WO2005010574A1

WO2005010574A1 - Micro lens and micro lens array

Info

Publication number: WO2005010574A1
Application number: PCT/JP2004/009044
Authority: WO
Inventors: Junji Nishii; Satoru Yoshihara
Original assignee: National Institute Of Advanced Industrial Science And Technology; Nippon Electric Glass Co., Ltd.
Priority date: 2003-07-25
Filing date: 2004-06-21
Publication date: 2005-02-03
Also published as: JP2006330010A

Abstract

A micro lens array (10), comprising a plurality of two-dimensionally arranged micro lenses (3) having lens parts (1) and base parts (2). The array provides a generally flat plate-like appearance. The lens part (1) is formed in a cylindrical shape with a specified diameter and comprises an amorphous part (1a) formed of an amorphous glass positioned on one surface side of the micro lens array (10) and a crystalline part (1b) formed of a crystallized glass positioned on the other surface side. The surface of the amorphous part (1a) is raised in curved shape from the position of the surface of the base part (2) to form a convex-shaped lens surface (1a1). The base part (2) is formed of the same crystallized glass as the crystalline part (1b) of the lens part (1) and surrounds the periphery of the lens part (1).

Description

Description Microphone lens and microphone lens array

Technical field

The present invention relates to a microlens and a microlens array, particularly to a microlens and a microlens array used in the optical communication field. Background art

A microlens is a general term for a lens having a minute lens part with a diameter of 2 mm or less, and has a function of forming a minute spot in optical recording and a function of coupling an output light beam from a semiconductor laser to an optical fiber. It is used for optical pickups, liquid crystal projectors, optical communication devices (eg, optical switches, multiplexers / demultiplexers, etc.). In particular, microlenses used in the field of optical communications require the lens diameter to be as small as possible in accordance with the core diameter of the optical fiber of about 10 μΐη, and in DWDM and parallel optical communications, A microlens array in which a plurality of such fine microlenses are two-dimensionally arranged is used.

As such a microlens, a microlens using a glass (a so-called photosensitive crystallized glass) that precipitates a crystal only in an exposed portion has been proposed (for example, Japanese Patent Publication No. 5-848481). Gazette (hereinafter referred to as “Patent Document 1”)}. In other words, this microlens masks a region corresponding to the lens portion on the surface of the original glass substrate with a masking material made of a silica glass plate on which a Cr film having a size corresponding to the lens portion is formed. After the exposure, heat treatment is performed to precipitate crystals only in the exposed portion (the portion surrounding the lens portion). As a result, the upper surface and the lower surface of the unexposed portion are curved and raised to be amorphous. A lens portion made of glass is formed. As another microlens, a microlens (array) in which a microstructure on the surface of a densified silica glass is irradiated with a carbon dioxide laser to relax the thermal structure of the irradiated part and form a raised structure in the microdomain. [For example, Naoyuki Kitamura, et al., “Uplift structure of glass surface formed by laser irradiation”, Proceedings of the 50th Federation of Applied Physics, 2002 March 3rd, p983, 28p-M-l (hereinafter referred to as "Non-Patent Document 1")}.

However, the microlens described in Patent Document 1 requires a masking material for each type when manufacturing a microlens array in which the distance between the lens portion and the lens portion is different from each other. Will be higher.

The microlens (array) described in Non-Patent Document 1 irradiates an infrared laser having a wavelength of 10.6 μππ as a carbon dioxide gas laser to form a lens portion, but quartz glass does not transmit this infrared light. However, the infrared laser cannot be irradiated over the entire thickness portion, and the lens portion is formed only in the portion near the surface. In addition, expensive manufacturing equipment is required, and the use of quartz glass densified by HIP processing, which makes continuous production difficult, increases the manufacturing cost. Disclosure of the invention

Therefore, an object of the present invention is to provide an inexpensive microlens and microlens array.

In order to achieve the above object, the present invention comprises: a lens portion having a convex lens surface; and a substrate portion made of crystallized glass surrounding the lens portion, wherein the lens portion constitutes the substrate portion. Provided are a microlens in which a crystallized glass substrate includes an amorphous portion that has been amorphously vitrified by laser irradiation, and a microphone aperture lens array in which a plurality of the microlenses are two-dimensionally arranged.

