WO2004090912A1 - ペースト組成物およびこれを用いた誘電体組成物 - Google Patents
ペースト組成物およびこれを用いた誘電体組成物 Download PDFInfo
- Publication number
- WO2004090912A1 WO2004090912A1 PCT/JP2004/004182 JP2004004182W WO2004090912A1 WO 2004090912 A1 WO2004090912 A1 WO 2004090912A1 JP 2004004182 W JP2004004182 W JP 2004004182W WO 2004090912 A1 WO2004090912 A1 WO 2004090912A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- titanate
- inorganic filler
- average particle
- dielectric
- resin
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 294
- 239000011256 inorganic filler Substances 0.000 claims abstract description 154
- 229910003475 inorganic filler Inorganic materials 0.000 claims abstract description 154
- 239000002245 particle Substances 0.000 claims abstract description 147
- 229920005989 resin Polymers 0.000 claims abstract description 139
- 239000011347 resin Substances 0.000 claims abstract description 139
- 239000002904 solvent Substances 0.000 claims abstract description 83
- 239000000945 filler Substances 0.000 claims abstract description 79
- 238000009835 boiling Methods 0.000 claims abstract description 33
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 claims description 76
- 229910002113 barium titanate Inorganic materials 0.000 claims description 76
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 69
- 239000003822 epoxy resin Substances 0.000 claims description 56
- 229920000647 polyepoxide Polymers 0.000 claims description 56
- 239000003990 capacitor Substances 0.000 claims description 25
- 229910019142 PO4 Inorganic materials 0.000 claims description 16
- 239000010452 phosphate Substances 0.000 claims description 16
- 230000003287 optical effect Effects 0.000 claims description 12
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims description 10
- 239000007787 solid Substances 0.000 claims description 9
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 claims description 9
- 229920001187 thermosetting polymer Polymers 0.000 claims description 8
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 7
- 229910052749 magnesium Inorganic materials 0.000 claims description 7
- 239000011777 magnesium Substances 0.000 claims description 7
- 150000001875 compounds Chemical class 0.000 claims description 6
- ITVXALCWBIYZPP-UHFFFAOYSA-N [Sn].[Ba] Chemical compound [Sn].[Ba] ITVXALCWBIYZPP-UHFFFAOYSA-N 0.000 claims description 5
- IJBYNGRZBZDSDK-UHFFFAOYSA-N barium magnesium Chemical compound [Mg].[Ba] IJBYNGRZBZDSDK-UHFFFAOYSA-N 0.000 claims description 5
- 150000002148 esters Chemical group 0.000 claims description 5
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 claims description 4
- 229910002115 bismuth titanate Inorganic materials 0.000 claims description 4
- 229910052791 calcium Inorganic materials 0.000 claims description 4
- 239000011575 calcium Substances 0.000 claims description 4
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 claims description 4
- NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 claims description 4
- 229910052451 lead zirconate titanate Inorganic materials 0.000 claims description 4
- HFGPZNIAWCZYJU-UHFFFAOYSA-N lead zirconate titanate Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ti+4].[Zr+4].[Pb+2] HFGPZNIAWCZYJU-UHFFFAOYSA-N 0.000 claims description 4
- 239000004408 titanium dioxide Substances 0.000 claims description 4
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 claims description 4
- MYXYKQJHZKYWNS-UHFFFAOYSA-N barium neodymium Chemical compound [Ba][Nd] MYXYKQJHZKYWNS-UHFFFAOYSA-N 0.000 claims description 3
- 229910021523 barium zirconate Inorganic materials 0.000 claims description 3
- DQBAOWPVHRWLJC-UHFFFAOYSA-N barium(2+);dioxido(oxo)zirconium Chemical compound [Ba+2].[O-][Zr]([O-])=O DQBAOWPVHRWLJC-UHFFFAOYSA-N 0.000 claims description 3
- NKTZYSOLHFIEMF-UHFFFAOYSA-N dioxido(dioxo)tungsten;lead(2+) Chemical compound [Pb+2].[O-][W]([O-])(=O)=O NKTZYSOLHFIEMF-UHFFFAOYSA-N 0.000 claims description 3
- HEPLMSKRHVKCAQ-UHFFFAOYSA-N lead nickel Chemical compound [Ni].[Pb] HEPLMSKRHVKCAQ-UHFFFAOYSA-N 0.000 claims description 2
- ZBSCCQXBYNSKPV-UHFFFAOYSA-N oxolead;oxomagnesium;2,4,5-trioxa-1$l^{5},3$l^{5}-diniobabicyclo[1.1.1]pentane 1,3-dioxide Chemical compound [Mg]=O.[Pb]=O.[Pb]=O.[Pb]=O.O1[Nb]2(=O)O[Nb]1(=O)O2 ZBSCCQXBYNSKPV-UHFFFAOYSA-N 0.000 claims description 2
- 229910052779 Neodymium Inorganic materials 0.000 claims 1
- FKSZLDCMQZJMFN-UHFFFAOYSA-N [Mg].[Pb] Chemical compound [Mg].[Pb] FKSZLDCMQZJMFN-UHFFFAOYSA-N 0.000 claims 1
- 125000000686 lactone group Chemical group 0.000 claims 1
- DJZHPOJZOWHJPP-UHFFFAOYSA-N magnesium;dioxido(dioxo)tungsten Chemical compound [Mg+2].[O-][W]([O-])(=O)=O DJZHPOJZOWHJPP-UHFFFAOYSA-N 0.000 claims 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 claims 1
- XIKYYQJBTPYKSG-UHFFFAOYSA-N nickel Chemical compound [Ni].[Ni] XIKYYQJBTPYKSG-UHFFFAOYSA-N 0.000 claims 1
- 238000000034 method Methods 0.000 description 76
- 239000006185 dispersion Substances 0.000 description 70
- 239000000126 substance Substances 0.000 description 47
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 42
- 239000000243 solution Substances 0.000 description 37
- 239000000758 substrate Substances 0.000 description 34
- 239000002253 acid Substances 0.000 description 27
- 239000010408 film Substances 0.000 description 25
- 238000012360 testing method Methods 0.000 description 23
- 230000000052 comparative effect Effects 0.000 description 22
- -1 for example Substances 0.000 description 22
- 239000002270 dispersing agent Substances 0.000 description 20
- 230000015572 biosynthetic process Effects 0.000 description 19
- 239000000463 material Substances 0.000 description 19
- 238000003786 synthesis reaction Methods 0.000 description 18
- 239000011810 insulating material Substances 0.000 description 17
- 239000011229 interlayer Substances 0.000 description 16
- 229910052719 titanium Inorganic materials 0.000 description 16
- 238000001816 cooling Methods 0.000 description 15
- 229920001577 copolymer Polymers 0.000 description 15
- 239000010936 titanium Substances 0.000 description 14
- 238000001723 curing Methods 0.000 description 13
- 230000007423 decrease Effects 0.000 description 12
- 238000005259 measurement Methods 0.000 description 12
- 239000013078 crystal Substances 0.000 description 11
- 238000011049 filling Methods 0.000 description 11
- 239000010410 layer Substances 0.000 description 11
- 239000007788 liquid Substances 0.000 description 11
- 238000002156 mixing Methods 0.000 description 11
- 239000003795 chemical substances by application Substances 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 150000002596 lactones Chemical group 0.000 description 9
- 229910052782 aluminium Inorganic materials 0.000 description 8
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 8
- 239000002131 composite material Substances 0.000 description 8
- HJOVHMDZYOCNQW-UHFFFAOYSA-N isophorone Chemical compound CC1=CC(=O)CC(C)(C)C1 HJOVHMDZYOCNQW-UHFFFAOYSA-N 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 8
- 239000004593 Epoxy Substances 0.000 description 7
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 7
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 6
- 229910052802 copper Inorganic materials 0.000 description 6
- 239000010949 copper Substances 0.000 description 6
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 6
- 238000009826 distribution Methods 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- VGVHNLRUAMRIEW-UHFFFAOYSA-N 4-methylcyclohexan-1-one Chemical compound CC1CCC(=O)CC1 VGVHNLRUAMRIEW-UHFFFAOYSA-N 0.000 description 5
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 5
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 5
- 229910052788 barium Inorganic materials 0.000 description 5
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 description 5
- 230000008859 change Effects 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 239000011800 void material Substances 0.000 description 5
- YNAVUWVOSKDBBP-UHFFFAOYSA-N Morpholine Chemical compound C1COCCN1 YNAVUWVOSKDBBP-UHFFFAOYSA-N 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 230000002776 aggregation Effects 0.000 description 4
- 239000011230 binding agent Substances 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 230000005484 gravity Effects 0.000 description 4
- 238000001027 hydrothermal synthesis Methods 0.000 description 4
- 229920001721 polyimide Polymers 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-L Malonate Chemical compound [O-]C(=O)CC([O-])=O OFOBLEOULBTSOW-UHFFFAOYSA-L 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000004642 Polyimide Substances 0.000 description 3
- 238000003917 TEM image Methods 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- 238000004220 aggregation Methods 0.000 description 3
- 230000004888 barrier function Effects 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- 230000000704 physical effect Effects 0.000 description 3
- QQONPFPTGQHPMA-UHFFFAOYSA-N propylene Natural products CC=C QQONPFPTGQHPMA-UHFFFAOYSA-N 0.000 description 3
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000007711 solidification Methods 0.000 description 3
- 230000008023 solidification Effects 0.000 description 3
- 238000003860 storage Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- MFKRHJVUCZRDTF-UHFFFAOYSA-N 3-methoxy-3-methylbutan-1-ol Chemical compound COC(C)(C)CCO MFKRHJVUCZRDTF-UHFFFAOYSA-N 0.000 description 2
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 2
- 239000005977 Ethylene Substances 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 239000004695 Polyether sulfone Substances 0.000 description 2
- 239000004697 Polyetherimide Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- 238000010521 absorption reaction Methods 0.000 description 2
- 150000001450 anions Chemical class 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 2
- 235000014113 dietary fatty acids Nutrition 0.000 description 2
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N diphenyl Chemical group C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 2
- 238000006073 displacement reaction Methods 0.000 description 2
- 238000001035 drying Methods 0.000 description 2
- 238000010894 electron beam technology Methods 0.000 description 2
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 2
- 239000000194 fatty acid Substances 0.000 description 2
- 229930195729 fatty acid Natural products 0.000 description 2
- 150000004665 fatty acids Chemical class 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- MQWCXKGKQLNYQG-UHFFFAOYSA-N methyl cyclohexan-4-ol Natural products CC1CCC(O)CC1 MQWCXKGKQLNYQG-UHFFFAOYSA-N 0.000 description 2
- 229920006393 polyether sulfone Polymers 0.000 description 2
- 229920001601 polyetherimide Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 238000003980 solgel method Methods 0.000 description 2
- 238000003746 solid phase reaction Methods 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229920005992 thermoplastic resin Polymers 0.000 description 2
