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WO2005109482A1 - Gas supply integration unit - Google Patents

Gas supply integration unit Download PDF

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Publication number
WO2005109482A1
WO2005109482A1 PCT/JP2005/007308 JP2005007308W WO2005109482A1 WO 2005109482 A1 WO2005109482 A1 WO 2005109482A1 JP 2005007308 W JP2005007308 W JP 2005007308W WO 2005109482 A1 WO2005109482 A1 WO 2005109482A1
Authority
WO
WIPO (PCT)
Prior art keywords
unit
gas
holding member
flow path
gas supply
Prior art date
Application number
PCT/JP2005/007308
Other languages
French (fr)
Japanese (ja)
Inventor
Akihiro Takeichi
Tatsuhito Aoyama
Toshikazu Miwa
Takashi Inoue
Original Assignee
Ckd Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ckd Corporation filed Critical Ckd Corporation
Priority to KR1020067025097A priority Critical patent/KR101074265B1/en
Publication of WO2005109482A1 publication Critical patent/WO2005109482A1/en

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • C23C16/45561Gas plumbing upstream of the reaction chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17DPIPE-LINE SYSTEMS; PIPE-LINES
    • F17D1/00Pipe-line systems
    • F17D1/02Pipe-line systems for gases or vapours
    • F17D1/04Pipe-line systems for gases or vapours for distribution of gas
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67017Apparatus for fluid treatment
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67103Apparatus for thermal treatment mainly by conduction
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E60/00Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
    • Y02E60/30Hydrogen technology
    • Y02E60/34Hydrogen distribution

