WO2006057177A1 - 防湿膜用積層フィルム及びその製造方法 - Google Patents
防湿膜用積層フィルム及びその製造方法 Download PDFInfo
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- WO2006057177A1 WO2006057177A1 PCT/JP2005/020834 JP2005020834W WO2006057177A1 WO 2006057177 A1 WO2006057177 A1 WO 2006057177A1 JP 2005020834 W JP2005020834 W JP 2005020834W WO 2006057177 A1 WO2006057177 A1 WO 2006057177A1
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- 230000004888 barrier function Effects 0.000 title claims abstract description 37
- 238000004519 manufacturing process Methods 0.000 title claims description 107
- 239000010408 film Substances 0.000 claims abstract description 715
- 239000010409 thin film Substances 0.000 claims abstract description 251
- 239000010410 layer Substances 0.000 claims abstract description 201
- 239000002253 acid Substances 0.000 claims abstract description 94
- 229920000642 polymer Polymers 0.000 claims abstract description 94
- 239000012044 organic layer Substances 0.000 claims abstract description 68
- 229910052751 metal Inorganic materials 0.000 claims abstract description 58
- 239000002184 metal Substances 0.000 claims abstract description 58
- 238000000862 absorption spectrum Methods 0.000 claims abstract description 42
- 150000003839 salts Chemical class 0.000 claims abstract description 33
- 238000000034 method Methods 0.000 claims description 114
- 239000000853 adhesive Substances 0.000 claims description 81
- 230000001070 adhesive effect Effects 0.000 claims description 76
- 239000012790 adhesive layer Substances 0.000 claims description 47
- 150000002736 metal compounds Chemical class 0.000 claims description 45
- 239000011701 zinc Substances 0.000 claims description 39
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 38
- 230000035699 permeability Effects 0.000 claims description 36
- 238000010030 laminating Methods 0.000 claims description 34
- 229910052725 zinc Inorganic materials 0.000 claims description 34
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 33
- 238000007740 vapor deposition Methods 0.000 claims description 30
- 239000000203 mixture Substances 0.000 claims description 27
- 238000010521 absorption reaction Methods 0.000 claims description 25
- 239000012528 membrane Substances 0.000 claims description 24
- 230000008569 process Effects 0.000 claims description 22
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 20
- 239000006185 dispersion Substances 0.000 claims description 20
- 239000002904 solvent Substances 0.000 claims description 20
- 239000005001 laminate film Substances 0.000 claims description 17
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 13
- 229910052802 copper Inorganic materials 0.000 claims description 13
- 239000010949 copper Substances 0.000 claims description 13
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims description 12
- 238000010183 spectrum analysis Methods 0.000 claims description 12
- 229910052809 inorganic oxide Inorganic materials 0.000 claims description 11
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 10
- 229910052759 nickel Inorganic materials 0.000 claims description 10
- 229910052726 zirconium Inorganic materials 0.000 claims description 10
- 229920000728 polyester Polymers 0.000 claims description 9
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 8
- 238000001228 spectrum Methods 0.000 claims description 8
- 229920006332 epoxy adhesive Polymers 0.000 claims description 4
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims description 3
- 239000000243 solution Substances 0.000 description 83
- 239000000463 material Substances 0.000 description 82
- 238000010438 heat treatment Methods 0.000 description 68
- 239000000758 substrate Substances 0.000 description 55
- 239000007789 gas Substances 0.000 description 52
- 238000000576 coating method Methods 0.000 description 44
- 239000000126 substance Substances 0.000 description 41
- 230000000052 comparative effect Effects 0.000 description 40
- 239000011248 coating agent Substances 0.000 description 38
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 33
- 239000001301 oxygen Substances 0.000 description 33
- 229910052760 oxygen Inorganic materials 0.000 description 33
- -1 ethylene, propylene Chemical group 0.000 description 30
- 239000000047 product Substances 0.000 description 28
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 27
- 238000001035 drying Methods 0.000 description 24
- 238000005259 measurement Methods 0.000 description 21
- 229920005989 resin Polymers 0.000 description 19
- 239000011347 resin Substances 0.000 description 19
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 18
- 238000002835 absorbance Methods 0.000 description 18
- 239000003795 chemical substances by application Substances 0.000 description 18
- 229920001577 copolymer Polymers 0.000 description 18
- 229920002125 Sokalan® Polymers 0.000 description 17
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 16
- 239000007864 aqueous solution Substances 0.000 description 16
- 238000004806 packaging method and process Methods 0.000 description 16
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 15
- 239000004584 polyacrylic acid Substances 0.000 description 15
- 239000003814 drug Substances 0.000 description 14
- 238000012360 testing method Methods 0.000 description 14
- 239000002994 raw material Substances 0.000 description 11
- 230000005540 biological transmission Effects 0.000 description 10
- 229920000139 polyethylene terephthalate Polymers 0.000 description 10
- 239000005020 polyethylene terephthalate Substances 0.000 description 10
- 235000014692 zinc oxide Nutrition 0.000 description 10
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 9
- 229910021529 ammonia Inorganic materials 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 9
- 239000000178 monomer Substances 0.000 description 9
- 229920002799 BoPET Polymers 0.000 description 8
- 239000001099 ammonium carbonate Substances 0.000 description 8
- 235000012501 ammonium carbonate Nutrition 0.000 description 8
- 150000002739 metals Chemical class 0.000 description 8
- 239000011787 zinc oxide Substances 0.000 description 8
- 208000028659 discharge Diseases 0.000 description 7
- 229940079593 drug Drugs 0.000 description 7
- 239000012847 fine chemical Substances 0.000 description 7
- 230000010354 integration Effects 0.000 description 7
- 239000007788 liquid Substances 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 238000004458 analytical method Methods 0.000 description 6
- 150000004649 carbonic acid derivatives Chemical class 0.000 description 6
- 230000015271 coagulation Effects 0.000 description 6
- 238000005345 coagulation Methods 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 6
- 238000000691 measurement method Methods 0.000 description 6
- 238000002156 mixing Methods 0.000 description 6
- 229920003023 plastic Polymers 0.000 description 6
- 239000004033 plastic Substances 0.000 description 6
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 5
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 5
- 239000012298 atmosphere Substances 0.000 description 5
- 239000002131 composite material Substances 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- 238000007667 floating Methods 0.000 description 5
- 229910052814 silicon oxide Inorganic materials 0.000 description 5
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 5
- 230000007704 transition Effects 0.000 description 5
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 4
- 238000005452 bending Methods 0.000 description 4
- 229910017052 cobalt Inorganic materials 0.000 description 4
- 239000010941 cobalt Substances 0.000 description 4
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 230000000875 corresponding effect Effects 0.000 description 4
- 235000019441 ethanol Nutrition 0.000 description 4
- 230000005284 excitation Effects 0.000 description 4
- 238000003475 lamination Methods 0.000 description 4
- 125000000896 monocarboxylic acid group Chemical group 0.000 description 4
- 239000002985 plastic film Substances 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000007639 printing Methods 0.000 description 4
- 230000002441 reversible effect Effects 0.000 description 4
- 150000003752 zinc compounds Chemical class 0.000 description 4
- BQCIDUSAKPWEOX-UHFFFAOYSA-N 1,1-Difluoroethene Chemical compound FC(F)=C BQCIDUSAKPWEOX-UHFFFAOYSA-N 0.000 description 3
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 229920002292 Nylon 6 Polymers 0.000 description 3
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
- 229920002845 Poly(methacrylic acid) Polymers 0.000 description 3
- 239000004952 Polyamide Substances 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 229920002472 Starch Polymers 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 239000003522 acrylic cement Substances 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 239000003153 chemical reaction reagent Substances 0.000 description 3
- 238000003851 corona treatment Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910001882 dioxygen Inorganic materials 0.000 description 3
- 239000012153 distilled water Substances 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 238000011049 filling Methods 0.000 description 3
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 3
- 150000004679 hydroxides Chemical class 0.000 description 3
- 230000001771 impaired effect Effects 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 229910010272 inorganic material Inorganic materials 0.000 description 3
- 239000011147 inorganic material Substances 0.000 description 3
- 230000007774 longterm Effects 0.000 description 3
- 238000004020 luminiscence type Methods 0.000 description 3
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 3
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229920006255 plastic film Polymers 0.000 description 3
- 229920002647 polyamide Polymers 0.000 description 3
- 229920006254 polymer film Polymers 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 229920006395 saturated elastomer Polymers 0.000 description 3
- 238000007790 scraping Methods 0.000 description 3
- 239000008107 starch Substances 0.000 description 3
- 235000019698 starch Nutrition 0.000 description 3
- 229920003002 synthetic resin Polymers 0.000 description 3
- 239000000057 synthetic resin Substances 0.000 description 3
- JAHNSTQSQJOJLO-UHFFFAOYSA-N 2-(3-fluorophenyl)-1h-imidazole Chemical compound FC1=CC=CC(C=2NC=CN=2)=C1 JAHNSTQSQJOJLO-UHFFFAOYSA-N 0.000 description 2
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 description 2
- WSSSPWUEQFSQQG-UHFFFAOYSA-N 4-methyl-1-pentene Chemical compound CC(C)CC=C WSSSPWUEQFSQQG-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 2
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- QUSNBJAOOMFDIB-UHFFFAOYSA-N Ethylamine Chemical compound CCN QUSNBJAOOMFDIB-UHFFFAOYSA-N 0.000 description 2
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 2
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 2
- BAVYZALUXZFZLV-UHFFFAOYSA-N Methylamine Chemical compound NC BAVYZALUXZFZLV-UHFFFAOYSA-N 0.000 description 2
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 2
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 2
- NSEQHAPSDIEVCD-UHFFFAOYSA-N N.[Zn+2] Chemical class N.[Zn+2] NSEQHAPSDIEVCD-UHFFFAOYSA-N 0.000 description 2
- 229920000393 Nylon 6/6T Polymers 0.000 description 2
- 239000004695 Polyether sulfone Substances 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 101001012040 Pseudomonas aeruginosa (strain ATCC 15692 / DSM 22644 / CIP 104116 / JCM 14847 / LMG 12228 / 1C / PRS 101 / PAO1) Immunomodulating metalloprotease Proteins 0.000 description 2
- 229910052581 Si3N4 Inorganic materials 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 239000011358 absorbing material Substances 0.000 description 2
- 229920001284 acidic polysaccharide Polymers 0.000 description 2
- 150000004805 acidic polysaccharides Chemical class 0.000 description 2
- 239000000783 alginic acid Substances 0.000 description 2
- 229920000615 alginic acid Polymers 0.000 description 2
- 235000010443 alginic acid Nutrition 0.000 description 2
- 229960001126 alginic acid Drugs 0.000 description 2
- 150000004781 alginic acids Chemical class 0.000 description 2
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 2
- 150000001342 alkaline earth metals Chemical class 0.000 description 2
- 229920000180 alkyd Polymers 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 239000011575 calcium Substances 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 230000009918 complex formation Effects 0.000 description 2
- 238000010276 construction Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 2
- 238000001514 detection method Methods 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000009820 dry lamination Methods 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- 239000005038 ethylene vinyl acetate Substances 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000001530 fumaric acid Substances 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000012943 hotmelt Substances 0.000 description 2
- 238000002347 injection Methods 0.000 description 2
- 239000007924 injection Substances 0.000 description 2
- 229910052749 magnesium Inorganic materials 0.000 description 2
- 239000011777 magnesium Substances 0.000 description 2
- 150000004706 metal oxides Chemical class 0.000 description 2
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 2
- 229920006284 nylon film Polymers 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 239000008188 pellet Substances 0.000 description 2
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 2
- 229920001200 poly(ethylene-vinyl acetate) Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920001225 polyester resin Polymers 0.000 description 2
- 239000004645 polyester resin Substances 0.000 description 2
- 229920006393 polyether sulfone Polymers 0.000 description 2
- 239000011112 polyethylene naphthalate Substances 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920000098 polyolefin Polymers 0.000 description 2
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 238000001028 reflection method Methods 0.000 description 2
- 239000000565 sealant Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 2
- 239000004071 soot Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- PGAPATLGJSQQBU-UHFFFAOYSA-M thallium(i) bromide Chemical compound [Tl]Br PGAPATLGJSQQBU-UHFFFAOYSA-M 0.000 description 2
- 238000005979 thermal decomposition reaction Methods 0.000 description 2
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 2
- RNWHGQJWIACOKP-UHFFFAOYSA-N zinc;oxygen(2-) Chemical class [O-2].[Zn+2] RNWHGQJWIACOKP-UHFFFAOYSA-N 0.000 description 2
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- VFWCMGCRMGJXDK-UHFFFAOYSA-N 1-chlorobutane Chemical compound CCCCCl VFWCMGCRMGJXDK-UHFFFAOYSA-N 0.000 description 1
- FCBJLBCGHCTPAQ-UHFFFAOYSA-N 1-fluorobutane Chemical compound CCCCF FCBJLBCGHCTPAQ-UHFFFAOYSA-N 0.000 description 1
- OEPOKWHJYJXUGD-UHFFFAOYSA-N 2-(3-phenylmethoxyphenyl)-1,3-thiazole-4-carbaldehyde Chemical compound O=CC1=CSC(C=2C=C(OCC=3C=CC=CC=3)C=CC=2)=N1 OEPOKWHJYJXUGD-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 1
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 1
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- UXVMQQNJUSDDNG-UHFFFAOYSA-L Calcium chloride Chemical compound [Cl-].[Cl-].[Ca+2] UXVMQQNJUSDDNG-UHFFFAOYSA-L 0.000 description 1
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 1
- 229920002284 Cellulose triacetate Polymers 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229920000742 Cotton Polymers 0.000 description 1
- 229920000089 Cyclic olefin copolymer Polymers 0.000 description 1
- 239000004713 Cyclic olefin copolymer Substances 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
- 239000004831 Hot glue Substances 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- JVTAAEKCZFNVCJ-UHFFFAOYSA-M Lactate Chemical compound CC(O)C([O-])=O JVTAAEKCZFNVCJ-UHFFFAOYSA-M 0.000 description 1
- JHWNWJKBPDFINM-UHFFFAOYSA-N Laurolactam Chemical compound O=C1CCCCCCCCCCCN1 JHWNWJKBPDFINM-UHFFFAOYSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 229920000299 Nylon 12 Polymers 0.000 description 1
- 229920002302 Nylon 6,6 Polymers 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- 239000004696 Poly ether ether ketone Substances 0.000 description 1
- 229920002319 Poly(methyl acrylate) Polymers 0.000 description 1
- 229920000331 Polyhydroxybutyrate Polymers 0.000 description 1
- 239000004721 Polyphenylene oxide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NNLVGZFZQQXQNW-ADJNRHBOSA-N [(2r,3r,4s,5r,6s)-4,5-diacetyloxy-3-[(2s,3r,4s,5r,6r)-3,4,5-triacetyloxy-6-(acetyloxymethyl)oxan-2-yl]oxy-6-[(2r,3r,4s,5r,6s)-4,5,6-triacetyloxy-2-(acetyloxymethyl)oxan-3-yl]oxyoxan-2-yl]methyl acetate Chemical compound O([C@@H]1O[C@@H]([C@H]([C@H](OC(C)=O)[C@H]1OC(C)=O)O[C@H]1[C@@H]([C@@H](OC(C)=O)[C@H](OC(C)=O)[C@@H](COC(C)=O)O1)OC(C)=O)COC(=O)C)[C@@H]1[C@@H](COC(C)=O)O[C@@H](OC(C)=O)[C@H](OC(C)=O)[C@H]1OC(C)=O NNLVGZFZQQXQNW-ADJNRHBOSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 229920003232 aliphatic polyester Polymers 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 229920003180 amino resin Polymers 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- ATBAMAFKBVZNFJ-UHFFFAOYSA-N beryllium atom Chemical compound [Be] ATBAMAFKBVZNFJ-UHFFFAOYSA-N 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- 244000309464 bull Species 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- QHIWVLPBUQWDMQ-UHFFFAOYSA-N butyl prop-2-enoate;methyl 2-methylprop-2-enoate;prop-2-enoic acid Chemical compound OC(=O)C=C.COC(=O)C(C)=C.CCCCOC(=O)C=C QHIWVLPBUQWDMQ-UHFFFAOYSA-N 0.000 description 1