When a predetermined region of the substrate made of crystallized glass is irradiated with a laser, the predetermined region of the substrate irradiated with the laser is partially or entirely melted by the irradiation energy of the laser. And amorphous vitrification It becomes. The density of the amorphous vitrified amorphous part is relatively smaller than that of the crystallized glass substrate surrounding the amorphous part, and the volume of the amorphous part is smaller than that of the substrate part. Increase relatively. As a result, the amorphous portion receives a compressive force from the surrounding substrate portion, and its surface protrudes in a curved shape to form a convex lens surface. Therefore, a predetermined region of the substrate irradiated with the laser becomes a lens portion having a convex curved lens surface, and the other region of the substrate not irradiated with the laser surrounds the periphery of the lens portion. It becomes a substrate part made of crystallized glass.

For example, when irradiating a laser to a predetermined area from one side of the substrate and only the portion near the surface of the predetermined area is melted by the irradiation energy of the laser, only the portion near the surface becomes amorphous. Thus, the lens surface is formed only on one side of the substrate. When irradiating a predetermined region with laser from both sides of the substrate, lens surfaces are formed on both sides of the substrate regardless of the range of melting by the irradiation energy of the laser. In particular, if the laser is an ultraviolet laser, the transmittance of the ultraviolet light to the glass is high.For example, the laser is irradiated from one side of the substrate, and the entire thickness of the predetermined area is melted by the irradiation energy of the laser. Thereby, the entire thickness portion of the predetermined region can be made amorphous to form the lens surfaces on both sides of the substrate.

When the laser is applied to a plurality of predetermined regions of the substrate at intervals, a microphone aperture lens array in which a plurality of microphone aperture lenses are two-dimensionally arranged as described above is formed.

In the above configuration, the crystallized glass constituting the substrate portion (substrate) has a density difference (D a) between the density of the original glass before crystallization (D a) and the density of the crystallized glass after crystallization (D b). It is preferable that the crystallized glass has AD = (Db−Da) / Db) of 1 ° / ₀ or more because a convex curved surface necessary for obtaining a lens effect is obtained. A more preferable range of ΔD is 2 to 6%.

Further, when the amorphous part of the lens portion has a 3 0-1 3 0 thermal expansion coefficient of X 1 0 one ⁷ in the temperature range one 4 0 to 8 0 ° C, the focal length change rate with respect to temperature (D f / dT) is small (for example, within 2 nm / ^ C in absolute value), and light loss is small even when the environmental temperature fluctuates.

The thermal expansion coefficient of the amorphous part of the lens part is more preferably 30 to 95 X 1 O- ⁷ / ^^ in the temperature range of 140 to 80 ° C. When the coefficient of thermal expansion is less than 60 × 10 ¹⁷ / ° C, the difference in thermal expansion from the substrate portion is small, and cracks are less likely to occur.

In general, microlenses (arrays) are sometimes used by transmitting and receiving infrared light from an optical fiber fixed to a base material for an optical fiber array. L i ₂ 0-A 1 ₂ 0 ₃ — S i 0 having a coefficient of thermal expansion of 10 to +1 OX 10 ¹⁷ / ° c because the coefficient is close to that of the optical fiber and the V groove processability is excellent. _In many cases, ₂ type crystallized glass is used as a base material. Therefore, if the substrate part has a thermal expansion coefficient of 130 to + 50 × 10 ¹⁷ Z ° C in a temperature range of 140 to 80 ° C, the thermal expansion coefficient between the microlens and the base material for an optical fiber array Therefore, when used as a microlens array, it is preferable because the axial deviation due to a temperature change is small and light loss is small even if the environmental temperature fluctuates. The preferred range of the coefficient of thermal expansion of the substrate portion is from 130 to 20 × 10 ¹⁷ /. Is C, still more preferably in the range of - 25 to ten 15 X 10 - ⁷ /. C. Further, when the amorphous part of the lens portion is one ^{1~ + 8 X 10- 6 / °} C ( preferably 5~ 7X 10_ ⁶ / ° C) has a temperature dependence of the refractive index of, with respect to temperature This is preferable because the focal length change rate is small.