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- YQFFHPXGRDVLLR-UHFFFAOYSA-N (2,3,4-triphenylphenyl)phosphane Chemical compound C=1C=CC=CC=1C1=C(C=2C=CC=CC=2)C(P)=CC=C1C1=CC=CC=C1 YQFFHPXGRDVLLR-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- HMUNWXXNJPVALC-UHFFFAOYSA-N 1-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperazin-1-yl]-2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)N1CCN(CC1)C(CN1CC2=C(CC1)NN=N2)=O HMUNWXXNJPVALC-UHFFFAOYSA-N 0.000 description 1
- HYZJCKYKOHLVJF-UHFFFAOYSA-N 1H-benzimidazole Chemical compound C1=CC=C2NC=NC2=C1 HYZJCKYKOHLVJF-UHFFFAOYSA-N 0.000 description 1
- LDXJRKWFNNFDSA-UHFFFAOYSA-N 2-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)-1-[4-[2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidin-5-yl]piperazin-1-yl]ethanone Chemical compound C1CN(CC2=NNN=C21)CC(=O)N3CCN(CC3)C4=CN=C(N=C4)NCC5=CC(=CC=C5)OC(F)(F)F LDXJRKWFNNFDSA-UHFFFAOYSA-N 0.000 description 1
- PTTPXKJBFFKCEK-UHFFFAOYSA-N 2-Methyl-4-heptanone Chemical compound CC(C)CC(=O)CC(C)C PTTPXKJBFFKCEK-UHFFFAOYSA-N 0.000 description 1
- AWFYPPSBLUWMFQ-UHFFFAOYSA-N 2-[5-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]-1,3,4-oxadiazol-2-yl]-1-(1,4,6,7-tetrahydropyrazolo[4,3-c]pyridin-5-yl)ethanone Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1=NN=C(O1)CC(=O)N1CC2=C(CC1)NN=C2 AWFYPPSBLUWMFQ-UHFFFAOYSA-N 0.000 description 1
- JTXMVXSTHSMVQF-UHFFFAOYSA-N 2-acetyloxyethyl acetate Chemical compound CC(=O)OCCOC(C)=O JTXMVXSTHSMVQF-UHFFFAOYSA-N 0.000 description 1
- WOYWLLHHWAMFCB-UHFFFAOYSA-N 2-ethylhexyl acetate Chemical compound CCCCC(CC)COC(C)=O WOYWLLHHWAMFCB-UHFFFAOYSA-N 0.000 description 1
- QMYGFTJCQFEDST-UHFFFAOYSA-N 3-methoxybutyl acetate Chemical compound COC(C)CCOC(C)=O QMYGFTJCQFEDST-UHFFFAOYSA-N 0.000 description 1
- DEXFNLNNUZKHNO-UHFFFAOYSA-N 6-[3-[4-[2-(2,3-dihydro-1H-inden-2-ylamino)pyrimidin-5-yl]piperidin-1-yl]-3-oxopropyl]-3H-1,3-benzoxazol-2-one Chemical compound C1C(CC2=CC=CC=C12)NC1=NC=C(C=N1)C1CCN(CC1)C(CCC1=CC2=C(NC(O2)=O)C=C1)=O DEXFNLNNUZKHNO-UHFFFAOYSA-N 0.000 description 1
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 1
- 241000894006 Bacteria Species 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- 230000005653 Brownian motion process Effects 0.000 description 1
- FJMHICRLSRVAOC-UHFFFAOYSA-N C1(=CC=CC=C1)P(C1=CC=CC=C1)C1=CC=CC=C1.[Ti] Chemical compound C1(=CC=CC=C1)P(C1=CC=CC=C1)C1=CC=CC=C1.[Ti] FJMHICRLSRVAOC-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- 102100025027 E3 ubiquitin-protein ligase TRIM69 Human genes 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- 101000830203 Homo sapiens E3 ubiquitin-protein ligase TRIM69 Proteins 0.000 description 1
- 241000208822 Lactuca Species 0.000 description 1
- 235000003228 Lactuca sativa Nutrition 0.000 description 1
- 229920000106 Liquid crystal polymer Polymers 0.000 description 1
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 1
- AFCARXCZXQIEQB-UHFFFAOYSA-N N-[3-oxo-3-(2,4,6,7-tetrahydrotriazolo[4,5-c]pyridin-5-yl)propyl]-2-[[3-(trifluoromethoxy)phenyl]methylamino]pyrimidine-5-carboxamide Chemical compound O=C(CCNC(=O)C=1C=NC(=NC=1)NCC1=CC(=CC=C1)OC(F)(F)F)N1CC2=C(CC1)NN=N2 AFCARXCZXQIEQB-UHFFFAOYSA-N 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- 239000007983 Tris buffer Substances 0.000 description 1
- 235000018936 Vitellaria paradoxa Nutrition 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- FHKPLLOSJHHKNU-INIZCTEOSA-N [(3S)-3-[8-(1-ethyl-5-methylpyrazol-4-yl)-9-methylpurin-6-yl]oxypyrrolidin-1-yl]-(oxan-4-yl)methanone Chemical compound C(C)N1N=CC(=C1C)C=1N(C2=NC=NC(=C2N=1)O[C@@H]1CN(CC1)C(=O)C1CCOCC1)C FHKPLLOSJHHKNU-INIZCTEOSA-N 0.000 description 1
- CMIYBRHKAKMPBQ-UHFFFAOYSA-N [Ba].[Nb].[Mg] Chemical compound [Ba].[Nb].[Mg] CMIYBRHKAKMPBQ-UHFFFAOYSA-N 0.000 description 1
- LKVOBFOKXFEIKY-UHFFFAOYSA-N acetic acid;2,3-dihydroxypropanoic acid Chemical compound CC(O)=O.OCC(O)C(O)=O LKVOBFOKXFEIKY-UHFFFAOYSA-N 0.000 description 1
- YRKCREAYFQTBPV-UHFFFAOYSA-N acetylacetone Chemical compound CC(=O)CC(C)=O YRKCREAYFQTBPV-UHFFFAOYSA-N 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000003945 anionic surfactant Substances 0.000 description 1
- 239000003963 antioxidant agent Substances 0.000 description 1
- 230000003078 antioxidant effect Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000000498 ball milling Methods 0.000 description 1
- XBYNNYGGLWJASC-UHFFFAOYSA-N barium titanium Chemical compound [Ti].[Ba] XBYNNYGGLWJASC-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 235000010290 biphenyl Nutrition 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 238000005537 brownian motion Methods 0.000 description 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 description 1
- 150000001735 carboxylic acids Chemical class 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003093 cationic surfactant Substances 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 239000013522 chelant Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- XLJMAIOERFSOGZ-UHFFFAOYSA-M cyanate Chemical compound [O-]C#N XLJMAIOERFSOGZ-UHFFFAOYSA-M 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000004807 desolvation Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- ZFTFAPZRGNKQPU-UHFFFAOYSA-N dicarbonic acid Chemical compound OC(=O)OC(O)=O ZFTFAPZRGNKQPU-UHFFFAOYSA-N 0.000 description 1
- CJXLIMFTIKVMQN-UHFFFAOYSA-N dimagnesium;oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[O-2].[Mg+2].[Mg+2].[Ta+5].[Ta+5] CJXLIMFTIKVMQN-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- KPUWHANPEXNPJT-UHFFFAOYSA-N disiloxane Chemical class [SiH3]O[SiH3] KPUWHANPEXNPJT-UHFFFAOYSA-N 0.000 description 1
- 239000003814 drug Substances 0.000 description 1
- 229940079593 drug Drugs 0.000 description 1
- 238000002296 dynamic light scattering Methods 0.000 description 1
- 238000010292 electrical insulation Methods 0.000 description 1
- 238000002338 electrophoretic light scattering Methods 0.000 description 1
- 238000000921 elemental analysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 229940116333 ethyl lactate Drugs 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 210000004709 eyebrow Anatomy 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- 238000013007 heat curing Methods 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 229910052809 inorganic oxide Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 229940035429 isobutyl alcohol Drugs 0.000 description 1
- KQNPFQTWMSNSAP-UHFFFAOYSA-N isobutyric acid Chemical compound CC(C)C(O)=O KQNPFQTWMSNSAP-UHFFFAOYSA-N 0.000 description 1
- 230000033001 locomotion Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 1
- 229910052753 mercury Inorganic materials 0.000 description 1
- AUHZEENZYGFFBQ-UHFFFAOYSA-N mesitylene Substances CC1=CC(C)=CC(C)=C1 AUHZEENZYGFFBQ-UHFFFAOYSA-N 0.000 description 1
- 125000001827 mesitylenyl group Chemical group [H]C1=C(C(*)=C(C([H])=C1C([H])([H])[H])C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N methyl acetate Chemical compound COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- 239000004570 mortar (masonry) Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002736 nonionic surfactant Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000011368 organic material Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 229920001568 phenolic resin Polymers 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 150000003014 phosphoric acid esters Chemical class 0.000 description 1
- 239000004014 plasticizer Substances 0.000 description 1
- QVLTXCYWHPZMCA-UHFFFAOYSA-N po4-po4 Chemical group OP(O)(O)=O.OP(O)(O)=O QVLTXCYWHPZMCA-UHFFFAOYSA-N 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920005672 polyolefin resin Polymers 0.000 description 1
- 229920001955 polyphenylene ether Polymers 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000011164 primary particle Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 108090000765 processed proteins & peptides Proteins 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- RLUCXJBHKHIDSP-UHFFFAOYSA-N propane-1,2-diol;propanoic acid Chemical compound CCC(O)=O.CC(O)CO RLUCXJBHKHIDSP-UHFFFAOYSA-N 0.000 description 1
- RUOJZAUFBMNUDX-UHFFFAOYSA-N propylene carbonate Chemical compound CC1COC(=O)O1 RUOJZAUFBMNUDX-UHFFFAOYSA-N 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 239000011163 secondary particle Substances 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 235000015170 shellfish Nutrition 0.000 description 1
- 230000008054 signal transmission Effects 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 238000000235 small-angle X-ray scattering Methods 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 239000011877 solvent mixture Substances 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 1
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- UBOXGVDOUJQMTN-UHFFFAOYSA-N trichloroethylene Natural products ClCC(Cl)Cl UBOXGVDOUJQMTN-UHFFFAOYSA-N 0.000 description 1
- 238000001132 ultrasonic dispersion Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 239000000080 wetting agent Substances 0.000 description 1
- 239000002023 wood Substances 0.000 description 1
- 229920001221 xylan Polymers 0.000 description 1
- 150000004823 xylans Chemical group 0.000 description 1
- RPEUFVJJAJYJSS-UHFFFAOYSA-N zinc;oxido(dioxo)niobium Chemical compound [Zn+2].[O-][Nb](=O)=O.[O-][Nb](=O)=O RPEUFVJJAJYJSS-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/02—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of inorganic substances
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
- H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
- H01B3/40—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes epoxy resins
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
- H01B3/002—Inhomogeneous material in general
- H01B3/006—Other inhomogeneous material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/10—Metal-oxide dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/06—Solid dielectrics
- H01G4/08—Inorganic dielectrics
- H01G4/12—Ceramic dielectrics
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G4/00—Fixed capacitors; Processes of their manufacture
- H01G4/002—Details
- H01G4/018—Dielectrics
- H01G4/20—Dielectrics using combinations of dielectrics from more than one of groups H01G4/02 - H01G4/06
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor
- H05K1/162—Printed circuits incorporating printed electric components, e.g. printed resistor, capacitor, inductor incorporating printed capacitors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/02—Fillers; Particles; Fibers; Reinforcement materials
- H05K2201/0203—Fillers and particles
- H05K2201/0206—Materials
- H05K2201/0209—Inorganic, non-metallic particles
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/31504—Composite [nonstructural laminate]
- Y10T428/31511—Of epoxy ether
Definitions
- the present invention relates to a dielectric composition exhibiting suitable characteristics as an interlayer insulating material for circuit materials having a function as a capacitor and an optical wiring material.