Definitions

  • the present invention relates to a gas supply integrated unit used in a semiconductor manufacturing apparatus or the like, and more particularly, to dichlorosilane which is liable to liquefy unless external heat is removed at room temperature where the vaporization temperature is high. (Or dichlorosilane), WF6, HBr, etc. It is related to a gas supply integrated unit that supplies process gas with high accuracy without liquefaction.
  • a silicon oxide thin film or the like formed by a vapor phase has been frequently used as an insulating film in a semiconductor integrated circuit.
  • the vapor phase film formation of strong silicon oxide or the like is generally performed by a chemical vapor deposition method on a wafer placed in a film forming tank.
  • the gas supply device of Patent Document 1 uses, for example, piping, fittings, gas valves 62 and 64, and an electromagnetic valve with a mass flow meter as shown in FIG.
  • the tape-shaped heater 60 is held and arranged in holding grooves 53, 54 formed in the heat transfer block 51 and the sub heat transfer block 52.
  • the dichlorosilane (or dichlorosilane) or the like is heated and kept at a temperature higher than the vaporization temperature.
  • the upper surface of the heat transfer block 51 is a contact surface 65 that contacts the solenoid valve 61 with a mass flow meter from below, and heats and heats the solenoid valve 61 with a mass flow meter.
  • Patent document 1 JP-A-7-286720
  • the gas supply device shown in Fig. 9 has a heat transfer block 51 and a sub heat transfer block on both sides of the gas unit. Since the tape-shaped heaters 60 are provided in the holding grooves 53 and 54 formed in the gas unit 52, the width of the gas unit is larger than that of the gas unit that does not require a heater.
  • the gas supply device requires many components for heating and keeping heat, such as the heater 60, the heat transfer block 51, and the sub-heat transfer block 52, on both sides of the gas unit, resulting in high costs.
  • the gas supply integrated unit of the present invention has the following configuration in order to solve the above problems.
  • a second manual valve provided at a position communicating with the passage is integrally connected in series with the passage block and the unit fixing plate, and the cross section of the gas supply integrated unit having a plurality of gas units is U-shaped.
  • the gas unit is fitted to the holding member, and a rail to be fastened, and a plate-like shape sandwiched between the holding member and the rail. And a spacer member.
  • the gas supply integrated unit of the present invention has the following functions and effects.
  • the gas supply integrated unit of the present invention includes a first manual valve provided in an outlet flow path, an air operated valve provided at a position communicating the first manual valve with a process gas common flow path,
  • a gas supply integrated unit including a plurality of gas units in which a manual valve and a second manual valve provided at a position communicating the purge gas common flow path are integrally connected in series by a flow path block and a unit fixing plate, Is a U-shape, and a holding member to which the flow path block and the unit fixing plate are fitted is fixed between the holding member, the flow path block and the unit fixing plate. Since the gas unit has the flat heater, the external dimensions of the gas unit can be made exactly the same as those of the gas unit which does not require the flat heater.
  • the outer dimensions do not change even in the entire gas supply integrated unit in which the gas units are integrated. Furthermore, since the channel block of the gas unit and the unit fixing plate are heated and maintained from the back, only one flat heater and one holding member are required for one gas unit as components for heating and maintaining the temperature. Therefore, the number of parts can be reduced and the cost can be reduced.
  • the gas supply integrated unit of the present invention has a plate-like shape in which the gas unit is fitted to and fastened to the holding member, and a rail which is held between the holding member and the rail. Since there is a spacer member, by removing the spacer member, the flat heater can be removed and another flat heater can be mounted while maintaining the state in which the gas supply integrated pipe can be used. . Thus, the replacement of the flat heater is easy and the maintenance is easy.
  • the gas supply integrated unit of the present invention includes one or more flat heaters disposed in contact with the bottom surface of the gas unit, a holding member for holding the flat heater, and a holding member for holding the flat heater.
  • the gas heater does not require one flat heater and one holding member for each gas unit. If the plane heater and the holding member are one or two or more in the entire supply and accumulation unit, the number of parts for heating and keeping the gas supply and accumulation unit is small, and the cost can be reduced. Furthermore, the number of flat heaters is reduced. By doing so, wiring becomes easy, and the flat heater can be easily replaced.
  • FIG. 1 is a plan view showing a configuration of a gas supply integrated unit according to a first embodiment of the present invention.
  • FIG. 2 is a front view of a gas supply integrated unit according to a first embodiment of the present invention.
  • FIG. 3 is a circuit diagram showing the configuration of FIG. 1.
  • FIG. 4 is a perspective view showing an assembling order of the gas unit according to the first embodiment of the present invention.
  • FIG. 5 is a cross-sectional view taken along a line AA in FIG. 1.
  • FIG. 6 is a view showing attachment and detachment of a heater 16 in FIG.
  • FIG. 7 is a plan view showing a configuration of a gas supply integrated unit according to a second embodiment of the present invention.
  • FIG. 8 is a sectional view taken along the line BB of FIG. 7.
  • FIG. 9 is a perspective view of a conventional gas supply device.
  • FIG. 10 is a diagram illustrating the heat transfer block of FIG. 9.
  • FIG. 1 is a plan view showing the configuration of a gas supply integrated unit that supplies process gas to five lines
  • FIG. 2 is a front view of FIG.
  • FIG. 3 shows the circuit diagram of FIG.
  • the two rails 10 and 12 are fixed at both ends in parallel by rail fixing bars 13 and 14.
  • the circuit configuration of the equipment to be installed in each of the purge gas unit, process gas unit, and gas units A, B, C, D, and E is shown in Fig. 3.
  • the purge gas manual valve 29 is not shown via the purge gas supply port 28!
  • the purge gas manual valve 29 is connected to one port of the second manual valves 25A, 25B, 25C, 25D, and 25E via the air operated valve 32, the check valve 33, and the purge gas common flow path 43.
  • a pressure gauge 31 is connected to a flow path that connects the purge gas manual valve 29 and the air operated valve 32.
  • the other ports of the second manual valves 25A, 25B, 25C, 25D, 25E are connected to one port of the regulators 24A, 24B, 24C, 24D, 24E.
  • the process gas manual valve 35 is connected to a process gas tank (not shown) via a process gas supply port 34.
  • the process gas manual valve 35 is connected to one of the air operated valves 26A, 26B, 26C, 26D, and 26E via an air operated valve 37 and a process gas common flow path 44.
  • a pressure gauge 36 is connected to a flow path connecting the process gas manual valve 35 and the air operated valve 37.
  • the other ports of the air operated valves 26A, 26B, 26C, 26D, 26E are connected to one port of the regulators 24A, 24B, 24C, 24D, 24E.
  • the other ports of the regulators 24A, 24B, 24C, 24D, 24E are connected to the process gas outlets 21A, 21B, 21C, 21D, 21E via the first manual valves 22A, 22B, 22C, 22D, 22E.
  • Regulators 24A, 24B, 24C, 24D, 24E communicate with the first manual valves 22A, 22B, 22C, 22D, 22E.
  • Pressure gauges 23A, 23B, 23C, 23D, 23E are connected to the road.
  • the end of the process gas common flow path 44 is sealed by the process gas common flow path end manual valve 41.
  • the end of the purge gas common flow path 43 is sealed by a purge gas common flow path end manual valve 38.
  • FIG. 4 is a perspective view showing an assembling sequence of a gas unit of one line of the gas supply integrated unit.
  • the gas unit namely the gas unit, process gas unit and gas units A, B, C, D and E.
  • each device is integrally connected in series by a unit fixing plate 15 via a flow path block 46 (see FIG. 2).
  • the unit fixing plate 15 and the flat heater 16 disposed below the unit fixing plate 15 are fitted to the U-shaped cross section of the holding member 18.
  • the unit fixing plate 15 is fixed to the rails 10 and 12 by fastening means 20 by holding a plate-shaped spacer member 19 between the holding member 18 and the rails 10 and 12.
  • process gas is supplied from a process gas tank (not shown) to the process gas supply port 34, the process gas manual valve 35, the air operated valve 37, the process gas common flow path 44, and the air operated valves 26A, 26B, 26C, 26D, 26E.
  • Flow to the regulators 24A, 24B, 24C, 24D, and 24E, and the first manual valves 22A, 22B, 22C, 22D, and 22E also pass through the process gas outputs PI 21A, 21B, 21C, 21D, and 21E. It flows to the supply destination.
  • a purge gas which is a nitrogen gas
  • the process gas manual valve 35 is closed, and the air operate valve 37 is closed by a signal to shut off the flow of the process gas.
  • a purge gas which is a nitrogen gas
  • a purge gas is introduced into each line of the gas units A, B, C, D and E from a purge gas tank (not shown).
  • the purge gas passes through the purge gas manual valve 29, the air operated valve 32, the check valve 33, the purge gas common flow path 43, the second manual valve 25A, 25B, 25C, 25D, 25E, and the regulators 24A, 24B, It flows to 24C, 24D, 24E, and the first manual valves 22A, 22B, 22C, 22D, 22E are also discharged to the exhaust system via the process gas outlets 21A, 21B, 21C, 21D, 21E.
  • the purge gas manual valve 29 and the second manual valves 25A, 25B, 25C, 25D, and 25E are closed, and the air operated valve 32 is closed by a signal to stop the flow of the purge gas.
  • the plane heater 16 is disposed below the unit fixing plate 15 and is fitted to the U-shaped cross section of the holding member 18.
  • the heat is transferred via the unit fixing plate 15 to the purge gas unit, the process gas unit, and the gas unit A. , B, C, D, and E are transmitted to the flow path block 46 and the equipment attached to the flow path block 46.
  • FIG. 5 showing a cross section taken along the line AA of FIG. 1 and FIG. 6 showing attachment and detachment of the flat heater 16.
  • the unit fixing plate 15 and the flat heater 16 disposed below the unit fixing plate 15 are fitted into the U-shaped cross section of the holding member 18, and the unit fixing plate 15 is attached to the holding member 18, the rail 10, and the rail.
  • a plate-shaped spacer member 19 is sandwiched between the rails 12 and fixed to the rails 10 and 12 by fastening means 20.
  • the gas supply integrated unit can be used by removing the fastening means 20 and removing the spacer member 16. 6, the flat heater 16 can be removed and another flat heater 16 can be attached as shown in FIG.
  • the first manual valve 22 provided in the outlet flow path, the first manual valve 22 and the process gas common flow path 44
  • An air operated valve 26 provided at a position communicating the first manual valve 22 and a second manual valve 25 provided at a position communicating the first manual valve 22 and the purge gas common flow path 43 are provided with a flow path block 46 and a unit fixing plate 1.
  • a cross-section is U-shaped, and a holding member 18 to which the flow path block 46 and the unit fixing plate 15 are fitted is provided.
  • the gas heater has a flat heater 16 sandwiched and fixed between the holding member 18, the flow path block 46 and the unit fixing plate 15, the outer dimensions of the gas unit are completely different from those of the gas unit which does not require the flat heater 16. Can be the same. Therefore, the outer dimensions do not change even in the entire gas supply integrated unit in which the gas units are integrated.
  • the flow path block 46 of the gas unit and the unit fixing plate 15 are back-heated and heat-retained, one flat heater and one holding member are provided for one gas unit as heat-insulation parts. Just required, cost can be reduced by reducing the number of parts.
  • the gas unit is fitted to the holding member 18 and the rails 10 and 12 to be fastened, and the space between the holding member 18 and the rail 10 and the rail 12 is narrow. Since it has the plate-shaped spacer member 19 to be held, the flat heater 16 can be easily replaced and maintenance is easy. That is, by removing the spacer member 19, the flat heater 16 can be removed and another flat heater 16 can be attached while the gas supply integrated unit can be used.
  • FIG. 7 is a plan view showing the configuration of the gas supply integrated unit similar to that of FIG. 1, and FIG. 8 shows a cross section taken along the line BB of FIG. Two rails 10, 12 Force Both ends are fixed in parallel by rail fixing rods 13, 14.
  • the purge gas unit, process gas unit, and gas units A, B, C, D, and E move from left to right along the rails 10 and 12 in parallel with the rail fixing bars 13 and 14, respectively, by the unit fixing plate 15.
  • the plane heater 17 has a force of one sheet or two or more sheets.
  • FIGS. 7 and 8 show an example of two sheets.
  • the two flat heaters 17 are in contact with the lower part of the unit fixing plate 15 to which the purge gas unit, the process gas unit, and the gas units A, B, C, D, and E are fixed, respectively, and extend in the longitudinal direction of the unit fixing plate 15. They are arranged orthogonally.
  • the two flat heaters 17 are held by holding members 48, respectively, and the holding members 48 are fixed by fastening means 49 and two holding member fixing plates 47.
  • One holding member fixing plate 47 is mounted on the left side of the process gas unit in parallel with the rail fixing bar 13, and the other holding member fixing plate 47 is mounted on the right side of the gas unit E in parallel with the rail fixing bar 14. .
  • the two holding member fixing plates 47 are fixed at both ends to the rails 10 and 12, respectively.
  • the operation and effect of the gas supply integrated unit according to the second embodiment of the present invention will be described.
  • the operation of the gas supply integrated unit as a whole is the same as in the first embodiment, and will not be described.
  • the plane heater 17 is disposed in contact with the lower part of the unit fixing plate 15 and is held by a holding member 48.
  • the process heater is energized while the process gas is flowing through the gas supply integrated unit to generate Joule heat, the heat is transmitted via the unit fixing plate 15 to the purge gas unit, the process gas unit, and the gas unit A. , B, C, D, and E are transmitted to the equipment attached to the flow path block 46.
  • FIG. 7 a plan view showing the configuration of the gas supply integrated unit of the second embodiment in FIG. 7 and FIG.
  • the mounting state of the left plane heater 17 shows a state in which the holding member 48 is not tightened by the fastening means 49 in FIG. 8, and the mounting state of the right plane heater 17 in FIG. Indicates the state of being tightened by 49.
  • the state of the left side heater 17 is also checked by looking at the right side force in FIG. 7 (see FIG. 8).
  • the flat heater 17 was pulled out in the direction of arrow K1 shown in FIG. 7, removed, and another flat heater 17 was inserted in the direction of arrow K2 shown in FIG. After that, the holding member 48 is fixed to the holding member fixing plate 47 by the fastening means 49.
  • one or more flat heaters 17 disposed in contact with the bottom surface of the gas cut, and the flat heater 17 17 and a holding member fixing plate 47 for fixing the holding member 48 by sandwiching the flat heater 17 between the holding member 48, the flow path block 46 and the unit fixing 15.
  • the external dimensions of the gas unit can be made exactly the same as those of the gas unit that does not require the flat heater 17. Therefore, the external dimensions do not change even in the entire gas supply integrated unit in which the gas units are integrated.
  • one flat heater 17 and one holding member 48 are not required for each gas unit, and the flat heater 17 and the holding member 48 need only be one or two or more in the entire gas supply integrated unit. Therefore, the number of components for heating and keeping the gas supply integrated unit is small and the cost can be reduced. Further, since the number of the flat heaters 17 is reduced, wiring becomes easy, and the flat heaters 17 can be easily replaced.
  • the air supply valve is mounted on the gas supply integrated unit.
  • the type and arrangement of the mounted fluid control devices are not limited thereto, and can be changed as appropriate.
  • the flat heater 17 when attaching and detaching the flat heater 7, the flat heater 17 is pulled out in the direction of arrow K1 shown in FIG. 7 and removed, and another flat heater 17 is inserted in the direction of arrow K2 shown in FIG.
  • the flat heater 17 may be pulled out in the direction of arrow K2 shown in FIG. 7 and removed, and another flat heater 17 may be inserted in the direction of arrow K1 shown in FIG.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Details Of Valves (AREA)
  • Valve Housings (AREA)
  • Pipeline Systems (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

A gas supply integration unit for supplying a process gas, which is liable to be liquefied at room temperatures and pressures, while heating and insulating the process gas. The unit comprises a plurality of gas units. Each gas unit is formed of a first manual valve (22) installed in an outlet flow passage, an air operated valve (26) installed at a position where the first manual valve (22) is allowed to communicate with a process gas common flow passage (44), and a second manual valve (25) installed at a position where the first manual valve (22) is allowed to communicate with a purge gas common flow passage (43) which are integrally connected in series to each other through flow passage blocks (46) and unit fixing plates (15). The unit also comprises holding members (18) formed in a U-shape in cross section and to which the flow passage blocks (46) and the unit fixing plates (15) are fitted and plane heaters (16) fixedly held between the holding members (18), the flow passage blocks (46), and the unit fixing plates (15).