- 239000001110 calcium chloride Substances 0.000 description 1
- 229910001628 calcium chloride Inorganic materials 0.000 description 1
- 150000001720 carbohydrates Chemical class 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-N carbonic acid Chemical compound OC(O)=O BVKZGUZCCUSVTD-UHFFFAOYSA-N 0.000 description 1
- 239000001768 carboxy methyl cellulose Substances 0.000 description 1
- 235000010948 carboxy methyl cellulose Nutrition 0.000 description 1
- 150000007942 carboxylates Chemical class 0.000 description 1
- 150000001734 carboxylic acid salts Chemical class 0.000 description 1
- 239000008112 carboxymethyl-cellulose Substances 0.000 description 1
- 239000013626 chemical specie Substances 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- 239000000701 coagulant Substances 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000002596 correlated effect Effects 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 239000010431 corundum Substances 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 239000003599 detergent Substances 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 238000002265 electronic spectrum Methods 0.000 description 1
- 150000002148 esters Chemical group 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 235000013305 food Nutrition 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 229920001903 high density polyethylene Polymers 0.000 description 1
- 239000004700 high-density polyethylene Substances 0.000 description 1
- 239000012456 homogeneous solution Substances 0.000 description 1
- 229920001519 homopolymer Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000007733 ion plating Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229920000092 linear low density polyethylene Polymers 0.000 description 1
- 239000004707 linear low-density polyethylene Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229920001684 low density polyethylene Polymers 0.000 description 1
- 239000004702 low-density polyethylene Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000001630 malic acid Substances 0.000 description 1
- 235000011090 malic acid Nutrition 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 239000000113 methacrylic resin Substances 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 229910052754 neon Inorganic materials 0.000 description 1
- GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 239000001814 pectin Substances 0.000 description 1
- 229920001277 pectin Polymers 0.000 description 1
- 235000010987 pectin Nutrition 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 description 1
- OJMIONKXNSYLSR-UHFFFAOYSA-N phosphorous acid Chemical compound OP(O)O OJMIONKXNSYLSR-UHFFFAOYSA-N 0.000 description 1
- 238000005240 physical vapour deposition Methods 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 239000005015 poly(hydroxybutyrate) Substances 0.000 description 1
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 229920002239 polyacrylonitrile Polymers 0.000 description 1
- 229920001230 polyarylate Polymers 0.000 description 1
- 229920001707 polybutylene terephthalate Polymers 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000570 polyether Polymers 0.000 description 1
- 229920002530 polyetherether ketone Polymers 0.000 description 1
- 229920000120 polyethyl acrylate Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920001444 polymaleic acid Polymers 0.000 description 1
- 239000004926 polymethyl methacrylate Substances 0.000 description 1
- 229920000306 polymethylpentene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920006380 polyphenylene oxide Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- 229920002689 polyvinyl acetate Polymers 0.000 description 1
- 239000011118 polyvinyl acetate Substances 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000003307 slaughter Methods 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- JBJWASZNUJCEKT-UHFFFAOYSA-M sodium;hydroxide;hydrate Chemical compound O.[OH-].[Na+] JBJWASZNUJCEKT-UHFFFAOYSA-M 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 230000002269 spontaneous effect Effects 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 235000000346 sugar Nutrition 0.000 description 1
- 150000008163 sugars Chemical class 0.000 description 1
- 235000002906 tartaric acid Nutrition 0.000 description 1
- 239000011975 tartaric acid Substances 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- BKVIYDNLLOSFOA-UHFFFAOYSA-N thallium Chemical compound [Tl] BKVIYDNLLOSFOA-UHFFFAOYSA-N 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 229910052723 transition metal Inorganic materials 0.000 description 1
- 150000003624 transition metals Chemical class 0.000 description 1
- 229920006337 unsaturated polyester resin Polymers 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- 229920001567 vinyl ester resin Polymers 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 238000009816 wet lamination Methods 0.000 description 1
- 238000004804 winding Methods 0.000 description 1
- 230000037303 wrinkles Effects 0.000 description 1
- 229910000010 zinc carbonate Inorganic materials 0.000 description 1
- 229910021511 zinc hydroxide Inorganic materials 0.000 description 1
- 229940007718 zinc hydroxide Drugs 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/14—Layered products comprising a layer of synthetic resin next to a particulate layer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/30—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers
- B32B27/308—Layered products comprising a layer of synthetic resin comprising vinyl (co)polymers; comprising acrylic (co)polymers comprising acrylic (co)polymers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/36—Layered products comprising a layer of synthetic resin comprising polyesters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/38—Layered products comprising a layer of synthetic resin comprising epoxy resins
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/40—Layered products comprising a layer of synthetic resin comprising polyurethanes
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B5/00—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts
- B32B5/16—Layered products characterised by the non- homogeneity or physical structure, i.e. comprising a fibrous, filamentary, particulate or foam layer; Layered products characterised by having a layer differing constitutionally or physically in different parts characterised by features of a layer formed of particles, e.g. chips, powder or granules
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2264/00—Composition or properties of particles which form a particulate layer or are present as additives
- B32B2264/10—Inorganic particles
- B32B2264/102—Oxide or hydroxide
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/552—Fatigue strength
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/554—Wear resistance
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/50—Properties of the layers or laminate having particular mechanical properties
- B32B2307/56—Damping, energy absorption
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/724—Permeability to gases, adsorption
- B32B2307/7242—Non-permeable
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/724—Permeability to gases, adsorption
- B32B2307/7242—Non-permeable
- B32B2307/7246—Water vapor barrier
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2307/00—Properties of the layers or laminate
- B32B2307/70—Other properties
- B32B2307/726—Permeability to liquids, absorption
- B32B2307/7265—Non-permeable
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2439/00—Containers; Receptacles
- B32B2439/40—Closed containers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2439/00—Containers; Receptacles
- B32B2439/40—Closed containers
- B32B2439/46—Bags
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B2457/00—Electrical equipment
- B32B2457/20—Displays, e.g. liquid crystal displays, plasma displays
- B32B2457/202—LCD, i.e. liquid crystal displays
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B37/00—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding
- B32B37/14—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers
- B32B37/16—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with all layers existing as coherent layers before laminating
- B32B37/20—Methods or apparatus for laminating, e.g. by curing or by ultrasonic bonding characterised by the properties of the layers with all layers existing as coherent layers before laminating involving the assembly of continuous webs only
- B32B37/203—One or more of the layers being plastic
Definitions
- the present invention relates to a laminated film for a moisture-proof film and a method for producing the same, and more specifically, suitable for materials for precision electronic parts, and also suitable for packaging of fine chemicals such as pharmaceuticals and test drugs. More particularly, the present invention relates to a laminated film for a moisture-proof film that is useful as a moisture-proof film for an electoluminescence device that requires a stable gas barrier performance for a long period of time and requires high moisture-proof performance, and a method for producing the same.
- a laminated film for a moisture-proof film used as a component of an electronic device has a high level of gas barrier properties including a water vapor-nozzle property (i.e., moisture-proof performance, hereinafter referred to as moisture-proof property) due to water vapor. Things are sought.
- the moisture-proof level of the moisture-proof laminated film used as a member of such an electronic device is the level of moisture-proof property of the moisture-proof laminated film as used in ordinary filling packaging. Is not enough.
- there is a restriction to incorporate a moisture-proof film laminated film in a limited part volume so it is not possible to use a moisture-absorbing material in the moisture-proof film laminated film.
- a laminated film for a moisture-proof film used as a member of such an electronic device is the level of moisture-proof property of the moisture-proof laminated film as used in ordinary filling packaging. Is not enough.
- there is a restriction to incorporate a moisture-proof film laminated film in a limited part volume so it is not possible to use a moisture-absorbing material in the moisture-proof film laminated film.
- a vapor-deposited film is formed on a gas-free film by vacuum deposition, plasma deposition, sputtering, etc.
- Japanese Unexamined Patent Application Publication No. 2004-42502 discloses a barrier transparent laminated film formed by forming a silicon nitride sputtering film on a transparent film substrate. ing.
- an adhesive layer (B) is formed directly or on both sides of a hygroscopic resin layer (A) made of polybutyl alcohol, a saponified ethylene-butyl acetate copolymer, or polyamide.
- a stretched nylon film (A) a stretched nylon film (A), a vapor-deposited film (B), a gas barrier layer (C) including at least one composite vapor-deposited film, and A laminated film in which the heat seal layer (D) is laminated via an adhesive layer is disclosed.
- Japanese Patent Application Laid-Open No. 2004-148626 discloses a gas noria film in which a deposited film protective layer formed by applying a deposited film protective coating material on an inorganic oxide deposited film is laminated. Yes.
- Such a gas nore film described in Japanese Patent Application Laid-Open No. 2004-148626 is transparent and has visibility and flexibility in which a vapor deposition film protective coating material such as a silane coupling agent is applied on an inorganic oxide vapor deposition film. It was a gas nolla film.
- a vapor deposition film (B) of an inorganic material is formed on at least one surface of the polymer film substrate (A), and further, a water-resistant film is formed on the vapor deposition film (B).
- a moisture-proof composite vapor deposition film is disclosed.
- a polymer film substrate layer (A), an inorganic material vapor deposition layer (B), a barrier unifacial resin coating layer (C), and a relaxation layer (D) are disclosed.
- JP-A-9-193307 discloses a composite film laminated in order.
- a heat seal layer (D) each laminated via an adhesive layer A layer film is disclosed.
- the moisture-proof film can exhibit gas barrier properties and moisture-proof properties at an even higher level, and the strength can be stably demonstrated over a long period of time.
- laminated films for membranes There is a need for laminated films for membranes.
- the present invention has been made in view of the above-described problems of the prior art, and is a moisture-proof laminated film in which inorganic layers are laminated on both sides of an organic layer, and the film thickness direction in the organic layer It is possible to sufficiently prevent the deterioration of moisture resistance due to gas micro pinholes and to achieve high level gas barrier and moisture resistance over a long period of time.
- An object of the present invention is to provide a laminated film for a moisture-proof film capable of maintaining its high gas-nozzle property and moisture-proof property even when an external force is applied, and a method for producing the same.
- an organic thin film in which the density of the polymer molecular structure is increased due to, for example, salt formation with a hydrophilic group or a polyvalent metal and an organic layer having two organic thin films is formed.
- the inventors have found that the above-mentioned object can be achieved by forming a layer by laminating two or more inorganic layers, and have completed the present invention.
- the moisture-proof film laminate film of the present invention is a moisture-proof film laminate film comprising an organic layer and inorganic layers laminated on both sides of the organic layer,
- the organic layer comprises two organic thin films
- Each of the two organic thin films contains at least a polyvalent metal salt of the polycarboxylic acid polymer (A), and an infrared absorption spectrum area ratio ⁇ [peak area S (3700-2500 cm
- Peak area S (1800-1500 cm _1 )] is 2.5 or less and an infrared absorption spectrum
- Tuttle peak ratio j8 [Peak A (1560cm- 1 ) / Peak A (1700cm- 1 )] is 1.2 or more
- the method for producing a laminated film for a moisture-proof film of the present invention comprises a polycarboxylic acid polymer (A), a polyvalent metal compound (B), a volatile base (C) or an acid (D). Either one and the solvent.
- each of the two organic thin films contains at least a polyvalent metal salt of the polycarboxylic acid-based polymer (A).
- A polycarboxylic acid-based polymer
- Peak ratio of yield spectrum j8 [Peak A (1560cm- 1) / Peak A (1700cm _1)] is 1 - 2
- the organic layer is formed by directly facing and adhering two organic thin films.
- the organic layer is preferably formed by laminating two organic thin films via an adhesive layer.
- the other surfaces of the two organic thin films are directly opposed to each other.
- the laminated film for a moisture-proof film is obtained by close contact.
- the other surfaces of the two organic thin films are laminated via an adhesive layer. It is preferable to obtain the laminated film for moisture-proof film.
- the polyvalent metal that can be used in the present invention is preferably at least one metal that can select a group force including zinc, zirconium, copper, and nickel.
- the polyvalent metal according to the present invention is zinc and has at least one peak between 96 to 498 eV of binding energy force by the Auger electron spectrum analysis of zinc.
- the inorganic oxide which is preferably made of an inorganic oxide vapor deposition film, is more preferably a silicate oxide.
- an adhesive formed using at least one adhesive selected from the group consisting of urethane adhesives, acrylic adhesives, polyester adhesives, and epoxy adhesives.
- the adhesive's Vicat soft spot is preferably 50 ° C. More preferably, it is ⁇ 140 ° C.
- the laminated film for a moisture-proof film of the present invention has a water vapor transmission rate of 0 at 40 ° C and 90% relative humidity after standing for 250 hours under prehumidification conditions at 60 ° C and 90% relative humidity. It is preferably maintained at 02 gZ (m 2 'day) or less.
- the laminated film force for moisture-proof film of the present invention is preferably a moisture-proof film for an electoluminescence element.
- the moisture-proof film laminated film of the present invention has the above-described configuration. That is, first, due to the salt formation between the hydrophilic group of the polycarboxylic acid polymer (A) and the polyvalent metal while containing at least the polyvalent metal salt of the polycarboxylic acid polymer (A).