- a method of disposing a capacitor on a printed wiring board there is a method of disposing an external capacitor such as a chip capacitor on the printed wiring board.
- an inorganic filler to the inner layer of the printed wiring board so that the printed wiring board itself has a capacitor function, and a composite of inorganic filler and resin is used as an interlayer insulating material.
- the methods to be used JP-A-5-57852, JP-A-6-85413) are known.
- the relative dielectric constant of the composite obtained by the above method was as low as about ⁇ 0 to 20.
- the relative dielectric constant can be increased by increasing the amount of the inorganic filler.
- the content of the inorganic filler exceeds 50% by volume, the content of the inorganic filler is reduced.
- the relative permittivity did not increase even if it was increased.
- a large amount of a high dielectric constant inorganic filler is mixed with a resin, the resin becomes highly viscous, so that a large amount of a solvent is usually required.
- a filler having at least two kinds of particle diameters is added.
- 'A method of increasing the relative dielectric constant by increasing the filling rate of the filler Japanese Patent Laid-Open No. 53-8819
- Japanese Patent Application Laid-Open No. 2000-2313366 are known.
- the filler used in these fillers has a maximum average particle diameter of 5 m or more, which is as large as 5 m. It had to be as thick as about 0 im.
- the dielectric constant of the filter depends on the crystal structure of the filter.
- an inorganic crystal as seen in titanium titanate, the displacement of the center of gravity between anions and cations causes a large dielectric constant.
- the crystal particle size generally decreases, the surface energy of the particles increases, and the symmetry of the crystal structure increases to reduce the energy of the entire system. Become.
- the dielectric constant can be increased by using a filter having a large particle diameter.
- barium titanate For example, an example in which barium titanate having an average particle size of 15 cm is used as a filler, and ethyl carbitol (boiling point: 202 ° C.) (Japanese Patent Laid-Open Publication No. Hei 8-229334) is disclosed. is there.
- the filler has a large particle size and a small specific surface area of the filler, even if a solvent having a high boiling point is used, solvent removal during heating proceeds at a relatively low temperature in a short time. Then, desolvation occurs at a speed faster than the movement of the resin-filler due to the shrinkage of the entire system, so that many voids are generated.
- the generation of voids causes a decrease in dielectric constant. If a filler having a large average particle diameter is used, the dielectric constant of the filler itself is increased, but even if a high boiling solvent is used, the generation of voids cannot be suppressed as described above, and as a result, the dielectric constant is 52 And a large value could not be obtained.
- a filler having a large average particle size of 15 xm is used (Japanese Patent Application Laid-Open No. Hei 8-229334). Therefore, the film thickness must be as large as 25 m, and thus the capacitance density is as small as 1.8 ⁇ FZ cm 2 .
- the capacitance of the capacitor is inversely proportional to the thickness of the interlayer insulating material, it is preferable to reduce the thickness of the interlayer insulating material from the viewpoint of increasing the capacitance of the capacitor.
- An important basic property required for an interlayer insulating material is a low linear expansion coefficient.
- the coefficient of linear expansion of the resin itself is 50 ppm / ° C or more, which is much larger than the linear thermal expansion coefficient (17 ppm Z ° C) of the metal used as the wiring layer, for example, copper. Therefore, when an interlayer insulating material composed of only a resin is used, defects such as delamination due to stress and wiring tearing occur due to a difference in linear expansion coefficient from the wiring layer. On the other hand, if a resin is compounded with an inorganic filler, the coefficient of linear expansion can be reduced.
- the line of the wiring layer cannot be reduced. It is possible to approach the value of the expansion coefficient ⁇ :.
- the inorganic filler cannot be filled sufficiently high, and it cannot be reduced to a value close to the linear expansion coefficient of the wiring layer. Disclosure of the invention
- an object of the present invention is to obtain a high dielectric composition having a low coefficient of linear expansion, and furthermore, it is sufficient as an inter-layer insulating material for a large capacitance capacitor incorporated in a high-density SIP.
- a dielectric composition and an optical wiring material which have achieved a thinner structure. That is, the present invention relates to a paste composition comprising an inorganic filler, a resin, and a solvent having a boiling point of 160 ° C or more, wherein the solvent has a boiling point of 16.0 ° C or more.
- Another aspect of the present invention is a dielectric composition having an inorganic filler and a resin, wherein the inorganic filler has at least two kinds of average particle diameters, and Is 0.1 to 5 tm, and the maximum average particle diameter is at least three times the minimum average particle diameter.
- a dielectric composition having a relative dielectric constant as high as 50 or more can be easily obtained. Furthermore, since the composition of the present invention has a low coefficient of linear expansion almost similar to the coefficient of linear expansion of the wiring metal, when used as an interlayer insulating material, there are problems such as peeling off from the wiring layer and breaking of the wiring. Is less likely to occur and a highly reliable capacitor can be obtained. Further, a thin film having a uniform thickness and uniform physical properties can be easily obtained. Since this is suitable for a large capacitance, it is useful as an interlayer insulating material for a circuit board material having a function as a capacitor embedded in a high-density SIP. BEST MODE FOR CARRYING OUT THE INVENTION
- the paste composition of the present invention comprises an inorganic filler, a resin, and a solvent.
- the paste composition has an inorganic filler having an average particle size of 5 m or less, and the solvent has a boiling point of 160 ° C. or more.
- the present invention is a dielectric composition having an inorganic filler and a resin, comprising at least two types of inorganic fillers having an average particle diameter, and among these, the average particle diameter of the inorganic filler having the largest average particle diameter is 0.1 to 5 m, wherein the maximum average particle diameter is at least three times the minimum average particle diameter.
- the total amount of the solvent in the paste composition of the present invention is 25% by weight of the total amount of the paste composition. It must be: It is preferably at most 20% by weight, more preferably at most 10% by weight. Further, it is preferably at least 1% by weight.
- the amount of the solvent is 25% by weight or less, generation of voids due to evaporation of the solvent during drying is suppressed, and the specific dielectric constant of the dielectric composition can be increased. Also, since the amount of voids that can cause moisture absorption is small, changes in physical properties due to the effects of humidity and moisture can be reduced. Furthermore, it has excellent storage durability.
- the amount of the solvent is more than 25% by weight (and the voids increase in the drying step and the thermosetting step for removing the solvent, and the relative dielectric constant of the dielectric composition often decreases. If the amount is less than the above, the amount of the solvent is small, and the viscosity and uniformity of the paste composition are impaired.
- the effect of the amount of the solvent increases as the filling rate of the inorganic filler increases.
- the inorganic filler is 85% by weight or more of the solid content of the paste composition, the effect of the present invention is reduced. Especially large.
- At least one of the solvents used in the present invention must have a boiling point of 160 ° C. or higher. It is preferably at least 180 ° C, more preferably at least 200 ° C.
- the boiling point of the solvent is 160 ° C. or higher, the generation of voids is suppressed, and the dielectric constant of the dielectric composition can be increased. If the boiling point is lower than 160 ° C, the solvent volatilization rate is high, so that the density cannot be kept up by the mass transfer during heat treatment, the voids increase, and the relative dielectric constant of the heat sink composition decreases. More things.
- the solvent used in the present invention preferably has a boiling point of 300 ° C. or lower, more preferably 280 ° C. or lower.
- the solvent used in the paste composition of the present invention may be only one solvent having a boiling point of 160 ° C or higher, but other solvents may be used as long as the solvent contains a solvent having a boiling point of 160 ° C or higher. May be included.
- Solvents with a boiling point of 160 ° C or more include mesitylene, acetoacetone, methylcyclohexanone, diisobutyl ketone, methyl phenyl ketone, dimethyl sulfoxide, carboxylactone, isophorone, getylformamide, and dimethyl.
- a solvent having an ester structure is preferably used, and a solvent having a lactone structure is more preferable.
- the most preferred solvent is abutyrolactone.
- the boiling point referred to in the present invention 1 atm, i.e. 1.
- the boiling point is measured by using a known technique; it can be measured by using, for example, but not limited to, a boiling point meter of Swietoslawski.
- Solvents include, for example, methylacetosolve, N, N-dimethylformamide, methylethylketone, dioxane, acetone, cyclohexanone, cyclopenone, isobutyl alcohol, isopropyl alcohol, tetrahydrofuran , Toluene, benzene, trichloroethylene, benzyl alcohol, methoxymethyl butanol, ethyl lactate, propylene dalycol monomethyl ether and acetate thereof, and organics containing at least one of these. Solvent mixtures are preferably used.
- Examples of the shape of the inorganic filler include a spherical shape, a substantially spherical shape, an elliptical spherical shape, a needle shape, a plate shape, a scale shape, a rod shape, and the like.
- a spherical shape or a substantially spherical shape is preferable. This is because a spherical or substantially spherical filler has the smallest specific surface area, so that it does not easily cause agglomeration of the filler or a decrease in resin fluidity during filling.
- One of these can be used alone, or two or more can be used in combination.
- An organic resin generally used as an interlayer insulating material has a linear expansion coefficient of, for example, 30 to 50 ppm Z ° C for polyimide and 50 ppm, ° C or more for epoxy resin. This is very large compared to the linear expansion coefficient of wiring metal, for example, copper, 17 ppm Z ° C, but it can be reduced by mixing inorganic filler. It becomes possible.
- the relative permittivity of the dielectric composition follows a formula for deriving the relative permittivity of the composite, that is, a so-called logarithmic mixing rule (1) described below.
- a formula for deriving the relative permittivity of the composite that is, a so-called logarithmic mixing rule (1) described below.
- the higher the content of the inorganic filler having a high dielectric constant the higher the relative dielectric constant of the obtained dielectric composition.
- V volume fraction of each component of the complex
- the resin In order to allow the resin to contain the inorganic filler at a high filling ratio, it is preferable to use a mixture of two or more kinds having different average particle sizes.
- a filler having a single particle size is filled, particularly when the filler is spherical or substantially spherical, filling at a high density results in a diamond-shaped void between the fillers.
- no other filers can invade.
- the filler has a size smaller than the gap, the filler can further enter the gap, and the filling rate can be easily improved.
- the difference ratio between the average particle diameter of the inorganic filler having the maximum average particle diameter and the average particle diameter of the inorganic filler having the minimum average particle diameter is preferably as large as possible.
- the diameter is preferably at least three times, more preferably at least five times the minimum average particle size. If the difference ratio is small, it is difficult for small fillers to efficiently enter the gap between the large fillers. On the other hand, if the difference ratio is large, the difference is small.
- the filler tends to aggregate, and the dispersion stability is reduced. It is preferably 30 times or less, and more preferably 0 times or less.