Description

明 細 書  Specification
ガス供給集積ユニット  Gas supply integrated unit
技術分野  Technical field
[0001] 本発明は、半導体製造装置等で使用されるガス供給集積ユニットに関し、さらに詳 細には、気化温度が高ぐ常温において外部力 熱をカ卩えないと液ィ匕しやすいジクロ ロシラン(又はジクロルシラン)、 WF6、 HBr等のプロセスガスを液化させることなく、 高精度に供給するガス供給集積ユニットに関するものである。  The present invention relates to a gas supply integrated unit used in a semiconductor manufacturing apparatus or the like, and more particularly, to dichlorosilane which is liable to liquefy unless external heat is removed at room temperature where the vaporization temperature is high. (Or dichlorosilane), WF6, HBr, etc. It is related to a gas supply integrated unit that supplies process gas with high accuracy without liquefaction.
背景技術  Background art
[0002] 従来より、半導体集積回路中の絶縁膜として、気相成膜された酸化珪素薄膜等が 多用されている。力かる酸ィ匕珪素等の気相成膜は、成膜槽中に載置されたウェハ上 に、化学蒸着成膜法にて行うのが普通である。  [0002] Conventionally, as an insulating film in a semiconductor integrated circuit, a silicon oxide thin film or the like formed by a vapor phase has been frequently used. The vapor phase film formation of strong silicon oxide or the like is generally performed by a chemical vapor deposition method on a wafer placed in a film forming tank.
[0003] ジクロロシラン(又はジクロルシラン)等の液化しやす 、プロセスガスを供給する場合 、プロセスガスの供給ルートである高圧ボンべ、配管、マスフローコントローラ、反応チ ヤンバ等を加熱することが必要となる。その理由は、供給ルートの途中でジクロロシラ ン (又はジクロルシラン)が液ィ匕すると、流量計測が正確に行えず、製造される半導体 集積回路等の性能を悪くするからである。また、液ィ匕したジクロロシラン (又はジクロル シラン)等が質量流量計付電磁弁の細管を詰まらせて流量計測を不正確にする問題 bあった。  [0003] When a process gas is supplied, which easily liquefies dichlorosilane (or dichlorosilane) or the like, it is necessary to heat a high-pressure cylinder, a pipe, a mass flow controller, a reaction chamber, and the like, which are supply routes of the process gas. . The reason is that if dichlorosilane (or dichlorosilane) is mixed in the middle of the supply route, the flow rate cannot be measured accurately, and the performance of the manufactured semiconductor integrated circuit or the like deteriorates. In addition, there was a problem b that dichlorosilane (or dichlorosilane) or the like clogged the thin tube of the solenoid valve equipped with a mass flow meter and made flow measurement inaccurate.
ジクロロシラン(又はジクロルシラン)等のプロセスガスの液化を防止するため、特許 文献 1のガス供給装置では、例えば図 9に示すように、配管、継手、ガス弁 62、 64及 び質量流量計付電磁弁 61等により構成されるガスユニットの両側に、伝熱ブロック 5 1と副伝熱ブロック 52とに形成された保持溝 53, 54にテープ状のヒータ 60が保持さ れ、配設されることにより、ジクロロシラン (又はジクロルシラン)等が気化温度以上に なるように加熱保温される。  In order to prevent liquefaction of process gas such as dichlorosilane (or dichlorosilane), the gas supply device of Patent Document 1 uses, for example, piping, fittings, gas valves 62 and 64, and an electromagnetic valve with a mass flow meter as shown in FIG. On both sides of the gas unit constituted by the valve 61, etc., the tape-shaped heater 60 is held and arranged in holding grooves 53, 54 formed in the heat transfer block 51 and the sub heat transfer block 52. Thereby, the dichlorosilane (or dichlorosilane) or the like is heated and kept at a temperature higher than the vaporization temperature.
また、図 10に示すように、伝熱ブロック 51の上面は、質量流量計付電磁弁 61に下 方から接触する接触面 65となっており、質量流量計付電磁弁 61を加熱保温している 特許文献 1:特開平 7— 286720号公報 As shown in FIG. 10, the upper surface of the heat transfer block 51 is a contact surface 65 that contacts the solenoid valve 61 with a mass flow meter from below, and heats and heats the solenoid valve 61 with a mass flow meter. Is Patent document 1: JP-A-7-286720
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0004] し力しながら、特許文献 1のガス供給装置には、以下の問題点があった。 [0004] However, the gas supply device of Patent Document 1 has the following problems.
(1)ガス供給装置はコストダウンのため、小型化と集積ィ匕が望まれているが、図 9に示 すガス供給装置は、ガスユニットの両側に、伝熱ブロック 51と副伝熱ブロック 52とに 形成された保持溝 53, 54にテープ状のヒータ 60を保持するように配設しているので 、ガスユニット巾が、ヒータを必要としないガスユニットに比較して大きくなる。  (1) To reduce the cost of the gas supply device, miniaturization and integration are desired. However, the gas supply device shown in Fig. 9 has a heat transfer block 51 and a sub heat transfer block on both sides of the gas unit. Since the tape-shaped heaters 60 are provided in the holding grooves 53 and 54 formed in the gas unit 52, the width of the gas unit is larger than that of the gas unit that does not require a heater.
(2)ガス供給装置は、ガスユニットの両側にヒータ 60、伝熱ブロック 51及び副伝熱ブ ロック 52など、加熱保温のための部品を多く必要とし、コストが高くなる。  (2) The gas supply device requires many components for heating and keeping heat, such as the heater 60, the heat transfer block 51, and the sub-heat transfer block 52, on both sides of the gas unit, resulting in high costs.
そこで本発明は、係る課題を解決すベぐ常温常圧では液ィ匕しやすいプロセスガス を加熱保温しながら供給するためのガス供給集積ユニットを提供することを目的とす る。  Accordingly, it is an object of the present invention to provide a gas supply integrated unit for supplying a process gas which can easily be liquefied at normal temperature and normal pressure while heating and maintaining the temperature so as to solve the above problem.
課題を解決するための手段  Means for solving the problem
[0005] 本発明のガス供給集積ユニットは、上記課題を解決するために以下のような構成を 有している。 [0005] The gas supply integrated unit of the present invention has the following configuration in order to solve the above problems.
(1)出口流路に設けられた第 1手動弁と、該第 1手動弁とプロセスガス共通流路とを 連通する位置に設けられたエアオペレート弁と、該第 1手動弁とパージガス共通流路 とを連通する位置に設けられた第 2手動弁とが流路ブロック及びユニット固定板により 直列一体に連結されて 、るガスユニットを複数備えるガス供給集積ユニットにお 、て 、断面がコの字型であって、前記流路ブロック及び前記ユニット固定板が嵌合される 保持部材と、前記保持部材と前記流路ブロック及び前記ユニット固定板との間に挟ま れて固定される平面ヒータとを有することを特徴とする。  (1) A first manual valve provided in the outlet flow path, an air operated valve provided at a position communicating the first manual valve with the process gas common flow path, and a common flow of the purge gas and the first manual valve. A second manual valve provided at a position communicating with the passage is integrally connected in series with the passage block and the unit fixing plate, and the cross section of the gas supply integrated unit having a plurality of gas units is U-shaped. A holding member into which the flow path block and the unit fixing plate are fitted, and a flat heater sandwiched and fixed between the holding member and the flow path block and the unit fixing plate. It is characterized by having.
(2) (1)に記載するガス供給集積ユニットにおいて、前記ガスユニットが前記保持部 材に嵌合されて、締結されるレールと、前記保持部材と前記レールの間に狭持される 板状のスぺーサ部材とを有することを特徴とする。  (2) In the gas supply integrated unit according to (1), the gas unit is fitted to the holding member, and a rail to be fastened, and a plate-like shape sandwiched between the holding member and the rail. And a spacer member.
(3) (1)に記載するガス供給集積ユニットにおいて、前記ガスユニットの底面に接して 配設される 1枚又は 2枚以上の平面ヒータと、前記平面ヒータを保持する保持部材と、 前記平面ヒータを前記保持部材と前記流路ブロック及び前記ユニット固定板との間 に挟んで、保持部材を固定する保持部材固定板とを有することを特徴とする。 (3) In the gas supply integrated unit according to (1), one or two or more flat heaters disposed in contact with the bottom surface of the gas unit, and a holding member for holding the flat heater, A holding member fixing plate for fixing the holding member by sandwiching the flat heater between the holding member, the flow path block, and the unit fixing plate is provided.
発明の効果  The invention's effect
[0006] 本発明のガス供給集積ユニットは、次のように作用効果を奏する。  [0006] The gas supply integrated unit of the present invention has the following functions and effects.
