奏效。 徐恒泳等 [徐恒泳, 侯守福, 李文钊, 江魁, 袁立祥. 一种复合金属钯膜或合金钯膜及其制备方法. CN1327942C, 2007] 将上述溶胶一 凝胶法略作了改动, 即在多孔陶瓷表面沉积胶体后暂不进行高温处理,而是先通过化学镀 法在胶体层上制备钯膜, 最后再进行高温热处理, 将胶体分解。但是化学镀过程中, 活化 液呈酸性, 镀液则呈强碱性且含有高浓度的鳌合剂, 胶体的稳定性较弱, 难免会被侵蚀, 而且热处理过程中胶体的分解也可能使钯膜丧失附着力。 发明内容
本专利发明目的是针对负载型钯膜(包括钯合金膜)对多孔基体的要求, 开发一种用 石墨铅笔修饰多孔陶瓷表面以制备负载型钯或钯合金膜的方法,本发明中用石墨铅笔修饰 多孔陶瓷表面是一种简便有效的多孔陶瓷表面修饰技术, 以取代缺点较多的溶胶_凝胶 法。
本发明的具体技术方案为: 一种制备负载型钯或钯合金膜的方法, 其具体步骤如下:
A. 将石墨铅笔笔芯煅烧后,在多孔陶瓷表面涂划以减少多孔陶瓷表面的粗糙度并填 补多孔陶瓷的表面缺陷;或者是用石墨铅笔芯直接在多孔陶瓷表面涂划,再将多孔陶瓷基 体进行煅烧; 得到修饰后的多孔陶瓷基体;
B. 对上述修饰后的多孔陶瓷基体进行活化, 再采用化学镀法制备钯或钯合金膜。 石墨铅笔的笔芯是极佳的修饰材料。普通铅笔的笔芯材料由石墨和粘土组成。粘土是 天然的硅铝酸盐, 粒度细、 分散性好, 粘土与石墨一样也有良好的可塑性。铅笔芯中粘土 的掺入量越大, 则笔芯越硬。 人们用 "H"表示铅笔的硬度, 用" B"表示铅笔的软度, 从软 到硬有 12B、 11B、 10B、 9B 8B 7B 6B 5B 4B 3B 2B B、 F、 HB、 H、 2H 3H、 4H、 5H、 6H、 7H、 8H、 9H、 10H、 11H、 12H共 26个等级。 其中 6B~4H型铅笔芯 的修饰效果最佳。我们发现市售铅笔芯不仅能够满足多孔陶瓷表面修饰的性能要求,而且 修饰成本低廉, 非常便于操作。 铅笔的笔芯形状不限, 铅笔涂敷量一般在 2-50 g/m2, 取 决于多孔陶瓷的孔径和表面粗糙度。 适用的多孔陶瓷平均孔径在 0.5~10 μηι, 优选为 2~5 μιη。
如前所述, 铅笔的笔芯是石墨和粘土的混合物, 二者化学性质极其稳定, 既不会妨碍 钯膜的制备, 也完全能够满足钯膜的工作条件。钯膜的主要用途是用于氢分离, 其工作温
度一般不超过 500°C。虽然用纯的石墨在多孔陶瓷表面磨擦时也可以形成修饰层, 但是粘 土的作用十分重要, 除增加硬度之外, 还有利于修饰层的透气性。
为防止铅笔笔芯杂质可能带来的污染,可在修饰完成后将多孔陶瓷煅烧,或事先将笔 芯煅烧;煅烧的温度为 300~800°C,煅烧时间为 0.5~10 h。石墨的一个重要性质是导电性, 因此石墨修饰可以使多孔陶瓷表面由绝缘变为导电。 尽管可以直接通过电镀来制备金属 膜, 本专利采用化学镀法, 因为化学镀被公认为是制备负载型钯膜的最好方法。化学镀的 原理就是通过还原剂来还原金属离子以形成金属的沉积和生长。为了在基体表面均匀、快 速地引发化学镀, 基体表面必须具有催化活性, 一般而言, 任何能导电的物质均可催化化 学镀, 而石墨就是其中一种, 这也已在我们的试验中得到了验证。但是, 石墨表面对化学 镀的引发速度较慢、 产生的膜缺陷也较多, 这是由于石墨催化活性不高造成的。 因此, 本 专利仍建议对石墨修饰层进行活化。
本专利对基体的活化与化学镀方法没有特殊要求。实践中,基体活化时使用最多的是 金属钯催化剂, 即在化学镀之前, 在基体表面沉积一层纳米级的金属钯微粒。钯微粒的沉 积方法有许多,其中最常用的是浸钯法,而浸钯法也有许多种,其中最常用的是胶体钯法, 如 SnCl2/PdCl2法。 优选本研究组也发明了一种 Pd(OH)^S化法 ; 例如黄彦, 范菁菁, 舒 世立, 胡小娟. 非金属基体化学镀的一种活化工艺. 中国专利申请号 200710022996.6, (2007); 黄彦, 范菁菁, 俞健, 胡小娟. 一种用于吸水性基体表面化学镀的喷雾活化法. 中 国专利申请号 200710134022.7, (2007)。 钯金属的沉积方法为化学镀法, 化学镀金属钯时, 典型的镀液组成为 PdCl2 2~6 g/L、 Na2EDTA 40-80 g/L 浓氨水 100~400 ml/L, 还原剂为 联胺, 又称为肼。钯合金膜的制备方法一般是先化学镀钯然后再通过化学镀、 电镀或其他 方法沉积其它金属, 最后经热处理形成合金。钯合金膜中最常用的是钯银或钯铜膜, 其中 银和铜的沉积方法也主要是化学镀法。一般铜镀液的组成为 CuS04.5H20 5-15 g/L、 NaOH 5-20 g/L、 KNaC4H406.4H20 40-50 g/L, 还原剂为 HCHO; 银镀液的组成为 AgN03 2-10 g/L、 Na2EDTA 30-50 g/L 浓氨水 300~600 ml/L, 还原剂为联胺。
