USD826300S1 - Rotably mounted thermal plasma burner for thermalspraying - Google Patents
Rotably mounted thermal plasma burner for thermalspraying Download PDFInfo
- Publication number
- USD826300S1 USD826300S1 US35/355,031 US35503131F USD826300S US D826300 S1 USD826300 S1 US D826300S1 US 35503131 F US35503131 F US 35503131F US D826300 S USD826300 S US D826300S
- Authority
- US
- United States
- Prior art keywords
- thermalspraying
- thermal plasma
- plasma burner
- rotably mounted
- mounted thermal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000007751 thermal spraying Methods 0.000 title claims description 3
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B21—MECHANICAL METAL-WORKING WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D—WORKING OR PROCESSING OF SHEET METAL OR METAL TUBES, RODS OR PROFILES WITHOUT ESSENTIALLY REMOVING MATERIAL; PUNCHING METAL
- B21D31/00—Other methods for working sheet metal, metal tubes, metal profiles
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
Description
1. Rotably mounted thermal plasma burner for thermal spraying
Claims (1)
- The ornamental design for a rotably mounted thermal plasma burner for thermal spraying, as shown and described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US35/355,031 USD826300S1 (en) | 2016-09-30 | 2016-09-30 | Rotably mounted thermal plasma burner for thermalspraying |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US35/355,031 USD826300S1 (en) | 2016-09-30 | 2016-09-30 | Rotably mounted thermal plasma burner for thermalspraying |
Publications (1)
Publication Number | Publication Date |
---|---|
USD826300S1 true USD826300S1 (en) | 2018-08-21 |
Family
ID=63144488
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US35/355,031 Active USD826300S1 (en) | 2016-09-30 | 2016-09-30 | Rotably mounted thermal plasma burner for thermalspraying |
Country Status (1)
Country | Link |
---|---|
US (1) | USD826300S1 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD849228S1 (en) * | 2017-12-19 | 2019-05-21 | Systems Spray-Cooled, Inc | Burner bump out |
USD849227S1 (en) * | 2017-12-12 | 2019-05-21 | Systems Spray-Cooled, Inc. | Burner bump out |
USD851237S1 (en) * | 2017-11-01 | 2019-06-11 | Systems Spray-Cooled, Inc | Watertight sidewall dustcover |
USD851743S1 (en) * | 2017-12-19 | 2019-06-18 | Systems Spray-Cooled, Inc | Burner bump out |
Citations (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4345744A (en) * | 1980-05-11 | 1982-08-24 | Trumpf Gmbh & Co. | Working machine with flame cutter and cooling unit |
US4392927A (en) * | 1981-02-21 | 1983-07-12 | Heraeus Elektroden Gmbh | Novel electrode |
US4423546A (en) * | 1981-09-04 | 1984-01-03 | W. A. Whitney Corp. | Punch press with automatic tool changer |
USD275016S (en) * | 1982-03-17 | 1984-08-07 | Mototsugu Matsuo | Apparatus for cutting by melting |
US4486941A (en) * | 1981-09-04 | 1984-12-11 | W. A. Whitney Corp. | Punch press with automatic tool changer |
US5273957A (en) * | 1990-12-04 | 1993-12-28 | Hoechst Aktiengesellschaft | Thermally sprayed lead-containing thick layers |
USD490450S1 (en) * | 2002-05-20 | 2004-05-25 | Tokyo Electron Limited | Exhaust ring for semiconductor equipment |
USD505963S1 (en) * | 2004-01-16 | 2005-06-07 | Thermal Dynamics Corporation | Electrode for a plasma arc torch |
USD519135S1 (en) * | 2004-01-16 | 2006-04-18 | Thermal Dynamics Corporation | Tip for a plasma arc torch |
US7211177B2 (en) * | 2002-01-03 | 2007-05-01 | Bayer Aktiengesellschaft | Electrode for electrolysis in acidic media |
USD571383S1 (en) * | 2005-07-29 | 2008-06-17 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
USD571831S1 (en) * | 2005-07-29 | 2008-06-24 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
USD571833S1 (en) * | 2005-07-29 | 2008-06-24 | Tokyo Electron Limited | Top panel for microwave introduction window of plasma processing apparatus |
USD571832S1 (en) * | 2005-07-29 | 2008-06-24 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
USD572733S1 (en) * | 2005-07-29 | 2008-07-08 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
