USD992615S1 - Focus ring - Google Patents
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- USD992615S1 USD992615S1 US29/692,040 US201929692040F USD992615S US D992615 S1 USD992615 S1 US D992615S1 US 201929692040 F US201929692040 F US 201929692040F US D992615 S USD992615 S US D992615S
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2018-026741 | 2018-12-07 | ||
JP2018026741F JP1646505S (zh) | 2018-12-07 | 2018-12-07 |
Publications (1)
Publication Number | Publication Date |
---|---|
USD992615S1 true USD992615S1 (en) | 2023-07-18 |
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ID=68610585
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US29/692,040 Active USD992615S1 (en) | 2018-12-07 | 2019-05-22 | Focus ring |
Country Status (2)
Country | Link |
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US (1) | USD992615S1 (zh) |
JP (1) | JP1646505S (zh) |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1040304S1 (en) * | 2018-12-17 | 2024-08-27 | Applied Materials, Inc. | Deposition ring for physical vapor deposition chamber |
USD1041537S1 (en) * | 2023-05-01 | 2024-09-10 | Jiangmen Kase Optics Co., Ltd | Magnetic filter |
USD1042374S1 (en) | 2022-03-18 | 2024-09-17 | Applied Materials, Inc. | Support pipe for an interlocking process kit for a substrate processing chamber |
USD1042373S1 (en) | 2022-03-18 | 2024-09-17 | Applied Materials, Inc. | Sliding ring for an interlocking process kit for a substrate processing chamber |
USD1047884S1 (en) * | 2021-10-22 | 2024-10-22 | Nuflare Technology, Inc. | Susceptor cover |
USD1049067S1 (en) * | 2022-04-04 | 2024-10-29 | Applied Materials, Inc. | Ring for an anti-rotation process kit for a substrate processing chamber |
USD1052546S1 (en) * | 2020-12-10 | 2024-11-26 | Nuflare Technology, Inc. | Cover ring of top plate for semiconductor manufacturing apparatus |
USD1055139S1 (en) * | 2022-09-11 | 2024-12-24 | Shenzhen Anymore Technology Limited | Filter for photography |
USD1055006S1 (en) * | 2022-03-18 | 2024-12-24 | Applied Materials, Inc. | Support ring for an interlocking process kit for a substrate processing chamber |
USD1056019S1 (en) * | 2022-08-29 | 2024-12-31 | Shenzhen Anymore Technology Limited | Filter for photography |
USD1066275S1 (en) | 2022-04-04 | 2025-03-11 | Applied Materials, Inc. | Baffle for anti-rotation process kit for substrate processing chamber |
Citations (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD248766S (en) * | 1976-05-20 | 1978-08-01 | Kabushiki Kaisha Tamron | Barrel for interchangeable lens |
USD692475S1 (en) * | 2012-03-21 | 2013-10-29 | Nikon Corporation | Camera mount |
US20140140688A1 (en) * | 2012-11-20 | 2014-05-22 | Ye Xu | Magnetic Lens Filters and Adapter Assemblies for a Camera |
USD731577S1 (en) * | 2011-08-10 | 2015-06-09 | Nikon Corporation | Intermediate adapter for a camera |
USD750152S1 (en) * | 2012-07-03 | 2016-02-23 | Fujifilm Corporation | Lens for camera |
USD770992S1 (en) * | 2015-06-12 | 2016-11-08 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
US20170009367A1 (en) * | 2015-07-09 | 2017-01-12 | Applied Materials, Inc. | Wafer electroplating chuck assembly |
USD797691S1 (en) * | 2016-04-14 | 2017-09-19 | Applied Materials, Inc. | Composite edge ring |
USD799578S1 (en) * | 2016-03-11 | 2017-10-10 | Breakthrough Photography, LLC | Camera lens filter with traction frame |
USD810705S1 (en) * | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
USD820341S1 (en) * | 2016-08-31 | 2018-06-12 | Fujifilm Corporation | Camera body |
USD825504S1 (en) * | 2015-04-21 | 2018-08-14 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
US20190278058A1 (en) * | 2018-03-07 | 2019-09-12 | Largan Precision Co.,Ltd. | Annular optical component, lens module and electronic device |