本发明所提出的技术思路不仅仅局限于金属钯膜的制备,还可以用于其它金属膜或合 金膜的制备, 如 Ag、 Pt、 Cu、 Ni膜, Pd-Ag、 Pd-Cu合金膜等。 本发明所述的基体修饰 方法不仅适用于多孔陶瓷, 还适用于多孔不锈钢、 多孔玻璃、 多孔镍、 多孔塑料, 多孔不 锈钢-陶瓷复合膜等。此外本发明所述的镀膜方式不仅局限于化学镀法, 还适用于电镀法、 化学蒸汽沉积法等。
有益效果:
本专利提供了一种更简便易行的表面修饰法,尤其是对孔径较大的普通多孔陶瓷基体
尤其有效。它属于环境友好工艺, 彻底杜绝了溶胶一凝胶工艺中的三废问题, 且成本大大 降低。 所制备的钯膜均匀性、 光亮度、 附着力均较好。 附图说明
图 1. 多孔陶瓷基体外观图, 其中 (A) 未经修饰的多孔陶瓷基体、 (B) 修饰后的多 孔陶瓷基体、 (C) 实施例 1所制备的负载型钯膜。
图 2. 多孔陶瓷表面 SEM形貌图。
图 3. 铅笔修饰后的多孔陶瓷表面 SEM形貌图。
图 4. 所制备的钯膜表面 SEM形貌图。 具体实施方式
实施例 1
(1) . 所用 A1203多孔陶瓷管如图 1 (A) 所示, 表面 SEM形貌见图 2, 其内径为 8 mm, 外径 12 mm, 长 85 mm。 采用泡压法测得的平均孔径和最大孔径分别为 3 μηι和 9 μηι。
(2) . 从市售的普通 2Β铅笔中取出铅笔芯,在 600°C焙烧 4小时。用铅笔芯在多孔陶瓷表 面涂划, 形成一层连续、 均匀、 平滑的石墨涂层, 铅笔芯涂敷量为 5 g/m2, 如图 1 (B) 所 示, 其表面 SEM形貌见图 3。
(3) . 将修饰后的多孔陶瓷用水冲洗, 然后用热的市售洗洁精溶液清洗, 再用自来水和 蒸馏水漂洗。
(4) . 采用 SnCl2/PdCl2法对基体进行活化, 其中敏化液含 SnCl2 5 g/L、 浓盐酸 1 ml/L, 活化液含 PdCl2 0.2 g/L、 浓盐酸 l ml/L。 敏化-活化处理 4次。
(5) . 化学镀制备钯膜。镀液的组成为: PdCl2 5 g/L,浓氨水 250 ml/L, Na2EDTA 70 g/L。 还原剂为 0.2 mol/L 的 N2H4溶液。 镀膜完成后, 先用自来水冲洗, 再用蒸馏水反复漂洗, 最后用无水乙醇浸泡 0.5 h, 在 120 °C干燥过夜。
(6) . 根据增重法算得钯膜厚度约为 5.0 μηι。所制得的钯膜如图 1 (C)所示, 表面均匀、 光亮, 气密性好, 其微观 SEM形貌如图 4所示。采用 Η2/Ν2单气体测试法发现, 该钯膜在 400 °。和压力为 l bar时的透氢渗透率为 22.5 m3/m2h、 H2/N2选择性大于 200。 而同样条件下未进 行石墨修饰所制得的钯膜, H2/N2选择性则小于 5。 实施例 2
( 1 ) 同实施例 1的步骤 (1 ), 但多孔陶瓷的平均孔径为 1 μηι。
(2) 用市售的普通 2H铅笔在多孔陶瓷表面反复涂划以形成石墨涂层, 铅笔芯涂敷量 为 10 g/m2, 然后将多孔陶瓷在 500°C焙烧 5小时。
(3) 同实施例 1的步骤 (4)、 (5)。
(4) 同实施例 1的步骤 (6), 但钯膜厚度为 5.5μηι, 在室温 1 bar条件下测得氮气泄漏 量为 400ml/min。
实施例 3
(1)同实施例 1的步骤(1)、(2)、(3)、(4)、(5),但选用的陶瓷基体平均孔径为 0.5 m。 所制备的钯膜厚度为 4.5 μηι, 在室温 1 bar条件下测得氮气泄漏量为 1 ml/min。
实施例 4
(1) 同实施例 1的步骤 (1)、 (2)、 (3)、 (4)、 (5), 制得的钯膜厚度为 2.2μηι。
(2) 在钯膜上镀铜。 镀液的组成为: CuS04.5H20 10 g/L、 NaOH 10 g/L、 KNaC4H4064H2045 g/L, 还原剂为 0.2mol/L 的甲醛溶液。
(3) 增重法测得镀铜的厚度为 2.0 μηι。
实施例 5
