US3834999A - Electrolytic production of glassy layers on metals - Google Patents
Electrolytic production of glassy layers on metals Download PDFInfo
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- US3834999A US3834999A US00134431A US13443171A US3834999A US 3834999 A US3834999 A US 3834999A US 00134431 A US00134431 A US 00134431A US 13443171 A US13443171 A US 13443171A US 3834999 A US3834999 A US 3834999A
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- Prior art keywords
- metals
- metal
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- rectifier
- voltage
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- 229910052751 metal Inorganic materials 0.000 title abstract description 83
- 239000002184 metal Substances 0.000 title abstract description 83
- 150000002739 metals Chemical class 0.000 title abstract description 31
- 238000004519 manufacturing process Methods 0.000 title description 3
- 238000000034 method Methods 0.000 abstract description 36
- 229910045601 alloy Inorganic materials 0.000 abstract description 23
- 239000000956 alloy Substances 0.000 abstract description 23
- 150000001450 anions Chemical class 0.000 abstract description 17
- 230000015271 coagulation Effects 0.000 abstract description 8
- 238000005345 coagulation Methods 0.000 abstract description 8
- 230000001464 adherent effect Effects 0.000 abstract description 7
- BTBUEUYNUDRHOZ-UHFFFAOYSA-N Borate Chemical compound [O-]B([O-])[O-] BTBUEUYNUDRHOZ-UHFFFAOYSA-N 0.000 abstract description 6
- 238000002048 anodisation reaction Methods 0.000 abstract description 6
- PBYZMCDFOULPGH-UHFFFAOYSA-N tungstate Chemical compound [O-][W]([O-])(=O)=O PBYZMCDFOULPGH-UHFFFAOYSA-N 0.000 abstract description 6
- 239000000084 colloidal system Substances 0.000 abstract description 5
- MEFBJEMVZONFCJ-UHFFFAOYSA-N molybdate Chemical compound [O-][Mo]([O-])(=O)=O MEFBJEMVZONFCJ-UHFFFAOYSA-N 0.000 abstract description 5
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 abstract description 4
- 229940000489 arsenate Drugs 0.000 abstract description 4
- DJHGAFSJWGLOIV-UHFFFAOYSA-K Arsenate3- Chemical compound [O-][As]([O-])([O-])=O DJHGAFSJWGLOIV-UHFFFAOYSA-K 0.000 abstract description 3
- -1 PHOPHATE Chemical compound 0.000 abstract description 3
- ZCDOYSPFYFSLEW-UHFFFAOYSA-N chromate(2-) Chemical compound [O-][Cr]([O-])(=O)=O ZCDOYSPFYFSLEW-UHFFFAOYSA-N 0.000 abstract description 3
- SOCTUWSJJQCPFX-UHFFFAOYSA-N dichromate(2-) Chemical compound [O-][Cr](=O)(=O)O[Cr]([O-])(=O)=O SOCTUWSJJQCPFX-UHFFFAOYSA-N 0.000 abstract description 3
- 229940071182 stannate Drugs 0.000 abstract description 3
- 239000011241 protective layer Substances 0.000 abstract description 2
- 238000000576 coating method Methods 0.000 description 25
- 239000010410 layer Substances 0.000 description 24
- 239000011248 coating agent Substances 0.000 description 19
- 229910052782 aluminium Inorganic materials 0.000 description 13
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 12
- 230000008021 deposition Effects 0.000 description 12
- 239000011521 glass Substances 0.000 description 10
- 229910052742 iron Inorganic materials 0.000 description 10
- 239000010936 titanium Substances 0.000 description 10
- 229910052719 titanium Inorganic materials 0.000 description 10
- 229910052791 calcium Inorganic materials 0.000 description 8
- 229910052804 chromium Inorganic materials 0.000 description 8
- 229910052735 hafnium Inorganic materials 0.000 description 8
- 229910052746 lanthanum Inorganic materials 0.000 description 8
- 239000000203 mixture Substances 0.000 description 8
- 229910052759 nickel Inorganic materials 0.000 description 8
- 229910052758 niobium Inorganic materials 0.000 description 8
- 229910052726 zirconium Inorganic materials 0.000 description 8
- 230000015556 catabolic process Effects 0.000 description 7
- 238000005260 corrosion Methods 0.000 description 7
- 230000007797 corrosion Effects 0.000 description 7
- 229910052748 manganese Inorganic materials 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 5
- 230000000694 effects Effects 0.000 description 5
- 239000000243 solution Substances 0.000 description 5
- 229910019142 PO4 Inorganic materials 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 239000003513 alkali Substances 0.000 description 4
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 4
- 229910052707 ruthenium Inorganic materials 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 229910052720 vanadium Inorganic materials 0.000 description 4
- 150000007513 acids Chemical class 0.000 description 3
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 3
- AAQNGTNRWPXMPB-UHFFFAOYSA-N dipotassium;dioxido(dioxo)tungsten Chemical compound [K+].[K+].[O-][W]([O-])(=O)=O AAQNGTNRWPXMPB-UHFFFAOYSA-N 0.000 description 3
- 239000003973 paint Substances 0.000 description 3
- 239000010452 phosphate Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- 239000011734 sodium Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- 239000004115 Sodium Silicate Substances 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000002378 acidificating effect Effects 0.000 description 2
- 150000008044 alkali metal hydroxides Chemical class 0.000 description 2
- 239000012670 alkaline solution Substances 0.000 description 2
- APUPEJJSWDHEBO-UHFFFAOYSA-P ammonium molybdate Chemical compound [NH4+].[NH4+].[O-][Mo]([O-])(=O)=O APUPEJJSWDHEBO-UHFFFAOYSA-P 0.000 description 2
- 229940010552 ammonium molybdate Drugs 0.000 description 2