USD862404S1 (en) * | 2016-10-25 | 2019-10-08 | Kokusai Electric Corporation | Sealing material ring for a semiconductor manufacturing apparatus |
USD870185S1 (en) * | 2017-09-28 | 2019-12-17 | Nikon Corporation | Digital camera |
USD876504S1 (en) * | 2017-04-03 | 2020-02-25 | Asm Ip Holding B.V. | Exhaust flow control ring for semiconductor deposition apparatus |
USD877101S1 (en) * | 2018-03-09 | 2020-03-03 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
US20200090915A1 (en) * | 2017-06-01 | 2020-03-19 | Oerlikon Surface Solutions Ag, Pfäffikon | Target assembly for safe and economic evaporation of brittle materials |
USD888804S1 (en) * | 2018-05-04 | 2020-06-30 | New Ideas Manufacturing LLC | Step-up ring |
USD900194S1 (en) * | 2018-05-15 | 2020-10-27 | Canon Kabushiki Kaisha | Interchangeable lens for camera |
USD900196S1 (en) * | 2018-05-15 | 2020-10-27 | Canon Kabushiki Kaisha | Interchangeable lens for camera |
USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD933726S1 (en) * | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
USD934315S1 (en) * | 2020-03-20 | 2021-10-26 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD937926S1 (en) * | 2017-09-27 | 2021-12-07 | Nikon Corporation | Camera lens |
US20220157573A1 (en) * | 2020-11-13 | 2022-05-19 | Tokyo Electron Limited | Edge ring and substrate processing apparatus |
USD973609S1 (en) * | 2020-04-22 | 2022-12-27 | Applied Materials, Inc. | Upper shield with showerhead for a process chamber |
US20220415621A1 (en) * | 2021-06-09 | 2022-12-29 | One Semicon. Co., Ltd. | Focus ring for improvement of semiconductor plasma etching process |
-
2018
- 2018-12-07 JP JP2018026741F patent/JP1646505S/ja active Active
-
2019
- 2019-05-22 US US29/692,040 patent/USD992615S1/en active Active
Patent Citations (29)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD248766S (en) * | 1976-05-20 | 1978-08-01 | Kabushiki Kaisha Tamron | Barrel for interchangeable lens |
USD731577S1 (en) * | 2011-08-10 | 2015-06-09 | Nikon Corporation | Intermediate adapter for a camera |
USD692475S1 (en) * | 2012-03-21 | 2013-10-29 | Nikon Corporation | Camera mount |
USD750152S1 (en) * | 2012-07-03 | 2016-02-23 | Fujifilm Corporation | Lens for camera |
USD780822S1 (en) * | 2012-07-03 | 2017-03-07 | Fujifilm Corporation | Lens for camera |
US20140140688A1 (en) * | 2012-11-20 | 2014-05-22 | Ye Xu | Magnetic Lens Filters and Adapter Assemblies for a Camera |
USD825504S1 (en) * | 2015-04-21 | 2018-08-14 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD770992S1 (en) * | 2015-06-12 | 2016-11-08 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
US20170009367A1 (en) * | 2015-07-09 | 2017-01-12 | Applied Materials, Inc. | Wafer electroplating chuck assembly |
USD799578S1 (en) * | 2016-03-11 | 2017-10-10 | Breakthrough Photography, LLC | Camera lens filter with traction frame |
USD810705S1 (en) * | 2016-04-01 | 2018-02-20 | Veeco Instruments Inc. | Self-centering wafer carrier for chemical vapor deposition |
USD797691S1 (en) * | 2016-04-14 | 2017-09-19 | Applied Materials, Inc. | Composite edge ring |
USD820341S1 (en) * | 2016-08-31 | 2018-06-12 | Fujifilm Corporation | Camera body |
USD862404S1 (en) * | 2016-10-25 | 2019-10-08 | Kokusai Electric Corporation | Sealing material ring for a semiconductor manufacturing apparatus |
USD876504S1 (en) * | 2017-04-03 | 2020-02-25 | Asm Ip Holding B.V. | Exhaust flow control ring for semiconductor deposition apparatus |
US20200090915A1 (en) * | 2017-06-01 | 2020-03-19 | Oerlikon Surface Solutions Ag, Pfäffikon | Target assembly for safe and economic evaporation of brittle materials |