Further, the amorphous portion of the lens portion L i _₂ 0-A 1 ₂ 〇 ₃ - and S i 0 ₂ based amorphous glass or Ranaru, in the temperature range one 40~80 ° C, 30~1 30 X 10- ⁷ ° (easily have a coefficient of thermal expansion, the substrate portions _{_{L i 2 0-a 1 2}} 0 3 - S i 0 2 based crystallized glass, in particular β one-quartz solid solution and or; 3 - the Supojiyumen solid solution comprising precipitated as a main crystal phase _{_{L i 2 0-a 1 2}} 0 3 - to consist of S i 0 ₂ based crystallized glass, single 30 + 5 in the temperature range one 40 to 80 ° C OX10-17 / ^ C is preferable because it tends to have a thermal expansion coefficient of ¹⁷ / ^ C. Further, when the substrate portion contains an element that absorbs ultraviolet light having a wavelength of 200 to 400 nm, the element present in a predetermined region of the substrate irradiated with the ultraviolet laser absorbs the ultraviolet light, and its energy causes the element to absorb the ultraviolet light. Some or all of the crystals of the crystallized glass substrate constituting the glass melt and become amorphous vitrified efficiently in a short time to become an amorphous portion. One or more elements selected from the group consisting of Ti, Nb, Bi, Pb, Fe, Cr, V, Ce, Au, Ag, and Cu are used as the elements that absorb ultraviolet light. can, in particular, in addition to T i (50 to at _{_{F e 2 0 3: L 000}} p pm) F e traces to include, tends to absorb more ultraviolet radiation. In addition, it is preferable that the element that absorbs ultraviolet light is T i because light having a wavelength of visible light can be transmitted and absorbed.

The lens portion and the substrate portion, the mass ^{_{_{0/0, S i 0 2}}} 55~75%, A 1 2 0 3 14~35%, L i 2 〇 2 ~ 8%, T i 0 2 + Z r 0 ₂ 0. and also contains 7-8%, particularly preferably, in _{mass%, S i 0 2 55~75%} , a 1 2 0 3 14 - 35%, L i 2 0 2~8%, _{T i 0 2 + Z r 0} 2 0. 7~5%, MgO 0 ~4 0/0, ZnO 0~4 o / o, T I_〇 _{2 0~4%,} Z R_〇 ₂ 0-4%, _{^{_{Sn0 2 0~4 0/0, P}}} 2 〇 _{_{5 0~4%, N a 2 0}} 0~ 7%, K 2 0 0~7%, B a O

When comprising 0-7% in the temperature range one 40 to 80 ° C, the amorphous glass amorphous portion of the lens portion has a thermal expansion coefficient of 30~ 130 X 10- ⁷ / ° C likely prone to crystallized glass substrate portion has a thermal expansion coefficient one ^{30~ + 50 X 10- 7 / °} C.

Substrate made of crystallized glass is in the temperature range of over 40 to 80 ° C, one 30 to ten 50 X 10- ⁷ /. Has a thermal expansion coefficient of the C, P- quartz solid solution and / or 3- scan Pojumen solid solution comprising precipitated as a main crystal phase _{_{L i 2 0-A 1 2}} 0 3 -S i 0 2 based crystallized glass When made of, becomes amorphous glass having a thermal expansion coefficient of 30~13 OX 10- ⁷ Z ° C in the temperature range of amorphous portion is one 40 to 80 ° C of lens portions formed by irradiation of a laser It is easy to become a crystallized glass having a substrate part having a thermal expansion coefficient of 30 to + 50 × 10 ¹⁷ / ° C.

The substrate, in _{mass%, S ί O 2 55~ 75} %, A 1 2 Ο 3 14~ 35%, L i ₂ 〇 2 ~ 8%, T i 0 2 + Z r 0 2 0. containing 7-8%, more preferably, by mass% S I_〇 _{_{2 55 ~ 75% s A 1}} 2 O a 14~ _{35%, L i 2 0 2~} 8%, T i 0 2 + Z r 0 2 0. 7~5%, 0~4% MgO, 0~4% ZnO, T i 0 2 0 ~ 4%, Z R_〇 ₂ 0-4%, Sn_〇 _{_{_{2 0~4%, P 2 0 5}}} 0 ~ 4%, Na 2 0 0~7%, K 2 0 0~7%, the B aO ⁰ ~ 7 0 / o It is preferred that it be contained.