- 235000018660 ammonium molybdate Nutrition 0.000 description 2
- 239000011609 ammonium molybdate Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005137 deposition process Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- 239000000839 emulsion Substances 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 125000004430 oxygen atom Chemical group O* 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 229910052708 sodium Inorganic materials 0.000 description 2
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 2
- 229910052911 sodium silicate Inorganic materials 0.000 description 2
- XMVONEAAOPAGAO-UHFFFAOYSA-N sodium tungstate Chemical compound [Na+].[Na+].[O-][W]([O-])(=O)=O XMVONEAAOPAGAO-UHFFFAOYSA-N 0.000 description 2
- 125000005402 stannate group Chemical group 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 108010010803 Gelatin Proteins 0.000 description 1
- 229910002651 NO3 Inorganic materials 0.000 description 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 description 1
- 229910018487 Ni—Cr Inorganic materials 0.000 description 1
- 229910019256 POF3 Inorganic materials 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 1
- 239000004111 Potassium silicate Substances 0.000 description 1
- 101100408805 Schizosaccharomyces pombe (strain 972 / ATCC 24843) pof3 gene Proteins 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- 229910010977 Ti—Pd Inorganic materials 0.000 description 1
- FZQSLXQPHPOTHG-UHFFFAOYSA-N [K+].[K+].O1B([O-])OB2OB([O-])OB1O2 Chemical compound [K+].[K+].O1B([O-])OB2OB([O-])OB1O2 FZQSLXQPHPOTHG-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 229910001413 alkali metal ion Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229940063013 borate ion Drugs 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000003518 caustics Substances 0.000 description 1
- 238000005524 ceramic coating Methods 0.000 description 1
- 238000005254 chromizing Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 230000001351 cycling effect Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 210000003298 dental enamel Anatomy 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229920000159 gelatin Polymers 0.000 description 1
- 239000008273 gelatin Substances 0.000 description 1
- 235000019322 gelatine Nutrition 0.000 description 1
- 235000011852 gelatine desserts Nutrition 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910000833 kovar Inorganic materials 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- QGLKJKCYBOYXKC-UHFFFAOYSA-N nonaoxidotritungsten Chemical compound O=[W]1(=O)O[W](=O)(=O)O[W](=O)(=O)O1 QGLKJKCYBOYXKC-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 235000011007 phosphoric acid Nutrition 0.000 description 1
- FFUQCRZBKUBHQT-UHFFFAOYSA-N phosphoryl fluoride Chemical compound FP(F)(F)=O FFUQCRZBKUBHQT-UHFFFAOYSA-N 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- LWIHDJKSTIGBAC-UHFFFAOYSA-K potassium phosphate Substances [K+].[K+].[K+].[O-]P([O-])([O-])=O LWIHDJKSTIGBAC-UHFFFAOYSA-K 0.000 description 1
- 229910000160 potassium phosphate Inorganic materials 0.000 description 1
- 235000011009 potassium phosphates Nutrition 0.000 description 1
- NNHHDJVEYQHLHG-UHFFFAOYSA-N potassium silicate Chemical compound [K+].[K+].[O-][Si]([O-])=O NNHHDJVEYQHLHG-UHFFFAOYSA-N 0.000 description 1
- 229910052913 potassium silicate Inorganic materials 0.000 description 1
- 235000019353 potassium silicate Nutrition 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000012266 salt solution Substances 0.000 description 1
- 239000001488 sodium phosphate Substances 0.000 description 1
- 229910000162 sodium phosphate Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 229910021653 sulphate ion Inorganic materials 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 238000011282 treatment Methods 0.000 description 1
- WUUHFRRPHJEEKV-UHFFFAOYSA-N tripotassium borate Chemical compound [K+].[K+].[K+].[O-]B([O-])[O-] WUUHFRRPHJEEKV-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- 229910001930 tungsten oxide Inorganic materials 0.000 description 1
- 239000002966 varnish Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01G—CAPACITORS; CAPACITORS, RECTIFIERS, DETECTORS, SWITCHING DEVICES, LIGHT-SENSITIVE OR TEMPERATURE-SENSITIVE DEVICES OF THE ELECTROLYTIC TYPE
- H01G9/00—Electrolytic capacitors, rectifiers, detectors, switching devices, light-sensitive or temperature-sensitive devices; Processes of their manufacture
- H01G9/0029—Processes of manufacture
- H01G9/0032—Processes of manufacture formation of the dielectric layer
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D11/00—Electrolytic coating by surface reaction, i.e. forming conversion layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D9/00—Electrolytic coating other than with metals
Definitions
- the metals and alloys which can be coated include those which exhibit electrolytic rectification at both low and high voltages and those which exhibit rectification at high voltages only.
- the anodization baths contain anions such as tungstate, phosphate, arsenate, stannate, stibnate, molybdate, borate, chromate and dichromate, alone or in combination and carbonate, in combination only. Selection of the operating conditions makes it possible to produce coatings which are smooth or which have extended surfaces.
- the process involves coagulation of colloids at the surface of the metals. Either direct or alternating current may be used.
