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US4456999A - Terrace-shaped substrate semiconductor laser - Google Patents

Terrace-shaped substrate semiconductor laser Download PDF

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Publication number
US4456999A
US4456999A US06/270,352 US27035281A US4456999A US 4456999 A US4456999 A US 4456999A US 27035281 A US27035281 A US 27035281A US 4456999 A US4456999 A US 4456999A
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Prior art keywords
layer
region
oblique
lasing
current
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Expired - Fee Related
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US06/270,352
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English (en)
Inventor
Takashi Sugino
Kunio Itoh
Masaru Wada
Hirokazu Shimizu
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Panasonic Holdings Corp
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Matsushita Electric Industrial Co Ltd
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Assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD., 1006, OAZA-KADOMA, KADOMA-SHI, OSAKA-FU, 571 JAPAN reassignment MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD., 1006, OAZA-KADOMA, KADOMA-SHI, OSAKA-FU, 571 JAPAN ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: ITOH, KUNIO, SHIMIZU, HIROKAZU, SUGINO, TAKASHI, WADA, MASARU
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00—Semiconductor lasers
    • H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/223—Buried stripe structure
    • H01S5/2238—Buried stripe structure with a terraced structure

Definitions

  • the present invention relates to an improvement in a semiconductor laser of terraced substrate type.
  • Semiconductor laser has advantages of smallness of bulk, high efficiency and direct modulation by means of its current, and therefore has a bright future as light sources for optical communication, optical data processing.
  • Laser for such use necessitates characteristics of stable fundamental transverse mode lasing, low threshold current, high output of light and high reliability.
  • the conventional laser which has a structure of simple gain guiding has a difficulty in maintaining a transverse mode for a wide range of current, and therefore is liable to occurrence of undesirable mode conversion or a generation of higher modes.
  • the light-current characteristic is likely to have a kink of characteristic curve or the device is likely to have a multiple longitudinal mode oscillation.
  • FIG. 1, FIG. 2 and FIG. 3 show various types of conventional semiconductor stripe laser, wherein FIG. 1 shows a planar stripe laser.
  • the laser of FIG. 1 has a doublehetero structure which has on
  • Numeral 7 and 8 designate p-side and n-side electrode ohmicly contacting the current injection region 6 and the substrate 1, respectively.
  • the active layer has a flat structure and has uniform refractive index on all parts thereof. Therefore, the light confinement in the stripe shaped region of width W is not sufficient. Besides, current injected from the current injection region 6 is likely to spread as shown by the curve I of FIG. 1 and spread parts around both sides of the curve does not contribute to the oscillation. On the other hand, if the injected current is increased, the distribution of oscillated light becomes as of curve II which has undesirable peaks 9, 9 on side parts, resulting in loss of single fundamental transverse mode of oscillation.
  • FIG. 2 shows structure of another conventional laser, wherein the substrate 1 has a groove 10 of a stripe shaped pattern and on such substrate 1 a first clad layer 2 and an active layer 3 and known subsequent layers 4 and 5 are formed.
  • the stability of single mode oscillation is improved than the laser of FIG. 1; but the structure of the active layer per se is still flat like the structure of FIG. 1, that is, there is no means to limit spreading of the injected current. Accordingly, its threshold current is not sufficiently reduced.
  • FIG. 3 shows still another example of the conventional laser, which has been proposed by some members of the inventors of the present invention.
  • One example of this laser has
  • an active layer 13 having an oblique lasing region 131 of: (non-doped) Ga 1-y Al y As,
  • insulation layer 16 of, for example, an SiO 2 having a stripe shaped opening W at the position above the oblique active region 131 formed over a step T of the substrate 1.
  • electrodes 18 and 17 are formed on the p-side and n-side of the substrate.
  • the active layer has an oblique lasing region 131 defined by an upper bending part and a lower bending part which confines light therebetween
  • the first clad layer 12 has a triangular thick part 121 under the oblique lasing region 131 and upper thinner part and a lower thinner part under an upper horizontal part and a lower horizontal part of the active layer 13, respectively.
  • the thicker part 121 of the first clad layer 12 serves to prevent absorption of light into the substrate 11, while the thinner parts of the first clad layer 12 serves to allow absorption of light therethrough into the substrate 11. Therefore, by the difference of the light absorption from the active layer 13 to the substrate 11, the light is effectively confined in the lasing region 131 which is on the thicker part 121 and between the two bending parts, and thereby a single transverse mode oscillation is easily obtainable, the manufacture thereof is easy and life time thereof is long because of reasonable crystal structure.
  • the first clad layer 12 should be extremely thin at the parts under the above-mentioned "other parts", but such forming of the extremely thin clad layer is not easy.
  • the present invention purposes to provide an improved laser capable of stable fundamental mode lasing at a low threshold current.
  • the laser of the present invention can also provide a stable fundamental single mode lasing even at an operation with a larger injection current for obtaining a strong output light.