If the laser is an ultraviolet laser having a wavelength of 400 nm or less, preferably 266 to 355 nm, specifically a YAG laser, the laser output can be increased, the irradiation spot diameter can be reduced, and the spot diameter can be reduced. Since the roundness can be increased, a small-diameter lens part with high dimensional accuracy can be formed in a short time, and when the output of the ultraviolet laser is 0.5 to 5 W, a part of the substrate made of crystallized glass Melts in a short time and easily forms an amorphous part Especially when the base material made of crystallized glass has a large absorption of light having a wavelength of 400 nm or less, the base material is melted by the laser. It is preferable because it becomes easy.

The microphone opening lens and the microphone opening lens array of the present invention do not require high-density base materials by HIP processing, which requires expensive manufacturing equipment and difficult to produce continuously, and does not require the production of a masking material. Therefore, according to the present invention, inexpensive microlenses and microphone aperture lens arrays can be provided. Brief Description of Drawings

FIG. 1 is a sectional view conceptually showing a microphone aperture lens array according to an embodiment.

FIG. 2 is a sectional view conceptually showing a microphone aperture lens array according to another embodiment. BEST MODE FOR CARRYING OUT THE INVENTION

1 and 2 show microlens arrays 10 and 20 according to an embodiment of the present invention. Are conceptually shown.

The microphone aperture lens array 10 shown in FIG. 1 is configured by two-dimensionally arranging a plurality of microlenses 3 having a lens portion 1 and a substrate portion 2, and has a flat appearance as a whole. Each of the lens portions 1 has a cylindrical shape with a predetermined diameter, and includes an amorphous portion 1a made of amorphous glass located on one surface side of the micro-aperture lens array 10 and a second portion on the other surface side. And a crystalline part 1b made of crystallized glass. The surface of the amorphous portion la rises in a curved shape from the position of the surface of the substrate portion 2 to form a convex curved surface, for example, a convex spherical lens surface 1 a 1 having one radius of curvature. I have. The substrate portion 2 is made of the same crystallized glass as the crystalline portion 1 b of the lens portion 1 and surrounds the lens portion 1. In FIG. 1, the substrate part 2 and the crystalline part 1b of the lens part 1 are conceptually divided, but in reality, there is a difference in the structure between the two. do not do.

The microlens array 10 can be manufactured, for example, by irradiating a plurality of predetermined regions of a substrate made of crystallized glass with laser from one surface side. In other words, a predetermined area of the substrate irradiated with the laser is melted at a portion close to one surface by laser irradiation energy and becomes amorphous vitrified to form an amorphous portion la. The amorphous portion 1a that has been vitrified has a relatively lower density than the substrate portion 2 of the crystallized glass substrate surrounding the amorphous portion 1a, and therefore, the volume of the amorphous portion 1a is small. It increases relatively compared to the substrate part 2. As a result, the amorphous portion 1a receives a compressive force from the surrounding substrate portion 2, and its surface rises in a curved shape to form a convexly curved lens surface 1a1. Therefore, the predetermined region of the substrate irradiated with the laser becomes the lens portion 1 having the convexly curved lens surface 1a1, and the other region of the substrate not irradiated with the laser surrounds the lens portion 1. The substrate part 2 is made of crystallized glass. The diameter of the lens portion 1 is substantially equal to the spot diameter of the laser beam to be irradiated. By adjusting the spot diameter of the laser beam, the lens portion 1 having a desired diameter can be formed accurately.

The microphone aperture lens array 20 shown in FIG. 2 has a lens section 11 and a substrate section 12. The obtained microlenses 13 are two-dimensionally arranged in a plurality, and have a flat plate-like appearance as a whole. Each of the lens portions 11 has a cylindrical shape with a predetermined diameter, and is formed of an amorphous portion 11a made of amorphous glass. Both surfaces of the amorphous portion 1 1 a are respectively protruded in a curved shape from the position of the surface of the substrate portion 12 to form a convex curved surface, for example, a convex spherical lens surface 1 having one radius of curvature. 1 a 1 is formed. The substrate portion 12 is made of crystallized glass and surrounds the lens portion 11.