- those metals which show an electrolytic rectifier effect when anodized electro-chemically can be coated with an adherent glassy layer.
- metals which show an electrolytic rectification effect at low as well as high voltages are Mg, Ta, Al, Ti, Nb, Ca, Zr, Hf, La, Mn, Ru, V and their alloys. These may be termed intrinsic rectifier metals.
- Metals which show this effect only at high voltage are Fe, Ni, Cr, Co and their alloys, and may be termed induced rectifier metals.
- metal is used herein to denote both elementary metals and alloys.
- Either type of metal can be coated with a glassy layer by immersing a specimen in a bath ranging from weakly acidic to strongly alkaline and containing at least one anion which yields a solid oxide on loss of charge.
- Suitable anions are tungstate, silicate, borate, phosphate, chromate, dichromate, arsenate, stannate and stibnate, alone or in combination. Carbonate is also useful in combination with other anions.
- the deposition process is effected by making the specimen progressively more anodic until deposition of a colloid, and coagulation of the colloid on the surface of the specimen occur.
- the process for coating metals of the second group is similar except that the voltage must be more rapidly increased during the anodization process and a minimum voltage of at least about 600 v. must be reached.
- Another object of the invention is to provide for such metals a coating which serves as an adhesive underlayer for various burnt varnishes, paints, emulsions, and the like.
- Yet another object of the invention is to provide for A further object of the invention is to provide for such metals a coating which ranges from very smooth to very rough and which can be made hard enough to abrade steel.
- Still another object of the invention is to provide for such metals a coating which has a high voltage breakdown strength.
- the invention accordingly comprises the several steps and the relation of one or more of such steps with respect to each of the others thereof, which will be exemplified in the method hereinafter disclosed, and the scope of the invention will be indicated in the claims.
- an electrolytic rectifier metal in accordance with the present invention, the metal is connected as the anode to a source of high voltage and immersed in a bath, the composition of which is given below.
- a second metal which is electrolytically insoluble is connected as the cathode to the source of high voltage and is also immersed in the solution.
- a suitable metal for such a purpose is iron.
- Example 1 G. K siO 30 KOH 150 H O 1000
- Example 2
- Example 1 The strongly alkaline composition of Example 1 yields a hard layer of silica with a high breakdown voltage, in contrast to the type of coating achieved with a mildly alkaline solution as described in the Czechoslovakian patent cited above.
- the composition of Example 3 gives an extremely hard tungsten oxide layer.
- the baths should contain about 15% of alkali. Alkali concentrations between 0.1% and 15% are the most useful.
- tungstate-silicate SiO -12WO '8KOH-10H O the tungstate-borate H BO l2WO -5KOI-I- MH O
- the tungstate-phosphate H PO 12WO KOH2 /2 H O the tungstate-arsenate sodium tungstate, sodium silicate, sodium or potassium tetraborate and boric acid made alkaline with potassium or sodium phosphate.
- Suitable combinations of compounds are ammonium molybdate with potassium tungstate and potassium borate with potassium tungstate.
- the solution must contain at least one oxidic anion from which a glassy oxide can be formed by the removal of one or more oxy gen atoms.
- the borate and the silicate ions can yield B 0 and SiO in a glassy state.
- the intrinsic rectifier metals include Mg, Ta, Ti, Nb, Ca, Al, Zr, Hf, La, Mn, Ru, and V, as well as their alloys.
- Examples of such alloys are Kovar, Rodar alloy 89446, Aluminum 3105, 3003, K845, Udimet 500, Mg AZ92A, A231B, A280A, Ti A, A, Ti6-A14V, and Ti-Pd Alloys.
- Induced rectifier metals include Fe, Ni, Cr and Co as Well as their alloys. Examples of such alloys are the many different types of steels and the Fe-Ni-Cr combinations.
- compositions are particularly suitable for specific metals.
- a bath containing molybdate and phosphate ions produces glasses which are highly adherent to titanium and its alloys.
- the combination can withstand temperatures as high as 1200 C. without loss of adhesion; this is due to the fact that the coefiicient of thermal expansion of the glass can be matched to that of the metal.
- the protective glassy layers have high breakdown voltages; particularly high breakdown voltages are obtained with layers containing tungstate, borate, molybdate, which have an average breakdown voltage of at least 800 v. at a thickness of 1 mm. as measured in accordance with ASTM test B-110-45. Tungstate when predominant in the glass, produces a highly homogeneous layer with a very smooth surface as can be seen by microscopic examination.
- panels of Al 5667-H25 and 500-H14 were coated with a layer of silica 1 mm. thick.
- the panels were exposed to a spray of a 20% salt solution for 245 hours without developing any indication of corrosion.
- Similar panels have withstood the C.A.S.S. corrosion test for 48 hours, the Taber H-ll abrasion test and the 180 bond adhesion test.
- the voltage is started at a low value and gradually increased. Initially, the substrate is oxidized, but when the voltage reaches about 250 v. coagulation of the solution begins. As the voltage is increased spark discharges appear on the surface of the anode. From the color of the spark discharges, it appears that the temperature of the spark discharges may be as high as 1500 C. It is believed that the high temperature resulting from the discharge melts the coagulated mixture into a homogeneous, pore-free glass on the surface of the metal. As indicated, the thickness of the layer depends on the current density and the duration of the process. The deposit may be smooth or rough, and the glass may be soft or hard, depending on its composition.