USD937926S1 (en) * | 2017-09-27 | 2021-12-07 | Nikon Corporation | Camera lens |
USD870185S1 (en) * | 2017-09-28 | 2019-12-17 | Nikon Corporation | Digital camera |
US20190278058A1 (en) * | 2018-03-07 | 2019-09-12 | Largan Precision Co.,Ltd. | Annular optical component, lens module and electronic device |
USD877101S1 (en) * | 2018-03-09 | 2020-03-03 | Applied Materials, Inc. | Target profile for a physical vapor deposition chamber target |
USD888804S1 (en) * | 2018-05-04 | 2020-06-30 | New Ideas Manufacturing LLC | Step-up ring |
USD900194S1 (en) * | 2018-05-15 | 2020-10-27 | Canon Kabushiki Kaisha | Interchangeable lens for camera |
USD900196S1 (en) * | 2018-05-15 | 2020-10-27 | Canon Kabushiki Kaisha | Interchangeable lens for camera |
USD933725S1 (en) * | 2019-02-08 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD934315S1 (en) * | 2020-03-20 | 2021-10-26 | Applied Materials, Inc. | Deposition ring for a substrate processing chamber |
USD973609S1 (en) * | 2020-04-22 | 2022-12-27 | Applied Materials, Inc. | Upper shield with showerhead for a process chamber |
USD933726S1 (en) * | 2020-07-31 | 2021-10-19 | Applied Materials, Inc. | Deposition ring for a semiconductor processing chamber |
US20220157573A1 (en) * | 2020-11-13 | 2022-05-19 | Tokyo Electron Limited | Edge ring and substrate processing apparatus |
US20220415621A1 (en) * | 2021-06-09 | 2022-12-29 | One Semicon. Co., Ltd. | Focus ring for improvement of semiconductor plasma etching process |
Non-Patent Citations (2)
Title |
---|
Chinese Patent Office, Office Action in counterpart Chinese Design Patent Application No. 201930258942.3, dated Feb. 25, 2020. |
Silocon Carbine Rings by Schunk, retrieved Feb. 23, 2022, https://www.schunk-carbontechnology.com/en/products/produkte-detail/silicon-carbide-rings, automatic google English translation (Year: 2022). * |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD1040304S1 (en) * | 2018-12-17 | 2024-08-27 | Applied Materials, Inc. | Deposition ring for physical vapor deposition chamber |
USD1052546S1 (en) * | 2020-12-10 | 2024-11-26 | Nuflare Technology, Inc. | Cover ring of top plate for semiconductor manufacturing apparatus |
USD1047884S1 (en) * | 2021-10-22 | 2024-10-22 | Nuflare Technology, Inc. | Susceptor cover |
USD1042374S1 (en) | 2022-03-18 | 2024-09-17 | Applied Materials, Inc. | Support pipe for an interlocking process kit for a substrate processing chamber |
USD1042373S1 (en) | 2022-03-18 | 2024-09-17 | Applied Materials, Inc. | Sliding ring for an interlocking process kit for a substrate processing chamber |
USD1055006S1 (en) * | 2022-03-18 | 2024-12-24 | Applied Materials, Inc. | Support ring for an interlocking process kit for a substrate processing chamber |
USD1049067S1 (en) * | 2022-04-04 | 2024-10-29 | Applied Materials, Inc. | Ring for an anti-rotation process kit for a substrate processing chamber |
USD1066275S1 (en) | 2022-04-04 | 2025-03-11 | Applied Materials, Inc. | Baffle for anti-rotation process kit for substrate processing chamber |
USD1056019S1 (en) * | 2022-08-29 | 2024-12-31 | Shenzhen Anymore Technology Limited | Filter for photography |
USD1055139S1 (en) * | 2022-09-11 | 2024-12-24 | Shenzhen Anymore Technology Limited | Filter for photography |
USD1041537S1 (en) * | 2023-05-01 | 2024-09-10 | Jiangmen Kase Optics Co., Ltd | Magnetic filter |
Also Published As
Publication number | Publication date |
---|---|
JP1646505S (zh) | 2019-11-25 |
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Legal Events
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FEPP | Fee payment procedure |
Free format text: ENTITY STATUS SET TO UNDISCOUNTED (ORIGINAL EVENT CODE: BIG.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |