TWI863479B - Package - Google Patents
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- TWI863479B TWI863479B TW112128956A TW112128956A TWI863479B TW I863479 B TWI863479 B TW I863479B TW 112128956 A TW112128956 A TW 112128956A TW 112128956 A TW112128956 A TW 112128956A TW I863479 B TWI863479 B TW I863479B
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Abstract
本發明提供一種封裝體,可確保氣密性,並防止焊料之往空腔中的流入。由陶瓷形成的框部120,具有第1面SF1與第2面SF2。第2面SF2,具有將空腔CV包圍的內緣、及將內緣包圍的外緣EO。由陶瓷形成的基板部110具有第3面SF3,第3面SF3具備支持框部120之第2面SF2的部分、及面向空腔CV的部分。電極層200,設置於基板部110之該第3面SF3上。介層電極510,具備在第1面SF1具有直徑DA之端面SFA、及在第2面SF2與電極層200接觸且具有直徑DB之底面SFB。滿足DA<DB。俯視時,介層電極之底面SFB,具有從框部120之第2面SF2的內緣算起之最小尺寸LI、及從框部120之第2面SF2的外緣EO算起之最小尺寸LO,滿足LO>LI。The present invention provides a package that ensures airtightness and prevents solder from flowing into a cavity. A frame portion 120 formed of ceramic has a first surface SF1 and a second surface SF2. The second surface SF2 has an inner edge surrounding a cavity CV and an outer edge EO surrounding the inner edge. A substrate portion 110 formed of ceramic has a third surface SF3, and the third surface SF3 has a portion of the second surface SF2 supporting the frame portion 120 and a portion facing the cavity CV. An electrode layer 200 is disposed on the third surface SF3 of the substrate portion 110. An interlayer electrode 510 has an end surface SFA having a diameter DA on the first surface SF1, and a bottom surface SFB having a diameter DB in contact with the electrode layer 200 on the second surface SF2. DA<DB is satisfied. In a plan view, the bottom surface SFB of the interlayer electrode has a minimum dimension LI from the inner edge of the second surface SF2 of the frame portion 120 and a minimum dimension LO from the outer edge EO of the second surface SF2 of the frame portion 120, satisfying LO>LI.
Description
本發明係關於一種封裝體,特別是關於具有由介層電極貫通的框部之封裝體。The present invention relates to a package, and more particularly to a package having a frame portion penetrated by an intermediate electrode.
作為使用陶瓷坯片製造之陶瓷零件,已知水晶振盪器用之封裝體。一般的水晶振盪器,具有水晶坯料、具備收納水晶坯料的空腔之封裝體、及用於將空腔密封之蓋部。封裝體,具有成為空腔的底面之基板部、將空腔包圍之框部、及設置於此框部上之金屬化層。使用焊料將蓋部接合至金屬化層。藉此,確保空腔的氣密性。As a ceramic component manufactured using a ceramic blank, a package for a crystal oscillator is known. A general crystal oscillator has a crystal blank, a package having a cavity for accommodating the crystal blank, and a cover for sealing the cavity. The package has a substrate portion that serves as the bottom surface of the cavity, a frame portion that surrounds the cavity, and a metallized layer provided on the frame portion. The cover is bonded to the metallized layer using solder. In this way, the airtightness of the cavity is ensured.
封裝體的框部上之金屬化層,通常,與接地電位用之電極墊電性短路。此電氣路徑,一般而言,可經由貫通框部之介層電極而確保。然而,隨著封裝體的小型化之進展,框部的材料寬度(框部的內緣與外緣之間的尺寸)亦變小,與其相應之微細介層電極的形成亦變得困難。具體而言,變得難以將微細介層電極用的微細介層孔,形成在藉由煅燒而成為框部之坯片。作為介層孔之一般的形成方法,有使用具有銷的形狀之模具的情況,若為了使介層孔微細化而將銷的形狀微細化,則容易使銷的機械強度不足。因而,例如依日本特開2007-27592號公報所揭露之技術,則取代介層電極,於框部的內壁面上,設置具有略月牙形的形狀之城垛形電極。The metallization layer on the frame of the package is usually electrically short-circuited with the electrode pad for ground potential. This electrical path can generally be ensured by an interlayer electrode penetrating the frame. However, as the miniaturization of the package progresses, the material width of the frame (the dimension between the inner and outer edges of the frame) also becomes smaller, and the formation of the corresponding fine interlayer electrode becomes difficult. Specifically, it becomes difficult to form fine interlayer holes for fine interlayer electrodes in the green sheet that is formed into the frame by calcination. As a general method for forming a via hole, a mold having a pin shape is used. However, if the pin shape is miniaturized in order to miniaturize the via hole, the mechanical strength of the pin is likely to be insufficient. Therefore, according to the technology disclosed in Japanese Patent Application Laid-Open No. 2007-27592, a battlement-shaped electrode having a crescent shape is provided on the inner wall surface of the frame instead of the via electrode.
如同上述公報之技術般地取代介層電極而將城垛形電極設置在空腔的側壁之情況,相較於由陶瓷形成的框部,使對焊料具有高潤濕性之電極在空腔的內壁沿著厚度方向縱斷。因此,於使用焊料之蓋部的接合步驟中,焊料容易沿著城垛形電極往空腔中流入。一旦流入的焊料與水晶坯料接觸,則有對水晶振盪器之機械性能造成不良影響的情形。此等對於機械特性之不良影響,在安裝於封裝體的元件為水晶坯料之情況特別受到擔憂,但在其他壓電元件之情況亦有發生的情形。進一步,只要安裝於封裝體之元件為電氣元件,則例如對電氣特性的不良影響如未預期之短路等受到擔憂。因此,要點在於避免焊料的流入,在此觀點中,相較於城垛形電極,介層電極更為適宜。由於對小型封裝體而言亦存在此等需求,因而期望一種技術,可與框部小的材料寬度對應而形成介層電極用之微細介層孔。When the interlayer electrode is replaced with a crenellated electrode on the side wall of the cavity as in the technique of the above-mentioned publication, the electrode having high wettability to solder is longitudinally cut along the thickness direction of the inner wall of the cavity compared to the frame formed by ceramic. Therefore, in the joining step of the cover using solder, the solder easily flows into the cavity along the crenellated electrode. Once the flowing solder contacts the crystal blank, it may cause adverse effects on the mechanical properties of the crystal oscillator. Such adverse effects on mechanical properties are particularly concerned when the component mounted on the package body is a crystal blank, but they may also occur in the case of other piezoelectric components. Furthermore, as long as the components mounted in the package are electrical components, there is a concern about adverse effects on electrical characteristics such as unexpected short circuits. Therefore, it is important to avoid the inflow of solder, and from this point of view, interposer electrodes are more suitable than crenel-shaped electrodes. Since such a demand also exists for small packages, a technology is desired that can form fine interposer holes for interposer electrodes corresponding to the small material width of the frame.
於日本特開2009-234074號公報揭露一種方法,將作為介層孔的微細貫通孔,藉由雷射加工技術形成在陶瓷坯片。具體而言,將直徑30μm至50μm的貫通孔,利用紫外線雷射形成在厚度250μm以下之陶瓷坯片。如此地藉由雷射加工形成相對於厚度使直徑較小的貫通孔之情況,被指出存在「貫通孔具有推拔形狀」的傾向。而於上述公報中,貫通孔之推拔形狀,在難以對於貫通孔充填導體膠之方面被視作問題。因而,於上述公報的技術中,檢討可使推拔率為60%以上之雷射光照射條件。此處,推拔率係藉由推拔的直徑比而定義,推拔率100%係指貫通孔不具有推拔形狀,此外,較小的推拔率,意味較陡峭的推拔形狀。 [習知技術文獻] [專利文獻] Japanese Patent Publication No. 2009-234074 discloses a method of forming fine through holes, which serve as vias, in a ceramic green sheet by laser processing technology. Specifically, through holes with a diameter of 30μm to 50μm are formed in a ceramic green sheet with a thickness of less than 250μm using an ultraviolet laser. In the case of forming through holes with a smaller diameter relative to the thickness by laser processing in this way, it is pointed out that there is a tendency for "the through holes to have a pushed-out shape." In the above-mentioned publication, the pushed-out shape of the through holes is considered to be a problem in that it is difficult to fill the through holes with a conductive glue. Therefore, in the technology of the above-mentioned publication, the laser light irradiation conditions that can make the push-out rate above 60% are examined. Here, the push-out rate is defined by the ratio of the push-out diameter. A push-out rate of 100% means that the through hole has no push-out shape. In addition, a smaller push-out rate means a steeper push-out shape. [Known technical literature] [Patent literature]
專利文獻1:日本特開2007-27592號公報 專利文獻2:日本特開2009-234074號公報 Patent document 1: Japanese Patent Publication No. 2007-27592 Patent document 2: Japanese Patent Publication No. 2009-234074
[本發明所欲解決的問題][Problems to be solved by the present invention]
依本案發明人等之檢討,若將上述雷射加工技術,單純在將介層電極設置於封裝體的框部之目的下應用,則有難以充分地確保空腔的氣密性之情形。隨著封裝體的小型化之進展,框部的材料寬度變得越小,而使此一問題變得越嚴重。因此,在確保氣密性的觀點上,前述城垛形電極較為適宜。另一方面,如同前述,若提供城垛形電極,則存在焊料之往空腔的流入成為問題之情形。由上述內容來看,在習知技術中,難以確保空腔之足夠的氣密性並防止焊料之往空腔中的流入。According to the review of the inventors of this case, if the above-mentioned laser processing technology is applied simply for the purpose of setting the interlayer electrode in the frame of the package, it is difficult to fully ensure the airtightness of the cavity. As the miniaturization of the package progresses, the material width of the frame becomes smaller, making this problem more serious. Therefore, from the perspective of ensuring airtightness, the above-mentioned battlement-shaped electrode is more suitable. On the other hand, as mentioned above, if a battlement-shaped electrode is provided, there is a situation where the inflow of solder into the cavity becomes a problem. From the above content, it can be seen that in the known technology, it is difficult to ensure sufficient airtightness of the cavity and prevent the inflow of solder into the cavity.