- the voltage When the oxidation of the surface reaches maximum which is generally within a few seconds from initial immersion, the voltage must be increased in order to maintain flow of current and efficient deposition. Depending on the time and on the voltage used, glassy layers in excess of 1 mm. thick can readily be achieved. It should be noted that a high degree of reproducibility can be obtained by controlling the voltage, the current and the time of the deposition process. Also, the roughness of the surface of the glass layer can be minimized if the deposition current is maintained at a minimum value when the electrical discharge becomes evident on the surface of the electrode. The actual minimum current used will depend on the desired rate of deposition.
- the current density is held in the range of 250500 ma./dm. by adjustment of the voltage.
- the voltage must be raised to at least about 400 v. and may go as high as about 1000 v. At the higher end of the voltage range the surface of the coating becomes rough and may be described as being extended. The coating, however, does not become porous.
- the process for coating the induced rectifier metals is similar except that the voltage i raised rapidly to 250 v. and, in fact, this voltage may be imposed on the specimen prior to immersion in the bath. Also, the minimum voltage to which the piece must be raised to produce a satisfactory coating is about 600 v.
- the diameter of specimens of the induced rectifier metals which can be coated is limited to about 2 mm.
- the length is not limited.
- the color of the electrical discharge will vary in accordance with the cations of the bath. For example, sodium produces a yellow discharge, potassium a violet discharge, sodium tungstate a yellow-white discharge, and potassium tungstate K (H W O a white discharge.
- the optimum bath temperature for coating is 45- 60C., but where the anode is large and substantial amounts of heat are generated during the deposition, it is desirable to use auxiliary cooling means.
- the tungstate layer described above is particularly resistant to corrosion by strong alkali or strong acid environments.
- a bath in which the borate ion is a POant anion produces a glass with a high surface roughness. In fact, the roughness may be so great that the surface appears to be porous so that the layer may be more precisely described as having an extended surface.
- This type of glass has been tested for use as a sublayer for photosensitive gelatin emulsions in the printing field. It is also suitable as a sub-layer for paints and burned varinshes. Tests showed that such layers are of far greater durability than those presently used in this field.
- alternating current, pulsing current or periodic reverse current can also be used for formation of glassy layers, since, due to the electroyltic rectifier effect of the substrate metals, current flows only when the metal is anodic.
- Method of coating an electrolytic rectifier metal selected from the group consisting of Mg, Ta, Ti, Nb, Ca, Zr, Hf, La, Mn, Al, Ru, V, Fe, Ni, Cr, Co and alloys thereof with a glassy, adherent layer comprising the steps of immersing said metal in a bath made strongly alkaline with an alkali metal hydroxide and containing at least one anion selected from the group consisting of B02, BO3 3, B4O7 -2, ASO4 3, CO CI'O4 2, 01107 6 MOO4 2, PO4 3, Ti3O'1 WO4 2, W7O246 and anions resulting from dissolution of SiO 12W0 8KOH -10H O, H BO 12WO SKOH' l4H O,
- H3PO4' H20 and H AsO -9WO -3KOH-2 /zH O in water CO being used only in combination with at least one anion of said group, the total concentration of anion other than hy droxyl lying between about 1.0 and 6.0 weight percent, causing current to flow by making said metal progressively more anodic until deposition, coagulation and visible spark discharge occurs at the surface of said metal, further raising the potential of said metal to a minimum of 400 v. for an intrinsic rectifier metal and to a minimum of 600 v. for an induced rectifier metal, and maintaining said flow of current until the deposit reaches the desired thickness, the diameter of induced rectifier metals being limited to about 2 mm.
- metal is an intrinsic rectifier metal and is selected from the group consisting of Mg, Ta, Ti, Nb, Ca, Zr, Hf, La, Al,- Mn. Ru, V and alloys thereof.
- metal is an induced rectifier metal and is selected from the group consisting of Fe, Ni, Cr, Co and alloys thereof.
- Method of coating an electrolytic rectifier metal selected from the group consisting of Mg, Ta, Ti, Nb, Ca, Zr, Hf, La, Mn, Al, Ru, V, Fe, Ni, Cr, Co and alloys thereof with a glassy adherent layer comprising the steps of immersing said metal in a strongly alkaline bath containing SiO and alkali metal ion, causing current to flow, by making said metal progressively more anodic until deposition, coagulation and visible spark discharge occurs at the surface of said metal, further raising the potential of said metal to at least 400 v. for an intrinsic rectifier metal and to a minimum of 60 v. for an induced rectifier metal, and maintaining said flow of current until the deposit reaches the desired thickness, the diameter of induced rectifier metals being limited to about 2 mm.
- metal is an intrinsic rectifier metal and is selected from the group consisting of Mg, Ta, Ti, Nb, Ca, Zr, Hf, La, Al, Mn, Ru, V and alloys thereof.
- metal is an induced rectifier metal and is selected from the group consisting of Fe, Ni, Cr, Co and alloys thereof.
- Method of coating an electrolytic rectifier metal selected from the group consisting of Mg, Ta, Ti, Nb, Ca, Zr, Hf, La, Mn, Al, Ru, V, Fe, Ni, Cr, Co and alloys thereof with a glassy, adherent layer comprising the steps of immersing said metal in a bath made strongly alkaline with alkali metal hydroxide containing SO; and at least one anion selected from the group consistil'lg of BO'2 BO3 3, B4O7 2, ASO4 3, (303 CI'O4 2,
- Method as in claim 17, wherein said metal is H PO "12WO -KOH-2 /2H O and maintained anodic throughout the coating process.