本発明のガス供給集積ユニットは、出口流路に設けられた第 1手動弁と、該第 1手動 弁とプロセスガス共通流路とを連通する位置に設けられたエアオペレート弁と、該第 1手動弁とパージガス共通流路とを連通する位置に設けられた第 2手動弁とが流路 ブロック及びユニット固定板により直列一体に連結されているガスユニットを複数備え るガス供給集積ユニットにおいて、断面がコの字型であって、前記流路ブロック及び 前記ユニット固定板が嵌合される保持部材と、前記保持部材と前記流路ブロック及び 前記ユニット固定板との間に挟まれて固定される平面ヒータとを有するので、ガスュニ ットの外形寸法を平面ヒータを必要としないガスユニットと全く同一にすることが出来 る。従って、ガスユニットを集積したガス供給集積ユニット全体でも外形寸法が変化し ない。更に、ガスユニットの流路ブロック及びユニット固定板を裏面から加熱保温する ので、加熱保温するための部品として、 1ガスユニットに対して、 1枚の平面ヒータと 1 個の保持部材を必要するだけで、部品点数が少なぐコストダウンすることが出来る。  The gas supply integrated unit of the present invention includes a first manual valve provided in an outlet flow path, an air operated valve provided at a position communicating the first manual valve with a process gas common flow path, In a gas supply integrated unit including a plurality of gas units in which a manual valve and a second manual valve provided at a position communicating the purge gas common flow path are integrally connected in series by a flow path block and a unit fixing plate, Is a U-shape, and a holding member to which the flow path block and the unit fixing plate are fitted is fixed between the holding member, the flow path block and the unit fixing plate. Since the gas unit has the flat heater, the external dimensions of the gas unit can be made exactly the same as those of the gas unit which does not require the flat heater. Therefore, the outer dimensions do not change even in the entire gas supply integrated unit in which the gas units are integrated. Furthermore, since the channel block of the gas unit and the unit fixing plate are heated and maintained from the back, only one flat heater and one holding member are required for one gas unit as components for heating and maintaining the temperature. Therefore, the number of parts can be reduced and the cost can be reduced.
[0007] また、本発明のガス供給集積ユニットは、前記ガスユニットが前記保持部材に嵌合さ れて、締結されるレールと、前記保持部材と前記レールの間に狭持される板状のス ぺーサ部材とを有するので、スぺーサ部材を抜き取ることにより、ガス供給集積ュ-ッ トを使用できる状態を維持したままで、平面ヒータを取り外し、別の平面ヒータを取り 付けることができる。このように平面ヒータの交換が容易で、メンテナンスし易い。 また、本発明のガス供給集積ユニットは、前記ガスユニットの底面に接して配設される 1枚又は 2枚以上の平面ヒータと、前記平面ヒータを保持する保持部材と、前記平面 ヒータを前記保持部材と前記流路ブロック及び前記ユニット固定板との間に挟んで、 保持部材を固定する保持部材固定板とを有するので、ガスユニット毎に平面ヒータと 保持部材を各 1個必要とせず、ガス供給集積ユニット全体で平面ヒータと保持部材が それぞれ、 1枚又は 2枚以上であればよぐガス供給集積ユニットを加熱保温するた めの部品点数が少なぐコストダウンすることが出来る。更に、平面ヒータの枚数が減 ることで配線が容易になり、平面ヒータの交換もし易 、。 [0007] Further, the gas supply integrated unit of the present invention has a plate-like shape in which the gas unit is fitted to and fastened to the holding member, and a rail which is held between the holding member and the rail. Since there is a spacer member, by removing the spacer member, the flat heater can be removed and another flat heater can be mounted while maintaining the state in which the gas supply integrated pipe can be used. . Thus, the replacement of the flat heater is easy and the maintenance is easy. In addition, the gas supply integrated unit of the present invention includes one or more flat heaters disposed in contact with the bottom surface of the gas unit, a holding member for holding the flat heater, and a holding member for holding the flat heater. Since a holding member fixing plate for fixing the holding member is provided between the member and the flow path block and the unit fixing plate, the gas heater does not require one flat heater and one holding member for each gas unit. If the plane heater and the holding member are one or two or more in the entire supply and accumulation unit, the number of parts for heating and keeping the gas supply and accumulation unit is small, and the cost can be reduced. Furthermore, the number of flat heaters is reduced. By doing so, wiring becomes easy, and the flat heater can be easily replaced.
図面の簡単な説明  Brief Description of Drawings
[0008] [図 1]本発明の第 1実施例であるガス供給集積ユニットの構成を示す平面図である。  FIG. 1 is a plan view showing a configuration of a gas supply integrated unit according to a first embodiment of the present invention.
[図 2]本発明の第 1実施例であるガス供給集積ユニットの正面図である。  FIG. 2 is a front view of a gas supply integrated unit according to a first embodiment of the present invention.
[図 3]図 1の構成を示す回路図である。  FIG. 3 is a circuit diagram showing the configuration of FIG. 1.
[図 4]本発明の第 1実施例のガスユニットの組み立て順序を示す斜視図である。  FIG. 4 is a perspective view showing an assembling order of the gas unit according to the first embodiment of the present invention.
[図 5]図 1の A— A部の断面図である。  FIG. 5 is a cross-sectional view taken along a line AA in FIG. 1.
[図 6]図 5において、ヒータ 16の脱着を示す図である。  FIG. 6 is a view showing attachment and detachment of a heater 16 in FIG.
[図 7]本発明の第 2実施例であるガス供給集積ユニットの構成を示す平面図である。  FIG. 7 is a plan view showing a configuration of a gas supply integrated unit according to a second embodiment of the present invention.
[図 8]図 7の B— B部の断面図である。  FIG. 8 is a sectional view taken along the line BB of FIG. 7.
[図 9]従来のガス供給装置の斜視図である。  FIG. 9 is a perspective view of a conventional gas supply device.
[図 10]図 9の伝熱ブロックを説明する図である。  FIG. 10 is a diagram illustrating the heat transfer block of FIG. 9.
符号の説明  Explanation of symbols
[0009] 10 レーノレ  [0009] 10 Renole
12 レーノレ  12 Renole
15 ユニット固定板  15 Unit fixing plate
16 平面ヒータ  16 Flat heater
17 平面ヒータ  17 Flat heater
18 保持部材  18 Holding member
19 スぺーサ部材  19 Spacer material
22 第 1手動弁  22 1st manual valve
25 第 2手動弁  25 2nd manual valve
26 エアオペレート弁  26 Air operated valve
43 パージガス共通流路  43 Common purge gas flow path
44 プロセスガス共通流路  44 Process gas common flow path
46 流路ブロック  46 Flow path block
47 保持部材固定板  47 Holding member fixing plate
48 保持部材 発明を実施するための最良の形態 48 Holding member BEST MODE FOR CARRYING OUT THE INVENTION
[0010] 以下、本発明に係るガス供給集積ユニットの実施例について、添付図面に基づい て説明する。  Hereinafter, embodiments of a gas supply integrated unit according to the present invention will be described with reference to the accompanying drawings.
[0011] (第 1実施例)  (First Example)
図 1は 5ラインへプロセスガスの供給を行うガス供給集積ユニットの構成を示す平面 図で、図 2は図 1の正面図である。図 3は図 1の回路図を示す。  FIG. 1 is a plan view showing the configuration of a gas supply integrated unit that supplies process gas to five lines, and FIG. 2 is a front view of FIG. FIG. 3 shows the circuit diagram of FIG.
2本のレール 10、 12は、両端をレール固定棒 13, 14により平行に固定される。レー ノレ固定棒 13, 14〖こ平行〖こ、左からパージガスユニット、プロセスガスユニット、ガスュ ニット A、 B、 C, D、 Eがそれぞれユニット固定板 15により、レール 10、 12に沿って横 方向に平行移動可能に取り付けられる。パージガスユニット、プロセスガスユニット、 ガスユニット A、 B、 C, D、 Eにそれぞれ取り付けられる機器の回路構成は図 3に示す パージガス手動弁 29はパージガス供給口 28を介して図示しな!、パージガスタンク と接続する。パージガス手動弁 29は、エアオペレート弁 32、逆止弁 33、パージガス 共通流路 43を介して、第 2手動弁 25A、 25B、 25C, 25D、 25Eの一方のポートに 接続する。パージガス手動弁 29と、エアオペレート弁 32とを連通させる流路に、圧力 計 31力連通される。第 2手動弁 25A、 25B、 25C, 25D、 25Eの他のポートは、レギ ユレータ 24A、 24B、 24C, 24D、 24Eの一方のポートに接続される。  The two rails 10 and 12 are fixed at both ends in parallel by rail fixing bars 13 and 14. Retainer fixing rods 13, 14 mm parallel bars, purge gas unit, process gas unit, gas units A, B, C, D, E from left to right along rails 10, 12 by unit fixing plate 15, respectively Is mounted so as to be able to move in parallel. The circuit configuration of the equipment to be installed in each of the purge gas unit, process gas unit, and gas units A, B, C, D, and E is shown in Fig. 3.The purge gas manual valve 29 is not shown via the purge gas supply port 28! Connect with The purge gas manual valve 29 is connected to one port of the second manual valves 25A, 25B, 25C, 25D, and 25E via the air operated valve 32, the check valve 33, and the purge gas common flow path 43. A pressure gauge 31 is connected to a flow path that connects the purge gas manual valve 29 and the air operated valve 32. The other ports of the second manual valves 25A, 25B, 25C, 25D, 25E are connected to one port of the regulators 24A, 24B, 24C, 24D, 24E.