Like the microlens array 10 shown in FIG. 1, this microlens array 20 is also manufactured by irradiating a plurality of predetermined regions of a substrate made of crystallized glass with a laser from one surface side. However, the difference is that the entire thickness of the lens portion 11 is melted and amorphous by laser irradiation, and the lens surfaces 11a1 are formed on both sides of the substrate.

【Example】

[Table 2]

[Table 3]

Table 1 shows Examples 1 to 5, Table 2 shows Examples 6 to 9, and Table 3 shows Comparative Examples 1 and 2. The microlens arrays of Examples 1 to 3, 5, and 7 correspond to the configuration shown in FIG. 1, and the microlens arrays of Examples 4, 6, 8, and 9 correspond to the configuration shown in FIG. First, the raw materials prepared so as to have the compositions shown in Tables 1 and 2 were placed in a platinum crucible, and the glass melted at 1550 ° C for 10 hours was poured out into a carbon mold, and gradually cooled to room temperature. A glass plate was produced. Thereafter, crystallization was performed under the crystallization conditions shown in Table 1 to obtain an original plate composed of crystallized glass on which β-quartz solid solution or] 3-spodumene solid solution was precipitated. In Examples 1-9, the F e ₂ 0 ₃ as an impurity contained 50~400 ρ ρ m.

Next, the base plate was cut into a size of 3 x 4 x 0.5 tmm, and the base material was prepared by mirror-polishing both sides. A YAG laser with a pulse width of 10 ns, a frequency of 1 kHz, and a wavelength of 355 nm is radiated from 0.5 to 2.5 W for 2 seconds at each location. A microlens array 10 in which eight microlenses 3 each having a (region irradiated with an ultraviolet laser) and a substrate portion 2 (region not irradiated with an ultraviolet laser) were formed two-dimensionally was prepared (implemented). Examples 1-3, 5, 7). In addition, the base plate is cut into a size of 3 X 4 X 0.2 t mm, and the base material is manufactured by mirror-polishing both sides. The total thickness of the base material is obtained at eight locations at 0.2 mm intervals. By irradiating a YAG laser with a pulse width of 10 ns, a frequency of 1 kHz, and a wavelength of 355 nm in each direction at 0.5 to 2.5 W for 2 seconds per location, as shown in Fig. 2, the lens section 1 A microphone aperture lens array in which eight microphone aperture lenses 13 each having 1 (area irradiated with ultraviolet laser) and substrate section 1 2 (area not irradiated with ultraviolet laser) are arranged two-dimensionally. (Examples 4, 6, 8, and 9). The portions of the lens portions 1 and 11 where the substrate was melted by the irradiation of the ultraviolet laser were amorphous portions 1 _a and 11 _a made of amorphous glass. In Examples 1 to 3, 5, and 7, a portion of the lens portion 1 where the base material was not melted was a crystalline portion 1b in which crystals of the base material were precipitated. In addition, although this crystalline part lb has precipitated a quartz solid solution, Since the crystal size was less than 0.05 m, the transmittance of infrared light in the wavelength range of 1000 to 1650 nm was 60% or more, and it was sufficient for optical communication applications.

In Comparative Example 1, a carbon dioxide laser having a wavelength of 10.6 μπι was output as a master plate using lGPa, a densified silica glass whose density was increased by 4% by HIP treatment at 1200 ° C. A micro lens array was produced in the same manner as in Example 1 except that irradiation was performed at 5 W for 120 seconds. In this case, the portion of the lens portion where the density has been reduced by the laser irradiation becomes the amorphous portion of the lens portion, and the portion of the original plate which has been increased in density becomes the substrate portion.

In Comparative Example 2, the raw materials prepared so as to have the composition shown in Table 2 were placed in a platinum crucible, and the glass melted at 1450 ° C for 4 hours was poured into a carbon mold, and gradually cooled to room temperature. Produced. Next, this base plate was cut into a size of 3 x 4 x 0.5 t mm, and both sides were mirror-polished to produce a base material, and a Cr film with a size corresponding to the lens part was formed. Using the formed silica glass plate, a region corresponding to the lens portion on the surface of the substrate was masked, and ultraviolet rays were irradiated for 100 seconds using a 100 OW mercury-xenon lamp. Then, 1 hour a substrate with 540 ° C, and heat-treated for 1 hour at 580 ° C, the portion irradiated with ultraviolet rays of the base material by precipitating _{L i 2 0 ■ S i 0} 2 crystals, both surfaces of the base material A microlens array equipped with eight microphone aperture lenses having a convex curved lens surface was fabricated.