本發明係為了解決上述問題而提出,其目的在於提供一種封裝體,可確保空腔之足夠的氣密性,並防止焊料之往空腔中的流入。 [解決問題之技術手段] The present invention is proposed to solve the above-mentioned problem, and its purpose is to provide a package that can ensure sufficient airtightness of the cavity and prevent solder from flowing into the cavity. [Technical means for solving the problem]
態樣1為一種封裝體,設置有空腔;包含由陶瓷形成的框部,該框部具有第1面、及在厚度方向中與該第1面反向之第2面;該第2面,具有將該空腔包圍的內緣、及將該內緣包圍的外緣;該封裝體,更包含由陶瓷形成的基板部;該基板部具有第3面,該第3面具備支持該框部之該第2面的部分、及面向該空腔的部分;該封裝體,更包含設置於該基板部之該第3面上的電極層、及在該第1面與該第2面之間將該框部貫通的介層電極;該介層電極,具備在該第1面具有直徑DA之端面、及在該第2面與該電極層接觸且具有直徑DB之底面,滿足DA<DB;俯視時,該介層電極之該底面,具有從該框部之該第2面的該內緣算起之最小尺寸LI、及從該框部之該第2面的該外緣算起之最小尺寸LO,滿足LO>LI
態樣2為如態樣1之封裝體,其中,該直徑DA為50μm以下。Aspect 2 is a package as in
態樣3為如態樣1或態樣2之封裝體,其中,該框部之該第2面的該內緣與該外緣之間的最小尺寸為200μm以下。Aspect 3 is a package body as in
態樣4為如態樣1至態樣3中任一態樣之封裝體,其中,滿足LO≧LI×1.5。Aspect 4 is a package body as in any one of
態樣5為如態樣1至態樣4中任一態樣之封裝體,其中,該介層電極,於該厚度方向中之該端面與該底面的中間位置中,具有(DA+DB)/2以下之直徑。Aspect 5 is a package body as in any one of
態樣6為如態樣1至態樣5中任一態樣之封裝體,其中,該介層電極,具有於該厚度方向中從該端面以倒推拔形狀延伸的部分。Aspect 6 is a package body as in any one of
態樣7為如態樣6之封裝體,其中,該倒推拔形狀具有5度以上之推拔角。
態樣8為如態樣1至態樣7中任一態樣之封裝體,其中,該介層電極,使從該端面往該底面以倒推拔形狀延伸的部分,具有較該框部之厚度的1/2更厚之厚度。Aspect 8 is a package body as in any one of
態樣9為如態樣1至態樣8中任一態樣之封裝體,其中,該介層電極,具有將該端面與該底面連結的側面;該側面,在與該厚度方向平行之剖面視圖中,具有至少1個折曲點。Aspect 9 is a package body as in any one of
態樣10為如態樣9之封裝體,其中,該至少1個折曲點,包含往相反方向彎曲的2個折曲點。Aspect 10 is a package body as described in aspect 9, wherein the at least one bending point includes two bending points that bend in opposite directions.
態樣11為如態樣1至態樣10中任一態樣之封裝體,其中,該框部,具有將該第1面與該第2面的該外緣連結之外壁面;該外壁面,具有與該第1面連結之煅燒面(as-fired surface)、及與該第2面連結之破斷面(fracture surface)。Aspect 11 is a package body as in any one of
態樣12為如態樣1至態樣11中任一態樣之封裝體,其中,滿足LI>0。Aspect 12 is a package body as in any one of
態樣13為如態樣1至態樣11中任一態樣之封裝體,其中,該介層電極於該第2面具有外周;該外周由圓弧部分及缺口部分形成,該圓弧部分沿著直徑DB之圓形形狀,該缺口部分沿著該框部之該第2面的該內緣之一部分。Aspect 13 is a package body as in any one of
態樣14為如態樣13之封裝體,其中,該介層電極之該外周的該缺口部分,具有朝向該介層電極之該底面的裡側之凸形。Aspect 14 is a package body as in aspect 13, wherein the notch portion of the periphery of the interlayer electrode has a convex shape facing the inner side of the bottom surface of the interlayer electrode.
態樣15為如態樣1至態樣14中任一態樣之封裝體,其中,該電極層,在與該介層電極之該底面接觸的部分局部性地變厚。
態樣16為如態樣1至態樣15中任一態樣之封裝體,其中,該框部之該第2面,具有與該介層電極之該底面直接連結的第1區域、及經由該第1區域而與該介層電極之該底面連結的第2區域;該第2區域垂直於該厚度方向;該第1區域,相對於該第2區域,以越接近該介層電極之該底面則該框部的厚度越變小之方式傾斜。
[本發明之效果]
Aspect 16 is a package body as in any aspect of
依態樣1,則第1,由於以滿足LO>LI的方式配置介層電極之底面,故在介層電極之底面的外緣與框部之第2面的外緣之間,可大程度地確保陶瓷間的疊層界面之配置處。此處,陶瓷間的疊層界面,相較於金屬與陶瓷的疊層界面,具有高氣密性。因此,可抑制因沿著疊層界面之漏洩所導致的空腔之氣密性的降低。第2,由於介層電極之端面的直徑DA較介層電極之底面的直徑DB更小,故即便使介層電極位於空腔附近,近至介層電極之底面到達空腔的程度,仍可使介層電極之端面位於與空腔離隔的位置。藉此,避免介層電極之側面在介層電極之端面附近往空腔露出。因此,可防止因介層電極所導致的焊料之往空腔中的流入。由上述內容來看,可確保空腔之足夠的氣密性,並防止焊料之往空腔中的流入。According to
依態樣2,則介層電極之直徑DA為50μm以下的微細尺寸。藉此,可使框部之寬度尺寸亦微細化。此微細化越進展,則沿著基板部與框部之間的疊層界面之漏洩容易成為問題,但藉由上述理由,有效地抑制此等問題。According to aspect 2, the diameter DA of the interlayer electrode is a fine size of less than 50 μm. As a result, the width of the frame can also be miniaturized. As the miniaturization progresses, leakage along the laminate interface between the substrate and the frame becomes more likely to become a problem, but these problems can be effectively suppressed for the reasons mentioned above.
依態樣3,則框部之第2面的內緣與外緣之間的最小尺寸為200μm以下。如此地,微細化越進展,則沿著基板部與框部之間的疊層界面之漏洩容易成為問題,但藉由上述理由,有效地抑制此等問題。According to aspect 3, the minimum dimension between the inner edge and the outer edge of the second surface of the frame is 200 μm or less. As the miniaturization progresses, leakage along the lamination interface between the substrate and the frame becomes more likely to become a problem, but such problems are effectively suppressed for the reasons described above.
依態樣4,則滿足LO≧LI×1.5。藉此,可更充分地抑制因沿著基板部與框部之間的疊層界面之漏洩所導致的空腔之氣密性的降低。According to Aspect 4, LO≧LI×1.5 is satisfied. This can more effectively suppress the reduction in the airtightness of the cavity due to leakage along the lamination interface between the substrate portion and the frame portion.