[0012] プロセスガス手動弁 35は、プロセスガス供給口 34を介して図示しな!、プロセスガスタ ンクと接続される。プロセスガス手動弁 35は、エアオペレート弁 37、プロセスガス共通 流路 44を介して、エアオペレー卜弁 26A、 26B、 26C, 26D、 26Eの一方のポー卜に 接続される。プロセスガス手動弁 35と、エアオペレート弁 37とを連通される流路に、 圧力計 36が連通される。 The process gas manual valve 35 is connected to a process gas tank (not shown) via a process gas supply port 34. The process gas manual valve 35 is connected to one of the air operated valves 26A, 26B, 26C, 26D, and 26E via an air operated valve 37 and a process gas common flow path 44. A pressure gauge 36 is connected to a flow path connecting the process gas manual valve 35 and the air operated valve 37.
エアオペレート弁 26A、 26B、 26C, 26D、 26Eの他のポートは、レギユレータ 24A、 24B、 24C, 24D、 24Eの一方のポートに接続される。レギユレータ 24A、 24B、 24 C, 24D、 24Eの他のポートは、第 1手動弁 22A、 22B、 22C, 22D、 22Eを介して、 プロセスガス出口 21A、 21B、 21C, 21D、 21Eと連通される。レギユレータ 24A、 24 B、 24C, 24D、 24Eと、第 1手動弁 22A、 22B、 22C, 22D、 22Eとを連通させる流 路に、圧力計 23A、 23B、 23C, 23D、 23E力 S連通される。 The other ports of the air operated valves 26A, 26B, 26C, 26D, 26E are connected to one port of the regulators 24A, 24B, 24C, 24D, 24E. The other ports of the regulators 24A, 24B, 24C, 24D, 24E are connected to the process gas outlets 21A, 21B, 21C, 21D, 21E via the first manual valves 22A, 22B, 22C, 22D, 22E. . Regulators 24A, 24B, 24C, 24D, 24E communicate with the first manual valves 22A, 22B, 22C, 22D, 22E. Pressure gauges 23A, 23B, 23C, 23D, 23E are connected to the road.
プロセスガス共通流路 44の端部は、プロセスガス共通流路端部手動弁 41により封止 される。また、パージガス共通流路 43の端部は、パージガス共通流路端部手動弁 38 により封止される。  The end of the process gas common flow path 44 is sealed by the process gas common flow path end manual valve 41. The end of the purge gas common flow path 43 is sealed by a purge gas common flow path end manual valve 38.
[0013] 図 4はガス供給集積ユニットの 1ラインのガスユニットの組み立て順序を示す斜視図 である。ノ ージガスユニット、プロセスガスユニット、ガスユニット A、 B、 C, D、 Eのい ずれのガスユニットでも全く同様である。ガスユニットは、各機器が流路ブロック 46 (図 2参照)を介して、ユニット固定板 15により、直列一体に連結される。ユニット固定板 1 5と、ユニット固定板 15の下部に配設された平面ヒータ 16は、保持部材 18のコの字 型断面に嵌合される。ユニット固定板 15は保持部材 18とレール 10、レール 12の間 に、板状のスぺーサ部材 19を狭持して、レール 10、レール 12に締結手段 20により 固定される。  FIG. 4 is a perspective view showing an assembling sequence of a gas unit of one line of the gas supply integrated unit. The same applies to any of the gas units, namely the gas unit, process gas unit and gas units A, B, C, D and E. In the gas unit, each device is integrally connected in series by a unit fixing plate 15 via a flow path block 46 (see FIG. 2). The unit fixing plate 15 and the flat heater 16 disposed below the unit fixing plate 15 are fitted to the U-shaped cross section of the holding member 18. The unit fixing plate 15 is fixed to the rails 10 and 12 by fastening means 20 by holding a plate-shaped spacer member 19 between the holding member 18 and the rails 10 and 12.
[0014] このように設けられた本発明の第 1実施例に係るガス供給集積ユニットの作動及びそ の作用効果について説明する。まず、ガス供給集積ユニットの全体の作用について 説明する。半導体の製造工程へプロセスガスを供給するときには、プロセスガス手動 弁 35及び第 1手動弁 22A、 22B、 22C, 22D、 22Eを開き、エアオペレート弁 37及 びエアオペレート弁 26A、 26B、 26C, 26D、 26Eを信号により開とする。パージガス 回路のパージガス手動弁 29、及び第 2手動弁 25A、 25B、 25C, 25D、 25Eを閉じ 、エアオペレート弁 32を信号により閉とする。これにより、プロセスガスは図示しない プロセスガスタンクから、プロセスガス供給口 34、プロセスガス手動弁 35、エアオペレ ート弁 37、プロセスガス共通流路 44、エアオペレート弁 26A、 26B、 26C, 26D、 26 Eを経由し、レギユレータ 24A、 24B、 24C, 24D、 24Eへ流れ、第 1手動弁 22A、 2 2B、 22C, 22D、 22E力も、プロセスガス出 PI 21A、 21B、 21C, 21D、 21Eを経由 し、供給先へ流れる。  [0014] The operation and effect of the gas supply integrated unit according to the first embodiment of the present invention thus provided will be described. First, the overall operation of the gas supply integrated unit will be described. When supplying the process gas to the semiconductor manufacturing process, open the process gas manual valve 35 and the first manual valves 22A, 22B, 22C, 22D and 22E, and operate the air operated valve 37 and the air operated valves 26A, 26B, 26C and 26D. , 26E open by signal. The purge gas manual valve 29 and the second manual valves 25A, 25B, 25C, 25D, and 25E of the purge gas circuit are closed, and the air operated valve 32 is closed by a signal. As a result, process gas is supplied from a process gas tank (not shown) to the process gas supply port 34, the process gas manual valve 35, the air operated valve 37, the process gas common flow path 44, and the air operated valves 26A, 26B, 26C, 26D, 26E. Flow to the regulators 24A, 24B, 24C, 24D, and 24E, and the first manual valves 22A, 22B, 22C, 22D, and 22E also pass through the process gas outputs PI 21A, 21B, 21C, 21D, and 21E. It flows to the supply destination.
[0015] 次に、ガスユニットのメンテナンスの必要が生じた場合は、プロセスガスの供給を停止 した後、実施される。この際、回路が大気に暴露されるので、大気中の水分を除去す るために、窒素ガスであるパージガスを回路に導入する。即ち、プロセスガス手動弁 3 5を閉じ、エアオペレート弁 37を信号により閉として、プロセスガスの流れを遮断する oそして、ノ ージガス手動弁 29、第 2手動弁 25A、 25B、 25C, 25D、 25Eを開き、 エアオペレート弁 32を信号により開とする。こうして、図示しないパージガスタンクから 窒素ガスであるパージガスがガスユニット A、 B、 C, D、 Eの各ラインに導入される。即 ち、パージガスはパージガス手動弁 29、エアオペレート弁 32、逆止弁 33、パージガ ス共通流路 43、第 2手動弁 25A、 25B, 25C, 25D, 25Eを経由し、レギユレータ 24 A、 24B、 24C, 24D、 24Eへ流れ、第 1手動弁 22A、 22B、 22C, 22D、 22E力も、 プロセスガス出口 21A、 21B、 21C, 21D、 21Eを経由し、排気系へ排出される。そ して所定時間後、パージガス手動弁 29、第 2手動弁 25A、 25B、 25C, 25D、 25E を閉じ、エアオペレート弁 32を信号により閉として、パージガスの流入を止める。 Next, when the maintenance of the gas unit needs to be performed, the maintenance is performed after the supply of the process gas is stopped. At this time, since the circuit is exposed to the atmosphere, a purge gas, which is a nitrogen gas, is introduced into the circuit to remove moisture in the atmosphere. That is, the process gas manual valve 35 is closed, and the air operate valve 37 is closed by a signal to shut off the flow of the process gas. o Then, open the manual gas valve 29 and the second manual valves 25A, 25B, 25C, 25D, and 25E, and open the air operated valve 32 by a signal. In this way, a purge gas, which is a nitrogen gas, is introduced into each line of the gas units A, B, C, D and E from a purge gas tank (not shown). That is, the purge gas passes through the purge gas manual valve 29, the air operated valve 32, the check valve 33, the purge gas common flow path 43, the second manual valve 25A, 25B, 25C, 25D, 25E, and the regulators 24A, 24B, It flows to 24C, 24D, 24E, and the first manual valves 22A, 22B, 22C, 22D, 22E are also discharged to the exhaust system via the process gas outlets 21A, 21B, 21C, 21D, 21E. After a predetermined time, the purge gas manual valve 29 and the second manual valves 25A, 25B, 25C, 25D, and 25E are closed, and the air operated valve 32 is closed by a signal to stop the flow of the purge gas.