In Examples 1 to 9 and Comparative Examples 1 and 2, the diameter of the lens portion was substantially equal to the radius of curvature of the lens surface, and was 50 to 300 m. In the columns of “lens shape” in Tables 1 and 2, “convex flat” indicates a lens shape having a lens surface only on one side as shown in FIG. Indicates that the lens has a lens shape having lens surfaces on both sides as shown in FIG.

The precipitated crystal phase was identified using an X-ray diffractometer.

The density (D a) of the raw glass before crystallization and the density (Db) of the crystallized glass (substrate) after crystallization were measured using the Archimedes method.

In Examples 1 to 5, the thermal expansion coefficient of the amorphous portion is the thermal expansion coefficient of the original glass plate. In Comparative Examples 1 and 2, the evaluation was made based on the coefficient of thermal expansion of the original plate. The coefficient of thermal expansion of the substrate portion was evaluated in Examples 1 to 5 and Comparative Example 1 by the coefficient of thermal expansion of the original plate, and in Comparative Example 2, the coefficient of thermal expansion of the original plate after heat treatment was evaluated. These thermal expansion coefficients were measured using a dilatometer (TD-5000S, manufactured by Matsuku Science Co., Ltd.) in a temperature range of -40 to 80 ° C.

The radius of curvature of the lens was measured using a laser microscope.

The refractive index of the lens portion and the temperature dependence of the refractive index (dn / dT) were determined by measuring the refractive index by an optical probe method in a temperature range of 140 to 80 ° C.

The focal length change rate with respect to temperature (df / dT) was calculated as follows. The focal length f is represented by Equation 1, and by differentiating Equation 1 with the temperature T, the focal length change rate (d f ZdT) with respect to temperature shown in Equation 2 is derived.

f = (r, r ₂ ) / {(r ₂ -r _x )-(n-1)}

df / d T = f-[a- {1 / (n-1)-dn / d T}] ... Equation 2 where r or r ₂ is the radius of curvature (μπι) of the lens surface of the lens section, a thermal expansion coefficient (X 1 0- ⁷ °, n is the refractive index at room temperature at a wavelength of 1 550 nm, dn Zd T is the refractive index change rate with respect to temperature (XIO- ⁶ / ° C). the lens When the shape is convex flat, ₂ becomes ∞.

The focal length change and axis shift due to temperature change are evaluated by the input loss with respect to the temperature change, and the insertion loss is calculated by converting 1.55 μm infrared light emitted from a laser diode (LD) into the microphone port. The light was incident on the single mode optical fiber through the lens, and the optical loss (dB) at 15 ° C, 25 ° C and 65 ° C was measured for eight microlenses using a power meter. The average value of the light loss of each was used.

In Examples 1 to 9, the microphone aperture lens array could be manufactured without the need for the HIP processing or the masking material, and the insertion loss with respect to the temperature change was small. On the other hand, in Comparative Example 1, HIP processing had to be performed in order to produce the original plate, and the focal length change rate (df / dT) with respect to temperature was large. Insertion loss was large. In Comparative Example 2, a masking material had to be prepared, and the rate of change in focal length with respect to temperature (dί / άά) was small, but the input loss with respect to temperature change was large. This is presumed to be due to the fact that the axis deviation with respect to the temperature of the microlens array increased due to the large thermal expansion coefficient of the substrate. Industrial applicability

INDUSTRIAL APPLICABILITY The microlens and microlens array of the present invention are suitable for optical communication devices such as optical switches and multiplexing / demultiplexing devices, and in particular, DWD which requires strict focal length accuracy and high chemical durability. Suitable for M and parallel optical communication.

Claims

The scope of the claims

1. A lens part having a convex lens surface and a substrate part made of crystallized glass surrounding the periphery of the lens part, wherein the lens part is a laser made of a crystallized glass substrate constituting the substrate part. Microphone lens that contains an amorphous part that has been made amorphous by irradiation.