- the organic layer is provided with two organic thin films, and even when a micro pinhole is formed in the thickness direction of one organic thin film in the organic layer, it is still more.
- the laminated film for moisture-proof film makes it possible to stably maintain a high gas noria property and moisture-proof property.
- the laminated film for a moisture-proof film of the present invention can exhibit higher moisture-proof and gas-nozzle properties by laminating an inorganic layer having a high moisture-proof property on both sides of the organic layer. Since the soft organic layer is covered with a relatively hard inorganic layer, the gas resistance and moisture resistance of the laminated film for moisture-proof film will be reduced even when an external force such as bending or impact is applied. There is no.
- FIG. 1 is a schematic view showing an embodiment of an apparatus for producing a laminated film for a moisture-proof film of the present invention.
- FIG. 2 is a schematic view showing an embodiment of an apparatus for producing an organic-inorganic laminated film used for a moisture-proof laminated film of the present invention.
- FIG. 3 is a schematic view showing an embodiment of an apparatus for producing a laminated film for a moisture-proof film of the present invention using an organic-inorganic laminated film produced in advance.
- FIG. 4 is a schematic view showing an embodiment of an apparatus for producing a laminated film for a moisture-proof film of the present invention.
- FIG. 5 is a schematic view showing an embodiment of an apparatus for producing an adhesive layer-formed laminated film used for the moisture-proof laminated film of the present invention.
- FIG. 6 is a schematic view showing an embodiment of an apparatus for producing a moisture-proof laminated film of the present invention using an adhesive layer-formed laminated film produced in advance.
- FIG. 7 A graph showing the relationship between the distance of the surface force of an organic thin film and the composition distribution of elements in the organic thin film.
- FIG. 8 is a graph showing the relationship between the binding energy of zinc and the intensity that is positively correlated with the amount of emitted Auge electrons, as determined by Auger electron spectrum analysis.
- the moisture-proof film laminate film of the present invention is a moisture-proof film laminate film comprising an organic layer and inorganic layers laminated on both sides of the organic layer,
- the organic layer comprises two organic thin films
- Each of the two organic thin films contains at least a polyvalent metal salt of the polycarboxylic acid polymer (A), and an infrared absorption spectrum area ratio ⁇ [peak area S (3700-2500 cm
- the two organic thin films forming the organic layer according to the present invention each contain at least a polyvalent metal salt of the polycarboxylic acid polymer (A), and the area ratio ⁇ [peak area S (3700 ⁇ 2500cm _1) Z peak area S (1800 ⁇ 1500cm _ 1)] force. 5 below
- the above-mentioned area ratio is simplified and expressed as the area ratio a of the infrared absorption spectrum, or simply as the area ratio a, or the peak ratio is simplified to reduce the infrared absorption spectrum. It may be expressed as peak ratio ⁇ or simply as peak ratio ⁇ .
- the gas nolia property in the present invention means having a low oxygen permeability under high humidity conditions. Unless otherwise noted, oxygen permeability at a temperature of 30 ° C and a relative humidity (RH) of 80%.
- the organic thin film has a gas barrier property such as oxygen even under high humidity. It can be used suitably as a raw material for organic thin films because it has long-term water resistance even in a natural environment such as a humid tropical region.
- the specific requirement is that the polycarboxylic acid polymer (A) as a raw material for the organic thin film according to the present invention (A) is a drying condition for the organic thin film formed at a single temperature (temperature 30 ° C).
- the oxygen transmission coefficient at 0% relative humidity is below a specific value.
- the gas permeability coefficient can be adopted as a variable reflecting the structure of the polymer. Please refer to Jhon Wiley & Sons, Inc., ENCYCLOPEDIA OF POLYMER SCIENCE AND ENGINEERI NG, VOL. 2, p. 177 (1985) for the relationship between polymer molecular structure and gas permeability coefficient. .
- the polycarboxylic acid-based polymer (A) used as a raw material for the organic thin film useful in the present invention is not particularly limited as long as it is an existing polycarboxylic acid-based polymer, but the organic according to the present invention From the viewpoint of improving the gas barrier property and moisture resistance of the thin film, the oxygen permeability coefficient measured under dry conditions (30 ° C, relative humidity 0%) of the polycarboxylic acid polymer (A) as a raw material is: 100cm 3 (STP) ⁇ / z mZ 'day MPa) or less.
- Such an oxygen transmission coefficient can be obtained, for example, by the following method.
- a 10% by weight aqueous solution of the polycarboxylic acid polymer (A) was prepared to produce a coating film having a 1 m-thick polycarboxylic acid polymer layer formed on a plastic substrate.
- the oxygen permeability at 30 ° C and 0% relative humidity when the coated film is dried is measured.
- the plastic substrate any plastic film whose oxygen permeability is known is used.
- the oxygen permeability of the coating film of the obtained polycarboxylic acid polymer (A) is 1/10 or less than the oxygen permeability of the plastic film alone used as the substrate, the above-mentioned
- the measured value of the oxygen permeability measured as described above can be regarded as the oxygen permeability of the layer of the polycarboxylic acid polymer (A) alone.
- the oxygen permeability coefficient can be converted to the oxygen permeability coefficient by multiplying the measured value of oxygen permeability thus obtained by 1 ⁇ m.
- the polycarboxylic acid polymer (A) used as a raw material for the organic thin film according to the present invention is a force capable of using an existing polycarboxylic acid polymer.
- What is an existing polycarboxylic acid polymer? This is a general term for polymers having two or more carboxy groups in the molecule. Specifically, homopolymers that use j8-monoethylenically unsaturated carboxylic acid as the polymerizable monomer, and only a, j8-monoethylenically unsaturated carboxylic acid as the monomer component.
- copolymers of ⁇ , ⁇ monoethylenically unsaturated carboxylic acid and other ethylenically unsaturated monomers alginic acid, carboxymethylcellulose, and pectin.
- examples thereof include acidic polysaccharides having a carboxy group in the molecule.
- These polycarboxylic acid polymers ( ⁇ ) can be used alone or as a mixture of at least two polycarboxylic acid polymers ( ⁇ ).
- ⁇ monoethylenically unsaturated carboxylic acid acrylic acid, methacrylic acid, itaconic acid, maleic acid, fumaric acid, crotonic acid and the like are representative.
- the ethylenically unsaturated monomer copolymerizable therewith include saturated carboxylic acid butyl esters such as ethylene, propylene, and butyl acetate, alkyl acrylates, and alkyl methacrylates.
- Typical examples include tacrylates, alkyl itaconates, acrylonitrile, butyl chloride, vinylidene chloride, butyl fluoride, vinylidene fluoride, styrene, acrylamide, and the like.
- the polycarboxylic acid polymer (A) is a copolymer of a, j8-monoethylenically unsaturated carboxylic acid and a saturated carboxylic acid vinyl ester such as butyl acetate, it is further saponified. As a result, it is possible to convert the saturated carboxylic acid bull ester moiety into a butyl alcohol for use.
- the polycarboxylic acid polymer (A) used as a raw material for the organic thin film according to the present invention comprises a, j8-monoethylenically unsaturated carboxylic acid and other ethylenically unsaturated monomers.
- the copolymer composition is a, ⁇ -monoethylenically unsaturated carboxylic acid monomer composition from the viewpoint of improving the gas barrier property of the obtained organic thin film and resistance to high-temperature steam and hot water.
- it is preferably 60 mol% or more, more preferably 80 mol% or more, still more preferably 90 mol% or more, and most preferably 100 mol%.
- the polycarboxylic acid polymer ( ⁇ ⁇ ) used as the raw material for the organic thin film according to the present invention it is preferable to use a polymer having only the power of ⁇ ,
- the polycarboxylic acid-based polymer ( ⁇ ) is a polymer that only has ⁇ , ⁇ monoethylenically unsaturated carboxylic acid
- preferred specific examples thereof are acrylic acid, methacrylic acid, itaconic acid, maleic acid
- examples thereof include polymers obtained by polymerization of at least one polymerizable monomer selected from the group power consisting of fumaric acid and crotonic acid, and mixtures thereof.
- polymers having only ⁇ , ⁇ monoethylenically unsaturated carboxylic acid a polymer obtained by polymerization of at least one polymerizable monomer selected from acrylic acid, methacrylic acid, and maleic acid And most preferably polyacrylic acid, polymethacrylic acid, polymaleic acid, and mixtures thereof, which are more preferably used.
- the polycarboxylic acid polymer ( ⁇ ) is an acidic polysaccharide other than the polymer of a, / 3 monoethylenically unsaturated carboxylic acid monomer, for example, alginic acid can be preferably used.
- the number average molecular weight of the polycarboxylic acid-based polymer (A) is not particularly limited, but it should be in the range of 2,000-10, 000, 000 from the viewpoint of the ability to form an organic thin film. Force S, preferably 5,000 to 1,000,000.
- the organic thin film that is useful in the present invention is used by mixing other polymers as long as the gas thinness and moisture resistance of the organic thin film are not impaired. Although it is possible to use only the polycarboxylic acid polymer (A) alone,
- the polyvalent metal contained as a constituent in the polyvalent metal salt of the polycarboxylic acid polymer (A) contained in the organic thin film according to the present invention has a metal ion valence of 2 or more. It is a single polyvalent metal atom.
- Specific examples of such polyvalent metals include alkaline earth metals such as beryllium, magnesium and calcium, transition metals such as titanium, zirconium, chromium, manganese, iron, cobalt, nickel, copper and zinc, aluminum, etc. Can be mentioned.
- the organic thin film is preferably transparent.
- the polyvalent metal contained in such an organic thin film include zinc or zirconium. Is mentioned.
- the organic thin film may be colored. For example, copper may be used as the polyvalent metal contained in the organic thin film. .
- a polyvalent metal compound (B) is used as a raw material for the polyvalent metal salt contained in the organic thin film according to the present invention.
- a polyvalent metal compound (B) include oxides, hydroxides, carbonates, organic acid salts, inorganic acid salts of polyvalent metals, ammonium complexes of polyvalent metals, and polyvalent metals. Examples include metal secondary to quaternary amine complexes and carbonates and organic acid salts of these complexes.
- the organic acid salt include acetate, oxalate, citrate, lactate, phosphate, phosphite, hypophosphite, stearate, monoethylenically unsaturated carbonate, etc. Is mentioned.
- the inorganic acid salt include chloride, sulfate, nitrate and the like.
- polyvalent metal alkyl alkoxides and the like can be mentioned.
- Such polyvalent metal compounds (B) can be used alone or in a mixture of at least two polyvalent metal compounds.
- divalent metal compounds are preferably used from the viewpoint of improving the gas barrier properties, moisture resistance and manufacturability of the organic thin film.
- magnesium calcium, zinc, copper, zinc oxides, hydroxides, carbonates and zirconium, copper, nickel or zinc ammonium complexes. More preferably, a carbonate of the complex is used.
- a metal compound composed of a monovalent metal for example, a monovalent metal salt of the polycarboxylic acid polymer (A) can be used as mixed or contained.
- a preferable addition amount of such a monovalent metal compound is 0.2 chemical equivalent with respect to the carboxy group of the polycarboxylic acid-based polymer (A) from the viewpoints of gas nature and moisture resistance of the organic thin film. It is as follows.
- the monovalent metal compound may be partially contained in the molecule of the polyvalent metal salt of the polycarboxylic acid polymer.
- the form of the polyvalent metal compound (B) used as the raw material for the organic thin film that is useful in the present invention is not particularly limited. However, as will be described later, in the organic thin film according to the present invention, a part or all of the polyvalent metal compound (B) forms a salt with the carboxy group of the polycarboxylic acid polymer (A) and an ionic bond. And
- the organic thin film according to the present invention contains a polyvalent metal compound (B) that does not participate in carboxylate formation
- the polyvalent metal compound (B) is used from the viewpoint of transparency of the organic thin film. It is preferable to be granular and have a smaller particle size.
- the polyvalent metal compound is granular in terms of efficiency during preparation and obtaining a more uniform solution or dispersion. Its particle size is small!
- the average particle size of the polyvalent metal compound is preferably 5 m or less, more preferably 1 m or less, and most preferably 0.1 ⁇ m or less.
- the organic thin film according to the present invention contains at least the polyvalent metal salt of the polycarboxylic acid polymer (A) as described above, measures a specific region of the infrared absorption spectrum, and obtains the area obtained therefrom.
- the ratio ⁇ is 2.5 or less, and the peak ratio
- the organic thin film according to the present invention having such characteristics is satisfactory in gas barrier properties such as oxygen and moisture resistance.
- the area ratio of the infrared absorption spectrum of the organic thin film alpha [peak area E (3700-2500 cm- 1) / peak area S (1800 ⁇ 1500cm _1)] will be described.
- the area ratio ⁇ of the infrared absorption spectrum is substituted as an index representing the amount of water in the organic thin film.
- the moisture in the organic thin film according to the present invention refers to the state of being adsorbed in the organic thin film, and is referred to as adsorbed water.
- the 0— ⁇ stretching vibration caused by moisture gives a broad absorption in the infrared light wave number region of 3700-2500 cm _1 . Therefore, in the present invention, the peak area of the infrared absorption spectrum of 3700 ⁇ 2500Cm _1 was defined as the peak area S (3700 ⁇ 2500cm _ 1).
- Peak area S (3700 ⁇ 2500cm _1;) is a straight line connecting two points of the absorbance and 2500 cm _ 1 absorbance 3700 cm _1 as the baseline, as possible out be determined by area integration ranging 3700 ⁇ 2500cm _1.
- Such a peak attributed to a carboxy group (one COOH) and a salt of a carboxy group (one COO_) is a characteristic peak of the organic thin film according to the present invention. Therefore, the area of the infrared absorption spectrum of 1800 ⁇ 1500Cm _1 containing this peak is a characteristic peak area of force Cal organic thin film of the present invention. In the present invention, this area is defined as the peak area S (18
- Peak area S (1800 ⁇ 1500cm _ 1) is, 1800cm "1
- the absorbance and a straight line connecting two points of the absorbance of 1500 cm _1 as the baseline, can be determined by area integration ranging 1800 ⁇ 1500c m _1.
- the area ratio was defined as O and was used as an index representing the amount of water in the organic thin film.
- the area ratio ⁇ of the infrared absorption spectrum is 2.5 or less, preferably 0.01 or less. Above, 2.3 or less, more preferably 0.01 or more and 2.0 or less. If the area ratio ⁇ exceeds 2.5, the moisture resistance is insufficient.
- the infrared absorption spectrum is measured by transmission method, ATR method (total reflection attenuation method), KBr pellet method, diffuse reflection method, photoacoustic method (PAS method), etc. Then, the peak area S and peak area S of the infrared absorption spectrum are calculated, and the ratio between the two is obtained.