[0016] 次に、平面ヒータ 16の作用について説明する。パージガスユニット、プロセスガスュ ニット、ガスユニット A、 B、 C, D、 Eのいずれのガスユニットでも全く同様である。平面 ヒータ 16はユニット固定板 15の下部に配設されて、保持部材 18のコの字型断面に 嵌合される。ガス供給集積ユニットにプロセスガスを流しているときに、平面ヒータ 16 に通電してジュール熱を発生させると、その熱はユニット固定板 15を介して、パージ ガスユニット、プロセスガスユニット、ガスユニット A、 B、 C, D、 Eの流路ブロック 46及 び流路ブロック 46に取り付けられている機器に伝達される。こうして、ガスユニットの 流路ブロック 46及びユニット固定板 15に取り付けられている機器に熱が伝達されるこ とにより、プロセスガスが流れるガスユニット内部の温度がプロセスガスの凝結温度以 上に維持される。従って、プロセスガスユニット、ガスユニット A、 B、 C, D、 E内でプロ セスガスが液ィ匕することによる種々の不具合の発生を防止することが出来る。  Next, the operation of the flat heater 16 will be described. The same applies to the purge gas unit, the process gas unit, and the gas units A, B, C, D, and E. The plane heater 16 is disposed below the unit fixing plate 15 and is fitted to the U-shaped cross section of the holding member 18. When the plane heater 16 is energized to generate Joule heat while the process gas is flowing through the gas supply integrated unit, the heat is transferred via the unit fixing plate 15 to the purge gas unit, the process gas unit, and the gas unit A. , B, C, D, and E are transmitted to the flow path block 46 and the equipment attached to the flow path block 46. In this manner, heat is transferred to the devices attached to the flow path block 46 and the unit fixing plate 15 of the gas unit, so that the temperature inside the gas unit through which the process gas flows is maintained at or above the condensation temperature of the process gas. You. Accordingly, it is possible to prevent various inconveniences caused by the process gas being liquefied in the process gas unit and the gas units A, B, C, D, and E.
[0017] 次に、スぺーサ部材 19の作用について、図 1の A— A部の断面を示す図 5及び平面 ヒータ 16の脱着を示す図 6を参照して説明する。ガスユニット Eの断面図で説明する 力 パージガスユニット、プロセスガスユニット,ガスユニット A、 B、 C, Dでも全く同様 である。ユニット固定板 15と、ユニット固定板 15の下部に配設された平面ヒータ 16は 、保持部材 18のコの字型断面に嵌合され、ユニット固定板 15が保持部材 18とレー ル 10、レール 12の間に、板状のスぺーサ部材 19を狭持して、レール 10、レール 12 に締結手段 20により固定される。平面ヒータ 16の交換が必要になったとき、締結手 段 20を取り外してスぺーサ部材 16を抜くことにより、ガス供給集積ユニットを使用でき る状態を維持したままで、図 6に示すように平面ヒータ 16を取り外し、別の平面ヒータ 16を取り付けることができる。 Next, the operation of the spacer member 19 will be described with reference to FIG. 5 showing a cross section taken along the line AA of FIG. 1 and FIG. 6 showing attachment and detachment of the flat heater 16. The same applies to the force purge gas unit, process gas unit, and gas units A, B, C, and D described in the cross-sectional view of the gas unit E. The unit fixing plate 15 and the flat heater 16 disposed below the unit fixing plate 15 are fitted into the U-shaped cross section of the holding member 18, and the unit fixing plate 15 is attached to the holding member 18, the rail 10, and the rail. A plate-shaped spacer member 19 is sandwiched between the rails 12 and fixed to the rails 10 and 12 by fastening means 20. When the flat heater 16 needs to be replaced, the gas supply integrated unit can be used by removing the fastening means 20 and removing the spacer member 16. 6, the flat heater 16 can be removed and another flat heater 16 can be attached as shown in FIG.
[0018] 以上詳細に説明したように第 1実施例のガス供給集積ユニットによれば、出口流路に 設けられた第 1手動弁 22と、第 1手動弁 22とプロセスガス共通流路 44とを連通する 位置に設けられたエアオペレート弁 26と、第 1手動弁 22とパージガス共通流路 43と を連通する位置に設けられた第 2手動弁 25とが流路ブロック 46及びユニット固定板 1 5により直列一体に連結されているガスユニットを複数備えるガス供給集積ユニットに おいて、断面がコの字型であって、流路ブロック 46及びユニット固定板 15が嵌合さ れる保持部材 18と、保持部材 18と流路ブロック 46及びユニット固定板 15との間に挟 まれて固定される平面ヒータ 16とを有するので、ガスユニットの外形寸法を平面ヒー タ 16を必要としないガスユニットと全く同一にすることが出来る。従って、ガスユニット を集積したガス供給集積ユニット全体でも外形寸法が変化しない。更に、ガスユニット の流路ブロック 46及びユニット固定板 15を裏面力 加熱保温するので、加熱保温す るための部品として、 1ガスユニットに対して、 1枚の平面ヒータと 1個の保持部材を必 要するだけで、部品点数が少なぐコストダウンすることが出来る。  As described in detail above, according to the gas supply integrated unit of the first embodiment, the first manual valve 22 provided in the outlet flow path, the first manual valve 22 and the process gas common flow path 44 An air operated valve 26 provided at a position communicating the first manual valve 22 and a second manual valve 25 provided at a position communicating the first manual valve 22 and the purge gas common flow path 43 are provided with a flow path block 46 and a unit fixing plate 1. In a gas supply integrated unit including a plurality of gas units connected in series and integrally by 5, a cross-section is U-shaped, and a holding member 18 to which the flow path block 46 and the unit fixing plate 15 are fitted is provided. Since the gas heater has a flat heater 16 sandwiched and fixed between the holding member 18, the flow path block 46 and the unit fixing plate 15, the outer dimensions of the gas unit are completely different from those of the gas unit which does not require the flat heater 16. Can be the same. Therefore, the outer dimensions do not change even in the entire gas supply integrated unit in which the gas units are integrated. In addition, since the flow path block 46 of the gas unit and the unit fixing plate 15 are back-heated and heat-retained, one flat heater and one holding member are provided for one gas unit as heat-insulation parts. Just required, cost can be reduced by reducing the number of parts.
また、第 1実施例のガス供給集積ユニットによれば、ガスユニットが保持部材 18に嵌 合されて、締結されるレール 10、レール 12と、保持部材 18とレール 10、レール 12の 間に狭持される板状のスぺーサ部材 19とを有するので、平面ヒータ 16の交換が容易 で、メンテナンスし易い。即ち、スぺーサ部材 19を抜き取ることにより、ガス供給集積 ユニットを使用できる状態を維持したままで、平面ヒータ 16を取り外し、別の平面ヒー タ 16を取り付けることができる。  Further, according to the gas supply integrated unit of the first embodiment, the gas unit is fitted to the holding member 18 and the rails 10 and 12 to be fastened, and the space between the holding member 18 and the rail 10 and the rail 12 is narrow. Since it has the plate-shaped spacer member 19 to be held, the flat heater 16 can be easily replaced and maintenance is easy. That is, by removing the spacer member 19, the flat heater 16 can be removed and another flat heater 16 can be attached while the gas supply integrated unit can be used.
[0019] (第 2実施例)  (Second embodiment)
次に、本発明に係るガス供給集積ユニットの第 2実施例について、添付図面に基づ いて説明する。図 7は図 1と同様なガス供給集積ユニットの構成を示す平面図で、図 8は図 7の B— B部の断面を示す。 2本のレール 10、 12力 両端をレール固定棒 13, 14により平行に固定されている。レール固定棒 13,14に平行に、左からパージガス ユニット、プロセスガスユニット、ガスユニット A、 B、 C, D、 Eがそれぞれユニット固定 板 15により、レール 10、 12に沿って横方向に平行移動可能に取り付けられている。 平面ヒータ 17は、 1枚又は 2枚以上である力 図 7及び図 8では、 2枚の例で示す。 2 枚の平面ヒータ 17は、パージガスユニット、プロセスガスユニット、ガスユニット A、 B、 C, D、 Eがそれぞれ固定されているユニット固定板 15の下部に接して、ユニット固定 板 15の長手方向に直交して配設される。 2枚の平面ヒータ 17はそれぞれ保持部材 4 8により保持され、保持部材 48は締結手段 49により、二つの保持部材固定板 47によ り固定される。一つの保持部材固定板 47は、レール固定棒 13と平行にプロセスガス ユニットの左側に取り付けられ、もう一つの保持部材固定板 47は、レール固定棒 14 と平行にガスユニット Eの右側に取り付けられる。二つの保持部材固定板 47は両端を それぞれレール 10、 12に固定される。 Next, a second embodiment of the gas supply integrated unit according to the present invention will be described with reference to the accompanying drawings. FIG. 7 is a plan view showing the configuration of the gas supply integrated unit similar to that of FIG. 1, and FIG. 8 shows a cross section taken along the line BB of FIG. Two rails 10, 12 Force Both ends are fixed in parallel by rail fixing rods 13, 14. The purge gas unit, process gas unit, and gas units A, B, C, D, and E move from left to right along the rails 10 and 12 in parallel with the rail fixing bars 13 and 14, respectively, by the unit fixing plate 15. Mounted as possible. The plane heater 17 has a force of one sheet or two or more sheets. FIGS. 7 and 8 show an example of two sheets. The two flat heaters 17 are in contact with the lower part of the unit fixing plate 15 to which the purge gas unit, the process gas unit, and the gas units A, B, C, D, and E are fixed, respectively, and extend in the longitudinal direction of the unit fixing plate 15. They are arranged orthogonally. The two flat heaters 17 are held by holding members 48, respectively, and the holding members 48 are fixed by fastening means 49 and two holding member fixing plates 47. One holding member fixing plate 47 is mounted on the left side of the process gas unit in parallel with the rail fixing bar 13, and the other holding member fixing plate 47 is mounted on the right side of the gas unit E in parallel with the rail fixing bar 14. . The two holding member fixing plates 47 are fixed at both ends to the rails 10 and 12, respectively.