2. The crystallized glass constituting the substrate part has a density difference (AD = (Db) between the density (D a) of the original glass before crystallization and the density (Db) of the crystallized glass after crystallization.

2. The microphone aperture lens according to claim 1, wherein the lens is a crystallized glass in which -D a) is not less than 1%.

3. amorphous portion of the lens portion is in the temperature range one 40 to 80 ° C, according to the range 1 or 2 claims having a thermal expansion coefficient of ^{30~ 1 30 X 1 0- 7 /} ° C Microphone mouth lens.

4. The substrate unit, in the temperature range one 40 to 80 ° C, one 30~ + 5 0 X 1 0 one ⁷ Microphone port lens according to claim 1 or 2 in accordance with the thermal expansion coefficient of the Z ° C .

5. The lens portion of the amorphous portion _{_{L i 2 0-A 1 2}} 0 3 - S i 0 2 system consists amorphous glass, wherein the substrate portion _{_{L i 2 0-A 1 2}} 0 3 - S i 0 ₂ based microphone port lens according to any one of claim 1, wherein comprising a crystallized glass 4.

6. The substrate portion β one-quartz solid solution and / or - spodumene solid solution comprising precipitated as a main crystal phase _{_{L i 2 0- A 1 2 0}} 3 - S i 0 2 based crystallized glass or Ranaru claims Microphone mouth lens according to any of 1 to 5.

7. The microphone aperture lens according to any one of claims 4 to 6, wherein the substrate portion contains an element that absorbs ultraviolet light having a wavelength of 200 to 400 nm.

8. The substrate portion contains one or more elements selected from the group consisting of Ti, Nb, Bi, Pb, Fe, Cr, V, Ce, Au, Ag, and Cu. The microphone aperture lens according to any one of claims 4 to 7.

9 - the lens section及Pi said substrate section by _{mass%, S i O 2 55~ 75} %, Claims containing A 1 ₂ 0 ₃ 14 to 35%, L i ₂ 〇 2 to 8%, T i O ₂ + Zr O ₂ 0.7 to 8% Any of claims 1 to 8 Microphone mouth lens as described.

10. The lens unit and the substrate unit are mass. /. _{In, S i O 2 5 5~75%} , A 1 2 O 3 14~3 5%, L i 2 0 2~8%, T i 0 2 + Z r 0 2 0. 7~ 5%, M g O 0~ 4%, Z n O 0~ 4 0/0, T i O 2 0~ 4%, Z r O 2 0~4%, S N_〇 _{_{_{2 0~4%, P 2 0 5}}} 0 ~ 4 _{%, N a 2 0 0~7%} , K 2 O 0~7%, B a O 0 microphone port lens according to any one of claim 1, wherein containing ~ 7% 9.

1 1. The microphone aperture lens according to any one of claims 1 to 10, wherein the laser is an ultraviolet laser.

12. The microphone aperture lens according to any one of claims 1 to 11, wherein an output of the laser is 0.5 to 5W.

1 3. A method for producing a microlens comprising a lens portion having a convex lens surface and a substrate portion made of crystallized glass surrounding the lens portion, comprising a base made of crystallized glass. Irradiating a predetermined area of the material with a laser, and irradiating the laser with the laser to irradiate the crystallized glass substrate in a predetermined area of the base material into an amorphous glass to form an amorphous portion; A method for producing a micro lens for forming a part.

14. The substrate has a density difference (AD = (Db-Da) / Db) between the density of the raw glass before crystallization (Da) and the density of the crystallized glass after crystallization (Db). 14. The method for producing a microphone opening lens according to claim 13, wherein the lens is made of crystallized glass of 1% or more.

1 5. wherein the substrate, in the temperature range of over 40 to 80 ° C, has a thermal expansion coefficient one ^{30~ + 50 XI 0- 7 Z °} C, i3- quartz solid solution and Z or J3- Supojume down producing how the microphone port lens according to _{_{L i 2 0-a 1 2}} 0 3 -S i 0 the claims of _two based crystallized glass 1 3 or 14 comprising precipitated as a main crystal phase a solid solution.