  • FIG. 1 is a sectional elevation view of the example of conventional planar type semiconductor laser.
  • FIG. 2 is a sectional elevation view of the example of another type of conventional semiconductor laser.
  • FIG. 3 is a sectional elevation view of the example of conventional terraced substrate type laser.
  • FIG. 4(a), FIG. 4(b), FIG. 4(c) and FIG. 4(d) are sectional elevation views showing steps of manufacturing a semiconductor laser embodying the present invention, wherein FIG. 4(d) shows the finished laser.
  • the semiconductor laser in accordance with the present invention comprises:
  • a terrace-shaped semiconductor substrate having a thinner part and a thicker part with a step inbetween
  • semiconductor epitaxial layers to form a doublehetero structure including an active layer which are formed on the terrace-shaped semiconductor substrate, thereby the active layer comprising an oblique lasing region at the part over a part which is near the step,
  • the impurity diffused region having an impurity opposite to that of the surface layer, the impurity diffused region having a pattern which is substantially parallel to and above the oblique lasing region and a corner of diffusion front near to the step reaches at least the oblique lasing region.
  • the present invention is an improvement of the laser of FIG. 3, wherein the active layer 13 has a thicker and oblique part 131 disposed between an upper and lower bending parts, in order to attain a fundamental transverse mode lasing at the oblique thicker part 131.
  • the improved laser shown in the embodiment of FIG. 4(d) has a diffused current-injection region on top of the configuration of FIG. 3. That is, the embodiment of FIG. 4(d) has
  • a p-side electrode 28 and an n-side electrode 29 are formed on the p-side face and n-side face of the above-mentioned wafer.
  • the diffused region 27 is disposed in a stripe-shaped pattern at such position and to such depth that its one corner part penetrates the oblique lasing region 231 of the active layer 23, and its other corner lies on the lower part of the terrace-shaped substrate 21.
  • the carrier concentration of the n-type first clad layer 22 is selected sufficiently large in order that at the diffusion of Zn therein the diffused part therein does not change its conductivity type.
  • the carrier concentration of the p-type second clad layer 24 is selected low thereby to raise specific resistance thereof in order to restrict lateral spreading of the injected current from the current injection region 27.
  • the injected current is taken in flowing through the diffused region 27 and injected in the oblique lasing part 231 of the active layer 23, and makes oscillation therein. Since the oblique lasing part 231 has a larger thickness than the horizontal parts of the active layer 23, the oscillation of transverse mode is stably confined in the oblique lasing part 231.
  • a step of about 1.5 ⁇ m height is formed by chemical etching in the direction of ⁇ 011> on a (100) surface of an n-GaAs substrate 21 as shown in FIG. 4(a), thus forming a terraced substrate.
  • the following layers are sequentially formed by means of known sequential liquid phase epitaxial growth method:
  • a first clad layer 22 having triangular section part 221 at the step part, of: Ga 0 .65 Al 0 .35 As of about 0.2 ⁇ m thick at horizontal parts and about 1 ⁇ m thick at step part,
  • an active layer 23 having oblique lasing part 231 on the triangular section part 221, of: n-Ga 0 .95 Al 0 .05 As of about 1 ⁇ 10 17 cm -3 concentration and about 0.08 ⁇ m thick at horizontal parts and about 0.1 ⁇ m thick at oblique lasing part 231.
  • a second clad layer 24 having oblique part on the oblique lasing part 231, of: p-Ga 0 .65 Al 0 .35 As of about 1 ⁇ 10 17 cm -3 concentration and about 0.5 ⁇ m thick at horizontal parts and about 1 ⁇ m thick at the oblique part, and
  • a cap layer 25 having substantially horizontal and flat upper face, of: n-GaAs of about 5 ⁇ 10 17 cm -3 concentration and about 1 ⁇ m at over the thicker part of the substrate 1.
  • an Si 3 N 4 film 26 is formed to cover the wafer as a mask, and a stripe-shaped opening 261 of about 5 ⁇ m width is formed at the part over and near the foot part of the step of the substrate 1. That is the opening 261 is formed over a stripe shape part which is on the thinner part of the substrate 1 and near the step.
  • a known Zn-diffusion as a p-type impurity is carried out through the opening 261, in a manner that the diffused front reaches at least the oblique lasing region 231, preferably to penetrate the oblique lasing region 231.
  • Diffusion temperature is about 750° C.
  • the opening 261 should be formed in a manner that a corner of the diffusion front which is on the side of the step of the substrate reaches or penetrates the active layer 23 at the oblique lasing part 231. Then, the Si 3 N 4 mask 26 is removed by known method. A p-side electrode film 28 is formed by known vapor deposition method, and an n-side electrode film 29 is formed by known vapor deposition method followed by alloying with the substrate 1. The finished semiconductor laser wafer is then cleaved into individual unit chip and mounted onto a known copper mount (not shown).
  • the current is injected from the p-side electrode 28, through the impurity-diffused region 27, directly to the limited region in the lasing region 231 of the active layer 23, and therefore, the spreading of the injected current in the active layer is drastically limited in comparison with the prior art device of FIG. 3. Therefore, even in an operation of injecting a large current into the active layer, the lasing region is limited to a designed region, different from the conventional device where the lasing region becomes spreaded. Thereby the present semiconductor laser can oscillate with a stable fundamental transverse mode even at a large power oscillation. Furthermore, the threshold current is halved from the conventional device to about 40 mA, and external differential quantum efficiency drastically increases to a value of about 35%.