依態樣5,則該介層電極,於厚度方向中之該端面與該底面的中間位置中,具有(DA+DB)/2以下之直徑。藉此,可充分地確保介層電極的該中間位置與框部的外壁面之間的距離。因此,可提高介層電極與框部之間的氣密可靠度。According to aspect 5, the intermediate electrode has a diameter of (DA+DB)/2 or less in the middle position between the end surface and the bottom surface in the thickness direction. Thus, the distance between the intermediate position of the intermediate electrode and the outer wall surface of the frame can be sufficiently ensured. Therefore, the airtight reliability between the intermediate electrode and the frame can be improved.
依態樣6,則介層電極,具有於厚度方向中從端面以倒推拔形狀延伸的部分。藉此,容易確保介層電極的端面與空腔之間的距離。因此,可更充分地防止因介層電極所導致的焊料之往空腔中的流入。According to aspect 6, the interlayer electrode has a portion extending from the end surface in a reverse push-out shape in the thickness direction. This makes it easy to ensure the distance between the end surface of the interlayer electrode and the cavity. Therefore, the inflow of solder into the cavity caused by the interlayer electrode can be more effectively prevented.
依態樣7,則介層電極之從端面延的倒推拔形狀,具有5度以上之推拔角。藉此,容易確保介層電極的端面與空腔之間的距離。因此,可更充分地防止因介層電極所導致的焊料之往空腔中的流入。According to
依態樣8,則介層電極之從端面延的倒推拔形狀,具有框部之厚度的1/2以上之厚度。藉此,容易確保介層電極的端面與空腔之間的距離。因此,可更充分地防止因介層電極所導致的焊料之往空腔中的流入。According to aspect 8, the reverse-pushed shape of the interlayer electrode extending from the end surface has a thickness of more than 1/2 of the thickness of the frame. This makes it easy to ensure the distance between the end surface of the interlayer electrode and the cavity. Therefore, the inflow of solder into the cavity caused by the interlayer electrode can be more effectively prevented.
依態樣9,則介層電極之側面,具有至少1個折曲點。藉此,可抑制因封裝體的製造中之燒結收縮所導致的介層電極之側面與框部間的剝離。According to aspect 9, the side surface of the interlayer electrode has at least one inflection point. This can prevent the side surface of the interlayer electrode from being separated from the frame due to sintering shrinkage during the manufacture of the package.
依態樣10,則介層電極之側面,具有往相反方向彎曲的2個折曲點。藉此,可更充分地抑制因封裝體的製造中之燒結收縮所導致的介層電極之側面與框部間的剝離。 According to aspect 10, the side surface of the interlayer electrode has two bending points that bend in opposite directions. This can more effectively suppress the peeling between the side surface of the interlayer electrode and the frame portion caused by sintering shrinkage during the manufacture of the package.
依態樣11,則框部的外壁面,具有與第1面連結之煅燒面、及與第2面連結之破斷面。破斷面係藉由斷裂步驟而形成,但由於該步驟差異的影響,而有框部之第2面的外緣與介層電極的底面之間的距離變小之情形。然而,藉由如同前述地滿足LO>LI,而使該距離不易變得過小。因此,可防止因該距離過小所導致的氣密性之不足。According to the embodiment 11, the outer wall surface of the frame has a calcined surface connected to the first surface and a fracture surface connected to the second surface. The fracture surface is formed by the fracture step, but due to the influence of the difference in the step, the distance between the outer edge of the second surface of the frame and the bottom surface of the intermediate electrode becomes smaller. However, by satisfying LO>LI as described above, the distance is not easy to become too small. Therefore, the lack of airtightness caused by the distance being too small can be prevented.
依態樣12,則滿足LI>0。藉此,於介層電極之底面附近中,亦避免介層電極之側面往空腔露出。因此,可更確實地防止焊料之往空腔中的流入。According to aspect 12, LI>0 is satisfied. Thus, the side surface of the interlayer electrode is prevented from being exposed to the cavity near the bottom surface of the interlayer electrode. Therefore, the inflow of solder into the cavity can be more reliably prevented.
依態樣13,則介層電極之外周,具有沿著框部之第2面的內緣之一部分的缺口部分。藉此,容易將介層電極往空腔靠近配置。因此,可更充分地抑制因沿著基板部與框部之間的疊層界面之漏洩所導致的空腔之氣密性的降低。According to aspect 13, the outer periphery of the interlayer electrode has a notch portion along a portion of the inner edge of the second surface of the frame portion. This makes it easier to place the interlayer electrode close to the cavity. Therefore, the reduction in the airtightness of the cavity caused by leakage along the laminated interface between the substrate portion and the frame portion can be more effectively suppressed.
依態樣14,則介層電極之外周的缺口部分,具有朝向介層電極之底面的裡側之凸形。藉此,可將介層電極配置在空腔的角隅。因此,容易大程度地確保最小尺寸LO。因此,可更充分地抑制因沿著基板部與框部之間的疊層界面之漏洩所導致的空腔之氣密性的降低。According to aspect 14, the notch portion of the outer periphery of the interlayer electrode has a convex shape facing the inner side of the bottom surface of the interlayer electrode. Thus, the interlayer electrode can be arranged at the corner of the cavity. Therefore, it is easy to ensure the minimum size LO to a large extent. Therefore, the reduction of the airtightness of the cavity caused by leakage along the stacking interface between the substrate part and the frame part can be more fully suppressed.
依態樣15,則電極層,在與介層電極之底面接觸的部分局部性地變厚。藉此,能夠以大致維持介層電極之構成的方式,將介層電極之側面與框部之第2面所夾的鈍角更為增大。因此,可緩和因在主要由金屬形成的介層電極與由陶瓷形成的框部之間的熱膨脹之差異所導致的熱應力。因此,可防止因熱應力所導致的裂縫、或介層電極與框部之間的剝離。According to
依態樣16,則框部之該第2面,具有與介層電極之底面直接連結的第1區域、及經由第1區域而與介層電極之底面連結的第2區域;第2區域垂直於厚度方向;第1區域,相對於第2區域,以越接近介層電極之底面則框部的厚度越變小之方式傾斜。藉此,能夠以大致維持介層電極之構成的方式,將介層電極之側面與框部之第2面所夾的鈍角更為增大。因此,可緩和因在主要由金屬形成的介層電極與由陶瓷形成的框部之間的熱膨脹之差異所導致的熱應力。因此,可防止因熱應力所導致的裂縫、或介層電極與框部之間的剝離。 According to aspect 16, the second surface of the frame has a first region directly connected to the bottom surface of the interlayer electrode, and a second region connected to the bottom surface of the interlayer electrode via the first region; the second region is perpendicular to the thickness direction; the first region is inclined relative to the second region in such a manner that the thickness of the frame becomes smaller as it approaches the bottom surface of the interlayer electrode. In this way, the blunt angle between the side surface of the interlayer electrode and the second surface of the frame can be further increased while roughly maintaining the structure of the interlayer electrode. Therefore, the thermal stress caused by the difference in thermal expansion between the interlayer electrode mainly formed of metal and the frame formed of ceramic can be alleviated. Therefore, cracks caused by thermal stress or separation between the dielectric electrode and the frame can be prevented.
以下,依據圖式,針對本發明之實施形態予以說明。另,於一部分的圖式中,為了容易理解方向而顯示xyz直角座標系,其z方向對應於厚度方向。此外,本說明書中,「推拔形狀」及「倒推拔形狀」,具有不同意思。在定義某方向的情況,沿該方向延伸之「推拔形狀」,係朝向該方向逐漸變窄之形狀,例如為直徑朝向該方向逐漸變小之形狀。另一方面,沿該方向延伸之「倒推拔形狀」,係朝向與該方向相反的方向逐漸變窄之形狀,例如為直徑朝向與該方向相反的方向逐漸變小之形狀。換而言之,沿該方向延伸之「倒推拔形狀」,係朝向該方向逐漸變寬之形狀,例如為直徑朝向該方向逐漸變大之形狀。Hereinafter, the implementation form of the present invention will be described with reference to the drawings. In addition, in some of the drawings, an xyz rectangular coordinate system is shown for easy understanding of the direction, and the z direction corresponds to the thickness direction. In addition, in this specification, "pushing-out shape" and "reverse pushing-out shape" have different meanings. In the case of defining a certain direction, the "pushing-out shape" extending along the direction is a shape that gradually narrows toward the direction, for example, a shape whose diameter gradually decreases toward the direction. On the other hand, the "reverse pushing-out shape" extending along the direction is a shape that gradually narrows toward the direction opposite to the direction, for example, a shape whose diameter gradually decreases toward the direction opposite to the direction. In other words, the "reverse push-pull shape" extending along the direction is a shape that gradually becomes wider toward the direction, for example, a shape whose diameter gradually increases toward the direction.
<實施形態1>
圖1係概略顯示本實施形態1之水晶振盪器900(電氣零件)的構成之俯視圖。圖2係沿著圖1的線II-II之概略剖面圖。圖3係概略顯示水晶振盪器900(圖1)的製造方法中之緊接水晶坯料890(電氣元件)安裝後的構成之俯視圖。圖4係沿著圖3的線IV-IV之概略剖面圖。
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水晶振盪器900,具備封裝體701、水晶坯料890、焊料960、及蓋部980。於封裝體701設置空腔CV。水晶坯料890,收納在空腔CV內,安裝於封裝體701的元件電極墊211及元件電極墊212上。蓋部980,藉由焊料960而與封裝體701的金屬化層600接合,藉此將空腔CV密封。焊料960,一般而言,宜由含有金的合金形成,例如由含有金及錫的合金,換而言之,由Au-Sn系合金形成。蓋部980,由金屬形成,例如由含有鐵及鎳的合金形成。另,本說明書中,將合金視作金屬之一種。The
金屬化層600,例如,由含有鉬及鎢之至少任一者的金屬形成。於金屬化層600的表面(面向焊料960的面),亦可設置鍍層,一般而言,設置鍍金層。此外,亦可設置鍍鎳層作為鍍金層之基底。本實施形態中,僅藉由焊料960,將在封裝體701的框部120之框頂面SF1上直接設置的金屬化層600,與蓋部980之間接合。The
圖5係概略顯示封裝體701的構成之俯視圖。圖6係沿著圖5的線VI-VI之概略剖面圖。封裝體701,具有陶瓷部100、元件電極墊211、元件電極墊212、及封裝體電極墊301~304。此外,封裝體701,具有設置於陶瓷部100之供電氣配線所用的構成,細節於之後詳述。FIG5 is a top view schematically showing the structure of the
陶瓷部100,由陶瓷形成,宜具有氧化物作為主成分,更宜具有氧化鋁作為主成分,例如實質上由氧化鋁形成。陶瓷部100,包含基板部110及框部120。基板部110之材料,亦可與框部120之材料相同。框部120,在厚度方向(圖6的z方向)中疊層於基板部110。框部120,具有框頂面SF1(第1面)、及框底面SF2(在厚度方向中與第1面反向之第2面)。此外,框部120,具有將框頂面SF1與框底面SF2彼此連結之內壁面,該內壁面為空腔CV之側壁。基板部110具有基板頂面SF3(第3面)。基板頂面SF3,具有支持框部120之框底面SF2的支持面部分SF3S、及面向空腔CV的空腔面部分SF3C。空腔面部分SF3C成為空腔CV之底面。The
元件電極墊211及元件電極墊212(圖5),面向空腔CV而配置於陶瓷部100(圖6)。具體而言,元件電極墊211及元件電極墊212,配置於基板部110(圖6)的頂面(面向空腔CV的面)上。封裝體電極墊301~304(圖5),於空腔CV外配置在陶瓷部100(圖6)。具體而言,封裝體電極墊301~304,配置於基板部110(圖6)之底面(與面向空腔CV的面反向之面)上。The
中繼電極220(圖5),設置於基板部110(圖6)之基板頂面SF3上。中繼電極220,至少部分地配置於支持面部分SF3S(圖6)上。因此,中繼電極220(圖5),至少部分地受到框部120覆蓋。中繼電極220,進一步,亦可具有未受框部120覆蓋而配置在空腔CV之底面的部分。換而言之,中繼電極220,亦可僅受到框部120部分地覆蓋。The relay electrode 220 (FIG. 5) is disposed on the substrate top surface SF3 of the substrate portion 110 (FIG. 6). The
圖7係將金屬化層600(圖5)及框部120(圖6)的圖示省略之俯視圖。圖8係概略顯示圖7之基板部110及基板介層電極411~414,並將封裝體電極墊301~304以虛線顯示之俯視圖。Fig. 7 is a top view in which the metallization layer 600 (Fig. 5) and the frame portion 120 (Fig. 6) are omitted. Fig. 8 is a top view schematically showing the
於陶瓷部100的基板部110,在其頂面附近中嵌入配線層401~403。配線層401與元件電極墊211接觸,配線層402與元件電極墊212接觸,配線層403與中繼電極220接觸。在不阻礙其等之接觸的範圍,配線層401~403,亦可受到作為基板部110之一部分的絕緣膜110i(參考圖11)被覆,特別是元件電極墊211與配線層403之間,藉由絕緣膜110i而絕緣。藉由配線層403及中繼電極220,構成電極層200。The wiring layers 401 to 403 are embedded in the
封裝體701,具有嵌入至陶瓷部100之基板部110中的基板介層電極411~414。基板介層電極411,將配線層402與封裝體電極墊301彼此連接。基板介層電極412,將配線層403與封裝體電極墊302彼此連接。基板介層電極413,將配線層401與封裝體電極墊303彼此連接。基板介層電極414,將配線層403與封裝體電極墊304彼此連接。The
由上述構成來看,元件電極墊211與封裝體電極墊303電性連接,元件電極墊212與封裝體電極墊301電性連接,中繼電極220與封裝體電極墊302及封裝體電極墊304電性連接。According to the above structure, the
圖9係將圖5之金屬化層600的圖示省略之俯視圖。圖10係圖9之部分放大圖。圖11係沿著圖5的線XI-XI之概略剖面圖。Fig. 9 is a top view in which the
框部120之框底面SF2,具有將空腔CV包圍的內緣EI、及將內緣EI包圍的外緣EO。內緣EI與外緣EO之間的最小尺寸WD(圖10),可為200μm以下,一般為20μm以上110μm以下。框部120,具有將框頂面SF1與框底面SF2的外緣EO連結之外壁面SF4。此外,框部120,具有將框頂面SF1與框底面SF2的內緣EI連結之內壁面(圖11之左面),內壁面面向空腔CV。本實施形態中,外壁面SF4,具有與框頂面SF1連結之煅燒面SF4A、及與框底面SF2連結之破斷面SF4B。破斷面SF4B,亦可為對於框頂面SF1大致垂直的面(於圖11中垂直於z方向的面)。煅燒面SF4A,如圖11所示,亦可為將框頂面SF1與破斷面SF4B之間倒角的斜角面。換而言之,煅燒面SF4A的法線方向,亦可與框頂面SF1及破斷面SF4B的法線方向不同,且亦可位於其等之間。The frame bottom surface SF2 of the
如同前述,藉由配線層403及中繼電極220,於基板部110之基板頂面SF3上構成電極層200。此外,如同前述,基板部110,作為其一部分,具有絕緣膜110i(圖11)。作為變形例,亦可依封裝體的設計而將絕緣膜110i省略。此外,電極層200,亦可僅藉由配線層403及中繼電極220之任一方構成。例如,電極層200,亦可將中繼電極220省略但具有配線層403,於此一情況中,亦可使配線層403與絕緣膜110i的邊界位置(圖11之配線層403的右端位置)往支持面部分SF3S上之中繼電極220的端位置(圖11之中繼電極220的右端位置)偏移,亦可將中繼電極220省略。此外,面向空腔CV之絕緣膜110i的端,亦可變形而到達至框部120,此一情況,電極層200亦可藉由絕緣膜110i從空腔CV分隔。此外,電極層200,一般如圖11所示,跨越支持面部分SF3S與空腔面部分SF3C,但作為變形例,亦可僅配置於支持面部分SF3S上。此外,電極層200,如圖11所示,宜具有從框部120之框底面SF2的外緣EO離隔之端(圖11之右端)。換而言之,該端宜未到達至外緣EO。藉此,使成為電極層200之金屬與陶瓷的疊層界面,未到達至外緣EO。此一結果,具有較陶瓷彼此的界面之氣密性更低的氣密性之金屬與陶瓷的界面,未到達至外緣EO。因此,可抑制因電極層200所導致之氣密性的降低。As described above, the
封裝體701,具有介層電極510。介層電極510,在框頂面SF1與框底面SF2之間將框部120貫通。介層電極510,在框頂面SF1具有端面SFA,此外,在框底面SF2具有底面SFB。俯視時,端面SFA的中心位置與底面SFB的中心位置,亦可大致相同。底面SFB,與電極層200接觸,本實施形態中與中繼電極220接觸。如同前述,中繼電極220與配線層403接觸;於配線層403(圖7),連接基板介層電極412及基板介層電極414。因此,將基板介層電極412及基板介層電極414,與介層電極510電性連接。進一步,介層電極510之端面SFA,與金屬化層600(圖6)接觸。因此,金屬化層600,經由基板介層電極412及基板介層電極414,分別與封裝體電極墊302及封裝體電極墊304電性連接(參考圖8)。The
介層電極510之端面SFA,具有直徑DA(圖10)。直徑DA,較最小尺寸WD更小,亦可為50μm以下。介層電極510之底面SFB,具有較直徑DA更大的直徑DB(圖10)。換而言之,滿足DA<DB。直徑DA之相對於直徑DB的比例,亦可為30%以上70%以下。框部120之厚度為20μm以上250μm以下的情況,上述比例特別適宜。介層電極510宜於厚度方向(圖11的z方向)中之端面SFA與底面SFB的中間位置(端面SFA的位置與底面SFB的位置之平均位置)中,具有(DA+DB)/2以下之直徑。推拔率(直徑DA之相對於直徑DB的百分率),亦可未滿60%。The end surface SFA of the
俯視時(圖10),底面SFB,具有從框部120之框底面SF2的內緣EI算起之最小尺寸LI、及從框部120之框底面SF2的外緣EO算起之最小尺寸LO。滿足LO>LI,宜滿足LO≧LI×1.5。另,本實施形態中,LI>0。In a plan view ( FIG. 10 ), the bottom surface SFB has a minimum dimension LI from the inner edge EI of the frame bottom surface SF2 of the
於圖10所示之平面布置中,端面SFA及底面SFB的形狀,呈大致圓形形狀,但此等形狀亦可為因製造誤差而從幾何學上嚴格定義之圓形產生些許不同。此一情況,直徑DA及直徑DB,亦可藉由將端面SFA及底面SFB以圓形形狀進行近似而算出。此外,如同後述變形例般地於圓形形狀設置缺口部分之情況,亦可無視缺口部分而決定直徑。In the planar layout shown in FIG10 , the shapes of the end surface SFA and the bottom surface SFB are generally circular, but these shapes may be slightly different from the strictly geometrically defined circle due to manufacturing errors. In this case, the diameter DA and the diameter DB can also be calculated by approximating the end surface SFA and the bottom surface SFB with a circular shape. In addition, in the case of providing a notch portion in the circular shape as in the modified example described later, the diameter can also be determined without considering the notch portion.
此外,於圖10所示之平面布置中,框底面SF2(參考圖11)的內緣EI,具有第1直線部(圖10之沿著x方向的直線部)、相對於第1直線部沿直角方向延伸的第2直線部(圖10之沿著y方向的直線部)、及將其等彼此連結的角部。最小尺寸LI,亦可為該角部之尺寸。In addition, in the planar layout shown in FIG10, the inner edge EI of the frame bottom surface SF2 (see FIG11) has a first straight line portion (a straight line portion along the x direction in FIG10), a second straight line portion extending in a right angle direction relative to the first straight line portion (a straight line portion along the y direction in FIG10), and a corner portion connecting them. The minimum dimension LI may also be the dimension of the corner portion.
圖12至圖22,係用於說明一併製造複數個封裝體701的製造方法之圖。另,圖12~圖21,顯示較使圖21的狀態往圖22的狀態改變之煅燒步驟更早的狀態。因此,圖12~圖21中的各構成,與完成之封裝體701中的構成不同,由未煅燒之材料形成。然而,為了方便說明,在顯示較煅燒步驟更早之步驟的圖12~圖21中,仍賦予與表示經由煅燒步驟而獲得之封裝體701的構成之符號相同的符號。此外,為了方便說明,在由未煅燒之材料形成的上述構成之稱呼,亦有使用經由煅燒步驟而獲得之封裝體701中的構成之稱呼的情形。FIG. 12 to FIG. 22 are figures used to illustrate a manufacturing method for manufacturing a plurality of
圖12係概略顯示上述製造方法中之基板坯體GS的構成之部分俯視圖。圖13係概略顯示基板坯體GS的基板部110及基板介層電極411~414,並將封裝體電極墊301~304以虛線顯示之部分俯視圖。圖14係沿著圖12及圖13的線XIV-XIV之概略部分剖面圖。基板坯體GS,包含複數個區域UN0~UN4,其等最終各自成為封裝體701(圖6)的基板部110及其附近之構造。區域UN1~UN4,皆配置為與區域UN0相鄰。另,於圖12及圖13中,雖僅對於區域UN0顯示具體的構成,但區域UN1~UN4亦可亦具有同樣的構成。FIG. 12 is a partial top view schematically showing the structure of the substrate blank GS in the above-mentioned manufacturing method. FIG. 13 is a partial top view schematically showing the
另,本說明書中,用語「坯體」,係指在之後的步驟中煅燒之未煅燒的構成。坯體,一般為粉末成形體。為了容易處理,坯體,除了主成分以外,亦可包含玻璃成分與有機成分作為添加物。有機成分,例如亦可包含聚乙烯醇縮丁醛或丙烯酸。坯體之成形方法為任意方法,例如藉由刮刀法,形成作為坯體之至少一部分的坯片。亦可於此坯片上進一步附加坯體,此一附加,一般而言,係藉由在該坯片上印刷,或疊層其他坯片而施行。該印刷,一般係藉由網版印刷法施行。藉由煅燒而成為陶瓷部100(圖6)的坯體之主成分,例如亦可為氧化鋁粉末。藉由煅燒而成為介層電極510及電極層200(參考圖11)等配線構造的坯體之主成分,例如亦可為鎢(W)粉末、鉬(Mo)粉末、W粉末與Mo粉末的混合粉末、或W-Mo合金粉末。In addition, in this specification, the term "green body" refers to the uncalcined structure that is calcined in a subsequent step. The green body is generally a powder molded body. In order to facilitate handling, the green body may also contain glass components and organic components as additives in addition to the main component. The organic component may also contain polyvinyl butyral or acrylic acid, for example. The green body is formed by any method, such as by a doctor blade method to form a green sheet that is at least a part of the green body. A green body may be further added to the green sheet, and this addition is generally performed by printing on the green sheet, or by stacking other green sheets. The printing is generally performed by screen printing. The main component of the green body that is formed into the ceramic part 100 (Figure 6) by calcination may be, for example, aluminum oxide powder. The main component of the green body that is formed into the wiring structure such as the
為了獲得基板坯體GS,首先,形成成為基板部110的坯片。對於該坯片,施行以沖壓加工進行之介層孔的形成、及電極膠之往該介層孔中的印刷,藉以形成成為基板介層電極411~414之坯體。於電極膠中,例如使鎢及鉬的至少任一種粉末分散。接著,對於該坯片施行電極膠的印刷,藉以形成成為配線層401~403之坯體。接著,對於該坯片,施行陶瓷膠的印刷,藉以形成成為絕緣膜110i之坯體。接著,對於該坯片施行電極膠的印刷,藉以形成成為元件電極墊211、212及中繼電極220之坯體。此外,在如同上述地形成成為基板介層電極411~414之坯體後的任意時序,對於該坯片施行電極膠的印刷,藉以形成成為封裝體電極墊301~304之坯體。In order to obtain the substrate blank GS, first, a blank that will become the
圖15~圖19係依序顯示與用於構成框部120(圖11)及其附近的構造之框部坯體GF相關的步驟之部分剖面圖。圖式中,以一點鏈線顯示斷裂面BR,沿著此線,施行後述斷裂步驟。Figures 15 to 19 are partial cross-sectional views showing the steps of the frame blank GF used to form the frame 120 (Figure 11) and the structure near it. In the figure, the fracture surface BR is shown by a dot chain line, and the fracture step described later is performed along this line.
參考圖15,作為框部坯體GF,首先,形成包含成為框部120的部分之單純的坯片。此一形成,例如亦可藉由刮刀法施行。15, as the frame blank GF, first, a simple green sheet including a portion to be the
參考圖16,藉由雷射加工,於框部120形成介層孔VH。雷射加工用的雷射光,以從框底面SF2往框頂面SF1行進之方式照射。此一結果,介層孔VH,容易沿從框底面SF2往框頂面SF1的方向具有推拔形狀。框底面SF2中的孔徑,較框頂面SF1中的孔徑更大。Referring to FIG. 16 , a via hole VH is formed in the
進一步參考圖17,於框部坯體GF的介層孔VH(圖16)內,形成介層電極510(圖17)。具體而言,藉由網版印刷法,往介層孔VH中充填電極膠。此一充填,宜從框底面SF2往框頂面SF1施行。Referring to FIG. 17 , a via hole VH ( FIG. 16 ) of the frame body GF is formed with an via electrode 510 ( FIG. 17 ). Specifically, the via hole VH is filled with electrode glue by screen printing. The filling is preferably performed from the frame bottom surface SF2 to the frame top surface SF1 .
參考圖18,形成金屬化層600。具體而言,塗布電極膠。另,於圖18中,在框頂面SF1全體塗布電極膠,但在藉由後述空腔CV之形成步驟除去的區域無須塗布金屬化層600。因此,亦可應用並未在該區域之至少一部分進行塗布的網版印刷法。Referring to FIG. 18 , a
參考圖19,藉由沖壓加工形成空腔CV。另,亦可在更早的時序往框部坯體GF形成空腔CV。藉由上述方式,完成具有將空腔CV包圍之框狀的框部坯體GF。Referring to Fig. 19, the cavity CV is formed by stamping. Alternatively, the cavity CV may be formed in the frame blank GF at an earlier time. By the above method, the frame blank GF having a frame shape surrounding the cavity CV is completed.
參考圖20,將框部坯體GF(圖19)疊層於基板坯體GS(圖14)上,藉以形成坯片700G。坯片700G包含複數個區域701G,其等最終各自成為封裝體701(參考圖11)。Referring to Fig. 20, the frame blank GF (Fig. 19) is stacked on the substrate blank GS (Fig. 14) to form a blank 700G. The blank 700G includes a plurality of
參考圖21,於坯片700G之框頂面SF1形成溝槽TR1(圖13)。此外,於坯片700G的與框頂面SF1反向之面,形成溝槽TR2。溝槽TR1與溝槽TR2,於厚度方向中配置為相對向。溝槽TR1及溝槽TR2,例如係藉由將刀尖抵緊坯片700G而形成。其後,施行將坯片700G煅燒之煅燒步驟。另,於煅燒步驟後,因應必要,亦可亦施行鍍敷步驟。Referring to FIG. 21 , a groove TR1 ( FIG. 13 ) is formed on the frame top surface SF1 of the blank 700G. In addition, a groove TR2 is formed on the surface of the blank 700G opposite to the frame top surface SF1. The groove TR1 and the groove TR2 are arranged to face each other in the thickness direction. The groove TR1 and the groove TR2 are formed, for example, by pressing the tip of a knife against the blank 700G. Thereafter, a calcining step of calcining the blank 700G is performed. In addition, after the calcining step, a coating step may also be performed as necessary.
參考圖22,藉由上述煅燒步驟形成煅燒片700F。於煅燒步驟中,溝槽TR1的內面,暴露於煅燒環境氣體。因此,煅燒片700F之溝槽TR1的內面成為煅燒面。該煅燒面,成為封裝體701的煅燒面SF4A(圖11)。藉由對煅燒片700F施加應力,而施行從溝槽TR1產生裂縫之斷裂步驟。藉由以斷裂步驟使框部120破斷而形成破斷面。該破斷面,成為封裝體701的破斷面SF4B(圖11)。斷裂步驟,亦可為在溝槽TR1與溝槽TR2之間產生裂縫的步驟。藉由斷裂步驟,從煅燒片700F將複數個封裝體701切出。藉由上述方式,獲得封裝體701(圖11)。Referring to FIG. 22 , a
於上述斷裂步驟中,來自溝槽TR1的裂縫,理想上,如圖22中之實線箭頭所示,沿著厚度方向伸展。但實際上,如圖22中之虛線箭頭所示,有裂縫無預期地往介層電極510接近的情形。此一結果,在具有該一方的介層電極510之封裝體701中,有框部120之框底面SF2的最小尺寸LO(圖10)變小之情形。由於過小的最小尺寸LO容易致使封裝體701之漏洩,故最小尺寸LO宜保有某程度的餘裕。依本實施形態,則容易確保此一餘裕。In the above-mentioned breaking step, the crack from the trench TR1 ideally extends in the thickness direction as shown by the solid arrow in FIG. 22. However, in reality, as shown by the dotted arrow in FIG. 22, there is a case where the crack unexpectedly approaches the
圖23係將第1比較例之封裝體791的構成以與圖11相同之視野概略顯示的部分剖面圖。第1比較例之封裝體791的介層電極510之形狀,具有使前述實施形態1之封裝體701(圖11)的介層電極510之形狀上下反轉的形狀。此一結果,於封裝體791中,不同於實施形態1,端面SFA的直徑較底面SFB的直徑更大。因此,在欲製造封裝體791(圖23)的步驟中,成為無法無視由於如空腔CV與介層電極510彼此接近等製造誤差之發生而製造出如圖24所示的第2比較例之封裝體792的機率。FIG. 23 is a partial cross-sectional view schematically showing the structure of the
於封裝體792中,介層電極510之端面SFA到達至空腔CV。此一結果,在介層電極510之端面SFA附近,介層電極510之側面往空腔CV露出。於將蓋部980(參考圖2)往封裝體792接合的步驟中,焊料960(參考圖2),容易如箭頭FL(圖24)所示地往空腔CV中流入。由於流入之焊料與水晶坯料890(參考圖2)接觸,而有對水晶振盪器900(參考圖2)的性能造成不良影響之情形。另,因焊料960的流入所導致之對機械特性的不良影響,在安裝於封裝體之元件為水晶坯料890的情況特別受到擔憂,但在其他壓電元件的情況亦發生。進一步,只要安裝於封裝體之元件為電氣元件,則例如對電氣特性的不良影響如未預期之短路等受到擔憂。In the
依本實施形態之封裝體701(圖10及圖11),則第1,由於以滿足LO>LI(參考圖10)的方式配置介層電極510之底面SFB,故在介層電極510之底面SFB,與框部120之框底面SF2的外緣EO之間,可大程度地確保陶瓷間的疊層界面之配置處。此處,陶瓷間的疊層界面,相較於金屬與陶瓷的疊層界面,具有高氣密性。因此,可抑制因沿著疊層界面之漏洩所導致的空腔CV之氣密性的降低。第2,由於介層電極510之端面SFA的直徑DA較介層電極510之底面SFB的直徑DB更小,故即便使介層電極510位於空腔CV附近,近至介層電極510之底面SFB到達空腔CV的程度,仍可使介層電極510之端面SFA位於與空腔CV離隔的位置。藉此,避免介層電極510之側面在介層電極510之端面SFA附近往空腔CV露出。因此,可防止因介層電極510所導致的焊料960之往空腔CV中的流入。由上述內容來看,可確保空腔CV之足夠的氣密性,並防止焊料960之往空腔CV中的流入。According to the package 701 (FIG. 10 and FIG. 11) of the present embodiment, first, since the bottom surface SFB of the
亦可使介層電極510之直徑DA(圖10)為50μm以下。藉此,可使框部120之最小尺寸WD(圖10)亦微細化,例如為200μm以下。此微細化越進展,則沿著基板部110與框部120之間的疊層界面之漏洩容易成為問題,但藉由上述理由,有效地抑制此等問題。The diameter DA (FIG. 10) of the
參考圖10,滿足LO≧LI×1.5的情況,可更充分地抑制因沿著基板部110與框部120之間的疊層界面(參考圖11)之漏洩所導致的空腔之氣密性的降低。10 , when LO≧LI×1.5 is satisfied, the reduction in the airtightness of the cavity due to leakage along the stacking interface (see FIG. 11 ) between the
介層電極510,於厚度方向(圖11的z方向)中之端面SFA與底面SFB的中間位置中,參考圖10,亦可具有(DA+DB)/2以下之直徑。藉此,可充分地確保介層電極510的該中間位置與框部120的外壁面SF4之間的距離。藉此,可提高介層電極510與框部120之間的氣密可靠度。例如即便如同圖22中之虛線箭頭所示,裂縫無預期地往介層電極510接近,仍可防止裂縫到達至介層電極510。The
介層電極510,於厚度方向(圖11的z方向)中,具有從端面SFA以倒推拔形狀延伸的部分。藉此,容易確保介層電極510的端面SFA與空腔CV之間的距離。因此,可更充分地防止因介層電極510所導致的焊料960之往空腔CV中的流入。特別在本實施形態中,使介層電極510全體以倒推拔形狀延伸,故更充分地獲得此一效果。The
框部120之外壁面SF4(圖11),具有與框頂面SF1連結之煅燒面SF4A、及與框底面SF2連結之破斷面SF4B。破斷面SF4B係藉由斷裂步驟而形成,但由於該步驟差異的影響,而有最小尺寸LO(圖10)變小之情形。然而,藉由如同前述地滿足LO>LI,而使最小尺寸LO不易變得過小。因此,可防止因最小尺寸LO過小所導致的氣密性之不足。The outer wall surface SF4 (FIG. 11) of the
滿足LI>0之情況(圖10),於介層電極510之底面SFB附近中,亦避免介層電極510之側面往空腔CV露出。因此,可更確實地防止焊料960之往空腔CV中的流入。然則,不必非得滿足LI>0。關於與LI=0對應的變形例,於下方說明。When LI>0 is satisfied (FIG. 10), the side surface of the
圖25係將本實施形態1的變形例之封裝體710的構成以與圖11相同之視野概略顯示的部分剖面圖。圖26係將封裝體710的構成以與圖10相同之視野概略顯示的部分俯視圖。圖27係說明圖26所示的介層電極510之底面SFB的構成之俯視圖。參考圖11(實施形態1),於本變形例中,並未滿足LI>0。FIG25 is a partial cross-sectional view schematically showing the structure of the
介層電極510,於框底面SF2(圖25)具有外周PR(圖27)。外周PR,由沿著直徑DB之圓形的圓弧部分PRa、及沿著框底面SF2的內緣EI之一部分EIc的缺口部分PRb所形成。缺口部分PRb,位於使上述圓形凹缺的位置。另,於本變形例中,框部120的內緣EI,視作包含沿著缺口部分PRb之一部分EIc。於本變形例中,由於介層電極510之底面SFB與框部120的內緣EI之一部分EIc接觸,故圖11中定義之最小尺寸LI為零。The
依本變形例,則使介層電極510之外周PR,具有沿著框部120之框底面SF2的內緣EI之一部分EIc的缺口部分。藉此,容易將介層電極510往空腔CV靠近配置。因此,可更充分地抑制因沿著基板部110與框部120之間的疊層界面之漏洩所導致的空腔之氣密性的降低。According to this modification, the outer periphery PR of the
介層電極510之外周PR的缺口部分PRb(圖27),亦可具有朝向介層電極510之底面SFB的裡側之凸形。此一情況,可將介層電極510配置在空腔CV的角隅。藉此,容易大程度地確保最小尺寸LO(參考圖10)。藉此,可更充分地抑制因沿著基板部110與框部120之間的疊層界面之漏洩所導致的空腔之氣密性的降低。另,作為此一情況的典型例,使框部120的內緣EI具有略矩形形狀,沿著矩形形狀的各角部使內緣EI之一部分EIc延伸。各角部,於圖10所示的例子中倒角為圓弧狀,因此,內緣EI之一部分EIc亦呈圓弧狀地延伸。The notch portion PRb (FIG. 27) of the outer periphery PR of the
圖28係用於說明介層電極510(圖11)之構成的細節之圖。介層電極510,於厚度方向(圖28的z方向)全體中,從端面SFA至底面SFB具有倒推拔形狀。此一倒推拔,以厚度方向(圖中為z方向)作為基準,宜具有5度以上之推拔角TP。藉此,容易確保介層電極510的端面SFA與空腔CV之間的距離。因此,可更充分地防止因介層電極510所導致的焊料960之往空腔CV中的流入。另,本實施形態中,使介層電極510,如同上述地於厚度方向全體中具有倒推拔形狀,關於與其不同的形態,於以下實施形態2及3中說明。FIG. 28 is a diagram for explaining the details of the structure of the interlayer electrode 510 (FIG. 11). The
<實施形態2>
圖29係用於說明本實施形態2之封裝體702所具有的介層電極520之構成的細節之圖。在與厚度方向平行之剖面視圖(圖29)中,介層電極520,具有將端面SFA與底面SFB連結的側面。點KA及點KB,分別顯示在厚度方向中之端面SFA及底面SFB的位置之該側面的位置。點KV,顯示在厚度方向中之點KA與點KB間之該側面的位置。點KW,顯示在厚度方向中之點KV與點KB間之該側面的位置。上述側面,亦可具有至少1個折曲點;本實施形態中,作為往相反方向彎曲的2個折曲點,具有點KV及點KW。介層電極520,具備:部分521,具有從點KA至點KV之側面;部分522,具有從點KV至點KW之側面;以及部分523,具有從點KW至點KB之側面。部分521,於厚度方向中從端面SFA以倒推拔形狀延伸,此一倒推拔形狀之推拔角TP宜為5度以上。部分522,具有較部分521更平緩的倒推拔形狀、或圓筒狀形狀。部分523,具有較部分522更陡峭的倒推拔形狀。
<Implementation Form 2>
FIG. 29 is a diagram for explaining the details of the structure of the
另,關於上述以外之構成,由於與上述實施形態1或其變形例之構成幾近相同,故對於相同或相對應的要素賦予相同符號,不重複其說明。In addition, regarding the configuration other than the above, since it is almost the same as the configuration of the above-mentioned
依本實施形態2,則介層電極520之側面,具有折曲點(具體而言,點KV及點KW)。藉此,可抑制因封裝體702的製造中之燒結收縮所導致的介層電極520之側面與框部120間的剝離。藉由使作為折曲點的點KV及點KW往相反方向彎曲,而使其效果更為充足。According to the second embodiment, the side surface of the
另,介層電極520,宜使從端面SFA往底面SFB以倒推拔形狀延伸的部分,具有較框部120之厚度的1/2更厚之厚度。藉此,容易確保介層電極520的端面SFA與空腔CV(參考圖11)之間的距離。因此,可更充分地防止因介層電極520所導致的焊料之往空腔CV中的流入。In addition, the portion of the
<實施形態3>
圖30係用於說明本實施形態3之封裝體703所具有的介層電極530之構成的細節之圖。介層電極530,具備:部分531,具有從點KA至點KV之側面;部分532,具有從點KV至點KW之側面;以及部分533,具有從點KW至點KB之側面。部分531,於厚度方向中從端面SFA以倒推拔延伸,此一倒推拔形狀之推拔角TP宜為5度以上。部分532,於從端面SFA往底面SFB的方向中,具有推拔形狀而非倒推拔形狀。換而言之,部分532,於從端面SFA往底面SFB的方向中,具有推拔形狀。部分533,於從端面SFA往底面SFB的方向中,具有倒推拔形狀。
<Implementation Form 3>
FIG. 30 is a diagram for explaining the details of the structure of the
另,關於上述以外之構成,由於與上述實施形態2之構成幾近相同,故對於相同或相對應的要素賦予相同符號,不重複其說明。依本實施形態,則使抑制因燒結收縮所導致的介層電極520之側面與框部120間的剝離之效果,較實施形態2更為提高。In addition, since the structures other than the above are almost the same as those of the above-mentioned embodiment 2, the same symbols are given to the same or corresponding elements, and their descriptions are not repeated. According to this embodiment, the effect of suppressing the peeling between the side surface of the
另,介層電極530,宜使從端面SFA向底面SFB以倒推拔形狀延伸的部分,具體而言,部分531及部分533,具有較框部120之厚度的1/2更厚之厚度。藉此,容易確保介層電極530的端面SFA與空腔CV(參考圖11)之間的距離。因此,可更充分地防止因介層電極530所導致的焊料之往空腔CV中的流入。In addition, the portion of the
<實施形態4>
圖31係將本實施形態4之封裝體720的構成以與實施形態1的圖10相同之視野概略顯示的部分俯視圖。圖32係,沿著圖31的線XXXII-XXXII之概略部分剖面圖。圖33係將封裝體720的構成以與實施形態1的圖7相同之視野概略顯示的部分俯視圖。
<Implementation Form 4>
FIG. 31 is a partial top view schematically showing the structure of the
於封裝體720中,電極層200,在與介層電極510之底面SFB接觸的部分局部性地變厚。此係由於參考圖34並於根據後述的理由,使電極層200,具有與介層電極510之底面SFB接觸的隆起部222之緣故。此外,由於此一緣故,框部120之框底面SF2,具有與介層電極510之底面SFB直接連結的傾斜區域SF2d(第1區域)、及經由傾斜區域SF2d而與介層電極510之底面SFB連結的平行區域SF2f(第2區域)。第2區域SF2f垂直於厚度方向。傾斜區域SF2d,相對於平行區域SF2f,以越接近介層電極510之底面SFB則框部120的厚度越變小之方式傾斜。該傾斜的角度,例如為4°以上、20°以下。In the
俯視(圖31)時,隆起部222,與框部120之框底面SF2的外緣EO離隔。此外,俯視時,從外緣EO算起之隆起部222的最小尺寸(換而言之,最小距離),宜較最小尺寸LI(圖10)更大,更宜為LI×1.5以上。When viewed from above (FIG. 31), the raised
另,在圖31及圖32所例示之構成中,於俯視時,傾斜區域SF2d將介層電極510之底面SFB完全包圍,此外,平行區域SF2f將此傾斜區域SF2d完全包圍。然而,作為變形例,平行區域SF2f無須將傾斜區域SF2d完全包圍。作為更另一變形例,進一步,傾斜區域SF2d亦無須將介層電極510之底面SFB完全包圍。此等變形例,例如,相當於將隆起部222應用在如圖25及圖26(實施形態1的變形例)所示地使介層電極510配置於空腔CV旁之構成的情況。In the configurations illustrated in FIGS. 31 and 32 , when viewed from above, the inclined region SF2d completely surrounds the bottom surface SFB of the
此外,於圖32中,隆起部222,藉由中繼電極220而從基板部110(具體而言,作為基板部110之一部分的絕緣膜110i)完全分離。作為變形例,隆起部222,亦可與基板部110(具體而言,作為基板部110之一部分的絕緣膜110i)接觸。In addition, in FIG32 , the raised
藉由使傾斜區域SF2d(圖32)如同前述地傾斜,而能夠以大致維持介層電極510之構成的方式,將介層電極510之側面與框底面SF2所夾的鈍角SH(圖32)更為增大。因此,可緩和因在主要由金屬形成的介層電極510與由陶瓷形成的框部120之間的熱膨脹之差異所導致的熱應力。因此,可防止因熱應力所導致的裂縫、或在介層電極510與框部120之間的剝離。By making the tilted region SF2d (FIG. 32) tilt as described above, the blunt angle SH (FIG. 32) between the side surface of the
圖34係將封裝體720的製造方法之與實施形態1的圖17相對應之步驟概略顯示的部分剖面圖。於此步驟中,在框部坯體GF的介層孔VH(圖16)內,形成介層電極510(圖34)。具體而言,藉由網版印刷法,往介層孔VH中充填電極膠,而後使其乾燥。此一充填,宜藉由使電極膠從框底面SF2往框頂面SF1流入而施行。將具有若干餘裕量的電極膠供給至介層孔VH(圖16)內之幾近全體,俾將介層電極510確實地形成,而後使其乾燥,則如圖34所示,於框底面SF2上,以從介層孔VH隆起之方式形成電極膠的隆起部222p。此隆起部222p,由於在疊層步驟(參考圖19至圖20之步驟)中藉由基板坯體GS往介層孔VH抵緊,而對封裝體720賦予隆起部222(圖32)。FIG34 is a partial cross-sectional view schematically showing the steps corresponding to FIG17 of the
另,關於上述以外之構成,由於與上述實施形態1~3的任一者或其變形例之構成幾近相同,故對於相同或相對應的要素賦予相同符號,不重複其說明。In addition, regarding the configuration other than the above, since it is almost the same as the configuration of any one of the above-mentioned
100:陶瓷部 110:基板部 110i:絕緣膜 120:框部 200:電極層 211,212:元件電極墊 220:中繼電極 222:隆起部 222p:隆起部 301~304:封裝體電極墊 401~403:配線層 411~414:基板介層電極 510,520,530:介層電極 521~523,531~533:部分 600:金屬化層 700F:煅燒片 700G:坯片 701,702,703,710,720:封裝體 701G:區域 791,792:封裝體 890:水晶坯料 900:水晶振盪器(電氣零件) 960:焊料 980:蓋部 BR:斷裂面 CV:空腔 DA,DB:直徑 EI:內緣 EIc:內緣之一部分 EO:外緣 GF:框部坯體 GS:基板坯體 KA,KB,KV,KW:點 LI:從內緣算起之最小尺寸 LO:從外緣算起之最小尺寸 PR:外周 PRa:圓弧部分 PRb:缺口部分 SF1:框頂面(第1面) SF2:框底面(第2面) SF2d:傾斜區域(第1區域) SF2f:平行區域(第2區域) SF3:基板頂面(第3面) SF3C:空腔面部分 SF3S:支持面部分 SF4:外壁面 SF4A:煅燒面 SF4B:破斷面 SFA:端面 SFB:底面 SH:鈍角 TP:推拔角 TR1,TR2:溝槽 UN0~UN4:區域 VH:介層孔 WD:內緣與外緣之間的最小尺寸 100: Ceramic part 110: Substrate part 110i: Insulating film 120: Frame part 200: Electrode layer 211,212: Component electrode pad 220: Relay electrode 222: Raised part 222p: Raised part 301~304: Package electrode pad 401~403: Wiring layer 411~414: Substrate interlayer electrode 510,520,530: Interlayer electrode 521~523,531~533: Partial 600: Metallization layer 700F: Sintered sheet 700G: Green sheet 701,702,703,710,720: Package 701G: Area 791,792: Package 890: Crystal blank 900: Crystal oscillator (electrical parts) 960: Solder 980: Cover BR: Fracture surface CV: Cavity DA,DB: Diameter EI: Inner edge EIc: Part of the inner edge EO: Outer edge GF: Frame blank GS: Substrate blank KA,KB,KV,KW: Point LI: Minimum dimension from the inner edge LO: Minimum dimension from the outer edge PR: Periphery PRa: Arc part PRb: Notch part SF1: Frame top surface (first surface) SF2: frame bottom surface (second surface) SF2d: inclined area (first area) SF2f: parallel area (second area) SF3: substrate top surface (third surface) SF3C: cavity surface part SF3S: support surface part SF4: outer wall surface SF4A: calcined surface SF4B: fracture surface SFA: end surface SFB: bottom surface SH: blunt angle TP: push angle TR1,TR2: groove UN0~UN4: area VH: via WD: minimum size between inner edge and outer edge
圖1係概略顯示實施形態1之水晶振盪器的構成之俯視圖。
圖2係沿著圖1的線II-II之概略剖面圖。
圖3係概略顯示圖1之水晶振盪器的製造方法之一步驟的俯視圖。
圖4係沿著圖3的線IV-IV之概略剖面圖。
圖5係概略顯示實施形態1之封裝體的構成之俯視圖。
圖6係沿著圖5的線VI-VI之概略剖面圖。
圖7係將圖5之金屬化層及框部的圖示省略之俯視圖。
圖8係概略顯示圖7之基板部及介層電極,並將封裝體電極墊以虛線顯示之俯視圖。
圖9係將圖5之框部上之金屬化層的圖示省略之俯視圖。
圖10係圖9之部分放大圖。
圖11係沿著圖5的線XI-XI之概略部分剖面圖。
圖12係概略顯示實施形態1之封裝體的製造方法中之基板坯體的構成之部分俯視圖。
圖13係概略顯示圖12所示之基板坯體的基板部及基板介層電極,並將封裝體電極墊以虛線顯示之部分俯視圖。
圖14係沿著圖12及圖13的線XIV-XIV之概略部分剖面圖。
圖15係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖16係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖17係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖18係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖19係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖20係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖21係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖22係概略顯示實施形態1之封裝體的製造方法之一步驟的部分剖面圖。
圖23係將第1比較例之封裝體的構成以與圖11相同之視野概略顯示的部分剖面圖。
圖24係將第2比較例之封裝體的構成以與圖11相同之視野概略顯示的部分剖面圖。
圖25係將實施形態1的變形例之封裝體的構成以與圖11相同之視野概略顯示的部分剖面圖。
圖26係將實施形態1的變形例之封裝體的構成以與圖10相同之視野概略顯示的部分俯視圖。
圖27係說明圖26之封裝體所具有的介層電極之底面的構成之俯視圖。
圖28係用於說明圖11所示的介層電極之構成的細節之圖。
圖29係用於說明本發明的實施形態2之封裝體所具有的介層電極之構成的細節之圖。
圖30係用於說明本發明的實施形態3之封裝體所具有的介層電極之構成的細節之圖。
圖31係將實施形態4之封裝體的構成以與實施形態1的圖10相同之視野概略顯示的部分俯視圖。
圖32係沿著圖31的線XXXII-XXXII之概略部分剖面圖。
圖33係將實施形態4之封裝體的構成以與實施形態1的圖7相同之視野概略顯示的部分俯視圖。
圖34係概略顯示實施形態4之封裝體的製造方法中之與實施形態1的圖17相對應之步驟的部分剖面圖。
FIG. 1 is a top view schematically showing the structure of the crystal oscillator of the
110:基板部 110: Baseboard
110i:絕緣膜 110i: Insulation film
120:框部 120: Frame
200:電極層 200:Electrode layer
220:中繼電極 220: Relay electrode
302:封裝體電極墊 302: Package electrode pad
403:配線層 403: Wiring layer
510:介層電極 510: Dielectric electrode
600:金屬化層 600:Metallization layer
701:封裝體 701:Package
CV:空腔 CV: Cavity
EI:內緣 EI: Internal edge
EO:外緣 EO: Outer Edge
SF1:框頂面(第1面) SF1: Frame top (1st side)
SF2:框底面(第2面) SF2: Frame bottom (2nd side)
SF3:基板頂面(第3面) SF3: Substrate top surface (3rd surface)
SF3C:空腔面部分 SF3C: Cavity surface part
SF3S:支持面部分 SF3S: Support surface part
SF4:外壁面 SF4: Outer wall
SF4A:煅燒面 SF4A: calcined surface
SF4B:破斷面 SF4B: Broken surface
SFA:端面 SFA: end face
SFB:底面 SFB: Bottom surface
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JP2003218660A (en) * | 2002-01-24 | 2003-07-31 | Kyocera Corp | Package for storing piezoelectric vibrator |
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TW201352084A (en) * | 2012-03-14 | 2013-12-16 | Ngk Spark Plug Co | Ceramic substrate and method of manufacturing the same |
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