- Method as in claim 17, wherein said metal is alcentration of anion other than hydroxyl lying between ternately made anodic and cathodic.
- Method is in claim 17, wherein said metal is an 204-46 58 induced rectifier metal and is selected from the group consisting of Fe, Ni, Cr, Co and alloys thereof.
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Abstract
METALS AND ALLOYS ARE COATED WITH GLASSY, ADHERENT, CORROSION-RESISTANT, PROTECTIVE LAYERS BY ELECTROLYTIC ANODIZATION AT HIGH VOLTAGE IN SUITABLE BATHS. THE METALS AND ALLOYS WHICH CAN BE COATED INCLUDE THOSE WHICH EXHIBIT ELECTROLYTIC RECTIFICATION AT BOTH LOW AND HIGH VOLTAGES AND THOSE WHICH EXHIBIT RECTIFICATION AT HIGH VOLTAGES ONLY. THE ANODIZATION BATHS CONTAIN ANIONS SUCH AS TUNGSTATE, PHOPHATE, ARSENATE, STANNATE, STIBNATE, MOLYBDATE, BORATE, CHROMATE AND DICHROMATE, ALONE OR IN COMBINATION AND CARBONATE, IN COMBINATION ONLY. SELECTION OF THE OPERATING CONDITIONS MAKES IT POSSIBLE TO PRODUCE COATINGS WHICH ARE SMOOTH OR WHICH HAVE EXTENDED SURFACES. THE PROCESS INVOLVES COAGULATION OF COLLOIDS AT THE SURFACE OF THE METALS. EITHER DIRECT OR ALTERNATING CURRENT MAY BE USED.
Description
United States Patent Oflice 3,834,999 Patented Sept. 10, 1974 3,834,999 ELECTROLYTIC PRODUCTION OF GLASSY LAYERS ON METALS Rudolf .I. Hradcovsky and Otto R. Kozak, Long Beach, N.Y., assignors to Atlas Technology Corporation, Long Beach, N.Y. No Drawing. Filed Apr. 15, 1971, Ser. No. 134,431 Int. Cl. C23b 4/02, 11/02 US. Cl. 20456 R 23 Claims ABSTRACT OF THE DISCLOSURE Metals and alloys are coated with glassy, adherent, corrosion-resistant, protective layers by electrolytic anodization at high voltage in suitable baths. The metals and alloys which can be coated include those which exhibit electrolytic rectification at both low and high voltages and those which exhibit rectification at high voltages only. The anodization baths contain anions such as tungstate, phosphate, arsenate, stannate, stibnate, molybdate, borate, chromate and dichromate, alone or in combination and carbonate, in combination only. Selection of the operating conditions makes it possible to produce coatings which are smooth or which have extended surfaces. The process involves coagulation of colloids at the surface of the metals. Either direct or alternating current may be used.
BACKGROUND OF THE INVENTION The protection of metallic surfaces against corrosion by the process of anodization is at present limited to aluminum. Some protection is also provided by chromizing. However, none of these treatments, whether chemical or electrochemical, has proved to be sufiiciently effective against corrosive agents such as strong alkalis and strong acids. The anodized surface of aluminum is not resistant against acids or even mild alkalis. Also, such a surface is inadequate with respect to abrasion resistance. Fired ceramic coatings have been used to protect iron but the process incolves very high temperatures, so that application to most other metals is difiicult, if not impossible.
In many cases, resort has been had to organic coatings such as paints and enamels, applied by dipping, brushing or spraying. However, such coatings, although relatively resistant to non-oxidizing acids and alkalis, present other disadvantages including degradation at high temperature. Also, adhesion of the coating to the metallic substrate may be poor, particularly when temperature cycling is involved.
The deposition of a silica coating on aluminum has been described in Czechoslovakian Pat. No. 104927 issued Feb. 15, 1961 to Rudolf J. Hradcovsky. The deposition was carried out by making the specimen to be coated strongly anodic in a bath of aqueous sodium silicate or potassium silicate which might also contain a small quantity of ammonium molybdate. A coating with a low breakdown voltage was the objective, it being the intention to use the coated aluminum piece as an automatically introduced emergency by-pass in the event of a break in an electric circuit. As will become apparent, it is significant that no alkali was added to the silicate solution, so that the deposition was carried out in weakly alkaline solution.
It is evident, then, that the number of metals and alloys which can be protected by conventional processes against corrosion over a substantial range of temperature is severely limited.
SUMMARY OF THE INVENTION Generally speaking, in accordance with the invention, those metals which show an electrolytic rectifier effect when anodized electro-chemically can be coated with an adherent glassy layer. Examples of metals which show an electrolytic rectification effect at low as well as high voltages are Mg, Ta, Al, Ti, Nb, Ca, Zr, Hf, La, Mn, Ru, V and their alloys. These may be termed intrinsic rectifier metals. Metals which show this effect only at high voltage are Fe, Ni, Cr, Co and their alloys, and may be termed induced rectifier metals.
It should be noted that the term metal is used herein to denote both elementary metals and alloys.