[0020] このように設けられた本発明の第 2実施例に係るガス供給集積ユニットの作動及びそ の作用効果について説明する。ガス供給集積ユニットの全体の作用については、第 1実施例と同様であるので省略し、平面ヒータ 17の作用について説明する。平面ヒー タ 17はユニット固定板 15の下部に接して配設され、保持部材 48により保持される。 ガス供給集積ユニットにプロセスガスを流しているときに、平面ヒータ 17に通電してジ ユール熱を発生させると、その熱はユニット固定板 15を介して、パージガスユニット、 プロセスガスユニット、ガスユニット A、 B、 C、 D、 Eの流路ブロック 46に取り付けられ ている機器に伝達される。こうして、各ユニットの流路ブロック 46に取り付けられてい る機器に熱が伝達されることにより、プロセスガスが流れるガスユニット内部の温度が プロセスガスの凝結温度以上に維持される。従って、プロセスガスユニット、ガスュ- ット A、 B、 C、 D、 E内でプロセスガスが液化することによる種々の不具合の発生を防 止することが出来る。 The operation and effect of the gas supply integrated unit according to the second embodiment of the present invention will be described. The operation of the gas supply integrated unit as a whole is the same as in the first embodiment, and will not be described. The plane heater 17 is disposed in contact with the lower part of the unit fixing plate 15 and is held by a holding member 48. When the process heater is energized while the process gas is flowing through the gas supply integrated unit to generate Joule heat, the heat is transmitted via the unit fixing plate 15 to the purge gas unit, the process gas unit, and the gas unit A. , B, C, D, and E are transmitted to the equipment attached to the flow path block 46. In this way, heat is transferred to the devices attached to the flow path block 46 of each unit, so that the temperature inside the gas unit through which the process gas flows is maintained at or above the condensation temperature of the process gas. Therefore, it is possible to prevent various problems caused by liquefaction of the process gas in the process gas units and the gas cuts A, B, C, D, and E.
[0021] 次に、平面ヒータ 17の脱着を図 7の第 2実施例のガス供給集積ユニットの構成を示 す平面図、及び図 7の B— B部の断面を示す図 8で説明する。平面ヒータ 17は、図 7 の右側面方向から見て、左右に 2枚ある。左側の平面ヒータ 17の装着状態は、図 8で 保持部材 48が締結手段 49により締め付けられていない状態を示し、右側の平面ヒ ータ 17の装着状態は、図 8で保持部材 48が締結手段 49により締め付けられている 状態を示す。例えば、図 7の右側面方向から見て、右側の平面ヒータ 17の交換が必 要になったとき、図 7の右側面方向力も見て、左側の平面ヒータ 17の状態(図 8参照) にして、ガス供給集積ユニットを使用できる状態を維持したままで、平面ヒータ 17を図 7に示す矢印 K1方向に引いて取り外し、別の平面ヒータ 17を図 7に示す矢印 K2方 向に挿入した後、締結手段 49により保持部材 48を保持部材固定板 47に固定する。 Next, the attachment / detachment of the flat heater 17 will be described with reference to a plan view showing the configuration of the gas supply integrated unit of the second embodiment in FIG. 7 and FIG. There are two flat heaters 17 on the left and right as viewed from the right side of FIG. The mounting state of the left plane heater 17 shows a state in which the holding member 48 is not tightened by the fastening means 49 in FIG. 8, and the mounting state of the right plane heater 17 in FIG. Indicates the state of being tightened by 49. For example, when the right side heater 17 needs to be replaced when viewed from the right side direction in FIG. 7, the state of the left side heater 17 is also checked by looking at the right side force in FIG. 7 (see FIG. 8). Then, while maintaining the state in which the gas supply integrated unit can be used, the flat heater 17 was pulled out in the direction of arrow K1 shown in FIG. 7, removed, and another flat heater 17 was inserted in the direction of arrow K2 shown in FIG. After that, the holding member 48 is fixed to the holding member fixing plate 47 by the fastening means 49.
[0022] 以上詳細に説明したように第 2実施例のガス供給集積ユニットによれば、ガスュ-ッ トの底面に接して配設される 1枚又は 2枚以上の平面ヒータ 17と、平面ヒータ 17を保 持する保持部材 48と、平面ヒータ 17を保持部材 48と流路ブロック 46及びユニット固 定 15との間に挟んで、保持部材 48を固定する保持部材固定板 47とを有するので、 ガスユニットの外形寸法を平面ヒータ 17を必要としないガスユニットと全く同一にする ことが出来る。従って、ガスユニットを集積したガス供給集積ユニット全体でも外形寸 法が変化しない。更に、ガスユニット毎に平面ヒータ 17と保持部材 48を各 1個必要と せず、ガス供給集積ユニット全体で平面ヒータ 17と保持部材 48がそれぞれ、 1枚又 は 2枚以上であればよい。従って、ガス供給集積ユニットを加熱保温するための部品 点数が少なぐコストダウンすることが出来る。更に、平面ヒータ 17の枚数が減ること で配線が容易になり、平面ヒータ 17の交換もし易い。  As described in detail above, according to the gas supply integrated unit of the second embodiment, one or more flat heaters 17 disposed in contact with the bottom surface of the gas cut, and the flat heater 17 17 and a holding member fixing plate 47 for fixing the holding member 48 by sandwiching the flat heater 17 between the holding member 48, the flow path block 46 and the unit fixing 15. The external dimensions of the gas unit can be made exactly the same as those of the gas unit that does not require the flat heater 17. Therefore, the external dimensions do not change even in the entire gas supply integrated unit in which the gas units are integrated. Furthermore, one flat heater 17 and one holding member 48 are not required for each gas unit, and the flat heater 17 and the holding member 48 need only be one or two or more in the entire gas supply integrated unit. Therefore, the number of components for heating and keeping the gas supply integrated unit is small and the cost can be reduced. Further, since the number of the flat heaters 17 is reduced, wiring becomes easy, and the flat heaters 17 can be easily replaced.
[0023] なお、本発明の実施の一形態について説明したが、本発明は上記実施例に限定さ れることなぐ様々な応用が可能である。  Although one embodiment of the present invention has been described, the present invention is not limited to the above-described embodiment, and various applications are possible.
例えば、上記実施例では、ガス供給集積ユニットにエアオペレートバルブを搭載し たが、搭載する流体制御機器の種類や並びはこれに限定されるものでなぐ適宜変 更可能である。  For example, in the above embodiment, the air supply valve is mounted on the gas supply integrated unit. However, the type and arrangement of the mounted fluid control devices are not limited thereto, and can be changed as appropriate.
例えば、上記第 2実施例では、平面ヒータ 7を脱着するときに、平面ヒータ 17を図 7 に示す矢印 K1方向に引いて取り外し、別の平面ヒータ 17を図 7に示す矢印 K2方向 に挿入するようにした力 平面ヒータ 17を図 7に示す矢印 K2方向に引いて取り外し、 別の平面ヒータ 17を図 7に示す矢印 K1方向に挿入するようにしてもょ 、。  For example, in the second embodiment, when attaching and detaching the flat heater 7, the flat heater 17 is pulled out in the direction of arrow K1 shown in FIG. 7 and removed, and another flat heater 17 is inserted in the direction of arrow K2 shown in FIG. The flat heater 17 may be pulled out in the direction of arrow K2 shown in FIG. 7 and removed, and another flat heater 17 may be inserted in the direction of arrow K1 shown in FIG.