- the total volume Va of the inorganic filler having the largest average particle size and the total volume V of the inorganic filler having the smallest average particle size are 0 0 5 ⁇ V b / (V a + V b) ⁇ 0.5 Is preferred. That is, the amount of the small filler is preferably 5% or more and less than 50% of the total amount of the filler by volume ratio. If it is less than 5%, the effect of penetrating into the voids to increase the filling amount is hardly obtained, and if it is more than 50%, the volume occupied by the filler smaller than the void created by the large filler becomes large. The effect of increasing the filling amount by interpenetrating is small.
- fillers of other particle sizes may be mixed, and even if three or more types are used, the effect of improving the filling rate by mixing the fillers by appropriately selecting the particle size and the mixing ratio is considered. Is obtained.
- the inorganic filler used in the present invention contains at least two kinds of inorganic fillers having different average particle diameters, and among them, the average particle diameter of the inorganic filler having the largest average particle diameter is preferably 5 im or less. More preferably, it is 2 Atm or less, and further preferably, 1 Atm or less. Further, it is at least 0.1 m, more preferably at least 0.2 ⁇ m, further preferably at least 0.3 tm.
- the filler is likely to protrude into the film door. Therefore, it is difficult to obtain stable dielectric properties.
- the filler of the filler monodispersed liquid is unlikely to settle.
- the filler having the largest average particle diameter is less than 1 ⁇ m, the filler is less likely to settle during long-term storage, and storage conditions may not be limited.
- the maximum average particle size is smaller than 0.1 tm, the symmetry of the crystal structure is reduced due to the large specific surface area of those fillers. It tends to be high and it is difficult to obtain a high dielectric constant phase, which causes a decrease in the relative dielectric constant of the dielectric composition.
- the average particle diameter of the inorganic filler having the maximum average particle diameter is 0.3 / m or more, the average particle diameter of the inorganic filler having the maximum average particle diameter and the average particle diameter of the inorganic filler having the minimum average particle diameter are determined. Since the difference between the average particle sizes can be made sufficiently large, the packing ratio is not affected.
- the average particle size of the inorganic filler having the minimum average particle size is preferably from 0.01 to 0.1 iim.
- the inorganic filler having the minimum average particle size is appropriately selected from the above range according to the maximum average particle size.
- the filling rate can be increased by increasing the difference ratio between the average particle diameter of the inorganic filler having the minimum average particle diameter and the average particle diameter of the inorganic filler having the maximum average particle diameter.
- the average particle size of the inorganic filler having the smallest average particle size is preferably 0.1 ⁇ or less, considering the preferred range of the average particle size of the inorganic filler having the largest average particle size. Preferably, it is 0.06 ⁇ m or less.
- the average particle diameter of the inorganic filler having the minimum average particle diameter is 0.04 tm or more, reagglomeration after dispersion is unlikely to occur, and the paste has good dispersion stability. Further, when the average particle diameter of the inorganic filler having the minimum average particle diameter is more than 0.01 tm, it is difficult for the fillers to be secondary-agglomerated, so that the aggregates are easily broken and dispersed.
- the measurement of the average particle size contained in the paste composition and the dielectric composition of the present invention is performed by forming a dielectric composition thin film, and measuring an ultrathin section obtained by cutting a film cross section in the thickness direction of the thin film. It can be measured by XMA measurement and transmission electron microscope (TEM) observation. Since the transmittance of the inorganic filler and the resin with respect to the electron beam are different, the inorganic filler and the resin can be identified by the difference in contrast in the TEM observation image. When multiple types of inorganic fillers are used, each inorganic filler can be identified by performing elemental analysis based on XMA measurement and crystal structure analysis by electron beam diffraction image observation.
- TEM transmission electron microscope
- the distribution of the area of the filler and the resin obtained in this manner is obtained by image analysis, and the particle diameter can be calculated from the area by approximating the cross section of the inorganic filler to a circle.
- the evaluation of the particle size may be performed on TEM images at magnifications of 5,000 and 4,000.
- the calculated particle size distribution is a histogram in 0.1 m increments in a TEM image with a magnification of 500 ⁇ , and a 0.01 m increment in a TEM image with a magnification of 400 ⁇ .
- the median value of the class with the maximum frequency is the average particle size.
- "having at least two kinds of average particle sizes” means that two or more of these maximum values exist, and the inorganic filler contained in the composition Is that there are two or more maximum values in the particle size distribution.
- a scanning electron microscope (SEM) may be used instead of the TEM in the above method.
- the dielectric properties of the inorganic filler those having a specific dielectric constant of 50 to 300 are preferably used. If an inorganic filler having a relative permittivity of less than 50 is used, a dielectric composition having a sufficiently high relative permittivity cannot be obtained. Further, when the relative dielectric constant exceeds 300000, the temperature characteristic of the relative dielectric constant tends to deteriorate, which is not preferable.
- the relative dielectric constant of the inorganic filler as used herein refers to the relative dielectric constant of a sintered body obtained by heating and firing the inorganic filler as a raw material powder. The relative permittivity of the sintered body is measured, for example, by the following procedure.
- An inorganic filler is mixed with a binder resin such as polyvinyl alcohol, an organic solvent or water to prepare a paste-like composition, which is then filled in a pellet molding machine, dried and pelletized. Get things. By firing the pellet-like solid at, for example, about 900 to 1200 ° C., the binder resin is decomposed and removed, the inorganic filler is sintered, and the sintering composed only of the inorganic component is performed. You can get the body. At this time, the porosity of the sintered body must be sufficiently small, and the porosity calculated from the theoretical density and the measured density must be 1% or less. Upper and lower electrodes are formed on this pellet, and the relative permittivity is calculated from the measurement results of the capacitance and dimensions.
- a binder resin such as polyvinyl alcohol, an organic solvent or water
- Inorganic fillers include barium titanate, barium zirconate titanate, strontium titanate, calcium titanate, bismuth titanate, magnesium titanate, barium neodymium titanate, and titanate.
- Barium titanate is a solid solution based on barium titanate, in which some elements in barium titanate crystal are replaced with other elements or other elements penetrate into the crystal structure. It is a generic name including. Other zirconium titanate, strontium titanate, calcium titanate, bismuth titanate, magnesium titanate, barium neodymium titanate, barium tin titanate, barium tin titanate, niobium magnesium Barium acid, Barium magnesium tantalate, Lead titanate, Lead zirconate, Lead zirconate titanate, Lead niobate, Lead magnesium niobate, Lead nickel niobate, Tungstate The same applies to lead-based, calcium tungstate-based, lead magnesium tandastate-based, and titanium dioxide-based systems, and is a generic term that includes solid solutions based on each.
- a filler having a belovskite-type crystal structure or a composite perovskite-type crystal structure it is preferable to use.
- One of these can be used alone, or two or more can be used as a mixture.However, it is better that at least two inorganic fillers having different average particle diameters have the same chemical composition. It is preferable from the point of view.
- a compound mainly composed of barium titanate it is preferable to use a compound mainly composed of barium titanate from the viewpoint of compatibility with commercial convenience.
- a small amount of a shifter, a depressurizing agent or the like may be used.
- Methods for producing the inorganic filler include solid-phase reaction, hydrothermal synthesis, supercritical hydrothermal synthesis, sol-gel method, and oxalate method.
- a method for producing an inorganic filler having the largest average particle size it is preferable to use a solid-phase reaction method or an oxalate method from the viewpoint of high relative dielectric constant and quality stability.
- any of the hydrothermal synthesis method, the supercritical hydrothermal synthesis method, and the sol-gel method can be used because it is easy to reduce the particle size. I like it.
- the ratio Vf of the inorganic filler to the total volume of the total volume of the inorganic filler and the total volume of the resin solid content should be 50% or more and 95% or less. More preferably, it is 70% or more and 90% or less.
- the inorganic filler content Vf is 50% or more, a sufficiently large relative dielectric constant is obtained, and a small coefficient of thermal expansion is obtained.
- the inorganic filler content Vf is 70% or more, the effect of using inorganic fillers having at least two kinds of average particle diameters becomes remarkable, and a large relative dielectric constant is obtained.
- the inorganic filler content Vf is 95% or less
- the generation of voids inside the composition can be suppressed, a sufficiently large relative dielectric constant can be obtained, the moisture absorption rate due to the voids is small, and the physical properties are low. But not easily affected by moisture or humidity.
- the non-filamentary film content Vf is 90% or less, the adhesiveness after PCT (pressure cooker test), which is a durability promotion test, does not easily decrease.
- thermoplastic resin either a thermoplastic resin or a thermosetting resin can be selected.
- thermoplastic resin for example, polyphenylene ether, polyphenylene sulfide, polyether sulfone, polyether imide, liquid crystal polymer, polystyrene, polyethylene, fluorine resin and the like can be used.
- Thermosetting resins include, for example, epoxy resins, phenolic resins, siloxane resins, polyimides, acrylic resins, cyanate resins, and benzocyclobutene resins.
- the resin used can be used. It is preferable to use a thermosetting resin in terms of solder heat resistance and the like, and in particular, an epoxy resin is preferably used in terms of thermosetting shrinkage and viscosity.
- the epoxy resin is a resin having a prepolymer containing two or more epoxy groups (a xylan ring) in a molecular structure. It is preferable that the prepolymer has a biphenyl skeleton or a dicyclopentene skeleton from the viewpoint of dielectric properties.
- the composition may have a curing agent.
- a curing agent such as a phenol novolak resin, a bisphenol A-type novolak resin, an aminotriazine compound, or a naphthol compound can be used.
- a curing accelerator such as a metal chelate compound such as a vault.
- the paste composition of the present invention is obtained by dispersing an inorganic filler in a resin.
- a method of adding and dispersing an inorganic filler to a resin solution and mixing or dispersing, or a let-down method of preparing a dispersion in which the inorganic filler is dispersed in an appropriate solvent in advance and mixing the dispersion and the resin solution are used. It is made.
- the method for dispersing the inorganic filler in the resin or the solvent is not particularly limited, and for example, a method such as ultrasonic dispersion, a ball mill, a roll mill, a clear mix, a homogenizer, and a media disperser can be used. It is preferable to use a ball mill and a homogenizer from the viewpoint of dispersibility. ,
- dispersing the inorganic filler for example, surface treatment of the inorganic filler, addition of a dispersant, addition of a surfactant, addition of a solvent, etc. may be performed to improve dispersibility.
- the surface treatment of the inorganic filler include treatment with various coupling agents such as silane, titanium, and aluminum, fatty acids, phosphate esters, and the like, as well as rosin treatment, acid treatment, and basic treatment.
- the addition of the dispersant include dispersants having an acid group such as phosphoric acid, carboxylic acid, fatty acid, and esters thereof, and in particular, compounds having a phosphate ester skeleton are preferably used.
- the paste composition may contain a stabilizer, a dispersant, an anti-settling agent, a plasticizer, an antioxidant, and the like, if necessary.
- the content of the inorganic filler in the solid content contained in the paste composition of the present invention is preferably 85% by weight or more and 99% by weight or less, preferably 90% by weight or more, More preferably, it is 94% by weight or more.
- the relative dielectric constant of the composition can be easily increased.
- the present invention as the content of the inorganic filler is increased, a dielectric composition having a high relative dielectric constant can be obtained.
- the content becomes 99% by weight or less the composition at the time of film formation is reduced. The shape is easy, and the dispersion of the machine filler is easy to control.