- a laminate in which an organic thin film according to the present invention is formed on a substrate is used as a sample, the ATR method is used, and KRS-5 (Thallium Bromide —Iodide) is used as an ATR prism. It can be measured at an angle of incidence of 45 degrees, a resolution of 4 cm _ 1 and an integration count of 30 times.
- the peak ratio of the infrared absorption spectrum of the organic thin film j8 [Peak A (156 Ocm _1) Z peak A (1700cm- 1)] is the polycarboxylic acid polymer in the organic thin film and (A)
- the straight line connecting two points of the absorbance peak A (1560cm "1) ⁇ 1600cm absorbance and 1500 cm _1 _1 as baseline, peak areas from the area integral of the range of 1600 ⁇ 1500cm_ 1, absorption maximum in the range of 1600 ⁇ 1500Cm _1
- the peak height can also be obtained for the height force.
- the peak A (1700 cm “ 1 ) constituting the peak ratio 13 is the peak A (1560 cm" 1
- the peak ratio j8 of the infrared absorption spectrum of the organic thin film useful in the present invention is 1.2 or more and 1000 or less, but from the viewpoint of moisture resistance of the organic thin film, the peak ratio j8 is 2.0 or more and 10,000 or less. Preferably it is 4.0 or more and 10,000 or less.
- the absorbance baseline of the infrared absorption vector has a slight fluctuation related to the measurement limit.
- the infrared absorption spectrum for obtaining the peak ratio ⁇ can be measured using, for example, FT-IR2000 manufactured by PERKIN-EL MER.
- the infrared absorption spectrum of the organic thin film according to the present invention is measured by the transmission method, ATR method.
- Total reflection attenuation method KBr pellet method, diffuse reflection method, photoacoustic method (PAS method), etc.
- PAS method photoacoustic method
- the inorganic layer is peeled off so as to expose the organic thin film surface such as the laminated film for a moisture-proof film of the present invention in which the inorganic layer is laminated on both sides of the organic layer, the face is the test sample of organic thin film, in the ATR method, the ATR prism KRS - 5 (Thallium Bromid e- Iodide ) used, degree incidence angle 45, be mentioned measurements with a resolution 4 cm _1, number of integration 30 times Can do.
- FT-IR For the infrared absorption spectrum measurement method using FT-IR, refer to, for example, Ms. Mitsuo Tasumi, “Basics and Practice of FT-IR”.
- the polyvalent metal is zinc and that the binding energy by the Auger electron spectrum analysis of zinc has at least one peak between 496 and 498 eV. Better ,.
- Auger electron spectrum analysis is also called X-ray photoelectron analysis (XPS) when the excitation energy source of atoms is X-rays.
- XPS X-ray photoelectron analysis
- the stoichiometric or non-stoichiometric binding state of zinc can be known from the value of the binding energy. It is also possible to know the bonding state of complex formation.
- the L inner-shell electrons of zinc are ionized by the irradiated X-rays and become the L shell.
- a vacancy is created, and the M-shell electron in the upper orbital transitions to the L-shell, and this induces another N-shell electron in the upper orbital transition to the M-shell.
- the present inventors have found that there is a positive correlation between the amount of auger electrons emitted in the Zn-LMN transition process corresponding to the process of such electron transition and the moisture resistance of the organic thin film. It was.
- the Auger electron energy of the Zn-LMN transition process is 496 to 498 eV. Having at least one peak between the energies directly correlates with the moisture resistance of the organic thin film.
- the measuring device used for such analysis is not particularly limited, and a known measuring device can be used as appropriate. Specifically, the product name Quanter a SXM manufactured by PHI can be used. .
- the organic thin film (hereinafter simply referred to as an organic thin film) of the laminated film for moisture-proof film according to the present invention is excellent in gas barrier properties such as oxygen even under high humidity.
- the organic thin film that is useful in the present invention is characterized in that it is excellent in moisture resistance as well as gas-nore properties such as oxygen. That is, the moisture resistance of the organic thin film referred to in the present invention, the temperature 40 ° C, in an atmosphere of 90% RH, a water vapor permeability 15gZ (m 2 'day) or less, preferably 3gZ (m 2' d ay ) The following (the relative humidity on the steam supply side is 90%). When this value exceeds 15 gZ (m 2 -day), a laminated film for a moisture-proof film that is excellent in both the gas noria property and moisture-proof property, which is the object of the present invention, cannot be obtained.
- the density of the organic thin film according to the present invention is preferably 1.80 gZcm 3 or more, more preferably 1.80-2.89 g / cm 3 , more preferably force S, 1.85-2. A force of 89 g / cm 3 ⁇ is more preferable.
- an organic thin film having a density of less than 1.80 gZcm 3 there is a tendency that a moisture-proof laminated film having insufficient moisture-proof properties and a target moisture-proof performance cannot be obtained.
- an organic thin film having a density exceeding 2.89 gZcm 3 increases the amount of polyvalent metal compound used, making it difficult to form an organic thin film after coating.
- the density of such an organic thin film can be measured according to JIS K7112 (Method for measuring the density and specific gravity of plastic).
- the organic layer according to the present invention includes two organic thin films.
- the organic layer since the organic layer has the structure including the two organic thin films, even if a micro pinhole is generated in one organic thin film due to impact or the like, the other organic thin film is Because it is placed V, it is possible to prevent the micro pinholes from being connected in the organic layer.
- Such an organic layer is formed by directly facing two organic thin films and adhering them, or by laminating two organic thin films via an adhesive layer.
- Organic layers are preferred.
- the material of the adhesive that forms the adhesive layer is not particularly limited, and a resin commonly used in dry lamination or the like can be used. Also, such connections Although it does not restrict
- urethane adhesives polyester adhesives, acrylic adhesives, and epoxy adhesives
- An adhesive having a Vicat softness point of 50 ° C to 140 ° C is preferred, and an adhesive having a temperature of 50 ° C to 98 ° C is more preferable.
- the Vicat softening point of the adhesive is a softening temperature when the adhesive is cured. It can be measured according to Vicat soft spot WIS K-7206.
- the inorganic layer is laminated on both sides of the organic layer.
- Such an inorganic layer is not particularly limited, but it is preferable that the inorganic layer is an inorganic vapor deposition film.
- the inorganic vapor deposition film is preferably composed of an inorganic oxide vapor deposition film.
- the inorganic oxide it is particularly preferable to use a silicon oxide (SiO 2) from the viewpoint of transparency.
- SiO 2 silicon oxide
- the inorganic layer according to the present invention is an inorganic layer that is excellent in gas-nore property such as oxygen even under high humidity.
- the inorganic layer used in the present invention is 40 when the thickness of the inorganic layer is 1 m.
- C oxygen permeability measured at a relative humidity of 90% (RH), preferably 500 cm 3 (STP) / (m 2 day-MPa) or less, 100 cm 3 (STP) / (m 2 day- MPa ) It is more preferable that
- the inorganic layer according to the present invention is characterized in that it is excellent in moisture resistance as well as gas-nore property such as oxygen.
- the inorganic layer used in the present invention when the thickness of the inorganic layer is 1 ⁇ m, the water vapor transmission rate is 15 gZ (m 2 ′ day) or less in an atmosphere at a temperature of 40 ° C. and a relative humidity of 90%.
- the force S is preferably 3 g / (m 2 'day) or less.
- This value is 15g / (m 2 'da This is because if it exceeds y), there is a tendency that a laminated film for a moisture-proof film that is excellent in both the gas noria property and moisture-proof property of the present invention cannot be obtained.
- the laminated film for moisture-proof film of the present invention is a laminated film for moisture-proof film comprising an organic layer having two organic thin films and the inorganic layer laminated on both surfaces of the organic layer.
- the organic layer includes two organic thin films. Therefore, even if a micro pin hole is formed in the thickness direction of one organic thin film in the organic layer, since another organic thin film is provided, it is possible to prevent the micro pin holes from being connected. Deterioration of gas barrier properties and moisture resistance due to micro pinholes is prevented, and the laminated film for moisture barrier film can stably maintain high gas barrier properties and moisture resistance.
- the laminated film for moisture-proof film of the present invention an inorganic layer having a high moisture-proof property is laminated on both surfaces of the organic layer. Therefore, the laminated film for a moisture-proof film according to the present invention can exhibit higher moisture-proof and gas-tight properties. Since the relatively soft organic layer is covered with a relatively hard inorganic layer, the laminated film for a moisture-proof film of the present invention is laminated even if an external force such as bending or impact is applied. The gas nozzle and moisture resistance of the film will not deteriorate.
- the laminated film for a moisture-proof film of the present invention is formed by laminating two organic thin films directly facing each other and in close contact with each other and on both sides of the organic layer.
- a laminated film for a moisture-proof film comprising the inorganic layer (i) or an organic layer formed by laminating two organic thin films via an adhesive layer, and the organic layer laminated on both sides of the organic layer.
- a laminated film for moisture-proof membrane (ii) provided with an inorganic layer is preferred.
- the thickness of the organic layer in the moisture-proof film laminated film (i) suitable for the present invention is not particularly limited, but from the viewpoint of moldability and handling properties when forming the moisture-proof film laminated film,
- the force is preferably 0.001 ⁇ m to 200 ⁇ m, more preferably 0.01 ⁇ m to 100 ⁇ m, particularly preferably 0.m.
- the organic layer thickness is 200 If it exceeds m, there is a tendency for problems to occur in the production that is difficult to coat.
- the thickness of one organic thin film is not particularly limited. From the viewpoint of ringability, the thickness of one organic thin film is preferably 0.001 ⁇ m to 200 ⁇ m, more preferably 0.01 ⁇ m to 100 ⁇ m. 0 1 m ⁇ : Especially preferred is LO m.
- the thickness force of one organic thin film is less than 0.001 m, it becomes difficult to form an organic thin film, and stable production tends to be impossible.
- the thickness of the organic thin film exceeds 200 m, there is a tendency for problems to occur in the manufacture that is difficult to coat.
- the thickness of the adhesive layer is not particularly limited, it may be 0.1 to 100 111 from the viewpoint of preventing the deterioration of gas and moisture resistance of the resulting laminated film for moisture-proof film. It is more preferably 0.5 to 10 / ⁇ ⁇ . If the thickness of the adhesive layer is less than 0 .: L m, adhesion of organic thin film tends to be difficult, and if it exceeds 100 / zm, there will be a problem in producing a laminated film for moisture-proof film that is difficult to apply. There is a tendency.
- the thickness of the inorganic layer in the laminated film for moisture-proof film of the present invention is not particularly limited.
- the thickness of the inorganic layer is 0.01. It is preferable that it is ⁇ m to 100 ⁇ m, more preferably 0.l ⁇ m ⁇ lO ⁇ m.
- the thickness of the inorganic layer is less than 0.01 m, it becomes difficult to form the inorganic layer and stable production cannot be achieved.
- the thickness of the inorganic layer exceeds 100 / zm, vapor deposition is difficult and it tends to be difficult to produce a moisture-proof laminated film.
- the laminated film for moisture-proof film has a water vapor permeability of 0. 0 at 40 ° C and 90% relative humidity after standing for 250 hours under pre-humidification conditions at 60 ° C and 90% relative humidity. It is preferably maintained below 02 g Z (m 2 'day).
- a laminated film for a moisture-proof film exhibiting a high V and moisture-proof property that satisfies the above conditions can be particularly suitably used as a moisture-proof film for an electoluminescence device.
- the laminated film for a moisture-proof film of the present invention may be a laminate in which other layers are further laminated.
- One or more layers may be laminated for the purpose of imparting strength, imparting strength, or providing further moisture resistance.
- the use of such a moisture-proof film laminated film is suitable as a material for precision electronic parts, and can also be used as a package for fine chemicals such as pharmaceuticals and test drugs.
- a moisture-proof film for an electoluminescence device is particularly preferable. This is because the laminated film for a moisture-proof film of the present invention has a high level of gas barrier property and moisture-proof property stably over a long period of time, and can be suitably used as a moisture-proof film for an electoluminescence device.
- the method for producing a moisture-proof laminated film of the present invention comprises a polycarboxylic acid polymer (A), a polyvalent metal compound (B), and either one of a volatile base (C) or an acid (D).
- a solution or dispersion of a mixture containing a solvent is applied to each of the two inorganic layers, and the inorganic layer is laminated on one surface to obtain two organic thin films;
- each of the two organic thin films contains at least a polyvalent metal salt of the polycarboxylic acid-based polymer (A).
- A polycarboxylic acid-based polymer
- Peak ratio of yield spectrum j8 [Peak A (1560cm- 1) / Peak A (1700cm _1)] is 1 - 2
- the raw material, polycarboxylic acid polymer ( ⁇ ), and polyvalent metal compound ( ⁇ ) are as described above. Since the polycarboxylic acid polymer ( ⁇ ) and the polyvalent metal compound ( ⁇ ) react easily in an aqueous solution and may form a heterogeneous precipitate, the polycarboxylic acid polymer ( ⁇ ) and the polycarboxylic acid polymer ( ⁇ ) In order to obtain a uniform coating solution that is hydrodynamic as a valent metal compound ( ⁇ ) and a solvent, either volatile base (C) or acid (D) is mixed with water as a solvent.
- volatile base (C) or acid (D) is mixed with water as a solvent.
- Examples of such a volatile base (C) include ammonia, methylamine, ethylamine, and dimethyl. Luamine, jetylamine, triethylamine, morpholine, and ethanolamine are used. Among these volatile bases (C), ammonia is preferably used from the viewpoint of improving the gas barrier property and moisture resistance of the organic thin film to be formed.
- the blending amount of the polyvalent metal compound (B) relative to the amount of the polycarboxylic acid polymer (A) depends on the gas barrier property and moisture resistance of the organic thin film. From the viewpoint, it is preferably 0.5 chemical equivalent or more with respect to all carboxy groups in the polycarboxylic acid polymer (A), more preferably 0.8 chemical equivalent or more. Further, in addition to the above viewpoint, it is preferable that the viewpoint of moldability and transparency of the organic thin film is 10 chemical equivalents or less. Particularly preferred is a range of 1 chemical equivalent or more and 5 chemical equivalents or less.
- a polycarboxylic acid polymer (The blending amount of the polyvalent metal compound (B) with respect to the amount of A) is preferably 0.5 to 10 chemical equivalents with respect to all the carboxy groups in the polycarboxylic acid polymer (A).
- the chemical equivalent is a certain amount of an element (a simple substance) or a compound determined based on chemical reactivity.
- the chemical equivalent in the present invention is a chemical equivalent to the carboxy group in the polycarboxylic acid polymer (A)
- one chemical equivalent is a base that neutralizes the amount of one equivalent carboxy group that acts as an acid.
- the base is a polyvalent metal constituting the polyvalent metal compound (B).
