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USD981972S1 - Adiabatic plate for substrate processing appratus - Google Patents

Adiabatic plate for substrate processing appratus Download PDF

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Publication number
USD981972S1
USD981972S1 US29/808,582 US202129808582F USD981972S US D981972 S1 USD981972 S1 US D981972S1 US 202129808582 F US202129808582 F US 202129808582F US D981972 S USD981972 S US D981972S
Authority
US
United States
Prior art keywords
substrate processing
adiabatic plate
processing appratus
appratus
adiabatic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/808,582
Inventor
Shinya Morita
Seiyo Nakashima
Satoru Murata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Electric Corp
Original Assignee
Kokusai Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kokusai Electric Corp filed Critical Kokusai Electric Corp
Assigned to Kokusai Electric Corporation reassignment Kokusai Electric Corporation ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: MURATA, SATORU, NAKASHIMA, SEIYO, MORITA, SHINY
Application granted granted Critical
Publication of USD981972S1 publication Critical patent/USD981972S1/en
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Description

FIG. 1 is a front, top and right side perspective view of an adiabatic plate for substrate processing appratus showing our new design;
FIG. 2 is a front elevational view thereof;
FIG. 3 is a rear elevational view thereof;
FIG. 4 is a top plan view thereof;
FIG. 5 is a bottom plan view thereof;
FIG. 6 is a left side elevational view thereof;
FIG. 7 is a right side elevational view thereof; and,
FIG. 8 is a cross sectional view taken along line 8-8 in FIG. 2 .

Claims (1)

    CLAIM
  1. The ornamental design for an adiabatic plate for substrate processing appratus, as shown and described.
US29/808,582 2021-03-22 2021-09-21 Adiabatic plate for substrate processing appratus Active USD981972S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2021005833F JP1700781S (en) 2021-03-22 2021-03-22 Heat insulating plate for substrate processing equipment
JP2021-005833D 2021-03-22

Publications (1)

Publication Number Publication Date
USD981972S1 true USD981972S1 (en) 2023-03-28

Family

ID=78766347

Family Applications (1)

Application Number Title Priority Date Filing Date
US29/808,582 Active USD981972S1 (en) 2021-03-22 2021-09-21 Adiabatic plate for substrate processing appratus

Country Status (3)

Country Link
US (1) USD981972S1 (en)
JP (1) JP1700781S (en)
TW (1) TWD225036S (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1053157S1 (en) * 2022-08-10 2024-12-03 Kokusai Electric Corporation Heat reflector for semiconductor manufacturing equipment
USD1054388S1 (en) * 2021-10-15 2024-12-17 Shin-Etsu Chemical Co., Ltd. Carrier substrate for handling

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040256284A1 (en) * 2002-11-26 2004-12-23 Masatoshi Nanjo Cassette for storing a plurality of semiconductor wafers
USD547147S1 (en) * 2006-09-01 2007-07-24 Huy Tran Window tinting tool
USD615937S1 (en) * 2009-03-06 2010-05-18 Tokyo Electron Limited Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers
USD654883S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD654884S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD655259S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD655257S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD916037S1 (en) * 2018-05-18 2021-04-13 Kokusai Electric Corporation Cover of seal cap for reaction chamber for semiconductor
USD924823S1 (en) 2018-07-19 2021-07-13 Kokusai Electric Corporation Adiabatic plate for substrate processing apparatus

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040256284A1 (en) * 2002-11-26 2004-12-23 Masatoshi Nanjo Cassette for storing a plurality of semiconductor wafers
USD547147S1 (en) * 2006-09-01 2007-07-24 Huy Tran Window tinting tool
USD615937S1 (en) * 2009-03-06 2010-05-18 Tokyo Electron Limited Heat radiation fin of heat insulating cylinder for manufacturing semiconductor wafers
USD654883S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD654884S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD655259S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD655257S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Top plate for reactor for manufacturing semiconductor
USD916037S1 (en) * 2018-05-18 2021-04-13 Kokusai Electric Corporation Cover of seal cap for reaction chamber for semiconductor
USD924823S1 (en) 2018-07-19 2021-07-13 Kokusai Electric Corporation Adiabatic plate for substrate processing apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1054388S1 (en) * 2021-10-15 2024-12-17 Shin-Etsu Chemical Co., Ltd. Carrier substrate for handling
USD1053157S1 (en) * 2022-08-10 2024-12-03 Kokusai Electric Corporation Heat reflector for semiconductor manufacturing equipment

Also Published As

Publication number Publication date
TWD225036S (en) 2023-05-01
JP1700781S (en) 2021-11-29

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