Either type of metal can be coated with a glassy layer by immersing a specimen in a bath ranging from weakly acidic to strongly alkaline and containing at least one anion which yields a solid oxide on loss of charge. Suitable anions are tungstate, silicate, borate, phosphate, chromate, dichromate, arsenate, stannate and stibnate, alone or in combination. Carbonate is also useful in combination with other anions.
The deposition process is effected by making the specimen progressively more anodic until deposition of a colloid, and coagulation of the colloid on the surface of the specimen occur.
As the voltage is further increased above about 250 v. a discharge becomes evident at the surface of the metal. The process is continued under conditions such that the discharge is visible until the deposit reaches the desired thickness. A voltage of at least about 400 v. is necessary for the production of a satisfactory deposit. Layers of 1 mm. or more in thickness are readily prepared.
The process for coating metals of the second group is similar except that the voltage must be more rapidly increased during the anodization process and a minimum voltage of at least about 600 v. must be reached.
Accordingly, it is an object of the present invention to apply to metals which show an electrolytic rectifier effect a coating that is strongly resistant to corrosion and abra- SlOIl.
Another object of the invention is to provide for such metals a coating which serves as an adhesive underlayer for various burnt varnishes, paints, emulsions, and the like.
Yet another object of the invention is to provide for A further object of the invention is to provide for such metals a coating which ranges from very smooth to very rough and which can be made hard enough to abrade steel.
Still another object of the invention is to provide for such metals a coating which has a high voltage breakdown strength.
Still other objects and advantages of the invention will in part be obvious and will in part be apparent from the specification.
The invention accordingly comprises the several steps and the relation of one or more of such steps with respect to each of the others thereof, which will be exemplified in the method hereinafter disclosed, and the scope of the invention will be indicated in the claims.
DESCRIPTION OF THE PREFERRED EMBODIMENTS To coat an electrolytic rectifier metal in accordance with the present invention, the metal is connected as the anode to a source of high voltage and immersed in a bath, the composition of which is given below. A second metal which is electrolytically insoluble is connected as the cathode to the source of high voltage and is also immersed in the solution. A suitable metal for such a purpose is iron.
3 Following are examples of suitable solutions:
Example 1: G. K siO 30 KOH 150 H O 1000 Example 2:
K PO 50 KI-ICO 50 KOH 2O K SiO 20 H O 1000 Example 3:
Nagwog NaOI-I 100 H O 1000 Example 4:
K130 50 KOH 30 B 1000 Example 5:
(NH4 5MD10z4-4H20 KOH 20 K SiO 20 H O 1000 Example 6:
SD02 Na SiO NaGH H O 1000 Example 7:
Sb O 15 K SiO 10 KOH 5 H O 1000 CONCENTRATION IN WEIGHT PERCENT 0F ANIONS OTHER THAN HYDROXYL Anion coneentration inweight Example Active anions percent 1 stow 1.25 2 POF3, H603, 5103- 5.50 3-. W042 5.05 4.- BOr 2. 4e 5.. MO7Oz 4HzO' Sim- I. SO 6-- SI103 ,si03 1.66 7 Shot-10 2.86
The strongly alkaline composition of Example 1 yields a hard layer of silica with a high breakdown voltage, in contrast to the type of coating achieved with a mildly alkaline solution as described in the Czechoslovakian patent cited above. The composition of Example 3 gives an extremely hard tungsten oxide layer.
For hardest layers, the baths should contain about 15% of alkali. Alkali concentrations between 0.1% and 15% are the most useful.
Other compounds which may be used for the same purpose when dissolved in water and brought to a pH ranging from weakly acidic to alkaline are the tungstate-silicate SiO -12WO '8KOH-10H O, the tungstate-borate H BO l2WO -5KOI-I- MH O, the tungstate-phosphate H PO 12WO KOH2 /2 H O, the tungstate-arsenate sodium tungstate, sodium silicate, sodium or potassium tetraborate and boric acid made alkaline with potassium or sodium phosphate.
Suitable combinations of compounds are ammonium molybdate with potassium tungstate and potassium borate with potassium tungstate. In general, the solution must contain at least one oxidic anion from which a glassy oxide can be formed by the removal of one or more oxy gen atoms. Thus, the borate and the silicate ions can yield B 0 and SiO in a glassy state. The carbonate ion, on
4 the other hand, while it has been found useful as a bath component, cannot form a glass by itself, since the prodnet of removal of an oxygen atom is CO a gas. As is evident, the various anions can be mixed with each other but, of course, the type of glass deposited will depend on the composition of the bath. Typical oxides which may be deposited, either alone or in combination, are AS203, AS205, B203, CI'203, C1303, M0203, S1102, 813203, Sb205, M002, M003, P203, P205, Slog, TIOZ, WO2, and W03.
The intrinsic rectifier metals include Mg, Ta, Ti, Nb, Ca, Al, Zr, Hf, La, Mn, Ru, and V, as well as their alloys. Examples of such alloys are Kovar, Rodar alloy 89446, Aluminum 3105, 3003, K845, Udimet 500, Mg AZ92A, A231B, A280A, Ti A, A, Ti6-A14V, and Ti-Pd Alloys.
Induced rectifier metals include Fe, Ni, Cr and Co as Well as their alloys. Examples of such alloys are the many different types of steels and the Fe-Ni-Cr combinations.
Certain compositions are particularly suitable for specific metals. For instance, a bath containing molybdate and phosphate ions produces glasses which are highly adherent to titanium and its alloys. The combination can withstand temperatures as high as 1200 C. without loss of adhesion; this is due to the fact that the coefiicient of thermal expansion of the glass can be matched to that of the metal.
Although all of the protective glassy layers have high breakdown voltages; particularly high breakdown voltages are obtained with layers containing tungstate, borate, molybdate, which have an average breakdown voltage of at least 800 v. at a thickness of 1 mm. as measured in accordance with ASTM test B-110-45. Tungstate when predominant in the glass, produces a highly homogeneous layer with a very smooth surface as can be seen by microscopic examination.
As further evidence of the protective action of layers deposited in accordance with the present invention, panels of Al 5667-H25 and 500-H14 were coated with a layer of silica 1 mm. thick. The panels were exposed to a spray of a 20% salt solution for 245 hours without developing any indication of corrosion. Similar panels have withstood the C.A.S.S. corrosion test for 48 hours, the Taber H-ll abrasion test and the 180 bond adhesion test.
To form the glassy layer on a metal substrate of the intrinsic rectifier type, the voltage is started at a low value and gradually increased. Initially, the substrate is oxidized, but when the voltage reaches about 250 v. coagulation of the solution begins. As the voltage is increased spark discharges appear on the surface of the anode. From the color of the spark discharges, it appears that the temperature of the spark discharges may be as high as 1500 C. It is believed that the high temperature resulting from the discharge melts the coagulated mixture into a homogeneous, pore-free glass on the surface of the metal. As indicated, the thickness of the layer depends on the current density and the duration of the process. The deposit may be smooth or rough, and the glass may be soft or hard, depending on its composition.
When the oxidation of the surface reaches maximum which is generally within a few seconds from initial immersion, the voltage must be increased in order to maintain flow of current and efficient deposition. Depending on the time and on the voltage used, glassy layers in excess of 1 mm. thick can readily be achieved. It should be noted that a high degree of reproducibility can be obtained by controlling the voltage, the current and the time of the deposition process. Also, the roughness of the surface of the glass layer can be minimized if the deposition current is maintained at a minimum value when the electrical discharge becomes evident on the surface of the electrode. The actual minimum current used will depend on the desired rate of deposition.
In coating intrinsic rectifier metals, the current density is held in the range of 250500 ma./dm. by adjustment of the voltage. For deposition of a satisfactory coating,
the voltage must be raised to at least about 400 v. and may go as high as about 1000 v. At the higher end of the voltage range the surface of the coating becomes rough and may be described as being extended. The coating, however, does not become porous.
The process for coating the induced rectifier metals is similar except that the voltage i raised rapidly to 250 v. and, in fact, this voltage may be imposed on the specimen prior to immersion in the bath. Also, the minimum voltage to which the piece must be raised to produce a satisfactory coating is about 600 v.
It should be noted that while there is no limitation on the size of specimens of intrinsic rectifier metals which can be coated by the present process, the diameter of specimens of the induced rectifier metals which can be coated is limited to about 2 mm. The length is not limited.
The color of the electrical discharge will vary in accordance with the cations of the bath. For example, sodium produces a yellow discharge, potassium a violet discharge, sodium tungstate a yellow-white discharge, and potassium tungstate K (H W O a white discharge.
In making up the bath, the presence of more than a small quantity of bromide, fluoride, iodide, chloride, sulphate, nitrate and cyanide ions is to be avoided because of the attack by these ions on the anode, creating conditions unsuitable for the coagulation of colloids on the anode.
The optimum bath temperature for coating is 45- 60C., but where the anode is large and substantial amounts of heat are generated during the deposition, it is desirable to use auxiliary cooling means.
The tungstate layer described above is particularly resistant to corrosion by strong alkali or strong acid environments. Also, a bath in which the borate ion is a domniant anion produces a glass with a high surface roughness. In fact, the roughness may be so great that the surface appears to be porous so that the layer may be more precisely described as having an extended surface. This type of glass has been tested for use as a sublayer for photosensitive gelatin emulsions in the printing field. It is also suitable as a sub-layer for paints and burned varinshes. Tests showed that such layers are of far greater durability than those presently used in this field.
It should be noted that alternating current, pulsing current or periodic reverse current can also be used for formation of glassy layers, since, due to the electroyltic rectifier effect of the substrate metals, current flows only when the metal is anodic.
It will thus be seen that the objects set forth above, among those made apparent from the preceding description, are efificiently attained and since certain changes may be made in the above compositions and methods without departing from the spirit and scope of the inven tion, it is intended that all matter contained in the above description shall be interpreted as illustrative and not in a limiting sense.
It is also to be understood that the following claims are intended to cover all of the generic and specific features of the invention herein described, and all statements of the scope of the invention which, as a matter of language, might be said to fall therebetween.
What is claimed is:
1. Method of coating an electrolytic rectifier metal selected from the group consisting of Mg, Ta, Ti, Nb, Ca, Zr, Hf, La, Mn, Al, Ru, V, Fe, Ni, Cr, Co and alloys thereof with a glassy, adherent layer, comprising the steps of immersing said metal in a bath made strongly alkaline with an alkali metal hydroxide and containing at least one anion selected from the group consisting of B02, BO3 3, B4O7 -2, ASO4 3, CO CI'O4 2, 01107 6 MOO4 2, PO4 3, Ti3O'1 WO4 2, W7O246 and anions resulting from dissolution of SiO 12W0 8KOH -10H O, H BO 12WO SKOH' l4H O,
H3PO4' H20 and H AsO -9WO -3KOH-2 /zH O in water, CO being used only in combination with at least one anion of said group, the total concentration of anion other than hy droxyl lying between about 1.0 and 6.0 weight percent, causing current to flow by making said metal progressively more anodic until deposition, coagulation and visible spark discharge occurs at the surface of said metal, further raising the potential of said metal to a minimum of 400 v. for an intrinsic rectifier metal and to a minimum of 600 v. for an induced rectifier metal, and maintaining said flow of current until the deposit reaches the desired thickness, the diameter of induced rectifier metals being limited to about 2 mm.
2. Method as in claim 1, wherein said bath is maintained between 45 C. and 60 C.
3. Method as in claim 1, wherein said metal is an intrinsic rectifier metal and is selected from the group consisting of Mg, Ta, Ti, Nb, Ca, Zr, Hf, La, Al,- Mn. Ru, V and alloys thereof.
4. Method as in claim 1, wherein said metal is an induced rectifier metal and is selected from the group consisting of Fe, Ni, Cr, Co and alloys thereof.
5. Method as in claim 1, wherein the current density lies in the range of 250-500 ma./dm.
6. Method as in claim 1, wherein said metal is titanium and is coated from a bath containing molybdate and phosphate ions.
7. Method as in claim 1, wherein said metal is maintained anodic throughout the coating process.
8. Method as in claim 1, wherein said metal is alternately made anodic and cathodic.
9. The product resulting from the process of claim 1.
10. Method of coating an electrolytic rectifier metal selected from the group consisting of Mg, Ta, Ti, Nb, Ca, Zr, Hf, La, Mn, Al, Ru, V, Fe, Ni, Cr, Co and alloys thereof with a glassy adherent layer, comprising the steps of immersing said metal in a strongly alkaline bath containing SiO and alkali metal ion, causing current to flow, by making said metal progressively more anodic until deposition, coagulation and visible spark discharge occurs at the surface of said metal, further raising the potential of said metal to at least 400 v. for an intrinsic rectifier metal and to a minimum of 60 v. for an induced rectifier metal, and maintaining said flow of current until the deposit reaches the desired thickness, the diameter of induced rectifier metals being limited to about 2 mm.
11. Method as in claim 10, wherein said bath is maintained between 45 C. and 60 C.
12. Method as in claim 10, wherein said metal is an intrinsic rectifier metal and is selected from the group consisting of Mg, Ta, Ti, Nb, Ca, Zr, Hf, La, Al, Mn, Ru, V and alloys thereof.
13. Method as in claim 10, wherein said metal is an induced rectifier metal and is selected from the group consisting of Fe, Ni, Cr, Co and alloys thereof.
14. Method as in claim 10, wherein the current density lies in the range of 250-500 ma./dm.
15. Method as in claim 10, wherein said metal is maintained anodic throughout the coating process.
16. Method as in claim 10, wherein said metal is alternately made anodic and cathodic.
17. Method of coating an electrolytic rectifier metal selected from the group consisting of Mg, Ta, Ti, Nb, Ca, Zr, Hf, La, Mn, Al, Ru, V, Fe, Ni, Cr, Co and alloys thereof with a glassy, adherent layer, comprising the steps of immersing said metal in a bath made strongly alkaline with alkali metal hydroxide containing SO; and at least one anion selected from the group consistil'lg of BO'2 BO3 3, B4O7 2, ASO4 3, (303 CI'O4 2,
7 8 Cr O PO53, Ti O WO W and anions re- 21. Method as in claim 17, wherein the current density sulting from dissolution of SiO 12WO -8KOH-10H O, lies in the range of 250400 ma./dm.
H BO -12WO -K0H-14H O, 22. Method as in claim 17, wherein said metal is H PO "12WO -KOH-2 /2H O and maintained anodic throughout the coating process. H ASO -9WO -3KOH-2 /2H O in water, the total con- 5 23. Method as in claim 17, wherein said metal is alcentration of anion other than hydroxyl lying between ternately made anodic and cathodic.
about 1.0 and 6.0 Weight percent, and causing current to flow by making said metal progressively more anodic until deposition, coagulation and visible spark discharge occurs UNITED STATES E TS References Cited at the surface of said metal, further raising the potential of 1 said metal to a minimum of 400 v. for an intrinsic rec- 2778789 1/1957 204-56 M 3,293,158 12/1966 McNeill et al. 20456 R tifier metal and to a mimmumof 600 v. for an induced 2 346 658 4/1944 B a t 1 rectifier metal, and maintaining said flow of current unrenn n fi a til the deposit reaches the desired thickness, the diameter FOREIGN PATENTS of induced metal rectifier pieces being limited to about 15 397 453 11/1931 Great Britain 204 58 2 mm. t n
18. Method as in claim 17, wherein said bath is main- 342256 H1931. Great Britain 204-68 tained between 40 C. and 60 c. JOHN H. MACK. Prlmary Exammer 19. Method as in claim 17, wherein said metal is an L. ANDREWS, Assistant Examiner intrinsic rectifier metal and is selected from the group consisting of Mg, Ta, Ti, Nb, Ca, Zr, Hf, La, Al, Mn, 1 Ru, V and allo s thereof.
20. Method is in claim 17, wherein said metal is an 204-46 58 induced rectifier metal and is selected from the group consisting of Fe, Ni, Cr, Co and alloys thereof.
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