- the amount of the volatile base (C) necessary for obtaining a solution or dispersion (coating solution) of a uniform mixture is based on the carboxy group in the polycarboxylic acid polymer (A). 1 ⁇ ⁇ equivalent.
- the polyvalent metal compound is cobalt, nickel, copper, zinc oxide, hydroxide, or carbonate, it can be added by adding one or more chemical equivalents of volatile base (C). These metals form a complex with the volatile base (C), and the polycarboxylic acid polymer (A), the polyvalent metal compound (B), the volatile base (C), and a transparent hydrodynamic solvent. A homogeneous solution is obtained.
- a suitable addition amount of the volatile base (C) is 1 chemical equivalent or more and 60 chemical equivalents or less, and further 2 chemical equivalents or less with respect to all carboxy groups in the polycarboxylic acid polymer (A).
- the upper limit is preferably 30 chemical equivalents or less. If the addition amount is less than 1 chemical equivalent, it is difficult to obtain a uniform solution (coating solution). On the other hand, if it exceeds 60 chemical equivalents, a problem arises in film production (film formation).
- zinc compounds are used as the polyvalent metal compound, a laminated film for a moisture-proof film is produced that has at least one peak between 496 and 498 eV in the binding energy of zinc ogee electron spectrum analysis. From the standpoint of achieving this, it is preferable to add 2 to 120 moles of volatile base (C) per mole of zinc compound, especially when the volatile base (C) is ammonia. It is preferable to add 4 to 60 mol per mol of the compound.
- the amount of acid (D) required to obtain a uniform mixture solution or dispersion (coating solution) is determined by the amount of polycarboxylic acid polymer (A It is preferably 1 chemical equivalent or more and 60 chemical equivalents or less, and preferably 2 chemical equivalents or more and 30 chemical equivalents or less with respect to the carboxy group in (). If this amount is less than 1 chemical equivalent, it is difficult to obtain a uniform solution (coating solution). On the other hand, if it exceeds 60 chemical equivalents, there is a problem in film production (film formation).
- As the acid (D) hydrochloric acid is preferably used.
- the solvent to be used include water, methyl alcohol, ethyl alcohol, isopropyl alcohol, n-propyl alcohol, n-butyl alcohol, n-pentanol alcohol, dimethyl sulfoxide, dimethyl formamide, dimethylacetamide. , Toluene, hexane, heptane, cyclohexane, acetone, methyl ethyl ketone, jetyl ether, dioxane, tetrahydrofuran, ethyl acetate, butyl acetate and the like.
- water which is a problem solution such as waste liquid treatment at the time of coating, and the possibility that the solvent may remain on the film.
- polyacrylic acid available in the form of an aqueous solution
- ammonia in an aqueous solution state
- C volatile base
- polyvalent metal in water prepared as a solvent Zinc oxide (powder) can be added in this order as compound (B) and mixed with an ultrasonic homogenizer to obtain a coating solution.
- the amount of water as a solvent In order to suit the coating suitability of the device, it is appropriately adjusted by combining with other additives.
- the solvent may be a single type or a mixture.
- a resin, a softener, a stabilizer, a film forming agent, an antiblocking agent, an adhesive, and the like can be appropriately added.
- a mixture of soluble resin in the solvent system used Preferable examples of the resin include alkyd resin, melamine resin, acrylic resin, nitrified cotton, urethane resin, polyester resin, phenol resin, amino resin, fluorine resin, epoxy resin, etc.
- the coagulant used for the purpose is 1% to 50% by weight from the viewpoint of coating suitability. It is preferable that it is in the range.
- the polycarboxylic acid polymer (A), the polyvalent metal compound (B), the volatile base (C), and the ammonium carbonate (E) are used as solvents.
- a solution or dispersion obtained by mixing with water can also be used.
- Ammonium carbonate (E) converts polyvalent metal compound (B) into a carbonic acid polyvalent metal ammonium complex state for one carboxylic group of polycarboxylic acid polymer (A). It is added to prepare a uniform solution containing a polyvalent metal in an amount equal to or greater than the equivalent amount.
- the amount of ammonium carbonate (E) added is the molar ratio to the polyvalent metal compound (B), that is, the number of moles of ammonium carbonate (E).
- the number ranges from 0.05 to 10, preferably from 1 to 5.
- a coating solution using polycarboxylic acid polymer (A), polyvalent metal compound (B), volatile base (C) or acid (D) and water as a solvent will be described as an example.
- ammonium carbonate (E) the same consideration can be made unless otherwise specified.
- the step of obtaining the laminated film for a moisture-proof film directly causes the other surfaces of the two organic thin films to face each other and to adhere to each other.
- the process for obtaining the laminated film for a moisture-proof film comprises A method for producing a moisture-proof film laminate film), which is a step of laminating the other surfaces of the organic thin film via an adhesive layer to obtain a moisture-proof film laminate film).
- a specific method for producing a laminated film for moisture-proof film includes (1) a step of forming an inorganic layer on the surface of a substrate (a step of obtaining an inorganic layer-formed substrate film), (2) inorganic A step of obtaining two organic thin films in which layers are laminated (a step of obtaining an organic-inorganic laminated film), and (3) a step of obtaining a laminated film for a moisture-proof film of the present invention by adhering two organic thin films. Is the method.
- Step of forming an inorganic layer on the surface of the base material (Step of obtaining an inorganic layer-formed base film)
- the material of the base material used for producing the laminated film for moisture-proof film of the present invention is particularly limited Hanagu metals, glasses, plastics, etc. can be used. Even metals, glass, etc., which do not inherently allow gas to pass through, can be used as substrates for the purpose of compensating for the gas norecity of the defective portion.
- the form of the substrate is not particularly limited, and examples thereof include a film form, a sheet form, and a container form.
- the type of the base material is not particularly limited. Specifically, low-density polyethylene, high-density polyethylene, linear low-density polyethylene, polypropylene, Polyolefin polymers such as polymethylpentene (4-methylpentene monopolymer), cyclic olefin copolymers, and their copolymers, and their acid-modified products, polyvinyl acetate, ethylene vinyl acetate copolymer, ethylene vinyl acetate copolymer Polymer saponified products, butyl acetate copolymers such as polybutyl alcohol, aromatic polyester polymers such as polyethylene terephthalate, polybutylene terephthalate, and polyethylene naphthalate and copolymers thereof, poly ⁇ -strength prolatathone, polyhydroxybutyrate Aliphatic polyester polymerization such as rate and polyhydroxylinate And copolymers thereof, nylon 6, nylon 66, nylon 12, nylon 6,
- the method for forming the inorganic layer on the surface of the substrate is not particularly limited, and an inorganic oxide such as oxide silicon, aluminum oxide, aluminum, silicon nitride, or silicon oxide nitride is used.
- the method of forming the thin film which consists of a compound and a metal compound by a vapor deposition method is mentioned.
- Such vapor deposition methods include physical vapor deposition methods such as sputtering, resistance heating vapor deposition, electron beam vapor deposition, and ion plating.
- the sputtering method a direct current or a high frequency sputtering method using a desired material for the target and an inert gas such as argon or neon as the sputtering gas can be used.
- the resistance heating vapor deposition method is a method in which a desired material is vapor-deposited by resistance heating, and an inorganic layer is formed on the surface of a substrate disposed oppositely.
- the electron beam vapor deposition method is In this method, a desired material is vapor-deposited by an electron beam heating method, and an inorganic layer is formed on the surface of a substrate disposed oppositely.
- an inorganic layer By forming the inorganic layer in this way, it is possible to impart high moisture, transparency, gas nozzle properties, and moisture resistance to the resulting laminated film for moisture barrier film. And in this invention, an inorganic layer can be formed on two base materials, and an inorganic layer formation base film can be obtained.
- Step of obtaining two organic thin films laminated with an inorganic layer step of obtaining an organic-inorganic laminated film
- the polycarboxylic acid is formed on the inorganic layers of the two inorganic layer-forming base films formed as described above. Apply a solution or dispersion of a mixture containing the acid polymer (A), the polyvalent metal compound (B), the volatile base (C) or the acid (D), and a solvent. Two organic thin films are produced that have an inorganic layer stacked on one side.
- a known coating method can be used without any particular limitation, and is performed using dipping or spraying, and a coater, a printing machine, or a brush.
- Coaters, types of printing machines, and coating methods include direct gravure method, reverse gravure method, kiss reverse gravure method, offset gravure method, etc.
- a pecoater, a bar coater, a comma coater, a die coater, or the like can be used.
- the coating thickness (wet) in a state (wet) immediately after coating the solution or dispersion on the inorganic layer is 0.02 m to lmm. Preferred 0.5 ⁇ to 500 / ⁇ ⁇ is more preferable.
- the coating thickness (dry) of the solution or dispersion is preferably 0.001 / zm to Lmm. It is more preferable that it is m-100 micrometers. The desired thickness can be obtained by coating and drying repeatedly 1 to 4 times to achieve such a dry thickness.
- the above-mentioned coating thickness is a value measured from the film cross section using a transmission normalsky differential interference microscope manufactured by Olynos Hikari Kogyo Co., Ltd. Is used. If the thickness is 5 m or less, use a value measured using Otsuka Electronics Co., Ltd. product name MCPD-2000.
- the viscosity of the solution or dispersion in the state immediately before coating the solution or dispersion on the inorganic layer can be adjusted as appropriate.
- the method of evaporating and drying the solvent after applying the coating liquid on the inorganic layer is not particularly limited.
- a method using natural drying a method of drying in an oven set to a predetermined temperature, or a dryer attached to the coater, such as an arch dryer, a floating dryer, a drum dryer, an infrared dryer, or the like can be used.
- the drying conditions can be arbitrarily selected within the range of V, in which the base material, polyvalent metal salt of the polycarboxylic acid polymer (A), and other additives are not damaged by heat.
- the polyvalent metal compound (B) is an unreacted molecular form, a polyvalent metal salt with the polycarboxylic acid polymer (A), and a metal complex salt with the polycarboxylic acid.
- the metal complex salt means a complex of cobalt, nickel, copper, zinc, zirconium or the like and a volatile base.
- Specific examples of the metal complex salt include zinc and copper tetraamonium complex salts.
- the solution or dispersion is applied onto the inorganic layer, dried to form an organic thin film, and an organic thin film (organic / inorganic laminated film) having an inorganic layer laminated on one surface is obtained. Sheets can be manufactured.
- Step of obtaining two layers of organic thin films to obtain a laminated film for moisture-proof membrane of the present invention two pieces obtained as described above were used.
- the organic thin film surfaces of the organic inorganic laminated film can be directly opposed to each other and brought into close contact with each other to produce a moisture proof laminated film.
- the method of directly facing and bonding the organic thin film surfaces of the two organic-inorganic laminated films is not particularly limited, and a known method can be used as appropriate. Specifically, as such a method, a method in which a heating roll is used and the other surfaces of the two organic thin films in which the inorganic layer is laminated on one surface is directly opposed to each other and pressed. Is mentioned. In addition, as a method for performing such pressure bonding, a method using a high-frequency induction heating roll or a resistance heating roll can be cited. Further, when performing such pressure bonding, a heating roll is used to obtain flatness of the film. Expanding rolls and dancer rolls can be appropriately arranged before and after. By directly facing the two organic thin films in this way, the substrate Z inorganic layer Z organic layer (organic thin film 1Z organic thin film 2) Z inorganic layer Z substrate laminated in order of the moisture barrier film A film can be obtained.
- the obtained laminated film for moisture-proof film is subjected to heat treatment at a temperature in the range of 60 ° C to 400 ° C, preferably 100 to 300 ° C, more preferably 150 to 250 ° C. If it is within the above-mentioned temperature range, there is no particular restriction on the heat treatment. Usually, preferably under an inert gas atmosphere, 0.1 to 600 MPa, more preferably 0.1 to: Heat treatment is performed under a LOOMPa caloric pressure, preferably 0.1 to 300 minutes, more preferably 1 to 2000 minutes. If the heat treatment temperature exceeds 400 ° C or if the heat treatment time exceeds 3000 minutes, it will be difficult to obtain the desired oxygen gas barrier property and moisture-proof film, and the production viewpoint will also be problematic.
- Heat treatment temperature and force Less than S60 ° C and heat treatment time of less than 0.1 minutes tend to cause problems, especially from the viewpoint of moisture resistance, because moisture removal is not sufficient.
- the area ratio ⁇ of the infrared absorption spectrum is more reliably 2.5 or less (preferably 0.01-2.3, more preferably 0.01-2.0) from the organic thin film strength in the resulting laminated film for moisture-proof film. ) Is preferably heat-treated at a temperature of 60 to 400 ° C. under 0.1 to 600 MPa.
- the heat treatment temperature is less than the lower limit, moisture tends not to be removed sufficiently, and if the heat treatment temperature exceeds the upper limit, a black to brown pyrolyzate tends to be generated due to thermal decomposition of the resin constituting the organic layer. is there.
- the heat treatment temperature may be changed a plurality of times to raise the temperature step by step to give a heat history.
- the heat treatment apparatus is not particularly limited. For example, it can be heat-treated with a continuous heating device such as an atmospheric oven, an autoclave under pressure, a press machine, or a floating furnace. Examples of the heat treatment method include hot air injection, air floating, infrared radiation, microwave irradiation, and high frequency dielectric heating.
- the volatile base (C) or acid (D) or ammonium carbonate (E) becomes a volatilizing force or salt, leaving traces in the film, but leaving traces in the film. 'Spontaneous has no effect.
- the laminated film for moisture-proof film after such heat treatment is the laminated film for moisture-proof film of the present invention having excellent gas barrier properties and moisture-proof properties.
- FIG. 1 is a schematic view showing a preferred embodiment of an apparatus for producing a laminated film for a moisture-proof film of the present invention.
- the manufacturing apparatus shown in FIG. 1 includes a feeding apparatus 1.
- the inorganic layer forming base film 3 manufactured according to the manufacturing process (1) described above is wound in a roll shape.
- the inorganic layer forming substrate film roll 2 is installed.
- the manufacturing apparatus shown in FIG. 1 includes a corona discharge system 4 and a gravure roll 5 in the direction in which the inorganic layer forming base film 3 fed from the feeding apparatus 1 travels. Part of the gravure roll 5 is added to a solution 6 of a mixture containing the polycarboxylic acid polymer (A), polyvalent metal compound (B), volatile base (C), and solvent prepared as described above. Touching.
- Sarako the production apparatus shown in Fig. 1 is composed of a first drying furnace 7, a heating roll 8, and a second drying furnace in the direction in which the inorganic layer forming substrate film 3 coated with the solution 6 proceeds. 10, Akimuley 1 1, and scraper 12.
- an inorganic layer-forming substrate film roll 2 is provided in a feeding apparatus 1. Is set and the inorganic layer forming base film 3 is fed out. Then, the surface of the inorganic layer of the fed inorganic layer-forming substrate film 3 passes through the corona discharge system 4 so that a corona discharge treatment is performed. The inorganic layer forming base film 3 subjected to such corona discharge treatment is guided to the gravure roll 5, and the solution 6 is applied on the surface of the inorganic layer of the inorganic layer forming base film 3.
- the surface of the inorganic layer of the inorganic layer forming base film 3 is subjected to the corona discharge treatment as described above, it is easy to apply the solution 6 uniformly. Then, the inorganic layer forming base film 3 coated with the solution 6 is guided to the first drying furnace 7 and subjected to heat treatment. Thus, an organic-inorganic laminated film in which an organic thin film is laminated on an inorganic layer can be obtained. In the present embodiment, the step of obtaining such an organic-inorganic laminated film is simultaneously performed on two lines as shown in FIG.
- the organic thin film surfaces of the two organic-inorganic laminate films obtained as described above are pressure-bonded using a heating roll 8, A layer film for a moisture-proof film is obtained in which the base material, the inorganic layer, the organic thin film Z, the organic thin film Z, the inorganic layer, and the base material are laminated in this order.
- the laminated film for moisture-proof film thus pressure-bonded is guided to the second drying furnace 10 and subjected to heat treatment.
- the laminated film for a moisture-proof film of the present invention passes through the Achille Ray 11, and is wound up into a roll shape by the scooping device 12 (a laminated film roll 13 for the moisture-proof film).
- the laminated film for moisture-proof film of the present invention can be obtained.
- the apparatus for producing the moisture-proof laminated film of the present invention suitable for carrying out the production steps (2) and (3) in the production method (i) described above is described above.
- the apparatus for producing such a moisture-proof laminated film is not limited to the above embodiment.
- the embodiment described above is an apparatus for manufacturing a laminated film for a moisture-proof film according to the present invention through a series of operations. It may be performed separately using a separate apparatus as described below.
- Fig. 2 is a schematic view showing an embodiment of an apparatus for producing an organic-inorganic laminated film used for the moisture-proof laminated film of the present invention
- Fig. 3 is a previously produced organic-inorganic laminated film. It is a schematic diagram showing an embodiment of an apparatus for producing a laminated film for a moisture-proof film of the present invention using a film.
- the manufacturing apparatus shown in FIG. 2 includes a feeding apparatus 1 for feeding out the inorganic layer forming base film 3, and the feeding apparatus 1 includes an inorganic layer shape manufactured according to the manufacturing process (1) described above.
- An inorganic layer-forming base film roll 2 in which the base film 3 is wound into a roll is installed.
- the manufacturing apparatus shown in FIG. 2 includes a corona discharge system 4 and a gravure roll 5 for applying the solution 6 in the traveling direction of the inorganic layer forming base film 3.
- the manufacturing apparatus shown in FIG. 2 includes a first drying furnace 7 for performing heat treatment after coating the solution 6, and further, an accumulator 11, and a soot cup in the traveling direction of the heat-treated organic-inorganic laminated film.
- a take-off device 14 is provided.
- the process for producing the organic / inorganic laminated film using the production apparatus shown in FIG. 2 is basically the same as the process for obtaining the organic / inorganic laminated film described in the above-described embodiment.
- the organic / inorganic laminated film roll 15 is taken up into a roll using the scraping device 14 and the organic / inorganic laminated film roll 15 is obtained.
- the manufacturing apparatus shown in FIG. 3 includes a feeding device 1, and the feeding device 1 is provided with the organic-inorganic laminated film roll 15 obtained as described above. Further, the manufacturing apparatus shown in FIG. 3 includes a heating roll 8 for press-bonding the organic thin film surfaces of the two organic-inorganic laminated films 16 fed from the two feeding apparatuses 1, and further a moisture-proof film after the pressure-bonding. In the traveling direction of the laminated film for use, a second drying furnace 10, an Akimulet 11 and a soot removal device 12 are provided.
- the process of obtaining the moisture-proof film laminate film using the manufacturing apparatus shown in FIG. 3 is basically the same as the process of obtaining the moisture-proof film laminate film described in the above-described embodiment.
- the organic thin film surfaces of the organic / inorganic laminated film 16 fed from the two feeding devices 1 are pressure-bonded to each other.
- a laminated film for moisture-proof film is obtained.
- a specific method (ii) for producing a laminated film for a moisture-proof film includes (1) a process of forming an inorganic layer on the surface of a substrate (a step of obtaining an inorganic layer-forming substrate film), and (2) an inorganic layer comprising A process for obtaining two laminated organic thin films (a process for obtaining an organic-inorganic laminated film), and (3) a process for obtaining a laminated film for a moisture-proof film by laminating two organic thin films via an adhesive layer. It is.
- Step of forming an inorganic layer on the surface of a base material Step of obtaining an inorganic layer-forming base film
- Manufacturing method The step of obtaining an inorganic layer-forming base film in (ii) is the above-described manufacturing method This is the same step as the step (1) in (i) of forming an inorganic layer on the surface of the substrate.
- Step of obtaining two organic thin films laminated with an inorganic layer step of obtaining an organic-inorganic laminated film
- the step of obtaining the organic / inorganic laminated film in the production method (ii) is the step of obtaining the two organic thin films laminated with the inorganic layer in the production method (i) described above (the step of obtaining the organic / inorganic laminated film).
- the solution or dispersion is applied onto the inorganic layer and dried to form an organic thin film, and the inorganic film is formed on one surface.
- the step of obtaining the organic / inorganic laminated film in the method (ii) is different in that the solution or dispersion is applied on the inorganic layer and dried to form an organic thin film, followed by heat treatment.
- the solution or dispersion is applied on an inorganic layer, dried to form an organic thin film, and then the organic thin film on which the inorganic layer is laminated is heated to 60 ° C. ⁇ 400 ° C, preferably 100 ⁇ 300 ° C, more preferably 150 ⁇ 250 ° C Two films can be manufactured. If it is within the said temperature range, there will be no special restriction
- 0.1 to 600 MPa preferably 0.1 to: under pressure of LOOMPa, preferably 0.1 to 3000 minutes, more preferably 1 to 2000 minutes. Done.
- the heat treatment temperature exceeds 400 ° C or if the heat treatment time exceeds 3000 minutes, it will be difficult to obtain the desired film with oxygen gas resistance and moisture resistance, and there is also a problem from the viewpoint of production.
- the heat treatment temperature is less than 60 ° C, or when the heat treatment time is less than 0.1 minute, moisture removal is not sufficient, and there is a tendency for a dampproof point problem.
- the organic thin film in the resulting laminated film for moisture-proof film more reliably has an infrared absorption spectrum area ratio ⁇ of 2.5 or less (preferably 0.01-2.3, more preferably 0.01-2). 0), it is preferable that the heat treatment is performed under conditions of 60 to 400 ° C under 0.1 to 600 MPa.
- the heat treatment temperature is less than the lower limit, moisture tends not to be sufficiently removed, and if the heat treatment temperature exceeds the upper limit, a black to brown pyrolysis product tends to be generated due to thermal decomposition of the resin constituting the organic layer. It is in.
- the heat treatment method is not particularly limited.
- the heat treatment temperature may be changed a plurality of times, and the temperature may be raised stepwise to give a heat history.
- the heat treatment apparatus is not particularly limited.
- the heat treatment can be performed by a continuous heating device such as an atmospheric oven, an autoclave under pressure, a press, or a floating furnace.
- Examples of the heat treatment method include hot air injection, air floating, infrared radiation, microwave irradiation, high-frequency dielectric heating, and the like.
- the volatile base (C) or acid (D) or ammonium carbonate (E) is a stripping force or a salt that leaves traces in the film. Does not affect the performance of.
- the organic thin film surfaces of the two organic-inorganic laminated films obtained as described above are laminated with an adhesive layer therebetween to obtain the moisture-proof laminated film of the present invention.
- the method of applying the adhesive to the organic thin film surface of the organic thin film on which the inorganic layer obtained as described above is laminated is not particularly limited, and a known coating method can be used, It can be carried out by dipping, spraying, and using a coater, printing machine or brush. Coaters, types of printing machines, and coating methods include direct gravure method, reverse gravure method, kiss reverse gravure method, offset gravure method, etc. A coater, bar coater, comma coater, die coater, etc. can be used. In addition, when the adhesive is applied, one organic thin film of the two organic thin films may be coated on both organic thin film surfaces of the two organic thin films. Adhesive may be applied only to the surface. Furthermore, it is preferable that the coating thickness when the adhesive is applied to the organic thin film be sufficient to realize a suitable thickness of the adhesive layer described above.
- the method for adhering the two organic thin film surfaces to each other is not particularly limited, and a known method can be used as appropriate, such as a dry laminating method, an etatrusion lamination method, a hot method. A melt lamination method or the like can be used.
- FIG. 4 is a schematic view showing an embodiment of an apparatus for producing the laminated film for moisture-proof membrane of the present invention.
- the configuration of the manufacturing apparatus shown in FIG. 4 is basically the same as that of the manufacturing apparatus shown in FIG.
- the structure differs from the manufacturing apparatus shown in FIG. 1 in that a laminating apparatus 9 is arranged. That is, the manufacturing apparatus shown in FIG. 4 includes two lines configured in the order of the feeding apparatus 1, the corona discharge system 4, the gravure roll 5, and the first drying furnace 7, and one of the lines includes the first line.
- a laminator 9 is further disposed after the drying oven 7.
- the manufacturing apparatus shown in FIG. 4 has an organic / inorganic laminated film that has passed through the first drying furnace 7 and an organic / inorganic laminated film that has been passed through the laminating apparatus 9 and is coated with an adhesive (hereinafter referred to as “contact”).
- a heating roll 8, a second drying furnace 10, an Akumulet 11, and a wrinkle removing device 12 are provided in the traveling direction of the “laminated layer forming laminated film”.
- the process for obtaining the organic / inorganic laminated film in producing the laminated film for moisture-proof film using the production apparatus shown in FIG. 4 is performed using the production apparatus shown in FIG. 1 described above. It is the same process as the process of manufacturing the organic inorganic laminated film at the time of manufacturing.
- the laminated film for moisture-proof film of the present invention that has been subjected to such heat treatment passes through Achille Ray 11, and is wound up into a roll by a scissoring device 12 (laminated film roll for moisture-proof film 13).
- the laminated film for moisture-proof film of the present invention can be obtained.
- an apparatus for producing a laminated film for a moisture-proof film of the present invention suitable for carrying out the production steps (2) and (3) in the production method (ii) described above.
- an apparatus for manufacturing such a laminated film for a moisture-proof film is implemented as described above.
- the form is not limited.
- the embodiment described above is an apparatus for producing a laminated film for a moisture-proof film according to the present invention by a series of operations. Separately from the process of manufacturing the laminated film, it may be performed using a separate apparatus as described below.
- FIG. 5 is a schematic view showing an embodiment of an apparatus for producing an adhesive layer-forming laminated film used for the moisture-proof laminated film of the present invention
- FIG. 6 is a diagram showing formation of an adhesive layer produced in advance. It is a schematic diagram which shows one Embodiment of the apparatus for manufacturing the laminated
- the manufacturing apparatus shown in Fig. 5 includes two feeding apparatuses 1.
- the inorganic layer forming substrate film 3 manufactured according to the manufacturing process (1) described above is rolled.
- a rolled inorganic layer forming substrate film roll 2 is installed.
- the production apparatus shown in FIG. 5 has a corona discharge system 4 in the traveling direction of the inorganic layer forming base film 3 and a polycarboxylic acid polymer (A) and a polyvalent metal compound (A) prepared as described above.
- a gravure roll 5 for coating a solution 6 of a mixture containing B), a volatile base (C) and a solvent is provided.
- the manufacturing apparatus shown in FIG. 5 includes a first drying furnace 7 for performing heat treatment after coating the solution 6, and further applying an adhesive in the traveling direction of the heat-treated organic-inorganic laminated film.
- a laminating device 9 is provided.
- the other feeding device 1 of the manufacturing apparatus shown in FIG. 5 is provided with a release paper roll 20 in which a release paper 21 is wound in a roll shape.
- the release paper 21 used is not particularly limited, and a commercially available release paper or the like can be used.
- the manufacturing apparatus shown in FIG. 5 includes a heating roll 8 for crimping the adhesive layer-forming laminated film coated with the adhesive by the laminating apparatus 9 and the release paper 21 fed from the feeding apparatus 1. In the advancing direction of the adhesive layer-forming laminated film laminated with the release paper pressure-bonded by the heating roll 8, an Akimulet 11 and a scraping device 22 are provided.
- a process for producing an adhesive layer-formed laminated film using the production apparatus shown in Fig. 5 will be described below. First, it is the same as the step of obtaining the organic-inorganic laminated film described in the above-described embodiment for the inorganic layer forming substrate film 3 fed from one feeding device 1. To obtain an organic-inorganic laminated film. Thereafter, an adhesive is applied to the organic thin film surface of the obtained organic-inorganic laminated film using a laminating apparatus 9. Next, the adhesive layer-formed laminated film coated with such an adhesive and the release paper 21 fed from the other feeding device 1 are pressure-bonded by a heating roll 8 and applied to the adhesive layer surface of the adhesive layer-formed laminated film. Adhere release paper 21.
- the adhesive layer forming laminated film having the release paper 21 bonded in this manner passes through the Achille tray 11 and is taken up into a roll by the scooping device 22 (adhesive layer forming laminated film roll 23). In this way, an adhesive layer-formed laminated film is obtained.
- the manufacturing apparatus shown in FIG. 5 can also be produced by using the apparatus in which the feeding apparatus 1, laminating apparatus 9 and heating roll 8 are removed from which the release paper roll 20 is installed, so that the organic-inorganic laminated film 16 is used.
- the organic-inorganic laminated film 16 is used.
- an organic / inorganic laminated film roll 15 wound in a roll shape is obtained.
- the manufacturing apparatus shown in FIG. 6 includes two feeding apparatuses 1, and one feeding apparatus 1 is provided with an adhesive layer-formed laminated film roll 23 obtained as described above.
- the manufacturing apparatus shown in FIG. 6 includes a scooping device 25 for taking up the release paper 21 laminated on the adhesive layer-forming laminated film and winding it in a roll shape (release paper roll 24).
- the other feeding apparatus 1 is provided with the organic / inorganic laminated film roll 15 obtained as described above.
- the manufacturing apparatus shown in FIG. 6 includes a heating roll 8 for press-bonding the adhesive layer surface of the adhesive layer-forming laminated film and the organic thin film surface of the organic-inorganic multilayer film 16, and a moisture-proof film obtained after the press-bonding.
- a second drying furnace 10 In the traveling direction of the laminated film for use, a second drying furnace 10, an Akimulet 11, and a scraping device 12 are provided.