- the solid content refers to a combination of an inorganic filler, a resin, and other additives.
- the dielectric composition of the present invention is a dielectric composition containing an inorganic filler and a hold, wherein the amount of the inorganic filler is 85 to 99% by weight of the total amount of solids contained in the dielectric composition. % And the porosity is 30% by volume or less.
- a method for obtaining the dielectric composition of the present invention for example, first, a paste composition in which an inorganic filler is mixed with a resin is prepared, and the paste composition is applied to an adherend (for example, a substrate). Then, a method of obtaining a dielectric composition by performing solvent removal and solidification can be given. At this time, as a method of solidification, solidification by heat, light or the like can be mentioned. However, since the dielectric composition of the present invention is not a sintered body, it is not necessary to completely decompose and remove the resin. C is preferred.
- the porosity of the dielectric composition must be 30% by volume or less, preferably 20% by volume or less, and more preferably 10% by volume or less.
- the porosity is more than 30% by volume, the ratio of the inorganic filler in the film volume is low, and it is difficult to obtain an i-electrode composition having a dielectric constant of 50 or more.
- insulation resistance, leak current increases, and bending strength decreases.
- the method for reducing the porosity to 30% by volume or less can be achieved, for example, by appropriately selecting the inorganic filler, resin, and solvent from those described above. It can be easily achieved by including at least one solvent having a temperature of 160 ° C. or more and having a total volume of 25% or less of the total amount of the paste composition.
- the porosity in order to reduce the porosity to 20% by volume or less, if the paste composition contains at least one solvent having a lactone structure, the porosity should be 20% by volume or less. Can be. Among solvents having a lactone structure, carboxylactone is most preferred.
- the method of measuring the porosity of the dielectric composition can be appropriately selected according to the application, such as a gas adsorption method, a mercury intrusion method, a positron annihilation method, and a small angle X-ray scattering method. From the density of the body composition, 'The porosity is calculated by the following procedures (1) to (3). Confuse.
- the paste composition of the present invention is preferably applied onto an adherend (for example, a substrate), and is solvent-removed and solidified to form a dielectric composition.
- the method for applying the paste composition on the adherend is not particularly limited, and examples thereof include a spinner, screen printing, a blade coater, and a die coater.
- the dielectric composition can be easily obtained by removing the solvent and heat-curing the coated film using a heating device such as a hot plate or an oven.
- the adherend to which the paste composition is applied can be selected from, for example, an organic substrate, an inorganic substrate, or a substrate on which a circuit material is disposed.
- organic substrates include glass-based copper-clad laminates such as glass cloth and epoxy copper-clad laminates; composite copper-clad laminates such as glass nonwoven fabric and epoxy copper-clad laminates; polyetherimide resin substrates;
- flexible substrates such as heat-resistant, thermoplastic substrates such as polyolefin resin substrates and polysulfone resin substrates, polyester copper-clad film substrates, and polyimide copper-clad film substrates.
- the inorganic substrate examples include a ceramic substrate such as an alumina substrate, an aluminum oxide substrate, and a silicon carbide substrate, and a metal substrate such as an aluminum base substrate and an iron base substrate.
- circuit constituent materials include a conductor containing a metal such as silver, gold, and copper; a resistor containing an inorganic oxide; a glass-based material; Examples thereof include a low dielectric substance containing a resin or the like, a high dielectric substance containing a resin or an inorganic filler, and an insulator containing a glass-based material.
- the form of the dielectric composition of the present invention is not particularly limited, and can be selected according to the application such as a film shape, a rod shape, and a spherical shape, but the film shape is particularly preferable.
- the film includes films, sheets, plates, pellets, and the like.
- the film thickness can be arbitrarily set within a range where the capacitance satisfies a desired value, but is preferably 0.5 ⁇ m or more and 20 m or less. . More preferably, it is 2 m or more and 20 ⁇ m or less. It is preferable that the film thickness is small in order to secure a large capacitance as a capacitor. However, if the thickness is smaller than 0.5 m, pinholes and the like are liable to occur, and it becomes difficult to obtain electrical insulation. When the pressure is 2 Atm or more, the dielectric loss tangent does not easily increase after the PCT (pressure reduction test), which is a durability promotion test. On the other hand, if the film thickness exceeds 20 m, a large relative dielectric constant is required to obtain sufficient capacitor performance, and it may be difficult to improve the mounting density.
- the applications of the paste composition and the dielectric composition of the present invention are not particularly limited.
- the paste composition and the dielectric composition are used as a high dielectric constant layer for an interlayer insulating material for a built-in capacitor of a printed wiring board. It can be applied to various electronic components and devices such as frequency filters, wireless antennas, electromagnetic shields, and optical wiring materials.
- the dielectric composition of the present invention is preferably used as an interlayer insulating material for a capacitor.
- the method for forming the interlayer insulating material for a capacitor using the dielectric composition is not particularly limited. For example, as described above, it can be obtained by forming a high dielectric substance on a substrate and then forming an appropriate electrode.
- the capacitance of the area between the eyebrows insulating material for a capacitor manufactured using the dielectric composition of the present invention is preferably 5 nF / cm 2 or more. More preferably, it is preferably in the range of 10 nFZ cm 2 or more.
- the 5 n 'F / cm 2 Yori small capacitance is used as a decoupling capacity sheet evening In such a case, the power supply system of the entire system cannot be sufficiently separated from the power supply system, and cannot function sufficiently as a decoupling capacitor.
- the temperature change is as small as possible.
- the in-plane variation of the capacitance is preferably 5% or less with respect to the average value (the average value of the capacitance: 1% ⁇ the capacitance ⁇ the average value of the capacitance + 5%).
- the dielectric loss tangent of the capacitor is preferably in the range of 0.01% to 5%, and more preferably in the range of 0.01% to 1%.
- electrical characteristics such as capacitance and dielectric loss tangent are measured values at a frequency of 20 k to 1 GHz.
- the dielectric composition of the present invention can be preferably used also as an optical wiring material.
- Optical wiring refers to wiring that uses optical signals to transmit signals between LSIs, modules, boards, etc., instead of using ordinary electrical signals.
- an optical wiring is formed on or in a mounting substrate, a structure in which a layer having a high refractive index is sandwiched between layers having a refractive index. It is also possible to substitute a layer with a low rate of contact with space.
- an inorganic filler that is sufficiently smaller than the wavelength of the light to reduce scattering of light for signal transmission guided in the optical wiring. It is preferable that the particle size is 1/4 or less of the above.
- the refractive index, the temperature dependency of the refractive index, and the coefficient of thermal expansion can be controlled by selecting the inorganic filler material, the content, and the resin material. This allows a wide range of choices for the substrate material for forming the optical wiring layer, and uses not only conventionally used materials made of inorganic materials such as silicon and ceramics, but also substrates made of organic materials. It becomes possible.
- Example 1 Barium titanate film (manufactured by Sakai Chemical Co., Ltd., BT-05, average particle size: 0.
- Dispersion A-1 Dispersion A-1.
- Epoxy resin manufactured by Nippon Kayaku Co., Ltd., EPPN 502 H
- phenol novolak resin manufactured by Dai Nippon Ink Industries, Ltd., TD—2 13
- curing accelerator 0.6 parts by weight of triphenylphosphine (manufactured by Hokko Chemical Co., Ltd.) and 20 parts by weight of carboxylactone were mixed to obtain an epoxy resin solution B-1.
- the dispersion A-1 and the epoxy resin solution B-1 were mixed using a ball mill to prepare a paste composition C-1.
- the boiling point of T-butyrolactone is 204 ° C.
- This paste composition C-11 was applied on a 300-m-thick aluminum substrate using Daiko All-In-One, dried in an oven at 80 ° C for 15 minutes, and then dried. The composition was cured at 5 ° C for 1 hour to obtain a high dielectric composition having a film thickness of about 0 tm.
- a paste composition C-11 was prepared in the same manner as in Example 1. Next, 22.6 parts by weight of lactone was added to prepare a paste composition C-2 such that the amount of the solvent in the paste composition was 15% by weight.
- Table 1 shows the results of preparing a high dielectric composition based on the method of Example 1 and evaluating the dielectric properties. The relative dielectric constant of the high dielectric composition was 73, the dielectric loss tangent was 3.4%, and the capacitance per area was 4.3 nF / cm 2 . The porosity was 12% by volume.
- Pastylolactone is further added to the paste composition C-11, and the paste compositions C13 to C3 having different solvent amounts are adjusted so that the solvent amount in the paste composition becomes 20 or 25% by weight.
- Table 1 shows the results of preparing a high dielectric composition based on the method of Example 1 and evaluating the dielectric properties. A high dielectric composition having a porosity of 20% by volume or less and a relative dielectric constant of 50 or more was obtained. Comparative Example 1
- the ester paste was added to the paste composition C-1 to prepare a paste composition D-1 in which the amount of the solvent in the paste composition was 40% by weight.
- Table 4 shows the results of preparing a high dielectric composition based on the method of Example 1 and evaluating the dielectric properties. When the amount of the solvent contained in the paste composition was 40% by weight of the total amount, the porosity was 31% by volume and the relative dielectric constant was 4%.
- ⁇ -butyrolactone was added to prepare a paste composition C-16 in which the amount of the solvent in the paste composition was 15% by weight. Further, based on the method of Example 1, a high dielectric composition was prepared, and the results of evaluating the dielectric properties are shown in Table 1. The relative dielectric constant was 95, the dielectric loss tangent was 3.1%, the capacitance per area was 8.4 nFZ cm 2 , and the porosity was 7% by volume.
- a paste composition was prepared in the same manner as paste composition C-2 except that the solvent was N-methyl-2-pyrrolidone, and paste composition C-17 was prepared.
- the boiling point of N-methyl 2-pyrrolidone is 202 ° C.
- a high dielectric composition was produced, and the results of evaluating the dielectric properties are shown in Table 1.
- the relative dielectric constant was 58, the dielectric loss tangent was 4.6%, the capacitance per area was 5.3 nF / cm 2 , and the porosity was 26% by volume.
- Example 8 A paste composition was prepared in the same manner as the paste composition C-12 except that the solvent was ethylene dalicol diacetate, and a paste composition C-18 was prepared.
- the boiling point of ethyl blendy dicarbonate is 190 ° C.
- a high dielectric composition was prepared, and the results of evaluating the dielectric properties are shown in Table 1.
- the relative dielectric constant was 64, the dielectric loss tangent was 4.8%, the capacitance per area was 5.7 nF / cm 2 , and the porosity was 21% by volume.
- a paste composition was prepared in the same manner as the paste composition C-12 except that the solvent was ethylcarbitol, and a paste composition C-9 was prepared.
- the boiling point of ethyl carbitol is 202 ° C.
- a high dielectric composition was prepared, and the results of evaluating the dielectric properties are shown in Table 2.
- the relative dielectric constant was 50, the dielectric loss tangent was 2.2%, the capacitance per area was 4.4 nFZ cm 2 , and the porosity was 30% by volume. ⁇
- a paste composition was prepared in the same manner as the paste composition C-2 except that the solvent was morpholine, and a paste composition D-2 was prepared.
- Morpholine has a boiling point of 128 ° C.