USD582949S1 (en) * | 2006-12-15 | 2008-12-16 | Tokyo Electron Limited | Cover for a heater stage of a plasma processing apparatus |
USD583394S1 (en) * | 2006-12-15 | 2008-12-23 | Tokyo Electron Limited | Cover for a heater stage of a plasma processing apparatus |
USD583395S1 (en) * | 2006-12-15 | 2008-12-23 | Tokyo Electron Limited | Cover for a heater stage of a plasma processing apparatus |
USD593585S1 (en) * | 2005-07-29 | 2009-06-02 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
USD594485S1 (en) * | 2005-07-29 | 2009-06-16 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
US7578451B2 (en) * | 2005-02-11 | 2009-08-25 | Sulzer Metco Ag | Apparatus for thermal spraying |
US7892609B2 (en) * | 2004-11-02 | 2011-02-22 | Sulzer Metco Ag | Thermal spraying apparatus and also a thermal spraying process |
USD645486S1 (en) * | 2010-03-31 | 2011-09-20 | Tokyo Electron Limited | Dielectric window for plasma processing device |
USD658692S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD658693S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD658691S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD672377S1 (en) * | 2010-03-31 | 2012-12-11 | Tokyo Electron Limited | Dielectric window for plasma processing device |
USD694791S1 (en) * | 2011-09-20 | 2013-12-03 | Tokyo Electron Limited | Baffle plate for manufacturing semiconductor |
USD694790S1 (en) * | 2011-09-20 | 2013-12-03 | Tokyo Electron Limited | Baffle plate for manufacturing semiconductor |
US8871010B2 (en) * | 2011-03-23 | 2014-10-28 | Malko Gindrat | Plasma spray method for the manufacture of an ion conductive membrane |
USD721110S1 (en) * | 2012-05-10 | 2015-01-13 | Robert F. Savill, Jr. | Plasma gun |
USD721749S1 (en) * | 2012-05-10 | 2015-01-27 | Robert F. Savill, Jr. | Plasma gun |
USD775249S1 (en) * | 2015-04-01 | 2016-12-27 | Koike Sanso Kogyo Co., Ltd. | Inner nozzle for plasma torch |
USD776177S1 (en) * | 2015-10-13 | 2017-01-10 | Lincoln Global, Inc. | Air cooled plasma torch electrode |
USD776730S1 (en) * | 2015-01-30 | 2017-01-17 | Komatsu Ltd. | Plasma torch cartridge |
USD776731S1 (en) * | 2015-01-30 | 2017-01-17 | Komatsu Ltd. | Plasma torch cartridge |
USD777812S1 (en) * | 2015-10-13 | 2017-01-31 | Lincoln Global, Inc. | Liquid cooled plasma torch electrode |
USD784432S1 (en) * | 2015-01-30 | 2017-04-18 | Komatsu Ltd. | Plasma torch electrode |
USD796562S1 (en) * | 2016-04-11 | 2017-09-05 | Applied Materials, Inc. | Plasma outlet liner |
USD802034S1 (en) * | 2015-01-30 | 2017-11-07 | Komatsu Ltd. | Plasma torch electrode |
USD804436S1 (en) * | 2015-06-12 | 2017-12-05 | Hitachi High-Technologies Corporation | Upper chamber for a plasma processing apparatus |
USD812578S1 (en) * | 2016-02-26 | 2018-03-13 | Hitachi High-Technologies Corporation | Upper chamber for a plasma processing apparatus |
-
2016
- 2016-09-30 US US35/355,031 patent/USD826300S1/en active Active
Patent Citations (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4345744A (en) * | 1980-05-11 | 1982-08-24 | Trumpf Gmbh & Co. | Working machine with flame cutter and cooling unit |
US4392927A (en) * | 1981-02-21 | 1983-07-12 | Heraeus Elektroden Gmbh | Novel electrode |
US4423546A (en) * | 1981-09-04 | 1984-01-03 | W. A. Whitney Corp. | Punch press with automatic tool changer |
US4486941A (en) * | 1981-09-04 | 1984-12-11 | W. A. Whitney Corp. | Punch press with automatic tool changer |
USD275016S (en) * | 1982-03-17 | 1984-08-07 | Mototsugu Matsuo | Apparatus for cutting by melting |
US5273957A (en) * | 1990-12-04 | 1993-12-28 | Hoechst Aktiengesellschaft | Thermally sprayed lead-containing thick layers |
US7211177B2 (en) * | 2002-01-03 | 2007-05-01 | Bayer Aktiengesellschaft | Electrode for electrolysis in acidic media |
USD490450S1 (en) * | 2002-05-20 | 2004-05-25 | Tokyo Electron Limited | Exhaust ring for semiconductor equipment |
USD505963S1 (en) * | 2004-01-16 | 2005-06-07 | Thermal Dynamics Corporation | Electrode for a plasma arc torch |
