TWI811636B - Inorganic substrate/engineering plastic film laminate with protective film, stacking of laminates, storage method of laminates, and transportation method of laminates - Google Patents
Inorganic substrate/engineering plastic film laminate with protective film, stacking of laminates, storage method of laminates, and transportation method of laminates Download PDFInfo
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- TWI811636B TWI811636B TW110106237A TW110106237A TWI811636B TW I811636 B TWI811636 B TW I811636B TW 110106237 A TW110106237 A TW 110106237A TW 110106237 A TW110106237 A TW 110106237A TW I811636 B TWI811636 B TW I811636B
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- Prior art keywords
- engineering plastic
- plastic film
- inorganic substrate
- protective film
- film
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- 229920006351 engineering plastic Polymers 0.000 title claims abstract description 178
- 239000000758 substrate Substances 0.000 title claims abstract description 160
- 230000001681 protective effect Effects 0.000 title claims abstract description 149
- 238000000034 method Methods 0.000 title claims abstract description 57
- 239000002651 laminated plastic film Substances 0.000 title claims abstract description 42
- 238000003860 storage Methods 0.000 title abstract description 11
- 239000002985 plastic film Substances 0.000 claims abstract description 124
- 239000000463 material Substances 0.000 claims abstract description 55
- 230000003746 surface roughness Effects 0.000 claims abstract description 28
- 239000000853 adhesive Substances 0.000 claims abstract description 22
- 230000001070 adhesive effect Effects 0.000 claims abstract description 22
- 239000010410 layer Substances 0.000 claims abstract description 19
- 239000012790 adhesive layer Substances 0.000 claims abstract description 9
- 238000004806 packaging method and process Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 abstract description 23
- 239000010408 film Substances 0.000 description 171
- 239000011521 glass Substances 0.000 description 51
- 229920001721 polyimide Polymers 0.000 description 26
- -1 polyethylene naphthalate Polymers 0.000 description 22
- 239000004952 Polyamide Substances 0.000 description 16
- 229920002647 polyamide Polymers 0.000 description 16
- 239000002243 precursor Substances 0.000 description 16
- 229920005989 resin Polymers 0.000 description 16
- 239000011347 resin Substances 0.000 description 16
- 239000004642 Polyimide Substances 0.000 description 14
- 239000000243 solution Substances 0.000 description 14
- 238000010438 heat treatment Methods 0.000 description 11
- 229920000728 polyester Polymers 0.000 description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 8
- 239000010409 thin film Substances 0.000 description 8
- NVKGJHAQGWCWDI-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenyl]-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N)=CC=C1C1=CC=C(N)C=C1C(F)(F)F NVKGJHAQGWCWDI-UHFFFAOYSA-N 0.000 description 7
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 150000004984 aromatic diamines Chemical class 0.000 description 6
- 238000001035 drying Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 6
- 229920000642 polymer Polymers 0.000 description 6
- 239000004962 Polyamide-imide Substances 0.000 description 5
- 239000004743 Polypropylene Substances 0.000 description 5
- 239000000919 ceramic Substances 0.000 description 5
- 229920002312 polyamide-imide Polymers 0.000 description 5
- 229920006254 polymer film Polymers 0.000 description 5
- 229920001155 polypropylene Polymers 0.000 description 5
- 235000012431 wafers Nutrition 0.000 description 5
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 4
- 239000004698 Polyethylene Substances 0.000 description 4
- 239000006087 Silane Coupling Agent Substances 0.000 description 4
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 150000004985 diamines Chemical class 0.000 description 4
- 238000005516 engineering process Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- 239000010954 inorganic particle Substances 0.000 description 4
- 229920000573 polyethylene Polymers 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000002966 varnish Substances 0.000 description 4
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 3
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 3
- 239000000956 alloy Substances 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 239000005388 borosilicate glass Substances 0.000 description 3
- 239000000292 calcium oxide Substances 0.000 description 3
- ODINCKMPIJJUCX-UHFFFAOYSA-N calcium oxide Inorganic materials [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 3
- 235000012255 calcium oxide Nutrition 0.000 description 3
- 150000002466 imines Chemical class 0.000 description 3
- 229910052757 nitrogen Inorganic materials 0.000 description 3
- 239000000123 paper Substances 0.000 description 3
- 229920003207 poly(ethylene-2,6-naphthalate) Polymers 0.000 description 3
- 239000011112 polyethylene naphthalate Substances 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 229910052814 silicon oxide Inorganic materials 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 239000002904 solvent Substances 0.000 description 3
- 238000003786 synthesis reaction Methods 0.000 description 3
- 238000009864 tensile test Methods 0.000 description 3
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 2
- LJMPOXUWPWEILS-UHFFFAOYSA-N 3a,4,4a,7a,8,8a-hexahydrofuro[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1C2C(=O)OC(=O)C2CC2C(=O)OC(=O)C21 LJMPOXUWPWEILS-UHFFFAOYSA-N 0.000 description 2
- ICNFHJVPAJKPHW-UHFFFAOYSA-N 4,4'-Thiodianiline Chemical compound C1=CC(N)=CC=C1SC1=CC=C(N)C=C1 ICNFHJVPAJKPHW-UHFFFAOYSA-N 0.000 description 2
- BKQWDTFZUNGWNV-UHFFFAOYSA-N 4-(3,4-dicarboxycyclohexyl)cyclohexane-1,2-dicarboxylic acid Chemical compound C1C(C(O)=O)C(C(=O)O)CCC1C1CC(C(O)=O)C(C(O)=O)CC1 BKQWDTFZUNGWNV-UHFFFAOYSA-N 0.000 description 2
- QYIMZXITLDTULQ-UHFFFAOYSA-N 4-(4-amino-2-methylphenyl)-3-methylaniline Chemical compound CC1=CC(N)=CC=C1C1=CC=C(N)C=C1C QYIMZXITLDTULQ-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- JHCBFGGESJQAIQ-UHFFFAOYSA-N 4-[(4-amino-3,5-dimethylcyclohexyl)methyl]-2,6-dimethylcyclohexan-1-amine Chemical compound C1C(C)C(N)C(C)CC1CC1CC(C)C(N)C(C)C1 JHCBFGGESJQAIQ-UHFFFAOYSA-N 0.000 description 2
- IGSBHTZEJMPDSZ-UHFFFAOYSA-N 4-[(4-amino-3-methylcyclohexyl)methyl]-2-methylcyclohexan-1-amine Chemical compound C1CC(N)C(C)CC1CC1CC(C)C(N)CC1 IGSBHTZEJMPDSZ-UHFFFAOYSA-N 0.000 description 2
- DZIHTWJGPDVSGE-UHFFFAOYSA-N 4-[(4-aminocyclohexyl)methyl]cyclohexan-1-amine Chemical compound C1CC(N)CCC1CC1CCC(N)CC1 DZIHTWJGPDVSGE-UHFFFAOYSA-N 0.000 description 2
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 2
- NKYXYJFTTIPZDE-UHFFFAOYSA-N 4-[4-amino-2-(trifluoromethyl)phenoxy]-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N)=CC=C1OC1=CC=C(N)C=C1C(F)(F)F NKYXYJFTTIPZDE-UHFFFAOYSA-N 0.000 description 2
- YGYCECQIOXZODZ-UHFFFAOYSA-N 4415-87-6 Chemical compound O=C1OC(=O)C2C1C1C(=O)OC(=O)C12 YGYCECQIOXZODZ-UHFFFAOYSA-N 0.000 description 2
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- WVOLTBSCXRRQFR-SJORKVTESA-N Cannabidiolic acid Natural products OC1=C(C(O)=O)C(CCCCC)=CC(O)=C1[C@@H]1[C@@H](C(C)=C)CCC(C)=C1 WVOLTBSCXRRQFR-SJORKVTESA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- GPXJNWSHGFTCBW-UHFFFAOYSA-N Indium phosphide Chemical compound [In]#P GPXJNWSHGFTCBW-UHFFFAOYSA-N 0.000 description 2
- 229910001374 Invar Inorganic materials 0.000 description 2
- 229920000106 Liquid crystal polymer Polymers 0.000 description 2
- 239000004977 Liquid-crystal polymers (LCPs) Substances 0.000 description 2
- 239000004696 Poly ether ether ketone Substances 0.000 description 2
- 239000004721 Polyphenylene oxide Substances 0.000 description 2
- ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 2
- 229920001646 UPILEX Polymers 0.000 description 2
- 239000004760 aramid Substances 0.000 description 2
- 229920003235 aromatic polyamide Polymers 0.000 description 2
- TZCXTZWJZNENPQ-UHFFFAOYSA-L barium sulfate Chemical compound [Ba+2].[O-]S([O-])(=O)=O TZCXTZWJZNENPQ-UHFFFAOYSA-L 0.000 description 2
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 2
- WVOLTBSCXRRQFR-DLBZAZTESA-M cannabidiolate Chemical compound OC1=C(C([O-])=O)C(CCCCC)=CC(O)=C1[C@H]1[C@H](C(C)=C)CCC(C)=C1 WVOLTBSCXRRQFR-DLBZAZTESA-M 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- VKIRRGRTJUUZHS-UHFFFAOYSA-N cyclohexane-1,4-diamine Chemical compound NC1CCC(N)CC1 VKIRRGRTJUUZHS-UHFFFAOYSA-N 0.000 description 2
- DIOQZVSQGTUSAI-UHFFFAOYSA-N decane Chemical compound CCCCCCCCCC DIOQZVSQGTUSAI-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000009477 glass transition Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- NLYAJNPCOHFWQQ-UHFFFAOYSA-N kaolin Chemical compound O.O.O=[Al]O[Si](=O)O[Si](=O)O[Al]=O NLYAJNPCOHFWQQ-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000000395 magnesium oxide Substances 0.000 description 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 2
- 235000012245 magnesium oxide Nutrition 0.000 description 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 239000003921 oil Substances 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 2
- 229920001230 polyarylate Polymers 0.000 description 2
- 229920000570 polyether Polymers 0.000 description 2
- 229920002530 polyetherether ketone Polymers 0.000 description 2
- 229920000139 polyethylene terephthalate Polymers 0.000 description 2
- 239000005020 polyethylene terephthalate Substances 0.000 description 2
- 229920001296 polysiloxane Polymers 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000005060 rubber Substances 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012360 testing method Methods 0.000 description 2
- 150000003673 urethanes Chemical class 0.000 description 2
- 239000011787 zinc oxide Substances 0.000 description 2
- PFNQVRZLDWYSCW-UHFFFAOYSA-N (fluoren-9-ylideneamino) n-naphthalen-1-ylcarbamate Chemical compound C12=CC=CC=C2C2=CC=CC=C2C1=NOC(=O)NC1=CC=CC2=CC=CC=C12 PFNQVRZLDWYSCW-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- BCMCBBGGLRIHSE-UHFFFAOYSA-N 1,3-benzoxazole Chemical compound C1=CC=C2OC=NC2=C1 BCMCBBGGLRIHSE-UHFFFAOYSA-N 0.000 description 1
- FWHUTKPMCKSUCV-UHFFFAOYSA-N 1,3-dioxo-3a,4,5,6,7,7a-hexahydro-2-benzofuran-5-carboxylic acid Chemical compound C1C(C(=O)O)CCC2C(=O)OC(=O)C12 FWHUTKPMCKSUCV-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- WCZNKVPCIFMXEQ-UHFFFAOYSA-N 2,3,5,6-tetramethylbenzene-1,4-diamine Chemical compound CC1=C(C)C(N)=C(C)C(C)=C1N WCZNKVPCIFMXEQ-UHFFFAOYSA-N 0.000 description 1
- VOZKAJLKRJDJLL-UHFFFAOYSA-N 2,4-diaminotoluene Chemical compound CC1=CC=C(N)C=C1N VOZKAJLKRJDJLL-UHFFFAOYSA-N 0.000 description 1
- RLYCRLGLCUXUPO-UHFFFAOYSA-N 2,6-diaminotoluene Chemical compound CC1=C(N)C=CC=C1N RLYCRLGLCUXUPO-UHFFFAOYSA-N 0.000 description 1
- MJAVQHPPPBDYAN-UHFFFAOYSA-N 2,6-dimethylbenzene-1,4-diamine Chemical compound CC1=CC(N)=CC(C)=C1N MJAVQHPPPBDYAN-UHFFFAOYSA-N 0.000 description 1
- WRRQKFXVKRQPDB-UHFFFAOYSA-N 2-(2-aminophenyl)sulfanylaniline Chemical compound NC1=CC=CC=C1SC1=CC=CC=C1N WRRQKFXVKRQPDB-UHFFFAOYSA-N 0.000 description 1
- MXPYJVUYLVNEBB-UHFFFAOYSA-N 2-[2-(2-carboxybenzoyl)oxycarbonylbenzoyl]oxycarbonylbenzoic acid Chemical compound OC(=O)C1=CC=CC=C1C(=O)OC(=O)C1=CC=CC=C1C(=O)OC(=O)C1=CC=CC=C1C(O)=O MXPYJVUYLVNEBB-UHFFFAOYSA-N 0.000 description 1
- FZZMTSNZRBFGGU-UHFFFAOYSA-N 2-chloro-7-fluoroquinazolin-4-amine Chemical compound FC1=CC=C2C(N)=NC(Cl)=NC2=C1 FZZMTSNZRBFGGU-UHFFFAOYSA-N 0.000 description 1
- IKCQWKJZLSDDSS-UHFFFAOYSA-N 2-formyloxyethyl formate Chemical compound O=COCCOC=O IKCQWKJZLSDDSS-UHFFFAOYSA-N 0.000 description 1
- FRWYFWZENXDZMU-UHFFFAOYSA-N 2-iodoquinoline Chemical compound C1=CC=CC2=NC(I)=CC=C21 FRWYFWZENXDZMU-UHFFFAOYSA-N 0.000 description 1
- JRBJSXQPQWSCCF-UHFFFAOYSA-N 3,3'-Dimethoxybenzidine Chemical compound C1=C(N)C(OC)=CC(C=2C=C(OC)C(N)=CC=2)=C1 JRBJSXQPQWSCCF-UHFFFAOYSA-N 0.000 description 1
- LXJLFVRAWOOQDR-UHFFFAOYSA-N 3-(3-aminophenoxy)aniline Chemical compound NC1=CC=CC(OC=2C=C(N)C=CC=2)=C1 LXJLFVRAWOOQDR-UHFFFAOYSA-N 0.000 description 1
- FGWQCROGAHMWSU-UHFFFAOYSA-N 3-[(4-aminophenyl)methyl]aniline Chemical compound C1=CC(N)=CC=C1CC1=CC=CC(N)=C1 FGWQCROGAHMWSU-UHFFFAOYSA-N 0.000 description 1
- UVUCUHVQYAPMEU-UHFFFAOYSA-N 3-[2-(3-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound NC1=CC=CC(C(C=2C=C(N)C=CC=2)(C(F)(F)F)C(F)(F)F)=C1 UVUCUHVQYAPMEU-UHFFFAOYSA-N 0.000 description 1
- DKKYOQYISDAQER-UHFFFAOYSA-N 3-[3-(3-aminophenoxy)phenoxy]aniline Chemical compound NC1=CC=CC(OC=2C=C(OC=3C=C(N)C=CC=3)C=CC=2)=C1 DKKYOQYISDAQER-UHFFFAOYSA-N 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- XSZYBMMYQCYIPC-UHFFFAOYSA-N 4,5-dimethyl-1,2-phenylenediamine Chemical compound CC1=CC(N)=C(N)C=C1C XSZYBMMYQCYIPC-UHFFFAOYSA-N 0.000 description 1
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 description 1
- FWOLORXQTIGHFX-UHFFFAOYSA-N 4-(4-amino-2,3,5,6-tetrafluorophenyl)-2,3,5,6-tetrafluoroaniline Chemical group FC1=C(F)C(N)=C(F)C(F)=C1C1=C(F)C(F)=C(N)C(F)=C1F FWOLORXQTIGHFX-UHFFFAOYSA-N 0.000 description 1
- HSBHHZPXBTXCMZ-UHFFFAOYSA-N 4-(4-amino-3-methylphenyl)-2-methylaniline;toluene Chemical compound CC1=CC=CC=C1.C1=C(N)C(C)=CC(C=2C=C(C)C(N)=CC=2)=C1 HSBHHZPXBTXCMZ-UHFFFAOYSA-N 0.000 description 1
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 1
- NWIVYGKSHSJHEF-UHFFFAOYSA-N 4-[(4-amino-3,5-diethylphenyl)methyl]-2,6-diethylaniline Chemical compound CCC1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=C(CC)C=2)=C1 NWIVYGKSHSJHEF-UHFFFAOYSA-N 0.000 description 1
- QJENIOQDYXRGLF-UHFFFAOYSA-N 4-[(4-amino-3-ethyl-5-methylphenyl)methyl]-2-ethyl-6-methylaniline Chemical compound CC1=C(N)C(CC)=CC(CC=2C=C(CC)C(N)=C(C)C=2)=C1 QJENIOQDYXRGLF-UHFFFAOYSA-N 0.000 description 1