- the step of obtaining the moisture-proof laminated film using the manufacturing apparatus shown in Fig. 6 obtains the moisture-proof laminated film described in the embodiment using the production apparatus shown in Fig. 4 described above.
- the adhesive layer-forming laminated film roll 23 and the organic / inorganic laminated film roll 15 obtained as described above were used and bonded to the adhesive layer-forming laminated film.
- the adhesive layer surface of the adhesive layer forming laminate film and the organic thin film surface of the organic / inorganic laminated film 16 are pressure-bonded. A bright laminated film for moisture-proof film is obtained.
- the laminated film for a moisture-proof film and the method for producing the same of the present invention may further include another layer on the outside of the substrate.
- the laminated film for a moisture-proof film of the present invention may further include another layer on the outside of the substrate.
- other layers include, but are not limited to, a layer made of a synthetic resin having transparency, a heat-sealable resin layer, and the like, which are different from the base material used in the present invention.
- stacked the base material and made the base material into multiple layers can also be mentioned.
- Examples of such a layer made of a synthetic resin having transparency include, for example, a resin layer formed from a mixture of polybulualcohol and poly (meth) acrylic acid, a mixture of sugars and poly (meth) acrylic acid, and the like. And the like.
- Examples of the heat-sealable resin layer include a polyolefin hot-melt sealant layer and an epoxy hot-melt sealant layer.
- a known laminating method may be employed, in which a laminating material is laminated by coating, or a laminating material in the form of a film or sheet is interposed with or without an adhesive. The method of laminating is mentioned.
- Specific lamination methods include a dry lamination method, a wet lamination method, and an extrusion lamination method. Even when other layers are laminated in this way, the properties of the moisture-proof laminated film (oxygen permeability, water vapor permeability, etc.) are not inferior. By selecting this material, it is possible to obtain a laminate with other functions added.
- the laminated film for moisture-proof film of the present invention can be used as a moisture-proof film for an electoluminescence device.
- the substrate is a transparent resin film and has heat resistance that can withstand vapor deposition or sputtering. What has is preferable.
- any material can be used as the base material resin. Examples of such a base material resin include polyarylate, polycarbonate, polyethylene terephthalate, polyethylene naphthalate, polyethersulfone, polyester resin, polyamide, cellulose triacetate, acrylic resin, methacrylic resin, and polyester.
- the laminated film for moisture-proof film of the present invention is preferably used as follows.
- the laminate film for moisture-proof film of the present invention is used to sandwich the electret luminescence element from the front and back. In that case, it is preferable to make the laminated film for moisture-proof film sufficiently large and to adhere the laminated film for moisture-proof film to each other around the electoluminescence element.
- an adhesive is applied to the entire surface or the end of the laminated film for the moisture-proof film on the side to be in close contact with the electoluminescence element.
- the adhesive By using the adhesive, the electoric luminescence element body and the laminated film for the moisture-proof film are bonded, and further, the laminated films for the moisture-proof film are bonded around the elect-luminescent element.
- the front side and the back side of the electoric luminescence element are insulated.
- the length from the end surface in contact with the outside air of the adhesive to the inner end surface sealed with the laminated film for moisture-proof film is the thickness of the applied adhesive from the viewpoint of maintaining moisture-proof property. It is preferable to make it sufficiently longer than that.
- an adhesive an ultraviolet curable adhesive, a hot melt adhesive, or a synthetic resin adhesive is used, and an epoxy or acrylic ultraviolet curable adhesive is particularly preferably used.
- the obtained multilayer film for moisture-proof membrane of the present invention can be assembled as a material for precision electronic parts, and forms packaging bags and packaging containers for fine chemicals such as pharmaceuticals and test drugs. Can be made.
- an electroluminescent device hereinafter referred to as EL
- EL electroluminescent device
- the fine chemicals as packaging bags or containers, for example, for the long-term storage of pharmaceuticals and test drugs that may reduce the effect of the drug due to moisture absorption or cause side effects due to chemical changes.
- the use of the laminated film for a moisture-proof film of the present invention for a packaging bag or packaging container for pharmaceuticals or test drugs is mentioned.
- an EL element emits light by itself, and its thin film, light weight,!
- the application is expanding as an image display.
- the phosphor constituting the light emitting layer absorbs moisture, the luminance of the emitted light is remarkably impaired. Specifically, a phenomenon may occur in which the luminance of the dark spot or the entire panel becomes small. Therefore, an EL element generally has a structure in which a light emitting layer is disposed between a pair of electrodes, and has a structure in which the whole is sealed with a transparent moisture-proof film.
- Example 1 Regarding the laminated film for moisture-proof film obtained in the preliminary test, Example 1 and each comparative example, the area ratio ex [peak area S (3700 ⁇ 2500cm _1) was determined Z peak area S (1800 ⁇ 1500cm _ 1)].
- the peak area S (3700-2500 cm _ 1 ) is obtained by area integration in the range of 3700-2500 cm _ 1 with a line connecting the absorbance of 3700 cm _ 1 and the absorbance of 2500 cm- 1 as the base line. It was. Also, the peak area S (1800 ⁇ 1500cm _ 1) is, and the absorbance of 1800 cm _ 1 1500
- cm- 1 of the straight line connecting two points of the absorbance as a baseline was determined by area integration of a range of 1800 ⁇ 1500cm _ 1.
- Example 1 Regarding the laminated film for moisture-proof film obtained in the preliminary test, Example 1 and each comparative example, among the methods described above, the peak ratio j8 [peak] from the ratio of the peak height of the infrared absorption spectrum of the film by the ATR method. a (1560cm - 1) / peak a (1700cm _ 1)] was determined.
- the peak A (1600cm- absorbance, 1600 cm _ 1 of absorbance and 1500Cm- 1 of the intake
- the peak A (1700cm _ 1) is, 1800 cm _ 1 of absorbance and 1600Cm- 1 of the intake
- the oxygen permeability of the moisture-proof laminated film obtained in the preliminary test, Example 1 and each comparative example was measured using a product name OXTRAN2Z20 of an oxygen permeation tester manufactured by Modern Control, at a temperature of 30 ° C and a relative humidity of 80%. It was measured under the condition of (RH).
- the measurement method conformed to JIS K 7126, B method (isobaric method), and ASTM D3985-81, and the measured value was expressed in the unit cm 3 (ST P) / (m 2 ⁇ day-MPa).
- (STP) means the standard condition (0 ° C, 1 atm) for defining the volume of oxygen.
- the measurement was performed by the isobaric method.
- Example 1 In order to evaluate the moisture resistance of the laminated film for moisture-proof membranes obtained in the preliminary test, Example 1 and each comparative example, the water vapor permeability was measured using the JIS K7129-1992 water vapor permeability test method for plastic films and sheets (equipment). The measurement method was performed according to Method B (infrared sensor method). Specifically, preliminary humidification was performed under conditions of a temperature of 60 ° C and a relative humidity of 90%, and WVTR was measured at a temperature of 40 ° C and a relative humidity of 90% after a predetermined time had elapsed since the start of humidification.
- Method B infrared sensor method
- the measuring equipment was PERMA TRA N, a product name of a water vapor permeation tester manufactured by Modern Control, at a relative humidity of 90% RH on the water vapor supply side.
- the measured value was expressed in the unit gZm 2 'day.
- a laminated film for a moisture-proof film in which an organic thin film is formed on a base material is manufactured.
- the Zn Auger electron spectrum of the thin film was measured.
- an organic thin film was produced under the following conditions. It is also possible to peel another layer so as to expose the surface of the organic thin film, and to use this surface as an organic thin film specimen.
- Polyacrylic acid solid content concentration 2.5 wt%, ZnO addition amount: 2.0 chemical equivalent, ammonia addition amount: 5.0 (mass ratio to ZnO), ammonium carbonate addition amount: 5.5 ( The coating solution was prepared so that the mass ratio to ZnO).
- polyacrylic acid PAA: Toagosei Co., Ltd., trade name AALON A-10H
- ZnO Wako Pure Chemical Industries
- Direct gravure method (gravure version: 45 lines, depth: 800 ⁇ m, wet coating amount: about 22 g / m 2 , KL multi-coater, substrate: polyethylene terephthalate).
- In-line drying drying oven setting: first zone 60 ° C 15mZsec, second zone 60 ° C 15mZsec, line speed: 4mZmin).
- the organic thin film was fixed to the ferrule plate and heat-treated for 15 minutes in a 210 ° C gear oven.
- the obtained organic thin film was subjected to chamfering with an inclination by a polishing method. After that, the distribution of the elements in the organic thin film and the auger electronic spectrum of Zn at the point of 0.2111 and the point of 0.4 m from the surface side were clearly measured.
- the measurement method was based on the following conditions.
- Measuring device Product name manufactured by PHI Quantera SXM
- Measurement spectrum Wide (0 to 1500 eV), narrow (490 to 505 eV corresponding to Zn—LMN Auger electrons).
- Fig. 7 shows the distribution of the elements confirmed by the measurement
- Fig. 8 shows the measurement results obtained by the analysis of the Zn Auger electron spectrum.
- ⁇ indicates the relationship between the binding energy and the strength of zinc by the Auger electron spectrum analysis on the surface of the organic thin film
- ⁇ indicates the Auger electron spectrum at the surface force of 0.2 m of the organic thin film.
- Analysis shows the relationship between the binding energy and strength of zinc
- ⁇ shows the relationship between the binding energy and strength of zinc in the position of surface force 0.
- the binding energy by the Auger electron spectrum analysis of Zn has a peak at 496 to 498 eV, and the strong peak is mainly the chemistry of zinc and ammonia. It was presumed to be derived from the mechanical bond.
- Solution A for forming an organic thin film was produced as follows.
- polycarboxylic acid polymer A
- PAA polyacrylic acid
- trade name: AALON A-10H a few average molecular weight 200, 000, 25 wt% aqueous solution
- ammonia water (reagent ammonia 28 wt% aqueous solution manufactured by Wako Pure Chemical Industries, Ltd.), acid zinc (reagent manufactured by Wako Pure Chemical Industries, Ltd.), and distilled water are used as volatile bases.
- Solution A was obtained by sequentially adding in composition and mixing with an ultrasonic homogenizer. Utilizing the complexing ability of zinc with volatile base (ammonia), it was a homogeneous transparent solution in which zinc oxide was completely dissolved.
- Solution B for forming an organic thin film was prepared as follows.
- a polycarboxylic acid polymer Toagosei Co., Ltd., product name AALON A-10H (number average molecular weight 200, 000, 25 wt% aqueous solution) of polyacrylic acid (PAA) is used, and Wako Pure Chemical is used as a saccharide.
- PAA polyacrylic acid
- Soluble starch was used and each was diluted with water to prepare an aqueous solution.
- a sodium hydroxide hydroxide manufactured by Wako Pure Chemical Industries, Ltd., first grade reagent
- the composition of solution B is as follows.
- Solution B composition is as follows.
- Example 1 a laminated film for a moisture-proof film was produced by laminating the base material Z inorganic layer Z organic layer (organic thin film Z organic thin film) Z inorganic layer Z base material in this order. That is, two stretched polyethylene terephthalate films (PET film: product name Lumirror S10, thickness 12 / zm, manufactured by Toray Industries, Inc.) are used as the base materials, and the oxidation cages are respectively formed on the two base materials. A vapor-deposited film (inorganic layer) was formed. As the vapor deposition method, an electron beam vapor deposition method was used, and an oxide layer was deposited on the substrate so that the film thickness was 0.025 m. In this way, two inorganic layer-forming substrate films in which the inorganic layer was laminated on the substrate were produced.
- PET film product name Lumirror S10, thickness 12 / zm, manufactured by Toray Industries, Inc.
- the solution A obtained in Production Example 1 was applied to a bar coater (a product manufactured by RK PRINT-COAT IN STRUMENT). (Name K303PROOFER) to obtain two organic / inorganic laminated films in which an inorganic layer and an organic thin film were laminated on a base material.
- the organic thin film surfaces of the two organic-inorganic laminated films are directly opposed to each other and are pressure-bonded with a pressure IMPa under a condition of 90 ° C using a heating roll, and then in an oven,
- the laminated film for moisture-proof film of the present invention was obtained by heat treatment at 200 ° C. for 60 minutes.
- the thickness of the organic layer in the obtained laminated film for moisture-proof membrane is 1.4 m (one organic thin film) The thickness was 0.
- the area ratio ⁇ [peak area S (3700-2500 cm _1 ) Z peak area S (1800-1500 cm _1 )] and the peak ratio j8 [ Peak A (1560cm— 1 ) / Peak A (1700cm
- WVTR water vapor permeability
- Example 2 a laminated film for a moisture-proof film was produced by laminating the base material Z inorganic layer Z organic thin film Z adhesive layer Z organic thin film Z inorganic layer Z base material in this order. That is, two stretched polyethylene terephthalate films (PET film: product name Lumirror S10, thickness 12 / zm, manufactured by Toray Industries, Inc.) are used as the base materials, and the oxidation cages are respectively formed on the two base materials. A vapor-deposited film (inorganic layer) was formed. As the vapor deposition method, an electron beam vapor deposition method was used, and an oxide layer was deposited on the substrate so that the film thickness was 0.025 m. In this way, two inorganic layer-forming substrate films in which the inorganic layer was laminated on the substrate were produced.
- PET film product name Lumirror S10, thickness 12 / zm, manufactured by Toray Industries, Inc.
- the solution A obtained in Production Example 1 was applied to a bar coater (product of RK PRINT-COAT IN STRUMENT). Name was K303PROOFER), and then heat treated in an oven at 200 ° C for 60 minutes to obtain two organic / inorganic laminated films in which an inorganic layer and an organic thin film were laminated on the substrate. .
- an adhesive was applied onto the organic thin film surfaces of the two organic / inorganic laminated films and adhered by a dry laminating method to obtain a laminated film for a moisture-proof film of the present invention.
- a urethane adhesive (Dick Dry LX500 (main agent) / KW75 (curing agent), Vicat soft spot, manufactured by Dainippon Ink & Chemicals) on the organic thin film surface of the two organic / inorganic laminated films. 100 ° C. to 105 ° C.) and dried for 5 seconds at a temperature of 200 ° C. and then pressure-bonded at a pressure of IM Pa at a temperature of 150 ° C.
- a laminated film for a moisture-proof film of the present invention adhered through the film was obtained.
- the thickness of the organic thin film in the obtained laminated film for moisture-proof film was 0.7 ⁇ m, and the thickness of the adhesive layer was 1.5 m.
- the laminated film for moisture-proof film obtained in this way is also used.