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  • Physics & Mathematics (AREA)
  • Geometry (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Semiconductor Lasers (AREA)
US06/270,352 1980-06-13 1981-06-04 Terrace-shaped substrate semiconductor laser Expired - Fee Related US4456999A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP55-80586 1980-06-13
JP8058680A JPS575384A (en) 1980-06-13 1980-06-13 Semiconductor laser device

Publications (1)

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US4456999A true US4456999A (en) 1984-06-26

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JP (1) JPS575384A (ja)
CA (1) CA1180094A (ja)
GB (1) GB2080014B (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4571729A (en) * 1982-06-18 1986-02-18 Omron Tateisi Electronics, Co. Semiconductor laser having an inverted layer in a plurality of stepped offset portions
US4785457A (en) * 1987-05-11 1988-11-15 Rockwell International Corporation Heterostructure semiconductor laser
DE3821775A1 (de) * 1988-06-28 1990-01-11 Siemens Ag Halbleiterschichtstruktur fuer laserdiode mit vergrabener heterostruktur
US20050280003A1 (en) * 2004-06-18 2005-12-22 Alps Electric Co., Ltd. Input device and display input device using the same

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2127218B (en) * 1982-08-16 1986-05-21 Omron Tateisi Electronics Co Semiconductor laser
DE3435148A1 (de) * 1984-09-25 1986-04-03 Siemens AG, 1000 Berlin und 8000 München Laserdiode mit vergrabener aktiver schicht und mit seitlicher strombegrezung durch selbstjustierten pn-uebergang sowie verfahren zur herstellung einer solchen laserdiode
JP4087619B2 (ja) 2002-02-27 2008-05-21 住友ゴム工業株式会社 弾性クローラ
KR100571143B1 (ko) * 2005-02-25 2006-04-18 대륙화학공업 주식회사 크로라의 심체구조

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4105955A (en) * 1976-03-11 1978-08-08 Nippon Electric Co., Ltd. Heterostructure laser having a stripe region defined in an active layer by a difference in impurity
JPS54107284A (en) * 1978-02-10 1979-08-22 Nec Corp Semiconductor junction laser and its production

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53140984A (en) * 1977-05-13 1978-12-08 Sharp Corp Semiconductor laser element and production of the same
JPS5518094A (en) * 1978-07-27 1980-02-07 Nec Corp Semiconductor laser device with high optical output and horizontal fundamental mode

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4105955A (en) * 1976-03-11 1978-08-08 Nippon Electric Co., Ltd. Heterostructure laser having a stripe region defined in an active layer by a difference in impurity
JPS54107284A (en) * 1978-02-10 1979-08-22 Nec Corp Semiconductor junction laser and its production

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4571729A (en) * 1982-06-18 1986-02-18 Omron Tateisi Electronics, Co. Semiconductor laser having an inverted layer in a plurality of stepped offset portions
US4581743A (en) * 1982-06-18 1986-04-08 Omron Tateisi Electronics Co. Semiconductor laser having an inverted layer in a stepped offset portion
US4785457A (en) * 1987-05-11 1988-11-15 Rockwell International Corporation Heterostructure semiconductor laser
DE3821775A1 (de) * 1988-06-28 1990-01-11 Siemens Ag Halbleiterschichtstruktur fuer laserdiode mit vergrabener heterostruktur
US20050280003A1 (en) * 2004-06-18 2005-12-22 Alps Electric Co., Ltd. Input device and display input device using the same
US8531391B2 (en) * 2004-06-18 2013-09-10 Alps Electric Co., Ltd. Input device and display input device using the same

Also Published As

Publication number Publication date
JPS575384A (en) 1982-01-12
CA1180094A (en) 1984-12-27
GB2080014B (en) 1984-10-03
GB2080014A (en) 1982-01-27

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