- ZSQIQUAKDNTQOI-UHFFFAOYSA-N 4-[1-(4-aminophenyl)cyclohexyl]aniline Chemical compound C1=CC(N)=CC=C1C1(C=2C=CC(N)=CC=2)CCCCC1 ZSQIQUAKDNTQOI-UHFFFAOYSA-N 0.000 description 1
- HESXPOICBNWMPI-UHFFFAOYSA-N 4-[2-[4-[2-(4-aminophenyl)propan-2-yl]phenyl]propan-2-yl]aniline Chemical compound C=1C=C(C(C)(C)C=2C=CC(N)=CC=2)C=CC=1C(C)(C)C1=CC=C(N)C=C1 HESXPOICBNWMPI-UHFFFAOYSA-N 0.000 description 1
- WUPRYUDHUFLKFL-UHFFFAOYSA-N 4-[3-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(OC=2C=CC(N)=CC=2)=C1 WUPRYUDHUFLKFL-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- LACZRKUWKHQVKS-UHFFFAOYSA-N 4-[4-[4-amino-2-(trifluoromethyl)phenoxy]phenoxy]-3-(trifluoromethyl)aniline Chemical compound FC(F)(F)C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1C(F)(F)F LACZRKUWKHQVKS-UHFFFAOYSA-N 0.000 description 1
- XPAQFJJCWGSXGJ-UHFFFAOYSA-N 4-amino-n-(4-aminophenyl)benzamide Chemical compound C1=CC(N)=CC=C1NC(=O)C1=CC=C(N)C=C1 XPAQFJJCWGSXGJ-UHFFFAOYSA-N 0.000 description 1
- DGRGLKZMKWPMOH-UHFFFAOYSA-N 4-methylbenzene-1,2-diamine Chemical compound CC1=CC=C(N)C(N)=C1 DGRGLKZMKWPMOH-UHFFFAOYSA-N 0.000 description 1
- VVYWUQOTMZEJRJ-UHFFFAOYSA-N 4-n-methylbenzene-1,4-diamine Chemical compound CNC1=CC=C(N)C=C1 VVYWUQOTMZEJRJ-UHFFFAOYSA-N 0.000 description 1
- HJSYPLCSZPEDCQ-UHFFFAOYSA-N 5-[2-(3-amino-4-methylphenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]-2-methylaniline Chemical compound C1=C(N)C(C)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(C)C(N)=C1 HJSYPLCSZPEDCQ-UHFFFAOYSA-N 0.000 description 1
- MARUHZGHZWCEQU-UHFFFAOYSA-N 5-phenyl-2h-tetrazole Chemical compound C1=CC=CC=C1C1=NNN=N1 MARUHZGHZWCEQU-UHFFFAOYSA-N 0.000 description 1
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 1
- 239000005995 Aluminium silicate Substances 0.000 description 1
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 229910004613 CdTe Inorganic materials 0.000 description 1
- 208000032544 Cicatrix Diseases 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- 229910000530 Gallium indium arsenide Inorganic materials 0.000 description 1
- 229910001030 Iron–nickel alloy Inorganic materials 0.000 description 1
- VZUHQRBBQSLSHS-SSZFMOIBSA-N Isoimide Chemical compound C1=CC(Br)=CC=C1\N=C/1C(CCCC2)=C2C(=O)O\1 VZUHQRBBQSLSHS-SSZFMOIBSA-N 0.000 description 1
- 239000004640 Melamine resin Substances 0.000 description 1
- 229920000877 Melamine resin Polymers 0.000 description 1
- 229910000792 Monel Inorganic materials 0.000 description 1
- DMBHHRLKUKUOEG-UHFFFAOYSA-N N-phenyl aniline Natural products C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 1
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 1
- 229920006269 PPS film Polymers 0.000 description 1
- 229920002614 Polyether block amide Polymers 0.000 description 1
- 239000004697 Polyetherimide Substances 0.000 description 1
- 239000004734 Polyphenylene sulfide Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- KEUCYUPOICDBOG-UHFFFAOYSA-N [2-(aminomethyl)-5-bicyclo[2.2.1]heptanyl]methanamine Chemical compound C1C2C(CN)CC1C(CN)C2 KEUCYUPOICDBOG-UHFFFAOYSA-N 0.000 description 1
- GKXVJHDEWHKBFH-UHFFFAOYSA-N [2-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC=C1CN GKXVJHDEWHKBFH-UHFFFAOYSA-N 0.000 description 1
- RPYFJVIASOJLJS-UHFFFAOYSA-N [3-(aminomethyl)-2-bicyclo[2.2.1]heptanyl]methanamine Chemical compound C1CC2C(CN)C(CN)C1C2 RPYFJVIASOJLJS-UHFFFAOYSA-N 0.000 description 1
- OTKFKCIRTBTDKK-UHFFFAOYSA-N [3-(aminomethyl)-5-bicyclo[2.2.1]heptanyl]methanamine Chemical compound C1C(CN)C2C(CN)CC1C2 OTKFKCIRTBTDKK-UHFFFAOYSA-N 0.000 description 1
- QLBRROYTTDFLDX-UHFFFAOYSA-N [3-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCCC(CN)C1 QLBRROYTTDFLDX-UHFFFAOYSA-N 0.000 description 1
- FDLQZKYLHJJBHD-UHFFFAOYSA-N [3-(aminomethyl)phenyl]methanamine Chemical compound NCC1=CC=CC(CN)=C1 FDLQZKYLHJJBHD-UHFFFAOYSA-N 0.000 description 1
- KRENPFWZLNUZCX-UHFFFAOYSA-N [Sb].[As].[P].[N] Chemical compound [Sb].[As].[P].[N] KRENPFWZLNUZCX-UHFFFAOYSA-N 0.000 description 1
- LEVVHYCKPQWKOP-UHFFFAOYSA-N [Si].[Ge] Chemical compound [Si].[Ge] LEVVHYCKPQWKOP-UHFFFAOYSA-N 0.000 description 1
- BAPJBEWLBFYGME-UHFFFAOYSA-N acrylic acid methyl ester Natural products COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 150000007933 aliphatic carboxylic acids Chemical class 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 235000012211 aluminium silicate Nutrition 0.000 description 1
- 239000005407 aluminoborosilicate glass Substances 0.000 description 1
- 239000005354 aluminosilicate glass Substances 0.000 description 1
- 238000003491 array Methods 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- JUPQTSLXMOCDHR-UHFFFAOYSA-N benzene-1,4-diol;bis(4-fluorophenyl)methanone Chemical compound OC1=CC=C(O)C=C1.C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 JUPQTSLXMOCDHR-UHFFFAOYSA-N 0.000 description 1
- LTPBRCUWZOMYOC-UHFFFAOYSA-N beryllium oxide Inorganic materials O=[Be] LTPBRCUWZOMYOC-UHFFFAOYSA-N 0.000 description 1
- CJYIPJMCGHGFNN-UHFFFAOYSA-N bicyclo[2.2.1]heptane-2,3,5,6-tetracarboxylic acid Chemical compound C1C2C(C(O)=O)C(C(=O)O)C1C(C(O)=O)C2C(O)=O CJYIPJMCGHGFNN-UHFFFAOYSA-N 0.000 description 1
- ZPKDUFWKBQYUAT-UHFFFAOYSA-N bicyclo[2.2.1]heptane-2,3-diamine Chemical compound C1CC2C(N)C(N)C1C2 ZPKDUFWKBQYUAT-UHFFFAOYSA-N 0.000 description 1
- KVMMOSKKPJEDNG-UHFFFAOYSA-N bicyclo[2.2.1]heptane-2,5-diamine Chemical compound C1C2C(N)CC1C(N)C2 KVMMOSKKPJEDNG-UHFFFAOYSA-N 0.000 description 1
- VMQNOUCSRQVOKM-UHFFFAOYSA-N bicyclo[2.2.1]heptane-3,5-diamine Chemical compound C1C(N)C2C(N)CC1C2 VMQNOUCSRQVOKM-UHFFFAOYSA-N 0.000 description 1
- QRUKTBUQLMMSLJ-UHFFFAOYSA-N bicyclo[2.2.1]heptane-3,7-diamine Chemical compound C1CC2C(N)CC1C2N QRUKTBUQLMMSLJ-UHFFFAOYSA-N 0.000 description 1
- BKDVBBSUAGJUBA-UHFFFAOYSA-N bicyclo[2.2.2]oct-7-ene-2,3,5,6-tetracarboxylic acid Chemical compound C1=CC2C(C(O)=O)C(C(=O)O)C1C(C(O)=O)C2C(O)=O BKDVBBSUAGJUBA-UHFFFAOYSA-N 0.000 description 1
- GPRLTFBKWDERLU-UHFFFAOYSA-N bicyclo[2.2.2]octane Chemical compound C1CC2CCC1CC2 GPRLTFBKWDERLU-UHFFFAOYSA-N 0.000 description 1
- TUQQUUXMCKXGDI-UHFFFAOYSA-N bis(3-aminophenyl)methanone Chemical compound NC1=CC=CC(C(=O)C=2C=C(N)C=CC=2)=C1 TUQQUUXMCKXGDI-UHFFFAOYSA-N 0.000 description 1
- ZLSMCQSGRWNEGX-UHFFFAOYSA-N bis(4-aminophenyl)methanone Chemical compound C1=CC(N)=CC=C1C(=O)C1=CC=C(N)C=C1 ZLSMCQSGRWNEGX-UHFFFAOYSA-N 0.000 description 1
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 1
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 235000010216 calcium carbonate Nutrition 0.000 description 1
- 239000001506 calcium phosphate Substances 0.000 description 1
- 229910000389 calcium phosphate Inorganic materials 0.000 description 1
- 235000011010 calcium phosphates Nutrition 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000007385 chemical modification Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- VYQRBKCKQCRYEE-UHFFFAOYSA-N ctk1a7239 Chemical compound C12=CC=CC=C2N2CC=CC3=NC=CC1=C32 VYQRBKCKQCRYEE-UHFFFAOYSA-N 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- GEQHKFFSPGPGLN-UHFFFAOYSA-N cyclohexane-1,3-diamine Chemical compound NC1CCCC(N)C1 GEQHKFFSPGPGLN-UHFFFAOYSA-N 0.000 description 1
- WOSVXXBNNCUXMT-UHFFFAOYSA-N cyclopentane-1,2,3,4-tetracarboxylic acid Chemical compound OC(=O)C1CC(C(O)=O)C(C(O)=O)C1C(O)=O WOSVXXBNNCUXMT-UHFFFAOYSA-N 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010790 dilution Methods 0.000 description 1
- 239000012895 dilution Substances 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 125000003438 dodecyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000004049 embossing Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 229910001026 inconel Inorganic materials 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002655 kraft paper Substances 0.000 description 1
- 239000005355 lead glass Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- ZLNQQNXFFQJAID-UHFFFAOYSA-L magnesium carbonate Chemical compound [Mg+2].[O-]C([O-])=O ZLNQQNXFFQJAID-UHFFFAOYSA-L 0.000 description 1
- 239000001095 magnesium carbonate Substances 0.000 description 1
- 229910000021 magnesium carbonate Inorganic materials 0.000 description 1
- 235000014380 magnesium carbonate Nutrition 0.000 description 1
- GVALZJMUIHGIMD-UHFFFAOYSA-H magnesium phosphate Chemical compound [Mg+2].[Mg+2].[Mg+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O GVALZJMUIHGIMD-UHFFFAOYSA-H 0.000 description 1
- 239000004137 magnesium phosphate Substances 0.000 description 1
- 229910000157 magnesium phosphate Inorganic materials 0.000 description 1
- 229960002261 magnesium phosphate Drugs 0.000 description 1
- 235000010994 magnesium phosphates Nutrition 0.000 description 1
- AHADSRNLHOHMQK-UHFFFAOYSA-N methylidenecopper Chemical compound [Cu].[C] AHADSRNLHOHMQK-UHFFFAOYSA-N 0.000 description 1
- 239000012046 mixed solvent Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910001235 nimonic Inorganic materials 0.000 description 1
- 229920006284 nylon film Polymers 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 239000005011 phenolic resin Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920005575 poly(amic acid) Polymers 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
- 229920006267 polyester film Polymers 0.000 description 1
- 229920001601 polyetherimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920000069 polyphenylene sulfide Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000001294 propane Substances 0.000 description 1
- 239000005297 pyrex Substances 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000010992 reflux Methods 0.000 description 1
- 238000007363 ring formation reaction Methods 0.000 description 1
- 231100000241 scar Toxicity 0.000 description 1
- 230000037387 scars Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 1
- SBIBMFFZSBJNJF-UHFFFAOYSA-N selenium;zinc Chemical compound [Se]=[Zn] SBIBMFFZSBJNJF-UHFFFAOYSA-N 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 239000004945 silicone rubber Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
- 125000004079 stearyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000000454 talc Substances 0.000 description 1
- 229910052623 talc Inorganic materials 0.000 description 1
- KKEYFWRCBNTPAC-UHFFFAOYSA-L terephthalate(2-) Chemical compound [O-]C(=O)C1=CC=C(C([O-])=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-L 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 1
- 229920002803 thermoplastic polyurethane Polymers 0.000 description 1
- QORWJWZARLRLPR-UHFFFAOYSA-H tricalcium bis(phosphate) Chemical compound [Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O QORWJWZARLRLPR-UHFFFAOYSA-H 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/12—Interconnection of layers using interposed adhesives or interposed materials with bonding properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B15/00—Layered products comprising a layer of metal
- B32B15/04—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B15/08—Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/10009—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets
- B32B17/10018—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the number, the constitution or treatment of glass sheets comprising only one glass sheet
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/28—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42
- B32B27/281—Layered products comprising a layer of synthetic resin comprising synthetic resins not wholly covered by any one of the sub-groups B32B27/30 - B32B27/42 comprising polyimides
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/02—Physical, chemical or physicochemical properties
- B32B7/022—Mechanical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B7/00—Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
- B32B7/04—Interconnection of layers
- B32B7/06—Interconnection of layers permitting easy separation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B9/00—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00
- B32B9/04—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B9/045—Layered products comprising a layer of a particular substance not covered by groups B32B11/00 - B32B29/00 comprising such particular substance as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/12—Bonding of a preformed macromolecular material to the same or other solid material such as metal, glass, leather, e.g. using adhesives
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
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Abstract
本發明之課題係以保護膜來保護用於可撓性電子裝置的製造方法之工程塑膠/無機基板的積層體。 本發明之解決手段係在依序包含無機基板、工程塑膠薄膜、保護膜的黏著材層、保護膜基材的附有保護膜之無機基板/工程塑膠薄膜積層體中,藉由使無機基板與工程塑膠薄膜之利用90度剝離法的接著強度Fb、和工程塑膠薄膜與保護膜之利用90度剝離法的接著強度Fp以成為Fp<Fb的關係的方式組合,且使前述保護膜基材之與黏著材層相反側的面之表面粗糙度Ra為0.02μm~1.2μm的範圍,而得到保存性、操作性、運輸性良好的附有保護膜之無機基板/工程塑膠薄膜積層體。The object of the present invention is to use a protective film to protect an engineering plastic/inorganic substrate laminate used in a manufacturing method of a flexible electronic device. The solution of the present invention is in an inorganic substrate/engineering plastic film laminate that sequentially includes an inorganic substrate, an engineering plastic film, an adhesive layer of a protective film, and an inorganic substrate/engineering plastic film laminate with a protective film base material. The bonding strength Fb of the engineering plastic film by the 90-degree peeling method, and the bonding strength Fp of the engineering plastic film and the protective film by the 90-degree peeling method are combined in a relationship such that Fp<Fb, and the protective film base material is The surface roughness Ra of the surface opposite to the adhesive material layer is in the range of 0.02 μm to 1.2 μm, thereby obtaining an inorganic substrate/engineering plastic film laminate with a protective film that has good storage properties, operability, and transportation properties.