Claims

請求の範囲 The scope of the claims
[1] 出口流路に設けられた第 1手動弁と、該第 1手動弁とプロセスガス共通流路とを連 通する位置に設けられたエアオペレート弁と、該第 1手動弁とパージガス共通流路と を連通する位置に設けられた第 2手動弁とが流路ブロック及びユニット固定板により 直列一体に連結されて 、るガスユニットを複数備えるガス供給集積ユニットにお 、て 断面がコの字型であって、前記流路ブロック及びユニット固定板が嵌合される保持 部材と、  [1] A first manual valve provided in an outlet flow path, an air operated valve provided in a position communicating the first manual valve with a process gas common flow path, and a common purge gas with the first manual valve. A second manual valve provided at a position that communicates with the flow path is integrally connected in series by a flow path block and a unit fixing plate. A holding member into which the flow path block and the unit fixing plate are fitted,
前記保持部材と前記流路ブロック及び前記ユニット固定板との間に挟まれて固定さ れる平面ヒータとを有することを特徴とするガス供給集積ユニット。  A gas supply integrated unit, comprising: a flat heater sandwiched and fixed between the holding member, the flow path block, and the unit fixing plate.
[2] 請求項 1に記載するガス供給集積ユニットにお 、て、 [2] In the gas supply integrated unit according to claim 1,
前記ガスユニットが前記保持部材に嵌合されて、締結されるレールと、 前記保持部材と前記レールの間に狭持される板状のスぺーサ部材とを有することを 特徴とするガス供給集積ユニット。  A gas supply assembly comprising: a rail to which the gas unit is fitted and fastened to the holding member; and a plate-shaped spacer member sandwiched between the holding member and the rail. unit.
[3] 請求項 1に記載するガス供給集積ユニットにお 、て、 [3] In the gas supply integrated unit according to claim 1,
前記ガスユニットの底面に接して配設される 1枚又は 2枚以上の平面ヒータと、 前記平面ヒータを保持する保持部材と、  One or more flat heaters disposed in contact with the bottom surface of the gas unit, a holding member for holding the flat heater,
前記平面ヒータを前記保持部材と前記流路ブロック及び前記ユニット固定板との間 に挟んで、保持部材を固定する保持部材固定板とを有することを特徴とするガス供 給集積ユニット。  A gas supply integrated unit comprising: a holding member fixing plate for fixing the holding member by sandwiching the flat heater between the holding member, the flow path block, and the unit fixing plate.
PCT/JP2005/007308 2004-05-10 2005-04-15 Gas supply integration unit WO2005109482A1 (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006134727A1 (en) * 2005-06-17 2006-12-21 Fujikin Incorporated Fluid control device
JP2012159102A (en) * 2011-01-31 2012-08-23 Fujikin Inc Fluid control apparatus
JP2014002884A (en) * 2012-06-18 2014-01-09 Tem-Tech Kenkyusho:Kk Flat heating plate for integrated gas supply device, and method of manufacturing the same
KR20150059794A (en) * 2012-11-29 2015-06-02 가부시키가이샤 후지킨 Fluid control device
WO2020261985A1 (en) * 2019-06-28 2020-12-30 株式会社フジキン Fluid control apparatus

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008014390A (en) * 2006-07-05 2008-01-24 Hitachi Metals Ltd Integrated fluid control device
US7807222B2 (en) * 2007-09-17 2010-10-05 Asm International N.V. Semiconductor processing parts having apertures with deposited coatings and methods for forming the same
JP5000469B2 (en) * 2007-12-05 2012-08-15 株式会社キッツエスシーティー Vessel block valve
JP5410173B2 (en) * 2009-06-30 2014-02-05 Ckd株式会社 Gas supply device
JP6966499B2 (en) * 2019-03-06 2021-11-17 Ckd株式会社 Gas supply unit and gas supply method
US20250075898A1 (en) * 2021-12-22 2025-03-06 Proterial, Ltd. Vaporizer
CN118328226B (en) * 2024-06-17 2024-09-27 鸿舸半导体设备(上海)有限公司 Gas system integrated module and gas delivery control method

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999064780A1 (en) * 1998-06-08 1999-12-16 Advanced Delivery & Chemical Systems, Ltd. Chemical delivery system having purge system utilizing multiple purge techniques
JP2001073144A (en) * 1999-09-03 2001-03-21 Pioneer Electronic Corp Raw material feeding device for chemical vapor growth method
JP2002173777A (en) * 2000-12-01 2002-06-21 C Bui Res:Kk Metal liquid vaporization unit and vaporization method for CVD apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5964254A (en) * 1997-07-11 1999-10-12 Advanced Delivery & Chemical Systems, Ltd. Delivery system and manifold
JP3767897B2 (en) * 2004-03-01 2006-04-19 シーケーディ株式会社 Gas supply integrated unit

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999064780A1 (en) * 1998-06-08 1999-12-16 Advanced Delivery & Chemical Systems, Ltd. Chemical delivery system having purge system utilizing multiple purge techniques
JP2001073144A (en) * 1999-09-03 2001-03-21 Pioneer Electronic Corp Raw material feeding device for chemical vapor growth method
JP2002173777A (en) * 2000-12-01 2002-06-21 C Bui Res:Kk Metal liquid vaporization unit and vaporization method for CVD apparatus

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006134727A1 (en) * 2005-06-17 2006-12-21 Fujikin Incorporated Fluid control device
JP2006349075A (en) * 2005-06-17 2006-12-28 Fujikin Inc Fluid control system
JP2012159102A (en) * 2011-01-31 2012-08-23 Fujikin Inc Fluid control apparatus
JP2014002884A (en) * 2012-06-18 2014-01-09 Tem-Tech Kenkyusho:Kk Flat heating plate for integrated gas supply device, and method of manufacturing the same
KR20150059794A (en) * 2012-11-29 2015-06-02 가부시키가이샤 후지킨 Fluid control device
KR101674849B1 (en) 2012-11-29 2016-11-09 가부시키가이샤 후지킨 Fluid control device
WO2020261985A1 (en) * 2019-06-28 2020-12-30 株式会社フジキン Fluid control apparatus
US12152685B2 (en) 2019-06-28 2024-11-26 Fujikin Incorporated Fluid control apparatus

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CN100440454C (en) 2008-12-03
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CN1950931A (en) 2007-04-18
JP4567370B2 (en) 2010-10-20
TW200538678A (en) 2005-12-01
JP2005322797A (en) 2005-11-17
KR101074265B1 (en) 2011-10-19

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