- Table 4 shows the results of producing a high dielectric composition based on the method of Example 1 and evaluating the dielectric properties. Dielectric constant 35, the dielectric loss tangent 5. Ri 8% der, the capacitance or area 3 ⁇ 4 is 2. a S n FZc m 2, Retsutsu electrical properties: had C. The porosity was 32% by volume.
- a paste composition was prepared in the same manner as paste composition C-12 except that the solvent was propylene glycol monomethyl acetate, and a paste composition D-3 was prepared.
- Propylene dalycol monomethyl acetate has a boiling point of 146 ° C.
- Table 4 shows the results of producing a high dielectric composition based on the method of Example 1 and evaluating the dielectric properties.
- the dielectric constant 4 6, the dielectric loss tangent is 4.7%, the area per Rino capacitance 2.
- a 7 n FZc m 2 were inferior in electrical characteristics.
- the porosity was 35% by volume.
- Example 10 Barium titanate (manufactured by Sakai Chemical Co., Ltd., BT-05, average particle size: 0.5 ⁇ m)
- a dispersion A-3 494 parts by weight and 1 part by weight of peptide lactone were kneaded using a homogenizer to obtain a dispersion A-3.
- the dispersion A-3 and the epoxy resin solution B-1 were mixed using a ball mill to prepare a paste composition C-10. Further, based on the method of Example 1, a high dielectric composition was prepared, and the results of evaluating the dielectric properties are shown in Table 2.
- the dielectric constant was 79
- the dielectric loss tangent was 3.4%
- the capacitance per area was 5.8 nFZ cm 2
- the porosity 13% by volume.
- barium titanate manufactured by Toho Titanium Co., Ltd.
- a paste composition C-12 was prepared in the same manner as in Example 2 except that 5B05 (average particle size: 0.5 ⁇ m) was used. Further, based on the method of Example 1, a high dielectric composition was prepared, and the results of evaluating the dielectric properties are shown in Table 2. The relative dielectric constant was 70, the dielectric loss tangent was 2.9%, the capacitance per area was 6.2 nF / cm 2 , and the porosity was 14% by volume.
- Paste composition C was prepared in the same manner as in Example 2 except that strontium titanate (manufactured by Sakai Chemical Co., Ltd., ST-03, average particle size: 0.3 m) was used as the high dielectric constant inorganic filler. One thirteen were made. Further, based on the method of Example 1, a high dielectric composition was prepared, and the results of evaluating the dielectric properties are shown in Table 2. The relative dielectric constant was 65, the dielectric loss tangent was 1.2%, the capacitance per area was 3.8 nF / cm 2 , and the porosity was 14% by volume. Example 14 to ⁇ 6
- a paste composition C114-16 was produced in the same manner as in Example 2 except that the resins and the curing agents shown in Table 2 were used. Table 2 shows the results of preparing a high dielectric composition and evaluating the dielectric properties. T Examples 17 to 18 in which a high dielectric composition having a relative dielectric constant of 50 or more was obtained
- a paste composition C-1 was used, using polyimide resin (manufactured by Toray Industries, Inc., "Semico Fine” SP34 ⁇ ) and polyether sulfone (manufactured by Sumitomo Chemical Co., Ltd., Japan, Japan) 17 to 18 were produced. High dielectric compositions having the compositions shown in Table 3 were prepared, and their dielectric properties were evaluated. Table 3 shows the results. A high dielectric composition having a relative dielectric constant of 50 or more was obtained.
- Barium titanate filler manufactured by Sakai Chemical Co., Ltd., BT-05, average particle size: 0.5 im
- 12.8 parts by weight of epoxy resin Nippon Kayaku Co., Ltd., EPPN 502 H
- 7.8 parts by weight of phenol novolak resin TD-2131 of Dainippon Ink Industries, Ltd.
- [Titanate] 1 ] film (BT-05, average particle size: 0.5 ⁇ m, manufactured by Sakai Chemical Co., Ltd.) 32 parts by weight, dispersant (copolymer with acid group having phosphate ester skeleton) 0.2 parts by weight (BYK-W910) manufactured by BYK-Chemie K.K. and 36 parts by weight of arbutyrrolactone were kneaded using a homogenizer to obtain a dispersion A-6. Dispersion A-6 and epoxy resin solution B-2 are mixed using a ball mill, A composition C-120 was prepared. Table 3 shows the results of preparing a high dielectric composition based on the method of Example 1 and evaluating the dielectric properties. The dielectric constant 9 5, the dielectric tangent is 3. was 1%, the capacitance per area 8. 4 n F / cm 2, a porosity
- Epoxy resin manufactured by Nippon Kayaku Co., Ltd., NC 300 15.3 parts by weight, phenolic novolak resin (manufactured by Nippon Kayaku Co., Ltd., "Chahard” TPM (new name: “Rikihahard” KTG) -10 5)) 5.3 parts by weight, a curing accelerator (Horiko Chemical Co., Ltd., triphenylphenyl wood fin) 0.2 parts by weight, 24.7 parts by weight of ⁇ -butyrolactone, and an epoxy resin solution B-3 was obtained.
- the dispersion A-2 and the epoxy resin solution B-3 were mixed using a ball mill to prepare a paste composition C-21.
- Table 3 shows the results of producing a high dielectric composition based on the method of Example 1 and evaluating the dielectric properties.
- the relative dielectric constant was 76
- the dielectric loss tangent was 2.8%
- the capacitance per area was 5.6 nFZ cm 2
- the porosity was 14% by volume.
- Barium titanate manufactured by Sakai Chemical Co., Ltd., BT-05: average particle size 0.5 ⁇ m
- barium titanate TPL, Inc., HPB-10
- 0 Average particle size: 0.059 Aim
- Example 2 a high dielectric composition was prepared, and the results of evaluating the dielectric properties are shown in Table 6.
- Dielectric constant 1 2 3 dielectric loss tangent 3.1, capacitance 1 0. 9 n F cm 2, a porosity of 4% by volume.
- Example 2 3 Dielectric constant 1 2 3, dielectric loss tangent 3.1, capacitance 1 0. 9 n F cm 2, a porosity of 4% by volume.
- Epoxy resin (Nippon Kayaku Co., Ltd., NC-300) 2.6 parts by weight, pheno-l-novolak resin (Nippon Kayaku Co., Ltd., "Chahard” TPM (new name: “Ryakuha”) 0.9 "parts by weight of K” -KTG-105), 0.04 parts by weight of a curing accelerator (manufactured by Hokko Chemical Co., Ltd., triphenylphosphine), and 7.1 parts by weight of T-butyrolactone, An epoxy resin solution B-5 was obtained The dispersion A-7 and the epoxy resin solution B-5 were mixed using a ball mill to prepare a paste composition C-23.
- a paste composition C-24 was prepared in the same manner as in Example 23, except that the solvent was ethylene dalicol diacetate.
- the boiling point of ethylene glycol diacetate is 190 ° C.
- Table 6 shows the results of producing a high dielectric composition based on the method of Example 1 and evaluating the dielectric properties. The relative permittivity was 95, the dielectric loss tangent was 3.1%, the capacitance per area was 8.4 nFZ cm 2 , and the porosity was 8% by volume.
- a paste composition C-125 was prepared in the same manner as in Example 23, except that the solvent was getyl malonate.
- the boiling point of getyl malonate is 199 ° C.
- a high dielectric composition was prepared, and its dielectric properties were evaluated.
- the dielectric constant was 85
- the dielectric loss tangent was 2.7%
- the capacitance per area was 7.5 nF / cm 2
- the porosity was 9% by volume.
- a paste composition C-126 was produced in the same manner as in Example 23, except that the solvent was ethyl carbitol. Ethyl carbitol has a boiling point of 202 ° C. Further, based on the method of Example 1, a high dielectric composition was prepared, and its dielectric properties were evaluated. The relative dielectric constant was 99, the dielectric loss tangent was 2.9%, the capacitance per area was 8.8 nFZ cm 2 , and the porosity was 7% by volume.
- a paste composition C-27 was produced in the same manner as in Example 23, except that the solvent was 4-methylcyclohexanone.
- the boiling point of 4-methylcyclohexanone is 169 ° C.
- a high dielectric composition was prepared, and the results of evaluating the dielectric properties are shown in Table 6.
- the dielectric constant 7 9, the dielectric loss tangent is 2-1%, the capacitance of the area per Li is 7. 0 n F / cm 2, porosity 1 2 vol% der ivy.
- a paste composition C-28 was produced in the same manner as in Example 23 except that the solvent was isophorone. Isophorone has a boiling point of 215 ° C. Also, based on the method of Example 1, a high dielectric composition was prepared, and the results of evaluating the dielectric properties are shown in Table 6. The relative dielectric constant was 76, the dielectric loss tangent was 2.2%, and the capacitance per area was 6.7 7 ( 2 : porosity: 11% by volume).
- a paste composition C-129 was produced in the same manner as in Example 23, except that the solvent was getylformamide.
- the boiling point of getylformamide is 177 ° C.
- Table 6 shows the results of producing a high dielectric composition based on the method of Example 1 and evaluating the dielectric properties.
- the relative dielectric constant was 70
- the dielectric loss tangent was 2.3%
- the capacitance per area was 6.2 nF / cm 2
- the porosity was 15% by volume.
- a base composition C-130 was prepared in the same manner as in Example 23 except that the solvent was dimethyl acetate.
- Dimethyl acetate amide has a boiling point of 165 ° C.
- a high dielectric composition was prepared and its dielectric properties were evaluated.
- the dielectric constant 7 9, the dielectric loss tangent 2. 3%, the capacitance per area 7. 0 n FZ cm 2, a porosity of 1 1% by volume.
- Barium titanate filler (manufactured by Sakai Chemical Industry Co., Ltd., BT-05, average particle size: 0.5 ⁇ m) 53,28 parts by weight, barium titanate filler (TPL, Inc.) , HPB—100, average particle size: 0.059 tm) 1 87 2 parts by weight, 92 parts by weight of petyrolactone, dispersant (copolymer having an acid group having a phosphate ester skeleton: BYK-W910, manufactured by Big Chemie Japan KK) 72 parts by weight using a homogenizer Then, the mixture was mixed and dispersed under ice cooling for 1 hour to obtain Dispersion X-1.
- Barium titanate filler (manufactured by Sakai Chemical Industry Co., Ltd., BT-05, average particle size: 0.5 im) 532 8 parts by weight, barium titanate filler (manufactured by Cabot Corp.) , K-Plus16, average particle size: 0.06 iim) 1872 parts by weight, acetylolactone 922 parts by weight, dispersant (copolymer having an acid group having a phosphate ester skeleton) : BYK-W9100) (72 parts by weight, manufactured by BYK-Chemie Japan KK) was mixed and dispersed using an homogenizer under ice-cooling for 1 hour to obtain Dispersion X-12.
- Barium titanate filler (manufactured by Nagaku Chemical Industry Co., Ltd., BT-02, average particle size: 0.18 Atm) 5328 parts by weight, titanium titanate barrier filter (TPL, Inc.) HPB-1000, average particle size: 0.059 tm) 187 2 parts by weight, ⁇ -butyrolactone 928 parts by weight, dispersing agent (acid group having phosphate ester skeleton Copolymer having: manufactured by Big Chemie Japan Co., Ltd., ⁇ ⁇ ⁇ — W 9100) 7 Using a homogenizer, mix and disperse 1 hour under ice-cooling using a homogenizer to obtain Dispersion X-3 Was.
- Barium titanate filler manufactured by Sakai Chemical Industry Co., Ltd., powder size: 0.3, average particle size: 0.28 m) 53.28 parts by weight, titanium titanate barrier filter (TPL, Inc.) , HPB-1000, average particle size: 0.059 m) 1872 parts by weight, carbylactone 922 parts by weight, dispersant (acid group having phosphate ester skeleton Copolymer having: BYK-W9100) manufactured by BYK-Chemie Japan K.K., was mixed and dispersed in a homogenizer for 1 hour under ice-cooling using a homogenizer to obtain Dispersion X-4.
- Barium titanate filler (manufactured by Kyoritsu Materials Co., Ltd., BT-SA, average particle size: 2.1 m) 532 8 parts by weight, titanium titanate barrier filter (TPL, Inc., HPB- 100, average particle size: 0.059 xm) 187 2 parts by weight, acetylolactone 922 parts by weight, dispersant (copolymer having acid group having phosphate ester skeleton: BYK-W9100) 72 parts by weight manufactured by BYK Japan's Japan Co., Ltd. was mixed and dispersed for 1 hour under ice-cooling using a homogenizer to obtain Dispersion X-6.
- TPL, Inc. HPB- 100, average particle size: 0.059 xm
- dispersant copolymer having acid group having phosphate ester skeleton: BYK-W9100
- Barium titanate filler manufactured by Sakai Chemical Industry Co., Ltd., BT-05, average particle size: 0.5 tm) 600,6 parts by weight, barium titanate filler (TPL, Inc., HPS-) 200, average particle size: 0.045 Atm) 1613 parts by weight, r-loop, tyrolactone 152,3 parts by weight, dispersant (acid group having phosphate ester skeleton Holding copolymer: BYK-W90 90) 77 parts by weight, manufactured by BYK Japan KK, was mixed and dispersed using an homogenizer under ice-cooling for 1 hour to obtain Dispersion X-7.
- Barium titanate filler manufactured by Sakai Chemical Industry Co., Ltd., BT-05, average particle size: 0.5 ⁇ m
- dispersant lact Copolymer having an acid ester-based acid group: BYK-W910, manufactured by Big Chemie Japan Co., Ltd. 72 2 parts by weight was mixed and dispersed using a homogenizer under ice-cooling for 1 hour, and dispersion X — I got 10
- Barium titanate filler manufactured by Kyoritsu Materials Co., Ltd., BTHP-8 YF, average particle size: 7 m
- barium titanate filler manufactured by Sakai Chemical Industry Co., Ltd., BT— 0,5, average particle size: 0.5 im
- 187,2 parts by weight lactone mouth lactone, 92,8 parts by weight
- dispersant Copolymer having an acid group having a phosphate ester skeleton: Big Chemie
- 72 parts by weight of BYK-W910 manufactured by Japan Co., Ltd., were mixed and dispersed for 1 hour under ice-cooling using a homogenizer to obtain a dispersion X-11.
- Barium titanate filler (manufactured by Kyoritsu Materials Co., Ltd., BT-SA, average particle size: 2.1 m) was dispersed in an acrylic resin binder using a ball mill, and the primary particles were coagulated and solidified using a spray dryer. Secondary particles were granulated. Next, this is calcined in the air at 1200 ° C. for 6 hours, pulverized in a mortar, and then classified by a sieve of 500 mesh and 300 mesh to obtain a titanate having an average particle size of 40 im. I got a Realm A. Dynamic scattering type particle size distribution analyzer for measuring average particle size (LB-500, manufactured by Horiba, Ltd.) was used.
- This barium titanate filler A is composed of 532 parts by weight, barium titanate filler B (manufactured by Kyoritsu Materials Co., Ltd., BT—SA, average particle size: 2.1 ⁇ m) 1872 parts by weight, r Bacterium lactone 922 parts by weight, dispersant (copolymer having acid group having phosphate phosphate skeleton: BYK-W91010 manufactured by BYK Japan KK) 72 parts by weight Using a homogenizer, the mixture was mixed and dispersed under ice cooling for 1 hour to obtain a dispersion liquid X-12. Synthesis Example 13: Dispersion X—13
- a titanium titanate filler C having an average particle diameter of 20 Aim was prepared in the same manner as in the case of titanium titanate filler A of Synthesis Example 12. did. 5 3 2 8 parts by weight of the barium titanate filler C, barium titanate filler B (KCM Co., BT- SA, an average particle size: 2.
- Epoxy resin manufactured by Nippon Kayaku Co., Ltd., "Phenolite” 500 parts by weight, phenol novolak resin (manufactured by Dainippon Ink and Chemicals, TD-213) 1) 400 parts by weight and 100 parts by weight of polybutyrolactone were mixed to obtain a resin solution ⁇ - ⁇ .
- Epoxy resin (Nippon Kayaku Co., Ltd., NC-30000) 600 parts by weight, pheno-l-novolak resin (Nippon Kayaku Co., Ltd., "Kahakudo") (new name: "Rigid Hard” KTG—105)) 200 parts by weight, 8 parts by weight of a curing accelerator (Triphenylphenylphosphine manufactured by Hokuko Chemical Co., Ltd.), and 100 parts by weight of carpirolactone As a result, a resin solution ⁇ -1 was obtained.
- the paste composition was applied onto an aluminum substrate and a copper substrate using a Svinco overnight, dried in an oven at 120 ° C. for 10 minutes, and then dried at 170 ° C. C, curing for ⁇ hours to obtain a dielectric composition.
- the stress change due to temperature of the dielectric composition formed on these two types of substrates was measured using a stress measurement device FI eXus manufactured by Tencor Co., Ltd.
- the value was 18 ppm / ° C, which was a good value that almost matched copper (17 ppm / ° C).
- an aluminum electrode is formed by vapor deposition on the surface of the dielectric composition on the aluminum substrate, and the aluminum electrode of the substrate is used as an electrode to measure the dielectric characteristics at 1 MHz using an impedance analyzer (Hyurette Packard Co., Ltd.). , HP 4, 284 A, HP 1645 1 B), the relative permittivity was 55, the dielectric loss tangent was 3.3%, The capacitance per area was 4.9 nF cm 2 .
- the dielectric composition on the copper substrate was subjected to a pressure cooker test (PCT test, 100% RH, 121 ° C, 2 atmospheres, 100 hours later). Was not observed, and in the test by the crosscut tape method (JISK540), the evaluation score was 10 points, which was good.
- the thickness of the dielectric composition was evaluated at three levels of 5, 10, and 20 / m. Table 9 summarizes the results at ⁇ 0 ⁇ m.
- a dielectric composition was obtained in the same manner as in Example 31 except that the epoxy resin solution of Synthesis Example 14 was used and the inorganic filler monodispersion was not used, and the coefficient of linear expansion, the dielectric properties, and the PCT test were measured. The results are shown in Table 10.
- Barium titanate filler (manufactured by Sakai Chemical Industry Co., Ltd., average particle size: 0.5 tm), which is a large particle size filler, is replaced with barium titanate filler (TPL, 1 nc., HPB— The average particle size was changed to 100,000 and the average particle size was 0.059 ⁇ m, and a small particle size filler, barium titanate filler (TPS, Inc., HPB—100, average) Particle size: 0.059 m) is changed to Strontium titanate filter (TPL, Inc., HPS-200, average particle size: 0.045 ⁇ m) Except for this, an attempt was made to produce a dispersion in the same manner as in Synthesis Example 3, but the filler was coagulated and the dispersion was unstable, and the paste composition could not be obtained. Industrial applications
- the paste composition and the dielectric composition of the present invention are preferably used for applications such as an interlayer insulating material for circuit materials having a function as a capacitor and an optical wiring material.
- Example 22 10 123 10.9 3.1 4
- Example 23 10 121 10.7 2.6 4
- Example 24 10 95 8.4 3.1 8
- Example 25 10 85 7.5 2.7 9
- Example 26 10 99 8.8 2.9 7
- Example 27 10 79 7.0 2.1 12
- Example 28 10 76 6.7 2.2 1 1
- Example 29 10 70 6.2 2.3 15
- Example 30 10 79 7.0 2.3 1 1
- composition Epoxy resin Volume ratio
- Example 31 X-1 Halium titanate 0.5 Titanium, 0.059 8.5 Y-161 / 39 Stable, Example 32 X-1 Titanium, lithium 0.5 Halium titanate 0.059 8.5 Y-1 72/28 Stable Example 33 X-1 Halium titanate 0.5 Aium titanate 0.059 8.5 Y- 1 79/21 Stable Example 34 X-1 Halium titanate 0.5 Harium titanate 0.059 8.5 Y-1 86 / 14 Stable t Example 35 X-1 Halium titanate 0.5 Aium titanate 0.059 8.5 Y—1 91/9 Stable Example 36 X—1 Halium titanate 0.5 Harium titanate 0.059 8.5 Y-1 93/7 Stable Example 37 X-1 Lithium titanate 0.5 Halarium titanate 0.059 8.5 Y-2 79/21 Stable Example 38 X-2 Halarium titanate 0.5 Halarium titanate 0.060 8.3 Y- 2 79/21 Stable Example 39 X-3 Halium Titanate 0.18 Hala
- composition Epoxy resin Volume ratio
- Example 43 X-2 halium titanate 0.5 halium titanate 0.060 8.3 Y-1 79/21 stable
- Example 44 X-7 halium titanate 0.5 strontium titanate 0.045 11.1 Y-1 79/21 stable
- Example 45 X—8 Aium titanate 0.5 Titanium oxide 0.2 2.5 Y-181 / 29 Slightly unstable
- Example 46 X-9 Lead-based Filament-0.9 Halium Titanate 0.059 15.3 Y—186 / 14 Stable Comparative Example 4 One Y—10 / 100 — Comparative Example 5 X—10 Titanate Lithium 0.5 Y-1 79/21 Stable Comparative Example 6 X—1 1 Harium titanate 7 Harium titanate 0.5 14 Y-1 79/21 Unstable
- Example 31 10 18 00. A Q 10
- Example 32 10 17 yo A A o o.7 / 10
- Example 33 10 16 A A
- Example 40 10 16 102 2.8 9.0 10
- Example 41 10 16 135 3.7 12.0 10
- Example 42 10 16 150 4.1 13.3 10
- Example 43 10 16 1 1 0 Q in 10
- Example 44 10 16 91 3.9 8.1 10
- Example 45 10 15 47 2.6 4.2
- Example 46 10 15 80 3.5 7.1 10