Description
本發明係關於保管無機基板與工程塑膠薄膜(以下簡稱工程塑膠膜)的積層體時的形態、保管方法,進一步關於其運輸方法的發明。The present invention relates to the form and storage method for storing a laminate of an inorganic substrate and an engineering plastic film (hereinafter referred to as the engineering plastic film), and further relates to a transportation method thereof.
作為用以製造可撓性電子裝置的基板材料,已探討使用聚醯亞胺、芳香族聚醯胺、聚醯胺醯亞胺、聚碳酸酯、聚萘二甲酸乙二酯、聚對苯二甲酸乙二酯等工程塑膠膜。這種工程塑膠膜係以長形的捲狀而製造,因此一般在可撓性裝置的製造中被認為以利用捲對捲(roll-to-roll)方式的生產線較為理想。 另一方面,以往的顯示裝置、感測器陣列、觸控螢幕、印刷配線基板等電子裝置,大多使用玻璃基板、半導體晶圓或者玻璃纖維補強環氧基板等硬質的剛性基板,而關於製造裝置亦以使用這種剛性基板為前提而構成。As substrate materials for manufacturing flexible electronic devices, the use of polyamide, aromatic polyamide, polyamide, polycarbonate, polyethylene naphthalate, polyterephthalate has been studied. Engineering plastic films such as ethylene formate. This kind of engineering plastic film is manufactured in a long roll shape, so it is generally considered ideal to use a roll-to-roll production line in the manufacture of flexible devices. On the other hand, conventional electronic devices such as display devices, sensor arrays, touch screens, and printed wiring boards mostly use hard rigid substrates such as glass substrates, semiconductor wafers, or glass fiber reinforced epoxy substrates. Regarding manufacturing equipment, It is also constructed based on the use of this rigid substrate.
由於這樣的背景,作為使用既有的製造裝置來製造可撓性電子裝置的手法,已知以下述程序製造可撓性電子裝置的手法:使用玻璃基板等的剛性無機基板作為暫時支撐體,並在將工程塑膠膜暫時貼附於暫時支撐體的狀態下進行操作,在工程塑膠膜上進行電子裝置加工之後,將形成有電子裝置的工程塑膠膜從暫時支撐體剝離(專利文獻1)。Against this background, as a method of manufacturing a flexible electronic device using existing manufacturing equipment, a method of manufacturing a flexible electronic device using the following procedure is known: using a rigid inorganic substrate such as a glass substrate as a temporary support, and The engineering plastic film is operated in a state where it is temporarily attached to a temporary support. After the electronic device is processed on the engineering plastic film, the engineering plastic film on which the electronic device is formed is peeled off from the temporary support (Patent Document 1).
又,作為使用既有的製造裝置製造可撓性電子裝置的手法,已知下述手法:使用玻璃基板等剛性基板作為暫時支撐體,將工程塑膠之前驅物以溶液狀態塗布於暫時支撐體並進行乾燥而形成前驅物薄膜後,引發化學反應而使前驅物轉化成工程塑膠,藉此得到暫時支撐體與工程塑膠膜的積層體,以下相同地在工程塑膠膜上形成電子裝置後進行剝離而製造可撓性電子裝置(專利文獻2)。In addition, as a method of manufacturing a flexible electronic device using existing manufacturing equipment, the following method is known: using a rigid substrate such as a glass substrate as a temporary support, applying an engineering plastic precursor in a solution state to the temporary support, and then applying the precursor to the temporary support. After drying to form a precursor film, a chemical reaction is initiated to convert the precursor into engineering plastic, thereby obtaining a laminate of the temporary support and the engineering plastic film. In the same manner, an electronic device is formed on the engineering plastic film and then peeled off. A flexible electronic device is manufactured (Patent Document 2).
亦即,任一手法中皆經過使剛性的暫時支撐體與工程塑膠膜層重合之形態的積層體,該工程塑膠膜最終會被剝離而成為可撓性電子裝置的基材。該積層體可作為剛性的板材來操作,因此可藉由用以製造以往使用玻璃基板的液晶顯示器及電漿顯示器、或者有機EL顯示器等的裝置,與玻璃基板相同地操作。That is, in either method, a laminated body in the form of a rigid temporary support and an engineering plastic film layer is superimposed, and the engineering plastic film will eventually be peeled off to become the base material of the flexible electronic device. Since the laminated body can be handled as a rigid plate material, it can be handled in the same manner as a glass substrate by a device used to manufacture liquid crystal displays, plasma displays, organic EL displays, etc., which have conventionally used glass substrates.
[先前技術文獻] [專利文獻][Prior technical literature] [Patent Document]
[專利文獻1] 日本專利第5152104號公報 [專利文獻2] 日本專利第5699606號公報[Patent Document 1] Japanese Patent No. 5152104 [Patent Document 2] Japanese Patent No. 5699606
[發明欲解決之課題][Problem to be solved by the invention]
本發明的主題係保管以上所述之包含工程塑膠膜與剛性暫時支撐體的積層體時的形態、保管方法、甚至運輸方法。 以往的玻璃基板等剛性無機基板,在保管或運輸時,係以將多片重疊的堆疊形態來處理。在堆疊時,係以在保管後或運輸後容易從堆疊中取出無機基板的方式,在無機基板之間夾入發泡聚合物片或紙等的緩衝材。該方法可應用於具有充分表面硬度的玻璃基板。但本發明所處理的暫時支撐基板與工程塑膠膜的積層體中,工程塑膠膜表面的硬度不足,因此若將積層體堆疊,則積層體的工程塑膠膜面與暫時支撐基板面摩擦,而會在柔軟的工程塑膠膜面上產生傷痕。再者,在放入發泡聚合物片或紙等緩衝材的情況,亦因為混入的異物等而容易在工程塑膠膜表面上產生傷痕。The subject of the present invention is the form, storage method, and even transportation method when storing the above-mentioned laminate including an engineering plastic film and a rigid temporary support. Conventionally, rigid inorganic substrates such as glass substrates are handled in a stacked form in which multiple sheets are stacked during storage or transportation. When stacking, a buffer material such as a foamed polymer sheet or paper is sandwiched between the inorganic substrates so that the inorganic substrates can be easily taken out of the stack after storage or transportation. This method can be applied to glass substrates with sufficient surface hardness. However, in the laminate of the temporary support substrate and the engineering plastic film processed by the present invention, the surface hardness of the engineering plastic film is insufficient. Therefore, if the laminates are stacked, the engineering plastic film surface of the laminate will rub against the temporary support substrate surface, which may cause Causes scars on the surface of soft engineering plastic film. Furthermore, when cushioning materials such as foamed polymer sheets or paper are put in, scratches can easily occur on the surface of the engineering plastic film due to mixed foreign matter.
作為解決此種課題的手段所慣例使用的方法,係藉由保護膜來保護工程塑膠膜面的手法。一般而言,保護膜係在聚乙烯、聚丙烯、聚酯等較為廉價的高分子薄膜之單面上塗布弱接著性的黏著材而成的微黏著薄膜。A commonly used method to solve this problem is to protect the engineering plastic film surface with a protective film. Generally speaking, protective films are micro-adhesive films made by coating one side of relatively cheap polymer films such as polyethylene, polypropylene, and polyester with a weakly adhesive adhesive material.
藉由使用該保護膜,可防止工程塑膠膜面損傷,維持適合形成微細的可撓性電子裝置的工程塑膠膜表面。 然而,本案發明人等面臨下述課題:在將積層體之工程塑膠膜面上貼附有保護膜的附有保護膜之積層體重合多片而進行保管或運送的情況,保護膜面與暫時支撐基板面會貼附而變得難以個別取出。雖亦可與玻璃基板相同地併用發泡聚合物片或紙等緩衝材,但變得除了保護膜之外亦進一步使用輔助材料,變成高成本,並且導致廢棄物增加,因此使用緩衝材不能說是較佳的方法。By using this protective film, the surface of the engineering plastic film can be prevented from being damaged and the surface of the engineering plastic film suitable for forming fine flexible electronic devices can be maintained. However, the inventors of the present case faced the following problem: when a plurality of laminates with a protective film attached to the engineering plastic film surface of the laminate are stacked together for storage or transportation, the protective film surface and the temporary The support substrate surface becomes attached and becomes difficult to remove individually. Although it is possible to use a cushioning material such as a foamed polymer sheet or paper in combination with the glass substrate, it requires the use of auxiliary materials in addition to the protective film, which increases the cost and leads to an increase in waste. Therefore, the use of cushioning materials cannot be said is the better method.