(1) 同实施例 1的步骤 (1)、 (2)、 (3)、 (4)、 (5), 制得的钯膜厚度为 3.0 μηι。
(2) 在钯膜上镀银。 镀液的组成为: 5g/L的 AgN03, 35g/L的 Na2EDTA, 500ml/L的 浓氨水。 还原剂为 0.2mol/L 的联胺溶液。
(3)镀膜完成后, 清洗方法同实施例 1的步骤(5)。增重法测得镀银的厚度为 3.5 μηι。 以上实施例仅是用来说明本发明,在没有脱离本发明精神的情况下所做的任何等效的 变化, 都属于本发明权利要求的范围。
Claims
1. 一种制备负载型钯或钯合金膜的方法, 其具体步骤如下:
A. 将石墨铅笔笔芯煅烧后,在多孔陶瓷表面涂划以减少多孔陶瓷表面的粗糙度并填 补多孔陶瓷的表面缺陷; 或者是用石墨铅笔笔芯直接在多孔陶瓷表面涂划, 再将多孔陶瓷 基体进行煅烧; 得到修饰后的多孔陶瓷基体;
B. 对上述修饰后的多孔陶瓷基体进行活化, 再采用化学镀法制备钯或钯合金膜。
2. 如权利要求 1所述的方法, 其特征在于步骤 A中煅烧的温度为 300~800°C, 煅烧时间 为 0.5-10 h o
3. 如权利要求 1所述的方法, 其特征在于所述多孔陶瓷的平均孔径为 0.5~10
μιη, 优选为 2~5μιη。
4. 如权利要求 1所述的方法, 其特征在于所述石墨铅笔为市售铅笔, 笔芯形状不限, 从 软到硬为 12Β~12Η, 优选 6Β~4Η。
5. 如权利要求 1所述的方法, 其特征在于所述铅笔芯涂敷量为 2~50 g/m2。
6.如权利要求 1所述的方法,其特征在于钯金属的沉积方法为化学镀法,镀液组成为 PdCl2 2~6 g/L、 Na2EDTA 40-80 g/L 浓氨水 100~400 ml/L, 还原剂为联胺溶液。
7. 如权利要求 1所述的方法, 其特征在于钯合金膜是在镀钯后再沉积其它相应金属, 最 后经合金化处理而成。
8. 如权利要求 1所述的方法, 其特征在于所述钯合金为钯银或钯铜合金。
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CN101481263B (zh) * | 2009-02-26 | 2012-02-15 | 南京工业大学 | 一种制备负载型钯或钯合金膜的方法 |
DE102010011269B4 (de) * | 2009-11-10 | 2014-02-13 | Ami Doduco Gmbh | Verfahren zum Abscheiden einer für das Drahtbonden geeigneten Palladiumschicht auf Leiterbahnen einer Schaltungsträgerplatte und Verwendung eines Palladiumbades in dem Verfahren |
CN102120150B (zh) * | 2010-12-08 | 2013-07-03 | 南京工业大学 | 一种齿轮型透氢钯或钯合金膜及氢气分离器 |
CN102154635A (zh) * | 2011-02-24 | 2011-08-17 | 南京工业大学 | 一种多孔不锈钢负载型钯或钯合金膜的制备工艺 |
CN102247764A (zh) * | 2011-07-26 | 2011-11-23 | 南京工业大学 | 一种碳/石墨/多孔基体复合膜及其制备方法和应用 |
CN102527259A (zh) * | 2012-02-10 | 2012-07-04 | 南京工业大学 | 一种复合碳分子筛膜及其制备方法和应用 |
CN107376661B (zh) * | 2017-08-31 | 2020-08-18 | 廊坊师范学院 | 一种钯基复合膜的制备方法 |
CN109954500B (zh) * | 2017-12-25 | 2023-05-05 | 沈阳三聚凯特催化剂有限公司 | 一种铜基骨架复合膜型加氢催化剂和其制备方法以及应用 |
CN112569803B (zh) * | 2019-09-30 | 2022-08-05 | 成都易态科技有限公司 | 复合多孔薄膜的制备方法 |
CN111893526B (zh) * | 2020-08-06 | 2022-05-13 | 中国科学技术大学 | 一种纳米银合金修饰基底及其制备方法和应用 |
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