- Area ratio ⁇ [peak area S (3700-2500 cm _1 ) Z peak area S (1800-1500 cm _1 )], peak ratio j8 [peak A (1560 cm
- Example 3 instead of urethane adhesive (product name Dick Dry LX500 (main agent) / KW75 (curing agent) manufactured by Dainippon Ink, Vicat softening point 100 to 105 ° C), polyester adhesive (Toyo The product name TM250HV (main agent), product name CAT-RT 86L-60 (curing agent), Vicat soft spot 95-98 ° C) manufactured by Morton Co., Ltd. A laminated film for moisture-proof film was obtained.
- urethane adhesive product name Dick Dry LX500 (main agent) / KW75 (curing agent) manufactured by Dainippon Ink, Vicat softening point 100 to 105 ° C
- polyester adhesive Toyo The product name TM250HV (main agent), product name CAT-RT 86L-60 (curing agent), Vicat soft spot 95-98 ° C) manufactured by Morton Co., Ltd.
- a laminated film for moisture-proof film was obtained.
- the thickness of the organic thin film in the obtained laminated film for moisture-proof film was 0.7 ⁇ m, and the thickness of the adhesive layer was 1.5 m.
- the area ratio ⁇ [peak area S (3700-2500 cm _1 ) Z peak area S (1800-1500 cm _1 )] and peak ratio j8 [ Peak A (1560cm— 1 ) / peak
- acrylic adhesive was used instead of urethane adhesive (product name Dick Dry LX500 (main agent) / KW75 (curing agent), Vicat softening point 100 to 105 ° C, manufactured by Dainippon Ink and Co., Ltd.) Except for using the agent (trade name BLS-PA3 (main agent) / CAT-RT35 (curing agent), Vicat soft spot 105-110 ° C, manufactured by Toyo Morton Co., Ltd.) A laminated film for a moisture-proof film was obtained.
- urethane adhesive product name Dick Dry LX500 (main agent) / KW75 (curing agent), Vicat softening point 100 to 105 ° C, manufactured by Dainippon Ink and Co., Ltd.
- the agent trade name BLS-PA3 (main agent) / CAT-RT35 (curing agent)
- Vicat soft spot 105-110 ° C manufactured by Toyo Morton Co., Ltd.
- the thickness of the organic thin film in the obtained laminated film for moisture-proof film was 0.7 ⁇ m, respectively, and the thickness of the adhesive layer was 1.5 m.
- the area ratio ⁇ [peak area S (3700-2500 cm _1 ) Z peak area S (1800-1500 cm _1 )] and peak ratio j8 [ Peak A (1560cm— 1 ) / peak A (1700cm- 1 )], oxygen permeability and water vapor permeability (WVTR)
- Comparative Example 1 a laminated film for a moisture-proof film was produced, which was laminated in the order of base material Z inorganic layer Z organic thin film. That is, a stretched polyethylene terephthalate film (PET film: product name Lumirror S10, thickness 12 / zm, manufactured by Toray Industries, Inc.) is used as the base material, and a silicon oxide vapor deposition film (inorganic layer) is formed on the strong base material. ) To form an inorganic layer-formed base film in which an inorganic layer was laminated on the base material. In addition, as a vapor deposition method, the same method as in Example 1 was used.
- PET film product name Lumirror S10, thickness 12 / zm, manufactured by Toray Industries, Inc.
- the solution A obtained in Production Example 1 is used with a bar coater (trade name K3 03PROOFER manufactured by RK PRINT-COAT IN STRUMENT).
- the coated film was heat-treated in an oven at 200 ° C. for 60 minutes to obtain a laminated film for a moisture-proof film as a comparison.
- the film thickness of the inorganic layer was 0.025 ⁇ m, and the film thickness of the organic thin film was 0. Further, the same measurement as in Example 1 was performed on the laminated film for moisture-proof film thus obtained. The WVTR was measured after 0 hours and after 250 hours. The results obtained are shown in Table 1.
- Comparative Example 2 a laminated film for a moisture-proof film was produced, which was laminated in the order of base material Z inorganic layer Z organic thin film. At this time, a laminated film for a moisture-proof film was obtained in the same manner as in Comparative Example 1 except that the solution B was used.
- the film thickness of the inorganic layer was 0.025 ⁇ m, and the film thickness of the organic thin film was 0.0. Further, the same measurement as in Example 1 was performed on the laminated film for moisture-proof film thus obtained. The WVTR was measured after 0 hours and after 250 hours. The results obtained are shown in Table 1.
- a laminated film for a moisture-proof film was produced in the order of the base material Z organic thin film. That is, stretched polyethylene terephthalate film (PET film: Toray Using the product name Lumirror S10 (thickness: 12 / zm) manufactured by Co., Ltd., the solution A obtained in Production Example 1 was applied on a strong substrate using a bar coater (RK PRINT-COAT IN STRUMENT Product name K303PROOFER) was applied, and heat treatment was performed in an oven at 200 ° C. for 60 minutes to obtain a laminated film for moisture-proof film as a comparison.
- a bar coater RK PRINT-COAT IN STRUMENT Product name K303PROOFER
- the film thickness of the organic thin film was 0.7 ⁇ m. Further, the same measurement as in Example 1 was performed on the laminated film for moisture-proof film thus obtained. WVTR was measured 0 hours after the start of humidification. The results obtained are shown in Table 1.
- Comparative Example 4 a laminated film for a moisture-proof film laminated in the order of the base material Z inorganic layer was produced. That is, stretched polyethylene terephthalate film (PET film: product name Lumirror S10, thickness 12 111, manufactured by Toray Industries, Inc.) is used as a base material, and an acid-sealed vapor deposition film (inorganic layer) on a strong base material. ) To obtain a laminated film for moisture-proof film as a comparison. As a vapor deposition method, the same method as in Example 1 was used.
- PET film product name Lumirror S10, thickness 12 111, manufactured by Toray Industries, Inc.
- the film thickness of the inorganic layer was 0.025 ⁇ m. Further, the same measurement as in Example 1 was performed on the laminated film for moisture-proof film thus obtained. WVTR was measured after 0 hours and 250 hours after the start of humidification. The results obtained are shown in Table 1.
- a laminated film for a moisture-proof film was produced in the order of the base material Z inorganic layer Z adhesive layer. That is, a stretched polyethylene terephthalate film (PET film: product name Lumirror S 10 manufactured by Toray Industries, Inc., thickness 12 m) is used as the base material, and an oxidized silicon vapor-deposited film (inorganic layer) is applied on the strong base material. ) To produce an inorganic layer forming substrate film in which an inorganic layer is laminated on a substrate. The vapor deposition method was the same as in Example 1.
- PET film product name Lumirror S 10 manufactured by Toray Industries, Inc., thickness 12 m
- an adhesive (trade name TM250HV (main agent), product name CAT—RT86L-60 (hard hardener), Vicat Soft, manufactured by Toyo Morton Co., Ltd.) was applied on the inorganic layer of the inorganic layer forming substrate film. (Chemical point 95-98 ° C), dried for 1 minute at 70 ° C using a dryer, and then heat treated in an oven at 200 ° C for 60 minutes for comparative moisture-proofing Laminate film for membrane I got Lum.
- TM250HV main agent
- CAT—RT86L-60 hard hardener
- Vicat Soft manufactured by Toyo Morton Co., Ltd.
- the film thickness of the inorganic layer was 0.025 ⁇ m, and the film thickness of the adhesive layer was 1. Further, the same measurement as in Example 1 was performed on the laminated film for moisture-proof film thus obtained. WVTR was measured after 0, 24 and 250 hours from the start of humidification. The results obtained are shown in Table 1.
- Comparative Example 6 a laminated film for a moisture-proof film was produced by laminating the base material Z inorganic layer Z organic layer (organic thin film Z organic thin film) Z inorganic layer Z base material in this order.
- a comparative laminated film for a moisture-proof film was obtained in the same manner as in Example 1 except that the solution B was used instead of the solution A in the production of the strong laminated film for the moisture-proof film.
- the inorganic layer has a thickness of 0.025 ⁇ m and the organic layer has a thickness of 1.4 m (the thickness of one organic thin film is 0.7 m). there were. Further, the same measurement as in Example 1 was performed on the laminated film for moisture-proof film thus obtained. WVT R was measured after 0 hours, 24 hours, and 250 hours after the start of humidification. Table 1 shows the results obtained.
- Comparative Example 7 a laminated film for a moisture-proof film was produced by laminating the base material Z inorganic layer Z organic thin film Z adhesive layer Z organic thin film Z inorganic layer Z base material in this order.
- a comparative laminated film for a moisture-proof film was obtained in the same manner as in Example 2 except that the solution B was used instead of the solution A in the production of the strong laminated film for the moisture-proof film.
- the film thickness of the inorganic layer was 0.025 ⁇ m
- the film thickness of the organic thin film was 0.0
- the thickness of the adhesive layer was 1.5 m. Further, the same measurement as in Example 1 was performed on the laminated film for moisture-proof film thus obtained. WVT R was measured after 0 hours, 24 hours, and 250 hours after the start of humidification. Table 1 shows the results obtained.
- a laminated film for a moisture-proof film was produced by laminating the base material Z organic layer (organic thin film Z organic thin film) Z base material in this order. That is, as a base material, Using a tarate film (PET film: trade name Lumirror S 10 manufactured by Toray Industries, Inc., thickness 12 m), the solution A obtained in Production Example 1 was applied to Barco on each of the two substrates. The organic thin film is coated with a thin film (product name: K303PROOFE R manufactured by RK PRINT-COAT IN STRUMENT), dried in an oven at 200 ° C for 60 minutes, and the organic thin film is laminated on the substrate. Two laminated films were produced.
- a tarate film PET film: trade name Lumirror S 10 manufactured by Toray Industries, Inc., thickness 12 m
- the organic thin film is coated with a thin film (product name: K303PROOFE R manufactured by RK PRINT-COAT IN STRUMENT), dried in an oven at 200 ° C for 60 minutes
- the organic thin film surfaces of the two organic thin film laminated films are directly opposed to each other, and are pressure-bonded at a pressure IMPa under a condition of 50 ° C using a heating roll.
- a heat-resistant laminated film for comparison was obtained by heat treatment at 50 ° C. for 60 minutes.
- the thickness of the organic layer in the obtained laminated film for moisture-proof film was 1.4 m (the thickness of one organic thin film was 0. In addition, the laminated film for moisture-proof film thus obtained was about
- Example 1 The same measurement as in Example 1 was performed. WVTR was measured after 0 hours and 250 hours from the start of humidification. The results obtained are shown in Table 1.
- the laminated films for moisture-proof membranes of the present invention obtained in Examples 1 to 4 have a WVTR of 0.02 or less even after 500 hours have passed since the start of humidification. Humidification Even after 1000 hours from the start, the WVTR was 0.02. For this reason, it was confirmed that the laminated film for moisture-proof membranes of the present invention obtained in Examples 1 to 4 stably maintained a high level of moisture-proof property over a long period of time. On the other hand, the laminated films for moisture-proof membranes obtained in each comparative example all showed a WVTR value of 0.04 or more after 250 hours after humidification, which is not sufficient in terms of maintaining waterproofness. I helped. Further, as is clear from the results in Table 1, it was confirmed that the laminated films for moisture-proof films of the present invention obtained in Examples 1 to 4 exhibited high gas nozzle properties.
- each electoluminescence element assembled with the laminated film for moisture-proof film obtained in Example 1 and Comparative Examples 1, 6, and 7 was 250 hours at a temperature of 60 ° C and a relative humidity of 90%. After pre-humidification, electricity was applied to each electroluminescent device, and the degree of dark spot generation was observed. Table 2 shows the results obtained.
- Substrate / inorganic layer / organic layer organic thin film organic thin film
- Example 3 Substrate Inorganic layer / organic thin film / adhesive layer / organic thin solution A Adhesive No dark spot was produced.
- Comparative Example 7 Solution B Agent A film / inorganic layer / base material that has dark spots around the display (100 to 105 ° C)
- the electoluminescence device assembled with the multilayer film for a moisture-proof film of the present invention obtained in Examples 1 to 4 has a light emitting display surface on its entire surface. The cspot worked normally without any spots.
- the electoluminescence device assembled with the laminated film for the moisture-proof film obtained in Comparative Examples 1 and 6 to 8 produced a dark spot on the light emitting display surface, and did not operate normally. From this, it was confirmed that the laminated film for a moisture-proof film of the present invention can be suitably used as a moisture-proof film for an electoluminescence device.
- each of the moisture-proof laminated films obtained in Examples 1 to 4 and Comparative Examples 1 and 6 to 8 was used to form a three-way pillow-one sealed packaging container.
- Each three-way pillow sealed packaging container is packed with 20 g of fine chemical acid titanium dioxide powder (number average diameter 2 m) for 250 hours under conditions of 60 ° C temperature and 90% relative humidity. After pre-humidification, the degree of powder lump (also called core guidance) in the three-way pillow sealed package was shaken by hand. Table 3 shows the results obtained.
- Item Solvent used in the construction of laminated film for moisture barrier film
- Example 3 Substrate / Inorganic layer / Organic thin film / Adhesive layer / Organic thin solution A Adhesive
- a laminated film for a moisture-proof film in which inorganic layers are laminated on both sides of an organic layer, the gas barrier being caused by micro pinholes in the film thickness direction in the organic layer. It is possible to prevent the deterioration of heat resistance and moisture resistance sufficiently and to stably exhibit a high level of gas barrier properties and moisture resistance over a long period of time, even if external force such as bending or impact is applied. It is possible to provide a laminated film for a moisture-proof film capable of maintaining the high gas nozzle property and moisture-proof property, and a method for producing the same.
- the laminated film for a moisture-proof film of the present invention is excellent in gas barrier properties and moisture-proof properties, and thus is suitable as a material for precision electronic parts and used as a package for fine chemicals such as pharmaceuticals and test drugs. It is particularly useful as a moisture-proof film for electoluminescence devices
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- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Wood Science & Technology (AREA)
- Laminated Bodies (AREA)
- Electroluminescent Light Sources (AREA)
Abstract
Description
Claims
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WO2008068948A1 (ja) * | 2006-12-01 | 2008-06-12 | Kureha Corporation | コーティング液、それを用いたガスバリア性積層体およびガスバリア性成形体、並びにガスバリア性積層体の製造方法 |
JP2008248062A (ja) * | 2007-03-30 | 2008-10-16 | Kureha Corp | ガスバリア層形成用塗工液およびガスバリア性積層体の製造方法 |
JP2009123347A (ja) * | 2007-11-10 | 2009-06-04 | Tohcello Co Ltd | デバイス封止材、封止されたデバイス及びその製造方法 |
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US8808816B2 (en) | 2006-12-01 | 2014-08-19 | Toppan Printing Co., Ltd. | Coating liquid, gas-barrier multilayer structure and gas-barrier shaped article therefrom, and process for producing gas-barrier multilayer structure |
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