本發明應解決之課題,在於提供一種保管或搬運包含工程塑膠膜與剛性暫時支撐體的積層體時的適當形態及方法。 亦即,本發明提供一種即使在以重疊的狀態長期保管的情況下亦可容易個別取出的附有保護膜之無機基板/工程塑膠薄膜積層體,提供一種將附有保護膜之無機基板/工程塑膠薄膜積層體堆積而成的堆疊,且提供一種使用特定保護膜的無機基板/工程塑膠薄膜積層體的保管方法、及無機基板/工程塑膠薄膜積層體的運輸方法。 [用以解決課題之手段]The problem to be solved by the present invention is to provide an appropriate form and method for storing or transporting a laminated body including an engineering plastic film and a rigid temporary support. That is, the present invention provides an inorganic substrate/engineering plastic film laminate with a protective film that can be easily taken out individually even if it is stored in a stacked state for a long time, and provides an inorganic substrate/engineering process with a protective film. The invention provides a stack of plastic film laminates, a storage method of an inorganic substrate/engineering plastic film laminate using a specific protective film, and a transportation method of the inorganic substrate/engineering plastic film laminate. [Means used to solve problems]
亦即,本發明包含以下構成。 [1]一種附有保護膜之無機基板/工程塑膠薄膜積層體,其特徵為:在依序包含無機基板、工程塑膠薄膜、保護膜的黏著材層、保護膜基材的附有保護膜之無機基板/工程塑膠薄膜積層體中, 無機基板與工程塑膠薄膜之利用90度剝離法的接著強度Fb、和工程塑膠薄膜與保護膜之利用90度剝離法的接著強度Fp係成為Fp<Fb的關係, 且前述保護膜基材之與黏著材層相反側的面之表面粗糙度Ra為0.02μm~1.2μm的範圍。 [2]如[1]記載之附有保護膜之無機基板/工程塑膠薄膜積層體,其特徵為:前述保護膜基材之與黏著材層相反側的面、和前述無機基板之未與工程塑膠薄膜對向側的面之間的動摩擦係數在0.02~0.25的範圍。 [3]如[1]或[2]記載之附有保護膜之無機基板/工程塑膠薄膜積層體,其特徵為:前述無機基板之未面向工程塑膠薄膜側的表面之表面粗糙度Ra在0.01~2nm的範圍。 [4]如[1]至[3]中任一項記載之附有保護膜之無機基板/工程塑膠薄膜積層體,其特徵為:前述無機基板與前述工程塑膠薄膜的接著強度Fb為0.02~0.3N/cm的範圍。 [5]如[1]至[4]中任一項記載之附有保護膜之無機基板/工程塑膠薄膜積層體,其特徵為:前述工程塑膠薄膜與保護膜的接著強度Fp為0.01~0.27N/cm的範圍。 [6]如[1]至[5]中任一項記載之附有保護膜之無機基板/工程塑膠薄膜積層體,其特徵為:無機基板的外接圓的直徑為310mm以上。 [7]如[1]至[6]中任一項記載之附有保護膜之無機基板/工程塑膠薄膜積層體,其特徵為:在23℃、50%RH的環境下放置24小時以上的情況,前述保護膜基材之與黏著材相反側的面之表面電阻為1×106 ~1×1010 [Ω]的範圍。 [8]一種附有保護膜之無機基板/工程塑膠薄膜積層體堆疊,其特徵為:將如前述[1]至[7]中任一項記載之附有保護膜之無機基板/工程塑膠薄膜積層體在層方向上以相同的朝向重疊4片以上。 [9]一種附有保護膜之無機基板/工程塑膠薄膜積層體的保管方法,其特徵為:以如前述[8]記載之附有保護膜之無機基板/工程塑膠薄膜積層體堆疊的形態包裝並進行保管。 [10]一種附有保護膜之無機基板/工程塑膠薄膜積層體的運輸方法,其特徵為:以如前述[8]記載之附有保護膜之無機基板/工程塑膠薄膜積層體堆疊的形態包裝並進行運輸。 [發明之效果]That is, the present invention includes the following configurations. [1] An inorganic substrate/engineering plastic film laminate with a protective film, which is characterized by: sequentially including an inorganic substrate, an engineering plastic film, an adhesive material layer of the protective film, and a protective film base material of the protective film. In the inorganic substrate/engineering plastic film laminate, the bonding strength Fb of the inorganic substrate and the engineering plastic film using the 90-degree peeling method, and the bonding strength Fp of the engineering plastic film and the protective film using the 90-degree peeling method are such that Fp < Fb relationship, and the surface roughness Ra of the surface of the protective film base material opposite to the adhesive layer is in the range of 0.02 μm to 1.2 μm. [2] The inorganic substrate/engineering plastic film laminate with a protective film as described in [1], which is characterized by: the surface of the protective film base material opposite to the adhesive material layer, and the surface of the above-mentioned inorganic substrate not related to the engineering The kinetic friction coefficient between the opposite sides of the plastic film is in the range of 0.02 to 0.25. [3] The inorganic substrate/engineering plastic film laminate with a protective film as described in [1] or [2], characterized in that the surface roughness Ra of the surface of the inorganic substrate not facing the engineering plastic film is 0.01 ~2nm range. [4] The inorganic substrate/engineering plastic film laminate with a protective film according to any one of [1] to [3], characterized in that the bonding strength Fb of the inorganic substrate and the engineering plastic film is 0.02 to 0.3N/cm range. [5] The inorganic substrate with protective film/engineering plastic film laminate according to any one of [1] to [4], characterized in that the bonding strength Fp of the engineering plastic film and the protective film is 0.01 to 0.27 N/cm range. [6] The inorganic substrate/engineering plastic film laminate with a protective film according to any one of [1] to [5], characterized in that the diameter of the circumscribed circle of the inorganic substrate is 310 mm or more. [7] The inorganic substrate/engineering plastic film laminate with a protective film as described in any one of [1] to [6], characterized by being left in an environment of 23°C and 50% RH for more than 24 hours. In this case, the surface resistance of the surface of the protective film base material opposite to the adhesive material is in the range of 1×10 6 to 1×10 10 [Ω]. [8] A stack of an inorganic substrate with a protective film/engineering plastic film laminate, characterized by: the inorganic substrate with a protective film/engineering plastic film as described in any one of the above [1] to [7] Four or more laminated bodies are stacked in the same direction in the layer direction. [9] A method for storing an inorganic substrate/engineering plastic film laminate with a protective film, which is characterized by packaging the inorganic substrate/engineering plastic film laminate with a protective film in a stacked form as described in [8] and keep it. [10] A method of transporting an inorganic substrate/engineering plastic film laminate with a protective film, which is characterized by packaging the inorganic substrate/engineering plastic film laminate with a protective film in a stacked form as described in [8] and transport. [Effects of the invention]
一般保護膜的情況,在堆疊狀態下長期保管的情況,保護膜表面與對向的無機基板面之間的空氣層係因為積層體的重量而逐漸從兩個面之間向外排出,會成為真空密合狀態。此為長期保管時變得難以將積層體個別取出的理由。在積層體的尺寸小的情況下並不會成為大問題,但若假設以顯示器製造裝置操作,則積層體的尺寸係最大為2m×3m左右的大小的玻璃板。若這種尺寸的多片積層體成為真空密合狀態則非常難以剝離,又在暫時支撐基板為玻璃板的情況,變得容易發生玻璃基板的破損等。 藉由使用本發明的特定保護膜,可避免這樣的問題,本發明的附有保護膜之無機基板/工程塑膠膜積層體,即使在重合並作成堆疊的狀態下長期保管的情況,亦可容易個別取出。In the case of general protective films, when stored in a stacked state for a long time, the air layer between the surface of the protective film and the opposite surface of the inorganic substrate will gradually be discharged from between the two surfaces due to the weight of the laminate, resulting in Vacuum sealing state. This is the reason why it becomes difficult to individually take out the laminated bodies during long-term storage. When the size of the laminated body is small, this does not become a big problem. However, assuming that the display manufacturing apparatus is operated, the size of the laminated body is a glass plate of about 2 m×3 m at most. When a multi-sheet laminated body of this size is brought into a vacuum-adhered state, it is very difficult to peel off, and when the temporary support substrate is a glass plate, breakage of the glass substrate or the like becomes easy to occur. By using the specific protective film of the present invention, such problems can be avoided. The inorganic substrate/engineering plastic film laminate with protective film of the present invention can be easily stored for a long time even if it is overlapped and made into a stack. Take out individually.
[用以實施發明的形態][Form used to implement the invention]
作為本發明中的無機基板,可使用玻璃板、半導體晶圓、金屬板、陶瓷板等。 作為前述玻璃板,包含石英玻璃、高矽酸玻璃(96%氧化矽)、鈉鈣玻璃(soda-lime glass)、鉛玻璃、鋁硼矽酸玻璃、硼矽酸玻璃(Pyrex(註冊商標))、硼矽酸玻璃(無鹼)、硼矽酸玻璃(微片(microsheet))、鋁矽酸鹽玻璃等。此等之中,期望係線膨脹係數為5ppm/K以下者,若為市售品則期望為液晶用玻璃之Corning公司製的「Corning(註冊商標) 7059」或「Corning(註冊商標) 1737」、「EAGLE」、Asahi Glass公司製的「AN100」、Nippon Electric Glass公司製的「OA10」、SCHOTT公司製的「AF32」等。 作為前述半導體晶圓,可列舉:矽晶圓、鍺、矽-鍺、鎵-砷、鋁-鎵-銦、氮-磷-砷-銻、SiC、InP(磷化銦)、InGaAs、GaInNAs、LT、LN、ZnO(氧化鋅)或CdTe(碲化鎘)、ZnSe(硒化鋅)等晶圓。 作為前述金屬板,包含W、Mo、Pt、Fe、Ni、Au之類的單一元素金屬、或英高鎳(Inconel)、莫涅爾合金(Monel)、鎳蒙克合金(Nimonic)、碳銅、Fe-Ni系因鋼(invar)合金、超因鋼合金、各種不銹鋼之類的合金等。又,此等金屬亦包含附加其他金屬層、陶瓷層而成的多層金屬板。 作為前述陶瓷板,可使用氧化鋁、氧化鎂、氧化鈣(calcia)、氮化矽、氮化硼、氮化鋁、氧化鈹等單一或複合燒結體。本發明中,使用陶瓷基板的情況,較佳係使用將表面進行玻璃釉(glass glaze)處理而平滑化的陶瓷基板。As the inorganic substrate in the present invention, a glass plate, a semiconductor wafer, a metal plate, a ceramic plate, etc. can be used. Examples of the glass plate include quartz glass, high silicate glass (96% silica), soda-lime glass, lead glass, aluminoborosilicate glass, and borosilicate glass (Pyrex (registered trademark)). , borosilicate glass (alkali-free), borosilicate glass (microsheet), aluminosilicate glass, etc. Among these, the linear expansion coefficient is preferably 5 ppm/K or less. If it is a commercial product, it is preferably "Corning (registered trademark) 7059" or "Corning (registered trademark) 1737" made by Corning Co., Ltd. for liquid crystal glass. , "EAGLE", "AN100" made by Asahi Glass Co., Ltd., "OA10" made by Nippon Electric Glass Co., Ltd., "AF32" made by SCHOTT Co., Ltd., etc. Examples of the semiconductor wafer include: silicon wafer, germanium, silicon-germanium, gallium-arsenic, aluminum-gallium-indium, nitrogen-phosphorus-arsenic-antimony, SiC, InP (indium phosphide), InGaAs, GaInNAs, LT, LN, ZnO (zinc oxide) or CdTe (cadmium telluride), ZnSe (zinc selenide) and other wafers. The aforementioned metal plate includes single-element metals such as W, Mo, Pt, Fe, Ni, and Au, or Inconel, Monel, Nimonic, and carbon copper. , Fe-Ni invar alloy, super invar alloy, various stainless steel and other alloys. In addition, these metals also include multi-layer metal plates with additional metal layers and ceramic layers. As the ceramic plate, single or composite sintered bodies of aluminum oxide, magnesium oxide, calcium oxide (calcia), silicon nitride, boron nitride, aluminum nitride, beryllium oxide, etc. can be used. In the present invention, when using a ceramic substrate, it is preferable to use a ceramic substrate whose surface is smoothed by glass glaze treatment.
本發明中的無機基板的表面粗糙度較佳為0.01~2nm的範圍。無機基板在與工程塑膠積層的情況下,至少與工程塑膠膜相反側的面之表面粗糙度較佳為0.01~2nm的範圍。再者,表面粗糙度的較佳範圍為0.01~0.8nm的範圍,進一步較佳為0.01~0.3nm的範圍。藉由將無機基板的表面粗糙度控制在此範圍,而變得容易控制與工程塑膠薄膜的接著強度,又可使與另外說明的保護膜基材之間的動摩擦係數收斂至既定範圍。The surface roughness of the inorganic substrate in the present invention is preferably in the range of 0.01 to 2 nm. When the inorganic substrate is laminated with engineering plastic, the surface roughness of at least the surface opposite to the engineering plastic film is preferably in the range of 0.01 to 2 nm. Furthermore, the preferred range of surface roughness is the range of 0.01 to 0.8 nm, and the further preferred range is the range of 0.01 to 0.3 nm. By controlling the surface roughness of the inorganic substrate within this range, the bonding strength with the engineering plastic film becomes easy to control, and the dynamic friction coefficient with the protective film base material explained separately can be converged to a predetermined range.
本發明中,無機基板的尺寸,在將無機基板設為長方形時,較佳係外接圓的直徑具有310mm以上的尺寸。藉由使用此大小的尺寸的無機基板,可充分得到為本發明的效果之改善經重疊的積層體的保管、搬運、其他操作性的效果。In the present invention, the size of the inorganic substrate is preferably such that the diameter of the circumscribed circle is 310 mm or more when the inorganic substrate is rectangular. By using an inorganic substrate of this size, it is possible to fully obtain the effects of the present invention that improve storage, transportation, and other operability of stacked laminates.
本發明中的工程塑膠膜,係指即使長時間、較佳為168小時暴露於100℃以上的環境中仍保持49MPa以上之拉伸強度與2.5GPa以上之彎曲彈性係數的高分子化合物的薄膜,較佳為進一步可在150℃中長時間使用、較佳為使用至少168小時的高分子薄膜,其係玻璃轉移溫度為115℃以上、較佳為130℃以上、進一步較佳為145℃以上的高分子薄膜。更具體而言,為非晶聚芳酯(polyarylate)、聚碸、聚醚碸、聚苯硫醚、聚醚醚酮、聚醯亞胺、聚醯胺醯亞胺、聚醚醯亞胺、聚苯并㗁唑、聚萘二甲酸乙二酯、聚矽氧樹脂、氟樹脂、液晶聚合物等的薄膜等。 本發明中特佳為使用具有醯亞胺鍵的高分子薄膜。作為具有醯亞胺鍵的高分子薄膜,可例示聚醯亞胺、聚醯胺醯亞胺、聚醚醯亞胺、聚醯亞胺苯并㗁唑、雙馬來醯亞胺三𠯤(bismaleimide triazine)等。The engineering plastic film in the present invention refers to a film of a polymer compound that maintains a tensile strength of more than 49 MPa and a bending elastic coefficient of more than 2.5 GPa even if it is exposed to an environment above 100°C for a long time, preferably 168 hours. It is preferably a polymer film that can be used for a long time at 150°C, preferably at least 168 hours, and has a glass transition temperature of 115°C or higher, preferably 130°C or higher, and further preferably 145°C or higher. Polymer film. More specifically, it is amorphous polyarylate (polyarylate), polystyrene, polyether sulfide, polyphenylene sulfide, polyether ether ketone, polyamide imide, polyamide amide imine, polyether amide imine, Films of polybenzoethazole, polyethylene naphthalate, polysiloxy resin, fluororesin, liquid crystal polymer, etc. In the present invention, it is particularly preferable to use a polymer film having an imine bond. Examples of the polymer film having an imine bond include polyimide, polyimide imine, polyether imine, polyimide benzoxazole, and bismaleimide triazine) etc.
本發明中,作為聚醯亞胺薄膜,可使用芳香族聚醯亞胺、脂環族聚醯亞胺、聚醯胺醯亞胺、聚醚醯亞胺等。更佳係指包含50%以上之聚醯亞胺骨架的高分子。 一般而言,聚醯亞胺薄膜可藉由下述而獲得:將在溶媒中使二胺類與四羧酸類反應所得到的聚醯胺酸(聚醯亞胺前驅物)溶液,塗布於聚醯亞胺薄膜製作用支撐體並進行乾燥而成為生胚薄膜(green film)(亦稱為「前驅物薄膜」或「聚醯胺酸薄膜」),進一步於聚醯亞胺薄膜製作用支撐體上、或者在將其從該支撐體剝離的狀態下,將生胚薄膜進行高溫熱處理,而使其進行脫水閉環反應。In the present invention, as the polyamideimide film, aromatic polyamideimide, alicyclic polyamideimide, polyamideimide, polyetherimide, etc. can be used. More preferably, it refers to a polymer containing more than 50% polyimide skeleton. Generally speaking, a polyamide film can be obtained by coating a polyamide acid (polyamide precursor) solution obtained by reacting diamines and tetracarboxylic acids in a solvent on a polyamide film. A support for producing a polyimide film is dried and becomes a green film (also known as a "precursor film" or "polyamide film"), which is further used as a support for producing a polyimide film. On the green film, or in a state of being peeled off from the support, the green film is subjected to high-temperature heat treatment to cause dehydration and ring-closure reaction.