- Comparative example 4 10 53 4 2.8 0.3 10 Comparative example 5 10 25 72 6.8 6.4 8 Comparative example 6 10 32 Measured value is not stable and cannot be measured 6 Comparative example 7 10 36 Measured value is not stable and cannot be measured 6 Comparative Example 8 10 35 Measured value was unstable and measurement was not caustic 6 Comparative Example 9 Paste could not be produced due to filler aggregation
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Inorganic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Ceramic Engineering (AREA)
- Inorganic Insulating Materials (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/551,031 US20060159927A1 (en) | 2003-04-04 | 2004-03-25 | Paste composition and dielectric composition using the same |
EP04723336A EP1612810A4 (en) | 2003-04-04 | 2004-03-25 | PULP COMPOSITION AND DIELECTRIC COMPOSITION CONTAINING SAME |
KR1020057017731A KR101071791B1 (ko) | 2003-04-04 | 2005-09-22 | 페이스트 조성물 및 이것을 사용한 유전체 조성물 |
US12/805,179 US9058912B2 (en) | 2003-04-04 | 2010-07-15 | Paste composition and dielectric composition using the same |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003-101226 | 2003-04-04 | ||
JP2003101226 | 2003-04-04 | ||
JP2003-186632 | 2003-06-30 | ||
JP2003186632 | 2003-06-30 |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10551031 A-371-Of-International | 2004-03-25 | ||
US12/805,179 Continuation-In-Part US9058912B2 (en) | 2003-04-04 | 2010-07-15 | Paste composition and dielectric composition using the same |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2004090912A1 true WO2004090912A1 (ja) | 2004-10-21 |
Family
ID=33161504
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/004182 WO2004090912A1 (ja) | 2003-04-04 | 2004-03-25 | ペースト組成物およびこれを用いた誘電体組成物 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20060159927A1 (ja) |
EP (1) | EP1612810A4 (ja) |
KR (1) | KR101071791B1 (ja) |
TW (1) | TWI352663B (ja) |
WO (1) | WO2004090912A1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2008013048A1 (en) * | 2006-07-27 | 2008-01-31 | Daikin Industries, Ltd. | Coating composition |
EP1939894A1 (en) * | 2005-09-06 | 2008-07-02 | Toray Industries, Inc. | Paste composition, dielectric composition, capacitor, and method for production of paste composition |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050019214A (ko) * | 2003-08-18 | 2005-03-03 | 한국과학기술원 | 내장형 커패시터용 폴리머/세라믹 복합 페이스트 및 이를이용한 커패시터 제조방법 |
KR100665261B1 (ko) * | 2005-10-13 | 2007-01-09 | 삼성전기주식회사 | 온도변화에 따른 정전용량변화가 작은 복합 유전체 조성물및 이를 이용한 시그널 매칭용 임베디드 캐패시터 |
KR101423456B1 (ko) | 2006-12-28 | 2014-07-29 | 서울반도체 주식회사 | 형광막 구조를 포함하는 백라이팅 유닛 |
EP2234118A4 (en) | 2008-01-18 | 2017-08-16 | Toray Industries, Inc. | High dielectric constant paste composition and dielectric composition using the same |
US8586660B2 (en) | 2010-04-07 | 2013-11-19 | Samsung Electronics Co., Ltd. | Dielectric paste composition, method of forming dielectric layer, dielectric layer, and device including the dielectric layer |
JP5356326B2 (ja) * | 2010-07-20 | 2013-12-04 | 日東電工株式会社 | 半導体装置の製造方法 |
CN103547548A (zh) * | 2011-03-23 | 2014-01-29 | 密苏里大学学监 | 高介电常数复合材料和制造方法 |
KR20150006713A (ko) * | 2013-07-09 | 2015-01-19 | 삼성전기주식회사 | 인쇄회로기판용 절연필름 및 이를 이용한 제품 |
US9809720B2 (en) * | 2015-07-06 | 2017-11-07 | University Of Massachusetts | Ferroelectric nanocomposite based dielectric inks for reconfigurable RF and microwave applications |
US10839992B1 (en) | 2019-05-17 | 2020-11-17 | Raytheon Company | Thick film resistors having customizable resistances and methods of manufacture |
US20240336846A1 (en) * | 2023-04-07 | 2024-10-10 | Ticona Llc | Polymer Composition for Use in an Electronic Device |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000199956A (ja) * | 1999-01-06 | 2000-07-18 | Toray Ind Inc | 感光性ペ―スト |
JP2001243837A (ja) * | 2000-02-29 | 2001-09-07 | Kyocera Corp | 誘電体ペースト及びこれを用いたセラミック回路基板の製法 |
JP2001294445A (ja) * | 2000-04-13 | 2001-10-23 | Toray Ind Inc | ガラスペースト |
JP2002293619A (ja) * | 2001-03-29 | 2002-10-09 | Tdk Corp | 誘電体複合材料及びその製造方法 |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5102720A (en) * | 1989-09-22 | 1992-04-07 | Cornell Research Foundation, Inc. | Co-fired multilayer ceramic tapes that exhibit constrained sintering |
US5270416A (en) * | 1992-09-04 | 1993-12-14 | Ferro Corporation | Thermosetting glycidyl modified acrylic powder coatings |
US6753108B1 (en) * | 1998-02-24 | 2004-06-22 | Superior Micropowders, Llc | Energy devices and methods for the fabrication of energy devices |
JP2000203941A (ja) * | 1999-01-11 | 2000-07-25 | Tdk Corp | セラミックペ―ストの製造方法 |
JP3228923B2 (ja) * | 2000-01-18 | 2001-11-12 | イビデン株式会社 | 半導体製造・検査装置用セラミックヒータ |
US6891263B2 (en) * | 2000-02-07 | 2005-05-10 | Ibiden Co., Ltd. | Ceramic substrate for a semiconductor production/inspection device |
JP2001283420A (ja) * | 2000-03-30 | 2001-10-12 | Fuji Photo Film Co Ltd | 磁気記録媒体 |
US6350792B1 (en) * | 2000-07-13 | 2002-02-26 | Suncolor Corporation | Radiation-curable compositions and cured articles |
CN1164527C (zh) * | 2000-07-28 | 2004-09-01 | 株式会社村田制作所 | 陶瓷糊浆组合物、陶瓷成形体和陶瓷电子元件 |
JP2002226675A (ja) | 2001-02-05 | 2002-08-14 | Toshiba Chem Corp | 絶縁性ペースト |
US7162137B2 (en) * | 2001-06-20 | 2007-01-09 | Ers Company | Optical fiber with nano-particle cladding |
US20030138731A1 (en) * | 2001-12-21 | 2003-07-24 | Treliant Fang | Photoresist formulation for high aspect ratio plating |
JP2004030737A (ja) * | 2002-06-24 | 2004-01-29 | Fuji Photo Film Co Ltd | 磁気記録媒体の製造方法 |
-
2004
- 2004-03-25 WO PCT/JP2004/004182 patent/WO2004090912A1/ja active Application Filing
- 2004-03-25 US US10/551,031 patent/US20060159927A1/en not_active Abandoned
- 2004-03-25 EP EP04723336A patent/EP1612810A4/en not_active Withdrawn
- 2004-04-02 TW TW93109156A patent/TWI352663B/zh not_active IP Right Cessation
-
2005
- 2005-09-22 KR KR1020057017731A patent/KR101071791B1/ko active IP Right Grant
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000199956A (ja) * | 1999-01-06 | 2000-07-18 | Toray Ind Inc | 感光性ペ―スト |
JP2001243837A (ja) * | 2000-02-29 | 2001-09-07 | Kyocera Corp | 誘電体ペースト及びこれを用いたセラミック回路基板の製法 |
JP2001294445A (ja) * | 2000-04-13 | 2001-10-23 | Toray Ind Inc | ガラスペースト |
JP2002293619A (ja) * | 2001-03-29 | 2002-10-09 | Tdk Corp | 誘電体複合材料及びその製造方法 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1612810A4 * |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1939894A1 (en) * | 2005-09-06 | 2008-07-02 | Toray Industries, Inc. | Paste composition, dielectric composition, capacitor, and method for production of paste composition |
EP1939894A4 (en) * | 2005-09-06 | 2015-01-14 | Toray Industries | PASTE COMPOSITION, DIELECTRIC COMPOSITION, CAPACITOR AND METHOD FOR PRODUCING A PASTEN COMPOSITION |
WO2008013048A1 (en) * | 2006-07-27 | 2008-01-31 | Daikin Industries, Ltd. | Coating composition |
US8779047B2 (en) | 2006-07-27 | 2014-07-15 | Daikin Industries, Ltd. | Coating composition |
Also Published As
Publication number | Publication date |
---|---|
EP1612810A4 (en) | 2009-12-16 |
US20060159927A1 (en) | 2006-07-20 |
TWI352663B (en) | 2011-11-21 |
KR101071791B1 (ko) | 2011-10-11 |
TW200500210A (en) | 2005-01-01 |
KR20060002844A (ko) | 2006-01-09 |
EP1612810A1 (en) | 2006-01-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3680854B2 (ja) | ペースト組成物およびこれを用いた誘電体組成物 | |
Zhang et al. | Enhanced dielectric tunability of Ba0. 6Sr0. 4TiO3/Poly (vinylidene fluoride) composites via interface modification by silane coupling agent | |
US7609504B2 (en) | High-dielectric constant metal-ceramic-polymer composite material and method for producing embedded capacitor using the same | |
WO2004090912A1 (ja) | ペースト組成物およびこれを用いた誘電体組成物 | |
WO2007029605A1 (ja) | ペースト組成物、誘電体組成物、キャパシタおよびペースト組成物の製造方法 | |
JP4019725B2 (ja) | 高誘電率複合材料とそれを用いた多層配線板 | |
US9058912B2 (en) | Paste composition and dielectric composition using the same | |
JP2007109655A (ja) | 温度変化による静電容量変化の小さい複合誘電体組成物及びこれを用いたシグナルマッチング用エンベッディドキャパシタ | |
US8187710B2 (en) | Insulated ultrafine powder, process for producing same and resin composite material with high dielectric constant using same | |
JP3995020B2 (ja) | ペースト組成物、誘電体組成物、キャパシタおよびペースト組成物の製造方法 | |
JP5176290B2 (ja) | ペースト組成物、誘電体組成物、誘電体シート、およびこれらを用いたキャパシタ内蔵回路基板 | |
JP4972903B2 (ja) | 誘電体組成物 | |
JP2007027101A5 (ja) | ||
CN107531575B (zh) | 电介质陶瓷材料及其制造方法和复合电介质材料 | |
JP2006160934A (ja) | ペースト組成物及び誘電体組成物 | |
JP2007217623A (ja) | ペースト組成物および誘電体組成物、ならびに誘電体組成物を用いたキャパシタ | |
CN100418161C (zh) | 糊状组合物及使用了该糊状组合物的电介质组合物 | |
JP2004067889A (ja) | 高誘電体組成物 | |
KR20160140781A (ko) | 중합체/세라믹 복합물 | |
JP2004124066A (ja) | 高誘電体組成物 | |
JP6903538B2 (ja) | 誘電体複合材料 | |
JP2004307607A (ja) | 高誘電体組成物 | |
JP4725278B2 (ja) | キャパシタ | |
JP2004363065A (ja) | 誘電体組成物 | |
JP2006351390A (ja) | 複合材料 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): BW GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2004723336 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020057017731 Country of ref document: KR |
|
ENP | Entry into the national phase |
Ref document number: 2006159927 Country of ref document: US Kind code of ref document: A1 |
|
WWE | Wipo information: entry into national phase |
Ref document number: 10551031 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 20048091202 Country of ref document: CN |
|
WWP | Wipo information: published in national office |
Ref document number: 2004723336 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 1020057017731 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 10551031 Country of ref document: US |