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USD837754S1 - Plasma chamber liner - Google Patents

Plasma chamber liner Download PDF

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Publication number
USD837754S1
USD837754S1 US29/602,217 US201729602217F USD837754S US D837754 S1 USD837754 S1 US D837754S1 US 201729602217 F US201729602217 F US 201729602217F US D837754 S USD837754 S US D837754S
Authority
US
United States
Prior art keywords
plasma chamber
chamber liner
liner
view
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
US29/602,217
Inventor
Eric Kihara Shono
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Materials Inc
Original Assignee
Applied Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Applied Materials Inc filed Critical Applied Materials Inc
Priority to US29/602,217 priority Critical patent/USD837754S1/en
Assigned to APPLIED MATERIALS, INC. reassignment APPLIED MATERIALS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SHONO, ERIC KIHARA
Application granted granted Critical
Publication of USD837754S1 publication Critical patent/USD837754S1/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Description

FIG. 1 is a top isometric view of a plasma chamber liner showing my new design;
FIG. 2 is a bottom isometric view thereof;
FIG. 3 is a top plan view thereof;
FIG. 4 is a bottom plan view thereof;
FIG. 5 is a side elevational view thereof;
FIG. 6 is an opposite side elevational view thereof; and,
FIG. 7 is a front elevational view thereof, a rear elevational view being identical.

Claims (1)

    CLAIM
  1. The ornamental design for a plasma chamber liner, as shown and described.
US29/602,217 2017-04-28 2017-04-28 Plasma chamber liner Active USD837754S1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US29/602,217 USD837754S1 (en) 2017-04-28 2017-04-28 Plasma chamber liner

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US29/602,217 USD837754S1 (en) 2017-04-28 2017-04-28 Plasma chamber liner

Publications (1)

Publication Number Publication Date
USD837754S1 true USD837754S1 (en) 2019-01-08

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Family Applications (1)

Application Number Title Priority Date Filing Date
US29/602,217 Active USD837754S1 (en) 2017-04-28 2017-04-28 Plasma chamber liner

Country Status (1)

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US (1) USD837754S1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD925481S1 (en) * 2018-12-06 2021-07-20 Kokusai Electric Corporation Inlet liner for substrate processing apparatus
USD1023987S1 (en) * 2018-01-24 2024-04-23 Applied Materials, Inc. Chamber inlet

Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5964947A (en) * 1996-07-12 1999-10-12 Applied Materials, Inc. Removable pumping channel liners within a chemical vapor deposition chamber
US6277237B1 (en) * 1998-09-30 2001-08-21 Lam Research Corporation Chamber liner for semiconductor process chambers
US6374871B2 (en) * 1999-05-25 2002-04-23 Micron Technology, Inc. Liner for use in processing chamber
US7011039B1 (en) * 2000-07-07 2006-03-14 Applied Materials, Inc. Multi-purpose processing chamber with removable chamber liner
USD658693S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658691S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658692S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD678228S1 (en) * 2011-03-30 2013-03-19 Tokyo Electron Limited Chamber block
USD699692S1 (en) * 2012-01-19 2014-02-18 Applied Materials, Inc. Upper liner
US20140116366A1 (en) 2011-04-21 2014-05-01 Eaton Corporation Pivot foot for deactivating rocker arm
US8858754B2 (en) * 2010-05-25 2014-10-14 Tokyo Electron Limited Plasma processing apparatus
USD716239S1 (en) * 2013-11-06 2014-10-28 Applied Materials, Inc. Upper chamber liner
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
US20140322897A1 (en) 2013-04-30 2014-10-30 Applied Materials, Inc. Flow controlled liner having spatially distributed gas passages
USD717746S1 (en) * 2013-11-06 2014-11-18 Applied Materials, Inc. Lower chamber liner
US8980005B2 (en) 2011-03-22 2015-03-17 Applied Materials, Inc. Liner assembly for chemical vapor deposition chamber
USD802545S1 (en) * 2015-06-12 2017-11-14 Hitachi High-Technologies Corporation Lower chamber for a plasma processing apparatus
USD804436S1 (en) * 2015-06-12 2017-12-05 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus
USD812578S1 (en) * 2016-02-26 2018-03-13 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus

Patent Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5964947A (en) * 1996-07-12 1999-10-12 Applied Materials, Inc. Removable pumping channel liners within a chemical vapor deposition chamber
US6277237B1 (en) * 1998-09-30 2001-08-21 Lam Research Corporation Chamber liner for semiconductor process chambers
US6374871B2 (en) * 1999-05-25 2002-04-23 Micron Technology, Inc. Liner for use in processing chamber
US7011039B1 (en) * 2000-07-07 2006-03-14 Applied Materials, Inc. Multi-purpose processing chamber with removable chamber liner
US8858754B2 (en) * 2010-05-25 2014-10-14 Tokyo Electron Limited Plasma processing apparatus
US8980005B2 (en) 2011-03-22 2015-03-17 Applied Materials, Inc. Liner assembly for chemical vapor deposition chamber
USD658693S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658691S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD658692S1 (en) * 2011-03-30 2012-05-01 Tokyo Electron Limited Liner for plasma processing apparatus
USD678228S1 (en) * 2011-03-30 2013-03-19 Tokyo Electron Limited Chamber block
US20140116366A1 (en) 2011-04-21 2014-05-01 Eaton Corporation Pivot foot for deactivating rocker arm
USD699692S1 (en) * 2012-01-19 2014-02-18 Applied Materials, Inc. Upper liner
US20140322897A1 (en) 2013-04-30 2014-10-30 Applied Materials, Inc. Flow controlled liner having spatially distributed gas passages
USD717746S1 (en) * 2013-11-06 2014-11-18 Applied Materials, Inc. Lower chamber liner
USD716239S1 (en) * 2013-11-06 2014-10-28 Applied Materials, Inc. Upper chamber liner
USD716240S1 (en) * 2013-11-07 2014-10-28 Applied Materials, Inc. Lower chamber liner
USD802545S1 (en) * 2015-06-12 2017-11-14 Hitachi High-Technologies Corporation Lower chamber for a plasma processing apparatus
USD804436S1 (en) * 2015-06-12 2017-12-05 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus
USD812578S1 (en) * 2016-02-26 2018-03-13 Hitachi High-Technologies Corporation Upper chamber for a plasma processing apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD875054S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875055S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD875053S1 (en) * 2017-04-28 2020-02-11 Applied Materials, Inc. Plasma connector liner
USD882536S1 (en) * 2017-04-28 2020-04-28 Applied Materials, Inc. Plasma source liner
USD1023987S1 (en) * 2018-01-24 2024-04-23 Applied Materials, Inc. Chamber inlet
USD925481S1 (en) * 2018-12-06 2021-07-20 Kokusai Electric Corporation Inlet liner for substrate processing apparatus

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