作為構成聚醯胺酸的二胺類,並未特別限制,可使用通常用於聚醯亞胺合成的芳香族二胺類、脂肪族二胺類、脂環式二胺類等。從耐熱性的觀點來看,較佳為芳香族二胺類,芳香族二胺類之中,更佳為具有苯并㗁唑結構的芳香族二胺類。若使用具有苯并㗁唑結構的芳香族二胺類,則變得可和高耐熱性一起呈現高彎曲彈性係數、低熱收縮性、低線膨脹係數。二胺類可單獨使用,亦可併用兩種以上。The diamines constituting the polyamide are not particularly limited, and aromatic diamines, aliphatic diamines, alicyclic diamines, etc. that are generally used in the synthesis of polyimides can be used. From the viewpoint of heat resistance, aromatic diamines are preferred, and among aromatic diamines, aromatic diamines having a benzoethazole structure are more preferred. When aromatic diamines having a benzoethazole structure are used, it becomes possible to exhibit high flexural elastic modulus, low thermal shrinkage, and low linear expansion coefficient together with high heat resistance. The diamines may be used alone, or two or more types may be used in combination.
聚醯亞胺樹脂一般大多著色成黃色或茶褐色,但根據化學結構,可得到無色且透明性高的聚醯亞胺薄膜。作為該前驅物的合成中所使用的酸成分,可例示1,2,3,4-環丁烷四羧酸二酐、1,2,4,5-環戊烷四羧酸二酐、1,2,4,5-環己烷四羧酸二酐、雙環[2,2,1]庚烷-2,3,5,6-四羧酸二酐、雙環[2,2,2]辛烷-2,3,5,6-四羧酸二酐、3,3’,4,4’-雙環己基四羧酸二酐、1,2,4-環己烷三羧酸酐等,特佳為1,2,3,4-環丁烷四羧酸二酐、1,2,4,5-環己烷四羧酸二酐、3,3’,4,4’-雙環己基四羧酸二酐。此等的脂肪族羧酸類可單獨使用,亦可併用兩種以上。另一方面,亦有併用雙環[2,2,2]辛-7-烯-2,3,5,6-四羧酸二酐等包含不飽和鍵者的情況。Polyimide resins are generally colored yellow or brown, but depending on the chemical structure, colorless and highly transparent polyimide films can be obtained. Examples of the acid component used in the synthesis of the precursor include 1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1,2,4,5-cyclopentanetetracarboxylic dianhydride, 1 ,2,4,5-cyclohexanetetracarboxylic dianhydride, bicyclo[2,2,1]heptane-2,3,5,6-tetracarboxylic dianhydride, bicyclo[2,2,2]octane Alkane-2,3,5,6-tetracarboxylic dianhydride, 3,3',4,4'-bicyclohexyltetracarboxylic dianhydride, 1,2,4-cyclohexanetricarboxylic anhydride, etc., especially good It is 1,2,3,4-cyclobutanetetracarboxylic dianhydride, 1,2,4,5-cyclohexanetetracarboxylic dianhydride, 3,3',4,4'-bicyclohexyltetracarboxylic acid dianhydride. These aliphatic carboxylic acids may be used alone, or two or more types may be used in combination. On the other hand, those containing an unsaturated bond such as bicyclo[2,2,2]oct-7-ene-2,3,5,6-tetracarboxylic dianhydride may be used in combination.
若將本發明的無色透明聚醯亞胺系樹脂或其前驅物的合成中所使用的二胺成分例示作為二胺化合物,則可列舉:1,3-苯二胺、1,4-苯二胺、2,4-二胺基甲苯、2,6-二胺基甲苯、3,4-二胺基甲苯、4,5-二甲基-1,2-苯二胺、2,5-二甲基-1,4-苯二胺、2,6-二甲基-1,4-苯二胺、2,3,5,6-四甲基-1,4-苯二胺、3-胺基苯甲胺、間苯二甲胺(m-xylylenediamine)、鄰苯二甲胺、1,5-二胺基萘、2,2’-二甲基聯苯-4,4’-二胺、2,2’-雙(三氟甲基)聯苯胺、3,3’-二甲氧基聯苯胺、4,4’-二胺基八氟聯苯、3,3’-二胺基二苯基甲烷、3,4’-二胺基二苯基甲烷、4,4’-二胺基二苯基甲烷、4,4’-亞甲基雙(2,6-二乙基苯胺)、4,4’-亞甲基雙(2-乙基-6-甲基苯胺)、4,4’-伸乙基二苯胺、4,4’-二胺基二苯醚、3,4’-二胺基二苯醚、3,3’-二胺基二苯醚、2,2’-雙(三氟甲基)-4,4’-二胺基二苯醚、1,3-雙(4-胺基苯氧基)苯、1,3-雙(3-胺基苯氧基)苯、1,4-雙(4-胺基苯氧基)苯、1,4-雙(4-胺基-2-三氟甲基苯氧基)苯、4,4’-雙(4-胺基苯氧基)聯苯、4,4’-二胺基-3,3’-二甲基二苯基甲烷、雙[4-(4-胺基苯氧基)苯基]碸、雙[4-(3-胺基苯氧基)苯基]碸、2,2-雙(4-胺基苯基)六氟丙烷、2,2-雙(3-胺基苯基)六氟丙烷、2,2’-雙[4-(4-胺基苯氧基)苯基]丙烷、2,2’-雙[4-(4-胺基苯氧基)苯基]六氟丙烷、2,2-雙(3-胺基-4-甲基苯基)六氟丙烷、α,α’-雙(4-胺基苯基)-1,4-二異丙基苯、雙(2-胺基苯基)硫醚、雙(4-胺基苯基)硫醚、3,3’-二胺基二苯基碸、4,4’-二胺基二苯基碸、4,4’-二胺基二苯硫醚、4,4’-二胺基二苯甲酮、3,3’-二胺基二苯甲酮、4,4’-二胺基苯甲醯胺苯(diaminobenzanilide)、1,4-雙(4-胺基苯氧基)苯、對苯二甲酸雙(4-胺基苯基)酯、2,7-二胺基茀、9,9-雙(4-胺基苯基)茀等芳香族二胺。又,作為脂肪族二胺,可例示:1,3-二胺基環己烷、1,4-二胺基環己烷、1,3-雙(胺基甲基)環己烷、1,1-雙(4-胺基苯基)環己烷、4,4’-二胺基二環己基甲烷、4,4’-亞甲基雙(2-甲基環己胺)、4,4’-亞甲基雙(2,6-二甲基環己胺)、4,4’-二胺基二環己基丙烷、雙環[2.2.1]庚烷-2,3-二胺、雙環[2.2.1]庚烷-2,5-二胺、雙環[2.2.1]庚烷-2,6-二胺、雙環[2.2.1]庚烷-2,7-二胺、2,3-雙(胺基甲基)-雙環[2.2.1]庚烷、2,5-雙(胺基甲基)-雙環[2.2.1]庚烷、2,6-雙(胺基甲基)-雙環[2.2.1]庚烷、3(4),8(9)-雙(胺基甲基)三環[5.2.1.0(2,6)]癸烷等。此等之中,特佳為對苯二胺、2,2’-二甲基聯苯-4,4’-二胺、2,2’-雙(三氟甲基)聯苯胺、2,2’-雙(三氟甲基)-4,4’-二胺基二苯醚、1,4-雙(4-胺基-2-三氟甲基苯氧基)苯、1,4-二胺基環己烷、4,4’-二胺基二環己基甲烷、4,4’-亞甲基雙(2-甲基環己胺)、4,4’-亞甲基雙(2,6-二甲基環己胺)。上述胺成分可單獨使用,亦可併用兩種以上。If the diamine component used in the synthesis of the colorless and transparent polyimide-based resin of the present invention or its precursor is exemplified as a diamine compound, 1,3-phenylenediamine and 1,4-phenylenediamine can be exemplified. Amine, 2,4-diaminotoluene, 2,6-diaminotoluene, 3,4-diaminotoluene, 4,5-dimethyl-1,2-phenylenediamine, 2,5-diamine Methyl-1,4-phenylenediamine, 2,6-dimethyl-1,4-phenylenediamine, 2,3,5,6-tetramethyl-1,4-phenylenediamine, 3-amine m-xylylenediamine, o-xylylenediamine, 1,5-diaminonaphthalene, 2,2'-dimethylbiphenyl-4,4'-diamine, 2,2'-bis(trifluoromethyl)benzidine, 3,3'-dimethoxybenzidine, 4,4'-diaminooctafluorobiphenyl, 3,3'-diaminodiphenyl methylmethane, 3,4'-diaminodiphenylmethane, 4,4'-diaminodiphenylmethane, 4,4'-methylenebis(2,6-diethylaniline), 4 ,4'-methylenebis(2-ethyl-6-methylaniline), 4,4'-ethylidene diphenylamine, 4,4'-diaminodiphenyl ether, 3,4'-bis Aminodiphenyl ether, 3,3'-diaminodiphenyl ether, 2,2'-bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 1,3-bis(4 -Aminophenoxy)benzene, 1,3-bis(3-aminophenoxy)benzene, 1,4-bis(4-aminophenoxy)benzene, 1,4-bis(4-amine 2-trifluoromethylphenoxy)benzene, 4,4'-bis(4-aminophenoxy)biphenyl, 4,4'-diamino-3,3'-dimethylbiphenyl Phenylmethane, bis[4-(4-aminophenoxy)phenyl]terine, bis[4-(3-aminophenoxy)phenyl]terine, 2,2-bis(4-amino) Phenyl)hexafluoropropane, 2,2-bis(3-aminophenyl)hexafluoropropane, 2,2'-bis[4-(4-aminophenoxy)phenyl]propane, 2,2 '-bis[4-(4-aminophenoxy)phenyl]hexafluoropropane, 2,2-bis(3-amino-4-methylphenyl)hexafluoropropane, α,α'-bis (4-Aminophenyl)-1,4-diisopropylbenzene, bis(2-aminophenyl)sulfide, bis(4-aminophenyl)sulfide, 3,3'-diamine Diphenyl sulfide, 4,4'-diaminodiphenyl sulfide, 4,4'-diaminobenzophenone, 3,3'- Diaminobenzophenone, 4,4'-diaminobenzanilide, 1,4-bis(4-aminophenoxy)benzene, bis(4-amine terephthalate) Aromatic diamines such as phenyl) ester, 2,7-diaminophenyl, and 9,9-bis(4-aminophenyl)fluorine. Moreover, examples of aliphatic diamines include: 1,3-diaminocyclohexane, 1,4-diaminocyclohexane, 1,3-bis(aminomethyl)cyclohexane, 1, 1-bis(4-aminophenyl)cyclohexane, 4,4'-diaminodicyclohexylmethane, 4,4'-methylenebis(2-methylcyclohexylamine), 4,4 '-Methylenebis(2,6-dimethylcyclohexylamine), 4,4'-diaminodicyclohexylpropane, bicyclo[2.2.1]heptane-2,3-diamine, bicyclo[ 2.2.1]heptane-2,5-diamine, bicyclo[2.2.1]heptane-2,6-diamine, bicyclo[2.2.1]heptane-2,7-diamine, 2,3- Bis(aminomethyl)-bicyclo[2.2.1]heptane, 2,5-bis(aminomethyl)-bicyclo[2.2.1]heptane, 2,6-bis(aminomethyl)- Bicyclo[2.2.1]heptane, 3(4),8(9)-bis(aminomethyl)tricyclo[5.2.1.0(2,6)]decane, etc. Among these, p-phenylenediamine, 2,2'-dimethylbiphenyl-4,4'-diamine, 2,2'-bis(trifluoromethyl)benzidine, 2,2 '-Bis(trifluoromethyl)-4,4'-diaminodiphenyl ether, 1,4-bis(4-amino-2-trifluoromethylphenoxy)benzene, 1,4-bis Aminocyclohexane, 4,4'-diaminodicyclohexylmethane, 4,4'-methylenebis(2-methylcyclohexylamine), 4,4'-methylenebis(2, 6-Dimethylcyclohexylamine). The above-mentioned amine components may be used alone, or two or more types may be used in combination.
本發明中,將無機基板與工程塑膠膜積層。此情況之無機基板與工程塑膠膜積層體的接著強度較佳為0.02~1.0N/cm的範圍,進一步較佳為0.03~0.3N/cm的範圍。此接著強度,係以將來會將無機基板與工程塑膠膜剝離為前提的接著強度。In the present invention, an inorganic substrate and an engineering plastic film are laminated. In this case, the bonding strength between the inorganic substrate and the engineering plastic film laminate is preferably in the range of 0.02 to 1.0 N/cm, and more preferably in the range of 0.03 to 0.3 N/cm. This bonding strength is based on the assumption that the inorganic substrate and the engineering plastic film will be peeled off in the future.
本發明的積層體根據製作方法可分成下述三類。 (1)預先製作工程塑膠膜,而與無機基板貼合的方法。 (2)將工程塑膠的溶液或工程塑膠前驅物的溶液塗布於無機基板上並進行乾燥及因應需求的化學反應,而在無機基板上形成工程塑膠之薄膜的方法。 (3)預先製作工程塑膠膜前驅物的薄膜,於貼合至無機基板之後進行化學反應,而在無機基板上形成工程塑膠之薄膜的方法。The laminated body of the present invention can be divided into the following three categories according to the production method. (1) Method of pre-making an engineering plastic film and bonding it to the inorganic substrate. (2) A method of coating a solution of engineering plastics or a solution of engineering plastic precursors on an inorganic substrate and performing drying and chemical reactions as required to form a thin film of engineering plastics on the inorganic substrate. (3) A method of preparing a thin film of an engineering plastic film precursor in advance, and then performing a chemical reaction after bonding it to an inorganic substrate to form a thin film of engineering plastic on the inorganic substrate.