USD519135S1 (en) * | 2004-01-16 | 2006-04-18 | Thermal Dynamics Corporation | Tip for a plasma arc torch |
US7892609B2 (en) * | 2004-11-02 | 2011-02-22 | Sulzer Metco Ag | Thermal spraying apparatus and also a thermal spraying process |
US7578451B2 (en) * | 2005-02-11 | 2009-08-25 | Sulzer Metco Ag | Apparatus for thermal spraying |
USD571383S1 (en) * | 2005-07-29 | 2008-06-17 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
USD594485S1 (en) * | 2005-07-29 | 2009-06-16 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
USD572733S1 (en) * | 2005-07-29 | 2008-07-08 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
USD571832S1 (en) * | 2005-07-29 | 2008-06-24 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
USD571831S1 (en) * | 2005-07-29 | 2008-06-24 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
USD571833S1 (en) * | 2005-07-29 | 2008-06-24 | Tokyo Electron Limited | Top panel for microwave introduction window of plasma processing apparatus |
USD593585S1 (en) * | 2005-07-29 | 2009-06-02 | Tokyo Electron Limited | Top panel for microwave introduction window of a plasma processing apparatus |
USD583394S1 (en) * | 2006-12-15 | 2008-12-23 | Tokyo Electron Limited | Cover for a heater stage of a plasma processing apparatus |
USD583395S1 (en) * | 2006-12-15 | 2008-12-23 | Tokyo Electron Limited | Cover for a heater stage of a plasma processing apparatus |
USD582949S1 (en) * | 2006-12-15 | 2008-12-16 | Tokyo Electron Limited | Cover for a heater stage of a plasma processing apparatus |
USD645486S1 (en) * | 2010-03-31 | 2011-09-20 | Tokyo Electron Limited | Dielectric window for plasma processing device |
USD672377S1 (en) * | 2010-03-31 | 2012-12-11 | Tokyo Electron Limited | Dielectric window for plasma processing device |
US8871010B2 (en) * | 2011-03-23 | 2014-10-28 | Malko Gindrat | Plasma spray method for the manufacture of an ion conductive membrane |
USD658692S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD658693S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD658691S1 (en) * | 2011-03-30 | 2012-05-01 | Tokyo Electron Limited | Liner for plasma processing apparatus |
USD694791S1 (en) * | 2011-09-20 | 2013-12-03 | Tokyo Electron Limited | Baffle plate for manufacturing semiconductor |
USD694790S1 (en) * | 2011-09-20 | 2013-12-03 | Tokyo Electron Limited | Baffle plate for manufacturing semiconductor |
USD721110S1 (en) * | 2012-05-10 | 2015-01-13 | Robert F. Savill, Jr. | Plasma gun |
USD721749S1 (en) * | 2012-05-10 | 2015-01-27 | Robert F. Savill, Jr. | Plasma gun |
USD784432S1 (en) * | 2015-01-30 | 2017-04-18 | Komatsu Ltd. | Plasma torch electrode |
USD802034S1 (en) * | 2015-01-30 | 2017-11-07 | Komatsu Ltd. | Plasma torch electrode |
USD776730S1 (en) * | 2015-01-30 | 2017-01-17 | Komatsu Ltd. | Plasma torch cartridge |
USD776731S1 (en) * | 2015-01-30 | 2017-01-17 | Komatsu Ltd. | Plasma torch cartridge |
USD775249S1 (en) * | 2015-04-01 | 2016-12-27 | Koike Sanso Kogyo Co., Ltd. | Inner nozzle for plasma torch |
USD804436S1 (en) * | 2015-06-12 | 2017-12-05 | Hitachi High-Technologies Corporation | Upper chamber for a plasma processing apparatus |
USD777812S1 (en) * | 2015-10-13 | 2017-01-31 | Lincoln Global, Inc. | Liquid cooled plasma torch electrode |
USD776177S1 (en) * | 2015-10-13 | 2017-01-10 | Lincoln Global, Inc. | Air cooled plasma torch electrode |
USD812578S1 (en) * | 2016-02-26 | 2018-03-13 | Hitachi High-Technologies Corporation | Upper chamber for a plasma processing apparatus |
USD796562S1 (en) * | 2016-04-11 | 2017-09-05 | Applied Materials, Inc. | Plasma outlet liner |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
USD851237S1 (en) * | 2017-11-01 | 2019-06-11 | Systems Spray-Cooled, Inc | Watertight sidewall dustcover |
USD849227S1 (en) * | 2017-12-12 | 2019-05-21 | Systems Spray-Cooled, Inc. | Burner bump out |
USD849228S1 (en) * | 2017-12-19 | 2019-05-21 | Systems Spray-Cooled, Inc | Burner bump out |
USD851743S1 (en) * | 2017-12-19 | 2019-06-18 | Systems Spray-Cooled, Inc | Burner bump out |
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