16. The element in which the substrate portion absorbs ultraviolet light having a wavelength of 200 to 400 nm. 16. The method for producing a microphone aperture lens according to claim 15, comprising:

1 7. The substrate portion comprises one or more elements selected from the group consisting of Ti, Nb, Bi, Pb, Fe, Cr, V, Ce, Au, Ag, and Cu. 17. The method for producing a microphone aperture lens according to claim 15, wherein the method comprises:

1 8. wherein the substrate, in mass%, S I_〇 _{_{2 55~75%, A 1 2 0}} 3 14 ~3 5%, L i 2 0 2~8%, T i 0 2 + Z r 0 2 The method for producing a microphone aperture lens according to any one of claims 13 to 17, comprising 0.7 to 8%.

1 9. The substrate, in mass%, S I_〇 ₂ 55 to 75 ° /. _{_{, A l 2 0 3 14 ~}} 35%, L i 2 〇 ^{_{2~8 0/0, T i O}} 2 + Z r O 2 0. 7~5%, Mg O 0 ~4%, Z nO 0~4 _{%, T i O 2 0~4%} , Z r O 2 0~4%, S nO 2 0~ 4%, P 2 O 5 0~ 4 0/0, N a 2 O 0~ 7%, K 2 The method for producing a microlens according to any one of claims 13 to 18, comprising O0-7% and BaO 0-7%.

20. The method according to any one of claims 13 to 19, wherein the laser is an ultraviolet laser.

21. The method for manufacturing a microphone aperture lens according to any one of claims 13 to 19, wherein the output of the laser is 0.5 to 5 W.

22. A microlens array in which the microlenses according to any one of claims 1 to 12 are two-dimensionally arranged.

23. A microlens array in which a plurality of two-dimensionally arranged microlenses including a lens part having a convex lens surface and a substrate part made of crystallized glass surrounding the lens part is manufactured. A method comprising: irradiating a plurality of predetermined regions of a base material made of crystallized glass with a laser; A method for producing a microlens array in which a portion is formed to form the lens portion including the amorphous portion.

24. The base material has a density difference (Db (DbDa) / Db) between the density (Da) of the raw glass before crystallization and the density (Db) of the crystallized glass after crystallization. 1% or less 24. The method for producing a microlens array according to claim 23, comprising the above-mentioned crystallized glass.

25. The substrate in the temperature range one 40 to 80 ° C, has a thermal expansion coefficient one 30 dozen ^{50 X 10- 7 / ° C,} 3- quartz solid solution and / or 3- Supojume down method for manufacturing a microphone port lens array according to claim 2 3 or 24 according consisting _{_{L i 2 0-a 1 2}} 0 3 -S i 0 2 based crystallized glass formed by precipitating as a main crystal phase a solid solution.

26. The method according to claim 25, wherein the base material contains an element that absorbs ultraviolet light having a wavelength of 200 to 400 nm.

27. The base material contains one or more elements selected from the group consisting of Ti, Nb, Bi, Pb, Fe, Cr, V, Ce, Au, Ag, and Cu. 27. The method for producing a microlens array according to claim 25 or 26, wherein

28. The substrate is, in mass%, S I_〇 _{_{2 55~75%, A 1 2 0}} 3 14 ~3 5%, L i 2 0 2~ 8%, T i 0 2 + Z r 0 2 0 28. The method for producing a microphone opening lens array according to any one of claims 23 to 27, comprising 7 to 8%.

29. The substrate is, in mass%, S I_〇 _{_{2 55~75%, A 1 2 0}} 3 14 ~35%, L i 2 0 2~8 0/0, T i O 2 + Z r O 2 0. 7~5%, Mg O 0 ~ 4%, Z nO 0~4%, T i O 2 0~4 0/0, Z r O 2 0~4%, S nO 2 0~4%, P ₂ O ₅ 0 to 4%, one of _{^{_{N a 2 0 0~7 0/0}}} , K 2 0 0~7%, B a O 0~ comprising 7% claims 2 3 2 8 3. The method for producing a microlens array according to item 1.

30. The method of manufacturing a microlens array according to any one of claims 23 to 29, wherein the laser is an ultraviolet laser.

31. The method of manufacturing a microlens array according to any one of claims 23 to 30, wherein an output of the laser is 0.5 to 5 W.