前述(1)預先製作工程塑膠膜,而與無機基板貼的方法中,有使用接著劑的情況與使用下述方法的情況:藉由表面處理將工程塑膠膜、無機基板雙方或一方的表面加以活化而直接貼合之方法。 作為後者的具體例,可例示:以活性能量線、電漿等處理工程塑膠膜表面的方法;相同地處理無機基板表面的方法;進一步使用偶合劑等進行化學修飾的方法等。又,為了控制工程塑膠膜與無機基板的剝離強度,亦可組合脫模劑處理、形成脫模層等技術。Among the methods of (1) making an engineering plastic film in advance and attaching it to an inorganic substrate, there are cases in which an adhesive is used and a method in which the following method is used: surface treatment is performed on both or one of the surfaces of the engineering plastic film and the inorganic substrate. Activated and directly attached method. Specific examples of the latter include: a method of treating the surface of an engineering plastic film with active energy rays, plasma, etc.; a method of treating the surface of an inorganic substrate in the same way; a method of further chemical modification using a coupling agent, etc. In addition, in order to control the peeling strength of the engineering plastic film and the inorganic substrate, technologies such as mold release agent treatment and mold release layer formation can also be combined.
使用前述(2)將工程塑膠的溶液或工程塑膠前驅物的溶液塗布於無機基板上並進行乾燥及因應需求的化學反應,而在無機基板上形成工程塑膠之薄膜的方法的情況,較佳可使用聚醯亞胺系樹脂的溶液或聚醯亞胺系樹脂之前驅物。作為聚醯亞胺系樹脂之前驅物,將在異醯亞胺(isoimide)或聚醯胺酸之狀態下的溶液塗布於無機基板上,乾燥後加熱或使觸媒作用,而得到聚醯亞胺的薄膜。乾燥與加熱亦可同時並行地進行。It is better to use the above method (2) to apply the solution of engineering plastic or the solution of engineering plastic precursor on the inorganic substrate and perform drying and chemical reaction according to the requirements to form a thin film of engineering plastic on the inorganic substrate. A solution of polyimide-based resin or a precursor of polyimide-based resin is used. As a precursor of polyimide-based resin, a solution in the state of isoimide or polyamide acid is applied to an inorganic substrate, and then heated or catalyzed after drying to obtain polyimide. amine film. Drying and heating can also be performed simultaneously and in parallel.
使用前述(3)預先製作工程塑膠膜前驅物的薄膜,於貼合至無機基板之後進行化學反應,而在無機基板上形成工程塑膠之薄膜的方法的情況,首先在聚酯薄膜等之上塗布工程塑膠前驅物、較佳為聚醯亞胺前驅物並使其乾燥,因應需求使其進行化學變化而得到膠狀薄膜。膠狀薄膜中亦可殘留溶劑。如此所得之膠狀薄膜具有某程度的黏性,因此可藉由按壓於無機基板來進行層合。亦可將膠狀薄膜解釋為硬化系樹脂的B階段。亦即,此手法可使環氧樹脂、三聚氰胺樹脂、酚樹脂、BT樹脂等硬化系樹脂在無機基板上薄膜化而作為工程塑膠膜,本發明中,亦可將此等硬化系樹脂的薄膜作為工程塑膠膜來處理。In the case of using the aforementioned (3) method of pre-preparing a thin film of engineering plastic film precursor, laminating it to an inorganic substrate and then performing a chemical reaction, and forming a thin film of engineering plastic on the inorganic substrate, first coating it on a polyester film, etc. An engineering plastic precursor, preferably a polyimide precursor, is dried and chemically changed according to requirements to obtain a gelatinous film. Solvents may also remain in the gelatinous film. The gel-like film thus obtained has a certain degree of viscosity, so it can be laminated by pressing it against the inorganic substrate. The gelatinous film can also be interpreted as the B stage of hardened resin. That is, this method can thin curable resins such as epoxy resin, melamine resin, phenol resin, and BT resin on an inorganic substrate to form an engineering plastic film. In the present invention, thin films of these curable resins can also be used as Engineering plastic film for processing.
本發明中,無機基板與工程塑膠薄膜的接著強度Fb較佳為0.02~0.3N/cm的範圍。接著強度未必需要為此範圍,但本發明中,在以弱接著、亦即在後續步驟中將工程塑膠膜從無機基板剝離為前提的積層體中特別能夠發揮效果。In the present invention, the bonding strength Fb between the inorganic substrate and the engineering plastic film is preferably in the range of 0.02 to 0.3 N/cm. The adhesion strength does not necessarily need to be within this range, but in the present invention, it is particularly effective in laminates that require weak adhesion, that is, peeling off the engineering plastic film from the inorganic substrate in a subsequent step.
本發明中係以保護膜覆蓋工程塑膠膜與無機基板的積層體的工程塑膠膜面。 本發明中的保護膜係至少由保護膜基材與黏著材層所構成。 作為保護膜基材,除了PET薄膜、PEN薄膜、聚乙烯薄膜、聚丙烯薄膜、尼龍薄膜等之外,亦可使用PPS薄膜、PEEK薄膜、芳香族聚醯胺薄膜、聚醯亞胺薄膜、聚醯亞胺吲哚(polyimidebenzazole)薄膜等耐熱性超級工程塑膠薄膜。In the present invention, the engineering plastic film surface of the laminate of the engineering plastic film and the inorganic substrate is covered with a protective film. The protective film system in the present invention is composed of at least a protective film base material and an adhesive material layer. As the protective film base material, in addition to PET film, PEN film, polyethylene film, polypropylene film, nylon film, etc., PPS film, PEEK film, aromatic polyamide film, polyimide film, polyimide film, etc. can also be used. Heat-resistant super engineering plastic films such as polyimidebenzazole films.
作為保護膜的黏著材,並未特別限制,可使用丙烯酸系、聚矽氧系、胺基甲酸酯(urethane)系、橡膠系、聚酯系等公知者。以處理性的觀點,較佳為丙烯酸系樹脂、聚矽氧系樹脂、胺基甲酸酯系樹脂。 前述丙烯酸系樹脂係藉由將(甲基)丙烯酸烷酯等單體聚合而得。作為前述單體的具體例,可列舉:(甲基)丙烯酸甲酯、(甲基)丙烯酸乙酯、(甲基)丙烯酸丙酯、(甲基)丙烯酸正丁酯、(甲基)丙烯酸異丁酯、(甲基)丙烯酸三級丁酯、(甲基)丙烯酸正己酯、(甲基)丙烯酸2-乙基己酯、(甲基)丙烯酸正辛酯、(甲基)丙烯酸異辛酯、(甲基)丙烯酸月桂酯、(甲基)丙烯酸硬脂酯等(甲基)丙烯酸烷酯化合物。此等亦可因應需求而將多種共聚合。The adhesive material of the protective film is not particularly limited, and known ones such as acrylic type, polysilicone type, urethane type, rubber type, polyester type, etc. can be used. From the viewpoint of handleability, acrylic resins, silicone resins, and urethane resins are preferred. The acrylic resin is obtained by polymerizing monomers such as alkyl (meth)acrylate. Specific examples of the monomer include: (meth)acrylic acid methyl ester, (meth) ethyl acrylate, (meth) acrylic acid propyl ester, (meth) acrylic acid n-butyl ester, (meth) acrylic acid isopropyl isoester Butyl ester, tertiary butyl (meth)acrylate, n-hexyl (meth)acrylate, 2-ethylhexyl (meth)acrylate, n-octyl (meth)acrylate, isooctyl (meth)acrylate , (meth)acrylic acid alkyl ester compounds such as lauryl (meth)acrylate and stearyl (meth)acrylate. These can also be copolymerized according to needs.
本發明中的保護膜基材的表面粗糙度Ra,在黏著層之相反側的表面係以0.02μm以上、較佳為0.025μm以上、進一步較佳為0.03μm以上為較佳,關於上限係以1.2μm以下、較佳為0.6μm以下、進一步較佳為0.3μm以下的範圍為進一步較佳。 作為將保護膜基材的表面粗糙度控制在既定範圍的方法,可例示在製造保護膜基材之薄膜時於原料樹脂中添加無機粒子而控制表面粗糙度的方法。作為無機粒子,只要添加既定量的氧化矽、氧化鋁、氧化鈣、氧化鎂、碳酸鈣、碳酸鎂、磷酸鈣、磷酸鎂、硫酸鋇、滑石、高嶺土等公知的無機粒子即可。添加量係根據製作基材薄膜時的延伸倍率、最終的基材薄膜厚度、添加無機粒子的粒度分布等而並不一致,但一般而言以質量比計相對於基材薄膜樹脂的質量為500ppm以上,較佳為1000ppm以上,進一步較佳為2000ppm以上,關於上限為10%質量以下,較佳為3質量%以下,進一步較佳為10000ppm以下的範圍。 作為將保護膜基材的表面粗糙度控制在既定範圍的方法,可例示研磨或研削薄膜基材的表面而作成既定表面粗糙度的方法。 再者,作為將保護膜基材的表面粗糙度控制在既定範圍的方法,可例示:將薄膜原料澆鑄在預先以成為既定表面粗糙度的方式所製作的支撐基材上而得到保護膜基材的方法。此外,亦可例示:將加工成既定表面形狀的壓紋輥等進行按壓而控制保護膜基材之表面粗糙度的方法。The surface roughness Ra of the protective film base material in the present invention is preferably 0.02 μm or more, preferably 0.025 μm or more, and further preferably 0.03 μm or more on the surface opposite to the adhesive layer, and the upper limit is A range of 1.2 μm or less, preferably 0.6 μm or less, further preferably 0.3 μm or less is still more preferred. An example of a method for controlling the surface roughness of the protective film base material within a predetermined range is a method of adding inorganic particles to the raw resin to control the surface roughness when producing a thin film of the protective film base material. As the inorganic particles, a predetermined amount of known inorganic particles such as silicon oxide, aluminum oxide, calcium oxide, magnesium oxide, calcium carbonate, magnesium carbonate, calcium phosphate, magnesium phosphate, barium sulfate, talc, kaolin, etc. may be added. The amount added varies depending on the stretching ratio when making the base film, the final base film thickness, the particle size distribution of the added inorganic particles, etc., but generally it is 500 ppm or more in terms of mass ratio relative to the mass of the base film resin. , preferably 1000 ppm or more, further preferably 2000 ppm or more, and the upper limit is 10 mass % or less, preferably 3 mass % or less, further preferably 10000 ppm or less. As a method of controlling the surface roughness of the protective film base material within a predetermined range, a method of grinding or grinding the surface of the film base material to obtain a predetermined surface roughness can be exemplified. Furthermore, an example of a method for controlling the surface roughness of the protective film base material within a predetermined range is to cast the film raw material onto a support base material that has been produced in advance to have a predetermined surface roughness to obtain the protective film base material. Methods. In addition, a method of controlling the surface roughness of the protective film base material by pressing an embossing roller or the like processed into a predetermined surface shape may also be exemplified.
本發明中工程塑膠膜與保護膜之利用90度剝離法的接著強度Fp較佳為0.01~0.27N/cm的範圍。再者,本發明中,無機基板與工程塑膠膜之利用90度剝離法的接著強度Fb、和工程塑膠膜與保護膜之接著強度Fp較佳係成為Fp<Fb的關係。 亦即,較佳係以在將保護膜從工程塑膠膜剝離時工程塑膠膜不會從無機基板剝離的方式設定各層之間的接著力。根據黏著材的種類而具有剝離速度相依性,因此前述各層之間的接著力根據剝離速度而有所不同。特別是若加快剝離速度,則有剝離強度上升的傾向。然而,從縮短製程時間的觀點來看,前述剝離時的剝離速度期望為較快者,但較佳為至少50mm/分鐘、期望為100mm/分鐘以下。 又,前述接著強度Fp及Fb係利用90度剝離法者,但工程塑膠膜與保護膜的剝離強度、及無機基板與工程塑膠膜的剝離強度,即使在進行180度剝離的情況,較佳亦係成為Fp<Fb的關係。In the present invention, the bonding strength Fp of the engineering plastic film and the protective film using the 90-degree peeling method is preferably in the range of 0.01 to 0.27 N/cm. Furthermore, in the present invention, the bonding strength Fb between the inorganic substrate and the engineering plastic film by the 90-degree peeling method, and the bonding strength Fp between the engineering plastic film and the protective film preferably have a relationship of Fp<Fb. That is, it is preferable to set the adhesive force between each layer so that the engineering plastic film will not peel off from the inorganic substrate when the protective film is peeled off from the engineering plastic film. The type of adhesive material is dependent on the peeling speed, so the adhesion force between the respective layers varies depending on the peeling speed. In particular, if the peeling speed is increased, the peeling strength tends to increase. However, from the viewpoint of shortening the process time, the peeling speed during peeling is preferably faster, but is preferably at least 50 mm/min, and desirably 100 mm/min or less. In addition, the above-mentioned bonding strengths Fp and Fb are based on the 90-degree peeling method. However, the peeling strength between the engineering plastic film and the protective film, and the peeling strength between the inorganic substrate and the engineering plastic film are preferably 180-degree peeling. The relationship is Fp<Fb.
本發明中,前述保護膜基材之與黏著材層相反側的面、和前述無機基板之未與工程塑膠薄膜對向側的面之間的動摩擦係數為0.02~0.25的範圍。動摩擦係數可藉由將保護膜基材之與黏著材層相反側的面、和前述無機基板之未與工程塑膠薄膜對向側的面各自的表面粗糙度控制在前述範圍來實現。In the present invention, the dynamic friction coefficient between the surface of the protective film base material opposite to the adhesive material layer and the surface of the inorganic substrate not opposite to the engineering plastic film is in the range of 0.02 to 0.25. The dynamic friction coefficient can be achieved by controlling the surface roughness of the surface of the protective film substrate opposite to the adhesive layer and the surface of the inorganic substrate not facing the engineering plastic film within the aforementioned range.
本發明中,可將以上所述之積層體重合多片而作成堆疊,較佳為4片以上,進一步較佳為10片以上。本發明中,在作成堆疊的情況,相接的保護膜基材之與黏著材相反的面、和無機基板之間的動摩擦係數在既定範圍內,因此可容易從堆疊中將積層體個別取出。In the present invention, a plurality of the above-described laminates can be stacked to form a stack, preferably 4 or more sheets, more preferably 10 or more sheets. In the present invention, when a stack is formed, the kinetic friction coefficient between the surface of the adjacent protective film base material opposite to the adhesive material and the inorganic substrate is within a predetermined range, so that the laminated bodies can be easily taken out individually from the stack.
本發明中,保護膜基材之與黏著材相反側的面之表面電阻,在23℃、50%RH的環境下放置24小時以上的情況,較佳為1×106 ~1×1010 [Ω]的範圍。亦即,保護膜表面較佳係具有無效而不帶電之程度的導電性。若保護膜面帶電,則在將積層體重合而作成堆疊時,有保護膜面與無機基板面會因靜電而密合,變得難以個別取出積層體的情況。In the present invention, the surface resistance of the surface of the protective film base material opposite to the adhesive material is preferably 1×10 6 to 1×10 10 [ Ω] range. That is, it is preferable that the surface of the protective film has electrical conductivity to such an extent that it is ineffective and does not become electrified. If the protective film surface is charged, when the laminates are stacked to form a stack, the protective film surface and the inorganic substrate surface may come into close contact due to static electricity, making it difficult to individually take out the laminates.
本發明中,可在如此所得之堆疊狀態下保管積層體。本發明之堆疊,在保管時可對應下述任一情況:以堆疊的無機基板成為水平方向的方式進行保管的情況、以成為垂直方向的方式進行保管的情況、接近垂直而傾斜75~89度左右來進行保管的情況。In the present invention, the laminated body can be stored in the stacked state thus obtained. The stacking of the present invention can be stored in any of the following situations: when the stacked inorganic substrates are stored in a horizontal direction, when they are stored in a vertical direction, or when they are nearly vertical and tilted at 75 to 89 degrees. The situation of storage is left and right.
本發明中,可在如此所得之堆疊狀態下運輸積層體。本發明之堆疊可對應下述任一情況:以堆疊的無機基板成為水平方向的方式保持來進行運輸的情況、以堆疊成為垂直方向的方式保持來進行運輸的情況、以接近垂直而傾斜75~89度左右的狀態保持來進行運輸的情況。 [實施例]In the present invention, the laminated body can be transported in the stacked state thus obtained. The stacking of the present invention can correspond to any of the following situations: a situation in which the stacked inorganic substrates are held in a horizontal direction for transportation; a case in which the stacked inorganic substrates are held in a vertical direction for transportation; or a situation in which the stacked inorganic substrates are held in a vertical direction and tilted by 75 to 75 degrees. The condition is maintained at around 89 degrees for transportation. [Example]
以下舉出實施例更具體說明本發明,但本發明不受下述實施例限定。以下實施例中的物性評價方法如下所述。 <表面粗糙度> 表面粗糙度Ra、Rt及Rsm係使用觸針式表面粗糙度計並依據JIS B 0601進行測量。 <動摩擦係數> 關於動摩擦係數,係將摩擦係數夾具安裝於拉伸試驗機,並依據JIS K 7125進行測量。 拉伸試驗機:島津製作所公司製「Autograph(註冊商標) AG-IS」The following examples are given to illustrate the present invention more specifically, but the present invention is not limited to the following examples. The physical property evaluation methods in the following examples are as follows. <Surface roughness> Surface roughness Ra, Rt and Rsm are measured using a stylus type surface roughness meter in accordance with JIS B 0601. <Dynamic friction coefficient> Regarding the dynamic friction coefficient, the friction coefficient fixture was installed on the tensile testing machine and measured in accordance with JIS K 7125. Tensile testing machine: "Autograph (registered trademark) AG-IS" manufactured by Shimadzu Corporation
<接著強度> 關於工程塑膠膜與無機基板的接著強度、保護膜與工程塑膠膜的接著強度(加熱前),係依照JIS K 6854-1記載的90度剝離法,以下述條件進行測量。又,相同地亦測量於120℃加熱1小時後的接著強度。 拉伸試驗機:島津製作所公司製「Autograph(註冊商標) AG-IS」 測量溫度 :室溫 剝離速度 :50mm/分鐘 氣體環境 :大氣 測量樣本寬度 :10mm <表面電阻> 在Agilent Technologies公司製毫歐表(milliohmmeter) 4338B上安裝同公司製的電阻測量單元16008B,以依據IEC 62631-3-2的方法進行測量。<Adhesion strength> The bonding strength between the engineering plastic film and the inorganic substrate and the bonding strength between the protective film and the engineering plastic film (before heating) were measured under the following conditions in accordance with the 90-degree peeling method described in JIS K 6854-1. Moreover, the adhesive strength after heating at 120 degreeC for 1 hour was measured similarly. Tensile testing machine: "Autograph (registered trademark) AG-IS" manufactured by Shimadzu Corporation Measuring temperature: room temperature Peeling speed: 50mm/min Gas environment: atmosphere Measurement sample width: 10mm <Surface resistance> A resistance measurement unit 16008B made by Agilent Technologies was installed on the milliohmmeter 4338B made by Agilent Technologies to perform measurements according to the method of IEC 62631-3-2.
<工程塑膠膜/無機基板的積層體L1的製造> 作為工程塑膠膜F1,係使用宇部興產公司製聚醯亞胺薄膜Upilex 25S。首先,對工程塑膠膜的單面進行使用氮氣的大氣壓電漿處理。 作為無機基板,係使用370mm×470mm、厚度0.7mm的Nippon Electric Glass製的玻璃板OA10G。首先,以UV/臭氧處理清潔玻璃板表面之後,將玻璃板和加熱板一起放入無塵腔室(clean chamber),以支撐載台支撐玻璃板之後,將腔室內以乾淨的乾燥氮氣進行取代,以液面位於無機基板下方200mm的方式放置裝滿矽烷偶合劑(3-胺基丙基三甲氧基矽烷)的培養皿,以加熱板將培養皿加熱至100℃,使無機基板的下表面暴露於矽烷偶合劑蒸氣中3分鐘後,從腔室中取出,設置於潔淨台(clean bench)內,以使無機基板之與暴露面相反側和熱板相接的方式放置在調溫至120℃的加熱板上,進行熱處理1分鐘,得到經進行矽烷偶合劑處理的玻璃板。 然後,以使先前得到的工程塑膠膜之大氣壓電漿處理面重疊於玻璃板的矽烷偶合劑處理面的方式藉由輥層合機使兩者密合,在潔淨烘箱內於150℃進行熱處理30分鐘,得到工程塑膠膜/無機基板的積層體L1。<Manufacturing of engineering plastic film/inorganic substrate laminate L1> As the engineering plastic film F1, polyimide film Upilex 25S manufactured by Ube Kosan Co., Ltd. was used. First, one side of the engineering plastic film is treated with atmospheric pressure plasma using nitrogen. As the inorganic substrate, a glass plate OA10G made of Nippon Electric Glass with a thickness of 370 mm×470 mm and a thickness of 0.7 mm was used. First, after cleaning the surface of the glass plate with UV/ozone treatment, put the glass plate and the heating plate into a clean chamber (clean chamber). After supporting the glass plate on the support stage, replace the chamber with clean dry nitrogen. , place a Petri dish filled with silane coupling agent (3-aminopropyltrimethoxysilane) with the liquid level 200mm below the inorganic substrate, and heat the Petri dish to 100°C with a heating plate to make the lower surface of the inorganic substrate After being exposed to the silane coupling agent vapor for 3 minutes, take it out of the chamber and place it on a clean bench. Place the inorganic substrate in a temperature-adjusted temperature of 120°C so that the side opposite to the exposed surface is in contact with the hot plate. Heat treatment was performed on a hot plate at 100°C for 1 minute to obtain a glass plate treated with a silane coupling agent. Then, the atmospheric pressure plasma treated surface of the previously obtained engineering plastic film is overlapped with the silane coupling agent treated surface of the glass plate, so that the two are closely bonded using a roller laminator, and heat treated at 150°C for 30 seconds in a clean oven. Minutes, a laminate L1 of engineering plastic film/inorganic substrate is obtained.
<工程塑膠膜/無機基板的積層體L2~L4的製造> 以下,除了將工程塑膠膜變更為下述以外,相同地進行操作,得到工程塑膠膜/無機基板的積層體L2~L4: F2:DuPont-Toray公司製聚醯亞胺薄膜 Kapton 100H; F3:東洋紡公司製聚醯亞胺薄膜 Xenomax 38LR; F4:Kuraray公司製液晶聚合物薄膜 Vecstar CTQ-25。<Manufacturing of engineering plastic film/inorganic substrate laminates L2 to L4> Next, except that the engineering plastic film is changed to the following, the same operation is performed to obtain the engineering plastic film/inorganic substrate laminates L2 to L4: F2: Polyimide film Kapton 100H manufactured by DuPont-Toray; F3: Polyimide film Xenomax 38LR manufactured by Toyobo Co., Ltd.; F4: Liquid crystal polymer film Vecstar CTQ-25 manufactured by Kuraray Corporation.
<工程塑膠膜/無機基板的積層體L5的製造> 準備聚醯亞胺(Mitsubishi Gas Chemical(股)製「Neopulim」,玻璃轉移溫度390℃)。將此聚醯亞胺溶解於N,N-二甲基乙醯胺及γ丁內酯的9:1的混合溶媒,製備清漆(濃度20質量%)。藉由澆鑄法使此清漆在厚度188μm、寬度750mm的聚對苯二甲酸乙二酯(PET)薄膜上成膜。以線速0.2m/分鐘,使成膜的清漆通過以階段性地從50℃成為75℃的方式設定溫度之長度12m的爐內,藉此從清漆中去除溶媒,形成透明樹脂薄膜/PET薄膜的二層體,並捲取成捲狀。 然後,從此捲將二層體捲出並將透明樹脂薄膜與PET薄膜剝離後,將透明樹脂薄膜切成既定尺寸,於惰性烘箱中,以氮氣環境下、210℃、60分鐘的條件進行加熱・乾燥,藉此得到無色透明的聚醯亞胺薄膜。將此薄膜作為工程塑膠膜F5。 使用所得之工程塑膠膜F5,與工程塑膠膜/無機基板的積層體L1的製造相同地進行操作,得到工程塑膠膜/無機基板的積層體L5。<Manufacturing of engineering plastic film/inorganic substrate laminate L5> Polyimide ("Neopulim" manufactured by Mitsubishi Gas Chemical Co., Ltd., glass transition temperature: 390°C) was prepared. This polyimide was dissolved in a 9:1 mixed solvent of N,N-dimethylacetamide and γ-butyrolactone to prepare a varnish (concentration: 20% by mass). This varnish was formed on a polyethylene terephthalate (PET) film with a thickness of 188 μm and a width of 750 mm by a casting method. At a line speed of 0.2m/min, the film-formed varnish is passed through a 12m-long furnace whose temperature is set from 50°C to 75°C in stages, thereby removing the solvent from the varnish to form a transparent resin film/PET film The two-layer body is rolled into a roll shape. Then, the two-layer body is rolled out from this roll and the transparent resin film and PET film are peeled off. The transparent resin film is cut into a predetermined size and heated in an inert oven at 210°C for 60 minutes in a nitrogen atmosphere. Dry to obtain a colorless and transparent polyimide film. This film is regarded as engineering plastic film F5. Using the obtained engineering plastic film F5, the same operation as the production of the engineering plastic film/inorganic substrate laminated body L1 was performed to obtain the engineering plastic film/inorganic substrate laminated body L5.
<工程塑膠膜/無機基板的積層體L6的製造> 準備對可分離式燒瓶安裝矽膠管、攪拌裝置及溫度計而成的反應器與油浴。在此燒瓶內投入519.84質量份的二甲基乙醯胺、75.52質量份的4,4’-(六氟亞異丙基)二苯二甲酸二酐(6FDA)及54.44質量份的2,2’-雙(三氟甲基)-4,4’-二胺基二苯基(TFMB),進行攪拌至燒瓶的內容物成為均勻的溶液為止。接著,一邊使用油浴以容器內溫度成為25℃±5℃的範圍的方式進行調整,一邊進一步持續攪拌20小時,得到聚醯胺酸溶液。 使用棒塗布機將所得之聚醯胺酸溶液塗布於370mm×470mm、厚度0.7mm的Nippon Electric Glass製的玻璃板OA10G的單面,於70℃乾燥7.5分鐘、於120℃乾燥7.5分鐘後,進一步於惰性烘箱中,以氮氣環境下、300℃、20分鐘的條件進行加熱。將聚醯胺酸轉化為聚醯亞胺,得到包含成為工程塑膠膜F6的聚醯亞胺薄膜與玻璃板的工程塑膠膜/無機基板之積層體L6。 表1中顯示所得之積層體之工程塑膠膜與玻璃板的接著強度Fa、玻璃板之與工程塑膠膜之積層面相反的面之表面粗糙度Ra等。 從以相同方法製作的積層體L6將樹脂薄膜層剝離,而作為工程塑膠膜F6。<Manufacturing of engineering plastic film/inorganic substrate laminate L6> Prepare a reactor and oil bath consisting of a detachable flask equipped with a silicone tube, a stirring device, and a thermometer. 519.84 parts by mass of dimethylacetamide, 75.52 parts by mass of 4,4'-(hexafluoroisopropylidene)diphthalic dianhydride (6FDA) and 54.44 parts by mass of 2,2 were put into this flask. '-bis(trifluoromethyl)-4,4'-diaminodiphenyl (TFMB), and stir until the contents of the flask become a uniform solution. Next, stirring was continued for 20 hours while adjusting the temperature in the container so that it would fall within the range of 25°C±5°C using an oil bath, thereby obtaining a polyamide solution. The obtained polyamic acid solution was coated on one side of a Nippon Electric Glass glass plate OA10G of 370 mm × 470 mm and 0.7 mm thickness using a rod coater, dried at 70° C. for 7.5 minutes, and then dried at 120° C. for 7.5 minutes. Heating was performed in an inert oven at 300°C for 20 minutes in a nitrogen atmosphere. Polyamide acid is converted into polyimide, and a laminate L6 of an engineering plastic film/inorganic substrate including a polyimide film and a glass plate, which is the engineering plastic film F6, is obtained. Table 1 shows the bonding strength Fa between the engineering plastic film and the glass plate of the obtained laminated body, the surface roughness Ra of the surface of the glass plate opposite to the laminated surface of the engineering plastic film, etc. The resin film layer is peeled off from the laminated body L6 produced by the same method, and it is made into the engineering plastic film F6.
<工程塑膠膜/無機基板的積層體L7的製造> 將具備氮氣導入管、回流管、攪拌棒的反應容器內進行氮氣取代後,加入33.36質量份的2,2’-雙(三氟甲基)聯苯胺(TFMB)、270.37質量份的N-甲基-2-吡咯啶酮(NMP),及以氧化矽在聚醯胺酸溶液中的聚合物固體成分總量成為0.14質量%的方式加入將膠態氧化矽分散於二甲基乙醯胺而成的分散體(日產化學工業製「SNOWTEX(註冊商標) DMAC-ST」),使其完全溶解,然後直接以固體的狀態分批添加9.81質量份的1,2,3,4-環丁烷四羧酸二酐(CBDA)、11.34質量份的3,3’,4,4’-聯苯四羧酸、4.85質量份的(ODPA)之後,於室溫攪拌24小時。之後,加入165.7質量份的DMAc進行稀釋,得到固體成分18質量%、還原黏度2.7dl/g的聚醯胺酸溶液11(TFMB//CBDA/BPDA/ODPA的莫耳比=1.00//0.48/ 0.37/0.15)。使用缺角輪塗布機(comma coater),以最終膜厚成為20μm的方式,藉由模塗布機將此聚醯胺酸溶液塗布於聚對苯二甲酸乙二酯製薄膜A4100(東洋紡股份有限公司製)的無滑材面上。以110℃將其乾燥10分鐘。將乾燥後得到自我支撐性的聚醯胺酸薄膜從作為支撐體的A4100薄膜剝離,通過具有配置有針之針板(pin seat)的針梳拉幅機(pin tenter),藉由將薄膜端部插入針而勾住,以薄膜不會斷裂的方式、且以不會產生不必要之鬆弛的方式調整針板的間隔而進行運輸,以200℃ 3分鐘、250℃ 3分鐘、300℃ 6分鐘的條件加熱,進行醯亞胺化反應。之後,以2分鐘冷卻至室溫,以切割機切除薄膜兩端平面性差的部分,捲繞成捲狀,得到500m的寬度450mm之工程塑膠膜(聚醯亞胺薄膜)F7。使用所得之工程塑膠膜F7,與工程塑膠膜/無機基板的積層體L1的製造相同地進行操作,得到工程塑膠膜/無機基板的積層體L7。<Manufacturing of engineering plastic film/inorganic substrate laminate L7> After replacing the reaction vessel with a nitrogen gas inlet pipe, a reflux pipe, and a stirring rod with nitrogen, 33.36 parts by mass of 2,2'-bis(trifluoromethyl)benzidine (TFMB) and 270.37 parts by mass of N-methyl were added. 2-pyrrolidone (NMP), and colloidal silicon oxide dispersed in dimethylacetamide was added so that the total polymer solid content of silicon oxide in the polyamide solution became 0.14% by mass. The dispersion ("SNOWTEX (registered trademark) DMAC-ST" manufactured by Nissan Chemical Industry) was completely dissolved, and then 9.81 parts by mass of 1,2,3,4-cyclobutane was added directly in a solid state in batches After adding tetracarboxylic dianhydride (CBDA), 11.34 parts by mass of 3,3',4,4'-biphenyltetracarboxylic acid, and 4.85 parts by mass of (ODPA), the mixture was stirred at room temperature for 24 hours. Thereafter, 165.7 parts by mass of DMAc was added for dilution to obtain a polyamide solution 11 with a solid content of 18 mass % and a reduced viscosity of 2.7 dl/g (molar ratio of TFMB//CBDA/BPDA/ODPA=1.00//0.48/ 0.37/0.15). Using a comma coater, this polyamide solution was applied to polyethylene terephthalate film A4100 (Toyobo Co., Ltd.) by a die coater so that the final film thickness became 20 μm. Made of) non-slip material surface. Dry it at 110°C for 10 minutes. The self-supporting polyamide film obtained after drying is peeled off from the A4100 film as the support, and passed through a pin tenter (pin tenter) with a pin seat equipped with pins. Insert the needle into the bottom and hook it, adjust the distance between the needle plates so that the film does not break and unnecessary slack is not generated, and transport it at 200°C for 3 minutes, 250°C for 3 minutes, and 300°C for 6 minutes. Heating under the conditions to carry out the imidization reaction. After that, the film was cooled to room temperature for 2 minutes, and the parts with poor flatness at both ends of the film were cut off with a cutting machine and rolled into a roll to obtain a 500-meter-wide engineering plastic film (polyimide film) F7 with a width of 450 mm. Using the obtained engineering plastic film F7, the same operation as the production of the engineering plastic film/inorganic substrate laminated body L1 was performed to obtain the engineering plastic film/inorganic substrate laminated body L7.
[表1]
<保護膜> 使用表2所示的聚酯(PET)薄膜、聚丙烯(PP)薄膜作為保護膜的基材薄膜,同樣塗布表2所示的黏著材,藉此製造保護膜P1~P6。另外,表2的表面粗糙度係表示保護膜基材之與黏著材層相反側的表面粗糙度。<Protective film> The polyester (PET) film and polypropylene (PP) film shown in Table 2 were used as the base film of the protective film, and the adhesive material shown in Table 2 was similarly coated to produce protective films P1 to P6. In addition, the surface roughness in Table 2 represents the surface roughness of the side of the protective film base material opposite to the adhesive layer.
[表2]
<保護膜與工程塑膠膜的接著強度> 將工程塑膠膜F1~F7與保護膜P1~P6輪流組合,測量各自的組合在90度剝離法中的接著強度Fp。將結果顯示於表3。另外,測量係以N5進行,並設為平均值。另外,接著面係工程塑膠膜之與無機基板(玻璃板)貼附面相反的面。將保護膜與工程塑膠膜貼合後,確認於120℃加熱後的接著強度的結果,係與表3記載之結果為10%以內之範圍的結果。<Adhesion strength between protective film and engineering plastic film> Combine the engineering plastic films F1 to F7 and the protective films P1 to P6 in turn, and measure the bonding strength Fp of each combination in the 90-degree peeling method. The results are shown in Table 3. In addition, the measurement was performed with N5, and was set as an average value. In addition, the bonding surface is the surface of the engineering plastic film opposite to the surface where the inorganic substrate (glass plate) is attached. After laminating the protective film and the engineering plastic film, the results of confirming the bonding strength after heating at 120°C were within 10% of the results reported in Table 3.
[表3]
<附有保護膜之積層體的製造與工程塑膠膜/無機基板(玻璃板)間之接著強度的測量>
以表4所示的組合,使用輥層合機在工程塑膠膜/無機基板的積層體上層合保護膜,得到附有保護膜之工程塑膠膜與無機基板的積層體(簡稱為附有保護膜之積層體)。另外,附有保護膜之積層體係每各自的組合製作7組。
使用前述7組之中3組的附有保護膜之積層體,測量工程塑膠膜/無機基板(玻璃板)間的接著強度。從積層體的邊緣製作「起始處」而將保護膜基材/黏著材/工程塑膠膜統一剝離10mm左右,抓住該部分,求出從玻璃板剝離時的90度接著強度Fb。將結果顯示於表4。測量值為N3的平均值。無論有無保護膜,皆得到大致與表1所示之工程塑膠膜/無機基板(玻璃板)間的接著強度Fa同等的值。
[表4]
<附有保護膜之積層體的製造與保護膜接著強度的測量> 使用前述附有保護膜之積層體的剩餘各4組,求出從積層體將保護膜剝離時的90度接著強度。將結果顯示於表5。針對在保護膜黏著材與工程塑膠膜之間剝離的情況,記載接著強度值,但在將保護膜剝離時工程塑膠膜和保護膜一起從無機基板(玻璃板)剝離的情況則當作「×」。測量值為N3的平均值。 此結果顯示在無機基板(玻璃板)與工程塑膠膜之利用90度剝離法的接著強度Fb、和工程塑膠膜與保護膜之利用90度剝離法的接著強度Fp成為Fp<Fb之關係的情況,在將保護膜剝離時,工程塑膠膜不會和保護膜一起從無機基板(玻璃板)剝離。<Manufacture of laminate with protective film and measurement of protective film adhesion strength> The remaining 4 sets of the above-mentioned protective film-attached laminated body were used to determine the 90-degree bonding strength when the protective film was peeled off from the laminated body. The results are shown in Table 5. When the protective film adhesive material and the engineering plastic film are peeled off, the bonding strength value is recorded. However, when the protective film is peeled off, the engineering plastic film and the protective film are peeled off from the inorganic substrate (glass plate) as "×" ”. Measured values are average values of N3. This result shows that when the bonding strength Fb of the inorganic substrate (glass plate) and the engineering plastic film by the 90-degree peeling method, and the bonding strength Fp of the engineering plastic film and the protective film by the 90-degree peeling method, the relationship is Fp < Fb. , when peeling off the protective film, the engineering plastic film will not peel off from the inorganic substrate (glass plate) together with the protective film.
[表5]
<附有保護膜之積層體堆疊的操作性評價> 前述接著強度測量試驗的結果,保護膜可從工程塑膠膜剝離的組合(工程塑膠膜未從無機基板剝離的組合)中,每各自的組合製作10組附有保護膜之積層體。 在所得之各組合中,將10組附有保護膜之積層體,在平坦的桌上,以玻璃板向下的方式,於水平方向上重疊10組,而作成附有保護膜之積層體之堆疊,於其上重疊相同尺寸的玻璃板、厚度50μm的聚乙烯薄膜、以及與玻璃板相同尺寸的厚度3mm的聚矽氧橡膠片,進一步放置厚度10mm的不銹鋼板作為荷重,於室溫靜置10天。 經過10天後,移除荷重與聚矽氧橡膠片、聚乙烯薄膜,以人工作業確認能否從積層有10組的附有保護膜之積層體堆疊中一組一組地取出附有保護膜之積層體。結果,將無特別問題而能夠取出的情況當作操作良好「○」,將在取出附有保護膜之積層體時發生任何問題的情況當作操作性不良「●」。將結果顯示於表6。 另外,操作性不良中,大部分的個案為玻璃板的背面與保護膜會密合而在將玻璃板抬起時,下方一組的保護膜會剝離。<Evaluation of operability of laminate stacking with protective film> According to the results of the above-mentioned bonding strength measurement test, among the combinations in which the protective film can be peeled off from the engineering plastic film (the combination in which the engineering plastic film is not peeled off from the inorganic substrate), 10 sets of laminates with protective films were prepared for each combination. In each of the obtained combinations, 10 sets of laminated bodies with a protective film were overlapped in the horizontal direction on a flat table with the glass plate downward to make a laminated body with a protective film. Stack on top a glass plate of the same size, a polyethylene film with a thickness of 50 μm, and a polysiloxane rubber sheet with a thickness of 3 mm and the same size as the glass plate. Place a stainless steel plate with a thickness of 10 mm as a load and let it stand at room temperature. 10 days. After 10 days, remove the load, silicone rubber sheet, and polyethylene film, and manually confirm whether the protective films can be removed one by one from the stack of 10 sets of laminates with protective films. The layered body. As a result, the case where the product could be taken out without any particular problem was regarded as good operability "○", and the case where any problem occurred when taking out the laminated body with the protective film was regarded as poor operability "●". The results are shown in Table 6. In addition, in most cases of poor operability, the back side of the glass plate and the protective film are in close contact, and when the glass plate is lifted, the lower set of protective films peels off.
[表6]
<附有保護膜之積層體堆疊的運輸適性評價> 在前述操作性評價中被認為操作性良好的積層體之組合中,將各自10組對齊並重疊而作成附有保護膜之積層體之堆疊。以牛皮紙包住附有保護膜之積層體堆疊,和厚度20mm的聚胺基甲酸酯緩衝材一起放入瓦楞板製的箱子,堆放在小型卡車的載台上,於一般國道上搬運30km,在目的地解開包裝,以前述的方法再次評價操作性。 於任一組合皆無特別問題而能取出附有保護膜之積層體。又,運輸中亦無發生玻璃破裂等事故。 [產業上利用之可能性]<Evaluation of transportability of stacked laminates with protective film> Among the combinations of laminated bodies that were found to have good handleability in the aforementioned handleability evaluation, 10 sets of each were aligned and overlapped to prepare a stack of laminated bodies with a protective film. Wrap the laminate with a protective film in kraft paper and stack it, put it into a corrugated board box together with a polyurethane buffer material with a thickness of 20mm, stack it on the platform of a small truck, and transport it for 30km on a general national highway. Unpack the product at the destination and evaluate the operability again using the method described above. There is no particular problem in any combination, and the laminated body with the protective film can be removed. In addition, there were no accidents such as glass breakage during transportation. [Possibility of industrial application]
如上所述,本發明的附有保護膜之無機基板/工程塑膠薄膜積層體係處理性、運輸性優良,可在藉由保護膜而保護工程塑膠膜面的狀態下進行操作,並且在對工程塑膠膜面進行加工的情況,可無問題地將保護膜剝離。 本發明能夠有用地利用於可撓性裝置等的製造,該可撓性裝置等的製造係利用使用這種積層體而在對工程塑膠膜進行微細加工後將工程塑膠膜從無機基板剝離。As described above, the inorganic substrate/engineering plastic film laminate system with a protective film of the present invention has excellent handleability and transportability, can be operated with the engineering plastic film surface protected by the protective film, and can be used to treat the engineering plastic. If the film surface is processed, the protective film can be peeled off without any problem. The present invention can be effectively used in the production of flexible devices and the like by performing fine processing on the engineering plastic film and then peeling the engineering plastic film from the inorganic substrate using such a laminate.
1:玻璃基板 2:工程塑膠薄膜 3:保護膜的黏著材層 4:保護膜基材 100:玻璃/工程塑膠薄膜積層體 150:保護膜 200:附有保護膜之積層體 300:附有保護膜之積層體堆疊1:Glass substrate 2: Engineering plastic film 3: Adhesive material layer of protective film 4: Protective film base material 100: Glass/engineering plastic film laminate 150:Protective film 200:Laminated body with protective film 300: Laminated body stack with protective film
圖1係顯示無機基板/工程塑膠膜積層體的剖面結構的示意圖。 圖2係顯示保護膜的剖面結構的示意圖。 圖3係顯示附有保護膜之無機基板/工程塑膠膜積層體的剖面結構的示意圖。 圖4係顯示將附有保護膜之無機基板/工程塑膠膜積層體堆積4片而成之堆疊的剖面結構的示意圖。FIG. 1 is a schematic diagram showing the cross-sectional structure of the inorganic substrate/engineering plastic film laminate. FIG. 2 is a schematic diagram showing the cross-sectional structure of the protective film. FIG. 3 is a schematic diagram showing the cross-sectional structure of an inorganic substrate/engineering plastic film laminate with a protective film. FIG. 4 is a schematic diagram showing a stacked cross-sectional structure in which four inorganic substrate/engineering plastic film laminates with protective films are stacked.
200:附有保護膜之積層體200:Laminated body with protective film
300:附有保護膜之積層體堆疊300: Laminated body stack with protective film
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CN118119507A (en) * | 2021-10-27 | 2024-05-31 | 东洋纺株式会社 | Laminate of inorganic substrate with protective film and heat-resistant polymer film |
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